1295200 九、發明說明： 【發明所屬之技術領域】 本發明係關於-種多功能生物晶片及醫療工具乾式清洗及表面處理 機，特別是指-種㈣溫臭紐流進行待處職之清潔，並結合氣相化學 沈積法糸統對待處理物進行活化作用之多功能生物晶片及，療工具乾式清 洗及表面處理機。 【先前技術】 生物晶片的體積小、反應快速並城夠平行分析大量生物資訊，因此 適用於生倾理、讀、缝、峨嫩碰糊耻，但生物晶 :的使用”餘’不祕存’且不同批次的日日日片品質不―，不同實驗亦 而要不问活性(act卿)的晶片，若自行在實驗室自製晶片雖可控制品質，但 其製=過程需要清洗及活化晶片表面«畔驟；制清理生物晶片表面 ^木物的方法可分兩種：_為濕式清理法，另—為乾式清洗法；濕式清 •法現為嫩人所_，係使w藥品㈣次浸嫩晶片，該法 而使用大量的化學_，包括有機溶劑、無機溶劑以及強酸紐溶液，不 7易製造環境污染，在操作時亦料產生毒物㈣，此外，更有回收廢 =學溶咖擾’·再者，生物晶片崎洗_高的清潔度，濕式清理 法磁到達如此高的要求，亦讓使用者非常困擾。 為乾式β洗法，這歸洗法最常見的有兩種：-為電漿 处理法’另—為制料線清洗，這兩種清洗方法常在半導體製程上 1295200 或TFT玻璃基板的清洗，效果卓著；然而，上述兩種清洗方法所使用之儀 0設俩具有價格昂貴、設備複雜、雜Μ，觀者往往必縣受訓後 才可操作’增加成本及浪費時間等缺點，例如：一台小型電聚處理機的生 ，產成本很高，其減往往超過三萬美金，而且還需要真空設絲支援，所 ，以-直無法成為廉！賈儀益被一般實驗室、檢驗所及醫院廣泛使用；此外， 最重要的是這兩種清洗法均存在嚴重的清洗死角問題，在半導體製程上或 籲TFT玻璃基板的清洗均為簡單的平面清洗，但醫療工具如手術刀等須要多 面清洗的物件，«清洗器及紫外線清洗機均很難克服該問題，尤其紫外 線清洗法的紫外線燈管需在高溫的搶體内運作，燈管的壽命減少而且容易 發生危險。 臭氧所具有的高氧化能力大多細麵毒上，若使用在清洗方面，最 普遍的方法是制魏水’臭氧水的細在铸體料非常普遍，但在生 物晶片的清洗上，光是使用臭氧水是無法達到生物晶片清洗的要求’因為 鲁生物晶片清洗的乾淨度最後需達到奈米級，而臭氧水溶液的雜質含量過 高，即使個狀吹淨，殘餘物質還是討能留在物體表面，因此無法使 用臭氧水作為生物晶片最後清洗的步驟。 由此可見’上述制物品仍有諸多缺失，實非_良善之料者，而亟 待加以改良。 核發日狀驗上述制清洗及表面處觀柄触的各項缺點，乃 —亟思加以改良創新’並經多年苦心孤諸潛心研究後，終於成功研發完成本 件多功能生物晶片及醫療工具乾式清洗及表面處理機。 6 1295200 '【發明内容】 • 本發明之目的即在於提供一種多功能生物晶片及醫療工具乾式清洗及 表面處理機，係以高溫臭氧汽流作為清缸具，以提供—價格低廉、操作 ·-簡單、容易維護、體積輕巧之生物晶片及醫療工具乾式清洗機。 * 本發明之次—目的係在於提供—鮮雜生物⑼及醫紅具乾式清 洗及表面處理機’除了清洗作用之外，本機可再加上氣相化學沈積裝置， 鲁以作為生物晶片的表面能量處理，進而控制生物晶片表面的親水或疏水 性可以使生物曰曰片的生產在單一低價位的機器内完成，減少大量生產步 驟’節«間及空間’且晶片的活性可以完全控制。 本發明之另-目的係在於提供—種多功能生物晶片及醫療卫具乾式清 洗及表面處理機，除了清洗作狀外，本機也能使物體表面的性質改變， 而作出驗«處理_麵處職果，因此本清洗齡也可用在金屬材 料表面處理’或使用於鏡#鑛前的活化表面卫作，而使所鑛膜的附著力 Φ 纟村作為植人性金屬支架的表面處理，以延長支架壽命，或使金屬 飾品表面變色以增加其附加價值。 理可達成上述伽目.多功能生物晶片及醫療工具乾式清洗及表面處 理機’具有清洗、氣概學沈積活化及《處理三部份，本發縣將三種 功旎整合為一機，現分述如下·· 1· /月洗·本發明係彻高溫高濃度的臭氧氣流處理物體表面，因為高 里六氧具有非昂強的氧化特性，加上流動氣流可以刻意吹往物體特定表 、述π洗死角的缺點，該高溫高濃度的臭氧可以把物體表面的 7 1295200 有機污染物強力氧化成二氧化碳及水蒸氣，達到洗淨作用。 本發明之清洗機部分包含一可密閉之容器，該容器内具有一加熱裝 置、一排氣孔以及一進氣孔，並可放置待處理物；一臭氧產生器，該自氧 •產生器係以該進氣孔與該容器連接，氧氣〇2進入該臭氧產生器後受激發而 成為臭氧〇3，產生的臭氧〇3再由該進氣孔輸入至該容器内，經由該容器内 的加熱裝置加熱輸人之臭氧〇3，使高溫之錄〇3流向待處理物，以高溫臭 •氧、/飞流進行待處理物之最後清潔，最後廢氣由該排氣孔排出。 於一較佳實施例中，該臭氧產生器之氧氣輸入口可設置一氧氣進氣 閥，以控制氧氣02的輸入。 本叙明加熱臭氧〇3的原因為在一般化學反應中，當温度提升,反 應速率加快—倍，若本機溫度設定在25G°C，則較常溫25。(：提高了 10倍溫 度，而化學反應速則增為210= 1〇24倍，因此可藉由高溫臭氧&吹向物體 表面’而產生很強烈的氧化制；所以本發明所使用之密閉容器及喷氣系 鲁統觸具有抗氧化的能力，而贿理物需要清洗的可雛污染物質也不能 太夕，以免產生細反應^發生危險，因此本發明最翻於待處理物最後 殘餘物的清洗步驟，而非_般大量污染_清洗；本發明可綠輕易地氧 化待處理物表面有機物污染，達到最後清潔的目的。 舌化本♦月了視需求加上氣相化學沈積法（chemical vapor dep〇slt1Gn，CVD)彡統’崎彳鍵理物絲自能魏理，進而控制待處理物 _表_親水或疏水性；該氣相化學沈積法祕包含—化學蒸氣源以及一加 熱器’該氣相化學沈積法系統係以—氣孔與前述可密閉之容器連接，該化 1295200 學蒸氣源經該加熱器加熱產生蒸氣後，經由該進氣孔輸入至該可密閉之容 器内，以對該待處理物進行活化作用。 於一較佳實施例中，該化學蒸氣源與該進氣孔之間可設置一氣閥，以 經由該氣閥控制該蒸氣的輸入量。 1 3.表面處理·由於向溫局濃度的臭乳〇3可以把物體表面的材質作強力 氧化’所以也能對待處理物作表面處理，如：鋼材的變色、合金的防腐等 均具有其成效。 【實施方式】 請參閱圖一，本發明所提供之多功能生物晶片及醫療工具乾式清洗及 表面處理機，主要包括有： 一可密閉之容器1，該容器内具有一加熱裝置11、一排氣孔12以及進 氣孔13、14，並可放置待處理物2 ; 一臭氧產生器31 ; 一氧氣進氣閥32 ; 一氣相化學沈積法(chemical vapor deposition，CVD)系統4，該系統包含 一化學蒸氣源41、一加熱器42以及一氣閥43 ; 該臭氧產生器31係以該進氣孔13與該可密閉之容器丨連接，於該臭 乳產生器31之輸入口加上一氧氣進氣閥32，以控制氧氣a的輸入，氧氣 〇2經由該氧氣進氣閥32進入該臭氧產生器31後受激發而成為臭氧A，產 生的臭氧〇3再由該進氣孔13輸入至該可密閉之容器2内，經由該容器^ 内的加熱裝置11加熱輸入之臭氧〇3，使高溫之臭氧〇3流向待處理物2， 9 1295200 以南溫臭氧汽流進行待處理物2之最後清潔，最後廢氣由該排氣孔Η排出; 錢相化學沈積法系統4係以該進氣孔14與該可密閉之容器1連接， 該化學蒸氣源4丨經該加熱器42加熱產生蒸氣後，經由該氣閥处制該蒸 氣的輪入量，再由該進氣孔14輸入至該可密閉之容器丨内，以對該待處理 物2進行活化作用。 . 其中該化學蒸氣源41可為有機或無機氣體，亦可為加熱反應物質產生 之蒸氣。 其中該反應物質可為水或食鹽水等。 其中该氣相化學沈積法系统4若所需反應的化學氣體不只一種，可視 而求增设化學療氣源、、加熱器以及氣闕。 其中该氣相化學沈積法系統4若須在低壓下進行化學反應，則該可密 閉之谷时1便而要有真空的賴要求，並且視需要外加真空果浦。 本I月所提i、之多功能生物晶片及醫療工具乾式清洗及表面處理機操 作步驟如下： Λ 步驟1將預洗過之待處理物2(如：生物晶片）放人該可細之容器i中； 步驟2設定加熱裴置u的工作溫度； 步驟3 打開臭氧產U Μ及加人外純氣，使高溫的臭氧進人該可密閉之 容器1和高溫的待處理物產生作氧化作用； 止臭氧進入，改變加熱裝置11的工作溫 步驟4待設定的時間到達之後， 度； 步驟5打開氣相化學沈積法系統， 令反應之蒸氣進入該可密閉之容器1 中， l2952〇〇 •鱗树定的化學氣航方及溫度下，待處理物2的表面會被活化 或依使用者所希望的要求而變化，時間到達之後停機取出待處理物 2即可。 ♦雕 - 本發賊提供^魏生物“及醫療工具乾式清洗及表面處理機， -、則述習用技術相互比較時，更丹有下列之優點： h本發明所提供之多功能生物晶片及醫療工具乾式清洗及表面處理 _機彳胃格低廉，不需要真空設備來支援，容易維護且體積輕巧。 2.本發明所提供之多魏生物晶片及躲玉具乾式清洗及表面處理 機知作簡單，清洗、氣相化學沈積活化及表面處轉所有製造過程一機完 成，生產時間可以由原來的十多小時降到一小時左右。 * 3·本發簡提供之多功能生物晶片及醫療工具乾式清洗及表面處理 機可以取代㈣的鄕清洗器及紫外線清洗機，作為—般乾式清洗，並具 有類似電漿處理機的表面處雌力與效果，如：植人性金屬支架的表面處 鲁 理、金屬表面變色處理等。 上列詳細說明係針對本發明之一可行實施例之具體說明，惟該實施例 並非用以聞本發明之專利範圍，凡未脫離本發明技藝精神所為之等效實 施或變更，均應包含於本案之專利範圍中。 上所述’本案不但在方法上確屬創新，並能較習用物品增進上述多 項功效’應已充分符合寵性及進步性之法定發明專利要件，纽法提出 _申凊’懇請貴局核准本件發明專利申請案，以勵發明，至感德便。 【圖式簡單說明】 1295200 * 圖一為本發明多功能生物晶片及醫療工具乾式清洗及表面處理機之構 • 造示意圖。 【主要元件符號說明】 1可密閉之容器 . 11加熱裝置 12排氣孔 13進氣孔 φ 14進氣孔 2待處理物 31臭氧產生器 32氧氣進氣閥 4氣相化學沈積法系統 41化學蒸氣源 42加熱器 43氣閥1295200 IX. Description of the invention: [Technical field of the invention] The present invention relates to a multi-functional biochip and a dry cleaning and surface treatment machine for medical tools, in particular to a kind of (four) warm and odorous neoflow for cleaning. Combined with the gas phase chemical deposition method, the multifunctional biochip for treating the treatment material and the dry cleaning and surface treatment machine for the treatment tool. [Prior Art] The size of the biochip is small, the reaction is fast, and the city can analyze a large amount of biological information in parallel. Therefore, it is suitable for living, reading, sewing, and tenderness, but the use of biocrystals is not secret. 'And the quality of different batches of Japanese and Japanese films is not--different experiments, regardless of the active (acting) wafers, if you can control the quality of the wafers in the laboratory, but the process = cleaning and activation The surface of the wafer is «side of the wafer; the method for cleaning the surface of the biochip can be divided into two types: _ is the wet cleaning method, and the other is the dry cleaning method; the wet cleaning method is now the tender person _, the system makes w The drug (4) is used to soak the wafer. This method uses a large amount of chemical _, including organic solvents, inorganic solvents and strong acid solution. It is not easy to manufacture environmental pollution, and it also produces poison during operation (4). In addition, it has more recycling waste = Learn to dissolve the coffee's 'More, the biological wafers are washed _ high cleanliness, the wet cleaning method reaches such high requirements, and the user is very troubled. For the dry β washing method, this washing method is the most common There are two kinds: - for the plasma treatment method 'other For the cleaning of the production line, these two cleaning methods are often used in the cleaning of 1295200 or TFT glass substrates in the semiconductor process, and the effect is outstanding; however, the two methods used in the above two cleaning methods are expensive, complicated, and complicated. The viewers often have to operate after the training to increase the cost and waste time. For example, the production of a small electric polymerization machine is very high, and the reduction is often more than 30,000 US dollars. Silk support, so, can not be cheap! Jia Yiyi is widely used by general laboratories, laboratories and hospitals; in addition, the most important thing is that both cleaning methods have serious problems with cleaning corners, on the semiconductor process or The cleaning of TFT glass substrates is simple flat cleaning, but medical tools such as scalpels require multi-faceted cleaning. It is difficult to overcome this problem with the washers and UV cleaners. In particular, UV lamps for UV cleaning require high temperatures. The internal operation of the lamp, the life of the lamp is reduced and it is prone to danger. The high oxidizing power of ozone is mostly fine-faced. In the cleaning aspect, the most common method is to make Weishui's ozone water is very common in casting materials, but in the cleaning of biochips, it is impossible to achieve the requirements of biological wafer cleaning by using ozone water. The cleanliness of the wafer cleaning needs to reach the nanometer level, and the impurity content of the ozone aqueous solution is too high. Even if the shape is blown off, the residual material can be retained on the surface of the object, so ozone water cannot be used as the final cleaning step of the biochip. It can be seen that there are still many defects in the above-mentioned articles, which are not good materials, but urgently need to be improved. The daily defects of the above-mentioned system cleaning and surface handles are detected. ' After many years of painstaking research, I finally successfully developed this multi-function biochip and medical tool dry cleaning and surface treatment machine. 6 1295200 '[Invention] The purpose of the present invention is to provide a multifunctional biochip And dry cleaning and surface treatment of medical tools, using high-temperature ozone steam as a cleaning device to provide - low price Operation * - simple, easy maintenance, lightweight medical instrument of biochips and dry cleaning machine. * The second aspect of the present invention is to provide a fresh hybrid (9) and a dry cleaning and surface treatment machine for medical reds. In addition to the cleaning function, the machine can be coupled with a vapor phase chemical deposition device, which is used as a biochip. Surface energy treatment, which in turn controls the hydrophilicity or hydrophobicity of the biowafer surface, allows the production of bio-slices to be completed in a single low-cost machine, reducing the number of production steps, and the activity of the wafer can be fully controlled. . Another object of the present invention is to provide a multi-functional biochip and a medical cleaning device for dry cleaning and surface treatment. In addition to cleaning, the machine can also change the properties of the surface of the object, and the inspection is performed. Because of the service, the cleaning age can also be used in the surface treatment of metal materials or the use of the activated surface of the mine before the mine, and the adhesion of the film Φ 纟 作为 as the surface treatment of the implanted metal stent, Extend the life of the stent or discolor the surface of the metal jewelry to add value. The above-mentioned gamma can be achieved. The multi-function biochip and medical tool dry cleaning and surface treatment machine have the functions of cleaning, gas deposition and activation, and the three parts of the treatment. The county has integrated three kinds of exercises into one machine. The following is ··································································································· The disadvantage of washing the dead angle, the high temperature and high concentration of ozone can strongly oxidize 7 1295200 organic pollutants on the surface of the object into carbon dioxide and water vapor to achieve the cleaning effect. The washing machine part of the invention comprises a closable container having a heating device, a venting hole and an air inlet hole, and can be placed with the object to be treated; an ozone generator, the oxygen generating device The air inlet is connected to the container, and the oxygen enthalpy 2 is excited to become the ozone enthalpy 3 after entering the ozone generator, and the generated ozone enthalpy 3 is further input into the container through the air inlet hole, and the heating is performed in the container. The device heats the input ozone enthalpy 3, so that the high temperature recording enthalpy 3 flows to the object to be treated, and the final cleaning of the object to be treated is performed by the high temperature odor, oxygen, and /fly flow, and finally the exhaust gas is discharged from the vent hole. In a preferred embodiment, the oxygen inlet of the ozone generator can be provided with an oxygen inlet valve to control the input of oxygen 02. The reason for heating ozone 〇3 is that in the general chemical reaction, when the temperature is raised, the reaction rate is accelerated by - times, and if the temperature of the machine is set at 25 G ° C, the temperature is 25. (: The temperature is increased by 10 times, and the chemical reaction rate is increased to 210 = 1 〇 24 times, so that a high oxidation system can be produced by blowing high temperature ozone & blowing onto the surface of the object; therefore, the sealing used in the present invention is used. The container and the jet system Lutong have the ability to resist oxidation, and the brittle material that needs to be cleaned can not be too late, so as to avoid the occurrence of fine reaction, so the invention is turned over to the last residue of the object to be treated. The cleaning step is not a large amount of pollution_cleaning; the invention can easily oxidize the organic matter on the surface of the object to be treated, and achieve the purpose of final cleaning. The tongue is formed according to the demand plus gas phase chemical deposition method (chemical vapor) dep〇slt1Gn, CVD) 彳 ' ' 彳 彳 彳 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' , , , , , , , , , , , , , , , , , , , , , , , , , , The vapor phase chemical deposition system is connected to the closable container by a pore, and the vapor source is heated by the heater to generate steam, and then input to the sealable space through the inlet hole. The activation of the object to be treated is performed. In a preferred embodiment, a gas valve may be disposed between the chemical vapor source and the inlet port to control the input of the vapor via the gas valve. Surface treatment ・Because of the concentration of the scented sputum 3 to the temperature, the material on the surface of the object can be oxidized strongly. Therefore, it is also possible to treat the surface of the object to be treated, such as discoloration of the steel and anticorrosion of the alloy. Embodiments Referring to FIG. 1 , a multi-functional biochip and medical tool dry cleaning and surface treatment machine provided by the present invention mainly comprises: a sealable container 1 having a heating device 11 and an exhaust gas therein; The hole 12 and the air inlet holes 13, 14 and the object to be treated 2; an ozone generator 31; an oxygen inlet valve 32; a chemical vapor deposition (CVD) system 4, the system comprising a a chemical vapor source 41, a heater 42 and a gas valve 43; the ozone generator 31 is connected to the closable container by the air inlet hole 13 and an oxygen gas is introduced into the input port of the cream generator 31. Valve 3 2, in order to control the input of the oxygen a, the oxygen enthalpy 2 enters the ozone generator 31 via the oxygen intake valve 32 and is excited to become ozone A, and the generated ozone enthalpy 3 is further input to the closable by the air inlet hole 13 In the container 2, the input ozone 〇3 is heated by the heating device 11 in the container, and the high-temperature ozone 〇3 is flowed to the object to be treated 2, 9 1295200, and the ozone vapor flow in the south is finally cleaned. Finally, the exhaust gas is discharged from the vent hole; the money phase chemical deposition system 4 is connected to the closable container 1 by the gas inlet hole 14, and the chemical vapor source 4 is heated by the heater 42 to generate steam. The valve is configured to fill the amount of steam, and the intake port 14 is input into the closable container to activate the object 2 to be treated. The chemical vapor source 41 may be an organic or inorganic gas, or may be a vapor generated by heating the reactive material. The reaction substance may be water or saline. Wherein the vapor phase chemical deposition system 4 requires more than one chemical gas to be reacted, it is possible to add a chemical gas source, a heater and a gas cylinder. Where the vapor phase chemical deposition system 4 is to be subjected to a chemical reaction at a low pressure, the closable valley is required to have a vacuum, and a vacuum fruit pump may be added as needed. The operation steps of the multi-function biochip and medical tool dry cleaning and surface treatment machine mentioned in this month are as follows: Λ Step 1 Put the pre-washed object 2 (such as bio-wafer) into the fine container i; step 2 sets the working temperature of the heating device u; step 3 opens the ozone production U Μ and adds the external pure gas, so that the high temperature ozone enters the closable container 1 and the high temperature treated material to produce oxidation Stop ozone entry, change the working temperature of the heating device 11 step 4 after the time to be set, step 5; open the vapor phase chemical deposition system, and let the reaction vapor enter the closable container 1, l2952〇〇• Under the chemical gas and the temperature of the scale tree, the surface of the object to be treated 2 is activated or changed according to the requirements desired by the user, and the object to be treated 2 is stopped after the time is reached. ♦ Carving - This thief provides ^Wei Bio" and medical tool dry cleaning and surface treatment machine, -, when the comparison technology is compared with each other, Dan has the following advantages: h Multifunctional biochip and medical provided by the invention Tool dry cleaning and surface treatment _ machine 彳 low stomach, no need for vacuum equipment to support, easy to maintain and lightweight. 2. The multi-wei biochip and the jade dry cleaning and surface treatment machine provided by the invention are simple. Cleaning, vapor phase chemical deposition activation and surface transfer All manufacturing processes are completed in one machine, and the production time can be reduced from more than ten hours to one hour. * 3. Multifunctional biochip and medical tool dry cleaning provided by this hairpin And the surface treatment machine can replace the (four) sputum washer and ultraviolet cleaner, as a general dry cleaning, and has a similar force and effect on the surface of the plasma processor, such as: the surface of the implanted metal bracket, Luli, metal Surface discoloration treatment, etc. The above detailed description is directed to a specific description of one of the possible embodiments of the present invention, but the embodiment is not intended to be used in the present invention. The scope of the patent, the equivalent implementation or modification of the invention, should be included in the scope of the patent of the present invention. The above-mentioned case is not only innovative in terms of method, but also can enhance the above-mentioned items more than the conventional items. The efficacy 'should be fully in line with the petal and progressive statutory invention patent requirements, New Zealand proposed _ Shen Hao', please ask your office to approve the invention patent application, in order to invent invention, to the sense of virtue. [Simple diagram] 1295200 * Figure 1 is a schematic diagram of the structure and manufacturing of the multi-function biochip and medical tool dry cleaning and surface treatment machine of the present invention. [Main component symbol description] 1 closable container. 11 heating device 12 vent hole 13 air inlet hole φ 14 Intake hole 2 to be treated 31 Ozone generator 32 Oxygen intake valve 4 Vapor phase chemical deposition system 41 Chemical vapor source 42 Heater 43 Air valve
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