TWI298340B - Manufacturing method of an optical film - Google Patents

Manufacturing method of an optical film Download PDF

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TWI298340B
TWI298340B TW94126401A TW94126401A TWI298340B TW I298340 B TWI298340 B TW I298340B TW 94126401 A TW94126401 A TW 94126401A TW 94126401 A TW94126401 A TW 94126401A TW I298340 B TWI298340 B TW I298340B
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optical film
producing
pmma
film according
coating
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TW94126401A
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TW200706588A (en
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Kuang Rong Lee
Tan Ching Wang
Yu Hwey Chuang
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Optimax Tech Corp
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Description

1298340 九、發明說明: 【發明所屬之技術領域】 本發明與一種光學膜與混掺光學高分子以製備上述 光學膜之方法有關,特別是一種PMMA(Polymethyl Methacrylate)光學膜以及利用溶劑鑄膜技術以製備上述 PMMA光學膜之方法。 【先前技術】1298340 IX. Description of the Invention: [Technical Field] The present invention relates to an optical film and a mixed optical polymer for the preparation of the above optical film, in particular to a PMMA (Polymethyl Methacrylate) optical film and a solvent casting film technique A method of preparing the above PMMA optical film. [Prior Art]

傳統光學膜之基材一般是以三醋酸纖維(TAC : triacetate)、PC(polycarbonate)、COP 為主。而典型的 TAC 膜又可進一步作為光學膜之保護與支撐膜,所以一般的 TAC膜除了必須達到所要求的光學性質外,也必須具有一 定的強度且具有耐高溫以及耐潮濕之特性以達到光學膜 之使用需求或是提供保護TAC膜所構成之光學膜的效果 (參考下述專利:JP4342202,TW499573,JP2000-324055, JP2001-235625, JP2003-195048, EP 1-285742, EP 1-331245)。另外,美國第6,652,926B1號專利中揭露加入 0·04%〜0.3%的矽土粒子(silica particle)於 TAC 中,其一方 面增加了 TAC膜的韌性,另一方面亦使得TAC的膜厚降 低0 再者,有關於基板或是保護膜的產生,已揭示於美國 公告第2004/ 0086721A1號專利中,其揭露以20〜40%之 PVDF(聚偏二氟乙烯)、40〜60% 之 PMMA(Polymethyl Methacrylate)以及 5〜18%之 acrylic elastomer(聚丙稀彈性 體)以熔融混摻的方式製成基板或是保護膜。歐洲第 1298340 EPl 154005A1號專利揭露以PET膜中混摻小於5微米(um) 的微粒子以達到介於20〜600奈米(nm)中心粗度之PET薄 膜。此外,日本特開平7-56017號專利中提到’以 PC80%+PMMA(Kuraray C-16) 20%鑄成 80 微米(um)的薄 膜,以及 PMMA(MMA97%+BA3%)材料 75%混摻 25% PEA 所鑄成之500微米(um)薄膜。The substrate of the conventional optical film is generally based on triacetate (TAC: triacetate), PC (polycarbonate), and COP. The typical TAC film can be further used as a protective and supporting film for the optical film. Therefore, in addition to the required optical properties, the general TAC film must have a certain strength and have high temperature resistance and moisture resistance to achieve optical. The use of the film is required to provide an effect of protecting the optical film composed of the TAC film (refer to the following patents: JP4342202, TW499573, JP2000-324055, JP2001-235625, JP2003-195048, EP 1-285742, EP 1-331245). In addition, U.S. Patent No. 6,652,926 B1 discloses the addition of 0.04% to 0.3% of silica particles in TAC, which increases the toughness of the TAC film on the one hand and decreases the film thickness of TAC on the other hand. Further, the production of a substrate or a protective film is disclosed in U.S. Patent Publication No. 2004/0086721 A1, which discloses a PVDF (polyvinylidene fluoride) of 20 to 40% and a PMMA of 40 to 60%. (Polymethyl Methacrylate) and 5 to 18% of acrylic elastomer (polypropylene elastomer) are melt-blended to form a substrate or a protective film. European Patent No. 1298340 EPl 154005 A1 discloses a PET film having a fineness of less than 5 micrometers (um) in a PET film to achieve a center thickness of 20 to 600 nanometers (nm). In addition, Japanese Patent Laid-Open No. Hei 7-56017 mentions that a film of 80% (um) is molded by PC80%+PMMA (Kuraray C-16) 20%, and 75% of PMMA (MMA97%+BA3%) material is mixed. A 500 micron (um) film cast with 25% PEA.

上述習知技術之缺點包括:TAC薄膜之吸水及透濕性 大’因此當於高溫、高濕度條件下使用時,會因外在環境 導致薄膜變形或產生應力而造成光學膜之光學特性受到 影響’甚至造成光學膜無法使用。並且TAC之b值過高, 在外觀上即可看出,容易造成視覺上之阻礙。另外,COP 薄膜(如Zeonor、Arton)之吸水及透濕性過小,附著性質 差’並且具有材料太脆的問題。歐洲第EP1154005A1號 專利中之微粒子雖可以降低表面粗度,但其所使用pET 之玻璃轉移溫度低(75。〇,無法符合現有光學膜的耐熱性 要求。日本特開平7_56〇17號專利中提到的PMMa/pc混 摻之材料性質太脆,並且PMMA/PEA混摻之材料厚度高 達500微米(um),相對於現有光學膜,其適用性皆不足鑒 於上述之缺點,並且為了避免因融熔掺混或熱塑性加工造 成之材料不安定現象,並且改善光學膜之耐熱性、耐濕性 妓及機械性質,而有效解決光學膜穩定性問題,本發明提 /、了可以解決上述缺點之光學膜及其製作方法。 【發明内容】 P M lut發明之目的在於揭露一種利用溶劑鑄膜技術语 之光學膜及其製作方法,PMMA可溶於不具肩 1298340 的溶劑如甲苯等之中,其可避免TAC製程中大量使用二 氯曱烷所可能對人體及環境造成的傷害。 本發明之再一目的在於提供一種具適中之吸水及透 濕性並可有效解決光學膜光學性質變異之問題。Disadvantages of the above-mentioned prior art include: the TAC film has a large water absorption and moisture permeability. Therefore, when used under high temperature and high humidity conditions, the optical properties of the optical film are affected due to deformation or stress generated by the external environment. 'Also caused the optical film to be unusable. And the value of b of TAC is too high, it can be seen in appearance, it is easy to cause visual obstacles. In addition, COP films (e.g., Zeonor, Arton) have too little water absorption and moisture permeability, poor adhesion properties, and have a problem that the materials are too brittle. Although the fine particles in the European Patent No. EP1154005A1 can reduce the surface roughness, the glass transition temperature of the pET used is low (75. 〇, which cannot meet the heat resistance requirements of the existing optical film. Japanese Patent Laid-Open No. 7_56〇17 The material of the PMMA/PC blended material is too brittle, and the PMMA/PEA blended material has a thickness of up to 500 micrometers (um). Compared with the existing optical film, the applicability is insufficient in view of the above disadvantages, and in order to avoid melting The invention is capable of solving the above-mentioned shortcomings by improving the heat resistance, moisture resistance and mechanical properties of the optical film by melt blending or thermoplastic processing, and effectively solving the problem of stability of the optical film. The invention relates to an optical film using a solvent cast film technology and a manufacturing method thereof, and the PMMA is soluble in a solvent such as toluene which does not have a shoulder 1298340, which can be avoided. A further use of dichloromethane in the TAC process may cause harm to the human body and the environment. A further object of the present invention is to provide a moderate suction Water and moisture permeability can effectively solve the problem of optical properties of optical films.

本發明之又一目的在於提供一種耐熱性佳、機械性質 適中、低光彈性係數且具備良好光學性質,例如:低霧度、 低黃化指數、高阿貝數、在可見光範圍(波長4〇〇〜700奈 米)具有高的穿透度(>90%)以及具有均勻膜面性質(如厚 度、表面粗糙度等)之光學膜,以及避免因融熔掺混或熱 塑性加工造成之材料不安定現象。 本發明揭露之光學膜,包含:至少一種PMMA、被 取代官能基之PMMA或PMMA混摻;以及,溶劑,上述 PMMA、被取代官能基之PMMA或PMMA混摻可依所需 性質以任意比例均勻混合在上述溶劑中以形成一混合溶 液,上述混合溶液包括20〜40%重量百分比的PMMA經 過熱處理後形成光學膜。 上述官能基為曱基,而上述被取代官能基之PMMA 包括以乙基、丙基、異丙基、正丁基、異丁基、新丁基、 正已基、異已基、環己基等官能基取代曱基之PMMA。 上述混摻包括至少一種高分子、小分子、可塑劑 (plasticizer)、UV吸收劑、抗降解劑或奈米級粒子混摻。 上述溶劑包括至少一種芳香族、環烷類、醚類、酯類或酮 類。上述芳香族包括甲苯,鄰-、間-或對-二曱苯 (Xylene),環烷類包括環己烷(Cyclohexane),醚類包括 二乙基醚(Diehtyl Ether)、四氫呋喃(Tetrahydrofuran ·· 7Still another object of the present invention is to provide a heat resistance, moderate mechanical properties, low photoelastic coefficient, and good optical properties such as low haze, low yellowing index, high Abbe number, and visible light range (wavelength 4 〇). 〇~700 nm) optical film with high penetration (>90%) and uniform film properties (such as thickness, surface roughness, etc.), and materials due to melt blending or thermoplastic processing Unstable phenomenon. The optical film disclosed in the present invention comprises: at least one PMMA, a PMMA or a PMMA blended with a substituted functional group; and a solvent, the PMMA, the PMMA or the PMMA blended with the substituted functional group can be uniformly distributed in an arbitrary ratio according to a desired property. The mixture is mixed in the above solvent to form a mixed solution comprising 20 to 40% by weight of PMMA after heat treatment to form an optical film. The above functional group is a fluorenyl group, and the PMMA of the above substituted functional group includes ethyl, propyl, isopropyl, n-butyl, isobutyl, neobutyl, n-hexyl, isohexyl, cyclohexyl, etc. The functional group replaces the PMMA of the thiol group. The above blending includes at least one polymer, small molecule, plasticizer, UV absorber, antidegradant or nanoparticle blending. The above solvent includes at least one aromatic, naphthenic, etheric, ester or ketone. The above aromatics include toluene, o-, m- or p-nonylene (Xylene), cycloalkanes include cyclohexane, and ethers include diethyl ether (Diehtyl Ether) and tetrahydrofuran (Tetrahydrofuran · 7

1298340 THF ),g旨類包括乙酸曱醋(Methyl acetate、Ethyl acetate ),酮類包括丙酮(Acetone )、曱基乙基酮 (methylethylketone : MEK ) 、 1-曱基環戊酮 (l-methylpyrrolidone:NMP)。上述光學膜之厚度介於 20〜200微米(μπι)之間;並且光學膜可應用於LCD、LED、 OLED或PLED之光學膜基材或光學膜保護膜。 本發明揭露之光學膜之製作方法,包含:將至少一種 PMMA、被取代官能基之PMMA或PMMA混摻與一溶劑 混合,以形成一均勻的混合溶液;將上述混合溶液均勻分 佈在一基板上;以及,進行一熱處理,以獲得均勻表面之 光學膜。 上述混合溶液係利用一溶劑鑄膜之方式而均勻分佈 在上述基板上。上述溶劑鑄膜之方式包括刮刀塗佈、纏線 棒塗佈、逆或同向式滾筒塗佈、氣簾式(air curtain)塗佈、 輪式塗佈、雕筒塗佈、浸沾式塗佈、旋轉塗佈、狹缝式塗 佈、擠壓式塗佈或淋幕式塗佈。上述基板包括玻璃基板、 塑膠基板、鏡面鋼板、鏡面鋼帶或表面均勻性良好之合成 高分子。上述合成高分子PET(polyethyleneterephthalate)、 PEN(polyethylenenaphthalate)、PES(polyethersulfone)、 Pl(polyimide)、PAR(polyarylate)、PC(polycarbonate)、或 天然纖維如 CA(cellulose acid)、DAC(cellulose diacetate)、 TAC(cellulose triacetate)等。上述混合溶液均勻分佈在上 述基板上之厚度為150微米(μηι)〜1200(μιη)微米。上述熱 處理係利用UV光照射均勻分佈在上述基板上之混合溶 液0 8 1298340 本發明之光學膜之製作方法更包括塗上盤狀液晶等 材料於上述光學膜之上,並經由滾筒磨擦或uv曝光等方 式進行配向,而得到具有位相差之位相差光學膜。1298340 THF ), g is intended to include Methyl acetate, Ethyl acetate, and ketones include acetone (Acetone), methylethylketone (MEK), 1-methylpyrrolidone (l-methylpyrrolidone: NMP). The thickness of the above optical film is between 20 and 200 micrometers (μm); and the optical film can be applied to an optical film substrate or an optical film protective film of an LCD, an LED, an OLED or a PLED. The method for fabricating an optical film according to the present invention comprises: mixing at least one PMMA, a substituted functional group of PMMA or PMMA with a solvent to form a uniform mixed solution; and uniformly distributing the mixed solution on a substrate. And, a heat treatment is performed to obtain an optical film having a uniform surface. The mixed solution is uniformly distributed on the substrate by a solvent cast film. The above solvent casting method includes blade coating, wire bar coating, reverse or co-roll coating, air curtain coating, wheel coating, engraving coating, dip coating , spin coating, slit coating, extrusion coating or curtain coating. The substrate includes a glass substrate, a plastic substrate, a mirror steel plate, a mirror steel strip, or a synthetic polymer having a good surface uniformity. The above synthetic polymer PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PES (polyethersulfone), Pl (polyimide), PAR (polyarylate), PC (polycarbonate), or natural fibers such as CA (cellulose acid), DAC (cellulose diacetate), TAC (cellulose triacetate) and the like. The mixed solution is uniformly distributed on the substrate to have a thickness of 150 μm to 1200 μm. The heat treatment is a mixed solution uniformly distributed on the substrate by UV light. The method for producing the optical film of the present invention further comprises coating a material such as a discotic liquid crystal on the optical film and exposing it via a roller or uv. The alignment is carried out in the same manner to obtain a phase difference optical film having a phase difference.

另外,本發明之光學膜中,可進一步添加由PMMA 及/或被取代官能基之PMMA及/或PMMA混摻中包覆一 橡膠彈性材質所形成之PMMA橡膠粒子,其中該橡膠彈 性材質係可選擇丙晞酸丁醋(butyl acrylate)及/或聚α-氯代 丙烯酸甲g旨PMMA Poly(methyl methacrylate)及/或苯乙烯 (styrene),且該橡膠彈性材質之粒徑尺寸係小於丨〇微米甚 至可進一步為奈米尺度,以增進光學膜之機械性質。 【實施方式】 在此,本發明將詳細地敘述一些實施例。然而,值得 注意的是除了這些明確之敘述外,本發明可以實施在一廣 泛範圍之其它實施例中,並且本發明之範圍不受限於上述 實施例,其當視後述之專利申請範圍而定。 本發明揭露之光學膜,包含··至少一種pMMA、被 取代官能基之PMMA或PMMA混摻;以及上述PMMA ' 被取代官能基之PMMA或PMMA混摻可依所需性質以任 意比例均勻混合在上述溶劑中,上述混合溶液經過熱處理 後形成光學膜之基材。 請參考第1圖,其係顯示本發明之光學膜之製作流程 (flowchart)。本發明之光學膜之製作方法,首先,於步驟 101中選擇PMMA高分子及溶劑,亦即選擇一種或兩種 以上之PMMA或經過化學/物理方法改質之pMMA,依所 9 1298340Further, in the optical film of the present invention, PMMA rubber particles formed by coating a rubber elastic material with PMMA and/or PMMA substituted with a functional group may be further added, wherein the rubber elastic material may be Select butyl acrylate and/or poly-α-chloro acrylate to PMMA Poly (methyl methacrylate) and/or styrene, and the rubber elastic material has a particle size smaller than 丨〇 The micron can even be further nanometer scale to enhance the mechanical properties of the optical film. [Embodiment] Herein, the present invention will be described in detail with some embodiments. However, it is to be understood that the invention may be embodied in a wide variety of other embodiments, and the scope of the invention is not limited to the embodiments described above. . The optical film disclosed in the present invention comprises: at least one pMMA, a PMMA or a PMMA blended with a substituted functional group; and the PMMA or PMMA blended with the above substituted PMMA' can be uniformly mixed in an arbitrary ratio according to a desired property. In the above solvent, the mixed solution is subjected to heat treatment to form a substrate of an optical film. Please refer to Fig. 1, which shows a flow chart of the optical film of the present invention. In the method for producing the optical film of the present invention, first, in step 101, a PMMA polymer and a solvent are selected, that is, one or two or more types of PMMA or a chemically/physically modified pMMA are selected, according to the number 9 1298340

需性質以任意比例均勻溶在溶劑中。舉例而言,上述化學 方法包括利用官能基取代之PMMA,例如:以乙基、丙 基、異丙基、正丁基、異丁基、新丁基、正已基、異已基、 環己基等官能基取代甲基。舉例而言,上述物理方法包括 PMMA混摻,上述混摻包括至少一種高分子、小分子、 可塑劑(plasticizer)、UV吸收劑、抗降解劑或奈米級粒子 混摻。舉一實施例而言,上述溶劑包括至少一種芳香族、 環烧類、醚類、酯類、酮類或其混合物。舉例而言,上述 芳香族包括甲苯,鄰-、間-或對-二甲苯(Xylene),環烧 類包括環己烷(Cyclohexane),醚類包括二乙基醚(Diehtyl Ether)、四氫11 夫喃(Tetrahydrofuran : THF ),酯類包括乙 酸甲酯(Methyl acetate、Ethyl acetate ),酮類包括丙酮 (Acetone)、甲基乙基酮(methylethylketone: MEK)、1-曱基環戊酮(l-methylpyrrolidone:NMP)。上述之溶劑選擇 只是一實施例,並非用以限定本發明。 上述奈米微粒子之粒徑最好不要大於100奈米,較佳 的狀況是小於80奈米,最好是小於50奈米。 舉一實施例而言,本發明提出四組溶劑鑄膜技術製備 PMMA光學膜之配方、組成和溶劑,如下所述: 1、Degussa 8N 100 part、Toluene 200 part; 2 > Degussa 8N 97.5 part, Kuraray GR00100 2.5 part, Acetone 200part ; 3、Degussa 8N 80part、Degussa zk5BR 2.5 part,Methyl acetate 200part; 1298340 4、Degussa 8N 50 part, Kuraray GR049402.5 part, Toluene200part。 接下來,進行步驟102,上述所選擇之PMMA高分 子及溶劑,透過一溶劑混摻技術形成一溶液系統,並進行 測試。其測試結果請參考第2圖。另外,第3圖顯示PMMA 加入少量矽土(silica)後,PMMA膜之各種物理或化學性 質’其中silica之含量可為0.5%至15%。The properties are required to be uniformly dissolved in the solvent in any ratio. For example, the above chemical methods include PMMA substituted with a functional group, for example, ethyl, propyl, isopropyl, n-butyl, isobutyl, neobutyl, n-hexyl, isohexyl, cyclohexyl The isofunctional group replaces the methyl group. For example, the above physical methods include PMMA blending, and the blending includes at least one polymer, small molecule, plasticizer, UV absorber, antidegradant or nanoparticle blending. In one embodiment, the above solvent comprises at least one of an aromatic, a cyclamate, an ether, an ester, a ketone, or a mixture thereof. For example, the above aromatics include toluene, o-, m- or p-xylene (Xylene), cyclohexanes include cyclohexane, ethers include diethyl ether (Diehtyl Ether), tetrahydrogen 11 Tetrahydrofuran (THF), esters include methyl acetate (Ethyl acetate), and ketones include acetone (Acetone), methyl ethylketone (MEK), 1-mercaptocyclopentanone (l -methylpyrrolidone: NMP). The above solvent selection is only an example and is not intended to limit the invention. The particle size of the above-mentioned nanoparticle particles is preferably not more than 100 nm, preferably less than 80 nm, preferably less than 50 nm. By way of an embodiment, the present invention proposes a four-part solvent cast film technique for preparing a formulation, composition and solvent of a PMMA optical film, as follows: 1. Degussa 8N 100 part, Toluene 200 part; 2 > Degussa 8N 97.5 part, Kuraray GR00100 2.5 part, Acetone 200part; 3, Degussa 8N 80part, Degussa zk5BR 2.5 part, Methyl acetate 200part; 1298340 4. Degussa 8N 50 part, Kuraray GR049402.5 part, Toluene200part. Next, in step 102, the selected PMMA polymer and the solvent are formed into a solution system by a solvent mixing technique and tested. Please refer to Figure 2 for the test results. In addition, Figure 3 shows that the various physical or chemical properties of the PMMA film after PMMA is added to a small amount of silica can be from 0.5% to 15%.

前述之Kuraray GR系列係可以選擇GR04940、 GR04970、GR00100、GR01240、GR01270、GR1000H24、 GR1000H42 以及 GR1000H60,且也可以用 Degussa 之 zk3BR、zk4BR、zk5BR、zk6BR、zk4HC、zk5HC、k6HC、 zk5HT、zk6HT、zkHF、zk6HF、zk20、zk30、zk40 以及 zk50中的任一材料所取代。較佳的情形下,溶液中之 PMMA之固含量係介於20〜40%之間。然後,進行步驟 103,將上述溶液以溶劑鑄膜的方式,將混合溶液均勻分 佈在一基板上。舉例而言,上述基板包括但不限定於玻璃 基板、塑膠基板、鏡面鋼板、鏡面鋼帶或表面均勻性良好 之合成’合成T^^^^i:PET(polyethyleneterephthalate)、 PEN(polyethyleneeenaphthalate)、PES(polyethersulfone)、 Pl(polyimide)、PAR(polyarylate)、PC(polycarbonate)、或 天然纖維如 CA(cellulose acid)、DAC(cellulose diacetate)、 TAC(cellulose triacetate)等。在步驟i〇3中,本發明利用 刮刀塗佈混合溶液於玻璃基板之上,舉例而言,括刀之間 隙(Gap)包含但不限定於550微米(μιη)、650微米(μιη)、400 微米(μηι)。另外,上述溶劑鑄膜的方式包含但不限定於纏 πThe aforementioned Kuraray GR series can select GR04940, GR04970, GR00100, GR01240, GR01270, GR1000H24, GR1000H42 and GR1000H60, and can also use Degussa's zk3BR, zk4BR, zk5BR, zk6BR, zk4HC, zk5HC, k6HC, zk5HT, zk6HT, zkHF, Substituting any of zk6HF, zk20, zk30, zk40, and zk50. Preferably, the solids content of PMMA in the solution is between 20 and 40%. Then, in step 103, the solution is uniformly distributed on a substrate by solvent casting. For example, the substrate includes, but is not limited to, a glass substrate, a plastic substrate, a mirror steel plate, a mirror steel strip, or a composite having a good surface uniformity. Synthesis T^^^^i: PET (polyethylene terephthalate), PEN (polyethyleneeenaphthalate), PES (polyethersulfone), Pl (polyimide), PAR (polyarylate), PC (polycarbonate), or natural fiber such as CA (cellulose acid), DAC (cellulose diacetate), TAC (cellulose triacetate) and the like. In the step i3, the present invention coats the mixed solution on the glass substrate by using a doctor blade. For example, the gap (Gap) of the knife includes, but is not limited to, 550 micrometers, 650 micrometers, and 400. Micron (μηι). In addition, the manner of the above solvent cast film includes, but is not limited to, entanglement π

1298340 線棒塗佈、逆或同向式滾筒塗佈、 故 ±.,,.. 乳嚴式(air curtain)塗 佈、輪式塗佈'雕筒塗佈、浸沾式塗 -V ^ Γ-, 靛轉塗佈、狹縫 式塗佈、漏毅佈或科—佈;从 學薄膜的方式皆可以利用。 7成句勻 前述之溶劑鑄膜的方式中,除了各種塗佈方法外,亦 可透過鏡面模具之壓出成型或射出成型,以製成光學膜。 塗佈後所形成之含有溶劑之薄膜稱為濕膜,濕膜之厚 又可以視需求之不同而定。較佳的情形下,上述濕膜之厚 度可為150微米_)〜1200微米(㈣。之後進行步驟 1〇4 ’在此步财透過烘箱㈣段式或連續式升溫(例如: 利用UV光照射)的方式’將前述方法製得膜乾燥。 較佳的情形下,上述乾燥至溶劑殘留量不大於1%之階 段’即可以形成具良好光學性質及均勻膜面的光學膜(相 對於濕膜,稱為乾臈)。其中上述光學臈之厚度可以由溶 劑所占比例與加熱時間以及溫度來控制。並且上述乾膜經 由表面化學處理,可以增進溶液中之分散性。其目的在於 增進所形成的膜之耐熱程度,且不影響乾膜之光學均勻 性。 本發明利用一階段式升溫方式進行乾燥,例如··將上 述ΡΜΜΑ光學膜之配方、組成中溶劑加熱至9(rc,並劇 烈攪拌。於此溫度下攪拌一小時,待粒子完全溶解後移去 加熱源並維持攪拌至室溫,接著,以35微米(um)紗網過 慮後靜置一段時間。此混合液傾倒於玻璃基板上,以550 微米(μιη)間隙的括刀刮除多餘的塗怖液。然後,置於烘箱 中靜置10分鐘後,加熱至80°C並維持2〇分鐘,以每次 12 1298340 昇溫20°C並維持20分鐘的階段方式增溫,直至16〇它, 並維持30分鐘。最後,再加熱至18〇〇c並維持2小時。 結果,得到的膜其溶劑殘餘01%,而膜厚為94微米(叫^), 並進行光學測試和機械強度測試,其中··光學測試可為穿 透度、Haze、b值等,機械強度可為延展率(%)、抗拉強 度(MPa)、拉伸模數(1^1^)等。再者,上述之pMMA薄膜 亦可經由加熱延伸,塗上盤狀液晶等材料,並經由滾筒磨 擦或UV曝光等方式進行配向,以得到具有位相差之位相 差膜p 另外’利用上述方法所製得之光學薄膜(乾膜),由於 具有良好之光學性質,例如:低霧度、低黃化指數、於可 見光範圍(波長400〜700奈米)具有高的光線穿透度(>9〇%) 以及高阿貝數(即低的波長依存性),因此可以直接應用為 光學膜基材或光學_護膜。換言之,本發社功能性光 學薄膜’可以應用於光電平面顯示$,例如LCD、㈣、 OLED或PLED之上。 本發明之利用溶劑鑄膜技術混掺PMMA所製備之光 學膜具有許多優點:1·耐熱性佳、機械性質適中、低光彈 =係數且具備良好光學性f,例如:低霧度、低黃化指數、 南阿貝數、在可見光範圍(波長4〇〇〜7〇〇奈米)具有高的穿 透度(>90%)以及具有均勻膜面性質(如厚度、表面粗操度 等)之光學膜;2·可以避免因融熔掺混或熱塑性加工造成之 材料不安定現象;3·適巾之吸水及透祕並可有效解決光 學膜光學性質變異之問題;4•製程簡易。 前述本發明之光學膜中,可進一步添加由PMMA及/ 1298340 或被取代官能基之PMMA及/或PMMA混摻中包覆一橡膠 彈性材質所形成之PMMA橡膠粒子,其中該橡膠彈性材 質係可選擇丙烯酸丁酯(butyl acrylate)及/或聚α-氣代丙烯 酸甲酯 PMMA P〇ly(methyl methacrylate)及 / 或苯乙稀 (styrene),且該橡膠彈性材質之粒徑尺寸係小於i 〇微米甚 至可進一步為奈米尺度。另外,該PMMA橡膠粒子的添 加量係2·5〜50%。並因此可增進光學膜之機械性質,包括 提升延伸性等性質。1298340 Bar coating, reverse or co-roller coating, so ±.,,.. air curtain coating, wheel coating 'carving coating, dip coating-V ^ Γ -, 靛 transfer coating, slit coating, leaking cloth or ke- cloth; the method of learning film can be used. In the manner of the above-mentioned solvent cast film, in addition to various coating methods, it can also be formed by extrusion molding or injection molding of a mirror mold to form an optical film. The film containing the solvent formed after coating is called a wet film, and the thickness of the wet film can be determined depending on the needs. Preferably, the thickness of the wet film may be from 150 micrometers to 1200 micrometers ((4). Then step 1〇4' is performed in this step through the oven (four) segment or continuous temperature rise (for example: irradiation with UV light) The method of 'drying the film by the above method. In the preferred case, the drying to the stage where the residual amount of the solvent is not more than 1%' can form an optical film having good optical properties and a uniform film surface (relative to the wet film) The thickness of the optical enthalpy can be controlled by the proportion of the solvent and the heating time and temperature, and the dry film can be improved in the solution by surface chemical treatment. The purpose is to enhance the formation. The degree of heat resistance of the film does not affect the optical uniformity of the dry film. The present invention utilizes a one-stage heating method for drying, for example, heating the solvent in the formulation and composition of the above-mentioned enamel optical film to 9 (rc, and vigorously stirring Stir at this temperature for one hour, after the particles are completely dissolved, remove the heat source and maintain stirring to room temperature, then let stand for 35 um (um) gauze and let stand for a while. The mixture was poured onto a glass substrate, and the excess coating liquid was scraped off with a 550 μm gap. Then, it was placed in an oven for 10 minutes, heated to 80 ° C and maintained for 2 minutes. , warm up every 12 1298340 by 20 ° C and maintain 20 minutes, until 16 〇 it, and maintain for 30 minutes. Finally, heat to 18 〇〇 c and maintain for 2 hours. As a result, the obtained film The solvent residue is 01%, and the film thickness is 94 microns (called ^), and optical test and mechanical strength test are performed. Among them, the optical test can be penetration, Haze, b value, etc., and the mechanical strength can be the elongation rate (%) ), tensile strength (MPa), tensile modulus (1^1^), etc. Further, the above pMMA film may be extended by heating, coated with a disk-like liquid crystal or the like, and subjected to roller rubbing or UV exposure, etc. The alignment is performed to obtain a phase difference film p having a phase difference. In addition, the optical film (dry film) obtained by the above method has good optical properties such as low haze, low yellowness index, and visible light. Range (wavelength 400~700 nm) with high light penetration Degree (>9〇%) and high Abbe number (ie low wavelength dependence), so it can be directly applied as an optical film substrate or an optical film. In other words, the functional optical film of the present invention can be applied. The photoelectric plane displays $, for example, above LCD, (4), OLED or PLED. The optical film prepared by mixing PMMA with solvent casting film technology of the invention has many advantages: 1. good heat resistance, moderate mechanical properties, low photoelasticity = Coefficient with good optical properties f, for example: low haze, low yellowing index, South Abbe number, high penetration in the visible range (wavelength 4〇〇~7〇〇N) (>90% ) and optical film with uniform film surface properties (such as thickness, surface roughness, etc.); 2) can avoid material instability caused by melt blending or thermoplastic processing; 3 · water absorption and transparency of the towel Can effectively solve the problem of optical film optical properties variation; 4 • Easy process. In the optical film of the present invention, PMMA rubber particles formed by coating a rubber elastic material with PMMA and/or 1298340 or a substituted functional group of PMMA and/or PMMA may be further added, wherein the rubber elastic material may be Select butyl acrylate and/or polymethyl α methacrylate PMMA P〇ly (methyl methacrylate) and/or styrene, and the rubber elastic material has a particle size smaller than i 〇 Micron can even be further nanometer scale. Further, the amount of the PMMA rubber particles added is 2·5 to 50%. Therefore, the mechanical properties of the optical film can be enhanced, including properties such as improved elongation.

前述本發明之光學膜中,可在進一步添加矽土 (silica),且矽土可在光學膜製程中加入,而比較方便的方In the optical film of the present invention, silica may be further added, and the alumina may be added in the optical film process, and the convenient side is convenient.

式係將前述之溶劑與矽土先行混合,再進行後續的PMMAThe solvent and the alumina are mixed first, followed by the subsequent PMMA.

混掺程序。另外,關於矽土加入的程序,也可以在PMMA 粒子混掺程序中,將矽土與pMMA 一起加入。再者,也 可在PMMA混掺程序後,再行混入前述之矽土。而前述 添加之矽土佔光學膜的重量百分比可為Q5 %的較 佳範圍。 · ^本發明以較佳實施例說明如上,然其並非用以限定本 ^ &月所主張之專利權利範圍。其專利保護範圍當視後附之 二請專利範圍及其㈣領域而定。凡熟悉此領域之技藝 ’在不脫離本專利精神或範圍内,所作之更動或潤飾, 座2於本發明所揭不精神下所完成之_效改變或設計,且 應包含在下述之申請專利範圍内。 【圖式簡單說明】 藉由參考下列詳細敘述,上述觀點以及本發明之優點 14 1298340 將可以更快地了解,並且藉由下面的描述以及附加圖示, 可以容易了解本發明之精神。其中: 第1圖所示為顯示本發明之光學膜製作流程圖; 第2圖所示為顯示本發明之PMMA測試結果圖表; 第3圖所示為顯示本發明之PMMA膜加入矽土之測試結 果特性圖表。Mixing procedure. In addition, for the addition of alumina, it is also possible to add alumina together with pMMA in the PMMA particle blending procedure. Furthermore, it is also possible to mix the above-mentioned alumina after the PMMA mixing process. The weight percentage of the added alumina to the optical film may be a preferred range of Q5 %. The invention is described above by way of a preferred embodiment, and is not intended to limit the scope of patent rights claimed herein. The scope of patent protection shall depend on the scope of the patents attached to the second and the scope of (4). Any modification or design made by the skill of the art in the field without departing from the spirit or scope of the patent, and the invention shall be included in the following patent application. Within the scope. BRIEF DESCRIPTION OF THE DRAWINGS The above discussion, as well as the advantages of the present invention, will be readily understood by reference to the following detailed description. 1 is a flow chart showing the production of the optical film of the present invention; FIG. 2 is a graph showing the PMMA test result of the present invention; and FIG. 3 is a view showing the test of adding the PMMA film of the present invention to bauxite. Result chart.

【主要元件符號說明】 步驟101 選擇PMMA高分子及溶劑 步驟102 以溶劑摻混技術形成一溶液系統並進行安定性測試 步驟103 刮刀塗佈製膜 步驟104 烘膜[Explanation of main component symbols] Step 101 Select PMMA polymer and solvent Step 102 Form a solution system by solvent blending technique and carry out stability test Step 103 Scraper coating film formation Step 104 Film drying

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Claims (1)

1298340 十、申請專利範圍: 公告本1 1、 一種光學膜之製作方法,包括: 將至少選擇一種PMMA、被取代官能基之PMMA以及前 述各種PMMA混摻中的任一材質; 混掺與一溶劑混合,以形成一混合溶液; 將該混合溶液分佈在一基板上;以及 進行一熱處理,以形成光學膜。 ^ 2、如申請專利範圍第1項之光學膜之製作方法,其中 PMMA、被取代官能基之PMMA以及PMMA混摻中的任 一材質係以20至40%的重量百分比混摻該溶劑。 3、 如申請專利範圍第1項之光學膜之製作方法,其中該熱處 理包括以下步驟: 將該混合溶液加熱至一第一溫度,並於該第一溫度下進行 攪拌,直至該混合溶液中的粒子完全溶解; φ 將該混合溶液傾倒於一玻璃基板上,並將該玻璃基板上的 該混合溶液烘乾,以形成光學膜。 4、 如申請專利範圍第3項之光學膜之製作方法,其中該溶劑 殘留量小於1%。 5、 如申請專利範圍第1項之光學膜之製作方法,其中該官能 基為甲基。 6、 如申請專利範圍第5項之光學膜之製作方法,其中該被取 代官能基之PMMA係選擇以乙基、丙基、異丙基、正丁 16 1298340 基、異丁基、新丁基、正已基、異已基、環己基以及數種 前述的官能基取代PMMA之甲基。 7 、如申請專利範圍第1項之光學膜之製作方法,其中該溶劑 係選自於甲苯、丙酮以及乙酸甲酯中的任一溶劑。 8、如申請專利範圍第1項之光學膜之製作方法,其中該混摻 係選擇高分子、小分子、可塑劑(plasticizer)、uv吸收劑、 抗降解劑以及奈米級粒子混摻中的任一型態。 • 9、如申請專利範圍第8項之光學膜之製作方法,其中該奈米 級粒子之粒徑小於100奈米。 ,1G、如、t請ί利範圍第1項之光學膜之製作方法,其中該溶劑 係避擇芳香族、環烷類、醚類、酯類以及酮類中的任一 -劑。 / U、 12、 二==第"項之光學膜之製作方法 其中該環 13、 14、 如申請專概圍第H)項之絲膜之製作方法 類係選擇二乙基醚以及四氫呋喃中的任—醚類如申凊專利範圍第1〇項之光學膜之製作 類係選擇乙酸甲酯以及乙酸乙酯中的任—酯類 ’其中該醚 〇’其中該酯 如申請專利範圍第10項之光學膜之 類係選擇丙酮、甲基乙基酮以及 / ’其中該酮酉同類。 τ丞1衣戊_中的任一 17 15、 1298340 16、 如申請專利範圍第10項之光學膜之製作方法,其中該光 學膜之厚度介於20〜200微米(μηι)之間。 17、 如申請專利範圍第1項之光學膜之製作方法,其中該光學 膜係選擇應用於LCD、LED、OLED或PLED之光學膜基 材以及光學膜之保護膜。 18、如申請專利範圍第1項之光學膜之製作方法,其中該混合 溶液係利用一溶劑摻混技術所形成。 φ 19、如申請專利範圍第1項之光學膜之製作方法,其中該混合 溶液係利用一溶劑鑄膜之方式而分佈在該基板上。 20、如申請專利範圍第19項之光學膜之製作方法,其中該溶 劑鑄膜之方式係選擇刮刀塗佈、、纏線棒塗佈、逆或同向 式滾筒塗佈、氣簾式塗佈、輪式塗佈、雕筒塗佈、浸沾式 塗佈、旋轉塗佈、狹縫式塗佈、擠壓式塗佈、淋幕式塗佈、 壓出成型以及射出成型中的任一方式。 21 22 如申請專利範圍第β之光學膜之製作方法,其中該基板 係=玻璃基板、塑膠基板、鏡面鋼板、鏡面鋼帶以及表 面均句性良好之合成高分子中的任-材質。 如申清專利範圍第21j苜夕止级, 員之先學膜之製作方法,其中該合 成咼分子係選擇PET、PFN ητ rbN、PES、PI、PAR、PC、以及 天然纖維中的任一材暂 L'i » TAn ^ 貝’且該天然纖維係選擇CA、DAC 以及TAC中的任一材質。 如申請專利範圍第1 溶液分佈在該基板上 米0 項之光學膜之製作方法,其中該混合 之尽度為150微米(μπι)〜ΐ2〇〇(μηι)微 18 23 1298340 24、 如申請專利範圍第1項之光學膜之製作方法,更包括塗上 盤狀液晶等材料於該光學膜之上,並選擇經由滾筒磨擦以 及UV曝光中的任一方式進行配向,而得到具有位相差之 位相差光學膜。 25、 如申請專利範圍第1項之光學膜之製作方法,其中該熱處 理係利用UV光照射該基板上之該混合溶液。 26、 如申請專利範圍第1項之光學膜之製作方法,其中進一步 添加選擇PMMA、被取代官能基之PMMA以及各種 # PMMA混摻中的任一材質包覆一橡膠彈性材質所形成之 粒子。 ^ 27、如申請專利範圍第26項之光學膜之製作方法,其中該橡 膠彈性材質係選擇丙烯酸丁酯、聚α-氯代丙烯酸甲酯 # PMMA Poly、苯乙烯以及前述數種橡膠彈性材質之混合 物。 28、 如申請專利範圍第26項之光學膜之製作方法,其中該橡 膠彈性材質之粒徑尺寸係小於10微米。 # 29、 如申請專利範圍第26項之光學膜之製作方法,其中該橡 膠彈性材質之粒徑尺寸係小於100奈米。 30、 如申請專利範圍第26項之光學膜之製作方法,其中以 2.5〜50%的添加量,選擇PMMA、被取代官能基之PMMA 以及各種PMMA混摻中的任一材質包覆該橡膠彈性材 質。 31、 如申請專利範圍第1項之光學膜之製作方法,其中進一步 於製程中添加矽土,其中該矽土為二氧化矽。 19 1298340 32、 如申請專利範圍第31項之光學膜之製作方法,其中矽土 之添加量係選擇佔光學膜重量百分比的0.5%至15%中的 任一比例。 33、 如申請專利範圍第32項之光學膜之製作方法,其中添加 之矽土係與溶劑先行混合,以提供後續的PMMA混掺程 序使用。 34、 如申請專利範圍第32項之光學膜之製作方法,其中添加 之矽土係在PMMA粒子混掺程序中,與PMMA —起加入 I 溶劑。 35、 如申請專利範圍第32項之光學膜之製作方法,其中添加 .之矽土係在PMMA混掺程序後,再行混入。 201298340 X. Patent Application Range: Announcement 1 1. An optical film manufacturing method comprising: selecting at least one PMMA, a substituted functional group of PMMA, and any of the foregoing various PMMA blends; mixing and a solvent Mixing to form a mixed solution; distributing the mixed solution on a substrate; and performing a heat treatment to form an optical film. 2. The method of producing an optical film according to the first aspect of the invention, wherein any one of PMMA, a substituted functional group of PMMA, and a PMMA blend is blended with 20 to 40% by weight. 3. The method of producing an optical film according to claim 1, wherein the heat treatment comprises the steps of: heating the mixed solution to a first temperature, and stirring at the first temperature until the mixed solution The particles are completely dissolved; φ The mixed solution is poured onto a glass substrate, and the mixed solution on the glass substrate is dried to form an optical film. 4. The method for producing an optical film according to item 3 of the patent application, wherein the residual amount of the solvent is less than 1%. 5. The method of producing an optical film according to claim 1, wherein the functional group is a methyl group. 6. The method for producing an optical film according to claim 5, wherein the PMMA substituted with a functional group is selected from the group consisting of ethyl, propyl, isopropyl, n-butyl 16 1298340, isobutyl, and neobutyl. The n-hexyl group, the isohexyl group, the cyclohexyl group, and several of the aforementioned functional groups replace the methyl group of PMMA. 7. The method of producing an optical film according to claim 1, wherein the solvent is selected from any one of toluene, acetone, and methyl acetate. 8. The method for producing an optical film according to claim 1, wherein the blending system selects a polymer, a small molecule, a plasticizer, a uv absorber, an antidegradant, and a nanoparticle blend. Any type. 9. The method for producing an optical film according to item 8 of the patent application, wherein the nano-sized particles have a particle diameter of less than 100 nm. In the method of producing an optical film according to Item 1, wherein the solvent is selected from any one of an aromatic, a naphthene, an ether, an ester, and a ketone. / U, 12, two == the first " item of optical film manufacturing method wherein the ring 13, 14, such as the application of the general line H) of the silk film manufacturing method is selected from diethyl ether and tetrahydrofuran The ether-type of the optical film of the first aspect of the invention is selected from the group consisting of methyl acetate and any ester in ethyl acetate, wherein the ether is the same as the ester of the patent. The optical film of the item is selected from the group consisting of acetone, methyl ethyl ketone and / 'where the ketone oxime is the same. A method of producing an optical film according to claim 10, wherein the thickness of the optical film is between 20 and 200 μm. 17. The method for producing an optical film according to claim 1, wherein the optical film is selected for use as an optical film substrate for an LCD, an LED, an OLED or a PLED, and a protective film for an optical film. 18. The method of producing an optical film according to claim 1, wherein the mixed solution is formed by a solvent blending technique. Φ 19. The method for producing an optical film according to the first aspect of the invention, wherein the mixed solution is distributed on the substrate by means of a solvent cast film. 20. The method for producing an optical film according to claim 19, wherein the solvent casting method is selected from the group consisting of blade coating, wire bar coating, reverse or co-roll coating, air curtain coating, Any of wheel coating, engraving coating, dip coating, spin coating, slit coating, extrusion coating, curtain coating, extrusion molding, and injection molding. 21 22 The method for producing an optical film according to Patent Application No. β, wherein the substrate is a glass substrate, a plastic substrate, a mirror steel plate, a mirror steel strip, and a material of a synthetic polymer having a good uniformity. For example, in the 21st 苜 苜 专利 , , , , , , , , 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员 员'i » TAn ^ Bay' and the natural fiber system is selected from any of CA, DAC and TAC. For example, the method for preparing an optical film in which the first solution of the patent range is distributed on the substrate, wherein the mixing degree is 150 micrometers (μπι)~ΐ2〇〇(μηι) micro 18 23 1298340 24, as claimed The method for fabricating the optical film of the first aspect, further comprising coating a material such as a discotic liquid crystal on the optical film, and selecting to perform alignment by any one of roller rubbing and UV exposure, thereby obtaining a position having a phase difference. Phase difference optical film. 25. The method of producing an optical film according to claim 1, wherein the heat treatment irradiates the mixed solution on the substrate with UV light. 26. The method for producing an optical film according to claim 1, wherein a particle formed by coating a rubber elastic material with any one of PMMA, PMMA substituted with a functional group, and various #PMMA blends is further added. [27] The method for producing an optical film according to claim 26, wherein the rubber elastic material is selected from the group consisting of butyl acrylate, poly-α-chloromethyl acrylate #PMMA Poly, styrene, and the foregoing rubber elastic materials. mixture. 28. The method of producing an optical film according to claim 26, wherein the rubber elastic material has a particle size of less than 10 micrometers. #29. The method for producing an optical film according to claim 26, wherein the rubber elastic material has a particle size of less than 100 nm. 30. The method for producing an optical film according to claim 26, wherein the rubber elasticity is coated with any one of PMMA, PMMA substituted with functional group, and various PMMA blends in an amount of 2.5 to 50%. Material. 31. The method for producing an optical film according to claim 1, wherein the alumina is further added to the process, wherein the alumina is cerium oxide. The method for producing an optical film according to claim 31, wherein the amount of alumina added is selected from any one of 0.5% to 15% by weight of the optical film. 33. The method for producing an optical film according to claim 32, wherein the added alumina system is mixed with the solvent to provide a subsequent PMMA mixing process. 34. The method for producing an optical film according to claim 32, wherein the added alumina is added to the PMMA particle mixing process, and the I solvent is added together with the PMMA. 35. The method for producing an optical film according to item 32 of the patent application, wherein the added earth is mixed in the PMMA mixing process. 20
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