TWI281522B - Method for preparing zinc oxide crystalline - Google Patents

Method for preparing zinc oxide crystalline Download PDF

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TWI281522B
TWI281522B TW94136872A TW94136872A TWI281522B TW I281522 B TWI281522 B TW I281522B TW 94136872 A TW94136872 A TW 94136872A TW 94136872 A TW94136872 A TW 94136872A TW I281522 B TWI281522 B TW I281522B
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substrate
zinc oxide
aqueous solution
crystal
mixture
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TW94136872A
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TW200716798A (en
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Ming-Kwei Lee
Tsung-Hsiang Shih
Po-Chun Chen
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Univ Nat Sun Yat Sen
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions

Abstract

The present invention provides a method for preparing zinc oxide crystalline, which is comprising the following steps: mixing a reacting aqueous solution and a proper amount of nitric acid aqueous solution to obtain a mixing solution, heating said mixing solution to a proper temperature, and then placing a substrate into said mixing solution for appropriate time, so as to form a layer of zinc oxide crystalline on the substrate, wherein said reacting aqueous solution is consisting of zinc nitrate aqueous solution and hexamethylenetetramine aqueous solution.

Description

1281522 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種用於製備氧化辞晶體之方法,特 別是指一種利用液相沉積法(liquid phase deposition)來製備 氧化鋅晶體之方法。 【先前技術】 氧化鋅(ZnO)由於具有3.37eV之能隙(band gap)以及60 meV之激發束缚能(excitation binding energy),又具備許多 特殊性質,例如:近紫外線發射(near-UV emission)、透明 導電性(transparent conductivity)、壓電性(piezoelectricity) 、光觸媒效果、化學及熱穩定性等等,因此,氧化辞之應 用範圍非常廣泛,特別是呈晶相之氧化辞可應用於表面聲 波過渡器(surface acoustic wave filter)、光子晶體(photonic crystals)、發光二極體(light-emitting diode)、光學調變波導 (optical modulator waveguide)、變阻器(varistor)、氣體感測 器(gas sensor)及太陽能電池(solar cell)等。 氧化鋅晶體之製備方法,目前已知有金屬-有機化學氣 相沉積法(metal-organic chemical vapor phase deposition, MOCVD)、熱蒸鍵法(thermal evaporation)、高溫氣相傳輸法 (high temperature vapor transport)及液相沉積法等,其中, 因為液相沉積法具備步驟較為簡單,無需使用特定儀器及 成本較為低廉等優點,所以,目前之研究大多朝向利用液 相沉積法來製備氧化辞晶體。 L. Vayssieres 等人(L. Vayssieres,K. Keis,S. Ε· 12815221281522 IX. Description of the Invention: [Technical Field] The present invention relates to a method for preparing an oxidized crystal, and more particularly to a method for preparing zinc oxide crystal by liquid phase deposition. [Prior Art] Zinc oxide (ZnO) has many special properties due to its band gap of 3.37 eV and excitation binding energy of 60 meV, for example, near-UV emission. , transparent conductivity, piezoelectricity, photocatalytic effect, chemical and thermal stability, etc. Therefore, the application of oxidation is very extensive, especially the oxidation of crystalline phase can be applied to surface acoustic waves. Surface acoustic wave filter, photonic crystals, light-emitting diodes, optical modulator waveguides, varistors, gas sensors And solar cells (solar cells) and the like. Metal-organic chemical vapor phase deposition (MOCVD), thermal evaporation, and high temperature vapor transport are known as methods for preparing zinc oxide crystals. And liquid phase deposition methods, etc., because the liquid deposition method has the advantages of simple steps, no need to use a specific instrument, and low cost, so most of the current researches are directed to the preparation of oxidized crystals by liquid deposition. L. Vayssieres et al. (L. Vayssieres, K. Keis, S. Ε · 1281522

Lindquist, A. Hagfeldt, J. Phys. Chem. B 2001, 105, 3350 ; L. Vayssieres,ji/v. Maier. 2003,75,464)首先提出利用六亞甲 基四胺(hexamethylenetetramine,C6H12N4)及石肖酸辞(zinc nitrate,Zn(N03)2)於水溶液中進行熱分解反應,可於各種基 板上直接成長高方向性二維氧化鋅微棒陣列(highly oriented two-dimensional microrod arrays of ΖηΟ) 〇 於“Q· Li,V. Kumar,Y. Li,H. Zhang,T. J. Marks,R. P. H. Chang,C/zem. Maier.2005,/7,1001·”文獻中,是利用等莫 耳數之六亞甲基四胺水溶液與硝酸辞水溶液於95°C之反應 溫度下進行反應,其反應方程式推測如下式(1)〜(5)所示: C6H12N4 + 6H20 4 6HCHO + 4NH3 (1) nh3 + H20 ^ NH4+ + OH" (2) Zn(N〇3)2 ^ ^ Zn2+ + 2N03" (3) 20H~ + Zn2 + Zn(OH)2 (4) Zn(OH)2 — ZnO(S) + H20 (5) 首先,六亞曱基四胺依據上式(1)及(2)之反應,將提供氫氧 根離子(OH_),硝酸鋅則依據上式(3)提供辞原子(Zn2+),接 著氫氧根離子與鋅原子將繼續依據上式(4)及(5)進行反應, 最後生成氧化辞,而氧化辞將進行成核(nucleation)反應並 洛在基板上方繼績生長’約10小時生長成氧化辞奈米棒 (ZnO nanorods)。氧化辞需要使用95°C以上之溫度作為生 長溫度的原因有二:一、致使六亞甲基四胺水解並解離出 氫氧根離子,以及二、95°C以上之高溫將促使反應方程式 (5)向右移動,讓Zn(OH)2轉變為ZnO,並使成長速度加快 1281522 。但是,上述反應式皆於水溶液狀態下進行,然而95QC以 上之高溫將可能導致水及NH3蒸發,而讓氫氧根離子的濃 度下降,所以,使用95°C以上之生長溫度通常需要耗時數 十小時或更長的時間才可獲得柱狀氧化辞晶體。 於“X. Gao,X.Li,W. Yu,CT^m. 5 2005,709, 1155.”文獻中,則是依據1 : 3 : 1之莫耳比例來混合硫酸鋅 、乙二胺(ethylenediamine)及六亞甲基四胺,以製備一前驅 物水溶液,接著將此前驅物水溶液加熱至95^(3,再倒入底 部放置有矽基板之玻璃瓶中進行生長反應,約1小時可獲 得似花狀氧化辞奈米結構(flowerlike ZnO nanostructures), 反應過程如以下反應方程式(6)〜(9)所示:Lindquist, A. Hagfeldt, J. Phys. Chem. B 2001, 105, 3350; L. Vayssieres, ji/v. Maier. 2003, 75, 464) first proposed the use of hexamethylenetetramine (C6H12N4) and Zinc nitrate (Zn(N03)2) is thermally decomposed in aqueous solution to directly grow highly oriented two-dimensional microrod arrays of ΖηΟ on various substrates. In the "Q·Li, V. Kumar, Y. Li, H. Zhang, TJ Marks, RPH Chang, C/zem. Maier. 2005, /7, 1001·" literature, is the use of the six molar number The aqueous solution of methylenetetramine and the aqueous solution of nitric acid are reacted at a reaction temperature of 95 ° C, and the reaction equation is presumed to be as shown in the following formulas (1) to (5): C6H12N4 + 6H20 4 6HCHO + 4NH3 (1) nh3 + H20 ^ NH4+ + OH" (2) Zn(N〇3)2 ^ ^ Zn2+ + 2N03" (3) 20H~ + Zn2 + Zn(OH)2 (4) Zn(OH)2 — ZnO(S) + H20 ( 5) First, the hexamethylenetetramine will provide the hydroxide ion (OH_) according to the reaction of the above formulas (1) and (2), and the zinc nitrate will provide the atom (Zn2) according to the above formula (3). +), then the hydroxide ion and the zinc atom will continue to react according to the above formulas (4) and (5), and finally an oxidation word will be generated, and the oxidation word will undergo a nucleation reaction and grow on top of the substrate. 'Approximately 10 hours to grow into ZnO nanorods. Oxidation requires the use of temperatures above 95 ° C as the growth temperature for two reasons: one, causing the hydrolysis of hexamethylenetetramine and dissociation of hydroxide ions, and the high temperature above 95 ° C will promote the reaction equation ( 5) Move to the right to convert Zn(OH)2 to ZnO and increase the growth rate by 1281522. However, the above reaction formulas are all carried out in an aqueous solution state, but a high temperature of 95 QC or higher may cause water and NH 3 to evaporate, and the concentration of hydroxide ions is lowered. Therefore, it takes a time to use a growth temperature of 95 ° C or higher. Columnar oxidized crystals are available for ten hours or longer. In "X. Gao, X. Li, W. Yu, CT^m. 5 2005, 709, 1155.", the zinc sulfate and ethylenediamine are mixed according to the molar ratio of 1:3:1. Ethylenediamine) and hexamethylenetetramine to prepare a precursor aqueous solution, and then heat the previous aqueous solution of the precursor to 95 ° (3, and then poured into a glass bottle with a ruthenium substrate at the bottom for growth reaction, about 1 hour. The flowerlike ZnO nanostructures are obtained, and the reaction process is as shown in the following reaction equations (6) to (9):

Zn2+ + 3NH2.(CH2)2.NH2 ㈠[Zn(NH2.(CH2)2.NH2)3]2+ (6) C6H12N4 + 6H20 — 6HCHO + 4NH3 (7) NH2 (CH2)2 NH2 + 2H20 h NH3 (CH2)2 NH3 + 20H_ (8)Zn2+ + 3NH2.(CH2)2.NH2 (I)[Zn(NH2.(CH2)2.NH2)3]2+ (6) C6H12N4 + 6H20 — 6HCHO + 4NH3 (7) NH2 (CH2)2 NH2 + 2H20 h NH3 (CH2)2 NH3 + 20H_ (8)

Zn2+ + 20H_ — Zn(OH)2 — ZnO + H20 (9) 。此文獻主要在探討乙二胺是否會影響所製得之氧化鋅的 形態,最後發現當硫酸鋅/六亞甲基四胺/乙二胺= 1/1/6時 或是在未使用乙二胺且硫酸鋅濃度為0.0001 Μ之狀態下, 可獲得棒狀氧化鋅晶體。但是,此文獻之反應溫度還是必 須控制在95°C,才可獲得柱狀氧化鋅結晶。 由上述可知,柱狀氧化辞晶體之習知製備方法大多須 於95°C以上之生長溫度,須適度控制反應物之濃度且大多 需數十小時之時間下才可獲得柱狀結晶,因此,對於在較 低生長溫度且較短時間下製備柱狀氧化辞晶體之方法,仍 1281522 存在一需求。 【發明内容】 因此,本發明之目的,即在提供一種於較低生長溫度 (80°C以下)及較短時間下之用於製備氧化鋅晶體之方法。 於是,本發明之用於製備氧化鋅晶體之方法,包含之 步驟為:將一反應水溶液與一適量頌酸水溶液進行混合, 以獲得一混合液,將該混合液加熱至適當溫度,再將一基 板放置於該混合液中並歷時適當時間,最後於該基板上形 成一層氧化辞晶體,其中,該反應水溶液是由一硝酸辞水 溶液及一六亞甲基四胺水溶液所構成。 本發明之方法是藉由添加適量硝酸來製備氧化辞晶體 ,並可有效降低生長溫度至80。(:以下及縮短時間至2小時 以下。針對本案之方法,目前推測之反應過程如下式 ⑴〜(ix)所示: C6Hi2N4 + 6H20 6HCH0 + 4NH3 (i) NH3 + H20 ㈠ NH4+ + OH- (ii)Zn2+ + 20H_ — Zn(OH)2 — ZnO + H20 (9) . This paper is mainly to explore whether ethylenediamine will affect the form of zinc oxide produced. Finally, it was found that when zinc sulfate/hexamethylenetetramine/ethylenediamine = 1/1/6 or when ethylene is not used In the state where the amine and the zinc sulfate concentration are 0.0001 Å, a rod-shaped zinc oxide crystal can be obtained. However, the reaction temperature of this document must be controlled at 95 ° C to obtain columnar zinc oxide crystals. It can be seen from the above that the conventional preparation method of the columnar oxidized crystals is mostly required to have a growth temperature of 95 ° C or more, and it is necessary to appropriately control the concentration of the reactants, and it takes a few tens of hours to obtain columnar crystals. There is still a need for 1281522 for the preparation of columnar oxidized crystals at lower growth temperatures and for shorter periods of time. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a method for preparing zinc oxide crystals at a lower growth temperature (below 80 ° C) and for a shorter period of time. Therefore, the method for preparing zinc oxide crystals of the present invention comprises the steps of: mixing a reaction aqueous solution with an appropriate amount of aqueous citric acid solution to obtain a mixed solution, heating the mixed solution to a suitable temperature, and then The substrate is placed in the mixed solution for a suitable period of time, and finally a layer of oxidized crystals is formed on the substrate, wherein the aqueous solution is composed of an aqueous solution of nitric acid and an aqueous solution of hexamethylenetetramine. The method of the present invention prepares an oxidized crystal by adding an appropriate amount of nitric acid, and can effectively lower the growth temperature to 80. (: The following and shortening time to 2 hours or less. For the method of the present case, the current estimated reaction process is as shown in the following formulas (1) to (ix): C6Hi2N4 + 6H20 6HCH0 + 4NH3 (i) NH3 + H20 (1) NH4+ + OH- (ii )

Zn(N03)2 ㈠ Zn2+ + 2Ν0Γ (iii) 20H_ + Zn2+ — Zn(OH)2 (iv) HN03 ㈠ It + NOf (v)Zn(N03)2 (a) Zn2+ + 2Ν0Γ (iii) 20H_ + Zn2+ — Zn(OH)2 (iv) HN03 (I) It + NOf (v)

Zn(N03)2 + 2H20 + 2C6H12N4 ㈠[Zn(H20)2(C6H12N4)2](N03)2 (vi)Zn(N03)2 + 2H20 + 2C6H12N4 (1) [Zn(H20)2(C6H12N4)2](N03)2 (vi)

Zn(N03)2 + 4H20 + 2C6H12N4 ^ [Ζη(Η20)4(〇6Η12Ν4)2](Ν〇3)2 (vii) [Zn(H2〇)2(C6Hi2N4)2](N〇3)2 + OH" — Zn(0H)2 — Z11O+H2O (viii) [Zn(H20)4(C6H12N4)2](N〇3)2 + 〇ir-> Zn(OH)2 Zn0+H20 (ix) ,六亞曱基四胺同樣會依據上述式(i)及(ii)產生0H_,但隨 著該式(v)所產生之H+及Ν〇Γ的濃度升高,該式(iii)及式(iv) 1281522 之反應將會受到影響,而不會繼續向右反應,也就是表示 六亞曱基四胺及硝酸鋅於水溶液中將不會發生解離,且依 據“Q. Li,V. Kumar,Y. Li,H· Zhang,T. J· Marks, R. Ρ· H· Chang,C/zem. Μα 化 r.2005,7 7,1001文獻之内容,而推測會 生成該式(vi)及(vii)之配位錯合物(coordination complexes), 並以兩配位錯合物作為核種(nuclei),最後再形成氧化鋅晶 體(推測可能機制如式viii及式ix)。因此可知,頌酸確實可 有效促進氧化鋅晶體之成長。 【實施方式】 本發明用於製備氧化鋅晶體之方法包含之步驟為:將 一反應水溶液與一適量硝酸水溶液進行混合,以獲得一混 合液,將該混合液加熱至適當溫度,再將一基板放置於該 混合液中並歷時適當時間,最後於該基板上形成一層氧化 鋅晶體,其中,該反應水溶液是由一石肖酸鋅水溶液及一六 亞甲基四胺水溶液所構成。 較佳地,於該混合液中,該硝酸辞、六亞甲基四胺與 硝酸之莫耳比例為1 : 1 : 0.05〜1 ·· 1 ·· 0.15。需注意的是, 氧化辞之結晶狀態及形狀可能會受到周圍生長環境的影響 ,因此,必須適當控制硝酸的添加量,可獲得不同尺寸之 柱狀氧化鋅晶體。 於本發明之方法中,該混合液是被加熱至較低溫度 (80°C以下),再放入該基板進行氧化鋅晶體的生長。較佳 地,該混合液被加熱至50°C〜75°C ;更佳地,該混合液被加 熱至65°C〜75°C。於本發明之一具體例中,該混合液被加熱 1281522 至 70oC 〇 該基板放置於該混合液之時間可依需要進行增加,較 佳地,該基板放置於該混合液之時間為〇 5〜2小時。於本發 明之一具體例中,該基板放置於該混合液之時間為2小時Zn(N03)2 + 4H20 + 2C6H12N4 ^ [Ζη(Η20)4(〇6Η12Ν4)2](Ν〇3)2 (vii) [Zn(H2〇)2(C6Hi2N4)2](N〇3)2 + OH" — Zn(0H)2 — Z11O+H2O (viii) [Zn(H20)4(C6H12N4)2](N〇3)2 + 〇ir-> Zn(OH)2 Zn0+H20 (ix) , The hexamethylenetetramine also produces 0H_ according to the above formulas (i) and (ii), but with the concentration of H+ and strontium produced by the formula (v), the formula (iii) and the formula (iii) Iv) The reaction of 1281522 will be affected and will not continue to react to the right, meaning that the hexamethylenetetramine and zinc nitrate will not dissociate in the aqueous solution, and according to "Q. Li, V. Kumar, Y. Li, H. Zhang, T. J. Marks, R. Ρ·H· Chang, C/zem. Μα化r.2005,7 7,1001 The content of the literature, and it is speculated that this formula (vi) and (vii) Coordination complexes, with two coordination complexes as nuclei, and finally zinc oxide crystals (presumably possible mechanisms such as formula viii and formula ix). The acid can effectively promote the growth of zinc oxide crystals. [Embodiment] The present invention is used for preparing zinc oxide crystals. The method comprises the steps of: mixing a reaction aqueous solution with an appropriate amount of aqueous nitric acid solution to obtain a mixed solution, heating the mixture to a suitable temperature, and then placing a substrate in the mixed solution for a suitable period of time, and finally Forming a layer of zinc oxide crystals on the substrate, wherein the aqueous solution of the solution is composed of an aqueous solution of zinc silicate and an aqueous solution of hexamethylenetetramine. Preferably, in the mixture, the nitrate, hexamethylene The molar ratio of the tetramine to the nitric acid is 1: 1: 0.05~1 ··1 ·· 0.15. It should be noted that the crystal state and shape of the oxidation may be affected by the surrounding growth environment, so it must be properly controlled. Columnar zinc oxide crystals of different sizes can be obtained by adding nitric acid. In the method of the present invention, the mixture is heated to a lower temperature (below 80 ° C) and then placed on the substrate for zinc oxide crystals. Preferably, the mixture is heated to 50 ° C to 75 ° C; more preferably, the mixture is heated to 65 ° C to 75 ° C. In one embodiment of the invention, the mixture Being heated 1 281522 to 70oC 时间 The time during which the substrate is placed in the mixed solution can be increased as needed. Preferably, the substrate is placed in the mixed solution for 5 to 2 hours. In one embodiment of the present invention, the substrate Placed in the mixture for 2 hours

於本發明之方法中,該基板之材質可依需要進行變化 。較佳地,該基板係選自於由下列所構成之群組:π-νζ族 半導體基板、III-V族半導體基板及IV族半導體基板。例如 邊III-V族半導體基板可為 填化銦等等,該π_νι族半導體基板可為,但不限於:硫化 鋅、砸化鋅、氧化鋅料,該IV族半導體基板可為,=不 限於:石夕、錯等等。於本發明之—具體例中,該基板 砷化鎵基板。 選擇性地,本發明之方法更包含一基板清洗步驟,該 基板清洗步驟是在將該基板放置於該混合液之前,先進^ 該基板之清洗。需注意的是,該基板清洗步驟可依據業Ζ 所熟知之步驟並使用適當溶劑進行。 於本發明之方法中’可以視後續用途所需,選擇性地 日欠化所使用之基板或是將該基板予以移除。較佳地,本發 =方法更包含—分離步驟,該分離步驟是將該氧化辞曰^ 體與該基板進行分離。 曰曰 ο 於本發明之方法中,所製得之氧化鋅是呈六角板狀結 〈實施例&gt; 10 1281522 本發明將就以下實施例來作進一步說明,但應瞭解的 疋’該等實施例僅為例示說明之用,而不應被解釋為本發 明實施之限制。 &lt;化學品&gt; 以下實施例及比較例係運用下列化學品進行反應: 1· 硝酸鋅水溶液:硝酸鋅是由瑞士 Riedel_de Haen公司所 製造,型號為14436,以下所使用之硝酸鋅水溶液之使 用濃度為0·1 Μ,係由29.75 g之硝酸鋅加入1 L水中 所製得。 2·六亞甲基四胺水溶液:六亞甲基四胺是由美國sigma-Aldrich公司所製造,型號為si3361_473,以下所使用 之六亞甲基四胺水溶液之使用濃度為〇·丨M,是由 l4.19g之六亞甲基四胺加入1 l水中所製得。 3 · 硝酸水溶液:確酸是由德國Merck公司所製造,型號 為TN1701,以下所使用之硝酸水溶液之使用濃度為 0·1 Μ,是由體積比率為70%之硝酸水溶液進行稀釋所 製得。 iiMJ__殖:酸水溶液之添加量與氧化銼形 將10 mL之頌酸辞水溶液與1 〇 mL之六亞甲美四胺 進行混合,以獲得一反應水溶液。於該反應水溶液中分別 加入 0、0.5、ho、15、2.0、2.5、3.0 mL 之硝酸水溶液 ,以各自獲得一混合液。接著,使該砷化鎵基板(由曰本In the method of the present invention, the material of the substrate can be changed as needed. Preferably, the substrate is selected from the group consisting of a π-ν 半导体 semiconductor substrate, a III-V semiconductor substrate, and a Group IV semiconductor substrate. For example, the side III-V semiconductor substrate may be filled with indium or the like, and the π_νι group semiconductor substrate may be, but not limited to, zinc sulfide, zinc telluride, and zinc oxide. The group IV semiconductor substrate may be, without being limited to, : Shi Xi, wrong and so on. In a specific embodiment of the invention, the substrate is a gallium arsenide substrate. Optionally, the method of the present invention further comprises a substrate cleaning step of cleaning the substrate prior to placing the substrate in the mixed solution. It should be noted that the substrate cleaning step can be carried out according to procedures well known in the art and using a suitable solvent. In the method of the present invention, the substrate used may be selectively etched or removed depending on the needs of the subsequent use. Preferably, the method of the present invention further comprises a separation step of separating the oxidized singer from the substrate.曰曰ο In the method of the present invention, the zinc oxide obtained is a hexagonal plate-like junction <Example> 10 1281522 The present invention will be further illustrated by the following examples, but it should be understood that The examples are for illustrative purposes only and are not to be construed as limiting the invention. &lt;Chemicals&gt; The following examples and comparative examples were carried out by the following chemicals: 1. Zinc nitrate aqueous solution: Zinc nitrate was manufactured by Riedel_de Haen, Switzerland, model 14436, and the following zinc nitrate aqueous solution was used. The concentration is 0·1 Μ, which is obtained by adding 29.75 g of zinc nitrate to 1 L of water. 2. hexamethylenetetramine aqueous solution: hexamethylenetetramine is manufactured by Sigma-Aldrich, USA, model si3361_473, and the hexamethylenetetramine aqueous solution used below is used at a concentration of 〇·丨M. It is prepared by adding 14.19 g of hexamethylenetetramine to 1 l of water. 3 · Aqueous nitric acid solution: The acid is manufactured by Merck, Germany, model TN1701, and the aqueous solution of nitric acid used below is used at a concentration of 0.1 Μ, which is obtained by diluting a 70% by volume aqueous solution of nitric acid. iiMJ__ Colonization: Addition amount of aqueous acid solution and cerium oxide shape A 10 mL aqueous solution of citric acid was mixed with 1 〇 mL of hexamethylenetetramine to obtain a reaction aqueous solution. To the aqueous solution of the reaction, 0, 0.5, ho, 15, 2.0, 2.5, and 3.0 mL of an aqueous solution of nitric acid were separately added to obtain a mixed solution. Next, the gallium arsenide substrate is

Sumitomo Electric Industries 公司所製造,厚声約為 4〇〇 μηι)依據下列步驟進行清洗:以丙酮進行清洗約▼時1 〇 1281522 分鐘,再以熱硫酸進行清洗約歷時3分鐘,然後使用一蝕 刻液(將硫酸、雙氧水及水依據體積比為5 : 1 : 1進行混 合所製得)進行清洗約歷時i分鐘,最後再利用氮氣吹乾 。然後,分別將該混合液加熱至7〇〇C並於一恆溫槽(由台 灣Wisdom公司所製造,型號為0B-10)中維持此溫度2〇 分鐘,再將經清洗之該砷化鎵基板放置於該混合液中約歷 時2小時,最後於該砷化鎵基板上形成一層氧化辞。 (測試) 分別以去離水,將上述所獲得之成長有氧化鋅之砷 化鎵基板進行清洗,再以氮氣吹乾,然後利用下列方式及 儀器加以分析,所獲得之結果分別如下表1及圖1至9所 不 · (I) FESEM 測試: 將所獲得之晶體黏著在一導電材料上,並利用荷蘭 飛利浦公司(Philip)製造,型號為Xl-40FEG之場放射型 掃描式電子顯微鏡(以下稱為『FESEM』),觀察晶體表面 及側面,及該晶體與基材的連結狀態。 (II) XRD 測試 利用德國西門子(Siemens)公司製造,型號為D5000 的X射線繞射儀(以下稱為『XRD』),並且以電壓4〇 kv 、電流30 mA、掃描範圍由2Θ=20。〜50。、掃描速率為i °/min、每格2θ=〇·1。自動紀錄X光強度及銅靶λ= 0.15406 Α之條件下,進行XRD分析,並經由儀器内建之資料庫 (database)進行訊號比對結果,以確認其化學組成。 12 1281522 (III) HRTEM 測試 自晶體於基板上剝離並置於一約2-3 mm直徑、200 網目(mesh)之圓形銅網上,並利用曰本捷東(jeql jem)公 司製造,型號為3010之高解析度穿透式電子顯微鏡沙匕匕 resolution transmission electron micrograph,以下簡稱為 『HRTEM』),以200 kV之加速電壓來觀察該等晶體之 單晶結構。 表1 樣品 編號 硝酸水溶液 添加量(mL) --------- 石肖酸鋅:六亞甲基 氧化鋅之形態 FESEM 圖式 HRTEM 圖式 1 0 1 : 1 : 0 --— ^11^曰葉片狀 圖1 - 2 0.5 1 : 1 : 〇.〇5 -------— 結晶 圖2 - 3 1.0 t : 1 : 0.10 _____— ---- _^狀結晶 圖3 4 1.5 1 : 1 · 〇·ΐ5 ----- 狀結晶 圖4 圖8 5 2.0 ! : 1 : 0.20 _______ ___ 葉片狀 圖5 圖7 6 2.5 1 : 1 : 〇·25 葉片狀 - 7 3.0 1 : 1 : 0.30 i___一-— 葉片狀 圖6 - (結果) 由該表1之、结果可知’當硝酸水溶液之添加量為〇·5 、1.0及1.5 mL時’所獲得之氧化鋅形態為柱狀結晶,且 由圖2至4以及圖8看來’可明顯看出氧化辞是呈六角柱 狀結晶,且可發現· ^硝^水溶液之添加量增加時,柱狀 氧化鋅結晶的尺寸會隨著縮小以及其密度會隨著增加。這 是因為適量的硝酸會抑制六亞甲基四胺及硝酸辞的解離反 13 1281522 液之添加量為0.5七mL時,可獲得呈晶相之氧化辞。 總言之,當硝酸辞:六亞甲基四胺:确 之氧化鋅,而可利於後續之使用。It is manufactured by Sumitomo Electric Industries, and the thickness is about 4〇〇μηι). It is cleaned according to the following steps: cleaning with acetone for about 1 〇 1281522 minutes, then cleaning with hot sulfuric acid for about 3 minutes, then using an etchant (Sulphuric acid, hydrogen peroxide, and water were prepared by mixing according to a volume ratio of 5:1:1). The cleaning was carried out for about 1 minute, and finally dried by nitrogen gas. Then, the mixture was separately heated to 7 ° C and maintained in a constant temperature bath (manufactured by Wisdom, Taiwan, model 0B-10) for 2 minutes, and then the washed gallium arsenide substrate It was placed in the mixture for about 2 hours, and finally a layer of oxidation was formed on the gallium arsenide substrate. (Test) The gallium arsenide substrate obtained by growing the zinc oxide obtained above was washed with water, and then dried with nitrogen, and then analyzed by the following methods and instruments. The obtained results are shown in Table 1 below. 1 to 9 none (I) FESEM test: The obtained crystal is adhered to a conductive material, and a field-type scanning electron microscope (hereinafter referred to as Xl-40FEG) manufactured by Philips, the Netherlands (hereinafter referred to as "Xl-40FEG"). "FESEM"), the surface and side of the crystal and the state of connection between the crystal and the substrate were observed. (II) XRD test An X-ray diffractometer (hereinafter referred to as "XRD") manufactured by Siemens, Germany, model D5000, with a voltage of 4 〇 kv, a current of 30 mA, and a scanning range of 2 Θ = 20. ~50. The scanning rate is i ° / min, 2θ = 〇 · 1 per division. XRD analysis was performed under the conditions of automatic recording of X-ray intensity and copper target λ = 0.15406 ,, and the signal comparison was performed via the built-in database of the instrument to confirm the chemical composition. 12 1281522 (III) HRTEM test was carried out on a substrate and placed on a circular copper wire of approximately 2-3 mm diameter and 200 mesh, and manufactured by jeql jem. The 3010 high-resolution transmission electron microscope, hereinafter referred to as "HRTEM", observes the single crystal structure of the crystals with an acceleration voltage of 200 kV. Table 1 Sample No. Nitric Acid Aqueous Solution Addition (mL) --------- Zinc Shawl Acid: Form of Hexamethylene Zinc Oxide FESEM Pattern HRTEM Figure 1 0 1 : 1 : 0 --- ^ 11^曰 blade shape Figure 1 - 2 0.5 1 : 1 : 〇.〇5 ------- - Crystallization Figure 2 - 3 1.0 t : 1 : 0.10 _____— ---- _^ Crystallization Figure 3 4 1.5 1 : 1 · 〇·ΐ5 ----- Crystalline Figure 4 Figure 8 5 2.0 ! : 1 : 0.20 _______ ___ Blade Figure 5 Figure 7 6 2.5 1 : 1 : 〇·25 Leaf Shape - 7 3.0 1 : 1 : 0.30 i___一-- Leaf shape Figure 6 - (Result) From the results of Table 1, the oxidation obtained when 'the amount of nitric acid aqueous solution is 〇·5, 1.0 and 1.5 mL' is obtained. The form of zinc is columnar crystal, and it can be clearly seen from Fig. 2 to Fig. 4 and Fig. 8 that the oxidation word is hexagonal columnar crystal, and it can be found that the columnar zinc oxide is added when the addition amount of the aqueous solution is increased. The size of the crystal will decrease with increasing density and density. This is because an appropriate amount of nitric acid inhibits the dissociation of hexamethylenetetramine and nitric acid, and the addition amount of the liquid is 1,7,815,522. In summary, when nitric acid: hexamethylenetetramine: indeed zinc oxide, can be used for subsequent use.

此外,值得一提的是,如欲將非晶葉片狀之氧化鋅 轉變為呈晶相之氧化辞,可將該非晶葉片狀氧化鋅之樣品 (樣品編號卜5、6及7)放人氧氣中進行回火步驟,約歷 時1小時’便可獲得呈晶相之氧化辞。例如,將上述樣品 編號1(未添加_水溶液)所製得之非晶葉片狀氧化辞於 不同回火溫度下進行反應,接著再將經回火後之氧化辞進 行XRD刀析’其結果如圖所示,其中發現以3〇〇〇c 之回火溫度可獲得最高之強度。 綜上所述,本發明用於製備氧化辞晶體之方法是藉由 添加適量硝酸水溶液,以獲得呈六角柱狀結晶之氧化辞, 並有效地降低將氧化辞之生長溫度至8〇cc以下,以及縮短 成長時間至2小時以下。 惟以上所述者,僅為本發明之較佳實施例而已,當不 能以此限定本發明實施之範圍,即大凡依本發明申請專利 範圍及發明說明内容所作之簡單的等效變化與修飾,皆仍 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一 FESEM圖,說明本發明方法之一具體例的樣品 編號1所製得之氧化鋅的外觀形態,其中左圖為正面觀察 ,及右圖為側面觀察; 15 ⑧ 1281522 圖2是一 FESEM圖,說明本發明方法之一具體例的樣品 編號2所製得之氧化辞的外觀形態,其中左圖為正面觀察 ,及右圖為側面觀察; 圖3是一 FESEM圖,說明本發明方法之一具體例的樣品 編唬3所製得之氧化辞的外觀形態,其中左圖為正面觀察 ,及右圖為側面觀察; 圖4是一扭8_圖,說明本發明方法之一具體例的樣品 編號4所製得之氧化鋅的外觀形態,其中左圖為正面觀察 ’及右圖為側面觀察; 圖5疋一!?£8_圖,說明本發明方法之一具體例的樣品 編號5所製得之氧化鋅的外觀形態,其中左圖為正面觀: ’及右圖為側面觀察·, 圖6是—feSEM圖’說明本發明方法之一具體例的樣品 編號7所製得之氧化辞的外觀形態,其中左圖為正面觀: ’及右圖為側面觀察; 圖7是—HRTEM圖,說明本發明方法之一具體例的樣 品編號5所製得之氧化鋅里非晶之狀態·, 圖8是-HRTEM圖,說明本發明方法之—具 品編號4所製得之氧化鋅呈單晶之狀態; 幻樣 。圖9是-XRD @,說明本發明方法之—具體例的樣品 編说1至7所製得之氧化鋅的結晶狀態·,及 ’ 圖是-XRD圖,說明本發明方法之一具體例的樣 品編號1所製得之非晶葉片狀氧化鋅於不同回火溫产下之 結晶狀態。 又卜怠 16 1281522 【主要元件符號說明】 無 17In addition, it is worth mentioning that if the amorphous leaf-shaped zinc oxide is converted into an oxidized word in the crystalline phase, the amorphous leaf-shaped zinc oxide sample (sample No. 5, 6 and 7) can be placed. The tempering step is carried out in human oxygen, and the oxidation of the crystalline phase is obtained in about 1 hour. For example, the amorphous leaf-shaped oxidation obtained by the above sample No. 1 (without adding an aqueous solution) is reacted at different tempering temperatures, and then the oxidized oxidized words are subjected to XRD analysis. As shown in the figure, it was found that the highest strength was obtained with a tempering temperature of 3 〇〇〇c. In summary, the method for preparing an oxidized crystal of the present invention is obtained by adding an appropriate amount of an aqueous solution of nitric acid to obtain an oxidized word in a hexagonal columnar crystal, and effectively reducing the growth temperature of the oxidized word to less than 8 〇cc. And shorten the growth time to less than 2 hours. The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an FESEM diagram showing the appearance of zinc oxide prepared in sample No. 1 of a specific example of the method of the present invention, wherein the left side is a front view and the right side is a side view; 8 1281522 FIG. 2 is an FESEM diagram showing the appearance of the oxidized word obtained by the sample No. 2 of one specific example of the method of the present invention, wherein the left side is a front view and the right side is a side view; FIG. 3 is a FESEM BRIEF DESCRIPTION OF THE DRAWINGS FIG. 4 is a perspective view showing the appearance of an oxidized word obtained by the sample editing 3 of a specific example of the method of the present invention, wherein the left side is a front view and the right side is a side view; FIG. 4 is a twisted 8_FIG. The appearance form of zinc oxide prepared in sample No. 4 of a specific example of the invention, wherein the left picture is a front view and the right picture is a side view; Fig. 8 is a view showing the appearance of zinc oxide prepared in sample No. 5 of a specific example of the method of the present invention, wherein the left picture is a front view: 'and the right picture is a side view · Fig. 6 is a -feSEM picture 'Description of the appearance of the oxidized word prepared in sample No. 7 of a specific example of the method of the present invention, wherein the left picture is a front view: 'and the right picture is a side view; FIG. 7 is a -HRTEM chart illustrating the method of the present invention. A specific example of the amorphous state of zinc oxide prepared in sample No. 5, and FIG. 8 is a -HRTEM diagram showing the state of the zinc oxide obtained by the method of the present invention in the single crystal state; kind. Figure 9 is -XRD @, illustrating the crystal state of zinc oxide prepared in Samples 1 to 7 of the method of the present invention - and the figure is -XRD pattern, illustrating a specific example of the method of the present invention. The amorphous leaf-shaped zinc oxide prepared in sample No. 1 was crystallized under different tempering temperature.怠 怠 16 1281522 [Explanation of main component symbols] None 17

