TWI274200B - Micro actuator, micro actuator device, optical switch and optical switch array - Google Patents

Micro actuator, micro actuator device, optical switch and optical switch array Download PDF

Info

Publication number
TWI274200B
TWI274200B TW092105761A TW92105761A TWI274200B TW I274200 B TWI274200 B TW I274200B TW 092105761 A TW092105761 A TW 092105761A TW 92105761 A TW92105761 A TW 92105761A TW I274200 B TWI274200 B TW I274200B
Authority
TW
Taiwan
Prior art keywords
movable
electrode
force
voltage
electrostatic force
Prior art date
Application number
TW092105761A
Other languages
Chinese (zh)
Other versions
TW200404174A (en
Inventor
Keiichi Akagawa
Junji Suzuki
Tohru Ishizuya
Yoshihiko Suzuki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/JP2002/009023 external-priority patent/WO2003024864A1/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200404174A publication Critical patent/TW200404174A/en
Application granted granted Critical
Publication of TWI274200B publication Critical patent/TWI274200B/en

Links

Landscapes

  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

A moveable plate 21 is fixed on a substrate 11 via flexible parts 27a and 27b, and capable of moved up and down with respect to the substrate. The substrate 11 is also used as a fixing electrode. The moveable plate 11 includes: second electrodes 23a and 23b capable of generating static electricity between the electrodes and the substrate 11 via the voltage between the electrodes and the substrate 11; and a current path 25 arranged in the magnetic field to generate Lorenz force by applying a current. A reflective mirror 12 to enter and drop out the optical path is arranged in a moveable plate 21. Accordingly, it is able to increase the moveable range of the moveable part and reduce the consumed power without applying high voltage and without influencing miniaturization.

Description

l2742〇〇 狄、發明說明: 【發明所屬之技術領域】 本發明係有關微致動器、微致動器裝置、光開關及光 開關陣列。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a microactuator, a microactuator device, an optical switch, and an optical switch array.

L白知後術J 隨著微機技術之進展,在各領域中,致動器之重要性 曰漸提高。作為使用微致動器領域之一例,例如,有在光 =訊等中用來開關光程之光開關。作為此種光開關之例, 例如,有日本特開平2001_42233號公報所揭示之光開關。 —般而言,微致動器具有固定部、與能以既定之力移 =可動部’用前述既定之力’以使保持在既定位置。至 。「習知之微致動器,大多使用靜電力來作為前述既定之力 所=’日本特開平2剛_42233號公報所揭示之光開關中 :之用來使微反射鏡移動之微致動器,係藉由靜電力 與動部移動到上方位置(微反射鏡反射人射光之位置) 立置(微反射鏡使入射光直接 並保持在該位置。 直接通過入射先之位置), 利用這種靜電力之微致動器 部間施加電厂堅,以在第〗及第2電二= 及弟2電極 午仁疋,河述使用靜電力之習知微致 电力使可動部移動,用靜電力 。。,由於係用靜 擴大可動部之可動範圍。…既定之位置,故不易 作用於平行平板 反之,極間的靜電力n,若使用 !274200 電極間距離 電極面積S的話,則如下 數ε、電位差、 述之(1)式所示 F1- ε XV2xs/(2d2) ···⑴ 心= 式可知’若電極間矩離d變大的話,靜電力F1 ㈣千^反比急遽地變小。因&,若是前述習知之微致 買力杰,虽電極間距離d成為某一 動Μ孩釭 距離以上時,即不易使可 力4移動,不易擴大可動部 極間距離d,相得到充八〇 乾圍。又,若對大的電 心付到充刀之疗電力F1而加大電位差(電極 =I )V的活,則在絕緣耐力之點會產生問題,或必須 有间電壓產生部。又,若對大的電極間距離d,想得到 乂刀之月争包力F1而加大電極面積s的話,則尺寸變大,會 〜备彳政致動器小型化之本來宗旨。 因此,本發明人研究之結果,在微致動器中,構思使 用羅倫茲力來取代靜電力。 设磁通密度為B(T),電線之長度為L(m),電流為 KA),則羅倫兹力F2(N)能用下述之(2)式來表示。 F2= IxBxL ... (2) 在(2)式中’因沒有規定電源位置之項目,故在—定之 磁通密度中,即使電線之位置改變’所產生之羅倫茲力F2 也不變化。 Μ致動中’在可動部設置相當於前述電線之電流路 核’若對該電流路徑施加磁場,使電流流於前述電流路徑 的話,即能使羅倫茲力作用於可動部。即使可動部之可動 範圍較習知廣,對該範圍事先施加大致一樣之磁場,例如 !2742〇〇 藉由磁鐵等之使用’是非常容易的。因此,即使可動部之 可動範圍廣,亦不致受限於可動部 ,^ 丨之位置,而能將一定之 力作用於可動部。亦即,在微致動器 — 來取代靜電力的話’與使用因可動 :羅倫鉍力 靜電力的情形不同的,理論上能使驅動力變化之 得-定之驅動力。 ^了動部之位置無關的獲 例如,若電極間隔為5〇 ,電…,介電率為〗的話,5—方形L Baizhi Houji J With the advancement of microcomputer technology, the importance of actuators in various fields has gradually increased. As an example of the field of using a microactuator, for example, there is an optical switch for switching an optical path in light = signal or the like. An example of such an optical switch is an optical switch disclosed in Japanese Laid-Open Patent Publication No. 2001-42233. In general, the microactuator has a fixed portion and can be moved by a predetermined force = the movable portion ' is held at a predetermined position by the aforementioned predetermined force '. to . "A conventional microactuator uses an electrostatic force as the predetermined force." In the optical switch disclosed in Japanese Laid-Open Patent Publication No. Hei. No. 422332, a microactuator for moving a micromirror , by electrostatic force and movement of the moving part to the upper position (the position of the micro-mirror reflecting the human light) standing (the micro-mirror keeps the incident light directly at this position. Directly through the incident position), using this The electric force is applied between the micro-actuator parts of the electrostatic force, so that in the first and second electric two = and the second electrode of the second pole, the river uses the conventional electric force to move the movable part, using static electricity. Force... Because the static range of the movable part is expanded by static expansion....It is not easy to act on the parallel plate, but the electrostatic force n between the poles. If the distance is 274200, the electrode area S between the electrodes is as follows. ε, potential difference, F1- ε XV2xs/(2d2) (1) of the formula (1) (1) The heart = formula shows that if the moment between electrodes becomes larger than d, the electrostatic force F1 (four) is inversely smaller. Because &, if it is the aforementioned micro-purchasing, When the distance d between the electrodes becomes a certain distance or more, it is difficult to move the force 4, and it is difficult to enlarge the distance d between the movable parts, and the phase is filled with the entanglement. Moreover, if the large electric core is charged If the knives are treated with electric power F1 and the potential difference (electrode = I) V is increased, there is a problem at the point of insulation endurance, or there must be a voltage generating portion. Also, if the distance d between the large electrodes is desired, the boring tool is desired. In the case of the expansion of the force F1 and the increase in the electrode area s, the size of the electrode is increased, and the purpose of miniaturization of the shovel actuator is to be achieved. Therefore, as a result of research by the inventors, in the microactuator, the concept is Use the Lorentz force to replace the electrostatic force. If the magnetic flux density is B(T), the length of the wire is L(m), and the current is KA), then the Lorentz force F2(N) can be used as follows (2) F2= IxBxL (2) In the formula (2), 'there is no item specifying the position of the power supply, so in the magnetic flux density, even if the position of the wire changes', the Lorentz generated The force F2 does not change either. In the Μ actuation, 'the current path nucleus corresponding to the aforementioned wire is set in the movable part'. When a magnetic field is applied to cause a current to flow in the current path, the Lorentz force can be applied to the movable portion. Even if the movable range of the movable portion is relatively wide, a substantially identical magnetic field is applied to the range, for example, 2742 The use of a magnet or the like is very easy. Therefore, even if the movable portion has a wide movable range, it is not limited to the movable portion and the position of the movable portion, and a certain force can be applied to the movable portion. The actuator - in place of the electrostatic force, is different from the case where it is used because it is movable: Loren's electrostatic force is theoretically the driving force that can be changed by the driving force. ^ The position of the moving part is irrelevant. If the electrode spacing is 5 〇, electric..., the dielectric ratio is 〖, then 5-square

Α η ! μ 口 則述(1)式之靜電力FI 為O.lnN。另一方面,若在5〇 ,^ ^ ^ ^ #万形之電極上作成50 # m 長又之電k路徑,施加磁通密度〇 <磁%的話,則當通 Γ :之會產生㈣之羅倫兹力。為了以靜電力 :1?N以上之力’必須將電極間隔設定在7…下,戍 將電極形狀設定在35—方形以上,因此可知欲得到相同 之驅動力,使用羅倫茲力較為有利。 又例如,右將20ππη方形之麵鐵删系磁 致動器之位置的話,能輕易的得到。·π之磁通= 二:所述’在微致動器中’若使用羅倫兹力來取代靜 电力的活,則不必施加高電壓且 可動部之可動範圍。 …型化,而能擴大 不過’發明人發現’若在微致動器中使 取代靜電力的話,目,丨合吝斗虹AA 木 …二懸生新的問題。亦即,當使用羅倫 : 硭電力時,係藉由羅倫兹力使可動部移動到既 定位置’且藉由羅偷兹力將可動部持續保持在該位置。承 上所述,由於係持續通以用來產生羅倫兹力的電流,故,、肖 1274200 耗電力明顯增大。 例如,在大型光開關之應用中,因在一個光開關裝置 中具有數萬個致動器,故強烈要求降低各致動器之消耗電 力。例如’在1 0 0 X 1 0 〇頻道之光開關中,例如,為了選擇 頻道’必須在半導體基板上製作M0S開關。設m〇S開關之 阻抗為1 Ok Ω,則此處持續通以1 mA之電流時,}個M〇s開 關之/肖耗電力為1 〇mf。因此處有1萬個,故合計也有1 之消耗電力,因發熱過大,故在實用上有問題。 【發明内容】 本發明為解決上述問題點,其目的在於,係提供一種 不須施力口冑電壓s不影響小型&,能擴大可動部之可動範 圍並減低消耗電力的微致動器、微致動器裝置、光開關及 光開關陣列。 本發明人進一步研究結果,發現在微致動器中,若作 t能結合利用靜電力與羅倫茲力之構成的肖,即能達成前 邱二。亦即’發現在具有固定部與設置成能相對該固定 口Μ多動之可動部的微致動器 於可動部)分別設置在固定…:Β極根静電力作用 儉兹力作用於可動部)事二置:動部,將電流路徑(使羅 前述目的。 )事“置在可動部的話,即能達成 採用此種方式,例如,當 電極部之距離變大時,可僅以 當可動部之電極部與固定部之 U靜電力來保持可動部。藉此 了動部之電極部與固定部之 羅倫茲力使可動部移動,而 電極部之距離變小時,可僅 不必施加南電廢且不影塑 12^42〇〇 小型:匕’而能擴大可動部之可動範圍,並減低消耗電力。 靜電力驅動,由於筏Φ u 此% ά 、係電乳性進行電容器之充放電,因 生二電力僅在充放電時(亦即,僅在電壓之變化時點)產 頻,務Γ如使用在光開關等之微致動器般,當可動部不 可:邻2可動部保持在既定位置(係固定部之電極部與 ^#^. ± . 隹小之位置)之期間較長時,若僅 ,即能大幅減低消耗㈣: 定位置之力量的話Α η ! μ 口 The electrostatic force FI of the formula (1) is O.lnN. On the other hand, if a 50 # m long electric k-path is formed on the electrode of 5 〇, ^ ^ ^ ^ #万形, and the magnetic flux density 〇 <magnetic % is applied, then when it is passed: (4) The power of Lorentz. In order to use electrostatic force: force of 1 N or more, the electrode spacing must be set at 7..., and the electrode shape is set to 35 or more. Therefore, it is advantageous to use the Lorentz force in order to obtain the same driving force. For example, if the position of the 20ππη square iron is deleted by the magnetic actuator, it can be easily obtained. - π flux = two: If the 'in the microactuator' uses the Lorentz force instead of the static power, it is not necessary to apply a high voltage and the movable range of the movable portion. ...typed, but can be expanded, but the 'inventor found out' that if the electrostatic force is replaced in the micro-actuator, it is a new problem. That is, when Loren: 硭 power is used, the movable portion is moved to a predetermined position by the force of Lorentz and the movable portion is continuously maintained at the position by the sneak force. As mentioned above, since the current used to generate the Lorentz force is continuously passed, the power consumption of the Xiao 1274200 is significantly increased. For example, in the application of a large optical switch, since there are tens of thousands of actuators in one optical switching device, it is strongly required to reduce the power consumption of each actuator. For example, in an optical switch of a channel of 1 0 0 X 1 0 ,, for example, in order to select a channel, it is necessary to fabricate a MOS switch on a semiconductor substrate. Let the impedance of the m〇S switch be 1 Ok Ω, and if the current is 1 mA continuously, the power consumption of the M〇s switch is 1 〇mf. Therefore, there are 10,000, so there is also a total of 1 power consumption. Because the heat is too large, there is a problem in practical use. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object thereof is to provide a microactuator that can increase the movable range of a movable portion and reduce power consumption without affecting a small voltage s without affecting the voltage 胄, Microactuator device, optical switch and optical switch array. The inventors further studied the results and found that in the microactuator, if t can be combined with the use of the electrostatic force and the Lorentz force, the second can be achieved. That is, it is found that the microactuator having the fixed portion and the movable portion that is arranged to be movable with respect to the fixed port is respectively disposed on the fixed portion: the electrostatic force acting on the base of the bungee acts on the movable portion. The second thing: the moving part, the current path (to make the aforementioned purpose.) "If you put it in the movable part, you can achieve this way. For example, when the distance of the electrode part becomes large, it can only be moved. The U electrostatic force of the electrode portion and the fixing portion of the portion holds the movable portion. The Lorentz force of the electrode portion and the fixing portion of the moving portion moves the movable portion, and the distance between the electrode portions becomes small, so that it is not necessary to apply the south portion. The electric waste does not affect the 12^42〇〇 small size: 匕' and can expand the movable range of the movable part and reduce the power consumption. Electrostatic force drive, due to 筏Φ u This % ά, is the charge and discharge of the capacitor Since the secondary power is only generated during charging and discharging (that is, only when the voltage changes), it is used as a microactuator such as an optical switch. When the movable part is not available: the adjacent 2 movable parts are kept at The predetermined position (the electrode part of the fixed part and ^#^. ± . When the period of the small position is long, if it is only, it can greatly reduce the consumption (4): If the power of the position is fixed

,電壓為5V,夫— 丨1如,電極間之電容量為10pF 之消耗電力為:母1分鐘移動可動部1次時’靜電驅動份 靜電驅動份m恭 動益有1萬個時,合計之 可動# t ϋ ^力為4Μ。又,在固定部之電極部與 低且命& $ # 小之位置,即使兩者間之電壓較 丨卫《毛極面積齡穷 ,乍,亦能得到充份大小之靜電力。The voltage is 5V, and the voltage is 10pF. The power consumption is 10pF. The movable #t ϋ ^ force is 4Μ. In addition, in the electrode portion of the fixed portion and the position of the low and the life & $ # small, even if the voltage between the two is relatively weak, the "electrode area is poor, and the electrostatic force can be obtained."

羅偏從力驅動,由於A 之驅動力,因此若以〜:與可動部位置無關的獲得一定 大可動範m 、准两炫力使可動部移動的話,即能擴 的,假設用來選擇頻道J毛電力’例如,與前述例同樣 10kQ, 之早片(on-chiP)M0S開關之阻抗為 ⑴在對該M0S開關备〗八力立 l〇mSec(相當於了舌 1關母1刀知通以1mA之電流 消耗電力為部之移動期間)時,羅倫兹力驅動份之 兹力驅動份之消二。力當 動時之消耗恭士电力為17mW,與前述隨時以羅倫兹力驅 體消耗電力=i〇°w相較’能大幅降低消耗電力。雖然整 沒有大的問題 白被羅偏啟力佔有’但實用上幾乎 10 1274200 如前所述,在微致動器中,搭載使靜電力產生之結構 與使羅倫兹力產生之結構兩者,藉此,例如,以靜電力來 產生將可動部保持在既定位置之力,以減低消耗電力,另 一方面,當可動電極與固定雷托 疋冤極之間隔變大時,以羅倫茲 力來驅動致動器,即能在枷制# 4 ^ 在抑制施加向電壓或電極面積擴大 之同時,擴大可動範圍。 本發明係根據以上說明之太鉻 月之本發日月人研究結果之新構想 而元成者。 亦即’用來達成前述目的之箆 哭广、甘士 的之弟1發明,係一種微致動 : :有固定部、及設置成能相對該固定部移動的可 動部,α)前述固定部具有第i電 女贫〇 + , 刖述可動部呈 =電極部(能藉由與前述第1電極部間之《,在愈前 述弟1電極部之間產生靜電力)、與電流路徑(磁 内藉由通電來產生羅倫茲力)。 在綠场 一用來達成前述目的之第2發明,係前述 丽述可動部係由薄膜構成。 &月中, 本發明中,因可動部係由薄膜形成 型輕量化,減低消# +六 此將可動部小 咸低力。又,因能藉 造可動部,故能降佤制U、士 守版1 ^來製 双月b丨牛低製造成本,並且容易陣列化。 用來達成前述目的之第3發明,係前述第 2發明中,乂、+ t明或第 … _j述電流路徑,係配置成能在使前述可動: 电刀曰大之第1位置的方向產生羅倫兹力。 x明中’因能有效施加使可動部 之位置所需要 ㈣保持可動部 资之、、隹“炫力,故能減低產生羅倫茲 ^消耗 1274200 電力。 用來達成前述目的之箓 前述可動部係設置成能在前":位:前1第3發明中, 或消失之第2位置間移動,…述靜電力降低 置之復原力。 且此產生欲復原至前述第2位 本發明中’因可動部能 故能擴大可動部之可動〜 W電力達不到之位置, 置之際,係用復斥:!/又,當可動部移動到第2位 。 M H故不需要該移動所f之電力 用來達成前述目的之第5 ⑷前述第〗電極部與前述第V極: 述可動部係透仍且古2„ 晃㈣係對向配置,⑻前 部,而使前过#、有每性之彈性部,機械連接於前述固定 第2=動部位於前心 復…::::=::部間之_大,述 :發明中’因可動部能移動到靜電力 故-擴大可動部之可動範圍。 之位置, 置之際,係!4 i & 田T動邛移動到第2位 力。係糟由-原力來移動’故不需要該移動所需之電 2發:t達之第6發明,係前述第1發明或第 藉由與前述第^^具有第3電極部’前述可動部具有 之門“ 間之電壓而能在與前述第3 之間產生靜電力的第4電極部。 书極部 12 1274200 月匕進一步擴大可動部 个势、明中 / ^ /V j S/J ar ^ ^ ^ ^ m ° 、,2來達成前述目的之第7發明,係前述第6發明中, 最用别述第2電極部與前述第4電極部。 w、本泰明中,因構成單純,故能減輕可動部,又因製程 父’故能降低製造成本。 、 7於二達成前述目的之第8發明,係前述第6發明或第 移動至第:前述電流路徑,係配置成能使前述可動部分別 “立置二二置Γ第,置之各方向產生羅偷兹力;該第 前述第3及? &弟2電極部間所產生之靜電力增大且 置,該第2弟4電^部間所產生之靜電力降低或消失的位 力降低或消失且m > 電極邛間所產生之靜電 增大的位置。月以 及第4電極部間所產生之靜電力 本發明中,因能有效施加使 之位置所需之溫/八—+ 史了動°M夕動到保持可動部 力。 力,故能減低產生羅倫兹力之消耗電 用來達成前述目的之第9發 ㈣可動部係設置成能產生欲復片前::迷弟8發明中, 之既定位置之復原力。 设原…1及第2位置間 指 &月中,當可動部移動到既定位詈 设原力來移動,故不需要該移動所需:置之際’因係藉由 用來達成前述目的之第1〇/明而之電力。 (二前述第1電極部係在相對前料重:前述第9發明中, 2兔^部對向配置’ (b)前述第::邛之-側’與前述第 3电極部係在相對前述可動 13 1274200 另一側’與前述第4電極部對向配 係透過具有彈性之 動口p ^4 ’故械連接於前述固定部,當俞Since the driving force of A is driven by the force, if the movable part is moved by a certain large movable mass m and the quasi-dark force is not related to the position of the movable part, it can be expanded, and it is assumed that the channel is selected. J hair power 'For example, the same 10kQ, the impedance of the on-chiP MOS switch of the same example is (1) in the MOS switch, 八力立 l〇mSec (equivalent to the tongue 1 When the current consumption of 1 mA is the moving period of the part, the Lorentz force drives the power of the driver. When the force is consumed, the power consumption of the Congo is 17mW, which can significantly reduce the power consumption when compared with the above-mentioned power consumption of the Lorentz force. Although there is no big problem, it is occupied by Luo’s partial force. 'But practically almost 10 1274200. As mentioned above, in the microactuator, both the structure that generates the electrostatic force and the structure that generates the Lorentz force are mounted. Thereby, for example, a force for holding the movable portion at a predetermined position is generated by an electrostatic force to reduce power consumption, and on the other hand, when the distance between the movable electrode and the fixed Leito bungee becomes large, Lorenz is used. Force to drive the actuator, that is, can increase the movable range while suppressing the application of the voltage or the electrode area. The present invention is based on the above-described new concept of the results of the research on the date of the moon. That is, the invention of the brother-in-law who is used to achieve the above-mentioned purpose, is a micro-actuation: a fixed portion, and a movable portion that is arranged to be movable relative to the fixed portion, α) the aforementioned fixed portion The i-th power female inferior +, the description of the movable portion is the = electrode portion (between the first electrode portion, "the electrostatic force is generated between the first electrode portion"), and the current path (magnetic Internally, the power is used to generate the Lorentz force). In the green field, a second invention for achieving the above object is characterized in that the movable portion is formed of a film. In the present invention, in the present invention, since the movable portion is lightened by the thin film formation type, the lower portion of the movable portion is reduced to a small amount. Moreover, since the movable part can be borrowed, it is possible to reduce the manufacturing cost of the U, the defensive version, and the manufacturing cost of the bimonthly b yak, and it is easy to array. According to a third aspect of the present invention, in the second aspect of the invention, the current path of the 乂, + t, or _j is arranged so as to be generated in a direction in which the first position of the movable: electric blade is large. Lorenz force. x Mingzhong 'Because it can effectively apply the position of the movable part (4) to maintain the movable part, and 隹 "shame force, it can reduce the generation of Lorenz ^ consumption of 1274200 power. The above-mentioned movable part is used to achieve the above purpose. It is configured to be able to move between the first position and the third position of the first invention, or to disappear between the second position, and the electrostatic force is lowered to restore the restoring force. 'Because the movable part can expand the movable part's movable position~W power can't reach the position, and the repulsion is used:!/ Also, when the movable part moves to the second position. MH does not need the mobile station. The electric power of f is used to achieve the above-mentioned purpose (5), the first electrode portion and the fourth V pole: the movable portion is still transparent, and the ancient 2⁄4 (4) is arranged in the opposite direction, and (8) the front portion, and the front is over #, There is a flexible part of each nature, mechanically connected to the fixed second = moving part is located in the front of the heart ...::::=:: between the _ large, said: in the invention 'because the movable part can move to electrostatic force - Expand the movable range of the movable part. The location, set, the system! 4 i & Tian T moves to the 2nd force. The system is moved by the original force. Therefore, the second invention is not required for the movement. The sixth invention of the first invention or the first invention has the third electrode portion The fourth electrode portion which has a voltage between the gate and the electrostatic force between the third and the third. The book portion 12 1274200 further expands the potential of the movable portion, and the middle / ^ /V j S/J In the seventh invention of the sixth aspect of the invention, the second electrode portion and the fourth electrode portion are the most widely used, and in the present invention, the composition is simple. Therefore, the movable portion can be lightened, and the manufacturing cost can be reduced by the process father. The eighth invention that achieves the above object is the sixth invention or the first to the second current path that is configured to enable The movable portion is respectively "positioned on the second and second sides, and the sneak force is generated in each direction; the third and third The electrostatic force generated between the electrode portions of the & 2 is increased and the positional force of the electrostatic force generated between the second and fourth electrodes is reduced or disappeared, and m > The position where the static electricity is increased. Electrostatic force generated between the month and the fourth electrode portion In the present invention, since the temperature required for the position can be effectively applied, the movable portion is maintained. The force can reduce the power consumption of the Lorentz force. The ninth issue is used to achieve the above-mentioned purpose. (4) The movable part is set to generate the resilience of the predetermined position in the invention: In the middle of the first... and the second position between the middle and the middle of the month, when the movable part moves to the position and the original force is moved, the movement is not required: the reason is used to achieve the above purpose. The first 〇 / Ming power. (2) The first electrode portion is in the relative front weight: in the ninth invention, the second rabbit portion is disposed in the opposite direction (b) the front side: the side portion is opposite to the third electrode portion. The other side of the movable 13 1274200 is connected to the fixed portion of the fourth electrode portion opposite to the fourth electrode portion through a flexible opening p ^ 4 '

4可動部位於前述 田月'J 間之第Μ隔變小,且It :使前述第1及第2電極部 間^大’當前述可動部位 ” 1間隔變大,前述第2間隔變小。…置日…逃第 本發明中,當可動 復原力來移動,故也不二多:定位置之際,因亦藉由 而要5亥移動所需之電力。 1成前述目的之第u發明 ,其特徵在於,具備: 低彳成双勡為裝置 微致動器、,係前述帛j發 致動器; ^明中之任一個微 磁場產生部,係產生前述磁場;以及 控制部,其係控制前述第】 前述電流路徑所流之電流。 “極部間之電壓及 本發明中,因能控制羅倫兹力 ,故能用適當之條件來驅動微致動器。 產生之時序 用來達成前述目的之第】2 ,⑷前述控制部在前述可動部㈣到:前:第】】發明中. 係藉由前述羅倫兹力或前 4】位置之際, 制前述電壓及前述電流以使前靜電力,來控 置,⑻前述控制部在將前述可動部保 到剧述第】位 至少穩定保持狀態τ,藉 ㈤迷第J位置之 ,以使前述可動部保持在前述f來控制前述電塵 置,且進行控制以使 14 1274200 前述電流不流動。 1位置之際,需要用 可動部保持在第1位 需要之消耗電力。 係一種微致動器裝置 本發明中,僅在可動部移動到第 來產生羅倫茲力之電力,由於為了將 置’僅利用靜電力,故能減低保持所 用來達成前述目的之第13發明, ’其特徵在於,具備·· 則述第6發明到第1〇發明 磁場產生邻... ^ 一個微致動器; 每屋生邻,係產生前述磁場;以及 控制部,係控制前述第丨 述第 電流 〇 n ^ 弟2電極部間之雷厭 3及第4電極部間之電 ’之電屋、 。 以及流於前述電流路徑 -扣炫剌維偷茲力之士 ,故能用適當之條件來驅動微致動器。所產生之時序 用來達成前述目的之第14 ,⑷前述控制部使前述可動部J :二边第13發明中 係藉由前述羅倫茲 ㈤述弟“立置之際, 弟2電極部間之前述靜電力,來 及則述第1及 部間之電壓、前述“弟1及第2電極 命、古妨 ^ d及弟4電極部間之畲颅 电^路徑所流之電流, ^ ^、以及前述 置,⑻前述控制部 ^了動部移動到前述第1位 際,藉由前述羅吏則述可動部移動到前述第2位置之 4 阳紋力,或糟由前述羅倫茲力+ 及弟4電極部間之前述靜電力, 二力“述第3 極部間之電壓、前 月J述弟1及第2電 狄乂丄 及弟4電極部 於前述電流路徑之、、,电f丨間之電壓、以及流 以使則述可動部移動到前述第2 15 1274200 别述控制部在 之至少穩定保持狀態下,藉由^可動部保持在前述第1位置 前述靜電力,來控制前述二:第弟1及第2電極部間之 第3及第4電極部間之兩〃、苐2電極部間之電遷以及 第1位置,且,以使前述可動部保持在前述 且進仃控制以使前诂 ^ 態下,藉由前述第3及第 :至少穩定保持狀 制前述第1盥$ 2 “ σ卩間之前述靜電力,來控 間之電壓,以使前、f ^及弟3與弟4電極部(4) The movable portion is located at the second space between the said Tianyue 'J, and is: and the ratio between the first and second electrode portions is increased as the distance between the first and second electrode portions is increased, and the second interval is decreased. ...Setting the day... In the present invention, when the movable restoring force is moved, it is not so much: when the position is fixed, the power required for the movement of 5 sets is also required. The present invention is characterized in that: the low-twisting double-turn is a device micro-actuator, and the first-order micro-magnetic actuator is generated; any one of the micro-magnetic field generating units generates the magnetic field; and a control unit The current flowing in the current path is controlled. The voltage between the poles and the present invention can control the Lorentz force, so that the microactuator can be driven under appropriate conditions. The timing of the generation is used to achieve the above-mentioned purpose. 2, (4) The control unit is in the movable portion (four) to: before: the invention], by the aforementioned Lorentz force or the first 4] position, The voltage and the current are controlled by the pre-static force. (8) The control unit maintains the movable portion at least in a stable position τ, and (5) the J position, so that the movable portion is held. The aforementioned electric dust is controlled in the above f, and control is performed so that the current of 14 1274200 does not flow. At the 1st position, it is necessary to use the movable part to maintain the power consumption required in the first place. In the present invention, only the movable portion is moved to the power for generating the Lorentz force first, and the third invention for achieving the aforementioned purpose can be reduced in order to reduce the use of only the electrostatic force. "It is characterized by the fact that the magnetic field is generated by the sixth invention to the first invention. ^ A microactuator; each of the neighbors generates a magnetic field; and the control unit controls the foregoing The electric current house of the first electric current 〇n ^ brother 2 between the electrode portion and the fourth electrode portion. As well as flowing through the aforementioned current path - the buckle is difficult to drive the microactuator with appropriate conditions. The generated timing is used to achieve the above-mentioned purpose. (14) The control unit causes the movable portion J to be in the thirteenth aspect of the present invention, in the third invention by the aforementioned Lorentz (five), the second electrode portion The electrostatic force is the current between the first and the second, and the current flowing through the sacral circuit between the first and second electrodes, the ancient electrode, and the fourth electrode. ^ ^ And (8) the control unit moves to the first position, and the moiré moves to the fourth position of the fourth position by the movable portion, or the aforementioned Lorentz force + The electrostatic force between the four electrode parts, the second force "the voltage between the third poles, the previous month, the first brother, the second electric dike, and the fourth electrode, in the current path, And a flow between the voltage and the flow to move the movable portion to the second 15 1274200, wherein the control unit is at least stably held, and the movable portion holds the electrostatic force at the first position to control The second two: between the third and fourth electrode portions between the first brother and the second electrode portion, between the two electrodes and the second electrode portion And moving the first position, and maintaining the movable portion in the above-described manner and controlling the first state to be in the front state, and forming the first 盥$2" σ卩 by the third and third at least stable holding states The aforementioned electrostatic force, to control the voltage, so that the front, f ^ and brother 3 and brother 4 electrode

控制以使前述電流不流動。 』…位置,且進行 :發明中’僅在將可動部移動到要 用來產生羅倫兹力之電力而要 电刀為了將可動部保持在第1位置 ,’、利用靜電力’故能減低保持所需要之消耗電力。 ㈣h述目的之第15發明’係-種光開關,其特 被在於,具備·· 丽述第1發明到第1〇發明中任—個微致動器;以及 反射鏡,係設置在前述可動部。 _ 用來達成前述目的之第16發明,係一種光開關陣列, /、特斂在於,具有複數個前述第15發明之光開關,該複 數個光開關係配置成2維狀。 用來達成前述目的之第1 7發明,係前述第1 6發明中 備有電路,該電路係包含複數個開關元件,其係應答前述 複數個光開關各行之行選擇訊號及前述複數個光開關各列 之歹]擇讯號’對所選擇之行及列之光開關,進行前述電 16 1274200 流及前述電壓之控制。 【實施方式】 以下,參照圖式說明本發明實施形態例之微致動器、 及使用微致動器之微致動器裝置、光開關及光開關陣列。 [第1實施形態] 第1圖,係顯示具備本發明第丨實施形態之光開關陣 列1之光開關系統例的概略構成圖。為了便於說明,如第 i圖所示,定義彼此正交之χ軸、γ車由、Z轴(關於後述之 圖也是同樣)。光開關陣列i之基板u之面與)^平面平行_ 。又’為了便於說明,z車由方向之+側稱為上側,z轴^ 向之一側稱為下側。 此光開關系統’如第i圖所示,具備:光開關陣列 、M條光輸人用光.纖2、M條光輸出用光纖3、N條光輸 用光纖4、磁鐵5(係對光開關陣列1,如後述,作為2 磁场之磁场產生部)、及外部控制電㉟6(係應答光程切 狀:態指令訊號’將控制訊號(係用來實現表示該光程切:Control is such that the aforementioned current does not flow. 』...Location, and proceeding: In the invention, 'only the moving part is moved to the power to generate the Lorentz force, and the electric knife is required to keep the movable part in the first position, 'use the electrostatic force', so that it can be reduced Maintain the required power consumption. (4) The fifteenth invention of the present invention is characterized in that: the micro-actuator of the first invention to the first invention is provided, and the mirror is provided in the movable body. unit. The 16th invention for achieving the above object is an optical switch array, and the optical switch of the above-described 15th invention is characterized in that the plurality of optical opening relationships are arranged in a two-dimensional shape. According to a seventh aspect of the present invention, in the first aspect of the invention, there is provided a circuit comprising: a plurality of switching elements responsive to a row selection signal of each of the plurality of optical switches and the plurality of optical switches After each column] selects the signal 'for the selected row and column of the optical switch, the above-mentioned electric 16 1274200 flow and the aforementioned voltage control. [Embodiment] Hereinafter, a microactuator according to an embodiment of the present invention, a microactuator device using the microactuator, an optical switch, and an optical switch array will be described with reference to the drawings. [First Embodiment] Fig. 1 is a schematic block diagram showing an example of an optical switch system including an optical switch array 1 according to a first embodiment of the present invention. For convenience of explanation, as shown in Fig. i, the x-axis, the gamma car, and the Z-axis which are orthogonal to each other are defined (the same applies to the drawings to be described later). The surface of the substrate u of the optical switch array i is parallel to the ^ plane. Further, for convenience of explanation, the side of the z-vehicle is referred to as the upper side, and the side of the z-axis is referred to as the lower side. As shown in the first diagram, the optical switch system includes: an optical switch array, M light input light fibers, 2 optical output optical fibers 3, N optical fibers 4, and magnets 5 (pairs) The optical switch array 1 as a magnetic field generating unit of the two magnetic fields will be described later, and the external control circuit 356 (the response light path cut: state command signal) will control the signal (which is used to implement the optical path cut:

=指令訊號之光程切換狀態)供應給光開關陣列…= optical path switching state of the command signal) supplied to the optical switch array...

第1圖所示之例中,雖M 意數。 雖M~3, N=3,但Μ及N也可分別是彳 之+側著磁在N極、一制荃并 要如1 側者磁在S極之板狀永久磁鐵,~ 置在光„㈣U 彡鐵’配 私- 對先開關陣列1產生磁力矯ς 所不之磁場。亦即,成钟c〆 及王茲刀線5a 白,心, 磁鐵5係對光開關陣列1,沿Y轴方 向,向該一側產生大致均 軸方 J之磁场。又,作為磁場產生部 17 1274200 ’例如’也可使用具有其他形狀之永久磁鐵或電磁鐵等來 取代磁鐵5。In the example shown in Fig. 1, M means number. Although M~3, N=3, but Μ and N can also be 彳 + 侧 侧 侧 侧 侧 侧 侧 侧 侧 + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + „(四)U 彡铁' 私私--The magnetic field of the first switch array 1 is magnetically deformed. That is, the clock is c〆 and the Wangz knife line 5a white, the heart, the magnet 5 is the optical switch array 1, along the Y In the axial direction, a magnetic field having a substantially uniform axis J is generated on the one side. Further, as the magnetic field generating portion 17 1274200 'for example, a permanent magnet or an electromagnet having another shape may be used instead of the magnet 5.

光開關陣列1,如第1圖所示,具備基板11與配置在 基板11上之ΜχΝ個反射鏡12。Μ條光輸入用光纖2係配置 在與ΧΥ平面平行之面内,以相對基板η之X軸方向之一 側’將入射光導入X軸方向。Μ條光輸出用光纖3,係以分 別對向於Μ條光輸入用光纖2之方式配置在基板11之另一 側’且係配置在與χγ平面平行之面内,以使行進於X軸方 向之光(不會被光開關陣列丨之任一個反射鏡12反射)射入 。Ν條光輸出用光纖4,係配置在與χγ平面平行之面内, 藉由光開關陣列1之任一個反射鏡丨2來反射,以使行進於 Υ、軸方向之光射入。ΜχΝ個反射鏡12,係以能分別藉由後 述之U致動為’於ζ轴方向直線移動而能進出及退出Μ條 光輸入用光纖2之射出光程與光輸出用光纖4之入射光程 之又又點的方式’ 2維矩陣狀配置在基板11上。又,本例 中反射鏡1 2之面向,係設定成其法線在與χγ平面平行As shown in Fig. 1, the optical switch array 1 includes a substrate 11 and a plurality of mirrors 12 disposed on the substrate 11. The beam light input optical fiber 2 is disposed in a plane parallel to the pupil plane, and the incident light is introduced into the X-axis direction with respect to one side of the X-axis direction of the substrate η. The beam light output optical fiber 3 is disposed on the other side of the substrate 11 so as to be opposed to the beam light input optical fiber 2, and is disposed in a plane parallel to the χγ plane so as to travel on the X axis. The direction light (which is not reflected by any of the mirrors 12 of the optical switch array) is incident. The beam light output optical fiber 4 is disposed in a plane parallel to the χγ plane, and is reflected by any one of the mirror switches 2 of the optical switch array 1 so that light traveling in the Υ and the axial direction is incident. Each of the mirrors 12 is capable of moving in and out of the optical path of the optical fiber 2 and the incident light of the optical fiber 4 by the U actuation which is described later as a linear movement in the x-axis direction. The method of the point is again arranged in a two-dimensional matrix on the substrate 11. Moreover, in this example, the face of the mirror 12 is set such that its normal is parallel to the χγ plane.

之面内,與X軸成45。 0 角。又,該角度也能適當加以變更 ’ §變更反射鏡12 ^ 之角度日守,視該角度來設定光輸出用 光纖4之面向即可。 ^ 人’此例中,驅動反射鏡1 2之機構係 m致動器。 此光開關系統之光 關之光程開關原理相:開關原理本身,婦2維光開 其次,針對第丨_ ώ ? 個光開關之構造,*日卜之光開關陣列1之單位元件之— ^弟2圖〜第5圖加以說明。第2圖 18 1274200 係線示一個光開關之概略俯視圖。第3圖係沿 σ ^ Ζ圖中之 X1 — Χ2線之概略截面圖。第4圖係沿第2圖中之 線之概略截面圖。第5圖係對應第3圖之概 1 Υ2 -Γ- Λ , 势*面圖,晶苜 不將反射鏡12保持在下側之狀態。又,第3圖係 ”、、、 射鏡12保持在上側之狀態。 “、丁:反 此光開關除具有前述反射鏡12及作為固定部之前乂 板υ外,亦具備設置成能相對基板u移動作為可= 可動板21。在基板u中,形成有作為可動板μ之進入區 域的凹部13。本實施形態,係使用石夕基板等半導體基板: 作為基板與基板n巾之可動板21對向部份構成為第 1電極部。當然,也可與基板u不同的,在基板u上以 金屬膜等來形成第1電極部。 、可動板21,係由薄膜構成,具有:下側絕緣膜22,形 成在下側絕緣膜22上之2個第2電極部(23a、23b),用^ :7成在下側絕緣膜22之電極部(23a、23b)分別電氣連接 在基板11之既定處的部分配線圖案(24a、24b),形成在下 側絕緣膜22上、配置在第1圖中以磁鐵5所產生之磁場内 乍$藉由通電而產生羅倫茲力之電流路徑的線圈層25,及 覆盍在該等之上側的上側絕緣膜26。第2電極部(23a、 ^3b)係藉由與構成前述第1電極部之基板11間之電壓,而 能在與基板Π之間產生靜電力。 作為絕緣膜(22、26),例如,能使用siN膜或Si02膜 為電極部(23a、23b)、配線圖案(24a、24b)及線圈 層 2 $,/ ϊ 如’此使用A1膜等金屬膜等。又,由於電極部 19 1274200 (23a、23b)、部分配線圖案(24a、24b)、及線圈層25被上 側絕緣層26所覆蓋,因此,第2圖中原本應以虛線,但為 了便於圖示,被上側絕緣膜26所遮蔽之部份亦以實線顯 示。但是,被線圈層2 5之反射鏡12遮蔽之部份,則以虛 線顯示。 本實施形態中,可動板21之X軸方向兩端部係透過撓 曲部(27a、27b)(作為具有彈性之彈性部)、銷部(2、 28b),以此順序機械性連接在基板π之凹部13之周邊部 。撓曲部(27a、27b)及錨部(28a、28b)係由下側絕緣膜 22(從可動板21直接連續延伸)、前述配線圖案(24a、24b) 之其他部份、配線圖案(29a、29b)(將線圈層25分別電氣 連接在基板11之既定處)、及上側絕緣膜26所構成。又 ,配線圖案(29a、29b)係構成線圈層25之金屬膜等直接連 續延伸而成者。配線圖案(24a、24b、29a、29b),係在錨 部(28a、28b)中,透過形成在下側絕緣臈22之孔(未圖/) ’分別電氣連接在基板u之既定處。配線圖案(24&、2⑹ 係藉由形成在基板U之配線(未圖示),連接成電氣共通。 扰曲4 (27a 27b),如第2圖所示,俯視呈幫曲之形 狀。^此,可動板21能上下(z轴方向)移動。亦即,本實 =了中’當靜電力及羅倫兹力對可動板Η纟作 由挽曲部(27a、27b)之彈力(復原力),而在 動复=上側位置(第2位置)(參照第3圖及第4圖)、與可 γ 4人基板11之凹部13並抵接在其底部之下側位置 (弟1位置)(參照第5圖)間移動。在第3圖及第4圖所示 20 1274200 之上側位置,可動板21之第2電極部(23a、23b)與作為第 1電極部之基板11之間隔變大,兩者間所產生之靜電力降 低或消失。在第5圖所示之下側位置,可動板21之第2電 極部(23a、23b)與作為第1電極部之基板11之間隔變窄, 兩者間所產生之靜電力增大。 線圈層2 5 ’係配置成能在將可動板21移動至前述靜 電力增大之第5圖所示之下側位置的方向(下方向)產生羅 倫茲力。具體而言’本實施形態中,如前所述,由於係藉 由第1圖中之磁鐵5,產生沿γ軸方向朝向其〜側之磁場 ’故線圈層25係如第1圖所示,配置成延伸於X軸方向。 反射鏡12,係直立固定在可動板21上面。如前所述 ’反射鏡12之反射面方向,係設定成在其法線與χγ平面 平行之面内與X軸形成45°角。 前述光開關構造中’係藉由反射鏡12以外之構成要件 來構成驅動反射鏡12之微致動器。 用電壓」)、以及該光開關之反射鏡12之位置(即可動板 21之位置)’三者間隨時間變化之關係的時序圖。 -開始,羅倫兹力用電流為零,且靜電力用電壓為零 其次,著眼在1個光開關,針對其控制方法之一例及 藉由該控制方法之光開關之動作,參照第6圖加以說明。 第6圖,係顯示流經1個光開關之線圈層25以引起羅倫茲 力之電流(以下,稱為「羅倫茲力用電流」)、在該光開關 之第1電極部(基板11)與可動板21之第2電極部(2如、 23b)之間引起靜電力之兩者間之電壓(以下,稱為「靜電力 21 1274200 1由撓曲部ma、27b)之彈力,反射鏡12係如第3圖及 弟4圖所示的被保持在上側位置。此狀態下,如第3圖所 不,入射光係被反射鏡12反射而行進到紙面前側。 之後’在時間丁 1,開如用 Ί始用以將反射鏡12之位置開關 !弟5圖所示之下側位置的控制。亦即,在時間71,羅倫 力用电机係6又為+ I。此處,+ J係在線圈層Μ,產生較 撓曲部(27a、27b)之彈力強日Α π 〜之弹力強且向下之羅倫茲力之電流。 反射鏡1 2,因此n於找+ I γ Α 、准“效力而逐漸下降,在可動板21 立:在基板11之時間Τ2停止’保持在第5圖所示之下側 位置。 然而,並非藉由羅倫兹力將反射鏡12持續保持在下側 :置,而是在時間Τ3,將靜電力用電遂設為V後,在時間 Τ4 ’使羅倫兹力用電流為零。此處,ν係至少反射鏡 下側位置時’產生較撓曲部(27a、27b)之彈力強 二電壓。期…3’反射鏡12係僅藉 持在下側位置’期,”3—T4,係藉由羅倫兹力及二保 將反射鏡12保持在下側位置,至於日㈣π以後: 靜電力,將反射鏡12保持在下側位置。期間了错由 將反射鏡12在下側位置之保持從羅倫兹力 電 ’所謂的下側保持之過渡期間,期間Τ4以 二 的下側保持之穩定期間。 于、所6月 反射鏡12被保持在下側位置之期間,如第$ _ 入射光不被反射鏡12反射,係直接通過成為射所不’ 之後,在時間Τ5,開始將反射鏡。 心议置開關為第3 22 Ϊ274200 圖及第4圖所示上側位置的控制。^卩,在_τ5,㈣ 電力用電壓設定為零。其結果,反射鏡12藉由撓曲部(❿ 二2?b)之彈力,較為急遽地回到第3圖及第4圖所示之上 側位置,藉由該彈力持續保持在上側位置。 如前所述,當可動板21之第2電極部23a、23b盘基 板11(第1電極部)間之間隔大時,藉由其大小不依存於反 射9鏡12位置(可動板21之位置)的羅倫兹力,抵抗撓曲部 (仏、⑽之彈力使反射鏡12移動到下侧位置。因此,不 需要為了提高靜電力而施加高電壓、或影響小型化,即能 :廣大可動板21之可動範圍。又,在可動板21之第2電極 邛(23a、23b)與基板1!(第}電極部)間之間隔變小之下側 位置之保持穩定狀態,由於僅藉由靜電力來將反射鏡U 保持在下側位置,故能減低消耗電力。 又’前述例中,時間盘M 日日 ^ 了] 1Z與日守間T4間之時間T3,係將 靜電力用電壓設定在V,但在期U — T4之任—時點,皆 可將靜電用電壓設定在V,亦可在時間T1之前,將靜電力 用電壓設定在V。又,當可動板21位於上側位置時,若將 靜電力用電壓設定纟v時所產生之靜電力較撓曲部(27a、 27b)之彈力小的話,則在相T5後,可動板21移動到上 側位置後’在上側保持期間將靜電力用電壓以在v亦可 。後述弟8圖例之右側的電壓更新(refresh)期間,即相 於這種情形。 第1圖所示之光開關陣列1,具有複數個作為前述單 位元件之第2圖〜箆, 弟5圖所示之光開關,此等光開關係配 23 1274200 置成2、准矩陣狀。又’第】圖所示之光開關陣列1中,為 、子此等各個光開關,能以少條數之控制線來實現前述控 制,搭載了帛7 ® (包含複數個開關元件)所*之電路。第 7圖係顯示光開關陣列1之電路圖。 第7圖中’為簡化說明’將9個光開關配置成3行3 列。當然,其數量無任何限定,例如,具有1〇〇行1〇〇列 之光開關時,其原理也相同。 第2圖〜第5圖所示之單一光開關,在電路上,可視 為1個f容器(相當於並聯第2電極23a與第i電極(基板 Π)所形成之電容器、及第2電極23b與第i電極(基板 11)所形成之電容器的合成電容器)與丨個線圈(相當於線圈 層25)。第7圖巾,分別以Cmn及Lmn來顯示m行n列之 光開關之電容器及線圈。例如,分別以cu及Lu來表示 第7圖中左上之(1行1列之)光開關之電容器及線圈。 為了減少控制線之條數,第7圖所示之電路中,對電 容器Cmn及線圈Lmn,分別設置列選擇開關(Mmnb、M㈣d) 與行選擇開關(Mmna、Mmnc)。電容器Cmn之一端係連接在 行選擇開關Mnrna之一端,行選擇開關Mmna之另一端係連 接在列選擇開關Mmnb之一端,列選擇開關Mmnb之另一端 則連接在電壓控制開關MCI之一端及MC2之一端。電容哭 Cmn之另一端接地。電壓控制開關MC1之另一端連接在箝 位電壓VC,電壓控制開關MC2之另一端則接地。 又,線圈Lmn之一端係連接在行選擇開關Mmnc之一端 ,行選擇開關Mmnc之另一端係連接在列選擇開關Mmnd之 24 1274200 一端,列選擇開關Mmnd之另一端係連接在電流控制開關 MC3之一端。線圈Lmn之另一端接地。電流控制開關此3 之另一端係連接在電源流n (供應前述電流+丨)之一端, 電流源11之另一端則接地。 作為開關元件之列選擇開關(Mmnb、Mmnd)、行選擇開 關(Mmna、Mmnc)、電壓控制開關(MC1、MC2)及電流控制開 關MC3,例如,當使用矽基板來作為基板n時,能用基板 11所形成之N型M0S電晶體來構成。 第 1 行之行選擇開關(Mila、Mile、Ml2a、Ml2c、Ml3a 、Ml 3c)之閘極係連接在端子n。同樣地,第2行之行選 擇開關之閘極係連接在V2,第3行之行選擇開關之問極係 連接在V3。 第 1 列之列選擇開關(Mllb、Mild、M21b、M21d、M31b 、M31d)之閘極係連接在端子H1。㈣地,帛2列之列選 擇開關之閘極係連接在H2,第3狀列選_關之閘極係 連接在H3。 其次,於第8圖中顯示施加至各端子⑺、V2、v3、们 、H2、H3、Cl、C2、C3)之電壓時序圖之一例)。帛8圖中 ’時間tl以前’係將所有光開關之電容器^偏麼在箱位 電麼VC之電壓更新期間。因此,在該期間,端子⑺、V2 V3 H1 :H:、H3)全部為高位準’所有列選擇開關(Μ— 、_ )及订選擇開關(Mmna、Mmnc)成為導通狀態。又, = Π係高位準’端子C2係低位準,控制 開關们“通狀態,電虔控制開關Μ(:2成為不導通狀態 25 1274200 。而且’為子C3成為低位準’電流控制開關mc成為不導 通狀態。在電Μ更新期間,反㈣12係保持在上側位置 及下側位置之任一位置。至於第8圖之例,在時間tl以前 之電麼更新期間,反射鏡12係保持在下側位置。 又,本貫施形態中,施加至端子⑺、V2、V3、H1、H2 、H3、C卜C2、C3)之訊號(電壓)係從第i圖中之外部控制 電路6以控制訊號之形式供應。外部控制電路6,例如, 锊根據光轾切換狀態指令訊號,檢視應從現在位置狀能變 ^之光開M,就該應變更之每1個光開關,依序i _設 定狀態變更期間。芒、力亡處W , 士 右/又有應從現在位置狀態變更之光開關 曰"ΐ ’即设定前述電單爭專 更期間時(也就是二 定複數個狀態變 况,應從現在位置狀態變更之光開關數 為 2個以上時),a 也了在各狀態變更期間之間,設定電厣 也可不設定電壓更新期間。例如,應從現在二 、帝=更之光開關數為3個以上時,可設定狀態變更期 私£更新期間—狀態變更期間—電壓更新期間—狀態 文期間,亦可連續設定狀態變更期間。此外,在所設定 之各狀態變更期鬥In the plane, it is 45 with the X axis. 0 angle. Further, the angle can be appropriately changed. § The angle of the mirror 12 ^ is changed, and the direction of the optical fiber 4 for light output can be set depending on the angle. ^ Person In this example, the mechanism that drives the mirror 12 is an m actuator. The principle of the optical path switch of the optical switch system is as follows: the principle of the switch itself, the second dimension of the woman is the second, for the construction of the first 丨 ώ 个 个 个 个 个 个 个 个 个 个 个 个 个 单位 单位 单位 单位 单位 ^ ^ ^ ^ ^ ^ ^ ^ ~ Figure 5 to illustrate. Figure 2 18 The 1274200 line shows a schematic top view of an optical switch. Figure 3 is a schematic cross-sectional view along the line X1 - Χ2 in the σ ^ Ζ diagram. Figure 4 is a schematic cross-sectional view along the line in Figure 2. Fig. 5 is a view corresponding to Fig. 3 Υ 2 - Γ - Λ , potential * surface, the crystal 苜 does not hold the mirror 12 in the lower side. Further, the third diagram is a state in which the mirror 12 is held on the upper side. ", D: In addition to the mirror 12 and the front panel as the fixing portion, the optical switch is also provided to be capable of opposing the substrate. u moves as a movable plate 21. In the substrate u, a concave portion 13 as an entry region of the movable plate μ is formed. In the present embodiment, a semiconductor substrate such as a stone substrate is used. The substrate is formed as a first electrode portion opposite to the movable plate 21 of the substrate n. Of course, unlike the substrate u, the first electrode portion may be formed of a metal film or the like on the substrate u. The movable plate 21 is made of a thin film and has a lower insulating film 22, two second electrode portions (23a, 23b) formed on the lower insulating film 22, and electrodes formed on the lower insulating film 22 by ^:7. The portions (23a, 23b) are electrically connected to the predetermined portion of the wiring pattern (24a, 24b) of the substrate 11, respectively, and are formed on the lower insulating film 22, and are placed in the magnetic field generated by the magnet 5 in the first drawing. A coil layer 25 that generates a current path of the Lorentz force by energization, and an upper insulating film 26 that covers the upper side. The second electrode portion (23a, ^3b) generates an electrostatic force between the substrate and the substrate by a voltage between the substrate 11 constituting the first electrode portion. As the insulating film (22, 26), for example, a SiN film or a SiO 2 film can be used as the electrode portions (23a, 23b), wiring patterns (24a, 24b), and a coil layer 2 $, /, for example, "this uses a metal such as an A1 film. Membrane and the like. Further, since the electrode portions 19 1274200 (23a, 23b), the partial wiring patterns (24a, 24b), and the coil layer 25 are covered by the upper insulating layer 26, the second drawing should be a broken line, but for convenience of illustration The portion covered by the upper insulating film 26 is also shown by a solid line. However, the portion that is shielded by the mirror 12 of the coil layer 25 is shown as a dashed line. In the present embodiment, both ends in the X-axis direction of the movable plate 21 are transmitted through the flexure portions (27a, 27b) (as elastic portions having elasticity) and the pin portions (2, 28b), and are mechanically connected to the substrate in this order. The peripheral portion of the concave portion 13 of π. The flexures (27a, 27b) and the anchor portions (28a, 28b) are composed of a lower insulating film 22 (continuously extending directly from the movable plate 21), other portions of the wiring patterns (24a, 24b), and wiring patterns (29a). And 29b) (each of the coil layers 25 is electrically connected to a predetermined portion of the substrate 11) and the upper insulating film 26. Further, the wiring patterns (29a, 29b) are formed by directly extending a metal film or the like constituting the coil layer 25. The wiring patterns (24a, 24b, 29a, 29b) are electrically connected to the predetermined portions of the substrate u through the holes (not shown) which are formed in the lower insulating spacers 22 in the anchor portions (28a, 28b). The wiring patterns (24&, 2(6) are electrically connected by wiring (not shown) formed on the substrate U. The disturbance 4 (27a 27b), as shown in Fig. 2, is in the shape of a curved shape in a plan view. Therefore, the movable plate 21 can be moved up and down (z-axis direction). That is, the actual force is restored when the electrostatic force and the Lorentz force act on the movable plate by the bending portions (27a, 27b). Force), in the upper position (second position) (see FIGS. 3 and 4), and the concave portion 13 of the γ 4 human substrate 11 is in contact with the lower side of the bottom portion (different position 1) (see Fig. 5). The second electrode portion (23a, 23b) of the movable plate 21 and the substrate 11 as the first electrode portion are spaced apart from each other at the upper side of 20 1274200 shown in Figs. 3 and 4 . When the voltage is increased, the electrostatic force generated between the two is reduced or disappeared. At the lower side shown in Fig. 5, the second electrode portion (23a, 23b) of the movable plate 21 is spaced from the substrate 11 as the first electrode portion. When the width is narrowed, the electrostatic force generated between the two increases. The coil layer 2 5 ' is arranged to move the movable plate 21 to the lower side as shown in Fig. 5 in which the electrostatic force is increased. The Lorentz force is generated in the direction (downward direction). Specifically, in the present embodiment, as described above, since the magnet 5 in Fig. 1 is used, a magnetic field is formed in the γ-axis direction toward the side thereof. The coil layer 25 is arranged to extend in the X-axis direction as shown in Fig. 1. The mirror 12 is fixed upright on the movable plate 21. As described above, the direction of the reflecting surface of the mirror 12 is set to The X-axis forms an angle of 45° with respect to the X-axis in a plane parallel to the χγ plane. In the optical switch structure, the micro-actuator that drives the mirror 12 is configured by components other than the mirror 12. And a timing chart of the relationship between the positions of the mirrors 12 of the optical switch (that is, the position of the movable plate 21) as a function of time. - At the beginning, the Lorentz force uses zero current, and the electrostatic force voltage is zero. Focus on one optical switch. For an example of the control method and the operation of the optical switch by the control method, refer to FIG. Explain. Fig. 6 is a view showing a current flowing through a coil layer 25 of one optical switch to cause a Lorentz force (hereinafter referred to as "current for Lorentz force"), and a first electrode portion (substrate) of the optical switch 11) The voltage between the two electrodes (2, 23b) of the movable plate 21 causing an electrostatic force (hereinafter referred to as "the electrostatic force 21 1274200 1 by the flex portions ma, 27b", The mirror 12 is held at the upper position as shown in Fig. 3 and Fig. 4. In this state, as shown in Fig. 3, the incident light is reflected by the mirror 12 and travels to the front side of the paper. Ding 1, open for use to switch the position of the mirror 12! The control of the lower side position shown in Figure 5, that is, at time 71, the Loren force motor system 6 is again + I. At the same time, the +J system is in the coil layer, and the elastic force of the flexure (27a, 27b) is stronger than that of the Φ 〜 ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ + I γ Α , quasi "effectiveness and gradually decrease, and the movable plate 21 stands at the time of the substrate 11 Τ 2 stops" and remains at the lower side position shown in Fig. 5. However, instead of maintaining the mirror 12 on the lower side by the Lorentz force: set, but at time Τ3, after the electrostatic force is set to V, the current of the Lorentz force is zero at time Τ4'. . Here, when ν is at least at the lower side of the mirror, the elastic force of the deflection portion (27a, 27b) is generated. The period of ... 3' mirror 12 is only borrowed in the lower position '," 3-T4, by the Lorentz force and the second guarantee to keep the mirror 12 in the lower position, as after the day (four) π: electrostatic force, will The mirror 12 is held at the lower position. The period of error is maintained during the transition period from the hold of the Lorentz force to the so-called lower side of the mirror 12, and the period Τ4 is maintained for a stable period of the lower side of the second. During the period in which the mirror 12 is held at the lower position in June, if the $ _ incident light is not reflected by the mirror 12, it is directly passed through the projection, and the mirror is started at time Τ 5. The switch is the control of the upper position shown in the 3 22 Ϊ 274200 diagram and the 4th diagram. ^ 卩, at _τ5, (4) The power voltage is set to zero. As a result, the mirror 12 is deflected by the ❿ 2 2 b The elastic force is more urgently returned to the upper side position shown in Fig. 3 and Fig. 4, and the elastic force is continuously maintained at the upper side position. As described above, when the second electrode portions 23a, 23b of the movable plate 21 are diskd When the interval between the substrates 11 (first electrode portions) is large, the size is not dependent on the reflection 9 The Lorentz force at the 12 position (the position of the movable plate 21) resists the elastic force of the flexures (仏, (10), causing the mirror 12 to move to the lower position. Therefore, it is not necessary to apply a high voltage or influence in order to increase the electrostatic force. The miniaturization means that the movable range of the movable plate 21 is large, and the interval between the second electrode (23a, 23b) of the movable plate 21 and the substrate 1! (the first electrode portion) becomes smaller. Keeping the steady state, since the mirror U is held at the lower position only by the electrostatic force, the power consumption can be reduced. In the above example, the time plate M is the same as the time T3 between the 1Z and the daytime guard T4. The voltage for electrostatic force is set to V, but the voltage for static electricity can be set to V during the period of U-T4, and the voltage for electrostatic force can be set to V before time T1. When the movable plate 21 is at the upper position, if the electrostatic force generated when the electrostatic force voltage is set to 纟v is smaller than the elastic force of the flexure portions (27a, 27b), the movable plate 21 is moved to the upper side after the phase T5. After the position, the electrostatic force is applied to the voltage during the upper side hold period. 8 The voltage refresh period on the right side of the legend is the same. The optical switch array 1 shown in Fig. 1 has a plurality of the second unit as the unit element, and the second picture is shown in Fig. 5. Optical switch, these light-opening relationships are matched with 23 1274200 in 2, quasi-matrix. In the optical switch array 1 shown in the 'figure】, for each optical switch, the number of control lines can be reduced by a small number. In order to realize the above control, a circuit of 帛7 ® (including a plurality of switching elements) is mounted. Fig. 7 shows a circuit diagram of the optical switch array 1. In Fig. 7, 'for simplicity of explanation', nine optical switches are configured to 3 rows and 3 columns. Of course, there is no limit to the number. For example, when the optical switch has 1 row and 1 column, the principle is the same. The single optical switch shown in FIGS. 2 to 5 can be regarded as one f-container on the circuit (corresponding to a capacitor formed by paralleling the second electrode 23a and the i-th electrode (substrate Π), and the second electrode 23b A combined capacitor of a capacitor formed by the i-th electrode (substrate 11) and one coil (corresponding to the coil layer 25). In the seventh figure, the capacitors and coils of the optical switches of m rows and n columns are displayed by Cmn and Lmn, respectively. For example, the capacitors and coils of the optical switch of the upper left (1 row and 1 column) in Fig. 7 are denoted by cu and Lu, respectively. In order to reduce the number of control lines, in the circuit shown in Fig. 7, column selection switches (Mmnb, M (four) d) and row selection switches (Mmna, Mmnc) are provided for the capacitor Cmn and the coil Lmn, respectively. One end of the capacitor Cmn is connected to one end of the row selection switch Mnrna, the other end of the row selection switch Mmna is connected to one end of the column selection switch Mmnb, and the other end of the column selection switch Mmnb is connected to one end of the voltage control switch MCI and MC2 One end. Capacitor Cry The other end of Cmn is grounded. The other end of the voltage control switch MC1 is connected to the clamp voltage VC, and the other end of the voltage control switch MC2 is grounded. Further, one end of the coil Lmn is connected to one end of the row selection switch Mmnc, the other end of the row selection switch Mmnc is connected to one end of the column selection switch Mmnd 24 1274200, and the other end of the column selection switch Mmnd is connected to the current control switch MC3. One end. The other end of the coil Lmn is grounded. The other end of the current control switch 3 is connected to one end of the power supply flow n (supply the current + 丨), and the other end of the current source 11 is grounded. As a column selection switch (Mmnb, Mmnd), a row selection switch (Mmna, Mmnc), a voltage control switch (MC1, MC2), and a current control switch MC3, for example, when a germanium substrate is used as the substrate n, it can be used. The N-type MOS transistor formed by the substrate 11 is formed. The gate of the row selection switch (Mila, Mile, Ml2a, Ml2c, Ml3a, Ml 3c) in row 1 is connected to terminal n. Similarly, the gate of the row selection switch of the second row is connected to V2, and the row of the row selection switch of the third row is connected to V3. The gate of the selector switch (Mllb, Mild, M21b, M21d, M31b, M31d) in column 1 is connected to terminal H1. (4) Ground, 闸 2 column The gate of the selection switch is connected to H2, and the gate of the 3rd column is connected to H3. Next, an example of a voltage timing chart applied to each of the terminals (7), V2, v3, H2, H3, Cl, C2, and C3) is shown in Fig. 8). In the figure 8 before 'time t1', the capacitors of all the optical switches are biased during the voltage update of the VC. Therefore, during this period, the terminals (7), V2, V3, H1, H:, and H3) are all high level. All the column selection switches (Μ-, _) and the order selection switches (Mmna, Mmnc) are turned on. Also, = Π high level 'terminal C2 is low level, the control switch is "on state, electric control switch Μ (: 2 becomes non-conducting state 25 1274200. And 'sub C3 becomes low level' current control switch mc becomes Non-conducting state. During the power-on update, the anti-fourth 12-series is maintained at either the upper side position and the lower side position. As for the example of Fig. 8, the mirror 12 is kept on the lower side during the power-up period before time t1. Further, in the present embodiment, the signal (voltage) applied to the terminals (7), V2, V3, H1, H2, H3, Cb, C2, C3) is controlled by the external control circuit 6 in FIG. The external control circuit 6, for example, 轾 switches the state command signal according to the diaphragm, and checks that the light should be changed from the current positional state, and each of the optical switches should be changed, in order to set the state. During the change period, Mang, force and death, W, and Shiyou/have an optical switch that should be changed from the current position. ΐ 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即 即The light should be changed from the current position state When the number of turns is two or more, a also sets the voltage during each state change period, and the voltage update period may not be set. For example, when the number of optical switches is two or more, the number of optical switches may be three or more. In the setting state change period, the private update period - the state change period - the voltage update period - the status period, the status change period can be continuously set.

月間,針對對應之光開關,為了根據所指令 之光程狀態來實筇二、+、— P #工, 見刚述弟6圖所示之控制,而供應施加至 ,去# 3 H1、Η2、Η3、Cl、C2、C3)之訊號。又 二亦可將外部控制電路6搭載在光開關陣列!。 圖>係藉由外部控制電路6,設定電壓更新期間—1 丁歹之光開關之狀態變更期間-電壓更新期間。至於第 8圖之例,在時門 了間tl以前之電壓更新期間,反射鏡12係 26 1274200 保持在下側位置。 能變更期卩1 # 1,開始1行1列之光開關之狀During the month, for the corresponding optical switch, in order to implement the second, +, and -# P # according to the commanded optical path state, see the control shown in Figure 6 of the description, and the supply is applied to, go to # 3 H1, Η 2 , Η3, Cl, C2, C3) signal. Alternatively, the external control circuit 6 can be mounted on the optical switch array! . The figure > is set by the external control circuit 6 to set the voltage update period - 1 state change period of the optical switch - voltage update period. As for the example of Fig. 8, the mirror 12 is held at the lower side during the voltage update before the time gate. Can change the period 卩1 # 1, start the light switch of 1 row and 1 column

心又灵期間,端子(V 容器C11以外之+ + _ H3)被設定在低位準,電 高位準,充電在 …開。其二人’在時間t3’ C2成為 之電荷放電,靜電力用電壓成為零。 此%間t3係對應帛 ,^ Μ ^ 19^^ 之日守間Τ5。精此,靜電力消失 射鏡12移動到第3圖及箆 -0 ^ ^ + 口及弟5圖所示之上側位置並被保 持。其次,在時間以 山 而子C2成為低位準,進一步在時 間t5 ’ &子ci成為高位準。 m ^ ^ Μη …、、後,在時間t6,結束該狀During the heart and spirit, the terminal (+ + _ H3 other than the V container C11) is set to the low level, the electric high level, and the charging is on. The two of them "discharge" at time t3' C2, and the electrostatic force voltage becomes zero. This % t3 corresponds to 帛 , ^ Μ ^ 19^^ on the day of the Τ Τ 5. In this case, the electrostatic force disappears. The mirror 12 moves to the upper side position shown in Fig. 3 and 箆 -0 ^ ^ + and the bottom 5 and is held. Secondly, in time, the mountain C2 becomes a low level, and further, the time t5 ’ & ci becomes a high level. m ^ ^ Μη ..., after, at time t6, end the condition

心、、又更J間,成為電壓更新期間。 仗日守間 11到日卑戸弓+ e ,4 】時間t6之期間,1行1列以外之光開關 之反射鏡12之下相,丨你番々^ ^ 置之保持,係藉由各電容器所殘留 之電荷所產生之電壓。因卜Heart, and more J, become the voltage update period.仗日守间11至日卑戸弓+ e ,4 】 During the period of time t6, the lower part of the mirror 12 of the light switch other than the 1 row and 1 column, the 保持 々 ^ ^ ^ The voltage generated by the charge remaining in the capacitor. Inb

、 电i因此,各電容器最好是製作成M0S 開關為非導通狀態時電荷的漏洩小。 其次,針對本實施形態之光開關陣列1製造方法之- 例,參照第9圖及繁! n m 4 ·、,Μ Ω 弟圖加以說明。第9圖及第10圖之Therefore, it is preferable that each capacitor is made to have a small leakage of charge when the MOS switch is in a non-conducting state. Next, for the example of the manufacturing method of the optical switch array 1 of the present embodiment, refer to FIG. 9 and the example! n m 4 ·,, Μ Ω is illustrated. Figure 9 and Figure 10

各圖係以不思方式顯示該製程之概略截面圖,對應第4 圖0 首先,在將成為前述基板11之矽基板31中,以一般 之M0S製程來形成作為第7圖中之開關(Mmna、如以、m_c 、Mmnd、MCI、MC2、MC3)的M0S電晶體(未圖示)。又,在 矽基板11上,形成實現第7圖所示之電路所需要之配線( 未圖示)。在此狀態之基板31表面,形成Si〇2膜32。其次 ’在Si 〇2膜32上’形成作為下側絕緣膜22之si N膜33。 又’ Si 02膜32及SiN膜33上,在將配線圖案(2 4a、24b、 27 1274200 29a 29b)待連接在基板3i所形成之m〇s電晶體處,以光 银刻法事先形成連接用孔。在此狀態之基板31上,藉由 热鍵法等形成電極部(23a、23b)、配線圖案(24a、24b、 2 9a、29b)、及線圈層25之A1膜34後,藉由光蝕刻法, 進行圖案化,來形成這些形狀。然後,形成SiN膜35(其 係成為上側絕緣膜26),藉由光蝕刻法,將SiN膜、 35)圖案化成可動板21、撓曲部(27a、27b)及錨部、 28b)之形狀(第9(幻圖)。 其次,在第9(a)圖所示狀態之基板31上,形成Si〇2 · 膜36並且,除去形成Si〇2膜36之反射鏡12之處、及形 成Si02膜(32、36)之蝕刻孔處(第9(b)圖)。 接著’在第9(b)圖所示狀態之基板上,厚厚的塗上光 阻37。此處,將光阻37予以曝光、顯影,將反射鏡成長 之區域$成在光阻3 7 (第9 (c )圖)。然後,以電解鍵方式, 來成長作為反射鏡12之Au、Ni及其他金屬38(第1〇(&)圖 )° 其次,除去光阻37後,透過蝕刻孔,注入K〇H溶液,_ 除去基板31之一部份(第丨“…圖)。最後,除去殘留之 S1 〇2膜(32、36)。藉此,完成本實施形態之光開關陣列丄 〇 [第2實施形態] 第11圖係顯示本發明第2實施形態光開關陣列之單位 凡件之1個光開關之概略俯視圖。第i i圖中,上側電極部 41本來應以實線顯示’但為了容易理解,係以虛線顯示。 28 1274200Each drawing shows a schematic cross-sectional view of the process in an inconspicuous manner, and corresponds to FIG. 4 first. First, in the substrate 31 to be the substrate 11, the switch in FIG. 7 is formed by a general MOS process (Mmna). M0S transistors (not shown) such as , m_c , Mmnd, MCI, MC2, MC3). Further, wiring (not shown) necessary for realizing the circuit shown in Fig. 7 is formed on the germanium substrate 11. On the surface of the substrate 31 in this state, a Si 2 film 32 is formed. Next, a si N film 33 as a lower insulating film 22 is formed on the Si 〇 2 film 32. Further, on the Si 02 film 32 and the SiN film 33, a wiring pattern (2 4a, 24b, 27 1274200 29a 29b) is to be connected to the m〇s transistor formed by the substrate 3i, and a connection is formed in advance by photolithography. Use holes. In the substrate 31 in this state, the electrode portions (23a, 23b), the wiring patterns (24a, 24b, 209a, 29b), and the A1 film 34 of the coil layer 25 are formed by a thermal bonding method or the like, and then photoetched. Method, patterning to form these shapes. Then, an SiN film 35 (which is the upper insulating film 26) is formed, and the SiN film and 35) are patterned into a shape of the movable plate 21, the flex portions (27a, 27b), and the anchor portions, 28b) by photolithography. (9th (phantom). Next, on the substrate 31 in the state shown in Fig. 9(a), the Si〇2· film 36 is formed and the mirror 12 forming the Si〇2 film 36 is removed and formed. The etched hole of the SiO 2 film (32, 36) (Fig. 9(b)). Next, on the substrate in the state shown in Fig. 9(b), the photoresist 37 is thickly coated. Here, the light is applied. The resistor 37 is exposed and developed, and the region where the mirror is grown is formed in the photoresist 3 7 (Fig. 9 (c)). Then, the Au, Ni, and other metals are grown as the mirror 12 by electrolytic bonding. (1st (&))) Next, after the photoresist 37 is removed, the K〇H solution is injected through the etching hole, and _ a part of the substrate 31 is removed (the first "..."). Finally, the residual is removed. S1 〇2 film (32, 36). Thus, the optical switch array of the present embodiment is completed. [Second Embodiment] FIG. 11 shows one unit of the optical switch array according to the second embodiment of the present invention. Light on A schematic top view of Fig. i i, the upper electrode portion 41 should be shown by a solid line 'but for the sake of easy understanding, it is shown by a broken line. 28 1274200

:二圖係沿第U圖中之X3-X4線之概略截面圖。第13 圖‘沿弟1 1圖中之V Y4線之概略截面圖。第14圖係對 二能圖之概略截面圖,顯示反射鏡12被保持在上侧之 12:俘牲15圖係對應第12圖之概略截面圖,顯示反射鏡 呆:寺在下側之狀態。又,第12圖及第13圖與前述第 動:2广士 4圖同樣的’顯示靜電力及羅倫茲力不作用於可 復原之^,係位於藉由撓曲部(27a、27b)之彈力(復原力) 立置狀態,本實施形態稱該位置為中立位置。: The second figure is a schematic cross-sectional view along the line X3-X4 in the U-picture. Figure 13 is a schematic cross-sectional view of the V Y4 line in the figure of the brother. Fig. 14 is a schematic cross-sectional view of the two-energy diagram showing that the mirror 12 is held on the upper side. 12: The captive image 15 corresponds to the schematic cross-sectional view of Fig. 12, showing that the mirror stays in the state of the lower side of the temple. Further, Fig. 12 and Fig. 13 are the same as the above-mentioned first motion: 2 shows that the electrostatic force and the Lorentz force do not act on the recoverable one, and are located by the flexures (27a, 27b). The elastic force (restoring force) is in a standing state, and this embodiment is referred to as a neutral position.

