TWI265595B - Method for fabricating conductive lines and shortening the spacing of conductive lines and pattern - Google Patents
Method for fabricating conductive lines and shortening the spacing of conductive lines and patternInfo
- Publication number
- TWI265595B TWI265595B TW94131988A TW94131988A TWI265595B TW I265595 B TWI265595 B TW I265595B TW 94131988 A TW94131988 A TW 94131988A TW 94131988 A TW94131988 A TW 94131988A TW I265595 B TWI265595 B TW I265595B
- Authority
- TW
- Taiwan
- Prior art keywords
- conductive lines
- conductive layer
- spacing
- shortening
- pattern
- Prior art date
Links
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94131988A TWI265595B (en) | 2005-09-16 | 2005-09-16 | Method for fabricating conductive lines and shortening the spacing of conductive lines and pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94131988A TWI265595B (en) | 2005-09-16 | 2005-09-16 | Method for fabricating conductive lines and shortening the spacing of conductive lines and pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI265595B true TWI265595B (en) | 2006-11-01 |
TW200713496A TW200713496A (en) | 2007-04-01 |
Family
ID=38122254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94131988A TWI265595B (en) | 2005-09-16 | 2005-09-16 | Method for fabricating conductive lines and shortening the spacing of conductive lines and pattern |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI265595B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8440576B2 (en) | 2008-04-25 | 2013-05-14 | Macronix International Co., Ltd. | Method for pitch reduction in integrated circuit fabrication |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI393216B (zh) * | 2007-11-01 | 2013-04-11 | Ind Tech Res Inst | 電阻式記憶體以及其製造方法 |
KR102323251B1 (ko) | 2015-01-21 | 2021-11-09 | 삼성전자주식회사 | 반도체 소자 및 반도체 소자의 제조방법 |
-
2005
- 2005-09-16 TW TW94131988A patent/TWI265595B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8440576B2 (en) | 2008-04-25 | 2013-05-14 | Macronix International Co., Ltd. | Method for pitch reduction in integrated circuit fabrication |
Also Published As
Publication number | Publication date |
---|---|
TW200713496A (en) | 2007-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |