TWI292245B - An optical system for uniformly irradiating a laser bear - Google Patents
An optical system for uniformly irradiating a laser bear Download PDFInfo
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- TWI292245B TWI292245B TW092105755A TW92105755A TWI292245B TW I292245 B TWI292245 B TW I292245B TW 092105755 A TW092105755 A TW 092105755A TW 92105755 A TW92105755 A TW 92105755A TW I292245 B TWI292245 B TW I292245B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0282—Passivation layers or treatments
- H01S5/0283—Optically inactive coating on the facet, e.g. half-wave coating
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- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Recrystallisation Techniques (AREA)
- Laser Beam Processing (AREA)
Description
1292245 '五、發明說明(1) 【發明所屬之技術領域】 " 本發明係有關於改善在雷射處理被照射物之際,照射 ,在照射面上的雷射光束其強度分布之均勻性之雷射光均勻 照射光學系統。 【先前技術】 \ 利用雷射照射之熱處理之範例中,在多晶矽膜之製造 义際,事先在適當之基板上,例如在玻璃基板上,透過化 學氣相沈積法等之氣相沈積法將非晶矽膜加以彼覆形成, 這種將此非晶矽膜,以雷射光束加以掃描,而達成多晶化 方法為人所知。例如,美國專利USP5, 5 2 9, 9 5 1中提出有 在半導體積體電路之組裝中,更在電路構成部上蒸鍍非晶 矽,並在必要之部位照射準分子(exci mer)雷射光束,將 非晶質形成多晶碎層之方法。在此美國專利中,為了加大 照射面積,而在光學系統中,其均一化機制,係使用複眼 透鏡(fly’s eye lens),或者稜鏡,將準分子雷射光束之 強度分布均勻化地分佈在略成正方形之面積上。 將石夕膜多晶化在大面積之基板上之方式亦為人所知, 例如,將由雷射光源所射出之雷射光束透過透鏡聚光並照 射於非晶矽膜上,在照射之際使雷射照射點在矽膜上掃 ,使其部分溶融,而在凝固之過程中使矽結晶化之方法 為人所知。在所使用之雷射光束方面,在照射位置上之光 束之軸向強度輪廓(p r 〇 f i 1 e ),乃是依存於雷射光源之光 束輪廓,通常是於光學軸作軸對稱之高斯分布。在如此分 布之光束照射下所成形之多晶矽膜,其朝表面方向之結晶1292245 'V. Description of the Invention (1) [Technical Field to Be Invented by the Invention] The present invention relates to improving the uniformity of the intensity distribution of a laser beam on an irradiation surface at the time of laser processing of an object to be irradiated. The laser light uniformly illuminates the optical system. [Prior Art] In the example of heat treatment using laser irradiation, in the fabrication of a polycrystalline tantalum film, a vapor deposition method such as chemical vapor deposition is applied to a suitable substrate, for example, on a glass substrate. The crystal film is formed by overlying the film, and the amorphous film is scanned by a laser beam to achieve a polycrystallization method. For example, in the assembly of a semiconductor integrated circuit, in the assembly of a semiconductor integrated circuit, an amorphous germanium is vapor-deposited on the circuit constituent portion, and an excimer is irradiated at a necessary portion, for example, in US Pat. No. 5,509,915. A method of irradiating a beam of light to form a polycrystalline layer. In this U.S. patent, in order to increase the irradiation area, in the optical system, the homogenization mechanism is to uniformly distribute the intensity distribution of the excimer laser beam by using a fly's eye lens or 稜鏡. On an area that is slightly square. A method of polycrystallizing a stone film on a large-area substrate is also known. For example, a laser beam emitted from a laser light source is condensed through a lens and irradiated onto an amorphous ruthenium film at the time of irradiation. A method in which a laser irradiation spot is swept on a enamel film to partially melt it, and a crystallization of ruthenium during solidification is known. In terms of the laser beam used, the axial intensity profile (pr 〇 fi 1 e ) of the beam at the illumination position is dependent on the beam profile of the laser source, usually a Gaussian distribution on the axis of the optical axis. . The polycrystalline tantalum film formed by the irradiation of such a distributed light beam crystallizes in the direction of the surface
314513.ptd 第 12 頁 1292245 五、發明說明(2) 的均勻性相當低’將此作為半導體基板,使用於薄膜電晶 體之製造上乃相當困難。 此外,將波長較短之準分子雷射,其在照射面上之光 束輪鄭加以矩形化,在半導體膜上進行掃掠加熱之技術亦 為人所知。日本專利公開1 1 - 1 6 8 5 1以及日本專利公開 1 0 - 3 3 3 0 7 7中,提出有將由振動產生器所射出之雷射光 束,通過在與光軸垂直之平面内互相交叉之兩個圓筒透鏡 陣列,並通過配置於其前方之會聚透鏡,而成像於半導體 膜表面之發明。圓筒透鏡陣列乃是將複數個微圓筒透鏡互 相平行且與光軸垂直地加以配置,將一道光束分割成複數 道之光學元件。 在前述之方法中,乃是將採用高斯分布且單純模式之 雷射光束,透過兩個圓筒透鏡陣列在垂直相交之兩個方向 上進行均勻之強度分布。在半導體膜等其照射表面上之照 射光束之形狀,乃是在半導體表面上,於垂直相交之兩個 方向上具有不同之寬度。此方法乃是透過將照射雷射光束 向較狹窄寬度之一方掃掠移動之方式,在半導體膜上,重 複形成出相當於較長之寬度之具有一定寬度的多晶帶區。 但是,將由雷射光源所射出之雷射光束透過前述之圓 筒透鏡陣列加以分割,並在照射面加以合成時,會在照射 面產生雷射光之干涉,在照射位置上會形成光束強度重複 具有南處與低處之干涉模樣。 在照射面上因重疊複數個光束所產生之干涉,會影響 結晶成長。也就是說,照射面上之照射光束之形狀為使用314513.ptd Page 12 1292245 V. INSTRUCTION OF THE INVENTION (2) The uniformity is relatively low. As a semiconductor substrate, it is quite difficult to use it for the manufacture of a thin film transistor. Further, a technique of performing a sweeping heating on a semiconductor film by a quasi-molecular laser having a short wavelength and a rectangular beam on the irradiation surface is also known. In the Japanese Patent Publication No. 1 -1 6 8 5 1 and Japanese Patent Laid-Open No. 10-3 3 0 7 7 , it is proposed that a laser beam emitted from a vibration generator crosses each other in a plane perpendicular to the optical axis. The invention of the two cylindrical lens arrays and imaging on the surface of the semiconductor film by a converging lens disposed in front of them. The cylindrical lens array is an optical element in which a plurality of microcylindrical lenses are arranged in parallel with each other and arranged perpendicularly to the optical axis to divide a single beam into a plurality of channels. In the foregoing method, a laser beam having a Gaussian distribution and a simple mode is uniformly distributed in two directions perpendicularly intersecting through two cylindrical lens arrays. The shape of the illuminating beam on the illuminating surface of the semiconductor film or the like is different on the surface of the semiconductor in two directions of perpendicular intersection. In this method, a polycrystalline strip region having a certain width corresponding to a longer width is repeatedly formed on the semiconductor film by sweeping the irradiated laser beam toward one of the narrower widths. However, the laser beam emitted by the laser light source is split through the cylindrical lens array, and when the illumination surface is combined, the interference of the laser light is generated on the illumination surface, and the beam intensity is repeated at the irradiation position. Interference between the south and the lower part. Interference caused by overlapping a plurality of beams on the illuminated surface affects crystal growth. In other words, the shape of the illumination beam on the illumination surface is used.
314513.ptd 第13頁 1292245 五、發明說明(3) -長方形之雷射照射光束將非晶質半導體膜加熱使其結晶化 ’時,由於令照射光束向較窄寬度方向移動,故與移動方向 唾直相交之長度方向之強度輪廓會對長晶有較大影響,而 此方向之強度輪廓並非均勻且干涉模樣較大,並不適於加 犬石夕膜之結晶粒的成長。 . 去除因前述干涉所產生之雷射照射、強度不均勻之方 法,有若干個被提出。日本專利公開2 0 0 1 - 1 2 7 0 0 3號中, 提出有將由光源所射出之雷射光束透過平行光管使其成為 平行光,並照射於具有台階狀反射面之鏡面,使其通過用 φ合成與會聚經前述多段鏡所分割之光束的圓筒透鏡陣列 與圓筒透鏡,而照射於照射面上之光學系統。此光學系 妩,乃是透過所分割之光束其各反射面間之段差,設置雷 射光束之相干長度(可干涉長度)以上之光路徑差,來防止 -在照射面上各分割光束間之干涉。 . 又,日本專利公開2 0 0 1 - 2 4 4 2 1 3號中,提出有將由光 源所射出之雷射光束透過平行光管使其成為平行光,照射 在複數個小型反射鏡,將由各反射鏡所反射之反射光照射 到照射面並加以重疊,透過將各平面鏡加以反射之雷射.光 涑的光路徑差確保在相干長度以上之方式,同樣地進行防 •干涉之發明。 " 前述之光束均勻化之技術,乃是將由同一光源所射出 之雷射光束加以分割,將照射面上在重疊之際所產生之干 涉,利用具有複數個反射面之反射鏡設置光路徑差來加以 防止,但是此類光學系統,必須要有特殊之反射鏡。特別314513.ptd Page 13 1292245 V. Description of the Invention (3) - When a rectangular laser beam is heated to crystallize the amorphous semiconductor film, the beam is moved in a narrow width direction, so the direction of movement The intensity profile in the longitudinal direction of the salivation has a great influence on the crystal growth, and the strength profile in this direction is not uniform and the interference pattern is large, which is not suitable for the growth of the crystal grains of the dog. Several methods have been proposed to remove laser irradiation and uneven intensity due to the aforementioned interference. In Japanese Patent Publication No. 2000-127-07, it is proposed that a laser beam emitted from a light source is transmitted through a collimator to be parallel light, and is irradiated onto a mirror surface having a stepped reflection surface. The optical system on the illuminated surface is irradiated by combining and condensing a cylindrical lens array and a cylindrical lens that converge the light beam split by the multi-segment mirror with φ. The optical system is configured to prevent the difference between the light beams of the laser beam by the difference between the reflection surfaces of the divided light beams and the light path length of the laser beam (interference length). put one's oar in. Further, in Japanese Patent Laid-Open Publication No. 2000-241, it is proposed that a laser beam emitted from a light source is transmitted through a collimator to be parallel light, and is irradiated on a plurality of small mirrors. The reflected light reflected by the mirror is irradiated onto the irradiation surface and superimposed, and the laser beam reflected by each plane mirror is transmitted. The optical path difference of the pupil is ensured to be equal to or larger than the coherence length, and the invention of preventing interference is performed in the same manner. " The above technique of beam homogenization is to divide the laser beam emitted by the same light source, and to interfere with the interference surface when the illumination surface is overlapped, and to set the optical path difference by using a mirror having a plurality of reflection surfaces. To prevent it, but such optical systems must have special mirrors. particular
314513.ptd 第14頁 1292245_ 五、發明說明(4) 是,日本特開2 Ο (H - 2 4 4 2 1 3號中所述之光學系統,必須要 有透過反射鏡將光學系統之光軸加以彎曲之配置。此外, 光學系統之各反射鏡,為了要能夠使複數個受到分割之各 光束正確地照射到照射面,被要求必須滿足特定之位置關 係。因此,複數個反射鏡之配置會變為複雜,存在有作為 熱處理裝置上其應配置之光學系統之自由度會降低之問 題。特別是,針對所有的分割光束設置光路徑差上,對於 時間性可干涉距離較大之雷射振動產生源而言,其裝置會 變成大且複雜,非現實且光學上之調整會變得困難。 【發明内容】 本發明之目的係有鑑於前述問題,提供一般在照射面 上透過將來自光源的被分割之各光束予以重疊,而在照射 面上形成具有均句強度分布之照射光束用之光學系統,防 止因重疊所產生之分割光束間之干涉,達到照射光束之均 勻化之雷射光均勻照射光學系統。 本發明之另一目的,係提供簡單且容易之均勻照射光 學系統其構成與調整能防止前述干涉並將照射光束均勻化 用。 本發明之又一目的,係提供適用於作為被照射物之非 晶矽膜且適用於其多晶化用之雷射加熱裝置,能夠製造出 遍佈結晶面區而晶格缺陷較少之多晶石夕膜之光學糸統。 本發明之雷射光均勻照射光學系統,係由將來自雷射 光源之雷射光在光束剖面上作空間性分割之雷射光束分割 機構、將複數條被分割的光束在照射面上重疊進行照射之314513.ptd Page 14 1292245_ V. INSTRUCTIONS (4) Yes, the optical system described in Japanese Patent Laid-Open No. 2 (H-244 2 2 3) must have the optical axis of the optical system through the mirror. In addition, each of the mirrors of the optical system is required to be able to accurately illuminate the plurality of divided beams to the illumination surface, and it is required to satisfy a specific positional relationship. Therefore, the configuration of the plurality of mirrors is It becomes complicated, and there is a problem that the degree of freedom of the optical system to be disposed on the heat treatment device is lowered. In particular, for all the split beams, the laser path difference is large, and the laser vibration with a large temporal interference distance is large. In the case of a source, the device becomes large and complicated, and unrealistic and optical adjustment becomes difficult. SUMMARY OF THE INVENTION The object of the present invention is to provide a light source that is generally transmitted through a light source in view of the aforementioned problems. The divided beams are overlapped, and an optical system for illuminating a beam having a uniform sentence intensity distribution is formed on the illuminated surface to prevent the division due to the overlap. The interference between the beams, the uniformity of the laser beam to uniformly illuminate the optical system. Another object of the present invention is to provide a simple and easy uniform illumination optical system whose composition and adjustment prevent the aforementioned interference and homogenize the illumination beam. Another object of the present invention is to provide a laser heating apparatus suitable for use as an amorphous tantalum film as an object to be irradiated and which is suitable for polycrystallization, which can produce a crystal lattice region and have fewer lattice defects. The optical system of the monolithic film is a laser beam uniform illumination optical system of the present invention, which is a laser beam splitting mechanism for spatially dividing a laser beam from a laser source into a beam profile, and dividing the plurality of strips The beam of light overlaps on the illuminated surface for illumination
314513.ptd 第15頁 1292245 五、發明說明(5) ,重疊照射機構、以及將照射面上之光束強度予以均勻化之 >勻化機構所構成,前述雷射光束分割機構係將被分割之 -光束寬度,以使來自光源之雷射光束剖面之剖面方向之空 間性可干涉距離變成1 / 2倍以上的方式將光源之雷射光束 _加以分割。規定於前述光束寬度之分割光束,會通過重疊 照射機構,即使在照射面受到重疊,亦會減輕多數光束之 立相干涉,而將照射面上之照射強度分布予以均勻化。 又,本發明所述之雷射光均勾照射光學系統,係包含 有將來自雷射光源之雷射光束在光束剖面上作空間性分割 φ雷射光束分割機構、將分割後之光束在照射面上加以重 疊並進行照射之重疊照射機構的同時、更含有將照射面上 乏光束強度予以均勻化之均勻化機構。前述均勻化機構之 一係包含有將前述分割光束之互相鄰接之鄰接分割光束的 -一方使其較另一方之時間性可干涉距離更長且延遲之光學 性延遲機構,防止互相鄰接之分割光束間在照射面上之干 涉,將照射強度分布均勻化。 本發明中,另一的均勻化機構,乃包含在透過雷射光 束分割機構所分割之相鄰分割光束之間使偏光角度作實質 上垂直相交之旋光機構。旋光機構,乃是透過使受分割之 束間之偏光角度互相垂直相交之方式,來減輕於重疊各 ^目鄰之分割光束在照射面上時,所產生之分割光束間之干 涉,而將照射強度分布均勻化。 本發明之均勻照射光學系統,透過同時降低前述雷射 光束之剖面方向的空間性可干涉距離之因素以及光軸方向314513.ptd Page 15 1292245 V. Inventive Note (5), the overlapping illumination mechanism and the homogenization mechanism for equalizing the beam intensity on the illumination surface, the laser beam splitting mechanism will be divided The beam width is such that the laser beam _ of the light source is split in such a manner that the spatial interference distance of the cross-sectional direction of the laser beam profile from the light source becomes 1/2 times or more. The split light beam defined by the beam width is superimposed on the irradiation surface, and even if the irradiation surface is overlapped, the vertical interference of the plurality of light beams is reduced, and the irradiation intensity distribution on the irradiation surface is made uniform. In addition, the laser light of the present invention is an optical illumination system, which comprises spatially dividing a laser beam from a laser source into a beam profile. The laser beam splitting mechanism and the split beam are on the illuminated surface. The superimposing means for superimposing and irradiating the overlapping irradiation means further includes a homogenizing means for uniformizing the intensity of the beam on the irradiation surface. One of the above-mentioned homogenization mechanisms includes an optical retardation mechanism that blocks the adjacent divided light beams adjacent to each other to make the temporally interferable distance longer than the other and delays, and prevents the adjacent light beams from being adjacent to each other. The interference between the illumination surfaces is uniformed. In the present invention, another homogenizing means includes an optical rotatory mechanism that substantially orthogonally intersects the polarization angles between adjacent divided light beams split by the laser beam splitting means. The optical rotation mechanism is to reduce the interference between the split beams generated when the split beams of the adjacent beams are on the illumination surface by overlapping the polarization angles between the divided beams. The intensity distribution is uniformized. The uniform illumination optical system of the present invention transmits the spatial interferenceable distance factor and the optical axis direction while reducing the cross-sectional direction of the laser beam
314513.ptd 第16頁 1292245_ 五、發明說明(6) 的時間性可干涉距離之因素,具有能夠將照射強度分布非 常均勻化之優點。 又,本發明中,重疊照射機構更包含有令各分割雷射 光束在照射面上相互變位,或相互偏移,轉印形成照射光 束。藉由分割機構分割成多數道之各分割光束,在通過重 疊照射機構之際,會作光學性偏移而照射在照射面上,以 降低照射面上分割光束間之干涉。將轉印加以變位乃至於 偏移用之重疊照射機構,能夠簡單地實施,此外,更能夠 並用依據前述空間性可干涉距離之因素以及光軸方向的時 間性可干涉距離之因素的防止干涉之機構。 本發明之上述雷射光均勻照射光學系統,係可將照射 面仍為形成在基板上的非晶質或多晶質半導體膜用,並能 夠作為半導體膜退火(annealing)用光學系統。 【實施方式】 [發明之實施形態] 本發明之光學系統,乃是將由雷射光源所射出之單一 雷射光束利用雷射光束分割機構分割成為複數道分割光 束,並透過重疊機構使分割光束重疊照射在照射面上。在 此,雷射光束分割機構,係針對複數道分割光束,將各光 束之寬度設定為雷射光束剖面的其剖面方向之空間性可干 涉距離之1 / 2倍以上,由此,可防止在照射面上之分割光 束間之干涉,使得照射光束之強度分布均勻化。 分割光束間之干涉,在2道分割光束於分割前在該雷 射光束之剖面内為互相鄰接之光束之場合時,乃是非常容314513.ptd Page 16 1292245_ V. Inventive Note (6) The time-interferable distance factor has the advantage of being able to homogenize the illumination intensity distribution. Further, in the present invention, the superimposing illumination means further includes shifting the respective divided laser beams to each other on the irradiation surface, or shifting from each other to form an irradiation beam. Each of the divided light beams divided into a plurality of tracks by the dividing mechanism is optically deflected and irradiated onto the irradiation surface when passing through the overlapping irradiation mechanism to reduce the interference between the divided light beams on the irradiation surface. The superimposed irradiation mechanism for displacing the transfer or offset can be easily implemented, and further, it is possible to prevent interference by factors of the spatial interferometric distance and the temporal interferometric distance in the optical axis direction. The institution. The above-described laser light uniform illumination optical system of the present invention can be used for an amorphous or polycrystalline semiconductor film formed on a substrate, and can be used as an optical system for annealing a semiconductor film. [Embodiment] [Embodiment of the Invention] An optical system according to the present invention divides a single laser beam emitted from a laser light source into a plurality of divided light beams by a laser beam splitting mechanism, and overlaps the split beams by an overlapping mechanism. Irradiation on the illuminated surface. Here, the laser beam splitting means sets the width of each beam to the spatial interference interference distance of the cross-sectional direction of the laser beam profile for the plurality of divided light beams, thereby preventing The interference between the split beams on the illuminated surface makes the intensity distribution of the illumination beam uniform. The interference between the split beams is very large when the two split beams are adjacent to each other in the cross section of the laser beam before the splitting.
314513.ptd 第17頁 1292245 五、發明說明(7) ,易引起,但是透過將各分割光束之寬度設定在空間性可干 涉距離之1 / 2倍以上之方式,能夠降低互相干涉。 - 前述之各分割光束之光束寬度,乃是就雷射光束分割 機構之射出面的分割光束之寬度加以規定,此時,所謂的 <間性可干涉距離,乃是指由光源所射出之雷射光束投射 到·其射出面之位置時之剖面内之空間性可干涉距離。其詳 i田會在後面加以敘述,此空間性可干涉距離,乃是指雷射 光束被分割為2道之後在照射面上再度重疊時所產生之干 涉而造成後述之可視性(v i s i b i 1 i t y,清晰度)成為1 / e _,2道光束之最小重疊距離。 在本發明中,對於分割光束寬度之光束剖面的剖面方 ‘之空間性可干涉距離之比,雖設定為1 / 2以上,但以1 / 2以上為佳,以1以上為更佳。也就是說,透過光束分割 -機構所分割之光束寬度,其空間性可干涉距離最好設定為 • 1/ 2倍以上,特別是以1倍以上為最佳。 分割光束寬度之上限,乃是由分割雷射光束之分割數 所決定,被分割光束之數目,至少有5,以7以上為佳。分 割數愈多,雖對照射雷射光束其強度之平坦化愈有效,但 是將分割數增多而使上述分割光束寬度對空間性可干涉距 比未滿1 / 2時並不好。在實用性上,分割數係採用5至 7,並將分割光束寬度對於空間性可干涉距離之比設定為1 倍以上。 雷射光束分割機構,乃是將由雷射光源所射出之雷射 光束加以分割,並且規定前述分割光束之寬度之機構,如314513.ptd Page 17 1292245 V. Inventive Note (7) is easy to cause, but by setting the width of each split beam to 1 / 2 times the spatial interferable distance, mutual interference can be reduced. - the beam width of each of the split beams described above is defined by the width of the split beam of the exit surface of the laser beam splitting mechanism. In this case, the so-called inter-interference distance refers to the light source emitted by the light source. The spatially interferable distance within the profile of the laser beam as it is projected onto its exit surface. The detailed i-field will be described later. This spatially interferable distance refers to the interference generated when the laser beam is split into two channels and then overlapped again on the illuminated surface, resulting in the visibility described later (visibi 1 ity , clarity) becomes the minimum overlap distance of 1 / e _, 2 beams. In the present invention, the ratio of the spatial interfering distance of the cross-section of the beam profile of the split beam width is set to be 1 / 2 or more, preferably 1 / 2 or more, more preferably 1 or more. That is to say, the spatially interfering distance of the beam width divided by the beam splitting-mechanism is preferably set to be more than 1/2 times, and particularly preferably more than 1 time. The upper limit of the split beam width is determined by the number of divisions of the split laser beam, and the number of split beams is at least 5, preferably 7 or more. The more the number of divisions, the more effective it is to flatten the intensity of the irradiated laser beam, but it is not preferable to increase the number of divisions so that the width of the split beam is less than 1 / 2 of the spatial interferometric distance. In practicality, the number of divisions is 5 to 7, and the ratio of the split beam width to the spatial interference distance is set to be 1 or more. The laser beam splitting mechanism is a mechanism that divides the laser beam emitted by the laser light source and defines the width of the split beam, such as
314513.ptd 第18頁 1292245 五、發明說明(8) 此之分割機構,可使用波導路徑或是圓筒透鏡陣列。任何 一種,都是將雷射光束在對光轴垂直面上任何方向之唯一 方向加以分割,分割成前述分割數之分割光束。 波導路徑可利用具有互相相向之反射鏡之中空體,以 及中心實體之透光體。中空之波導路徑,可利用在空間中 將兩個鏡面以一定間隔相向加以配置之物件。 中心貫體之波導路控^乃是利用透明板狀以兩方之主 要面為鏡面,而將兩方之端面作為入射與射出使用之透光 體。如此之波導路徑,通常係可利用光學玻璃板。 在波導路徑中,雷射光束分割機構,包含有將由雷射 光源所射出之雷射光束,使其入射到波導路徑内之反射面 間之聚光透鏡。 由波導路徑之射出面,可獲得將在波導路徑内未由反 射面加以反射而透射過之分割光束、以及利用相向之反射 面加以反射之於每一反射次數分為兩組之分割光束。入射 光束利用反射面於每增加一次反射次數,分割光束會各增 力口 2道。 另一方面,作為雷射光束分割機構之圓筒透鏡陣列, 乃是將圓柱狀且其剖面為凸透鏡狀之複數個圓筒透鏡設成 平行,並配置排列成與光軸作實質性垂直相交之一方向 上。可獲得對應於每一微小圓筒透鏡之分割光束。在使用 圓筒透鏡陣列之雷射光束分割機構中,以含有將平行光入 射到圓筒透鏡陣列之平行光管為佳。 本發明光學系統之另一實施形態,係於光學系統中包314513.ptd Page 18 1292245 V. INSTRUCTIONS (8) For this segmentation mechanism, a waveguide path or a cylindrical lens array can be used. Either way, the laser beam is split in a unique direction in any direction on the vertical plane of the optical axis, and is divided into split beams of the aforementioned number of divisions. The waveguide path may utilize a hollow body having mirrors facing each other and a light transmissive body of the central body. The hollow waveguide path utilizes an object in which two mirror faces are arranged to face each other at an interval. The waveguide of the central body is controlled by a transparent plate, and the main faces of the two sides are mirrored, and the end faces of both sides are used as a light transmitting body for incident and injection. Such a waveguide path usually utilizes an optical glass plate. In the waveguide path, the laser beam splitting mechanism includes a condensing lens that directs the laser beam emitted from the laser light source into the reflecting surface in the waveguide path. From the exit surface of the waveguide path, a split light beam that is transmitted through the waveguide path without being reflected by the reflection surface and a split light beam that is reflected by the opposite reflection surface and divided into two groups for each reflection order can be obtained. The incident beam uses the reflecting surface for each additional number of reflections, and the split beam will have two boosting ports. On the other hand, a cylindrical lens array as a laser beam splitting mechanism is formed by arranging a plurality of cylindrical lenses having a cylindrical shape and a convex lens shape in parallel, and arranged in a substantially perpendicular intersection with the optical axis. In one direction. A split beam corresponding to each tiny cylindrical lens is obtained. In the laser beam splitting mechanism using the cylindrical lens array, it is preferable to include a collimator that supplies parallel light to the cylindrical lens array. Another embodiment of the optical system of the present invention is packaged in an optical system
314513.ptd 第19頁 1292245 五 、發明說明 (9) ,含 有 均 勻 化 機 構 該 均 勻 化 機 構 係 包 含 有 光 學 性 延 遲 機 構 以 及 旋 光 機 構 0 - 在 本 發 明 中 5 光 學 性 延 遲 機 構 乃 是 具 有 在 透 過 前 述 雷 射 光 束 分 割 機 構 分 割 之 光 束 中 將 互 相 鄰 接 之 分 割 光 束 一 方 對 於 另 一 方 作 較 該 雷 射 光 束 之 時 間 性 可 干 涉 距 離 更 長· 的 延 遲 之 功 能 J 藉 此 在 曰S 射 面 上 , 降 低 或 防 止 互 相 鄰 h 之 分 割 光 束 間 之 干 涉 〇 光 學 性 延 遲 機 構 田 取 好 是 使 用 延 遲 光 束 用 之 透 光 體 也 就 是 說 利 用 延 遲 板 插 入 在 透 過 前 述 雷 射 光 束 分 割 機 • 丨所 分 割 之 分 割 光 束 互 相 作 空 間 性 分 離 之 光 路 徑 中 〇 此 時 在 將 各 分 割 光 束 逆 投 影 在 由 光 源 所 射 出 之 單 一 雷 射 k 束 時 於 互 相 鄰 接 之 分 割 光 束 中 至 少 任 何 一 方 ? 插 入 延 遲 板 在 互 相 鄰 接 之 分 割 光 束 之 間 設 置 光 學 性 之 光 路 徑 差 〇 延 遲 板 乃 將 分 割 後 之 相 鄰 光 束 之 光 路 徑 差 變 成 為 較 其 雷 射 光 束 之 時 間 性 可 干 涉 距 離 為 大 由 此 可 防 止 受 到 分 離 之 複 數 道 分 割 光 束 於 as 射 到 日S 4 射 面 而 重 疊 時 的 分 割 光 束 間 之 干 涉 〇 光 路 徑 差 係 由 延 遲 板 之 厚 度 也 就 是 5 由 光 束 透 過 長 度 Λ 延 遲 板 之 折 射 率 與 空 氣 之 折 射 率 之 差 所 加 以 規 定 〇 i _ 延 遲 板 乃 是 5 以 由 田 射 光 源 所 射 出 之 雷 射 光 束 為 基 插 入 在 由 該 雷 射 光 束 所 分 離 出 之 相 鄰 配 列 之 每 隔 一 道 分 割 光 束 間 , 互 相 形 成 光 路 徑 差 因 此 產 生 相 位 差 〇 本 發 明 中 均 勻 化 機 構 更 包 含 有 旋 光 機 構 旋 光 機 構 乃 是 1 在 透 過 雷 射 光 束 分 割 機 構 所 分 割 之 相 鄰 分 割 光 束314513.ptd Page 19 1292245 V. Inventive Note (9), including a homogenization mechanism, the homogenization mechanism includes an optical delay mechanism and an optical rotation mechanism 0 - In the present invention, the 5 optical delay mechanism has a The laser beam splitting mechanism splits the beam into a mutually adjacent split beam and the other side has a longer delay interference than the laser beam. The function J is thereby lowered or Preventing the interference between the split beams of mutually adjacent h. The optical delay mechanism is preferably a light-transmitting body for using a delayed beam, that is, a split beam split by the delay beam inserted through the laser beam splitter. In the spatial separation of the light path, the projection beam is backprojected at this time. The single laser beam emitted by the light source is at least one of the mutually adjacent split beams. The insertion retardation plate sets an optical path difference between the mutually adjacent split beams. The retardation plate is adjacent to the segmentation. The light path difference of the beam becomes larger than the temporal interference distance of the laser beam, thereby preventing the interference between the split beams when the separated plurality of divided beams are overlapped by the as-singing to the S 4 plane. The optical path difference is defined by the thickness of the retardation plate, which is defined by the difference between the refractive index of the beam, the retardation of the retardation plate, and the refractive index of the air. 延迟i _ The retardation plate is a laser beam emitted by the field source. Inserting a light path between each of the divided beams of the adjacent array separated by the laser beam The difference is the phase difference. The homogenization mechanism in the present invention further includes an optical rotating mechanism. 1 is a neighboring splitting beam split by a laser beam splitting mechanism.
314513.ptd 第 20 頁 1292245 五、發明說明(11) .之光路徑長度設定為實質上相同光路徑長度。由此,照射 面上前述一方以及另一方之分割光束之成像能夠鮮明化, ’能夠給予合成後之照射光束強度分布達到均勻化。 ^ 關於前述均勻化機構之配置,也就是關於延遲板與旋 光板之配置方面,重疊照射機構包含有將由雷射光束分割 屬構所射出的分割光束轉印到照射面之轉印透鏡,在轉印 透鏡將複數道分割光束形成空間性分離之領域時,延遲板 等之均勻化機構,會被插入此分離領域中。延遲板,例如 在雷射光束分割機構為波導路徑之場合時,各分割光束會 春過轉印透鏡而配至於所會聚之焦點位置上。 此外,關於均句化機構之簡單化,波導路徑以不令其 產生未反射而通過之分割光束之構造或配置為佳。此配 置,係如後述般,透過將單一之延遲板或是旋光板,僅插 ~入一定群組之分割光束之方式,而不插入另一方群組之分 -割光束,可減低照射面上之干涉。此乃是具有可將單一之 •光學性延遲機構之配置予以簡便化之優點。 因此,最好是,在入射雷射光束中僅對未由反射面加 以反射而通過波導路徑之分割光束插入遮蔽體,即能夠加 i遮蔽。 胃 在另一形態中,可採用將射入波導路徑之雷射光束對 波導路徑中心軸作非對稱入射之構造。因此,在波導路徑 中,對於波導路徑之入射雷射光束之光軸會與前述波導路 徑的反射面間之中心軸成斜交,由此,能不會產生未由任 一反射面加以反射而通過之分割光束。314513.ptd Page 20 1292245 V. INSTRUCTIONS (11) The optical path length is set to be substantially the same optical path length. Thereby, the imaging of the divided light beams of the one surface and the other of the irradiation surface can be made clear, and the intensity distribution of the irradiation beam after the synthesis can be made uniform. Regarding the arrangement of the above-described homogenization mechanism, that is, regarding the arrangement of the retardation plate and the optical rotator, the superimposed illumination mechanism includes a transfer lens that transfers the split beam emitted from the laser beam splitting structure to the irradiation surface, and is rotated. When the printing lens forms a domain in which the plurality of divided beams are spatially separated, a homogenizing mechanism such as a retardation plate is inserted into the separation field. The retardation plate, for example, in the case where the laser beam splitting mechanism is a waveguide path, each of the split beams will pass through the transfer lens and be placed at the focus position of the convergence. Further, with regard to the simplification of the singularization mechanism, it is preferable that the waveguide path is constructed or arranged in such a manner that the split beam is passed through without causing unreflected. In this configuration, as will be described later, by inserting a single retardation plate or a light-rotating plate into only a certain group of split beams, without inserting the split-beam of the other group, the illumination surface can be reduced. Interference. This has the advantage of simplifying the configuration of a single optical delay mechanism. Therefore, it is preferable that only the split beam that is not reflected by the reflecting surface and that passes through the waveguide path is inserted into the shielding body in the incident laser beam, that is, it can be shielded. Stomach In another aspect, a configuration in which a laser beam incident on a waveguide path is asymmetrically incident on a central axis of a waveguide path can be employed. Therefore, in the waveguide path, the optical axis of the incident laser beam for the waveguide path is oblique to the central axis between the reflecting surfaces of the waveguide path, thereby preventing the reflection from being reflected by any of the reflecting surfaces. The beam is split by it.
3145]3.ptd 第22頁 1292245 五、發明說明(12) 又一實施形態中,在波道路徑中,使用前述之中心實 體之透光體,但是,該波導路徑之入射面與波導路徑之中 心軸成斜交的構造,而能使入射光在斜將後之入射面進行 折射。入射光束中,至少一次會由反射面加以反射,可構 成分割光束。在前述各實施形態中,與將未反射而通過之 分割光束加以遮斷之構成比較之下,具有能夠將所有的分 割光束利用在照射上之優點。 均勻化機構之另一種配置,在雷射光束分割機構為圓 筒透鏡陣列之場合時,各圓筒透鏡之射出端光路徑係能夠 互相分離,所以能夠將延遲板或旋光板配置於光束之光路 徑上。在此場合中,若干個小延遲板或是旋光板,係每隔 一道透過圓筒透鏡陣列所分割而成列之光束地加以配置。 如此,複數道分割光束,其一部份透過均勾化機構, 然後重疊照射機構將分割光束在照射面上加以重疊照射, 照射光束之形狀會以成為矩形狀或是直線狀地受到投影, 而使受照射之光束其長度方向之強度分布會變成一致。 在本發明之實施形態中,重疊照射機構,更含有將各 分割電射光束在照射面上互相偏移加以轉印而形成照射光 束之方式。重疊照射機構乃是將透過分割機構所分離之分 割光束在照射面上加以重疊照射,在照射面上形成矩形狀 或是直線狀之形狀,而在本實施形態中,將若干道分割光 束透過向照射光束形狀之長度方向偏移之方式,特別可消 除長度方向兩側所產生之強度之強弱分布。前述重疊照射 機構,最好以可利用具有透鏡像差之圓筒透鏡陣列為佳。3145] 3.ptd Page 22 1292245 V. Inventive Note (12) In still another embodiment, the light-transmitting body of the central entity is used in the channel path, but the incident surface and the waveguide path of the waveguide path The central axis is configured to be oblique, and the incident light can be refracted at the incident surface after the oblique direction. At least one of the incident beams is reflected by the reflecting surface to form a split beam. In each of the above embodiments, it is advantageous in that all of the split beams can be used for illumination in comparison with a configuration in which the split light beam that has not been reflected is blocked. In another configuration of the homogenization mechanism, when the laser beam splitting mechanism is a cylindrical lens array, the light path of the exit end of each cylindrical lens can be separated from each other, so that the retardation plate or the optical plate can be disposed in the light of the beam. On the path. In this case, a plurality of small retardation plates or optically-polarized plates are arranged every other way through a beam of light which is divided by a cylindrical lens array. In this way, a plurality of divided beams are transmitted through a uniformizing mechanism, and then the overlapping illumination means superimposes the divided beams on the illumination surface, and the shape of the illumination beam is projected into a rectangular shape or a linear shape. The intensity distribution of the irradiated beam in the longitudinal direction is made uniform. In the embodiment of the present invention, the superimposed irradiation means further includes means for shifting the respective divided electroluminescence beams onto the irradiation surface to form an irradiation beam. In the superimposed illumination mechanism, the split light beams separated by the splitting means are superimposed on the irradiation surface, and are formed in a rectangular shape or a linear shape on the irradiation surface. In the present embodiment, a plurality of divided light beams are transmitted. The manner in which the length of the illumination beam is shifted in the longitudinal direction particularly eliminates the intensity distribution of the intensity generated on both sides in the longitudinal direction. Preferably, the overlapping illumination means is preferably a cylindrical lens array having lens aberration.
314513.ptd 第23頁 1292245 五、發明說明(13) - 本發明之該些實施形態所述之雷射光均勻化照射光學 系統,乃是適用於將在玻璃基板上透過化學氣相沈積法等 加以被覆形成之非晶質或多晶質之矽皮膜加以加熱溶融, 使其多晶化或長成更粗大結晶用之退火(a η n e a 1 i n g )裝 [。在此,所謂的退火,不僅是指對固體膜加以雷射照射 使·其直接結晶化或再結晶化,亦包含將固體膜以雷射照射 k其暫時溶融,而在之後的溶融膜凝固過程中使其結晶 化。 在本發明中,雷射光源方面,廣泛地包含固體雷射以 φ半導體雷射,雷射光束中,包含有固體雷射以及半導體 雷射之基本波以及諧波。特別是,照射面為矽半導體膜 备,特別是在非晶質矽膜之場合時,在利用Nd : YAG雷 射、Nd : YLF雷射、Yb : YAG雷射等固體雷射之基本波之 ,外,特別以利用第2諧波(2倍波),第3諧波(3倍波)加以照 射為佳。此類譜波,在3 5 0至8 0 0 n m之波長領域中時,前述 非晶質膜會適度地吸收光束,而能夠有效率地進行加熱溶 融0 特別是,在前述退火用光學系統中,透過在矽膜表面 土形成細小而具有較寬寬度之線狀照射光束並與光束線垂 #目交之方向掃描之方式,在照射光束通過之際將矽皮膜 上以其光束寬度加以掃掠均勻地急速加熱,而在通過後冷 卻之際在凝固過程中可使其結晶成長,由於光束具有干涉 模樣少且均勻之強度分布,故可製造各結晶具較寬之長形 形狀以及均勻且高度結晶性之結晶性矽膜。314513.ptd Page 23 1292245 V. INSTRUCTION DESCRIPTION (13) - The laser light homogenizing illumination optical system according to the embodiments of the present invention is suitable for being applied to a glass substrate by a chemical vapor deposition method or the like. The amorphous or polycrystalline tantalum film formed by coating is heated and melted to polycrystallize or grow into an annealed (a η nea 1 ing ) for coarser crystals. Here, the term "annealing" refers not only to laser irradiation of a solid film, but also to direct crystallization or recrystallization thereof, and also includes temporarily melting a solid film by laser irradiation, and thereafter solidifying the molten film. It is crystallized. In the present invention, in terms of a laser light source, a solid laser is widely included as a φ semiconductor laser, and the laser beam includes a solid laser and a fundamental wave and a harmonic of the semiconductor laser. In particular, the irradiation surface is a germanium semiconductor film, especially in the case of an amorphous germanium film, the fundamental wave of a solid laser such as a Nd:YAG laser, a Nd:YLF laser, or a Yb:YAG laser is used. In addition, it is preferable to irradiate with the second harmonic (2× wave) and the 3rd harmonic (3× wave). Such a spectral wave, in the wavelength region of 350 to 800 nm, the amorphous film absorbs the light beam moderately, and can be efficiently heated and melted. 0 In particular, in the optical system for annealing described above. By sweeping the surface of the ruthenium film into a small linear irradiation beam having a wide width and scanning in the direction of the beam traverse, the smear film is swept by its beam width as the illuminating beam passes. Uniformly rapid heating, while crystallizing and growing during solidification during post-cooling, since the beam has a small interference pattern and a uniform intensity distribution, it is possible to manufacture a wide elongated shape and uniformity and height of each crystal. Crystalline crystalline ruthenium film.
314513.ptd 第24頁 1292245 五、發明說明(14) (第1實施形態) 在本發明之第1實施形態中,第1 A圖與第1 B圖係顯示 雷射光均勻照射光學系統,此光學系統係顯示在照射面上 形成往y方向均勻分布地擴展,往X方向會聚成線狀之直線 狀照射輪廓之實施例。 此光學系統中,含有雷射光束分割機構3、重疊照射 機構6 ( 6卜6 2 )。在此實施例中,雷射光束分割機構3,係 利用波導路徑4,將雷射光束1分割成所希望數量之分割光 束1 6 a至1 6 e,並將這些分割光束透過重疊照射機構6,在 照射面9 0上以直線狀輪廓之照射光束1 9加以成像。 在此實施形態中,雷射光束分割機構3,包含有將由 雷射振動器所射出之雷射光束1入射到波導路徑4内用之光 學系統,又包含平行光束用之光束放大透鏡3 1以及y方向 平行透鏡3 2以及X方向平行透鏡3 3,更包含在y方向上聚 光,使其入射到波導路徑4内之圓筒透鏡之聚光透鏡3 4。 ❿ 波導路徑4中,具有其互相相向且平行之主要表面為 反射面之41、42,反射面41、42,在第1圖中係垂直於y方 向。雷射光束1貫穿兩反射面之間之入射端面4 3與射出端 面4 4,係與雷射光束之光軸垂直相交。入射的雷射光束 1,會被分割為通過反射面間由射出端加以射出成分之分 割光束、於反射面4 1與4 2之任何一面作一次反射(m = 1 )成 分之2道分割光束(ni = + l,m = 以及於兩方的反射面作 二次反射(m = 2 )成分之2道分割光束(m = + 2,m = -2),更有3 次或是更多於以上次數的反射之各一對分割光束,由射出314513.ptd Page 24 1292245 V. Inventive Description (14) (First Embodiment) In the first embodiment of the present invention, the first A diagram and the first B diagram show a laser light uniform illumination optical system, the optical The system shows an embodiment in which a linear irradiation profile is formed which is uniformly distributed in the y direction and spreads in a line shape in the X direction on the irradiation surface. This optical system includes a laser beam splitting mechanism 3 and an overlapping illumination mechanism 6 (6b 6 2 ). In this embodiment, the laser beam splitting mechanism 3 divides the laser beam 1 into a desired number of split beams 16 6 to 1 6 e by using the waveguide path 4, and transmits the split beams to the overlapping illumination mechanism 6 The beam 19 is imaged by a linear profile on the illuminated surface 90. In this embodiment, the laser beam splitting mechanism 3 includes an optical system for causing the laser beam 1 emitted from the laser vibrator to enter the waveguide 4, and a beam magnifying lens 3 1 for the parallel beam. The y-direction parallel lens 3 2 and the X-direction parallel lens 33 further include a condensing lens 34 that collects light in the y direction and enters the cylindrical lens in the waveguide 4.波导 In the waveguide path 4, the main surfaces which face each other and are parallel are the reflecting surfaces 41 and 42, and the reflecting surfaces 41 and 42 are perpendicular to the y direction in Fig. 1 . The laser beam 1 extends through the incident end face 43 and the exit end face 44 between the two reflecting surfaces, perpendicularly intersecting the optical axis of the laser beam. The incident laser beam 1 is divided into two divided beams which are reflected by the emitting end by the emitting end and which are reflected (m = 1) on either side of the reflecting surfaces 4 1 and 4 2 . (ni = + l,m = and two split beams (m = + 2, m = -2) with two reflections (m = 2) on the two reflecting surfaces, 3 or more Each of the pair of split beams reflected by the above number of times is emitted
第25頁 314513.ptd 1292245 五、發明說明(15) -端被射出各成分。 ' 來自波導路徑4之分割光束,透過重疊照射機構6,重 -疊並投影在照射面9 0上。重疊照射機構6,係由將分割光 束在照射面上轉印到y方向之y方向轉印透鏡61(圓筒透 _鏡),以及向X方向聚光之聚光透鏡6 2 (筒狀透鏡)所構成。 y方向轉印透鏡6 1,係使光束通過X方向聚光透鏡6 2,在照 '射面9 0上向y方向依所規定之長度延伸,而X方向聚光透鏡 6 2,會使光束在X方向會聚成線狀,由此,在照射面上可 獲得直線狀輪廓之照射光束1 9。 • 更詳細地,第2圖係顯示使用雷射光束分割機構之波 導路徑,將由雷射振動器(未圖示)所射出之雷射光束加以 务割之模樣,由雷射振動器所射出之雷射光束,會透過圓 筒透鏡之聚光透鏡3 4經由焦點F 0入射到波導路徑4内。在 -波導路徑内,入射光束之一部份,存在有不由反射面反射 而透過之分割光束(反射次數m = 0 ),接著,於互相相向之 反射面4 1或是4 2僅作一次反射之分割光束會有兩種類存在 於在y方向(m=± 1 ),此外,在反射面41及42作二次反射之 分割光束同樣地會有兩種類存在於在y方向2),各分 割光束分別由射出端面4 4射出。在垂直於光軸且含有焦點 馨之平面上,存在有由射出面4 4所射出之各分割光束之虛 ϊί象焦點F +1、F F +2、F _2,各分割光束,觀測起來會如同由 前述虛像焦點F+1、F_!、F+2、F_嬅由射出面44之開口加以射 出。 在第2圖中若將透過假設不存在波導路徑時之聚光透Page 25 314513.ptd 1292245 V. INSTRUCTIONS (15) - The ends are shot out of each component. The split light beam from the waveguide 4 is transmitted through the overlapping illumination means 6, and is superimposed and projected on the illumination surface 90. The superimposed illumination mechanism 6 is a lenticular lens 61 (cylinder lens) that transfers the split beam to the y direction on the irradiation surface, and a condensing lens 6 2 that collects the light in the X direction (a cylindrical lens) ) constitutes. The y-direction transfer lens 161 passes the light beam through the X-direction condensing lens 6 2, and extends in the y direction according to the predetermined length of the illuminating surface 90, and the X-direction condensing lens 6 2 causes the light beam to pass. Converging in a line shape in the X direction, an irradiation beam 19 having a linear profile can be obtained on the irradiation surface. • In more detail, Fig. 2 shows a waveguide path using a laser beam splitting mechanism, and a laser beam emitted by a laser vibrator (not shown) is cut into a shape, which is emitted by a laser vibrator. The laser beam is incident into the waveguide path 4 through the focus lens F 0 through the condenser lens 34 of the cylindrical lens. In the waveguide path, a part of the incident beam has a split beam that is not reflected by the reflecting surface and transmitted (the number of reflections m = 0), and then only one reflection is made on the reflecting surfaces 4 1 or 4 2 facing each other. There are two types of split beams that exist in the y direction (m=± 1 ). In addition, the split beams that are reflected twice on the reflective surfaces 41 and 42 have two types in the y direction. 2) The light beams are emitted from the exit end faces 44, respectively. On the plane perpendicular to the optical axis and containing the focus, there are virtual imaginary focal points F +1, FF +2, F _2 of the split beams emitted by the exit surface 44, and the split beams are observed as if The virtual image focus points F+1, F_!, F+2, and F_嬅 are emitted from the openings of the exit surface 44. In Figure 2, if the transmission is assumed to be absent, the condensed light will be transmitted through the waveguide.
314513.ptd 第26頁 1292245 五、發明說明(16) 鏡3 4而經由焦點加以擴散之雷射光束,投影到射出面4 4其 位置之平面上之光束輪廓設定為圓形1 4時,此投影之雷射 光束1 4能夠分解成分別對應多數道分割光束的區分成分。 將雷射光束1其剖面之各成份於剖面上,在y方向依照m = -2、-1、0、+1、+2之順序進行分割時,必須注意由波導 路徑4之射出面4 4所射出之成分,也就是分割光束,在y方 向會形成反射次數in = + 2、-1、0、+1、- 2之成分順序之排 列。 在第2圖中,僅顯示出由波導路徑4之射出面44所射出 之mz + O、+1、+ 2之成分之分割光束之配置,m = + l、4* 2之分 割光束,對於反射面之中間面,乃是互相以相反方向射 出。另一方面,m = - 1與m = - 2之分割光束,對於m二+ 1、+ 2之 反射面之中間面為對稱方向,所以圖中將其省略。 第3 A圖所示乃是將雷射光束由焦點F $在波導路徑4加 以反射,而把投影在波導路徑4之射出面4 4所對應之平面 上之雷射光束1 4中分割光束之分割寬度加以圖式化之示意 圖。此乃是,根據高斯分布之圓形輪廓之雷射光束1 4透過 波導路徑加以分割成7道之實施例。 在波導路徑4中,在波導路徑4之射出面4 4處,互相鄰 接之分割光束會折返受到重疊。因此,透過雷射光束1之 分割所產生之互相鄰接之成分,其境界部位,在第3Β圖 中,在波導路徑之射出面之分割光束之折返部分處會一 致。例如,在第3Α圖中,m = + 1之成分之境界部I I I與連接 此境界部之m = 0之境界部i i i,會如第3 B圖所示般,在波導314513.ptd Page 26 1292245 V. DESCRIPTION OF THE INVENTION (16) The laser beam diffused through the focus by the mirror 34 is projected to a circle 1 4 when the beam profile projected on the plane of the exit surface 44 is set to a circle 1 4 The projected laser beam 14 can be decomposed into distinct components corresponding to the majority of the divided beams. When the components of the cross section of the laser beam 1 are on the cross section and are divided in the order of m = -2, -1, 0, +1, and +2 in the y direction, attention must be paid to the exit surface 4 of the waveguide path 4. The component that is emitted, that is, the split beam, forms an arrangement of the order of the components of the number of reflections in = y 2, -1, 0, +1, - 2 in the y direction. In Fig. 2, only the arrangement of the split beams of the components of mz + O, +1, and + 2 emitted from the exit surface 44 of the waveguide 4, and the split beams of m = + l and 4 * 2 are shown. The intermediate faces of the reflecting surfaces are emitted in opposite directions from each other. On the other hand, the split beams of m = -1 and m = - 2 have a symmetrical direction with respect to the intermediate faces of the reflection faces of m 2 + 1 and + 2, so they are omitted in the figure. 3A is a view in which the laser beam is reflected from the waveguide F by the focus F$, and the laser beam is split into the laser beam 14 projected on the plane corresponding to the exit surface 44 of the waveguide 4. A schematic diagram of dividing the width into a schema. This is an embodiment in which the laser beam 14 of the circular contour of the Gaussian distribution is divided into 7 channels by the waveguide path. In the waveguide path 4, at the exit surface 44 of the waveguide path 4, the mutually adjacent divided beams are folded back and overlapped. Therefore, the boundary portions of the mutually adjacent components generated by the division of the laser beam 1 are identical in the third figure, at the folded portion of the split beam of the exit surface of the waveguide. For example, in the third diagram, the boundary portion I I I of the component of m = + 1 and the boundary portion i i i connecting m = 0 of this boundary portion, as shown in Fig. 3B, in the waveguide
314513.ptd 第27頁 1292245 五、發明說明(17) 路徑4之射出面4 4處受到折返而重疊。 將如此折返之分割光束,經由y方向轉印透鏡6 1與X方 -向聚光透鏡6 2等,使其在照射面9 0上重疊投影時,照射光 束在照射面上會產生干涉,形成強烈之波狀分布。 ; 第4圖所示乃是,僅有由波導路徑所射出之分割光束 之兩個成分,例如將反射次數m = + l以及m = 0之兩個成分, 經由y方向轉印透鏡6 1與X方向聚光透鏡6 2等,使其在照射 面9 0上重疊加以照射時其照射面9 0上之照射光束1 9之強度 分布圖,原本之雷射光束上互相鄰接之分割光束境界部 i與I I I會有較大之干涉,同樣地,在原本之雷射光束上 互相分離之分割光束境界部I V與i i方面,則顯示因干涉所 蓋生之強度分布之變動較小。在第4圖中,橫軸代表分割 寬度d,而縱軸則代表相對之光束強度。但是,第4圖中, 乃是使雷射光束之強度分布與高斯分布近似,分割寬度d 為相等於空間性可干涉距離s之情況。 照射面上之重疊所產生之干涉程度,乃是依存在分割 寬度d與在其位置上之雷射光束之空間性可干涉距離s之 比。在此,空間性可干涉距離s,乃是定義為:在雷射光 耒之光束剖面中之強度分布依高斯分布加以保存時,如第 #1的模式所示般,將光束直徑D規定為強度成為光轴強度 之1 / e 2(在此e為自然對數之底)時其圓(1 / e匍)之直徑D, 由將單一之雷射光束分割為兩道在照射面上將光軸加以共 通使其干涉之狀態,將光軸互相偏移而重疊之照射區域中 干涉條紋之可視性降低為1 / e時,雙方之1 / e 1]之中心間之314513.ptd Page 27 1292245 V. INSTRUCTIONS (17) The exit surface 44 of the path 4 is folded back and overlapped. When the split light beam thus folded back passes through the y-direction transfer lens 61 and the X-direction condensing lens 6 2 and the like, and the projection light is superimposed on the irradiation surface 90, the irradiation light beam interferes on the irradiation surface, forming an interference beam. Strong wavy distribution. Figure 4 shows that only the two components of the split beam emitted by the waveguide path, for example, the two components of the number of reflections m = + l and m = 0, are transferred to the lens 6 1 via the y direction. The intensity distribution map of the illumination beam 19 on the illumination surface 90 when the X-direction condenser lens 6 2 is superimposed on the illumination surface 90, and the original beam boundary portion adjacent to each other on the laser beam i and III will have a large interference. Similarly, in the divisional beam boundary portions IV and ii which are separated from each other on the original laser beam, the variation in the intensity distribution due to the interference is small. In Fig. 4, the horizontal axis represents the division width d, and the vertical axis represents the relative beam intensity. However, in Fig. 4, the intensity distribution of the laser beam is approximated by the Gaussian distribution, and the division width d is equal to the spatial interference distance s. The degree of interference produced by the overlap on the illuminated surface is the ratio of the spatially interferable distance s of the laser beam at the position of the division width d and its position. Here, the spatially interferable distance s is defined as: when the intensity distribution in the beam profile of the laser beam is preserved according to the Gaussian distribution, as shown in the pattern of #1, the beam diameter D is defined as the intensity. The diameter D of the circle (1 / e匍) when the optical axis intensity is 1 / e 2 (where e is the base of the natural logarithm), by dividing a single laser beam into two paths and the optical axis on the illuminated surface When the visibility of the interference fringes in the overlapping areas where the optical axes are shifted and overlapped is reduced to 1 / e, the center of each of the 1 / e 1] is
314513.ptd 第28頁 1292245 五、發明說明(18) 距離。在此,所謂的可視性,乃是指將干涉之強度分布其 最高強度與最低強度之差除以最高強度與最低強度之和所 得到之值,為顯示干涉程度之尺度。 當將雷射光束之分割寬度d,訂為d = s/2時,互相鄰接 之分割光束其互相靠近區域之照射光束重疊部處,其可視 性趨近於1,在分離區域之照射光束其重疊部處,可視性 變為1 / e。在其中間區域,則是由1遞減到1 / e。在較佳實 施形態中,分割寬度d,乃是d = s/2以上,在此場合之分離 區域之照射光束之重疊部處,其可視性降低為1 / e以下。 此外,雷射光束之分割寬度d,訂在d = s//" 2以上時, 在分離區域之照射光束之重疊部處,其可視性降低為1 / e 2〇 在最佳實施形態中,在分離區域之照射光束之重疊部 處,其可視性降低至1 / e奴下。 將分割寬度d取為d = s,則如第2圖所示般透過波導路 徑4將雷射光束分割為7,在照射面上重疊時之強度分布為 第6圖所示,顯示強度分布受到相當程度之改善。此圖 中,發生干涉條紋之週期T,乃是由T =又/ s i ηΔ 0加以決 定。在此,λ為波長,△ 0為產生干涉之2道分割光束在 照射面1 9上之入射角之差。 (第2實施形態) 本實施例乃是利用圓筒透鏡陣列作為另一光束分割機 構,在本實施例中,如第8Α圖與第8Β圖所示,雷射光均勻 照射光學系統係包含將由雷射振動器所射出之雷射光束1314513.ptd Page 28 1292245 V. INSTRUCTIONS (18) Distance. Here, the term "visibility" refers to a value obtained by dividing the difference between the highest intensity and the lowest intensity of the intensity distribution of the interference by the sum of the highest intensity and the lowest intensity, and is a measure of the degree of interference. When the division width d of the laser beam is set to d = s/2, the mutually adjacent split beams are adjacent to each other at the overlapping portion of the illumination beam, the visibility of which approaches 1 and the illumination beam in the separation region At the overlap, the visibility becomes 1 / e. In the middle area, it is decremented from 1 to 1 / e. In the preferred embodiment, the division width d is d = s/2 or more. In this case, the visibility of the overlapping portion of the illumination beam in the separation region is reduced to 1 / e or less. In addition, when the division width d of the laser beam is set to d = s//" 2 or more, the visibility of the overlapping portion of the illumination beam in the separation region is reduced to 1 / e 2 〇 in the preferred embodiment. At the overlap of the illumination beam of the separation region, the visibility is reduced to 1 / e slave. When the division width d is taken as d = s, the laser beam is divided into 7 by the waveguide 4 as shown in Fig. 2, and the intensity distribution when superimposed on the illumination surface is shown in Fig. 6, and the intensity distribution is shown. A considerable degree of improvement. In this figure, the period T at which the interference fringes occur is determined by T = again / s i ηΔ 0 . Here, λ is the wavelength, and Δ 0 is the difference between the incident angles of the two divided beams which cause interference on the irradiation surface 19. (Second Embodiment) In the present embodiment, a cylindrical lens array is used as another beam splitting mechanism. In the present embodiment, as shown in Figs. 8 and 8B, the laser light uniform illumination optical system includes a Laser beam emitted by the vibrator
314513.ptd 第29頁 1292245314513.ptd Page 29 1292245
-五、發明說明(19) ,入射到圓筒透鏡陣列5用之光學系統,又包含平行光束用 •之光束放大透鏡3 1和y方向平行透鏡3 2以及X方向平行透鏡 .3 3,將來自平行透鏡3 3之平行光束入射到圓筒透鏡陣列 5 〇 / 在圓筒透鏡陣列5中,圓筒透鏡乃是指將圖中χ方向呈 桂狀朝,光軸之剖面凸透鏡往y方向重疊之透鏡,圖中範 例’乃疋由5段該種微小圓筒透鏡5 &至5 e所加以構成,由 此,可形成5道分割光束。 由分割用圓筒透鏡陣列5朝向y方向之分割光束1 5&至 # e ’會入射到配置於其前方之另外之轉印用圓筒透鏡陣 列5 1,來自轉印用圓筒透鏡陣列5丨之分割光束,會透過朝 “X方向聚光的透鏡62(圓筒透鏡)投射在照射面9〇上,而形 成具有在y方向均勻,在χ方向細長會聚之線狀輪廓之照射 光束19。此外,場透鏡(fie]L(1 lens)63,係配置於轉印用 圓筒透鏡陣列51與聚光透鏡62之間。 、第9A圖與第9B圖’係顯示圓筒透鏡陣列5中雷射光束 =分割模樣,各微小圓筒透鏡所分割之光束,與先前透過 :導路2進行之分割不同,在照射面重疊之際,並不會折 ^僅進仃重豎而已,因此,即使將兩道互相鄰接之分割光 由轉印用圓筒透鏡陣列5丨與χ方向聚光透鏡6 2在照射 面上加以重豐’合成後之強度分布,與在y方向上之干涉 並無差異。 、,丨+〇圖係’將分割寬度d與前述空間性可干涉距離3訂 為相等日守其互相鄰接之兩道分割光束其在照射面上之重- V. Inventive Note (19), an optical system for incident on the cylindrical lens array 5, further comprising a beam magnifying lens 3 1 for parallel beams, a parallel lens 3 in the y direction, and a parallel lens in the X direction. 3 3 The parallel light beams from the parallel lens 3 3 are incident on the cylindrical lens array 5 〇 / in the cylindrical lens array 5, which means that the χ direction of the figure is a cassia, and the convex lens of the optical axis overlaps in the y direction. The lens, in the figure, is composed of five micro-cylindrical lenses 5 & 5 e to 5 e, whereby five divided beams can be formed. The divided light beams 1 5 & to # e ' which are directed toward the y direction by the cylindrical lens array 5 for division are incident on the other transfer cylindrical lens array 5 1 disposed in front of the cylindrical lens array 5 for transfer from the cylindrical lens array 5 for transfer. The split beam is projected onto the illumination surface 9 through a lens 62 (cylinder lens) that collects in the X direction, thereby forming an illumination beam 19 having a linear contour that is uniform in the y direction and elongated in the x direction. Further, a field lens (fie) L (1 lens) 63 is disposed between the cylindrical lens array 51 for transfer and the condensing lens 62. Fig. 9A and Fig. 9B show the cylindrical lens array 5 In the middle laser beam = split pattern, the beam split by each micro-cylindrical lens is different from the previous transmission: the guide 2 is divided, and when the illumination surfaces overlap, they are not folded and only vertical and vertical, so Even if the two divided light beams adjacent to each other are subjected to a heavy-combined intensity distribution on the irradiation surface by the cylindrical lens array 5 for transfer and the pupil lens concentrating lens 6 2, the interference in the y direction is No difference. ,,丨+〇图系' will divide the width d and the aforementioned spatiality 3 is set equal to the interference from the date of its adjacent to each other to keep the two split light irradiated surface of the weight in
1292245 五、發明說明(20) 疊所產生之強度分布,在y方向為一定,其可視性顯示為 1 / e之一定值。 第1 1圖係針對透過前述分割用圓筒透鏡陣列5所分割 成的7道分割光束,將分割寬度d,訂為d = s時,顯示在照 射面上之重疊時所產生之強度分布,在y方向具有相當良 好之分布。 (第3實施形態) 本發明之第3實施形態之光學系統,前述均勻化機構 係包含有光學性延遲機構使透過前述波導路徑所形成之分 割光束中互相鄰接之鄰接分割光束的任何一方對於另一方 具有更加延遲之時間性可干涉距離。光學性延遲機構,乃 是由雷射光束其互相鄰接之區域所射出之分割光束會互相 干涉,在兩者間設置時間性可干涉距離以上之光路徑差, 以防止干涉之光學系統。 本實施形態中,係利用透光性之延遲板7,作為光學 性延遲機構之光學系統。該光學系統,係如第1 2A圖與第 1 2 B圖所示般,乃是使用利用波導路徑4之雷射光束分割機 構3、作為重疊照射機構之垂直相交之2個圓筒透鏡(6 1、 6 2 )、以及作為光學延遲機構之延遲板7。在本實施例中, 波導路徑4與第1實施形態之波導路徑相同,將雷射光束1 分割成所希望分割數之分割光束1 6 a至1 6 e,將這些分割光 束透過重疊照射機構6在照射面9 0上形成直線狀輪廓之照 射光束成像。 第1 2 B圖中,在複數道分割光束互相分離之位置上,1292245 V. INSTRUCTIONS (20) The intensity distribution produced by the stack is constant in the y direction, and its visibility is shown as a certain value of 1 / e. In the case of the seven-divided light beam that has been divided by the cylindrical lens array 5 for division, the first embodiment shows the intensity distribution generated when the division width d is set to d = s. It has a fairly good distribution in the y direction. According to a third aspect of the present invention, in the optical system according to the third aspect of the present invention, the equalization means includes an optical delay mechanism for causing either one of adjacent light beams adjacent to each other among the divided light beams formed through the waveguide path to One party has a more delayed temporal interference distance. The optical retardation mechanism is an optical system in which a split light beam emitted from a region adjacent to each other by a laser beam interferes with each other and an optical path difference equal to or greater than a temporal interference distance is provided therebetween to prevent interference. In the present embodiment, the translucent retardation plate 7 is used as the optical system of the optical delay mechanism. The optical system is a laser beam splitting mechanism 3 using the waveguide 4, and two cylindrical lenses which are perpendicularly intersecting the overlapping illumination means, as shown in Figs. 2A and 1B. 1, 6 2 ), and a retardation plate 7 as an optical delay mechanism. In the present embodiment, the waveguide 4 is divided into the divided beams 1 6 a to 16 e of the desired number of divisions in the same manner as the waveguide of the first embodiment, and the divided beams are transmitted through the overlapping illumination means 6 An illumination beam image forming a linear profile on the illumination surface 90 is imaged. In the first picture, in the position where the plurality of divided beams are separated from each other,
314513.ptd 第31頁 1292245 五、發明說明(21) -於容易互相產生干涉之分割光束之任何一道,插入透光性 之延遲板7,也就是說,插入光學玻璃板2,作為光學性延 遲機構,在相鄰之分割光束間形成光路徑差。在此實施例 中,將透過波導路徑4所分割之光束透過y方向轉印透鏡6 1 $以轉印,透過X方向聚光透鏡6 2,在照射面上形成照射 光束1 9,而在y方向轉印透鏡6 1與X方向聚光透鏡6 2之間, ‘透過y方向轉印透鏡6 1在各光束上形成焦點f,作為延遲板 7之玻璃板,則於相鄰之分割光束的任何一方插入在焦點 位置f或者是其前後以設置光路徑差。圖之範例,乃是在5 •分割光束中每隔一道插入作為延遲板7之玻璃板,在互 相鄰接之延遲板7、7之間的空間中,其他之分割光束會通 過。透過前述排列之延遲板7,在照射面上受到重疊之照 射光束上,互相鄰接之分割光束之間不會產生干涉,故能 夠實質上形成強度分布均勻之輪廓。 由玻璃板所形成之光路徑差△ a,係由玻璃板之厚度 a、玻璃之折射率n i、空氣之折射率η。(通常η 〇= 1 ),得到, Δ a = a(n「n〇) / 玻璃板所形成之光路徑差△ a,係設定為時間性可干 渉距離△ L以上,也就是, φ A a- △ L。 ’ 另一方面,雷射光束之時間性可干涉距離△ L,由 Δ L = cA t ^ Α 2/Δλ 得到。 在此,c為光速,△ t為可干涉時間,△ λ為雷射光所 具有之波長寬度(光譜寬度),雷射之波長寬度愈窄,可干314513.ptd Page 31 1292245 V. Description of the Invention (21) - Inserting the translucent retardation plate 7 into any one of the split beams that are easy to interfere with each other, that is, inserting the optical glass plate 2 as an optical delay The mechanism forms a light path difference between adjacent split beams. In this embodiment, the light beam split by the waveguide path 4 is transmitted through the y-direction transfer lens 6 1 $ for transmission, and transmitted through the X-direction condensing lens 62 to form an illuminating beam 19 on the illuminating surface. Between the direction transfer lens 6 1 and the X-direction condensing lens 6 2, 'the y-direction transfer lens 61 forms a focal point f on each of the light beams, and the glass plate serving as the retardation plate 7 is adjacent to the divided light beam. Either side is inserted at or before and after the focus position f to set the optical path difference. In the example of the figure, the glass plate as the retardation plate 7 is inserted every other one of the 5 split beams, and the other split beams pass through the spaces between the mutually adjacent retard plates 7, 7. Through the retardation plate 7 arranged as described above, the overlapping light beams which are superimposed on the irradiation surface do not interfere with each other, so that a contour having a uniform intensity distribution can be substantially formed. The light path difference Δ a formed by the glass plate is the thickness a of the glass plate, the refractive index n i of the glass, and the refractive index η of the air. (usually η 〇 = 1 ), and Δ a = a(n "n〇) / the optical path difference Δ a formed by the glass plate is set to a temporally dry distance Δ L or more, that is, φ A a - △ L. ' On the other hand, the temporal interference of the laser beam can be obtained by Δ L = cA t ^ Α 2/Δλ. Here, c is the speed of light, Δ t is the interferable time, △ λ For the wavelength width (spectral width) of the laser light, the narrower the wavelength of the laser, the drier
314513.ptd 第32頁 1292245 五、發明說明(22) 涉距離會愈長。 舉例來說,在Nd : YAG雷射中,針對中心波長λ =1. 06 // m之光束其光諸寬度為△ λ = 0 . 1 2至0 . 3 0 m m,故時間性可 干涉距離A L,會成為△ L = 3. 8至9. 4 m m。 第7圖中,說明由雷射光束其互相鄰接之區域所分割 之兩道分割光束的在照射面之可視性與設置於分割光束間 之光路徑差之距離(也就是,光路徑差△ a)之關係’當光 路徑差為時間性可干涉距離△ L時,可視性會降低到1 / e, 透過更將來自分割光束間之光路徑差加以擴大,可視性會 更加變小。 由前述關係中,可求出互相鄰接之分割光束間給予時 間性可干涉距離△ L以上之光路徑差之玻璃厚度a。延遲板 之厚度’最好是設定為依據延遲板設置時間性可干涉距離 △ L的2倍以上光路徑差,更好的是,設置4倍以上之光路 徑差。例如,光源為前述Nd : YAG雷射,光學性延遲機構 之延遲板7,是利用石英(折射率η尸1 · 4 6 )時,對於時間性 可干涉距離△ L為3. 8至9. 4mni而言,石英玻璃之厚度a英會 成為1 2至3 0 mm。 第1 3圖係第3實施形態之變形例,顯示由X方向所觀測 到之光學系統之配置,除了光學延遲機構7之配置不同之 外,基本上,與第1 2 A圖與第1 2 B圖之光學系統為相同之雷 射光均句照射光學系統,在本實施例中,乃是採用將在前 述波導路徑之反射面之間未反射而通過之分割光束加以遮 斷之方式。314513.ptd Page 32 1292245 V. INSTRUCTIONS (22) The longer the distance will be. For example, in a Nd:YAG laser, the beam with a center wavelength λ =1. 06 // m has a width of Δ λ = 0 . 1 2 to 0 . 3 0 mm, so the temporal interferometric distance AL, will become Δ L = 3. 8 to 9. 4 mm. In Fig. 7, the distance between the visibility of the two divided beams split by the areas adjacent to each other by the laser beam and the distance of the optical path between the divided beams (i.e., the optical path difference Δ a ) will be described. The relationship 'When the optical path difference is the temporal interfering distance Δ L , the visibility is reduced to 1 / e, and the optical path difference from the split beam is expanded to make the visibility smaller. In the above relationship, the glass thickness a of the optical path difference in which the time-interference distance Δ L or more is given between the mutually adjacent divided light beams can be obtained. The thickness ' of the retardation plate y is preferably set to be more than twice the optical path difference of the temporally interceptible distance Δ L according to the retardation plate, and more preferably, the optical path difference of four times or more is set. 5至9。 The light-interference distance ΔL is 3. 8 to 9. The light-interference distance Δ L is 3.8 to 9. For 4mni, the thickness of quartz glass will be 1 2 to 30 mm. Fig. 13 is a modification of the third embodiment, showing the arrangement of the optical system observed in the X direction, and basically, in addition to the arrangement of the optical delay mechanism 7, basically, with the 1 2 A map and the 1 2 The optical system of Fig. B is the same laser light illuminating optical system. In the present embodiment, the splitting light beam which is not reflected by the reflecting surface of the waveguide path is blocked.
314513.ptd 第33頁 1292245 五、發明說明(23) - 也就是說,將如第2圖、第3A圖與第3B圖所示之波導 路徑4之反射次數m = 0之場合中之直行光束,透過配置於y 方向轉印透靜後方之焦點位置f之遮蔽體7 9加以遮斷。m二0 之直行光束,受到遮蔽體7 9之阻擋,無法抵達照射面,所 f乂不會牽涉到干涉。因此,光學性延遲機構7,對於直行 光·束(ΙΏ = 0 )將只會插入其對稱配置之分割光束群(m 4卜 -2)又或者是(10 = -1,+2 )任何一方之一方,另一方之群 組,則由於未配置有光學性延遲機構7,故由此,降低了 照射面上其分割光束相互間之干涉,並且光學性延遲機構 _乃是利用將一方之分割光束群(ιώ = + 1,-2)—併使其透 過之單一延遲板7 2,例如,可利用一片之玻璃板或是玻璃 森,具有可將光學系統簡單化之優點。 又一其他變形例之光學系統,含有波導路徑4與光學 性延遲機構7,但是以未含有在波導路徑内未反射而直行 之分割光束的方式,提供一種雷射光束分割機構,使波導 路徑能讓所有之分割光至少作一次反射,並且防止2道以 上之反射分割光束作同次數的反射。如此之雷射光束分割 機構,係如第1 4圖所示般,可採用將雷射光束分割機構之 八射光學系統的光軸,對於波導路徑之中心軸,依所定之 •&作斜交般地加以配置之構造。 ’ 如第15圖、第16Α圖與第16 Β圖所示般,入射到波導路 徑4内之圓筒透鏡之聚光透鏡34之光束的周圍成分(1 ),會 入射到波導路徑4之入射面,並在反射面作1次反射由射出 面射出,來自聚光透鏡3 4之其他光束成分(2)(3)(4),分314513.ptd Page 33 1292245 V. Description of Invention (23) - That is, a straight beam in the case where the number of reflections of the waveguide path 4 shown in Figs. 2, 3A and 3B is m = 0 The shielding body 7 9 disposed at the focus position f after the transfer in the y direction is blocked. The straight beam of m 2 is blocked by the shielding body 79 and cannot reach the illuminated surface, so f乂 does not involve interference. Therefore, the optical delay mechanism 7 will insert only the symmetrical arrangement of the split beam group (m 4 bu-2) or the (10 = -1, +2) for the straight-light beam (ΙΏ = 0). In one of the groups, the other group is not equipped with the optical delay mechanism 7, so that the interference between the split beams on the illumination surface is reduced, and the optical delay mechanism is used to divide one side. The beam group (ιώ = + 1, -2) - and the single retardation plate 72 that is transmitted through it, for example, can use a piece of glass plate or glass, which has the advantage of simplifying the optical system. The optical system according to still another modification includes the waveguide path 4 and the optical delay mechanism 7, but provides a laser beam splitting mechanism so as not to include a split beam that is not reflected in the waveguide path and is straightforward, so that the waveguide path can Let all the split light be reflected at least once, and prevent more than 2 reflections of the split beam from being reflected for the same number of times. Such a laser beam splitting mechanism can be used as shown in FIG. 14 , and the optical axis of the optical system of the laser beam splitting mechanism can be used, and the central axis of the waveguide path is tilted according to the specified & Constructed in a manner that is configurable. As shown in Fig. 15, Fig. 16 and Fig. 16, the surrounding component (1) of the light beam of the collecting lens 34 of the cylindrical lens incident on the waveguide 4 is incident on the waveguide path 4. The surface is reflected by the exit surface by the reflection surface, and the other beam components (2)(3)(4) from the condensing lens 34 are divided into
314513.ptd 第34頁 1292245_ 五、發明說明(24) 別作2次反射、3次反射、4次反射,其他成分則是作更多 次數之反射,而由射出面射出般加以設定。受到射出之分 割光束,在第1 5圖之射出面側,以反射次數m的數字1至8 加以表示。 第1 6 A圖與第1 6 B圖中,記載有射出面4 4上平面中光束 剖面之分割光束之配置,以及射出面上分割光束之重疊。 反射次數之順序,乃是代表雷射光束剖面中分割光束配置 之順序。因此,反射次數之順序相差1之兩分割光束間, 彼此在照射面上容易產生干涉,僅針對順序相差1之分割 光束的任何一方,配置有作為空間性延遲機構之延遲板 7。此延遲板之配置,係如第1 4圖所示般,在Y方向轉印透 鏡所產生之焦點位置f上,偶數次(例如,m = 2、4、6 )反射 之分割光束群,對於奇數次(m=卜3、5 )之分割光束群會 偏向一方,透過對偶數次反射m = 2、4、6之所有分割光 束,插入單一之延遲板7 2,能夠簡單地實現相鄰分割光束 其彼此之間的干涉。 第1 6A圖與第1 6B圖中,分割光束之寬度d,係如前述 實施形態所述般,空間性可干涉距離s設定在1 / 2以上,最 好是1 AA 2以上,特別是以1以上為最佳。 第1 7圖係顯示在波導路徑4内不形成直行分割光束之 又一變形例。在此實施例中,令波導路徑4之光軸4 0與聚 光透鏡3 4之光軸3 0—致,將波導路徑4之入射面4 3對於光 軸不作垂直相交,而以適當之角度令其斜交,透過使在斜 交後之入射面4 3處之入射光束1 3加以折射,消除零次反314513.ptd Page 34 1292245_ V. INSTRUCTIONS (24) Do not make 2 reflections, 3 reflections, or 4 reflections. The other components are reflected more times and set by the exit surface. The split beam that is emitted is shown on the exit surface side of Fig. 5, and is represented by the number 1 to 8 of the number m of reflections. In Figs. 1 6 A and 1 6 B, the arrangement of the split beams of the beam profile in the plane on the exit surface 44 and the overlap of the split beams on the exit face are described. The order of the number of reflections represents the order in which the split beams are arranged in the laser beam profile. Therefore, the two divided beams having the order of the number of reflections are likely to interfere with each other on the irradiation surface, and the retardation plate 7 as the spatial delay mechanism is disposed only for any one of the divided beams having the order difference of one. The arrangement of the retardation plate is a split beam group that is reflected evenly (for example, m = 2, 4, 6) at a focus position f generated by the Y-direction transfer lens as shown in FIG. The odd-numbered (m=Bu 3, 5) split beam group will be biased to one side, and through a pair of split beams of m = 2, 4, and 6 for even reflections, a single retardation plate 7 2 can be inserted to easily implement adjacent segmentation. The beams interfere with each other. In the first and sixth embodiments, the width d of the divided light beam is set to be 1 / 2 or more, preferably 1 AA 2 or more, as described in the above embodiment. 1 or more is the best. Fig. 17 shows still another modification in which the straight split beam is not formed in the waveguide 4. In this embodiment, the optical axis 40 of the waveguide 4 is aligned with the optical axis 30 of the collecting lens 34, and the incident surface 43 of the waveguide 4 is not perpendicularly intersected with respect to the optical axis, but at an appropriate angle. By skewing it, by refracting the incident beam 13 at the entrance face 43 after the skew, eliminate the zero-reverse
jii 圓 第35頁 314513.ptd 1292245 五、發明說明(25) 射,而獲得1次、2次、3次等反射之分割光束,在此實施 例中,亦可將一個延遲板7 2,在由y方向轉印透鏡所產生 之焦點f位置處,透過一併插入偶次數反射(例如in = 2、4、 6 )之分割光束或是奇次數反射(m = 1、3、5 )之分割光束之 f式,能夠在互相鄰接之分割光束間設置光路徑差。 (第4實施形態) ' ’ 本實施形態中,係適用前述延遲板以作為前述第2實 施形態的圓筒透鏡陣列之分割機構,以及作為將透過該圓 筒透鏡陣列予以分離之分割光束的光學性延遲機構,以防 _干涉之實施例。 第18A圖與第18B圖中,由分割用圓筒透鏡陣列5向Y方 而分割之分割光束1 5 a至1 5 e,插入作為光學性延遲機構之 延遲板7,在本實施例中,各延遲板7會每隔一道插入分割 光束15a、15c、15e,而不插入其他分割光束15b、15d。 由此,互相鄰接之分割光束間(例如,分割光束1 5 a與1 5 b 之間,或是分割光束1 5 b與1 5 c之間)其在照射面9 0上之干 涉會受到限制,能夠均勻化重疊後之照射光束之干涉所產 生之強度分布。 • 第1 9圖係第1 8A圖與第1 8B圖所示之雷射光均勻照射光 #系統之變形例,在分割用圓筒透鏡陣列5之分割光束 i,以及其前方之轉印用圓筒透鏡陣列5 1之前方焦點位置 上,分別配置一對延遲板7 3與7 4。在此實施例中,在轉印 用圓筒透鏡陣列5 1之前後,因配置了 2個延遲板7 4與7 4, 所以能夠將延遲板之被轉印面與轉印面形成共輛關係,由Jii circle page 35 314513.ptd 1292245 V. Description of the invention (25) to obtain a split beam of 1 time, 2 times, 3 times, etc., in this embodiment, a retardation plate 7 2 From the position of the focus f generated by the y-direction transfer lens, the split beam that is inserted into the even-numbered reflection (for example, in = 2, 4, 6) or the odd-numbered reflection (m = 1, 3, 5) is divided. The f-type of the light beam can set the optical path difference between the mutually split split beams. (Fourth Embodiment) In the present embodiment, the retardation plate is applied as the division mechanism of the cylindrical lens array of the second embodiment, and as the optical light of the split beam that is separated by the cylindrical lens array. Sexual delay mechanism to prevent _ interference in the embodiment. In the 18A and 18B, the divided light beams 1 5 a to 15 e divided by the dividing cylindrical lens array 5 toward the Y side are inserted into the retardation plate 7 as an optical delay mechanism, in the present embodiment, Each of the retardation plates 7 inserts the split beams 15a, 15c, 15e every other one without inserting the other split beams 15b, 15d. Thus, the interference between the mutually adjacent split beams (for example, between the split beams 1 5 a and 1 5 b or between the split beams 1 5 b and 1 5 c) is limited on the illumination surface 90. The intensity distribution generated by the interference of the overlapping illumination beams can be homogenized. • Fig. 19 is a modification of the laser light uniform illumination light system shown in Figs. 18A and 18B, the split beam i of the cylindrical lens array 5 for division, and the transfer circle in front of it. A pair of retardation plates 7 3 and 7 4 are respectively disposed at the front focus position of the cylindrical lens array 5 1 . In this embodiment, after the cylindrical lens array 5 1 for transfer is disposed, since the two retardation plates 7 4 and 7 4 are disposed, the transfer surface of the retardation plate and the transfer surface can form a common vehicle relationship.
314513.ptd 第36頁 1292245 五、發明說明(26) 此,具有將在照射面之繞射影響做到最小之優點。 第2 0圖乃是第1 8 B圖所示之雷射光均勻照射光學系統 之變形例,針對插入延遲板7之分割光束其轉印用圓筒透 鏡陣列5 1之微小透鏡5 1 2,以及針對未插入延遲板之分割 光束其轉印用圓筒透鏡陣列5 1之微小透鏡5 1 1,乃是被調 製成在照射面之成像具有一樣而有不同的焦點距離。透過 由分割用圓筒透鏡陣列5在y方向排列分割之分割光束中每 隔一道分割光束插入光路徑長用之延遲板7之方式,雖然 對於未插入之分割光束會產生焦點位置f之偏移,但乃是 將焦點f之位置偏移以轉印用圓筒透鏡陣列5 1之各個微小 透鏡加以補償,由此,能夠均勻化成像於照射面上之各分 割光束之強度分布。 (第5實施形態) 在此實施資形態中,乃適用旋光機構作為均勻化機 構,防止互相鄰接之分割光束彼此在照射面上之干涉,而 達到均勻化。此光學系統乃是含有作為雷射光束分割機構 之波導路徑、作為重疊照射機構之圓筒透鏡、以及作為均 勻化機構之旋光機構之雷射光均勻照射光學系統。此光學 系統,在照射面上於y方向作均勻之分布擴大,而於X方向 形成線狀會聚之直線狀照射輪廓。雷射光束分割機構3, 係利用波導路徑4將雷射光束分割成所希望數量之分割光 束,透過重疊照射機構將分割光束在照射面上形成直線狀 輪廓之成像。 本實施形態之光學系統中,前述均勻化機構,包含有314513.ptd Page 36 1292245 V. INSTRUCTIONS (26) This has the advantage of minimizing the effects of diffraction on the illuminated surface. Fig. 20 is a modification of the laser light uniform illumination optical system shown in Fig. 18B, and the minute lens 5 1 2 of the cylindrical lens array 5 1 for transfer of the split light beam inserted into the retardation plate 7, and The minute lens 5 1 1 of the cylindrical lens array 5 for transfer which is not divided into the retardation plate is modulated so that the imaging on the irradiation surface has the same and different focal lengths. Each of the divided light beams arranged in the y direction by the cylindrical lens array 5 for division is inserted into the retardation plate 7 for the optical path length, and the offset of the focal position f is generated for the undivided split light beam. However, the position of the focus f is shifted by the respective minute lenses of the cylindrical lens array 5 for transfer, whereby the intensity distribution of each of the divided light beams formed on the irradiation surface can be uniformized. (Fifth Embodiment) In this embodiment, an optical rotator is used as the homogenization mechanism to prevent the mutually adjacent divided light beams from interfering with each other on the irradiation surface to achieve uniformity. This optical system is a laser light uniform illumination optical system including a waveguide path as a laser beam splitting means, a cylindrical lens as a superimposed illumination means, and an optical rotation mechanism as a homogenization means. This optical system is uniformly distributed in the y direction on the irradiation surface, and forms a linearly illuminating contour in the X direction. The laser beam splitting mechanism 3 divides the laser beam into a desired number of divided beams by the waveguide 4, and forms a linear contour on the illuminated surface by the overlapping illumination means. In the optical system of the embodiment, the homogenization mechanism includes
314513.ptd 第37頁 1292245 五、發明說明(27) 由前述波導路徑所形成之分割光束中互相鄰接之鄰接分割 光束的任何一方對於另一方令偏光面之角度作實質性垂直 相交之旋光機構。此旋光機構,乃是使由互相鄰接之區域 所分割光束之偏光面呈互相垂直相交,以防止分割光束互 相之干涉。 • 旋光機構,乃是以互相鄰接之兩道分割光束其互相之 干’涉實質上不發生的程度使偏光面之角度作實質上垂直相 交般地使其加以旋光,最好是利用由石英所構成之半波長 板。 φ 第2 1 A圖與第2 1 B圖中,在波導路徑4前方之y方向轉印 透鏡6 1 (圓筒透鏡)之前方處令形成焦點f,將半波長板8作 爲旋光機構,配置於該焦點位置。在此實施例中,由波導 路徑4所分割之5道分割光束中,僅針對反射次數m = 0、 m = + 2、in = - 2之3道分割光束插入半波長板8,其他反射次數 m = +1、1則不插入。在此構成中,排列於y方向之分割 光束之每隔一道介入有半波長板。由此,參照第2圖與第 3 A圖,將半波長板8僅插入互相鄰接之兩道分割光束中之 任何一方,對於另一方之分割光束使偏光角度作實質上垂 直相交。由此,互相鄰接之任何組合之兩道分割光束,即 照射面9 0上重疊亦不會產生干涉。因此,在前述分割 i度之限制之外,同時透過實質上重疊偏光面其不同光 束,可改善照射光束之均勻性。 在此實施形態中,由於令半波長板8介在配置於y方向 之間隔一道的分割光束上,以作為為均勻化機構,所以必314513.ptd Page 37 1292245 V. INSTRUCTION DESCRIPTION (27) An optically rotating mechanism in which one of the adjacent divided light beams adjacent to each other among the divided light beams formed by the aforementioned waveguide path substantially intersects perpendicularly with respect to the angle of the polarizing surface. The optical rotatory mechanism is such that the polarized surfaces of the beams split by the mutually adjacent regions intersect each other perpendicularly to prevent interference of the split beams with each other. • The optically-rotating mechanism is to rotatize the angles of the polarizing surfaces so that they do not substantially occur, so that the angles of the two mutually adjacent beams are substantially non-occurring, preferably by quartz. The half-wavelength plate is constructed. φ In the 2nd 1st and 2nd 2nd drawings, the focal point f is formed in the y-direction transfer lens 6 1 (cylindrical lens) in front of the waveguide 4, and the half-wavelength plate 8 is used as the optical rotation mechanism. At this focus position. In this embodiment, among the five divided beams split by the waveguide path 4, only three divided beams for the number of reflections m = 0, m = + 2, and = - 2 are inserted into the half-wavelength plate 8, and other reflection times m = +1, 1 is not inserted. In this configuration, the half-wavelength plate is interposed every other one of the divided light beams arranged in the y direction. Thus, referring to Figs. 2 and 3A, the half-wavelength plate 8 is inserted only into either of the two divided light beams adjacent to each other, and the polarized light beam is substantially vertically intersected with respect to the other divided light beam. Thus, the two divided beams of any combination adjacent to each other, i.e., the overlapping faces 90, do not interfere. Therefore, in addition to the above-described limitation of the division degree, the uniformity of the illumination beam can be improved by simultaneously transmitting the different beams of the polarization plane substantially. In this embodiment, since the half-wavelength plate 8 is placed on the split light beam disposed at intervals of the y direction, it is necessary to be a uniformizing mechanism.
314513.ptd 第38頁 1292245 五、發明說明(28) 須要在半波長板8、8之間設置間隙,以使其他分割光束透 過,而令此半波長板之配置與構造變得有些複雜。 為了消除此問題,在第2 2圖所示之光學系統構造,特 別,透過設置於y方向轉印透鏡6 1之射出端之焦點位置f上 之遮斷板8 9將反射次數丨ώ = 0時之直行光束加以遮斷。Μ = 0之 直行光束,不會抵達照射面,所以並不會造成干涉。因 此,以一片半波長板8作為旋光裝置,僅插入對於直行光 束(111 = 0)作對稱配置之分割光束群(m = + l、-2)或是(m = -l、 + 2 )之任何之一方,而另一方之分割光束群則不配置旋光 機構。由此,減輕照射面9 0上之分割光束1 9互相之間的干 涉,並且旋光機構8,能夠利用一片之半波長板8 2—併地 使一方之分割光束群(ιώ = + 1、-2 )透過,具有能夠將光學系 統簡單化之優點。 遮蔽體8 9,則可利用吸收雷射光束,又或者是使其反 射之固體,例如,石墨、陶瓷、金屬等,遮蔽體8 9乃是與 前述之單一旋光機構8 2—體組裝而成,可配置於y方向轉 印透鏡6 1之焦點位置f上。 在第2 2圖之前述變形例中,透過遮蔽體8 9將中心之分 割光東m = 0加以遮斷,但是遮斷後中心之光束m = 1由於具有 相當大之能量,故若是不利用它會造成效率降低,此點實 為不經濟。 因此,接下來之變形例,乃是對於波導路徑之入射雷 射光之光軸與前述波導路徑4其反射面4 1、4 2間之中心軸 斜交,如前述第3實施形態中第1 4圖至第1 6圖所示般,不314513.ptd Page 38 1292245 V. INSTRUCTIONS (28) A gap is required between the half-wavelength plates 8, 8 to allow other split beams to pass through, making the configuration and construction of the half-wavelength plate somewhat complicated. In order to eliminate this problem, in the optical system configuration shown in Fig. 2, in particular, the number of reflections 丨ώ = 0 is transmitted through the blocking plate 8 9 disposed at the focus position f of the output end of the transfer lens 61 in the y direction. The straight beam is then blocked. The straight beam of Μ = 0 does not reach the illuminated surface, so it does not cause interference. Therefore, a half-wavelength plate 8 is used as the optical rotatory device, and only the split beam group (m = + l, -2) or (m = -l, + 2) symmetrically arranged for the straight beam (111 = 0) is inserted. Any one of the other, and the other split beam group is not equipped with an optical rotation mechanism. Thereby, the interference between the split light beams 19 on the illumination surface 90 is reduced, and the optical rotation mechanism 8 can use one of the half-wavelength plates 8 2 to collectively split the light beam group (ι = = 1, - 2) Transmission has the advantage of being able to simplify the optical system. The shielding body 8 9 can utilize a solid that absorbs the laser beam or is reflected, for example, graphite, ceramic, metal, etc., and the shielding body 8 is assembled with the single optical rotating mechanism 8 2 described above. It can be disposed at the focus position f of the transfer lens 61 in the y direction. In the above-described modification of Fig. 2, the center splitting light m = 0 is blocked by the shielding body 89, but the center beam m = 1 after the interruption has a considerable energy, so if it is not used It will cause a decrease in efficiency, which is really uneconomical. Therefore, in the following modification, the optical axis of the incident laser light of the waveguide path is oblique to the central axis between the reflection surfaces 4 1 and 4 2 of the waveguide path 4, as in the third embodiment. Figure to Figure 16 shows, no
314513.ptd 第39頁 1292245 五、發明說明(29) 、產生在反射面41、4 2之間未反射而通過之分割光束。在此 場合中,利用反射次數m加以區分之分割光束之對稱性會 廣失,如第2 3圖所示般,波導路徑中之光束分割,會分離 成1次反射之分割光束(1 ),以及數次反射(在本實施例 中‘為6次反射m = 6 )之分割光束,兩道以上之反射分割光束 會防止作同次數反射之分割光束,並且,如第2 3圖所觀測 对般,奇數次反射m = 1、3、5與偶次數反射m = 2、4、6之分 割光束,會在焦點位置f處產生整合之群組,不會有如第 2 2圖所示之將未反射之分割光束(m = 0 )捨棄利用之情況, •用單一之旋光機構8,能夠簡單地配置奇數次反射1、 3、5或偶次數反射m = 2、4、6之分割光束,如第2 3圖所示 舨,透過僅對反射為偶數次之分割光束群插入單一之半波 長板8 2之方式,使互相鄰接之分割光束之偏光面作實質上 垂直相交,具有能夠簡單地實現防止相互干涉之優點。 此外,又一第23圖之另一變形例,如第24圖所示之光 學系統,乃是將波導路徑4由中心實體之透光體所構成, 將該波導路徑4之入射面4 3不與波導路徑4之中心軸作垂直 相交而形成適當地斜交般,將由光源端之聚光透鏡3 4所射 出之雷射光束1 2入射到斜交之入射面4 3使其折射。其結 春, 入射光束至少會在反射面4 1、4 2間作1次反射,與第 > 3圖同樣地,由於不會產生未反射而通過之分割光束 (m = 0 ),所以能夠設定反射次數一次增加一個般之分割光 束,在此場合中,亦是利用單一之半波長板僅針對偶數次 或者是奇數次所反射之分割光束加以區分,而能夠將所區314513.ptd Page 39 1292245 V. Description of the Invention (29) A split beam that passes through between the reflecting surfaces 41 and 42 and passes through. In this case, the symmetry of the split beam that is distinguished by the number of reflections m is widely lost. As shown in Fig. 2, the beam splitting in the waveguide path is split into the split beam (1) of the first reflection. And the split beam of several reflections (in the embodiment, '6 reflections m = 6), the two or more reflected split beams prevent the split beams from being reflected by the same number of times, and as observed in Fig. 2 In general, the odd-numbered reflection m = 1, 3, 5 and the even-numbered reflection m = 2, 4, 6 split beams will produce an integrated group at the focus position f, which will not be as shown in Figure 2 The unreflected split beam (m = 0) is discarded. • With a single optical rotation mechanism 8, it is possible to easily configure the split beams of odd-numbered reflections 1, 3, 5 or even-numbered reflections m = 2, 4, and 6. As shown in FIG. 2, by inserting a single half-wavelength plate 8 2 only for the split beam group having an even number of reflections, the polarized surfaces of the mutually adjacent split beams are substantially perpendicularly intersected, and the display can be easily performed. Achieve the advantage of preventing mutual interference. Further, in another modification of the twenty-fifth diagram, the optical system shown in Fig. 24 is such that the waveguide 4 is formed of a light-transmissive body of the central body, and the incident surface of the waveguide 4 is not The laser beam 12 emitted from the condensing lens 34 of the light source end is incident on the oblique incident surface 43 to be refracted by perpendicularly intersecting the central axis of the waveguide 4 to form a proper oblique shape. In the spring, the incident beam is reflected at least once between the reflecting surfaces 4 1 and 4 2, and similarly to the image of Fig. 3, since the beam splits (m = 0) without passing through the unreflecting, it is possible to Set the number of reflections to increase the average split beam at a time. In this case, it is also possible to distinguish between the split beams that are reflected only for an even number of times or an odd number of times by using a single half-wavelength plate.
314513.ptd 第40頁 1292245 五、發明說明(30) 分之分割光束群一併地使其進行偏光。在此情況中,由於 能夠將聚光透鏡3 4之光軸與波導路徑之中心軸作共轴之配 置,所以具有光學系統之設計組裝容易,並且,能夠實現 與第2 3圖相同之效果之優點。 在前述實施形態中,旋光機構在前一實施例中,乃是 將半波長板插入於互相鄰接之分割光束之任何一方來防止 互相之干涉,半波長板亦同時將其分割光束之光路徑長實 質性地加以延長,所以在插入有半波長板之分割光束與未 插入之分割光束之間,會產生光路徑長之差距。如此兩種 類之分割光束之光路徑長不同時,在照射面上之照射光束 之成像位置則會互相偏移,而使得照射面上之光束強度輪 廓變得不鮮明,特別是,在形成線狀輪廓時寬度方向強度 分布會擴大。插入前述目的之光路徑長補償板防止光路控 差之範例由以下所述加以說明。 第2 5圖中,如第2 1 B圖所示般,利用波導路徑將光束 加以分割,在y方向轉印透鏡6 1之焦點位置f處,如前述 般,每隔一道之分割光束插入半波長板8、8,在此實施例 中’更對未插入半波長板之另一方之各個分割光束分別插 入作為光路徑長補償機構之延長光路徑長之延遲板8 3。在 此實施例中,延遲板8 3係使用光學玻璃板,其厚度乃是設 定為所產生之光路徑長與半波長板8所產生之光路徑長相 同之厚度。在照射面上,這些分割光束間互相不會產生光 路徑差,能夠確保照射輪廓之鮮明度。 第2 6圖,乃是第23圖所示之例適用延遲板83之例,在314513.ptd Page 40 1292245 V. INSTRUCTIONS (30) The divided beam groups are collectively polarized. In this case, since the optical axis of the collecting lens 34 and the central axis of the waveguide can be arranged coaxially, it is easy to design and assemble the optical system, and the same effect as in the second embodiment can be achieved. advantage. In the foregoing embodiment, the optical rotatory mechanism inserts the half-wavelength plate into either of the mutually adjacent split beams to prevent mutual interference, and the half-wavelength plate also splits the light path of the split beam at the same time. Substantially extended, there is a difference in optical path length between the split beam into which the half-wavelength plate is inserted and the split beam that is not inserted. When the optical path lengths of the two types of split beams are different, the imaging positions of the illumination beams on the illumination surface are offset from each other, so that the beam intensity profile on the illumination surface becomes unclear, in particular, the line profile is formed. The intensity distribution in the width direction will increase. An example of the optical path length compensation plate inserted in the foregoing purpose to prevent optical path control is explained below. In Fig. 25, as shown in Fig. 2 1 B, the light beam is split by the waveguide path, and at the focus position f of the transfer lens 61 in the y direction, as described above, the split beam is inserted half every other time. In the present embodiment, the wavelength plates 8, 8 are respectively inserted into the respective split beams of the other half of the un-inserted half-wavelength plate into the retardation plate 83 which is the length of the extended optical path of the optical path length compensation mechanism. In this embodiment, the retardation plate 83 is an optical glass plate whose thickness is set such that the length of the generated light path is the same as the length of the light path generated by the half-wavelength plate 8. On the illuminated surface, these split beams do not cause a light path difference between each other, and the sharpness of the illumination profile can be ensured. Fig. 26 is an example of the application of the retardation plate 83 as shown in Fig. 23,
314513.ptd 第41頁 1292245314513.ptd Page 41 1292245
J292245 五、發明說明(32) ^透在轉印用圓筒透鏡陣列Η與聚光透鏡62間配置 鏡陵長板8乃是作為旋光機構,插入由分割用圓筒透 '車列5向y方向加以分割之分割光束15e,半波長板 ί丁八插入每隔一道之分割光束lsa、KC、,而未插入其 他刀d光束15b、15d。由此,在互相鄰接之分割光束間 (例如,分割光束15a與15b之間,分割光束1讣與15c之 間’或是其他相鄰分割光束間),偏光角度會實質作垂直 相父’在照射面9 0上之干涉會受到抑制,能夠將重疊照射 光束1 9之干涉所造成之強度分布加以均勻化。 ^ 又,另 受形例,乃疋半波長板處更包含有光路徑長 補彳員機構之貫施例’第2 8圖所示乃是第2 7 A圖與第2 7 B圖所 示之光學糸統中’在未插入旋光機構之該另一方之分割光 束(本實施例中為1 5 b、1 5 d )上插入作為光路徑長補償機構 之延遲板8 3之玻璃體之例。在前述一方之分割光束,如前 速般没置有作為旋光機構之半波長板8,半波長板8之安 裝,使得其分割光束之光路徑長延長,當兩種類之分割光 束其光路徑長不同時,在照射面上之成像位置會互相偏 移,輪廓就會變得不鮮明。為了修正此情況,在另一方之 分割光束上插入作為光路徑長補償機構將光路徑長加以延 長之延遲板8 3。在本實施例中,乃是將延遲板8 3之光學玻 璃板之厚度,設定成所產生之光路徑長與半波長板8所產 生之光路徑長相同之厚度。第27圖之配置中,由於半波長J292245 5. Inventive Note (32) The mirror long plate 8 is disposed between the cylindrical lens array for transfer and the condensing lens 62 as a light-rotating mechanism, and is inserted into the cylinder for splitting into a row 5 The split beam 15e is split in the direction, and the half-wavelength plate is inserted into every other divided beam lsa, KC, and the other blade d beams 15b, 15d are not inserted. Thus, between the mutually adjacent split beams (for example, between the split beams 15a and 15b, between the split beams 1讣 and 15c or between other adjacent split beams), the polarization angle will be substantially vertical. The interference on the irradiation surface 90 is suppressed, and the intensity distribution due to the interference of the overlapping irradiation beams 19 can be made uniform. ^ In addition, the other example is that the half-wavelength plate contains a long path of the light path length supplemental mechanism. The picture shown in Figure 28 is shown in Figure 2 7 A and Figure 2 7 B. In the optical system, an example of a glass body of a retardation plate 8 3 as an optical path length compensation mechanism is inserted into the other divided light beam (in the present embodiment, 15 5 , 15 5 ) in which the optical rotation mechanism is not inserted. In the above-mentioned split beam, as the front speed does not have the half-wavelength plate 8 as the optical rotation mechanism, the half-wavelength plate 8 is mounted so that the optical path length of the split beam is extended, and when the two types of split beams have long optical paths At the same time, the imaging positions on the illuminated surface are offset from each other, and the outline becomes unclear. In order to correct this, a retardation plate 83 which lengthens the optical path length as an optical path length compensating mechanism is inserted into the other divided beam. In the present embodiment, the thickness of the optical glass plate of the retardation plate 83 is set such that the length of the generated light path is the same as the length of the light path generated by the half-wavelength plate 8. In the configuration of Figure 27, due to the half wavelength
314513.ptd 第43頁 1292245 五、發明說明(33) 與延遲板8 3作交互結合且一體化加以連接,形成一體之均 勻化機構。 - 第2 9圖係於第2 7圖所示之雷射光均勻照射光學系統其 轉印用圓筒透鏡陣列5 1中,針對插入半波長板8之分割光 束:之微小透鏡5 1 2,以及針對未插入半波長板8之分割光束 之·微小透鏡5 1 1,調製成在照射面9 0之成像為一樣而具有 不”同焦點之距離。透過由分割用圓筒透鏡陣列5在y方向排 列分割之分割光束中每隔一道之分割光束上插入偏光面的 旋轉用延遲板8之方式,雖然對於未插入之分割光束會產 •焦點位置f之偏移,但是在本例將焦點位置之偏移以轉 印用圓筒透鏡陣列5 1之各個微小透鏡的焦點距離加以補 检,由此,成像於照射面上之各分割光束之強度分布能夠 均勻4匕。 (第7實施形態) 在本貫施形悲中’係顯不由將由雷射光源所射出之雷 射光束加以分割之雷射光束分割機構、將分割光束在照射 面上重疊照射之重疊照射機構所加以構成,重疊照射機 構,會在將各分割光束轉印於照射面之際將各分割光束在 照射面上互相予以偏移,也就是使其互相變位形成照射光 雷射光均勻照射光學系統。 ‘ 在本實施形態中,雷射光束分割機構乃是利用波導路 徑,重疊照射機構會將由雷射分割機構所分割之分割光 束,在照射面9 0上互相偏移加以照射,由此,防止在照射 面上之分割光束互相之干涉,達到照射光束之均勻化。314513.ptd Page 43 1292245 V. INSTRUCTIONS (33) Interacting with the retarding plate 83 and integrating them integrally to form an integrated homogenizing mechanism. - Fig. 29 is a cylindrical lens array 51 for transfer in the laser light uniform illumination optical system shown in Fig. 27, for the split light beam inserted into the half-wavelength plate 8: the minute lens 5 1 2, and The microlens 51 1 1 that is not inserted into the split light beam of the half-wavelength plate 8 is modulated so that the image on the illumination surface 90 is the same and has a distance of not the same focus. The transmission is performed by the cylindrical lens array 5 for division in the y direction. A method of rotating the retardation plate 8 for inserting a polarizing surface into every other divided beam of the divided split beams, although the offset of the focus position f is generated for the undivided split beam, but in this example, the focus position is The offset is corrected by the focal length of each of the minute lenses of the cylindrical lens array for transfer 5, whereby the intensity distribution of each of the divided light beams formed on the irradiation surface can be uniform. (Seventh embodiment) The present invention is composed of a laser beam splitting mechanism that splits the laser beam emitted by the laser light source, and a superimposed illumination mechanism that superimposes the split light beam on the illumination surface. The mechanism shifts the divided beams on the irradiation surface when the respective split beams are transferred to the irradiation surface, that is, displaces each other to form an irradiation light, and the laser beam is uniformly irradiated to the optical system. In the laser beam splitting mechanism, the waveguide path is used, and the superimposed illumination mechanism illuminates the split light beams split by the laser splitting mechanism on the illumination surface 90, thereby preventing segmentation on the illumination surface. The beams interfere with each other to achieve uniformization of the illumination beam.
314513.ptd 第44頁 1292245 ---------:_________ 五、發明說明(34) 在本實施形態,第3 Ο A圖與第3 Ο B圖中,雷射光束分割 機構係含有將雷射振盪器所射出之雷射光束1入射到波導 路徑4用之光學系統,又含有形成平行光束用之光束放大 透鏡3 1以及y方向平行透鏡3 2與X方向平行透鏡3 3,接著更 含有向y方向聚光,入射到波導路徑4内之圓筒透鏡之聚光 透鏡34。 波導路徑4中,具有互相相向且平行之主要表面的反 射面4卜42,反射面41、42,在本圖中係垂直於y方向。 入射面4 3與射出面4 4,係垂直於光軸(平行於y方向)。係 如第1實施形態中的第1圖、第2圖以及第3圖所得知般,由 入射面4 3入射之雷射光束1,會被分離為未由反射面加以 反射而通過之成分(m = 〇)、由反射面加以反射之成分,反 射成分又被分離成一次反射(m = 1 )、二次反射(m = 2 )以至於 3次反射之分割光束。 來自波導路徑4之分割光束,會透過重疊照射機構6, 在照射面9 0上重疊而受到投影,重疊照射機構6係由將分 割光束在照射面上向Y方向轉印之y方向轉印透鏡6 1 (圓筒 透鏡),以及向X方向聚光之聚光透鏡6 2 (圓筒透鏡)所構 成0 y方向轉印透鏡61,乃是將光束通過X方向聚光透鏡 6 2,在照射面9 0上向y方向依所規定之長度延伸,而X方向 聚光透鏡6 2 ’乃是將光束向X方向作線狀會聚,由此,於 照射面上可獲得直線狀輪廓之照射光束1 9。314513.ptd Page 44 1292245 ---------: _________ V. DESCRIPTION OF THE INVENTION (34) In the present embodiment, in the third and third ΟB diagrams, the laser beam splitting mechanism is included. The laser beam 1 emitted from the laser oscillator is incident on the optical system for the waveguide path 4, and further includes a beam amplifying lens 31 for forming a parallel beam and a parallel lens 3 2 in the y direction and a parallel lens 33 in the X direction, and then Further, it includes a collecting lens 34 that collects light in the y direction and enters the cylindrical lens in the waveguide 4. In the waveguide path 4, a reflecting surface 4, 42 having a main surface facing each other and parallel, and reflecting surfaces 41, 42 are perpendicular to the y direction in the figure. The incident surface 43 and the exit surface 44 are perpendicular to the optical axis (parallel to the y direction). As is apparent from the first, second, and third aspects of the first embodiment, the laser beam 1 incident on the incident surface 43 is separated into components that are not reflected by the reflecting surface. m = 〇), the component reflected by the reflecting surface, and the reflected component is separated into a primary beam (m = 1), a secondary reflection (m = 2), and a split beam of 3 reflections. The split light beam from the waveguide 4 is superimposed on the irradiation surface 90 by the superimposed illumination mechanism 6, and is projected, and the superimposed illumination mechanism 6 is a transfer lens that transfers the split light beam in the Y direction on the irradiation surface. 6 1 (cylindrical lens) and a y-direction transfer lens 61 formed by a condensing lens 6 2 (cylindrical lens) condensed in the X direction, the light beam is passed through the X-direction condensing lens 6 2 , and is irradiated The surface 90 extends upward in the y direction by a predetermined length, and the X-direction condensing lens 6 2 ′ converges the beam in a linear direction in the X direction, whereby a linear profile illumination beam can be obtained on the illumination surface. 1 9.
在此實施形態中’作為重疊照射機構的乃是如第3 〇BIn this embodiment, 'as an overlapping illumination mechanism, as in the third 〇B
第45頁 314513.ptd 1292245 五、發明說明(35) '圖所不般,利用配置於波導路徑4前方之轉印透鏡6 1之像 差,於照射面90上將各分割光束16a至16e互相向y方向作 些許之偏移且加以照射之機構,由此,會如第3〇c圖模式 所不般,將在照射面9 0上合成之照射光束丨9其y方向兩端 命之重疊加以偏移,使其強度分布成台階狀’減輕較大之 干·涉,在均勻之照射範圍内,可獲得干涉少強度均勻之照 W光束。 第3 1 A圖與第3 1 B圖之例中,如前述第3實施形態之第 1 4圖所示般,將波導路徑4由透明固體形成,使其入射面 對於軸向形成斜交,將入射之雷射光束加以折射,分割 光束在反射面作1次反射(^丨)之光束、作2次反射(m = 2)之 光束、作3次反射(m = 3)之光束,以至於作6次反射為止之 (m = 6)之光束由射出面射出,通過y方向轉印透鏡61與X方 向聚光透鏡62,照射到照射面9〇上,與第3〇A圖以及第3〇β 圖同樣地,利用y方向轉印透鏡61之透鏡像差,將分割光 束在圖中的知、射面9 0上向y方向互相偏移且加以照射,由 此,防止在照射面上之分割光束互相之干涉,達到照射光 束之均勻化。 • 接下來之變形例,乃顯示在使用含有圓筒透鏡陣列之 光束分割機構之光學系統中,重疊照射機構會將各分 割光束在照射面上進行互相偏移且轉印以形成照射光束之 雷射光均句照射光學系統。 第32 A圖與第32 B圖所示乃是,含有放大雷射光束用之 光束放大透鏡31以及y方向平行透鏡3 2以及X方向平行透鏡Page 45 314513.ptd 1292245 V. Inventive Description (35) In the figure, the divided beams 16a to 16e are made on the irradiation surface 90 by the aberration of the transfer lens 61 disposed in front of the waveguide 4. A mechanism for making a slight offset in the y direction and illuminating, whereby the illuminating beam 9 synthesized on the illuminating surface 90 is overlapped at both ends in the y direction as in the third 〇c pattern. The shift is made so that the intensity distribution is stepped to reduce the large dryness. In the uniform illumination range, a W beam with less interference and uniform intensity can be obtained. In the example of the third embodiment and the third embodiment, as shown in the fourth embodiment of the third embodiment, the waveguide 4 is formed of a transparent solid, and the incident surface is obliquely formed in the axial direction. The incident laser beam is refracted, and the beam is split once on the reflecting surface, the beam is reflected twice (m = 2), and the beam is reflected (m = 3) for 3 times. The light beam (m = 6) which is subjected to the sixth reflection is emitted from the emitting surface, and is irradiated onto the irradiation surface 9 by the y-direction transfer lens 61 and the X-direction condensing lens 62, and the third 〇A map and the Similarly, in the same manner, by using the lens aberration of the y-direction transfer lens 61, the split light beams are shifted from each other in the y direction on the known and incident surfaces 90 in the figure, thereby preventing the irradiation surface. The split beams on the other interfere with each other to achieve uniformization of the illumination beam. • The following modification shows that in an optical system using a beam splitting mechanism including a cylindrical lens array, the overlapping illumination mechanism shifts the respective split beams on the irradiation surface and transfers them to form a thunder of the illumination beam. The illuminating average system illuminates the optical system. Figs. 32A and 32B show a beam magnifying lens 31 for enlarging a laser beam, a y-direction parallel lens 32, and an X-direction parallel lens.
314513.ptd 第 46 頁 1292245 五、發明說明(36) 3 3,將平行光束入射到分割用的圓筒透鏡陣列5。透過圓 筒透鏡陣列5加以分割之分割光束1 5 a至1 5 e,會通過轉印 用用圓筒透鏡陣列5卜y方向場透鏡(圓筒透鏡)6 3以及X方 向聚光透鏡6 2,在照射面上獲得向y方向延伸之線狀輪廓 之照射光束1 9。然後,調整該場透鏡6 3,將由雷射光束分 割機構所射出之分割光束1 6 a至1 6 e,在照射面9 0上予以互 相偏移照射以調整成能獲得照射光束1 9,由此,防止在照 射面上之分割光束互相之干涉,達到照射光束其y方向之 強度均勻化。在此情況中,如第3 0 C圖所示般,照射輪廓 之y方向的兩端部,乃是以台階狀之強度分布加以表示, 在其間可獲得顯示均勻分布之照射光束範圍。 本實施形態之變形例,係如第33A圖與第33B圖所示 般,在分割用圓筒透鏡陣列5與轉印用用圓筒透鏡陣列5 1 之間,配置有作為光學性延遲機構之延遲板7,降低在雷 射光束剖面上互相鄰接之分割光束彼此間在照射面上之干 涉,此外,在此實施例中,更有由場透鏡6 3所產生之於重 疊之際形成各分割光束之偏移而產生之干涉降低以及由光 學性延遲所產生之各分割光束間之干涉降低的相乘效果發 生作用,而具有更加降低因干涉所產生之強度分布之變動 之優點。 在本實施形態,光學性延遲機構中,配列後之複數道 分割光束中每隔一道之分割光束上,配置有透光性之延遲 板7。透過將相鄰之分割光束之任何一方之光束通過延遲 板7之方式,在相鄰之分割光束間形成空間性可干涉距離314513.ptd Page 46 1292245 V. Description of Invention (36) 3 3, a parallel beam is incident on the cylindrical lens array 5 for division. The divided light beams 15 5 to 15 e divided by the cylindrical lens array 5 pass through a cylindrical lens array 5 for transfer, a y-direction field lens (cylindrical lens) 63 and an X-direction condensing lens 6 2 An illumination beam 19 having a linear profile extending in the y direction is obtained on the illumination surface. Then, the field lens 63 is adjusted, and the split beams 16 6 to 16 6 e emitted by the laser beam splitting mechanism are offset from each other on the illumination surface 90 to be adjusted so that the illumination beam 9 can be obtained. Thereby, the split beams on the illumination surface are prevented from interfering with each other, and the intensity of the illuminating beam in the y direction is made uniform. In this case, as shown in Fig. 30C, both end portions of the illuminating contour in the y direction are represented by a step-like intensity distribution, and an irradiation beam range in which uniform distribution is displayed can be obtained therebetween. In the modification of the embodiment, as shown in FIGS. 33A and 33B, an optical retardation mechanism is disposed between the cylindrical lens array 5 for division and the cylindrical lens array 5 for transfer. The retardation plate 7 reduces interference between the divided light beams adjacent to each other on the laser beam profile on the illumination surface, and further, in this embodiment, each segmentation is formed by the overlap of the field lens 63 The interference reduction caused by the shift of the light beam and the multiplication effect of the interference between the split beams caused by the optical delay act, and the advantage of further reducing the variation of the intensity distribution due to the interference is obtained. In the optical delay mechanism, a translucent retardation plate 7 is disposed on every other divided light beam of the plurality of divided light beams after the arrangement. Forming a spatially interferable distance between adjacent split beams by passing a beam of either of the adjacent split beams through the retardation plate 7
314513.ptd 第47頁 1292245 五、發明說明(37) 以上之光路徑差。 此外,以下所述乃是,在均勻化機構上,利用將前述 分割後之互相鄰接之分割光束之一方對另一方使偏光方向 作實質上垂直相交之偏光機構之例。第3 4圖所示之例中, 在、射光源到光束放大透鏡3 1之間,預先令雷射光束1通 過·旋光板7 1,在由分割用圓筒透鏡陣列5向y方向加以分割 之> 割光束1 5 a至1 5 e上,插入作為旋光機構之半波長板 8,半波長板8係被插入每隔一道之分割光束1 5 a、1 5 c、 1 5 e,而未插入其他分割光束1 5 b、1 5 d。由此,在互相鄰 φ之分割光束間(例如,分割光束1 5 a與1 5 b之間,分割光 束1 5b與1 5c之間,或是其他相鄰分割光束間),偏光角度 #實質呈垂直相交,在照射面9 0上之干涉會受到抑制,而 能夠將重疊照射光束1 9之干涉所造成之強度分布加以均勻 化。在本實施例中,於y方向受分割之光束每隔一道插入 半波長板8,將偏光後之分割光束透過轉印用透鏡照射到 照射面9 0,在此,透過調整場透鏡6 3,將各分割光束在照 射面上向y方向偏移而重疊之方式,防止分割光束間之干 涉。在照射面9 0上,會顯示將分割光束偏移照射時其照射 光束1 9之強度分布,在y方向之照射光束1 9的兩端部,強 Λ合布雖作台階狀地降低,但是除了兩端部之主要部分, ^獲得干涉較少之均勻分布。314513.ptd Page 47 1292245 V. INSTRUCTIONS (37) The above optical path is poor. Further, as described below, the homogenization means is exemplified by a polarizing means that intersects one of the divided light beams adjacent to each other and substantially polarizes the polarization direction. In the example shown in Fig. 4, between the light source and the beam amplifying lens 31, the laser beam 1 is passed through the light-rotating plate 71 in advance, and is divided into the y direction by the cylindrical lens array 5 for division. > Cutting the light beam 1 5 a to 1 5 e, inserting the half-wavelength plate 8 as an optical rotating mechanism, and the half-wavelength plate 8 is inserted into every other divided light beam 1 5 a, 1 5 c, 1 5 e, and Other split beams 1 5 b, 1 5 d are not inserted. Thus, between the split beams of mutually adjacent φ (for example, between the split beams 1 5 a and 1 5 b, between the split beams 15 5 and 15 c, or between other adjacent split beams), the polarization angle is substantially Vertically intersecting, the interference on the illuminated surface 90 is suppressed, and the intensity distribution caused by the interference of the overlapping illumination beams 19 can be uniformized. In this embodiment, the light beams that are divided in the y direction are inserted into the half-wavelength plate 8 every other one, and the polarized light beam is irradiated to the irradiation surface 90 through the transfer lens, and the field lens 63 is transmitted through the adjustment lens. The split light beams are prevented from interfering with each other by shifting the overlapping light beams in the y direction and overlapping them. On the irradiation surface 90, the intensity distribution of the irradiation beam 19 when the split beam is irradiated is displayed, and the both ends of the irradiation beam 19 in the y direction are reduced in a stepwise manner, but Except for the main part of the two ends, ^ obtains a uniform distribution with less interference.
314513.ptd 第48頁 1292245 圖式簡單說明 【圖式fa〗單說明】 第1 A圖係利用本發明所述波導路徑之實施形態之雷射 光均勻照射光學系統之配置,由X方向所觀測之示意圖。 第1 B圖係利用本發明所述波導路徑之實施形態之雷射 光均勻照射光學系統之配置,由y方向所觀測之示意圖。 第2圖係說明波導路徑中雷射光束其分割模樣之剖面 圖。 第3 A圖係在波導路徑中分割雷射光束之際,應受分割 雷射光束之剖面中分割光束之配置之示意圖。 第3 B圖係波導路徑射出端面其分割光束之配置之示意 圖。 第4圖係由波導路徑所分割而互相鄰接之2道分割光束 在照射面上重疊時其合成照射光束之強度分布與可視性之 不意圖(d = s時)。 第5圖係說明雷射光束其空間性可干涉距離s之定義之 說明圖。 第6圖係將由波導路徑分割成7道分割光束在照射面上 重疊時之合成照射光束其強度分布與可視性之示意圖(d二s 時)。 第7圖係雷射光束之光路徑差與可視性之關係之曲線 圖。 第8 A圖係將圓筒透鏡陣列作為本發明所述之雷射光束 分割機構加以使用之另一實施形態之雷射光均勻照射光學 系統之配置,由X方向所觀測之示意圖。314513.ptd Page 48 1292245 Schematic description of the drawing [Description of the drawing fa] The first A picture is the configuration of the laser light uniform illumination optical system using the embodiment of the waveguide path of the present invention, observed by the X direction schematic diagram. Fig. 1B is a view showing the arrangement of the laser light uniform illumination optical system in the embodiment of the waveguide path of the present invention, as viewed from the y direction. Figure 2 is a cross-sectional view showing the split pattern of the laser beam in the waveguide path. Fig. 3A is a schematic diagram showing the arrangement of the split beams in the section of the split laser beam when the laser beam is split in the waveguide path. Fig. 3B is a schematic view showing the arrangement of the split beams of the exit end face of the waveguide. Fig. 4 is a view showing the intensity distribution and visibility of the combined illumination beam when the two divided light beams which are divided by the waveguide path and are adjacent to each other are overlapped on the irradiation surface (d = s). Figure 5 is an illustration of the definition of the spatially interferable distance s of a laser beam. Fig. 6 is a schematic diagram showing the intensity distribution and visibility of the composite illumination beam when the waveguide path is divided into 7 divided beams on the illumination surface (d 2 s). Figure 7 is a plot of the optical path difference and visibility of a laser beam. Fig. 8A is a view showing the arrangement of the laser beam uniform illumination optical system in another embodiment in which the cylindrical lens array is used as the laser beam splitting mechanism of the present invention, as viewed from the X direction.
第49頁 314513.ptd 1292245 圖式簡單說明 ; 第8 B圖係將圓筒透鏡陣列作為本發明所述之雷射光束 分割機構加以使用之另一實施形態之雷射光均勻照射光學 系統之配置,由y方向所觀測之示意圖。 第9 A圖係使用分割用圓筒透鏡陣列作為雷射光束分割 機Y構,應受分割雷射光束之剖面中分割光束之配置之示意 圖·。 ^ ’ 第9 B圖係同樣為波導路徑射出端面其分割光束之配置 之示意圖。 第1 0圖係由分割用圓筒透鏡陣列所分割而互相鄰接之 g分割光束在照射面上重疊時其合成照射光束之強.度分 布與可視性之示意圖(d = s時)。 ' 第1 1圖係由分割用圓筒透鏡陣列分割成7道分割光束 在照射面上重疊時其合成照射光束之強度分布與可視性之 示意圖(d = s時)。 第1 2 A圖係本發明之實施形態所述之使用波導路徑作 為分割機構,利用具透光性之延遲板7作為光學性延遲機 構之雷射光均勻照射光學系統之配置,由X方向所觀測之 示意圖。 - 第1 2 B圖係本發明之實施形態所述之使用波導路徑作 /#分割機構,利用具透光性之延遲板7作為光學性延遲機 構之雷射光均勻照射光學系統之配置,由y方向所觀測之 不意圖。 第1 3圖係第1 2 b圖所示光學系統之變形例之示意圖, 令未反射而通過波導路徑之反射面之間之分割光線受到遮Page 49 314513.ptd 1292245 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 8B is a configuration of a laser light uniform illumination optical system of another embodiment in which a cylindrical lens array is used as the laser beam splitting mechanism of the present invention, Schematic diagram observed from the y direction. Fig. 9A is a schematic diagram of the arrangement of the split beam in the cross section of the split laser beam using the cylindrical lens array for division as the Y beam structure of the laser beam splitter. ^ ' Figure 9B is also a schematic diagram of the arrangement of the split beam of the end face of the waveguide path. Fig. 10 is a schematic diagram showing the intensity distribution and visibility of the combined illumination beam when the g-divided beams which are divided by the cylindrical lens array for division are adjacent to each other on the irradiation surface (d = s). Fig. 1 is a schematic diagram showing the intensity distribution and visibility of the combined illumination beam when the illumination lens is superimposed on the illumination surface by the cylindrical lens array for division (d = s). The first aspect of the present invention is a configuration in which the waveguide is used as the dividing mechanism, and the light-transmitting retardation plate 7 is used as the optical delay mechanism for the laser light uniform illumination optical system, and is observed by the X direction. Schematic diagram. - FIG. 1B is a configuration of a laser beam uniform illumination optical system using a waveguide having a translucent retardation plate 7 as an optical delay mechanism, as described in an embodiment of the present invention. The intention of the direction is not observed. Fig. 13 is a schematic view showing a modification of the optical system shown in Fig. 1 2b, so that the split light passing between the reflecting surfaces of the waveguide path is unreflected
第50頁 314513.ptd 1292245 圖式簡單說明 斷之形態之光學系統,由y方向所觀測之示意圖。 第1 4圖係本發明之另一實施形態所述之雷射光均勻照 射光學系統之配置,由y方向所觀測,入射光之光軸與與 波導路徑中心軸斜交地加以配置之示意圖。 第1 5圖係入射光之光轴與波導路徑中心轴斜父地加以 配置之光束分割示意圖與第1 4圖相同。 第1 6 A圖係入射光之光軸與波導路徑中心轴斜交地加 以配置之第1 5圖所示之波導路徑中雷射光束其分割模樣, 在波導路徑中分割雷射光束之際,應受分割雷射光束之剖 面中分割光束之配置之示意圖。 第1 6 B圖係入射光之光軸與與波導路徑中心軸斜交地 加以配置之第1 5圖所示之波導路徑中雷射光束其分割模 樣,波導路徑射出面端其分割光束之配置之示意圖。 第1 7圖係本發明之另一實施形態所述之雷射光均勻照 射光學系統之配置示意圖,係令波導路徑之入射面對於波 導路徑之中心軸斜交地加以配置。 第1 8A圖係本發明之另一實施形態中所述之雷射光均 勻照射光學系統,延遲板適用分割用圓筒透鏡陣列由X方 向所觀測之示意圖。 第1 8 B圖係本發明之另一實施形態中所述之雷射光均 勻照射光學系統,延遲板適用分割用圓筒透鏡陣列由y方 向所觀測之示意圖。 第1 9圖係在轉印用圓筒透鏡陣列之前後配置2個延遲 板,由X方向所觀測之示意圖。Page 50 314513.ptd 1292245 Schematic description of the optical system of the broken form, a schematic diagram observed from the y direction. Fig. 14 is a view showing the arrangement of a laser light uniform illumination optical system according to another embodiment of the present invention, which is observed from the y direction, and the optical axis of the incident light is arranged obliquely to the central axis of the waveguide. Fig. 15 is a schematic diagram of beam splitting in which the optical axis of the incident light and the central axis of the waveguide path are arranged obliquely to the parent, as in Fig. 14. The first 16 A is a pattern in which the laser beam is split in a waveguide path as shown in FIG. 5, in which the optical axis of the incident light is obliquely intersected with the central axis of the waveguide, and the laser beam is split in the waveguide path. A schematic diagram of the configuration of the split beam in the profile of the split laser beam. The first 16B is a pattern in which the optical beam of the incident light is arranged obliquely to the central axis of the waveguide, and the laser beam is split in the waveguide path shown in Fig. 5, and the splitting beam is arranged at the exit end of the waveguide. Schematic diagram. Fig. 17 is a schematic view showing the arrangement of a laser beam uniform illumination optical system according to another embodiment of the present invention, in which the incident surface of the waveguide path is obliquely arranged with respect to the central axis of the waveguide path. Fig. 18A is a laser light uniform illumination optical system according to another embodiment of the present invention, and the retardation plate is applied to a schematic view of the cylindrical lens array for division from the X direction. Fig. 18B is a laser light uniform illumination optical system according to another embodiment of the present invention, and the retardation plate is applied to a schematic view of the cylindrical lens array for division from the y direction. Fig. 19 is a schematic view showing two retardation plates arranged before the cylindrical lens array for transfer, observed in the X direction.
314513.ptd 第51頁 1292245314513.ptd Page 51 1292245
1292245 圖式簡單說明 第2 7 A圖係利用本發明之另一實施形態所述之雷射光 均勻照射光學系統上,適用於分割用圓筒透鏡陣列、半波 長板,由X方向所觀測之示意圖。 第2 7 B圖係利用本發明之另一實施形態所述之雷射光 均勻照射光學系統上,適用於分割用圓筒透鏡陣列、半波 長板,由y方向所觀測之示意圖。 第28圖係第27A圖與第27B圖所示之分割光束處將半波 長板與延遲板交互配置之光學系統,由y方向所觀測之示 意圖。 第2 9圖係轉印用圓筒透鏡陣列之前後設置2個延遲板 之光學系統,由y方向所觀測之示意圖。 第3 Ο A圖係本發明另一實施形態所述之重疊照射機構 使各分割光束在照射面上互相變位,亦即進行偏移、轉印 之雷射光均勻照射光學系統之配置,由X方向所觀測之示 意圖。 第3 Ο B圖係本發明另一實施形態所述之重疊照射機構 使各分割光束在照射面上互相變位,亦即進行偏移、轉印 之雷射光均勻照射光學系統之配置,由y方向所觀測之示 意圖。 第30C圖係第30 A圖與第30 B圖所示之光學系統所產生 之照射光束其強度輪廓之示意圖。 第3 1 A圖係如第3 0 A圖所示本發明之另一實施形態所述 之雷射光均勻照射光學系統之配置,入射光之光軸與波導 路徑令心軸作斜交配置,由X方向所觀測之示意圖。1292245 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 2A is a schematic view of a cylindrical lens array and a half-wavelength plate for use in a X-direction, which is applied to a laser light uniform illumination optical system according to another embodiment of the present invention. . Fig. 2B is a schematic view of the cylindrical lens array and the half-wavelength plate for use in the y-direction, which is applied to the laser light uniform illumination optical system according to another embodiment of the present invention. Fig. 28 is an optical system in which the half-wavelength plate and the retardation plate are alternately arranged at the split beam shown in Figs. 27A and 27B, and is observed by the y direction. Fig. 29 is a schematic view of the optical system in which the two retardation plates are disposed before and after the cylindrical lens array for transfer, as viewed from the y direction. The third embodiment of the present invention is a superimposed illumination mechanism according to another embodiment of the present invention, wherein each of the divided light beams is displaced from each other on the irradiation surface, that is, a configuration in which the laser light is uniformly irradiated by the shifting and transferring laser light, and X is arranged. Schematic diagram of the direction observed. The third embodiment is a superimposed illumination mechanism according to another embodiment of the present invention, wherein the divided light beams are displaced from each other on the irradiation surface, that is, the arrangement of the laser light for uniform illumination of the offset and the transfer is performed by y. Schematic diagram of the direction observed. Figure 30C is a schematic illustration of the intensity profile of the illumination beam produced by the optical system shown in Figures 30A and 30B. FIG. 3A is a configuration of a laser light uniform illumination optical system according to another embodiment of the present invention as shown in FIG. 30A, wherein the optical axis of the incident light and the waveguide path are arranged obliquely to the mandrel. Schematic diagram of the observation in the X direction.
314513.ptd 第53頁 1292245 圖 式簡單說明 - 第 3] LB圖係如第30B圖 所 示 本發明 之另 — 施形態所述 之 雷 射 光 均 勻 照射光學系 統 之 配置, 入射 光 之 光轴與波導 路 徑 中 心 軸 作 斜交配置, 由 y方向所觀測之示意圖。 第 3] ί C圖係第3 1 A圖與 第 3 1 B圖所示之光學系統所產生 之 曰S # *、、 射 光 束 之 強度輪廓示 意 圖 〇 Ψ· 第 32A圖係如第8A圖所示本發明之另- -實施形態所述 之 田 射 光 均 勻 照射光學系 統 之 配置, 具備 有 使 分割光束在 日召 Μ、、 射 面 上 變 位 之轉印用重 疊 日S 射機構 ,由 X方向所觀測之 示 意 圖 0 1 \ 第 3 2B圖係如第8B圖所示本發明之另- -實施形態所述 之 雷 射 光 均 勻 照射光學系 統 之 配置, 具備 有 使 分割光束在 日g 射 面 上 變 位 之轉印用重 疊 日召 射機構 ,由 y方向所觀測之 示 意 圖 0 第 3 3人圖係如第18八圖 所 示 本發明 之另 一 實 施形態所述 之 雷 射 光 均 勻 照射光學系 統 之 配置 , 具備 有 使 分割光束在 日召 射 面 上 互 相 變位之轉印 用 重 疊照射 機構 由 X方向所觀 測 之 示 意 圖 〇 第 3 3 8圖係如第188圖 所 示 本發明 之另 — 實 施形態所述 之 雷 射 光 均 勻 照射光學系 統 之 配置, 具備 有 使 分割光束在 面 上 互 相 變位之轉印 用 重 疊照射 機構 j 由 y方向所觀 測 之 示 意 圖 〇 第 3^ ί圖 係 如第27Β圖所示本發明之另- -實施形態所述 之 田 射 光 均 勻 照射光學系 統 之 配置 , 具備 有 使 分割光束在 as 射 面 上 互 相 變位之轉印 用 重 疊照射 機構 1 由 y方向所觀314513.ptd Page 53 1292245 Brief Description of the Drawing - 3rd] The LB diagram is the configuration of the uniform illumination optical system of the laser light according to another embodiment of the present invention as shown in Fig. 30B, the optical axis of the incident light and the waveguide The central axis of the path is configured as an oblique configuration, which is observed from the y direction. 3) ί C is the 曰S # *, the intensity profile of the beam generated by the optical system shown in Fig. 3 1 A and Fig. 3 1 B 〇Ψ · Fig. 32A is as shown in Fig. 8A According to another aspect of the present invention, the arrangement of the field-light uniform illumination optical system according to the embodiment is provided, and the transfer overlap-type S-mirror mechanism for shifting the split light beam on the surface and the surface is provided, and the X-direction is The observed schematic diagram 0 1 \ 3 2B is a configuration of a laser light uniform illumination optical system according to another embodiment of the present invention as shown in FIG. 8B, and has a configuration in which the split beam is changed on the day g surface. The positional observation mechanism for the transfer is a schematic view of the laser light uniform illumination optical system according to another embodiment of the present invention as shown in the eighteenth figure. A schematic diagram of the overlapped illumination mechanism for transfer which causes the split beams to be displaced from each other on the surface of the sun-shooting surface is observed by the X direction. FIG. 3 is a configuration of a laser light uniform illumination optical system according to another embodiment of the present invention, as shown in FIG. 188, and includes a transfer overlapping irradiation mechanism j for shifting the split light beams on the surface. A schematic view of the illuminating light illuminating optical system according to the second embodiment of the present invention, as shown in Fig. 27, is provided with the splitting beam on the as-plane The overlapping irradiation mechanism 1 for transfer displacement from each other is viewed from the y direction
314513.ptd 第54頁314513.ptd第54页
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JP2002091468A JP3537424B2 (en) | 2002-03-28 | 2002-03-28 | Laser beam uniform irradiation optical system |
JP2002091454A JP3537423B2 (en) | 2002-03-28 | 2002-03-28 | Laser beam uniform irradiation optical system |
JP2002091440A JP3563065B2 (en) | 2002-03-28 | 2002-03-28 | Laser beam uniform irradiation optical system |
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US9353929B2 (en) | 2013-12-02 | 2016-05-31 | Industrial Technology Research Institute | Beam diffusing module and beam generating system |
TWI638253B (en) * | 2012-09-20 | 2018-10-11 | 應用材料股份有限公司 | Apparatus and system of pulse width controller |
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EP1400832B1 (en) | 2002-09-19 | 2014-10-22 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer and laser irradiation apparatus and method of manufacturing semiconductor device |
SG137674A1 (en) | 2003-04-24 | 2007-12-28 | Semiconductor Energy Lab | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
US7486856B2 (en) * | 2004-03-24 | 2009-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer and laser irradiation apparatus |
KR101097328B1 (en) * | 2010-01-07 | 2011-12-23 | 삼성모바일디스플레이주식회사 | Laser beam irradiation apparatus for substrate sealing, substrate sealing method, and manufacturing method of organic light emitting display device using the same |
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CN111069768B (en) * | 2019-12-17 | 2022-04-19 | 深圳先进技术研究院 | Engine connecting rod splitting slot processing system |
CN111258077B (en) * | 2020-02-07 | 2021-06-08 | 西北大学 | Laser beam combining device and method for rectangular light spots |
-
2003
- 2003-03-17 TW TW092105755A patent/TWI292245B/en not_active IP Right Cessation
- 2003-03-28 CN CNB031083781A patent/CN1249483C/en not_active Expired - Fee Related
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI638253B (en) * | 2012-09-20 | 2018-10-11 | 應用材料股份有限公司 | Apparatus and system of pulse width controller |
US9353929B2 (en) | 2013-12-02 | 2016-05-31 | Industrial Technology Research Institute | Beam diffusing module and beam generating system |
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KR100541126B1 (en) | 2006-01-10 |
CN1249483C (en) | 2006-04-05 |
KR20030078742A (en) | 2003-10-08 |
CN1448753A (en) | 2003-10-15 |
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