TWI312448B - Agent-based control architecture - Google Patents
Agent-based control architecture Download PDFInfo
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- TWI312448B TWI312448B TW091135512A TW91135512A TWI312448B TW I312448 B TWI312448 B TW I312448B TW 091135512 A TW091135512 A TW 091135512A TW 91135512 A TW91135512 A TW 91135512A TW I312448 B TWI312448 B TW I312448B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32097—Recipe programming for flexible batch
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/80—Management or planning
Description
91135512 年 η Η 係利用 工具、 .,而對 半導體 了此種 展,但 某些缺 易於使 資料監 的製程 界各地 定性及 而言’ 、研磨 程工具 ,構成 而造成 這些進 仍然有 使用者 進製程 整批次 地及世 性、穩 ί缺點可能對諸如產出 衣程溫度1及機械工In the year of 91,135, η 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 半导体 半导体 半导体 半导体 半导体The whole batch of process and world-wide, stable defects may be such as the output of the clothing temperature 1 and the mechanics
92226(修正本).ptc92226 (amendment).ptc
半導體裝置製造之領域,尤係有關 津人體媒介(software agent)來控 (r e c 1 p e )之自動化製造環境。 有一股驅策 電路裝置之 地工作的較 驅桌力。這^ 造以及設有 改良。此外 缺陷,則亦 晶體的積體 其中包括微 快速熱處理 一批晶圓執 製程工具的 製程工具的 是目前在市 點。更具體 用的格式提 視能力,也 參數之即時 .)監視。這 可重複性、 1312448 五、發明說明(l) [發明所屬之技術領域 本發明係大致有關 —種利用自主性主動式 制處理晶圓的技術方法 [先前技術] 半導體工業中—直 器、記憶裝置等的積體 率。客戶對於可更可靠 置-的需求更強化了此種 體等的半導體裝置之製 裝置之製造有了持續的 的各組成部分製造時之 體成本、及設有此種電 一般 沉積工具 的各種製 去數年中 的注意, 域中已有 製程工具 '乏諸如以 力等的先 程參數及 (亦即本 率、正確 力來提高諸如微處理 品質、可靠性、及產出 高品質之電腦及電子裝 些需求已使得'諸如電晶 此種電晶體的積體電路 ’若能減少典型電晶體 可降低每一電晶體的整 電路裝置之成本。 衫步進機、钱刻工具、 工具、離子植入工具等 行_組製程步驟。在過 基礎之技%已獲致更多 精進。然而,儘管該領 場上可購得的許多該等 而言,此種工具經常缺 仏歷史性參數資料的能 缺乏事件記縴、目前製. 圖形顯示、以及遠端 1312448 案號 91135512 —4ί 年月日_修正_ 五、發明說明(2) 具參數等的關鍵性製程參數造成了非最佳的控制。由於批 次内的差異性、各批次間之差異性、及各工具間之差異性 可能造成產品品質及效能的偏差,所以顯露了前文所述的 變化性;反之,用於此類工具的理想之監視及診斷系統將 提供一種監視該變化性之裝置,並提供一種對關鍵性參數 的控制之最佳化裝置。 一種改善半導體製程線作業的技術包括使用遍及全工 廠的控制系統來自動地控制各種製程工具的作業。該等製 造工具與由若干製程模組構成的製造架構或網路通訊。每 一製造工具通常係連接到設備介面。該設備介面係連接到 用來,助該製造工具與該製造架構間之通訊的機器介面。 該機L介面通㊉可能是先進製程控制(Advanced Process Control ;簡稱APC)系統中的一部分。該APC系統根據製 is·模i而啟動控制描述語言程式(C〇ntr〇i script) ’該 ,制描述語言程式可以是用來自動擷取製程執行所需的資 料之軟體程式。半導體裝置經常是逐步經過多値製造工 具’以便進行多個製程’而產生了與經過處理的半導體裝 置的品質有關之資料。 在製程期間’可能發生會影響到所製造裝置的性能之 各種事件。亦即,製程步驟中的變化將造成裝置性能的變 化。諸如細微結構關鍵尺寸(criUcai dimensions,簡 ==)、摻雜層級(丨e ve丨s )、接觸電卩且、及微粒污染等的 *皆有可能影響到該裝置的最終性能。根據各性能模型 戽二ϋ製程線中的各種工具,以便滅少製程的變化。一般 又控1的工具包括微影步進機、研磨工具、蝕刻工具、及 案號 91135512 1312448 五、發明說明(3) I…._…一---------------------------------—; 沉積工具。將處理前及(或)處理後的度量資料供應到該 等工具的製程控制器。該等製程控制器根據該性能模型及 該度量資訊來計算諸如製程時間等的操作技術資料參數, 以便嘗試使所產生的處理後結果儘量接近目標值。以此種 方式減少變化時,將可獲致更高的產出率、更低的成本、 及更高的裝置性能等成效,所有這些成效都等同於更高的 獲利率。 諸如遍佈全工廠的APC系統之分散式運算環境中經常 會出現組態控制及效率的問題。通常有許多軟體開發者撰 寫控制程式碼,以便建構該等製程控制器。某一特定的開 發者可能廣泛地開發某一類型的控制器。每一開發者通常 有一特有的程式撰寫風格,且通常依賴其自身撰寫的一些 常式。例如,每一開發者可能有一組常式,作為與資料庫 或該APC架構内的其他實體溝通之介面,並用來執行各種 數學函數及基本公用函數。 與此種配置相關聯的一個問題在於各製程控制描述語 言轾式之間只有很少的一致性。大量的客戶訂製式描述語 言程式也造成了組態控制問題及效率問題。各開發者可能 針對一不同的開發者所製作的一不同類型的製程控制器, 而將相當長的時間耗用在複製先前已開發出的程式碼。對 非標準化的程式碼進行除錯是更耗時的工作,且進一步降 低了效率。 本發明之目標在於克服或至少減輕前文所述之一個或 多個問題的效應。.The field of semiconductor device manufacturing is particularly related to the automated manufacturing environment in which the body agent controls (r e c 1 p e ). There is a driving force that drives the work of the circuit device. This is made and improved. In addition, the defect is also the accumulation of crystals, including micro-rapid heat treatment. A batch of wafer-making tools for the process tools is currently in the market. More specific format for viewing, and also for real-time parameters.) Monitoring. This reproducibility, 1312448 V. Inventive Description (1) [Technical Fields of the Invention] The present invention is generally related to a technique for processing wafers by autonomous active processing [Prior Art] In the semiconductor industry - straight, memory The combined rate of devices and the like. The customer's need for more reliable positioning has further enhanced the manufacture of devices for such semiconductor devices, such as the cost of manufacturing various components, and the various systems in which such electrical deposition tools are provided. In the past few years, there have been process tools in the domain that lack the advanced parameters such as force and (that is, the rate and correctness to improve the quality and reliability of computers and electronics such as micro-processing, reliability, and output. The need to install some of the 'integrated circuits such as electro-crystals such a transistor' can reduce the cost of a complete circuit device for each transistor by reducing the typical transistor. Shirt stepping machine, money engraving tools, tools, ion implants Into the tool and other processes - group process steps. The basic skills of the basics have been more refined. However, despite the many commercially available items on the field, such tools often lack the ability of historical parameters. Lack of event recording, current system. Graphic display, and remote 1312448 Case No. 91135512 - 4 年 日 _ _ _ _, invention description (2) key process parameters with parameters, etc. caused the most Good control. The variability described above is revealed due to differences in batches, differences between batches, and differences between tools, which may result in variations in product quality and performance; The ideal monitoring and diagnostic system for such tools will provide a means of monitoring this variability and provide an optimized means of controlling critical parameters. A technique for improving semiconductor process lines includes the use of control throughout the plant. The system automatically controls the operation of various process tools. The manufacturing tools communicate with a manufacturing architecture or network of process modules. Each manufacturing tool is typically connected to a device interface. The device interface is connected to, A machine interface that facilitates communication between the manufacturing tool and the manufacturing architecture. The L-interface of the machine may be part of an Advanced Process Control (APC) system. The APC system is activated according to the is. Control description language program (C〇ntr〇i script) 'This, the description language program can be used to automatically capture the process execution A software program for the required data. Semiconductor devices are often stepped through multiple manufacturing tools 'to perform multiple processes' to produce information about the quality of the processed semiconductor device. During the process 'may occur, it will affect the manufacturing Various events of the performance of the device, that is, changes in the process steps will result in changes in device performance, such as critical dimensions (cri Ucai dimensions, simplification ==), doping levels (丨e ve丨s ), contact 卩And, * and particulate contamination, etc., may affect the final performance of the device. According to the performance model, the various tools in the process line are used to eliminate the change of the process. Generally, the tools of the control 1 include the lithography step. Advance, grinding tools, etching tools, and case number 91135512 1312448 V. Invention description (3) I.._...一----------------------- -----------; deposition tools. The pre- and/or post-processed metrics are supplied to the process controllers of the tools. The process controller calculates operational technical data parameters such as process time based on the performance model and the metric information to attempt to bring the generated processed results as close as possible to the target value. Reducing change in this way will result in higher yields, lower costs, and higher device performance, all of which are equivalent to higher yields. Configuration control and efficiency issues often occur in decentralized computing environments such as APC systems throughout the plant. There are often many software developers writing control code to build these process controllers. A particular type of developer may develop a certain type of controller extensively. Each developer usually has a unique programming style and often relies on some of the routines he or she writes. For example, each developer may have a set of routines that serve as an interface to the repository or other entities within the APC architecture and to perform various mathematical functions and basic utility functions. One problem associated with such a configuration is that there is little consistency between the various process control description languages. A large number of customer-defined description language programs also pose configuration control problems and efficiency issues. Developers may be working on a different type of process controller for a different developer, and spend a considerable amount of time copying previously developed code. Destroping non-standardized code is a more time consuming task and further reduces efficiency. It is an object of the present invention to overcome or at least mitigate the effects of one or more of the problems set forth above. .
[發明内容] —[Summary of the invention] -
92226(修正本).ptc 第9頁 1312448 1312448 案莖_.,9.幽512 IT年月」 修正 五、發明說明(4) 本發明的一個概念是一種製造系統,該製造系統包 製程工具、控制器錄介、及第一製程媒介。該製程工且之 組態設定成根據操作技術方法而處理工件。該控制器媒 之組態設定成決定與該製程工具中之該工件的處理相關聯 的控制動作。該第一製程媒介係與該製程工且及該工件 一::!聯,1該第一製程媒介之組態設定成與該 控制益媒"連繫收該控制動作,並 設定該操作技術方法之組態。 < 观作而 能本發,f另—個概念是—種根據操作技術方法而控制 及;設件的製程工具之方法。將與該製程工ί 及該工件中之至父一個相關聯的苐一製程媒介實體化。蔣 ^態設定成決定與該製程工具中之該工件的處理相關的 控制動作之控制器媒介實體化。二、 ^曰 叹这控制動作。該第一製程媒介連螌纺 具1便根據該控制動作而設定該操作技術方法= [實施方式] 撕,太1:月本發明之實施例。為了顧及說明的清 而,我們當了解,貫的實施例之所有特徵。然 作出許多與實施例何此類真實的實施例時,必須 ^ L 系統相關的及與業務相關的限制條侔,i ,限錢件將隨著不同 例而改變。條:們: 二此;】發工作可能是複雜且耗時的,但對已 '171"事項獲益的擁有此項技藝的一般知識者而言,仍 131244892226 (Revised). ptc Page 9 1312448 1312448 Stalk _., 9. 512 IT Years of the Year Revision 5, Description of the Invention (4) One concept of the present invention is a manufacturing system that includes a process tool, Controller recording, and the first process medium. The process is configured to process the workpiece in accordance with operational techniques. The controller media is configured to determine the control actions associated with the processing of the workpiece in the process tool. The first process medium is associated with the process and the workpiece::! The configuration of the first process medium is set to be associated with the control medium and the configuration of the operational technical method is set. < Viewing and enabling, the other concept is a method of controlling and controlling the manufacturing tool according to the operation technique. The first process media associated with the process ί and the parent to the parent is materialized. The Jiang state is set to determine the controller media materialization of the control actions associated with the processing of the workpiece in the process tool. Second, ^ 曰 sigh this control action. The first process medium continuous twisting tool 1 sets the operation technique according to the control action. [Embodiment] Tearing, too 1: Monthly embodiment of the present invention. In order to take account of the clarity of the description, we will understand all the features of the embodiments. While many of the actual embodiments of the embodiments are made, there must be a system-related and business-related restriction, i. The limiter will vary from case to case. Article: We: Two;;] The work may be complicated and time-consuming, but for those who have the general knowledge of the '171"
---_ 索號.91135512 五 '發明說明(5) 然將是一種例行的工作。 首先請參閱第1圖,圖中示出根據本發明的_特定實 =例而建構及操作的生產流程(1〇〇)的— 概念 :,生產流程(1 0 0)的所示部分包含兩個製程站(i 〇 5 飑#母一製程站(10 5)包含與製程工具(115)通訊之電 。該等製程站(105)係經(由=連結 . 而相互通訊。在所示實施例中,該等電腦裝置 的_女番及Λ等通訊連結(120)包含諸如網路(125)等 (〔電腦糸統之一部分。第i圖所示之該等製稃工具 )之曰圓正在處理於製造積體電路裝置時的若干批次(130 J之日日圓(1 3 5)。雖然將本發明觫 恭昍用於 因為可腺士炊π α m 的應用並不受此限制,迫是 ^ 了將本發明應用於其他類型的製程。因此,在前文所 =、生產流程(100)中,可將該等批次(13〇)的晶圓 3 5)更般性地稱為π工件π。在所有的實施例中,該 # =程工具(115)及在該等製程工具上執行的任何製程 、並不必然與半導體裝置的製造相關。然而,為了顧及 5 ^的Θ晰,且為了有助於了解本發明,在所示實施例的 内容中揭示本發明時,將保留與半導體製造有關的術語。 第2圖示出根據本發明而設定程式及操作的電腦裝置 _( 11 0)的硬體及軟體架構之各別所選擇部分。圖中並未 不出該硬體及漱體架構的某些樣態(例如,個別的介面 卡、基本輸入/輸出系統(Basic Input/Output System ; 簡稱BIOS)、及輸入/輪出驅動程式等)。為了顧及說明 的清晰’而省略這些樣態,以便不會模糊了本發明。然---_ 索号.91135512 Five 'Invention Description (5) It will be a routine work. First, please refer to Fig. 1, which shows the production process (1〇〇) constructed and operated according to the _specific example of the present invention. The concept: the illustrated part of the production process (1 0 0) contains two The process stations (i 〇5 飑#mother one process station (10 5) contain electricity for communication with the process tool (115). The process stations (105) are communicated by (connected by =.). In the example, the communication link (120) of the computer device, such as the female fan and the sputum, includes a circle such as the network (125), etc. ([the computer system is part of the i. Several batches (130 days of Japanese yen (1 3 5)) are being processed in the manufacture of integrated circuit devices. Although the present invention is used for the application of gemstone π α m, it is not limited by this. It is forced to apply the present invention to other types of processes. Therefore, in the above-mentioned, production process (100), the batches (13 〇) of wafers 35) can be more commonly referred to as π workpiece π. In all embodiments, the #=程工具 (115) and any processes performed on the process tools are not necessarily semi-conductive The manufacture of the device is related. However, in order to facilitate the understanding of the present invention, in order to facilitate the understanding of the present invention, terms relating to semiconductor manufacturing will be retained when the invention is disclosed in the context of the illustrated embodiment. The selected portions of the hardware and software architecture of the computer device _ (110) according to the present invention are set. The figure does not show some aspects of the hardware and the body structure (for example, Individual interface cards, basic input/output systems (Basic Input/Output System; BIOS), and input/round-out drivers, etc., which are omitted for the sake of clarity of the description, so as not to obscure the present invention. However
92226(修正本).ptc 第11頁 131244892226 (Revised).ptc Page 11 1312448
__案號 91135512 五、發明說明(6) 而’對此項技術具有一般知辦土丄 之後將可了解’電腦裝置在參閱本發明的揭示事項 包含許多此種例行的功能。1〇)的該軟體及硬體架構將 在所示實施例中,電腦择婆, 業系統的工作站’但本發明f 11〇)是採用UNIX型作 譬如膝上型電腦、桌上型電腦:此限制。事實上可以用 超級電腦等的任何類型的電重Ϊ你電腦、大型電腦、或 (110卜在某些替代實施例中運\裝置來實施該電腦裝置 以是後入製程工具(115)的7理!腦裝置y1(0甚至可 不限於UNIX型作業系統。亦可免:或控制益。本發明亦 WindowsTM型作業系統或磁砰的=f系統(例如 system ^,D〇s) ^ ^ ^ 11 〇Perating 裝“⑽㈣定實施例統)。本發明不受限於電腦 電腦裝置(11〇)亦包含處理器(2〇5),該處理器 =)係經由匯統(215)而連接到某儲存單元 (1〇)。該儲存單凡(2丨〇)通常將包含至少一個硬碟 (圖中未示出)及隨機存取記憶體(Rand01n Access__Case No. 91135512 V. Description of the Invention (6) And 'This technology will have a general knowledge of the bandits. It will be understood that the computer device is included in the disclosure of the present invention and contains many such routine functions. The software and hardware architecture of the computer will be in the illustrated embodiment, the workstation of the computer system, but the invention is a UNIX type computer such as a laptop computer or a desktop computer: This limit. In fact, you can use any type of electric power such as a supercomputer to smash your computer, a large computer, or (in some alternative embodiments, the computer device to implement the computer device to be the back-in process tool (115) 7 The brain device y1 (0 may not even be limited to the UNIX type operating system. It may also be free of: or control benefits. The invention is also a WindowsTM type operating system or a magnetic 砰=f system (eg system ^, D〇s) ^ ^ ^ 11 〇Perspect is equipped with "(10) (four) fixed embodiment system. The invention is not limited to a computer computer device (11 〇) and also includes a processor (2 〇 5), which is connected to some via a sink (215) Storage unit (1〇). The storage unit (2丨〇) will usually contain at least one hard disk (not shown) and random access memory (Rand01n Access)
Memory;簡稱RAM)(圖中未示出)。在某些實施例中, .電腦裝置(110)亦可包含諸如光碟(圖中未示出)、或 軟碟(.圖中未示出)、或諸如磁帶(圖中未示出)或高容 量軟碟(圖中未示出)等某一其他形式的儲存單元等的抽 換式儲存單元。處理器(20 5)可以是此項技術中習知的 任何適用的處理器。例如,該處理器可以是一個一般用途 微處理器或數位信號處理器(Digitai signal Processor;簡稱DSP)。在所示實施例中,處理器(2〇5Memory; referred to as RAM) (not shown). In some embodiments, the computer device (110) may also include, for example, a compact disc (not shown), or a floppy disk (not shown), or such as a magnetic tape (not shown) or high. A removable storage unit of some other form of storage unit, such as a capacity floppy disk (not shown). The processor (205) can be any suitable processor known in the art. For example, the processor can be a general purpose microprocessor or a digital signal processor (DSP). In the illustrated embodiment, the processor (2〇5
