TWI295901B - Electroluminescent device - Google Patents
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Α7 Β7 經濟部口夭工消費合作社印製 智慧財產局 1295901 五、發明説明( 本發明係有關一種新穎有機發光1電致裝置,其具有新 穎電洞移轉層介於電洞產生電極與有機發光層間。此等裝 置高度有效、容易製造且價廉。 近年來對發光有機材料如輕合聚合物有極大興趣。發 光聚合物具有沿聚合物主鏈之非侷限性冗電子系統。非侷 限性7Γ電子系統對聚合物賦與半導性,讓聚合物可支持正 及負電荷載子且沿聚合物鏈具有高度移動性。軛合聚合物 薄膜可用於製備光學裝置例如發光裝置。此等裝置具有無 數優於使用習知半導性材料製備之裝置之優點,包括可作 廣域顯示、直流工作電壓低、以及製造簡單。此類型裝置 例如述於 WO-A-90/13148 、 UW 5,512,654 及 WO-A-95/06400。 以有機及聚合物發光材料為主之顯示裝置的全球市 場近來由史丹福資源公司估計至2〇〇2年將達2億元,成長速 率快速促成此領域獲得產業的高度興趣與重視(d r. Mentley,「平面資訊顯示裝置:市場與技術趨勢」,第9版 1998年)。可滿足商業需求且耗電量低之有效高穩定lEd裝 置已經由許笋公司以及學術研究團體製造出(例如參考rh.Α7 Β7 Ministry of Economic Affairs, Department of Consumers, Cooperatives, Printing and Intellectual Property Bureau 1295901 V. Description of the Invention (The present invention relates to a novel organic light-emitting 1 electro-electric device having a novel hole-transferring layer between a hole-generating electrode and an organic light-emitting device These devices are highly efficient, easy to manufacture, and inexpensive. In recent years, there has been great interest in luminescent organic materials such as light-weight polymers. Luminescent polymers have non-limiting redundant electronic systems along the polymer backbone. Non-limiting 7Γ The electronic system imparts semiconductivity to the polymer, allowing the polymer to support positive and negative charge carriers and is highly mobile along the polymer chain. Conjugated polymer films can be used to make optical devices such as light-emitting devices. Advantages over devices using conventional semiconducting materials, including wide field display, low DC operating voltage, and ease of fabrication. Devices of this type are described, for example, in WO-A-90/13148, UW 5,512,654 and WO- A-95/06400. The global market for display devices based on organic and polymer luminescent materials has recently been estimated by Stanford Resources to 22.2 years. 200 million yuan, the growth rate has quickly contributed to the high interest and attention of the industry in this field (d r. Mentley, "Flat Information Display Devices: Market and Technology Trends", 9th Edition, 1998). It can meet commercial needs and consume electricity. Low effective and stable lEd devices have been manufactured by Xusun and academic research groups (for example, reference rh.
Friend等人,自然 1999, 397, 12)。 目前正致力於實現全彩全塑膠螢幕。欲達成此項目的 的主要挑戰為:(1)存取可發光三原色光紅、綠及藍之軛合 聚合物;以及.(2)軛合聚合物必須容易加工遺製造成全彩顯 不結構。有機電致發光裝置例如聚合物LEDs (PLEDs)由於 經由變更有機發光化合物之化學結構而可達成發光色彩的 (請先閲讀背面之注意事項再填寫本頁)Friend et al., Nature 1999, 397, 12). Currently working on a full color full plastic screen. The main challenges to achieve this project are: (1) access to conjugated polymers of luminescent three primary colors of light red, green and blue; and (2) conjugated polymers must be easily processed to produce full color display. Organic electroluminescent devices such as polymer LEDs (PLEDs) can achieve luminescent color by changing the chemical structure of the organic luminescent compound (please read the back of the note first and then fill out this page)
4 1295901 A7 B7 五、發明説明() 〜 2 操控。但發光層化學性質的調控於實:驗室規模經常容易且 價廉,但於產業規模時變成昂貴且複雜的的過程。全彩矩 陣裝置容易處理及積層的第二項需求產生下列問題,該等 問題如何微圖樣化細小多彩像素、以及如何達成全彩發 光。喷墨印刷以及混成噴墨印刷技術晚近獲得諸多注目用 於圖樣化PLED裝置(例如參考R.F. Service,科學1998, 73, 2561 ; J. Bharathan,Y· Yang,應用物理函件 1998, 72, 2660 ; 以及t.R. Hebner,C.C. Wu,D. Marcy,M.L. Lu,J. Sturm, 應用物理函件1998, 72, 519)。 就最基本結構而言,有機電致發光裝置通常包含一種 有機發光材料設置於電洞注入電極與電子注入電極間。電 洞注入電極(陽極)典型為透明錫攙雜銦氧化物(ITO)塗覆 玻璃基板。常用於電子注入電極(陰極)之材料為低功函數 金屬如#5或銘。 經濟部口 :夭蒙局員工消費合作社印製 智慧財產局 (請先閱讀背面之注意事項再填寫本頁) 常用於有機發光層之材料包括軛合聚合物如聚苯烯-乙烯(PPV)及其衍生物(例如參考WO-A-90/13148)、聚第烯 衍生物(例如參考 A.W. Grice,D.d.C. Bradley,Μ·Τ· Bernius,Μ· Inbasekaran,W.W. Wu,及Ε·Ρ· Woo,應用物 理函件 1998, 73, 629, WO-A-pp/55927及Bernius等人,先進 材料,2000年12卷23期1737頁)、聚萘烯衍生物及聚菲烯衍 生物;以及小型有機分子例如鋁喳諾醇錯合物(Alq3錯合 物:例如參考US-A-4,539,507)以及喳吖啶酮、紅烯以及苯 乙烯系染料(例如參考JP-A-264692/1988)。有機發光層可包 含兩種或兩種以上不同發光有機材料之混合物或分開層。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) '' : 經濟部口芡工消費合作社印製 智慧財產局 1295901 at Β7 五、發明説明() - 3 典型裝置架構例如揭示^於WO-A-90/13148; US-A_5,512,654 ; WO-A-95/06400; R.F. Service,科學 1998, 279,1135 ; Wudl 等人,應用物理函件 1998,73,2561 ; Bharathan,Y. Yang,應用物理函件 1998,72,2660;1\11· Hebner,C.C. Wu,D· Marcy,M.L. Lu,J· Sturm,應用物 理函件1998, 72, 519);以及WO 99/48160 ;其内容以引用 方式併入此處。 由電洞注入層如ITO注入電洞至有機發光層係藉電洞 注入層功函數與發光材料最高佔有分子執道(HOMO)間之 能量差異控制,以及電洞注入層與發光層間之界面化學交 護作用控制。高功函數有機材料沉積於電洞注入層,例如 聚(苯乙烯磺酸酯)-攙雜聚(3,4-伸乙基二氧噻 吩)(PEDOT/PSS)、N,N,-二苯基-N,N,-(2-萘基)_(1,1,_ 苯 基)-4,4’-二胺(NBP)及Ν,Ν’-貳(3_甲基苯基聯苯 -4,4’-二胺(TPD)提供「電洞轉運」層,其有助於電洞注入 發光層,'由電洞注入電極穩定轉運電洞以及阻礙電子。此 等層可有放增加引進發光層的電洞數目。但ΙΤΟ表面之界 限不良,與習知電洞轉運材料間之界面化學難以控制。 至於高功函數有機材料如PEDOT/PSS替代之道,曾經 提議高電阻無機層用作為電洞轉運層例如參考 ΕΡ-Α-1009045 、 ΕΡ-Α-1022789 、 ΕΡ-Α-1030539 及 ΕΡ-Α-1041654。ΕΡ-Α-1022789揭示一種可阻擋電子而具有 電洞導通路徑的無機電洞轉運層。該層有高電阻,據稱較 好於103至108歐姆-厘米區。揭示之材料具有通式 本紙張尺度適用中國國家標準(CNS ) Α4規格(210、乂297公釐) ' ' :― -6 - (請先閲讀背面之注意事項再填寫本頁)4 1295901 A7 B7 V. Invention description () ~ 2 Control. However, the regulation of the chemical properties of the luminescent layer is true: the size of the laboratory is often easy and inexpensive, but becomes an expensive and complicated process at the industrial scale. The second requirement for easy handling and stacking of full-color matrix devices creates the following problems, how to micro-pattern small and colorful pixels, and how to achieve full-color lighting. Inkjet printing and hybrid inkjet printing technologies have recently gained a lot of attention for patterned PLED devices (eg, RF Service, Science 1998, 73, 2561; J. Bharathan, Y. Yang, Applied Physics Letters 1998, 72, 2660; tR Hebner, CC Wu, D. Marcy, ML Lu, J. Sturm, Applied Physics Letters 1998, 72, 519). In terms of the most basic structure, an organic electroluminescent device usually comprises an organic light-emitting material disposed between a hole injecting electrode and an electron injecting electrode. The hole injection electrode (anode) is typically a transparent tin-doped indium oxide (ITO) coated glass substrate. The material commonly used for electron injection electrodes (cathodes) is a low work function metal such as #5 or Ming. Ministry of Economic Affairs: The Intellectual Property Bureau of the Yimeng Bureau employee consumption cooperatives (please read the notes on the back and fill out this page) Materials commonly used in organic light-emitting layers include conjugated polymers such as polyphenylene-ethylene (PPV) and Its derivatives (for example, refer to WO-A-90/13148), polydiene derivatives (for example, reference AW Grice, DdC Bradley, Μ·Τ·Bernius, Μ·Inbasekaran, WW Wu, and Ε·Ρ·Woo, applications Physical Letters 1998, 73, 629, WO-A-pp/55927 and Bernius et al., Advanced Materials, Vol. 12, No. 23, 1737, 2000), poly-naphthene derivatives and polyphenene derivatives; and small organic molecules such as Aluminum quinolol complex (Alq3 complex: for example, see US-A-4,539,507) and acridone, redene and styrene dyes (for example, refer to JP-A-264692/1988). The organic light-emitting layer may comprise a mixture or a separate layer of two or more different light-emitting organic materials. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) '' : Ministry of Economic Affairs, Department of Consumers, Cooperatives, Printed Intellectual Property Bureau, 1295901 at Β7 V. Inventions () - 3 Typical device architecture, for example, reveals WO-A-90/13148; US-A_5,512,654; WO-A-95/06400; RF Service, Science 1998, 279, 1135; Wudl et al., Applied Physics Letters 1998, 73, 2561; Bharathan, Y. Yang , Applied Physics Letters 1998, 72, 2660; 1\11· Hebner, CC Wu, D. Marcy, ML Lu, J. Sturm, Applied Physics Letters 1998, 72, 519); and WO 99/48160; The way is incorporated here. From the hole injection layer, such as the ITO injection hole to the organic light-emitting layer, the energy difference between the work function of the hole injection layer and the highest occupied molecular structure of the luminescent material (HOMO), and the interface chemistry between the hole injection layer and the luminescent layer Control of the role of care. The high work function organic material is deposited on the hole injection layer, such as poly(styrene sulfonate)-doped poly(3,4-extended ethyldioxythiophene) (PEDOT/PSS), N,N,-diphenyl -N,N,-(2-naphthyl)-(1,1,-phenyl)-4,4'-diamine (NBP) and hydrazine, Ν'-贰 (3-methylphenylbiphenyl- 4,4'-Diamine (TPD) provides a "hole transport" layer that facilitates the injection of holes into the luminescent layer. 'The hole is injected into the electrode to stabilize the transport hole and block the electrons. These layers can be added and introduced. The number of holes in the luminescent layer. However, the boundary between the surface of the ruthenium is poor, and the interface chemistry between the conventional hole transport materials is difficult to control. As for the high work function organic materials such as PEDOT/PSS, a high-resistance inorganic layer has been proposed. The hole transport layer is, for example, referred to as ΕΡ-Α-1009045, ΕΡ-Α-1022789, ΕΡ-Α-1030539, and ΕΡ-Α-1041654. ΕΡ-Α-1022789 discloses an inorganic hole that blocks electrons and has a hole conduction path. Transport layer. This layer has a high electrical resistance and is said to be better than the 103 to 108 ohm-cm zone. The disclosed materials have the general purpose of this paper scale applicable to Chinese national standards ( CNS ) Α4 Specifications (210, 乂297 mm) ' ' :― -6 - (Please read the notes on the back and fill out this page)
41295901 A7 B7 經濟部口央^!^^工消費合作社印製 智慧財產局 五、發明説明( (SikGeJOy其中〇$χ·$ 1及1.7$丫$2’.2。此種電洞轉運層 的功難數並未明確界定,可能隨1及y的實際大小改變。 EP-A-1083776及EP-A-1111967揭示具有無機電洞轉運層之 EL裝置,其包含金屬硫屬化物與週期表之5八至8族元素之 無機化合物的組合。重要地兩種組成分係用以提供調節功 難數之期望效果,但未曾疑示金屬硫屬化物須為層狀金屬 硫屬化物。US-A-6023128揭示一種EL裝置其具有電洞轉運 層’該電洞準運層包含一基體其中嵌置過渡金屬硫屬化物 叢集’係藉有機配位子外殼穩定化。電子性質的調節可經 由叢集發揮量子大小效應達成。未曾揭示使用層狀金屬硫 屬單一連續層作為電洞轉運層。 但仍然需要有優於此等先前技藝材料之電洞轉運材 料’特別於與有機發光層界面呈化學惰性之材料,以及該 材料具有可簡單、低成本製造裝置而該裝置具有絕佳電源 效率、低驅動電壓及高發光程度等性質。 因此本發明之目地係提供一種電致發光裝置,其結合 新穎無機電洞準運層,該電致發光裝置於其製造容易及性 能方面具有優異性質。 如此於本發明之第一方面,提供一種電致發光裝置, 包含一電洞注入電極、一電子注入電極、及至少一有機發 光層設置於該電洞注入電極與該電子注入電極間,其中一 層狀金屬硫屬化物層係售置於該注入電極與該發光層間, 該硫屬化物之硫屬組成分係選自硫、硒及碲。 層狀金屬硫屬化物為眾所周知之化合物類別(例如參 n·—— n !.. ' I - I- . , Γ n (請先聞讀背面之注意事項存填寫本貢)41295901 A7 B7 Economic Department's mouth ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ The difficulty is not clearly defined and may vary with the actual size of 1 and y. EP-A-1083776 and EP-A-1111967 disclose an EL device having an inorganic hole transport layer comprising a metal chalcogenide and a periodic table 5 A combination of inorganic compounds of Groups 8 to 8. It is important that the two component systems are used to provide the desired effect of adjusting the number of difficulties, but it has not been suspected that the metal chalcogenide must be a layered metal chalcogenide. US-A- 6023128 discloses an EL device having a hole transport layer 'the hole transport layer comprising a matrix in which a transition metal chalcogenide cluster' is stabilized by an organic ligand shell. The regulation of electronic properties can be quantum through clustering. The size effect is achieved. It has not been revealed that a single continuous layer of layered metal chalcogen is used as the hole transport layer. However, there is still a need for a hole transport material that is superior to such prior art materials, particularly materials that are chemically inert to the interface with the organic light-emitting layer. , And the material has a simple and low-cost manufacturing device, and the device has excellent power supply efficiency, low driving voltage, high light-emitting degree, etc. Therefore, the object of the present invention is to provide an electroluminescent device which combines novel inorganic electroporation The electroluminescent device has excellent properties in terms of ease of manufacture and performance. Thus, in a first aspect of the invention, an electroluminescent device comprising a hole injecting electrode, an electron injecting electrode, and at least one An organic light-emitting layer is disposed between the hole injection electrode and the electron injection electrode, wherein a layered metal chalcogenide layer is sold between the injection electrode and the light-emitting layer, and the chalcogen component of the chalcogenide is selected from the group consisting of Sulfur, selenium and tellurium. Layered metal chalcogenides are well known compounds (eg, n.-n !.. ' I - I- . , Γ n (please read the notes on the back) )
,1T, 1T
1295901 A7 A7 ---- 五、發明説明() 5 考具有層狀結構材料之物理與化學,出版者D Reidei/荷蘭 道瑞齊/波士頓美國),包括包含金屬料減選自硫、碰 及碲之硫屬原子呈層狀結構之任_種化合物。例如包括層 狀金屬二硫屬化物及層大金屬_硫屬化物。層狀金屬二硫 屬化物具有化學式MX2’其中M表示金屬及χ表示硫、栖或 碲。層狀金屬二硫屬化物結構較好包括一片金屬原子夾置 於兩片硫屬原子間。層狀金屬二硫屬化物中,金屬組成分 Μ較好係選自過渡金屬如鈦、錯、給、鈒、钽、銳、翻及 鎮以及非過渡金屬如錫。更佳為H组、錫及鶴且最 佳為鈮、鉬及鈕。更佳硫屬為硫及硒。形成一硫屬化物之 金屬包括鎵、銦及鉈。 經1295901 A7 A7 ---- V. INSTRUCTIONS (5) Physico-chemical and chemistry with layered structural materials, published by D Reidei/Dorway, Boston, USA), including metal oxides selected from sulfur, Any of various compounds in which the atom of the genus genus is a layered structure. For example, it includes a layered metal dichalcogenide and a layered large metal-chalcogenide. The layered metal disulfide compound has the chemical formula MX2' wherein M represents a metal and ruthenium represents sulphur, habitat or ruthenium. The layered metal dichalcogenide structure preferably comprises a metal atom sandwiched between two chalcogen atoms. Among the layered metal dichalcogenides, the metal component is preferably selected from transition metals such as titanium, erbium, ruthenium, osmium, iridium, iridium, and non-transition metals such as tin. More preferably, it is group H, tin and crane and is preferably bismuth, molybdenum and button. More preferred sulfur is sulfur and selenium. The metals forming a chalcogenide include gallium, indium and antimony. through
工 消 f 合 作 社 印 製 谷後詳述,層狀金屬硫屬化物具有若干讓其特別適合 用作為電洞轉運層之性質。層狀金屬二硫屬化物為化學惰 性,不含旁懸鍵,如此可克服前文所述先前技藝電洞轉運 層與有機發光層及陽極間之界面遭遇之化學交互作用問 題。層狀金屬硫屬化物具有高功函數,容易將電洞由金屬 石敗屬化物層轉運至有機發光層。此外,其可使用化學方法 簡單廉價之赛理而獲得薄膜。 金屬硫屬化物結構包含金屬原子片材夾置於硫屬原 子片材間。例如於層狀金屬二硫屬化物中,金屬片材係共 價鍵結至二毗鄰硫屬片材。二毗鄰Μχ2層藉凡得瓦爾力而 維持結合在一起。此種結構結果導致具有極端各向異性之 機械、化學與電性質。材料之暴露面不具有旁懸鍵,如此 為化學惰性。如此讓其特別適合用作為電致發光裝置之電In detail, the layered metal chalcogenide has several properties that make it particularly suitable for use as a hole transport layer. The layered metal dichalcogenide is chemically inert and contains no pendant bonds, thus overcoming the chemical interactions encountered between the prior art hole transport layer and the interface between the organic light-emitting layer and the anode. The layered metal chalcogenide has a high work function and is easy to transport holes from the metalloid layer to the organic light-emitting layer. In addition, it is possible to obtain a film using a chemical method which is simple and inexpensive. The metal chalcogenide structure comprises a metal atomic sheet sandwiched between the chalcogenogen sheets. For example, in a layered metal dichalcogenide, the metal sheet is covalently bonded to two adjacent chalcogenide sheets. The two adjacent Μχ2 layers are maintained by the combination of Van der Valli. Such structural results result in mechanical, chemical and electrical properties with extreme anisotropy. The exposed side of the material does not have a side dangling bond and is therefore chemically inert. So that it is particularly suitable for use as an electroluminescent device
1295901 A7 B7 五、發明説明( 洞轉運層,原因在於此種結構可免除先前技藝裝置造成效 率減低及有效使用壽命縮短之與電洞注入層(如IT0)以及 發光層(如PPV)間的界面發生化學反應之問題。 層狀金屬硫屬化物於4-6.5電子伏特(ev)範圍具有高 功函數,以5-6.5 eV為特佳。例如二硒化鈮、二硫化鉬、 一硫化錫、二硫化鈕、二硒化釩、硒化銦及硒化鎵之功函 數分別為 5.9、4.8、5.2、5.2、5.6、4.55及 5.8 eV[藉光子發 射技術測量’揭示於T· Shimada,F.S. Ohuchi及B.A. Parkinson,日本應用物理期刊33, 2696 (1994)]。此等材料 之尚功函數讓其特別適合用作為電洞轉運層,原因在於此 等功函數之數值接近有機發光層之游離電位。有助於電洞 轉運至發光層。高功函數、合理傳導性、以及層狀金屬硫 屬化物暴露面的惰性,大為有助於本發明電致發光裝置之 電洞由電洞注入電極(例如ITO)注入發光層,因而讓電致發 光裝置特別有效。 經濟部T央工消費合作社印製 ,財產局 (請先閲讀背面之注意事項再填寫本頁) 層狀金屬硫屬化物之電子性質可有寬廣變化,由絕緣 體經半導體及半金屬至真金屬。層狀金屬硫屬化物之電阻 率係由二硒化硫及二硫化鈕之極低值例如約4乂10_4歐姆-厘 米(Ω-cm)至二硫化錮之高值如1〇歐姆_厘米。如前述,先 前無機電洞轉運層之揭示例如EP-A-1022789之揭示,教示 較佳電阻率為lxl〇3-lxl〇8歐姆-厘米。若干層狀金屬硫屬化 物具有低電阻率結果導致本發明裝置之驅動電壓要求值降 低。 層狀金屬二硫屬化物結構包括一片六面體填塞金屬 9 1295901 五、發明説明( 製 原子片材夾置於兩片.六面體硫屬原子間。金屬原子藉硫屬 原子配價為六面體(例如二硫化鈦及二硫化叙)或三面體棱 柱(例如二硫化翻及二硫化銳)β MX2層藉凡得瓦爾力維持 結合在-起,且存在有數種堆疊多龍(參考第1圖卜層間 的微弱鍵結,此處-層μ金屬原子單層藉共價鍵結ς屬 包被在-起組成,微弱鍵結結果導致極端各向異性機械及 電性質。例如垂直平面之導電率比二硫化翻平面至少降低1〇2因數[參考J.A.觀_及A.D· Y〇ffe,先進物理18 193 (1969)]。 層狀金屬-硫屬化物結構包括兩片六面體填塞金屬 原子片材夾置於兩片六面體硫屬原子片材間呈χ_Μ_Μ 順序。於二化合物,陽離子偏好為四面體配價 層之鍵結為共價鍵。金屬·金屬鍵結負責產生此等材料之 導電表現。各層藉凡得瓦爾力維持結合且存在有若干堆 多型性。層㈣弱鍵結結果導致極端各向異性機械及電 質。、 金屬原子之配價及氧化態決定材料之電子性質。例如 V族金屬原子(鈮及鈦)係呈三面體稜柱配價,對應二硫屬 物材料為金屬;VI族原子(鉬及鶴)也係呈三面體稜柱 饧,但有完整dz帶,故為半導體。二硫化鉬具有六面體 二面體稜柱配價,如此分別為金屬或半導性。 金屬性之金屬硫屬化物吸收光譜顯示該材料吸收 外光及可見光區。但三面體稜柱材料薄膜例如二硒化鈮 自由載子吸收低於1 eV,與直接吸收邊緣分開大於2 eV[參1295901 A7 B7 V. INTRODUCTION OF THE INVENTION (The hole transport layer is due to the fact that this structure eliminates the interface between the hole injection layer (such as IT0) and the luminescent layer (such as PPV) due to the reduced efficiency and effective service life of the prior art device. The problem of chemical reaction occurs. The layered metal chalcogenide has a high work function in the range of 4-6.5 electron volts (ev), especially 5-6.5 eV, such as bismuth selenide, molybdenum disulfide, tin sulphide, The work functions of disulfide knob, vanadium diselide, indium selenide and gallium selenide are 5.9, 4.8, 5.2, 5.2, 5.6, 4.55 and 5.8 eV, respectively. [Measurement by photon emission technology] revealed in T· Shimada, FS Ohuchi And BA Parkinson, Japanese Journal of Applied Physics 33, 2696 (1994). The work function of these materials makes them particularly suitable for use as a hole transport layer, because the value of these work functions is close to the free potential of the organic light-emitting layer. It facilitates the transport of holes to the luminescent layer. The high work function, reasonable conductivity, and the inertness of the exposed surface of the layered metal chalcogenide greatly contribute to the injection of the holes into the electrode of the electroluminescent device of the present invention. example ITO) is injected into the luminescent layer, thus making the electroluminescent device particularly effective. Printed by the T-Commerce Consumer Cooperative of the Ministry of Economic Affairs, the Property Bureau (please read the notes on the back and fill in this page) The electronic properties of the layered metal chalcogenide can be There are wide variations, from insulators to semiconductors and semi-metals to true metals. The resistivity of layered metal chalcogenides is very low for sulfur disulfide and disulfide knobs, for example about 4 乂 10 _ ohm-cm (Ω-cm The high value of bismuth disulfide is, for example, 1 〇 ohm_cm. As described above, the disclosure of the prior inorganic hole transport layer, for example, as disclosed in EP-A-1022789, teaches that the preferred resistivity is lxl 〇 3-lxl 〇 8 ohm - Cm. The low resistivity of several layered metal chalcogenides results in a decrease in the driving voltage requirement of the device of the invention. The layered metal dichalcogenide structure comprises a piece of hexahedral plug metal 9 1295901 V. Description of the invention The material clip is placed between two hexahedral sulfur atoms. The metal atom is a hexahedron (for example, titanium disulfide and disulfide) or a trihedral prism (for example, disulfide and disulfide). ) β MX The second layer borrows the van der Waals force to maintain the bond in, and there are several kinds of stacked multi-dragons (refer to the weak bond between the layers of Figure 1b, where the layer-μ layer of metal atom single layer is covalently bonded by the ς 包In the composition, weak bonding results in extremely anisotropic mechanical and electrical properties. For example, the conductivity of the vertical plane is at least 1〇2 lower than the disulfide turning plane [Refer to JA View _ and AD·Y〇ffe, Advanced Physics 18 193 (1969)] The layered metal-chalcogenide structure consists of two hexahedral packed metal atom sheets sandwiched between two hexahedral sulfur atomic sheets in a χ_Μ_Μ sequence. In the di-compound, the cation preference is that the bond of the tetrahedral valence layer is a covalent bond. Metal/metal bonding is responsible for producing the electrical conductivity of such materials. Each layer maintains a bond with Van der Valli and there are several piles of polymorphism. Layer (4) weak bonding results in extremely anisotropic machinery and electrical properties. The metal atom's valence and oxidation state determine the electronic properties of the material. For example, group V metal atoms (铌 and titanium) are trigonal prismatic valences, corresponding to disulfide materials are metals; group VI atoms (molybdenum and cranes) are also trihedral prisms, but with complete dz bands, so For the semiconductor. Molybdenum disulfide has a hexahedral dihedral prismatic coordinate, which is metal or semiconducting, respectively. The metallic metal chalcogenide absorption spectrum shows that the material absorbs the external light and visible light regions. However, a trihedral prismatic material film such as bismuth selenide free carrier absorbs less than 1 eV and is separated from the direct absorption edge by more than 2 eV.
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X 半疊 性 化 及 紅 本紙張尺度適用中關家標準(CNS ) A4規格(21GX297公釐)X semi-stacked and red paper size applicable to the Central Standard (CNS) A4 specification (21GX297 mm)
(請先閲讀背面之注意事項再填· I _ -fr填寫本頁)(Please read the notes on the back and fill in the form. I _ -fr fill this page)
,1T 鏵. 經濟部口央^^^^工消費合作社印製 智慧財產局 1295901 Λ7 B7 五、發明説明() 8 考J.A· Wilson及A.D· Yoffe,先進物理 18, 193 (1969)]。因 此經由處理層狀金屬硫屬化物之極薄薄膜可將其發光吸收 減至最低。如此雖然層厚度並無特殊限制,但層狀金屬硫 屬化物電洞轉運層較好具有厚度3至20奈米,更好3至10奈 米及最好3至7奈米。較厚薄膜雖然仍然有效,但可能吸收 大於20%之發射光,因而降低光的發射。 較好層狀金屬硫屬化物為唯一電洞轉運材料。此外, 須暸解層狀金屬硫屬化物電洞轉運層於電洞注入電極形成 單一連續薄片,參考US-A-6023128揭示之基體内懸浮的叢 集。 若於發射層沉積於層狀金屬硫屬化物電洞轉運層之 前,後者於至少l〇〇°C溫度(例如250°c溫度)退火,則於某 些案例中可獲得特佳性質,原因在於可改良若干層狀金屬 硫屬化物材料薄膜之排序,因而提升其導電性。 發光層可包含一或多種有機發光材料。若有多於一種 有機發光材料,則可設置為分開層、或將材料混合物設置 為單層。任二種有機發光材料皆可用於發光層。適當實例 包括:軛合$合物例如聚-苯烯-乙烯(PPV)及其衍生物(例 如參考WO-A-90/13148)、聚荞烯衍生物(例如參考A.W· Grice,D.D.C. Bradley,Μ·Τ· Bernius,M. Inbasekaran, W.W. Wu,及 Ε·Ρ· Woo,應用物理函件 1998,73,629, WO-A-OO/55927及Bernius等人,先進材料,2000年 12卷23 期1737頁)、聚萘烯衍生物、聚茚并苐衍生物及聚菲基衍生. 物;以及小型有機分子例如铭σ奎諾醇錯合物(Alq3錯合物: 本紙張尺度適用中國國家標準(CNS ) A4規格(21〇X297公釐) (請先閲讀背面之注意事項再填寫本頁), 1T 铧. Ministry of Economic Affairs, the central government ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ Therefore, the luminescence absorption of the layered metal chalcogenide can be minimized by treating the extremely thin film of the layered metal chalcogenide. Thus, although the layer thickness is not particularly limited, the layered metal chalcogenide hole transport layer preferably has a thickness of 3 to 20 nm, more preferably 3 to 10 nm, and most preferably 3 to 7 nm. Thicker films, while still effective, may absorb more than 20% of the emitted light, thus reducing the emission of light. The preferred layered metal chalcogenide is the only hole transport material. In addition, it is understood that the layered metal chalcogenide hole transport layer forms a single continuous sheet at the hole injection electrode, with reference to the cluster suspended in the matrix disclosed in US-A-6,023,128. If the emitter is annealed at a temperature of at least 10 ° C (eg, 250 ° C) before the emissive layer is deposited on the layered metal chalcogenide hole transport layer, then in some cases a particularly good property is obtained because The ordering of several layered metal chalcogenide material films can be improved, thereby improving the electrical conductivity. The luminescent layer can comprise one or more organic luminescent materials. If there is more than one organic luminescent material, it may be provided as a separate layer or as a single layer. Any two organic luminescent materials can be used for the luminescent layer. Suitable examples include: conjugates such as poly-phenylene-ethylene (PPV) and its derivatives (for example, see WO-A-90/13148), polydecene derivatives (for example, reference AW· Grice, DDC Bradley, Μ·Τ· Bernius, M. Inbasekaran, WW Wu, and Ε·Ρ·Woo, Applied Physics Letters 1998, 73, 629, WO-A-OO/55927 and Bernius et al., Advanced Materials, 2000, Vol. 12, No. 23 1737 pages), poly-naphthene derivatives, polyfluorene-deuterium derivatives and polyphenanthrenyl derivatives; and small organic molecules such as σ quinolol complex (Alq3 complex: This paper scale applies to Chinese national standards (CNS) A4 size (21〇X297 mm) (Please read the note on the back and fill out this page)
、1T ·· 11 1295901 A7 B7 五、發明説明() 一 9 例如參考US-A-4,539,507),過渡金屬乂錯合物、具有有機 配位子之鑭系原素及锕系元素,如TMHD(參考 WO-A-00/26323)以及喳吖啶酮、紅烯以及苯乙烯系染料(例 如參考抒-八-264692/1988);該等參考文獻之内容以引用方 式併入此處。 較佳發光聚合物料之特例包括包括下式(VIII)、(IX)、 (X)、(XI)、(XII)、(XIII)、(XIV)及(XV)軛合單位之聚合物。 此等聚合物可為均聚物或含有兩種或兩種以上不同軛合單 位,例如交替AB共聚物及三元聚合物;及統計共聚物及三 元聚合物。 (請先閲讀背面之注意事項再填寫本頁) 經濟部T央工消費合作社印製 智慧財產局, 1T ·· 11 1295901 A7 B7 V. Description of the invention () A 9 for example, see US-A-4,539,507), transition metal ruthenium complexes, lanthanides with organic ligands and actinides such as TMHD ( Reference is made to WO-A-00/26323) as well as acridone, redene and styrenic dyes (for example, see 抒-八-264692/1988); the contents of each of which are incorporated herein by reference. Specific examples of preferred luminescent polymer materials include polymers comprising conjugate units of the following formulae (VIII), (IX), (X), (XI), (XII), (XIII), (XIV) and (XV). These polymers may be homopolymers or contain two or more different conjugate units, such as alternating AB copolymers and terpolymers; and statistical copolymers and terpolymers. (Please read the notes on the back and fill out this page.) Printed by the Ministry of Economic Affairs, T-Commerce Consumer Cooperatives
訂Order
本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 12 !2959〇1 A7This paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 12 !2959〇1 A7
R8至R15及r 17至R 3 3為相同或相異且係選自下列基團 :成的組群:如下定義之烷基,如下定義之-烷基,如下 疋義之烷氧基,如下定義之烷氧烷基,如下定義之芳基, 如下定義之芳氧基,如下定義之芳烧基,以及式_c〇r 基,其中R16係選自下列基團組成的組群:羥基,如下定 之烷基;如下定義之鹵烷基,如下定義之烷氧基,如下 義之烷氧烧基,如下定義之芳基,如下定義之芳氧基, 下定義之芳烷基,胺基,烷基胺基其烷基部分定義如後 一烷基胺基其中各個烷基部分為相同或相異且定義如後 芳烷氧基其芳烷基部分定義如後,以及鹵烷氧基包含如 定義之烷氧基其係以至少一個豳原子取代, 或若r或s為2之整數,R32或R33二基連同其附接之環碳 原子形成含有5至7個環原子之雜環基,一或多個環原子為 選自氮、氧及硫原子組成之雜原子,· 訂 16 義 定 如 下 t 本紙張尺度適用中國國家標準(CNS ) A4規格(210χ297公釐) 13 1295901 A7 B7 五、 發明説明( 11 Z1、Z2及Z3為相同或相異且係選*自〇、s、s〇、叫、 NR3、Nf’XR;’’)、C(r4)(r5)、Si(R4;)(R5,)及 成的組群’其中R、R3,及r3”為相同或相異且各自係選自 下列基團組成的組群:氫原子,如下定義之炫基如下定 義之齒烧基,如下定義之烧氧基,如下定義之烧氧院基, 如下定義之芳基’如下定義之芳氧基,如下定義之芳烧基 以及如下定義之烧基其係以至少一個式_n+(r7)3基團取 代,其中各個R7基為相同或相異且係選自氣原子、.如下定 義之烷基及如下定義之芳基組成的組群,r4、r5、Μ,及r5, 為^同或相異且各自係選自氫原子、如下定義之烧基如 下定義之鹵院基、如下定義之院氧基、南原子硝基、氛 基、如下定義之烷氧烷基、如下定義之芳基、如下定義之 芳氧基及*T定義之技基組成的組群,或r4&r5與其附 接之碳原子共同表示幾基,以及r6係選自氫原子、如下定 義之烷基、如下定義之鹵烷基、如下定義之烷氧烷基如 下疋義之芳基、如下定義之芳氧基、以及如下定義之芳烷 基組成的鈕群; 經 Μ 局ι 工 消 費 合 作 社 X、X、X及X4各自為相同或相異且係選自·· 伸芳基其為一或多個環含有6至14個碳原子之芳香族 煙基’其可視需要地經以至少一個選自下列基團組成的組 群之取代基取代:硝基,氰基,胺基,如下定義之烷基、 如下定義之齒烷基、如下定義之烷氧烷基、如下定義之芳 氧基、以及如下定義之烷氧基; 含1至6個碳原子之直鏈或分支鏈伸烷基; 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨〇'乂297公羞) 12 1295901 五、發明説明( 含2至6個碳原子之直鏈或分支鏈伸烯基;以及 含1至6個碳原子之直鏈或分支鏈伸炔基;或 X與X3及/或X2與X4共同表示下式之鍵聯基 。丫 丫。 (V) 其中X5表示伸芳基其為一或多個環含有6至14個碳原 子之芳香族烴基,其可視需要地經以至少一個選自下列基 團組成的組群之取代基取代:硝基,氰基,胺基,如下定 義之烷基、如下定義之_烷基、如下定義之烷氧烷基、如 下定義之芳氧基、以及如下定義之烷氧基; el、e2、fl及f2各自為相同或相異且為〇或1至3之整數; g、ql、q2、q3及q4各自為相同或相異且為〇、丨或2; Μ、h2、’jl、j2、j3、11、12、13、14、各自為相同 或相異且為0或1至4之整數; 1、kl、k2、〇1及〇2各自為相同或相異且為〇或1至5之 整數;以及 pl、p2、p3及p4各自為0或1 ; 前述烷基為含1至20個碳原子之直鏈或分支鏈烷基; 前述鹵烷基為如上定義之烷基其經以至少一個鹵原 子取代; 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐 I丨丨—----丨#~ (請先閲讀背面之注意事項再填寫本頁〕 訂 15 -R8 to R15 and r17 to R33 are the same or different and are selected from the group consisting of alkyl groups as defined below, alkyl groups as defined below, alkoxy groups as defined below, as defined below An alkoxyalkyl group, an aryl group as defined below, an aryloxy group as defined below, an aryl group as defined below, and a formula _c〇r group, wherein R16 is selected from the group consisting of: hydroxy, as follows An alkyl group; a haloalkyl group as defined below, an alkoxy group as defined below, an alkoxyalkyl group as defined below, an aryl group as defined below, an aryloxy group as defined below, an aralkyl group as defined below, an amine group, an alkyl group The alkyl group of the amine group is defined as the latter alkylamino group wherein each alkyl moiety is the same or different and is defined as a post-aralkyloxy group, the aralkyl moiety of which is defined as follows, and the haloalkoxy group comprises as defined The alkoxy group is substituted with at least one deuterium atom, or if r or s is an integer of 2, the R32 or R33 diradical, together with the ring carbon atom to which it is attached, form a heterocyclic group containing 5 to 7 ring atoms, A plurality of ring atoms are heteroatoms composed of nitrogen, oxygen and sulfur atoms, and are defined as follows: The paper scale applies to the Chinese National Standard (CNS) A4 specification (210χ297 mm) 13 1295901 A7 B7 V. Description of invention (11 Z1, Z2 and Z3 are the same or different and are selected *self, s, s〇, 、, NR3, Nf'XR; ''), C(r4)(r5), Si(R4;)(R5,) and the resulting group 'where R, R3, and r3' are the same or different and each is selected A group consisting of the following groups: a hydrogen atom, a dentate group as defined below, an alkoxy group as defined below, an alkoxy group as defined below, a oxyalkyl group as defined below, an aryl group as defined below a aryl group, as defined below, and a decyl group, as defined below, substituted with at least one group of the formula _n+(r7)3, wherein each R7 group is the same or different and is selected from a gas atom, as defined below a group consisting of an alkyl group and an aryl group as defined below, r4, r5, fluorene, and r5, which are the same or different and each selected from a hydrogen atom, a halogen group as defined below, as defined below Alkoxy, a southern atom nitro, an aryl group, an alkoxyalkyl group as defined below, an aryl group as defined below, an aryloxy group as defined below, and a *T definition a group consisting of a technical group, or r4&r5 together with a carbon atom to which it is attached, represents a group, and r6 is selected from a hydrogen atom, an alkyl group as defined below, a haloalkyl group as defined below, an alkoxylated alkane as defined below a group of aryl groups, an aryloxy group as defined below, and an arylalkyl group as defined below; the oxime bureaux consumer cooperatives X, X, X and X4 are each identical or different and are selected from the group consisting of An aromatic aryl group having one or more rings containing from 6 to 14 carbon atoms which may optionally be substituted with a substituent of at least one group selected from the group consisting of nitro, A cyano group, an amino group, an alkyl group as defined below, a dentate alkyl group as defined below, an alkoxyalkyl group as defined below, an aryloxy group as defined below, and an alkoxy group as defined below; containing 1 to 6 carbon atoms Straight or branched chain alkyl; This paper scale applies to Chinese National Standard (CNS) A4 specification (2丨〇'乂297 public shame) 12 1295901 V. Description of invention (linear or branched with 2 to 6 carbon atoms) a chain extending alkenyl; and a straight or branched chain extending from 1 to 6 carbon atoms Group; or X and X3 and / or X4 and X2 together represent the formula of the linking group.丫 丫. (V) wherein X5 represents an aryl group which is an aromatic hydrocarbon group having one or more rings having 6 to 14 carbon atoms, which may optionally be substituted with a substituent of at least one group selected from the group consisting of: Nitro, cyano, amine, alkyl as defined below, alkyl as defined below, alkoxyalkyl as defined below, aryloxy as defined below, and alkoxy as defined below; el, e2, fl And f2 are each the same or different and are 〇 or an integer from 1 to 3; g, ql, q2, q3 and q4 are each the same or different and are 〇, 丨 or 2; Μ, h2, 'jl, j2 J3, 11, 12, 13, 14 are each the same or different and are 0 or an integer from 1 to 4; 1. kl, k2, 〇1 and 〇2 are each the same or different and are 〇 or 1 to 5 And pl, p2, p3 and p4 each being 0 or 1; the aforementioned alkyl group is a linear or branched alkyl group having 1 to 20 carbon atoms; the aforementioned haloalkyl group is an alkyl group as defined above Replace with at least one halogen atom; This paper scale applies to Chinese National Standard (CNS) A4 specification (210X297 mm I丨丨-----丨#~ (please read the notes on the back and fill in the form) ] Order 15--
五、發明説明( 13 1295901 如述烧氧基為含1至20個碳原子之直鍵或分支鏈烧氧 基; 前述烷氧烷基為如上定義之烷基其經以至少一個如 上定義之烷氧基取代;以及 前述芳基以及前述芳烷基(烷基部分含1至2〇個碳原子) 及芳氧基之芳基部分為於一或多個環含有6至14個碳原子 之芳香族烴基,其可視需要地經以至少一個選自下列基團 組成的組群之取代基取代:硝基,氰基,胺基’,如上定義 之烷基、如上定義之鹵烷基、如上定義之烷氧烷基、以及 如上定義之烷氧基。 特佳發光聚合物包括均聚物、共聚物及三元聚合物其 包含式(VIII)、(IX)、(X)、(XIV)、及(xv)基團,例如包括 PPV,聚(2-甲氧-5-(2’·乙基)己氧伸苯基-伸乙稀 基)(「MEH-PPV」),PPV衍生物如二烷氧及二烷基衍生物、 聚第衍生物及相關共聚物;及最佳聚合物包括PPV、 MEH-PPV、聚(2,7-(9,9-二-正己基苐))、聚(2,7-(9,9-二-正 辛基第))·、聚'(2,7-(9,9-二-正辛基第)-(ι,4-伸苯基‘第二 丁基苯基)亞胺基)-1,4-伸苯基))(「TFB」)、及聚(2,7-(9,9-二-正辛基苐)-3,6-苯并噻二唑)(「F8BT」)。最佳發光有機 分子包括Alq3錯合物。 發光層厚度並無特殊限制。層之精確厚度將依據多種 因素改變,此等因素例如發光層材料以及裝置之其它組件 材料。但典型地’發光層厚度(若有多於一層則為組合厚度) 為1至250奈米,較好50至120奈米又更好70至1〇〇奈米及最 本紙張尺度適用中國國家標準(CNS ) M規格(21〇χ297公釐) (請先閲讀背面之注意事項再填寫本頁} d5. Description of the Invention (13 1295901) The alkoxy group is a straight or branched alkoxy group having 1 to 20 carbon atoms; the alkoxyalkyl group is an alkyl group as defined above which has at least one alkane as defined above An oxy group; and the aryl group of the foregoing aryl group and the aforementioned aralkyl group (the alkyl moiety has 1 to 2 carbon atoms) and the aryloxy group are aromatic having 6 to 14 carbon atoms in one or more rings. a hydrocarbyl group which may optionally be substituted with a substituent of at least one group selected from the group consisting of nitro, cyano, amine ', alkyl as defined above, haloalkyl as defined above, as defined above Alkoxyalkyl, and alkoxy as defined above. Particularly preferred luminescent polymers include homopolymers, copolymers and terpolymers comprising formula (VIII), (IX), (X), (XIV), And (xv) groups, for example, including PPV, poly(2-methoxy-5-(2'-ethyl)hexyloxyphenylene-ethylene) ("MEH-PPV"), PPV derivatives such as Dialoxane and dialkyl derivatives, poly derivatives and related copolymers; and the best polymers include PPV, MEH-PPV, poly(2,7-(9,9-) Di-n-hexyl fluorene)), poly(2,7-(9,9-di-n-octyl)), poly'(2,7-(9,9-di-n-octyl)-( ι,4-phenylphenyl 't-butylphenyl)imido)-1,4-phenylene)) ("TFB"), and poly(2,7-(9,9-di-positive) Octyl)-3,6-benzothiadiazole) ("F8BT"). The best luminescent organic molecules include Alq3 complexes. The thickness of the light-emitting layer is not particularly limited. The precise thickness of the layer will vary depending on a number of factors such as the luminescent layer material and other component materials of the device. However, typically the thickness of the luminescent layer (combined thickness if there is more than one layer) is 1 to 250 nm, preferably 50 to 120 nm and better 70 to 1 Å nanometer and the most paper size is applicable to the Chinese country. Standard (CNS) M specification (21〇χ297 mm) (Please read the notes on the back and fill out this page again) d
