TWI296423B - Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these - Google Patents

Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these Download PDF

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Publication number
TWI296423B
TWI296423B TW91118274A TW91118274A TWI296423B TW I296423 B TWI296423 B TW I296423B TW 91118274 A TW91118274 A TW 91118274A TW 91118274 A TW91118274 A TW 91118274A TW I296423 B TWI296423 B TW I296423B
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cleaning
layer
sheet
porous
wafer
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TW91118274A
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Chinese (zh)
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Makoto Namikawa
Yoshio Terada
Nukaga Jirou
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Nitto Denko Corp
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

12964231296423

五、發明說明(1) &lt;技術領域〉 本發明係關於用於清潔各種基板處理裝置之片材,具有 清潔功能之運送元件,及利用其等清潔基板處理裝置^方 法。更特定言之,本發明係關於清潔用片材,具有清潔功 能之運送元件,及用於應防止顆粒接近之基板處理裝置, 諸如,比方說,用於製造或檢查半導體、平面顯示器、印 刷佈線板、或其類似物之裝置的清潔方法。 &lt;發明之背景〉 在各種基板處理裝置中,輪送基板,同時使其與各輸送 系統物理接觸。在被輸送之基板或輸送系統上有顆粒黏著 的情況中,接下來的基板會一個接一個地受到污染。因此 需定期停止及清潔裝置。因此,會有清潔操作導致降低時 間效率且需要甚多人工的問題。為消除此等問題,已有人 提出一種經由輸送黏合有感壓黏著物質之基板,而將黏附 至基板處理裝置内部之顆粒移除的技術(例如,日本公開 專利案第154686/1998號:)及一種經由輸送板狀元件而移除 勘附至基板背面之顆粒的技術(曰本公開專利案第87458/ 1 9 99 號)。 經由輸送黏合有感壓黏著物質之基板,而將黏著至基板 處理裝置内部之顆粒移除之技術係消除前述問題的有效方 法。然而,此技術有感壓黏著物質會太過頑強地黏著至裝 置之接觸部分,而無法與其分離的可能。換言之,此技術 有無法成功輪送基板或損壞輸送裝置的可能。此問題於具 有使用真空固定機構之夾台的裝置中尤其嚴重。5. Description of the Invention (1) <Technical Field> The present invention relates to a sheet for cleaning various substrate processing apparatuses, a conveying member having a cleaning function, and a cleaning substrate processing apparatus using the same. More particularly, the present invention relates to a cleaning sheet, a conveying member having a cleaning function, and a substrate processing apparatus for preventing particle access, such as, for example, for manufacturing or inspecting a semiconductor, a flat display, and a printed wiring. A method of cleaning a device of a board, or the like. &lt;Background of the Invention&gt; In various substrate processing apparatuses, a substrate is rotated while being physically in contact with each transport system. In the case where particles are adhered to the substrate or transport system being transported, the subsequent substrates are contaminated one by one. Therefore, it is necessary to stop and clean the device regularly. Therefore, there is a problem that the cleaning operation leads to a reduction in the time efficiency and requires a lot of labor. In order to eliminate such problems, a technique of removing particles adhering to the inside of a substrate processing apparatus by transporting a substrate to which a pressure-sensitive adhesive substance is bonded has been proposed (for example, Japanese Laid-Open Patent Publication No. 154686/1998: A technique for removing particles attached to the back surface of a substrate by transporting a plate-like member (Japanese Laid-Open Patent Publication No. 87458/19 99). The technique of removing particles adhering to the inside of the substrate processing apparatus by transporting the substrate to which the pressure-sensitive adhesive substance is bonded is an effective method for eliminating the aforementioned problems. However, this technique has the possibility that the pressure-sensitive adhesive substance will adhere too strongly to the contact portion of the device and cannot be separated therefrom. In other words, this technology has the potential to fail to successfully transport the substrate or damage the conveyor. This problem is particularly acute in devices having a clamping station that uses a vacuum securing mechanism.

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1296423 五、發明說明(2) 在將感壓黏著物貪使用作為清潔層的情況中,一般以經 塗布剝離劑(諸如聚矽氧)之剝離薄膜來保護感壓黏著物質 之表面。然而,前述之技術有剝離劑之成份會遷移/轉移 至清潔層之表面,及經遷移之剝離劑成份會污染輸送裝置 之基板接觸部分的問題。 此外’經由輸送板狀元件而移除顆粒之技術有雖然可在 未產生任何麻煩下進行輸送,但灰塵移除能力差的問題, 此點相當重要。 鑑於此等情勢,本發明之目標為提供清潔用片材及具有 清潔功能之運迗几件,其各自可成功地輸送至基板處理裝 置内’且可利用其在未失敗下容易地將黏著至裝置内部^ 顆粒移除。 〈發明之揭示内容〉 本發明人進行密集的研究,以完成目標。結果,經發 當輸送具有清潔層之片材或黏合有片材之運送元件,^ 如,基板,以將黏附至基板處理裝置内部之顆粒移除時 則使用具有孔隙度之片材(多孔片材)作為清潔層可有效h 容易地將顆粒成功分離及移除,而不會產生前述的任j i 題。本發明因此而完成。 j問 本發明係關於:一種清潔用片材,其包括一具有 之層(多孔層)作為清潔層(申請專利範圍第1項).一 ’&amp; 潔用片材,其包括一具有多孔層之片材,及形成於' 7 一面上之感壓黏著層(申請專利範圍第2項);一種产、★之 片材,其包括一基礎材料及一於基礎材料一 w用 叫上形成為1296423 V. INSTRUCTION DESCRIPTION (2) In the case where the pressure-sensitive adhesive is used as a cleaning layer, the surface of the pressure-sensitive adhesive is generally protected by a release film coated with a release agent such as polyfluorene. However, the foregoing techniques have the problem that the components of the release agent migrate/transfer to the surface of the cleaning layer, and the migrated release agent component can contaminate the substrate contact portion of the delivery device. Further, the technique of removing particles by conveying the plate-like member has a problem that the dust removal ability is poor, although it can be conveyed without any trouble, which is quite important. In view of such circumstances, it is an object of the present invention to provide a cleaning sheet and a cleaning member having a cleaning function, each of which can be successfully conveyed into a substrate processing apparatus and can be easily adhered to it without failure. Inside the device ^ Particle removal. <Disclosure of the Invention> The inventors conducted intensive research to accomplish the goal. As a result, when the sheet having the cleaning layer or the conveying member to which the sheet is bonded, such as the substrate, is used to remove the particles adhered to the inside of the substrate processing apparatus, the sheet having porosity (porous sheet) is used. As a cleaning layer, it is effective to easily separate and remove the particles without causing the aforementioned problems. The present invention has thus been completed. The invention relates to: a cleaning sheet comprising a layer (porous layer) as a cleaning layer (Patent No. 1 of the patent application). A '&amp; clean sheet comprising a porous layer a sheet, and a pressure-sensitive adhesive layer formed on one side of the '7' (application patent scope item 2); a sheet of production, ★, comprising a base material and a base material

C:\2D-CODE\91-10\91118274.ptd 1296423 五、發明說明(3) — 清潔j之多孔層(申請專利範圍第3項);一種清潔用 括一基礎材料、一於基礎材料之一面上形成為、、主 由夕孔層、及一形成於基礎材料之另-面上之感 者專利範圍第4項);此清潔用片材之特徵在於多 子匕曰貝貝上不具有黏性(申請專利範圍第5項);此清潔用 片材之車特徵在於多孔層係超高分子量聚乙烯之多孔薄膜 (申請專利範圍第6項);以及等等。 膜 〈實施發明之最佳方式〉 ^ =發明之清潔用片材中之清潔層(在下文中,清 :等;::二、材之本身、多層片材、層合至基礎材料之片 产士 、&gt;式)係一多孔性、且實質上不具有黏性之声。 产、、”發::經由使用經設計成多孔性且實質上無黏S性之 Z^ 用多孔清潔層成功捕捉及移除各種大小^ 粒丄同時可防止顆粒脫落,且不會產生輸送的麻須|的顯 毛月中之夕孔清潔層係如下較佳。雖^ ^ ^ ^ 限制,但較顆粒大小大之孔隙 會導致捕捉顆粒之效果的減低。舉例 = 自!至!〇微米之大小之情況中,使用具有小至二丄約 微未之平均孔隙直徑的多孔薄膜通 係約自30至95%較佳,尤其係約自4Q至_。-之孔隙度 /=V°237,經由將寬度1〇毫米之清潔層施用至 矽曰曰囫之鏡面’及測量180。剝離強度所測定 Γ下的 =強如 未下的黏性較佳。只要清潔層之剝離強度不高於此值, 1296423C:\2D-CODE\91-10\91118274.ptd 1296423 V. Description of invention (3) — Clean porous layer of j (Article 3 of the patent application); a basic material for cleaning, one for basic materials One side is formed as a main layer, and the first layer of the base material is formed on the other side of the base material. The cleaning sheet is characterized in that the sheet is not provided on the multi-shell shell. Viscosity (Patent No. 5 of the patent application); This cleaning sheet car is characterized by a porous film of a porous film of ultrahigh molecular weight polyethylene (Application No. 6); and the like. Membrane <Best Mode for Carrying Out the Invention> ^ = Cleaning layer in the cleaning sheet of the invention (hereinafter, clear: etc.;:: 2, the material itself, the multilayer sheet, the laminated to the base material) , &gt;) is a porous, and substantially non-viscous sound. Production, and "famous": through the use of a porous cleaning layer designed to be porous and substantially non-sticky, successfully capture and remove various sizes of granules while preventing particles from falling off and not transporting. The pore cleaning layer of the moth is the following. Although the ^ ^ ^ ^ limit, the pores larger than the particle size will result in a reduction in the effect of capturing the particles. Example = From! to ! In the case of size, it is preferred to use a porous film having an average pore diameter of from about 2 to about 25%, preferably from about 30 to 95%, especially from about 4Q to _-- porosity/=V°237, Applying a cleaning layer having a width of 1 mm to the mirror surface of the crucible' and measuring 180. The peel strength is determined to be stronger than the under-bonding viscosity as long as the peeling strength of the cleaning layer is not higher than this. Value, 1296423

