1269606 九、發明說明： 【發明領域】 本發明係有關於一種有機電致發光顯示器及其製造方法，特 別是一種藉由在絕緣層圖形上定義圖形使其兼具絕緣層及阻隔壁 功能之有機電致發光顯示器及其製造方法。 【發明背景】 有機電致發光顯示器（organic electroluminescence display ; OELD)是平面顯示器（fjatpanei出印㈣）的一種，其整體架構包 έ基板，此基板上含有陽極層及陰極層，並於此二電極層中插 入一有機發光層。此架構是為使製作出來有機電致發光顯示器之 厚度能夠更薄，且亦可製作成矩陣型式的有機電致發光顯示器。 有機電致發光顯示器與電槳顯示器（plasma display pand ; PDP)之不同在於：電槳顯示器需要超過2〇〇伏特的高電壓才能驅 動，然而，有機電致發光顯示器只需要低於15伏特即可驅動，因 此適用於-般攜帶制設備。她於—般非放射型顯示器，例如： 薄膜電晶體液晶顯示H，有機電致發光顯示器不但具有較高的亮 度及較寬廣的視角，而且具有低於!微秒之反應速度。特別是在反 應速度上，有機紐發光顯示器之反應速度優於其他平面顯示 器，因此，非常適用於移動通信中之具有影像功能(m〇vingpictoe) 的IMT_2000行動電話。 然而’因為有機電致發光顯示器内部之有機發光層及陰極層 易氧化以及受潮，因此，其製程的環境必縣持密·態，以確 1269606 T作出㈣有機電致發光顯示器之可靠度。因此，有機電致發 、、、示u。的‘作無法利用一般的光微影（photolithography )製程 來製作像素或是定義圖形。 有機電致發光顯示器之有機像素（pixdlati〇n〇f〇rganic)及陰 極層是利用網罩(shadow mask)直接製作，如此一來，可避免利用 光微影（photolithography)製程中，曝光、蝕刻的步驟會使其結 構氧化及受潮，而降低其可#度。然而，如果為了達到高解析度 而減少像素_距（也就是有機層以及陰極層之間隔）時，就無 法採用這樣的製造方法。 … —另-種有機電致發光顯示器_定義的方式，是糊分隔線 來疋我陰極層關形，在基材及陽極層上，利用不導電的材料製 作出絕緣層及分隔線，以定義陰極層的圖形。 在此方法巾，絕緣層是形成於整鶴極層之上，除了陽極層 之點狀的開π區域之外。由絕緣層來定義像素，可^由陰極^ 緣所產生之漏m因為在垂直謂極層之分隔線之陰影效声 =d〇W ef㈣’會使得卿疊上之錢發光層在接近分隔線處會 較溥’以防止陽極與陰極在二者邊緣處所產生的短路現象。 =形狀絕料上之分隔祕横跨於馳層之上，且彼此間 係保持-段雜，且形成-突起之結構，以防姆極層中相鄰兩 像素會產生祕的現象。且不同於—般的圖形定義之製程，此種 結構中需形成-負型側面(negative pr〇flle)，以防止陰極層中相鄰 1269606 如果沒有此分隔線結構，則相鄰的像 兩像素會產生短路的現象。 素有可能會產生短路的現象 為^地製造有機致電發光顯科，絕緣層和分隔線之製 =有义要的。然而，每一步的製程均需用到光微影 P otolithography)製程來製作，因此，增加了製作上的複雜性， 同時也增加了有機致光顯示H之製作成本。 接者’列舉-種習知之有機致電發光顯示器之製造方法，其 製作方法說明如下： 月ΐ考第1A圖』所示，婁文個由氧化銦錫如出咖如〇^此.則 或類似成分形成之第-電極2，以條狀的形式形成於透明基紀之 上0 如『第1B®』所示，格子狀的絕緣層卿3，疊堆在第一電極 2和透明基板1上，⑽第—電極2之±形成雜開口。 接著’請參考『第1C圖』所示，分隔線4形成於絕緣層圖船 之上，且在點狀開口之間，以橫跨第一電極2。有機電致發光細 中未示)與第二電極層(陰極層；圖中未示)係疊堆於第—電極/、奶 緣層圖形3及分隔線4之上。 、巴 為上述習知之有機致電發光顯 『第1Α〜1C圖』中Α，面線 請參考『第2Α〜2C圖』所示， 示器製程之剖面圖，此剖面圖是沿 所繪製之剖面圖。 如『第2Α圖』所示，選擇氧化銦錫或是類似的物質作為陽極 ::==將其製〜板1之上，其所需 、疋接者’將光阻劑(圖中去 、 上，並利用曝光、孽參的方 $凡全塗佈於陽極層之 圖案(圖中未示），接Γ 在陽極層上，形成條狀的光阻齊,! 層，最後，移除先阻劑即形成條狀的第_乍電 =到罩幕’韻刻陽接 接著，請參考『第2Β圖』所示 透明基㈣第-細之上，_㈣f層(财未示)叠堆在 域之賴_，此麵材财為_、紐劑 4基材料，而其中光阻劑亦包含丙稀醆 可使用氧化石夕、氮化Up、 …、栻材枓方面， 4。祕切之類的材料，作為_ 層之材料。而絕緣層圖形3係為狄 β 繁 極2之上。 ⑽係為格子狀《堆於透明基板1和第一電 田然後，請參考『第2C圖』所示，一負型有機光阻細 登堆於絕緣層圖形3之上，此負型 不） MW阻層倾科導電的材 科，並利用可定義出圖形的製程製作出分隔線4。此分隔線 於絕緣層圖形3之上，且在糊口之間，並橫跨第-電極2。、而 分隔線4係一向上突出之結構，此設計主要是為防止第二電極6和 周圍的7G件產生短路的現象。而接下來的有機發光層5及第二電 6，係利用網罩依序堆疊上去。 為了防止«發光層5與第二電極6(陰極層)氧化及受湖，因 此，需在整個結構(亦包括第二電極6)的表面上形成一概括層 9 1269606 (enCapsulation layer)或是一保護層___匕㈣，此概括層献 射為金屬、玻璃，或是其他類_材料，而賴層可為有機或 是無機材料所組成’儀此概括層或是保護層，即可使有機致電 發光頭示器與外界隔絕，且完全密封。 而『第3A〜3C圖』所示為此習知之有機致電發光顯示器製程 之剖面圖，但此剖面圖是沿『第1A〜1C圖』中抑，剖面線所緣製之 剖面圖。 ，者，W考『第4A，』所示為另_種習知之有機電溶 發光顯示器的電路示意圖。 •如『第4A圖』所示’數個由氧化銦錫或類似成分形成之第一 屯極2 ’以條狀的形式形成於透明基板1之上。 一…、後Μ麥考『弟4B圖』所示’條狀的絕緣層圖形3堆疊於第 -電極2和透明基板工之上，並橫跨第一電極2。 —_ ’如『第4C圖』所示’—光阻層7形成於透明細、第 :::緣層_之上，此光，不能覆蓋到窗口8，並開 “-電極2,及職層_ 3中與絕緣層_ =外界接觸。赌9簡__㈣麵鱗糊们之二 =而成，确刻之厚度可事先決定。此極 2上開啟整體的晶格形狀之窗口㈣书極 -電極2、㈣及第二電極之上(圖 而『第減圖』為上述有機致電發光顯示器製程之剖面 10 1269606 此剖面圖是沿『第4A〜4C圖』中a_a，剖 請參考『第5榻』所示，選擇氧化 極層瞧咖撕，獅辦為陽 之上，而陽極層所需厚度可事 ^ 土板1 完全塗佈於陽炻思4 香將先阻劑(圖t未示） 、&極層之上，並糊曝S、顯影的方法 形成條狀的光阻劑€_ 和層上， 幕，極層：中未二 再將4❹ 光阻劑即形成條狀的第-電極2。 、巴緣“圖中未示)疊堆於透明基板1與第 上，以達到不導電的目的。此絕緣層可由氧切、氮化二” 石夕化合物妓類_材#所域，而絕緣層的製作方法可利= ’例如··餐化學氣她積或是其他_ 作: 接者’概微影物在絕緣層上形成絕緣層_3，此圖^之 2安排是為使每個陶之_，隔，並使其橫跨第一電極 然後如弟5B圖』所示，將一正型朵 形3之上，此正型光阻_使用不以植層7塗佈於絕緣層圖 她層7係使用不導電的材料，接著，將此正型 伽之峨㈣使其裸露出 ’亦將絶緣層圖形3中央與絕緣層圖形3平行的部份裸霖 出來。 σ 接著，如『第5C圖』所示，溝槽9係藉由以正型光阻層 侧罩幕，铜絕緣層圖形3中央的部份，以形成溝槽9 ’而每二 11 1269606 ㈣Γ之拍為長方形，其剖面亦可為梯形或是半圓形。此溝槽 構之主要目的是為防止相鄰的第：電極產生短路的情形。 接著，細f錢發_財絲财 豐於上述結構之上。 、口 丁不7 為了 錢贱層與第二電極(陰極她化及受潮，因此， ;在整個結構(亦包括第二電極)的表面上形成一概括層 鳴如)或是一保_assivati〇^ ^為金屬、玻璃，或是其他類似的材料，而保護層可為有機或 ^機材觸域，_此概括層或是賴層，即可使有機致電 毛先頒不包括第二電極的部份)與外界隔絕，且完全密封。 但是’由上述習知技術所製作之有機致電發光顯示山器含有以 下之缺點： 、士絕緣層的圖形定義出每個像素，可防止漏電流從陰極的邊緣 肌出^肋陽極層無極層在陽極層與陰極層邊緣之短路現 象。堆疊上錢有機發光層由於垂直於陽極層方向的分隔線所產 生之陰影效應，在接近分隔線的部份會變得較薄。此分隔線是形 成於％緣層之上，並橫跨陽極，且每個分隔線之間保持有—定的 距離’而每個分隔線之結構皆為向上突出之結構，以防止陰極層 與其附近的元龍生短_絲。細，在結構上縣持有一凹 陷⑽gati，側剖面圖形，以防止相鄰的陰極產生短路的情形。 因此’為能狀地製作有機致電發光顯示器，絕緣層和分^線的 12 ί2696〇6 =作都是必要的’但每個製程皆需應關光微影製程，因此，伏 韻的過程複，且增加有機致電發光顯示器之製作成本。 【發明之目的及概述】 “鐾於以上習知技術的問題，本發明之目的在於提供一種有機 =欠毛光#不②及其製造方法，藉由已定義好圖形的絕緣層，同 時兼具絕緣體及隔離板的功能，以提高顯示器之開口率，並簡化 製程及降低製作成本。1269606 IX. INSTRUCTIONS: FIELD OF THE INVENTION The present invention relates to an organic electroluminescent display and a method of fabricating the same, and more particularly to a function of defining an insulating layer and a barrier wall by defining a pattern on an insulating layer pattern. Electroluminescent display and method of manufacturing the same. BACKGROUND OF THE INVENTION An organic electroluminescence display (OELD) is a type of flat panel display (fjatpanei printing (4)), and its overall structure comprises a substrate having an anode layer and a cathode layer, and the two electrodes thereon. An organic light-emitting layer is inserted in the layer. This architecture is an organic electroluminescence display in which the thickness of the organic electroluminescent display can be made thinner and can be made into a matrix type. The difference between an organic electroluminescent display and a plasma display pand (PDP) is that the paddle display requires a high voltage of more than 2 volts to drive. However, the organic electroluminescent display only needs less than 15 volts. Driven, so it is suitable for general carrying equipment. She is a non-radial display, such as a thin film transistor liquid crystal display H. The organic electroluminescent display not only has a high brightness and a wide viewing angle, but also has a reaction speed lower than ! microseconds. Especially at the reaction speed, the organic neon display is faster than other flat-panel displays, so it is very suitable for IMT_2000 mobile phones with video function (m〇vingpictoe) in mobile communication. However, because the organic light-emitting layer and the cathode layer inside the organic electroluminescence display are easily oxidized and damp, the environment of the process must be kept in a state to ensure the reliability of the organic electroluminescent display (1). Therefore, organic electricity generates, and shows u. The ‘can’t use the usual photolithography process to make pixels or define graphics. The organic pixel (pixdlati〇n〇f〇rganic) and cathode layer of the organic electroluminescent display are directly fabricated by using a shadow mask, thereby avoiding exposure and etching in a photolithography process. The steps will oxidize and damp the structure, reducing its degree. However, if the pixel_distance (i.e., the interval between the organic layer and the cathode layer) is reduced in order to achieve high resolution, such a manufacturing method cannot be employed. ... - another type of organic electroluminescent display _ defined way, is a paste separation line to 阴极 my cathode layer shape, on the substrate and anode layer, using non-conductive materials to make insulation layer and separation line to define The pattern of the cathode layer. In this method, the insulating layer is formed on the entire pole layer except for the point-like open π region of the anode layer. The pixel is defined by the insulating layer, and the leakage m generated by the cathode edge can be made because the shadow effect of the vertical line of the vertical layer is d=W ef(4)', so that the light emitting layer on the stack is close to the dividing line. It will be awkward to prevent short circuits between the anode and cathode at the edges. = The shape is desperately separated across the layer, and the structure is kept in-segment, and the structure of the protrusion is formed to prevent the adjacent two pixels in the m layer from generating a secret phenomenon. And unlike the general definition process of the pattern, the negative side (negative pr〇flle) needs to be formed in this structure to prevent adjacent 1269606 in the cathode layer. If there is no such separation line structure, the adjacent image is two pixels. A short circuit can occur. It is possible that a short circuit may occur. The organic electroluminescent system, the insulating layer and the separation line are manufactured. However, each step of the process needs to be fabricated using a photolithography process, thereby increasing the complexity of the fabrication and increasing the manufacturing cost of the organic photo display H. The receiver's enumeration - a method of manufacturing a conventional organic light-emitting display, the description of which is as follows: Figure 1A of the monthly test, the inscription of indium tin is as good as 咖 ^. The first electrode 2 formed of a component is formed in a strip form on the transparent base. As shown in FIG. 1B, the grid-shaped insulating layer 3 is stacked on the first electrode 2 and the transparent substrate 1. (10) The first electrode of the electrode 2 forms a heterojunction. Next, as shown in Fig. 1C, the dividing line 4 is formed on the insulating layer boat and between the dot openings to straddle the first electrode 2. The organic electroluminescent thin film (not shown) and the second electrode layer (cathode layer; not shown) are stacked on the first electrode / the milk edge layer pattern 3 and the separation line 4. For the above-mentioned conventional organic call-emitting illuminating "1st ~ 1C picture", the upper line, please refer to the "2nd ~ 2C picture", the cross-section of the display process, this section is along the drawn section Figure. As shown in the "Picture 2", select indium tin oxide or a similar substance as the anode::== Make it on the plate 1 above, and the required, splicer' will be the photoresist (in the figure, On the upper side, and using the exposure, the surface of the ginseng is fully coated on the anode layer (not shown), and then connected to the anode layer to form a strip of photoresist, ! layer, finally, remove first The resist is formed into a strip of the first 乍 乍 = = to the mask 'the rhyme of the yoke, then please refer to the second section of the transparent base (four) on the first - fine, _ (four) f layer (not shown) stacked The domain is based on _, this face material is _, ton 4 base material, and the photoresist also contains acrylonitrile can be used oxidized stone eve, nitriding Up, ..., coffin 枓, 4. Secret cutting The material of the class is used as the material of the _ layer, and the pattern of the insulating layer 3 is above the D-type Pole 2. (10) It is a grid-like pattern "Stacked on the transparent substrate 1 and the first field. Then, please refer to "2C" As shown, a negative organic photoresist is deposited on the insulating layer pattern 3, which is not a MW barrier layer, and a separation line 4 is formed by a process that defines a pattern. This separation line is above the insulating layer pattern 3 and between the pastes and across the first electrode 2. Further, the dividing line 4 is a structure which protrudes upward, and this design is mainly for preventing a short circuit of the second electrode 6 and the surrounding 7G member. The next organic light-emitting layer 5 and the second electricity 6 are sequentially stacked by using a mesh cover. In order to prevent the oxidation layer 5 and the second electrode 6 (cathode layer) from being oxidized and subjected to the lake, it is necessary to form a generalized layer 9 1269606 (enCapsulation layer) or a surface on the entire structure (including the second electrode 6). Protective layer ___匕(4), this general layer is advertised as metal, glass, or other type of material, and the layer can be composed of organic or inorganic materials. The organic caller is isolated from the outside and completely sealed. The "3A to 3C" diagram shows a cross-sectional view of the conventional organic electroluminescent display process, but this cross-sectional view is a cross-sectional view taken along the line of "1A to 1C". In addition, the W test "4A," is a schematic circuit diagram of another conventional organic electro-luminescence display. • As shown in Fig. 4A, a plurality of first drains 2' formed of indium tin oxide or the like are formed in a strip form on the transparent substrate 1. The strip-shaped insulating layer pattern 3 is stacked on the first electrode 2 and the transparent substrate, and spans the first electrode 2, as shown in Fig. 4B. —_ ' As shown in Figure 4C' - the photoresist layer 7 is formed on the transparent thin, the ::: edge layer _, this light, can not cover the window 8, and open "-electrode 2, and Layer _ 3 with the insulation layer _ = external contact. Bet 9 Jane __ (four) face scales of the two = become, the thickness of the exact can be determined in advance. This pole 2 opens the overall lattice shape window (four) book pole - Electrode 2, (4) and the second electrode (Fig. "Different map" is the cross section of the above organic electroluminescent display process 10 1269606. This cross-sectional view is a_a along the "4A~4C", please refer to " 5 couches, as shown in the selection of the oxidation layer, the lion is torn, the lion is above the yang, and the thickness of the anode layer can be used. ^ The earth plate 1 is completely coated on the yang sisi 4 scent will be the first resist (Figure t not shown ), & on the pole layer, and paste S, development method to form a strip of photoresist ~ _ and layer, curtain, pole layer: in the middle of the 4 ❹ photoresist is formed into strips - Electrode 2. The rim (not shown) is stacked on the transparent substrate 1 and the top to achieve non-conducting purposes. The insulating layer can be in the domain of oxygen-cutting, nitriding two-way stone compound 妓_material#, and the manufacturing method of the insulating layer can be profitable = 'for example, the food chemical gas her product or other _ for: picker' The lithography forms an insulating layer _3 on the insulating layer, and the arrangement of this figure is to make each ceramic _, separate, and make it traverse the first electrode and then as shown in the figure 5B, Above the shape of the shape 3, this positive type photoresist _ is not coated with the implant layer 7 on the insulating layer. The layer 7 is made of a non-conductive material, and then the positive type gamma (4) is exposed. The portion parallel to the insulating layer pattern 3 is also exposed in the center of the insulating layer pattern 3. σ Next, as shown in Fig. 5C, the trench 9 is made of a positive photoresist layer side mask, copper insulating. The central portion of the layer pattern 3 is formed to form the groove 9' and each of the two 11 1269606 (four) Γ is rectangular, and the cross section thereof may be trapezoidal or semi-circular. The main purpose of the groove structure is to prevent adjacent No.: The situation where the electrode is short-circuited. Next, the fine f money is issued on the above structure. The mouth is not 7 for the money layer and the second electrode ( Extremely aging and damp, therefore, forming a general layer of sound on the surface of the entire structure (including the second electrode) or a _assivati〇^ ^ for metal, glass, or other similar materials, The protective layer can be an organic or a mechanical contact, and the general layer or the layer can make the organic caller first exclude the part that does not include the second electrode, and is completely sealed from the outside. The organic illuminating display device made by the prior art has the following disadvantages: The pattern of the insulating layer defines each pixel to prevent leakage current from the edge of the cathode muscle. The rib anode layer is in the anode layer and the cathode. Short-circuit phenomenon at the edge of the layer. The shadow effect of the organic light-emitting layer on the stack due to the dividing line perpendicular to the direction of the anode layer becomes thinner in the portion close to the dividing line. This dividing line is formed in the % edge layer. Up and across the anode, and each of the dividing lines maintains a certain distance 'and each of the dividing lines has a structure that protrudes upward to prevent the cathode layer from being short-lived with the nearby Yuanlong. In the structure The county holds a recessed (10) gati, side profile to prevent short-circuiting of adjacent cathodes. Therefore, it is necessary to make an organic light-emitting display for insulation, and the insulation layer and the line of 12 22696〇6 are necessary. 'But each process needs to be closed to the lithography process, therefore, the process of the rhyme complexes, and increases the manufacturing cost of the organic light-emitting display. [Object and Summary of the Invention] "The problem of the above conventional technology, the present invention The purpose of the invention is to provide an organic = under-lighting #不2 and its manufacturing method, by defining a patterned insulating layer, and simultaneously having the functions of an insulator and a spacer, thereby improving the aperture ratio of the display, simplifying the process and reducing production cost.
本發明之錢電致發賴衫的結構，主要包含有：數個條 :欠的第-細立於透明基板之上;再將一絕緣層圖形，堆疊於遂 土板及第&極之上，並橫跨第—電極；然後，將—半色調圖 形堆疊於透·板與第一電極層之間，此半色調圖形係由絕緣體 所構^ ;接著’將數層有機發光層疊加於第-電極層之上；最後， 數個第二電極於有機發光層之上。 而此有械包致發光頒示益之製作方法，包含以下的步驟··在 透明基板上形成數個條狀的第一電極；在第一區域及第二區域上籲 堆疊-絕緣層圖形，此第—區域係指橫跨第—電極的部份，而第— 二區域係指平行於第—電極的部份，而在第二區域之上，亦形成- 有-半色調圖片；接著，在第一電極之上形成數層有機發光層； 最後，形成數個第二電極於有機發光層之上。 為使對本發明的目的、構造特徵及其功能有進一步的了解， 茲配合圖示詳細說明如下： 13 I269606 【實施例詳細說明】 請參考『第6A〜6C圖』所示，兔太旅日日七士 下為本發明之有機致電發 器的第一實施例之電路示意圖；如『 尤'·、員不 乐0A圖』所不，將數 之 的第一電極22_#絲影的方法，將其形成於透日狀_ 上；構成第-電極22的材料可為氧化銦錫，或其他類似的成/ 而製作第-電極22的製程中，曝光時所使用的光翔形如『第以 圖』所示。 接著，請參見『第6B圖』所示，將—絕緣層畴23利用 色調光罩形餅第-電極22及翻紐21之上，此半色調光罩之 圖形如『第12B圖』所示，其圖形是為使絕緣層圖形^排列於第一 電極22之間’並橫跨第—電独。因此，可於第—電極a之上形 成裸露出來的窗口25，此窗口25係以製作晝素。而絕緣層圖卵 係為晶格簡列’錄第-電節之上，職窗σ25，以製作晝 素。 、旦 絕緣層圖形23中與第一電極22平行的部份為一半色調圖形 24 ’此平订於第—電極22部份的半色賴形24之厚度小於其他垂 直於第一電極22部份的絕緣層圖形23的厚度。 而半色調圖形24之形成，是為了防止從第_電極22之邊緣所 產生的料流’且為防止第二電極沉積上去之後，在絲層和第 I電極22間的邊界部份厚度較薄，可能造成電路的不能導通，而 弟龟極排列之方向係與第一電極22互相垂直。 14 1269606 接著，如『第6C圖』所示，溝槽29形成於每個絕緣層圖網 與第-電極22垂麵_央部份，係—正f姆光的光罩，如 『第12C圖』所示’然而’最好是可利用半色調曝光的光罩，進行 曝光，因為如彻半色婦光的光罩進行曝光，顯影後即可將預 定好的雜雜保留在結構上。絲若是使鼓常鄕光的光 罩’則需藉由控制顯影的時間，才能將所欲保留的光阻部份 下來。 μThe structure of the money electro-acupuncture shirt of the present invention mainly comprises: a plurality of strips: the underlying first-standing on the transparent substrate; and then stacking an insulating layer pattern on the alumina board and the & And over the first electrode; then, the halftone pattern is stacked between the transparent plate and the first electrode layer, the halftone pattern is constructed by an insulator; then 'multilayer organic light emitting layer is superimposed on Above the first electrode layer; finally, a plurality of second electrodes are above the organic light emitting layer. The method for manufacturing the mechanical encapsulation method comprises the following steps: forming a plurality of strip-shaped first electrodes on the transparent substrate; and calling the stack-insulation layer pattern on the first region and the second region, The first region refers to a portion spanning the first electrode, and the first region refers to a portion parallel to the first electrode, and above the second region, a -has-halftone image is formed; A plurality of organic light-emitting layers are formed over the first electrode; finally, a plurality of second electrodes are formed over the organic light-emitting layer. In order to further understand the object, structural features and functions of the present invention, the following is a detailed description of the following: 13 I269606 [Details of the embodiment] Please refer to "Figure 6A~6C", Rabbit Travel Day The seventh circuit is a circuit diagram of the first embodiment of the organic caller of the present invention; if the "European, the staff is not happy 0A", the method of counting the first electrode 22_# silk shadow will be The material constituting the first electrode 22 may be indium tin oxide, or other similar processes for forming the first electrode 22, and the light shape used in the exposure is as follows. Figure shows. Next, as shown in FIG. 6B, the insulating layer 23 is formed by the tone mask-shaped pie electrode-electrode 22 and the flip 21, and the pattern of the halftone mask is as shown in FIG. 12B. The pattern is such that the insulating layer pattern is arranged between the first electrodes 22 and spans the first electricity. Therefore, a bare window 25 can be formed on the first electrode a, and this window 25 is used to fabricate a halogen. The insulation layer is a lattice diagram of the 'recording-electrical section, and the job window is σ25 to make the element. The portion of the insulating layer pattern 23 that is parallel to the first electrode 22 is a halftone pattern 24'. The thickness of the half-color spacer 24 that is flattened to the portion of the first electrode 22 is smaller than the other portion perpendicular to the first electrode 22. The thickness of the insulating layer pattern 23. The halftone pattern 24 is formed to prevent the flow generated from the edge of the first electrode 22 and to prevent the second electrode from being deposited, and the thickness of the boundary portion between the wire layer and the first electrode 22 is thin. It may cause the circuit to be incapable of being turned on, and the direction in which the turtles are arranged is perpendicular to the first electrode 22. 