、1T 經濟部tp工消費合#社印製 智慧財產局 16 經濟部口受$局員工消費合作社印製 智慧財產局 1295901 at B7 五、發明説明() 一 14 佳75至85奈米。 * 有機發光層可使用任一種適合沉積此種有機層之方 法沉積於層狀金屬硫屬化物電洞轉運層上。因層狀金屬硫 屬化物不溶於有機溶劑,故由有機發光材料溶液旋塗特別 .適合用於此項目地(例如參考WO-A-90/13148)。 本發明之電致發光裝置典型具有基板(例如玻璃)、電 洞注入電極(如ITO)、層狀金屬硫屬化物電洞轉運層、有機 發光層(例如聚苐)、及電子注入電極(例如Ca/Al)之堆疊組 態。另外,裝置具有基板、電子注入電極、有機發光層、 層狀金屬硫屬化物電洞轉運層、及電洞注入電極之反向堆 疊組態。 業界已知之任一種適當技術皆可用於沉積層狀金屬 硫屬化物電洞轉運層於陽極。但因超薄薄膜可以低成本方 法沉積於陽極上,故以化學途徑為佳。 適當沉積層狀金屬二硫屬化物於陽極之化學方法係 基於Frindt等人開發之方法[參考P· Joensen,R.F. Frindt及 S.R. Morrisoii,材料研究公報21,457 (1986)及美國專利 4,996,108]。此種方法涉及下列步驟: (a) 鋰原子插入MX2化合物; (b) 加水至插入材料,結果導致水被鋰原子還原。逸 出於MX2層間的結果產生的氫氣崩潰各層堆疊(離層),結 果製造懸浮於水中之MX2單層; (c) 添加水不溶混溶劑至MX2單層水懸浮液,接著攪 動結果所得混合物,製造MX2薄膜,其係形成於溶劑/水界 本紙張尺度適用中國國家標準(CNS ) Α4規格(210><297公釐) (請先閲讀背面之注意事項再填寫本頁)1T Ministry of Economic Affairs tp workers consumption combined with the company's printed intellectual property bureau 16 Ministry of Economic Affairs printed by the Bureau of Staff and Consumers Cooperatives Intellectual Property Office 1295901 at B7 V. Invention Description () A 14 good 75 to 85 nm. * The organic light-emitting layer can be deposited on the layered metal chalcogenide hole transport layer using any method suitable for depositing such an organic layer. Since the layered metal chalcogenide is insoluble in the organic solvent, it is particularly spin-coated from the organic light-emitting material solution. It is suitable for use in this project (for example, refer to WO-A-90/13148). The electroluminescent device of the present invention typically has a substrate (e.g., glass), a hole injecting electrode (e.g., ITO), a layered metal chalcogenide hole transport layer, an organic light emitting layer (e.g., polyfluorene), and an electron injecting electrode (e.g., Stack configuration of Ca/Al). In addition, the device has a reverse stacking configuration of a substrate, an electron injecting electrode, an organic light emitting layer, a layered metal chalcogenide hole transport layer, and a hole injecting electrode. Any suitable technique known in the art can be used to deposit a layered metal chalcogenide hole transport layer at the anode. However, since the ultrathin film can be deposited on the anode at a low cost, it is preferable to use a chemical route. The chemical method for properly depositing layered metal dichalcogenides at the anode is based on methods developed by Frindt et al. [Ref. P. Joensen, RF Frindt and SR Morrisoii, Materials Research Bulletin 21, 457 (1986) and U.S. Patent 4,996,108] . This method involves the following steps: (a) insertion of a lithium atom into the MX2 compound; (b) addition of water to the intercalation material, resulting in the reduction of water by the lithium atom. As a result of the MX2 layer, the resulting hydrogen collapses in each layer stack (off-layer), resulting in a single layer of MX2 suspended in water; (c) adding a water-immiscible solvent to the MX2 monolayer aqueous suspension, followed by agitation of the resulting mixture, Manufacture of MX2 film, which is formed on the solvent/water boundary of this paper. It is applicable to China National Standard (CNS) Α4 specification (210><297 mm) (please read the note on the back and fill out this page)
、1T 罈 17 A7 B7 1295901 五、發明説明() 15 面;以及 (d)經濕ITO塗覆玻璃基板下端浸泡於溶劑/水界面, 結果造成MX2薄膜展開成為薄定向膜於I το表面上。MX: 薄膜係以c軸垂直於ITO塗覆基板定向。 層狀金屬硫屬化物電洞轉運層提供絕佳電洞注入電 極產生的電洞傳導路徑。若干半導性材料之層狀金屬硫屬 化物也可阻擋由發光有機層逃逸的電子至某種程度,如此 輔助平衡發光層的電子流及電洞流,以及加強其捕捉。但 阻擔電子Sb力可错 >儿積一層材料大為提升,該材料可約束 來自發光層之電子的遷移且該材料層係沉積於無機層狀金 屬硫屬化物電洞轉運層與發光有機層間。1T altar 17 A7 B7 1295901 V. Inventive Note () 15 face; and (d) Soaking the lower end of the wet ITO coated glass substrate at the solvent/water interface, resulting in the MX2 film unfolding into a thin oriented film on the surface of I το. MX: The film is oriented with the c-axis perpendicular to the ITO coated substrate. The layered metal chalcogenide hole transport layer provides a hole conduction path created by the excellent hole injection electrode. The layered metal chalcogenide of a plurality of semiconducting materials also blocks electrons escaping from the luminescent organic layer to some extent, thus assisting in balancing the electron flow and the hole flow of the luminescent layer, as well as enhancing its capture. However, the resistance of the electron Sb can be wrong. The material can be greatly enhanced. The material can restrict the migration of electrons from the light-emitting layer and the layer of the material is deposited on the inorganic layered metal chalcogenide hole transport layer and the organic light-emitting layer. Between layers.
消 費 合 作 社 印 製 如此,於本發明裝置之特佳具體實施例,提供一層材 料於有機發光層與層狀金屬硫屬化物電洞轉運層間,該層 材料可約束由有機發光層發射的電子遷移至層狀金屬硫屬 化物電洞轉運層。此種材料例如為先前技藝已知可約束來 自有機發光層之電子遷移的材料,例如金屬及類金屬之氧 化物、碳·化物、氮化物、矽化物及硼化物,其係揭示於 EP-A-10227§9及EP-A-1041654,例如通式(Sii xGex)〇y其中 OSxS 1 及 1.7SyS2.2。 但特佳用於可約束電子遷移之材料薄層為金屬硫屬 化物層之相同金屬的氧化物。金屬氧化物作為高度有效之 電子阻擋劑。、此外,金屬氧化物層的沉積極為簡單,於層 狀金屬硫屬化物層沉積於電洞注入層後,經由氧化層狀金 屬硫屬化物層暴露面形成。金屬氧化物可為化學計算量戋In a preferred embodiment of the apparatus of the present invention, a layer of material is provided between the organic light-emitting layer and the layered metal chalcogenide hole transport layer, the layer material constraining the migration of electrons emitted by the organic light-emitting layer to Layered metal chalcogenide hole transport layer. Such materials are, for example, materials known in the prior art to constrain electron migration from organic light-emitting layers, such as oxides of metals and metalloids, carbon compounds, nitrides, tellurides, and borides, which are disclosed in EP-A. -10227 § 9 and EP-A-1041654, for example, the general formula (Sii xGex) 〇 y where OSxS 1 and 1.7 SyS 2.2. However, it is particularly preferred that the thin layer of material for constraining electron transport is an oxide of the same metal of the metal chalcogenide layer. Metal oxides are highly effective electron blockers. Further, the deposition of the metal oxide layer is extremely simple, and after the layered metal chalcogenide layer is deposited on the hole injection layer, it is formed via the exposed surface of the oxide layered metal chalcogenide layer. Metal oxides can be stoichiometric
-18 1295901 A7 B7 五、發明説明( •蒋 社 印 製 16 非化學計算量;氧化物層之實際組成將依據用來製造此層 之氧化條件改變。此外,聚合物溶液濕潤金屬氧化物層遠 優於層狀金屬硫屬化物層,結果導致較少針孔及較低漏電 流(亦即較高效率)。 結合金屬氧化物(MOs)於層狀金屬硫屬化物(LMC)層 上之較佳有機電致發光裝置具有如下典型結構:玻璃 /ITO/LMC/MO/有機發光層/Ca/Al。此種裝置之製造成本 低、操作電壓低且高度有效。 電子阻擋作用金屬氧化物薄膜之沉積方法包括多種 物理及化學薄膜形成方法例如濺鍍及蒸鍍。以於氧電漿產 生器氧化層狀金屬硫屬化物層為特佳。典型氧化係於射頻 氧電漿產生器於0.3-0.5毫巴氧壓及250瓦進行。於電聚產生 器處理時間長短控制氧化物膜厚度。金屬氧化物膜之較佳 厚度係隨裝置性質決定,對裝置效果而言並無特殊限制。 但於包含1-10奈米金屬氧化物膜之裝置可達成特別有效的 電子-電洞平衡;以厚2至6奈米之金屬氧化物膜為更佳;以 及以厚2-3奈米之金屬氧化物膜為最佳。厚度小於丨奈米之 薄膜對於阻撺電子效果降低,而於厚度大於4奈米之薄膜, 於若干例中,電洞注入有機發光層較為無效。氧化速率係 依據相關LMC/MO材料及產生器的設定決定。 %、 於包括電子阻搶薄膜如層狀金屬硫屬&物層之 氧化物之裝置,有機發光層係沉積於電子阻擋薄:層上。. 因層狀金屬硫屬化物層及金屬氧化物層不 故有機發光層可藉簡單而低成本之程序,藉由溶液2塗 (cNs) A4im\ 2i〇xl^jy-18 1295901 A7 B7 V. INSTRUCTIONS (• JIANGXI PRINT 16 Non-stoichiometric quantities; the actual composition of the oxide layer will vary depending on the oxidizing conditions used to make this layer. In addition, the polymer solution wets the metal oxide layer much better than The layered metal chalcogenide layer results in fewer pinholes and lower leakage current (ie, higher efficiency). It is preferred to combine metal oxides (MOs) on the layered metal chalcogenide (LMC) layer. The electroluminescent device has the following typical structure: glass/ITO/LMC/MO/organic light-emitting layer/Ca/Al. Such device has low manufacturing cost, low operating voltage and high efficiency. Method for depositing electron blocking metal oxide film Including a variety of physical and chemical film formation methods such as sputtering and evaporation. Oxygen plasma generator oxide layered metal chalcogenide layer is particularly good. Typical oxidation is based on RF oxygen plasma generator at 0.3-0.5 mbar Oxygen pressure and 250 watts. The thickness of the oxide film is controlled by the length of the treatment time. The preferred thickness of the metal oxide film is determined by the nature of the device, and there is no special limit on the effect of the device. However, a particularly effective electron-hole balance can be achieved in a device comprising a 1-10 nm metal oxide film; a metal oxide film having a thickness of 2 to 6 nm is preferred; and a thickness of 2-3 nm is used. The metal oxide film is optimal. The film having a thickness smaller than that of 丨 nanometer has a reduced effect on the electron resistance, and in the film having a thickness of more than 4 nm, in some cases, the injection of the hole into the organic light-emitting layer is ineffective. Determined according to the relevant LMC/MO material and generator settings. %, in an apparatus comprising an electron blocking film such as an oxide of a layered metal chalcogenide layer, the organic light-emitting layer is deposited on the electron blocking thin: layer. Because of the layered metal chalcogenide layer and the metal oxide layer, the organic light-emitting layer can be coated by solution 2 (cNs) by a simple and low-cost procedure (A): A4im\ 2i〇xl^jy
