TWI285375B - Voltage level converting circuit for use in flash memory - Google Patents

Voltage level converting circuit for use in flash memory Download PDF

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Publication number
TWI285375B
TWI285375B TW94117563A TW94117563A TWI285375B TW I285375 B TWI285375 B TW I285375B TW 94117563 A TW94117563 A TW 94117563A TW 94117563 A TW94117563 A TW 94117563A TW I285375 B TWI285375 B TW I285375B
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voltage
voltage level
level
flash memory
conversion circuit
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TW94117563A
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Chinese (zh)
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TW200641898A (en
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Shin-Jang Lin
Jeng-Ying Wu
Ming-Tsang Yang
Hau-Cheng Jang
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Yield Microelectronics Corp
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Abstract

This invention provides a voltage level converting circuit for use in flash memory. A voltage level detector is employed to provide a reference voltage level, and there are two pairs of coupled PMOS transistors each connected to the voltage level detector, wherein one pair is connected to a first voltage and the other pair determines the gate bias using the voltage level detector. There are two pairs of coupled NMOS transistors, wherein on end thereof is connected to the second voltage and an input end respectively. One of the two pairs is connected to one pair of PMOS transistors, and the other end thereof is connected to an output end. The other pair is connected by means of an inverting amplifier and is further connected to ground. The voltage level converting circuit of this invention allows high-voltage level to pass through and is provided with a wide voltage range for the working power source.

Description

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【發明所屬之技術領域】 本發明係有關一種應用於快閃記憶體之電壓 電路,特別是關於—種具有寬工作電源電壓範 2 = 於快閃記憶體之電壓準位轉換電路。 j應用 【先前技術】 第1圖為目前快閃記憶體之内部電路方塊示意 閃記憶體1包括一位址解碼/編碼器丨0,一連接位^址’ 2 編碼器Η之電壓準位轉換電路12、一充電幫浦14及=/ 儀^己憶兀件16分別連接至電壓準位轉換電路12,在快、二 體10内部需要電壓準位轉換電路12把高壓Vpp傳遞到<快閃_ 記憶元件16的閘極(Gate)或汲極(Source)上以便完成資料 寫入(Program)或資料抹除(Erase)等功能。 貝’ 然因一般標準邏輯元件半導體製程中沒有耐高壓的金 屬氧化半導體(Metal-Oxide Semi Conductor ;M0S)元件 裝置,對於使用這樣製程的快閃記憶體丨〇而言會產生高壓 電路設計上的困擾。 第2圖為先前技術中之電壓準位轉換電路12之一詳細 電路示意圖,並請參考第3圖之操作時序圖,當輸入端In %Logic Hi(Vcc電壓準位)時,N通道金屬氧化半導體(N -channel Metal-Oxide Semi Conductor ;NM0S)M4 處於關閉 狀態,而P通道金屬氧化半導體(P-channel Metal-Oxide Semi Conductor ; PM0S)M2處於導通狀態,輸出端Out電壓 準位為Vpp,另一輸出端Out2因NMOS M3處於導通狀態而為 d:BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a voltage circuit applied to a flash memory, and more particularly to a voltage level conversion circuit having a wide operating power supply voltage range = flash memory. j application [prior art] Figure 1 shows the internal circuit block of the current flash memory. The flash memory 1 includes a bit address decoder/encoder 丨0, a connection bit address 2 encoder Η voltage level conversion The circuit 12, a charging pump 14 and a / / device 己 兀 16 16 are respectively connected to the voltage level conversion circuit 12, in the fast, two body 10 requires a voltage level conversion circuit 12 to transfer the high voltage Vpp to < fast Flash_Gate or Gate of memory element 16 to complete functions such as program writing or data erasing (Erase). However, due to the fact that there is no high-voltage metal-oxide-semiconductor (M0S) device in the semiconductor process of standard logic components, high-voltage circuit design is produced for flash memory devices using such a process. Troubled. 2 is a detailed circuit diagram of a voltage level conversion circuit 12 in the prior art, and please refer to the operation timing diagram of FIG. 3, when the input terminal In %Logic Hi (Vcc voltage level), N-channel metal oxide The semiconductor (N-channel Metal-Oxide Semi Conductor; NM0S) M4 is in a closed state, and the P-channel Metal-Oxide Semi Conductor (PM0S) M2 is in an on state, and the output terminal Out voltage level is Vpp. The other output terminal Out2 is d because NMOS M3 is in the on state:

第5頁 1285375 五、發明說明(2) 接地準位,其中Vpp >Vcc,此時PM0S %的閘極承受的準位 為Vpp,Vpp愈高,對PMOS M2的可靠性傷害愈大,高準位的 輸出端Out可能造成NMOS Μ*的汲極端接面崩潰(juncti〇rl break down) 〇 " 當輸入端111為[〇21(: Low(接地準位)時,NM〇s a處於 •導通狀態,輸出端Out的電壓準位為接地準位,另一輸出 ^Out:2因NMOS Ms處於關閉狀態,且pmos &處於導通狀態, 而為Vpp,此時PMOS Mi的閘極承受的準位為Vpp。Vpp愈“ 高,對PMOS 的可靠性傷害愈大’高準位輸出端能 孀卢成NMOS M3的汲極端接面崩潰(juncti〇n break d〇wn)。 第4圖為先前技術中之電壓準位轉換電路12之另一詳 細電路示意圖,並請參考第3圖之操作程序圖,當輸入端 h為Logic Hi(電壓準位為Vcc)時,NM〇s M?、心為關閉狀 態’由於PMOS Ms、M4為導通狀態,電源Vpp經由pM〇s 、 Μ4對輸出端Out充電,輸出端0ut為Vpp準位,n〇de ^亦為 VPP準位;另一輸出端〇^2因0的Ms、Me為導通狀態而為接 地準位,node W12的準位為Vcc +丨vtp卜vtp是pM〇s Μ〗或 M4 的起始電位(threshold voltage)。 當輸入端In為Logic Low(接地準位)時,為導 零心,輸出端Out經由NMOS MT、放電到接地準位;另一 輸出端Out2經*PM0S Mi、M2被充電到vpp準位,n〇de w 為VPP準位,node %4的準位為Vcc +丨ηρ丨,此一技^因、 亭PMOS M2及A的閘極偏壓在固定準位Vcc, 二 可靠性,因為每一元件的閘極所受的偏壓均小於Vpp—、Page 5 1285375 V. Description of invention (2) Grounding level, where Vpp > Vcc, at this time, the gate of PM0S % is subjected to Vpp, the higher the Vpp, the greater the damage to PMOS M2, the higher the damage The output Out of the level may cause the NMOS Μ* 汲 extreme junction to collapse (juncti〇rl break down) 〇" When the input terminal 111 is [〇21(: Low), NM〇sa is at In the on state, the voltage level of the output terminal Out is the grounding level, and the other output ^Out:2 is in the off state due to the NMOS Ms, and the pmos & is in the on state, and is Vpp, at this time the gate of the PMOS Mi is subjected to The level is Vpp. The higher the Vpp is, the greater the damage to the reliability of the PMOS. The high-level output can collapse the 汲 extreme junction of Lu Cheng NMOS M3 (juncti〇n break d〇wn). Another detailed circuit diagram of the voltage level conversion circuit 12 in the prior art, and please refer to the operation program diagram of FIG. 3, when the input terminal h is Logic Hi (voltage level is Vcc), NM〇s M?, The heart is in the off state. Since the PMOS Ms and M4 are in the on state, the power source Vpp charges the output terminal Out via pM〇s and Μ4. The output terminal 0ut is Vpp level, n〇de ^ is also VPP level; the other output terminal 〇^2 is grounded by Ms and Me of 0, and the level of node W12 is Vcc +丨vtp Bu vtp is the starting potential of pM〇s Μ or M4. When the input terminal In is Logic Low, it is the zero-conducting center, and the output terminal Out is discharged to the grounding level via the NMOS MT. The other output terminal Out2 is charged to the vpp level by *PM0S Mi, M2, n〇de w is the VPP level, and the level of node %4 is Vcc +丨ηρ丨, this technique, the kiosk PMOS M2 And the gate bias of A is at a fixed level Vcc, and the reliability is because the bias voltage of each element is less than Vpp-,

第6頁Page 6

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Vcc。但它最大缺點是工作電壓範圍約在Vcc + 2Vtp與Vpp之 間’假务Vpp由内部充電幫浦(charge pUmp)供應,當它因 瞬時大電流負載出現一向下的突波時,可能使得本電路不 能正常工作(參考第3圖所示之虛線部分)。 … 有鑑於此,本發明係針對上述之困擾,提出一種應用 •於快閃圯憶體之電壓準位轉換電路,以改善上述之缺失。 【發明内容】 本發明之主要目的,係在提供一種應用於快閃記憶體 馨p電壓準位轉換電路,係利用一般邏輯半導體製程下的電 晶體元件裝置,以設計出可通過高壓準位並且有寬工作電 源電壓範圍的電壓準位轉換電路。 本發明之另一目的,係在提供一種應用於快閃記憶體 之電壓準位轉換電路,其係可決定部分pM〇s電晶體之閘極 偏壓,當參考電壓準位小於一預設值,pM〇s電晶體之閘 極偏壓為接地準位,而當參考電壓準位大於預設值時, PMOS電晶體的閘極偏壓為等於或大於第二電壓Re。 為達到上述之目的,本發明係提出一種應用於快閃記 囑^體之電壓準位轉換電路,包括有一電壓準位偵測器,其 =一參考電壓準位,並有二對相耦接之pM〇s電晶體分別 到電壓準位偵測器,且其中一對pM〇s電晶體與一第一 壓相連接,而另一對利用電壓準位偵測器決定閘極偏 ,一另有一對相耦接之隨0S電晶體之一端分別連接至一第 電壓及一輸入端’且其中一對題os電晶體連接至一對Vcc. But its biggest disadvantage is that the operating voltage range is between Vcc + 2Vtp and Vpp. 'Fake Vpp is supplied by the internal charge pump (charge pUmp). When it appears a downward glitch due to the instantaneous high current load, it may make this The circuit does not work properly (refer to the dotted line shown in Figure 3). In view of the above, the present invention is directed to the above-mentioned problems, and proposes a voltage level conversion circuit for applying a flash memory to improve the above-mentioned deficiency. SUMMARY OF THE INVENTION The main object of the present invention is to provide a flash memory CMOS voltage level conversion circuit, which utilizes a transistor component device under a general logic semiconductor process to design a high voltage level. A voltage level conversion circuit with a wide operating supply voltage range. Another object of the present invention is to provide a voltage level conversion circuit for a flash memory, which can determine a gate bias of a portion of a pM〇s transistor, when the reference voltage level is less than a predetermined value. The gate bias of the pM〇s transistor is a grounding level, and when the reference voltage level is greater than a preset value, the gate bias of the PMOS transistor is equal to or greater than the second voltage Re. In order to achieve the above object, the present invention provides a voltage level conversion circuit applied to a flash memory device, including a voltage level detector, which has a reference voltage level and is coupled to two pairs. The pM〇s transistors respectively go to the voltage level detector, and one pair of pM〇s transistors is connected to a first voltage phase, and the other pair uses a voltage level detector to determine the gate bias, and another one One end of the coupled 0S transistor is respectively connected to a first voltage and an input terminal' and a pair of os transistors are connected to a pair

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PMOS電晶體,且另一端連接至一 晶體係利用-反相放大器相連接,並;接:另::祕電 ^ ^ <伐至一接地端。 氐下藉由具體貝施例配合所附的圖式 容易瞭解本發明的目的、技術内容、 』二=,虽, 效。 W點及其所達成的功 【實施方式】 本發明提出一種應用於快閃記憶體之電壓準位 ^=5圖為本發明所提出之快閃記憶體之内部電路方塊 ζ忍圖:快閃記憶體2包括-連接Vcc之位址解碼/編碼器 ,一連接位址解碼/編碼器20之電壓準位轉換電路22、 ^ =VPP/VCC切換電路24及一快閃記憶元件26分別連接至 ' =準位轉換電路22,且有一充電幫浦28連接至 cc 切換電路24。 本發明為利用電壓準位轉換電路22係為設計出可通過 高壓準位並且有寬工作電源電壓範圍,第β圖為本發明之 電壓準位轉換電路2 2之一實施例之詳細電路示意圖,電壓 準位轉換電路2 2包括一電壓準位偵測器3 〇,用以提供一參 j電壓準位,並有二對相耦接之PM〇s電晶體32、34,其^ 連接至電壓準位偵測器3〇,且其中一對PM〇s電晶體32與 第一電壓Vpp/Vcc相連接,而第一電壓Vpp/Vcc可經由 Vpp/Vcc切換電路24進行Vpp或Vcc之切換,而另一對pmos 電晶體34利用電壓準位偵測器30決定閘極偏壓Vbias,並 有二對相耦接之NM0S電晶體36、38,其一端分別連接至一PMOS transistor, and the other end is connected to a crystal system by using an inverting amplifier, and then: connected: another:: ^ ^ < cut to a ground. The purpose and technical content of the present invention can be easily understood by the specific embodiment of the present invention by means of a specific embodiment. W point and its achieved work [Embodiment] The present invention provides a voltage level applied to the flash memory ^=5 is the internal circuit block of the flash memory proposed by the present invention: flashing The memory 2 includes an address decoder/encoder connected to Vcc, a voltage level conversion circuit 22, a ^VPP/VCC switching circuit 24 and a flash memory element 26 connected to the address decoding/encoder 20 are respectively connected to ' = level conversion circuit 22, and a charging pump 28 is connected to the cc switching circuit 24. The present invention is designed to utilize a voltage level conversion circuit 22 to design a high voltage level and a wide operating power supply voltage range. The seventh diagram is a detailed circuit diagram of an embodiment of the voltage level conversion circuit 22 of the present invention. The voltage level conversion circuit 2 2 includes a voltage level detector 3 〇 for providing a reference voltage level, and has two pairs of coupled PM 〇s transistors 32, 34, which are connected to the voltage The level detector 3〇, and a pair of PM〇s transistors 32 are connected to the first voltage Vpp/Vcc, and the first voltage Vpp/Vcc can be switched by Vpp/Vcc switching circuit 24 for Vpp or Vcc. The other pair of pmos transistors 34 use the voltage level detector 30 to determine the gate bias voltage Vbias, and have two pairs of phase-coupled NM0S transistors 36, 38, one end of which is connected to one

第8頁 ⑨ 1285375 五、發明說明(5) 第二電壓Vcc及一輸入端In,且其中一對NM0S電晶體36連 接至一對PMOS電晶體34,且另一端連接至一輸出端〇ut, 而另一對NM0S電晶體38、利用一反相放大器40相連接,並連 ‘至一接地端VSS。 … 其中,於一開始時,電壓準位預先設定於第二電壓 、vcc ’當完成輸入準位之設定後,將電壓準位切換至第一 電壓Vpp/Vcc ;電壓準位偵測器3〇依據第一電壓Vpp/Vcc準 位提供參考電壓Vbias準位,其可能為第二電壓Vcc及接地 準位,或者為一第三電壓及接地準位,且第三電壓會高於 馨声二電壓Vcc並低於第一電壓仏{)/^(:(::準位;換言之,當第 電壓準位小於一預設值,即二至三倍的第二電壓Vcc 時,PM0S電晶體34之閘極偏壓為接地準位,而當第一電壓 準位大於預設值時,PM0S電晶體34的閘極偏壓為等於或大 於第二電壓Vcc。 電壓準位轉換電路22包括一電壓準位偵測器3〇,還包 括有一第一 p通道金屬氧化半導體M1,其源極(s〇urce)接 =第二電壓Vpp/Vcc,且有一第二p通道金屬氧化半導體 ,其閘極(Gate)、源極分別接到參考電壓”1&5準位及 2 —p通道金屬氧化半導體Μι之汲極(Drain),且 t通道金屬氧化半導體Μι之沒極,並有一第一N通道金 m _,彡閘極及源極分別接到-輸入端1η及-:,VSS,及一第:Nii道金屬氧化半 ,其汲極、 :雷If分別,接到第二?通道金屬氧化半導體M3的沒極、 第-電MVcc及第-N通道金屬氧化半導體A之没極,還有 1285375 五、發明說明(6) " - 第一P通道金屬氧化半導體沟,其閘極及源極分別接到第 p通道金屬氧化半導體札之汲極及第一電壓,及 第四P通道金屬氧化半導體%,其閘極及源極分別接到參 電壓Vbias準位及第三p通道金屬氧化半導體黾之汲極, -且基板接到第三p通道金屬氧化半導體黾之汲極,還有一第 •三N通道金屬氧化半導體,其閘極及源極分別接到一反相 放,器40輸出端及接地端Vss,另外還包括一第四N通道金 屬氧,半導體Ms,其汲極、閘極、源極分別接到第四p通道 金屬氧化半導體Me之汲極、第二電壓Vcc及第三N通道金屬 &化半導體M7之汲極。 第7圖為本發明之電壓準位轉換電路之另一内部詳細 電路示意圖,電壓準位轉換電路22包括一電壓準位偵測器 30,其用以提供一參考電壓準位Vbias,並有一第一 p通道 金屬氧化半導體Mg,其源極接到第一電壓Vpp/Vcc,一第二 P通道金屬氧化半導體4 G,其閘極、源極分別接到參考電 壓Vbias準位及第一P通道金屬氧化半導體^之汲極,且基 板接到第一 P通道金屬氧化半導體屺之汲極,還有一第一 n 通道金屬氧化半導體Mu,其閘極及源極分別接到一輸入端 ^及一接地端Vss,及一第二N通道金屬氧化半導體I,其 鲁極、閘極、源極分別接到第二P通道金屬氧化半導2體^ 的沒極、第二電壓Vcc及第一 N通道金屬氧化半導體Mu之^及 極,尚有一第三P通道金屬氧化半導體Mu,其源極接1到第 一電壓Vpp/Vcc,及一第四P通道金屬氧化半導體I,其淡 極、閘極及源極分別接到第一 P通道金屬氧化半導4體仏之閘Page 8 9 1285375 V. Description of the Invention (5) The second voltage Vcc and an input terminal In, and wherein a pair of NMOS transistors 36 are connected to a pair of PMOS transistors 34, and the other end is connected to an output terminal 〇ut, The other pair of NMOS transistors 38 are connected by an inverting amplifier 40 and connected to a ground terminal VSS. ... In the beginning, the voltage level is preset to the second voltage, vcc 'when the setting of the input level is completed, the voltage level is switched to the first voltage Vpp/Vcc; the voltage level detector 3〇 The reference voltage Vbias level is provided according to the first voltage Vpp/Vcc level, which may be the second voltage Vcc and the grounding level, or a third voltage and grounding level, and the third voltage is higher than the sinusoidal voltage Vcc is lower than the first voltage 仏{)/^(:(:: level; in other words, when the first voltage level is less than a predetermined value, that is, two to three times the second voltage Vcc, the PMOS transistor 34 The gate bias voltage is a grounding level, and when the first voltage level is greater than a preset value, the gate bias voltage of the PMOS transistor 34 is equal to or greater than the second voltage Vcc. The voltage level conversion circuit 22 includes a voltage level. The bit detector 3A further includes a first p-channel metal oxide semiconductor M1 having a source (s〇urce) connected to a second voltage Vpp/Vcc and a second p-channel metal oxide semiconductor having a gate ( Gate), the source is connected to the reference voltage "1 & 5 level and 2 - p channel metal oxide semiconductor Μι's Drain, and the t-channel metal oxide semiconductor Μι is infinite, and has a first N-channel gold m _, 彡 gate and source are respectively connected to the - input terminal 1η and -:, VSS, and No.: Nii channel metal oxidized half, its drain, Ray If, respectively, is connected to the second-channel metal oxide semiconductor M3, the first-electrode MVcc and the -N-channel metal oxide semiconductor A, and 1285375 V. INSTRUCTIONS (6) " - The first P-channel metal oxide semiconductor trench, the gate and the source of which are respectively connected to the drain of the p-channel metal oxide semiconductor and the first voltage, and the fourth P-channel metal % of the oxidized semiconductor, the gate and the source are respectively connected to the reference voltage Vbias level and the drain of the third p-channel metal oxide semiconductor ,, and the substrate is connected to the drain of the third p-channel metal oxide semiconductor ,, and one The third N-channel metal oxide semiconductor has its gate and source respectively connected to an inverting discharge, the output end of the device 40 and the ground terminal Vss, and further includes a fourth N-channel metal oxide, a semiconductor Ms, and a drain thereof. The gate and the source are respectively connected to the fourth p-channel metal oxide semiconductor Me The pole, the second voltage Vcc and the third N-channel metal & the semiconductor M7 of the drain. Figure 7 is another internal detailed circuit diagram of the voltage level conversion circuit of the present invention, the voltage level conversion circuit 22 includes a voltage The level detector 30 is configured to provide a reference voltage level Vbias and has a first p-channel metal oxide semiconductor Mg whose source is connected to the first voltage Vpp/Vcc and a second P-channel metal oxide semiconductor 4 G, the gate and the source are respectively connected to the reference voltage Vbias level and the first P-channel metal oxide semiconductor ^, and the substrate is connected to the first P-channel metal oxide semiconductor germanium, and a first n The channel metal oxide semiconductor Mu has a gate and a source respectively connected to an input terminal ^ and a ground terminal Vss, and a second N-channel metal oxide semiconductor I, the Lu, the gate and the source are respectively connected to the second The P-channel metal oxide semiconductor 2 body ^, the second voltage Vcc and the first N-channel metal oxide semiconductor Mu and the pole, there is a third P-channel metal oxide semiconductor Mu, the source is connected to the first Voltage Vpp/Vcc, and a fourth P channel metal Oxidized semiconductor I, whose light, gate and source are respectively connected to the first P-channel metal oxide semiconducting body

1285375 參考電MVbias準位及第三p通道金屬氧化半導體Mi3 之 五、發明說明(7) 極1285375 Reference electric MVbias level and third p-channel metal oxide semiconductor Mi3 5, invention description (7)

汲=A,且基板接到第三p通道金屬氧化半導體m13之汲極 及一第三N通道金屬氧化半導體I,其閘極及源極分別接 到一,相放大器4〇輪出端及接地端Vss,另有一第四N通道 金屬氧化半導體^,其汲極、閘極、源極分別接到第四P 通道金屬氧化半導體Mu之汲極、第二電壓Vcc及第三N通道 金屬氧化半導體M15之沒極。 第8圖為本發明之電壓準位轉換電路之另一内部詳細 電路示意圖,電壓準位轉換電路22包括一電壓準位偵測 ’其用以提供一參考電壓準位几。3,並有一第一p 金屬氧化半導體1,其源極接到第一電壓Vpp/Vcc ; 一 〜 一 P通道金屬氧化半導體,其閘極、源極分別接到參 電壓Vbias準位及第一 p通道金屬氧化半導體I之汲極, 基板接到第一P通道金屬氧化半導體Mn之汲極;一第—且 道金屬氧化半導體Mlg,其閘極及源極分別接到一輸入通 及一接地端Vss ; —第二N通道金屬氧化半導體I,其 n 極、閘極、源極分別接到第二P通道金屬氧化半2Q導體^〆 及極、第二電壓Vcc及第一N通道金屬氧化半導體i之、 g ; —第三P通道金屬氧化半導體‘,其閘極及源極分 到第二P通道金屬氧化半導體‘之汲極及第一電壓刮 Vpp/Vcc,· 一第四P通道金屬氧化半導體M22,其閘極及 分別接到參考電壓Vbias準位及第三p通道金屬氧化半 '極 M?1之汲極,且基板接到第三p通道金屬氧化半導體乂 趙 極;一第三N通道金屬氧化半導體I,其閘極及源=分^ 1285375 五、發明說明(8) 接到一反相放大器40輸出端及接地‘Vss ;以及一第四N通 道金屬氧化半導體I,其汲極、閘極、源極分別接到第四 P通道金屬氧化半導體I之汲極、第二電壓Vcc及第三N 道金屬氧化半導體M23之汲極。 Μ”源極(節點w 3 4 )的電壓準 M6、Mn、M12、M19、M2G 在關閉 M18源 PM0S Μ!、Μ9、Μ17 在導通狀態,pm〇s Μ2、M1Q 極(節點wl2)的電壓準位被推升到Vpp ; PM〇s Μι 其中,第6、7、8圖之第二P通道金屬氧化半導體坞、 M10、Mls及第四p通道金屬氧化半導體Μβ、I、屯之閘極2偏 壓由電壓準位偵測器30決定,當第一電壓準位小於一預設 值,即一至二倍的第二電壓VCC時,之閘極偏壓為接地準 位,而當第一電壓準位大於預設值時,閘極偏壓為等於或 馨卜於第二電壓Vcc,操作時序如第9圖所示,當輸入端In為 I L〇w(0v)時,NM0S m7、m8、Mi5、Μΐβ、m23、m24 在導通狀態二 輸出端Out和NMOS M?、M15、Mu汲極的電壓準位均被拉下到 〇V(接地準位),pm〇s M6、M14 位為Vbias+ 丨 Vtp I ; NMOS Μ 狀態 M17、Μ u电!平促裉推开到V pp ; PMOS %、M2、M9、 的閘極承受的準位為Vpp-Vbias-|Vtp|大幅度 改善元件裝置的可靠性,vtp是PM0S m2、、Miq、^ jM22的起始電位(threshold voltage);輸入端匕為。18 電壓準位),NMOS M5、M6、Mn、M12、M19、M2。在導通狀 態,節點Out2和NMOS Ms、Mn、Mlg汲極的電壓準位均被拉下 到0 V (接地準位),PMOS M2、M10、M18源極(節點w 1 2 )的電壓 準位為Vbias+lVtpl ;NM0S M7、M8、M15、M16、M23、M24 在關 閉狀態,PMOS 在導通狀態,輸出端〇ut和pM〇s 第12頁 五、發明說明(9) 虬Μί4 ^源極(節點w34)的電壓準位被推升到Vpp ,· pM〇s ίΛ 、Af 1/ \r — 的間極承受的準位為Vpp-Vbias汲=A, and the substrate is connected to the drain of the third p-channel metal oxide semiconductor m13 and a third N-channel metal oxide semiconductor I, the gate and the source thereof are respectively connected to one, the phase amplifier 4 is turned out and grounded The terminal Vss has a fourth N-channel metal oxide semiconductor, and the drain, the gate and the source thereof are respectively connected to the drain of the fourth P-channel metal oxide semiconductor Mu, the second voltage Vcc and the third N-channel metal oxide semiconductor. M15 is not very good. FIG. 8 is another internal detailed circuit diagram of the voltage level conversion circuit of the present invention. The voltage level conversion circuit 22 includes a voltage level detection unit </ RTI> for providing a reference voltage level. 3, and a first p metal oxide semiconductor 1, the source of which is connected to the first voltage Vpp / Vcc; a ~ P channel metal oxide semiconductor, the gate and source are respectively connected to the reference voltage Vbias level and the first The drain of the p-channel metal oxide semiconductor I, the substrate is connected to the drain of the first P-channel metal oxide semiconductor Mn; the first-channel metal oxide semiconductor Mlg, the gate and the source thereof are respectively connected to an input and a ground a second N-channel metal oxide semiconductor I, wherein the n-pole, the gate, and the source are respectively connected to the second P-channel metal oxide half 2Q conductor and the second voltage Vcc and the first N-channel metal oxide Semiconductor i, g; - third P-channel metal oxide semiconductor', whose gate and source are divided into the second P-channel metal oxide semiconductor's drain and the first voltage scraper Vpp/Vcc, · a fourth P channel The metal oxide semiconductor M22 has its gate connected to the reference voltage Vbias level and the third p-channel metal oxide half-pole M?1, and the substrate is connected to the third p-channel metal oxide semiconductor 乂Zhaoji; The third N-channel metal oxide semiconductor I, its gate and source = ^ 1285375 V. Description of the invention (8) Receive an inverting amplifier 40 output and ground 'Vss; and a fourth N-channel metal oxide semiconductor I, the drain, gate and source are respectively connected to the fourth P channel The metal oxidizes the drain of the semiconductor I, the second voltage Vcc, and the drain of the third N-channel metal oxide semiconductor M23. Μ"Source (node w 3 4 ) voltages M6, Mn, M12, M19, M2G turn off the voltage of M18 source PM0S Μ!, Μ9, Μ17 in the on state, pm〇s Μ2, M1Q pole (node wl2) The level is pushed up to Vpp; PM〇s Μι Among them, the second P-channel metal oxide semiconductor dock of the sixth, seventh, and eighth diagrams, M10, Mls, and the fourth p-channel metal oxide semiconductor Μβ, I, 屯 gate The bias voltage is determined by the voltage level detector 30. When the first voltage level is less than a predetermined value, that is, one to two times the second voltage VCC, the gate bias is the ground level, and when the first When the voltage level is greater than the preset value, the gate bias is equal to or equal to the second voltage Vcc, and the operation timing is as shown in FIG. 9. When the input terminal In is IL〇w(0v), NM0S m7, m8 , Mi5, Μΐβ, m23, m24 in the on-state 2 output terminal Out and the voltage levels of the NMOS M?, M15, Mu 汲 are pulled down to 〇V (grounding level), pm 〇s M6, M14 bits are Vbias+ 丨Vtp I ; NMOS Μ state M17, Μ u power! Push 到 to V pp ; PMOS %, M2, M9, the gate is subjected to the level of Vpp-Vbias-|Vtp| Reliability, vtp is the threshold voltage of PM0S m2, Miq, ^jM22; input terminal 匕 is .18 voltage level), NMOS M5, M6, Mn, M12, M19, M2. In the on state, The voltage levels of the node Out2 and the NMOS Ms, Mn, and Mlg 拉 are pulled down to 0 V (grounding level), and the voltage levels of the PMOS M2, M10, and M18 sources (node w 1 2 ) are Vbias+lVtpl. ;NM0S M7, M8, M15, M16, M23, M24 are off, PMOS is on, output 〇ut and pM〇s Page 12 V. Invention Description (9) 虬Μί4 ^Source (node w34) The voltage level is pushed up to Vpp, · pM〇s ίΛ, Af 1/ \r — the level of the interpole is Vpp-Vbias

Ml7、MMl7, M

[18 Μι、M2、M9、Mj[18 Μι, M2, M9, Mj

Ihpl大&amp;幅度改善元件裝置的可靠性。 路n::ϋ一種應用於快閃記憶體之電壓準位轉換電 ..^ 一般邏輯半導體製程下的電晶體元件裝置,並 利用電壓準位偵、、f丨丨哭、也—如' 包日日版几1干表置,並 設計出可、s古、/、疋邛/刀電晶體元件之閘極偏壓,以 〇冲出了通過兩壓準位並且有 準位轉換電路。 有冤作電源電壓乾圍的電壓 =上所述係藉由實施例說明本發明之特點, 熟習該技術者能瞭解本發明 &quot;' ,發明之專利範圍,故凡其他未脫離;以揭= :而完成之等效修飾或修改,仍應包含在精 專利範圍中。 r所述之申請 1285375 圖式簡單說明 w【圖式簡單說明】 第1圖為習知之快閃記憶體之内部電路方塊示意圖。 第2圖為習知之電壓準位轉換電路之一詳細電路示意圖。 第3圖為習知之電壓準位轉換電路之操作程序圖。 .第4圖為為習知之電壓準位轉換電路之另一詳細電路示意 圖。 •第5圖為本發明之快閃記憶體之内部電路方塊示意圖。 第6圖為本發明之電壓準位轉換電路之一詳細電路示意 圖。 Φ 7圖為本發明之電壓準位轉換電路之另一詳細電路示意 圖。 第8圖為本發明之電壓準位轉換電路之再一詳細電路示意 圖。 第9圖為本發明之電壓準位轉換電路之操作程序圖。 【主要元件符號說明】 1快閃記憶體 10位址解碼/編碼器 1 2電壓準位轉換電路 •充電幫浦 1 6快閃記憶元件 2-快閃記憶體 20位址解碼/編碼器 22電壓準位轉換電路Ihpl large &amp; amplitude improves the reliability of component devices. Road n:: ϋ A voltage level conversion power applied to the flash memory..^ The transistor component device under the general logic semiconductor process, and uses the voltage level to detect, f丨丨 cry, also—such as 'package The daily version of the 1st dry table is set, and the gate bias of the s-, _, 疋邛/knife transistor components is designed to rush out through the two-press level and have a level conversion circuit. There is a voltage for the dry voltage of the power supply voltage = the above description is based on the characteristics of the present invention, and those skilled in the art can understand the invention, the patent scope of the invention, and therefore the other is not detached; : The equivalent modification or modification completed shall still be included in the scope of the fine patent. r Application 1285375 Brief description of the diagram w [Simple description of the drawing] Fig. 1 is a schematic diagram of the internal circuit block of the conventional flash memory. Figure 2 is a detailed circuit diagram of a conventional voltage level conversion circuit. Figure 3 is a diagram showing the operation of a conventional voltage level conversion circuit. Fig. 4 is a schematic diagram showing another detailed circuit of a conventional voltage level conversion circuit. • Fig. 5 is a block diagram showing the internal circuit of the flash memory of the present invention. Figure 6 is a detailed circuit diagram of one of the voltage level conversion circuits of the present invention. The Φ 7 diagram is another detailed circuit diagram of the voltage level conversion circuit of the present invention. Figure 8 is a further detailed circuit diagram of the voltage level conversion circuit of the present invention. Figure 9 is a diagram showing the operation of the voltage level conversion circuit of the present invention. [Main component symbol description] 1 flash memory 10 address decoding / encoder 1 2 voltage level conversion circuit • charging pump 1 6 flash memory component 2 - flash memory 20 address decoding / encoder 22 voltage Level conversion circuit

m 第14頁 ⑧ 1285375 圖式簡單說明 ’24 Vpp/Vcc切換電路 2 6快閃記憶元件 28充電幫浦 30電壓準位偵測器 _ 32 、 34 PMOS 電晶體 36 、 38 NMOS電晶體 &lt; 40反相放大器m Page 14 8 1285375 Schematic description of the '24 Vpp/Vcc switching circuit 2 6 flash memory component 28 charging pump 30 voltage level detector _ 32, 34 PMOS transistor 36, 38 NMOS transistor &lt; 40 Inverting amplifier

1HHI 第15頁1HHI第15页

Claims (1)

1285375 六、申請專利範圍 1 · 一種應用於快閃記憶體之電壓準位轉換電路,其係包 括: ’…、 電壓準位偵測器,用以提供一參考電壓準位·, 二對相耦接之PMOS電晶體,其係分別連接該電壓準位偵 •測器,且其中一對該PM〇s電晶體與一第—電壓相連接,而 另一對該PMOS電晶體係利用該電壓準位偵測器決定閘極偏 '壓;以及 二對相耦接之NMOS電晶體,其一端分別連接至一第二電 壓及一輸入端,且其中一對該NMOS電晶體連接至一對該 •MOS電晶體,且另一端連接至一輸出端,而另一對該麗〇s 電晶體係利用一反相放大器相連接,並連接至一接地端。 2 ·如申請專利範圍第1項所述之應用於快閃記憶體之電壓 準位轉換電路,其中,該電壓準位偵測器依據該第一電壓 準位提供該參考電壓準位。 3 ·如申請專利範圍第1項所述之應用於快閃記憶體之電壓 準位轉換電路,其中,該參考電壓準位係為該第二電壓或 接地準位。 4 ·如申請專利範圍第1項所述之應用於快閃記憶體之電壓 準位轉換電路,其中,該參考電壓準位係為一第三電壓或 %地準位,且該第三電壓高於該第二電壓並低於該第一電 壓準位。 5··如申請專利範圍第1項所述之應用於快閃記憶體之電壓 準位轉換電路,其中,該參考電壓準位小於一預設值時, 該PMOS電晶體之閘極偏壓係為接地準位,而當該參考電壓1285375 VI. Patent Application Range 1 · A voltage level conversion circuit applied to flash memory, which includes: '..., voltage level detector for providing a reference voltage level ·, two pairs of phase coupling Connected to the PMOS transistor, which is respectively connected to the voltage level detector, wherein a pair of the PM〇s transistors are connected to a first voltage, and the other uses the voltage level for the PMOS crystal system The bit detector determines a gate bias voltage; and two pairs of phase coupled NMOS transistors, one end of which is respectively connected to a second voltage and an input terminal, and wherein a pair of the NMOS transistors are connected to a pair of the NMOS transistors The MOS transistor has the other end connected to an output terminal, and the other is connected to the ground terminal by an inverting amplifier. The voltage level conversion circuit applied to the flash memory according to the first aspect of the invention, wherein the voltage level detector provides the reference voltage level according to the first voltage level. The voltage level conversion circuit applied to the flash memory according to the first aspect of the invention, wherein the reference voltage level is the second voltage or ground level. The voltage level conversion circuit applied to the flash memory according to the first aspect of the invention, wherein the reference voltage level is a third voltage or a ground level, and the third voltage is high. And the second voltage is lower than the first voltage level. 5. The voltage level conversion circuit applied to the flash memory according to the first aspect of the patent application, wherein the reference voltage level is less than a predetermined value, the gate bias of the PMOS transistor Is the grounding level, and when the reference voltage 第16頁 ⑧ 1285375 六、申請專利範圍 *準位大於該預設值時,該PMOS電晶體之閘極偏壓係為等於 大於該第二電壓。 6. 如申請專利範圍第5項所述之應用於快閃記憶體之電壓 準位轉換電路,其中,該預設值係為該第二電壓之二至三 .倍。 7. 如申請專利範圍第1項所述之應用於快閃記憶體之電壓 •準位轉換電路,其電壓準位預先設定於該第二電壓,當完 成輸入準位之設定後,將該電壓準位切換至該第一電壓。Page 16 8 1285375 VI. Patent Application Range * When the level is greater than the preset value, the gate bias of the PMOS transistor is equal to or greater than the second voltage. 6. The voltage level conversion circuit applied to the flash memory according to claim 5, wherein the preset value is two to three times the second voltage. 7. The voltage level-level conversion circuit applied to the flash memory according to claim 1 of the patent application, wherein the voltage level is preset to the second voltage, and when the input level is set, the voltage is applied. The level is switched to the first voltage. 第17頁 ⑧Page 17 8
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US9523722B2 (en) 2014-06-02 2016-12-20 Winbond Electronics Corporation Method and apparatus for supply voltage glitch detection in a monolithic integrated circuit device
TWI565954B (en) * 2014-10-16 2017-01-11 華邦電子股份有限公司 Method for detecting glitch in supply voltage and monolithic integrated circuit device

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CN101988939B (en) * 2009-07-31 2014-06-04 环旭电子股份有限公司 External power supply device and power supply method thereof
US10505521B2 (en) 2018-01-10 2019-12-10 Ememory Technology Inc. High voltage driver capable of preventing high voltage stress on transistors

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9523722B2 (en) 2014-06-02 2016-12-20 Winbond Electronics Corporation Method and apparatus for supply voltage glitch detection in a monolithic integrated circuit device
TWI565954B (en) * 2014-10-16 2017-01-11 華邦電子股份有限公司 Method for detecting glitch in supply voltage and monolithic integrated circuit device

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