同或=11圖〜第15圖中,與第1圖〜第5圖中之元件相 士者,係附加相同符號,並省略重複之說明。 系J貫施形態之光開關陣列’係在帛1圖所示之光開關 鱼⑶用來取代光開關陣列1者。本實施形態之光開 關陣列與第i目中之光開關陣列i相異處,係在作為立單 h件之i個光開關中,追加可動板21上方所配置之上側 電極部(第3電極部)41。The same reference numerals are given to the same components as those in the first to fifth embodiments, and the description thereof will be omitted. The optical switch array shown in Fig. 1 is used to replace the optical switch array 1 in the optical switch fish (3) shown in Fig. 1. In the optical switch array of the present embodiment, the optical switch array i of the first embodiment is different from the optical switch array i of the first embodiment, and the upper electrode portion (the third electrode) disposed above the movable plate 21 is added to the one optical switch. Department) 41.

^上側電極部41係使用多晶矽材料來形成。第U圖〜 第一15圖中,42a、42b係表示上側電極錫部,43a、43b係 $不上升部,44係表示形成在上側電極部41之中央部之 ^ L孔。上側電極部41,係與上升部(43a、43b)及上側電 ,餉冲(42a、42b)構成為一體,透過上升部(43a、4此)及 上侧電極錨部(42a、42b)(以此順序)機械連接在基板u之 ° 之周邊部。如前所述,由於上側電極部41係固定 於基板1,故上側電極部41係與基板丨一起構成固定部。 本實施形態中,可動板21之電極部(23a、23b)不僅 29 1274200 :在與第1電極部(基板⑴之間產生靜電力之第2電極 =也能兼用作為在與上側電極部(第3電極部 ^靜電力之第4電極部。但不進行此種兼用,而例如在 屬膜\21/ ’在絕緣膜26上形成作為該第4電極部之金 屬膜,再在絕緣膜26上形成絕緣臈亦可。 又’本實施形態中,备如〇,&丄 了動板21肊在上側位置(第2位 置’參照第1 4圖,在a & Jr "X 1 係了動板攸則述中立位置移動到 而抵接於上側電極部41的位置)、與下側位置(第u 苓照第1 5圖,#可叙I > 〇 ··、 ’、 土板21進入基板Η之凹部13而抵 部的位置)之間移動。在第14圖所示之上側位置 且可動板2!之第2電極部(…、咖)與作為第玉電極部之 基板Π之間隔變大,兩者間所產生之靜電力降低或消失 可動板21之第2電極部(23a、23b)與上側電極部(第3 电極部)41間之間隔變窄’兩者間所產生之靜電力增大。 另方面,在第15圖所示之下側位置,可㈣£1之第2 電極部⑵3、饥)與作為第1電極部之基板11之間隔變窄 ,兩者間所產生之靜電力增大,可㈣21之第2電極部 23b)與上側電極部(第3電極部)41間之間隔變大, 兩者間所產生之靜電力降低或消失。 本貝%形怨中,f】電極部(基板i i)與作為第3電極 部之上側電極部41係電氣連接成共通。藉此,以可動板 21之罘2電極部(23a、23b)為基準,在可動板21之第2 電極部(23a、23b)與第1電極部(基板⑴之間、及可動板 1之第2包極部(23a、23b)與作為第3電極部之上側電極 30 1274200 部41之間’同時分別施加相同之電壓。但是,不將第】電 =部(基板⑴與作為第3電極部之上側電極部41電氣連 接’而作成能在可動板21 楚 i之弟2電極部(23a、23b)與第1 笔極部(基板u)之間、 了動板21之第2電極部(23a、 23b)與作為第3電極部 上側寬極部41之間,分別獨立施 加電壓亦可。 又, 由反射鏡 之微致動器。 第11圖〜第15圖所示之光開關之構造中 12以外之構成要件,來構成用以驅動反射 ,係藉 鏡12 其次’本實施形態中’著眼在1個光開關,針對該控 制方法之一例與藉由該控制方法之光開關之料,參照第 16圖加以說明。第16圖’係顯示流經!個光開關之線圈 :25以引起羅倫茲力之電流(以下’稱為「羅倫茲力用電 2」)、在該光開關之第1電極部(基板11)與可動板21之 2 2電極部(23a、23b)之間及該光開關之可動板Μ之第2 电極部(23a、23b)與上部電極部(帛3電極部)之間,分別 引=靜電力之各個間之相同電a (以下,稱為「靜電力 用电壓」)、及該光開關之反射鏡〗2位置(即,可動板Μ 之位置)之時間變化關係之時序圖。 ——開始,羅倫兹力用電流為I,且靜電力用電塵為v ,藉由可動板21之電極部(23a、23b)與上側電極部4i之 間之靜電力,反射鏡係如第14圖所示,被保持在上側位 $。此時,設定電壓為y,以使電極部(23a、23b)與上側 電極部41間之靜電力較撓曲部(27a、27b)之彈性強。在此 31 1274200 狀態下’如第14圖所示,入射光係被反射鏡i2反射,然 後行進到紙面前側。 〃之後’在時間tl中’開始將反射鏡12之位置開關到 第 囷所示之下側位置的控制。亦即,在時間τ 1中,將 靜電力用電壓設定為零。其結果,反射鏡12係藉由撓曲 部(仏、27b)之彈力,較為急遽地回到第12圖及第13圖 所示之中立位置。 之…、後在%間T2中,將羅儉兹力用電流設為+卜 此處,係使線圈層25產生較撓曲部(27a、27b)之彈力 強且向下之羅倫兹力的電流。 反射鏡12,藉由此羅倫兹力逐漸下降,在可動板Μ 抵接於基板u之時間T3停止,而被保持在第15圖所 下側位置。 此處,並非藉由羅倫兹力將反射鏡12持續保持在下側 位置,而是在時間Τ4,將靜電力用電麼設為y後, Τ5,將羅儉兹力用電流設定為零。此處,電壓v與前:: 相同,但當反射鏡12位於下侧位置時,係設定為產生較 撓曲部(27a、27b)之彈力強之靜電力的電塵。在期 — T4,僅藉由羅倫兹力將反射鏡12保持在下側位置 T4-T5, II由羅倫兹力及靜電力將反射鏡12保持側:The upper electrode portion 41 is formed using a polycrystalline silicon material. In the first to fifth drawings, 42a and 42b indicate the upper electrode tin portion, 43a and 43b are not raised portions, and 44 indicates the hole formed in the central portion of the upper electrode portion 41. The upper electrode portion 41 is electrically connected to the rising portions (43a, 43b) and the upper side, and the buffers (42a, 42b) are integrally formed, and are transmitted through the rising portions (43a, 4) and the upper electrode anchor portions (42a, 42b) ( In this order, it is mechanically connected to the peripheral portion of the substrate u. As described above, since the upper electrode portion 41 is fixed to the substrate 1, the upper electrode portion 41 constitutes a fixed portion together with the substrate 。. In the present embodiment, the electrode portions (23a, 23b) of the movable plate 21 are not only 29 1274200: the second electrode that generates an electrostatic force between the first electrode portion (the substrate (1) can also be used as the upper electrode portion (the second electrode portion) The third electrode portion of the third electrode portion is an electrostatic force. However, the metal film as the fourth electrode portion is formed on the insulating film 26, for example, on the insulating film 26, without using the same. In the present embodiment, it is also possible to use the 〇, & 丄 动 动 肊 肊 肊 肊 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( The movable plate 攸 is described as a position where the neutral position is moved to abut against the upper electrode portion 41 and the lower position (the first 图 第 第 第 , # & & & & & & & & & & & & 、 、 、 、 、 、 、 、 、 、 Moves between the recessed portion 13 of the substrate 而 and the position of the abutting portion. The second electrode portion of the movable plate 2! and the substrate as the first jade electrode portion are moved at the upper side position shown in FIG. When the interval is increased, the electrostatic force generated between the two decreases or disappears from the second electrode portion (23a, 23b) and the upper electrode portion of the movable plate 21 (third electric portion) Part) The interval between the 41s is narrowed. The electrostatic force generated between the two increases. On the other hand, in the lower position shown in Fig. 15, the second electrode part (2) of the £1 (2), the hungry and the The interval between the substrates 11 of the first electrode portion is narrowed, and the electrostatic force generated between the two electrodes is increased, and the distance between the second electrode portion 23b) of the (four) 21 and the upper electrode portion (third electrode portion) 41 is increased. The electrostatic force generated between them decreases or disappears. In the present invention, the electrode portion (substrate i i) is electrically connected to the upper electrode portion 41 as the third electrode portion. Thereby, the second electrode portion (23a, 23b) of the movable plate 21 and the first electrode portion (the substrate (1) and the movable plate 1 are used as the reference based on the second electrode portions (23a, 23b) of the movable plate 21. The same voltage is applied to the second packaged portion (23a, 23b) and the third electrode portion upper electrode 30 1274200 portion 41. However, the first electrical portion (the substrate (1) and the third electrode are not applied. The upper electrode portion 41 is electrically connected to the second electrode portion of the movable plate 21 between the second electrode portion (23a, 23b) of the movable plate 21 and the first pen portion (substrate u). The voltage may be independently applied between (23a, 23b) and the upper wide portion 41 as the third electrode portion. Further, the microactuator by the mirror. The optical switch shown in Figs. 11 to 15 The constituent elements other than the structure 12 are configured to drive the reflection, and the mirror 12 is used. Next, in the present embodiment, an optical switch is focused on one of the control methods and the optical switch by the control method. This is illustrated with reference to Figure 16. Figure 16 shows the flow through the coil of an optical switch: 25 to cause Loren The current of the force (hereinafter referred to as "Rorentz force power 2"), between the first electrode portion (substrate 11) of the optical switch and the 2 electrode portions (23a, 23b) of the movable plate 21 and The second electrode portion (23a, 23b) of the movable plate 该 of the optical switch and the upper electrode portion (the electrode portion of the 帛3) are respectively led to the same electric power between the electrostatic forces (hereinafter referred to as "static" Timing diagram of the time relationship between the force voltage ") and the position of the mirror of the optical switch (ie, the position of the movable plate 。) - At the beginning, the force of the Lorentz force is I, and the electrostatic force With the electric dust being v, by the electrostatic force between the electrode portions (23a, 23b) of the movable plate 21 and the upper electrode portion 4i, the mirror is held at the upper side as shown in Fig. 14. At this time, The set voltage is y such that the electrostatic force between the electrode portions (23a, 23b) and the upper electrode portion 41 is stronger than that of the flex portions (27a, 27b). In this state of 31 1274200, as shown in Fig. 14, The incident light is reflected by the mirror i2 and then travels to the front side of the paper. After that, the position of the mirror 12 is switched to the third position in 'time t1'. The control of the lower side position is shown. That is, in the time τ 1, the electrostatic force voltage is set to zero. As a result, the mirror 12 is more eagerly returned by the elastic force of the flexure portion (仏, 27b). To the neutral position shown in Fig. 12 and Fig. 13, after ... in the interval T2, the current for the Rogz force is set to +, and the coil layer 25 is made to have a more flexible portion (27a). 27b) The current of the strong and downward Lorentz force. The mirror 12 is gradually lowered by the Lorentz force, and is stopped at the time T3 when the movable plate 抵 abuts against the substrate u. Figure 15 is the lower side position. Here, instead of maintaining the mirror 12 at the lower position by the Lorentz force, the electric force is set to y at time Τ4, and then the 俭5 is set to zero. Here, the voltage v is the same as the front::, but when the mirror 12 is located at the lower side, it is set to generate electric dust having a stronger electrostatic force than the flexures (27a, 27b). In the period - T4, the mirror 12 is held in the lower position only by the Lorentz force T4-T5, II holds the mirror 12 by the Lorentz force and the electrostatic force:

置,時間T5以後,僅蕻由靜帝士收c A M 佼僅猎由“力將反射鏡12 位置:期^ T3-T5 ’係將反射鏡12保持在下側位置之 量從羅倫兹力換為靜電力之所謂的下側保持之過 期間T5以後,則係所謂的下側保持之穩定期間。…’ 32 1274200 反射鏡1 2被保持在下側位置之期間,如第i 5圖所示 入射光不被反射鏡丨2反射而係直接通過成為射出光。 之後’在時間t6,開始將反射鏡12之位置開關到第 14圖所TF之上側位置的控制。亦即,在時間,將靜電力 用电疋為零。其結果,反射鏡12藉由撓曲部、 27b)之彈力,較為急遽地回到第12圖及第i3圖所示之 立位置。 之後’在時間T7,將羅倫兹力用電流設為-I。此處 ,—I係使線圈層25產生較撓曲部(27a、27b)之彈力強且 向上之羅倫茲力的電流。 反射鏡藉由此羅倫兹力逐漸上升,在可動板2"氏 接於上側電極部4] $ 0主μ TQ产, 之上側位置。之_Τ8停止,而保圖所示 此處’並非藉由羅倫茲力將反射鏡12持續保持在上側 二置,而是在時間Τ9’將靜電力用電塵設為”吏,在時間 將羅倫茲力用電流設定為零。在期間T8—Tg,僅藉 由羅倫兹力將反射鏡12保持在上側位置,在期fa”9_T二 力及靜電力將反射鏡12保持在上側位置 ’則僅藉由靜電力將反射鏡i被保持在上 置。期間T9-T10,係將反射鏡12保持在上側位置之 間里^羅儉兹力開關為靜電力之所謂的上側保持之過渡期 4間Τ1 0以後則係所謂的上側保持之穩定期間。 板二前所述,當可動板21之第2電極繼、晴基 (弟1電極部)間之間隔大時,係藉由其大小不依存於 33 1274200 反射鏡12位置(可動板21之位置)的羅倫茲力,來抵抗撓 曲部(27a、27b)之彈力使反射鏡12移動到下側位置。又, 當可動板21之第2電極部(23a、23b)與上侧電極部41 (第 3電極部)間之間隔大時,係藉由其大小不依存於反射鏡12 位置的羅倫茲力,來抵抗撓曲部(27a、27b)之彈力使反射 鏡12移動到上側位置。因此,不需施加為提高靜電力之 高電壓且不影響小型化,即能擴大可動板21 t可動範圍 又至於可動板21之第2電極部(23a、23b)與基板11 ( 第1電極部)間之間隔變小之下側位置保持之穩定狀態、 以及可動板21之第2電極部(23a、23b)與上側電極部41( 第3電極部)間之心高變小之上側位置保持之穩定狀態, 由於僅藉由靜電力將反射鏡保持在上側位置,古支能減低消 耗電力。After the time T5, only the 帝 静 静 静 AM AM AM AM AM 佼 佼 佼 佼 佼 佼 佼 佼 佼 静 静 静 静 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 佼 “ “ “ “ “ “ “ “ “ “ “ “ “ “ In the so-called lower side hold period T5 of the electrostatic force, the so-called lower side hold period is stable....' 32 1274200 The mirror 1 2 is held at the lower side position, and is incident as shown in Fig. 5 The light is not reflected by the mirror 丨2 and passes directly to become the emitted light. Then, at time t6, the control of switching the position of the mirror 12 to the upper side of the TF of Fig. 14 is started. That is, at the time, the static electricity is generated. The force 用 is zero. As a result, the mirror 12 is more eagerly returned to the vertical position shown in Fig. 12 and i3 by the elastic force of the flexure portion, 27b). Then at time T7, Luo The lent force is set to -I. Here, the -I system causes the coil layer 25 to generate a current that is stronger than the flexure (27a, 27b) and upwards the Lorentz force. The force gradually rises, and the movable plate 2" is connected to the upper electrode portion 4] $0 main μ TQ, upper side position _ Τ 8 stops, and the map shown here 'does not rely on the Lorentz force to keep the mirror 12 on the upper side, but at the time Τ 9' to set the electrostatic force with electric dust, 吏, at the time Set the Lorentz force current to zero. During the period T8-Tg, the mirror 12 is held in the upper position only by the Lorentz force, and the mirror is held by the electrostatic force only when the fa"9_T force and the electrostatic force hold the mirror 12 in the upper position" i is held in the upper position. During the period T9-T10, the mirror 12 is held between the upper positions, and the so-called upper side of the electrostatic force is maintained in the transition period of 4 Τ1 0. The upper side is kept in a stable period. When the second electrode of the movable plate 21 is separated from the clear base (the electrode portion of the first electrode), the size of the movable plate 21 is not dependent on the position of the mirror 12 of 33 1274200. The Lorentz force (position of the movable plate 21) resists the elastic force of the flexures (27a, 27b) to move the mirror 12 to the lower position. Further, the second electrode portion (23a, 23b) of the movable plate 21 When the interval between the upper electrode portion 41 (third electrode portion) is large, the elastic force of the flexure portions (27a, 27b) is resisted by the Lorentz force whose size does not depend on the position of the mirror 12. The mirror 12 is moved to the upper position. Therefore, it is not necessary to apply a high voltage for increasing the electrostatic force and does not affect the small size. In other words, the movable range of the movable plate 21 t can be enlarged, and the interval between the second electrode portions (23a, 23b) of the movable plate 21 and the substrate 11 (first electrode portion) becomes smaller, and the position is maintained, and the movable state is movable. The height between the second electrode portion (23a, 23b) of the plate 21 and the upper electrode portion 41 (third electrode portion) is reduced, and the upper side position is maintained in a stable state, and the mirror is held at the upper position only by electrostatic force. , Guzhi can reduce power consumption.

又,前述例中,在時間T3與時間T5間之時間τ4,^ 將靜電力用電壓設定在V,但也可在期間η_Τ4之任一 ε 點’將靜電力用電壓設定在ν。同樣地,前述例中,在日 間Τ8與時間Τ10間之時間Τ9,係將靜電力用電壓設定在 但也可在期間Τ6 — Τ9之任一時點,將靜電力用電壓設$ 在 本貝%形態之光開關陣列丨,係具有複數個作為前述 單位元件之第1 1圖第〜〗5圖所示之光開關,此等光開關 係配置成2維矩陣。又,本實施形態之光開關陣列中,為 了用少條數之控制線來實現對此等各個光開關實現前述控 制,係搭載包含複數個開關元件之第17圖所示之電路。 34 1274200Further, in the above-described example, the voltage for electrostatic force is set to V at time τ4 between time T3 and time T5, but the voltage for electrostatic force may be set to ν at any ε point of period η_Τ4. Similarly, in the above example, during the time 日8 between the day Τ8 and the time Τ10, the voltage for the electrostatic force is set, but the voltage for the electrostatic force can be set to $ at the time of the period Τ6 - Τ9. The optical switch array of the form has a plurality of optical switches as shown in FIGS. 1 to 5 of the unit elements, and the optical open relationships are arranged in a two-dimensional matrix. Further, in the optical switch array of the present embodiment, the control of each of the optical switches is realized by a small number of control lines, and the circuit shown in Fig. 17 including a plurality of switching elements is mounted. 34 1274200

弟1 7 ®係、顯示本實施形態之光開M陣列之電路圖。第U ^中’與第7圖中之元件相同或對應之元件,係附加相同 符號’並省略重複之說明。 第1 7圖所不電路與第7圖所示電路之相異處,係追加 了電流控制開關MC4、及供應前述電流-I之電流源12。 電流控制開關MC4之一端係連接在列選擇開關Μ_之另一 端2流控制開M MC4之另一端係連接在電流源、12之一端 、电饥源12之另一端係接地。電流控制開關似之開極係 連接在端子C 4。 '、 第1 7圖中’ m行n列之光開關之電容器Cmn係相 s於並聯第2電極23a與第1 電極(基板11)所形成之電容 二:2電極23b與第!電極(基板⑴所形成之電容器、 =23a與上側電極部41(第3電極部)所形成之電容 口口、及苐2電極23b與上側 成電容器。 “桎。“1所形成之電容器之合 、人第18圖係顯示對各端子⑺、V2、V3、HI、H2 ;、C1、C2、C3、⑷施加電屢之時序圖例1 18圖中 電壓vc有光開關之電容11 GmnM在箝位 之毛昼更新期間。因此,該期間中,端子(m 、Mmnd) H2、H3)全部為高位準’所有列選擇開關(Mmnb 期Γ中 開關(Mmna、w)成為導通狀態。又,該 知子C1係高位準,端子 開關MCI係導诵妝能 1 +包壓控制 心,電壓控制開關MC2為不導通狀態。 此外,端子(C3、C4) A、 心 ”、、氐位準,電流控制開關(MC3、MC4) 35 !2742〇〇 二不導通狀態。在電壓更新期間’反射鏡i2係被保持在 側位置及下侧位置之任一位置。 、本實施形態中,施加至端子(V1、V2、V3、hi、h2、h3 , ^ — 係攸外部控制電路(其 ’、§於第1圖中之外部控制電路6 )作為3 。α μ A ^乍為控制訊號來供應 ,例:卿電路’與第1圖中之外部控制電路6同樣的 置狀:二…艮據先程切換狀態指令訊號,檢測應從現在位 依序设定狀態變更期間。在 光開關時,即抓定一十、^ 現在位置狀態變更之 ::即…述電壓更新期間。又,當設定複數個 心、交期間時(也就是說,應從現在位置狀能抖 電壓更新期:? 各狀態變更期間之間設定 。亦可不設定電星更新期間。例如,在庫從 現在位置狀態變更朵 ^ 在應從 變更期間;=3個以上時,可設定狀態 d更新期間—狀態變更期間 〜狀態變更期間,也可遠痒< 6 土更新期間 所設定之各狀態變更期間 :麦’在 所指令之光程狀態,來實現前^ 先開關,為了根據 現則述第6圖所示之护:制,品瓜 應施加至端子(V1、V2、V3、 工制而仏 C4)之訊號。又,告铁亦叮" H3、Cl、C2、C3、 陣列1。 M工制电路6搭载在光開關 第18圖,係藉由外部控制電路 間-"亍1列之光開關之狀態變更期間更新期 例。第18圖之例中,在時間電昼更新期間之 1以刖之電壓更新期間,反 36 1274200 射鏡12 i保持在上側位置及下側位置之任_位置。在時 間tl,針對丨行丨列之光開關’開始狀態變更期間,端子 U2 ' Π、H2、H3)係設定在低位準,電容器C1〗 σ u i Μ外之電 容器被分離。其次,在時間t3,C2被設定在高位準,原本 充電在C11之電荷放電,靜電力用電壓成為零。藉此,靜 電力消失,反射鏡12移動到第12圖及第13圖所示之中立 位置。其次,在時間t4,端子C2成為低位準後,在時間 t5 ’端子C3成為高位準。在線圈L1! +,電流+ !流動。 當移動方向相反時,將C4設定在高位準來取代α,電流 —I流動。其次,在時間t6,端子C1成為高位準,將電容 器C11再度充電到箝位電壓vc,藉此進行箝位。其次,在 時間t7,將C3設定在低位準,來截止線圈Lu之電流。 然後,在時間t8,結束該狀態變更期間,成為電壓更新期 間。 / 又,本實施形態之光開關陣列,基本上,能與前述第 1實施形態之光開關陣列1同樣製造。本實施形態中,由 於附加了上側電極部41 ’故在進行犧牲層(相當於可動板 21與上部電極部41間之間隔)之形成後,適當進行形成上 部電極部41等之變更即可。 月il述各貫施形怨中,若係在電極部間施加高電壓的話 ,則必須提高第8圖中之M0S電晶體之耐壓。但是,耐壓 门之M0S電晶體之平面尺寸變大,晶片之小型化將變得困 難二相對於此,前述各實施形態中,由於不必施加高電壓 在电極部間,故能使用平面尺寸小之_冑晶體,就此點 37 !2742〇〇 I看’亦能謀求小型化。 以上,針對本發明之各實施形態作了說明,但本發明 之範圍並不限定在此等實施形態。 例如,前述各實施形態係將複數個光開關配置成2維 狀夕丄 <光開關陣列之例,但本發明也可僅有1個光開關。又 . 則述各實施形態係將本發明之微致動器應用在光開關之 例’但不限定在該用途。 本叙明之彳政致動斋、微致動器裝置,例如,能使用在 驅動藉由微機械加工所製造之裝置等微小構造之裝置。本 _ I明之光開關及光開關陣列,例如,能使用在光通訊等方 兩〇 【圖式簡單說明】 (一)圖式部份 第1圖,係顯示具備本發明第i實施形態之光開關陣 列之光開關系統例的概略構成圖。 第2圖,係顯示構成帛1圖中之光開關陣列之-個光The brother 1 7 ® is a circuit diagram showing the optical open M array of the present embodiment. The elements of the same or corresponding elements in the above U is the same as the elements in the seventh embodiment, and the same reference numerals are given, and the overlapping description is omitted. The difference between the circuit shown in Fig. 7 and the circuit shown in Fig. 7 is the addition of a current control switch MC4 and a current source 12 for supplying the current -I. One end of the current control switch MC4 is connected to the other end of the column selection switch Μ_2, and the other end of the flow control switch M MC4 is connected to one end of the current source, 12, and the other end of the electric hunger source 12 is grounded. The current control switch is similar to the open circuit connected to terminal C 4. ', Figure 1 7 shows the capacitor Cmn phase of the optical switch of m rows and n columns s The capacitance formed by the parallel connection of the second electrode 23a and the first electrode (substrate 11) 2: 2 electrodes 23b and the first! The electrode (the capacitor formed by the substrate (1), the capacitor port formed by =23a and the upper electrode portion 41 (third electrode portion), and the 苐2 electrode 23b and the upper side are capacitors. "桎." Figure 18 shows the timing of applying the power to each of the terminals (7), V2, V3, HI, H2; C1, C2, C3, (4). Figure 18 The voltage of the voltage vc has an optical switch 11 GmnM in the clamp During this period, the terminals (m, Mmnd) H2, H3) are all high-level 'all column selection switches (Mmna, w) in the Mmnb period are turned on. The C1 system has a high level, the terminal switch MCI guides the makeup 1 + voltage control, and the voltage control switch MC2 is non-conducting. In addition, the terminals (C3, C4) A, the heart", the 氐 level, the current control switch (MC3, MC4) 35 !2742〇〇2 non-conduction state. During the voltage update period, the mirror i2 is held at either the side position and the lower position. In the present embodiment, it is applied to the terminal (V1). V2, V3, hi, h2, h3, ^ — system external control circuit (its ', § in the first The external control circuit 6 in Fig. 1 is supplied as 3 . α μ A ^ 乍 is supplied as a control signal. For example, the clear circuit 'is the same as the external control circuit 6 in Fig. 1 : The command signal should be set to change the status change period from the current position. In the case of optical switch, the tenth position is changed, and the current position status is changed:: that is, the voltage update period is described. Also, when setting a plurality of hearts, pay During the period (that is, it should be updated from the current positional voltage update period: ? between each state change period. It is also possible to set the period of the electric star update. For example, if the library is changed from the current position status, it should be changed from the current period; When there are three or more, the state d update period - the state change period - the state change period can be set, and the state change period set in the 6 soil update period can be set: the wheat is in the commanded light path state. Before the first switch, in order to according to the protection shown in Figure 6, the product should be applied to the terminals (V1, V2, V3, system and 仏 C4). Also, the iron is also 叮" H3, Cl, C2, C3 Array 1. The M-working circuit 6 is mounted on the optical switch in Fig. 18, and is updated by the state change period during the state change of the optical switch between the external control circuits. In the example of Fig. 18, the time is During the update period of the 昼 update period, the anti-36 1274200 mirror 12 i is held at any position of the upper position and the lower position. At time t1, during the start state change period of the optical switch of the 丨The terminals U2 ' Π, H2, H3) are set at the low level, and the capacitors outside the capacitor C1 〖 σ ui 被 are separated. Next, at time t3, C2 is set at a high level, and the charge that was originally charged at C11 is discharged, and the voltage for electrostatic force becomes zero. Thereby, the static electricity disappears and the mirror 12 moves to the neutral position shown in Figs. 12 and 13. Next, at time t4, after terminal C2 becomes a low level, terminal C3 becomes a high level at time t5'. At coil L1! +, current + ! flows. When the direction of movement is reversed, C4 is set to a high level to replace α, and current -I flows. Next, at time t6, the terminal C1 becomes a high level, and the capacitor C11 is again charged to the clamp voltage vc, thereby being clamped. Next, at time t7, C3 is set to a low level to turn off the current of the coil Lu. Then, at the time t8, the state change period is ended, and the voltage update period is reached. Further, the optical switch array of the present embodiment can basically be manufactured in the same manner as the optical switch array 1 of the first embodiment. In the present embodiment, after the upper electrode portion 41' is added, the sacrificial layer (corresponding to the interval between the movable plate 21 and the upper electrode portion 41) is formed, and the upper electrode portion 41 and the like may be appropriately changed. In the monthly stipulations, if a high voltage is applied between the electrode portions, the withstand voltage of the MOS transistor in Fig. 8 must be increased. However, the planar size of the MOS transistor with a pressure-resistant gate is increased, and the miniaturization of the wafer becomes difficult. In contrast, in the above embodiments, since it is not necessary to apply a high voltage between the electrode portions, the planar size can be used. Small _ 胄 crystal, at this point 37 ! 2742 〇〇 I see 'can also seek miniaturization. Although the embodiments of the present invention have been described above, the scope of the present invention is not limited to the embodiments. For example, each of the above embodiments is an example in which a plurality of optical switches are arranged in a two-dimensional optical switch array. However, the present invention may have only one optical switch. Further, in the respective embodiments, the microactuator of the present invention is applied to an example of an optical switch, but is not limited to this use. In the present invention, a micro-actuator device can be used, for example, a device that drives a micro-machine such as a device manufactured by micromachining can be used. The optical switch and the optical switch array of the present invention can be used, for example, in optical communication, etc. [Simplified description of the drawings] (1) The first part of the drawing shows the light having the i-th embodiment of the present invention. A schematic configuration diagram of an example of an optical switch system of a switch array. Figure 2 shows the light that constitutes the optical switch array in Figure 1.

開關的概略俯視圖。 弟3圖’係沿第2圖中之Χι — χ“的概略截面圖。 第4圖,係沿第2圖中之γι_γ2線的概略截面圖。 第5圖,係對應第3圖的概略截面圖。 第6圖,係顯示構成第1圖中之光開關陣列之一個 開關之羅倫茲力用電流與靜電力用電壓與反射鏡位置之 間變化關係的時序圖。 第7圖,係顯示第1圖中之光開關陣列的電路圖。 38 1274200 5a 磁力線 6 外部控制電路 11, 31 基板 12 反射鏡 13 凹部 21 可動板 22 下側絕緣膜 23a, 23b 第2電極部 24a, 24b 配線圖案 25 線圈層 26 上側絕緣膜 27a, 27b 撓曲部 28a, 28b 錨部 29a, 29b 配線圖案 32, 36 Si02 膜 33, 35 SiN膜 34 A1膜 37 光阻 38 金屬 41 上側電極部 42a, 42b 上側電極錫部 43a, 43 b 上昇部 44 貫通孔 Cmn 電容器A schematic top view of the switch. Figure 3 is a schematic cross-sectional view taken along line — — 第 in Fig. 2. Fig. 4 is a schematic cross-sectional view taken along line γι_γ2 in Fig. 2. Fig. 5 is a schematic cross section corresponding to Fig. 3. Fig. 6 is a timing chart showing the relationship between the current for the Lorentz force and the voltage for the electrostatic force and the position of the mirror constituting one of the switches of the optical switch array in Fig. 1. Fig. 7, showing Circuit diagram of the optical switch array in Fig. 1. 38 1274200 5a magnetic field line 6 external control circuit 11, 31 substrate 12 mirror 13 recess 21 movable plate 22 lower insulating film 23a, 23b second electrode portion 24a, 24b wiring pattern 25 coil Layer 26 upper side insulating film 27a, 27b flexure 28a, 28b anchor portion 29a, 29b wiring pattern 32, 36 SiO 2 film 33, 35 SiN film 34 A1 film 37 photoresist 38 metal 41 upper electrode portion 42a, 42b upper electrode tin portion 43a, 43 b riser 44 through hole Cmn capacitor

40 127420040 1274200

Lmn 線圈Lmn coil

Mmnb, Mmnd 列選擇開關Mmnb, Mmnd column selector switch

Mmna, Mmnc 行選擇開關 MCI, MC2 電壓控制開關 MC3 電流控制開關 VC 箝位電壓 VI〜V3,H1〜H3, C1〜C4 端子Mmna, Mmnc row select switch MCI, MC2 voltage control switch MC3 current control switch VC clamp voltage VI~V3, H1~H3, C1~C4 terminals

4141

Claims (1)

1274200 拾、申請專利範圍: 1、一種微致動器,其特徵在於: 具備固定部、及設置成能相對該固定部 • ~ I私動的可動部 該固定部具有第1電極部; 該可動部,具有能藉由與前述帛1電極部間之電壓、 在與該第1電極部之間產生靜電力的帛2電極部,與:置 在磁場内藉由通電來產生羅倫茲力的電流路徑。 2、如申請專利範圍第丨項之微致動器, 部係由薄膜構成。 ”中’遠可動 3、如申請專利範圍第1項之微致動器,其中,該^ 路徑’係配置成能在使該可動部移動至該靜電力增^ = 1位置的方向產生羅倫茲力。 ,如申請專利範圍第3項之微致動器,其中,該可動 :係设置成A在該帛i位置、與該靜電力降低或消失的第 。位置之間移動,且能產生欲復原至該第2位置之復原力 5、 如申請專利範圍第4項之微致動器, 電極部斑該第2 + k六Γ7〆 、 口义乐 彈从 %極部係對向配置;該可動部係透過呈有 知性之彈性部機械連接於該 …有 第1位置時,該第m9: 可動部位於該 及弟2电極部間之間隔變窄,且在哕 可動部位於該第2仞罢卩士 >卜 在°玄 變大m Λ “ ”該弟1及第2電極部間之間隔 ? '、係藉由該彈性部來產生。 6、 如申明專利範圍第1項之微致動器,其中,該固定 42 1274200 4電極部,此第4電 在與該第3電極部之 部具有第3電極部,該可動部I有第 極部能藉由與第3電極部間之電屢, 間產生靜電力。 7、如申請專利範圍筮 W第6項之微致動器,苴中,哕笛5 笔極部係兼用為該第4電極部。 … 以弟 广:申請專利範圍“項之微致動器,其中 2:置:成能在使該可動部分別移動至第1位置及第 1=向產生羅偷兹力,·該第1位置係該第1及第2 ==之靜電力增大、且㈣3及第“極部間 及降低或消失的位置,該第2位置係該第1 =2電極部間所產生之靜電力降低或消失、且該第3及 弟4電極部間所產生之靜電力增大的位置。 立〃 9、如申請專利範圍第8項之微致動器,其中,該可動 部,設置成產生欲復原至該第!及第2位置間之既定位置 的復原力。 10、如申請專利範圍第9項之微致動器,其中,該第 1電極部係在對該可動部之一側,與該第2電極部對向配 _ 置’。亥第3電極部係在對該可動部之另一側,與該第4電 極部對向配置; … °亥可動部係透過具有彈性之彈性部機械連接於該固定 、 邛,以使該可動部位於該第丨位置時,該第丨及第2電極 - 部間之第1間隔變小且該第3及第4電極部間之第2間隔 變大’而在該可動部位於該第2位置時,該第1間隔變大 且第2間隔變小; 43 1274200 該復原力係藉由該彈性部來產生。 、一種微致動器裝置,其特徵在於,具備·· 申凊專利範圍第1項之微致動器; 磁場產生部,係產生該磁場,·以及 控制部,係控制該第 該電流路徑之電流。 ……間之電屢及流過 &如申請專利範圍第U項之微致動 =部:控制該《及該電流,以在該可動部往該第i ,㈣動日寸’係藉由該羅倫茲力或該羅倫茲力及該靜電力 “。亥可動部向該第1位置移動; 保牲2制部在將該可動部保持在該帛1位置之至少穩定 持,二了 ’係控制該電壓以藉由該靜電力將該可動部保 持在戎第1位置’且控制該電流使其不流動。 13、-種微致動器裝置,其特徵在於,具備: 申請專利範圍第6項之微致動器; 1場產生部,係產生該磁場;以及 3 制冲’係控制該第1及第2電極部間之電壓、該第 广極邛間之電壓、及流過該電流路徑之電流。 該控制部如"專利範圍第13項之微致動器裝置,其中, 及第係控制該第1及帛2電極部間之電壓、該第3 在該可.4邛間之電壓、以及流過該電流路徑之電流,以 藉由該 ⑨時,係藉由該羅倫兹力,或 該可動: 及該第1及“電極部間之靜電力,來使 了動部移動到該第1位置; 44 1274200 ”二制部,係控制該第 第3及 及弟2電極部間之電壓、該 4電極部間之電壓、 ☆、两 # ,以在該可動-過该路徑之電流 2位置移動時,係藉 及错由該羅倫兹力及 隹“力 使該可動邱 弟4电極口P間之靜電力, J動邛移動到該第2位置; 定保ί將該可動部保持在該第1位置之至少穩 該第3及二 該第1及帛2電極部間之電磨以及 部門之兮 極部間之電虔,以藉由該第1及第2電極 電:使:靜!力將該可動部保持在㈣1位置,且控制該 电机使其不流動; 該控制部’在將該可動部保持在該第 定保持狀態下,係栌制兮笛〗β y t ”拴制δ亥弟1及弟2電極部間之電壓以及 以弟3及第4電極部間之電麼,以藉由該第3及第4電極 部間之該靜電力將該可動部保持在該…置,且控制該 電流使其不流動。 U、一種光開關,其特徵在於,具備: 申請專利範圍帛1項之微致動器;以及 反射鏡’係設置在該可動部。 16、一種光開關陣列,其特徵在於·· 具備複數個申請專利範圍第15項之光開關,該複數個 光開關係配置成2維狀。 1 7、如申請專利範圍第丨6項之光開關陣列,其中,具 備包含複數個開關兀件之電路,該電路係依該複數個光開 關各行之行選擇訊號及該複數個光開關各列之列選擇訊號 45 1274200 ,對所選擇之行及列之光開關,進行該電流及該電壓之控 制0 拾壹、圖式: 如次頁1274200 Patent Application No.: 1. A microactuator comprising: a fixed portion; and a movable portion provided to be movable with respect to the fixed portion, the fixed portion having a first electrode portion; The portion having the 帛2 electrode portion capable of generating an electrostatic force between the electrode portion and the first electrode portion by the voltage between the electrode portion and the first electrode portion is generated by energization in the magnetic field to generate the Lorentz force. Current path. 2. The microactuator according to the scope of the patent application, the part is composed of a film. "Medium" is a movable actuator, such as the microactuator of claim 1, wherein the path is configured to generate a Loren in a direction in which the movable portion is moved to the position where the electrostatic force is increased by = 1 The microactuator of claim 3, wherein the movable: is set such that A moves between the position of the 帛i and the position where the electrostatic force is reduced or disappears, and can be generated. The restoring force 5 to be restored to the second position, the micro-actuator according to item 4 of the patent application, the second portion of the electrode portion, and the collimation of the mouthpiece from the % pole portion; When the movable portion is mechanically connected to the first position by the flexible portion, the interval between the m9: the movable portion and the electrode portion of the second portion is narrowed, and the movable portion is located at the first portion. 2 仞 卩 & & 卜 ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° ° 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该a microactuator in which the electrode portion of the fixed portion 42 1274200 is fixed, and the fourth electric portion and the portion of the third electrode portion In the third electrode portion, the movable portion I has a second electrode portion capable of generating an electrostatic force between the third electrode portion and the third electrode portion. 7. The microactuator according to the sixth aspect of the patent application, 苴中哕 5 5 5 5 5 ... ... ... ... ... ... : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : And the first = the direction of the sneak force, the first position is the first and second == the electrostatic force is increased, and (4) 3 and the "the position between the poles is lowered or disappeared, the second position A position at which the electrostatic force generated between the first =2 electrode portions is reduced or disappeared, and the electrostatic force generated between the third and fourth electrode portions is increased. Lie 9, as in claim 8 The microactuator, wherein the movable portion is provided to generate a restoring force to be restored to a predetermined position between the second and second positions. 10. The microactuator according to claim 9, wherein The first electrode portion is disposed opposite to the second electrode portion on one side of the movable portion. The third electrode portion is attached to the movable portion. One side is disposed opposite to the fourth electrode portion; wherein the movable portion is mechanically coupled to the fixed portion by a resilient elastic portion such that the movable portion is located at the third position, the third and the third The second interval between the two electrodes is reduced, and the second interval between the third and fourth electrode portions is increased. When the movable portion is located at the second position, the first interval is increased and the second interval is increased. 43 1274200 The restoring force is generated by the elastic portion. A microactuator device comprising: a microactuator according to claim 1 of the patent scope; a magnetic field generating unit The magnetic field is generated, and the control unit controls the current of the first current path. Between the power and the current, the micro-actuation of the U-part of the patent application scope: control the "and the current, in the movable part to the i-th, (four) moving day" The Lorentz force or the Lorentz force and the electrostatic force ". The movable portion moves to the first position; and the guaranteed portion 2 holds the movable portion at least at the position of the 帛1, and the second 'Controlling the voltage to maintain the movable portion at the first position ' by the electrostatic force and controlling the current to prevent it from flowing. 13. A microactuator device characterized by having: a microactuator according to item 6; a field generating portion that generates the magnetic field; and a third system for controlling a voltage between the first and second electrode portions, a voltage between the first and second electrodes, and a flow rate The current of the current path is the micro-actuator device of the thirteenth aspect of the invention, wherein the first system controls the voltage between the first and second electrode portions, and the third is in the fourth The voltage between turns, and the current flowing through the current path, by the 9 o'clock, by the Lorentz force, or The movable: and the first and the "electrostatic force between the electrode portions move the moving portion to the first position; 44 1274200", the second system controls the voltage between the third and second electrode portions The voltage between the four electrode parts, ☆, two #, in the movement of the current 2 position of the movable path, the borrowing and the error by the Lorentz force and the force to make the movable Qiu 4 The electrostatic force between the poles P moves to the second position; the security of the third portion and the first and second electrode portions of the first and second electrodes are maintained at the first position. The electric power between the grinding and the thighs of the department is used to make electricity through the first and second electrodes: to make: static! The force is held at the (four)1 position, and the motor is controlled to not flow; the control portion 'maintains the movable portion in the predetermined holding state, and the system is 兮β yt 拴The voltage between the electrode portions of the younger brothers 1 and 2 and the electric power between the third and fourth electrode portions are held by the electrostatic force between the third and fourth electrode portions. And controlling the current so as not to flow. U. An optical switch comprising: a microactuator of the scope of claim 1; and a mirror ' is disposed in the movable portion. 16. An optical switch array It is characterized in that it has a plurality of optical switches of claim 15 of the patent application scope, and the plurality of optical opening relationships are arranged in two dimensions. 1 7. The optical switch array of claim 6 of the patent application scope, wherein a circuit comprising a plurality of switch components, wherein the circuit selects a signal according to a row of the plurality of optical switches and selects a signal of each of the plurality of optical switches 45 1274200 for the selected row and column of optical switches The current and the voltage Picking up one control 0, drawings: Page summarized as follows 4646
TW092105761A 2002-09-05 2003-03-17 Micro actuator, micro actuator device, optical switch and optical switch array TWI274200B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2002/009023 WO2003024864A1 (en) 2001-09-17 2002-09-05 Micro-actuator, micro-actuator device, optical switch and optical switch array

Publications (2)

Publication Number Publication Date
TW200404174A TW200404174A (en) 2004-03-16
TWI274200B true TWI274200B (en) 2007-02-21

Family

ID=38623085

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092105761A TWI274200B (en) 2002-09-05 2003-03-17 Micro actuator, micro actuator device, optical switch and optical switch array

Country Status (1)

Country Link
TW (1) TWI274200B (en)

Also Published As

Publication number Publication date
TW200404174A (en) 2004-03-16

Similar Documents

Publication Publication Date Title
JP4089215B2 (en) Microactuator, and microactuator device, optical switch, and optical switch array using the same
US6480320B2 (en) Microelectromechanical mirror and mirror array
US20070024155A1 (en) MEMS digital linear actuator
JP2006174688A (en) Mems actuator
US6496612B1 (en) Electronically latching micro-magnetic switches and method of operating same
US10564385B2 (en) MEMS device for lens barrel positioning
JP4743742B2 (en) Magnetically actuated microelectromechanical system actuator
US7427877B2 (en) Level shift circuit, and actuator apparatus and optical switch system using same
AU2009242920A1 (en) MEMS device with independent rotation in two axes of rotation
US6618518B1 (en) Microelectromechanical optical cross-connect switches including row and column addressing and methods of operating same
CN100400411C (en) Microactuator device and optical switching system using the same
TWI274200B (en) Micro actuator, micro actuator device, optical switch and optical switch array
US7023124B2 (en) Micro-actuator array, micro-actuator device, optical switch, array, and optical switch system
WO2007004710A1 (en) Microactuator, optical apparatus, and optical switch
JP3670635B2 (en) Microactuator device and optical switch system using the same
JP4569161B2 (en) Microactuator array, optical device and optical switch array
US20110220470A1 (en) Electromechanical Actuator with Interdigitated Electrodes
JP4307886B2 (en) Electromagnetic actuator
JP4595373B2 (en) Microactuator, microactuator array and optical device
CN219916077U (en) Micro-electromechanical mirror device
JP2004133196A (en) Mirror tilting mechanism and optical switch using same
US20020191272A1 (en) System of angular displacement control for micro-mirrors
JP2007178587A (en) Micro actuator device, optical switch system, and optical equipment
JP2007074883A (en) Micro actuator device and optical switch system
JP2005342839A (en) Micro actuator array, optical device, and optical switch array

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees