TWI245819B - Semiconductor-nanocrystal/conjugated polymer thin films - Google Patents

Semiconductor-nanocrystal/conjugated polymer thin films Download PDF

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TWI245819B
TWI245819B TW92106081A TW92106081A TWI245819B TW I245819 B TWI245819 B TW I245819B TW 92106081 A TW92106081 A TW 92106081A TW 92106081 A TW92106081 A TW 92106081A TW I245819 B TWI245819 B TW I245819B
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semiconductor
photovoltaic device
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TW200408733A (en
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A Paul Alivisatos
Janke J Dittmer
Wendy U Hunyh
Delia Milliron
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Univ California
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Priority claimed from US10/280,135 external-priority patent/US6884478B2/en
Priority claimed from US10/301,510 external-priority patent/US6855202B2/en
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Abstract

The invention described herein provides for thin films and methods of making comprising inorganic semiconductor-nanocrystals dispersed in semiconducting-polymers in high loading amounts. The invention also describes photovoltaic devices incorporating the thin films.

Description

1245819 玖、發明說明 (發明說明應敘明:發明所属之技術領域、先前技術、内容、實施方式及圖式簡單說明) 相關申請案之對照參考資料 本申請案係以美國臨時專利申請案第60/365,401號案 (2002年3月19日申請);第60/381,660號案(2002年5月 5 17曰申凊)及第60/3 81,667號案(2002年5月17曰申請)為 主之非臨時申請案。此等美國臨時專利申請案在此被全部 併入以供所有目的之用。相互關連之美國專利申請案係美 國序號10/301,510案(2002年11月20曰申請,其請求美 國序號60/335,435案(2001年η月3〇曰申請)之優先權) ίο ,及美國序號ι〇/280,135號案(其請求美國序號60/395,064 號案(2002年7月12日申請)及60/346,253號案(2001年1〇 月24曰申請)之優先權)。二新型申請案及所有臨時申請案 之内容在此被全部併入以供所有目的之用。 有關在聯邦贊助之研究或發展下而作之發明之權利聲明 15 在此所描述及請求之發明部份係使用美國能源部所提 供之基金且以美國能源部與加州大學董事間之編號 AC03-76SF000-98號合約而作的。政府對本發明具有某此 權利。 【明戶斤屬々貝^^】 20 本發明是有關於薄膜及製造方法。本發明亦係有關併 入此薄膜之光生伏打(photovoltaic)裝置。1245819 发明 Description of the invention (The description of the invention shall state: the technical field to which the invention belongs, the prior art, the content, the embodiments, and a brief description of the drawings) Cross-references for related applications This application is based on US Provisional Patent Application No. 60 Case No. / 365,401 (filed on March 19, 2002); Case No. 60 / 381,660 (filed on May 17, 2002); and Case No. 60/3 81,667 (filed on May 17, 2002) Main non-provisional applications. These U.S. provisional patent applications are hereby incorporated in their entirety for all purposes. Interrelated U.S. patent applications are U.S. Serial No. 10 / 301,510 (filed on November 20, 2002, which claims priority from U.S. Serial No. 60 / 335,435 (filed on 30 November 2001)), and U.S. Serial Numbers ι〇 / 280,135 (which claims priority to US Serial No. 60 / 395,064 (filed on July 12, 2002) and 60 / 346,253 (filed on October 24, 2001). The contents of the two new applications and all provisional applications are hereby incorporated in their entirety for all purposes. Statement of Rights Concerning Inventions Made Under Federally Sponsored Research or Development 15 The portion of the invention described and requested herein is funded by the U.S. Department of Energy using the number AC03- Contract 76SF000-98. The government has certain rights in this invention. [Minghu caterpillar 々 々] 20 The present invention relates to a film and a manufacturing method. The invention also relates to a photovoltaic device incorporating this film.

L先前技術I 最先之太1%能電池係於1950年代自結晶石夕晶圓製造。 當時,最有效裝置使6%太陽能轉化成電力。過去5〇年來 1245819 玖、發明說明 於太陽能電池技術之進步已形成最有效之Si電池(25%)及 商業之Si模組(電池陣列,10%)。雖然結晶及多結晶型式 之S!係太陽能電池中所用之最普遍型式之材料,其它半導 體(諸如,伸化鎵、磷化銦及碲化鎘)係正被研究作為下一 5代更高效率之太陽能電池。特別地,高效率結構(諸如,串 聯式電池,其中,數個帶隙(band gap)係使用、^8 及Ge鋪置於單一裝置)已達到34%之記錄效率。 即使此等令人印象深刻之效率,習知技藝之製造太陽 旎電池之高費用限制其廣泛作為電力源。習知技藝之商業 10矽太陽能電池之結構包含四個主要處理方法··半導體材料 之生長,分成晶圓,形成此等裝置及接合,及封裝。對於 單獨之電池製造,製造太陽能電池需十三個步驟,且此十 三個步驟中,五個步驟需高溫(3〇〇〇c_1〇〇(rc)、高度真空或 二者。此外,自熔融物之半導體生長係高於140(rc之溫度 15且於惰性氬氛圍。為獲得高效率裝置(>10%),需要包含使 太陽光集中於裝置上之集中器系統、數個半導體及用以吸 收更多光線之量子井,或較高性能之半導體(諸如, 及InP)之結構。性能增進造成增加製造費用,其係源自增 加之製造步驟數量。迄今,此等高性能結構主要係用於地 20球以外之應用,諸如,太空梭及衛星,其間,每單位重量 之效率係與製造費用一樣重要。 習知技藝之太陽能裝置之另一問題係高費用之製造材 料。1kW模組輸出功率所需之石夕含量約20 kg。於$20/gk, 電子等級石夕之材料費用係部份由晶片製造部門補助。其内 1245819 玖、發明說明 材料(諸如,GaAs ’其係以兩毒性氣體合成)係$40O/kg之費 用,其係更高20倍。因為太陽能電池係大面積裝置,此等 材料之費用阻礙不昂貴電池之生產。因此,薄膜裝置(其具 有數微米厚非結晶Si、CdTe及CuInSe2之活性層)被發展 5 出。於1991年,O’Regan等人報導包含不昂貴Ti02奈米 結晶及有機染料之新穎光化學太陽能電池之發明。 O’Regan 等人於 Waiwre 353, 737 (1991) 〇 雙層裝置(其係自聚噻吩衍生物(C6G層於其上被蒸發)旋 轉鑄造)已能達到23%之最大外部量子效率(EQE)。對於單 10 層裝置,50%之更高效率係自使C6G及MEH-PPV之衍生物 摻合於均質薄膜内而獲得。效率之進一步改良係受限於C60 之差的電子運送性質,其特徵在於跳動及裝置吸收及太陽 能發射光譜間之低重疊,Greenham,N.C·等人,尸Αγ如ν· 5,第54冊,編號24,1996年12月。 15 事先已建議於聚(3-己基噻吩)内使用CdSe顆粒,見L Previous Technology I The first too 1% energy battery was manufactured in the 1950s from crystallized stone wafers. At that time, the most efficient installations converted 6% of solar energy into electricity. In the past 50 years, 1245819 发明, invention description The advancement of solar cell technology has formed the most effective Si cells (25%) and commercial Si modules (battery arrays, 10%). Although crystalline and polycrystalline S! Are the most common types of materials used in solar cells, other semiconductors (such as gallium elongation, indium phosphide, and cadmium telluride) are being studied as the next 5 generations for higher efficiency Of solar cells. In particular, a high-efficiency structure (such as a tandem battery in which several band gaps are used, and 8 and Ge are laid in a single device) has achieved a recording efficiency of 34%. Even with these impressive efficiencies, the high cost of making solar cells using conventional techniques limits their widespread use as a source of electricity. Commercially Known Techniques 10 The structure of a silicon solar cell includes four main processing methods: growth of semiconductor materials, divided into wafers, forming such devices and joints, and packaging. For individual cell manufacturing, manufacturing solar cells requires thirteen steps, and of these thirteen steps, five steps require high temperature (3000c_100 (rc), high vacuum, or both. In addition, self-melting The semiconductor growth system of materials is higher than 140 (the temperature of rc is 15 and is in an inert argon atmosphere. In order to obtain a high-efficiency device (> 10%), it is necessary to include a concentrator system that concentrates sunlight on the device, several semiconductors, and In order to absorb more light from quantum wells, or higher performance semiconductors (such as, and InP), the increase in performance results in increased manufacturing costs, which is due to the increased number of manufacturing steps. To date, these high-performance structures are mainly For applications other than ground 20 spheres, such as space shuttles and satellites, in which the efficiency per unit weight is as important as the manufacturing cost. Another problem with conventional solar devices is high-cost manufacturing materials. 1kW modules The output of the stone material required for power is about 20 kg. At $ 20 / gk, the material cost of the electronic material stone material is partially subsidized by the wafer manufacturing department. Within it, 1245819 玖, invention explanatory materials (such as GaAs' is a combination of two toxic gases) which costs $ 40O / kg, which is 20 times higher. Because solar cells are large-area devices, the cost of these materials hinders the production of inexpensive batteries. Therefore, thin-film devices (It has several micron-thick active layers of amorphous Si, CdTe, and CuInSe2) was developed. In 1991, O'Regan et al. Reported the invention of a novel photochemical solar cell containing inexpensive Ti02 nanocrystalline and organic dyes O'Regan et al., Waiwre 353, 737 (1991) 〇 The double-layer device (which is a spin casting from a polythiophene derivative on which the C6G layer is evaporated) has reached a maximum external quantum efficiency of 23% (EQE ). For a single 10-layer device, a higher efficiency of 50% is obtained by blending C6G and MEH-PPV derivatives in a homogeneous film. Further improvements in efficiency are limited by the poor electron transport properties of C60, It is characterized by beating and low overlap between device absorption and solar emission spectrum, Greenham, NC, et al. Corpse Aγ such as v. 5, vol. 54, No. 24, December 1996. 15 It has been suggested in advance in Ju (3 -Hexylthiophene) With CdSe particles, see

Alivisatos 等人,ddv. Maer· 1999,11,編號 11。此文件僅教 示使用尺寸少於13 nm之奈米結晶,及製造之裝置不能接 近本發明之效率。再者,此習知技藝承認奈米棒之溶液化 學問題,且未提供能以此間所述之本發明所解決之問題之 2〇 解決方式。依據本發明之以無機奈米棒為主之太陽能電池( 其具有良好運送性質及吸收光譜,亦可延伸於近紅外線内) 可達到與以本體無機半導體為主之太陽能電池相匹敵之效 率。依據本發明實施例之併入半導體·奈米結晶内之薄膜提 供上述問題之解決方式。 1245819 玖、發明說明 【發明内容】 此間所述之本發明提供薄膜及製造方法,其包含以高 載荷量使無機半導體-奈米結晶分散於半導性聚合物内。本 發明亦描述併入此薄膜之光生伏打裝置。 5 圖式簡單說明 第1圖顯示CdSe及P3HT之能級圖,其係顯示5 nm CdSe與P3HT間之電荷轉移方法之示意圖。 第2圖係依據本發明一實施例之奈米棒-聚合物摻合物 光生伏打裝置之結構之示意圖。 10 第 3 圖顯示 a)7 nm X 7 nm,b) 8 nm X 13 nm,c) 3 nm x 60 nm,及d) 7 nm x 60 nm之CdSe奈米結晶之低解析 TEM影像。Alivisatos et al., Ddv. Maer 1999, 11, number 11. This document only teaches the use of nanocrystals with a size of less than 13 nm, and the devices manufactured cannot approach the efficiency of the present invention. Furthermore, this conventional technique recognizes the solution chemistry problem of nanorods, and does not provide a solution to the problem that can be solved by the present invention as described herein. Inorganic nanorod-based solar cells according to the present invention (which have good transport properties and absorption spectrum, and can also be extended in the near infrared) can achieve an efficiency comparable to that of bulk inorganic semiconductor-based solar cells. The thin film incorporated in the semiconductor / nano crystal according to the embodiment of the present invention provides a solution to the above problems. 1245819 发明 Description of the invention [Summary of the invention] The present invention described herein provides a thin film and a manufacturing method comprising dispersing an inorganic semiconductor-nanocrystal in a semiconductive polymer with a high load. This invention also describes a photovoltaic device incorporating this film. 5 Brief description of the diagram Figure 1 shows the energy level diagram of CdSe and P3HT, which is a schematic diagram showing the charge transfer method between 5 nm CdSe and P3HT. Figure 2 is a schematic diagram of the structure of a nanorod-polymer blend photovoltaic device according to an embodiment of the present invention. 10 Figure 3 shows low-resolution TEM images of a) 7 nm X 7 nm, b) 8 nm X 13 nm, c) 3 nm x 60 nm, and d) 7 nm x 60 nm CdSe nanocrystals.

第4圖顯示由分散於P3HT之90重量%之7 nm x 7 nm CdSe奈米結晶所組成之薄膜(自氯仿旋轉鑄製)之AFM-TM 15 形貌影像。掃瞄區域係5# m。 第5圖顯示分散於P3HT之由90重量%之9 nm X 13 nm之CdSe奈米結晶所組成之薄膜(自於氯仿内之1體積% 及8體積%吡啶旋轉鑄製)之AFM-TM a)形貌影像及b)相影 像。影像係以相同規格對5//m掃描區域呈現。 20 第6圖顯示分散於P3HT之由90重量%之9 nm X 13 nm CdSe奈米棒所組成之薄膜(自於氯仿内之各種濃度之°比 啶鑄製)之表面粗糙度(空心圓)。最大EQE(實心鑽石形)係 以自此等薄膜製造之裝置顯示。線係作為眼睛之導引。 第7a圖顯示顯示90重量%之3 nm X 60 nm之CdSe奈 10 1245819 玖、發明說明 米棒於P3HT内之裝置(空心圓)及於120°C退火(annealing) 後(實心距形)之正規化光電流光譜。 第7b圖顯示於P3HT内之90重量%之3 nm X 60 nm 之CdSe奈米棒之裝置及僅有奈米棒之裝置之於熱處理前 5 後之EQE比例,其係波長之函數。插入圖顯示3 nm X 60 nm之CdSe及P3HT之個別之1-透射光譜。 第8圖顯示於P3HT内之各種不同奈米棒濃度之各系 列之3 nm X 60 nm奈米棒之裝置之P3HT對吸收(實心鑽石 形,虛線)、光電流(空心圓,實線)及120°C熱處理後之光 10 電流(實心距形,虛線)之相對助益。 第9圖顯示於515 nm時之-0.1 mW/cm2照射下之於 P3HT内之90重量%之7 nm X 14 nm CdSe之EQE。插入圖 顯示於各種溫度熱處理後於514 nm激發下P3HT樣品内之 60重量%之7 nm X 14 nm之CdSe之PL效率。 15 第10圖顯示90重量%之7 nm X 60 nm CdSe奈米棒於 P3HT(空心圓)及於120°C熱處理後(實心距形)之EQE光譜 。插入圖:此裝置之於515 nm時O.lmW/cm2照射下之相 對應電流-電壓特性,其包含0.4V之開路電壓(open circuit voltage),及0.5之填充因子。 20 第11a圖顯示具212 nm、271 nm及346 nm厚度之自 P3HT内之90重量%之7 nm X 60 nm之CdSe奈米棒之裝 置於120°C熱處理前之EQO光譜。 第lib圖顯示具212 nm、271 nm及346 nm厚度之自 P3HT内之90重量%之7 nm X 60 nm之CdSe奈米棒之裝 11 1245819 玖、發明說明 置於120°C熱處理後之EQO光譜。 第12a圖顯示對於第11a及lib圖之裝置於120°C加熱 前後之EQE相對促進。 第12b圖顯示熱處理前後之EQE之絕對差。 5 第13a圖顯示自氯仿旋轉鑄製之20重量%之3 nm X 60 nm CdSe奈米棒及P3HT之薄膜之TEM。 第13b圖顯示第13a圖之相同奈米結晶自於氯仿溶液 内之10體積%咣啶鑄製時之TEM。 第14圖顯示由於P3HT内之60重量%之10 nm X 10 10 nm之CdSe奈米結晶組成之100 nm薄膜之截面之TEM。 第15a圖顯示7 nm X 60 nm之CdSe奈米棒。 第15b圖顯示由於P3HT内之40重量%之CdSe奈米 棒所組成之100 nm薄膜之截面之TEM。 第16圖顯示7 nm直徑之奈米棒的長度於515 nm時之 15 0.084 mW/cm2照射下,連續地從7 nm增加至30 nm及60 nm,對於P3HT内之90重量%0(136之裝置之EQE,其幾 乎以3之因子上升至54%。 第17a-c圖顯示具a) 7 nm,b) 30 nm及c) 60 nm之長 度之7 nm直徑之奈米結晶之TEM。比例尺設定係50 nm, 20 且所有TEM係相同比例。 第18圖顯示於P3HT内之90重量%之3 nm X 100 nm 之分支狀CdSe奈米棒之裝置之EQE,其係吡啶濃度之函 數。 第19a圖顯示未排列之四足體奈米結晶。 12 1245819 玖、發明說明 第19b圖顯示排列之四足體奈米結晶。 第20圖顯示一系列之具不同薄膜厚度之於P3HT内之 90重量%之7nm X 60 nm CdSe之裝置之EQE光譜。 第21a圖顯示各種不同薄膜厚度之於P3HT内之90重 5 量 %之 7 nm X 7 nm CdSe 之 EQE 光譜。 第21b圖顯示此等裝置之相對應吸收光譜,其係以增 加厚度之函數顯示。 第22a圖顯示以TOPO處理之奈米結晶於P3HT内之 40重量%之5 nm CdSe奈米結晶之TEM。 10 第22b圖顯示以T1處理之奈米結晶於P3HT内之40 重量%之5 nm CdSe奈米結晶之TEM。 第22c圖顯示以咄啶處理之奈米結晶於P3HT内之40 重量%之5 nm CdSe奈米結晶之TEM。 第23a圖顯示515nm時於0.1 mW/cm2照射下P3HT内 15 之90重量%之7 nm X 60 nm之CdSe奈米棒之Ι-V特性。 第23b圖顯示相同之第23a圖裝置之太陽能電池特性 ,其係以模擬之AM 1.5 Global光源測量,包含5.7 mA/cm2之短電路電流,0.42之FF,及0.67V之開路電壓 ,產生1.7%之太陽功率轉化效率。Figure 4 shows the AFM-TM 15 morphology image of a thin film (rotated from chloroform) composed of 90% by weight of 7 nm x 7 nm CdSe nanocrystals dispersed in P3HT. The scanning area is 5 # m. Figure 5 shows the AFM-TM a film consisting of 90% by weight of 9 nm X 13 nm CdSe nanocrystals dispersed in P3HT (1% by volume and 8% by volume of pyridine in chloroform by spin casting). ) Topographic image and b) phase image. The image is presented in a 5 // m scanning area with the same specifications. 20 Figure 6 shows the surface roughness (hollow circle) of a film composed of 90% by weight of 9 nm X 13 nm CdSe nanorods (cast from various ratios of chloroform in chloroform) dispersed in P3HT. . Maximum EQE (Solid Diamond Shape) is shown with devices made from these films. The line acts as a guide for the eyes. Figure 7a shows 90% by weight of 3 nm X 60 nm CdSe nano 10 1245819 玖, the device of the invention description of the rice rod in P3HT (open circle) and after annealing at 120 ° C (solid distance) Normalize the photocurrent spectrum. Figure 7b shows the EQE ratio of the 90 nm by weight 3 nm X 60 nm CdSe nanorod device and the nanorod-only device in P3HT before and after heat treatment as a function of wavelength. The insertion plot shows the individual 1-transmission spectra of CdSe and P3HT at 3 nm X 60 nm. Figure 8 shows the P3HT pair absorption (solid diamond shape, dotted line), photocurrent (open circle, solid line), P3HT pair absorption of various 3 nm x 60 nm nano rod devices of various series of nano rod concentrations in P3HT, and Relative benefit of light current (solid distance, dotted line) after heat treatment at 120 ° C. Figure 9 shows 90% by weight of 7 nm X 14 nm CdSe EQE in P3HT under -0.1 mW / cm2 irradiation at 515 nm. Insertion plots show the PL efficiencies of 60 wt% 7 nm X 14 nm CdSe in a P3HT sample under 514 nm excitation after heat treatment at various temperatures. 15 Figure 10 shows the EQE spectra of 90% by weight 7 nm X 60 nm CdSe nanorods after P3HT (open circles) and heat treatment at 120 ° C (solid distance shape). Insertion diagram: The corresponding current-voltage characteristics of the device under O.lmW / cm2 irradiation at 515 nm, which includes an open circuit voltage of 0.4V and a fill factor of 0.5. 20 Figure 11a shows the EQO spectra of 90% by weight 7 nm X 60 nm CdSe nanorods with a thickness of 212 nm, 271 nm, and 346 nm from P3HT before heat treatment at 120 ° C. Figure lib shows the thickness of 212 nm, 271 nm and 346 nm from 90% by weight of 7 nm X 60 nm CdSe nanorods in P3HT. 11 1245819 玖, description of the EQO after heat treatment at 120 ° C spectrum. Figure 12a shows the relative promotion of EQE before and after heating the device of Figures 11a and lib at 120 ° C. Figure 12b shows the absolute difference in EQE before and after heat treatment. 5 Figure 13a shows the TEM of a 20% by weight 3 nm X 60 nm CdSe nanorod and P3HT film cast from chloroform. Fig. 13b shows the TEM of the same nanocrystals of Fig. 13a from 10 vol% pyridine in chloroform solution when cast. FIG. 14 shows a TEM of a cross section of a 100 nm thin film composed of 60% by weight of 10 nm X 10 10 nm CdSe nanocrystals in P3HT. Figure 15a shows a 7 nm X 60 nm CdSe nanorod. Figure 15b shows the TEM of a cross section of a 100 nm thin film composed of a 40% by weight CdSe nanorod in P3HT. Figure 16 shows that the length of a 7 nm diameter nanorod is continuously increased from 7 nm to 30 nm and 60 nm under 15 0.084 mW / cm2 at 515 nm. For 90% by weight of P3HT The EQE of the device increased to almost 54% by a factor of 3. Figures 17a-c show TEMs of 7 nm diameter nanocrystals with a) 7 nm, b) 30 nm and c) 60 nm in length. The scale setting is 50 nm, 20, and all TEMs are the same scale. Fig. 18 shows the EQE of a device of 90% by weight of a 3 nm X 100 nm branched CdSe nanorod in P3HT as a function of pyridine concentration. Figure 19a shows the unaligned tetrapod nanocrystals. 12 1245819 发明, description of invention Fig. 19b shows the tetrapod nanocrystals arranged. Figure 20 shows the EQE spectra of a series of devices with different film thicknesses of 90% by weight of 7nm X 60 nm CdSe in P3HT. Figure 21a shows the EQE spectra of 7 nm X 7 nm CdSe at 90% by weight and 5% by weight in P3HT for various film thicknesses. Figure 21b shows the corresponding absorption spectra of these devices as a function of increasing thickness. Figure 22a shows a TEM of 40% by weight of 5 nm CdSe nanocrystals treated with TOPO-treated nanocrystals in P3HT. 10 Figure 22b shows a TEM of 40 wt% 5 nm CdSe nanocrystals of T1 treated nanocrystals crystallized in P3HT. Figure 22c shows a TEM of 40 wt% 5 nm CdSe nanocrystals treated with pyridine-treated nanocrystals in P3HT. Figure 23a shows the I-V characteristics of 15% 90% by weight 7 nm X 60 nm CdSe nanorods in P3HT at 515 nm under 0.1 mW / cm2 irradiation. Figure 23b shows the solar cell characteristics of the same device shown in Figure 23a. It is measured with an analog AM 1.5 Global light source, including a short circuit current of 5.7 mA / cm2, an FF of 0.42, and an open circuit voltage of 0.67V, yielding 1.7% Solar power conversion efficiency.

20 第24圖顯示理相之I-V曲線及實驗發現之典型之I-V 曲線。 【實施方式3 較佳實施例之詳細說明 於本發明之一實施例,揭露一種薄膜,其包含具有至 13 1245819 玖、發明說明 少5重量%半導體-奈米結晶埋於其内之半導性共軛聚合物 於另一實施例,揭露一種包含本發明薄膜之光生伏打 裝置。 5 於本發明之另一實施例,揭露一種製造聚合物薄膜之 方法,包含以溶劑清洗以表面活性劑塗覆之半導體·奈米結 晶至少一次,及使清洗過之半導體-奈米結晶及半導性聚合 物共同溶於二元溶劑混合物,及使混合物沈積。 於本發明之另一實施例,揭露一種製造光活性薄膜之 1〇方法,包含使具有大於2之縱橫比之半導體奈米結晶分散 於半導性共軛聚合物以提供聚合物-奈米結晶之複合物,及 沈積該複合物之薄膜,如此,奈米結晶係以大於5重量% 埋於聚合物内。 於本發明之另一實施例,揭露一種光生伏打裝置,其 U包含具有埋於其内之半導體_奈米結晶之共軛導性聚合物層 ’、中此裝置於AM 1·5全面照射時具有大於1%之功率 轉化效率。 -於本發明之另-貫施例,揭露_種光生伏打裝置,其 包含第-平面電極,包含具埋於其内之半導體-奈米結晶之 半導性共耗聚合物之薄膜,此薄膜係沈積於第一平面電極 上’及第二電極,其係相對於第—電極,及電子孔(h〇le)注 射層,其係置於薄膜聚合物層與第—平面電極之間。 ,半導體-奈米結 更佳係約5與5020 Figure 24 shows the I-V curve of the physical phase and the typical I-V curve found experimentally. [Embodiment 3 The detailed description of a preferred embodiment is described in an embodiment of the present invention, and a thin film is disclosed which has a semiconductivity of 13 to 1245819 玖, a 5% less semiconductor-nanocrystal buried in the description of the invention. In another embodiment, a conjugated polymer discloses a photovoltaic device including the film of the present invention. 5 In another embodiment of the present invention, a method for manufacturing a polymer film is disclosed, which includes washing a semiconductor-nanocrystal coated with a surfactant at least once with a solvent, and washing the cleaned semiconductor-nanocrystal and semi-crystal. The conductive polymer is co-dissolved in the binary solvent mixture and the mixture is allowed to settle. In another embodiment of the present invention, a method for manufacturing a photoactive film is disclosed, comprising dispersing semiconductor nanocrystals having an aspect ratio greater than 2 in a semiconducting conjugated polymer to provide polymer-nanocrystals. The composite, and the film on which the composite is deposited, so that the nanocrystalline is buried in the polymer at greater than 5% by weight. In another embodiment of the present invention, a photovoltaic device is disclosed, where U includes a conjugated conductive polymer layer having a semiconductor-nanocrystal buried therein, and the device is fully irradiated at AM 1.5 Has a power conversion efficiency of more than 1%. -In another embodiment of the present invention, a photovoltaic device is disclosed, which includes a first planar electrode including a thin film of a semiconducting co-consumable polymer with a semiconductor-nanocrystal buried therein. The thin film is deposited on the first planar electrode and the second electrode, which is opposite to the first electrode and the electron hole injection layer, which is disposed between the thin film polymer layer and the first planar electrode. , Semiconductor-nano junction is more preferably about 5 and 50

於本發明之較佳實施例 之縱橫比,較佳係大於5, 晶具有大於2 之間。最佳係 14 1245819 玖、發明說明 約10。 於本發明之較佳實施例,揭露於半導性聚合物内之半 導體-奈米結晶之分散或埋入。較佳地,此”載荷量”係大於 5重量%之量。更佳地,此含量係20與約95重量%之間。 5 更佳地,此含量係50與約95重量%之間。最佳地,此含 量係約90重量%。 於本發明之較佳實施例,半導性聚合物將為選自反式-聚乙炔、聚响咯、聚噻吩、聚苯胺、聚(對-伸苯基)及聚(對 -伸苯基-伸乙烯基)、聚芴、聚芳香族胺、聚(伸噻嗯基-伸 10 乙烯基)及其可溶性衍生物之聚合物或摻合物。較佳係(聚 (2-甲氧基5-(2’-乙基己基氧)對-伸苯基伸乙烯基)(MEH-PPV)及聚(3-己基噻吩)(P3HT),且P3HT係最佳。 於較佳實施例,半導體-奈米結晶包含具有大於約20 nm長度之棒。更佳係具有20與200 nm間長度之棒。更佳 15 係具約60與110 nm間長度之棒。 於更佳之實施例,本發明揭露使用Π-VI族、III-V族 、IV族之半導體及三級雲母銅礦。更佳係CdSe、CdTe、 InP、GaAs、CuInS2、CuInSe2、AlGaAs、InGaAs、Ge 及 Si,更佳係CdSe。 20 較佳地,半導體奈米結晶係分支狀奈米結晶。更佳之 奈米結晶具有4臂且係呈四面體對稱。 較佳地,本發明之薄膜具有約200 nm之厚度。 較佳地,製造本發明薄膜之方法使用二元溶劑混合物 ,其中,至少一溶劑係選自吡啶、氯仿、甲苯、二曱苯、 15 1245819 玖、發明說明 己院、水、二氣苯、二氯甲苯及烧基胺(其中,燒基鏈可為 分支狀或未被分支,且長度係2與20個間之碳原子)、丁 醇、曱醇及異丙醇。最佳係於氯仿内之吡啶。 較佳地,此二元溶劑混合物含量係M5體積%之間, 5 更佳範圍係4-12體積%,且最佳係8體積%。 於此間所述本發明之另一實施例,揭露一種製造具有 併入其内之半導體奈米結晶之聚合物薄膜之方法,其中, 一步驟係以溶劑(較佳係u比淀)清洗以表面活性劑塗覆之半 導體奈米結晶至少一次。 10 於此間所述本發明之另一實施例,係一種製造聚合物 薄膜之方法,包含於60°C至約200°C之溫度使被沈積之薄 膜熱退火。較佳係約12〇°C。 於本發明之另一實施例,在此揭露一種光生伏打裝置 ’其於ITO電極頂部上併入ped〇T:PSS (聚(伸乙基-二氧 15基)噻吩:聚(苯乙烯磺酸))電子孔運送層。 半V體-奈米結晶’’係指包含所有形狀及尺寸之半導性 結晶顆粒。較佳地,其具有至少一少於約10011111之尺寸, 但並不受限。棒可具有任何長度。”奈米結晶,,、,,奈米棒,, 及奈米顆粒,,可於此被交換使用。於本發明之某些實施例 20 ’奈米結晶顆粒可具有二或更多個少於約謂細之尺寸。 t米結晶可為芯/殼型式或芯型。例如,依據本發明某些實 e例之某些分支狀奈米結晶顆粒可具有具大於約1之縱橫 比之臂。於其它實施例,此等臂可具有大於約5之縱橫比 ’且於某些情況,大於約10等。於某些實施例,此等臂之 16 1245819 玖、發明說明 寬度可少於約200、100,甚至50 nm。例如,於具有一芯 及四臂之例示四足體,芯可具有約3至約4 nm之直徑,且 每一臂可具有約4至約50、100、200、500,甚至大於約 1000 nm之長度。當然,此間所述之四足體及其它奈米結 5 晶顆粒可具有其它適當尺寸。於本發明實施例,奈米結晶 顆粒性質上可為單結晶或多結晶。本發明亦考慮使用具有 高於20之縱橫比(甚至高達50)及大於100 nm長度之CdSe 及CdTe之奈米棒,其係依據文獻所述方法形成,見, Peng, X.G·等人之 404,59 (2000)及 Peng,Ζ·Α·等人 10 之 J. d/n· CTzem. 123,183 (2001) 〇 此間所用之半導體-奈米結晶棒之長度具有20及200 nm間之長度。於較佳實施例,半導體-奈米結晶包含具有 大於約20 nm長度之棒。更佳係具有20與200 nm間長度 之棒。更佳係約60與110 nm間長度之棒。 15 “至少一部份半導體-奈米結晶具有大於約2之縱橫比” 係指若半導體-奈米結晶係未分支之棒時,則此棒總量之至 少一部份會具有大於約2之縱橫比。此含量可高達100%。 再者,此係意指若奈米結晶係分支狀之半導體-奈米結晶( 當然包含四足體)時,貝Γ至少一部份”係指至少一分支具有 20 大於2之縱橫比。縱橫比被定義成棒之最長尺寸之長度除 以其直徑。於分支狀奈米結晶之情況,分支狀奈米結晶之 縱橫比被定義成最長分支之長度除以最長分支之直徑。 “ 一部份之半導體-奈米結晶係分支狀奈米結晶”係指至 少1重量%之奈米結晶係分支狀奈米結晶。需瞭解於此所 17 1245819 玖、發明說明 界定之”一部份”亦包含100%,即,”整個部份’’。 雖然CdSe及CdTe半導體-奈米結晶係較佳,奈米結 晶顆粒可包含其它適合之半導體材料,且係棒材、成形顆 粒或球狀物。例如,顆粒可包含諸如化合物半導體之半導 5 體。適當之化合物半導體包含II-VI族半導性化合物,諸 如,MgS、MgSe、MgTe、CaS、CaSe、CaTe、SrS、SrSe 、SrTe 、 BaS 、 BaSe 、 BaTe 、 ZnS 、 ZnSe 、 ZnTe 、 CdS 、 CdSe、CdTe、HgS、HgSe及HgTe。其它適當之化合物半 導體包含ΠΙ-V族之半導體,諸如,GaAs、GaP、GaAs-P 10 、GaSb、InAs、InP、InSb、AlAs、A1P、AlGaAs、InGaAs 及AlSb。使用諸如鍺或矽之IV族半導體於某些條件下亦 可行。於其它實施例,顆粒可包含介電材料,諸如SiC、 SiN或任何其它能展現多型性之材料。亦包含三級雲母銅 礦,例如,CuInS2及CuInSe2。某些金屬(諸如,Fe、Ni、 15 Cu、Ag、Au、Pd、Pt、Co等)亦可展現多型性,且可用於 實施例。棒狀、箭狀、淚滴狀及四足狀之半導體奈米結晶 係於 Manna 等人之乂 CAem.心c. 2000,12,12700-12706中定義,其内容在此被併入以供所有目的之用。 依據本發明實施例之奈米結晶顆粒可具有獨特之光、 20 電、磁、催化及機械等性質,且可用於數種適當之最終應 用。其可作為,例如,複合材料之填料,催化劑,光學裝 置之功能性元件,光生伏打裝置(例如,太陽能電池)之功 能性元件,電裝置之功能性元件等。 “P3HT”係指聚(3-己基噻吩),其包含區域規整性之 18 1245819 玖、發明說明 P3HT,包含頭接頭及頭接尾之區域規整性P3HT。較佳係 頭接尾之P3HT。 本發明考量可自溶液處理之任何半導性共軛聚合物可 依據本發明作用。”半導性聚合物”係指所有具有7Γ-電子系 5 統之聚合物。非限制性之例子包含反式-聚乙炔、聚吡咯、 聚噻吩、聚苯胺、聚(對-伸苯基)及聚(對-伸苯基-伸乙烯基) 、聚芴、聚芳香族胺、聚(伸噻嗯基-伸乙烯基)及上述之可 溶性衍生物。例子係(聚(2-甲氧基,5-(2’-乙基己基氧)對-伸 苯基伸乙烯基)(MEH-PPV)及聚(3-己基噻吩)。特別佳係聚 10 (3_己基噻吩),P3HT。本發明亦考量使用可以溶液處理或 以熔融物處理之共軛聚合物,其係因為本體側基附接至主 要共輛鏈或其使共輛聚合物包含於一或多種組份係非共輛 者之共聚物結構内之故。非限制性之例子包含聚(,4’_二伸 苯基二苯基伸乙烯基)、聚(1,4-伸苯基-1-苯基伸乙烯基及聚 15 (1,4-伸苯基二苯基伸乙烯基、聚(3-烷基咕咯)及聚(2,5-二烷 氧基-對-伸苯基伸乙烯基)。需瞭解半導性共軛聚合物係指 其一係半導性共軛聚合物之聚合摻合物之混合物。因此, 奈米結晶係被埋入或分散於摻合物或混合物内。 本發明進一步考量半導體-奈米結晶,棒狀物,可藉由 20 用於排列結晶之技藝所知之任何技術排列。 “光生伏打裝置”係指包含此項技藝所知之型式裝置結 構。例示之光生伏打裝置係描述於,例如,Science,295冊 ,2425-2427頁,2002年3月29曰,其内容在此被併入以 供參考之用。例示之光生伏打裝置可於黏合劑内具有奈米 19 1245819 玖、發明說明 結晶顆粒。然後,此組合物被夾於基材上之二電極(例如, 鋁電極及銦錫氧化物電極)之間,形成光生伏打裝置。 “二凡溶劑系統”係指包含二種溶劑之系統,且_者可 為配位體,其亦係溶劑。例如,於氣仿内之吡啶。,,二元溶 5劑系統,,亦指包含至少—溶劑及_非溶劑之配位體之系統, 例如,二甲苯及膦酸。二曱苯係半導體奈米結晶之溶劑, 且膦酸係配位體,但非溶劑。 製造此間所述薄膜之適當方法係已知。各種自溶液之 塗覆及印刷技術之非限制性例子包含旋轉塗覆、刮刀塗覆 10、浸潰塗覆、噴墨印刷及_網印刷。所有技術在此一般被 稱為”沈積’’。即,本發明薄膜需被,,沈積,,於某些型式之基 材上。 無機及有機之半導體之互補電子性質可用於形成電活 性聯結。電荷轉移於高電子親和勢之無機半導體與相對較 15低離子化電位之有機分子及聚合物間係有利的。於本發明 之一實施例,半導體奈米顆粒(諸如,Cdse奈米結晶)與共 軛聚合物(諸如,P3HT)結合產生具高界面區域之電荷轉移 聯結,其造成具改良性效率之光生伏打裝置。由CdSe奈 米結晶及P3HT之能階圖可看出CdSe係接受電子且ρ3Ητ 20係接受電子孔(第丨_)。奈米結晶表面上之配位體存在調 節與聚合物之交互作用。可於鑄造後經由化學性清洗奈米 結晶或熱處理CdSe-P3HT摻合物薄膜而替換或移除cdSe 表面上之配位體。 電荷之轉移及運送之效力係藉由摻合物之形態而決定 20 1245819 玖、發明說明 。奈米結晶於溶液及聚合物内之聚集係依顆粒間之凡得瓦 (van der Waals)交互作用強度而定,且因而係依奈米結晶間 之分離及其尺寸而定。用於運送電子之聚集作用及用於更 有效電荷轉移之分散作用間之平衡係必需。發明人已驚人 5 地發現形態之精密控制係經由使用溶劑混合物而獲得。含 有吡啶(其係配位體及幫助奈米結晶溶化)之依據本發明實 施例之溶劑混合物可影響奈米結晶於溶液内之分散。因為 旋轉鑄造係一種非平衡方法,奈米結晶於溶液内之分散作 用可於聚合物内維持。 10 依據本發明一實施例,溶劑混合物被用以控制達至毫 微米尺寸之相分離。發明人已驚人地發現可使用溶劑混合 物控制於聚合物(特別是P3HT)内具高奈米結晶濃度(最高 達90-95重量%)之薄膜内之相分離,達到亳微米尺寸。目 的係藉由同時使用對奈米結晶(特別是CdSe)係良好之溶劑 15 及配位體及對於溶液處理之聚合物係良好之溶劑而促進奈 米結晶之溶解度。較佳例子係強鍵結之路易士鹼,吡啶, 其116°C之相對較低沸點,其因易移除被選作為奈米結晶 之配位體。各種不同形狀及尺寸之以吡啶處理之奈米結晶 係與P3HT共同溶於氯仿内之4體積%至12體積%吡啶之 20 混合物内,其於旋轉鑄製時產生由聚合物内之分散顆粒所 組成之均一薄膜。用以覆蓋奈米結晶表面之較佳吨σ定含量 係藉由奈米顆粒上之非鈍化Cd表面位置之數量決定。吡 啶係可於氯仿内相容混,如此,對於奈米結晶具有二倍可 溶性增加:(a)以ϋ比淀塗覆之奈米結晶係比其裸對兆物更可 21 1245819 玖、發明說明 溶於氯仿内,且(b)其於未結合至奈米結晶之過量吡啶内係 高度可溶。但是,太多吡啶需被避免,因其調節P3HT(其 係極度可溶於氯仿,但不同於咄啶)之沈澱作用。因此,有 三種可溶性範_ ·· 5 I.低吡啶濃度範疇:奈米結晶之不充分可溶性造成由 奈米結晶聚集而促進之摻合物薄膜大規模相分離。 II. 中間吡啶濃度範疇:若聚合物於二溶劑之互容摻合 物内仍具充分可溶性,摻合物溶劑之奈米結晶組份之可溶 性促進將導致二半導體之緻密混合,因而於旋轉塗覆時避 10 免相分離。 III. 高咄啶濃度範疇:因吡啶非聚合物組份之溶劑,吾 等預期藉由聚合物鏈聚集作用而促進之大規模相分離。 為研究奈米結晶-聚合物薄膜之形態,感光性技術(諸 如,原子力顯微術(AFM))及本體感光技術(諸如,透射電子 15 顯微術(TEM))被使用。範疇I之例子係於第4圖對於 P3HT内之90重量%之7 nm X 7 nm奈米結晶而顯示,其係 自單一氯仿溶劑旋轉。第4圖顯示數微米尺度之相分離, 因薄膜散射光線,其亦可於光學顯微鏡下檢測,甚至係以 裸眼檢測。光散射於薄膜光生伏打裝置係非所欲,因其會 20 減少被吸收光線之分率。 奈米結晶-聚合物摻合物薄膜表面之研究可藉由使用拍 攝模式(TM)之AFM而重大地促進,因其一般係可藉由比 較相及形態影像而鑑別薄膜組成内之局部差式。為例示從 範疇I轉移至範疇II,第5圖顯示自具低及中間之吡啶濃 22 1245819 玖、發明說明 度之溶劑混合物旋轉而得之9 nm X 13 nm之奈米棒摻合物 薄膜之5//m掃描面積之AFM-TM形態圖及相影像。雖然 此等薄膜之形態對於低°比啶濃度係非常足夠,中間濃度產 生更平滑之薄膜。相對應之AFM-TM之相影像證明表面粗 5 糙性與相分離有關。奈米結晶及聚合物間之相分離未產生 單一材料區域,因此,不可能鑑定個別之聚合物及奈米結 晶區域。於低吡啶濃度,對於薄膜組成之局部變化具明確 證據,而於中間吡啶濃度,相影像係非常平滑。因此,可 吾等可個別將此二濃度歸於範疇I及範疇II。 10 於本發明之另一實施例,被考量係依據本發明之共軛 聚合物内之高載荷量之半導體-奈米結晶造成”平滑”薄膜表 面。此可被量化。為以量化方式表示此等結果,薄膜粗糙 度之均方根(RMS)係自為吡啶濃度之函數之AFM形態影像 決定(第6圖)。當吡啶濃度從0增加至5體積%,RMS粗 15 糙度以一數量等級減少。於5與12體積%間之吡啶濃度, 其於RMS粗糙度僅些微增加,而當吡啶濃度取12至20體 積%時,其具有一數量等級之增加。使用上述方案,吾等 可將0至5體積%之濃度範圍歸於範疇I,5至12體積%歸 於範疇II,及12至20體積%歸於範疇III。此等濃度值係 20 對二元溶液内之固定整體濃度之奈米結晶及聚合物。對於 此間使用之於P3HT内之90重量%之CdSe奈米結晶,部 份濃度個別係45克/公升及5克/公升。需瞭解有關清洗作 用表示之濃度可改變多達20%,且仍有效。 電荷分離僅對於奈米結晶-聚合物界面之激發擴散區域 23 1245819 玖、發明說明 内產生之激發作用而發生。單一材料區域尺寸因較佳奈米 結晶分散而減少,外部量子效率(EQE)之增加被預期。若 下列數量可對一組裝置比較,EQE可作為電荷分離效率之 測量:⑴入射光強度,(ii)吸收光線之分率,及(iii)電極處 5 之電荷收集效率(其主要係藉由電極選擇)。此三條件對於 EQE數據於第6圖呈現之裝置係符合。第6圖顯示對於 P3HT及9 nm X 13 nm之CdSe奈米結晶之摻合物之EQE 對吡啶之依賴性。於I時期至II時期,EQE係以1.4因子 增加,然後,對於III區域係再次減少。於較佳實施例, 10 35%最大EQE係對溶劑混合物(即,二元溶劑系統)内之8 體積%吡啶濃度所發現。 EQE對於二元溶劑系統内之吡啶濃度之相似依賴性存 在於分散於P3HT内之球狀奈米結晶。最大EQE亦於8體 積%吡啶濃度,其可與對如上所述低縱橫比之奈米棒所發 15 現之數值相比。對於固定之奈米結晶濃度,最佳吡啶濃度 係藉由奈米結晶之表面對體積之比例而決定。對於包含3 nm X 100 nm奈米棒之裝置,最佳裝置係自含有12體積% °比咬之溶液鑄製,而具7 nm X 60 nm奈米棒之裝置僅需4 體積%σ比唆。3nm直徑之奈米棒具有比7 nm奈米棒更高2 20 因子之表面對體積之比例。需要更多之吡啶以維持以吡啶 覆蓋之較薄奈米棒之表面,因此等結合之吡啶分子係與溶 液内之游離σ比啶呈動態平衡。 於本發明之另一實施例,可藉由以另一配位體取代吡 咬而改變依據本發明使用之二元溶劑混合物。例如,CdSe 24 1245819 玖、發明說明 、CdTe及InP奈米結晶係於主要由TOPO或TOP及不同 膦酸所組成之混合物内合成。於奈米結晶被回收及儲存後 ,其於產物中具有大量過量之TOPO(或TOP),且奈米結晶 藉由此有機表面活性劑鈍化。具TOPO殼之奈米結晶較不 5 易氧化,且輕易溶於大量之各種溶劑,其包含曱苯、氯仿 、己烷、THF、吡啶及丁醇。TOPO可以鎘之其它配位體 取代,諸如,硫醇、胺及其它膦氧化物及膦酸,見如下所 示0 TOPO τι 吡啶In the preferred embodiment of the present invention, the aspect ratio is preferably greater than 5, and the crystal has a value greater than 2. The best system is 14 1245819. The invention description is about 10. In a preferred embodiment of the present invention, the dispersion or embedding of semiconductor-nanocrystals in a semiconductive polymer is disclosed. Preferably, this "loading amount" is an amount greater than 5% by weight. More preferably, this content is between 20 and about 95% by weight. 5 More preferably, the content is between 50 and about 95% by weight. Optimally, this content is about 90% by weight. In a preferred embodiment of the present invention, the semiconducting polymer will be selected from the group consisting of trans-polyacetylene, polypyrrole, polythiophene, polyaniline, poly (p-phenylene) and poly (p-phenylene) -Polymers or blends of vinylidene), polyfluorene, polyaromatic amines, poly (ethynyl- vinylidene) and their soluble derivatives. Preferred are (poly (2-methoxy5- (2'-ethylhexyloxy) -p-phenylene vinylene) (MEH-PPV) and poly (3-hexylthiophene) (P3HT), and P3HT is Best. In the preferred embodiment, the semiconductor-nano crystals include rods having a length greater than about 20 nm. More preferably, rods having a length between 20 and 200 nm. More preferably 15 systems having a length between about 60 and 110 nm In a more preferred embodiment, the present invention discloses the use of III-V, III-V, IV semiconductors and tertiary mica copper ore. More preferably CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs, Ge, and Si are more preferably CdSe. 20 Preferably, the semiconductor nanocrystals are branched nanocrystals. More preferred nanocrystals have four arms and are tetrahedral symmetrical. Preferably, the film of the present invention It has a thickness of about 200 nm. Preferably, the method for manufacturing the thin film of the present invention uses a binary solvent mixture, wherein at least one solvent is selected from the group consisting of pyridine, chloroform, toluene, dioxobenzene, 15 1245819 玖, invention description, Water, digas benzene, dichlorotoluene, and alkynylamine (wherein the alkynyl chain may be branched or unbranched, The length is between 2 and 20 carbon atoms), butanol, methanol and isopropanol. The best is pyridine in chloroform. Preferably, the content of this binary solvent mixture is between M5 vol%, 5 more The preferred range is 4-12 vol%, and the most preferred is 8 vol%. Another embodiment of the present invention described herein discloses a method for manufacturing a polymer film having semiconductor nanocrystals incorporated therein, wherein The first step is to clean the semiconductor nanocrystals coated with the surfactant at least once with a solvent (preferably, Ubitu). 10 Another embodiment of the present invention described herein is a method for manufacturing a polymer film Including a thermal annealing of the deposited film at a temperature of 60 ° C to about 200 ° C. It is preferably about 120 ° C. In another embodiment of the present invention, a photovoltaic device 'its in The top of the ITO electrode incorporates a pedOT: PSS (poly (ethylene-dioxy 15-yl) thiophene: poly (styrene sulfonic acid)) electron hole transport layer. The semi-V-body-nanocrystal means that it contains Semiconducting crystalline particles of all shapes and sizes. Preferably, they have at least one The size is about 10011111, but it is not limited. The rods can have any length. "Nanocrystals, nanometer rods, nanoparticle, and nanoparticle, can be used interchangeably here. Some of the invention Example 20 'Nano-crystalline particles may have two or more sizes that are less than about fine. T-crystalline crystals may be core / shell or core-type. For example, certain branches according to certain examples of the present invention The shaped nanocrystalline particles may have arms having an aspect ratio greater than about 1. In other embodiments, these arms may have an aspect ratio greater than about 5 ′ and, in some cases, greater than about 10, etc. In some embodiments, the width of these arms can be less than about 200, 100, or even 50 nm. For example, in an exemplary tetrapod with a core and four arms, the core may have a diameter of about 3 to about 4 nm, and each arm may have about 4 to about 50, 100, 200, 500, or even greater than about 1000 nm Its length. Of course, the tetrapods and other nanojunction 5 crystal particles described herein may have other suitable sizes. In the embodiment of the present invention, the nanocrystalline particles may be monocrystalline or polycrystalline in nature. The present invention also considers using nanorods of CdSe and CdTe with aspect ratios higher than 20 (even up to 50) and lengths greater than 100 nm, which are formed according to the methods described in the literature, see 404 by Peng, XG · et al. , 59 (2000) and Peng, Z · A · et al. 10 J. d / n · CTzem. 123, 183 (2001) 〇 The length of the semiconductor-nanocrystalline rod used here has a length between 20 and 200 nm . In a preferred embodiment, the semiconductor-nanocrystal comprises a rod having a length greater than about 20 nm. More preferred are rods with lengths between 20 and 200 nm. More preferably, it is a rod with a length between about 60 and 110 nm. 15 "At least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 2" means that if the semiconductor-nanocrystal is an unbranched rod, at least a part of the total amount of the rod will have a greater than about 2 aspect ratio. This content can be as high as 100%. Furthermore, this means that if the nanocrystalline branched semiconductor-nanocrystal (including tetrapods of course), at least a part of the shell Γ means that at least one branch has an aspect ratio of 20 greater than 2. Aspect ratio The length defined as the longest dimension of the rod divided by its diameter. In the case of branched nanocrystals, the aspect ratio of branched nanocrystals is defined as the length of the longest branch divided by the diameter of the longest branch. "Semiconductor-nanocrystalline branched nanocrystals" means at least 1% by weight of nanocrystalline branched nanocrystals. It should be understood here that 17 "1245819", "a part" defined in the description of the invention also includes 100 %, That is, "the whole part". Although CdSe and CdTe semiconductor-nanocrystalline systems are preferred, the nanocrystalline particles may include other suitable semiconductor materials and are rods, shaped particles, or spheres. For example, the particles may include semiconductors such as compound semiconductors. Suitable compound semiconductors include group II-VI semiconducting compounds such as MgS, MgSe, MgTe, CaS, CaSe, CaTe, SrS, SrSe, SrTe, BaS, BaSe, BaTe, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe and HgTe. Other suitable compound semiconductors include semiconductors of the III-V group, such as GaAs, GaP, GaAs-P 10, GaSb, InAs, InP, InSb, AlAs, A1P, AlGaAs, InGaAs, and AlSb. The use of Group IV semiconductors such as germanium or silicon is also feasible under certain conditions. In other embodiments, the particles may include a dielectric material, such as SiC, SiN, or any other material capable of exhibiting polymorphism. It also contains tertiary mica copper ore, such as CuInS2 and CuInSe2. Certain metals (such as Fe, Ni, 15 Cu, Ag, Au, Pd, Pt, Co, etc.) can also exhibit polymorphism and can be used in embodiments. Rod-shaped, arrow-shaped, teardrop-shaped, and tetrapod-shaped semiconductor nanocrystals are defined in Manem et al., CAem. Xin c. 2000, 12, 12700-12706, the contents of which are incorporated herein for all Purpose. Nanocrystalline particles according to embodiments of the present invention may have unique optical, electrical, magnetic, catalytic, and mechanical properties, and may be used in several suitable end applications. It can be used, for example, as a filler for composite materials, a catalyst, a functional element of an optical device, a functional element of a photovoltaic device (for example, a solar cell), a functional element of an electric device, and the like. "P3HT" refers to poly (3-hexylthiophene), which contains regioregularity 18 1245819 发明, description of the invention P3HT, which includes the regioregularity P3HT of head joint and head to tail. P3HT is preferred. The present invention contemplates that any semiconducting conjugated polymer that can be treated from solution can act in accordance with the present invention. "Semiconducting polymer" means all polymers having a 7Γ-electron system. Non-limiting examples include trans-polyacetylene, polypyrrole, polythiophene, polyaniline, poly (p-phenylene) and poly (p-phenylene-phenylene), polyfluorene, polyaromatic amines , Poly (ethynyl-ethenyl) and the above-mentioned soluble derivatives. Examples are (poly (2-methoxy, 5- (2'-ethylhexyloxy) -p-phenylene vinylene) (MEH-PPV) and poly (3-hexylthiophene). Particularly preferred is poly 10 ( 3-hexylthiophene), P3HT. The present invention also considers the use of conjugated polymers that can be solution-processed or melt-processed because the bulk side groups are attached to the main car chain or the car polymer is included in a One or more components are within the copolymer structure of non-co-owners. Non-limiting examples include poly (, 4'-diphenylene diphenyl vinylene), poly (1,4-phenylene- 1-phenyl vinylene and poly15 (1,4-phenylene diphenyl vinylene, poly (3-alkyl-gall) and poly (2,5-dialkoxy-p-phenylene vinylene) It is necessary to understand that a semiconductive conjugated polymer refers to a mixture of polymer blends of a series of semiconductive conjugated polymers. Therefore, the nanocrystalline system is buried or dispersed in the blend or mixture. The present invention further considers semiconductor-nano crystals, rods, which can be arranged by any of the techniques known in the art of arranging crystals. "Photovoltaic device" means Contains the type of device structure known in the art. Exemplary photovoltaic devices are described in, for example, Science, volume 295, pages 2425-2427, March 29, 2002, the contents of which are incorporated herein by reference The exemplified photovoltaic device may have nano 19 1245819 玖 in the adhesive, crystal particles of the description of the invention. Then, the composition is sandwiched between two electrodes (for example, an aluminum electrode and indium tin oxide) on a substrate. (Electrode), a photovoltaic device is formed. "Two Fan Solvent System" refers to a system containing two solvents, and _ can be a ligand, which is also a solvent. For example, pyridine in aerosol., Binary solvent 5 agent system, also refers to a system containing at least -solvent and non-solvent ligands, for example, xylene and phosphonic acid. Dibenzobenzene semiconductor nanocrystalline solvent, and phosphonic acid system But not solvent. Appropriate methods for making the films described herein are known. Non-limiting examples of various self-solution coating and printing techniques include spin coating, doctor blade coating 10, dip coating, inkjet Printing and _screen printing. All technologies in Generally referred to as "deposition". That is, the thin film of the present invention needs to be deposited, deposited, on certain types of substrates. The complementary electronic properties of inorganic and organic semiconductors can be used to form electroactive bonds. Charge transfer is high The affinity between inorganic semiconductors with electronic affinity and organic molecules and polymers with relatively low ionization potentials is relatively advantageous. In one embodiment of the present invention, semiconductor nanoparticle (such as Cdse nanocrystal) and conjugated polymer (Such as P3HT) combined to generate a charge transfer connection with a high interface region, which results in a photovoltaic device with improved efficiency. From the CdSe nanocrystal and the energy level diagram of P3HT, it can be seen that the CdSe system accepts electrons and ρ3Ητ 20 Accepts electron pores (No. 丨 _). The ligands on the surface of the nanocrystalline crystals regulate the interaction with the polymer. After casting, the ligand on the cdSe surface can be replaced or removed by chemically cleaning the nanocrystals or heat-treating the CdSe-P3HT blend film. The effect of charge transfer and transport is determined by the form of the blend. 20 1245819 发明, description of the invention. The aggregation of nanocrystals in solution and polymer depends on the van der Waals interaction strength between the particles, and therefore on the separation and size of the nanocrystals. A balance between the aggregation effect for transporting electrons and the dispersion effect for more efficient charge transfer is necessary. The inventors have surprisingly discovered that precise control of morphology is obtained by using a solvent mixture. A solvent mixture according to an embodiment of the present invention containing pyridine, which is a ligand and helps dissolve nanocrystals, can affect the dispersion of nanocrystals in a solution. Because spin casting is a non-equilibrium method, the dispersion of nanocrystals in solution can be maintained in the polymer. 10 According to an embodiment of the present invention, the solvent mixture is used to control phase separation up to the nanometer size. The inventors have surprisingly discovered that solvent mixtures can be used to control phase separation in thin films with high nanocrystalline concentration (up to 90-95% by weight) in polymers (especially P3HT) to 亳 micron size. The purpose is to promote the solubility of nanocrystals by using a solvent 15 that is good for nanocrystals (especially CdSe) and ligands and a solvent that is good for solution-treated polymers. A preferred example is a strongly bonded Lewis base, pyridine, which has a relatively low boiling point of 116 ° C, and is easily selected as a ligand for nanocrystals due to its ease of removal. Pyridine-treated nanocrystals of various shapes and sizes are co-dissolved with P3HT in a mixture of 4% to 12% by volume of 20% pyridine in chloroform, which is produced by dispersed particles in the polymer during spin casting. Uniform thin film. The preferred ton sigma content to cover the nanocrystalline surface is determined by the number of non-passivated Cd surface locations on the nanoparticle. Pyridine is compatible with chloroform. In this way, it has a twofold increase in solubility for nanocrystals: (a) Nanocrystals coated with gadolinium are better than their bare counterparts. 21 1245819 发明, description of the invention It is soluble in chloroform, and (b) it is highly soluble in an excess of pyridine that is not bound to nanocrystals. However, too much pyridine needs to be avoided because it regulates the precipitation of P3HT (which is extremely soluble in chloroform but different from pyridine). Therefore, there are three types of solubility range. 5 I. Low Pyridine Concentration Range: Insufficient solubility of nanocrystals results in large-scale phase separation of blend films promoted by aggregation of nanocrystals. II. Intermediate pyridine concentration range: If the polymer is still sufficiently soluble in the mutual-solvent blend of the two solvents, the promotion of the solubility of the nanocrystalline components of the blend solvent will result in dense mixing of the two semiconductors, and thus the spin coating Avoid 10 to avoid phase separation. III. High pyridine concentration range: Due to the solvent of the pyridine non-polymer component, we expect to promote large-scale phase separation by polymer chain aggregation. To study the morphology of nanocrystalline crystalline-polymer films, photosensitive techniques (such as atomic force microscopy (AFM)) and bulk photosensitive techniques (such as transmission electron microscopy (TEM)) are used. An example of category I is shown in Figure 4 for 90% by weight 7 nm X 7 nm nanocrystals in P3HT, which is rotated from a single chloroform solvent. Figure 4 shows phase separation on the scale of several micrometers. Because the film scatters light, it can also be detected under an optical microscope, even with the naked eye. Light scattering in thin-film photovoltaic devices is undesirable because it reduces the fraction of absorbed light. The study of the surface of nanocrystalline crystalline-polymer blend films can be greatly promoted by using AFM in shooting mode (TM), because it is generally possible to identify local differences in film composition by comparing phase and morphological images . As an example, the transition from category I to category II is shown in Figure 5. Figure 5 shows the 9 nm X 13 nm nanorod blend film obtained by rotating a solvent mixture with a low and intermediate pyridine concentration of 22 1245819 玖 and a description of the invention. AFM-TM morphology and phase image of 5 // m scanning area. Although the morphology of these films is sufficient for low-degree-pyridine concentrations, intermediate concentrations produce smoother films. The phase images of the corresponding AFM-TM proved that the surface roughness was related to phase separation. Nanocrystals and phase separation between polymers do not result in a single material region, so it is not possible to identify individual polymers and nanocrystal regions. At low pyridine concentrations, there is clear evidence of local changes in film composition, while at intermediate pyridine concentrations, the phase image is very smooth. Therefore, we can individually classify these two concentrations into category I and category II. 10 In another embodiment of the present invention, the high-load semiconductor-nanocrystals in the conjugated polymer according to the present invention are considered to cause a "smooth" film surface. This can be quantified. To quantify these results, the root mean square (RMS) of the film roughness was determined from the AFM morphological image as a function of the concentration of pyridine (Figure 6). As the pyridine concentration increases from 0 to 5 vol%, the RMS coarse 15 roughness decreases by an order of magnitude. The concentration of pyridine between 5 and 12% by volume has only a slight increase in RMS roughness, and when the concentration of pyridine takes 12 to 20% by volume, it has an order of magnitude increase. Using the above scheme, we can classify the concentration range of 0 to 5 vol% as category I, 5 to 12 vol% as category II, and 12 to 20 vol% as category III. These concentration values are 20 pairs of nanocrystals and polymers with a fixed overall concentration in the binary solution. For 90% by weight of CdSe nanocrystals used in P3HT here, the partial concentrations were 45 g / liter and 5 g / liter, respectively. It is important to understand that the concentration indicated for cleaning effects can vary by up to 20% and still be effective. Charge separation occurs only for the excitation-diffusion region at the nanocrystal-polymer interface. The single material region size is reduced due to better nanocrystalline dispersion, and an increase in external quantum efficiency (EQE) is expected. EQE can be used as a measure of charge separation efficiency if the following quantities can be compared to a group of devices: ⑴ incident light intensity, (ii) fraction of absorbed light, and (iii) charge collection efficiency at the electrode 5 (which is mainly determined by Electrode selection). These three conditions are met for the device presented in Figure 6 with EQE data. Figure 6 shows the pyridine dependence of EQE for a blend of P3HT and CdSe nanocrystals of 9 nm X 13 nm. From period I to period II, the EQE line increased by a factor of 1.4, and then decreased again for the region III line. In the preferred embodiment, 10 35% maximum EQE is found for a concentration of 8 vol% pyridine in a solvent mixture (ie, a binary solvent system). A similar dependence of EQE on the concentration of pyridine in a binary solvent system resides in spherical nanocrystals dispersed in P3HT. The maximum EQE is also at 8 volume% of the pyridine concentration, which is comparable to the value found for nanorods with low aspect ratios as described above. For a fixed nanocrystal concentration, the optimal pyridine concentration is determined by the surface to volume ratio of nanocrystals. For devices containing 3 nm X 100 nm nanorods, the best device is cast from a solution containing 12% by volume ° specific bite, while devices with 7 nm X 60 nm nanorods require only 4% by volume σ ratio 唆. A 3 nm diameter nanorod has a surface-to-volume ratio that is 2 20 factors higher than a 7 nm nanorod. More pyridine is needed to maintain the surface of the thinner nanorods covered with pyridine, so the bound pyridine molecules are in dynamic equilibrium with the free σ-pyridine in the solution. In another embodiment of the present invention, the binary solvent mixture used in accordance with the present invention can be changed by replacing pyridine with another ligand. For example, CdSe 24 1245819 rhenium, description of the invention, CdTe and InP nanocrystals are synthesized in a mixture mainly composed of TOPO or TOP and different phosphonic acids. After the nanocrystals are recovered and stored, they have a large excess of TOPO (or TOP) in the product, and the nanocrystals are passivated by this organic surfactant. Nano crystals with TOPO shells are less susceptible to oxidation and are easily soluble in a variety of solvents, including toluene, chloroform, hexane, THF, pyridine and butanol. TOPO can be substituted with other ligands of cadmium, such as thiols, amines and other phosphine oxides and phosphonic acids, as shown below. 0 TOPO τι pyridine

10 非共軛配位體於電磁光譜可見光部份未吸收,且加至 太陽能電池之光產生電流。具附接之膦氧化物或膦酸官能 性之募聚噻吩可接合至CdSe及其它半導體-奈米結晶之表 面。具較長共軛(高於4個單體單元)之此等共軛配位體於 25 1245819 玖、發明說明 電磁光譜之可見光區域吸收,且有助於光電流,因此,其 使用係以本發明一實施例考量。苯基膦酸係較佳使用之配 位體之非限制性例子。具大於10個單體單元之寡聚噻吩之 能階接近母聚合物(P3HT)。ΤηΡΑ係如下所示之噻吩(η數 5 量之噻吩環)膦酸。有三種於本發明考量之較佳噻吩衍生物 配位體。噻吩環之數量可改變,且可使用膦酸、膦氧化物 或寡聚嗟吩胺。10 The non-conjugated ligand is not absorbed in the visible part of the electromagnetic spectrum, and the light applied to the solar cell generates a current. Polythiophenes with attached phosphine oxide or phosphonic acid functionality can be bonded to the surface of CdSe and other semiconductor-nanocrystals. These conjugated ligands with longer conjugates (higher than 4 monomer units) were absorbed in the visible light region of the electromagnetic spectrum and contributed to photocurrent at 25 1245819 玖. Therefore, their use is based on this Consider an embodiment of the invention. Non-limiting examples of phenylphosphonic acid are preferred ligands. The energy levels of oligothiophenes with more than 10 monomer units are close to the parent polymer (P3HT). TnPA is a thiophene (thiophene ring with η number 5) phosphonic acid as shown below. There are three preferred thiophene derivative ligands considered in the present invention. The number of thiophene rings can be varied, and phosphonic acid, phosphine oxide, or oligofluorene amine can be used.

因為大的募聚物緊密結合至奈米結晶,且可與聚合物 10 緻密地交互作用,其有助於改良二半導體間之電荷轉移速 率。亦具有相似於聚合物之側鏈之寡聚物有助於大量奈米 結晶彼此排斥,及於良好地分散於聚合物内。於較佳情況 ,奈米結晶與含有結合至奈米結晶之化學官能性(諸如,膦 及膦氧化物)之聚合物摻合。於此例子中,聚合物可緊密接 15 近奈米結晶以促進快速且有效之電荷轉移。 為取代ΤΟΡΟ或其它合成溶劑,奈米結晶以對奈米結 晶之特殊表面活性劑係適當之溶劑清洗。然後,奈米結晶 被溶於溶劑,且使用過量之所欲配位體,並於高溫迴流數 小時。高溫係確保自奈米結晶表面斷斷續續移除配位體, 26 1245819 玖、發明說明 且此過量係維持新配位體於奈米結晶表面上之平衡。降低 奈米結晶曝露於高溫之氧及水之另一有效化學處理係使奈 米結晶溶於過量之取代配位體内,然後於TOPO之溶劑或 其它合成溶劑内沈澱顆粒,且於離心作用後將上層物棄置 5 。吡啶(具116°C之沸點)係一種最易取代之配位體,且較佳 係與CdSe使用。以吡啶鈍化之奈米結晶係比以TOPO覆 蓋者更不可溶,但其可藉由使奈米結晶乾燥或加熱輕易使 °比唆汽提。 於以奈米結晶-聚合物之摻合物製造之光生伏打裝置, 10 奈米結晶上之配位體決定薄膜形態及微相分離程度。CdSe 與各種配位體(包含TOPO、吡啶及改質之TOPO,其中一 辛基部份係以噻吩環(T1)取代)之摻合物之形態於第22圖 中比較。 作為非限制性之例子,以具非極性烷基鏈之Τ0Ρ0鈍 15 化之CdSe奈米結晶可均勻分散於P3HT之非極性基質。顆 粒間之明確間隔相對應於11 A,TOPO分子之大約長度( 第22a圖)。當ΤΌΡ0藉由以噻吩環取代一辛基鏈產生T1 而改質時,此等奈米結晶當分散P3HT内時行為係不同於 以TOPO塗覆之顆粒(第22b圖)。以T1塗覆之奈米結晶係 20 比以TOPO塗覆之顆粒更易聚集,且CdSe奈米結晶之聚 集物組合成奈米顆粒線。雖然不受任何理論或原理所限, 可能係T1分子上之噻吩環與聚合物上之噻吩環產生7Γ-堆 疊,造成奈米結晶沿著聚合物鏈而排列。奈米結晶表面上 之表面活性劑存在可自聚集物内及奈米結晶鏈間之顆粒間 27 1245819 玖、發明說明 分離而辨別。相反地,以吡啶塗覆之奈米結晶於P3HT内 聚集(第22c圖)。雖然不受任何特定理論或原理所限制, 但可能因為吡啶係一種弱路易士鹼,某些吡啶於薄膜鑄製 時之溶劑蒸發期間自奈米結晶表面移除。因此,非極性 5 P3HT内之具重大極性之奈米結晶間之凡得瓦相互作用造 成複合物之有機及無機之組份間之微規模之相分離。以吡 啶清洗之奈米結晶係與附近顆粒更緻密地接觸,如此,將 無如以TOPO塗覆之顆粒般所觀察之於薄膜内之奈米結晶 間之明確分離。以TOPO及以吡啶塗覆之奈米結晶間之聚 10 集行為之相似差異於聚合物MEH-PPV(其係比P3HT更具 極性)觀察到。 需瞭解本發明考量作為較佳實施例係非自合成處理方 法實際取代95%之位於棒上之表面活性劑。直覺上,可能 相到清洗3次能去除更多殘餘之表面活性劑,且因表面活 15 性劑干擾電荷轉移而係較佳。但是,發明人驚人地發現僅 以一清洗步驟,某些表面活性劑被留住,造成比可預期者 更大且不可預期之結果之光生伏打裝置。相較於清洗三次 之裝置,此一裝置之EQE改良3至5倍。 直徑5 nm之奈米結晶於甲醇内清洗3次以移除過量 20 TOPO,然後,溶於最小量之吡啶(每100毫升CdSe係50 // 1)且於己烷内沈澱三次,以獲得於表面上具咄啶之顆粒 。以曱醇清洗之奈米結晶先以吡啶迴流而替代Τ0Ρ0,以 己烷沈澱,然後於溶於曱苯内之T1溶液内迴流12小時, 產生以T1塗覆之顆粒。薄膜藉由於NaCl IR窗上自溶於氣 28 1245819 玖、發明說明 仿之P3HT内之40重量%奈米結晶溶液旋轉鑄製而獲得。 此等樣品被浸潰於水中以浮出摻合物薄膜,且具多孔性碳 之銅TEM格柵被用以取拾此薄膜。 於本發明之另一實施例,發明人已驚人地發現熱處理 5 係促進結合至無機表面之有機分子之移動性之有效方法, 且接近聚合物玻璃轉移溫度之奈米複合物處理能使薄膜内 之此等分子移向表面。於有機摻合物,熱退火已被用於促 進旋轉鑄製薄膜之平衡形態,且於某些情況係用以促進複 合物内之相分離及結晶化作用。對於奈米-聚合物摻合物, 10 熱處理能改良奈米結晶-奈米結晶及奈米結晶-聚合物之界 面以不可預期地促進電荷轉移及運送,改良光生伏打裝置 之性能。二元溶劑内之過量咄啶(用以控制奈米結晶於聚合 物内之分散)將被顯示係作為P3HT内產生之激子之非輻射 性重組中心。因此,此等激子未有助於光電流。依據本發 15 明實施例之薄膜之熱退火造成界面吡啶及聚合物區域内之 過量未結合吡啶之移除。EQE之重大促進於加熱後之裝置 内觀察到,此可能與用於電荷轉及光電流產生之此等失去 激子之回收有關。 對自氯仿内之10體積%吡啶溶劑旋轉鑄製之於P3HT 20 内之90重量%之3 nm X 60 nm CdSe奈米棒所測得之正規 化光電流係如第7 a圖所示(空心圓,退火前;實心距形, 退火後)。絕對最大EQE於流動氬氣下之455 nm時於0.1 mW/cm2照射下係15%。於約50毫托耳之減壓下之120°C 時加熱3小時及冷卻8小時至室温,相同裝置之光電流被 29 1245819 玖、發明說明 大量促進(第7a圖),高於一般所預期。 雖然不欲受任何特定理論或原理所限,此等不可預期 結果可以如下解釋。加熱過之裝置之光電流對加熱前之裝 置之光電流之比例顯示以2.5之因子整體促進,且接近650 5 nm係以大於6之因子之特別強烈增加,且於700 nm具一 肩部(第7b圖)。為瞭解此紅色EQE促進波峰之起源,僅 具有3 nm X 60 nm之CdSe奈米棒之裝置係於相同條件下 製造及加熱。於熱處理前及熱處理後之光電流分析顯示僅 具有以約700 nm為中心之促進特徵。因此,吾等將摻合物 10 光電流之此一紅色位移歸因於奈米棒。因此,不受特定之 操作理論或機構所限,假定熱處理被認為有助於界面咄啶 之移除及使奈米棒更緊密在一起,造成不可預期及驚人之 較優效率。鄰近奈米棒之聚集可能改良奈米棒間之電子運 送,因此,跳動步驟間之分離距離被減少。再者,界面吡 15 啶之移除亦可藉由使此二材料呈更緊密電子接觸而具有促 進CdSe與P3HT間之電荷轉移之效果。此二效果最可能造 成於所有被吸收波長之約2.5之因子之整體光電流促進。 最大光電流增加發生於500 nm與700 nm間之區域, 其中,大於6之因子係對90重量%之CdSe摻合物裝置獲 20 得,且CdSe及P3HT皆重大地有助於光吸收。為決定相對 助益性,吾等比較吸收光線之分率與藉由每一材料組份產 生之光電流之分率。一系列具改變CdSe濃度之裝置之吸 收光譜可適合個別CdSe及P3HT光譜之線性組合(第8圖) 30 1245819 玖、發明說明 加熱後於摻合物裝置之400 nm與700 nm間之吸收無 重大變化。對於大於40重量%之濃度,P3HT濃度對於光 電流之助益係顯著少於聚合物吸收之光線比例。於90重量 %CdSe之裝置,P3HT有助於61%之吸收光線,但聚合物 5 僅有助於8%之光電流。此表示藉由P3HT吸收之大量光線 未有助於電流產生,且係損失於非輻射或輻射重組之路徑 。但是,於120°C時熱處理此等裝置時,光電流光譜之變 化產生P3HT之助益,其係更接近吸收光線之比例。對於 90重量%CdSe之裝置,光電流之P3HT部份戲劇性地增至 10 66%,其可與P3HT内61%之吸收光線相比擬。此一外部 量子效率放大於60°C至160°C觀察到,於180°C再次減少 ,因鋁經由薄膜泳移且此裝置退化,第9圖。相對應地, 60重量%0(186摻合物薄膜之PL效率(其係處理溫度之函數 )上升至120°C,其後減少,且於更高溫度時保持固定(第9 15 圖之插入圖)。本發明考量熱退火溫度可高達200°C。 此等不可預期功效可以如下解釋。因為摻合物内之 CdSe之PL效率少於0.1%,樣品之PL主要自P3HT產生 。P3HT之加熱已知係造成促進之結晶性,其終止PL效率 。此功效於低達40°C之溫度時於已加熱之P3HT薄膜觀察 20 到。因此,增加之結晶性解釋於高於120°C時摻合物薄膜 内觀察到之PL效率些微減少,但無法解釋低於120°C時之 PL效率大量增加。於低溫,移除聚合物内之過量^比咬係 P3HT之PL效率隨增加之處理溫度而增加之可能原因。可 能係因為P3HT内吸收之某些質子於未經處理薄膜内之聚 31 1245819 玖、發明說明 合物内之17比咬位置處進行非輕射重組且對PL無助益。於 熱處理後,此等質子可助於輻射衰變及電荷轉移。因此, 過量吡啶之移除造成較大P3HT對光電流之助益,導致於 500 nm與700 nm間之區域所觀察之EQE促進。 5 依據本發明較佳實施例之熱處理對於促進高縱橫比奈 米棒裝置(其具有高的表面積對體積之比例,且需於旋轉鑄 製溶液内之較高吡啶濃度(>8體積%))之EQE係重要的。於 由此等奈米棒所組成之裝置,其具有大量之奈米棒-奈米棒 及奈米棒-聚合物界面之面積,其含有吡啶及大量之過量吡 10 啶。此咣啶之移除造成最高達6之因子之大量EQE改良, 其係於第7圖觀察到。相反地,7 nm X 60 nm尺寸之奈米 棒於僅具4體積%吡啶之溶劑内與P3HT摻合,且加熱後 之最大EQE增加僅係1.3之因子(第10圖)。 本發明考量使用具低的表面積對體積之比例之奈米棒 15 ,因此,自薄膜(<200 nm)移除吡啶係僅於低壓時(<10_6毫 巴)自樣品上泵取而造成,且熱處理時未觀察到性能改良。 再者,薄膜之熱處理對於開路及充填因子係不利,因為鋁 經由重大部份裝置擴散。 於一系列之厚度範圍係100 nm至350 nm之於P3HT 20 内之90重量%之7 nm X 60 nm奈米棒CdSe之裝置,高於 200 nm厚度者於120°C之熱處理時改良(第11圖)。 當裝置之厚度增加,EQE之相對促進亦上升(第12a圖 )。熱處理後之EQE之絕對改良亦隨厚度而增加(第12b圖) ,但因最厚裝置之較差運送性質,於346 nm厚度係受限制 32 1245819 玖、發明說明 。因混雜之奈米棒-聚合物太陽能電池經由奈米棒排列及長 度大於100 nm之棒材合成而變得更有效率,具有較高光學 密度以吸收更多太陽光之較厚膜可被使用。於此等厚膜, 熱處理對於實行高性能裝置係較佳。 5 於本發明之另一實施例,發明人已驚人地實行不可預 期之策略以增加載體移動性及改良電荷收集,造成促進之 電池性能。對於電子運送材料與電子孔運送材料之摻合物 ,滲濾路徑之產生對於運送電荷係必需。於奈米結晶與聚 合物之分散中,此等路徑之對於電子之終端係作為阱(trap) 10或重組中心。增加奈米結晶之尺寸會降低此等終端之數量 ,且因而促進性能。但是,為達到商用太陽能電池所觀察 到之效率,所欲地係具有較高之載體移動性及較低之重組 速率。以具有相似於此裝置厚度之長度之奈米棒,其可具 有經指導之路徑,其間,載體移動性係相似於一度空間之 15線材。因此,滲濾及跳動運送之問題可被去除。藉由控制 刀政於P3HT内之CdSe奈米棒之縱橫比,發明人已驚人地 長度規袼及電子運送方向可經由薄膜pv裝置而修改。 因奈米結晶從球狀至棒狀時縱橫比增加,其自分子範 7更接近移肖度空間之線材,且變得較不易溶解。於第 20 13a圖,奈米棒於p3HT内聚集形成單_島狀物,其於薄膜 自氣仿鑄製跨越數微米。但^,對於相同濃度,當自吼 啶/氯仿溶劑混合物鑄製時,奈米棒均句分散於聚合物内, 第13b圖。吡啶及氣仿内之奈米棒分散對於均勻薄膜之鑄 製及與P3HT產生大的電荷轉移界面以降低激子重組係重 33 1245819 玖、發明說明 要的。 因為太陽能電池之結構係使電場於裝置之厚度延伸, 而非於平面上延伸,亦重要的係描述摻合物薄膜之截面形 態。為完成此目的,於P3HT内之60重量%之10 nm X 10 5 nm CdSe奈米結晶之溶液自溶液旋轉塗覆於Polybed環氧 碟片上。然後,碟片以鑽石刀顯微切割以產生60 nm厚之 膜。此等超薄之膜於一端緣含有奈米結晶-P3HT之截面。 於薄膜之TEM影像,第14圖,無奈米結晶之暗區段係環 氧基材,其上可見到含有奈米結晶之P3HT薄膜,紡100 10 nm寬。奈米結晶均勻地跨越整個薄膜厚度,且於側方向無 顯著之相分離。 獲得長奈米棒-聚合物薄膜之截面係非常難。奈米棒因 其大尺寸之故係耐切割,且摻合物薄膜具有撕裂及受刀具 拖曳之趨勢。因此,薄膜一旦旋轉於環氧碟片上時,係被 15 埋入環氧樹脂内兩天並固化,以於顯微切割期間提供進一 步之支撐。對P3HT内之40重量%之7 nm X 60 nm之 CdSe奈米棒所形成之截面顯示奈米棒係跨越薄膜厚度之大 部份,第15b圖。 因奈米棒長度增加以跨越光生伏打裝置之厚度,預期 20 電子運送將大量地改良。但是,對於運送所預期之改良係 假定奈米棒係垂直於基材平面而排列,且其係夠長以使電 子於一奈米棒内完全運送。第15圖顯示奈米查被任意分散 ,但某些顆粒係延電子運送方向以重大組份定向。奈米棒 之部份排列及對電子運送之有利效用之進一步證據可於光 34 1245819 玖、發明說明 電流中觀察。 只要下列數量可對一組裝置比較,EQE可作為電荷運 , , (iii) 電極處之電荷收集效率(其主要係藉由電極選擇),及㈣電 5荷轉移效率(自光致猝滅終止決定)。哪數據如第μ圖所 呈現之裝置係符合此四條件。因此,吾等論定當奈米棒之 縱橫比從i增至10,第17圖,電荷運送需重大改良以產 生、力3之因子之Eqe改良。於由較短之奈米顆粒組成之網 絡中,電子運送係以個別顆粒間之跳動(其係包含收集電子 10之電極之路⑹所控制。但是,於由較大顆粒所組成之裝置 ,f狀導電(band conduction)係普遍,因路徑可自單一奈米 棒形成。因為裝置内之奈米棒.聚合物薄膜之厚度約· nm,60 nm長之奈米棒可經由裝置之重大部份穿過,而3〇 及7 nm長之顆粒係漸進地較不有效,第16圖。最佳裝 15置(其含有7 nm X 60 nm奈米棒)於485 nm時之〇」 mWW照射下以55%之最大_施行,且此數值係顯著 地可再生。所報告之結果呈現於個別情況自三種不同之 CdSe合成批次物(總量係57個個別太陽能電池)製得之五 組裝置之中間值。此57個裝置之每一者之最大外部量子效 20率相對於中間值皆係於1〇%内,且最高獲得效率係59%, 所有皆係於〜(U mW/cm2之單色照射。個別裝置已於數個 月之時間規格重複地描述,且顯示於測量間無重量變化。 因為無機半導體奈米棒之相較於半導性有機聚合物及 J刀子之車乂優異載體運送性質,此等混雜之奈米棒_聚合物 35 1245819 玖、發明說明 太陽能電池於低強度照射下以最高EQE施行,其係對迄今 之含聚合物之電池所報告。 所考量者係依據本發明之光生伏打裝置併入高度分支 之奈米棒。高度分支之奈米棒係依據習知技藝已知技術自 5 10次先質注射而合成。於合成期間之隨後注射時,此等奈 米棒發展出許多用於分支及增加長度之成核位置。因為許 多此等分支狀奈米棒具有高於100 nm之長度,EQE之進 一步增加係於被用於奈米棒-聚合物PV裝置中被預期。分 支係藉由棒材之纖維鋅礦結構内之低能量閃鋅礦缺失(其係 10 相似於疊層缺陷之缺失,其造成奈米棒沿其長度具有紐結) 所造成。因此,預期分支狀奈米棒内之載體移動性係相似 於未分支之棒材。再者,奈米棒之分支及主體間之交互作 用係比物理性接觸之二個別奈米棒間者更強。因此,帶狀 運送於分支狀奈米棒内係普遍,且電子跳動發生於個別奈 15 米棒間。 需瞭解本發明實施例包含更複雜形狀之奈米結晶顆粒 。於本發明實施例,起始成核結果產生具立方體結晶結構 之芯部(例如,閃鋅礦結晶結構)。隨後,具六角形結晶結 構之臂(例如,纖維鋅礦)可自芯部長出。但是,不同生長 20 條件可被提供以統計上地交替形成立方體及六角形之結晶 結構,因此,導致不規則分支。於整個反應期間精確控制 溫度可產生依序分支之”無機樹狀物”,見Mana等人之1 XM· C/zem· S%·,2000,122,12700-2706 及美國序號 10/301,510號案(2002年11月20曰申請,現係審理中)。 36 1245819 玖、發明說明 於基材上自行排列之具有一總是指向一電極之臂且與 低帶隙材料(諸如,CdTe)結合之四足體之固有性質,使埋 於共軛聚合物内之四足狀半導體-奈米結晶成為特別佳之實 施例。與呈任意位向之奈米結晶顆粒相比,依據本發明實 5 施例之四足體被排列且能提供比任意位向之奈米結晶顆粒 更具單一方向之電流路徑。 對於各種吡啶濃度之於P3HT内之90重量%CdSe分支 狀奈米棒摻合物之光電流光譜係描述於第18圖。對於分支 狀奈米棒之較佳吡啶濃度發生於12%,其明顯高於較短之 10 未分支桿材,其係8%或更少。對於此等裝置之最大EQE 於450 nm時約0.1 mW/cm2照射下係31%。相反於預期結 果,此EQE幾乎比自60 nm奈米製得之裝置低2之因子。 較長奈米棒(>1〇〇 nm)於P3HT内之分散係受限於其於 咄啶-氯仿内之可溶性。當分支狀奈米棒溶於吡啶-氯仿内 15 時,其係形成膠凝黏稠溶液。此表示分支狀物體之較低可 溶性,及相對於奈米棒-溶劑交互作用之較高之奈米棒-奈 米棒交互作用。藉由此等分支狀物體,CdSe-P3HT薄膜以 不均勻且散射之光線鑄製,明顯地指示巨相分離。任何於 運送效率之促進受電荷分離效率減少(其係因奈米棒與 20 P3HT間之界面面積減少而造成)所累。 高濃度溶液内且以咣啶鈍化之長的硒化鎘奈米棒係以 小距離分隔,於某些情況係咄啶之直徑。於此接近距離下 ,凡得瓦吸引力(其係隨體積及距離增減)係非常強且促進 聚集作用。使高濃度之長奈米棒溶解(其係製造用於PV裝 37 1245819 玖、發明說明 置之具足夠厚度之膜所必需)係一種挑戰。具較大尺寸及較 長鏈之配位體係用以延伸添加至聚合物之奈米棒長度所必 需。為避免此等配位體作為障壁層,其需呈電活性且能階 需使CdSe與P3HT間之電荷轉移容易。 5 電子之完全帶狀導電需使運送整個容納於單一奈米結 晶内。運送之進一步改良係依薄膜厚度上之奈米棒排列而 定。奈米棒排列方法包含電場及拉伸排列,二者皆需電流 裝置之處理及結構之重大改良。四足體(具有四個附接於立 方體中心之相同臂)係使其等自然地於表面上定向,且一臂 10 自垂直於基材平面,如第19圖所見。因此,其次產生之混 雜太陽能電池能併入四足體作為自行排列之奈米結晶,以 便有效率地運送電子。 本發明之另一實施例,係使本發明之奈米棒/聚合物之 光生伏打裝置於驚人之薄膜厚度操作。使用奈米結晶及聚 15 合物之許多優點之一係相較於本體無機半導體而言之高吸 收係數。此形成典型上少於300 nm之薄膜,其能吸收多於 90%之入射輻射。不同於傳統之無機半導體太陽能電池(其 需多於數微米厚度以吸收光線),低材料使用及可撓性裝置 以奈米結晶及聚合物係可能。雖然不欲受任何特別理論或 20 機構所限制,可能係因為奈米棒之良好運送性質可於奈米 棒長度跨越薄膜之重大部份時使用,奈米棒-聚合物PV裝 置之效率與薄膜厚度之依賴性提供有關於載體運送性質之 進一步資訊。 於上述探討吸收作用之裝置之光電流光譜係如第20圖 38 1245819 玖、發明說明 所不。當薄膜厚度從100 nm增至35〇 nm,EQE之相對應 增加及其後減少非僅因被吸收光線之增加而產生。光譜形 狀係依裝置之厚度而定,且光譜紅色區域之光回應係因較 厚之薄膜而增加。此可被歸因於弱的過濾效用,其係自部 5份之未造成光電流之薄膜所產生。因為於厚的膜中,相較 於全部容納於一顆粒内之運送,物理性接觸之奈米棒網絡 運送具低載體移動性之電子,且接近PED〇T:pss電極所產 生之電子需使許多奈米棒橫貫到達收集鋁電極。藍光(其係 更接近透明電極處吸收)係未強烈地有助於光電流。此外, 10與造成電荷分離有關之於裝置上之電場係於相較於較薄膜 之較厚膜之特定偏壓減少。 本發人已驚人地發現奈米棒-聚合物裝置明顯較厚地 (200 nm)製得而達成更多光線吸收,因為奈米棒之分散特 性被良好地控制且奈米棒之運送性質係比所述有機材料更 15 有效。 於P3HT内之90重量%之7 nm球狀奈米結晶之裝置 之光電流光譜係展現相似性質,第21 a圖。此組具變化厚 度之裝置之吸收光谱係如第21b圖所示。當裝置之厚度增 加,EQE(其係波長之函數)於光譜紅色區域顯示更顯著之 20回應。對於此等球狀奈米結晶,最佳裝置厚度係160 nm, 其可與長奈米裝置之最佳值212相比較。因為相較於較短 尺寸之球狀物,長奈米棒顯示改良之電子運送,因此裝置 可作得更厚以於開始受跳動運送支配前吸收更多光線。此 進一步提供使用一度空間之奈米棒改良運送之益處之證據 39 1245819 玖、發明說明 〇 於本發明另一實施例,在此揭露一種光生伏打裝置, 其係於ITO電極頂部上併入一 PEDOT:PSS(聚(伸乙基-二氧 基)噻吩:聚(苯乙烯磺酸))電子孔運送層。於ITO電極 5 (PEDOT/PSS)頂部上併入電子孔傳導層產生數種有益功效 ,包含,例如,提供較平滑表面,而於其上藉由,例如, 旋轉鑄製沈積奈米複合物層,且其功函數(work function)係 比ITO更佳地符合傳導性聚合物(P3HT)之價帶(valence band),藉此,促進電子孔之傳導。當然,可依所用電極材 10 料之功函數而選擇各種不同電子孔傳導層。此裝置之非限 制性例子係於第4圖顯示。本發明之最佳實施例係一種藉 由使於P3HT内之90重量%之7 nm X 60 nm CdSe奈米棒 之溶液旋轉鑄製於以PEDOT:PSS塗覆(以鋁作為頂接觸物) 之ITO玻璃基材上而建構之半導體奈米結晶聚合物方陽能 15 電池。6.9%之功率轉化效率係於流動氬氣之惰性氛圍内於 515 nm以0.1 mW/cm2照射下獲得。於此強度,開路電壓 係0.5V,最大功率點之光電壓係0.4V,且填充因子係0.6 ,第23a圖。對於塑裝PV裝置,此單色功率轉化效率係 所報導最高之一。非常少之以聚合物為主之太陽能電池能 20 獲得高於2%之單色功率轉化效率。最可件賴之例子係自 C60之可溶性衍生物及MEH-PPV之摻合物者,其達5%之 效率。 於本發明之另一實施例,薄膜厚度上之半導體-奈米結 晶之排列可以外部輔助而進一步控制。排列辅助可包含熟 40 1245819 玖、發明說明 習此項技藝者所知之輔助。此等係包含可產生電、磁場或 拉伸排列之輔助,可用於排列奈米結晶。為了本發明之目 的,若10及99%間之奈米結晶具有其縱軸(其由垂直於薄 膜表面不多於20度而排列),則排列可被定義。 5 實驗 上述描述具有此間詳述之本發明之數個實施例。上述 實施例之某些參數係綜述於第1表。本發明之進一步非限 制性例子係如下所詳述。Pyr/Chlor係於氯仿混合物内之吡 啶。 10 第1表 奈米結晶載 荷量,重量 % 奈米結晶尺 寸,nm 奈米結晶材 料/聚合物 溶劑混合物 溶劑量,體 積% 參考 90 7x7 CdSe/P3HT Pyr/chlor 100 第4圖 90 9x 13 CdSe/P3HT Pyr/chlor 0-20 第6圖 90 3x 100 CdSe/P3HT Pyr/chlor 12 90 7x60 CdSe/P3HT Pyr/chlor 4 0-95 3x60 CdSe/P3HT Pyr/chlor 第8圖 60 10x 10 CdSe/P3HT Pyr/chlor 第14圖 40 7x60 CdSe/P3HT Pyr/chlor 第15圖 奈米結晶係於主要由三辛基膦氧化物(Τ0Ρ0)及三丁基 -或三辛基膦及及小量之各種膦酸所組成之混合物中且藉由 此項技藝所知之技術使用有機金屬先質熱解作用而合成, 見 Peng 等人之 TVa/wre 2000,404,59 ;及 Peng 等人之 15 d 777. C/zem. aSoc· 2001,123,1389。回收之產物於甲醇内分散 及清洗三次以移除過量之表面活性劑。奈米結晶之吡啶處 理以移除奈米棒合成中使用之表面活性劑係藉由使顆粒溶 於吡啶且其後於己烷沈澱而完成。雖然經Τ0Ρ0塗覆之Because the large agglomerates are tightly bound to the nanocrystals and can interact densely with the polymer 10, it helps to improve the charge transfer rate between the two semiconductors. Oligomers that also have polymer-like side chains help a large number of nanocrystals repel each other and disperse well within the polymer. In the preferred case, nanocrystals are blended with polymers containing chemical functionalities such as phosphines and phosphine oxides bound to the nanocrystals. In this example, the polymer can be close to 15 nanometer crystals to promote fast and efficient charge transfer. In order to replace TOPO or other synthetic solvents, nanocrystals are washed with a suitable solvent that is a special surfactant for nanocrystals. Then, the nanocrystals are dissolved in a solvent, an excess of the desired ligand is used, and refluxed at a high temperature for several hours. The high temperature system ensures the intermittent removal of ligands from the nanocrystalline surface. 26 1245819 玖, description of the invention, and this excess maintains the equilibrium of the new ligand on the nanocrystalline surface. Another effective chemical treatment to reduce the exposure of nanocrystals to high-temperature oxygen and water is to dissolve nanocrystals in excess of the substituted ligand, and then precipitate the particles in the solvent of TOPO or other synthetic solvents, and after centrifugation Discard the upper layer 5. Pyridine (with a boiling point of 116 ° C) is one of the most easily substituted ligands, and is preferably used with CdSe. Nanocrystals passivated with pyridine are more insoluble than those covered with TOPO, but they can be stripped easily by drying or heating the nanocrystals. In a photovoltaic device made from a nanocrystal-polymer blend, the ligands on the 10nm crystal determine the film morphology and the degree of microphase separation. The morphology of the blend of CdSe with various ligands (including TOPO, pyridine, and modified TOPO, one of which has an octyl moiety substituted with a thiophene ring (T1)) is shown in Figure 22. As a non-limiting example, TOP0 blunt CdSe nanocrystals with non-polar alkyl chains can be uniformly dispersed in the non-polar matrix of P3HT. The clear spacing between the particles corresponds to the approximate length of 11 A, the TOPO molecule (Figure 22a). When THP0 was modified by replacing a octyl chain with a thiophene ring to produce T1, these nanocrystals behaved differently from particles coated with TOPO when dispersed in P3HT (Figure 22b). Nanocrystalline system 20 coated with T1 aggregates more easily than particles coated with TOPO, and aggregates of CdSe nanocrystals are combined into nanoparticle lines. Although not limited by any theory or principle, it is possible that the thiophene ring on the T1 molecule and the thiophene ring on the polymer produce a 7Γ-stack, which causes the nanocrystals to be aligned along the polymer chain. The presence of surfactants on the surface of nanocrystals can be distinguished from the particles within the aggregates and between the particles of the nanocrystalline chains 27 1245819 发明, description of the invention. In contrast, nanocrystals coated with pyridine aggregated in P3HT (Figure 22c). Although not limited by any particular theory or principle, it may be because pyridine is a weak Lewis base, and some pyridine is removed from the nanocrystalline surface during the evaporation of the solvent during film casting. Therefore, the van der Waals interaction between the highly polar nanocrystals in the non-polar 5 P3HT creates a micro-scale phase separation between the organic and inorganic components of the composite. Nanocrystalline crystals cleaned with pyridine are in closer contact with nearby particles. In this way, there is no clear separation of nanocrystalline crystals in the film as observed with TOPO-coated particles. Similar differences in the behavior of the poly 10 clusters between nanocrystals coated with TOPO and pyridine were observed in the polymer MEH-PPV, which is more polar than P3HT. It should be understood that the present invention considers, as a preferred embodiment, a non-self-synthetic treatment method which actually replaces 95% of the surfactant on the rod. Intuitively, it may be possible to remove more residual surfactant by washing three times, and it is better because the surfactant interferes with charge transfer. However, the inventors have surprisingly discovered that with just one cleaning step, certain surfactants are retained, resulting in a photovoltaic device that is larger and more predictable than expected. The EQE of this device is improved by 3 to 5 times compared to the device washed three times. Nano crystals with a diameter of 5 nm were washed three times in methanol to remove excess 20 TOPO, and then dissolved in the minimum amount of pyridine (50 // 1 per 100 ml of CdSe series) and precipitated three times in hexane to obtain Pyridine particles on the surface. Nanocrystals washed with methanol are first refluxed with pyridine instead of TOPO, precipitated with hexane, and then refluxed in a T1 solution in toluene for 12 hours to produce T1 coated particles. The film was obtained by spin-casting a 40% by weight nanocrystalline solution in a simulated P3HT as a result of self-dissolving gas on a NaCl IR window. These samples were immersed in water to float the blend film, and a copper TEM grid with porous carbon was used to pick up the film. In another embodiment of the present invention, the inventors have surprisingly discovered that heat treatment 5 is an effective method to promote the mobility of organic molecules bound to an inorganic surface, and that the nanocomposite treatment near the polymer glass transition temperature can make the film interior These molecules move towards the surface. In organic blends, thermal annealing has been used to promote the equilibrium morphology of spin-cast films and, in some cases, to promote phase separation and crystallization within the compound. For nano-polymer blends, 10 heat treatments can improve the nanocrystal-nano crystal and nanocrystal-polymer interfaces to unexpectedly promote charge transfer and transport, and improve the performance of photovoltaic devices. Excessive pyridine in the binary solvent (to control the dispersion of nanocrystals in the polymer) will be shown as a non-radiative recombination center for excitons generated in P3HT. Therefore, these excitons do not contribute to the photocurrent. The thermal annealing of the thin film according to the embodiment of the present invention results in the removal of excess unbound pyridine in the interfacial pyridine and polymer regions. A significant promotion of EQE was observed in the heated device, which may be related to the recovery of these excitons lost for charge transfer and photocurrent generation. The normalized photocurrent measured on a 90% by weight 3 nm X 60 nm CdSe nanorod in P3HT 20 by spin casting of 10% by volume of pyridine solvent in chloroform is shown in Figure 7a (hollow (Round, before annealing; solid distance, after annealing). The absolute maximum EQE is 15% at 455 nm under flowing argon under 0.1 mW / cm2 irradiation. When heated at 120 ° C under a reduced pressure of about 50 millitorr for 3 hours and cooled for 8 hours to room temperature, the photocurrent of the same device was greatly improved by 29 1245819 玖, the description of the invention (Figure 7a), which is higher than generally expected . While not intending to be bound by any particular theory or principle, these unexpected results can be explained as follows. The ratio of the photocurrent of the heated device to the photocurrent of the device before heating shows an overall promotion with a factor of 2.5, and it approaches 650 5 nm with a particularly strong increase by a factor greater than 6, and has a shoulder at 700 nm ( Figure 7b). To understand the origin of this red EQE promoting wave crest, a device with only 3 nm X 60 nm CdSe nanorods was manufactured and heated under the same conditions. The photocurrent analysis before and after the heat treatment showed only a promotion feature centered around 700 nm. Therefore, we attribute this red shift in the photocurrent of the blend 10 to the nanorod. Therefore, without being limited by a specific operating theory or mechanism, it is assumed that heat treatment is believed to facilitate the removal of interfacial pyridine and bring nanorods closer together, resulting in unexpected and surprisingly superior efficiency. The aggregation of adjacent nanorods may improve the electron transport between the nanorods, so the separation distance between the beating steps is reduced. In addition, the removal of the interfacial pyridinium can also promote the charge transfer between CdSe and P3HT by bringing the two materials into closer electronic contact. These two effects are most likely to contribute to the overall photocurrent promotion of all factors of about 2.5 of the absorbed wavelength. The maximum photocurrent increase occurred in the region between 500 nm and 700 nm, where a factor greater than 6 was obtained for a 90% by weight CdSe blend device, and both CdSe and P3HT contributed significantly to light absorption. To determine the relative benefit, we compare the fraction of light absorption with the fraction of photocurrent generated by each material component. The absorption spectrum of a series of devices with varying CdSe concentration can be adapted to the linear combination of individual CdSe and P3HT spectra (Figure 8) 30 1245819 发明, invention description The absorption between 400 nm and 700 nm of the blend device after heating is not significant Variety. For concentrations greater than 40% by weight, the benefit of P3HT concentration for photocurrent is significantly less than the proportion of light absorbed by the polymer. In a device with 90% by weight CdSe, P3HT helps to absorb 61% of the light, but polymer 5 only contributes 8% of the photocurrent. This means that the large amount of light absorbed by P3HT does not contribute to the current generation and is lost to non-radiative or radiative recombination paths. However, when these devices are heat treated at 120 ° C, changes in the photocurrent spectrum produce the benefit of P3HT, which is closer to the ratio of light absorption. For a 90 wt% CdSe device, the P3HT portion of the photocurrent has dramatically increased to 10 66%, which is comparable to 61% of the absorbed light in P3HT. This external quantum efficiency is observed at 60 ° C to 160 ° C, and decreases again at 180 ° C, as aluminum migrates through the film and the device degrades, Figure 9. Correspondingly, the PL efficiency (which is a function of processing temperature) of 60% by weight 0 (186 blend film) rose to 120 ° C, then decreased, and remained fixed at higher temperatures (insertion of Fig. 9 15 Figure). The present invention considers that the thermal annealing temperature can be as high as 200 ° C. These unexpected effects can be explained as follows. Because the PL efficiency of the CdSe in the blend is less than 0.1%, the PL of the sample is mainly generated from P3HT. Heating of P3HT It is known to cause promoted crystallinity, which terminates PL efficiency. This effect is observed in heated P3HT films at temperatures as low as 40 ° C. 20 Therefore, the increased crystallinity is explained by doping above 120 ° C. The slight decrease in PL efficiency observed in the polymer film, but cannot explain the substantial increase in PL efficiency below 120 ° C. At low temperatures, the excess in the polymer is removed ^ The processing efficiency of the PL efficiency increases with the increase in bite P3HT The possible reason for the increase may be because some of the protons absorbed in P3HT are aggregated in the untreated film 31 1245819 发明, invention description non-light shot recombination at the 17 bite position in the composition and does not help PL After heat treatment, these protons can In radiation decay and charge transfer. Therefore, the removal of excess pyridine caused a larger P3HT benefit to the photocurrent, leading to the promotion of EQE observed in the region between 500 nm and 700 nm. 5 According to the preferred embodiment of the present invention Heat treatment is important to promote EQE for high aspect ratio nanorod devices that have a high surface area to volume ratio and require a higher pyridine concentration (> 8% by volume) in a spin casting solution. The device composed of equal nanometer rods has a large area of nanometer rod-nanometer rod and nanometer rod-polymer interface, which contains pyridine and a large amount of excess pyridine. The removal of this pyridine has the highest A large number of EQE improvements up to a factor of 6 are observed in Figure 7. Conversely, a 7 nm X 60 nm size nanorod is blended with P3HT in a solvent with only 4% by volume of pyridine, and heated after The maximum EQE increase is only a factor of 1.3 (Figure 10). The present invention considers the use of a nanorod 15 with a low surface area to volume ratio. Therefore, removing the pyridine from the film (< 200 nm) is only at low pressure (&10; 6 mbar) pumped from the sample And no performance improvement was observed during heat treatment. Furthermore, the heat treatment of the thin film is not good for open circuit and filling factor, because aluminum diffuses through a significant part of the device. Within a range of thicknesses ranging from 100 nm to 350 nm within P3HT 20 The 90% by weight 7 nm X 60 nm nanorod CdSe device is improved when the thickness is higher than 200 nm at 120 ° C (Figure 11). As the thickness of the device increases, the relative promotion of EQE also increases ( (Figure 12a). The absolute improvement of EQE after heat treatment also increases with thickness (Figure 12b), but due to the poor transport properties of the thickest device, the thickness is limited at 346 nm. 32 1245819 玖, description of the invention. Hybrid nanorod-polymer solar cells become more efficient through nanorod arrangement and rod synthesis longer than 100 nm. Thicker films with higher optical density to absorb more sunlight can be used . For these thick films, heat treatment is better for implementing high performance devices. 5 In another embodiment of the present invention, the inventors have surprisingly implemented unpredictable strategies to increase carrier mobility and improve charge collection, resulting in improved battery performance. For blends of electron transport materials and electron hole transport materials, the generation of percolation paths is necessary to transport the charge. In the dispersion of nanocrystals and polymers, the termination of these paths to electrons serves as a trap 10 or recombination center. Increasing the size of nanocrystals will reduce the number of these terminals and thus promote performance. However, in order to achieve the efficiency observed for commercial solar cells, it is desirable to have a higher carrier mobility and a lower recombination rate. A nanorod with a length similar to the thickness of the device can have a guided path, during which the carrier mobility is similar to a 15-degree wire. Therefore, the problems of percolation and beating can be eliminated. By controlling the aspect ratio of the CdSe nanorods in P3HT, the inventors have surprisingly adjusted the length gauge and electronic transport direction via a thin film pv device. As the aspect ratio of the nanocrystals increases from spherical to rod-like, the self-molecular range 7 is closer to the wire in the space of the shifting angle, and becomes less soluble. In Fig. 20 13a, nanorods are aggregated in p3HT to form single islands, which are formed by thin-film self-imitation casting over several micrometers. However, for the same concentration, nanorods are dispersed in the polymer when cast from a mixture of chloroform / chloroform solvent, Figure 13b. Dispersion of nanorods in pyridine and aerosols for the uniform film casting and large charge transfer interface with P3HT to reduce the exciton recombination system weight 33 1245819 发明, description of the invention. Because the structure of the solar cell allows the electric field to extend across the thickness of the device rather than on a plane, it is also important to describe the cross-sectional shape of the blend film. To accomplish this, a solution of 60% by weight of 10 nm X 10 5 nm CdSe nanocrystals in P3HT was spin-coated from the solution on Polybed epoxy discs. The disc was then micro-cut with a diamond knife to produce a 60 nm thick film. These ultra-thin films contain a nanocrystalline-P3HT cross section at one edge. In the TEM image of the film, Figure 14, the dark section without nanocrystals is an epoxy material, and a P3HT film containing nanocrystals can be seen on it, spinning 100 10 nm wide. Nanocrystals evenly span the entire film thickness without significant phase separation in the lateral direction. Obtaining a long nanorod-polymer film cross-section system is very difficult. Nanorods are resistant to cutting due to their large size, and the blend film has a tendency to tear and be dragged by a cutter. Therefore, once the film is rotated on the epoxy disc, it is buried in the epoxy for 15 days and cured to provide further support during microdissection. The cross section formed by 40% by weight of 7 nm X 60 nm CdSe nanorods in P3HT shows that the nanorods span most of the film thickness, Figure 15b. As the length of nanorods increases to span the thickness of photovoltaic devices, 20 electron transport is expected to be substantially improved. However, the improvement expected for shipping assumes that the nanorods are aligned perpendicular to the plane of the substrate and that they are long enough to allow the electrons to be fully transported within a nanorod. Figure 15 shows that nanometer particles are randomly dispersed, but some particles are oriented with major components in the direction of electron transport. Further evidence of the arrangement of the nanorods and their beneficial effects on electron transport can be observed in light 34 1245819, Invention Description Current. As long as the following quantities can be compared for a group of devices, EQE can be used as a charge transport, (iii) the charge collection efficiency at the electrode (which is mainly selected by the electrode), and the 5V charge transfer efficiency (self-induced quenching termination) Decide). Which data, as shown in Figure μ, the device meets these four conditions. Therefore, we concluded that when the aspect ratio of the nanorods was increased from i to 10, Figure 17, the charge transport needs to be significantly improved to produce an Eqe improvement of the factor of 3. In a network of shorter nano-particles, the electron transport is controlled by the beating of individual particles (which is controlled by a circuit containing an electrode that collects electrons 10. However, in a device composed of larger particles, f Band conduction is common, because the path can be formed from a single nanorod. Because the nanorod in the device. The thickness of the polymer film is about · nm, and a 60 nm long nanorod can pass through a significant part of the device Passed through, and the particles with a length of 30 and 7 nm are progressively less effective, Figure 16. The best device 15 (which contains 7 nm X 60 nm nanorods) is exposed to 0 ″ mWW at 485 nm. Performed at a maximum of 55%, and this value is significantly renewable. The reported results are presented in individual cases in five sets of devices made from three different CdSe synthetic batches (a total of 57 individual solar cells) The median value of the maximum external quantum efficiency of each of these 57 devices is within 10% relative to the median value, and the highest obtained efficiency is 59%, all of which are in the range of ~ (U mW / cm2 Monochromatic illumination. Individual devices have been repeatedly described over several months. And it shows no weight change between measurements. Because of the superior carrier transport properties of inorganic semiconductor nanorods compared to semiconducting organic polymers and J-knives, these hybrid nanorods_Polymer 35 1245819 玖, Description of the invention Solar cells are implemented with the highest EQE under low-intensity irradiation, which is reported for polymer-containing batteries to date. The considered device is a photovoltaic device according to the invention incorporated into a highly branched nanorod. Nanorods are synthesized from 5-10 precursor injections according to techniques known in the art. During subsequent injections during the synthesis, these nanorods developed many nucleation sites for branching and increasing length. Because Many of these branched nanorods have lengths greater than 100 nm, and a further increase in EQE is expected to be used in nanorod-polymer PV devices. The branching is through the fiber-zincite structure of the rod. Low energy sphalerite loss (series 10 is similar to the lack of lamination defects, which results in nanorods having kinks along their length). Therefore, the carrier mobility in branched nanorods is expected It is similar to unbranched rods. Furthermore, the interaction between the branch and the body of the nanorod is stronger than that between two individual nanorods in physical contact. Therefore, the ribbon is transported in the branched nanorod. It is common, and the electronic beat occurs between individual nanometer 15-meter rods. It should be understood that the embodiments of the present invention include nano-crystalline particles with more complex shapes. In the embodiment of the present invention, the initial nucleation results in a core with a cubic crystal structure. (Eg, sphalerite crystal structure). Subsequently, an arm with a hexagonal crystal structure (eg, fiber zincite) can emerge from the core. However, different growth 20 conditions can be provided to statistically alternate to form cubes and six The angular crystal structure, therefore, leads to irregular branches. Sequential branching of "inorganic dendrimers" can be generated by precise temperature control throughout the reaction, see Mana et al. 1 XM · C / zem · S% ·, 2000, 122, 12700-2706 and US Serial No. 10/301, Case No. 510 (application on November 20, 2002, currently under trial). 36 1245819 发明, description of the invention The inherent nature of a tetrapod with an arm that always points to an electrode and combined with a low band gap material (such as CdTe), arranged on the substrate, is buried in the conjugated polymer The tetrapod semiconductor-nanocrystal becomes a particularly preferred embodiment. Compared with the nanocrystalline particles with arbitrary orientation, the tetrapod according to the embodiment of the present invention is arranged and can provide a current path in a single direction than the nanocrystalline particles with arbitrary orientation. The photocurrent spectra of 90% by weight CdSe branched nanorod blends in P3HT for various pyridine concentrations are shown in FIG. The preferred pyridine concentration for branched nanorods occurs at 12%, which is significantly higher than the shorter 10 unbranched rods, which is 8% or less. The maximum EQE for these devices is 31% at 450 nm at approximately 0.1 mW / cm2. Contrary to expectations, this EQE is almost a factor 2 lower than that of devices made from 60 nm nanometers. The dispersion of longer nanorods (> 100 nm) in P3HT is limited by its solubility in pyridine-chloroform. When the branched nanorods are dissolved in pyridine-chloroform, it forms a gelatinous viscous solution. This indicates the lower solubility of branched bodies and the higher nanorod-nanorod interactions relative to the nanorod-solvent interaction. With these branched objects, the CdSe-P3HT film is cast with uneven and scattered light, which clearly indicates giant phase separation. Any improvement in transport efficiency is aggravated by a decrease in charge separation efficiency, which is caused by a reduction in the area of the interface between the nanorod and 20 P3HT. Long cadmium selenide nanorods in high-concentration solutions that are passivated with pyridine are separated by a small distance, and in some cases the diameter of pyridine. At this close distance, the attractiveness of Van der Waals (which increases and decreases with volume and distance) is very strong and promotes aggregation. Dissolving high-concentration long nanorods, which are necessary for the manufacture of films with sufficient thickness for PV devices 37 1245819 (invention description), is a challenge. Coordination systems with larger sizes and longer chains are necessary to extend the length of nanorods added to the polymer. In order to avoid such ligands from acting as barrier layers, they need to be electrically active and energy levels need to facilitate the charge transfer between CdSe and P3HT. 5 The complete strip conduction of electrons requires that the entire transport be contained within a single nanocrystal. Further improvements in shipping are based on the arrangement of nanorods in film thickness. Nanorod alignment methods include electric fields and stretch alignments, both of which require significant improvements in the processing and structure of the current device. The tetrapod (having four identical arms attached to the center of the cube) is oriented so that it naturally aligns on the surface, with one arm 10 perpendicular to the plane of the substrate, as seen in Figure 19. Therefore, the hybrid solar cells produced next can be incorporated into tetrapods as self-aligned nanocrystals to efficiently transport electrons. Another embodiment of the present invention is to operate the nanorod / polymer photovoltaic device of the present invention at an astonishing film thickness. One of the many advantages of using nanocrystalline and poly15 compounds is the high absorption coefficient compared to bulk inorganic semiconductors. This results in a thin film, typically less than 300 nm, which can absorb more than 90% of incident radiation. Unlike traditional inorganic semiconductor solar cells, which require more than a few microns in thickness to absorb light, low-material use and flexible devices are possible with nanocrystalline and polymer systems. Although it is not intended to be limited by any particular theory or mechanism, it may be due to the good transport properties of the nanorods that can be used when the length of the nanorods spans a significant portion of the film. The efficiency and film of the nanorod-polymer PV device The thickness dependence provides further information on the nature of the carrier transport. The photocurrent spectrum of the above-mentioned device for examining absorption is as shown in Fig. 20, 1245819 (20) and the description of the invention. When the thickness of the film is increased from 100 nm to 350 nm, the corresponding increase in EQE and its subsequent decrease are not only caused by the increase of absorbed light. The spectral shape depends on the thickness of the device, and the light response in the red region of the spectrum is increased by the thicker film. This can be attributed to the weak filtering effect, which was generated from the 5 parts of the film that did not cause photocurrent. Because in a thick film, compared to the transport contained in a single particle, the nanorod network in physical contact transports electrons with low carrier mobility, and the electrons generated near the PEDOT: pss electrode need to be used. Many nanorods traverse to the collecting aluminum electrode. Blue light, which is absorbed closer to the transparent electrode, does not contribute strongly to photocurrent. In addition, the electric field on the device associated with causing charge separation is a reduction in the specific bias voltage of the thicker film compared to the thinner film. The author has surprisingly found that nanorod-polymer devices are made significantly thicker (200 nm) to achieve more light absorption, because the dispersion characteristics of nanorods are well controlled and the transport properties of nanorods are comparable. The organic material is more effective. The photocurrent spectrum of a device with 90% by weight of 7 nm spherical nanocrystals in P3HT exhibits similar properties, Figure 21a. The absorption spectrum of this group of devices with varying thickness is shown in Figure 21b. As the thickness of the device increases, EQE (which is a function of wavelength) shows a more significant 20 response in the red region of the spectrum. For these spherical nanocrystals, the optimum device thickness is 160 nm, which can be compared with the optimum value of 212 for long nanodevices. Because long nanorods show improved electronic transport compared to shorter spheres, the device can be made thicker to absorb more light before it begins to be dominated by beating transport. This further provides evidence of the benefits of using nano-rods with a degree of space to improve the delivery. 39 1245819 发明 Description of the invention In another embodiment of the present invention, a photovoltaic device is disclosed here, which is integrated on the top of the ITO electrode. PEDOT: PSS (poly (ethylene-dioxy) thiophene: poly (styrenesulfonic acid)) electron hole transport layer. The incorporation of an electron hole conducting layer on top of the ITO electrode 5 (PEDOT / PSS) produces several beneficial effects, including, for example, providing a smoother surface, and depositing a nanocomposite layer on it by, for example, spin casting. Moreover, its work function conforms better to the valence band of the conductive polymer (P3HT) than ITO, thereby promoting the conduction of the electron hole. Of course, various electron hole conducting layers can be selected according to the work function of the electrode material used. A non-limiting example of this device is shown in Figure 4. The preferred embodiment of the present invention is a 90% by weight solution of 7 nm X 60 nm CdSe nanorods in P3HT, which is cast on a PEDOT: PSS coating (with aluminum as the top contact). A semiconductor nanocrystalline polymer Fangyang energy 15 cell constructed on an ITO glass substrate. The power conversion efficiency of 6.9% was obtained in an inert atmosphere of flowing argon at 515 nm and 0.1 mW / cm2. At this intensity, the open-circuit voltage is 0.5V, the photovoltage at the maximum power point is 0.4V, and the fill factor is 0.6, Figure 23a. For plastic PV installations, this monochrome power conversion efficiency is one of the highest reported. Very few polymer-based solar cells can achieve monochromatic power conversion efficiencies above 2%. The most reliable example is the soluble derivative of C60 and the blend of MEH-PPV, which has an efficiency of 5%. In another embodiment of the present invention, the arrangement of the semiconductor-nanocrystals in the thickness of the film can be further controlled by external assistance. Arrangement aids may include those that are familiar to those skilled in the art. These systems include an aid that can generate electrical, magnetic, or stretched alignments that can be used to arrange nanocrystals. For the purposes of the present invention, the arrangement can be defined if the nanocrystals between 10 and 99% have their longitudinal axis (which is aligned by not more than 20 degrees perpendicular to the film surface). 5 Experiments The above description has several embodiments of the invention detailed herein. Some parameters of the above embodiments are summarized in Table 1. Further non-limiting examples of the invention are detailed below. Pyr / Chlor is a pyridine in a chloroform mixture. 10 Table 1 Nano crystal load, weight% Nano crystal size, nm Nano crystal material / polymer solvent mixture solvent content, vol% Reference 90 7x7 CdSe / P3HT Pyr / chlor 100 Figure 4 90 9x 13 CdSe / P3HT Pyr / chlor 0-20 Fig. 6 90 3x 100 CdSe / P3HT Pyr / chlor 12 90 7x60 CdSe / P3HT Pyr / chlor 4 0-95 3x60 CdSe / P3HT Pyr / chlor Fig. 8 10 60 10x 10 CdSe / P3HT Pyr / chlor Figure 14 7x60 CdSe / P3HT Pyr / chlor Figure 15 Nanocrystals are mainly composed of trioctylphosphine oxide (TOP0) and tributyl- or trioctylphosphine and a small amount of various phosphonic acids The composition is composed of a mixture and synthesized by techniques known in the art using organometallic precursor pyrolysis, see Peng et al. TVa / wre 2000, 404, 59; and Peng et al. 15 d 777. C / zem. aSoc. 2001, 123, 1389. The recovered product was dispersed and washed three times in methanol to remove excess surfactant. Pyridine treatment of nanocrystals to remove surfactants used in nanorod synthesis is accomplished by dissolving the particles in pyridine and then precipitating in hexane. Although coated with TOP0

41 1245819 玖、發明說明41 1245819 发明, description of the invention

CdSe奈米結晶可溶於己烷,但經吡啶塗覆之顆粒不溶於己 烷。重複吡啶處理二至三次可以吡啶有效取代奈米結晶表 面上多於95%之TOPO。CdSe nanocrystals are soluble in hexane, but pyridine-coated particles are insoluble in hexane. Repeating the pyridine treatment two to three times can effectively replace more than 95% of TOPO on the nanocrystalline surface.

CdTe四足體係以美國序號10/301,510號案(2002年11 5 月20日申請,現係審理中)所述般合成,實質上係如下所 述。氧化鎘(CdO)(99.99+%)、碲(Te)(99.8%,200 篩目)及 三-正辛基膦氧化物(C24H510P或TOPO,99%)係購自 Aldrich。正十八烷基膦酸(C18H3903P或ODPA,99%)係 購自 Oryza Laboratories, Inc·。三辛基膦(TOP)(90%)係購自 10 Fluka。所用之所有溶劑係無水,購自Aldrich,且無任何 進一步純化下使用。所有操作係使用標塗之無空間技術施 行。Cd/Te之莫耳比例係1:1至5:1而變化,且Cd/ODPA 之莫耳比例係1:2至1:5而變化。先質溶液係藉由使碲粉 末溶於TOP(Te濃度10重量%)而製得。混合物於25〇°C攪 15拌30分鐘,然後,冷卻及施行離心作用以移除任何剩餘之 不可溶顆粒。於典型之CdTe四足體合成中,〇dPA、 TOPO及CdO之混合物於接連至Liebig冷凝器之50毫升 三頸燒瓶内於120°C脫氣20分鐘。於Αι·下緩慢加熱至 CdO分解且溶液變澄清及無色。其次,ι.5克之三辛基膦 20 (TOP)被添加,且溫度進一步上升至320°C。其後,Te:T0P 先質溶液被快速注入。溫度降至3 15dc,且於整個合成作 用維持於此數值。所有合成作用於5分鐘後藉由移除加熱 罩及藉由快速冷卻燒瓶而停止。使溶液冷卻至7〇°C後,3-4耄升之無水曱苯被添加至燒瓿,且分散液轉移至Ar乾燥 42 1245819 玖、發明說明 箱。最小量之無水甲醇(其於離心作用後用於沈澱奈米結晶 顆粒)被添加至分散液。以此方式,Cd-膦酸鹽錯合物之可 能共同沈澱被避免。移除上層物後,沈澱物被再次溶於甲 醇内兩次並以甲醇再次沈澱。移除上層物後,最後之沈澱 5 物被儲存於乾燥箱内。所有形成之CdTe四足體輕易溶於 諸如氯仿或甲苯之溶劑内。 範例1 =依據本發明一實施例,光生伏打裝置係於惰性氛 圍下自使吡啶-氯仿溶劑混合物内之CdSe奈米結晶及 P3HT之溶液旋轉鑄製於經ITO塗覆之玻璃基材上,於<10· 10 6毫巴下泵取12小時及頂部上之鋁蒸發而製得,獲得第2 圖所述之結構。 範例2 : a.奈米結晶之合成:依據本發明另一實施例, P3HT内之長CdSe奈米棒(90重量%〇636)係依如下所述合 成:Cd原料·· 0.161克之二甲基鎘被溶於0.34克之三辛基 15 膦(TOP)。Se原料:於2.367克TOP内之0.2克Se被溶解 。於三頸燒瓶内,3.536克之三辛基膦氧化物(TOPO)、 0.187克之己基膦酸(ΗΡΑ)及0.357克之十四烷基膦酸 (TDPA)被混合。此混合物於氬氣下加熱及脫氣達360°C。 Cd原料被緩慢注入,然後,溫度降至330°C,Se原料被快 20 速注入。反應於290°C進行18分鐘,然後,熱被移除。於 40°C,約15毫升之曱醇被添加至燒瓶。混合物被施以離心 作用,且上層物被棄置。8毫升之甲醇被添加,渦旋,然 後再次施以離心作用,棄置上層物。 b.基材之製備:於一系列溶劑内藉由音波作用清洗玻 43 1245819 玖、發明說明 璃基材上之銦鍚氧化物(ITO)。於最後之溶劑清洗後,將模 品乾燥及將其嵌入預先清理過之等離子腔内。以等離子體 處理面向下之樣品4分鐘。一旦樣品自腔室移除,開始沈 澱PEDOT:PSS(購自Bayer-電子等級)。於經由0.2微米乙 5 酸酯過濾器過濾後藉由3000 rpm之旋轉鑄製而沈積 PEDOLPSS。於流動之氬氣下於120°C加熱1小時而使薄 膜乾燥。 c.奈米結晶之清洗:將合成之奈米棒切半,且添加8 毫升甲醇至每一半。施行離心作用及棄置上層物,然後, 10 再次重複此處理方式。添加0.35毫升之吡啶至每一半以使 奈米棒溶解,於120°C加熱且偶爾渦旋10分鐘。以8毫升 己院沈殿每一半。施行離心作用及棄置上層物。使奈米棒 溶於具9.2%吡啶之氯仿加比啶混合物,產生83毫克/毫升濃 度之奈米結晶。 15 d.活性層之沈積:以30毫克/毫升使區域規則性之聚 (3-己基硫基噻吩)(P3HT)溶於氯仿。使用此溶液及上述奈 米棒溶液(見上述III)製備於氯仿/吡啶混合物内之奈米棒及 P3HT之共同溶液,其具有9:1之奈米棒對P3HT之質量比 例及4.55毫克/毫升之P3HT濃度。由此溶液,使薄膜以 20 1350 rpm於已製得之基材(見上述II)上旋轉鑄製。 e.電極沈積:將樣品載入蒸發腔室内,且使其於真空 下泵取至少8小時,達低於10·6托耳之壓力。經由蔭罩 (shadow mask)熱沈積約100 nm厚之紹薄膜以界定上電極 (top electrod) 〇 44 1245819 玖、發明說明 範例3 : P3HT内之CdTe四足體 具有一芯部及4支長度約80 nm之臂之CdTe四足體奈米 結晶被合成,然後,於四氫夫喃(THF)及乙酸乙酯内以數個 溶解/沈澱步驟清洗。 5 然後,奈米結晶與配位體苯基膦酸共同溶解於溶劑氯仿, 且於約100°C加熱數小時。 然後,奈米結晶以曱醇沈澱且再次溶於氯仿。 依範例2所述,使奈米結晶溶液與P3HT溶液混合,且旋 轉鑄製而產生薄膜。 10 基材及電極係以範例2般處理。此樣品之EQE值係少於 10%。 範例4 : P3HT内之CdTe四足體The CdTe quadruped system is synthesized as described in US Serial No. 10 / 301,510 (filed on May 20, 2002, currently under trial), which is essentially as described below. Cadmium oxide (CdO) (99.99 +%), tellurium (Te) (99.8%, 200 mesh) and tri-n-octylphosphine oxide (C24H510P or TOPO, 99%) were purchased from Aldrich. N-octadecylphosphonic acid (C18H3903P or ODPA, 99%) was purchased from Oryza Laboratories, Inc. Trioctylphosphine (TOP) (90%) was purchased from 10 Fluka. All solvents used were anhydrous, purchased from Aldrich, and used without any further purification. All operations are performed using standard coated space-free technology. The molar ratio of Cd / Te varies from 1: 1 to 5: 1, and the molar ratio of Cd / ODPA varies from 1: 2 to 1: 5. The precursor solution was prepared by dissolving tellurium powder in TOP (Te concentration 10% by weight). The mixture was stirred at 25 ° C for 15 minutes and then cooled and centrifuged to remove any remaining insoluble particles. In a typical CdTe tetrapod synthesis, a mixture of OdPA, TOPO and CdO was degassed in a 50 ml three-necked flask connected to a Liebig condenser at 120 ° C for 20 minutes. Slowly heat at Ai · until CdO decomposes and the solution becomes clear and colorless. Second, ι. 5 grams of trioctylphosphine 20 (TOP) was added, and the temperature further rose to 320 ° C. Thereafter, the Te: TOP precursor solution was rapidly injected. The temperature dropped to 3 15dc and was maintained at this value throughout the synthesis. All synthesis was stopped after 5 minutes by removing the heating mantle and by rapidly cooling the flask. After the solution was cooled to 70 ° C, 3-4 liters of anhydrous xylene was added to the calciner, and the dispersion was transferred to an Ar dry 42 1245819 玖, invention description box. A minimum amount of anhydrous methanol, which is used to precipitate nanocrystalline particles after centrifugation, is added to the dispersion. In this way, the possible co-precipitation of Cd-phosphonate complexes is avoided. After the upper layer was removed, the precipitate was redissolved twice in methanol and precipitated again with methanol. After the upper layer is removed, the final precipitate 5 is stored in a dry box. All CdTe tetrapods formed are easily soluble in solvents such as chloroform or toluene. Example 1 = According to an embodiment of the present invention, a photovoltaic device is spin-cast from a solution of CdSe nanocrystals and P3HT in a pyridine-chloroform solvent mixture on an ITO-coated glass substrate in an inert atmosphere. It was prepared by pumping at < 10 · 10 6 mbar for 12 hours and evaporating the aluminum on the top to obtain the structure shown in FIG. 2. Example 2: a. Synthesis of nanocrystals: According to another embodiment of the present invention, the long CdSe nanorods (90% by weight) in P3HT were synthesized as follows: Cd raw material ... 0.161 g of dimethyl Cadmium was dissolved in 0.34 grams of trioctyl 15 phosphine (TOP). Se raw material: 0.2 g of Se in 2.367 g of TOP is dissolved. In a three-necked flask, 3.536 grams of trioctylphosphine oxide (TOPO), 0.187 grams of hexylphosphonic acid (HPA), and 0.357 grams of tetradecylphosphonic acid (TDPA) were mixed. This mixture was heated and degassed to 360 ° C under argon. The Cd raw material was slowly injected. Then, the temperature dropped to 330 ° C, and the Se raw material was injected at a rapid rate. The reaction was performed at 290 ° C for 18 minutes, and then the heat was removed. At 40 ° C, about 15 ml of methanol was added to the flask. The mixture was subjected to centrifugation and the supernatant was discarded. 8 ml of methanol was added, vortexed, then centrifuged again, and the upper layer was discarded. b. Preparation of substrate: In a series of solvents, the glass is cleaned by sonication. 43 1245819 玖, description of the invention Indium osmium oxide (ITO) on the glass substrate. After the final solvent cleaning, the mold is dried and embedded in a previously cleaned plasma chamber. Face down samples were treated with plasma for 4 minutes. Once the sample was removed from the chamber, precipitation of PEDOT: PSS (available from Bayer-Electronic Grade) began. After filtering through a 0.2 micron acetic acid filter, PEDOLPSS was deposited by spin casting at 3000 rpm. The film was dried by heating at 120 ° C for one hour under flowing argon. c. Cleaning of nano crystals: Cut the synthesized nano rods in half, and add 8 ml of methanol to each half. Perform centrifugation and discard the upper layer, and then repeat this process again. Add 0.35 ml of pyridine to each half to dissolve the nanorods, heat at 120 ° C and vortex occasionally for 10 minutes. Take 8 ml of each half of Shen Dian. Perform centrifugation and discard the upper layer. The nanorod was dissolved in a chloroform-pyridine mixture with 9.2% pyridine to produce nanocrystals at a concentration of 83 mg / ml. 15 d. Deposition of the active layer: The regular poly (3-hexylthiothiophene) (P3HT) was dissolved in chloroform at 30 mg / ml. A common solution of nanorods and P3HT prepared in a chloroform / pyridine mixture using this solution and the above nanorod solution (see III above), having a mass ratio of 9: 1 nanorod to P3HT and 4.55 mg / ml P3HT concentration. From this solution, the film was spin-cast on the prepared substrate (see above II) at 20 1350 rpm. e. Electrode deposition: Load the sample into the evaporation chamber and pump it under vacuum for at least 8 hours to a pressure below 10.6 Torr. A thin film of about 100 nm thick is thermally deposited through a shadow mask to define the top electrode. 441245819 发明, Inventive Example 3: CdTe tetrapod in P3HT has a core and 4 branches. CdTe tetrapod nanocrystals with 80 nm arm were synthesized and then washed in tetrahydrofuran (THF) and ethyl acetate in several dissolution / precipitation steps. 5 Then, the nanocrystals are dissolved together with the ligand phenylphosphonic acid in the solvent chloroform and heated at about 100 ° C for several hours. Nanocrystals were then precipitated with methanol and redissolved in chloroform. As described in Example 2, the nanocrystalline solution and the P3HT solution were mixed and spin-cast to produce a thin film. 10 The substrate and electrode are treated as in Example 2. The EQE value of this sample is less than 10%. Example 4: CdTe tetrapod in P3HT

CdTe四足體被合成且如範例3(其係以THF及乙酸乙酯)以 甲苯及甲醇清洗。 15 然後,奈米結晶(約50毫克)與約1000毫克之配位體己基 膦酸(ΗΡΑ)共同溶解於約2毫升溶劑氯仿,並加熱數小時。 其餘程序係依循範例3。此樣品之EQE值係少於10%。 範例5 :於Ρ3ΗΤ内之CdTe四足體 如範例4般進行,但另外使奈米結晶溶於三丁基膦(TBP)且 20 於以曱醇沈澱前攪拌20小時。 然後,如範例3般進行。此樣品之EQE值係少於10%。 範例6 : MEH-PPV内之CdTe四足體 如範例3般進行,但於最後甲醇沈澱後再次溶於溶劑對-二 曱苯。因此,此範例具有配位體苯基膦酸。 45 1245819 玖、發明說明 製備於對-二甲苯内之ΜΕΗ-PPV溶液,將此與奈米結晶混 合,且此如範例2般鑄製混合成薄膜。 範例7 : P3HT内之CdSe奈米棒 如範例2般進行,但於每一步驟中配位體吡啶可以正丁基 5 胺或正己基胺替代。 範例8 : P3HT内之CdSe奈米棒 如範例4般進行,但CdTe奈米結晶以CdSe奈米結晶替代 。再者,ΗΡΑ以T1替代作為配位體。 範例9 : Ρ3ΗΤ内之CdSe或CdTe奈米結晶 10 以CdSe或CdTe奈米結晶如範例8般進行。 以T5-PA替代ΗΡΑ。 才篆品姜監定 奈米結晶之尺寸、形態及結構係藉由ΤΕΜ且使用FEI Tecnai 12 120kV 顯微鏡測量。約 50-100 nm 厚之 CdSe-15 P3HT(Alddch之區域規則性P3HT)摻合物之薄膜藉由使薄 膜鑄製於NaCl IR窗,使此薄膜浮於水内及以銅TEM格柵 採集而使用TEM研究。摻合物薄膜之形態亦直接於裝置上 經由原子力顯微鏡使用數位儀器公司(Digital Instruments) 之奈米鏡(Nanoscope)IIIa以輕觸式(tapping mode)鑑定。薄 20 膜厚度係經由AFM決定。CdTe tetrapods were synthesized and washed with toluene and methanol as in Example 3 (which is based on THF and ethyl acetate). 15 Nanocrystals (about 50 mg) were then dissolved together with about 1,000 mg of the ligand hexylphosphonic acid (HPA) in about 2 ml of chloroform and heated for several hours. The rest of the procedures follow Example 3. The EQE value of this sample is less than 10%. Example 5: CdTe tetrapod in P3HT was performed as in Example 4, but nanocrystals were dissolved in tributylphosphine (TBP) and stirred for 20 hours before precipitating with methanol. Then, proceed as in Example 3. The EQE value of this sample is less than 10%. Example 6: CdTe tetrapod in MEH-PPV was performed as in Example 3, but was dissolved again in the solvent p-diphenylbenzene after the final methanol precipitation. Therefore, this example has the ligand phenylphosphonic acid. 45 1245819 发明, description of the invention MEE-PPV solution prepared in p-xylene, this was mixed with nanocrystals, and this was cast and mixed into a film as in Example 2. Example 7: CdSe nanorods in P3HT Perform as in Example 2, but the ligand pyridine can be replaced with n-butyl 5 amine or n-hexylamine in each step. Example 8: CdSe nanorods in P3HT proceed as in Example 4, but CdTe nanocrystals are replaced with CdSe nanocrystals. Moreover, TPA substitutes T1 as a ligand. Example 9: CdSe or CdTe nanocrystals in PBS 3 10 CdSe or CdTe nanocrystals were processed as in Example 8. Replace TPA with T5-PA. The quality, shape, and structure of nanocrystals were determined by TEI and using a FEI Tecnai 12 120kV microscope. A film of a blend of CdSe-15 P3HT (Regularly Regular P3HT of Alddch) of about 50-100 nm thickness is made by casting the film in a NaCl IR window, floating the film in water and collecting it with a copper TEM grid. Study using TEM. The morphology of the blend film was also directly identified on the device via atomic force microscopy using Digital Instruments' Nanoscope IIIa in tapping mode. Thin 20 film thickness is determined via AFM.

CdSe-P3HT 摻合物薄膜之吸收係以 Agilent Chemstation之紫外線/可見光之分光光度計決定。光電流 測量係使用250瓦之鎢光源(其係偶合至作為照明源之 Acton SP150單色計及用以獲得電流及電壓之Keithley 23 6 46 1245819 玖、發明說明 源測里單元)完成。光強度係以經校準之Graseby碎光二極 體測量。 光致發光猝滅實驗係於玻璃基材上旋轉鑄製之1〇〇-200 nm厚之CdSe_p3HT薄膜上完成。自氬離子激光之514 5 nm之激發作用下之樣品之絕對光致發光性係以依循 deMello等人之义办从如以1997, 9, 23〇所述方法以集成球 測量。 光生伏打裝置之效率可以兩種方式描述,見R〇stalski 女/. 6W.心r心/ 61,87 (2〇〇〇)(其内容在此 10被全部併入以供參考之用)。第一種係數量效率,外部量子 效率(EQE),其表示被轉化成電子之光子數量。第二種係 功率轉化效率,其表示每一單位之入射輻射動力所產生之 電力。雖然EQE對於瞭解電流產生機構係重要的,但其僅 係測量商用太陽能電流之效率。對此等商用裝置更重要係 15於太陽能條件下此裝置之功率轉化效率。 對於商業上之應用,最重要參數光生伏打電池之功率 轉化效率77。因為電力係電流及電壓之乘積,功率轉化效 率係自為電流(其係電壓之函數)而決定。功率轉化效率可 以電池之進入光線功率?丨_及電輸出功率Pout表示:The absorption of CdSe-P3HT blend film is determined by the ultraviolet / visible spectrophotometer of Agilent Chemstation. The photocurrent measurement is performed using a 250-watt tungsten light source (which is coupled to an Acton SP150 monochromator as an illumination source and a Keithley 23 6 46 1245819 (source description measurement unit) for obtaining current and voltage). Light intensity is measured with a calibrated Graseby light-diode. The photoluminescence quenching experiment was performed on a 100-200 nm-thick CdSe_p3HT film cast on a glass substrate. The absolute photoluminescence of the sample under the excitation of 514 5 nm from the argon ion laser was measured with an integrated sphere in accordance with the method of deMello et al. As described in 1997, 9, 23 °. The efficiency of photovoltaic devices can be described in two ways, see Rostalski Female /. 6W. Heart / Heart / 61,87 (200) (the content of which is hereby incorporated by reference in its entirety for reference) . The first kind of coefficient quantity efficiency, external quantum efficiency (EQE), represents the number of photons that are converted into electrons. The second is the power conversion efficiency, which represents the electricity generated by each unit of incident radiant power. Although EQE is important for understanding the current generating mechanism, it is only measuring the efficiency of commercial solar current. More important for these commercial installations is the power conversion efficiency of this installation under solar conditions. For commercial applications, the most important parameter is the power conversion efficiency of photovoltaic cells77. Because power is the product of current and voltage, power conversion efficiency is determined by the current (which is a function of voltage). Power conversion efficiency can the battery enter the light power?丨 _ and electrical output power Pout means:

2〇 AM 最大理論性功率輸出係以短路(sh〇n circuit)光電流4 及開路電[F〜之乘積表不。第24圖顯示理想及以實驗發 現之典型I-V曲線。内距形之面積係相對應於實際裝置之 47 1245819 玖、發明說明 最大輸出功率(於最大功率點),而以軸及理想I-V曲線形 成之外矩形之面積係等於最大之理想輸出功率。實際之I-V特性被繪出曲線,且需使電流及電壓之乘積達最大以便 匕得最大功率輸出。最大理論性功率輸出與實際之最大功 率輸出之比值係LV特性描述之重要特徵。此比值被稱為 填充因子FF,且可定義成 —λ⑼匕⑻— 右使用填充因子表示光生伏打電池之最大輸出功率, 功率轉化效率變成 10 W) 大5貢訊係包含於裝置之I-V特性描述内。係與 QE呈比例,且與匕c及FF結合,提供用以描述電池之功 率效率特性所需之所有參數。 巧斤这之本發明考量此間所述之光生伏打電池係具 有至夕大於1% Α.Μ· 15全面照射之功率轉化效率。更佳 地,此含量係大於5%。更佳地,此含量係大於1〇%。最佳 地,此含量最高達30%。The maximum theoretical power output of 2 AM is expressed by the product of short circuit (shon circuit) photocurrent 4 and open circuit current [F ~. Figure 24 shows the ideal and experimentally found typical I-V curve. The area of the inner shape corresponds to 47 1245819 of the actual device. Description of the invention The maximum output power (at the maximum power point), while the area of the outer rectangle formed by the axis and the ideal I-V curve is equal to the maximum ideal output power. The actual I-V characteristics are plotted, and the product of current and voltage needs to be maximized in order to obtain the maximum power output. The ratio of the maximum theoretical power output to the actual maximum power output is an important feature of the LV characteristic description. This ratio is called the fill factor FF, and can be defined as —λ⑼ ⑻ ⑻ — the right uses the fill factor to represent the maximum output power of photovoltaic cells, and the power conversion efficiency becomes 10 W) Big 5 Gongxun is included in the IV characteristics of the device Within the description. It is proportional to QE and combined with d c and FF, provides all the parameters needed to describe the power efficiency characteristics of the battery. The present invention considers that the photovoltaic battery described here has a power conversion efficiency of more than 1% A.M · 15 full irradiation. More preferably, this content is greater than 5%. More preferably, the content is greater than 10%. Optimally, this content is up to 30%.

功率轉化效率可於單色或白光照射下產生。單色功率 轉化效率對於描述太陽能電池特性係不充足,但係於特定 波長時之裝置性能之一測量。此對於裝置係於非太陽之條 件下使用之情況(諸如,小的電子裝置及於周圍房間光線下 使用之手錶,及用於激光輻射之功率計)係有用的。描述太 48 1245819 玖、發明說明 陽能電池特性之標準方法係於Air Mass 1.5或A.M. 1.5條 件(經地球大氣行進1.5次後之太陽發射光譜)。此太陽照射 一般係被模擬,因為由於非理想之氣侯條件之故,標準之 A.M. 1.5條件係難以可信賴地獲得。 5 此間使用之用辭及表示方式係作為描述之用,而非限 制之用,且此等用辭及表示方式之使用非欲排除所示及所 述之特徵或其部份之等化物,需瞭解各種改良於所請求之 本發明範圍内係可能。再者,於未偏離本發明範圍,本發 明任何實施例之任何一個或更多之特徵可與本發明任何其 10 它實施例之任何一個或更多之其它特徵結合。 上述之所有專利案、專利申請案及公告案在此被全部 併入以供所有目的參考之用。上述專利案、專利申請案及 公告案無一被認為係習知技藝。 t圖式簡單說明3 15 第1圖顯示CdSe及P3HT之能級圖,其係顯示5 nmPower conversion efficiency can be generated under monochromatic or white light. Monochromatic power conversion efficiency is not sufficient to describe the characteristics of solar cells, but it is a measure of device performance at a specific wavelength. This is useful when the device is used in conditions other than the sun, such as small electronic devices and watches used in the ambient room light, and power meters for laser radiation. Describing Matt 48 1245819 发明 Description of the invention The standard method for the characteristics of a solar cell is the Air Mass 1.5 or A.M. 1.5 conditions (the solar emission spectrum after the Earth's atmosphere travels 1.5 times). This solar exposure is generally simulated because standard A.M. 1.5 conditions are difficult to obtain reliably due to non-ideal climatic conditions. 5 The terms and expressions used herein are for description, not limitation, and the use of these terms and expressions is not intended to exclude the illustrated or described features or equivalents of parts thereof. It is understood that various modifications are possible within the scope of the claimed invention. Furthermore, without departing from the scope of the invention, any one or more features of any embodiment of the invention may be combined with any one or more other features of any other embodiment of the invention. All the patents, patent applications and announcements mentioned above are incorporated herein for all purposes. None of the above patents, patent applications, and announcements are considered to be know-how. Brief description of t diagram 3 15 The first diagram shows the energy level diagram of CdSe and P3HT, which shows 5 nm

CdSe與P3HT間之電荷轉移方法之示意圖。 第2圖係依據本發明一實施例之奈米棒-聚合物摻合物 光生伏打裝置之結構之示意圖。 第 3 圖顯示 a) 7 nm X 7 nm,b) 8 nm X 13 nm,c) 3 nm 20 x 60 nm,及d) 7 nm x 60 nm之CdSe奈米結晶之低解析 TEM影像。 第4圖顯示由分散於P3HT之90重量%之7 nm x 7 nm CdSe奈米結晶所組成之薄膜(自氯仿旋轉鑄製)之AFM-TM 形貌影像。掃瞄區域係5 // m。 49 1245819 玖、發明說明 第5圖顯示分散於P3HT之由90重量%之9 nm X 13 nm之CdSe奈米結晶所組成之薄膜(自於氯仿内之1體積% 及8體積%呲啶旋轉鑄製)之AFM-TM a)形貌影像及b)相影 像。影像係以相同規格對5 // m掃描區域呈現。 5 第6圖顯示分散於P3HT之由90重量%之9 nm X 13 nm CdSe奈米棒所組成之薄膜(自於氯仿内之各種濃度之吡 啶鑄製)之表面粗糙度(空心圓)。最大EQE(實心鑽石形)係 以自此等薄膜製造之裝置顯示。線係作為眼睛之導引。 第7a圖顯示顯示90重量%之3 nm X 60 nm之CdSe奈 10 米棒於P3HT内之裝置(空心圓)及於120°C退火(annealing) 後(貫心距形)之正規化光電流光譜。 第7b圖顯示於P3HT内之90重量%之3 nm X 60 nm 之CdSe奈米棒之裝置及僅有奈米棒之裝置之於熱處理前 後之EQE比例,其係波長之函數。插入圖顯示3 nm X 60 15 nm之CdSe及P3HT之個別之1-透射光譜。 第8圖顯示於P3HT内之各種不同奈米棒濃度之各系 列之3 nm X 60 nm奈米棒之裝置之P3HT對吸收(實心鑽石 形,虛線)、光電流(空心圓,實線)及120°C熱處理後之光 電流(實心距形,虛線)之相對助益。 20 第9圖顯示於515 nm時之-0.1 mW/cm2照射下之於 P3HT内之90重量%之7 nm X 14 nm CdSe之EQE。插入圖 顯示於各種溫度熱處理後於514 nm激發下P3HT樣品内之 60重量%之7 nm X 14 nm之CdSe之PL效率。 第10圖顯示90重量%之7 nm X 60 nm CdSe奈米棒於 50 1245819 玖、發明說明 P3HT(空心圓)及於120°C熱處理後(實心距形)之EQE光譜 。插入圖:此裝置之於515 nm日寺0· lmW/cm2照射下之相 對應電流-電壓特性,其包含0.4V之開路電壓(open circuit voltage),及0·5之填充因子。 5 第11a圖顯示具212 nm、271 nm及346 nm厚度之自 P3HT内之90重量%之7 nm X 60 nm之CdSe奈米棒之裝 置於120°C熱處理前之EQ0光譜。 第lib圖顯示具212 nm、271 nm及346 nm厚度之自 P3HT内之90重量%之7 nm X 60 nm之CdSe奈米棒之裝 10 置於120°C熱處理後之EQ0光譜。 第12a圖顯示對於第11a及lib圖之裝置於12(TC加熱 前後之EQE相對促進。 第12b圖顯示熱處理前後之EQE之絕對差。 第13a圖顯示自氯仿旋轉鑄製之20重量%之3 nm X 60 15 nm CdSe奈米棒及P3HT之薄膜之TEM。 第13b圖顯示第13a圖之相同奈米結晶自於氯仿溶液 内之10體積%吡啶鑄製時之TEM。 第14圖顯示由於P3HT内之60重量%之10 nm X 10 nm之CdSe奈米結晶組成之100 nm薄膜之截面之TEM。 20 第15a圖顯示7 nm X 60 nm之CdSe奈求棒。 第15b圖顯示由於P3HT内之40重量%之CdSe奈米 棒所組成之100 nm薄膜之戴面之TEM。 第16圖顯示7 nm直徑之奈米棒的長度於515 nm時之 0.084 mW/cm2照射下,連續地從7 nm增加至30 nm及60 51 1245819 玖、發明說明 nm,對於P3HT内之90重量%0〇^6之裝置之EQE,其幾 乎以3之因子上升至54%。 第17a-c圖顯示具a) 7 nm,b) 30 nm及c) 60 run之長 度之7 nm直徑之奈米結晶之TEM。比例尺設定係50 nm, 5 且所有TEM係相同比例。 第18圖顯示於P3HT内之90重量%之3 nm X 100 nm 之分支狀CdSe奈米棒之裝置之EQE,其係吡啶濃度之函 數。 第19a圖顯示未排列之四足體奈米結晶。 10 第19b圖顯示排列之四足體奈米結晶。 第20圖顯示一系列之具不同薄膜厚度之於P3HT内之 90重量%之7nm X 60 nm CdSe之裝置之EQE光譜。 第21a圖顯示各種不同薄膜厚度之於P3HT内之90重 量%之 7 nm X 7 nm CdSe 之 EQE 光譜。 15 第21b圖顯示此等裝置之相對應吸收光譜,其係以增 加厚度之函數顯示。 第22a圖顯示以TOPO處理之奈米結晶於P3HT内之 40重量%之5 nm CdSe奈米結晶之TEM。 第22b圖顯示以T1處理之奈米結晶於P3HT内之40 20 重量%之5 nm CdSe奈米結晶之TEM。 第22c圖顯示以吡啶處理之奈米結晶於P3HT内之40 重量%之5 nm CdSe奈米結晶之TEM。 第23a圖顯示5 1 5nm時於0· 1 mW/cm2照射下P3HT内 之90重量%之7 nm X 60 nm之CdSe奈米棒之I-V特性。 52 1245819 玖、發明說明 第23b圖顯示相同之第23a圖裝置之太陽能電池特性 ,其係以模擬之AM 1.5 Global光源測量,包含5.7 mA/cm2之短電路電流,0.42之FF,及0.67V之開路電壓 ,產生1.7%之太陽功率轉化效率。Schematic diagram of the charge transfer method between CdSe and P3HT. Figure 2 is a schematic diagram of the structure of a nanorod-polymer blend photovoltaic device according to an embodiment of the present invention. Figure 3 shows low-resolution TEM images of a) 7 nm X 7 nm, b) 8 nm X 13 nm, c) 3 nm 20 x 60 nm, and d) 7 nm x 60 nm CdSe nanocrystals. Figure 4 shows the AFM-TM morphology image of a thin film (rotated from chloroform) composed of 90% by weight of 7 nm x 7 nm CdSe nanocrystals dispersed in P3HT. The scanning area is 5 // m. 49 1245819 发明, description of the invention Figure 5 shows a film composed of 90% by weight of 9 nm X 13 nm CdSe nanocrystals dispersed in P3HT (from 1% by volume and 8% by volume of pyridine in chloroform) AFM-TM a) morphological image and b) phase image. The image is presented in a 5 // m scan area with the same specifications. 5 Figure 6 shows the surface roughness (hollow circles) of a film consisting of 90% by weight of 9 nm X 13 nm CdSe nanorods (cast from various concentrations of pyridine in chloroform) dispersed in P3HT. Maximum EQE (Solid Diamond Shape) is shown with devices made from these films. The line acts as a guide for the eyes. Figure 7a shows the normalized photocurrent of a device (hollow circle) in 90% by weight 3 nm X 60 nm CdSe nanometer 10-meter rod in P3HT (annealing) at 120 ° C spectrum. Figure 7b shows the ratio of EQE before and after heat treatment of a 90 nm by weight 3 nm X 60 nm CdSe nanorod device and a nanorod only device in P3HT as a function of wavelength. The insertion plot shows individual 1-transmission spectra of CdSe and P3HT at 3 nm X 60 15 nm. Figure 8 shows the P3HT pair absorption (solid diamond shape, dotted line), photocurrent (open circle, solid line), P3HT pair absorption of various 3 nm x 60 nm nano rod devices of various series of nano rod concentrations in P3HT, and Relative benefit of photocurrent (solid distance, dotted line) after heat treatment at 120 ° C. 20 Figure 9 shows 90% by weight of 7 nm X 14 nm CdSe EQE in P3HT under -0.1 mW / cm2 at 515 nm. Insertion plots show the PL efficiencies of 60 wt% 7 nm X 14 nm CdSe in a P3HT sample under 514 nm excitation after heat treatment at various temperatures. Figure 10 shows EQE spectra of 90 wt% 7 nm X 60 nm CdSe nanorods at 50 1245819 玖, description of invention P3HT (open circles) and heat treatment at 120 ° C (solid distance shape). Insertion diagram: The corresponding current-voltage characteristics of this device under 515 nm Risi 0 · lmW / cm2 irradiation, which includes an open circuit voltage of 0.4V and a fill factor of 0.5. 5 Figure 11a shows the EQ0 spectra of 90% by weight 7 nm X 60 nm CdSe nanorods with a thickness of 212 nm, 271 nm, and 346 nm from P3HT before heat treatment at 120 ° C. The lib graph shows the EQ0 spectrum of a 90% by weight 7 nm X 60 nm CdSe nanorod device with a thickness of 212 nm, 271 nm, and 346 nm from P3HT 10 after heat treatment at 120 ° C. Figure 12a shows the relative promotion of EQE before and after heating of the device of Figure 11a and lib. Figure 12b shows the absolute difference in EQE before and after heat treatment. Figure 13a shows 20% by weight of 3% by weight of the rotatory casting of chloroform. TEM of nm X 60 15 nm CdSe nanorods and thin films of P3HT. Figure 13b shows the same nanocrystals of Figure 13a from TEM when 10% by volume of pyridine was cast in a chloroform solution. Figure 14 shows due to P3HT The TEM of a cross section of a 100 nm thin film consisting of 10 nm X 10 nm CdSe nanocrystals within 60% by weight. Figure 15a shows the 7 nm X 60 nm CdSe nanorod. Figure 15b shows the TEM of a 100 nm thin film composed of 40% by weight CdSe nanorods. Figure 16 shows that the length of a 7 nm diameter nanorod is continuously illuminated from 0.084 mW / cm2 at 515 nm from 7 nm Increasing to 30 nm and 60 51 1245819 发明, invention description nm, for the EQE of the device with 90% by weight in 0% of P3HT, it increased to a factor of 3 to 54%. Figures 17a-c shows a) TEM of 7 nm, b) 30 nm and c) 60 run diameter 7 nm diameter nanocrystalline. The scale setting is 50 nm, 5 and all TEM systems are the same scale. Fig. 18 shows the EQE of a device of 90% by weight of a 3 nm X 100 nm branched CdSe nanorod in P3HT as a function of pyridine concentration. Figure 19a shows the unaligned tetrapod nanocrystals. 10 Figure 19b shows nanocrystals of aligned tetrapods. Figure 20 shows the EQE spectra of a series of devices with different film thicknesses of 90% by weight of 7nm X 60 nm CdSe in P3HT. Figure 21a shows the EQE spectra of 7 nm X 7 nm CdSe at 90% by weight in P3HT for various film thicknesses. 15 Figure 21b shows the corresponding absorption spectra of these devices as a function of increasing thickness. Figure 22a shows a TEM of 40% by weight of 5 nm CdSe nanocrystals treated with TOPO-treated nanocrystals in P3HT. Figure 22b shows a TEM of 40 20 wt% 5 nm CdSe nanocrystals of T1 treated nanocrystals crystallized in P3HT. Figure 22c shows a TEM of 40 wt% 5 nm CdSe nanocrystals of pyridine-treated nanocrystals in P3HT. Figure 23a shows the I-V characteristics of a 90% by weight 7 nm X 60 nm CdSe nanorod in P3HT at 5 1 5 nm at 0.1 mW / cm2. 52 1245819 发明, Description of the invention Figure 23b shows the characteristics of the solar cell of the same device shown in Figure 23a. It is measured with an analog AM 1.5 Global light source, including a short circuit current of 5.7 mA / cm2, a FF of 0.42, and a 0.67V. The open-circuit voltage produces a solar power conversion efficiency of 1.7%.

5 第24圖顯示理相之Ι-V曲線及實驗發現之典型之I-V 曲線。 535 Figure 24 shows the I-V curve of the physical phase and the typical I-V curve found experimentally. 53

Claims (1)

12458191245819 申請專利範圍Patent application scope 第92106081號專利申請案申請專利範圍修正本94年6月1〇日 1 · 一種薄膜,包含: 半導性共扼聚合物,具有至少5重量%之埋於其内之 半導體-奈米結晶,其中: 該半導體-奈米結晶之至少一部份係具有大於約2之縱 橫比。 2·如申請專利範圍第1項所述之薄膜,其中: 該半V體-奈米結晶之至少一部份係具有大於約5之縱 橫比。 10 3·如申請專利範圍第1項所述之薄膜,其中: 該半導體-奈米結晶之至少一部份係具有大於約10之縱 橫比。 4.如申請專利範圍第1項所述之薄膜,其中: 該半導體-奈米結晶之至少一部份係具有約5與約50間 15 之縱橫比。 5·如申請專利範圍第丨項所述之薄膜,其中: 該半導體-奈米結晶之至少一部份係具有約2與約1〇間 之縱橫比。 6. 如申請專利範圍第1項所述之薄膜,其中: '〇 該半導性共輛聚合物具有約5與約99重量%之埋於其内 之半導體-奈米結晶。 7. 如申請專利範圍第1項所述之薄臈,其中·· 該半導性共輛聚合物具有約20與95重量%之埋於其内 之半導體-奈米結晶。 1245819 拾、申請專利範圍 8. 如申請專利範圍第丨項所述之薄膜,其中: 該半導性共軛聚合物具有約5〇與95重量%之埋於其内 之半導體-奈米結晶。 9. 如申請專利範圍第〗項所述之薄膜,其中: 5 該半導性共軛聚合物具有約90重量%之埋於其内之半 導體-奈米結晶。 10·如申請專利範圍第i項所述之薄膜,其中: 該半導性共軛聚合物係選自反式-聚乙炔、聚吡咯、聚 噻吩、聚苯胺、聚(對-伸苯基)及聚(對-伸苯基_伸乙烯基) 10 、聚苟、聚芳香族胺、聚(㈣嗯基·伸乙稀基)及其可溶性 衍生物所組成之族群。 11 ·如申请專利範圍第丨〇項所述之薄膜,其中: 該共軛聚合物係選自(聚(2_甲氧基5_(2,_乙基己基氧) 對·伸苯基伸乙烯基)(MEH_PPV)及聚(3_己基噻吩)(p3HT)m 15 組成之族群。 12. 如申請專利範圍第丨項所述之薄膜,其中: 3半導體_奈米結晶包含具有大於約2〇 nm長度之棒。 13. 如申請專利範圍第〗項所述之薄膜,其中: 。亥半導體-奈米結晶包含具有約2〇 nm與約2〇〇 nm間長 20 度之棒。 14·如申請專利範圍第13項所述之薄膜,其中·· 孩半導體-奈米結晶包含具有約6〇 與約11 〇 間長 度之棒。 15·如申請專利範圍第1項所述之薄膜,其中·· 1245819 拾、申請專利範圍 該半V體-奈米結晶包含約7 nm x go nm之棒。 16·如申請專利範圍第1項所述之薄膜,其中: 該半‘體-奈米結晶包含選自族、族、^族 之半導體及三級雲母銅礦所組成之族群之半導體。 17·如申請專利範圍第16項所述之薄膜,其中: 該半導體-奈米結晶係選自CdSe、CdTe、InP、GaAs、 CuInS2、CuInSe2、A1GaAs、㈣仏、Ge&si所組成之族 群。 18·如申請專利範圍第i項所述之薄膜,其中: 該半導體-奈米結晶係選自CdSe&CdTe所组成之族群 〇 19·如申請專利範圍第i項所述之薄膜,其中: 該半導體-奈米結晶之一部份係分支狀奈米結晶。 2〇·如申睛專利範圍第19項所述之薄膜,其中: 該刀支狀奈米結晶之一部份具有至少二臂,該臂非皆 相同長度。 21 ·如申請專利範圍第19項所述之薄膜,其中: 该分支狀奈米結晶非皆具有相同形狀。 22·如申請專利範圍第19項所述之薄膜,其中: 該分支狀奈米結晶具有4臂且具有四面體對稱。 23·如申請專利範圍第22項所述之薄膜,其中: w亥刀支狀奈米結晶係CdSe或CdTe,且係以約9〇重量〇/〇 之量被埋入。 24·如申請專利範圍第1項所述之薄膜,其中: Ϊ245819 、申請專利範匱 該薄膜具有約100 nm至約350 nm之厚度。 25.如申請專利範圍第22項所述之薄膜,其中: 遠薄膜具有約200 nm之厚度。 26·一種光生伏打裝置,包含: 5 如申請專利範圍第1項所述之薄膜。 27·如申請專利範圍第26項所述之光生伏打裝置,其中·· 該半導體-奈米結晶之至少一部份係具有大於約5之縱 橫比。 28·如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶之至少一部份係具有大於約丨〇之縱 橫比。 29·如申清專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶之至少一部份係具有約5與約5〇間 之縱橫比。 15 30·如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈来結晶之至少一部份係具有約2與約1〇間 之縱橫比。 31·如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約5與約99重量%之埋於其内 2〇 之半導體-奈米結晶。 32·如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約2〇與95重量%之埋於其内 之半導體-奈米結晶。 33·如申請專利範圍第26項所述之光生伏打裝置,其中: 1245819 拾、申請專利範圍 該半導性共概聚合物具有約50與95重量%之埋於其内 之半導體·•奈米結晶。 34_如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導性共輛聚合物具有約9〇重量%之埋於其内之半 5 導體-奈米結晶。 35·如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導性共軛聚合物係選自反式-聚乙炔、聚吡咯、聚 噻吩、聚苯胺、聚(對-伸苯基)及聚(對d申苯基-伸乙烯基) 、I知、聚芳香族胺、聚(伸嗔嗯基-伸乙烯基)及其可溶性 10 衍生物所組成之族群。 36·如申請專利範圍第35項所述之光生伏打裝置,其中: 該共軛聚合物係選自(聚(2-曱氧基5-(2,-乙基己基氧) 對-伸苯基伸乙烯基)(MEH-PPV)及聚(3-己基噻吩)(p3HT)所 組成之族群。 15 37.如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有大於約20 nm長度之棒。 38·如申請專利範圍第26項所述之光生伏打裝置,其中: 5亥半導體-奈米結晶包含具有約2〇 nm與約2〇〇 nm間長 度之棒。 20 39·如申請專利範圍第38項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有約60 nm與約110 nm間長 度之棒。 40.如申請專利範圍第26項所述之光生伏打裝置,其中: 5亥半導體-奈米結晶包含約7 nm X 60 nm之棒。 1245819 拾、申請專利範圍 41. 如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含選自Π-VI族、III-V族、IV族 之半導體及三級雲母銅礦所組成之族群之半導體。 42. 如申請專利範圍第41項所述之光生伏打裝置,其中·· 5 該半導體-奈米結晶係選自CdSe、CdTe、InP、GaAs、 CuInS2、CuInSe2、AlGaAs、InGaAs、Ge及 Si戶斤組成之族 群。 43. 如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶係選自CdSe及CdTe所組成之族群 10 ° 44. 如申請專利範圍第26項所述之光生伏打裝置,其中: 該半導體-奈米結晶之一部份係分支狀奈米結晶。 45. 如申請專利範圍第44項所述之光生伏打裝置,其中: 該分支狀奈米結晶之一部份具有至少二臂,該臂非皆 15 相同長度。 46. 如申請專利範圍第44項所述之光生伏打裝置,其中: 該分支狀奈米結晶非皆具有相同形狀。 47. 如申請專利範圍第44項所述之光生伏打裝置,其中: 該分支狀奈米結晶具有4臂且具有四面體對稱。 20 48.如申請專利範圍第47項所述之光生伏打裝置,其中: 該分支狀奈米結晶係CdSe或CdTe,且係以約90重量% 之量被埋入。 49.如申請專利範圍第26項所述之光生伏打裝置,其中: 該薄膜具有約100 nm至約350 nm之厚度。 1245819 拾、申請專利範圍 50·如申請專利範圍第49項所述之光生伏打裝置,其中: 該薄膜具有約200 nm之厚度。 51 · —種製造聚合物薄膜之方法,包含: 以溶劑清洗經表面活性劑塗覆之半導體-奈米結晶至少 5 一次,及 使清洗過之半導體-奈米結晶及半導性聚合物共同 溶解於一兀》谷劑混合物,及 沈積該混合物,其中 該半導體-奈米結晶之至少_部份係具有大於約2之縱 10 橫比。 52·如申凊專利範圍第51項所述之製造聚合物薄膜之方 法,其中: 該半導體-奈米結晶之至少一部份係具有大於約5之縱 橫比。 15 53·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導體-奈米結晶之至少一部份係具有大於約丨〇之縱 橫比。 54·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 20 其中: 該半導體-奈米結晶之至少一部份係具有約5與約5〇間 之縱横比。 55·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 1245819 拾、 申請專利範圍 該半導體•奈米結晶之至少 之縱橫比。 部份係具有約2與約1〇間 56·如申凊專利範圍第51項所述 其中: 之製造聚合物薄膜之方法 該半導性共軛聚合物具有約5與約 之半導體-奈米結晶。 99重量%之埋於其内 5如申#專利犯圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導性共軛聚合物具有約2〇與95重量%之埋於其内 10 之半導體-奈米結晶。 58.如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導性共軛聚合物具有約5〇與95重量%之埋於其内 之半導體·奈米結晶。 15 59·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導性共軛聚合物具有約9〇重量%之埋於其内之半 導體-奈米結晶。 60·如申請專利範圍第51項所述之製造聚合物薄膜之方法,20 其中: 該半導性共軛聚合物係選自反式-聚乙炔、聚吡咯、聚 嘍吩、聚苯胺、聚(對-伸苯基)及聚(對-伸苯基-伸乙烯基) 、聚芴、聚芳香族胺、聚(伸噻嗯基-伸乙烯基)及其可溶性 衍生物所組成之族群。 1245819 拾、申請專利範圍 61 ·如申請專利範圍第60項所述之製造聚合物薄膜之方法, 其中: 該共軛聚合物係選自(聚甲氧基5_(2,-乙基己基氧) 對-伸苯基伸乙烯基KMEH-PPV)及聚(3-己基噻吩)(P3HT)所 5 組成之族群。 62.如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導體-奈米結晶包含具有大於約2〇 nm長度之棒。 63·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 10 其中: 該半v體-奈米結晶包含具有約20 nm與約200 間長 度之棒。 64·如申晴專利範圍第63項所述之製造聚合物薄膜之方法, 其中: 該半導體-奈米結晶包含具有約6〇 nm與約11〇 間長 度之棒。 65.如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導體-奈米結晶包含約7nmx60nm之棒。 2〇 66,如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 夂’ ,該半導體_奈米結晶包含選自ηνι族财族 之+導體及三級雲母銅礦所組成之族群之半導體。、 67.如申請專利範圍第66項所述之製造聚合物薄膜之方法, 1245819 拾、申請專利範圍 其中: π亥半導體-奈米結晶係選自CdSe、CdTe、InP、GaAs、 CuInS2、CuInSe2、AlGaAs、InGaAs、Ge及 Si所組成之族 群。 5 68.如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該半導體,奈米結晶係選自CdSe及CdTe所組成之族群 〇 69·如申請專利範圍第51項所述之製造聚合物薄膜之方法, 10 其中: 該半導體-奈米結晶之一部份係分支狀奈米結晶。 70·如申請專利範圍第69項所述之製造聚合物薄膜之方法, 其中: °玄刀支狀奈米結晶之一部份具有至少二臂,該臂非皆 15 相同長度。 71·如申請專利範圍第69項所述之製造聚合物薄膜之方法, 其中: 該分支狀奈米結晶非皆具有相同形狀。 72·如申請專利範圍第69項所述之製造聚合物薄膜之方法, 0 其中: 滅刀支狀奈米結晶具有4臂且具有四面體對稱。 乃.如申請專利範圍第73項所述之製造聚合物薄膜之方法, 其中: 该分支狀奈米結晶係CdSe或CdTe,且係以約9〇重量% 1245819 拾、申請專利範圍 之量被埋入。 74.如申請專利範圍第51項所述之製造聚合物薄膜之方法, 其中: 該薄膜具有約100 nm至約350 nm2厚度。 5 75·如申清專利範圍第谷74項所述之製造聚合物薄膜之方法 ,其中: 該薄膜具有約200 nm之厚度。 76·如申請專利範圍第51項所述之製造聚合物薄膜之方 法,其中: 10 該二元溶劑混合物包含至少一選自吡啶、氣仿、甲 苯、二甲苯、己烷、水、二氣笨、二氣甲苯及烷基胺( 其中’烧基鏈可為分支狀或未被分支,且長度係2與2〇 個間之碳原子)、丁醇、甲醇及異丙醇之溶劑。 77·如申請專利範圍第5丨項所述之製造聚合物薄膜之方 15 法,其中: 該二元溶劑混合物之濃度係約1與約15體積%之間 〇 78·如申請專利範圍第77項所述之製造聚合物薄膜之方 法,其中: 20 該二元溶劑混合物之濃度係約4與約12體積%之間 〇 79·如申請專利範圍第78項所述之製造聚合物薄膜之方 法,其中·· 該二元溶劑混合物之濃度係約8體積%。 1245819 拾、申請專利fg圍 80·如申請專利範圍第76項所述之製造聚合物薄膜之方 法,其中: 該二元溶劑混合物包含於氣仿内之σ比咬。 81·如申請專利範圍第51項所述之製造聚合物薄膜之方 5 法,其中: 該被沈積之薄膜係於約6〇。〇至約200°C之溫度加熱 〇 82·如申凊專利範圍第81項所述之製造聚合物薄膜之方 法,其中: 10 該被沈積之薄膜係於約80°C至約130°C之溫度加熱 〇 83·如申請專利範圍第82項所述之製造聚合物薄膜之方 法,其中: 該被沈積之薄膜係於約12〇°C之溫度加熱。 15 84·一種製造光活性薄膜之方法,包含: 使半導體-奈米結晶分散於半導性共軛聚合物以提 供聚合物-奈米結晶之複合物,及 沈積該複合物之薄膜,如此,該奈米結晶係以大於 5重量%埋於聚合物内,其中 2〇 該半導體-奈米結晶之至少一部份係具有大於2之縱橫 比。 85.如申請專利範圍第84項所述之製造光活性薄膜之方法 ,其中: 該半導體-奈米結晶之至少一部柃总目士 L 丨伤係具有大於約5之縱 1245819 、申請專利箪ΐ圍 橫比。 86·如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導體-奈米結晶之至少一部份係具有大於約1〇之縱 5 橫比。 87_如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導體-奈米結晶之至少一部份係具有約5與約5〇間 之縱橫比。 87.如申請專利範圍第料項所述之製造光活性薄膜之方法, 其中: 該半導體-奈米結晶之至少一部份係具有約2與約1〇間 之縱橫比。 89·如申請專利範圍第84項所述之製造光活性薄膜之方法, 15 其中: 該半導性共軛聚合物具有約5與約9 9重量%之埋於其内 之半導體-奈米結晶。 9〇·如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 2〇 於 該半導性共軛聚合物具有約20與95重量%之埋於其内 之半導體-奈米結晶。 •如申明專利範圍第項所述之製造光活性薄膜之方法, 其中: 该半導性共軛聚合物具有約5〇與95重量%之埋於其内 1245819 拾、申請專利範圍 之半導體-奈米結晶。 92 ·如申请專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導性共軛聚合物具有約90重量%之埋於其内之半 5 導體-奈米結晶。 93·如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導性共輛聚合物係選自反式-聚乙快、聚吨洛、聚 噻吩、聚苯胺、聚(對-伸笨基)及聚(對-伸苯基_伸乙烯基) 10 、聚芴、聚芳香族胺、聚(伸嚷嗯基-伸乙烯基)及其可溶性 衍生物所組成之族群。 94.如申請專利範圍第93項所述之製造光活性薄膜之方法, 其中: 該共軛聚合物係選自(聚(2-甲氧基5-(2,-乙基己基氧) 15 對-伸苯基伸乙烯基)(MEH-PPV)及聚(3-己基噻吩)(P3HT)所 組成之族群。 95·如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導體-奈米結晶包含具有大於約2〇 nm長度之棒。 2〇 96·如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中: 該半導體-奈米結晶包含具有約2〇 nm與約200 nm間長 度之棒。 97·如申請專利範圍第96項所述之製造光活性薄膜之方法, 1245819 拾、申請專利範圍 其中: 該半導體-奈米結晶包含具有約60 nm與約110 nm間長 度之棒。 98. 如申請專利範圍第84項所述之製造光活性薄膜之方法, 5 其中: 該半導體-奈米結晶包含約7 nm X 60 nm之棒。 99. 如申請專利範圍第84項所述之製造光活性薄膜之方法, 其中= 該半導體-奈求結晶包含選自II-VI族、III-V族、IV族 10 之半導體及三級雲母銅礦所組成之族群之半導體。 100. 如申請專利範圍第99項所述之製造光活性薄膜之方法 ,其中: 該半導體-奈米結晶係選自CdSe、CdTe、InP、GaAs、 CuInS2、CuInSe2、AlGaAs、InGaAs、Ge及 Si所組成之族 15 群。 101. 如申請專利範圍第84項所述之製造光活性薄膜之方法 ,其中: 該半導體-奈米結晶係選自CdSe及CdTe所組成之族群 〇 20 102.如申請專利範圍第84項所述之製造光活性薄膜之方法 ,其中: 該半導體·奈米結晶之一部份係分支狀奈米結晶。 103.如申請專利範圍第102項所述之製造光活性薄膜之方法 ,其中: 1245819 拾、申請專利範圍 該刀支狀奈米結晶之-部份具有至少二臂,該臂 相同長度。 104.如中請專利範圍第1G2項所述之製造光活性薄膜之方法 ’其中· 5 δ亥分支狀奈米結晶非皆具有相同形狀。 105·如申請專利範圍第1〇2項所述之製造光活性薄膜之方法 ,其中: ^ 該分支狀奈米結晶具有4臂且具有四面體對稱。 106. 如申請專利範圍第1〇5項所述之製造光活性薄膜之 10 ,其中: ' 該分支狀奈米結晶係CdSe或CdTe,且係以約9〇重量% 之量被埋入。 107. 如申請專利範圍第84項所述之製造光活性薄膜之方法 ,其中: * 15 該薄膜具有約100 nm至約350 nm之厚度。 108. 如申請專利範圍第1〇7項所述之製造光活性薄膜之方法 ,其中: 該薄膜具有約2〇0 nm之厚度。 109·如申晴專利範圍第84項所述之製造光活性薄膜之方 20 法,其中: 該半導體-奈米結晶及該半導性聚合物被共同溶解 於二元溶劑混合物, 該二元溶劑混合物包含至少一選自吡啶、氯仿、甲 苯、二甲苯、己烷、水、二氯苯、THF、二氯甲笨、燒 1245819 拾、申請專利範圍 基胺(其中,烷基鏈可為分支狀或未被分支,且長度係2 與20個間之碳原子)、丁醇、曱醇及異丙醇之溶劑。 no.如申請專利範圍第109項所述之製造光活性薄膜之 方法,其中 該二7L溶劑混合物之濃度係約i與約15體積%之間 〇 U1·如申請專利範圍第110項所述之製造光活性薄膜之 方法,其中: 该二70溶劑混合物之濃度係約4與約12體積%之間 〇 112·如申請專利範圍第111項所述之製造光活性薄膜之 方法,其中: 該二元溶劑混合物之濃度係約8體積0/〇。 113·如申請專利範圍第109項所述之製造光活性薄膜之 方法,其中: 該一元溶劑混合物包含於氣仿内之σ比啶。 114.如申請專利範圍第84項所述之製造光活性薄膜之方 法,其中: 遠被沈積之薄膜係於約60°C至約200。(:之溫度加熱 〇 11 5·如申請專利範圍第以項所述之製造光活性薄膜之方 法,其中: 該被沈積之薄膜係於約8(TC至約130°C之溫度加熱 1245819 拾、申請專利範圍 116·如申請專利範圍第84項所述之製造光活性薄膜之方 法,其中: 該被沈積之薄膜係於約120°C之溫度加熱。 117·—種光生伏打裝置,包含: 5 一共軛導性聚合物層,其具有分散於其内之半導 體-奈米結晶,及 該裝置具有於Α·Μ. 1·5全面照明時大於ι%之功率轉化效 率, 其中該半導體-奈米結晶之至少一部份係具有大於 10 約2之縱橫比。 11 8·如申請專利範圍第117項所述之光生伏打裝置,其 中: 該裝置具有大於5 %之功率轉化效率 其中 15 該半導體-奈米結晶之至少一部份係具有大於約2之 縱橫比。 119.如申请專利範圍第Π8項所述之光生伏打裝置,其 中: 該裝置具有大於10%之功率轉化效率。 2〇 120.如申请專利範圍第117項所述之光生伏打裝置,其 中: 該裝置具有約1%與約30%間之功率.轉化效率。 121·如申5青專利範圍第120項所述之光生伏打裝置,其 中: 1245819 拾、申請專利範圍 該裝置具有約2%與約30%間之功率轉化效率。 如申凊專利範圍第121項所述之光生伏打裝置,其 中: ’、 該裝置具有約5%與約15%間之功率轉化效率。 5 123·如申請專利範圍第Π7項所述之光生伏打裝置,其 中: ’、 該裴置具有約1.7%之功率轉化效率。 124·如申請專利範圍第ιΐ7項所述之光生伏打裝置,其 中: ’、 1〇 該半導體-奈米結晶之至少一部份係具有大於約5之縱 橫比。 125.如申睛專利範圍第丨17項所述之光生伏打裝置,其中: 該半導體-奈米結晶之至少一部份係具有大於約1〇之縱 橫比。 15丨26·如申請專利範圍第117項所述之光生伏打裝置,其中: 忒半導體奈米結晶之至少一部份係具有約5與約50間 之縱横比。 127·如申請專利範圍第117項所述之光生伏打裝置,其中: 11亥半導體-奈米結晶之至少一部份係具有約2與約丨〇間 2〇 之縱橫比。 128.如申請專利範圍第117項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約5與約99重量%之埋於其内 之半導體-奈米結晶。 129·如申請專利範圍第117項所述之光生伏打裝置,其中: 1245819 拾、申請專利範圍 該半‘性共輕聚合物具有約2〇與95重量%之埋於其内 之半導體-奈米結晶。 130·如申請專利範圍第117項所述之光生伏打裝置,其中: 该半導性共軛聚合物具有約5〇與95重量%之埋於其内 5 之半導體-奈米結晶。 131·如申請專利範圍第117項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約9〇重量%之埋於其内之半 導體·•奈米結晶。 132.如申請專利範圍第117項所述之光生伏打裝置,其中: 10 該半導性共軛聚合物係選自反式-聚乙炔、聚吡咯、聚 噻吩、聚苯胺、聚(對-伸苯基)及聚(對_伸苯基_伸乙烯基) 、聚芴、聚芳香族胺、聚(伸噻嗯基-伸乙烯基)及其可溶性 衍生物所組成之族群。 133·如申請專利範圍第132項所述之光生伏打裝置,其中: 15 該共軛聚合物係選自(聚(2-曱氧基5-(2,-乙基己基氧) 對-伸笨基伸乙烯基)(MEH-PPV)及聚(3-己基嚷吩)(P3HT)所 組成之族群。 134·如申請專利範圍第117項所述之光生伏打裝置,其中: 该半導體-奈米結晶包含具有大於約20 nm長度之棒。 20 135·如申請專利範圍第117項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有約20 nm與約200 nm間長 度之棒。 136·如申請專利範圍第135項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有約60 nm與約110 nm間長 1245819 拾、申請專利範圍 度之棒。 137·如申請專利範圍第117項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含約7 nm x 60 nm之棒。 如申請專利範圍第117項所述之光生伏打裝置,其中: 5 該半導體-奈米結晶包含選自II-VI族、m-v族、1¥族 之半導體及三級雲母銅礦所組成之族群之半導體。 139.如申請專利範圍第138項所述之光生伏打裝置,其中: 該半導體-奈米結晶係選自CdSe、CdTe、lnp、GaAs、 CuInS2、CuInSe2、AlGaAs、InGaAs、Ge及 Si所組成之族 10 群。 140·如申請專利範圍第117項所述之光生伏打裝置,其中·· 該半導體-奈米結晶係選自CdSe&CdTe所組成之族群 〇 141.如申請專利範圍第117項所述之光生伏打裝置,其中: 15 該半導體-奈米結晶之一部份係分支狀奈米結晶。 142·如申睛專利範圍第141項所述之光生伏打裝置,其中·· 该分支狀奈米結晶之一部份具有至少二臂,該臂非皆 相同長度。 143·如申睛專利範圍第141項所述之光生伏打裝置,其中·· ° 5亥分支狀奈米結晶非皆具有相同形狀。 144·如申請專利範圍第141項所述之光生伏打裝置,其中: 5亥分支狀奈米結晶具有4臂且具有四面體對稱。 145·如申請專利範圍第144項所述之光生伏打裝置,其中: 該分支狀奈米結晶係CdSe或CdTe,且係以約90重量% 1245819 拾、申請專利範圍 之量被埋入。 146. 如申請專利範圍第117項所述之光生伏打裝置,其中: 該薄膜具有約100 nm至約350 nm之厚度。 147. 如申請專利範圍第146項所述之光生伏打裝置,其中: 5 该薄膜具有約200 nm之厚度。 148·—種光生伏打裝置,包含: 一第一平面電極, 一薄膜,其包含具有埋於内之半導體-奈米結晶之 半導性共軛聚合物,該薄膜被沈積於該第一平面電極 10 上,及 一第二電極,其係相對於該第一電極,及 一電子孔注射層,其被置於該薄膜聚合物層及該第一 平面電極之間, 其中該半導體_奈米結晶之至少一部份係具有大於 15 約2之縱橫比。 149. 如申請專利範圍第148項所述之光生伏打裝置,其 中: 該電子孔注射層包含PEDOT:PSS。 150. 如申請專利範圍第149項所述之光生伏打裝置,其 20 中: 該第一電極包含ITO且該第二電極包含A1。 151·如申請專利範圍第148項所述之光生伏打裝置,其中· Λ半‘體-奈米結晶之至少一部份係具有大於約5之縱 橫比。 1245819 拾、申請專利範圍 152·如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶之至少一部份係具有大於約1〇之縱 橫比。 153·如申請專利範圍第148項所述之光生伏打裝置,其中: 5 °亥半導體·奈米結晶之至少一部份係具有約5與約50間 之縱橫比。 154.如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶之至少一部份係具有約2與約丨〇間 之縱橫比。 10 155·如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約5與約99重量%之埋於其内 之半導體-奈米結晶。 156·如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導性共軛聚合物具有約20與95重量%之埋於其内 15 之半導體-奈米結晶。 157·如申請專利範圍第148項所述之光生伏打裝置,其中: 该半導性共軛聚合物具有約50與95重量%之埋於其内 之半導體-奈米結晶。 158·如申請專利範圍第148項所述之光生伏打裝置,其中: 20 該半導性共軛聚合物具有約90重量%之埋於其内之半 導體-奈米結晶。 159·如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導性共軛聚合物係選自反式-聚乙炔、聚吡咯、聚 噻吩、聚苯胺、聚(對-伸苯基)及聚(對-伸苯基_伸乙烯基) 1245819 拾、申請專利範圍 、聚芴、聚芳香族胺、聚(伸噻嗯基-伸乙烯基)及其可溶性 衍生物所組成之族群。 160. 如申請專利範圍第159項所述之光生伏打裝置,其中: 該共軛聚合物係選自(聚(2-甲氧基5-(2’-乙基己基氧) 5 對-伸苯基伸乙烯基)(MEH-PPV)及聚(3-己基噻吩)(P3HT)所 組成之族群。 161. 如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有大於約50 nm長度之棒。 162. 如申請專利範圍第148項所述之光生伏打裝置,其中: 10 該半導體-奈米結晶包含具有約20 nm與約200 nm間長 度之棒。 163. 如申請專利範圍第162項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含具有約60 nm與約110 nm間長 度之棒。 15 164.如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含約7 nm X 60 nm之棒。 165.如申請專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶包含選自II-VI族、III-V族、IV族 之半導體及三級雲母銅礦所組成之族群之半導體。 20 166.如申請專利範圍第165項所述之光生伏打裝置,其中: 該半導體-奈米結晶係選自CdSe、CdTe、InP、GaAs、 CuInS2、CuInSe2、AlGaAs、InGaAs、Ge及 Si所組成之族 群。 167.如申請專利範圍第148項所述之光生伏打裝置,其中: 1245819 拾、申請專利範圍 °玄半導體-奈米結晶係選自CdSe及CdTe所組成之族群 〇 168·如申凊專利範圍第148項所述之光生伏打裝置,其中: 該半導體-奈米結晶之一部份係分支狀奈米結晶。 5 169·如申睛專利範圍第168項所述之光生伏打裝置,其中: 5亥分支狀奈米結晶之一部份具有至少二臂,該臂非皆 相同長度。 Π0.如申請專利範圍第169項所述之光生伏打裝置,其中: 該分支狀奈米結晶非皆具有相同形狀。 10 171·如申凊專利範圍第169項所述之光生伏打裝置,其中: 该分支狀奈米結晶具有4臂且具有四面體對稱。 172·如申請專利範圍第171項所述之光生伏打裝置,其中: 該分支狀奈米結晶係CdSe或CdTe,且係以約90重量% 之量被埋入。 15 173·如申請專利範圍第148項所述之光生伏打裝置,其中: 該薄膜具有約1〇〇 nm至約350 nm之厚度。 174. 如申請專利範圍第173項所述之光生伏打裝置,其中: 該薄膜具有約2〇0 nm之厚度。 175. —種薄膜,包含: 20 聚合物’其具有埋於其内之奈米結, 其中該半導體-奈米結晶之至少一部份係具有大於 約2之縱橫比晶。 176·種製^薄膜之方法,包含一或更多之下列步驟: (a)以溶劑清洗奈米結晶至少一次; 1245819 拾、申請專利範圍 (b)使該經清洗之奈米結 生混合物;及 晶及聚合物 溶於溶劑内產 (C)沈積該混合物, 其中該半導體-奈米結晶之至少一 八〆 4份係具有大於 約2之縱橫比。 177.—種光生伏打裝置,包含: 一聚合物層’其具有分散於其内之奈米纟士曰, 其中該半導體-奈米結晶之至少一部份係具有大於 約2之縱橫比。 10 178.—種光生伏打裝置,包含: 一第一電極, 一薄膜,包含位於該第一電極上之聚合物,及 第二電極, 其中該半導體-奈米結晶之至少一部份係具有大於 15 約2之縱橫比。Patent Application No. 92106081 Patent Application Amendment to Patent Scope June 10, 19941. A thin film comprising: a semiconducting conjugated polymer having at least 5% by weight of semiconductor-nanocrystals buried therein, Wherein, at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 2. 2. The film according to item 1 of the scope of patent application, wherein: at least a part of the semi-V-body-nanocrystal has an aspect ratio greater than about 5. 10 3. The thin film according to item 1 of the scope of patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 10. 4. The thin film according to item 1 of the scope of the patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio of about 5 to about 50. 5. The thin film according to item 丨 of the patent application scope, wherein: at least a part of the semiconductor-nano crystal has an aspect ratio between about 2 and about 10. 6.  The film according to item 1 of the scope of the patent application, wherein: ′ The semiconducting polymer has about 5 to about 99% by weight of semiconductor-nanocrystalline crystals buried therein. 7.  The thin film described in item 1 of the scope of the patent application, wherein the semiconductor polymer has approximately 20 and 95% by weight of semiconductor-nanocrystalline crystals buried therein. 1245819 Patent application scope 8.  The film according to item 1 of the patent application range, wherein: the semiconducting conjugated polymer has about 50 and 95% by weight of semiconductor-nanocrystals buried therein. 9.  The film as described in the item of the scope of the patent application, wherein: 5 the semiconductive conjugated polymer has approximately 90% by weight of semiconductor-nanocrystals buried therein. 10. The film according to item i in the scope of the patent application, wherein: the semiconductive conjugated polymer is selected from the group consisting of trans-polyacetylene, polypyrrole, polythiophene, polyaniline, and poly (p-phenylene) And poly (p-phenylene_ethenyl) 10, polygo, polyaromatic amine, poly (hexyl · ethylene) and its soluble derivatives. 11 · The film according to item 丨 0 of the patent application scope, wherein: the conjugated polymer is selected from (poly (2-methoxy 5_ (2, _ethylhexyloxy) p-phenylene vinylene ) (MEH_PPV) and poly (3-hexylthiophene) (p3HT) m 15. 12.  The thin film as described in item 1 of the patent application scope, wherein: 3 semiconductor-nanocrystals include rods having a length greater than about 20 nm. 13.  The film as described in the scope of the patent application, wherein: The Hei semiconductor-nano crystal contains a rod having a length of 20 degrees between about 20 nm and about 200 nm. 14. The thin film according to item 13 of the scope of the patent application, wherein the semiconductor-nanocrystal contains a rod having a length between about 60 and about 110. 15. The thin film described in item 1 of the scope of patent application, wherein 1245819, the scope of patent application The semi-V-body-nanocrystal contains a rod of about 7 nm x go nm. 16. The thin film according to item 1 of the scope of the patent application, wherein: the semi-'body-nano crystal comprises a semiconductor selected from the group consisting of a semiconductor of a family, a family, a family, and a tertiary mica copper ore. 17. The thin film according to item 16 of the scope of the patent application, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, A1GaAs, osmium, Ge & si. 18. The film according to item i in the scope of the patent application, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe & CdTe. 19 · The film according to item i in the scope of patent application, wherein: Part of the semiconductor-nanocrystal is a branched nanocrystal. 20. The film as described in item 19 of the Shenjing patent scope, wherein: a part of the knife-shaped nanocrystal has at least two arms, and the arms are not all the same length. 21 · The film according to item 19 of the scope of patent application, wherein: the branched nanocrystals all have the same shape. 22. The film according to item 19 in the scope of patent application, wherein: the branched nanocrystal has four arms and has tetrahedral symmetry. 23. The thin film according to item 22 of the scope of patent application, wherein: dagger-like nanocrystalline CdSe or CdTe is buried, and is embedded in an amount of about 90% by weight. 24. The film according to item 1 of the scope of patent application, wherein: Ϊ245819, patent application scope The film has a thickness of about 100 nm to about 350 nm. 25. The thin film according to item 22 of the scope of patent application, wherein: the far film has a thickness of about 200 nm. 26. A photovoltaic device comprising: 5 The film according to item 1 of the scope of patent application. 27. The photovoltaic device according to item 26 of the scope of the patent application, wherein at least a portion of the semiconductor-nanocrystal has an aspect ratio greater than about 5. 28. The photovoltaic device according to item 26 of the scope of the patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 〇. 29. The photovoltaic device according to item 26 of the Shen Qing patent scope, wherein: at least a part of the semiconductor-nano crystal has an aspect ratio between about 5 and about 50. 15 30. The photovoltaic device according to item 26 of the scope of the patent application, wherein: at least a part of the semiconductor-naira crystal has an aspect ratio between about 2 and about 10. 31. The photovoltaic device according to item 26 of the scope of the patent application, wherein: the semiconductive conjugated polymer has about 5 and about 99% by weight of semiconductor-nano crystals buried therein. 32. The photovoltaic device according to item 26 of the scope of the patent application, wherein: the semiconducting conjugated polymer has approximately 20 and 95% by weight of semiconductor-nanocrystals embedded therein. 33. The photovoltaic device according to item 26 of the scope of patent application, wherein: 1245819 The scope of patent application This semiconducting co-polymer has about 50 and 95% by weight of the semiconductor buried in it. Rice crystals. 34_ The photovoltaic device according to item 26 of the scope of patent application, wherein: the semiconducting polymer has approximately 90% by weight of a semiconductor-nanocrystal buried therein. 35. The photovoltaic device according to item 26 of the scope of application for a patent, wherein: the semiconductive conjugated polymer is selected from the group consisting of trans-polyacetylene, polypyrrole, polythiophene, polyaniline, poly (p-elongation Phenyl) and poly (p-phenylene-vinylidene), I, polyaromatic amine, poly (vinyl-vinylidene) and its soluble 10 derivatives. 36. The photovoltaic device according to item 35 of the scope of patent application, wherein: the conjugated polymer is selected from the group consisting of (poly (2-fluorenyloxy 5- (2, -ethylhexyloxy) -phenylene) Group consisting of vinylidene group (MEH-PPV) and poly (3-hexylthiophene) (p3HT). 15 37. The photovoltaic device according to item 26 of the scope of the patent application, wherein: the semiconductor-nanocrystal includes a rod having a length greater than about 20 nm. 38. The photovoltaic device according to item 26 of the scope of the patent application, wherein: the semiconductor semiconductor-nanocrystal includes a rod having a length between about 20 nm and about 200 nm. 20 39. The photovoltaic device according to item 38 of the scope of patent application, wherein: the semiconductor-nanocrystal includes a rod having a length between about 60 nm and about 110 nm. 40. The photovoltaic device according to item 26 of the patent application scope, wherein: the 5H semiconductor-nano crystal contains a rod of about 7 nm X 60 nm. 1245819 Scope of patent application 41.  The photovoltaic device according to item 26 of the scope of patent application, wherein: the semiconductor-nano crystal comprises a group selected from the group consisting of III-V, III-V, IV semiconductors, and tertiary mica copper ore Of semiconductors. 42.  The photovoltaic device according to item 41 of the scope of patent application, wherein the semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs, Ge, and Si. Ethnic group. 