TWI255340B - Method and apparatus for analyzing mixtures of gases - Google Patents

Abstract

Disclosed herein is a method and apparatus for analyzing, sensing and measuring information related to the concentrations of various gases, including NOx, hydrocarbons, carbon monoxide and oxygen, in a multi-component gas system using chemical sensors and chemical sensor arrays. The sensors and sensor arrays use chemo/electro-active materials to analyze and detect the presence of gases.

Description

1255340 A7 B7 V. INSTRUCTION DESCRIPTION (1) Field of the Invention The present invention discloses a method for identifying and analyzing a specific gas (including NOx, hydrocarbon, carbon monoxide, and oxygen) in a multi-component gas system using a chemical inductor and a chemical sensor array. Method and equipment. The sensor and sensor columns use chemical/electric active materials to detect the presence of gases and/or to calculate the concentration of individual gases in a multi-component gas system. BACKGROUND OF THE INVENTION The use of chemical identification devices to detect certain gases is known. Many attempts have been made to find substances that are selective and sensitive to specific gases. For example, U.S. Patent No. 4,535,316 discloses an impedance sensor for measuring oxygen. See also H. Meixner et al., Inductors and Actuators, B 33 (1996) 198-202. Obviously, different substances are required for the various gases to be detected. However, when the gas is part of a multi-component system, it is not easy to use a substance to detect a particular gas because the substance is cross-sensitive to the constituent gases of the mixture. An example of a multi-component gaseous system is combustion gas release which may include oxygen, carbon monoxide, nitrogen oxides, hydrocarbons, CO 2 , H 2 S, sulfur dioxide, hydrogen, water vapor, halogens, and ammonia. See H. Meixner et al., Fresenius' J. Anal. Chem., 348 (1994) 536-541. In many combustion processes, it is necessary to determine whether the release of the gas meets the requirements of national and state air quality regulations. Many types of gas sensors have therefore been developed to address this requirement. No. 5,630,920 to Friese et al., which discloses an electrochemical oxygen sensor. U.S. Patent No. 4,770,760, the disclosure of which is incorporated herein by reference to the entire disclosure of the entire disclosure of the disclosure of the disclosure of the disclosure of the entire disclosure of the disclosure of the disclosure of the disclosure of the disclosure of Standard (CNS) A4 size (210X 297 mm)

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1255340 A7 B7 5. Inductive description (2) Impedance sensor. It is advantageous to simultaneously analyze the two or more components of the mixture (e.g., combustion gas release) to calculate the concentration, e.g., by direct contact of the gas with the sensor to produce data, and without the need to separate any gas in the mixture. Previous methods of technology have not currently met this need. A variety of sensors have been disclosed that detect gases released from food or from relatively low temperature applications. See K. Albert et al., Chem. Rev., 200 (2000) 2595-2626. A number of undoped and doped tin oxide sensors for detecting various combustion gases up to 450 °C have also been disclosed. See C. Di Natale et al., Inductors and Actuators, B 20 (1994) 217-224, J. Getino et al., Sensors and Actuators, B33 (1996) 128-133, and C· Di Natale Sensors and actuators, et al, B 23 (1995) 187-191. However, in high temperature and high corrosive environments, one of which uses chemical sensors to detect combustion gases, operating temperatures may change or degrade the performance of the sensor train. The situation is that a high temperature environment requires the use of chemical and thermal stability, and maintains a measurable reaction to the target gas. The effect of high temperature on the reaction of the oxygen-doped sensor column was 450 °C. See C. Di Natale, Sensors and Actuators, B23 (1995) 187-191. However, there is still a need for a gas release method and apparatus that can detect a multi-component gas system directly at high temperatures, in addition to the prior art, and that must face the operation of the combustion gas system. To address this need, a chemical sensor can be used to measure combustion release, such as automotive exhaust, and to determine if such release meets functional and regulatory requirements. In addition, it has been unexpectedly discovered that the method and apparatus of the present invention for analyzing high temperature gases, such as automotive emissions, has the same effect as the analysis of cryogenic gases in use. SUMMARY OF THE INVENTION -5- This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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1255340 A7 B7 V. INSTRUCTION DESCRIPTION (3) The present invention provides a method for directly sensing a gas component in a multi-component gas system, comprising the steps of: (i) a chemical sensor comprising an array of at least two chemical/electrically active materials Exposure to a multi-component gas system detects the reaction and directly measures the response of each chemical/electroactive material. Preferably, the chemical/electroactive material is a semiconductor material and the multi-component gas system is a discharge of a combustion process. The response to the measurement can be measurement of capacitance, voltage, current, AC impedance or DC impedance. The present invention also provides a chemical sensor for directly sensing a gas component present in a multi-component gas system, comprising a substrate; an array of at least two chemical/electroactive materials on the substrate; and detecting from the chemical/electrical activation The material is exposed to the component of the application of the analytical gas component of the system. Preferably, the chemically active material is a semiconductor material, and the multicomponent gas system is a discharge of the combustion process. The response to the detection can be an electrical property such as capacitance, voltage, current, AC impedance or DC impedance. The device may also include a housing that measures the components that are detected back to the application and the components that analyze the measurement response to resolve the presence and/or concentration of the analyzed gas component. The invention also provides a chemical sensor for directly sensing the presence and/or concentration of a gas component in a multi-component gas system, comprising: a substrate; an array of at least two chemical/electroactive materials deposited on the substrate; detecting the a member of the chemical/electroactive material that is exposed to electrical properties in the multi-component gas component; a member that analyzes the electrical property to detect a change to resolve the presence and/or concentration of the gas component; and an outer casing. The chemical/electroactive material can be a semiconductor material. Another embodiment of the invention is a gas sensitive device comprising an array of at least three chemical/electrically active materials, each chemical/electrically active material being exposed to a plurality of -6-sheet scales for use in the Chinese National Standard (CNS) A4 Specifications (210 X 297 mm)

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k 1255340 A7 B7 V. INSTRUCTION DESCRIPTION (4) A change in electrical impedance occurs in a gas mixture, wherein at least one chemical/electroactive material has (4) about 1 ohm-cm to about 400 ° C or higher. The electrical impedance between 106 ohm-cm and (b) exhibits a resistance change of at least about 0.1% after exposing the material to the gas mixture as compared to the impedance prior to exposure. Still another embodiment of the present invention is an apparatus for analyzing a multi-component gas mixture, comprising the array as described above, and means for measuring the electrical reaction of the chemical/electroactive material after the array is exposed to the gas mixture. Yet another embodiment of the present invention is a gas sensitive device comprising an array of at least two chemical/electrically active materials, each chemically/electroactive material being exposed to a multi-component gas mixture at a selected temperature. The electrical response properties of other chemical/electroactive materials, the electrical response characteristics of at least one of which may be quantified, wherein the value of the material response is constant or at least one minute during exposure of the material to the gas mixture at the selected temperature. No more than about 20%. Yet another embodiment of the present invention is an apparatus for analyzing a multi-component gas mixture comprising an array of the above-described arrays and an electrical response of the chemical/electroactive material after exposure of the array to the gas mixture. Yet another embodiment of the present invention is an array of chemical/electroactive materials, each chemical/electroactive material being exposed to a multi-component gas mixture at a selected temperature exhibiting electrical response characteristics different from those of other chemical/electroactive materials, wherein At least one chemical/electrical activation material is selected from the group consisting of: Μ^Μ\〇χ& Μ\Μ\Μ\〇χ, wherein Μ1 is selected from the group consisting of Ce, Co, Cu, Fe, Ga, Nb, Ni, Pr, Ru, Sn, Ti, Tm, W, Yb, Zn, and Zr; M2 and M3 are independently selected from the group consisting of Al, Ba, Bi, Ca, Cd, Ce, Co, Cr, Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na, Nb, Ni, Pb, Pr, Rb, Ru, Sb, Sc, Si5 Sn, Sr, Ta, Ti, Tm, V, W, Y, Yb, Zn , and Zi*, the paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm)

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1255340

^心Μ在心2# is different from it; a, recognizing e is independent of about 0._5, =1' and X is sufficient to make the other elements in the oxygen-balanced compound charge the spoon. Another specific example is An apparatus for analyzing a multi-component gas system, and an electrical component for detecting an electrical response of the electro-active material after exposure of the array to the gas mixture. ^In January, another specific example is a gas-sensitive device, including a first-and---chemicalized tongue-forming material <array, each chemical/electro-active material is in a selected degree of turbulence in the composition of the compound gas mixture. Each of the other chemical/electrical activating materials has different electrical response characteristics, wherein the chemical/electrically active material is selected from the group consisting of: (1) the first material is Mbx, and the second material is MiaM2b〇x; (9) first The material is Μι〇χ, and the second material is ΜΐδΜ, Μ3^χ; (Qi 2 one material is MiaM2b〇x, and the second material is WWeOx; (IV) the first material is the first type χ, and the second material is the second Ulxx; (V) the first material is the first MlaM2b〇x, and the second material is the second μ\μ\οχ; and (vi) One material is the first type MiaM2bM3e〇x, and the second material is the second type Μ^Μ'Μ^Οχ; wherein the lanthanide series is selected from the group consisting of Ce, c〇, Cu, Fe, Ga, Shi, wind pr, Thus, % crust, W, Yb, Zn, and Zr; M2 and M3 are independently selected from the group consisting of A1, Ba, Bi, Ca, Cd, Ce, Co, Cr5 Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na Nb, Ni, Pb, Pr, Rb, Ru, Sb, Sc, Si, Sn, Sr, Ta, Ti, Tm, V, W, Y, Yb, Zn, and Zr, but M2 and M3 are in Μ^Μ ^Μ^Οχ is different; a, 13 and c are each independently 〇〇〇〇5 to -8 - This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ____^

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k 1255340 A7 B7 V. DESCRIPTION OF THE INVENTION (6) Approximately 1; and X is sufficient to cause the presence of oxygen to equalize the charge of other elements in the compound. Yet another embodiment of the present invention is an apparatus for analyzing a multi-component gas system comprising an array as described above and means for detecting an electrical response of the chemical/electroactive material after the array is exposed to the gas mixture. Yet another embodiment of the present invention is an apparatus for analyzing a multi-component gas mixture comprising (8) an array of at least two chemical/electroactive materials, each chemical/electroactive material presenting with each of the other chemical/electroactive materials after exposure to the gas mixture Different electrical response characteristics; and (b) means for determining the electrical response of each chemical/electroactive material after the array is exposed to the gas mixture. The device may also include components that measure the temperature of the array, as well as components that digitize electrical response and temperature measurements. Yet another embodiment of the present invention is an apparatus for calculating the concentration of at least two separately analyzed gas components in a multi-component gas mixture, comprising (8) an array of at least three chemical/electroactive materials, each chemical/electroactive material being exposed to a gas mixture The electrical response characteristics are different from those of other chemical/electroactive materials; (b) after the array is exposed to the unseparated components of the gas mixture, the electrical response components of each chemical/electroactive material are determined; (c) by chemical/ The electrical response of the electroactive material is calculated as a component of the gas concentration analyzed separately. Yet another embodiment of the present invention is an apparatus for analyzing a multi-component gas mixture comprising (8) an array of at least three chemical/electroactive materials, each chemical/electrically active material presenting with each other chemical/electrical upon exposure to the gas mixture Different electrical response characteristics of the activating material; (b) means for determining the electrical response of each chemical/electrically active material after exposure of the array to the gas mixture; and (c) for (i) at least two chemical/electrical groups from the first group Response from activated materials to detect secondary gas in the mixture-9- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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绰 1255340 A7 B7 V. INSTRUCTIONS (7) The presence of a body, and (ii) the response of a second group of at least two chemical/electroactive materials to detect the presence of a gas of a separate component of the mixture. Yet another embodiment of the invention includes a method of analyzing a multi-component gas mixture. The steps involved are: (8) providing an array of at least two chemical/electroactive materials, each of which exhibits an electrical response characteristic different from that of each of the other chemical/electroactive materials after exposure to the gas mixture; The array is exposed to the gas mixture; (c) determining the electrical response of each chemical/electroactive material after the array is exposed to the gas mixture; (d) measuring the temperature of the gas mixture independent of determining the electrical response of the chemical/electroactive material; And (e) digitizing the electrical response and temperature measurements. Yet another embodiment of the present invention includes a method of calculating the concentration of at least two separate analytical gas components in a multi-component gas mixture having a temperature of about 400 ° C or higher, comprising the steps of: (a) providing at least three chemistries in the gas mixture / an array of electroactive materials, each chemical/electroactive material exhibiting an electrical response characteristic different from that of each of the other chemical/electroactive materials after exposure to the gas mixture, wherein at least one of the chemical/electroactive materials is at a temperature exceeding 400 ° C or At higher temperatures (i) the resistance is about 1 ohm-cm to about 106 ohm-cm, and (9) the resistance change after the material is exposed to the gas mixture is at least about 0.1% compared to the resistance before exposure; (b) in the array After exposure to the unseparated components of the gas mixture, the electrical response of each chemical/electroactive material is determined; and -10- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 B7 V. DESCRIPTION OF THE INVENTION (8) (C) Calculate the concentration of each individual analytical gas component from the electrical response of the chemical/electroactive material. Yet another embodiment of the invention includes a method of analyzing a multi-component gas mixture comprising the steps of: (8) providing an array of at least two chemical/electroactive materials in a gas mixture, each chemical/electroactive material being exposed at a selected temperature After being in the gas mixture, exhibiting electrical response characteristics different from those of the other chemical/electrically active materials, the electrical response characteristics of the at least one material are quantified numerically, wherein the response value of the material is exposed to at least about one at the selected temperature of the material. The process of minutes is constant or does not change by more than about 20%; and (b) the electrical response of each chemical/electroactive material is determined after the array is exposed to the gas mixture. Yet another embodiment of the present invention is a method of analyzing a multi-component gas mixture by providing an array of at least three chemical/electroactive materials by (8), each chemical/electroactive material being presented to each other after exposure to the gas mixture Different electrical response characteristics of chemical/electroactive materials; (b) determination of electrical response of each chemical/electroactive material after exposure of the array to components separated by gas mixture; and (c) detection of (i) from the first group A response from at least two chemical/electroactive materials to detect the presence of a gas subgroup in the mixture, and (9) a response from a second group of at least two chemical/electroactive materials to detect the presence of a separate component of the gas in the mixture. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 depicts an array of chemical/electroactive materials. Figure 2 is a schematic illustration of a digitized electrode pattern within a covered dielectric cap layer forming a sixteen-hole hollow cavity in an array of chemical/electroactive materials. -11 - This paper size is applicable to China National Standard (CNS) A4 specification (210X 297 mm) 1255340 A7 B7 V. Invention description (9) Figure 3 depicts the electrode pattern, dielectric pattern and induction in the array of chemical/electroactive materials. Material pattern. Detailed description of the invention

The present invention is a method and apparatus for directly sensing one or more analytical gases in a multi-component gas system at different temperature conditions. ''Direct induction means that the array of gas-inducing materials is exposed to a gas mixture that constitutes a multi-component gas system, such as a flowing gas stream. The array may be in a gas mixture, especially if needed in the source of the gas mixture. Alternatively, the array can remain in the chamber from which the gas mixture is directed from its source. When gas is directed into the chamber in which the array is located, the gas mixture can be injected and removed from the chamber by lines, conduits, or other suitable gas delivery device.

The response is obtained when the gas sensing material is exposed to the multicomponent gas mixture and is responsive to the function of one or more of the analytical gases themselves in the gas mixture. The sensor material is simultaneously substantially exposed to each of the analytical gases, and the analytical gas is not separated from the multicomponent gas mixture of one or more components of the mixture analysis and/or to be conducted. The invention can be used, for example, to detect and/or measure the concentration of automotive exhaust gas combustion gases at different temperatures, such as oxygen, carbon monoxide, nitrogen monoxide, hydrocarbons (such as butane), CO 2 , H 2 S, halogens, hydrogen, water vapor, and ammonia. . The invention is therefore used at elevated temperatures in automotive exhaust systems, typically from about 400 ° C to about 1000 ° C. In addition, the invention can also be used in a variety of other combustion systems, including diesel engines and home heating. These applications require the detection of ppm to % of gases such as nitrogen oxides, ammonia, carbon monoxide, hydrocarbons and oxygen, and are typically carried out in highly corrosive environments. The invention is also used for detecting gas in other gas systems-12- The paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 __ B7 V. Invention description (1〇) body, such as Detected in manufacturing processes where odor detection is important and/or at low temperatures, such as in the pharmaceutical, agricultural or food and beverage industries. The present invention uses an array of inductive materials to analyze the gas mixture and/or its knives to detect, for example, the presence and/or calculated concentration of one or more separate analytical gas components in the system. , Array means at least two separate materials, as shown in Figure 1 7F. The array may contain, for example, 3, 4, 5, 6, 8, 1 or 12 gas sensing materials, or other more or less (if desired). Preferably, at least one inductive material is provided for the individual gases or subgroups of the mixture to be analyzed. However, it may be desirable to provide more than one type of sensor material that responds to individual gas components and/or particular subgroups in the mixture. For example, a group of at least 2, 3 4, 5' 6, 7, 8, 9, 10, 11 or 12 sensors can be used to detect one or more gases and/or gases of one or more separate components of the mixture. The presence and/or calculated concentration of the subgroup. Different groups of sensors can be used for this purpose, with or without components. Sub-group gases analyzed by subgroups may or may not contain separate gases of their own analysis. Preferably, the % of the main components of each gas sensing material are different from the others. The sensing material used for j kg is a chemical/electroactive material. The chemical/electrically active material is a material that has an electrical response to at least one of the individual gases in the mouthpiece. Wood II to oxide semiconductor materials, mixtures thereof or mixtures of metal oxides, semiconductors and other inorganic materials are chemically/electrically activated and are especially useful in the present invention. The various chemical/electroactive materials used herein are exposed to a mixture and/or an analytical gas; preferably, exhibiting an electrically detectable reaction with various other chemical, electroactive materials, different species and/or tendencies. Therefore, the appropriate choice of chemical ~ activating material <array can be used to interact with the analytical gas, inductive fraction-13-1255340 A7 B7 5. The gas of the invention (11) or the presence of one or more analytical gases in the assay mixture and / Or concentration, analysis of multi-component gas mixtures, except for the presence of uninteresting interference gases. The invention is used to detect gases that are desired to be present in a gas stream. For example, in a combustion process, it is desirable that the gas present contains oxygen, nitrogen, oxides (such as NO, N02, N20, or N2〇4), carbon monoxide, hydrocarbons (such as CnH2n+2, and their saturated or unsaturated, or visible The case is replaced by a hetero atom; and its cyclic or aryl analogs), ammonia or hydrogen sulfide, water vapor and derivatives derived from saturated and unsaturated hydrocarbons, ethers, ketones, aldehydes, carbonyls, biochemical molecules and microorganisms. The component of the multicomponent gas mixture desired to be analyzed may be a separate gas such as carbon monoxide; it may be a partial subgroup, but not all of the gases contained in the mixture, such as nitrogen monoxide (NOx); or may be combined with one or more separate gases and One or more subgroups. When analyzing the subpopulation of gases, the chemical/electroactive material will respond to the concentration collected in the multicomponent gas mixture of the components of the subgroup. The use of such an inductor material to obtain the compositional content of the gas mixture (eg, the measured gas concentration) may be based on, for example, a change in the electrical properties of the material exposed to the mixture containing at least one or more of the analytical gases, at least one (but Better and all materials) AC impedance. Analysis of the gas mixture can also be performed by varying the electrical properties of the sensor material, such as capacitance, voltage, current, or AC or DC resistance. The change in DC resistance can be determined by, for example, measuring the change in temperature at a certain voltage. One of the stated properties of the sensor material is a function of the partial pressure of the analytical gas in the gas mixture, which can then be analyzed by the analytical gas molecules absorbed on the surface of the inductor material, thereby affecting the electrical response characteristics of the material. . By using chemical/electrical activation materials -14- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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1255340 A7 B7 5. Array of inventions (12), the pattern of individual responses after exposure of the material to a mixture containing one or more analytical gases can be used to simultaneously and directly detect the presence of at least one gas in a multi-component gas system And or measure the concentration. The invention is further useful in the determination of compositions of gas systems. This is illustrated in Figure 1 and is listed below. For purposes of illustration, the following theoretical examples of exposure of the sensing material to a mixture containing the analytical gas are contemplated. When a response is obtained, the item is represented by a positive (+), and when there is no response, the item is represented by a negative (-). Material 1 responded to Gas 1 and Gas 2 but did not respond to Gas 3. Material 2 responded to Gas 1 and Gas 3, but did not respond to Gas 2, and Material 3 responded to Gas 2 and Gas 3 but did not respond to Gas 1. Material 1 Material 2 Material 3 Gas 1 + + Gas 2 + 雠 + Gas 3 + + Therefore, if the array contains materials 1, 2 and 3, and the following response to the gas is not available 1 Material 2 Material 3 Unknown gas + + It is then determined that the unknown gas is gas 2. The response of each sensing material is a function of the partial pressure in the mixture of the analyzed gas and thus the concentration, or a function of the overall concentration of the subgroup of the analyzed gas; and the response can be quantified or recorded as a possible value, such as a number. In this case, the value of one or more responses can be used to generate one or more -15-paper scales. The Chinese National Standard (CNS) A4 specification (210X297 mm) 1255340 A7 B7 5. Inventive Note (13) Analytical Gas Quantitative data on the concentration of the mixture. In a multi-component gas system, stoichiometry, a central network, or other pattern recognition techniques can be used to calculate the concentration of one or more analytical gases in a mixture of systems. The chemical/electroactive material may be of any type, but the most useful are semiconductor metal oxides such as ZnO, Ti02, W03 and Sn02. These special materials are advantageous because of their chemical and thermal stability. The chemical/electroactive material may be a mixture of two or more semiconductor materials, or a mixture of semiconductor materials and non-base materials or combinations thereof. The attention-grabbing semiconductor material can be deposited on a suitable insulating solid substrate, such as, but not limited to, alumina or yttria, and stabilized under a multi-component gas mixture. The array is then turned into a sensor material as deposited on a substrate. Other suitable inductor materials include monolithic or thin film-like single crystal or polycrystalline semiconductors, amorphous semiconductor materials, and semiconductor materials containing metal oxides. The chemical/electroactive material used as the material of the inductor of the present invention may be, for example, a metal oxide of the formula: Μ\Μ\〇χ* or a mixture thereof, wherein Μ1, Μ2 and Μ3 are more than 500 ° C in the presence of oxygen. a metal that forms a stable oxide when burned; M1 is selected from Groups 2-15 and 镧 of the periodic table; M2 and M3 are independently selected from Groups 1-15 and 镧 of the periodic table, but M1 and M2 are in Μ^Μ'Μ ^ Οχ is not the same; a, b and c are each independently between about 0.0005 and about 1; and X is the number of charges sufficient to balance the other elements in the oxygen-presenting compound. Metal oxides containing more than one metal do not need to be compounds or solids. 16- This paper scale applies to Chinese National Standard (CNS) A4 size (210 X 297 mm) 1255340 A7 B7 V. Description of invention (14) Easy, However, it may be a mixture of discontinuous metal oxides. It can exhibit a composition gradient and can be crystalline or amorphous. Suitable metal oxides are 1) having a resistance of from about 1 to about 106 ohm-cm, preferably from about 1 to about 105 ohm-cm, and more preferably from about 10 to about 1, at a temperature of about 400 ° C or more. 〇 4 ohm-cm, 2) chemical/electrical response to at least one desired gas, and 3) stability and mechanical integrity, adhesion to the substrate, and no degradation at operating temperature. The metal oxide may also contain small or minor amounts of hydrates and elements present in the precursor material. In some preferred embodiments, the metal lanthanum oxide material may comprise the group consisting of: Ce, Co, Cu, Fe, Ga, Nb, Ni, Pr, Ru, Sn5 Ti5 Tm, W, Yb, Zn, and Zr; and/or M2 and M3 are each independently selected from the group consisting of Al, Ba, Bi, Ca, Cd, Ce, Co, Cr5 Cu, Fe, Ga, Ge, In, K, La, Mg. , Mn, Mo, Na, Nb, Ni, Pb, Pr, Rb, Ru, Sb5 Sc, Si, Sn, Sr5 Ta, Ti5 Tm, V, W, Y, Yb, Zn, and Zr, but M2 and M3 are Μ^Μ'Μ'Οχ is different. In some other preferred embodiments, the metal oxide material may comprise the following, wherein Ιν^Οχ is CeaOx, CoOx, Cu〇x, FeOx, GaOx, NbOx, NiOx, PrOx, RuOx, Sn〇x, TaaOx, Ti 〇x, TmOx, WOx, YbOx, ZnOx, ZrOx, SnOx with Ag additive, ZnOx with Ag additive, TiOx with Pt additive, ZnOx with glassy additive, NiOx with glassy additive, with glassy addition- 17- This paper scale applies to China National Standard (CNS) A4 specification (210X 297 mm)

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1255340 A7 B7 V. INSTRUCTIONS (15) Additive SnOx, WOx with glassy additive; and/or Μ\Μ\〇χAlaCrbOx, AlaFebOx, AlaMgbOx, AlaNibOx, AlaTibOx, AlaVbOx, BaaCubOX5 BaaSnbOx, BaaZnbOx, BiaRubOx , BiaSnbOx, BiaZnbOx, CaaSnbOx, CaaZnbOX5 CdaSnbOx? CdaZnbOx? CeaFebOX5 CeaNbbOx? CeaTibOx? CeaVbOX5 CoaCiib〇x, CoaGeb〇x, CoaLab〇x, CoaMgb〇x, CoaNbb〇x, CoaPbb〇x, CoaSiib〇x, C〇aVbOx, CoaWbOx, CoaZnbOx, CraCubOx, CraLabOx, CraMnbOx, CraNibOx, CraSibOx, CraTibOx, CraYbOx, CraZnbOx, CuaFebOx, CuaGabOx, CuaLabOX5 CuaNab〇x, CuaNibOx, CuaPbbOx, CuaSnbOx, CuaSrbOx, CuaTibOx, CuaZnbOx, CuaZrbOx, FeaGabOx, FeaLabOx, FeaMobOx, FeaNbbOx , FeaNibOx, FeaSnbOx, FeaTibOx, FeaWbOx, FeaZnabOx, FeaZrbOx, GaaLabOX5 GaaSnbOx, GeaNbbOx, GeaTibOx, InaSnbOx, KaNbbOx, MnaNbbOX5 on aSnbOx, MnaTibOx, MnaYbOx, MnaZnbOx, MoaPbbOx, MoaRbbOx, MoaSnbOx, MoaTibOx, MoaZnbOx, NbaNibOx, NbaNibOx, NbaSrbOx, NbaTibOx, NbaWbOx, Nb aZrbOx, NiaSibOx, NiaSirbOx, NiaYb〇x, NiaZnbOx? NiaZrbOx? PbaSnbOx? PbaZnbOX5 RbaWbOx? RuaSnbOx? RuaWbOx? RuaZnbOx? SbaSnbOx? SbaZnbOx? ScaZrbOx? SiaSnbOx? SiaTibOX9 Si^Wb〇x, SiaZrib〇x, SnaTab〇x, SnaTib〇 x, SnaWb〇x, SnaZiib〇x, SnaZrb〇x, SraTibOx, TaaTibOx, TaaZnbOx, TaaZrbOx, TiaVbOx, TiaWbOx, TiaZnb〇x, TiaZrbOx, VaZrbOx, WaZnbOx, WaZr*bOx, YaZrbOx, ZnaZrbOx, AlaNibOx with glassy additives AlaNibOx, CraTibOx with vitreous additive, FeaLabOx with vitreous additive, FeaNibOx with vitreous additive, FeaTibOx with vitreous additive, NbaTibOx with vitreous additive, NbaWbOx with vitreous additive, NiaZnbOx with vitreous additive NiaZrbOx with vitreous additive, sbaSniA with glass additive, TaaTibOx, or TiaZnbOx; and/or -18- ----^ This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 B7 V. INSTRUCTIONS (16) Μ^Μ'Μ^Οχ is AlaMgbZncOx, AlaSibV cOX5 BaaCubTicOx, CaaCebZrcOx, CoaNibTicOx, CoaNibZrcOx, CoaPbbSncOx, CoaPbbZncOx, CraSrbTicOx, CuaFebMncOx? CuaLabSrcOx? FeaNbbTicOx? FeaPbbZncOx? FeaSrbTicOx, FeaTabTieOx, FeaWbZrcOx? GaaT ibZncOX5 LaaMnbN acOx? LaaMnb SrcOx? MnaSrbTicOx? MoaPbbZncOx? NbaSrbTicOx? NbaSr5WcOx? NbaTibZncOx?

NiaSrbTicOx, SnaWbZncOx, SraTibVcOx, SraTibZncOx, or TiaWbZrcOx. In certain other preferred embodiments, the metal oxide material can be included in an array of first and second chemical/electroactive materials, wherein the chemical/electroactive material is selected from the group consisting of: The first material is Μ1. , and the second material is MiaM2b〇x; (ii) the first material is Mbx, and the second material is MiaM2bM3e〇x; (iii) the first material is Μ^Μ'Οχ, and the second The material is MiaM2bM3e〇x; (lv) the first material is the first type, and the second material is the second type; (v) the first material is the first type, and the first The two materials are the second type Μ\Μ\〇χ; and (vi) the first material is the first type MiaM\M3e〇x, and the second material is the second type MW. Self-contained Ce, Co, Cu, Fe, Ga, Can, say, pr, Ru, such as ^ plus W, Yb, Zn, and Zr; β and M3 are independently selected from the group consisting of A1, 玑 &amp; a '

Ce, Co, Cr, Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na, Nb ^ Pb, Pr, Rb, Ru, Sb, Sc, Si, Sn, Sr, Ta, Ti, Tm, v, w, Y, outer &amp; and &amp;, but M2 and Μ; in the case of not la, grade c is independently about ca ^ about 1; and \ is sufficient to make the oxygen balance compound The number of other elements in the rain. % % -19-

1255340 A7 B7 V. INSTRUCTIONS (I7) The sensor material may optionally contain one or more additives to promote adhesion to the substrate or to alter the conductivity, resistance or selectivity of the sensor material. Examples of additives for promoting adhesion include glass, which is a finely ground glass, or a finely ground inorganic material that is converted into glass or tantalum upon heating. Description Glassy materials such as F2834, F3876, F2967, KH770, KH710 and KH375 are available from DuPont/Technologies. These amounts can be up to 30% by volume of the process inductor material composition. Examples of additives that change conductivity, resistance, and selectivity include Ag, Au, or Pt, and glass. If desired, the inductor material may also contain additives, such as catalyzing the oxidation of the target gas, or promoting the selectivity of a particular analytical gas; or containing one or more dopants that convert the n-type semiconductor to a p-type semiconductor, and the like. These additives can be used in an amount up to 30% by weight of the composition of the inductor material. Any glass or other additives used in the manufacture are not required to be uniformly or homogeneously dispersed in the inductor material, but may be on or near the particular surface desired. Each chemical/electroactive material can be converted by a porous dielectric cover if desired. A suitable covering is QM44 from DuPont iTechologies. Any method of depositing a chemical/electroactive material on a substrate is suitable. One technique for deposition is to apply a semiconductor material to an alumina substrate of a screen printed electrode. The semiconductor material can be formed into a hole by hand-coating the semiconductor material onto the substrate, and the film deposition or thick film printing technique is applied to the electrode. Most of the technology is then finally burned to sinter the semiconductor material. The technical description of the substrate printed with electrodes and chemical/electroactive materials is shown in Figure 2-3. Figure 2 illustrates the use of an internal dielectric electrode covering the dielectric material to form a depositable -20- paper scale for the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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Bee 1255340 five, invention description (18 A7 B7

Hollow holes in chemical/electrically active materials. Fig. 3 depicts an electrode screen printing pattern of six types of materials which are printed on two sides of a substrate to obtain 12 material-row wafers. 'Electrode &lt; The second is parallel, so there are 6 unique materials. From the top of the array shown in Fig. 3, the upper two materials can only be partially approached by the separated electrodes at the same time. Underneath is a screen printing pattern of dielectric material, which is printed on both sides of the substrate to prevent the material from being clogged with contact with the gas mixture, such as depositing coal ash, which may cause short circuit. Below it is the screen printing pattern of the actual sensing material. This is printed in the holes in the dielectric on the electrodes. When more than one material is used in the array, only one material is printed at a time. ° The electrical response is measured for each chemical/electrical activation material after the array is exposed to the gas mixture, and the component that determines the response contains the conductor material. The conductor is then connected to the power input and output circuit, and includes data acquisition and operation means for measuring and recording the sensor material in the form of a signal, and responding. The value of the response, such as impedance-related measurements, can be displayed as a signal. One or more signals may be generated by the sensor array for each of the analytical components in the mixture, regardless of the analysis as one or more separate gases and/or sub-populations of one or more gases. The electrical response is for individual chemical/electroactive materials separated from each of the other chemical/electroactive materials (4). This can be achieved by sequentially picking up the chemical/electrically active materials with current, using a multiplexer to provide a difference in the value of one material and the other, such as a time difference or frequency difference. It is therefore preferred that no chemical/private activation material is combined with any other such material in a series of currents. However, its private pole (by which it passes to reach the chemical/electroactive material) can be in contact with more than one material. The electrode can be all or less than all of the chemical/electrical activities in the array

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Line -21 - 1255340 A7 B7 V. INSTRUCTIONS (19) Contact of chemical materials. For example, if the array has 12 chemical/electroactive materials, the electrodes may be in contact with various numbers of 2, 3, 4, 5 or 6 (or more often) chemical/electroactive materials. The electrodes are preferably configured to pass current through the various components of each group of chemical/electroactive materials. Conductors such as printed circuit boards can be used to connect the voltage source to the inductive material and, when a voltage is applied through the inductor material, a corresponding current is generated through the material. Although the voltage may be AC or DC, the magnitude of the voltage is generally maintained. The resulting current is proportional to the applied voltage and the impedance of the inductor material. The response of the material can be measured in terms of current, voltage or impedance, and the components that are implemented include commercially available analog circuit components such as precision resistors, filter capacitors, and operational amplifiers (such as the OPA4340). As for the known functions of electricity, voltage, current and resistance, which are properties of other two-electrodes, the known quantities for one property can be easily converted into another property. The impedance can be determined, for example, with a digital representation of the electrical response. The components that cause the appliance to respond to digitization include analog/digital (A/D) converters known in the art, and may include, for example, electrical components and circuitry including comparative meter operation. The electrical response in the form of a voltage signal derived from the application of a voltage to the inductor material as derived above is used as an input to the comparative measurement segment (e.g., LM339). The other input of the comparator is driven by a constant current source electrical capacitor consisting of an operational amplifier (such as the LT1014) and an external transistor (such as PN2007a) to produce a linear jump drive. The jump is controlled and detected by a microprocessor such as the T89C51CC01. The second comparison tester is also driven by the skip voltage, but compared to the exact reference voltage. The microprocessor acquires the length of time from the start of the jump to the activation of the comparator, producing a signal that is dominated by the time of the calculation. -22- This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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1255340 A7 B7 V. INSTRUCTIONS (2〇) The time signal by which the micro-processing is a function of the voltage signal derived from the voltage output of the material corresponding to the known voltage and ultimately to the generated voltage, The impedance of the sensor material is calculated or quantified numerically. A microprocessor chip such as the T89C51COH can be used for this function. The microprocessor chip can also be used to determine the impedance change of the sensor material by comparing the impedances as described above to appropriately measure the value of the impedance. Electrical properties such as impedance or capacitance can be measured, for example, using circuit components such as impedance meters, capacitance meters, or sensors. The means for temperature digitization of the chemical/electroactive material array may comprise, for example, a component that converts the physical properties, states or conditions of the temperature measuring device into signals based on the time of the calculation. According to one embodiment, the analysis of the multi-component gas mixture is completed in the above manner after generating an electrical response such as a resistance. The measured impedance provides useful information about the composition of the gas mixture as a function of the impedance exhibited by the inductive material exposed to the gas mixture as a function of the partial pressure in the mixture of one or more gases. This information may, for example, indicate the presence or absence of a sub-population of a particular gas or gas in the mixture. However, according to other specific examples, it is preferred to obtain data relating to the relative concentration of the sub-cluster of one or more of the specific constituent gases or gases in the mixture, or to calculate the actual concentration of the gas or group of one or more components of the mixture. The way, operation or further operation of the electrical response. Obtaining information about the relative concentrations of one or more individual component gases and/or one or more gas subgroups in the mixture, or detecting the presence or calculation of the actual concentration of one or more individual constituent gases and/or subgroups in the mixture-23 - This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm)

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1255340 A7 B7 V. INSTRUCTIONS (21) The components used may include a PLS (Planning on Potential System) model, a post-proliferation hub network model or a combination of two, accompanied by signal preprocessing and post-output processing models. Translation. Signal preprocessing includes, but is not limited to, analysis of the original components, simple linear transformations and scaling, logarithmic and natural logarithmic transformations, differences in major signal values (such as impedance), and differences in logarithmic values. The calculation includes a model in which the parameters have been pre-measured, and an empirical model of the relationship between the pre-processed input signal and the data of the gas concentration of the target. Post-processing of the output includes, but is not limited to, all of the above operations, as well as its reverse operation. The mode is constructed using equations in which the constants, coefficients, or other factors are derived from the precise measurement of the individual sensor materials to the predetermined individual characteristics of the particular individual gas or subgroup of the pre-analyzed mixture. The equation can be constructed in such a way that the temperature is treated as a value that separates from the electrical response exhibited by the exposure of the inductor material to the gas mixture. The individual sensor materials in the array are different from each other in response to at least one of the constituent gases or subgroups in the mixture, and the different responses of the various sensors are measured and used in the construction mode. equation. The analytical gas contained in the mixture exposed by the chemical/electroactive material may be a single gas, a subgroup of combined gases, or one or more gases or subgroups of a mixture with an inert gas such as nitrogen. The specific target gas is the gas that is imparted and received. These gases are gases that provide electrons to semiconductor materials, such as carbon monoxide, H2S, and hydrocarbons, or gases that accept electrons from semiconductor materials such as helium 2, nitrogen oxides (generally represented by NOx), and halogens. When exposed to the imparted gas, the reactance of the η-type semiconductor material drops, causing the current to increase, and thus the temperature is increased due to I2R heating. When exposed to an acceptor gas, the η-type semiconductor -24- paper scale applies to the Chinese National Standard (CNS) Α4 specification (210 X 297 mm)

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1255340 A7 B7 V. INSTRUCTIONS (22) The resistance of the material increases, causing the current to drop, and therefore the temperature is lowered due to I2R heating. When a p-type semiconductor material is used, the opposite situation occurs in each case. The shape of the sensor material in the array at the time of manufacture, including its thickness, the choice of compound or composition used as the inductor, and the voltage applied to the array will vary with the sensitivity desired. Preferably, the inductor material is connected in parallel with a current generated by applying a voltage of from about 1 to about 20, preferably from about 1 to about 12 volts to the inductor material. When performing an analysis of a multi-component gas mixture, when the array is exposed to a mixture containing one or more analytical gases, each of the chemical/electroactive sensor materials in the preferred array exhibits a different electrical power than the other chemical/electroactive materials in the array. Back to characteristics. As noted, the types of measurable electrical response characteristics include AC impedance or resistance, capacitance, voltage, current, or DC resistance. Preferably, when an electrical resistance is used as the electrical response characteristic of the material of the inductor, the twin measurement is performed to perform an analysis of the gas mixture and/or its constituents. For example, suitable sensor materials can be at least about 1 ohm-cm, and preferably at least about 106 ohm-cm, and preferably no more than about 106 ohm-cm, and preferably no more than about 1 ohm-cm, and preferably at least about 106 ohm-cm. 105 ohm-cm, and better not more than 104 ohm-cm. The inductor material can also be characterized by a resistance change of at least about 0.1%, and preferably at least about 1%, as compared to an unexposed resistance when exposed to a gas mixture at a temperature of about 400 ° C or higher. Regardless of the response characteristics measured for the purpose of analyzing the mixture and/or the target gas component therein, it is preferred to use a sensor material whose response value is also stabilized over time. When the sensor material is exposed to the mixture containing the analyte -25- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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1255340 A7 B7 V. INSTRUCTION DESCRIPTION (23) In the case of the composition, the concentration of the analysis is a function of the composition containing the special gas mixture. The value of the response of the sensor material is better at a certain temperature and is exposed to the mixture for a long time. Maintain a certain or only a small change. For example, if the value of the response changes, the change is within at least about 1 minute or better hours, such as at least about 1 hour, preferably at least about 10 hours, more preferably at least about 100 hours, and most preferably at least about 1000. In the hour, no more than about 20%, preferably no more than about 10%, more preferably no more than about 5%, and most preferably no more than about 1%. One of the advantages of sensor materials of the above type is characterized by this type of response stability. When the gas mixture is used above about 400 ° C, the temperature of the inductor material and the array can be determined substantially only by the temperature of the gas mixture containing the gaseous analyte, and preferably by the temperature. This is generally a variable temperature. When analyzing high temperature gases, it may be necessary to provide a heater to the array to allow the sensor material to heat up to the lowest temperature. However, when the analysis is initiated, the heater (if used) is typically turned off and there is no need to maintain the sensor material at a preselected temperature. The temperature of the inductor material thus rises or falls to the same temperature as the ambient temperature. The ambient environment and hence the temperature of the sensors and arrays are generally only substantially determined by the temperature of the gas mixture exposed by the array. In applications where the gas mixture is below about 400 ° C, it is preferred to maintain the inductor material and array at a preselected temperature of about 400 t or higher. The preselected temperature may be substantially constant or preferably constant. The preselected temperature may also be about 500 ° C or higher, about 600 ° C or higher, or about 700 ° C or higher. This can generally be accomplished by means of heaters applied to the array in a manner known in the art. The temperature of the gas mixture can also be less than about 300 ° C, less than about 200 ° C or less than about 100 ° C. The temperature change in the array can be determined by the electrical response characteristics of the sensor material. For example, this paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm).

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1255340 A7 B7 V. INSTRUCTIONS (24) If the quantized value of the resistance changes. At a certain partial pressure of the target gas in the mixture, the electrical response characteristics of the sensor material will change as the array and material temperature change. The change in the electrical response characteristic value can be measured for the degree to which the measured or measured temperature value changes. It is not necessary that the measurement of the temperature is independent of the information on the compositional content of the gas mixture, but it is preferred. This can be done by not using an inductor that provides additional information for the purpose of measuring the temperature, and optionally by connecting the temperature measuring member to the sensor material in parallel. The temperature measuring component contains a thermocouple or pyrometer that is added to the sensor array. If the temperature measuring member is a thermistor, it is generally a material that does not respond to the gas being analyzed, and the thermistor is preferably a material different from the material from which the gas sensor is made. Regardless of the method of measuring the temperature or temperature change, the quantitative change of the temperature value or temperature is a desired value, preferably in the form of a number, from which the mixture of gases and/or components thereof can be analyzed. According to the method and apparatus of the present invention, unlike the prior art techniques, it is not necessary to separate the constituent gases of the mixture by, for example, a film or an electrolytic cell when performing the analysis. Also, when analyzing with the apparatus of the present invention, there is no need for a reference gas such as to return the response or analysis result to the baseline value. The sensor material is only exposed to the mixture containing the analytical gas and/or sub-group, except for pre-tests, in which the standardized reaction values are determined by exposing the individual sensor materials to individual analytical gases. The sensor material is not exposed to any other gas to obtain a response value compared to the one obtained by exposure to the mixture containing the analyte. The analysis of the mixture is therefore carried out only by the electrical response obtained after the chemical/electroactive material has been exposed to the mixture containing the analyte. By making the sensor -27- paper scale applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) 1255340 A7 B7 V. Description of the invention (25) The material is exposed to the analysis gas itself not contained in the mixture. Information on analytical gases and/or subgroups cannot be inferred in any of the gases. The present invention therefore provides a method and apparatus for directly sensing the presence and/or concentration of one or more gases in a multi-component gas system, including an array selected to detect at least two chemical/electroactive materials in a multi-component gas system. A multi-component gas system can be at substantially any temperature that is not too low or too high, degrading the inductor or causing the sensor device to malfunction. According to a specific example, the gas system can be at a lower temperature, such as room temperature (about 25 ° C) or between about 0 ° C and less than about 100 ° C, so according to another specific example, the gas mixture can be At higher temperatures, such as from about 400 ° C to about 1000 ° C. The invention is applicable to exhaust gases or releases that may be present in a gas mixture of higher temperature gases, such as in a combustion stream, such as an automobile, diesel engine or domestic heating system. However, the invention may also be used in gas mixtures derived from other sources, such as manufacturing processes, exhaust streams, and environmental detection, or systems in which odor detection is important, and/or at lower temperatures, such as at In the pharmaceutical, agricultural or food and beverage industries. Arrays of chemical/electroactive materials can be used, such as the results or corrections of the gas chromatography. Thus, the temperature of the gas mixture is about 100 ° C or higher, or about 200 ° C or higher, or about 300 ° C or higher, or about 400 ° C or higher, or about 500 ° C or higher. Or about 60 (TC or higher, or about 700 ° C or higher, or about 800 ° C or higher, and further lower than about 1000 ° C, lower than about 900 ° C, lower than about 800 ° C , less than about 700 ° C, less than about 600 ° C, less than about 500 ° C, less than about 400 ° C, less than about 300 ° C, less than about 200 ° C, or less than about 100 ° C The present invention also provides a means for determining, measuring, and recording the array of chemical/electrochemically active materials after exposure to the gas mixture. For example, the paper can be applied to the Chinese National Standard (CNS) A4 specification ( 210X 297 mm)

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1255340 A7 B7 V. INSTRUCTIONS (%) Use components that measure, measure, and record changes in electrical properties. For example, this can be a component of a 〇 impedance change in which the measurable material responds to the concentration of gas molecules absorbed by its surface. Other components for determining electrical properties may be those suitable for measuring the capacitance, voltage, current or DC resistance of Example 2. In addition, changes in the temperature of the sensing material can be measured and recorded. The chemical sensing method and apparatus further provides for measuring or analyzing the components of the gas and/or the detected gas to identify the presence of the gas and measure its concentration. The component can include, for example, instruments and equipment that can perform stoichiometry, hub networking, or other pattern recognition techniques. The chemical sensing device includes a housing for the chemical/electro-active material, a member for detecting the chemical/electro-active material, and a member for analysis. The invention also provides a chemical sensor for directly sensing the presence and/or concentration of one or more gases in a multi-component gas system, comprising a substrate selected to detect at least two of one or more predetermined gases of the multi-component gas An array of chemical/electroactive materials, and means for determining electrical properties after each chemical/electroactive material is exposed to a gas: system. The array of sensor materials should be able to detect the analyte of the target, but the competitive reaction due to the presence of other components of the multi-component w-mouth is a newcomer. For this purpose, the invention employs an array of multiple sensor materials as described herein, each having a different selectivity for at least one gas component of the mixture to be detected. An inductor having the required sensitivity and operable to produce the above-described analytical measurement type and = is obtained by selecting a suitable composition of the material of the process inductor. Various suitable compositions of materials for this purpose are described above. The number of inductors in the array is generally greater than or equal to the number of constituents of the composition. -29- 1255340 A7

The gas mixture to be analyzed may be produced by a process or may be a chemical reaction money delivered to the apparatus. For this purpose, the apparatus of the present invention may also include the use of an array of electrical responses and optionally temperature measurements to control the components of the process or apparatus. Using electrical response of the sensor material and temperature measurement as appropriate, (iv) the process or component of the device contains decisions that produce repeated control, such as occurs in an internal combustion engine (combustion I chemical reaction, or control of the engine itself, or components or devices combined therewith) The eight-mouth combustion is a process in which the chemical reaction of the oxidation of hydrocarbon fuel takes place in the cylinder of the engine. The engine is a device that transmits the chemical hearing results in the middle, resulting in the force generated by the combustion reaction. The operation of the piston in the moving cylinder is required. Another example of the process is that the multi-component mixture of the released gas is a chemical reaction occurring in the fuel: battery and the device for transferring the chemical reaction product is other examples, such as used in the furnace. Or calving power @, or reducing (4) the scrubber in the stack of exhaust gas for processing. In the case of the engine, in order to control the combustion process or the operation of the engine itself, the microcomputer (such as T89C5K: CG1) performs many combustion processes. The various parameters related to or "the engine's production characteristics related to the decision-making routine. Microcomputer sets, reports and engine waste 4. Information relating to the content of the composition, obtained by responding by exposing the array of foot chemical/electroactive materials in the exhaust gas, and obtaining the temperature measurement as appropriate. The data is temporarily stored in the random access memory. In the middle, the microcomputer then issues one or more routines for making decisions. The routine of the house making decision uses one or more logarithmic and/or mathematical operations to change or take advantage of the fact that the numerical form is obtained. It is equivalent to the expected state of processing by special parameters of the private foot or by the operational characteristics of the device - 30 -

1255340 A7 B7 V. INSTRUCTIONS (28) OR CONDITIONS. For a chemical reaction process for combustion, the process can be controlled by adjusting the parameters of the reaction, such as the relative amount of reactants fed therein. For example, the fuel or air flowing into the cylinder can be increased or decreased. For the case of the engine itself, it is a device that delivers the results of the combustion reaction, which can be achieved by adjusting the operating characteristics of the engine, such as torque or engine speed. The following non-limiting examples are illustrative of the invention but are not intended to be limiting in any way. In the following examples, the 'wafer cassette' is used to describe an alumina substrate comprising an electrode and an inductive material, and a dielectric (if a dielectric is used). The symbol, 'X% AMCT, means that another inorganic compound (Α) has been added to the metal oxide (ΜΟ) at a specific concentration (X% at the atomic basis). ''Glass--words are used to describe mixtures of inorganic compounds that often form glass at certain temperatures. EXAMPLES The following are techniques that can be used to prepare inductor materials and use the infrared (IR) temperature recorder and AC impedance techniques to measure signal enumeration. IR Temperature Recorder Samples and Measurements The change in group resistance when exposed to a gas or gas mixture can be determined by measuring the temperature of the material sample as a technique of infrared temperature recorder imaging. Α. Fabrication of Array Wafers An empty row of array wafers is screen printed on an alumina substrate (96% alumina Γ X 0.75'f X 0.025 prepared by Coors Tek) by internally digitizing the electrode pattern (as shown in Figure 2). Manufactured using a semiconductor substrate printer (ETP Electro-dial, Series L-400). The electrode paste was purchased from DuPont/Technologies, product #5715. Using an electrode mesh (purchased from Microcircuit Engineering Corporation), the emulsion Thickness is 0.5 mil-31 - This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm)

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1255340 A7 ______B7___ V. Description of invention (29). After screen printing, the paste was placed in a general oven, dried under 12 Torr for 1 minute, and then sintered. The sintering was carried out in air using a 1 〇 z〇ne bdt Lindberg furnace with a cycle time of 30 minutes' and a maximum temperature of 85 ° C for 1 minute. The electrode is fired on the substrate, and after the mouth, the thickness of the emulsion is 9.9 mil of the mesh (Microcircuit Engineering Corporation #% pole dielectric printing medium (Dup〇nt z*jechn〇i〇gies, pr〇duct #5704) pattern 'As shown in Figure 2. Then dry the part at 12 ° C for 1 , minutes, and use the sintering cycle as described above to sinter. B · half, lead reading gold. _ gen ^ ^ ^ preparation and in the display wafer The above application will be about 175 mg of semiconducting metal oxide powder or semiconducting metal oxide and a suitable mixture of vitreous (DuP〇nt zTechn〇1〇gies product #F2889 or F3876), or semiconducting metal oxide powder and other inorganic compounds The mixture is weighed onto a glass that slides with about 753⁄4 grams of the appropriate medium (DuPont/Technologies product #M2619) and 1 milligram of the appropriate surfactant (Dupont / Technologies product #R0546). The medium and the surfactant are mixed together, and A metal oxide powder or mixture is slowly added to the medium and the surfactant to determine wetting. If necessary, a suitable solvent can be added at this time (DuP〇nt /1^1111〇1〇§丨^Product # R4553 ) ' Low viscosity. The paste is then transferred to an agate mortar and mashed for further mixing. A very small amount of paste is applied to one of the holes in the array wafer using a fine, pointed wood coater. The powder or mixture is repeatedly dried until all the holes on the other wafer are filled with the paste. When the holes in the array wafer are filled with the paste, the array wafer is placed in the closed chamber' and the low flow rate of N2 gas is passed through the array. Above the wafer, the array wafer was then dried at 120 C for 10 minutes, heated to 650 ° C at 1 ° C / min using a Fisher programmable box furnace in air, and maintained at this temperature for 30 minutes. -32- This paper size is generally Chinese National Standard (CNS) A4 specification (210X297 mm) &quot;&quot; 1255340 A7 ______Β7_ V. Invention description (30) Rate is 5 C / min, cooled to room temperature. 匕__Array The wafer cloth and wire are made of about 1.5&quot;0.005&quot; platinum wire. One end of the wire is bare and the other end is connected to the female RS232 connector. The exposed end of the thin wire is made of conductive paste (Pelco product #16023) Connected in the array One of the open conductive pads on the wafer. The second wire is attached to the other open conductive pads of the array wafer in the same manner. The wafer is then dried at 120 ° C for at least 4 hours. D· IR Temperature Recorder Measurement Laboratory Including gas flow input and output valves 2.75 &quot; cubes, T MgF window, two thermocouple feeders and two current feeders. The electric feeder was connected to a sample heater (Advanced Ceramics, Boralectric Heater # HT-42) and a voltage/current measuring unit (Keithley Instruments model #23 6). Gas flow was adjusted using a multi-gas controller (MKS model # 647B). The sample controller is controlled by a unit of Hampton Controls (70 VAC/700 W phase angle). In the measurement process, an infrared camera (Inframetrics PM390) was focused on the front surface of the array wafer using a 100 micron lens. Place the sample in the test chamber above the sample heater before measurement. The female end of the wire connected to the array wafer is then connected to an electrical feed connected to a voltage/current measuring monoalkane. The chamber is sealed and placed on the path visible to the IR camera. The gases (100 seem N2 and 25 seem 02) were then allowed to flow into the chamber during sample heating. The sample is then heated (about 10 ° C/min) to the desired temperature and equilibrated before the voltage/current measurement unit is activated and the voltage is applied. The voltage is typically adjusted so that the current through the array is between 10-20 mA. The IR temperature record of the material array is as follows after each change of the gas flow -33-^paper scale common Chinese National Standard (CNS) A4 specification (210&gt;&lt;297 mm) &quot;&quot;&quot; 1255340 A7 B7 V. DESCRIPTION OF THE INVENTION (31) Line 20 minutes · N2, 02 and gas mixture are as follows: 1% CO/99% N2, 1% N02/99% N2, and 1% C4H1()/99% N2. Unless otherwise stated, all of the following gas mixture contents are in % by volume. 2% 02/98% of the temperature of the material is subtracted from its temperature in other gas mixtures to determine the temperature signal in the example. Temperature reduction was performed using ThermMonitor 95 Pro, version 1.61 (Thermoteknix Systems, Ltd.). When exposed to the gas imparted, the resistance of the n-type semiconductor material decreases, causing the current to rise, so that the temperature rises due to I2R heating. When exposed to the acceptor gas, the resistance of the n-type semiconductor material increases, causing the current to drop, and the temperature drops due to I2R heating. The opposite is true for ρ-type semiconductor materials. Preparation of AC, Impedance i sample and SEM metal paste for about 2-3 grams of semiconductor metal oxide powder or semiconductor metal oxide and a mixture of suitable glass (DuPont / Technologies product #F2889* #F3876) ' or semiconductor A mixture of metal oxide powder and other inorganic compounds is weighed into a suitable amount of the appropriate medium (DuPont/Technologies product #M2619) to obtain a solid of about 40-70 wt%. These materials were then transferred to a grinder (Hoover Auto Grinder Model # M5) and mixed using a tongue depressor. If necessary, add a suitable surfactant (eg DuPont fTechnologies product # R0546) to reduce the viscosity. Further mixing was carried out using a grinder at a weight of 500 g, and about 6 times at 25 revolutions each. The resulting paste is then sent to the desired container. Fabrication of the device I Partially inductive wafers are fabricated from a single material rather than an array of inductive materials. Single Inductive Sample Wafer is made by screen printing with digital electrodes inside the electrode -34- This paper size is applicable _ 榡 榡 ( (CNS) Μ Specifications (_ χ 297 mm)

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1255340 A7 B7 V. Inventive Note (32) (0.4 ft long and prepared with an alumina substrate (Coors Tek, 96% alumina, 1 〃 X 1 〃 χ 0.025 &quot;) at intervals of 0.008&quot;). Semi-automated screen printing (ETP Electro-dial, Series L-4〇0) was used. Electrode paste (Product #57丨5 is from DuPont/Technologies. The thickness of the emulsion of Microcircuit Engineering Corporation is 〇·5 mil. After printing, the paste is dried in an oven at 120 ° C for 10 minutes and then sintered. The sintering system uses a 10 zone belt Lindberg furnace with a cycle time of 30 minutes and a maximum temperature of 10 ° C for 10 minutes. Then use the opening area 〇·5〃 X 〇.5〃的网 (Microcircuit Engineering Corporation) to sense The material was screen printed on the substrate. The emulsion thickness of the web was L0 mil. After printing the sensor material, the parts were dried in a 120 〇 oven for 10 minutes. At this time, the Lindberg tubular furnace was used to make the parts in the air. Sintering at 850 ° C for 10-45 minutes C. Manufacture of sensor arrays Various electrode and sensor structures can be used to obtain AC impedance data for the sensor array. The following describes the fabrication of 12 material arrays. The array wafer was prepared by screen printing an electrode pattern (Fig. 3) on an alumina substrate (Coors Tek, 96% alumina, 2.5', X 0.75, 'X 0.040,). Using semi-automated screen printing (ETP)Electro-dial, Series L-400. Electrode paste (Product #4597) was purchased from DuPont/Technologies. The thickness of the emulsion of Microcircuit Engineering Corporation was 0.4 mil. As shown in Figure 3, the sensor 塾The second is parallel, so only the unique sensor material measurement can be performed by the electrode structure. After printing, the paste is dried in an oven at 13 ° C for 10 minutes and then sintered. The sintering system is in 2 gas, using 1 〇. The ozone was placed in a Lindberg furnace with a cycle time of 30 minutes and taken at 850 C for 10 minutes at a south temperature. After the electrode was sintered on the substrate, the dielectric (DuPont/Technologies, product #QM44) was patterned (as shown in Figure 3). Emulsion thickness -35- This paper size applies to Chinese national standards ((=!]^8) A4 size (210X 297 mm) binding

1255340 A7 B7 V. INSTRUCTION DESCRIPTION (33) A 1.0 microcircuit Engineering Co卬oration screen is printed on the electrodes. The parts were then dried at 130 ° C for 10 minutes and sintered using the above sintering cycle. At this time, using the mesh shown in Fig. 3 (Microcircuit Engineering Corporation), the respective sensor materials are screen printed on the substrate to be inserted into a hole such as a dielectric. The emulsion thickness of the web is 1 〇 mil. After each sensor material was printed, the parts were dried in a general oven at 130 ° C for 1 minute. After all of the inductor material (6) was coated on the surface sensor material, the same sintered cycle sintered parts as described above were used. After the sintering step, the printing, drying and sintering steps as described above are carried out on the back side of the substrate, and six or more kinds of inductor materials are added to the array wafer. D_. AC Impedance Sounding For a single sensor material print, the 铂.2〃 platinum wire is connected to each electrode on a stainless steel spiral print. The end of the platinum wire is then connected to the inconel line of diameter 127&quot; The entire length of the inc〇nel line is encapsulated in alumina and the inconel tube is connected to eliminate the interference from the electromagnetic field present in the furnace. The inconel tube was welded to a stainless steel flange at the end of a 4&quot;length 24&quot;-end sealed melt quartz reactor. The quartz reactor is also wound with a grounded stainless steel mesh to eliminate electromagnetic interference from the furnace. All of the chamber components were placed in a linked Lindberg tubular furnace and the furnace was sealed. Use 10 pairs of coaxial cables (one pair per sample) (from the inc〇nel line on the outside of the furnace to the switch (Keithley 7001 with two Keithley 7062 high frequency cards), and a pair of coaxial cables with switch interface and analyzer, The sample was connected to a dielectric interface (Solartron 1296) and a frequency response analyzer (Solartron 1260). The switch, dielectric interface and frequency analyzer were all computer controlled. The gas flowing into the quartz chamber consisted of 4 separate flow agents (MKS products - 36 - This paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm)

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, % 1255340 A7 B7 V. Invention description (34) % # 1179) Computer control system adjustment of many gas controllers (MKS product # 647B). The temperature of the furnace was measured using a computer controlled mold logic controller (Fuji PYX). After the sample was placed in the furnace, it was charged into the quartz reactor as a synthetic gas mixture during furnace heating. After the furnace is equilibrated at the measured temperature, the gas concentration (N2, 02, 1% CO/99% and 1% N02/99% N2 is set to the desired value, and sufficient time to balance the gas in the reactor) At this time, the AC impedance measurement (1 Hz to 1 MHz) of each sample is measured sequentially. Then, the gas concentration is set to a new value, and the gas is equalized and another measurement is performed. The process is repeated until the measurement is performed at a specific temperature. All desired gases. At this point, change the temperature and repeat the procedure. After all measurements are taken, allow the furnace to cool to room temperature and remove the sample. For sensor array wafers, the above measurement system can be used. The only difference is platinum. The wire, which is connected to the inconel wire in the furnace, is connected to the electrode pads on the array wafer using a bonding paste (Pelco Product #16023). The number of sample-to-switch connections depends on the number of inductors on the array. 1 This example shows the change in electrical properties of 20 metal oxide semiconductor materials in the presence of four combustion gas compositions at 450 ° C. The signals listed in Table 1 below are derived from the above infrared temperature recorder technology. The signal is a measure of the difference in temperature (°C) when exposed to a gas (2% 02/98% N2) compared to one of the gas compositions shown, and reflects the change in resistance of the semiconductor material. Produced at 10 V through the material, unless otherwise stated. Spaces indicate that there is no detectable signal when the gas composition is in contact with the material. Unless otherwise stated, the gas system is measured at N2f 2000 ppm. -37- This paper size applies China National Standard (CNS) A4 specification (210 X 297 mm)

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1255340 A7 B7 V. Description of invention (35) Table 1 Changes in temperature QC)

ZnO Sn02 NiFe204 W03 l%Nb: Ti02 ΡΓ6〇ιι SrNb206 ν2 in the ν2 -38.1 -35.4 -27.4 -16.4 -2.7 -5.6 -2.8 2% 02/98% ν2 in the ν2 -35.2 -32.5 -13.7 -13.5 - 2.7 _ shouting CO in ν2 27.2 8.2 14 13.7 - - 8.3 Reference n2 16.9 9.6 11.2 5.6 12.4 - -

NiO CuO Cu20 MnTi03 BaCu02.5 A1V04 No2 in CuMnFe04 n2 5.5 8.2 8.2 5.6 6.6 - - 2% 02/98% no2 in n2 5.5 5.6 5.5 2.6 -2.7 2.6 n2 CO - -5.5 -13.8 _ -2.7 11.3 - Reference n2 -2.8 -5.6 -2.8 - -2.7 8.3 -

LaFe03 CuGa02 CuFe2〇4 Zn4Ti06 La2Cu04 SrCu202 n2 no2 - -2.8 -5.5 -5.7 4.2 - 2% 02/98% n2 no2 Sun-2.5 - - 2.6 n2 CO -2.8 - 7.3 - Reference n2 - - - - - -

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The following measurements were taken outside of 10 V. Pr6〇u is measured using 1 V;

BaCu025, CuMnFe04, CuGa〇ACuFe402 were measured using 16 V; Zn4Ti06 was measured using 20 V; LaCu04 and SrCu202 were measured using 12 V. Example 2 This example shows the change in electrical properties of eight metal oxide semiconductor materials in the presence of five combustion gas compositions at 450 °C. The signals listed in Table 2 below are derived from the above infrared temperature recorder technology. The signal is the measurement of the difference in temperature (°C) when exposed to the gas in the comparative gas (2% 〇2/98%). All signals are generated by 1〇v through the material, except -38- The paper scale is Chinese National Standard (CNS) A4 specification (2ι〇χ297 公董) 1255340

Unless otherwise stated. The space indicates that the gas composition does not detect the signal when it comes into contact with the material. Unless otherwise stated, the gas system is measured under the 2_ Peng. Table 2

Temperature (°C) change SnOn -35.4 -32.5 wo3 -16.4 SrNb206 -2.8 NiO 5.5 CuO 8.2 Cu20 8.2 aivo4 -13.5 5.5 5.6 5.5 -2.7 13.7 8.3 -5.5 -13.8 ΠλΤ~ ~5J~ - ~8.3 22 _:_ -6 -7 -11 IIEJ

N02 -38.1 2%02/98% in ZnO N2 -35.2 no2 n2 in ϋϋ~ \272 ¥Wn2~~ 'TeJ' Example 3

This example shows the change in electrical properties of 26 metal oxide semiconductor materials in the presence of four combustion gas compositions at 600 °C. The signals listed in Table 3 below are derived from infrared temperature recorder technology. The signal is a measure of the difference in temperature (C) relative to exposure to a comparative gas (2% 〇 2/98% N2) when the material is exposed to the gas composition shown. All signals are generated at 10 V through the material unless otherwise stated. The spaces indicate that the gas composition does not have a detectable nickname when it comes into contact with the material. The gas system was measured in N2 at 2〇〇〇?{)111 unless otherwise stated. Table 3 Changes in temperature (°C)

ZnO Sn02 NiFe204 l%Nb: Ti02 W03 FeTi03 SrTi03 NiO n2 no2 -54.4 -48.3 -36.3 -24.2 -18.1 -6.1 3 6 2% 02/98% n2 no2 -48.3 -48.3 -30.2 -12.1 -18.1 6.1 6 6 n2 CO 28.5 18.1 18.5 42.3 24.1 - -6 n2 30.2 24.1 h 15.1 r 24.1 6 3 - -9.1 -39- This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 B7 V. DESCRIPTION OF THE INVENTION (37) AlV〇4 CuO Cu20 LaFe03 BaCu02.5 Fe2〇3 SrNb206 ZnO+ 2.5% F2889 No2 in N2 - Predicate - Face - • -24 2% 02/98°/〇N2 no2 -6.1 6 6 -18 CO in CO 2 18.1 -6 -12.1 -3 -6 72.5 28.5 18 N2 18.1 -3 - - -6 - 18.1— 21 ZnO+ 10% F3876 Sn〇2+ 5% F2889 W〇3+ 10 % F3876 CuFe2〇4 Zn4Ti06 ZnTi03 Tm2〇3 Yb203 n2 no2 -42 -6 -15 -6 -12 -6 -6 -6 2% 02/98%N2 + N〇2 -24 -6 -18 - CO 12 in 6 n2 24 12 6 6 - - - n2 27 9 18 - 6 - - - Fe:Zr02 Mn4Cr03 No2 in -6 - 2% 02/98% N02 in N2 - - ~~ N2tCCO 6 24 n2 - _ All measurements are taken with 10 V, but BaCu02.5 is measured at 4 V; Fe203 is 1 V measurement; ZnO + 2.5% F2889, ZnO + 10% F3876, Sn02 + 5% F2889, Tm203, Yb203, Fe: Zr02 and MnCr03 are measured at 5 V; W03 + 10% F3876 is measured at 2 V; CuFe204 is based on 6 V measurement; and Zn4Ti〇6 and ZnTi03 are measured at 20 V. EXAMPLE 4 This example illustrates the use of one of the four metal oxide materials of Example 3 to identify four gas compositions that are displayed at 600 ° C using an ir temperature recorder signal. -40- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm)

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Edge 1255340 A7 B7 V. INSTRUCTIONS (38) The results are shown in Table 4 below. The signal is for exposure to a comparative gas (2% 02/9; all signals are at 10 V through the material 乂 gas composition in contact with the material and the gas system is at 2000 ρρηΓ temperature in N2 | In the middle, the phase s% n2) is measured as the difference in temperature (°c). 1 student, unless otherwise stated. Spaces show no detectable signals. Unless otherwise measured by T. Table 4 Change of Ct) SrTi03 Cu20 Fe2〇3 SrNb206 n2 no2 3 - - 2%02/98%N2 N02 6 6 - - n2 CO face-12.1. 72.5 28.5 n2 - - - 18.1 Example 5 This example demonstrates that the four groups of four metal oxide materials of Example 3 can be used to identify four gas compositions that are displayed at 600 ° C using an IR temperature recorder signal. The results are shown in Table 5 below. This signal is a measure of the difference in temperature (°C) relative to exposure to a comparative gas (2% 02/98% N2) when the material is exposed to the gas shown. All signals are produced at 10 V through the material unless otherwise stated. Spaces indicate that there is no detectable signal when the gas composition is in contact with the material. The gas system was measured at 2000 ppm in N2 unless otherwise stated. Table 5 Temperature (°C) change ZnO aivo4 LaFeO: ;BaCu〇2” n2 in n2 -54.4 - - 2%02/98%N2 N02 -48.3 -6.1 - -CO2 in n2 2 18.1 -3 -6 n2 30.2 18.1 - -6 -41 - This paper size is applicable to China National Standard (CNS) A4 specification (210x 297 mm) 1255340 A7 B7 V. Invention description (39)

Comparative Example A This comparison demonstrates that the six gas compositions of Example 3 can be used, using IR temperature recorder signals, to identify two gas compositions at 600T: and to illustrate the importance of proper selection of materials. The results are shown in Table 5A below. This signal is a measure of the difference in temperature (°C) from exposure to a relatively comparative gas (2% 02/98% N2) when the material is exposed to the gas shown. All signals are generated at 10 V through the material unless otherwise stated. The space indicates that there is no detectable signal when the gas composition is in contact with the material. The gas system was measured at 2000 ppm in N2 unless otherwise stated. Table 5a Change in temperature (°C)

Sn〇2 W03 FeTi03 NiO Sn〇2+5% F2889 No2 in the CuFe2〇4 n2 -48.3 -18.1 -6.1 6 -6 -6 2%02/98%N2 N02 -48.3 -18.1 -6.1 6 -6 -6

Compared with the car {column B. This comparison shows that the three types of materials can be used, and the IR temperature recorder signals are used to identify the two gas compositions at 600 ° C, and the importance of selecting materials appropriately. The results are shown in Table 5B below. This signal is a measure of the difference in temperature (°C) from exposure to a comparative gas (2% 02/98% N2) when the material is exposed to the gas shown. All signals are generated at 10 V through the material unless otherwise stated. The space indicates that there is no detectable signal when the gas composition is in contact with the material. The gas system was measured at 2000 pm in N2 unless otherwise stated. Table 5b Change in temperature (°C) aivo4 BaCu〇2.5 Zn4Ti06 CO in CO2 18.1 -6 6 n2 18.1 -6 6 -42- This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 B7 V. INSTRUCTIONS (40) Example 6 This example illustrates the AC impedance technique for measuring the response of a 19 heavy metal oxide semiconductor material in the presence of four gas compositions at 400 °C. The signals listed in Table 6 below are the ratio of the impedance of the material when exposed to the gas composition shown to the impedance of 1 〇 〇〇〇 pm 02. The gas used is N02 at 200 pm in N2, 200 pm N02 and 10,000 pm 02 in N2, 1000 ppm CO and N2 in N2 〇 Table 6

MgAl204 1% Zn: MgAl2〇4 ZnO W03 NiFe204 Sn02 No2 in Ti〇2 n2 0.6245 0.5544 55.85 8.772 5.008 9.243 1.536 no2 in 〇2/N2 0.7680 0.6787 47.38 9.468 12.93 10.56 1.585 n2 CO 1.531 1.459 0.1235 0.1865 Bu 1.248 0.0051 0.0116 n2 0.8242 0.9219 4.1290 1.716 1.327 0.3208 1.055

MnTi03 NiO SrNb206 CeV04 l%Nb: Ti02 FeTi03 Pr6〇n no no2 0.8643 0.5692 1.217 0.9847 1.937 1.299 0.5475 022/n2 N02 0.8475 0.9662 1.228 0.9977 1.674 1.034 0.5452 n2 CO 37.35 9.679 0.6501 1.045 0.0112 0.6009 1.184 N2 1.264 1.257 1.011 1.001 0.8811 1.028 1.103

SrTi03 BaCu2〇5 CuMnFe2〇4 LaFe03 Z112V2O7 n2 no2 0.6524 0.7869 0.9559 0.8401 1.209 Nn2 in Wn2 0.7596 0.7834 0.9399 0.8506 1.114 n2 CO 0.0178 0.7603 0.6089 2037 0.8529 n2 1.061 1.063 1.136 1.756 0.9900 Example 7 This example illustrates The AC impedance technique of 19 metal oxide semiconductor materials was measured at 550 ° C in the presence of four gas compositions. -43- The paper size is applicable to China National Standard (CNS) A4 specification (21〇X297 mm) 1255340 A7 B7 5. Invention description (41) The signal is from AC impedance technology. The signal is the ratio of the impedance of the material as it is exposed to the gas composition shown to the impedance of 10,000 ppm 02 in the crucible. The gas used is 200 ppm N02 in N2, 200 ppm N02 and 10,000 ppm 〇2 in N2, 1000 ppm CO and N2 in N2. Table 7

MgAl2〇4 1% Zn:MgAl204 ZnO W〇3 NiFe204 Sn02—n2 no2 0.9894 0.9583 3.866 2.335 3.025 1.655 o2/n2 N〇2 0.8937 0.8984 5.272 2.006 3.553 3.390 n2 CO 1.046 0.9697 0.0133 0.2034 0.2506 0.0069 n2 1.067 1.060 0.7285 0.9526 1.208 0.2666

Ti〇2 MnTi〇3 NiO SrNb2〇6 CeV04 l%Nb: no2 in Ti02 FeTi03 n2 1.135 1.010 0.9483 1.006 1.003 1.271 1.193 N〇2 in 〇2/N2 1.314 1.014 0.5207 1.044 0.9975 1.302 1.073 n2 CO 0.0017 44.00 1.194 0.2814 1.104 0.0021 0.6743 n2 0.7263 1.280 1.341 0.9830 1.024 0.477 1.054

Pr6〇ll SrTi03 Ba2Cu2〇5 CuMnFe2〇4 LaFe03 Z112V2O7 n2 no2 1.223 0.9055 0.7071 1.148 1.302 1.199 02/^2 N〇2 0.9656 0.9881 0.3812 0.9891 0.9429 1.086 n2 CO 62.76 0.0029 3.0892 2.557 123.3 0.4726 N2 1.495 1.210 1.333 1.681 1.789 0.9034 Example 8 This example illustrates the AC impedance technique for the measurement of 23 metal oxide semiconductor materials in the presence of four gas compositions at 650-700 °C. The signals listed in the table below are from AC impedance techniques. The signal is the ratio of the impedance of the material as it is exposed to the displayed gas composition to the impedance of 10,000 ppm 02 in the crucible. The gases used were 200 ppm N02 in N2, 200 ppm N02 and 10,000 ppm 〇2 in N2, 1000 ppm CO and N2 in N2. -44- This paper size is applicable to China National Standard (CNS) A4 specification (210X 297 mm) 1255340 A7 B7 V. Invention description (42)

SrTi03 Ba2Cu2〇5 CuMnFe2〇4 LaFe03 Z112V2O7 n2 no2 1.051 0.5615 3.401 1.331 0.8631 o2/n2 lacking N〇2 0.9320 0.9703 1.001 1.013 0.9459 n2 CO 0.0020 381.3 2.198 43.11 0.4672 n2 1.076 1.308 4.250 1.673 0.6574 Binding Table 8

MgAl204 1% Zn: MgAl2〇4 ZnO W03 NiFe204 Sn〇2 Ti02 No2 in 0.92 1.0450 1.022 0.4876 0.7151 0.5807 0.5419 0.5617 no2/N2 no2 0.6412 0.8310 1.235 1.281 1.105 0.8265 1.030 n2 CO 0.9074 0.9684 0.0348 0.2693 0.0408 0.0238 0.0015 n2 1.056 1.100 0.2753 0.6332 0.4421 0.3521 0.3957

MnTi03 NiO SrNb206 CeV04 l%Nb: Ti02 FeTi03 No.2 in Pr6〇n n2 1.445 1.379 0.8852 1.050 0.5711 0.9072 1.516 02 N 2 in heart 2 0.9561 0.8127 0.9862 1.135 0.8263 0.9524 0.9814 n in CO 113.3 1.782 0.0301 1.565 0.0035 0.4346 8005 N2 1.877 1.409 0.8788 1.080 0.2802 0.8050 1.962

ZnO X 2.5% F2889 ZnO+ 10% F3876 Sn02+ 5% F2889 W03+ 10% F3876 no2 in n2 0.5810 0.7944 0.6270 0.6055 o2/n2 N〇2 1.141 1.176 0.8927 1.284 n2 CO 0.0020 0.0016 0.0043 0.0122 n2 0.1054 0.1338 0.2780 0.4862

Example 9 This example illustrates the AC impedance technique for measuring 16 metal oxide semiconductor materials in response to the presence of four gas compositions at 800 °C. The signals listed in the table below are from AC impedance techniques. The signal is the gas group exposed to the display -45- This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 A7 B7 V. Invention Description (43) The impedance of the compound The ratio of the impedance of 10,000 ppm 02 in N2. The gases used were 200 ppm N02 in N2, 200 ppm N02 and 10,000 ppm 〇2 in N2, 1000 ppm CO and N2 in N2. Table 9

ZnO W03 NiFe204 Sn02 Ti02 MnTi03 NiO SrNb206 N2 in N2 2 0.3980 0.5737 0.6710 0.4050 0.4859 1.981 1.917 0.7555 o2/n2 no2 1.594 1.117 4.795 6.456 1.052 1.497 0.8529 0.9928 n2 CO 0.688 0.2610 0.0642 0.2349 0.0014 123.2 5.129 0.0144 N2 0.3070 0.5103 0.5339 0.2852 0.3093 2.882 2.124 0.5167

CeV04 1% Nb: Ti02 FeTi03 Pr6〇n SrTi03 Ba2Cii2〇5 CuMnFe2〇4 LaFe〇3 N2 in N22 1.013 0.3280 0.6799 1.569 0.0049 4.061 2.869 1.252 N〇2 in 〇2/N2 1.058 1.006 0.9982 1.010 0.0260 0.9811 0.9389 1.326 n2 CO 2.165 0.0047 0.2831 3530 1.004 216.0 ^ 0.8810 63.36 n2 1.075 0.1960 0.5600 2.999 1.048 7.445 3.413 1.612 -46- This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm)

Claims (1)

1255340 AB c D Μ /ϊ.\修日Λ Month Q VI. Application for patent scope 1. An apparatus for analyzing multi-component gas mixtures, comprising: (a) an array of at least two chemical/electroactive materials, each chemical/electrical The activated material exhibits an electrical response characteristic different from that of each of the other chemical/electrically active materials after being exposed to the gas mixture at a selected temperature, wherein the electrical response characteristics of at least one of the materials are numerically quantified, and wherein the material response value is The material is at least about one minute after exposure to the gas mixture at a selected temperature of at least about one minute; (b) means for determining the temperature of the array; and (c) after the array is exposed to the gas mixture, each is determined A component of an electrical/electrically active material that responds electrically. 2. The apparatus of claim 1, wherein the array is in a gas mixture and the temperature of the gas mixture is about 4,000 ° C or higher. 3. The apparatus of claim 1, wherein the gas mixture is emitted by a combustion process. 4. The equipment of claim 1 of the patent scope also includes means for calculating the concentration of at least one individual gas component in the gas mixture. 5. The apparatus of claim 1, wherein the temperature of each chemical/electroactive material is substantially determined solely by the temperature (variable) of the gas mixture. 6. The device of claim 1, wherein the electrical response is selected from the group consisting of a resistor, an impedance, a capacitor, a voltage, and a current. 7. The apparatus of claim 1, wherein the at least one chemical/electroactive material is a metal oxide. 8. The apparatus of claim 1, wherein the multi-component gas mixture is emitted by a process or is a chemical reaction product delivered to the device, and the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297). PCT 1255340 'Scope of Patent Application=The equipment also includes equipment that utilizes electrical response to control the process or device. 9. An array of chemical/electroactive materials, each chemically activated material exhibiting an electrical response characteristic different from that of other chemical/electroactive materials after exposure to a gas mixture at a selected temperature, wherein the chemical/electrical activation property is selected from Pairs of the following groups: 1 the first material is ιν^Οχ, and the second material is MiaM2b〇x; (ii) the younger material is Μ 〇x, and the second material is; (iii) The first material is MaM2bOx, and the second material is; (lv) the first material is the first type Μι〇χ, and the second material is the second type Μ; (v) the first material is the first a μ\μ\〇χ, and the second material is the first Two kinds of Μ\Μ\〇χ,• and (10) The first material is the first type μ, Μ\μ\〇χ, and the second material is the second type μ, μ\μ\οχ; Free ce5 Co5 Cu, Fe, Ga, Nb, Ni, Pr, RU, Sn, Ti, Tm, w, Yb, Zn, and Zr; M2 and M3 are independently selected from ai, Ba Bi, Ca, Cd, Ce, Co, (3⁄4 Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na, Nb, Ni, Pb, Pr5 Rb, Ru, Sb5 Sc, Si5 Sn, Sr , Ta, Ti, Tm, V, W, Y, Yb, Zn, and Zr, but M2 and M3 are different in Μ^Μ^Μ^Οχ; a, b, and c are each independent 0.0005 to about 1; and χ is sufficient to make the oxygen balance of the other elements in the compound; the paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1255340 έ88 C8 D8 VI. Patent application scope (b a member for determining the temperature of the array; and (c) a member for determining the electrical response of each chemical/electrical activation characteristic after the array is exposed to the gas mixture. 10. The device of claim 9 wherein (a) is Choose free CeaOx, CoOx, CuOx, F eOx, GaOx, NbOX5 NiOx, PrOx, RuOx, SnOx, TaaOx, TiOx, TmOx, WOx, YbOx, ZnOx, ZrOx, SnOx with Ag additive, ZnOx with Ag additive, TiOx with Pt additive, with glassy additive Group of ZnOx, NiOx with vitreous additive, SnOx with vitreous additive and WOx with glazing additive; (8) Μ, Μ\〇χ# Free AlaCrbOx, AlJebC^ AlaMgbOx, AlaNibOx, AlaTibOx, AlaVbOu BaaCubOx, BaaSnbC^ BaaZnbOx, BiaRubOx, BiaSnbOx, BiaZiib〇x, C~Sn^〇x5 C3^Ziib〇x5 Cd^SiibOxj CdaZiibOx^ CeJFebOj^ CeaNbb〇 along CeaTibO along CeaVbC^COaCubC^COaGebC^ C〇aMgbO along COaNbbC^ CoJPbbC ^ CoaSnbO along CoMC^. Cookware 0 along CoaZnbO^ CraCubOx? CraLabOx? CraMnbOx? CraNibOx? CraSibOx? CraTibOx? CraYb〇X5 CraZnbOx, CuaFebOx, CuaGatO along CuaLabC^ CuaNabC^ CUaNibC^ CuJPbbC^ CuaSnbC^ CiiaSrbC^ CiiaTibC^ CuaZnbC^ (ΧΖιΛ FeaGa^ FeaLabO^ FeaMobOx ? FeaNbbOx, FeaNibOx? FeaSnbOX5 FeaTibOx? FeaWbOX9 FeaZnbOx, FeaZrbOx, GaaLabOx, G~SnbOx, GeaNbbOx, GeaTibOX5 InaSnbOx? KaNbbOX5 MnaNbbOx? MnaSnbOx? MnaTibOx? MnaYbOX5 MnaZnbOx? MoaPbbOx? MoaRbbOx? MoaSnbOx? MoaTibOx? MoaZnbOx? NbaNib〇X5 NbaNibOX5 NbaSrbOx? NbaTibO,, NbaWbOx? NbaZrbOx? NiaSib〇x, MaSnb〇X5 NiaYbOx, NiaZnbO"NiaZrb〇" PbaSnbO along the PbaZnbO along the -3- paper scale for the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A BCD 1255340 Sixth, the scope of patent RbaWbOx, RuaSribO ^ RuaWbOx? RuaZnbOx? SbaSnbOx? SbaZnbOX5 ScaZrbOx? SiaSribO ,, SiaTibOx? SiaWbOx? SiaZnbOX9 SriaTabO ,. SnaTibOX5 SnaWbOx? SnaZnbOX5 SnaZrbOx? SraTibOX5 TaaTibOx? Τ ^ Οχ? TiaVbOx? TiaWbOx, TiaZnbOx? TiaZrbOX9 VaZnbOx VaZrbOx? WaZnbOX5 WaZrbOx, YaZrbOx ZnaZrbOx, AlaNibOx with glass additive, CraTibOx with glass additive, FeaLabOx with glass additive, FeaNibOx with glass additive, FeaTibOx with glass additive, NbaTibOx with glass additive, NbaWbOx with glass additive a group of NiaZnbOx with a vitreous additive, NiaZrbOx with a vitreous additive, SbaSnbOx with a vitreous additive, TaaTibOx with a vitreous additive, and TiaZnbOx with a vitreous additive; and/or (c) Μ^ΜίΜ ^ Οχ system selected from AlaMgbZnAc, AlaSibVA ^ BaaCubTicOx, CaaCebZrcOx? CoaNibTicOx? CoaNibZrcOX5 COaPbbSncO ^ COaPbbZncOx, CraSrbTicOX5 CuaFebMncOx, CuaLabSrcOX5 FeaNbbTicOx, FeaPbbZnc〇x, FeaSrbTicOx, FeaTabTicOx, FeaWbZrcOx, G ^ TibZncOx, L ^ MribNacOx, LaaMnbSrcOX5 MnaSrbTicOx? MoaPbbZneO ,, NbaSrbTicOx? NbaSrbWcOx? NbaTibZne〇x, NiaSrbTicOx, SnaWJ^^ TiaWbZreOx group. 11. The apparatus of claim 9, wherein the array is in a gas mixture and the temperature of the gas mixture is about 4,000 ° C or higher. 12. The apparatus of claim 9, wherein the gas mixture is emitted by a combustion process. 13. For equipment in the scope of patent application No. 9, in which -4- of this gas mixture is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Scope of Application The component gases are not separated. 14. The apparatus of claim 9, wherein the electrical response of each chemical/electroactive material is determined only by exposure to a multi-component gas mixture. 15. A device as claimed in claim 9 further comprising means for calculating the concentration of at least one individual gas component in the gas mixture. 16. The equipment of claim 9 of the patent application also includes means for measuring the temperature of the gas mixture and means for digitizing the electrical response and temperature measurement. 17. The apparatus of claim 9, wherein the temperature of each chemical/electroactive material is substantially determined solely by the temperature (variable) of the gas mixture. 18. The apparatus of claim 9, wherein at least one chemical/electrically active material has an electrical impedance of (8) between about 1 ohm-cm to about 106 ohm-cm at a temperature of about 400 ° C or higher, and (b) exhibiting a resistance change of at least about 0.1% after exposing the material to the gas mixture as compared to the impedance prior to exposure. 19. The apparatus of claim 9 wherein the temperature is selected to be exposed to the gas mixture. The electrical response characteristics of the at least one material are quantified numerically and the value of the material response is a certain or no change of no more than about 20% after exposure of the material to the gas mixture at the selected temperature for at least about one minute. 20. The device of claim 9, wherein the electrical response is selected from the group consisting of resistance, impedance, capacitance, voltage, and current. 21. The apparatus of claim 9 wherein the multicomponent gas mixture is produced by a process or is a chemical reaction product delivered to the apparatus, and wherein the apparatus further comprises utilizing an electrical response to control the process or apparatus. -5- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Application for patent scope. 22. Apparatus for analyzing a multi-component gas mixture, comprising: (a) an array of chemical/electroactive materials, each chemically active material being exposed to a gas mixture at a selected temperature, presenting with other chemical/electroactive materials Different electrical response characteristics, wherein at least one of the chemical/electroactive materials is selected from the group consisting of "Οχ, Μ^Μ'Οχ and Μ\Μ\Μ'Οχ; wherein Μ1 is selected from Ce, Co, Cu, a group consisting of Fe, Ga, Nb, Ni, Pi*, Ru, Sn, Ti5 Tm, W, Yb, Zn, and Zr; M2 and M3 are independently selected from the group consisting of Al, Ba, Bi, Ca, Cd, Ce, Co, Cr, Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na, Nb, Ni, Pb, Pr, Rb, Ru, Sb, Sc, Si, Sn, Sr, a group consisting of Ta, Ti, Tm, V, W, Y, Yb, Zn and Zr, but M2 and M3 are different in Μ^Μ'Μ^Οχ; a, b and c are each independently about 0.0005 to Approximately 1 ; and χ is sufficient to allow the presence of oxygen to equalize the charge of other elements in the compound; (b) the member that determines the temperature of the array; and (c) the chemical/electrical activation characteristics of the array after exposure to the gas mixture The component of the electrical response. 23. For the equipment of Patent Application No. 2, (a) choose CeaOx, CoOx, CuOx, FeOx, GaOx, Nb〇x, NiOX5 PrOx, Ru〇x, SnOx, TaaOx, Ti 〇x, TmOx, WOX5 YbOx, ZnOx, ZrOx, SnOx with Ag additive, ZnOx with Ag additive, TiOx with Pt additive, ZnOx with glassy additive, Ni〇x with glassy additive, with glassy additive Group of SnOx & WOxK with vitreous additives; -6- This paper scale applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Scope of application (b) Μ, Μ\〇Χ is selected from AlaCrbOx, AlaFebOx, AlaMgbOx, AlaNibOx, AlaTibOx, AlaVbOx, BaaCubOx, BaaSnbOx, BaaZnbOx, BiaRubOx, BiaSnbOx, BiaZnbOx, CaaSribOu CaaZnbC^CdaSnbC^CdaZnbC^ CeJFebC^ CeaNbbC^ CeaTibC^ CeaVbC^ 0:〇3 〇1This COaGetC^ (:〇山耻0沿(3〇掏此CoaNbbOX5 &lt;3〇办〇 along CoaSnbO along CoaVbC^ COaWbC^ COaZribO^ CraCubO^ CraLabOx? CraMnbOX9 CraNibOx, CraSibO^ CraTibOx, Cra Yb〇x, CraZrib〇x5 CuaFeb〇x, CuaGab〇x5 CuaLab〇x, CuaNab〇x, CuaNibOx® CuaPbbOx® CuaSnbOx® CuaSrbOX9 CuaTibOx® CuaZnbOx, CuaZrbOx, FeaGabOx, FeaLabC^ FeaMobOx, FeaNbbOX5 FeaNibOx, FeaSnbOX5 FeaTibOx, FeaWbOx, FeaZnbOx , FeaZrbOx, GaaLa ^ GaaSnbOx, GeaNbbOx? GeaTibOX5 InaSnbOX5 KaNbbOx? MnaNbbOx? MnaSnbOx? MnaTibOX5 MnaYbOX5 MnaZnbOx? MoaPbbOX5 MoaRbbOX5 MoaSnbOx? MoaTibOx, MoaZnbOx, NbaNibOx, NbaNibOX5 NbaSrbOx, NbaTibOx, NbaWbOx, NbaZrbOx, NiaSibOu NiaSnbOx, NiaYbOx, NiaZnbOx, NiaZrbOX5 PbaSnbOx, PbaZnbOx, RbaWbOX5 RuaSnbOx, RuaWbOX5 1111 0 along SbaSnbOx? SbaZnbOx? ScaZrbOx? SiaSnbOx? SiaTibOx? SiaWbOX5 SiaZnbOX5 SnaTabOx? SnaTibOx? SnaWbOX5 SnaZnbOx? SnaZrbOx? SraTibOx? TaaTibOx, TaaZnbOX5 TaaZrbOX5 TiaVbOX5 TiaWbOx? TiaZnbOx? TiaZrbOX5 VaZnbOx? VaZrbOx, WaZnbOx, WaZrbOx , YaZrbOx, ZnaZrbOx, AlaNibOx with vitreous additive, CraTibOx with vitreous additive, FeaLabOx with vitreous additive, FeaNibO with vitreous additive x, FeaTibOx with vitreous additive, NbaTibOx with vitreous additive, NbaWbOx with vitreous additive, NiaZnbOx with vitreous additive, NiaZr*bOx with vitreous additive, and Chinese National Standard (CNS) with this paper scale A4 size (210 X 297 mm) AB c D 1255340 6. Group of SbaSnbOx with glass additive, TaaTibOx with glass additive and TiaZnbOx with glass additive: and/or (c) Μ, Μ \ Μ \ 〇χ system selected from AlaMgbZne〇x, AlaSibVcOX5 BaaOibUOx, C~CebZrcOx, CoaNibTicOx, CoaNibZrcOx, CoaPbbSnc〇x, CoaPbbZnc〇X5 CraSrbTic0X5 CuaFebMncOx, CuaLabSrc0X5 FeaNbbTicOx, FeaPbbZnc〇x, FeaSrbTicOx, FeaTabTicOx, FeaWbZrcOx, GaaTibZnc 〇x, LaaMribNacOx, LaaMnbSrcOx, MnaSrbTicOx, ΜοΛΖηοΟχ^ NbaSrbTicOx, NbaSrbWcOx, NbaTibZ~Ox, NiaSrbTicOX5 SnaWbZ~0X5 SraTi%^ TiaWbZre(V;f group. 24. The apparatus of claim 2, wherein the array is in a gas mixture and the temperature of the gas mixture is about 400 ° C or higher. 25. The apparatus of claim 22, wherein the gas mixture is emitted by a combustion process. 26. The apparatus of claim 22, wherein the constituent gases of the gas mixture are not separated. 27. The apparatus of claim 2, wherein the electrical response of each chemical/electroactive material is determined only by exposure to a multi-component gas mixture. 28. The apparatus of claim 22, further comprising means for calculating the concentration of at least one individual gas component in the gas mixture. 29. The equipment of claim 22, which also covers the temperature of the gas mixture, and the means for digitizing the electrical response and temperature measurement. 30. The apparatus of claim 22, wherein the temperature of each chemical/electroactive material is substantially determined solely by temperature (variable) of the gas mixture. -8- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Patent application scope 31. For equipment such as patent application category 22, at least one chemical/electricity The activating material has an electrical impedance of (8) between about 1 ohm-cm to about 106 ohm-cm at a temperature of about 400 ° C or higher, and (b) after exposing the material to the gas mixture, compared to the impedance before exposure. Presenting a resistance change of at least about 0.1%. 32. The apparatus of claim 22, wherein the electrical response characteristic of at least one of the materials when exposed to the gas mixture at the selected temperature is quantified numerically and the value of the material response The material is or must not vary by more than about 20% after exposure to the gas mixture for at least one minute at the selected temperature. 33« The device of claim 22, wherein the electrical response is selected from the group consisting of resistance, impedance, capacitance, voltage, and current. 34. The apparatus of claim 22, wherein the multi-component gas mixture is produced by a process or is a chemical reaction product delivered to the apparatus, and wherein the apparatus further comprises means for controlling the process or apparatus by electrical response . 35. A gas sensitive device comprising: (a) an array of at least three chemical/electroactive materials, each chemical/electroactive material exhibiting a change in electrical resistance upon exposure to a gas mixture, wherein at least one chemical/electrical activation The material has (i) a resistance between about 1 ohm-cm to about 106 ohm-cm at a temperature of about 400 ° C or higher, and (ii) after exposing the material to the gas mixture as compared to the resistance prior to exposure. Presenting a resistance change of at least about 0.1%; and (b) means for determining the temperature of the array. 36. For the equipment of patent application No. 35, in which the temperature is selected at the selected temperature -9- This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) 1255340 - C8 D8 VI. The electrical response characteristics of at least one of the materials in the gas mixture are quantified numerically and the value of the material response is constant or no more than about 20% after exposure of the material to the gas mixture at the selected temperature for at least about one minute. 37. The apparatus of claim 35, wherein at least one of the chemical/electrically active materials is a metal oxide. 38. The apparatus of claim 35, wherein the gas mixture is emitted by a combustion process. 39. The apparatus of claim 35, further comprising means for calculating the concentration of at least one individual gas component in the gas mixture. 40. The apparatus of claim 35, wherein the temperature of each chemical/electroactive material is substantially determined solely by the temperature (variable) of the gas mixture. 41. The device of claim 35, wherein the electrical response is selected from the group consisting of: resistance, impedance, capacitance, voltage, and current. 42. The apparatus of claim 35, wherein the multi-component gas mixture is emitted by a process or is a chemical reaction product delivered to the device, and wherein the device further comprises utilizing an electrical response to control the process or device. member. 43. The apparatus of claim 35, wherein the component gas in the gas mixture is not separated. 44. An apparatus for analyzing a multi-component gas mixture comprising (8) an array of at least two chemical/electroactive materials, each chemical/electrical activation material exhibiting a chemical/electrical activation upon exposure to a gas mixture at a selected temperature Different electrical response characteristics of materials, of which -10- of this paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Less patent application range The electrical response characteristics of one material are numerical Quantitative, and wherein the value of the material response is constant or not more than about 20% after exposure of the material to the gas mixture at a selected temperature for at least one minute; (b) heating the array to above 500 °C a heater for temperature; (c) a component that determines the electrical response of each chemical/electrically active material after exposure of the array to the gas mixture; and (d) an electrical response only by inputting the chemical/electroactive material, rather than Detecting the presence of one or more individual component gases and/or sub-groups in the gas mixture by inputting a baseline response value, comparing the response value, or a reference response value, or calculating the Mixture of one or more individual component gases and / or the actual concentration of the secondary member of the group. 45. The apparatus of claim 44, wherein the array is in a gas mixture and the temperature of the gas mixture is about 400 ° C or higher. 46. The apparatus of claim 44, wherein the gas mixture is emitted by a combustion process. 47. The apparatus of claim 44, further comprising means for calculating the concentration of at least one individual gas component in the gas mixture. 48. The device of claim 44, wherein the electrical response is selected from the group consisting of: resistance, impedance, capacitance, voltage, and current. 49. The apparatus of claim 44, wherein the component gas in the gas mixture is not separated. 50. The apparatus of claim 44, wherein at least one of the chemical/electrically active materials is a metal oxide. 51. For equipment of patent application No. 44, where the multi-component gas is mixed -11 - the paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 The hairline is issued by &gt;&amp; or is the chemical reaction product delivered to the device, and the device also includes components that utilize electrical responses to control the process or device. 2—A device for analyzing a multi-component gas mixture, comprising: (4) an array of first and second chemical/electroactive materials, each chemical. The activated material is exposed to the gas mixture at a selected temperature, Other chemical/electrically active materials having different electrical response characteristics, wherein the chemical/electroactive material is selected from the group consisting of: the first material is Μ^χ, and the second material is MiaM2b〇x; (8) The first material is Μ1〇χ, and the second material is Μ, Μ, Μ3α〇“ (111) the first material is MlaM2b〇x, and the second material is y (iv) the first material is the first One type is Μι〇χ, and the second material is the second type Μ1,,; (ν) the first material is the first type Μ\Μ\〇χ, and the second material is the second type μ, μ\ Οχ ; and (Vi) the first material is the first type MiaM2bM3c〇x, and the second material is the second type Μ^Μ'Μ3. ^; wherein Μ1 is selected from Ce, Co, Cu, Fe, Ga, a group consisting of Nb, Ni, Pr, Ru, Sn, Ti, Tm, w, Yb, Zn and Zr; M2 and M3 are independently selected from the group consisting of Al, Ba, E, Ca, Cd, Ce, Co, Cr*, Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, M〇, Na, Nb, Ni, Pb5 Pr, Rb, Ru5 Sb5 Sc, Si, Sn, Sr, Ta, Ti, Tm , group of V, w, Y, Yb, Zn and Zr, but M2 and M3 are in Μ^Μ'Μ^Οχ -12- This paper scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) Binding m 1255340 as B8 C8 Wide D8 VI. The scope of the patent application is different; a, b and c are each independently from 0.0005 to about 1; and X is sufficient to make the number of charges of other elements in the oxygen-equilibrated compound present; a heater that heats the array to a temperature above 500 ° C; (c) a component that determines the electrical response of the respective chemical/electrically active material after the array is exposed to the gas mixture; and (6) only inputs the chemical/electrical Detecting the electrical response of the activating material, rather than detecting the presence of one or more individual component gases and/or sub-groups in the gas mixture, or calculating one of the gas mixtures, by inputting a baseline response value, a comparison response value, or a reference response value Or a component of the actual concentration of the individual component gases and/or sub-groups. 53. The apparatus of claim 5, wherein (a) 1^(\ is selected from the group consisting of CeaOX5 CoOx, CuOx, FeOx, GaOx, NbOx, NiOx, PrOx, RuOx, SnOx, TaaOx, TiOx, TmOx, WOX5 YbOx, ZnOx, ZrOx, SnOx with Ag additive, ZnOx with Ag additive, TiOx with Pt additive, ZnOx with glassy additive, NiOx with glassy additive, SnOx&amp; with glassy additive, with glassy additive a group consisting of wox; (b) Μ, Μ\〇χ is selected from AlaCrbOx; AlaFebC^ AlaMgbC^ AlaNibC^ AlaTib〇x, AlaVbOx, BaaCubOx, BaaSnbOx, BaaZnbOx, BiaRubOx, BiaSnbOX5 BiaZnbOx, Ca^SnbC^ CaaZnbC^ CdaSnbC^ CdaZnbC^ CeaFebO along CeJibOu CeaVbO^ CoaCutA^ (3〇Your team COaLatA^ C〇MgbC^ CoaNbbC^ (10) Team COaSntA^ CoaVbC^ CoaWbC^ CoaZnbO^ CraCubOX9 CraLabOx? CraMnbOx? CraNibOX5 CraSibOx? CraTibOx? CraYb〇x, CraZnbOx, CuaFebOx, 啦 耻 0. 咕 (6) along CuaNabC^ 〇1^This-13- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Patent application Range C^PbbOu C~Snb〇 along CuaSrb〇x^. From CuaZnbO”FeaGabC^ FeaLabOx, FeaMobOx? FeaNbbOX5 FeaNibOx? FeaSnbOx, FeaTibOx? FeaWbOx? FeaZnbOx, FeaZrbOx, GaaLab〇x, GaaSnbOx, GeaNbbOx, GeaTibOX5 InaSnbOx? KaNbbOx? MnaNbbOX9 MnaSnbOx? MnaTibOx? MnaYbOx? MnaZnbOx? MoaPbbOx? MoaRbbOx? MoaSnbOx? MoaTibOX5 MoaZnbOX5 NbaNibO along Chan 0 wind along NbaSrbOx, NbaTibOx, NbaWbOX5 and Chan 0 Bom NiaSibOx? NiaSnbOx? NiaYbOX5 Ν ^ Ζη ^ PbaSribO ,. PbaZn ^ RbaWbC ^ RuaSnbC ^ RuaWbOx, RuaZnbOx, SbaSnbC ^ SbaZnbOx, ScaZrbOX9 SiaSnbOX5 SiaTibOx? SiaWbOX5 SiaZnbOx? SnaTabOX5 SriaTibOx, SnaWbOX5 SnaZnbOx? SnaZrbOx? SraTibOX5 TaaTibOx? TaaZnbOx? TaaZrbOx? TiaVb〇X3 TiaWbOX5 TiaZnbOX5 TiaZrbOX5 VaZribO ^ VaZrbOx, WaZnbOx? WaZrbOx, YaZrbOx, ZnaZrbOx, with a glass AlaNibOx as a quality additive, CraTibOx with a glass additive, FeaLabOx with a glass additive, FeaNibOx with a glass additive, FeaTibOx with a glass additive, NbaTibOx with a glass additive, and a glass additive NbaWbOx, NiaZnbOx with vitreous additive, NiaZrbOx with vitreous additive, SbaSnbOx with vitreous additive, TaaTibOx with glass additive, TiaZnbOxK with vitreous additive; and/or (c) Μ, Μ \Μ\〇χ is selected from AlaMgbZnc〇x, AlaSibVcOx, BaaCubTicOx, CaaCe^O^ CoaNibTicOX3 CoaNibZrcOX5 CoaPbbSne〇x? COaPbbZricO,, CraSrbTicOx? CuaFebMricO, CuaLabSrcOx? FeaNbbTicOx? FeaPbbZrieO,, FeaSrbTic〇x? FeaTabTicOx? FeaWbZrcOx? L^ MiibNaeO^ La^MnbSrAo MnaSrbTicOx, MoJPbbZncOx, NbaSrbTicOx, NbaSrbWcOx, -14- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 8 8 8 8 AB c D 1255340 VI. Patent application scope NbaTibZncO^ NiaSrbTicOx? SriaWbZricOx, SraTibVcOx? SraTibZncOx^ TiaWbZreOJ/f group. 54. The apparatus of claim 5, wherein the array is in a gas mixture and the temperature of the gas mixture is about 400 ° C or higher. 55. The apparatus of claim 5, wherein the gas mixture is emitted by a combustion process. 56. The apparatus of claim 5, wherein the component gas in the gas mixture is not separated. 57. The apparatus of claim 5, wherein the apparatus for calculating the concentration of at least one individual gas component in the gas mixture is included. 58. The equipment of claim 5, which also covers the temperature of the gas mixture, and the means for digitizing the electrical response and temperature measurement. m 59. The apparatus of claim 5, wherein at least one chemical/electrically active material has an electrical impedance of (8) between about 1 ohm-cm to about 106 ohm-cm at about 40 (TC or higher) And (b) exhibiting a resistance change of at least about 0.1% after exposing the material to the gas mixture as compared to the impedance prior to exposure. 60. The apparatus of claim 5, wherein the exposure is at a selected temperature. The electrical response characteristics of at least one of the materials in the gas mixture are quantified numerically and the value of the material response is constant or not more than about 20% after exposure of the material to the gas mixture at the selected temperature for at least about one minute. For example, the device of claim 5, wherein the electrical response is selected from the group consisting of resistance, impedance, capacitance, voltage, and current. -15- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 - C8 D8 VI. Patent Application No. 62. The apparatus of claim 5, wherein the multi-component gas mixture is issued by a process or is transferred to a device. Reaction product, and wherein the apparatus further comprises means for controlling the process or apparatus by electrical response. 63. Apparatus for analyzing a multi-component gas mixture, comprising: (a) an array of chemical/electroactive materials, each chemically activated The material exhibits an electrical response characteristic different from that of other chemical/electroactive materials after exposure to a gas mixture at a selected temperature, wherein at least one chemical/electroactive material is selected from the group consisting of ΜΟχ, Μ\Μ\〇χ and . Group of Μ1 is selected from the group consisting of Ce, Co, Cu, Fe, Ga, Nb, Ni, Pr, Ru, Sn, Ti, Tm5 W, Yb, Zn and Zr; M2 and M3 are independent Selected from Al, Ba, Bi, Ca, Cd, Ce, Co, Cr, Cu, Fe, Ga, Ge, In, K, La, Mg, Mn, Mo, Na5 Nb, Ni, Pb5 Pr, Rb, Ru , Sb, Sc5 Si, Sn, Sr, Ta, Ti5 Tm, V, W, Y, Yb, Zn and Zr, but M2 and M3 are different in Μ\Μ\Μ'Οχ; a, b and c are each independently from about 0.0005 to about 1; and χ is sufficient to allow oxygen to equalize the charge of other elements in the compound; (b) heating the array above 500° a heater for the temperature of C; (c) a component for determining the electrical response of the respective chemical/electroactive material after the array is exposed to the gas mixture; and (d) an electrical response only by inputting the chemical/electroactive material, Instead of entering a baseline response value, a comparison response value, or a reference response value, detecting the presence of one or more individual component gases and/or sub-groups in the gas mixture, or calculating one or more individual formations in the gas mixture-16 - This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A BCD 1255340 The patent application 构件 component of the actual concentration of gas and / or sub-group. 64. The device of claim 63, wherein (a) is selected from CeaOx, CoOx, CuOx, FeOx, GaOx, NbOx, NiOx, PrOx, RuOx, SnOx, TaaOX5 TiOX5 TmOx, WOx, YbOx, ZnOx, ZrOx Group of SnOx with Ag additive, ZnOx with Ag additive, TiOx with Pt additive, ZnOx with glass additive, NiOx with glass additive, SnOx with glass additive, and WOxK with glass additive (b) Μ, Μ\〇χ is selected from AlaCrA^ AlaFebC^ AlaMgbOn AlaNibOx, AlaTibOx? AlaVbOX5 BaaCubOx? BaaSnbOx? Β^ΟΧ5 BiaRubOx? BiaSnbOx? BiaZrib〇x, Ca^SribOxj C^aZribOx^ CdaSribOj^ CdaZiibOx^ CeaFe ^Oxj CeaNbbC^ CeaTibC^ CeaVbO along COaCubC^ CoaGeiA^ CogLatC^ C°Mgb〇x, COaNbbOx, COaPbbOx, COaSribOx, COaVbOx, COaWbOx, COaZnbO^ CraCubOx, CraLabOx? CraMnbOX5 CraNibOx, CraSibOx? CraTibOx, CraYb〇X5 CraZnbOx? CuaFebOx? CuaGabO^ CuaLabOx, CiiaNabO^ CiiaNibO^ CuaPbbC^ CuaSnbC^ CuaSrbO along CUaTibC^ CuaZribC^ CiiaZi^ FeaGab〇 along F^LabO^ FeaM〇b〇x? FeaNbbOx? FeaNib x? FeaSnbOx? FeaTibOx? FeaWbOX5 FeaZnb〇x, FeaZrbOx, GaaLabOx? GaaSnbOX5 GeaNbbOX5 GeaTibOX5 KSribO ^ KaNbbOx? MnaNbbOX5 MnaSnbOx? MnaTibOX5 MnaYbOx? MnaZnb〇x, MoaPbbOx, MoaRbbOx, MoaSnbC ^ MoaTibOx, MoaZnbOx, NbaNib〇x? NbaNibOx? NbaSrbOx? NbaTibOX5 NbaWbOx? NbaZrbOx? NiaSibOx, NiaSnbOx, NiaYbOx, NiaZribC ^ NiaZrbC ^ PbaSnbC ^ PbaZribC ^ RuaSnbO ^ RuaWbOx? RuaZnbOX5 SbaSnbOx, SbaZnbOx? ScaZrb〇X5 SiaSnbOx? SiaTibOx? SiaWbOX5 SiaZnbOX5 SriaTabO ,, SnaTibOx? -17 mutatis mutandis China national Su ( CNS) A4 specification (210 x 297 dongdong) 1255340 as B8 C8 D8 VI. Patent application scope SnaWbOx, SnaZnbOx, SnaZrbOx, SraTibOx, Τ~Τ\Οχ, TaaZnbOx, Dingbium TiaVbOx? TiaWbOX5 TiaZnbOx? TiaZrbOx? VaZnbOX5 VaZrbOX9 WaZn5Ox WaZrbOx, YaZrbOx, ZnaZrbOx, AlaNibOx with glassy additive, Ci:aTibOx with glassy additive, FeaLabOx with glassy additive, FeaNibOx with glassy additive, FeaTibOx with glassy additive, NbaTibOx with glassy additive Have a group of glass additive NbaWbOx, NiaZnbOx with glass additive, NiaZrbOx with glass additive, SbaSnbOx with glass additive, TaaTibOx with glass additive, and TiaZnbOx with glass additive; and/or ( c) Μ, Μ \ Μ \ 〇χ system selected from AlaMgbZncOx, AlaSibVcOX5 Β% ανΐ \ Οχ, CaaCebZrcOX5 CoaNibTicOx? CoaNibZrcOx, CoaPbbSricO ^ COaPbbZncOx, CraSrbTicOx, CuaFebMricOx, CuaLabSrcOx, FeaNbbTicOX5 FeaPbbZricOx, FeaSrbTicOx? FeaTabTicOx? FeaWbZrcOx? GaaTibZncO ^ LaaMnbNac〇 X5 LaaMnbSrcOx? MnaSrbTicOx? MoaPbbZnc〇x? NbaSrbTicOx? NbaSrbWcOX5 NbaTibZnc〇x, NiaSrbTicOx, SnaWbZnc〇X5 SraTibVcOX5 SraTibZnc〇x and TiaWbZreOx. 65. The apparatus of claim 63, wherein the array is in a gas mixture and the temperature of the gas mixture is about 400 ° C or higher. 66. The apparatus of claim 63, wherein the gas mixture is emitted by a combustion process. 67. The apparatus of claim 63, wherein the constituent gases of the gas mixture are not separated. 68. If the equipment of patent application No. 63 is included, it shall include at least one of the calculations. -18- The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 as B8 C8 D8 VI. Patent application A component that ranges the concentration of a gas component in a gas mixture. 69. The apparatus of claim 63, which also includes means for measuring the temperature of the gas mixture, and means for digitizing the electrical response and temperature measurement. 70. The apparatus of claim 6, wherein at least one chemical/electrically active material has an electrical impedance of (8) between about 1 ohm-cm to about 106 ohm-cm at a temperature of about 400 ° C or higher, And (b) exhibiting a resistance change of at least about 0.1% after exposing the material to the gas mixture as compared to the impedance prior to exposure. 71. The apparatus of claim 63, wherein when exposed to a gas mixture at a selected temperature The electrical response characteristics of the at least one material are quantified numerically and the value of the material response is a certain or no change of no more than about 20% after exposure of the material to the gas mixture at the selected temperature for at least about one minute. 72. The device of claim 63, wherein the electrical response is selected from the group consisting of resistance, impedance, capacitance, voltage, and current. 73. The apparatus of claim 6, wherein the multi-component gas mixture is produced by a process or is a chemical reaction product delivered to the apparatus, and wherein the apparatus further comprises utilizing an electrical response to control the process or apparatus. member. 74. A gas sensitive device comprising (8) an array of at least three chemical/electroactive materials, each chemical/electroactive material exhibiting a change in electrical resistance after exposure to a gas mixture, wherein at least one chemical/electrically active material is at about (1) A resistance of about 1 ohm-cm to about 106 ohm-cm at a temperature of 400 ° C or higher, and (ii) -19- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 PCT) 1255340 as B8 C8 D8 VI. The patent application scope is compared with the resistance before exposure. After exposing the material to the gas mixture, it exhibits a resistance change of at least about 0.1%; (b) heating the array to above 500 °C a heater for temperature; (c) a component that determines the electrical response of each chemical/electrically active material after exposure of the array to the gas mixture; and (d) an electrical response only by inputting the chemical/electroactive material, rather than Detecting the presence of one or more individual component gases and/or sub-groups in the gas mixture via input baseline response values, comparison response values, or reference response values, or calculating one or more of the gas mixtures Do not form a component of the actual concentration of gas and / or sub-group. 75. The apparatus of claim 74, wherein the electrical response characteristic of at least one of the materials exposed to the gas mixture at the selected temperature is quantified numerically and the value of the material response is exposed at the selected temperature of the material. A certain or a change of no more than about 20% in the gas mixture for at least one minute. 76. The apparatus of claim 74, which also includes the means for determining the temperature of the array. 77. The apparatus of claim 74, wherein at least one of the chemical/electrically active materials is a metal oxide. 78. The apparatus of claim 74, wherein the gas mixture is emitted by a combustion process. 79. The apparatus of claim 74, wherein the component gas in the gas mixture is not separated. 80. If the equipment for patent application No. 74 is included, the calculation includes at least one -20- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1255340 as B8 C8 D8 VI. Patent application Scope. A component of the concentration of a gas component in a gas mixture. 81. The device of claim 74, wherein the electrical response is selected from the group consisting of: resistance, impedance, capacitance, voltage, and current. 82. The device of claim 74, wherein the multi-component gas mixture is produced by a process or is a chemical reaction product delivered to the device, and wherein the device further comprises means for controlling the process or device by electrical response . 83. The apparatus of any one of claims 1, 9, 2, 3, 5, 4, 5, 6, 3, and 4, wherein the gas mixture comprises (8) oxygen, nitrogen oxides, hydrocarbons, and One or more members of a group consisting of ammonia; (b) one or two members of a group consisting of nitrogen oxides and ammonia; or (c) one or both of a group consisting of oxygen and hydrocarbons member. 84. An internal combustion engine comprising the apparatus of any one of claims 1, 9, 22, 35, 44, 52, 63 and 74. 85. A vehicle comprising a device as claimed in any of claims 1, 9, 22, 35, 44, 52, 63 and 74. -21 - This paper size is applicable to China National Standard (CNS) A4 specification (210X 297 mm)