TWI287312B - Organic light emitting diode display panel and manufacturing method thereof - Google Patents

Abstract

An organic light emitting diode (OLED) display panel and a manufacturing method thereof are provided. In the method, at first, a substrate is provided. Then, a metal layer is formed on the substrate. The surface of the metal layer is treated by ultraviolet-ozone, (UV-O3) to form a metal oxide layer. The residue metal layer and the metal oxide layer are an anode. An organic emission material layer is formed on the anode. A cathode is formed on the organic emission material layer.

Description

1287312 Doc. No. 92114463 曰 曰 、 、 、 、 、 、 、 、 、 、 、 、 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 921 In particular, there is an organic light-emitting diode display panel and a manufacturing method for forming a metal oxide layer by treating the surface of a metal layer with ultraviolet-ozone (1111:1^"161:--Ozone, UV-O3). Prior art OLED display panel can self-illuminate by means of current driven or voltage driven (no need for liquid crystal display panel cryStai display panel, LCD panel) The backlight is added to the rear. Therefore, the OLED display panel has the advantages of self-illumination, wide viewing angle and full color. Among them, the OLED display panel can be applied to mobile phones and personal digital assistants (PDAs). On the device, it has become a display panel with great potential. Please refer to Figure 1 and Figure 2A to Figure 2G. Figure 1 shows that it is traditional. A flow chart of a method of manufacturing a light-emitting diode display panel, and FIGS. 2A to 2G are schematic cross-sectional views showing a method of manufacturing the organic light-emitting diode display panel of FIG. 1. In the first figure, first, In step 1〇2, a substrate 202 is provided as shown in Fig. 2A. Next, in step 1〇4, an aluminum layer 206 is formed on the substrate 20 2 to reflect light as a reflective layer, such as 2B. The process proceeds to step 106, in which a nickel layer 206 is sputtered onto the aluminum layer 204 as shown in Figure 2C. Next, proceed to step 1-8, using oxygen plasma. Oxidation of the surface of the nickel layer 206

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And forming a nickel oxide layer 2 〇 8 on the recording layer 20 6a which was not oxidized after the oxygen plasma treatment, as shown in Fig. 2D. Wherein, the unoxidized nickel layer 20 6a and the nickel oxide layer 2 08 after the oxygen plasma treatment constitute a so-called anode 20 9 〇 and then enter the step 11 , to form an organic luminescent material layer 2 1 〇 On the anode 20 9 to provide the desired light, as shown in Figure 2E. then,

Proceeding to step 112, a calcium layer 2 1 2 is formed on the organic light-emitting material layer 2 1 ' as a so-called cathode (cath〇de) as shown in Fig. 2F. Then, in step 11 4, a magnesium layer 2 14 is formed on the cathode formed by the calcium layer 2 1 2 as a so-called protective layer, and a 〇LED display panel 200 is formed as shown in Fig. 2G.

Since the nickel layer 206 is formed on the aluminum layer 204 by sputtering, the flatness of the surface of the nickel layer 206 is difficult to control, and the chance of unevenness is relatively high. Even when an oxygen plasma is used to oxidize the surface of the nickel layer 2〇6, a small number of oxygen atoms or oxygen ions will strike the surface of the nickel layer 2〇6, resulting in oxidation of the surface of the nickel layer 206 after oxidation. The surface of the nickel layer 208 is prone to unevenness. As a result, since the surface of the nickel oxide layer 208 is not flat, a part of the light emitted from the organic luminescent material layer 2 1 通过 passes through the nickel oxide layer 2 0 8 to cause a diffusion phenomenon. Therefore, the aluminum layer 2 〇 4 will not be able to effectively reflect part of the light emitted by the organic light-emitting material layer 210. When the light reflected by the aluminum layer 204 passes through the surface of the nickel oxide layer 206, a diffusion phenomenon is generated, so that the layer of the organic light-emitting material layer 2 1 and the town layer 214 can be emitted to the outside. The light will be less, which affects the lighting effect of the qled display panel 200. In addition, the price of the machine that can provide oxygen plasma is quite expensive, and oxygen

TW1039(050913)CRF.ptc Page 6 1287312 --- Case No. 92114463_Life Day Correction V. Invention Description (3) The amount of gas used is also large, and the energy required for the machine to generate plasma is very high. , resulting in a lot of production costs. In addition, since the machine capable of providing oxygen plasma performs the oxidation operation of the nickel layer 206 every time, it is necessary to repeatedly perform the steps of breaking the cavity, evacuating, holding the plasma to generate plasma, and stabilizing the plasma, although part of The steps can be improved through optimization, but the overall process efficiency is still very low. [In the invention, there is an electrode body display (the layer of the metal layer of the u 11rav metal layer, the transparent layer of the metallization layer, including the substrate layer, the gold surface is formed on the organic layer according to the genus layer of the display panel in the base metal layer) After the surface layer and the golden light rate and the substrate of the present invention, the surface of the substrate is oxidized. The organic light material of the present invention produces the upper surface of the square plate, oxidized

Here, the object panel and the manufacturing method of the present invention. Its iolet-ozone, UV-〇Q is designed to provide an organic light-emitting diode using UV-ozone, which can handle the formation of metal oxide layers. On the other hand, the structure of the reflective oxide layer can be flattened to increase the reflectivity of the metal layer and the metal oxygen reflective layer. The object of the invention is to provide an organic light-emitting diode display surface anode, an organic light-emitting material layer and a cathode. On the anode surface, the anode includes at least a metal layer and a metal oxide layer. The surface of the luminescent material layer is formed on the anode and the cathode is formed on the layer. Another purpose, the law. First, mention the surface. Then, a metal metal layer and a metal are formed to form an organic light emitting diode to display a substrate. Next, a gold is formed using an ultraviolet-ozone treatment oxide layer, and the ultraviolet-ozone oxide layer constitutes an anode. Connect

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f, forming a layer of illuminable organic luminescent material on the anode. After the absence, a cathode is formed on the organic light-emitting material layer. In order to make the above objects, features, and advantages of the present invention more apparent, a preferred embodiment will be described below in detail with reference to the accompanying drawings.

Please refer to FIG. 3 and FIG. 4A to FIG. 4G. FIG. 3 is a flow chart showing the manufacturing method of the organic light emitting diode display panel according to the preferred embodiment of the present invention, and FIG. 4A to FIG. FIG. 3 is a flow cross-sectional view showing a method of manufacturing the organic light emitting diode display panel of FIG. In Fig. 3, first, in step 302, a substrate 4?2 is provided as shown in Fig. 4A. Next, proceeding to step 304, a reflective layer 4?4 is formed on the upper surface of the substrate 4?2 as shown in Fig. 4B. Then, proceeding to step 3〇6, a metal layer 4〇6 is formed on the reflective layer 404 as shown in Fig. 4C. Wherein, the present invention can form the metal layer 406 on the reflective layer 404 by vapor deposition, so that the flatness of the surface of the metal layer 4〇6 will be much improved. Next, proceed to step 3〇曰8 to treat the surface of the metal layer 406 with ultraviolet-ozone (ultravi〇le1: -〇z〇ne, uv_%) to form a metal oxide layer 4〇8 after passing 3 ultraviolet ozone. After the treatment, the metal layer 4 〇6 a which is not oxidized is as shown in Fig. 4D, wherein the metal layer 4〇6a and the metal oxide layer 408 which are not oxidized after the ultraviolet-ozone treatment constitute a so-called anode (an 〇de ) 4〇9. When the stacked structure formed by the substrate 402, the reflective layer 404 and the metal layer 406 is fed into the machine capable of providing ultraviolet/ozone by the conveyor belt, the oxygen in the air poured into the machine will be provided by the light source of the machine. Ultraviolet Reaction Page 8 TW1039 (050913) CRF.ptc 1287312

In the adult dog's milk, the large enamel will oxidize the surface of the metal layer 406, so that the metal oxide layer 4 〇 8 is formed on the surface of the metal layer 406. In the course of ultraviolet irradiation, the preferred embodiment is that the ultraviolet light source is within one centimeter of the metal oxide layer and the non-oxidized metal layer 4〇6a and the reflective layer 4〇4 after the ultraviolet-smoke treatment. Thus, the effect of the structure of the ultraviolet opaque metal oxide layer 4〇8, the ultraviolet-ozone treatment, and the unoxidized metal layer 4〇6a and the reflective layer 4〇4 is better. When these structures are flattened by ultraviolet light, they will be more compact, and the metal oxide layer 8 and the outer layer of ozone treated after the ozone treatment will have a more souther light transmittance, and the reflective layer 4〇4 The surface will be smoother and the reflectivity will increase a lot. In addition, the wavelength of the ultraviolet light in the ultraviolet-ozone which can react with oxygen to form ozone and smooth the ruthenium structure is preferably 丨72~4〇2. When performing ultraviolet-ozone treatment, if the thickness of the metal layer 4〇6 is too Thickness will reduce the light transmittance; if the thickness of the metal layer 4〇6 is too thin, the metal layer is completely oxidized by ozone to the metal oxide layer 4〇8. In addition, if the oxygen _plasma process easily breaks through the metal layer 4〇6, the use of ultraviolet-ozone treatment results in a lower probability of metal layer 4〇6 being penetrated. Therefore, by adjusting the operating conditions of the evaporation, the metal layer 4〇6

The thickness is about 1G to 15Q angstroms (A). That is, the total thickness of the unoxidized metal layer 406a and the metal oxide layer 4〇8 after the ultraviolet-ozone treatment is about 10 to 150 angstroms (A). Further, if the thickness of the metal oxide layer 4 〇 8 is too thick, the conductivity of the metal oxide layer 408 will be deteriorated; if the thickness of the metal oxide layer 4 〇 8 is too thin, the uniformity of the metal oxide layer 408 is not good. Therefore, by adjusting the operating conditions of the ultraviolet-ozone, the thickness of the metal oxide layer 4〇8 is 9

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5. The invention (β) is preferably 6 to 20 angstroms (A). Then, in step 310, a layer 410 of organic light-emitting material is provided on the anode 40 9 as shown in Fig. 4E. In step 31〇, a hole transport iayer A f] c\ u -r- y 々, IW diameter 4U9 is formed, and then a light-emitting layer is formed on the hole transport layer, forming a further_ An electron transport layer is on the light emitting layer. When the electrons provided by the electron transport layer and the holes provided by the hole transport layer are combined in the second light-emitting layer, the light-emitting layer can emit light. Next, in step 312, a cathode 41 2 is formed on the organic light-emitting material layer 41' as shown in Fig. 4F. Then, the process proceeds to step 3丨4 to form a protective layer 414 on the cathode 412, and constitutes a ED1ED display panel 400 as shown in Fig. 4G. f, when a part of the light emitted by the organic light-emitting material layer 4 1 通过 passes through the metal oxide layer 408, since the flatness of the surface of the metal oxide layer 208 is very 'can avoid the light passing through the metal oxide layer 4 〇8 will be diffused Shooting phenomenon. Therefore, the reflective layer 404 will effectively reflect a portion of the light emitted by the organic light-emitting material layer 410. Then, the light reflected by the reflective layer 4〇4 does not diffuse when it passes through the surface of the metal oxide layer 408. It is conceivable that the light that can be emitted to the outside through the cathode 412 and the protective layer 414 on the organic light-emitting material layer 41 () will increase, so that the OLED display panel 400 has a good luminescent effect. In addition, the present invention does not require the use of a machine that can provide an oxygen plasma, and does not require a large amount of oxygen and a machine to generate plasma, and reduces the production cost. In addition, the present invention can employ a continuous transport substrate 402, a reflective layer 404, and a metal layer 40 6

TW1039(050913)CRF.ptc Page 10 1287312 Case No. 92114463 V. INSTRUCTIONS (7) In a stacked structure for UV-ozone treatment, the process efficiency will increase a lot. It is also apparent to those skilled in the art that the technique of the present invention is not limited thereto, for example, wherein the material of the reflective layer 404 is selected from any group consisting of aluminum, silver, and high reflectivity alloys. The material of the metal layer 4〇6 is selected from the group consisting of nickel (Ni), titanium (Ti), vanadium (v), chromium (Cr), manganese (Mn), iron (Fe), and cobalt (Co). Any of them.

Further, the material of the metal layer 406 may be selected from any one of the group consisting of jyB group, VB family, VIB family, lanthanum group and MB group of the periodic table. In addition, when the metal layer 406 is nickel, the metal oxide layer 4〇8 may be nickel oxide (NiOx), that is, the oxide produced by the ultraviolet-ozone treatment of nickel is not only NiO, and may generate other N helium. Proportion of oxidation brocade. < "Another embodiment of the present invention can be regarded as a reflective layer by selecting an appropriate anode or cathode, so that the structure of the original reflective layer 4?4 can be omitted. For example, when the anode 409 is a reflective layer, the cathode 412 and the protective layer 414 must be transparent. When the cathode 412 is a reflective layer, the anode 4〇9 can be thin to light and the substrate 402 can transmit light. Further, in another embodiment of the present invention, the reflective layer can be disposed at the cathode. Between 412 and the protective layer 414, the anode 4〇9 can be thin to light and the substrate 402 can transmit light, so that light can be emitted to the outside through the lower surface of the substrate 4〇2. In contrast, in the manufacturing process, it must be formed first. The reflective layer is formed on the cathode 412, and the protective layer 414 is further formed on the reflective layer. Alternatively, the reflective layer can be disposed on the lower surface of the substrate 40 2 , the anode 4 〇 9 can be thin to light, and the substrate 40 2 can be transparent. A structure for emitting light from the upper surface of the substrate 4〇2 is formed. 1287312 - No. 92114483 V. Description of the Invention (8) The organic light-emitting and manufacturing method disclosed in the embodiments of the present invention has the following advantages:矣 Ί Ί Ί — — — — — The design can deal with the surface of the eight layer to form the metal oxide sound. One i is all sounds and the current gas is π into h ^, and the other can be flat reflection; g, through to improve the metal layer and the metal layer 2, do not need to send a large amount of money to be able to make the need for the second, can be used for the gas, the handle, the amount of the handle, reduce production costs. The energy required to hold the water % is 3 · The present invention can be stacked in a stack of layers, which can increase the efficiency of the second/u earth plate, the reflective layer and the metal process. The ordering process, the external line-ozone treatment procedure, in summary, although it is not intended to limit the hair; the month has been disclosed by the best example of the above, within the spirit and scope of the present invention, right Those who do not deviate from the scope of protection of the present invention should be regarded as the latter. _Tianshi's patent application scope is defined as 匕 曰 修正 Correction polar body display panel TW1039 (050913) CRF.ptc Page 12 1287312

92114£R^ Simple description of the drawing [Simple description of the drawing] The drawing of the brother 1 is a flow chart of the traditional organic method. It is a process sectional view of the manufacturing method of the second diode display panel 2A to 2G. The organic light emitting diode display panel 苐3 is shown in accordance with the present invention - the polar body display panel The flow path of the manufacturing method is shown in the flow chart of the manufacturing method of the third embodiment of the organic light-emitting diodes 4A to 4G. For the matt diode display panel, the drawing label description 200 > 400 : 202 > 402 : 2 0 4 : aluminum layer 2 0 6 : nickel layer organic hair substrate photodiode display panel 20 6a : after oxygen plasma treatment Nickel layer 208: nickel oxide layered 2 0 9 , 4 0 9 : anode 210, 410 : organic light-emitting material layer 212 214 404 406 town layer reflective layer 406a : ultraviolet-ozone treatment ^ ^

UV-Ozone treatment before: Miao々k--白客#-鸯 layer

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Claims (1)

1287312 J No. 9211/1 State Six, the patent application range of organic light emitting diode (〇LED) i苜+; y ”, 'Bei no panel, at least: a substrate; anode ' is formed in the On the upper surface of the substrate, the anode is provided with at least two metal layers # and a metal oxide layer, wherein the metal oxide layer is treated with an ultraviolet-ozone (ultravi〇let - 〇z〇ne, uv - 〇3) Forming a surface of the metal layer, the total thickness of the metal layer and the metal oxide layer not oxidized after the ultraviolet-ozone treatment is 丨〇~丨5 〇(A); an organic luminescent material layer is formed on The organic light emitting diode display panel of the organic light emitting diode display panel of the first aspect of the invention, wherein the organic light emitting diode display panel further comprises: A reflective layer is formed between the substrate and the anode. The organic light emitting diode display panel of claim 2, wherein the material of the reflective layer is selected from the group consisting of aluminum, silver, and high. Reflectivity The organic light emitting diode display panel of claim 1, wherein the organic light emitting diode display panel further comprises: a reflective layer formed on the cathode The organic light-emitting diode display panel according to claim 1, wherein the material of the reflective layer is selected from the group consisting of aluminum, silver, and high-reflectivity alloys. The organic light emitting diode display panel further includes: a reflective layer formed on the lower surface of the substrate. 6. The organic light emitting diode display according to claim 5 TW1039 (050913) CRF.ptc Page 15 1287312 ---- Room number 921144 __祭月曰_修正6, apply for the special purpose '' ' panel, where the material of the reflective layer is selected from aluminum, silver And any of the groups consisting of high reflectivity alloys. The organic light-emitting diode display panel of claim 1, wherein the anode is a reflective layer. 8. The organic light emitting diode display panel of claim 1, wherein the cathode is a reflective layer. The organic light emitting diode display panel of the invention of claim 1, wherein the organic light emitting diode display panel further comprises: a protective layer formed on the cathode. The organic light emitting diode display panel of claim 1, wherein the material of the metal layer is selected from the group consisting of nickel (N i ), titanium (Ti), vanadium (V), and chromium (Cr). Any one of a group consisting of manganese (Mn), iron (Fe), and agglomerate (Co). 11. The organic light emitting diode display panel of claim 10, wherein the metal layer is nickel and the metal oxide layer is nickel oxide (N i Οχ ). 12. The organic light emitting diode display panel of claim 1, wherein the material of the metal layer is selected from the periodic table! Any of a group consisting of a group of VB, VB, VIB, VEB, and MB. 13. The organic light-emitting diode display panel of claim 1, wherein the ultraviolet-ozone ultraviolet light has a wavelength of from 1 72 to 402 nm (nm). 14. The organic light-emitting diode display as described in claim 1 TW1039(050913)CRF.ptc Page 16 1287312 ___ Case No. 9211_4463 Year Month _ Amendment VI. Patent Application Scope ^ Panel, wherein the thickness of the metal oxide layer is 6~2 〇 (A). The organic light emitting diode display panel of claim 1, wherein the organic light emitting material layer comprises: a hole transport layer formed on the anode; and a light emitting layer formed on the anode On the hole transport layer; and an electron transport layer formed on the light-emitting layer. 16) A method for manufacturing an organic light emitting diode display panel, comprising: providing: a substrate; forming a metal layer on the upper surface of the substrate; treating the surface of the metal layer with an ultraviolet-ozone to form a metal oxide layer, and the metal layer and the metal oxide layer which are not oxidized after the ultraviolet-ozone treatment constitute an anode, and the total thickness of the metal layer and the metal oxide layer which are not oxidized by the ultraviolet-ozone treatment is 150 An (A); ', ', ~ forms an organic light-emitting material layer on the anode; and a cathode is formed on the organic light-emitting material layer. 17. The method of claim 16, wherein the method further comprises forming a protective layer on the cathode after the step of forming a cathode on the organic light-emitting material layer. The method of claim 16, wherein the step of forming a metal layer on the substrate further comprises: forming a reflective layer on the upper surface of the substrate ;as well as TW1039(050913)CRF.ptc 1287312 A metal layer is formed on the reflective layer. The method of claim 18, wherein the material of the reflective crucible is selected from the group consisting of aluminum, silver, and high reflectivity alloys, as described in claim 1 The method of claim 6, wherein the method further comprises: forming a reflective layer on the cathode after the step of forming a cathode on the organic light-emitting material layer, wherein the material of the reflective layer is selected from the group consisting of: And any of the groups consisting of high reflectivity alloys. The method of claim 6, wherein the method further comprises: forming a reflective layer on a lower surface of the substrate. The method of claim 2, wherein the material of the reflective layer is selected from the group consisting of aluminum, silver, and high reflectivity alloys. The method of claim 16, wherein the anode is a reflective layer. The method of claim 16, wherein the cathode is a reflective layer. The method of claim 16, wherein the material of the metal layer is selected from the group consisting of nickel (Ni), titanium (Ti), hunger (V), chromium (Cr), and manganese (Mn). Any of a group consisting of iron () and cobalt (Co). The method of claim 25, wherein the metal layer is nickel and the metal oxide layer is nickel oxide (Ni Ox). TW1039 (050913) CRF.ptc Page 18 1287312 -- A case No. 92114463 Yue Zheng Zheng ____ VI. Application for patent scope 2 7 · If the patent application scope is the first β item, the metal layer The material is selected from any one of the group consisting of JYB, νβ, VIB, VHB, and MB of the periodic table. The method of claim 6, wherein the method further comprises: forming a metal layer having a thickness of 1 〇 150 Å (A) in the dream of forming a metal layer on the substrate; On the upper surface of the substrate. 29. The method of claim 6, wherein the ultraviolet-ozone ultraviolet light has a wavelength of from 1 7 2 to 4 2 nm (nm). The method of claim 16, wherein the metal oxide layer has a thickness of 6 to 20 angstroms (A). The method of claim 16, wherein the method further comprises: forming a hole transport layer on the anode in the step of forming an organic light-emitting material layer on the anode; forming a light-emitting layer Layered on the hole transport layer; and an electron transport layer is formed on the light-emitting layer. % •—