14 1269606 Next, as shown in FIG. 6C, a trench 29 is formed in each of the insulating layer net and the counter electrode of the first electrode 22, which is a photomask of positive light, such as "12C". The illustration, however, is preferably a reticle that can be exposed with a halftone, for exposure, because the reticle, such as a half-tone, is exposed to light, and the predetermined impurities are retained on the structure after development. If the wire is a hood that causes the drum to be often lighted, it is necessary to control the development time to partially remove the photoresist to be retained. μ
形成此溝槽29結構之主要目的，是為防止相鄰的第二電触 產生短路的情形。接著’依序將有機發光層（ϋ中未示）及第二 電極(陰極層，圖令絲）堆疊於第—電船與窗心之上。一 请翏考『第7Α〜7C圖』所示為本發明之有機致電發光顯示器 的第-實施例之製程剖面圖，此剖.面圖係沿著『第We圖』中 A_A'剖面線鱗製。由於此·線A.A，闕窗σ25，因此在『第 7Β〜7C圖』的剖面圖中，不會看到半色調圖形2払The primary purpose of forming the structure of this trench 29 is to prevent shorting of adjacent second electrical contacts. Next, the organic light-emitting layer (not shown) and the second electrode (cathode layer, patterned wire) are sequentially stacked on the first electric boat and the window core. Please refer to "7th to 7th" for the process section of the organic light-emitting display of the present invention. The cross-sectional view is along the line A_A' in the "We Wei" system. Since the line A.A and the window σ25, the halftone pattern 2 is not seen in the sectional view of the "7th to 7th".
如『第7Α圖』所示，先準備一透明基板2卜此透明基板21 為玻璃、石英、塑膠或是類似的材料。接著，將厚度為麵〜肅 的陽極層堆$於透明基板21之上，此陽極層的材料可選自氧化 錫、氧化銦鋅⑽iUmziMde ; ΙΖ〇、Ιχ〇)或是類似的材料， 陽極層之細仙等I蚊俯。_層絲由直空; 積的方法’例如：雜、化學動目沉鮮方式，沉積於清潔跑 透明基板21之上。接著，將s 设嘗骑先阻層（圖中未示）塗佈於陽極層: 15 1269606 上利用。有陽極圖形的光罩，對此光阻層進行曝光、顯影， 以形成條㈣光關形(财絲），彻此顯影光關形作為 侧罩幕，觸極層進行侧，綱完之後，再將光阻去除，即 形成條狀的第一電極22。 然後，請參考『第7B圖』所示，為防止從第-電極22之邊緣 產生之漏電流，並預防第—電極22和第二電蝴之後製作)間所造 成馳路現象’以及為防止第二電極28與其周圍圖形的短路，因 此，必須形成-絕緣層。本發明係利用一光阻層（圖中未示）， 來防止第-電極22和第二電極2δ(之後製作)間的短路現象，此光阻 層具有不導電的特性。 將一具有圖形轉換性質的光阻層塗佈於透明基板狀第一電 極22之上。本發明所採用的光阻為ΑΖ5214Ε，此種光阻為係為正 型先阻’而塗佈光阻層之厚度為1〜5卿，最好是在3〜_之間。然 而’此光阻一旦被過度曝光，並在常溫下進行加熱細常超過⑽ C) ’此光阻之正型光_性質會被轉換為負型光阻的性質。 在塗佈上光阻層之後，接著進行爾_掀剛，此麟的 ^件係為靴.，此麵如轉線層烤乾。紐，形成一 絕緣層圖形23，此絕緣層圖形23係利用一半色調曝光光罩所製 成’而此半色調曝光的光罩圖形如『第12β圖』所示。此絕緣層圖 =3平仃於第—電極22的部份為—半色調圖形24，如『第_』 斤丁可k擇性的製作，並保持彼此間一預定之距離。此半色調 16 !2696〇6 圖形24之高度低於絕__23其他的部份，而半色麵形处 厚度最好低卿叫嘴其厚度可藉_整半色調曝絲罩中之 半色調面積之開口率，來控雛厚度，而此半色瓣光光罩之圖 形如『弟12Β圖』所示。 此絕緣層平行於第-電極22的部份是由半色細形％形成， 以降低光阻屬的厚度。此目的是為防止第二電卿沉積上去之 後，在光阻層和第-電極22間的邊界部份厚度㈣，可能造成電 路的不4通。在曝光之後’接著進行顯影，以形成絕緣層圖形 23。 然後，如『第7C圖』所示，在顯影製程之後，將此結構利用 風刀(airknife)或是高速旋轉的方式使其風乾，献步驟需在1〇此 以下的溫度進行。接著，進行第二次的曝光，此次曝光是為形成 溝槽，以分隔第二電極’此次曝光所使用之光罩圖形如『第Μ圖』 所示。在第二次曝光之後’進行逆轉曝光(㈣㈣^㈣，其操作 條件為120tM40秒，由於曝光過量，會使得光阻層的性質改變， 因此剛才曝光到的部份會保留下來，而沒曝光到的部份則會顯影 掉。 在弟二次曝光之後，每個絕緣層圖形23與第一電極22垂直的 中央抽’其寬度會往上漸窄。或是，絕緣層圖形23與第一電極 22垂直財央部份，在使用半色調光料，其接受_曝光量較 少，以形成此種形狀的結才冓，而絕緣層圖形23其他的部份均曝到 17 1269606 光。 在每個絕緣層圖形23與第-電極22垂直的中央部份，經由一 顯影的步驟，可形成-溝槽26，此溝槽26是用以隔絕每個相鄰的 像素’溝槽26的深度需大於之後沉積上的有機發光層27及第二電-極28的總厚度。絲26的深度最好大於沉積上之有機發光層27及. 第二電極28總厚度的二倍，而本發明之溝槽％深度約為一。 最好，能在溝槽26之底部塗佈上一定量的光阻層，以防正沉 積於溝槽26内作為第二電極之金屬與第一電極碑生短路的現籲 象。因此’形纽溝槽26之鮮最好為半色調光罩，如果是正常 調光罩，則需控麵影的時間’以保留一預定量的光阻層於溝槽 26之中，而保留之光阻層的厚度最好超過〇 5_。 接著將此透明基板21進行後烤&〇st_趾㈣），以便將其送到 -真空沉積的機③、巾’進行沉積有機發光層27的動作。將一有機 發光層27堆疊於透明基板21及絕緣層_23之上，此有機發光層 27之材料可由發光低分子材料、發舰低分子材料或是高分子有_ 機發冷光材料所組成；在發紐分子材料方面，例如：8_經基絡 合物(Alq3)、anthrancene ;在發磷光低分子材料方面，例如：銥， 的化合物-Ir(PPy)3及其衍生物；而在高分子有機發冷光材料方面， 例如：PPV[p〇ly(phenylenevinylene)]、pT(p〇lythi〇phen_，及其 衍生物。以低分子為基礎之材料，可個熱級的方法定義其圖 形；而以高分子為基礎之材料，可由旋轉塗佈、轉錄(transcripti〇n)、 18 1269606 嘴墨丄或疋其他類似的方法在已設計好的位置形成所欲之形狀。 當使用則、分子騎機發線7的基礎材料時，陽極電洞的 注入及傳輸效率，可藉由在形成有機發光層27之前先形成 ^於雪〆h〇lemjeCtl〇nlayer)及一1洞傳輸層，此電洞傳輸層係形 成於電雕人叙岐上，吨升電_狀及傳輪效率。而陰 極電子的注人效率，可藉由在有機發光紋之上，形成電子傳輪 及注入層，以提升電子敝人效率。當使用—個具有高工作功能 的電洞注人·作為電洞注人層時，此電祖人層係為一有機薄 膜m大量軸，並可使電嶋嶋。而此電洞私 ，層係為有機_ ’其具有禁錢子注人其中之特性，轉使“ 子注入時，亦防止電子在其中移動。 田电 =外’若使用—具有低功魏之電子注人電極作為電子注 旦層τ τ利用-有機薄膜作為電子傳輸層，此有機薄膜含有大 置的電子注入在其中，並且可使電子在其内移動。而此電子 層係為有機薄膜，其具有禁止電洞注人其中之特性，且即使當電 洞注入時，亦防止電洞在其中移動。 田电 當使用以高分子為有機發光層27的基礎材料時，里不同於以 低分子縣__之處松：在_鴻極H溶 及有機發光層。 & ^ 用一 第二電極28形成於透明基板2〗及有機發光層27之上，它是利 框架形狀的光罩，賴啟元件所在的區域，此光罩的圖:如 19 1269606 『第13A@』_。此第二電極28主錢彻具有高導電度的材 料’例如：銘、健化合物、銀化鎂、名，等類似的成份所組成， :第，電極28可藉由真空沉躺方法，例如：舰、電子束、熱 减等方式’堆疊上去。而域護有機發㈣免於受潮及氧化， 因此’需在透明基板2!及第二電極28之上，形成—概括層 (⑽ Nation layer)或是一保護層 _ivati〇n i 料可為金屬、玻璃，或是其他類似的材料，而保護層可為有機或 是無機材料所組成，·此概括層或是賴層，即可使有機致電 發光顯不器（包括第二電極28)與外界隔絕，且完全密封。 如『第8A〜8CS1』所示，為此有機致電發光顯示器的第一實 施例之製程剖關，此剖面圖係沿著『第6A〜6C圖』中b_b，剖面^ 所纷製，所以『第㈣C圖』+，可看到半色賴形24之^度薄 於其他絕緣層圖形23部份的厚度。 接下來，請蒼考『第9A〜犯圖』所示，為本發明之有機致電 务光_示态的第二實施例之電路示意圖，其製程說明如下： —如『第9A圖』解，在透明基板41之上，形成數個條狀的第 —電極42 ’形成此第-電極42的材料可為氧化轉或是其他類似 的材料，而其曝光時所使用光罩之圖形如『第12A圖』听示。 接著，如『第9Βϋ』所示，在透明基板41及第一電極42之上， 形成一絕緣層圖形43，此製程所使用的半色調光罩如『第ΐ2β圖 所示，此圖形可將絕緣層圖形43形成在第一電極42之間，並可才= 20 1269606 =第:電齡懈ι抛塊崎伽 在弟-電極42之上，形成裸露出來的窗口# ， 後形成像素的位置。 商口 45即為之 在絕緣層_4种平行於第—電極如 ，θ 形44，此半色調圖形44的高度 疋半色調圖 译。"… 魏於㈣層圖糊其他部份的言 又半色调圖形44要做得較薄的原因是：由於沉積上—门 電極48(财未示)在雜層的邊緣及第 、便 薄，因此可能會造成電路上的不能導通，所^會便付較 作得較尊，以處^ 將+色調圖形44 4 €的第二電極48能夠全部都導通，不合 有電路不導通的現象。第— 曰 &互相垂直。 I紐御成的位置，是與第-電極 月，考第10Α〜10D圖』所示，為本發明之第二實施例的製 ^ rS9A^9Bs j 緣製。由於此剖面線A.A卜是經過窗吨的位置，因此，在『第 應〜10C®』的_中，不會出現半色調圖形糾。 、如『弟1〇Α圖』所示，先準傷一透明基板41，此透明基板41 可為玻肖；5英、塑|或是類似的材料。接著，將厚度為1·〜2_人 觸極細中絲)堆疊於透縣板41之上，此陽極層材料可選自 氧化銦=、氧化轉(mdium _，·肋、^狗或是類似的材 料此陽極層之片阻值約等於或是小於觀/⑽〕。而陽極詹之製 作’係藉由真空沉積的方法，例如：濺鍍等方式，沉積於清潔過 1269606 的透明基板41之上。接著’將—光阻細中未示)塗佈於陽極層之 上，並利用-具有陽極層_的光罩，對此光阻層進行曝光、顯 影，以形成條狀的光阻圖形(圖中未示），利用此顯影過的光阻圖形 作為侧罩幕，觸極層進行_，_完之後，再將光阻去除， 即形成條狀的第一電極42。 接著’請參考『第1_』所示，為防止從第-電極42之邊緣 產生之漏電流，並獅第—電極42和第二電極48(之後製細所造 成的短路縣，以及為防止每㈣二電極48之間所造成的短路現 象’因此’必須形成-絕緣層，以防止短路的發生。本發明係利 用-光阻層（圖中未示），來防止第一電極42和第二電極侧的短路 現象，此光阻層具有不導電的特性。 然後，將-光阻層塗佈於透明基材41之上，此光阻層塗佈白! 厚度為1〜5,之間，最好是在3〜_之間。再半色調曝光夫 罩(圖中未示)形成-絕緣層圖形43 ,此絕緣層圖形43是利用二 =光罩猶，如『_』所示，此絕緣層_平行於 弟-電極42的部份為半色調_44，且此半色調_街選擇怡 的製作。