1304868 七、指定代表圖： (一） 本案指定代表圖為： (二) 本代表圖之元件符號 10 —化學原料筒 11—第一管路 12--第二管路 13——第三管路 2 0--儲存器 (二）圖。 單說明： 2 1--排放管 3 0--幫浦 4 0--生產加工設備 5 0 廢液筒 1 5 接頭處1304868 VII. Designated representative map: (1) The representative representative of the case is as follows: (2) Component symbol 10 of the representative figure - chemical raw material cylinder 11 - first pipeline 12 - second pipeline 13 - third pipeline 2 0--Storage (2) map. Single explanation: 2 1--discharge pipe 3 0--helper 4 0--production and processing equipment 5 0 waste cylinder 1 5 joint
八、 本案若有化學式時，請揭示最能顯示發明特徵的化學式： 九、 發明說明： 【發明所屬之技術領域】 本發明係有關一種化學原料供應系統，尤針對系統當中 的化學原料筒上方接頭處，以及化學原料相關輸送管路之配 φ 置型態加以改良，藉以達到降低化學原料成本、廢料回收費 用以及環境危害之目的。 【先前技術】 在半導體積體電路或TH-LCD製程當中，一般多會透過 曝光顯影及蝕刻之流程進行相關電路之建構，其中光阻劑即 為曝光顯影之主要原料，其原理主要係在晶圓或玻璃基板上 之一絕緣體層或導電金屬層上均勻覆蓋或塗敷一種包括聚 合物樹脂，感光化合物與溶劑所組成之光阻劑（光阻組合 1304868 物）。 阻劑覆蓋或塗敷的晶圓或破璃基板經過加溫烘 ^吏浴•發之後，選擇性曝露於某些型式之糾如紫外 射線，曝露___#_ u基板《影產生所__，顯影之基板再以 脱除絕緣體層或導電金屬層，並移去餘㈣光阻劑層以 70成微小圖案移轉於晶圓或玻璃基板表面上。 為能滿足生產加工設備塗佈光阻劑之自動化作業需 ==相關觀迴路將光阻劑輸送至生產加工設備 Θ所不’ f用的光阻雜送迴路主要係在用以成 個弟一官路11以及-個第二管路12,利用第 氣體(例如氮氣)供應源聯結，利用第二 社。」〜2〇、幫浦30以及生產加工設備40聯 、衣口 在化學原制始供應㈣置作㈣，係彻惰 當中的化學原料推送進八第二管路12，並 且在财及排放管21之作用下，使第二管路^内 =的工c排出，待第二f路i 2完全充滿光阻劑（化學原料） 2即可在幫浦3〇或惰性氣體之作用下將光阻劑推送至生 產加工料4 0處’其幫浦3㈣依照實際力η作業的需 1304868 :被叹疋在既疋的時間或某一個加工步驟自動旦 的光阻輯其他化學原料，以排出幫浦内.：里 所排放的光阻劑，“、、、而， ]、'二由％浦前端的排放口直接茂放廢液筒^ :奢料處理’不但造成光阻劑(化學原料)之浪費 且徒增廢液之處理費用。 、而 【發明内容】8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: IX. Description of the invention: [Technical field of the invention] The present invention relates to a chemical raw material supply system, especially to the upper joint of the chemical raw material cylinder in the system At the same time, as well as the φ setting of the chemical raw material-related conveying pipeline, the purpose of reducing the chemical raw material cost, the waste recycling cost and the environmental hazard is improved. [Prior Art] In the semiconductor integrated circuit or TH-LCD process, the construction of related circuits is generally carried out through the process of exposure development and etching. Among them, the photoresist is the main raw material for exposure and development, and the principle is mainly in the crystal. A photoresist layer (photoresist combination 1304868) comprising a polymer resin, a photosensitive compound and a solvent is uniformly covered or coated on one of the insulator layer or the conductive metal layer on the circular or glass substrate. After the photoresist coated or coated wafer or the glass substrate is heated and baked, the surface is selectively exposed to certain types of ultraviolet rays, and the ___#_ u substrate is exposed. The developed substrate is then stripped of the insulator layer or the conductive metal layer, and the remaining (four) photoresist layer is removed and transferred to the surface of the wafer or glass substrate in a fine pattern of 70%. In order to meet the automation of coating and photoresist processing in production and processing equipment, it is necessary to use the relevant photoresist to transport the photoresist to the production and processing equipment. The photoresist loop is mainly used to become a brother. The official road 11 and the second conduit 12 are connected by a supply of a second gas (for example, nitrogen), and the second conduit is utilized. 〜2〇, 助浦30, and production and processing equipment 40, the garment opening is supplied in the chemical raw system (4) (4), the chemical raw materials in the inertia are pushed into the eighth second pipeline 12, and in the fiscal and discharge pipes Under the action of 21, the work c in the second pipe ^ is discharged, and the second f road i 2 is completely filled with the photoresist (chemical material) 2, and the light can be lighted by the pump 3 or the inert gas. The resist is pushed to the production and processing materials at 40 locations. [The pump 3 (four) according to the actual force η operation needs 1304868: is sighed at the time of the squatting or a certain processing step automatically refractory other chemical materials to discharge the help Pu Nei: The photoresist that is discharged from the inside, ",,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Waste and increase the disposal cost of waste liquid.
;此本务明即針對化學原料筒上方接頭處的構造， 以及化學原料相關輸送管路之配置狀態加以改良，整個回收 糸統基本μ由—麵難一雜财、-讀存哭^ 及一個幫浦所整合構成;其中，原料筒係為呈密閉狀；，透 過一個第-管路與惰性氣體供應源聯結，透過—個第二 連接至儲存器、幫浦以及生產加工設備處。 S 其中’化學原料筒上方接頭處係另外透過—個第三管路 聯結至幫叙排放σ;於常態運作時，係透過幫浦或惰性氣 體將化學原料推送至生產加卫設備處，制達需排放氣泡設 定狀態時，可透過㈣即時將化學㈣經由第三管路回送到 化學原料筒，㈣將化學補时錢，細達到降低化學 原料成本、廢料回收費用以及環境危害之目的。 l3〇4868 【實施方式】 為能使貴審杏禾《 * 兹配合圖·楚本發明之組成，以及實施方式， 應系「化學原料即時回收系統」，旨針對化學原料供 關輪送^路之化學原料筒上方接頭處構造，以及化學原料相 為廢液的化學=型態加以改良，即時將原本要直接排放成 >本、廢料回^'回收使用’’藉以達到降低化學原料成 、用以及環境危害之目的。 如第二圖所_ 的化學相〜不’I個系統基本上係在用以盛裝化學原料 及-個第21◦上方接頭幻5設有-個第-管路“以 氮氣）供應 彻㈠路11與惰性氣體（例如 3 0以及生^1用第二管路1 2與儲存器2。、幫浦 係另外設有^設備切聯結，·再者，化學原料筒10處 同樣的，在二Γ13聯結至幫浦30之排放口。 體將化學顧Q'/始供應的前置作業時，可利用惰性氣 管路12，並且在化學娜送㈣二 12内部的空氣排出，待之作用下，使第-官路 :。—二=:: 當幫浦3 Q在既定的時 時，即可透過幫浦3 0即時將:周4工步驟而需排放氣泡 字化予原料經由第三管路13回送到化 1304868 ^原料筒1 Ο，即時將化學原料回收使用，俾達到降低化學 本、廢料回收費用以及環境危害之目的。 成 在具體實麵，可糊_絲三料13飢學顧 =接頭處15聯結或與幫浦3 ◦聯結的其中—端（或兩端 ，細係可以手動闕門，以讓使用者操控心 機’·當然’細柯叫，由細 控化學原额权日細；甚缝 :路知 2❹㈣性Α體啟動之時·，朗操控化學騎回送之目 如上所述’本發明提供一較佳可行之化 =崎糊增；,_增魏侧式2 係本佳魏财，並相關_明，以，舉凡 明置、特徵等近似、雷同者，均應屬本發明之創設二 及申凊專利範圍之内。 【圖式簡單說明】 第-圖係為習用化學原料供應迴路圖。 第二圖係為本發明之化學原料供應迴路圖 1304868 【主要元件符號說明】 10 --化學原料筒 11 第一管路 12 第二管路 13——第三管路 2 0--儲存器 2 1--排放管 3 0 ――幫浦 4 0——生產加工設備 5 〇—廢液 15--接頭處This task is to improve the structure of the joint above the chemical raw material cylinder and the configuration state of the chemical raw material related conveying pipeline. The whole recycling system is basically composed of - the surface is difficult to be miscellaneous, - read and cry ^ and one The pump is integrated; wherein the raw material cylinder is sealed; it is connected to the inert gas supply through a first conduit, and through a second connection to the storage, pump and production processing equipment. S where 'the joint above the chemical raw material tube is connected to the third pipeline to the discharge σ; in the normal operation, the chemical raw material is pushed to the production and maintenance equipment through the pump or inert gas. When the bubble setting state is required, the chemical (4) can be immediately sent back to the chemical raw material cylinder through the third pipeline through (4), and the chemical replenishment time can be reduced to reduce the chemical raw material cost, the waste recycling cost and the environmental hazard. L3〇4868 [Embodiment] In order to enable the composition of the Apricot and the implementation of the invention, it should be the "chemical raw material instant recovery system", which is intended for the supply of chemical raw materials. The structure of the joint above the chemical raw material cylinder and the chemical type of the chemical raw material phase are improved, and the original chemical material is directly discharged into the > the waste, the waste is recycled, and the chemical raw material is reduced. Use and the purpose of environmental hazards. As shown in the second figure, the chemical phase ~ not 'I system is basically used to hold the chemical raw materials and - a 21st ◦ above the joint magic 5 set - a first - pipeline "with nitrogen" supply (a) road 11 with inert gas (for example, 30 and raw ^1 with the second line 1 2 and the reservoir 2., the pump is additionally equipped with ^ equipment cut-and-connect, · Again, the chemical raw material tube 10 is the same, in the second Γ13 is connected to the discharge port of the pump 30. When the front-loading operation of the chemical supply Q'/ is started, the inert gas line 12 can be used, and the air inside the chemical delivery (four) two 12 is discharged. Make the first - official road: - two =:: When the pump 3 Q is at the set time, you can use the pump 3 0 to immediately: the week 4 work steps need to discharge the bubble to the raw material through the third pipeline 13 back to the chemical 1304868 ^ raw material barrel 1 Ο, the chemical raw materials are recycled for use, to achieve the purpose of reducing chemical, waste recycling costs and environmental hazards. In the specific real, can be paste _ silk three materials 13 hunger school = The joint at the joint 15 or the end of the pump 3 ◦ (or both ends, the fine system can be manually slammed for use) Control the heart machine '·Of course' fine Ke called, by the fine control of the chemical original amount of the day fine; even seam: Lu Zhi 2 ❹ (four) sexual 启动 body start time, Lang control chemical riding back to the above as described above 'the present invention provides a comparison Good viability = sloppy increase;, _ Zeng Wei side 2 is the best of Wei Cai, and related _ Ming, to, where the Ming, the characteristics and similar approximation, the same, should be the creation of the invention and the application凊 范围 。 。 【 简单 简单 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 -- -- 11 First line 12 Second line 13 - Third line 2 0--Storage 2 1--Discharge tube 3 0 - Pump 4 0 - Production and processing equipment 5 〇 - Waste liquid 15 - Joint
十、申請專利範圍： 1 種化學原料即時回收系統，係包括有： 一 2化學㈣筒’相盛裝化學補及設有接頭處；一個第 s路’自化學原料筒接頭處聯結至惰性氣體供應源； 個第一官路’自化學原料筒接頭處聯結至幫浦及生產加工 設備處； 個第二官路，聯結於幫浦排放口與化學原料筒接頭處之 間。 、如請求項1所述之化學原料即時回收系統，其中該第三 管路在其與幫浦聯結的一端設有閥門。 3、 如请求項1所述之化學原料即時回收系統，其中該第三 &路在其與化學原料筒接頭處聯結的一端設有閥門。 4、 如晴求項1所述之化學原料即時回收系統，其中該第三 管路在其與幫浦以及化學原料筒接頭處聯結的兩端設有閥 門。 5、 如請求項2、3或4所述之化學原料即時回收系統，其 中該閥門為手動閥門。X. Patent application scope: 1 instant recovery system for chemical raw materials, including: 1 2 chemical (four) cylinder 'phase containing chemical supplement and joints; one s road 'connected from chemical raw material joints to inert gas supply Source; The first official road 'connected from the chemical material tube joint to the pump and production and processing equipment; a second official road, connected between the pump discharge port and the chemical material tube joint. The instant material recovery system of claim 1, wherein the third conduit is provided with a valve at one end of the junction with the pump. 3. The chemical material instant recovery system of claim 1, wherein the third & road is provided with a valve at one end thereof that is coupled to the chemical material cartridge joint. 4. The instant material recovery system of claim 1, wherein the third conduit is provided with a valve at both ends of the joint with the pump and the chemical material cartridge joint. 5. An instant material recovery system as claimed in claim 2, 3 or 4 wherein the valve is a manual valve.