則於本發明中可將此清潔層視為實質上無黏性 此清潔層之材料、構造等等並無特殊;;限制;只 ^ 2性好且實質上無黏性即可 '然而,由防止污染的觀點 末看,材料之例子包括各種塑膠材料,諸如聚乙烯、取.而 U賴、二聚胺基甲酸醋。雖然清潔層之厚度並無特 ,限制,但其一般係約自5至50 0微米,以自1〇至1〇 殊 較佳。 小 在本發明中,提供作為清 乙烯(通常具有500, 0 0 0或以 佳。此薄膜不僅具有高撓性 並且亦具有均勻的多孔結構 岔地接觸’並完全或部分進 有可如此成功捕捉顆粒的效 上不具黏性’因而當輸送此 運送元件時,其並不會頑強 言之’本發明有可提供成功 的效果。 層之多孔層係超高分子量聚 上之分子量)之多孔薄膜為特 及與鏡面相當的表面光滑度, 。因此,顆粒與清潔層高度緊 入至層之孔隙中。清潔用片材 果。此外,由於此清潔層實質 &gt;月W用片材或稍後即將說明之 地黏著至裝置之接觸部分。換 輸送之清潔用片材或其類似物 起向刀子置聚乙烯之多孔薄膜可使用商業產品,諸如, 比方况,Teinn Ltd·製造之商品名s〇lup〇r,或日 股份有限公司製造之商品名Sunmap。 冤工 希望將具有輕度黏性之可移除片材黏貼至清潔層之表 面:以保濩清潔層之表面。Λ會產生當將此可移 ::果了將可能存在於清潔層之表面上之不期望顆粒=In the present invention, the cleaning layer can be regarded as substantially non-adhesive. The material, structure and the like of the cleaning layer are not special;; limitation; only good and substantially non-viscous can be At the end of the point of view of prevention of contamination, examples of materials include various plastic materials such as polyethylene, and U. urethane diacetate. Although the thickness of the cleaning layer is not particularly limited, it is generally from about 5 to 50 μm, preferably from 1 to 1 Å. Small in the present invention, provided as clear ethylene (usually having 500,000 or better. This film not only has high flexibility but also has a uniform porous structure, and is in contact with it completely or partially. The particles are not viscous in effect. Therefore, when transporting the transporting member, it is not tough to say that 'the present invention has a successful effect. The porous layer of the layer is an ultrahigh molecular weight polymerized molecular weight) porous film is Special surface smoothness comparable to mirror surface. Therefore, the particles and the cleaning layer are highly tightly packed into the pores of the layer. Cleaning sheet. In addition, since the cleaning layer is substantially &gt;month W is adhered to the contact portion of the device with a sheet or as will be described later. A reversible cleaning sheet or the like can be used as a porous film for arranging polyethylene into a knife, and a commercial product such as, for example, a trade name manufactured by Teinn Ltd., s〇lup〇r, or a Japanese company can be used. The product name is Sunmap. Completion It is desirable to adhere a lightly viscous removable sheet to the surface of the cleaning layer: to protect the surface of the cleaning layer. Λ will produce undesired particles that may be present on the surface of the cleaning layer when this is removed.

12964231296423

本發明更提供:一種清潔用片#,其包括-具有多孔層 之片材,及形成於片材之一面上之感壓黏著層(申請專利 範圍第2項);一種清潔用片材,其包括一基礎材料及一於 f礎材料之一面上形成為清潔層之多孔層(申請專利範圍 苐3員),及種π &gt;糸用片材,其包括一基礎材料、一於基 礎材料之一面上形成為清潔層之多孔層、及一形成於基礎 材料之另一面上之感壓黏著層(申請專利範圍第4項)。此 感,黏著層之材料等等並無特殊之限制,Κ要其滿足感壓 ,著功能即彳。可使用一般的感壓黏著劑(例如,丙稀酸The present invention further provides a cleaning sheet # comprising: a sheet having a porous layer, and a pressure-sensitive adhesive layer formed on one side of the sheet (Patent No. 2); a cleaning sheet, The invention comprises a base material and a porous layer formed on the one surface of the base material as a clean layer (the patent application scope is 3), and a π &gt; sheet for use, which comprises a base material and a base material. A porous layer formed as a cleaning layer on one side, and a pressure-sensitive adhesive layer formed on the other side of the base material (Patent No. 4 of the patent application). There is no particular restriction on the feeling, the material of the adhesive layer, etc., and it is necessary to satisfy the pressure. A general pressure sensitive adhesive can be used (for example, acrylic acid)

系或橡膠基黏著劑或其類似物)。關於此感壓黏著層,亦 可使用雙面感壓黏著帶。 可將具有此種構造之清潔用片材透過感壓黏著層黏貼至 運送元件,諸如各種基板及帶材或片材,而得具有清潔功 能之運送元件(申請專利範圍第7項)。經由將此具有清潔 =能之運送X件輸送至裝置μ,並使其與待清潔之部分接 觸’則可清潔此部分(申請專利範圍第9項)。A rubber or rubber based adhesive or the like). For this pressure-sensitive adhesive layer, a double-sided pressure-sensitive adhesive tape can also be used. The cleaning sheet having such a configuration can be adhered to a transport member such as various substrates and strips or sheets through a pressure-sensitive adhesive layer to obtain a cleaning member having a cleaning function (Patent No. 7 of the patent application). This portion can be cleaned by transporting the transported X piece having the cleanness = energy to the device μ and bringing it into contact with the portion to be cleaned (Patent No. 9 of the patent application).

