1288030 與塗佈層（圖一之32)厚度導數關係圖中，所決定出使製程 穩定之區域40，只要在塗佈窗域4〇的範圍内，就不會在 製程中產生缺陷，反之則因各種不同的不穩定因素而容易 生成塗佈缺陷。接下來配合圖一以及圖二A所示，簡介在 塗佈製程下，容易產生缺陷之種類，當周遭真空度過高且 塗佈層厚度厚時’也就是在區域41的範圍内，則容易產生 上游新月（meniscus)邊界3〇的溢流（swelling)現象。如在 區域42時，則容易產生空氣捲入缺陷。此外更有如區域 43 0 在區戈44所發生之缺陷為雲紋現象。如圖 一 B所tf所明雲紋33缺陷，一般而言，係在真空度不足， 而塗佈層/2厚度薄時會產生之—種缺陷。如圖二C所示， 為有規律周期性之瑕窥，使得塗佈層32厚度產 通兩與某些塗佈參數，如：塗佈頭移動 佈珠ί到外部而^⑽^富士軟片驗證了雲紋現象係㈣ 形成周期性的變: 2游產生變化’進而使塗佈唐厚度 X士瞀八匕在該研究報告中，更提出了雲紋頻率 =A $以估异雲紋缺陷所發生之頻率。 ^ ： US* N〇. 4445458 設計，以轉塗❹^徵在於其下料具有八字形的 US.Pat.N0.572二：曰膜厚之均一性。又有如美國專利 設計，骑所麟的麟伽塗佈社下游唇的 的目的。it BP塗佈流壓力梯度與改善塗佈精度與品質 線，所以該：為適當的壓力分佈可以穩定塗佈層之分離 ^係麵1出利用塗佈流隨著塗佈方向而漸縮可 1288030 以幫助提昇塗佈品質，尤其是避免肋條（ribbing)等缺陷的 出=。然而，此方式會影響塗佈珠之流體力學行為，因為 漸縮過劇時會導致塗佈的逆向壓力過大，導致塗佈流場向 上游推擠，產生上游溢流（upstream leakage)的問題。1288030 and the coating layer (Fig. 1 of 32) thickness derivative relationship diagram, the region 40 which determines the process stability, as long as it is within the range of the coating window 4, will not cause defects in the process, otherwise Coating defects are easily generated due to various unstable factors. Next, as shown in FIG. 1 and FIG. 2A, it is easy to produce a type of defect under the coating process. When the surrounding vacuum is too high and the thickness of the coating layer is thick, that is, within the range of the region 41, it is easy. A swelling phenomenon occurs at the edge of the upstream meniscus. As in the area 42, it is easy to cause air entrapment defects. In addition, it is more like the area 43 0. The defect occurred in the district 44 is a moiré phenomenon. As shown in Fig. 1B, the moiré 33 defect is generally caused by a lack of vacuum and a thin layer of coating layer/2. As shown in Fig. 2C, for a regular periodic peek, the thickness of the coating layer 32 is produced by two and some coating parameters, such as: the coating head moves the cloth to the outside and ^(10)^Fuji film verification The moiré phenomenon (4) forms a cyclical change: 2 swims to produce changes, which in turn makes the coating thickness of the Tang dynasty in the research report, and proposes the moiré frequency = A $ to estimate the different moiré defects. The frequency of occurrence. ^ : US* N〇. 4445458 Design, in order to transfer the coating, it is characterized by the fact that it has a figure-eight shape. US.Pat.N0.572 2: Uniformity of the film thickness. Another example is the design of the U.S. patent, the purpose of the downstream lip of the lining coating agency. It BP coating flow pressure gradient and improving coating accuracy and quality line, so: for appropriate pressure distribution can stabilize the separation of the coating layer ^1 surface using the coating flow to shrink with the coating direction can be 1288030 To help improve coating quality, especially to avoid defects such as ribbing. However, this approach affects the hydrodynamic behavior of the coated bead because it tends to cause excessive reverse pressure in the coating, causing the coating flow field to push upstream, creating the problem of upstream leakage.