Claims (1)

1281522 -、申請專利範圍: :::.:: 一種用於製備氧化鋅晶體之方法 广虚,、· 床’包含之步驟為:將一 反應水溶液與一適量硝酸水溶液一、 合液,將該混合液加熱至適當溫声仃此口,以獲得一混 該混合液中並歷時適當時間,最 其基板放置於 氧化辞晶體,其中,該反應水溶=基板上形成-層 及一六亞甲基四胺水溶液所構成液疋由-硝酸鋅水溶液 2. 3. 6· =申=利範圍第1項所述之用於製備氧化鋅晶體之 ^ ^ ^ ^ ^ ^ °力酉夂辞、六亞甲基四胺 :省之莫耳比例係為1:1:0.05〜…:⑶。 方:申=利範:第入項所述之用於製備氧化鋅晶體之 '/、中,该混合液被加熱至5〇。(^ 75〇c 利範圍第3項所述之用於製備氧化辞晶體之 法,其中,該混合液被加熱至65〇c〜75〇c 3=利範圍第1項所述之用於製備氧化辞晶體之 時法,其中,該基板放置於㈣合液之相為0.5〜2小 2申請專利範圍第&quot;員所述之用於製備氧化鋅晶體之 二’其中,該基板係選自於由下列所構成之群組:n_ 矢+導體基板、m-v族半導體基板及ιν族半導體基 =申請專利範㈣6項所述之用於製備氧化鋅晶體之 '’其中’該基板為砷化鎵基板。 _中請㈣範圍第1項所述之用於製借氧化鋅晶體之1281522 -, the scope of application for patents :::::: A method for preparing zinc oxide crystals, the bed comprises the steps of: combining a reaction aqueous solution with an appropriate amount of aqueous nitric acid solution, The mixture is heated to a suitable temperature to squirt the port to obtain a mixture of the mixture for a suitable period of time, and the substrate is placed on the oxidized crystal, wherein the reaction is water-soluble = a layer is formed on the substrate and a hexamethylene group is formed. The liquid hydrazine composed of the tetraamine aqueous solution is composed of - zinc nitrate aqueous solution 2. 3. 6 · = ???========================================================= Methyltetramine: The molar ratio of the province is 1:1:0.05~...:(3). Fang: Shen = Lifan: In the '/, used to prepare zinc oxide crystals, the mixture was heated to 5 Torr. (^ 75〇c The method for preparing an oxidized crystal according to item 3, wherein the mixture is heated to 65 〇 c 〜 75 〇 c 3 = the range described in item 1 for preparation The method for oxidizing crystals, wherein the substrate is placed in the (four) liquid phase, and the phase is 0.5 to 2 small. 2 Patent Application No. 2, which is used to prepare zinc oxide crystals, wherein the substrate is selected from the group consisting of In the group consisting of: n_vector+conductor substrate, mv group semiconductor substrate, and ιν semiconductor substrate=Application for the invention of the zinc oxide crystal described in the sixth paragraph of claim 4, wherein the substrate is gallium arsenide Substrate. _中中(4) The scope described in item 1 for the production of zinc oxide crystals 18 1281522 該基板放置於該混合液之前,先咳基板清洗步驟是在將 9. 依射請專利範圍帛i項 4行該基板之清洗。 方法’更包含-分離步驟,2用於製備氧化辞晶體之 體與該基板進行分離。 Z刀離步驟是將該氧化鋅晶 10. 依據申請專利範圍第1項 方法,其中,該氧 迷之用於製備氧化鋅晶體之 乳化辞晶體是呈六角柱狀結晶。 1918 1281522 Before the substrate is placed in the mixture, the cough substrate cleaning step is to clean the substrate in accordance with the scope of the patent. The method 'further includes a separation step, and 2 is used to prepare a body of the oxidized crystal and is separated from the substrate. The Z-knife separation step is the zinc oxide crystal 10. According to the method of claim 1, wherein the emulsifier crystal for preparing zinc oxide crystals is a hexagonal columnar crystal. 19
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