(請先閲讀背面之注意事項再填寫本頁) 19 1295901 A7 B7 五、發明説明( 17 至無機層上沉積。 * 某些裝置中’「電子轉運」層也設置於電子注入層與 發光層間(例如適當化合物包括具有功函數高達4 eV之鹼 金屬、驗土金屬及鑭系元素氧化物,例如揭示於 EP-A-1009045)。此種化合物輔助電子注入發光層,由電子 注入層穩定轉運電子,以及阻擋電洞。此等層可有效增加 進入發光層之電子數目。特佳為氧化鳃、氧化鎂、氧化鈣、 氧化鋰、氧化錄I、氧化鉀、氧化鈉及氧化鉋。電子轉運層 厚度係依據其包含之材料決定,典型厚度為〇1至2奈米及 較好0.3至0.8奈米。 其上可形成本發明之有機電致發光裝置之基板可為 任一種典型用於此種裝置之基板,例如包括玻璃、石英及 Si,GaAs ’ ZnSe,ZnS,GaP及InP之結晶基板。其中以玻 璃基板為特佳。 賓洞注入電極可由任一種典型用於電致發光裝置用 於此項用途之材料製成。適當材料例如包括錫攙雜銦氧化 物(ITO)、·鋅攙雜錮氧化物(120)、氧化銦、氧化錫及氧化 鋅’其中以?το為特佳。電洞注入電極厚度將隨電洞注入 材料以及電致發光裝置之其它組成分改變。電極之典型厚 度為50至500奈米及特別50至300奈米。 電子注入電極可由典型用於電致發光裝置用於此項 目的之任一種材料組成。適當材料例如包括低功函數金屬 例如钟、裡、鈉、鎂、鑭、飾、#5、錄、鋇、鋁、銀、銦、 錫、鋅及錄以及含有此等金屬之二元或三元合金。其中以 本紙張尺度適用中國國家標準(C.NS ) Α4規格(210Χ297公釐) (請先閲讀背面之注意事項再填寫本頁) 、π 20 181295901 A7 B7 經 |1 產 局1 工 消 費 合 作 社 印 製 五、發明説明( 銘及辑連續層以及含丨至聰重量㉝合金為佳。 電子注入電極厚度將隨電手注人材料以及電致發光裝置之 其它組成分改變。典型電極厚度為01至5〇〇奈米且較好至 少1奈米。 本發明之典型有機電致發光裝置包括無機層狀金屬 硫屬化物電洞轉運層、無機金屬氧化物電子阻擋層、以及 夾置於陰極與陽極間之有機發光層。此等裝置製造成本 低,原因在於沉積各層需要的處理簡單,大部分層狀金屬 硫屬化物價廉易得。特別上述全化學廉價裝置處理技術可 長:供谷易製備且低成本裝置。本發明之電致發光裝置高度 有效,與某些裝置之電源效率大於10流明/瓦,顯然明亮, 某些裝置具有6伏特之亮度高於60,000燭光/平方米。混成 有機/無機裝置具有材料及無機材料之優點,本發明裝置之 卓越特性證實有機/無機協同增效作用。 發明之簡要說明 參照附圖考慮下列實例將進一步暸解本發明,附圖 中: ·’ 第1圖顯·示2H-MoS2之原子結構; 第2圖顯示根據本發明之電致發光裝置具有層狀金屬 二硫屬化物電洞轉運層之示意代表圖; 第3 ^ 5圖顯示根據本發明之玻璃/it〇/]V[s2/F8BT.: TFB/Ca/Al裝置之I-V-L作圖; 第6圖顯示根據本發明之電致發光裝置之示意代表 圖,該裝置有一層狀金屬二硫屬化物電洞轉運層及一金屬 (請先閲讀背面之注意事項再填寫本頁)(Please read the note on the back and fill out this page) 19 1295901 A7 B7 V. INSTRUCTIONS (17 deposited on the inorganic layer. * In some devices, the 'electron transport' layer is also placed between the electron injection layer and the light-emitting layer ( Suitable compounds, for example, include alkali metals, earth-suppressing metals and lanthanide oxides having a work function of up to 4 eV, as disclosed, for example, in EP-A-1009045. This compound assists electron injection into the luminescent layer and stably transports electrons from the electron-injecting layer. And blocking the holes. These layers can effectively increase the number of electrons entering the luminescent layer. Particularly preferred are cerium oxide, magnesium oxide, calcium oxide, lithium oxide, oxide I, potassium oxide, sodium oxide and oxidized planing. The thickness is determined according to the material it contains, and the typical thickness is from 1 to 2 nm and preferably from 0.3 to 0.8 nm. The substrate on which the organic electroluminescent device of the present invention can be formed can be any of the typical ones used in this type. The substrate of the device includes, for example, a crystal substrate of glass, quartz, and Si, GaAs 'ZnSe, ZnS, GaP, and InP. Among them, a glass substrate is particularly preferable. A material for use in electroluminescent devices for this purpose. Suitable materials include, for example, tin-doped indium oxide (ITO), zinc-doped lanthanum oxide (120), indium oxide, tin oxide, and zinc oxide. ?το is particularly good. The thickness of the hole injection electrode will vary with the hole injection material and other components of the electroluminescent device. The typical thickness of the electrode is 50 to 500 nm and especially 50 to 300 nm. The electron injection electrode can be Typically used in electroluminescent devices for any of the materials used in this project. Suitable materials include, for example, low work function metals such as clocks, linings, sodium, magnesium, strontium, garnish, #5, 钡, 钡, aluminum, silver, Indium, tin, zinc and recorded and binary or ternary alloys containing these metals. Among them, the Chinese National Standard (C.NS) Α4 specification (210Χ297 mm) is applied to the paper scale (please read the precautions on the back) Fill in this page), π 20 181295901 A7 B7 by |1 Production Bureau 1 Consumer Cooperatives Printing 5, invention description (Ming and series continuous layer and containing 丨 to Cong weight 33 alloy is better. Electron injection electrode thickness will be with electricity The injection material and other components of the electroluminescent device vary. A typical electrode thickness is from 01 to 5 nanometers and preferably at least one nanometer. A typical organic electroluminescent device of the invention comprises an inorganic layered metal chalcogenide. a hole transport layer, an inorganic metal oxide electron blocking layer, and an organic light-emitting layer sandwiched between the cathode and the anode. These devices are inexpensive to manufacture because the processing required for depositing the layers is simple, and most of the layered metal chalcogenide It is cheap and easy to obtain. In particular, the above-mentioned all-chemical cheap device processing technology can be long: easy to prepare and low-cost devices. The electroluminescent device of the present invention is highly effective, and the power efficiency of some devices is greater than 10 lm/W, which is obviously bright. Some devices have a brightness of 6 volts above 60,000 candelas per square meter. The mixed organic/inorganic device has the advantages of materials and inorganic materials, and the superior characteristics of the device of the present invention confirm the synergistic effect of organic/inorganic. BRIEF DESCRIPTION OF THE DRAWINGS The invention will be further understood by considering the following examples in which: FIG. 1 shows the atomic structure of 2H-MoS2; FIG. 2 shows the electroluminescent device according to the invention having a layered shape Schematic representation of a metal dichalcogenide hole transport layer; Figure 3-5 shows an IVL plot of a glass/it〇/]V[s2/F8BT.: TFB/Ca/Al device according to the present invention; The figure shows a schematic representation of an electroluminescent device according to the present invention having a layered metal dichalcogenide hole transport layer and a metal (please read the back of the back sheet and fill out this page)
,1T -21 1295901 at B7 五、發明説明() , 19 氧化物電子阻擋層;’ 第7圖顯示根據本發明之玻璃/IT0/NbSe2/Nb205/F8BT: FB/Ca/Al裝置之I-V-L作圖; 第8圖顯示根據本發明之玻璃/IT0/NbSe2/Nb205/F8BT: .TFB/Ca/Al裝置之電源及發光效率光譜; 第9圖顯示根據本發明之玻璃/ITO/MoS2/Mo03/F8BT: TFB/Ca/Al裝置之I-V-L作圖; 第10圖顯示根據本發明之玻璃/ITO/MoS2/Mo03/F8BT: TFB/Ca/Al裝置之電源及發光效率作圖; 第11圖顯示根據本發明之玻璃/IT0/TaS2/Ta203/F8BT: TFB/Ca/Al裝置之I-V-L作圖; 第12圖顯示根據本發明之玻璃/ITO/TaS2/Mo03/F8BT: TFB/Ca/Al裝置之電源及發光效率作圖。 經濟部口央蒙"^工消費合作社印製 智慧財產局 (請先閲讀背面之注意事項再填寫本頁) 首先說明基板/電洞注入層/層狀金屬硫屬化物電洞轉 運層結構之製造方法,然後說明基於此種結構製造兩類交 替類型肴機電致發光裝置,一者於層狀金屬硫屬化物與有 機發光層'間帶有金屬氧化物層,而另一型則否。實例中, 使用之層狀拿屬硫屬化物皆為層狀金屬二硫屬化物。 鋰插入、剝離及薄膜形成: 插入 正丁基鋰(Bu-Li)於己烷溶液用於將鋰原子插入層狀 金屬二硫屬化物化合物。典型反應中,0.5克市售層狀金屬 二硫屬化物(MX2)粉末於氬下於無水席朗克器皿於1.6M正 丁基鐘於己烧浸泡3曰,其處理程序係基於D.W. Murphy, 本紙張尺度適用中國國家標準(cns ) A4規格(210X297公釐) "~" Γ -22 - 經濟部T央蒙工消費合作社印製 智慧財產局 1295901 at B7 五、發明説明() 20 F.J. Di Salvo, G.W. Hull Jr.及 J.V· Waszczak,無機化學 15, 17 (1976)之揭示。插入反應如後: yBu-Li+MX2------>LiyMX2+(y/2)C8H18 產物LiyMX2於無水己烷洗滌,以真空脫水,然後轉送 儲存至手套箱。插入化合物中,鋰原子係位於MX2層間之 凡得瓦爾間隙[參考R.H. Friend及A.D. Yoffe,先進物理學 36, 1 (1987)]。 剝離 使用方法係基於 P· Joensen,R.F. Friendt 及 S.R· Morrison,材料研究公報,21,457 (1986)及美國專利 4,996,108所述。小瓶於手套箱内載荷15-20毫克前述插入步 驟製造的LiyMX2然後取出。即刻加入5-10毫升去離子水, 將溶液經超音波振盪處理(典型為1小時)。玻璃反應進行如 後·, 1T -21 1295901 at B7 V. Inventive Note (), 19 Oxide Electronic Barrier Layer; 'Figure 7 shows the glass/IT0/NbSe2/Nb205/F8BT: FB/Ca/Al device IVL mapping according to the present invention Figure 8 shows the power supply and luminous efficiency spectrum of the glass/IT0/NbSe2/Nb205/F8BT: .TFB/Ca/Al device according to the present invention; Figure 9 shows the glass/ITO/MoS2/Mo03/F8BT according to the present invention; : IVL plot of TFB/Ca/Al device; Figure 10 shows power supply and luminous efficiency of glass/ITO/MoS2/Mo03/F8BT: TFB/Ca/Al device according to the present invention; Figure 11 shows Invention of the glass / IT0 / TaS2 / Ta203 / F8BT: IVL drawing of the TFB / Ca / Al device; Figure 12 shows the glass / ITO / TaS2 / Mo03 / F8BT: TFB / Ca / Al device power supply according to the present invention Luminous efficiency mapping. The Ministry of Economic Affairs, the Central Government, and the Consumers' Cooperatives, Printed the Intellectual Property Office (please read the notes on the back and fill out this page). First, explain the structure of the substrate/hole injection layer/layered metal chalcogenide hole transport layer. The manufacturing method then illustrates the fabrication of two types of alternating type electroluminescent devices based on such a structure, one with a metal oxide layer between the layered metal chalcogenide and the organic light-emitting layer and the other type. In the examples, the layered chalcogenides used are all layered metal dichalcogenides. Lithium insertion, peeling, and film formation: Insertion of n-butyllithium (Bu-Li) in a hexane solution for inserting lithium atoms into the layered metal dichalcogenide compound. In a typical reaction, 0.5 g of commercially available layered metal dichalcogenide (MX2) powder was immersed in a dry Schlank vessel at 1.6 M n-butyl clock under argon for 3 Torr. The treatment procedure was based on DW Murphy. This paper scale applies Chinese national standard (cns) A4 specification (210X297 mm) "~" Γ -22 - Ministry of Economic Affairs T Central Mongolian Consumer Cooperatives Printed Intellectual Property Bureau 1295901 at B7 V. Inventions () 20 FJ Di Salvo, GW Hull Jr. and JV Waszczak, Revelation of Inorganic Chemistry 15, 17 (1976). The insertion reaction was as follows: yBu-Li+MX2------> LiyMX2+(y/2)C8H18 The product LiyMX2 was washed with anhydrous hexane, dehydrated under vacuum, and then transferred to a glove box. In the intercalation compound, the lithium atom is located in the van der Waals gap between the MX2 layers [Ref. R. H. Friend and A. D. Yoffe, Advanced Physics 36, 1 (1987)]. Peeling methods of use are based on P. Joensen, R. F. Friendt and S. R. Morrison, Materials Research Bulletin, 21, 457 (1986) and U.S. Patent 4,996,108. The vial was loaded with 15-20 mg of the LiyMX 2 manufactured by the aforementioned insertion step in a glove box and then taken out. Immediately add 5-10 ml of deionized water and subject the solution to ultrasonic vibration (typically 1 hour). The glass reaction proceeds as follows
LiyMX2+H20------> yLiOH+(y/2)H2+MX2 於Mx2層間逸出的氫氣破壞層堆疊,產生mx2單層 (SL),單層懸浮於水。SL懸浮液經離心,沉澱物經洗滌/ 攪動以及再度離心至上清液之pH降至7,指示無氫氧化鋰 留在沉積物為止。 薄膜形成: 使用之方法係基於P· Joensen,R.F. Frindt及S.R.· Morrison,材料研究公報21,457 (1986)及美國專利 4,996,108所述。3毫升去離子水添加至SL沉澱物,懸浮液. 經超音波處理數分鐘。然後2-3毫升二甲苯或甲苯添加至經 本紙張尺度適用中國國家標準(CNS ) A4規格(210X:297公釐) (請先閱讀背面之注意事項再填寫本頁)LiyMX2+H20------> yLiOH+(y/2)H2+MX2 stacks hydrogen depletion layers that escape between the Mx2 layers, producing a mx2 monolayer (SL) with a single layer suspended in water. The SL suspension was centrifuged and the precipitate was washed/stirred and re-centrifuged until the pH of the supernatant dropped to 7, indicating that no lithium hydroxide remained in the deposit. Film formation: The method used is based on P. Joensen, R. F. Frindt and S. R. Morrison, Materials Research Bulletin 21, 457 (1986) and U.S. Patent 4,996,108. Add 3 ml of deionized water to the SL precipitate, suspension. Ultrasonic treatment for a few minutes. Then add 2-3 ml of xylene or toluene to the Chinese National Standard (CNS) A4 specification (210X: 297 mm) according to the paper scale (please read the notes on the back and fill out this page)
23 1295901 at ________B7 五、發明説明() -: 21 超音波處理S L懸浮液。>谷劑未混合’無機材料係於水相(下 相)。一旦振搖小瓶,MX?薄膜生長於水與有機溶劑間之界 面,也爬上小瓶壁。須注意某些情況下,依據使用之材料 性質以及期望之薄膜類型決定,可於溶劑添加後而於振搖 前進行超音波處理。濕的乾淨且經氧電漿處理之ITO塗覆 玻璃基板(例如於WO-A-90/13148所述製備;第2及6圖之 1 ’ 2)隨後浸潰於界面。MX2薄膜(第2及6圖之3)於界面展開 於基板上。薄膜厚度係藉SL懸浮液濃度控制,典型厚4_7 奈米[藉AFM(原子力光譜術)及xpS (X光光電子光譜術)測 量決定]。 裝置結構 有機發光材料薄膜可使用適合用於此項目的之任一 種技術塗覆於如前述製備之無機層表面上。以由聚合物於 有機溶劑溶液旋塗(例如揭示於W〇_A-90/13 148)為特佳。下 列貝句中,聚(2,7-(9,9-二-正辛基荞)-(ι,4-伸苯基_(4·第二 丁基苯基)亞胺)-1,4-伸苯基))(「TFB」)與聚(2,7-(9,9_二_ 正辛基第·)-3;6-苯并噻二唑)(「F8BT」)之聚荞攙合物 [F8BT.TFB (3:1)]於二甲苯於15亳克/毫升濃度旋塗於如前 述製造之經塗覆基板無機層上(旋塗係於2500 rpm進行6〇 秒,採用漸進加速來達成最終轉速)獲得75-80奈米薄膜厚 度(第2及6圖之4)。 為了完成裝置,然後沉積電子注入層於如前述沉積於 電’同轉移層之有機發光薄膜上表面。任一種適合用作為電 子注入材料之材料皆可使用,此等材料之實例及其沉積手 1295901 工消費合作社印製 智慧財產局 A7 B7 五、發明説明() , 22 段列舉如前。本例中·,首先藉由於小於8χ1(Γ6毫巴蒸鍍而 沉積鈣層(第2及6圖之5)於聚合物薄膜表面上,接著於其上 於小於5x10_6毫巴壓力蒸鍍鋁層(第2及6圖之6)。 實例中製造兩組裝置。 第一組裝置中,二硫化鉬、二硒化鈮、或二硫化钽如 第2圖所示(未照比例繪製)於沉積聚合物層前(換言之金屬 二硫屬化物層與聚合物層間不含氧化物層)沉積於ITO層上 作為電洞轉移層。此外,用於各金屬二硫屬化物也製造裝 置,其中金屬二硫屬化物層(係於1〇_5毫巴壓力及230-240 °C溫度經歷10小時)於聚合物層之前沉積。如此用來研究金 屬二硫屬化物薄膜退火對裝置性能的影響。 對各批裝置也製備對照裝置其結構為:玻璃 /ITO/PEDOT:PSS/F8BT:TFB/Ca/Al俾便與先前技藝裝置比 對裝置性能。I-V-L作圖顯示於第3至5圖共6裝置(3種材 料,退火以及未經退火),資料可由下表1列舉之資料導出。 表1 μχ2材料· , 於6伏特之電流密度 (毫安培/平方厘米) 於6伏特之亮度 (燭光/平方米) TaS2未經退火 68 1.4 TaS2退火 250 7.0 MoS2未經退火 2660 110 MoS2退火 2140 300 NbS2未經退火 590 120 NbS2退火 、 2440 490 PEDOT-PSS 1500 60000 第2圖所示裝置結構帶有MX2作為電洞轉運層之效能 L適用中國國家標準(CNS ) A4規格(210 X 297公釐) ' ' ' 25 - (請先閲讀背面之注意事項再填寫本頁)23 1295901 at ________B7 V. INSTRUCTIONS () -: 21 Ultrasonic treatment of S L suspension. > The granules are not mixed. The inorganic material is in the aqueous phase (lower phase). Once the vial is shaken, the MX® film grows between the water and the organic solvent and climbs onto the vial wall. It should be noted that in some cases, depending on the nature of the material used and the type of film desired, ultrasonic treatment can be performed after the solvent is added and before shaking. A wet, clean and oxygen plasma treated ITO coated glass substrate (e.g., as described in WO-A-90/13148; Figs. 2 and 6 1 '2) was subsequently impregnated at the interface. The MX2 film (Fig. 2 and Fig. 3) is spread on the substrate at the interface. Film thickness is controlled by SL suspension concentration, typically 4-7 nm thick [determined by AFM (atomic force spectroscopy) and xpS (X-ray photoelectron spectroscopy) measurements]. Device Structure An organic light-emitting material film can be applied to the surface of the inorganic layer prepared as described above using any of the techniques suitable for use in this project. It is particularly preferred to spin-coat a polymer in an organic solvent solution (for example, as disclosed in W〇_A-90/13 148). In the following Baye, poly(2,7-(9,9-di-n-octylfluorene)-(ι,4-phenylene-(4.t-butylphenyl)imide)-1,4-stretch Phenyl)) ("TFB") and poly(2,7-(9,9-di-n-octyl)-3)6-benzothiadiazole) ("F8BT") The material [F8BT.TFB (3:1)] was spin-coated on the inorganic layer of the coated substrate as described above at a concentration of 15 g/ml (rotary coating was applied at 2500 rpm for 6 sec, using progressive acceleration). To achieve the final speed) to obtain a film thickness of 75-80 nm (4 of Figures 2 and 6). In order to complete the device, an electron injecting layer is then deposited on the upper surface of the organic light-emitting film deposited on the electrical & transfer layer as previously described. Any material suitable for use as an electron injecting material can be used. Examples of such materials and their deposition hands 1295901 Industrial Consumer Cooperatives Printing Intellectual Property Office A7 B7 V. Invention Description (), paragraph 22 is listed as before. In this case, first, a layer of calcium (5th of Figs. 2 and 6) is deposited on the surface of the polymer film by evaporation of less than 8 χ1 (Γ6 mbar evaporation, followed by evaporation of the aluminum layer at a pressure of less than 5 x 10_6 mbar. (6 of Figures 2 and 6). In the example, two sets of devices were fabricated. In the first set of devices, molybdenum disulfide, antimony diselenide, or antimony disulfide is shown in Figure 2 (not drawn to scale) for deposition. Before the polymer layer (in other words, the metal dichalcogenide layer and the polymer layer do not contain an oxide layer) are deposited on the ITO layer as a hole transfer layer. In addition, a device for manufacturing each metal dichalcogenide is also used, wherein the metal II The chalcogenide layer (which was subjected to a pressure of 1 〇 5 mbar and a temperature of 230-240 ° C for 10 hours) was deposited before the polymer layer. This was used to investigate the effect of metal disulfide film annealing on device performance. Each batch of devices was also prepared as a control device having the following structure: glass/ITO/PEDOT:PSS/F8BT: TFB/Ca/Al俾 to compare device performance with prior art devices. IVL plots are shown in Figures 3 to 5 for a total of 6 devices. (3 materials, annealed and unannealed), data can be listed in Table 1 below Table 1 μχ2 material · , current density at 6 volts (milliamps per square centimeter) at 6 volts brightness (candles per square meter) TaS2 unannealed 68 1.4 TaS2 annealing 250 7.0 MoS2 unannealed 2660 110 MoS2 annealing 2140 300 NbS2 unannealed 590 120 NbS2 annealed, 2440 490 PEDOT-PSS 1500 60000 The structure shown in Figure 2 with MX2 as a hole transport layer L is applicable to China National Standard (CNS) A4 specification (210 X 297厘) ' ' ' 25 - (Please read the notes on the back and fill out this page)
1295901 A7 ______ B7 五、發明説明() 23 對二硫化鈕(TaS2)獲得之低電流奋度及亮度值可能係 由於對XPS及AFM測量值觀察得薄膜之非連續性所致。具 有經退火之二硫化鉬(MoS2)層裝置比較未經退火的薄膜觀 察得之電流密度較低,原因在於當材料退火時出現金屬相 變遷成為半導體相[參考J.A· Wilson及A.D. Yoffe,先進物 理18,193 (1969)]。於各例中可見退火導致裝置亮度的改 進。 於第二組裝置,金屬二硫屬化物層於25〇瓦使用氧電 黎處理1、5、10或20分鐘。如此導致金屬二硫屬化物層表 面形成薄金屬氧化物膜(第6圖之7)。氧電漿處理時間愈 長,則產生的金屬氧化物層愈厚。如前文說明,希望如此 可改進電子捕捉性質,增加電子保留於發光聚合物層,因 而提高亮度。以二硫化鉬為例,氧化物層組成為M〇〇3 ;而 以二硫化鈕及二硒化鈮為例,藉XPS測量測定氧化物組成 為Ta2〇5及Nb2〇5。至於第一組裝置,對各個mx2/MO組合, 產生額外裝置,其中金屬二硫屬化物層經退火。裝置結構 顯示於第6圖(未照比例繪製)。1295901 A7 ______ B7 V. INSTRUCTIONS () 23 The low current and brightness values obtained for the disulfide button (TaS2) may be due to the discontinuity of the film observed for the XPS and AFM measurements. Compared with the unannealed film, the annealed molybdenum disulfide (MoS2) layer device has a lower current density because the metal phase changes to a semiconductor phase when the material is annealed [Ref. JA· Wilson and AD Yoffe, Advanced Physics 18, 193 (1969)]. Annealing can be seen in each case to result in improved brightness of the device. In the second set of devices, the metal dichalcogenide layer was treated with oxygen, at 25 watts for 1, 5, 10 or 20 minutes. This results in the formation of a thin metal oxide film on the surface of the metal dichalcogenide layer (Fig. 6-7). The longer the oxygen plasma treatment time, the thicker the metal oxide layer produced. As explained above, it is desirable to improve the electron trapping property, increase the retention of electrons in the luminescent polymer layer, and thereby increase the brightness. Taking molybdenum disulfide as an example, the oxide layer composition is M〇〇3; and the disulfide button and the bismuth selenide are used as an example, and the oxide compositions are determined by XPS measurement to be Ta2〇5 and Nb2〇5. As for the first set of devices, for each mx2/MO combination, an additional device is created in which the metal dichalcogenide layer is annealed. The structure of the device is shown in Figure 6 (not drawn to scale).
消 費 合 作 社 印 發明人梦現電聚處理前金屬二硫屬化物層退火,電衆 處理時間長度影響裝置性能。選定的I_V_L以及功率範圍於 第7-12圖作圖(第7及8圖顯示以銳為主之裝置結果,第9及 10圖顯示以鉬為主之裝置結果以及第11及12圖顯示以鈕為 主之裝置結果)。由此等曲線圖所得資料顯示於下表2。 26 1295901 A7The inventor of the Consumers Co., Ltd. invented the metal disulfide layer annealing before the electropolymerization treatment, and the length of the electricity processing time affected the performance of the device. The selected I_V_L and power range are plotted in Figures 7-12 (Figures 7 and 8 show sharp-based device results, Figures 9 and 10 show molybdenum-based device results, and Figures 11 and 12 show Button-based device results). The data obtained from this graph is shown in Table 2 below. 26 1295901 A7
B 五、發明説明() 24 表2 經濟部口未蒙工消費合作社印製 智慧財產局 張 紙 本 於 250〇C 氧電漿 於6伏特 於6伏特亮度 電源效率 發光效率 退火mx2 分鐘 電流密度 毫安培/ 平方厘米 燭光/平方米 流明/瓦 燭光/安培 NbSe2 否 5 1400 23000 (31500於 5.7 伏特) 7.9於2.8伏特7.8於3.4伏特 NbSe2 否 10 3300 24000 (30000於 5.1 伏特) 9於2.6伏特7.6於2.6伏特 NbSe2 否 20 1200 27500 7.5於2.7伏特7於3.2伏特 NbSe2 是 5 500 24000 7.2於3.0伏特.7.5於3.7伏特 NbSe2 是 10 2550 48000 於5.5伏特飽和 6.8於2.8伏特6.3於3.1伏特 NbSe2 是 20 1100 20000 5.7於2.5伏特8於2.5伏特 MoS2 否 1 750 31000 9.4於2.4伏特8.4於2.7伏特 MoS2 否 5 2300 58000 於6.0伏特飽和 5.9於2.8伏特5.4於2_8伏特 MoS2 .否 10 3000 56000 於5.5伏特飽和 7於2.7伏特 6於2.7伏特 MoS2 否 20 1000 40000 7於2.4伏特 6於2.8伏特 MoS2 是 1 1600 40000 於5.6伏特飽和 9.5於2.5伏特7.5於2.5伏特 MoS2 、是 5 2000 50000 於5.7伏特飽和 7.5於2.6伏特6.5於2.6伏特 MoS2 * / 是 10 700 20000 10於2.6伏特8於2.6伏特 MoS2 是· 20 1900 53000 9.5於2.4伏特7.7於2.9伏特 TaS2 否 10 1400 23000 (31500 於5.7伏特飽和) 10於2.6伏特1.5於2.8伏特 TaS2 是 10 3300 24000 (30000 於5.1伏特飽和) 3.2於2.5伏特4.5於3.3伏特 對照裝置 PEDOT 1400 61000 10.5於2.4伏特9.4於2.9½寺 帶有MX2作為電,洞轉運層以及對應金屬氧化物作為電 子阻擋層之裝置結構之LED效能儘管實際上注入層及阻擋層厚度以及攙合物組成並 準 標 家 國 國 中 用 適 遵 公 7 9 · 2 27 (請先閲讀背面之注意事項再填寫本頁)B V. INSTRUCTIONS () 24 Table 2 The Ministry of Economic Affairs is not covered by the consumer cooperatives. The printed intellectual property bureau sheet is at 250〇C. The oxygen plasma is 6 volts at 6 volts. The power efficiency is luminous efficiency, the annealing efficiency is mx2 minutes, and the current density is Ampere / square centimeter candle / square meter lumen / watt candle / ampere NbSe2 no 5 1400 23000 (31500 at 5.7 volts) 7.9 at 2.8 volts 7.8 at 3.4 volts NbSe2 no 10 3300 24000 (30000 at 5.1 volts) 9 at 2.6 volts 7.6 at 2.6 volts NbSe2 No 20 1200 27500 7.5 at 2.7 volts 7 at 3.2 volts NbSe2 is 5 500 24000 7.2 at 3.0 volts. 7.5 at 3.7 volts NbSe2 is 10 2550 48000 at 5.5 volts saturation 6.8 at 2.8 volts 6.3 at 3.1 volts NbSe2 is 20 1100 20000 5.7 at 2.5 volts at 8 volts 2.5 volts MoS2 no 1 750 31000 9.4 at 2.4 volts 8.4 at 2.7 volts MoS2 no 5 2300 58000 at 6.0 volts saturation 5.9 at 2.8 volts 5.4 at 2_8 volts MoS2. No 10 3000 56000 at 5.5 volts saturation 7 At 2.7 volts 6 to 2.7 volts MoS2 no 20 1000 40000 7 at 2.4 volts 6 to 2.8 volts MoS2 is 1 1600 40000 at 5.6 volts saturation 9.5 at 2.5 volts 7.5 at 2.5 volts M oS2, is 5 2000 50000 at 5.7 volts saturation 7.5 at 2.6 volts 6.5 at 2.6 volts MoS2 * / is 10 700 20000 10 at 2.6 volts 8 at 2.6 volts MoS2 is · 20 1900 53000 9.5 at 2.4 volts 7.7 at 2.9 volts TaS2 No 10 1400 23000 (31500 is saturated at 5.7 volts) 10 at 2.6 volts 1.5 at 2.8 volts TaS2 is 10 3300 24000 (30000 at 5.1 volts saturation) 3.2 at 2.5 volts 4.5 at 3.3 volts Control device PEDOT 1400 61000 10.5 at 2.4 volts 9.4 at 2.91⁄2 The temple has MX2 as the electricity, the hole transport layer and the corresponding LED oxide as the electron blocking layer of the device structure of the LED performance, although the thickness of the injection layer and the barrier layer as well as the composition of the composition of the compound and the standard country 9 · 2 27 (Please read the notes on the back and fill out this page)
、1T 25 1295901 五、發明説明( 非最理想化,但由前文可知,裝置具有極高發光效率及電 源效率。重要地須指出未曾作壽命及安定性測量。但因金 屬硫屬化物及對應金屬氧化物於高溫(大於75〇t:)安定, 預期此等裝置合理安定且使用壽命長。 總結而言,前述結果顯示層狀金屬硫屬化物具有若干 重要特性’讓層狀金屬硫屬化物變成用於有機電致發光篆 置之電洞轉運層高度有展望的材料: ^ I·功函數局 π·化學(溶液)處理容易 ΠΙ.可連續形成超薄膜 IV·可單純轉成對應絕緣氧化物 V·於高溫安定 VI.化學惰性 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部口央蒙工消費合作社印製 智慧財產局 1295901 A7 B7 五、發明説明() 26 元件標號對照 1.. .玻璃基板 2.. .電洞注入電極 3.. .層狀金屬硫屬化物層 4.. .有機發光層 5-6...電子注入電極 7.. .金屬氧化物薄膜 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)1T 25 1295901 V. INSTRUCTIONS (not idealized, but as can be seen from the foregoing, the device has extremely high luminous efficiency and power efficiency. It is important to note that life and stability measurements have not been made. However, due to metal chalcogenides and corresponding metals Oxides are stable at high temperatures (greater than 75 〇t:), and it is expected that these devices will be reasonably stable and have a long service life. In summary, the foregoing results show that the layered metal chalcogenide has several important properties 'to make the layered metal chalcogenide The hole transport layer used for organic electroluminescence is highly prospective: ^ I·Work function π·Chemical (solution) treatment is easy to ΠΙ. Continuous formation of ultra-thin film IV· can be simply converted into corresponding insulating oxide V·High temperature stability VI. Chemical inertness This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) Ministry of Economic Affairs Central Government Mongolian Consumer Cooperatives Printed Intellectual Property Bureau 1295901 A7 B7 V. Invention Description () 26 Components Label comparison 1... Glass substrate 2. Hole injection electrode 3.. Layered metal chalcogenide layer 4. Organic light-emitting layer 5-6... Electron injection electrode 7.. Oxide film This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill out this page)
2929
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