口雖然前述之技術多為提昇塗佈珠穩定之方向以改善塗 佈⑽質，不過對於塗佈時產生雲紋缺陷的問題並無法有姝 之改^、為了解決雲紋缺陷的問題，一般解決方式都是利 用壓抑塗佈设備之振動以及降低基板與塗佈頭間之相對速 ，不過降低速度，會直接降低面板的製造產能，進而影 曰到生產效率，而降低市場之競爭力。 品質的製程 綜合上述，因此亟需一種改善塗佈層均勻 方法來解決習用技術之缺點。 【發明内容】 製要目的是提供—種改善塗佈層均勻品質的 游Si声 節塗佈珠之壓力環境來控制塗料流體上 斤月長度，進而使製程落於塗佈窗域内， 缺陷問題之目的。 决雲紋 本毛月的次要目的是提供一種改善塗佈層均口 用調節塗佈珠之㈣環境來控制其 長又或穩疋度，進而使製程落於塗佈窗域内，以解 =陷問題’達到縮短塗佈製程時間，以增加生產效率 ^達到上述之目的，本發明提供一種 句品質的製程方法’其係包括有下列步驟: 8 1288030 塗佈頭以及-基板’利用該塗佈頭與該基板間之—相對運 動使從該塗佈頭輸出的塗料流體可以塗佈於基板上。献 後’以一控制調節方式，使控制該基板與該塗佈頭間一塗、 料流體之^力環境，以調整該塗料流體之—上游新月長 度’使製私落於一塗佈窗域内。 較佳的是，該控制㈣方式更包括—調整該塗佈頭之 上游區域之-真空度至適當範圍，使調整該塗料流體之上 游新月長度，使製程落於一塗佈窗域内。其中該真空度係 :選擇為-定值以及動態改變中之—者。或者是該控ς調 即方式，更可同時控制下游區域之真空度。前述之真空度 係可藉由在該塗佈頭之上游區域設置一低壓裝置以降低上 游區域之氣壓來控制。 較佳的是，該塗佈頭，係可為一上游唇體以及一下游 唇體，該上游唇體與該下游唇體間更具有至少一槽孔，且 上游唇體以及該下游唇體與該基板相對之一面上具有一連 ^ 續曲面之設計，以控制調節塗佈流體之壓力梯度，以調整 該塗料流體之一上游新月長度，使製程落於一塗佈窗域 λ 内。其中該連續曲面可選擇具有至少一凹面以降低壓力梯 度以及一凸面以增加壓力梯度其中之一。或者是其中該連 、、、貝曲面係為凹面與凸面的組合，以控制調節塗料流體之壓 力梯度。 較佳的是，該控制調節方式更包括有於塗佈過程中， 以—調整方式改變該塗佈頭與該基板間之一攻角角度之步 驟。調整攻角的方式有兩種，第一種方式為使該基板保持 水平方向’然後於塗佈過程中，移動該塗佈頭，以動態 9 1288030 改變該攻角角度。第二種則為使該塗佈頭保持一重力方 一 向；然後於塗佈過程中，移動該基板，以動態改變該攻角 角度；其中該基板係設置於一傾斜調整裝置上，該傾斜調 •整裝置具有一平行機構承載該基板，該平行機構更連接於 一可沿重力方向進行往復運動之位置調整體上以調整該攻 • 角。該攻角角度可介於四度至零度之間。此外，該傾斜調 • 整裝置之另一種實施方式可使用具有一承載板以承載該基 鲁板’該承载板之一侧更連接於可沿重力方向進行往復運動 之一位置調整體上以調整該攻角。 較佳的是，控制調節方式包括有下列步驟··提供形成 雲紋之頻率；接著以一波形產生器，產生與該形成頻率 具有一相位差之一波形。最後，使該波形消除該基板與該 塗佈頭間一塗佈珠之下游月形邊界振動。 較佳的是，該相位差係為180度。 較佳的是，該相位差係為165度至195度。 _ 較佳的是，該波形產生器係為一聲波產生器。 【實施方式】 為使貴審查委員能對本發明之特徵、目的及功能有 更進一步的認知與暸解，下文待將本發明之系統的相關細 部結構以及設計的理念原由進行說明，以使得審查委員可 以了解本發明之特點，詳細說明陳述如下·· 請參閱圖三所示，本發明提供一種改善塗佈層均勻品 質的製程方法60，其係包括有下列步驟··首先，如步驟601 1288030 —塗佈頭以及―基板，利用該塗佈頭與該基板 曰1之-相對運動使該塗佈頭塗佈至少―層塗料流體於該基 你^如步驟602所示’以一控制方式調節該基板 Γ。 /一塗佈珠之壓力環境以控制該塗佈珠之一上 =新=長度或穩定度’使製程落於一無缺陷塗佈窗域内。 接下來，將針對調整方式逐一介紹。 △請參閱圖四A所示，在本實施例中，係利用與塗佈機Although the above-mentioned techniques are mostly to improve the direction in which the coated beads are stabilized to improve the coating (10) quality, the problem of generating moiré defects during coating cannot be changed, and in order to solve the problem of moiré defects, it is generally solved. The method is to use the vibration of the suppression coating device and reduce the relative speed between the substrate and the coating head, but reducing the speed directly reduces the manufacturing capacity of the panel, thereby affecting the production efficiency and reducing the competitiveness of the market. The quality process is comprehensive. Therefore, there is a need for a method for improving the uniformity of the coating layer to solve the disadvantages of the conventional technology. SUMMARY OF THE INVENTION The purpose of the system is to provide a pressure environment for improving the uniform quality of the coating layer, to control the length of the coating fluid, thereby causing the process to fall within the coating window, and the defect problem purpose. The secondary purpose of the moiré is to provide an improved environment for the coating layer to adjust the coating bead (4) to control its length or stability, so that the process falls within the coating window to solve The problem of sinking is to shorten the coating process time to increase the production efficiency. To achieve the above object, the present invention provides a process method for sentence quality, which comprises the following steps: 8 1288030 Coating head and substrate are utilized The relative movement between the head and the substrate allows the coating fluid output from the coating head to be applied to the substrate. After the offer, a control and adjustment method is adopted to control the environment of the coating and the fluid between the substrate and the coating head to adjust the length of the upstream fluid of the coating fluid to make the system fall into a coating window. Within the domain. Preferably, the method of controlling (4) further comprises adjusting the vacuum of the upstream region of the coating head to an appropriate range to adjust the length of the new moon over the coating fluid so that the process falls within a coating window. The vacuum system is selected as - fixed value and dynamic change. Or it is the control mode, which can control the vacuum of the downstream area at the same time. The aforementioned degree of vacuum can be controlled by providing a low pressure means in the upstream region of the coating head to lower the pressure in the upstream region. Preferably, the coating head is an upstream lip and a downstream lip, and the upstream lip and the downstream lip further have at least one slot, and the upstream lip and the downstream lip are The substrate has a continuous curved surface on one side of the substrate to control the pressure gradient of the coating fluid to adjust the length of the new moon upstream of one of the coating fluids so that the process falls within a coating window λ. Wherein the continuous curved surface may have at least one concave surface to reduce the pressure gradient and a convex surface to increase one of the pressure gradients. Or the combination of the curved surface and the convex surface is controlled to control the pressure gradient of the coating fluid. Preferably, the control adjustment method further comprises the step of changing the angle of attack between the coating head and the substrate in an adjustment manner during the coating process. There are two ways to adjust the angle of attack. The first way is to keep the substrate in the horizontal direction. Then, during the coating process, the coating head is moved to change the angle of attack with dynamic 9 1288030. The second method is to keep the coating head in a gravity direction; then, during the coating process, the substrate is moved to dynamically change the angle of attack angle; wherein the substrate is disposed on a tilt adjustment device, the tilt adjustment • The unit has a parallel mechanism for carrying the substrate, and the parallel mechanism is further connected to a position adjusting body reciprocable in the direction of gravity to adjust the angle of attack. The angle of attack can be between four degrees and zero degrees. In addition, another embodiment of the tilt adjustment device can use a carrier plate to carry the base plate. One side of the carrier plate is further connected to a position adjustment body that can reciprocate in the direction of gravity to adjust The angle of attack. Preferably, the control adjustment method comprises the steps of: providing a frequency for forming a moiré; and then generating a waveform having a phase difference from the formation frequency by a waveform generator. Finally, the waveform is caused to eliminate the moon-shaped boundary vibration downstream of a coated bead between the substrate and the coating head. Preferably, the phase difference is 180 degrees. Preferably, the phase difference is from 165 degrees to 195 degrees. Preferably, the waveform generator is a sound wave generator. [Embodiment] In order to enable the reviewing committee to have a further understanding and understanding of the features, objects and functions of the present invention, the relevant detailed structure of the system of the present invention and the concept of the design are to be explained below so that the reviewing committee can The detailed description of the present invention is as follows. Referring to FIG. 3, the present invention provides a process 60 for improving the uniform quality of a coating layer, which comprises the following steps: First, as in step 601 1288030 - coating a cloth head and a substrate, wherein the coating head is coated with at least one layer of coating fluid on the substrate by using a relative movement of the coating head to the substrate, and the substrate is adjusted in a controlled manner as shown in step 602. Hey. / A coating of the bead pressure environment to control one of the coated beads = new = length or stability - causes the process to fall within a defect free coating window. Next, we will introduce the adjustment methods one by one. △Please refer to FIG. 4A, in this embodiment, the use and coating machine
St::置於塗佈珠3上游區域5〇之一低壓裝置12來 ^塗佈珠上游區域5Q之真空度，使得上游區域以及 I游區域51產生壓力差，以控制上游新月30長度或穩定 又。如圖四B所不，利用此方式可使得塗佈條件進入到塗 佈hi域40内’進而改善塗佈品質而解決雲紋缺陷之問題。 =使=佈珠3更加穩^ ’起始的真空度可以較高而隨 者裝程時間逐步降低至某預設值，至於真空度變化之曲線 與塗佈速度則必齡合實際之需求而定。另外，也可以在 塗佈過程中維持起始之真空度。 從圖二A中可以了解，雲紋缺陷係在塗佈窗域4〇的下 部穩定極限邊界’所以可見雲紋現象是出現於低真空壓力 的情形下。而現行之光阻佈多於常壓環境下進行，因 此可推論塗佈珠之上游月形長度確實為形成雲紋之因素。 所以如於塗佈上游區建立低壓區’則可以使改善雲紋現 象’使塗佈條件進入到塗佈窗域4〇。因此，透過本較佳實 施例之方式，藉由以該低壓裝置12來調整上游區域5〇之 真空度’可以有效控制雲紋缺陷之問題。 凊參閱圖五所示，在本實施例中，係利用動態移動塗 !288〇3〇 佈頭1與該基板2之間的攻角0，進而改變塗佈流夂壓力 刀佈。所§月動悲移動塗佈頭1亦即在塗佈製程中逐漸地改 變塗佈頭的攻角Θ。在隨著塗佈頭1之動態移動中，可以 改變塗佈珠3之上游新月3〇長度或穩定度。在本較佳實施 例中該攻角Θ可從4度逐漸改變至〇度，但不在此限。如 圖五B所示，在調整攻角0角度時，要注意避免角度太大 而產生負壓，使得塗佈流内部產生迴流91。所謂迴流91 即為塗佈流先回向上游溢流，然後在往下游方向流動。此 外’也要注意如果壓力梯度太低的話也會引發塗佈流不穩 定之現象。所以藉由適當之角度變化，而產生適當之壓力 分佈進而控制上游新月長度。 請參閱圖六所示，在本實施例中，其精神也是改變基 板2與該塗佈頭1之間的夾角，與前述之實施例不同的是， 本實施例係利用移動基板來改變塗佈頭之攻角。在移動基 板2時，塗佈頭1仍朝向重力方向。在圖示中，移動談基 板2之方式係透過一傾角調整裝置8來改變基板2與塗佈 頭1之角度。該傾角調整裝置8係包括有一承載基板2之 一平行機構80，該平行機構80更具有一頂板801以及一 承載板802，頂板801與承載板802之間更具有一間隙調 整機構82，以調整該頂板801與承載板802之間的距離。 該平行機構80之一側更連接有一位置調整體81，該位置 調整體81可進行一重力方向之彺復運動，以改變該基板2 與塗佈頭1之間的夾角。 請參閱圖七所示，在本實施例中，係利用變化塗佈頭 7之幾何外型設計來改變塗佈珠内之壓力分佈，使得流場 1288030 - 趨向穩定以及不會產生迴流。透過塗佈頭7之外形設含十、 當產生適當之壓力分佈’來控制上下游新月塗佈液面適 到擴充塗佈窗域的目標。該塗佈頭7包括有一上游唇體^ •以及一下游唇體71，該上游唇體70與該下游唇體71間 具有至少一槽孔72,使該至少一層塗料流體藉由該槽孔g • 塗佈於該基板2上。在本實施例中，塗佈頭7之上、下、游 • 唇體70、71與該基板2相對之面係為一連續曲面結構 711。其中利用曲面結構701、711之係由至少一凸面以及 至少一凹面所構成。在本實施例中凸面具有可以增加當土也 之壓力，其壓力梯度dp/dx>0，而凹面係可降低當地壓力， 其壓力梯度dp/dx<0。 為了更了解設計該上、下游唇體70、71表面設計，以 下揭露一設計實施方法。欲達到dp/dx>0的壓力梯度條件 時，先假設以五階方程式來描述該上、下游唇體7〇、71之 連續曲面結構701、711如式（1)所示： 籲 y=ax5+bx4+cx3+dx2+ex+f ·····•…·...........……·····〇) 同時，設定存在一反曲點位於X方向之2/3L長度點 上。此外，其他所需之邊界條件如下： y(0)=H ……............(2) y(L)=3H···..............-(3) dy(0)/dx:0 .......···（4) dy(L)/dx二0 ···…··· ···（5) d2y/dx2=0 ----- …⑹ 其中Η為塗佈高度，l為槽孔72中心至上、下游唇體7〇、 13 1288030 71之連續曲面結構 然後以上述⑵至（6^ ，之距離’如圖七所示。 ⑽L嚷一為例為=條件，求出式⑴之解，以_ -4· 6x10 19 b二-9· 24x10—15 c二3· 39x10’ ά-〇 e: f 二 100 若欲達到！的條件，則僅需修改y.H/3的邊界條 件即可:刖述提供之實施例僅為達到本發明之精神的較佳 實施方式’只要秉持前述之原則，就可獲得可達到壓力環 境之 >上、下游唇體70、71的連續曲面結構7〇i、7ii力衣 /青參閱圖人A所示，雲紋現象是-種週期性塗佈層厚 度變化rf^l起’雲紋出現的頻率與塗佈滯留^ =。因=提供—種__ 法6〜、係匕括有下列步驟：首先以步驟6ιι提供一塗佈 用該塗佈頭與該基板間之一相對運動使 以塗佈頭塗佈至少—層塗料流體於該基板之上。然後 步驟612 ’預測雲紋之—形成頻率。該預測之方式可以 先建置雲紋產生頻率的數據#料庫，紐是狀況來決定雲 紋產生之頻率。接下來進行步驟613，以—波形產生哭了 產生與該形成頻率具有一相位差之一波形。最後進行；驟 614’使該波形消除該基板與該塗佈頭間一塗佈珠之下游月 14 1288030 形邊界振動33。 ，參閱圈八B所示，在本實施例中，該波形產生器13 •為一聲波產生器，該波形130為一聲波。如圖八〇所°示， •該波形130與該塗佈層32表面之雲紋產生頻率34(亦即塗 佈珠下游月形邊界之振動頻率）具有18〇度之相位差，進而 達到塗佈層厚度均勻化之目標。此外，該相位差也可為165 唯以上所述者，僅為本發明之較佳實施例，當不能以 之限制本發明範15。即大凡依本發明t請專利範u所做之 均等變化及修飾，仍將不失本發明之要義所在，故都應視 為本發明的進一步實施狀況。 綜合上述，本發明提供之裝置以及方法具有可以改善 雲紋缺陷之優點，因此足以滿足業界之需求，進而提高該 產業之只兄f力，減已符合發明專利法所規定申請發明所需 具備之要件’故爰依法呈提發明專利之申請，謹請貴審 查委員允撥時間惠予審視，並賜準專利為禱。 15 1288030 【圖式簡單說明】 圖一係為塗佈製程示意圖。 β 圖二A係為综整前人的研究成果所呈顯出的塗佈窗域 • (coating window)以及缺陷區域示意圖。 圖二B以及圖二C係為雲紋缺陷示意圖。 _ 圖三係為本發明改善塗佈層均勻品質的方法之流程示意 • 圖。 ^ 圖四A係為本發明改善塗佈層均勻品質的方法之第一較佳 實施例示意圖。 圖四B係為本發明改善塗佈層均勻品質的方法之第一較佳 實施例塗佈窗域示意圖。 圖五A係為本發明改善塗佈層均勻品質的方法之第二較佳 實施例示意圖。 圖五B係為迴流現象示意圖。 圖六係為本發明改善塗佈層均勻品質的方法之第三較佳實 φ 施例以及改善塗佈層均勻品質裝置第一較佳實施例示意 圖。 - 圖七係為本發明改善塗佈層均勻品質的方法之第四較佳實 . 施例以及改善塗佈層均勻品質裝置第二較佳實施例示意 •圖。 ， 圖八A係為本發明改善塗佈層均勻品質的方法之第五較佳 實施例流程不意圖。 圖八B係為本發明第五較佳實施例之波形產生器配置示意 圖。 16 1288030 圖八c係為本發明第五較佳實施例之相位差示意圖。 【主要元件符號說明】 1 -塗佈頭 10 -下游唇體 1卜上游唇體 12- 低壓裝置 13- 波形產生器 13 0 -波形 2-基板 3 -塗佈珠 3 0 -上游新月 31 -下游新月 32- 塗佈層 33- 雲紋 34- 雲紋產生頻率 40-塗佈窗域 41 -邊界溢流區 42-空氣捲入區 4 3_肋條與河川區 44-雲紋區 6 0 -改善塗佈層均勻品質的方法 601〜602-流程 1288030 61 -改善塗佈層均勻品質的方法 611〜614-流程 5 0 _上游區域 51 -下游區域 7 -塗佈頭 70-上游唇體 71 -下游唇體 701、711-連續曲面 72-槽孔 8-傾角調整裝置 80- 平行機構 8 01 -頂板 802-承載板 81- 位置條整體 82- 間隙調整機構 91-迴流 Θ-攻角 u -相對速度 塗佈間隙 b-供料間係 18St:: placed in a low pressure device 12 in the upstream region of the coated bead 3 to coat the vacuum of the upstream region 5Q of the bead, so that the upstream region and the I-tour region 51 generate a pressure difference to control the length of the upstream new moon 30 or Stable again. As shown in Fig. 4B, in this manner, the coating conditions can be made to enter the coating hi domain 40, thereby improving the coating quality and solving the problem of moiré defects. = Make = Bead 3 more stable ^ 'The initial vacuum can be higher and the process time is gradually reduced to a certain preset value. As for the vacuum curve and the coating speed, the actual demand will be set. Alternatively, the initial vacuum can be maintained during the coating process. As can be seen from Fig. 2A, the moiré defect is at the lower stability limit boundary of the coating window 4' so that the moiré phenomenon is present under low vacuum pressure. However, the current photoresist is carried out more than in a normal pressure environment, so it can be inferred that the length of the upstream moon of the coated bead is indeed a factor for the formation of moiré. Therefore, if the low pressure zone is established by coating the upstream zone, the improvement of the moiré phenomenon can be made to cause the coating conditions to enter the coating window. Therefore, the problem of moiré defects can be effectively controlled by adjusting the degree of vacuum of the upstream region 5 by the low-pressure device 12 in the manner of the preferred embodiment. Referring to Fig. 5, in the present embodiment, the angle of attack 0 between the cloth head 1 and the substrate 2 is dynamically moved, and the coating flow turret is changed. The § month moving the coating head 1 gradually changes the angle of attack of the coating head during the coating process. In the dynamic movement of the coating head 1, the length or stability of the new moon 3 of the coated bead 3 can be changed. In the preferred embodiment, the angle of attack 逐渐 can be gradually changed from 4 degrees to the degree of twist, but not limited thereto. As shown in Fig. 5B, when adjusting the angle of attack 0, care should be taken to avoid the angle being too large to generate a negative pressure, so that the inside of the coating flow produces a return flow 91. The so-called reflux 91 means that the coating flow first returns to the upstream overflow and then flows in the downstream direction. In addition, it should be noted that if the pressure gradient is too low, the coating flow will be unstable. Therefore, by appropriate angle changes, an appropriate pressure distribution is generated to control the length of the upstream crescent. Referring to FIG. 6, in the embodiment, the spirit is also to change the angle between the substrate 2 and the coating head 1. Unlike the foregoing embodiment, the embodiment uses the moving substrate to change the coating. The angle of attack of the head. When the substrate 2 is moved, the coating head 1 is still oriented in the direction of gravity. In the illustration, the manner in which the substrate 2 is moved is changed by the angle adjusting means 8 to change the angle of the substrate 2 and the coating head 1. The reclining device 8 includes a parallel mechanism 80 for the carrier substrate 2. The parallel mechanism 80 further has a top plate 801 and a carrier plate 802. The top plate 801 and the carrier plate 802 further have a gap adjusting mechanism 82 for adjusting. The distance between the top plate 801 and the carrier plate 802. One side of the parallel mechanism 80 is further connected with a position adjusting body 81, which can perform a reciprocating movement in the direction of gravity to change the angle between the substrate 2 and the coating head 1. Referring to Figure 7, in this embodiment, the geometric profile of the coating head 7 is used to vary the pressure distribution within the coated beads such that the flow field 1288030 - tends to be stable and does not produce backflow. The target of controlling the upstream and downstream crescent coating liquid surface to expand the coating window area is set by the coating head 7 to form a suitable pressure distribution. The coating head 7 includes an upstream lip and a downstream lip 71. The upstream lip 70 and the downstream lip 71 have at least one slot 72 for the at least one coating fluid to pass through the slot g. • Applied on the substrate 2. In the present embodiment, the upper, lower, and lip portions 70, 71 of the coating head 7 are opposed to the substrate 2 as a continuous curved surface structure 711. The system utilizing the curved structures 701, 711 is composed of at least one convex surface and at least one concave surface. In the present embodiment, the convex surface has a pressure which can increase the soil pressure, and the pressure gradient dp/dx > 0, and the concave surface can lower the local pressure, and the pressure gradient dp/dx < In order to better understand the design of the surface of the upper and lower lip 70, 71, a design implementation method is disclosed. To achieve the pressure gradient condition of dp/dx>0, it is assumed that the continuous curved surface structures 701, 711 of the upper and lower lip bodies 7〇, 71 are described by the fifth-order equation as shown in the formula (1): y=ax5 +bx4+cx3+dx2+ex+f ··········................................)) At the same time, it is set that there is an inflection point in the X direction. 2/3L length point. In addition, other required boundary conditions are as follows: y(0)=H ..................(2) y(L)=3H···........ ......-(3) dy(0)/dx:0 .......···(4) dy(L)/dx二0 ···...······( 5) d2y/dx2=0 ----- (6) where Η is the coating height, l is the continuous curved surface structure of the center of the slot 72 to the upper and lower lip 7〇, 13 1288030 71 and then the above (2) to (6^ The distance ' is shown in Figure 7. (10) L嚷一 is an example of the condition, and the solution of the formula (1) is obtained by _ -4· 6x10 19 b 2-9 24x10-15 c 2 3 39×10' ά-〇 e: f 2 100 If you want to achieve the condition of !, you only need to modify the boundary conditions of yH / 3: the embodiments provided are only for the preferred embodiment of the spirit of the present invention 'as long as the above principles are adhered to, It is possible to obtain a continuous curved surface structure of the upper and lower lip 70, 71 which can reach the pressure environment. 7〇i, 7ii, and a green coat/green, as shown in Figure A, the moiré phenomenon is a periodic coating layer thickness. The change rf^l from the frequency of occurrence of moiré and coating retention ^ =. Because = provide - species __ method 6 ~, the system includes the following steps: first provide a coating with step 6 ι Using the coating head to move relative to one of the substrates, the coating head is coated with at least a layer of coating fluid on the substrate. Then step 612 'predicts the formation of the moiré. The prediction can be first established. Setting the frequency of the moiré generation data#, the new is the condition to determine the frequency of the moiré generation. Next, in step 613, the waveform is generated to generate a waveform having a phase difference from the formation frequency. Step 614' causes the waveform to eliminate the boundary edge vibration 33 downstream of a coating bead between the substrate and the coating head. Referring to circle VIIIB, in the present embodiment, the waveform generator 13 is An acoustic wave generator, the waveform 130 is an acoustic wave. As shown in Figure VIII, the waveform 130 and the moiré on the surface of the coating layer 32 generate a frequency 34 (i.e., the vibration frequency of the moon-shaped boundary downstream of the coated bead). ) having a phase difference of 18 degrees, thereby achieving the goal of uniformizing the thickness of the coating layer. Further, the phase difference may also be 165, which is only the preferred embodiment of the present invention, and cannot be limited thereto. The invention of the invention is 15. The present invention is not limited to the scope of the present invention, and should be considered as a further implementation of the present invention. In summary, the apparatus and method provided by the present invention can be improved. The advantages of moiré defects are sufficient to meet the needs of the industry, thereby increasing the strength of the industry, and reducing the requirements for applying for inventions as required by the invention patent law. Please ask the review committee to allow time for review and grant the patent as a prayer. 15 1288030 [Simple description of the diagram] Figure 1 is a schematic diagram of the coating process. β Figure 2A is a schematic diagram of the coating window and the defect area presented by the research results of the predecessors. Figure 2B and Figure 2C are schematic diagrams of moiré defects. _ Figure 3 is a schematic flow chart of the method for improving the uniform quality of the coating layer of the present invention. Figure 4A is a schematic view of a first preferred embodiment of the method of the present invention for improving the uniform quality of a coating layer. Figure 4B is a schematic view of a coating window of a first preferred embodiment of the method for improving the uniform quality of a coating layer of the present invention. Figure 5A is a schematic view of a second preferred embodiment of the method of the present invention for improving the uniform quality of a coating layer. Figure 5B is a schematic diagram of the reflow phenomenon. Fig. 6 is a schematic view showing a third preferred embodiment of the method for improving the uniform quality of the coating layer of the present invention and a first preferred embodiment of the apparatus for improving the uniform quality of the coating layer. - Figure 7 is a fourth preferred embodiment of the method for improving the uniform quality of the coating layer of the present invention. The embodiment and the second preferred embodiment of the apparatus for improving the uniform quality of the coating layer are schematically illustrated. Figure 8A is a fifth preferred embodiment of the method for improving the uniform quality of the coating layer of the present invention. Figure 8B is a schematic diagram showing the configuration of a waveform generator in accordance with a fifth preferred embodiment of the present invention. 16 1288030 FIG. 8 c is a schematic diagram of a phase difference according to a fifth preferred embodiment of the present invention. [Main component symbol description] 1 - Coat head 10 - Downstream lip 1 Bu upstream lip 12 - Low voltage device 13 - Waveform generator 13 0 - Waveform 2 - Substrate 3 - Coated beads 3 0 - Upstream new moon 31 - Downstream Crescent 32 - Coating Layer 33 - Moiré 34 - Moiré Generation Frequency 40 - Coating Window Domain 41 - Boundary Overflow Zone 42 - Air Entangled Zone 4 3_ Ribs and River District 44 - Moire Zone 6 0 - Method for improving the uniform quality of the coating layer 601 to 602 - Process 1288030 61 - Method for improving the uniform quality of the coating layer 611 to 614 - Process 5 0 - Upstream region 51 - Downstream region 7 - Coating head 70 - Upstream lip 71 - downstream lip 701, 711 - continuous curved surface 72 - slot 8 - inclination adjustment device 80 - parallel mechanism 8 01 - top plate 802 - carrier plate 81 - position bar integral 82 - gap adjustment mechanism 91 - reflow Θ - angle of attack u - Relative speed coating gap b - supply line 18