92226(修正本).Pt 第12頁 1312448 Λ --案號91135512 Qt:年b月曰 修正__ 五、發明說明(7) ' - _)是由 Advanced Micro Devices,Inc. "AMD")在古 +θ ,,上 1赞上供 應的Ath 1 οηΤΜ64位元處理器,但本發明並不受此限制。亦 可替代性地採用S u η M i c r 〇 s y s t e m s公司供應的6 4位元 ' U1 traSPARCTM或 32位元 microSPARCTM、Intel股份有限公 司供應的任何一種11 a n i u m T Μ或P e n t i u m T Μ等級的處理器、 和Compaq電腦股份有限公司供應的AlphaTM處理器。電1腦 裝置(110)包含監視器(240)、鍵盤(24 5)、及滑鼠 ( 25 0),而該等裝置連同其相關聯的使用者介面軟體 (2 5 5)而包含了使用者介面(260)。在所示實施例中, 該使用者介面(26 0)是圖形使用者介面(Graphical User Interface;簡稱GUI) ’但這不是實施本發明所必 要的。 第2圖亦示出電腦裝置(11 〇)的軟體架構之一些所 選擇部分。在所示實施例中’每一電腦裝置(1 1 〇)包含 存放在儲存單元(21 0)的軟體媒介(2 6 5)。請注意,可 將軟體媒介(265)存放在生產流程(1〇〇)中該等電腦裝 置.(110)以外的其他位置。軟體媒介(265)的位置對本 發明的實施不是很重要的。亦請注意,因為軟體媒介 -(26 5)的位置不是很重要’所以某些電腦裝置(1丨〇)可 能有多個軟體媒介(265)存放在其中,而其他的電腦裝 置(110)可能並無任何軟體媒介(265)存放在其中。諸 如由 Cons i 1 i um, I nc. ( Mountain View, CA)提供的 WORKSTREAMTM等的自動化製造執行系統(Manufacturing Execution System;簡稱 MES) ( 270)係存放在至少一 個電腦裝置(110)中。92226 (Revised). Pt Page 12 1312448 Λ - Case No. 91135512 Qt: Year b months 曰 Revision __ V. Invention Description (7) '- _) is by Advanced Micro Devices, Inc. "AMD") In the ancient +θ, the upper 1 is like the supplied Ath 1 οηΤΜ 64-bit processor, but the present invention is not limited thereto. Alternatively, the 64-bit U1 traSPARCTM or 32-bit microSPARCTM supplied by S u η M icr 〇systems, or any 11 anium T Μ or P entium T Μ class processor supplied by Intel Corporation can be used. , and the AlphaTM processor supplied by Compaq Computer Corporation. The electrical 1 brain device (110) includes a monitor (240), a keyboard (24 5), and a mouse (250), and the devices are included with their associated user interface software (25 5). Interface (260). In the illustrated embodiment, the user interface (260) is a Graphical User Interface (GUI)' but this is not required to practice the invention. Figure 2 also shows some of the selected parts of the software architecture of the computer unit (11 〇). In the illustrated embodiment, each computer device (1 1 〇) contains a software medium (2 6 5) stored in a storage unit (210). Please note that the software medium (265) can be stored in a location other than the computer equipment (110) in the production process (1〇〇). The location of the software medium (265) is not critical to the implementation of the present invention. Please also note that because the location of the software medium - (26 5) is not very important 'so some computer devices (1丨〇) may have multiple software media (265) stored in it, while other computer devices (110) may No software medium (265) is stored in it. An automated manufacturing execution system (MES) ( 270) such as WORKSTREAMTM supplied by Cons i 1 i um, I nc. (Mountain View, CA) is stored in at least one computer device (110).
92226(修正本).ptc 第13頁 鮮· 案號 91135512 月曰 1312448 五、發明說明(8) 統(125) 包括區域網路 請再參閱第1圖,如前文所述’該等電腦教置(丨丨 也可能是經由該等通訊連結(1 2 0)而連接的^ κ 、之一部分。在此種實施例中的例示m:: .Local Area Network;簡稱 Un)、 網路(Wide Area Network;簡稱 WAN)、备 & 糸統區域網路 < System Area Network;簡稱 SAN)、企業内網路、甚 或網際網路。電腦系統(1 25)採用連網主從式架構,作 是替代實施例亦可採用同層間架構(peer_tn ^ ’一 ,· 、 LU~Peer architecture)。因此,在噪些替代實施例中,該 裝置(110)可直接相互通訊。該等通訊連結(丨^)可:92226 (Revised). ptc Page 13 Fresh · Case No. 91935512 Monthly 曰 1312448 V. Invention Description (8) System (125) Including the regional network, please refer to Figure 1, as described above. (丨丨 may also be part of ^ κ connected via the communication link (1 2 0 0). In this embodiment, m:: . Local Area Network; Un), network (Wide Area) Network; referred to as WAN), backup & 区域 System Network Network (SAN), intranet, or even the Internet. The computer system (1 25) adopts a networked master-slave architecture, and an alternative embodiment can also adopt a peer-to-peer architecture (peer_tn ^ ', , LU~Peer architecture). Thus, in alternative embodiments, the devices (110) can communicate directly with one another. These communication links (丨^) can:
是無線、同轴纜線、光纖、或雙絞線電纜對連結。電腦S 統(125)(在各實施例中採用一個電腦系統及該@甬、 訊連結(1 20)都是與實施例相關的,且可以此 =^ 習知的任何適當方式提供該電腦系統(125)及$ ζ訊 連結(120)。電腦系統(125)可採用此項技術/中習^知°的 任何適當之通訊協定,例如傳輸控制協定/網際網路通訊 協定(Transfer Control Pr〇t〇c〇l/lnternet °It is a wireless, coaxial cable, fiber optic, or twisted pair cable pair. Computer S system (125) (using a computer system in each embodiment and the @甬, 讯链接 (1 20) are all related to the embodiment, and the computer system can be provided in any suitable manner. (125) and the 连结 连结 link (120). The computer system (125) can use any suitable communication protocol of the technology/study, such as the Transmission Control Protocol/Internet Protocol (Transfer Control Pr〇) T〇c〇l/lnternet °
Protocol;簡稱 TCP/IP)。 用來製造該 135)的層_、圖 現在請參閱第1圖及第2圖,該等軟體媒介 同地^責有效率地指導該等批次(⑽的晶圓(13^經 過:製程。每-製程工具(115)代表在該目標二 的某一資源。例如,製程工具(丨丨5)可以是 等晶圓(135)的某一部分(亦即,晶圓疋 樣、摻雜、或熱處理)之製造工具。或者, 115)可以是用來評估生產流程(1〇〇)的各部分:性能Protocol; referred to as TCP/IP). The layer used to make the 135), and now refer to Figure 1 and Figure 2, the software media in a timely manner to guide the batch (10) wafer (13 ^ pass: process. The per-process tool (115) represents a resource at the target 2. For example, the process tool (丨丨5) may be a portion of the wafer (135) (ie, the wafer is doped, doped, or Manufacturing tool for heat treatment. Or, 115) can be used to evaluate the various parts of the production process (1〇〇): performance
92226(修正本).ptc 1312448 案號 91135512 五、發明說明(9) 月日_修正 之度量工具。因此,該等軚秘 源用於該等批次(13〇)的曰體媒介(2 6 5)可將複數個資 由該等製程工具"⑸所:;^35)之後二'分配 τ θ , 11C, 叫+A亦 厂代表的資源、以及在該等製程 厂 之0 ^,以便將這些資源分配給該等批次 (130)的晶圓(135)之後續處理之評估工作。 。在所不實施例中,該等敕體媒介(2 6 5)是在啟動時 自行设定組態的、具有智慧的、知道狀態的、且灌輸有其 自主地開始行動而要達成之特定目標。該等軟體媒介 (26 5)也是可隨著其所在環境的改變而自行調整。在— 物件導向程式設§十(Object 〇riented Programming;簡 稱OOP)環境中,係將該等軟體媒介(2 65)實施為物件, 但是亦可利用非物件導向的技術來實施本發明。該等軟體 媒介的行為是相當簡單的,且是描述語言程式或基於規則 的。將該行為設計成達到所選擇的目標,例如:達到所指 定的批次到期日’達到預先規定的品質水準’使機器的利 用率最大化,以及安排隨機的預防性維護。於推動這些目 標時,該等軟體媒介(2 6 5)係作為MES( 270)的介面,並 與現有的工廠控制系統(圖中未示出)整合。熟習此項技 術者在參閱本發明的揭示事項之後將可了解,此種介面及 整合進行的方式將根據MES ( 27 及該工廠控制系統的特 性而是與實施例相關的° 如將於下文中進一步說明的,可針鮮數個不同的層級 而將該等軟體媒介(265)專門化。