在要將運送元件,諸如基板,自感壓黏著層剝離,以再 利用基板之情況中,此感壓黏著層以具有約自〇 〇丨至丨〇 頓/10毫米,尤其係約自0.10至5牛頓/10毫米之以自矽 晶圓(鏡面)180。剝離之強度計之黏性較佳。此係由於只 3壓黏著層具有此-黏性,則運送元件不會在輸送過程 中剝離,且於清潔之後可容易地分離。 清潔用片材可為包含基礎材料 層。此基礎材料並無特殊之限制 且於其上形成之清潔 其例子包括塑膠諸如聚In the case where a transport member such as a substrate is to be peeled off from the pressure-sensitive adhesive layer to reuse the substrate, the pressure-sensitive adhesive layer has a thickness of from about 0.1 mm to about 10 mm, especially from about 0.10. 5 Newtons/10 mm of self-twisting wafer (mirror) 180. The strength of the peeling strength meter is better. Since the adhesive layer alone has this viscosity, the conveying member is not peeled off during conveyance and can be easily separated after cleaning. The cleaning sheet may be a layer comprising a base material. This base material is not particularly limited and is formed on the cleaning thereof. Examples include plastics such as poly

1296423 五、發明說明(6) =烯、聚(對苯二曱酸乙二酯)、乙醯基纖維素、聚碳酸 酯、聚丙烯、聚醯胺、聚醯亞胺、及聚碳二醯亞胺之薄 膜。其之厚度一般係約自1 〇至丨〇 〇微米。 清潔用片材所黏貼之運送元件並無特殊之限制。其例子 匕括半導體晶圓、平面顯示器諸如LC])及pDp用之美 光碟用之基板、MR磁頭、及其類似物。 土 本發明更提供:此具有清潔功能之運送元件, 於清潔用片材具有較運送元件小之形狀,且其不合自運: 疋件之邊緣突出(申請專利範圍第8項);及一種θ 中之清潔標籤片材。 使用於八 前述具有清潔功能之運送元件的製造方法並叙殃 制。在將清潔用片材黏貼至運送元件諸如,比3殊t限 板,以製造清潔用運送元件之情況中, 5兒,基 括:黏貼較運送元件大之清潔用片材,^的例子包 切割之方法(以下稱為直接切割法) f : ”外形 1元件之形狀之清潔用標鐵片材黏 =切割成運 送元件之方法(以下稱為預切割法二=以製造 在直接切割法中,有在片材切割過程中合=而,由於 :物產生切屑,並黏著至清潔用運送元;層或其類 L,切割法為較佳。在此預切割法之可能 匕私中之切屑的產生較在直接切割法中 ,片材切割 而’當所黏貼之清潔標籤片材到達運送元:J:制。然 之該部分的標藏片材可能會根據輸緣時,位 卡在運送元件Ε巾或卡在輸送路徑上 =之種類而 U此會有榡籤片材1296423 V. INSTRUCTIONS (6) = Alkene, poly(ethylene terephthalate), Ethylcellulose, Polycarbonate, Polypropylene, Polyamide, Polyimine, and Polycarbazide A film of imine. The thickness is generally from about 1 丨〇 to 丨〇 〇 micrometers. The conveying member to which the cleaning sheet is pasted is not particularly limited. Examples include semiconductor wafers, flat panel displays such as LC], and substrates for optical discs, MR heads, and the like. The present invention further provides that the cleaning element has a cleaning function, and the cleaning sheet has a smaller shape than the conveying member, and is not self-operating: the edge of the element protrudes (article 8 of the patent application); and a θ The cleaning label sheet. It is used in the manufacturing method of the aforementioned conveying member having a cleaning function and is described. In the case where the cleaning sheet is adhered to a transport member such as a three-dimensional limit plate to manufacture a cleaning transport member, the base member includes: a cleaning sheet that is larger than the transport member, and an example package Cutting method (hereinafter referred to as direct cutting method) f : "The shape of the element 1 is cleaned by the standard iron sheet; the method of cutting into a transporting element (hereinafter referred to as pre-cutting method 2 = manufactured in the direct cutting method) In the sheet cutting process, the cutting method is preferred because the material generates chips and adheres to the cleaning carrier; the layer or its type L. The dicing in the pre-cutting method may be smudged. Compared with the direct cutting method, the sheet is cut and 'when the attached cleaning label sheet reaches the transport element: J: system. However, the part of the label sheet may be in accordance with the edge of the transfer. The component wipes or the card is on the transport path = the type and the U will have the check sheet

C:\2D-CODE\91-l〇\9iii8274.ptd h ;i 第10頁 1296423 五、發明說明(7) 發生翹起或位移,而使得在最 能 性。 最槽的情況中無法輸送的可 因此,本發明之具有清潔功 用片材具有較運送元件小之 迗70件係其中之清潔 緣突出的元件較佳。在清潔用材^會自運送元件之邊 且自運送元件之邊緣突出的产 =迗兀件之形狀大, 出部分會卡在運送元件匣中 、曰,有清各用片材之突 材會發生翹起或位移,而使^ 二迗路徑上,且標籤片 可能性。較係在清潔用片材情況中無法輪送的 =,!可能產生清潔用狀的 丟i的私度並無特殊之限制。然而 · 看,希望清潔用片材小至多約由貝際的硯^來 片材尺寸會導致移除顆粒之右 月办用 要。 7 &lt;有效面積的減小,此點相當重 〈貫施例〉 t:明將基於實施例而說明於下不應將本發 ,文其所限制。下文中之所有份數係以重量計。 實施例1 八將自由75份丙烯酸2-乙基己酯、20份丙烯酸曱酯、及5 份丙烯酸所組成之單體混合物製得之1〇〇份丙烯酸系聚合 物(f 1平均分子量,7〇〇, 〇〇〇)與5〇份丙烯酸胺基曱酸酯 及3份二苯基甲烷二異氰酸酯均勻混合,而製備得一般的 感壓黏著劑溶液。 將此溶液在乾燥基準下以1 〇微米之厚度塗布至寬度2 5 〇C:\2D-CODE\91-l〇\9iii8274.ptd h ;i Page 10 1296423 V. INSTRUCTIONS (7) Springing or displacement occurs, making it the most efficient. In the case of the most groove, it is impossible to convey. Therefore, it is preferable that the cleaning functional sheet of the present invention has a smaller cleaning member than the conveying member. In the case where the cleaning material is from the side of the conveying member and protrudes from the edge of the conveying member, the shape of the product is large, and the portion is caught in the conveying member, and the protruding member of the sheet is formed. Lift up or shift, and make ^2 path on the path, and the label is likely. It is not possible to rotate in the case of cleaning sheets =,! There is no particular restriction on the privacy of the type of cleaning that may result in cleaning. However, it is hoped that the cleaning sheet will be as small as about 贝^. The sheet size will cause the right month to remove the particles. 7 &lt; Reduction of effective area, this point is quite heavy <Comprehensive Example> t: It will be explained based on the embodiment and should not be limited by the present invention. All parts below are by weight. Example 1 VIII An acrylic polymer obtained by freely mixing a monomer mixture of 75 parts of 2-ethylhexyl acrylate, 20 parts of decyl acrylate, and 5 parts of acrylic acid (f 1 average molecular weight, 7 〇〇, 〇〇〇) is uniformly mixed with 5 parts of acrylamide phthalate and 3 parts of diphenylmethane diisocyanate to prepare a general pressure-sensitive adhesive solution. Apply this solution to a width of 2 〇 microns on a dry basis to a width of 2 5 〇

C:\2D-C0DE\91.10\91118274.ptd 第11頁 1296423 五、發明說明(8) 毫米、厚度2 5微米、及孔隙直徑自0 · 0 5至2微米之超高分 子量聚乙烯之多孔薄膜(Solupor,Teijin Ltd·製造)之一 面,而形成一般的感壓黏著層。於其之表面上黏貼厚度38 微米之聚酯剝離薄膜。如此製得本發明之清潔用片材。 此清潔層之表面實質上不具有黏性。此清潔層之孔隙度 係自40至90%。清潔層係以1〇毫米之寬度黏貼至矽晶圓之 鏡面,且以自矽晶圓之1 8 〇。剝離強度計,根據j I ς z 〇 2 3 7 測篁其之黏性。結果,黏性為〇 · 〇 〇 〇 9牛頓(〇.丨克)/丨〇毫 米。如此可確保清潔層實質上不具有黏性。 此外,將形成於另一面上之感壓黏著層以丨〇毫米之寬度 施用至矽晶圓之鏡面,且以自矽晶圓之18〇。剝離強度 計,根據JIS Z0237測量其之黏性。結果,黏性為2·8 /1 0毫米。 將在此清潔用片材之一般感壓黏著層上之剝離薄 二,並利用手動輥將片材點貼至8英吁石夕晶圓之背、鏡 二。如此可製得具有清潔功能之供運送用之清潔晶圓 圓污染偵測器檢查兩新的8英叶⑽ ,之各者之鏡面之〇·2微米或以上 少曰曰 圓上之顆粒數為8,及第二晶 ' 、、,°果弟一晶 至個別的基板處理裝置,同時並保n將此等晶圓輸送 雷射污染偵測器檢查各晶圓之鏡面。、:::”然後利用 尺寸面積中計算得之第一曰η μ 〜果,於8央吋晶圓 二個上為27, 003。 日日 、顆粒數為27, 890,及第 第12頁 C:\2D-00DE\9M0\91118274.ptd h Λ 1296423 五、發明說明(9) 接著將以上製得之供 上之剝離薄膜剝^圓(1)之清潔層側 2了,890個黏附顆粒數,=清潔晶圓(1)輪送至具有產生 可輸送清潔晶圓⑴,而阳圓段的基板處理裝置中。結果, 微米或以上之# w 不會產生任何麻煩。其後輸送〇. 2 保持鏡面ί;黏:之新,英心晶固,同時並 以上之顆&amp; # =後利用雷射污染偵測器檢查0. 2微米或 粒結因果此 粒移除。 因此,可將在清潔之前黏附之85%數目的顆 达較實施你Μ 高:之方式製造清潔用片材,除了使用超 非多孔性薄膜。以與實施例&quot;目同方 :且有產才製得之運送用之清潔晶圓⑺輸送通 置:姓果,;:、!黏附顆粒數之晶圓段的基板處理敦 ΐ德':°ί,、'η'Λ清、潔晶圓(2),**會產生任何麻須。 二曰m=±钕米或以上之黏附顆粒數為9之新的8英吋 檢查0.2微米或以射污㈣測器 中科管尸夕顆+ 4 顆粒。結果,於8英吋晶圓尺寸面積 附數目數為1 3,0 0 0。此,僅可將在清潔之前黏 附之48%數目的顆粒移除。 實施例2 、 將自由75份丙烯酸2-乙基己酿、20份丙烯酸甲酯、及5 伤丙烯齩所組成之單體混合物製得之丨〇 〇份丙烯酸系聚合 物(重量平均分子量,700, 0 00 )與1〇份聚乙二醇200二甲基C:\2D-C0DE\91.10\91118274.ptd Page 11 1296423 V. INSTRUCTIONS (8) Porous film of ultra-high molecular weight polyethylene with a diameter of 25 μm and a pore diameter of from 0·0 5 to 2 μm (Solupor, manufactured by Teijin Ltd.), forming a general pressure-sensitive adhesive layer. A 38-micron thick polyester release film was adhered to the surface. The cleaning sheet of the present invention was thus obtained. The surface of the cleaning layer is substantially non-tacky. The clean layer has a porosity of from 40 to 90%. The cleaning layer is adhered to the mirror surface of the wafer at a width of 1 mm and is 18 Å from the wafer. Peel strength meter, measured according to j I ς z 〇 2 3 7 viscous. As a result, the viscosity was 〇 · 〇 〇 〇 9 Newtons (〇. 丨) / 丨〇 millimeters. This ensures that the cleaning layer is substantially non-tacky. Further, the pressure-sensitive adhesive layer formed on the other side was applied to the mirror surface of the tantalum wafer in a width of 丨〇m, and was 18 矽 from the wafer. The peel strength meter was measured for its viscosity according to JIS Z0237. As a result, the viscosity was 2·8 / 10 mm. The peeling thinness on the general pressure-sensitive adhesive layer of the cleaning sheet will be applied, and the sheet is attached to the back of the 8 Yingshixi wafer by the manual roller. In this way, a clean wafer round contamination detector for cleaning can be prepared to inspect two new 8 British leaves (10), each of which has a mirror surface of 2 microns or more and a small number of particles on the circle. 8, and the second crystal ',,, °, a crystal to a separate substrate processing device, while maintaining the wafers of the laser contamination detector to check the mirror surface of each wafer. ,:::" Then the first 曰μ μ~ fruit calculated from the size area is 27, 003 on the two wafers. The date, the number of particles is 27, 890, and the 12th page C:\2D-00DE\9M0\91118274.ptd h Λ 1296423 V. Description of the invention (9) Next, the peeling film obtained above is stripped of the clean layer side of the round (1), and 890 adhered particles Number, = cleaning wafer (1) is transferred to a substrate processing apparatus having a positive round section that produces a transportable cleaning wafer (1). As a result, #w or above #w does not cause any trouble. 2 Keep the mirror ί; Sticky: New, Yingxin Crystal solid, and at the same time the above &# = after using the laser pollution detector to check 0. 2 microns or grain causality of this grain removed. Therefore, 85% of the number of sticks adhered before cleaning is higher than that of the implementation: the method of manufacturing the sheet for cleaning, except for the use of ultra-non-porous film. In the same way as the embodiment: Use the cleaning wafer (7) to transport the pass: the surname,;:,! The substrate processing of the wafer segment with the number of particles adhered to Dundee': °ί, 'η' Λ清, clean wafer (2), ** will produce any whiskers. 2曰m=±钕米 or above, the number of adhered particles is 9 new 8 inches, check 0.2 micron or to smear (4) In the detector, the corpse is + 4 particles. As a result, the number of wafer size areas in the 8 inch wafer is 1 3,0 0 0. This can only remove 48% of the particles adhered before cleaning. Example 2, a butyl acrylic polymer (weight average molecular weight, obtained by a free monomer mixture of 75 parts of 2-ethyl acrylate, 20 parts of methyl acrylate, and 5 acrylonitrile) 700, 0 00 ) with 1 part of polyethylene glycol 200 dimethyl

C:\2D-CODE\91-1〇\91118274.ptd 第13頁 1296423 五、發明說明(10) 丙稀酸酿(商品名 Nk Ester 4G ;Shln_Nakamura Chemical 〇·,Ltd.製造)及3份聚異氰酸酯化合物(商品名 L ^Nippon Polyurethane c〇.,Ud.製造)均勻混合,而 ‘得感壓黏著劑溶液A。 將由於一面上經聚矽氧剝離劑處理之連續聚醋薄膜(厚 :3= j米,見度,2 5 〇窀米)所組成之剝離薄膜的經處理 :布J I乞燥基準下厚度1〇微米之感壓黏著劑溶液八。 於所仵之感壓黏著層上重疊超高分子量多孔薄膜 (Su:二東電工股份有限公司製造;厚度,8〇微米; =可移除的感壓㈣m㈣至多孔 ?其中超高分子量聚乙稀之多孔薄膜ί供 作為/月〉糸層之清潔用片材Α。 片H不^包括感壓黏著劑側上之剝離薄膜之該部分之清潔用 的層合物薄膜衝出直徑198 要的部分連續剝除,而產生根攄 :、主T,專膜之不而 A。 座王很蘇本發明之清潔用標籤片材 將此等清潔用標籤片材八之其申一 之剝離薄膜剝除,3 M 者之感壓黏者層侧上 圓之背面(=: 潔晶圓。其之-般的Ιί:以;送, 180刹制》離強度計為5牛頓力〇毫米、之點性 之 ’J用標籤膠帶塗布機(NEL_GR3〇 將清潔用標籤片材A黏點至8英时石夕Nm〇 Seiki製造) 至8英吋矽晶圓之背面(鏡面)。對曰曰:片材八黏貼 ΤΖί3個晶囡連續進行此操 第14頁 C:\2D-mDH\9l.]〇\9n]8274 ptd 1296423 五、發明說明(11) 作。結果,可進行片材之黏貼至晶圓,而不會產生任 ,。如此製得具有清潔功能之供運送用之清潔晶圓A。°棘 查此等具有清潔功能之供運送用之清潔晶圓A。結果,: 定黏貼至各矽晶圓之標籤片材係在晶圓之外形内。 另一方面,利用雷射污染偵測器檢查兩新的8英 圓之各者之鏡面之0 . 2微米或以上的顆粒。结果, B曰曰 圓上之顆粒數為6,及第二晶圓上為5。 日曰 構之個別的基板處為理裝 鏡面向下,然後利用雷射污染偵測器檢查〇 2 保持 之顆粒。結果,於8英吋晶圓尺寸面得^ ^上 圓土㈣粒數為33, 456,及第二個上為3;十二之第-晶 接者,將以上製得之其中一個供, 清潔層側上之可移除薄膜剝除,及::曰曰圓A之 具有產生33,456個顆粒數之晶二=^青潔晶圓A輸送至 果,可輸送清潔晶圓A,而不合基板處理裝[中。結 新的8英吋矽晶圓,同時並保二=何麻煩。其後輪送 污染偵測器檢查〇. 2微米或以H、見面向下,然後利用雷射 次。其結果示於表丨。— 之顆粒。將此操作進行5 表1 一晶圓 一晶圓 輸送 輸送 貫施例2 80% 88% 二晶丨 輸送 五晶圓 輸送 90% 四晶圓 輸送 ^2%· &quot;92%^C:\2D-CODE\91-1〇\91118274.ptd Page 13 1296423 V. Description of Invention (10) Acrylic acid brewing (trade name: Nk Ester 4G; manufactured by Shln_Nakamura Chemical Co., Ltd.) and 3 parts of poly The isocyanate compound (trade name L ^Nippon Polyurethane c., manufactured by Ud.) was uniformly mixed, and 'pressure-sensitive adhesive solution A was obtained. Treatment of a release film consisting of a continuous polyester film (thickness: 3 = j meters, visibility, 25 mils) treated with a polyoxy olefin stripper on one side: thickness 1 of the cloth JI drying standard 〇Micron pressure sensitive adhesive solution eight. Superhigh molecular weight porous film is superposed on the pressure sensitive adhesive layer (Su: manufactured by Erto Electric Co., Ltd.; thickness, 8 μm; = removable pressure (4) m (four) to porous? Among them, ultrahigh molecular weight polyethylene The porous film ί is used as a cleaning sheet for the 月 layer. The sheet H does not include a portion of the release film of the release film on the side of the pressure-sensitive adhesive which is washed out of the desired portion of the diameter 198. Continuous stripping, and the production of roots:, the main T, the film is not A. The king of the Soviet Union, the invention of the cleaning of the label sheet, the cleaning of the label sheet of the eight strips of the peeling film , 3 M The pressure on the side of the layer on the side of the adhesive layer (=: clean wafer. Its - like Ι ί: to; send, 180 brake system) from the intensity meter is 5 Newton force 〇 mm, the point 'J label tape coating machine (NEL_GR3〇 will be used to clean the label sheet A to 8 inch Shishi Nm〇 Seiki) to the back of the 8 inch wafer (mirror surface). Opposite: sheet Eight stickers ΤΖί3 crystal rafts continue this operation on page 14 C:\2D-mDH\9l.]〇\9n]8274 ptd 1296423 V. Invention description (11) As a result, the sheet can be adhered to the wafer without any problem. Thus, the cleaning wafer A for cleaning is provided with a cleaning function. Clean wafer A. As a result, the label sheets that are attached to each wafer are outside the wafer. On the other hand, the laser contamination detector is used to inspect the mirror surface of each of the two new 8-inch circles. 0.2 μm or more of particles. As a result, the number of particles on the B circle is 6, and the number on the second wafer is 5. The individual substrates of the sundial are facing down the mirror, and then the mine is used. The shot detector detects the particles held by 〇2. As a result, the surface size of the 8 inch wafer is ^^, and the number of grains is 33, 456, and the second is 3; Receiver, one of the above is prepared, the removable film on the side of the cleaning layer is stripped, and:: The round A has a crystal number of 33,456 particles = ^ Qingjie wafer A is transported to If it is, the cleaning wafer A can be transported without the substrate processing equipment [in the new 8 inch wafer, while keeping the second = what trouble? The polluted polluting detector checks 〇 2 μm or H, sees the face down, and then uses the laser shot. The results are shown in Table —. — granules. This operation is performed. 5 Table 1 Wafer-to-wafer transfer Conveying Example 2 80% 88% Deuterium transport Five wafers transport 90% Four wafer transport ^2% · &quot;92%^

1296423 五、發明說明(12) 利用XPS檢查於檢測中所使用之8英吋矽晶圓的檢測表 面。結果,當然未偵測到矽氧烷,且其他元素之比例幾乎 與乾淨的石夕晶圓相同。 雖然本發明已經詳細說明並經參照其之特定具體例,但 熟悉技藝人士當明白可不脫離其之精神及範圍,而於其中 進行各種變化及修改。 〈工業應用性〉 如前所述,可將本發明之清潔用片材及具有清潔功能之 運送元件成功地輸送通過基板處理裝置,且可利用其成功 且容易地移除黏附至裝置内部之顆粒。1296423 V. INSTRUCTIONS (12) The XPS inspection surface of the 8-inch wafer used in the inspection was examined by XPS. As a result, of course, no decane was detected, and the ratio of other elements was almost the same as that of the clean Shihwa wafer. While the invention has been described with reference to the specific embodiments of the embodiments of the invention <Industrial Applicability> As described above, the cleaning sheet of the present invention and the conveying member having the cleaning function can be successfully conveyed through the substrate processing apparatus, and the particles adhering to the inside of the apparatus can be successfully and easily removed by using it. .

C:\2D-C0DE\9M0\91118274.ptd 第16頁 1296423 圖式簡單說明 第17頁 C:\2D-00DE\91-10\91118274.ptdC:\2D-C0DE\9M0\91118274.ptd Page 16 1296423 Schematic description of the page Page 17 C:\2D-00DE\91-10\91118274.ptd

Claims (1)

1296423 六、申請專利範圍 1 · 一種清 2· —種清 片材之'一面 3· —種清 之一面上形 4· 一種清 之一面上形 另一面上之 5. 如申請 中,該多孔 6. 如申請 中,該多孔 7. 如申請 中,該多孔 乙烯之多孔 8· —種具 透過黏著層 潔用片材。 潔用片 潔用片 上形成 潔用片 成為清 潔用片 成為清 黏著層 專利範 層實質 專利範 層係為 專利範 層實質 薄膜。 有清潔 而設置 材,其包括 材,其包括 之黏著層。 材,其包括 潔層之多% 材,其包括 潔層之多子匕 〇 圍第1至4項 上不具有黏 圍弟1至4項 包含超向分 圍第1至4項 上不具有黏 功能之運送 於其上之如 一多孔層 一具有多 一基礎材 層。 一基礎材 層、及一 中任一項 性。 中任一項 子量聚乙 中任一項 性,且係 元件,其 申請專利 作為清潔層。 孔層之片材,及於 料及一於基礎材 料 :二:基礎衬料 形成於基礎枒料之 之清潔用片材,其 之清潔用片材, 稀之多孔薄m /、 之清潔用片材, 包含超高分子量^ 包括一運送元 範圍第2或4項t 其 該 9 ·如申請專利範圍第8項之具有清潔 中,讀清潔用片材具有較運送元件/ 運送元件之邊緣突出。 1〇· 一種基板處理裝置之清潔方法,其包括 利範圍第1或3項之清潔用片材或如巾請專利 申請專 運送元件輸送至基板處理裝置内。 第8項之1296423 VI. Patent application scope 1 · A kind of clear 2 · - a kind of clear sheet of 'one side 3 · one kind of clear one side of the shape 4 · one kind of clear one side of the other side of the 5. On the application, the porous 6 As in the application, the porous 7. As in the application, the porous polyethylene porous material has a sheet through which the adhesive layer is applied. Clean film, clean film, clean film, clean film, clear adhesive layer, patent layer, essence, patent, layer, patent, layer, essence, film. There is a clean and configurable material that includes a material that includes an adhesive layer. Material, which includes more than 100% of the cleansing layer, including the multi-layer of the cleansing layer. Items 1 to 4 of the cleansing layer do not have a sticky line. The first to fourth items include the super-directional division. Items 1 to 4 are not sticky. The function is carried on it as a porous layer having one more base layer. A basic layer, and one of the properties. Any of the sub-quantities, and is a component, which is patented as a cleaning layer. The sheet of the hole layer, and the material and the base material: 2: the cleaning sheet formed by the base lining on the base material, the cleaning sheet thereof, the thin porous sheet m /, the cleaning sheet Included in the ultra-high molecular weight ^ includes a transport element range of the second or fourth item t. 9 of the patent application, in the cleaning, the read cleaning sheet has an edge protruding from the transport element/transport element. A cleaning method of a substrate processing apparatus, comprising the cleaning sheet of the first or third aspect or the patent application transporting component to the substrate processing apparatus. Item 8
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