此半色調圖形44是利用一半色調曝光光罩卿成，盆严 ^於絕緣制形43其他的部份，硫厚度的控制可藉由控^ =而妙__之錢，喊厚___以下: ㈣予又可融罐半色調曝光鮮中之半色觸積之開As shown in the "Fig. 7", a transparent substrate 2 is prepared first, and the transparent substrate 21 is made of glass, quartz, plastic or the like. Next, the anode layer stack having a thickness of a surface is disposed on the transparent substrate 21. The material of the anode layer may be selected from the group consisting of tin oxide, indium zinc oxide (10) iUmziMde, tantalum, niobium or the like, and an anode layer. The fine fairy and other I mosquitoes. The layered wire is formed by a straight space; a method of accumulation, for example, a hybrid, chemically immersive manner, deposited on the clean running transparent substrate 21. Next, apply the s-first resist layer (not shown) to the anode layer: 15 1269606. a photomask having an anode pattern, the photoresist layer is exposed and developed to form a strip (four) light-off shape (finished silk), and the developed light-off shape is used as a side mask, and the striking layer is performed on the side. The photoresist is removed again, that is, the strip-shaped first electrode 22 is formed. Then, please refer to "Fig. 7B" to prevent the leakage current generated from the edge of the first electrode 22, and prevent the path phenomenon caused between the first electrode 22 and the second electric butterfly. The second electrode 28 is short-circuited with its surrounding pattern, and therefore, an insulating layer must be formed. In the present invention, a photoresist layer (not shown) is used to prevent a short circuit between the first electrode 22 and the second electrode 2δ (which is subsequently fabricated), and the photoresist layer has a non-conductive property. A photoresist layer having pattern switching properties is applied over the transparent substrate-like first electrode 22. The photoresist used in the present invention is ΑΖ 5214 Ε, and the photoresist is a positive resistive ‘ and the coated photoresist layer has a thickness of 1 to 5 qing, preferably between 3 and _. However, once the photoresist is overexposed and heated at room temperature, it often exceeds (10) C) The positive light of the photoresist is converted to the properties of the negative photoresist. After the photoresist layer is applied, it is then carried out, and the ligament of the lining is a boot. This side is baked as a layer of a turn. Numerously, an insulating layer pattern 23 is formed which is formed by a halftone exposure mask, and the halftone exposure mask pattern is as shown in Fig. 12#. The insulating layer pattern = 3 is flat on the portion of the first electrode 22 - a halftone pattern 24, such as "the first", can be made selectively and kept at a predetermined distance from each other. The halftone 16 !2696〇6 The height of the figure 24 is lower than the other parts of the __23, and the thickness of the half-color surface is the best. The thickness of the half-color is called the thickness of the mouth. The aperture ratio of the area is used to control the thickness of the chick, and the pattern of the half-color flap reticle is as shown in the figure of "Dia 12". The portion of the insulating layer parallel to the first electrode 22 is formed by a half-color fineness % to reduce the thickness of the photoresist. The purpose of this is to prevent the thickness of the boundary portion between the photoresist layer and the first electrode 22 after the deposition of the second electrode, and the circuit may not be connected. Development is then carried out after the exposure to form the insulating layer pattern 23. Then, as shown in Fig. 7C, after the development process, the structure is air-dried by means of an airknife or a high-speed rotation, and the step is performed at a temperature of 1 〇 or less. Next, a second exposure is performed. This exposure is to form a trench to separate the second electrode. The mask pattern used for this exposure is shown in FIG. After the second exposure, 'reverse exposure ((4)(4)^(4), the operating condition is 120tM40 seconds, due to excessive exposure, the properties of the photoresist layer will change, so the exposed part will remain, but not exposed The portion is developed. After the secondary exposure, the width of each of the insulating layer patterns 23 perpendicular to the first electrode 22 is gradually narrowed upward. Alternatively, the insulating layer pattern 23 and the first electrode 22 vertical central part, in the use of halftone light, it accepts less exposure, to form a knot of this shape, while the other parts of the insulating layer pattern 23 are exposed to 17 1269606 light. The central portion of the insulating layer pattern 23 perpendicular to the first electrode 22 can form a trench 26 via a developing step, which is used to isolate the depth of each adjacent pixel 'groove 26 Greater than the total thickness of the organic light-emitting layer 27 and the second electrode-electrode 28 deposited thereon. The depth of the wire 26 is preferably greater than twice the total thickness of the organic light-emitting layer 27 and the second electrode 28 deposited thereon, and the present invention The groove % depth is about one. Preferably, it can be in the groove 26 A certain amount of photoresist layer is coated on the bottom to prevent the current deposition in the trench 26 as a short circuit between the metal of the second electrode and the first electrode. Therefore, the shape of the shaped trench 26 is preferably The halftone mask, if it is a normal dimming mask, needs to control the time of the mask to retain a predetermined amount of photoresist layer in the trench 26, and the thickness of the remaining photoresist layer preferably exceeds 〇5_. Then, the transparent substrate 21 is post-baked & 〇st_toe (four)) to be sent to the vacuum deposition machine 3, the towel' to perform the operation of depositing the organic light-emitting layer 27. An organic light-emitting layer 27 is stacked on the transparent substrate 21 and the insulating layer _23. The material of the organic light-emitting layer 27 may be composed of a luminescent low-molecular material, a low-molecular material, or a polymer-based luminescent material; In the molecular material of the hairpin, for example: 8_base complex (Alq3), anthrancene; in the case of phosphorescent low molecular materials, such as: 铱, the compound -Ir(PPy) 3 and its derivatives; Molecular organic luminescent materials, such as: PPV [p〇ly (phenylenevinylene)], pT (p〇lythi〇phen_, and its derivatives. Low-molecular-based materials, a thermal level method to define its pattern; The polymer-based material can be formed into a desired shape at a designed position by spin coating, transcription (transcripti〇n), 18 1269606 nozzle ink or other similar methods. When the base material of the machine wire 7 is used, the injection and transmission efficiency of the anode hole can be formed by forming a luminescent layer 27 before forming the organic light-emitting layer 27 and a 1-hole transmission layer. The transmission layer is formed in the electric sculpture On t-liter power _ shaped and round pass efficiency. The injection efficiency of the cathode electrons can increase the efficiency of the electronic deaf by forming an electron transfer wheel and an injection layer on the organic light-emitting pattern. When using a hole with a high working function as a hole injection layer, the electric ancestor layer is an organic film m with a large number of axes, and can make electricity. The hole is private, and the layer is organic _ 'It has the characteristics of the money-losing person, and it also prevents the electrons from moving in the sub-injection. Tiandian = outside' if used - has low power Wei The electron-injecting electrode serves as an electron-injecting layer τ τ using an organic film as an electron-transporting layer, wherein the organic film contains a large amount of electrons injected therein and allows electrons to move therein. The electron layer is an organic film. It has the characteristics of prohibiting the injection of holes, and prevents the holes from moving therein even when the holes are injected. When using the base material of the organic light-emitting layer 27 as a polymer, the field is different from the low-molecule. County __ where the pine: in the _ Hongji H dissolved and organic light-emitting layer. & ^ with a second electrode 28 formed on the transparent substrate 2 and the organic light-emitting layer 27, it is a frame-shaped mask, The area where the Laiqi component is located, the picture of the reticle: such as 19 1269606 "13A@" _. This second electrode 28 is a high-conductivity material such as: Ming, Jian Compound, Magnesium Magnesium, Name , composed of similar ingredients, : 28 can be stacked by means of a vacuum lying method, such as: ship, electron beam, heat reduction, etc. The domain protection organic hair (4) is protected from moisture and oxidation, so 'need to be in the transparent substrate 2! and the second electrode 28 The formation layer ((10) Nation layer or a protective layer _ivati〇ni material can be metal, glass, or other similar materials, and the protective layer can be composed of organic or inorganic materials. The layer or the layer can make the organic light-emitting device (including the second electrode 28) isolated from the outside and completely sealed. As shown in "8A~8CS1", the first implementation of the organic light-emitting display For example, the section of the process is cut along the b_b in the "6A~6C", and the section ^ is made. Therefore, the "fourth C picture" +, you can see that the half color is less than the other. The thickness of the portion of the insulating layer pattern 23. Next, please refer to the circuit diagram of the second embodiment of the organic telephone light _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ - As shown in Figure 9A, several strips are formed on the transparent substrate 41. The material of the first electrode 42 forming the first electrode 42 may be an oxidative or other similar material, and the pattern of the mask used for the exposure is as shown in FIG. 12A. As shown in FIG. 9 , an insulating layer pattern 43 is formed on the transparent substrate 41 and the first electrode 42 . The halftone mask used in the process is as shown in FIG. 2β, and the pattern can form the insulating layer pattern 43. Between the first electrodes 42, and only = 20 1269606 = the first: the age of the battery is over the body-electrode 42 to form a bare window #, and then the position of the pixel is formed. For this reason, the insulating layer _4 is parallel to the first electrode, for example, the θ-shaped 44, and the height of the halftone pattern 44 is halftone. "... Wei Yu (four) layer paste paste other parts of the words and halftone graphics 44 to do thinner reason: because the deposition of the - gate electrode 48 (not shown) at the edge of the hybrid layer and the thin Therefore, it may cause the circuit to be unconductible, and the second electrode 48 of the +-tone pattern 44 4 € can be turned on completely without the circuit being non-conducting. The first - 曰 & vertical. The position of the I-Nu Yucheng is the same as that of the first-electrode month, and the first embodiment of the present invention is the r rS9A^9Bs j edge of the second embodiment of the present invention. Since the section line A.A is the position of the window ton, the halftone pattern correction does not occur in the _ of the "10th to 10C". As shown in the "Different Diagram", a transparent substrate 41 is firstly applied, and the transparent substrate 41 can be a glass ray; a 5 inch, a plastic| or a similar material. Next, a thickness of 1·~2_personal contact fine middle wire) is stacked on the permeable plate 41, and the anode layer material may be selected from indium oxide= oxidized (mdium _, rib, ^ dog or the like) The material of the anode layer has a sheet resistance of about equal to or less than (/) (10). The anode is fabricated by vacuum deposition, such as sputtering, on a transparent substrate 41 cleaned 1269606. Then, the coating is applied to the anode layer, and the photoresist layer is exposed and developed by using a photomask having an anode layer to form a strip-shaped photoresist pattern. (not shown), the developed photoresist pattern is used as a side mask, and the photoresist layer is removed after the _, _ is completed, that is, the strip-shaped first electrode 42 is formed. Then, please refer to the "1_", in order to prevent the leakage current generated from the edge of the first electrode 42, and the lion-electrode 42 and the second electrode 48 (after the thinning caused by the short-circuit county, and to prevent each (d) Short-circuit phenomenon between the two electrodes 48. Therefore, an insulating layer must be formed to prevent the occurrence of a short circuit. The present invention utilizes a photoresist layer (not shown) to prevent the first electrode 42 and the second. Short-circuit phenomenon on the electrode side, the photoresist layer has non-conducting characteristics. Then, the photoresist layer is coated on the transparent substrate 41, and the photoresist layer is coated white! The thickness is between 1 and 5, Preferably, it is between 3 and _. A halftone exposure mask (not shown) forms an insulating layer pattern 43, and the insulating layer pattern 43 is formed by using a two-mask, as shown by "_". The insulating layer _ parallel to the portion of the electrode 42 is halftone _44, and the halftone _ street selects the production of the halftone pattern 44. The halftone pattern 44 is formed by using a halftone exposure mask, and the basin is tightly insulated. In the other part of shape 43, the control of sulfur thickness can be controlled by ^ = _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Touch tone halftone exposure of the fresh product in the open
控制其形成的厚度。 I 1269606 此半=她辦行於第—_嶋抱調圖卵， 職形成的目的是為降低光阻層的厚度。由於第二電 斤爾，其邊緣沉積的厚度會㈣，因此，餅低光阻層的 物：細8嫌嫩所可能發生 中，2『雜目』啦，崎入—細繼備 ^ =形蝴細47_。糊發_係利用絕 =層圓純作為第-網罩49_，經由窗吨形成於第一電極 之上。此絕緣層圖形43是作為第一網罩49的支撐’因此，第一 :罩49需輸嘯、纟嶋_之上，㈣損害第一電極 ’且必須防止有機發光層47從側向擴散進來。 ^有機發光層47之材料可由發光低分子·、發勉低分子 科或是向分子_發冷光材料所組成；在發光低分子材料方 β 4吏用例如.崎基絡合物(入响、触職，·在發碟光 低分子_方面’可使關如：細b合物娜py)3及其触物；_ 而“分子有機發冷光材料方面，可使用例如：-PVMy⑽enylenevmylene)]、pT(polythi〇phene)等，及其衍生物。 在形成有機發光層47之前，可先形成-制注人層及—電洞 傳輸層’除此之外’亦可戦—電子注人及傳輸層於有機發^層 47之上。當制-個具有高王作魏的電雕人作為電酿 入層時’此電洞注人層係為—有機薄膜，可注人大量的電洞，並 23 1269606 可使電洞在其内移動。 動而此電洞注入層係為有機、 策 止電子注从巾H 料领，其具有禁 中移動。 pu左入…亦防止電子在其 此外右使用一具有低工作功能之電子、、主 入層時，可利用一右媸—， /入书極作為電子注 量的電子注入在a中，¥B 有祛溥膜含有大 仕，、中，亚且可使電子在其内移 層係為有機_，^ ^此電子傳輸 、有電洞注人其中之特性，且即使者電 贴场，亦防止電洞在其中雜。 卩使田電 …後4考『弟_目』所示，_絕緣層U形43作為第二 咖嫩哪梅伽以彡綠f汹，而產I 此弟二電極48所使用的條狀電極圖形如『第现圖』所示。為避免 ㈣機蝴47 ’㈣t_t f軸輕絕緣層圖 形43之上，以避免第二電極牝從侧向擴散進來。 第二電極48主要是利用具有高導電度的材料，例如：鋁、鐘 紹化合物、銀化鎂、_，等類似的成份所組成，而其形成的方式 销由真空沉麵方法堆疊上去，例如：麵、電子束、熱蒸鑛 等方式。而為保護有機發光層47免於受潮及氧化，因此，需在透 明基板41及第二電極48之上，形成一概括層(__此〇_㈣或 疋一保護層(passivation layer)，此概括層的材料可為金屬、玻璃， 或是其他類㈣材料，而倾層可為有機或是無機材料所組成， 利用此概括層或疋保護層，即可使有機致電發光顯示器（包括第二 24 1269606 電極的部份)與外界隔絕，且完全密封。 接著，請參考『第11A〜11D圖』所示，為本發明之第二實施 例的製程剖面圖’此剖面圖係沿著『第9A〜9B圖』恨B，剖面線所 繪製。由於此剖LB，是經過半色調圖形44的部份，因此，可 在『弟11B〜11D圖』中，看到半色調圖形44形成的厚度低於絕緣 層圖形43的厚度。 第12A〜12C圖』係為本發明之第一實施例及第二實施例 中’有機致電發光顯示器製作過程中所使用的光罩圖形。 如第12A圖』所示，此曝光光罩是用來在透明基板μ之上， v成數们$ $極22、42，此第_電極22、幻的材料可為氧化姻 錫或是其他類似的材料。此曝光光罩包含—透光區_，及一用 來形成第一電極22、42的不透光區域52。 口月參考『第12B圖』所示，此半色調曝光光罩是用以形成晶格 ㈣絕緣層_23、43在每個第—電極22、42之間，及橫跨每個 第電極22、42。此半色調曝光光罩包含三個部份：—不透光區釋 幻3透光區域55以及-半色調區域54，此不透光區域％橫跨 每個第-電極22、42 ;半色樞域54是平行於第—電極22、&。 而此半色調區域5伙由矩形圖案56歧條狀圖案觸構成。 、妾著如帛12C圖』所示’此曝光光罩是用以形成垂直於第 一電極22之絕緣層圖形23中央之溝槽％、29，包含一半色調區域 57，及一透光區域58。 25 1269606 而『第13A〜13B圖』中所示之圖形為本發明之第一實施例及 第二實施例中所使用的網罩圖形。 如『第13八圖』所示’為本發明之第一實施例中所使用網罩之 圖形，此網罩包括了一不透光區域59及一透光區域62，此透光區 域62係用以沉積物質。 而『第1犯圖』所示，為本發明之第二實施例中所使用網罩之 圖形，此網罩包括了-不透光區域61及—透光區域62，此透光區 域62係用以沉積物質。 【達成之功效】 本毛明之有機電致發光顯示H，姻―具有絕緣性質之光阻 =P可谢由第-雜(陽極)的邊緣所產生之漏電流，防止第一 t(陽極)和第—電極腾極)間可能造成的短路現象，以及預防第 圖 及！^陰峨_圖形產生鱗的現象，因此，可達到簡化製程 牛Q作成本的目的。且·厚度小於絕緣層_之半色調 /可確保第二電極(陰極)的電路導通。 此外，利用— 的〃有影像轉換性質的有機材料作為絕緣層圖形 極)的方向形^㈣正麵為跡可在垂直於第一電極(陽 能。 /胃。因此，光阻層同時兼具分隔線及絕緣層的功 相較於習知之有 的絕緣層圖形即可達 哉龟致發光頒示态的製程，本發明利用單一 到分隔線及絕緣層的功能，因此，可增加顯 26 1269606 示器的開口率。 再者，在形成第二_(陰極)時，絕緣層圖形可 罩’而此網罩緊密地與絕緣層圖形附著在一起，▲撑網 發光層’及防止陰極層從側向擴散進入。 知镇有機 以上所述者，僅為本發明其中的較佳實施例而已 限定本發_實施翻，·即凡依本發明申請專利 = 變化與修飾，皆為本伽專利翻所涵蓋。 的均寻 【圖式簡單說明】 第1A〜1C圖為習知之有機電致發光顯示器的電路示 第2A〜2C圖為習知之有機致带么 ° 竭面線賴之Γ圖㈣製程沿著第—圖中 第3Α〜3C帽知娜物梅曝㈣a Β-Β’剖面線所緣製之剖面圖； 圖中 第4Α〜·^雜。蝴崎_ 第知之有機致電發光=〜 4A~4C圖中A_A，剖面線鱗製之剖面圖；〜、“程沿著第 第6A〜_林發明之麵 示意圖； 仏7^不為的弟—實施例之電路 第7A〜7C®林發明之有概f發光 剖面圖，係沿著第认责圖 。的弟—貫施例之製程 宁A-A剖面線所繪制· 第SA〜㈣林發明之有_電發 、， *、'、彳、。。的第—實施例之製程 1269606 笔發光顯示器的第二實施例之電路 剖面圖，係沿著第6A〜6C圖ψ 第9Α〜呢圖為本發明之有機致Β B剖面線所緣製 示意圖； 第10Α〜10D圖為本發明之古 &致電發光顯示器的第二實施例之製 程剖面圖，係沿著第9Α〜 β圖中Ai剖面線所繪製； 第11A〜11D圖為本發明之右邊sa ★ θ « 有^致電發光顯示器的第二實施例之製 關面圖，係沿著第9Α〜_中站，剖面_會製； 第12Γ=圖為本發明之第—實施例及第二實施例中，有機致電 發光颁示态製程中所使用的光罩圖形丨及 有機致電 第13Α〜13Β圖為本發明之第一實施例及第二實施例卜 發光顯示器製裎中所使用的網罩圖形。 【主要元件符號說明】 透明基板 1、21、41 第一電極 2、22、42 絕緣層圖形 3、23、43 分隔線 4 有機發光層 5、27、47 弟一^極 6、28、48 光阻層 7 窗口 ‘ 8、25、45 溝槽 9、26、29 28 1269606 半色調圖形 第一網罩 第二網罩 透明區域 不透明區域 半色調區域 矩形圖案 條狀圖案 24、44 49 50 5卜 55、58、62 52、53、59、61 54 56 57 29Control the thickness of its formation. I 1269606 This half = she is doing the first - _ 嶋 调 调 调 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Because of the second electric shovel, the thickness of the edge deposition will be (4). Therefore, the material of the low-resistance layer of the cake may be in the middle of the thin 8 sensation, 2 "Miscellaneous", and the subsense - fine relay ^ = shape Butterfly fine 47_. The paste _ is made of the rim layer pure as the first mesh cover 49_, and is formed on the first electrode via the window ton. This insulating layer pattern 43 serves as a support for the first mesh cover 49. Therefore, the first: the cover 49 needs to be smothered, the 纟嶋_ is over, (4) the first electrode is damaged, and the organic light-emitting layer 47 must be prevented from diffusing laterally. . The material of the organic light-emitting layer 47 may be composed of a light-emitting low molecule, a low-molecular group, or a molecular-luminous material; in the light-emitting low-molecular material, a β-based complex, for example, a Touching, · in the light of the low-molecular _ aspect 'can be off: fine b lyna py) 3 and its touch; _ and "molecular organic luminescent materials, for example: -PVMy (10) enylenevmylene), pT (polythi〇phene), etc., and derivatives thereof. Before the formation of the organic light-emitting layer 47, a human layer and a hole transport layer can be formed first, and the other can be formed by electronic injection and transmission. The layer is above the organic hair layer 47. When the electric carving person with the high Wang Zuowei is used as the electric brewing layer, the hole in the hole is an organic film, which can inject a large number of holes. And 23 1269606 can make the hole move inside. The hole injection layer is organic, and the electronic injection is from the collar of the towel H, which has a forbidden movement. The pu left into the ... also prevents the electron from being in its right Use an electronic with a low working function, and when using the main layer, you can use a right 媸-, / into the book pole as electricity The injection of electrons in a is in a, ¥B has a ruthenium film containing Da Shi, Zhong, Ya and can make the electrons move in the inner layer as organic _, ^ ^ This electron transmission, there is a hole in the injection of it Characteristics, and even if the electric field is applied, it prevents the holes from being mixed in. 卩 田 电 ... 后 后 后 后 后 考 考 考 考 考 考 考 考 考 考 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘 绝缘f汹, and I produced the strip electrode pattern used by the second electrode 48 as shown in the figure. To avoid (4) the butterfly 47 '(4) t_t f-axis light insulation layer pattern 43 to avoid the second electrode The second electrode 48 is mainly composed of a material having high conductivity, such as aluminum, zhongshao compound, magnesium magnesium, _, and the like, and the manner of forming the pin is made by vacuum. The method of stacking is stacked, for example, surface, electron beam, hot steaming, etc. To protect the organic light-emitting layer 47 from moisture and oxidation, a generalization is formed on the transparent substrate 41 and the second electrode 48. Layer (__ this 〇 _ (four) or pass a protective layer (passivation layer), the material of this general layer can be metal , glass, or other (4) materials, and the pour layer can be composed of organic or inorganic materials. With this general layer or enamel protective layer, the organic electroluminescent display (including the second 24 1269606 electrode part) can be made. It is isolated from the outside world and completely sealed. Next, please refer to the "11A-11D" diagram, which is a cross-sectional view of the process of the second embodiment of the present invention. This cross-sectional view is along the "9A to 9B" hate B. Since the section LB is a part of the halftone pattern 44, it can be seen that in the "11B to 11D diagram", the halftone pattern 44 is formed to have a thickness lower than that of the insulating layer pattern 43. thickness. 12A to 12C are the reticle patterns used in the manufacturing process of the organic electroluminescent display in the first embodiment and the second embodiment of the present invention. As shown in Fig. 12A, the exposure mask is used on the transparent substrate μ, v is a number of $$, 22, 42, the first electrode 22, the magic material can be oxidized agar or other similar s material. The exposure mask includes a light transmitting region _, and an opaque region 52 for forming the first electrodes 22, 42. Referring to "12B", the halftone exposure mask is used to form a lattice (4) insulating layer _23, 43 between each of the first electrodes 22, 42 and across each of the first electrodes 22 42, 42. The halftone exposure mask comprises three parts: an opaque zone interpreting 3 light transmissive area 55 and a halftone area 54, the opaque area % spanning each of the first electrodes 22, 42; The pivot domain 54 is parallel to the first electrode 22, & The halftone area 5 is composed of a rectangular pattern 56 and a strip pattern contact. The exposure mask is used to form the grooves %, 29, which are perpendicular to the center of the insulating layer pattern 23 of the first electrode 22, and includes a halftone region 57, and a light transmitting region 58 as shown in FIG. . 25 1269606 and the drawings shown in "Figs. 13A to 13B" are the screen patterns used in the first embodiment and the second embodiment of the present invention. As shown in the "13th eighth" diagram, the pattern of the mesh cover used in the first embodiment of the present invention includes an opaque region 59 and a light transmissive region 62. Used to deposit substances. The "first map" is a pattern of a mesh cover used in the second embodiment of the present invention. The mesh cover includes an opaque region 61 and a light transmissive region 62. Used to deposit substances. [Effects achieved] The organic electroluminescence of the hair of the hair shows H, marriage - the photoresist with insulating properties = P thanks to the leakage current generated by the edge of the first-hetero (anode), preventing the first t (anode) and The short circuit phenomenon that may occur between the first electrode and the electrode, as well as the prevention map! ^The phenomenon of yin _ graphics produces scales, therefore, the purpose of simplifying the process of cattle Q can be achieved. And the thickness is smaller than the halftone of the insulating layer _ to ensure that the circuit of the second electrode (cathode) is turned on. In addition, the direction of the shape of the organic material using the image-converting property as the insulating layer can be perpendicular to the first electrode (positive energy / stomach). Therefore, the photoresist layer is simultaneously The function of the dividing line and the insulating layer can reach the process of the illuminating state of the turtle in comparison with the conventional insulating layer pattern. The present invention utilizes the function of a single to the dividing line and the insulating layer, so that the display can be increased by 26 1269606. The aperture ratio of the device. Further, when the second _ (cathode) is formed, the insulating layer pattern can be covered, and the mesh cover is closely attached to the insulating layer pattern, ▲ the reticle luminescent layer 'and the cathode layer is prevented from the side Into the diffusion into the above. Know the town organic, as described above, only the preferred embodiment of the present invention has been limited to the implementation of the implementation of the implementation of the invention, the patent application according to the invention = change and modification, all of which are Covering all of the drawings [Simple description of the drawings] Figures 1A to 1C are diagrams showing the circuit of the conventional organic electroluminescent display. The 2A~2C diagram is a conventional organic band. The exhaustion line is based on the figure (4) The third to the 3C cap in the figure Nawumei exposure (four) a Β-Β' section of the cross-section of the line; Figure 4th ~ ~ ^ miscellaneous. Butterfly _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Figure; ~, "Cycle along the 6th ~ ~ _ Lin invention schematic; 仏 7 ^ not the brother - the circuit of the embodiment of the 7A ~ 7C ® forest invention has a general f luminescence profile, along the first The blame figure. The younger brother-------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------- A cross-sectional view of a second embodiment of the display is shown in FIG. 6A to FIG. 6C. FIG. 9 is a schematic diagram of the edge of the organic bismuth B section of the present invention; the 10th to 10th drawings are the ancient The process profile of the second embodiment of the light-emitting display is drawn along the Ai section line in the 9th to the 11th; the 11A-11D is the right side of the invention sa ★ θ « has a ^-emitting display The interface diagram of the second embodiment is carried out along the 9th Α~_ station, the section _ will be made; the 12th Γ= diagram is the first In the embodiment and the second embodiment, the reticle pattern used in the organic luminescence-issuing process and the organic call 13th to 13th drawings are the first embodiment and the second embodiment of the present invention. Grid pattern used in the [Main component symbol description] Transparent substrate 1, 21, 41 First electrode 2, 22, 42 Insulation pattern 3, 23, 43 Separation line 4 Organic luminescent layer 5, 27, 47 ^ pole 6, 28, 48 photoresist layer 7 window ' 8, 25, 45 groove 9, 26, 29 28 1269606 halftone pattern first mesh cover second mesh transparent area opaque area halftone area rectangular pattern strip pattern 24, 44 49 50 5 Bu 55, 58, 62 52, 53, 59, 61 54 56 57 29