一個層級是"類型", 亦即,該等軟體媒介(2 6 5)在生產流程(1 〇 〇)中是代表 "消費者"或"供應者'^更具體而言,係由軟體媒介在整92226 (Revised). ptc 1312448 Case No. 91135512 V. Description of invention (9) Month Day _ Corrected measurement tool. Therefore, the source of these secrets is used in the batch (13〇) of the corpuscular media (2 6 5), and the plurality of funds can be used to divide the τ by the process tools "(5):;^35) θ , 11C, the resources represented by the +A factory, and the 0 ^ at the process plants, in order to allocate these resources to the evaluation of the subsequent processing of the wafers (135) of the batch (130). . In the non-embodiment, the media (2 6 5) is self-configured at startup, intelligent, aware of the state, and instills a specific goal to be achieved by autonomously starting the action. . These software media (26 5) are also self-adjusting as their environment changes. In the context of Object 〇riented Programming (OOP), the software medium (2 65) is implemented as an object, but the invention can also be implemented using non-object-oriented techniques. The behavior of these software media is fairly straightforward and is a description language program or rule-based. The behavior is designed to achieve the selected objectives, for example, reaching the specified batch expiration date 'up to a predetermined quality level' to maximize machine utilization and to schedule random preventive maintenance. To drive these goals, the software media (2 6 5) serves as the interface for the MES (270) and is integrated with existing plant control systems (not shown). Those skilled in the art will appreciate, after reading the disclosure of the present invention, that such interface and integration will be performed in accordance with the MES (27 and the characteristics of the plant control system, but rather the embodiment-related values, as will be described below). Further, the software medium (265) can be specialized in a number of different levels. One level is "type", that is, the software medium (2 6 5) is in the production process (1) 〇〇) is represented by "consumer" or "supplier'^ more specifically, by software media
1312448 _案號 9Π35512_^<年 U 月 曰__ 五、發明說明(10) 體生產流程(1 0 0)中所代表的實體之類型來決定該等軟 體媒介(2 6 5)代表消費者或供應者。例如,軟體媒介 (26 5)可代表批次(130)的晶圓(135)(亦即 π批次 媒介"、製程工具(1 15)(亦即"機器媒介")、或製程 材料(亦即"資源媒介”)。亦可以藉由功能(亦即,以 軟體媒介(2 6 5)在生產流程中執行的功能)將該等軟體 媒介(26 5)專門化。例如,可將軟體媒介(2 6 5)之組態 設定成執行特定的功能,而不必然代表特定的實體。例 如,可將軟體媒介(2 65)之組態設定成決定在製程工具 (11 5)中處理的特定批次(1 3 0)的晶圓(1 3 5)之控制 動作(亦即”控制器媒介”)。該控制器媒介所採取的動作 能取決於該批次(1 30)的特性、及製程工具(1 1 5)的特 性。視特定的實施例而定,可由一批次媒介或機器媒介而 呼叫控制器媒介。在所示實施例中,控制器媒介在其整個 生命週期中都保持與特定的製程工具(1 1 5).相關聯,然 而,亦可使用其他的配置。軟體媒介(2 6 5)可執行其中 包括排程的其他功能。 在將於下文中更完整說明的一實施例中,例如,可以 有排程媒介、處理媒介、及控制器媒介。請注意,該等軟 體媒介(2 6 5)不必然存在與諸如各批次(1 3 0)或製程工 具(11 5)等的各製造領域實體間之一對一的對映關係。 相反地,係由一組軟體媒介(2 6 5)代表大部分的各領域 實體。例如,一批次(13 0)或製程工具(115)可以有排 程媒介及處理媒介。控制器媒介可與特定的製程工具 (11 5)相關聯,且可由其中一個處理媒介(亦即與該批1312448 _ Case number 9Π35512_^<年U月月曰__ V. Description of invention (10) The type of entity represented in the body production process (100) determines that the software medium (2 6 5) represents the consumer Or supplier. For example, the software medium (26 5) may represent a batch (130) of wafers (135) (ie, π batch media ", process tool (1 15) (ie, "machine media"), or process Materials (also known as "resource media).) Software media (26 5) can also be specialized by functionality (i.e., functions performed in the production process by software media (2 6 5). For example, The configuration of the software medium (2 6 5) can be configured to perform specific functions without necessarily representing a specific entity. For example, the configuration of the software medium (2 65) can be set to determine the process tool (11 5) The control action (ie, "controller medium") of the wafer (1 3 5) of the particular batch (130) processed in the process. The action taken by the controller medium can depend on the batch (1 30) Characteristics, and characteristics of the process tool (1 15). Depending on the particular embodiment, the controller medium can be called by a batch of media or machine media. In the illustrated embodiment, the controller media is throughout its life. It is associated with a specific process tool (1 15) during the cycle, however, it can also be used The software medium (2 6 5) may perform other functions including scheduling therein. In an embodiment, which will be more fully described below, for example, there may be a scheduling medium, a processing medium, and a controller medium. Please note that these software media (2 6 5) do not necessarily have an one-to-one mapping relationship with entities in each manufacturing domain such as batches (1 30) or process tools (115). A set of software media (2 6 5) represents most of the domain entities. For example, a batch (130) or process tool (115) can have scheduling media and processing media. The controller media can be specific to Process tool (11 5) is associated with and can be processed by one of the media (ie, with the batch)
92226(修正本).ptc 第16頁 1312448 ^-^135512 年 0 月^^ 修正 五、發明說明(11) ii:置或有該助製Λ工具(115)相關聯的處理媒介)守叫。 為,以便支接作叹计專門化的物件,用以展現專門化的行 為以便支,領域實體功能的單一樣態。 在此特定的實施例中,係利用ς 來實施該等軟體婵介f 2fm。在^件導向程式π。十技術 中,軟體"媒八/ 26 )在物件導向運算的術語 甲辱人體媒介”是具有自主性的主動 名將一组 的狀況而採取J 2 軟體媒介可回應當地 ii署體媒介"進行定義、組態設定、 工作者、㈣、設備、及製2匕世界” 軟體物件可包含—個或多個軟體物件解在, 干的軟體物件所構成。•反地,孰件又可由 解,可將-個物件的功能與其他的二項技術者當亦: 解,可將描述為與各別物件相ϋ成結合。我們當了 件相關聯的功能。 &功能結合成與單,物 此外,在此特定實施例 ”可設定組態的"。在該特定〒軟體媒介(2 65)是 軟體媒介行為的描述語 ’中,可修改用來管制 ("_—n‘),4定"控制旋益”92226 (Revised).ptc Page 16 1312448 ^-^135512 Year 0^^ Amendment 5. Invention Description (11) ii: Set or have the processing medium (115) associated with the helper tool). In order to support the special object of the exclamation, to show the specialized behavior in order to support, the domain entity functions in a single state. In this particular embodiment, the software is used to implement f 2fm. In the piece guide program π. In the ten-technical, software "Media 8/26) in the term of object-oriented computing, the human media is "autonomous, the name of the initiative, and the J 2 software media can respond to the local media." Definitions, configuration settings, workers, (4), equipment, and manufacturing worlds. Soft objects can consist of one or more soft objects, and dry soft objects. • Inversely, the element can be solved, and the function of one object can be compared with other two technologies: the solution can be described as being combined with each object. We have an associated function. The & function is combined into a single, and in addition, in this particular embodiment, the "configurable configuration" is used. In this particular software medium (2 65) is a description of the behavior of the software medium, which can be modified to control ("_-n'), 4 set " control spin benefits"
92226(修正本).ptc 第17頁 旋鈕是可在外部設定的軟體媒人人體媒介的組態。控制 使用彈性及(或)系統調整。、二^參數或特性,用以提供 OT™ ---~,某些特性指定用來指 1312448 案號 91135512 五、發明說明(12)92226 (Revision).ptc Page 17 The knob is a configuration of the software media human body medium that can be set externally. Control Use flexibility and/or system adjustments. , two parameters or characteristics, to provide OTTM ---~, some characteristics specified to refer to 1312448 case number 91135512 five, invention description (12)
引系統決策的曲線。更具體而言,4 述該等軟體媒介(2 6 5)的處理及Μ Λ田返語言程式來描 人辨程動你 的事件造成描述語言程式區段的執行 使某 些預定 在 一 例中,係以JPython實施該等描述語士^ —彳固特定的實施 J Python是一種可提供一個雙向jav人程式,其中A curve that leads to system decisions. More specifically, 4 the processing of the software medium (2 6 5) and the Λ 返 返 返 语言 语言 语言 来 返 返 返 返 返 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言 语言Implementing these descriptors in JPython ^ 彳 特定 特定 特定 特定 特定 特定 特定 Python Python is a two-way jav program
Java程式設計語言。可經由網際絪^丨面的開放原始碼 叫塔而自網站 <http://www. jpython.org/> 取措甘丄 ' 的額外資訊。 件其中包括JPython下載 因此,在本說明書中係以軟體實施的程序之方式來呈 現詳細說明的某些部分,而該軟俨 耵枉序之万式术呈 ^ u* ^ ^ Λ 遐貫知的程序涉及對電腦 铋主-、土 - tvf. ^ « ± 丄貝料位元進行的運算之符 说表不法。延些描述及表示法是孰 4从士斗,Tt ,疋熟習此項技術者用來在有 效的方式下將其工作之内涵傳遞认 夕丁 1兮笪总产 窗斤守题給對其他熟習此項技術者 之工具。該4程序及運算需要對物 非必然,但這些物理量之形式通里 灯 二 人 ,^ n ㊉為可予儲存、傳送、結 合、比較、及以他種方式接作少 Ο. ^ ^ 、 電氣信號、磁性信號、或 先信號。將延些信號稱為位元、 _ ^ -TS 4 致值、元素、符號、字 70、項、或數子等時,已證.明經當θ & π u t -為了普遍使用之故。 吊疋較便利的,主要也是 然而,我們當謹記於心,所 * 術語都與適當的物理量有關,而^ :術語及,、他類似的 AA /a 4l! M X, a 且只是適用於這些物理量 的便利性標δ己而已。除非有苴# 里 尨 F名"、他特別的陳述,或在說明中 係ϋ而易見’否則在整個本發明的揭示事項中,這些描 述意指一電子裝置的動作及程序,而該電子裝置可操作表 示為某一電子裝置的儲存單元内的物理(電子、磁性、或Java programming language. Additional information can be obtained from the website <http://www.jpython.org/> via the open source code of the Internet. Including the JPython download, therefore, in this specification, some parts of the detailed description are presented in the form of a software-implemented program, and the soft-sequence is presented as ^u*^^ Λ The procedure involves the operation of the computer 铋 main -, soil - tvf. ^ « ± 丄 料 料 。 。 。 。 。. Deferred descriptions and representations are 孰4 from 士斗,Tt, 疋 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项 此项The tool of this technology. The 4 programs and operations need to be inconsistent, but the form of these physical quantities is two-way, ^ n can be stored, transmitted, combined, compared, and used in other ways as a second. ^ ^, Electrical Signal, magnetic signal, or first signal. When the delay signal is called a bit, _ ^ -TS 4 value, element, symbol, word 70, term, or number, etc., it has been proved that the jing is θ & π u t - for general use. Hanging is more convenient, mainly but however, we should keep in mind that the terminology is related to the appropriate physical quantity, and ^: the term and, his similar AA / a 4l! MX, a and only applies to these The convenience of physical quantity is only δ. Unless there is a 苴# F名", his special statement, or in the description, it is easy to see 'otherwise, throughout the disclosure of the present invention, these descriptions mean the actions and procedures of an electronic device, and An electronic device is operatively represented as physical (electronic, magnetic, or within a storage unit of an electronic device)
第〗8頁 案號 91135512 1312448Page 〗 8 Case No. 91135512 1312448
五、發明說明(13) ______ 内 種 光)、量之資料,並將該資料轉換為同樣 〜 内或傳輸裝置或顯示裝置中的物理量之7F為該錯存單元 描述的術語之例子包括(但不限於、他資料。表示此 計算"、"決定11、或"顯示"等的術語。处理’運算"、 發 媒 亦請注意,通常係在某一形式的程 明的各軟體實施之樣態編碼,或者經由鞏存媒體上將本 體而實施該等軟體實施之樣態。該程式::=的傳輪 磁,的(例如軟碟或硬碟機)或光學的(例:二讀::是 ompact Dlsk Read Only Memory;簡稱 CD_R ’、, 且可以是唯讀或隨機存取。@樣地,該 絞線電規、同軸電'規、光纖、或此項技術中 if’輸媒體。本發明並不受限於任何特定實施例的 可在先進製程控制(APC)架構下實施生產流程(i )。APC系統包含由可進行生產流程(3 〇 中的批次至批 次控制及錯誤偵測/分類的若干可交換之標準化軟體元件 構成的分散式軟體系統。在該APC系統的上層部分將本發 明的各軟體媒介(2 65)及其作業分層,以便獲致近乎自 主性操作的半導體製造流程。 APC系統的該等軟體元件根據半導體設備及材料國際 協會(Semiconductor Equipment andMaterials International;簡稱SEMI)的電腦整合式製造 (Computer Integrated Manufacturing;簡稱 Cl Μ)架構 依從的系統技術及先進製程控制(APC)架構而實施架構 性標準。可公開地自SEMI取得CIM(SEMI E8 1 - 0 6 9 9-對於5. Description of invention (13) ______ Within the light, the amount of data, and convert the data into the same ~ within or the physical quantity of the transmission device or display device 7F for the description of the terminology of the defective unit includes (but Not limited to, his information. Indicates this calculation ", "decision 11, or "display", etc.. Handling 'operations", please also note that the media is usually in the form of a certain form of Cheng Ming. The software implements the mode coding, or implements the software implementation by the ontology on the media. The program: := the transmission of the magnetic, (such as a floppy or hard disk drive) or optical (for example) : Second reading:: is ompact Dlsk Read Only Memory; referred to as CD_R ', and can be read-only or random access. @样地, the stranded electric gauge, coaxial electric gauge, optical fiber, or this technology if 'Transmission media. The invention is not limited to any particular embodiment of the production process (i) that can be implemented under the Advanced Process Control (APC) architecture. The APC system consists of a production process (lots to batches in 3) Secondary control and error detection/classification A decentralized software system consisting of dry exchangeable standardized software components. The software media (2 65) of the present invention and its operations are layered in the upper portion of the APC system to achieve a semi-autonomous operation of the semiconductor manufacturing process. The software components of the system are based on the System Technology and Advanced Process Control (APC) architecture of the Semiconductor Integrated Manufacturing (SEMI) architecture of the Semiconductor Equipment and Materials International (SEMI). Implementing architectural standards. CIM can be obtained publicly from SEMI (SEMI E8 1 - 0 6 9 9-
92226(修正本).ptc 第19頁 1312448 ^ _案號91135512 年卜月曰 修正__ 五、發明說明(14) CIM架構領域或架構之臨時規格(Provisional Specification for CIM Framework Domain Architecture))及 APC(SEMI E93-0999-對於 CIM架構先進 製程控制組件之臨時規格(Provisional Speci fi cat ion for CIM Framework Advanced Process Control Component))規格。SEMI的連絡資訊為:8310 Capital of Texas Highway North, Suite 290 Austin, TX 78731;電話為 512-349-2422;傳真為 512-349-2442;網 址為 <http://www.semi.org> 。 此種特定的架構極度有賴於採用物件導向程式設計的 軟體,且採用分散式物件系統的物件管理群組(〇b j ect Management Group;簡稱 0MG)的共同物件要求中介人架 構(Common Object Request Broker Architecture;簡 稱CORBA)及C0RBA_Service規格。也易於公開地取得 〇MG C0RBA架構的資訊及規格。 可適於執行本發明所述的APC系統的功能之一例示軟 體系統是由KLA-Tencor,Inc.在市場上提供的Catalyst系 統。KLA-Tencor的連絡資訊為:1 60 Rio Robles, San Jose,CA 9 5 1 34;電話為 40 8-87 5-6 0 0 0;傳真為 40 8-87 5- 3 0 3 0;網址為 <http://www.kla-tencor.com>。 亦可自 KLA-Tencor的網站 <http://www.kla-tencor. com/controlsolutions/cataly stapc.html〉取得與 Catalyst系統有關的額外資訊。 現在請參閱第3圖,圖中示出使用根據本發明另一實 施例的軟體媒介(2 6 5)而實施生產流程(3 0 0)的實施範92226 (Revised). ptc Page 19 1312448 ^ _ Case No. 91935512 Rev. __ V. Invention Description (14) CIM Architecture Provisional Specification for CIM Framework Domain Architecture) and APC (SEMI E93-0999 - Specification for the CIM Architecture Advanced Process Control Component). SEMI's contact information is: 8310 Capital of Texas Highway North, Suite 290 Austin, TX 78731; telephone number 512-349-2422; fax number 512-349-2442; website address <http://www.semi.org> . This particular architecture relies heavily on object-oriented programming software, and the object object management group (〇bj ect Management Group; 0MG) uses a common object request broker architecture (Common Object Request Broker Architecture) ; referred to as CORBA) and C0RBA_Service specifications. It is also easy to publicly obtain information and specifications of the 〇MG C0RBA architecture. One of the functions that can be adapted to perform the functions of the APC system of the present invention is that the software system is a Catalyst system commercially available from KLA-Tencor, Inc. KLA-Tencor's contact information is: 1 60 Rio Robles, San Jose, CA 9 5 1 34; telephone is 40 8-87 5-6 0 0 0; fax is 40 8-87 5- 3 0 3 0; <http://www.kla-tencor.com>. Additional information related to the Catalyst system can also be obtained from KLA-Tencor's website <http://www.kla-tencor.com/controlsolutions/cataly stapc.html. Referring now to Figure 3, there is shown an implementation of a production process (300) using a software medium (2 6 5) in accordance with another embodiment of the present invention.
92226(修正本).ptc 第20頁 案號 91135512 1 _ 丨 ... 五、發明說明(15) 1312448 曰 修正 例之方塊簡圖。由一批次排程媒介( 媒介(320)代表例*㈣二及;批次製程 广On、 ^ 田機盗排避據办 〇及機器製程媒介(34 0)代表例示製程工具 5 :該批次排程媒介(31 0)與生產流程(3中、 ^排程媒介(33〇)等的各種實體協商,以便) 機 ^ -大所需的資源。例如,批次排程媒介及== ^ H〇n Pr〇t〇C〇1"方法來安排將該製程工具 5)私疋給該批次(1 3 0)的時程。 時 介 ,程工具(115)接收到該批:欠(13〇) *要處理 U叫該批次製程媒介(32〇)及(或)機器製程媒 (34(ΐί 4般該批次製程媒介(32〇)及機器製程媒介 (115) ΪΙΪ制器媒介(35G),以便決定將該製程工具 的必要之押制技^方法之組態設定成處理該批次(13〇) 介(urn甘 批次製程媒介(32〇)或機器製程媒 個實施命丨Φ、任何一個可呼叫該控制器媒介(35 0)。在一 動作所靈的^批次製程媒介(32〇)可將決定必要的控制 .度量次粗B與該抵(130)的特性有關之資料(例如尺寸 (ORn/ —電氣度量資料等資料)傳送給該控制器媒介 具 。同樣地,機器製程媒介(34〇)可將與該製程工 在的時門有關的資料(例如間置時間、自上次清潔到現 (3 、3 、工具狀況等的資訊)傳送給該控制器媒介 (〇)在—替代實施例中’可將與該批次(1 30)及 太製Ϊ工具(11 5).的特性有關之資料儲存在集中式 貝健存單凡(360)中,而該控制器媒介(3 5 0)可存取92226 (Revised). ptc Page 20 Case No. 91135512 1 _ 丨 ... V. Description of Invention (15) 1312448 方块 Block diagram of the modified example. A batch of scheduling media (media (320) representative example * (4) 2 and; batch process wide On, ^ field pirate evasion and machine process media (34 0) represents an exemplary process tool 5: the batch The secondary scheduling medium (31 0) negotiates with various entities such as the production process (3, ^ scheduling medium (33〇), etc.) to make the necessary resources. For example, batch scheduling media and == ^ H〇n Pr〇t〇C〇1" method to arrange the process tool 5) privately to the time course of the batch (130). Time, the tool (115) receives the batch: owe (13 〇) * to process the U called the batch process medium (32 〇) and / or machine process media (34 (ΐί 4 like the batch process medium (32〇) and machine process media (115) controller media (35G), in order to determine the configuration of the necessary tooling method for the process tool to set the batch (13〇) mediation (urn Gan Batch process media (32〇) or machine process media implementation 丨 Φ, any one can call the controller media (35 0). In an action ^ batch process medium (32 〇) can determine the necessary Control. Measure the data of the secondary coarse B and the characteristics of the offset (130) (for example, the size (ORn / - electrical metric data, etc.) is transmitted to the controller media. Similarly, the machine process medium (34 〇) can Data relating to the time gate of the process worker (eg, the intervening time, information from the last cleaning to the present (3, 3, tool status, etc.) is transmitted to the controller medium (〇) in an alternative embodiment 'Storage of data relating to the characteristics of the batch (1 30) and the Tailing Tools (11 5). (360) in a centralized deposit where shellfish health, and the media controller (350) accessible
92226(修正本).pt 第21頁 案號 91135512 131244892226 (Revised).pt Page 21 Case No. 91135512 1312448
五、發明說明(16) 該資料儲存單元(3 6 0)。可將該資料儲存單元 成:存諸如包含處理前的及處理後的度量資料之 工具狀態、及批次優先順序等的資料。 現在將更詳細地說明控制器媒介(35〇)之 =器媒:"5〇)所採取的特定控制動作是與實】例; 關的。例如,如果該製程工具(丨丨5)是CMp工具, $,器媒介(3 5 0)可接收研磨前的厚度量測值(' 例如了 較高細微結構的厚度、較低細微結構的厚度),並 成研磨後的目標厚度所需之研磨時間。在該製程^具u元 (115)是蝕刻工具的情形中,該控制器媒介(35〇'可 據钱刻前及(或)蝕刻後的厚度量測值而建立該製程工具 (115)的蝕刻性能模型。控制器媒介(35〇)可^用該^ 程工具(11 5)的控制模型來產生其預測。可利用一般Ύ 習知的線性或非線性技術,而憑經驗發展出該控制模型。 該控制模型可以是較簡單的方程式型模型(例如,線性、 才曰數、或加權平均等的方程式)、或諸如類神經網路模 型、主成分分析(Principal Component Analysis;簡稱 PCA)模型、或潛在結構預測(projecti〇n to Latent Structure;簡稱 PLS)模型等的較複雜的模型。該模型 的特定實施方式可能隨著所選擇的模型建立技術而有所不 同。利用該控制模型時,控制器媒介(3 5 0)可決定諸如 钮刻時間、電漿功率、溫度、氣壓、及反應物氣體濃度等 的操作技術方法參數,以便減少蝕刻後的厚度變化。其他 類型的製程工具(11 5)可能有其他的控制動作》 在控制器媒介(3 5 0)的組態設定期間(亦即,首次V. Description of invention (16) The data storage unit (3 60). The data storage unit can be configured to store information such as the status of the tool including the pre-processed and processed metric data, and the batch priority order. The specific control actions taken by the controller medium (<5〇) = "5〇) will now be described in more detail with respect to the actual example; For example, if the process tool (丨丨5) is a CMp tool, $, the medium (3 50) can receive the thickness measurement before grinding ('for example, the thickness of the higher microstructure, the thickness of the lower microstructure) ), and the grinding time required for the target thickness after grinding. In the case where the process tool (115) is an etching tool, the controller medium (35〇' can establish the process tool (115) according to the thickness measurement before and/or after etching. Etching performance model. The controller medium (35〇) can use the control model of the tool (11 5) to generate its predictions. The control can be developed empirically using conventional linear or nonlinear techniques. The control model can be a simpler equation-based model (for example, equations such as linear, talented, or weighted average), or a model such as a neural network model or a Principal Component Analysis (PCA) model. a more complex model such as a projecti〇n to Latent Structure (PLS) model. The specific implementation of the model may vary with the selected model building technique. The controller medium (350) determines operational technique parameters such as buttoning time, plasma power, temperature, gas pressure, and reactant gas concentration to reduce thickness variations after etching. During the "media configuration settings in the controller (350) is. Other types of process tools (115) may have other control operation (i.e., the first
92226(修正本).ptc 第22頁 1312448 案號 91135512 U 月 曰 修正 五、發明說明(17)92226 (Revised).ptc Page 22 1312448 Case No. 91135512 U Month 修正 Amendment V. Invention Description (17)
將該控制器媒介(3 5 0)實體化時),由該控制器媒介 (3 5 0)界定所用的整體性組態變數。在所示實施例$ 這些整體性變數包括來自技術方法管理系統(Reei ’ Management System;簡稱 RMS)(亦即,用來儲存該製 程工具(1 1 5)所執行的該現行製程的系統預設技術方法 的技術方法設定值之整體性資料庫)之變數值、以及環境 變數(context variable)值。環境變數值界定一控制執 行緒(control thread),且通常包含諸如工具識別碣、When the controller medium (3 50 is materialized), the overall configuration variable used is defined by the controller medium (350). In the illustrated embodiment, these holistic variables include a system preset from the Reei ' Management System (RMS) (ie, the current process used to store the process tool (1 15)). The technical method of the technical method sets the value of the integrity of the database) and the value of the environment variable (context variable). The environmental variable value defines a control thread and usually includes tools such as tool identification.
批次編號、及作業編號等的各變數之值。此外,係將數值 提供給任何必須的基本變數(baseline variable)。此 種變數值的例子包括錯誤通知的電子郵件發送清單、停止 ¥間值、視為."子"批次("c h i 1 d" 1 〇 t)的一批次中容 許的最大晶圓數目、及控制器媒介(3 5 〇)可使用的前— 製程層資訊(前饋資訊)等的變數值。 控制器媒介(3 5 0)可使用在該等整體性組態變數中 設定的批次編號及晶圓數量值,並決定批次編號、系列名 稱(family name)、母批次名稱(parent name)、設 備、晶圓數目、及狀態(亦即,該批次是母批次或子批次The value of each variable such as the batch number and the job number. In addition, the value is provided to any necessary baseline variable. Examples of such variable values include an email notification list of error notifications, a stoppage value, and a maximum crystal allowed in a batch of ."sub"batch ("chi 1 d" 1 〇t) The number of rounds, and the variable values of the front-process layer information (feedforward information) that can be used by the controller medium (3 5 〇). The controller medium (3 50) can use the batch number and wafer quantity value set in the overall configuration variables and determine the batch number, family name, and parent batch name (parent name). ), equipment, number of wafers, and status (ie, the batch is a parent batch or sub-batch)
)之值。可利用先前界定的環境資訊及RMs資訊來設定控 制器媒介(3 5 0)用來計算控制動作的值。例如,控制器 媒介(3 5 0)可根RMS中界定的值,而利用環境資訊(或,, 執^緒"名稱)來設定控制模型參數之值。一特定的例子 將是根據特定蝕刻製程室的環境及RMS中界定的該蝕刻 製程室的蝕刻速率值,而設定控制模型中所用的蝕刻速率 值°The value of ). The previously defined environmental information and RMs information can be used to set the value that the controller medium (350) uses to calculate the control action. For example, the controller medium (3 50) can use the values defined in the RMS and use the environmental information (or, control) to set the value of the control model parameters. A specific example would be to set the etch rate value used in the control model based on the environment of the particular etch process chamber and the etch rate value of the etch process chamber defined in the RMS.
13124481312448
五、發明說明(18) 此外,控制器媒介(3 5 0)可利用抵 名稱,使用查詢而自資料儲存單元( 、扁唬及I紅層 資訊。控制器媒介(3 5 0)可檢查與特 擷取前饋度量 料陣列中之各元素,並為缺少的值填入比次相關聯的資 如,可將前一製程的目標用來設定一個缺,預設值。例 值,作為由控制器媒介(35〇)所用的前、/、次的必須量測 分。亦可執行用來設定缺少的前饋資訊值貝貝訊的-部 預設值之其他方法。 乂取代使用系統 控制器媒介(3 5 0)設定用來查詢資 )以擷取與現行控制執行緒相關聯的控制儲存單元(360 及狀態結構。可利用該等鍵值自資料儲存dd先、所需之鍵值 取執行緒狀態資料。控制器媒介(35〇)早7^ ( 3 6 0)擷 環境變數處理的最近各批次而搜尋於排序資制以該·執行緒 行緒狀態資料。如果找到此種值,則將該等值=中,執 控制模型的使用者界定之函,,該函數計算並】=含 行緒狀態值^如果在該堆疊中並未找到任何值執 媒介(35。)可沿著資料儲存階層向上搜尋 ]且控制器 J執行緒狀態值的第- P皆層擷取資料。係假 堆、有該 :的階層包含類似的資#,但該等資料具有不同以所 f制器媒介(350^可施行風險檢查(je〇pu ,其方式為在貢料儲存單元(36G)中執行杳1 取風險堆疊(je〇Pardy stack)(亦即自上, 批次數目值。可將該值與該風險類別中的批次數^中之 ----- ——______ 心門限V. INSTRUCTIONS (18) In addition, the controller medium (3 50) can use the name and use the query from the data storage unit (, flat and I red layer information. The controller medium (3 50) can check and Specially extract each element in the feedforward metrics array, and fill in the missing values for the missing values. The target of the previous process can be used to set a default, default value. The pre-, /, and sub-measurements used by the controller media (35〇) can also be used to set other methods for setting the default value of the missing feedforward information value. The medium (3 50) is configured to query the resource to retrieve the control storage unit (360 and state structure associated with the current control thread. The key value can be used to store the dd first and the required key value from the data. Take the thread status data. The controller medium (35〇) is 7^ (3 6 0)撷 the most recent batches of the environment variable processing and search for the sorting resource to the thread state data. If such a value is found , then the equivalent = medium, defined by the user of the control model , the function calculates and == contains the thread state value ^ if no value is found in the stack (35.) can be searched up along the data storage level] and controller J thread status value - P The data is collected from all layers. It is a fake heap, and the class with the same contains the same capital #, but the information has different media to be used (the 350^ can be tested for risk (je〇pu, its way is in Gong In the material storage unit (36G), execute the risk stack (je〇Pardy stack) (that is, from the top, the batch number value. This value can be compared with the batch number in the risk category^---- ——______ heart threshold
92226(修正本).ptc 第24頁 業=該特定執行緒上處理過的各Μ構成 巧作 案號 91135512 1312448 五、發明說明(19) 值(這是通常在RMS中指定的一值)相比較。如果並未超 過該風險門限值,則控制器媒介(3 5 0)可繼續作業。如 果超過了該門限值,則控制器媒介(3 5 0)在決定現行批 次的控制動作之前,可異常中斷(abort),並傳送彈出 式顯示幕,用以指示操作員對自該風險堆疊中之批次清單 中選出的一個批次執行度量事件。 如前文所述,控制器媒介(3 5 0)利用先前決定的狀 態及目標資訊來計算控制器輸入(製程技術方法更新)。 控制器媒介(3 5 0)然後將該控制動作的結果傳送到機器 製程媒介(3 4 0),而機器製程媒介(34 0)又在處理該批 次(13 0)之前,先更新製程工具(1 1 5)的操作技術方 法。 在某些實施例中,可針對該批次(1 3 0)的處理而將 一個以上的控制器媒介(3 5 0)實體化。例如,如果該製 程工具(115)是微影步進機,則可呼叫控制器媒介(350 )來控制疊對(over 1 ay),並可呼叫另一控制器媒介 (3 5 0)來控制關鍵尺寸。該等多個控制器媒介(3 5 0)可 刮用來自已處理晶圓的回授資訊來調整各種步進機參數, 例如曝光劑量、曝光時間、及焦距等多數。在另_ 一例子 中,諸如用來形成多晶矽層的工具等的沉積工具亦可具有 多個控制器媒介(3 5 0),用以控制諸如多晶矽的粒徑 (g r a i n s i z e)及多晶石夕層的厚度等的參數。 當呼叫該等控制器媒介(3 5 0)時,即檢查各環境變 數,以便決定哪些個別的控制器媒介(3 5 0)需要決定控 制動作。作業識別碼指示將要'執行的製程(例如,多晶石夕92226 (Revised). ptc Page 24 industry = the various components processed on this particular thread constitute the case number 91135512 1312448 V. Invention Description (19) Value (this is a value usually specified in RMS) . If the risk threshold is not exceeded, the controller medium (3 50) can continue to operate. If the threshold is exceeded, the controller medium (3 50) can abort before deciding the control action of the current batch and send a pop-up display to instruct the operator to stack from the risk. A batch execution metric event selected in the batch list in the middle. As previously described, the controller medium (350) uses the previously determined status and target information to calculate controller inputs (process technology method updates). The controller medium (3 50) then transmits the result of the control action to the machine process medium (340), and the machine process medium (34 0) updates the process tool before processing the batch (130). (1 1 5) operational technique. In some embodiments, more than one controller medium (305) may be materialized for processing of the batch (130). For example, if the process tool (115) is a lithography stepper, the controller medium (350) can be called to control over 1 ay and can be controlled by calling another controller medium (3 50). Key size. The plurality of controller media (350) can be used to adjust various stepper parameters, such as exposure dose, exposure time, and focal length, using feedback information from the processed wafer. In another example, a deposition tool such as a tool for forming a polysilicon layer may also have a plurality of controller media (305) for controlling grain size and polycrystalline layer such as polycrystalline germanium. The parameters such as the thickness. When the controller media (3 50) is called, the environmental variables are checked to determine which individual controller media (300) need to determine the control action. The job identification code indicates the process to be executed (for example, polycrystalline stone eve
92226(修正本).ptc 第,25頁 1312448 _案號 9Π35512 五、發明說明(20) 修正 閘極掩蔽層對第二中間層電介質掩蔽層(I LD))。只有 在某些環境狀況下才需要每一控制器媒介(3 5 0),且只 有在這些環境狀況都符合時才執行每一控制器媒介(3 5 0 )。例如,CD控制器媒介(35 0)可能只在多晶矽掩蔽層 製程中執行,但是可能不在第二IL D掩蔽層製程中執行。 另一方面,疊對控制器媒介(3 5 0)可在上述兩種掩蔽層 製程事件中執行。 如本文所述,使用媒介型控制架構時,可提昇整體的 工廠效率,並提供更廣泛的自動化。更具體而言,具有自 主性的主動式軟體媒介(2 6 5)進行排程,並將開始執行 批次排程及製程。一般而言,較佳的製程控制可降低產品 的變化性,因而又提高了產品的性能和獲利率。 前文所揭示的該等特定實施例只是供說明用,這是因 為熟習此項技藝者在參閱本發明的揭示事項之後,可易於 以不同但等效之方式修改並實施本發明。此外,除了下文 的申請專利範圍所述者之外,不得將本發明限制在本文所 示的結構或設計之細節。因此,顯然可改變或修改前文所 揭示的該等特定實施例,且把所有此類的變化視為在本發 明的範圍及精神内。因此,本發明所尋求的保護係述於下 列的申請專利範圍中。92226 (Revised). ptc No., p. 25, 1312448 _ Case No. 9Π35512 V. Description of Invention (20) Correction of the gate masking layer to the second interlayer dielectric masking layer (I LD). Each controller medium (3 50) is required only under certain environmental conditions, and each controller medium (3 5 0 ) is executed only when these environmental conditions are met. For example, the CD controller medium (35 0) may only be executed in the polysilicon masking process, but may not be performed in the second IL D masking process. Alternatively, the overlay controller media (350) can be executed in both masking process events described above. As described in this article, using a media-based control architecture increases overall plant efficiency and provides greater automation. More specifically, the proactive active media (2 6 5) with scheduling is scheduled and will begin batch scheduling and processing. In general, better process control reduces product variability, which in turn increases product performance and profitability. The particular embodiments disclosed above are for illustrative purposes only, and the invention may be modified and practiced in a different and equivalent manner. In addition, the present invention is not limited to the details of the structure or design shown herein except as described in the claims below. Accordingly, it is apparent that the particular embodiments disclosed above may be changed or modified, and all such variations are considered within the scope and spirit of the invention. Accordingly, the protection sought by the present invention is described in the scope of the following claims.
92226(修正本).ptc 第26頁 1312448 , ___案號 91135512_^年 月 V?日______ 圖式簡單說明 [圖式簡單說明] 若參照上文中之說明,並配合各附圖,將可了解本發 明’在這些附圖中,相同的代號識別類似的元件,這些附 圖有: 第1圖在概念上示出根據本發明而建構並操作的第— 生產流程的特定實施例之一部分; 第2圖是第1圖所示電腦裝置的硬體及軟體架構的各 所選擇部分之一概念性部分方塊圖;以及 第3圖是在根據本發明而建構並操作的第二生產流程 中將媒介專門化為排程媒介、冑程媒介、及控制器媒介之 概念性說明部分方塊圖。 :然本發明易於作出各種修改及替代形式,但是該角 示出本發明的一些特定實施例,且e 解,本文對這些特定實施例的說:了 制在所揭示的該等特定形式, =’、毛明砰 的申請專利範圍所界定的本發&本發明將涵蓋最補 丨〜w不發明的精神及笳圊 改、等效物、及替代。 乾圍内之所有t [主要元件符號說明] 1 05 製程站 1 1 5 製程工具 125 網路 135 晶圓 21 0 儲存單元 240監視器 100、300 生產流程 110 電腦裝置 120 通訊連結 13 0 批次 205 處理器 215 匯流排系統92226 (Revised). ptc Page 26 1312448, ___ Case No. 91135512_^年月V?日______ Simple description of the drawing [Simple description of the drawing] If you refer to the above description and cooperate with the drawings, BRIEF DESCRIPTION OF THE DRAWINGS In the drawings, the same reference numerals identify similar elements, and the drawings are: FIG. 1 conceptually illustrates a portion of a particular embodiment of a production process constructed and operated in accordance with the present invention; Figure 2 is a conceptual partial block diagram of selected portions of the hardware and software architecture of the computer device of Figure 1, and Figure 3 is a second production process constructed and operated in accordance with the present invention. A block diagram that is conceptualized as a conceptual description of the scheduling medium, the processing medium, and the controller medium. The present invention is susceptible to various modifications and alternative forms, which are shown in the form of a particular embodiment of the invention, and the invention is described in the specific embodiments disclosed herein. The present invention, which is defined by the scope of the patent application of the present invention, will cover the spirit and falsification, equivalents, and substitutions that are not invented. All t in the dry circumference [Main component symbol description] 1 05 Process station 1 1 5 Process tool 125 Network 135 Wafer 21 0 Storage unit 240 Monitor 100, 300 Production process 110 Computer device 120 Communication link 13 0 Batch 205 Processor 215 bus system
1312448 案號 91135512 修正 圖式簡單說明 245 鍵盤 255 使用者介面軟 265 軟體媒介 310 批次排程媒介 330 機器排程媒介 350 控制器媒介 2 5 0 滑鼠 體 2 6 0 使用者介面 2 7 0 製造執行系統 3 2 0 批次製程媒介 3 4 0 機器製程媒介 3 6 0 資料儲存單元1312448 Case No. 91135512 Correct Description of the Drawings 245 Keyboard 255 User Interface Soft 265 Software Media 310 Batch Schedule Media 330 Machine Schedule Media 350 Controller Media 2 5 0 Mouse Body 2 6 0 User Interface 2 7 0 Manufacturing Execution system 3 2 0 Batch process media 3 4 0 Machine process media 3 6 0 Data storage unit
92226(修正本).ptc 第28頁92226 (Revised).ptc第28页
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US8032348B2 (en) | 2003-09-30 | 2011-10-04 | Tokyo Electron Limited | System and method for using first-principles simulation to facilitate a semiconductor manufacturing process |
US8014991B2 (en) | 2003-09-30 | 2011-09-06 | Tokyo Electron Limited | System and method for using first-principles simulation to characterize a semiconductor manufacturing process |
US8073667B2 (en) | 2003-09-30 | 2011-12-06 | Tokyo Electron Limited | System and method for using first-principles simulation to control a semiconductor manufacturing process |
US8296687B2 (en) | 2003-09-30 | 2012-10-23 | Tokyo Electron Limited | System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool |
US8036869B2 (en) | 2003-09-30 | 2011-10-11 | Tokyo Electron Limited | System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model |
US7542880B2 (en) * | 2006-04-06 | 2009-06-02 | Advanced Micro Devices, Inc. | Time weighted moving average filter |
DE102007014970B3 (en) * | 2007-03-28 | 2008-07-31 | Siemens Ag | Process e.g. medical treatment, configuration method, involves configuring process step, where process includes parallel running process steps, and configuration of process steps determines sequence of process steps |
DE102008035258A1 (en) * | 2008-07-29 | 2010-03-25 | Siemens Aktiengesellschaft | Method for testing data consistency of technical system, involves testing data consistency of control parameters marked by part of tag groups based on preset validation rules for providing test results |
DE102011109388A1 (en) * | 2011-08-04 | 2013-02-07 | Heidelberger Druckmaschinen Aktiengesellschaft | Automatic press improvement |
US9383739B2 (en) * | 2012-02-21 | 2016-07-05 | Applied Materials, Inc. | Enhanced re-hosting capability for legacy hardware and software |
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DE102019218623A1 (en) * | 2019-11-29 | 2021-06-02 | Sms Group Gmbh | Control system for an industrial plant, in particular for a plant for the production or processing of metallic strips or sheets, and method for controlling an industrial plant, in particular a plant for the production or processing of metallic strips or sheets |
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JP3002776B1 (en) * | 1998-07-16 | 2000-01-24 | 横河電機株式会社 | Production system and processing apparatus selection method in production system |
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JP2000158297A (en) * | 1998-12-01 | 2000-06-13 | Dainippon Screen Mfg Co Ltd | Job management system, job management method, and record medium |
US6485990B1 (en) * | 2000-01-04 | 2002-11-26 | Advanced Micro Devices, Inc. | Feed-forward control of an etch processing tool |
JP2001338856A (en) * | 2000-05-30 | 2001-12-07 | Tokyo Seimitsu Co Ltd | Process controller for semiconductor manufacturing system |
US6694275B1 (en) * | 2000-06-02 | 2004-02-17 | Timbre Technologies, Inc. | Profiler business model |
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