43.  The photovoltaic device as described in claim 26, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe and CdTe 10 ° 44.  The photovoltaic device according to item 26 of the patent application scope, wherein: a part of the semiconductor-nano crystal is a branched nano crystal. 45.  The photovoltaic device according to item 44 of the scope of the patent application, wherein: a part of the branched nanocrystal has at least two arms, and the arms are not all the same length. 46.  The photovoltaic device according to item 44 of the patent application scope, wherein: the branched nanocrystals all have the same shape. 47.  The photovoltaic device according to item 44 of the patent application scope, wherein: the branched nanocrystal has four arms and has tetrahedral symmetry. 20 48. The photovoltaic device according to item 47 of the scope of the patent application, wherein: the branched nanocrystalline system is CdSe or CdTe, and is embedded in an amount of about 90% by weight. 49. The photovoltaic device according to item 26 of the application, wherein: the film has a thickness of about 100 nm to about 350 nm. 1245819 Patent application scope 50. The photovoltaic device according to item 49 of the patent application scope, wherein: the film has a thickness of about 200 nm. 51. A method for manufacturing a polymer film, comprising: washing a surfactant-coated semiconductor-nanocrystal at least 5 times with a solvent, and dissolving the cleaned semiconductor-nanocrystal and a semiconductive polymer together Yu Yiwu's cereal mixture, and the mixture is deposited, wherein at least a part of the semiconductor-nanocrystal has an aspect ratio of greater than about 2 to 10 in length. 52. The method for manufacturing a polymer film as described in claim 51 of the patent scope, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 5. 15 53. The method for manufacturing a polymer film as described in item 51 of the scope of patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 丨 0. 54. The method for manufacturing a polymer film as described in item 51 of the scope of the patent application, 20 wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio between about 5 and about 50. 55. The method for manufacturing a polymer film as described in item 51 of the scope of patent application, wherein: 1245819, the scope of patent application: At least the aspect ratio of the semiconductor-nanocrystal. The part has about 2 and about 10 56. As described in the 51st patent scope of the application, among which: the method of manufacturing a polymer film, the semiconducting conjugated polymer has a semiconductor-nanometer of about 5 and about crystallization. 99% by weight is buried therein. 5 The method for manufacturing a polymer film as described in item 51 of the patent #patent, where: the semiconducting conjugated polymer has about 20 and 95% by weight Within 10 semiconductor-nanocrystals. 58. The method for manufacturing a polymer film as described in claim 51 of the scope of patent application, wherein: the semiconducting conjugated polymer has approximately 50% and 95% by weight of semiconductor · nanocrystals embedded therein. 15 59. The method for manufacturing a polymer film according to item 51 of the scope of the patent application, wherein: the semiconductive conjugated polymer has about 90% by weight of semiconductor-nanocrystals buried therein. 60. The method for manufacturing a polymer film according to item 51 of the scope of the patent application, 20 wherein: the semiconductive conjugated polymer is selected from the group consisting of trans-polyacetylene, polypyrrole, polyfluorene, polyaniline, polyaniline (P-phenylene) and poly (p-phenylene-phenylene), polyfluorene, polyaromatic amines, poly (butylene-phenylene) and its soluble derivatives. 1245819 Patent application scope 61 · The method for manufacturing a polymer film as described in item 60 of the scope of patent application, wherein: the conjugated polymer is selected from (polymethoxy 5_ (2, -ethylhexyloxy) A group consisting of p-phenylene vinylene (KMEH-PPV) and poly (3-hexylthiophene) (P3HT). 62. The method for manufacturing a polymer film as described in claim 51 of the scope of patent application, wherein: the semiconductor-nanocrystal includes a rod having a length greater than about 20 nm. 63. The method for manufacturing a polymer film according to item 51 of the scope of the patent application, 10 wherein: the semi-v-body-nanocrystal includes a rod having a length between about 20 nm and about 200. 64. The method for manufacturing a polymer film as described in item 63 of Shen Qing's patent scope, wherein: the semiconductor-nanocrystal includes a rod having a length between about 60 nm and about 110. 65. The method for manufacturing a polymer film according to item 51 of the scope of the patent application, wherein: the semiconductor-nano crystal contains a rod of about 7 nm × 60 nm. 2066, The method for manufacturing a polymer film as described in item 51 of the scope of the patent application, wherein: 夂 ', the semiconductor_nano crystal comprises a + conductor selected from the ηνι family wealth family and a third-grade mica copper ore Of semiconductors. , 67. The method for manufacturing a polymer thin film as described in item 66 of the scope of patent application, 1245819, the scope of the application for patents among which: πHai semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs , Ge, and Si. 5 68. The method for manufacturing a polymer film according to item 51 of the patent application, wherein: the semiconductor and the nanocrystal are selected from the group consisting of CdSe and CdTe. Of thin film, 10 Among them: A part of the semiconductor-nano crystal is branched nano crystal. 70. The method for manufacturing a polymer film as described in item 69 of the scope of the patent application, wherein: a part of the scabbard-like nanocrystal has at least two arms, and the arms are not all the same length. 71. The method for manufacturing a polymer film according to item 69 of the scope of the patent application, wherein: the branched nanocrystals all have the same shape. 72. The method for manufacturing a polymer film as described in item 69 of the scope of the application for patent, wherein 0: the annihilated nanocrystal has four arms and has tetrahedral symmetry. Yes. The method for manufacturing a polymer film according to item 73 of the scope of patent application, wherein: the branched nanocrystalline system is CdSe or CdTe, and is embedded in an amount of about 90% by weight 1245819 and the scope of patent application. 74. The method for manufacturing a polymer film as described in claim 51 of the scope of patent application, wherein: the film has a thickness of about 100 nm to about 350 nm2. 5 75. The method for manufacturing a polymer film as described in item 74 of Shenqing Patent, wherein: the film has a thickness of about 200 nm. 76. The method for manufacturing a polymer film according to item 51 of the scope of patent application, wherein: 10 the binary solvent mixture contains at least one selected from the group consisting of pyridine, aeroform, toluene, xylene, hexane, water, and dioxin 2, digas toluene and alkylamine (wherein the alkyl group may be branched or unbranched, and the length is between 2 and 20 carbon atoms), a solvent of butanol, methanol and isopropanol. 77. Method 15 for manufacturing a polymer film as described in item 5 of the patent application scope, wherein: the concentration of the binary solvent mixture is between about 1 and about 15% by volume. The method for manufacturing a polymer film according to item 2, wherein: 20 The concentration of the binary solvent mixture is between about 4 and about 12% by volume. 79. The method for manufacturing a polymer film according to item 78 of the scope of patent application Where the concentration of the binary solvent mixture is about 8% by volume. 1245819 Pick up and apply for patent fg around 80. The method for manufacturing a polymer film as described in item 76 of the scope of patent application, wherein: the binary solvent mixture contains a σ specific bite in aerosol. 81. The method for manufacturing a polymer film as described in item 51 of the scope of patent application, wherein: the deposited film is about 60. 〇 to about 200 ° C heating 82. The method of manufacturing a polymer film as described in the 81st patent scope of the patent, wherein: 10 The deposited film is at about 80 ° C to about 130 ° C Temperature heating 83. The method for manufacturing a polymer film as described in item 82 of the scope of patent application, wherein: the deposited film is heated at a temperature of about 120 ° C. 15 84. A method of manufacturing a photoactive film, comprising: dispersing semiconductor-nano crystals in a semiconducting conjugated polymer to provide a polymer-nano crystal composite, and a film that deposits the composite, and so on, The nanocrystalline is buried in the polymer at more than 5% by weight, and at least a part of the semiconductor-nanocrystalline has an aspect ratio of greater than 2. 85. The method for manufacturing a photoactive film as described in item 84 of the scope of patent application, wherein: at least a part of the semiconductor-nano crystal 柃 heads L 丨 has a vertical length of 1245819 greater than about 5, the patent application is Aspect ratio. 86. The method for manufacturing a photoactive film according to item 84 of the scope of the patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio of greater than about 10. 87_ The method for manufacturing a photoactive film according to item 84 of the scope of the patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio between about 5 and about 50. 87. The method for manufacturing a photoactive film as described in the item of the scope of patent application, wherein: at least a part of the semiconductor-nano crystal has an aspect ratio between about 2 and about 10. 89. The method for manufacturing a photoactive film according to item 84 of the scope of the patent application, 15 wherein: the semiconductive conjugated polymer has about 5 to about 99% by weight of semiconductor-nanocrystals buried therein . 90. The method for manufacturing a photoactive film according to item 84 of the scope of the patent application, wherein: 20 the semiconductor conjugated polymer has approximately 20 to 95% by weight of semiconductor-nanometers embedded therein crystallization. • The method for manufacturing a photoactive film as described in the item of the declared patent scope, wherein: the semiconducting conjugated polymer has approximately 50 and 95% by weight of 1245819 buried semiconductor-nai Rice crystals. 92. The method for producing a photoactive film according to item 84 of the scope of the patent application, wherein: the semiconductive conjugated polymer has about 90% by weight of a semiconducting-nanocrystalline crystal buried therein. 93. The method for manufacturing a photoactive film according to item 84 of the scope of application for a patent, wherein: the semiconductive polymer is selected from the group consisting of trans-polyethylene, polytonol, polythiophene, polyaniline, poly (P-phenylene) and poly (p-phenylene-phenylene) 10, polyfluorene, polyaromatic amine, poly (phenylene-phenylene) and its soluble derivatives . 94. The method for manufacturing a photoactive film according to item 93 of the scope of patent application, wherein: the conjugated polymer is selected from (poly (2-methoxy5- (2, -ethylhexyloxy) 15 p-elongation A group consisting of phenyl vinylene (MEH-PPV) and poly (3-hexylthiophene) (P3HT). 95. The method for manufacturing a photoactive film according to item 84 of the scope of patent application, wherein: Nanocrystals include rods having a length greater than about 20 nm. 2096. The method of manufacturing a photoactive film as described in item 84 of the patent application scope, wherein: the semiconductor-nanocrystals include A rod with a length of about 200 nm. 97. The method for manufacturing a photoactive film as described in item 96 of the scope of patent application, 1245819, and the scope of patent application where: The semiconductor-nanocrystal includes Time length 98.  According to the method for manufacturing a photoactive film described in item 84 of the scope of patent application, 5 wherein: the semiconductor-nanocrystal contains a rod of about 7 nm X 60 nm. 99.  The method for manufacturing a photoactive thin film as described in item 84 of the scope of the patent application, wherein = the semiconductor-neo crystal includes a semiconductor selected from group II-VI, group III-V, group IV 10 and a third-grade mica copper mine The semiconductors that make up the group. 100.  The method for manufacturing a photoactive film according to item 99 of the scope of patent application, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs, Ge, and Si 15 groups. 101.  The method for manufacturing a photoactive film according to item 84 of the patent application scope, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe and CdTe 〇 20 102. The method for manufacturing a photoactive film according to item 84 of the patent application scope, wherein: a part of the semiconductor · nanocrystal is a branched nanocrystal. 103. The method for manufacturing a photoactive film as described in item 102 of the scope of patent application, wherein: 1245819, the scope of the patent application The part of the knife-shaped nanocrystal has at least two arms, and the arms have the same length. 104. The method for manufacturing a photoactive film as described in item 1G2 of the Chinese Patent Application ′, wherein all of the 5 δHai branched nanocrystals have the same shape. 105. The method for manufacturing a photoactive film according to item 102 of the scope of patent application, wherein: ^ the branched nanocrystal has four arms and has tetrahedral symmetry. 106.  The photoactive thin film 10 as described in item 105 of the application patent scope, wherein: 'The branched nanocrystalline is CdSe or CdTe, and is embedded in an amount of about 90% by weight. 107.  The method for manufacturing a photoactive film according to item 84 of the patent application scope, wherein: * 15 The film has a thickness of about 100 nm to about 350 nm. 108.  The method for manufacturing a photoactive film as described in the scope of patent application No. 107, wherein: the film has a thickness of about 200 nm. 109. The method 20 for manufacturing a photoactive film according to item 84 of the Shen Qing patent scope, wherein: the semiconductor-nano crystal and the semiconducting polymer are co-dissolved in a binary solvent mixture, and the binary solvent The mixture contains at least one selected from the group consisting of pyridine, chloroform, toluene, xylene, hexane, water, dichlorobenzene, THF, dichloromethane, fired 1245819, and patented patented amines (wherein the alkyl chain may be branched Or unbranched, with a length between 2 and 20 carbon atoms), butanol, methanol and isopropanol. no. The method for manufacturing a photoactive film according to item 109 of the patent application, wherein the concentration of the 27L solvent mixture is between about i and about 15% by volume. A method for an active film, wherein: The concentration of the two 70 solvent mixture is between about 4 and about 12% by volume. 112. The method for manufacturing a photoactive film according to item 111 of the patent application scope, wherein: the binary solvent The concentration of the mixture is about 8 vol. 113. The method for manufacturing a photoactive film according to item 109 of the scope of patent application, wherein: the one-component solvent mixture contains σ-pyridine in aerosol. 114. The method for manufacturing a photoactive film according to item 84 of the patent application scope, wherein: the film to be deposited is about 60 ° C to about 200 ° C. (: Heating at temperature 011 5) The method for manufacturing a photoactive film as described in item 1 of the scope of the patent application, wherein: the deposited film is heated at a temperature of about 8 (TC to about 130 ° C) 1245819, Patent application range 116 · The method for manufacturing a photoactive film as described in item 84 of the patent application range, wherein: the deposited film is heated at a temperature of about 120 ° C. 117 · —a photovoltaic device, including: 5 a conjugated conductive polymer layer having semiconductor-nano crystals dispersed therein, and the device having  1.5 The power conversion efficiency is greater than 1% at full illumination, wherein at least a part of the semiconductor-nanocrystal has an aspect ratio greater than 10 to about 2. 11 8 · The photovoltaic device according to item 117 of the scope of patent application, wherein: the device has a power conversion efficiency of greater than 5%, of which 15 at least a part of the semiconductor-nano crystal has an aspect ratio greater than about 2 ratio. 119. The photovoltaic device according to item No. Π8 of the patent application scope, wherein: the device has a power conversion efficiency of greater than 10%. 2〇 120. The photovoltaic device according to item 117 of the patent application scope, wherein: the device has a power between about 1% and about 30%. Conversion efficiency. 121. The photovoltaic device as described in item 120 of the scope of Shen 5 Qing patent, in which: 1245819, patent application scope This device has a power conversion efficiency between about 2% and about 30%. The photovoltaic device according to item 121 of the patent application scope of the application, wherein: ′, the device has a power conversion efficiency between about 5% and about 15%. 5 123. The photovoltaic device according to item 7 of the scope of the patent application, wherein: ′, The Pei Zhi has about 1. 7% power conversion efficiency. 124. The photovoltaic device according to item 7 of the scope of the patent application, wherein: ′, 10 At least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 5. 125. The photovoltaic device according to item 17 of the patent application, wherein: at least a part of the semiconductor-nanocrystal has an aspect ratio greater than about 10. 15 丨 26. The photovoltaic device according to item 117 of the scope of patent application, wherein: 至少 At least a part of the semiconductor nanocrystal has an aspect ratio between about 5 and about 50. 127. The photovoltaic device according to item 117 of the scope of patent application, wherein: at least a part of the 11H semiconductor-nano crystal has an aspect ratio of about 2 to about 20. 128. The photovoltaic device according to item 117 of the patent application scope, wherein: the semiconductive conjugated polymer has about 5 and about 99% by weight of semiconductor-nanocrystals buried therein. 129. The photovoltaic device according to item 117 of the scope of patent application, wherein: 1245819 The scope of the patent application The semi-co-light polymer has approximately 20% and 95% by weight of semiconductor-naphthalene buried therein. Rice crystals. 130. The photovoltaic device according to item 117 of the scope of patent application, wherein: the semiconducting conjugated polymer has approximately 50 and 95% by weight of semiconductor-nano crystals buried therein. 131. The photovoltaic device according to item 117 of the scope of patent application, wherein: the semiconducting conjugated polymer has approximately 90% by weight of a semiconductor buried therein. Nanocrystals. 132. The photovoltaic device according to item 117 of the patent application scope, wherein: 10 the semiconductive conjugated polymer is selected from the group consisting of trans-polyacetylene, polypyrrole, polythiophene, polyaniline, poly (p-phenylene) Groups) and poly (p-phenylene-phenylene), polyfluorene, polyaromatic amines, poly (phenylene-phenylene) and its soluble derivatives. 133. The photovoltaic device according to item 132 of the scope of patent application, wherein: 15 the conjugated polymer is selected from (poly (2-fluorenyloxy 5- (2, -ethylhexyloxy)) A group consisting of benzylic vinyl) (MEH-PPV) and poly (3-hexylmethylphene) (P3HT). 134. The photovoltaic device according to item 117 of the scope of patent application, wherein: the semiconductor-nai The rice crystal includes a rod having a length greater than about 20 nm. 20 135. The photovoltaic device according to item 117 of the scope of patent application, wherein: the semiconductor-nano crystal contains a crystal having a length between about 20 nm and about 200 nm. 136. The photovoltaic device according to item 135 of the scope of patent application, wherein: the semiconductor-nano crystal includes a rod having a length of 1245819 between about 60 nm and about 110 nm, and a scope of patent application. 137 · The photovoltaic device according to item 117 of the patent application scope, wherein: the semiconductor-nano crystal contains a rod of about 7 nm x 60 nm. The photovoltaic device according to item 117 of the patent application scope, wherein: 5 The semiconductor-nano crystal contains a group selected from group II-VI, group mv, 1 ¥ Group of semiconductors and semiconductors of the group consisting of tertiary mica copper ore. 139. The photovoltaic device according to item 138 of the patent application scope, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, lnp, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs, Ge, and Si10 group. 140. The photovoltaic device according to item 117 of the scope of patent application, wherein the semiconductor-nano crystal system is selected from the group consisting of CdSe & CdTe. 141. The photovoltaic device according to item 117 of the patent application scope, wherein: 15 A part of the semiconductor-nano crystal is a branched nano crystal. 142. The photovoltaic device as described in item 141 of the Shin-Ken patent scope, wherein a part of the branched nanocrystal has at least two arms, and the arms are not all the same length. 143. The photovoltaic device described in item 141 of the Shenjing patent scope, wherein the branched nanocrystals of 5 ° H all have the same shape. 144. The photovoltaic device according to item 141 of the scope of patent application, wherein: the 5 nm branched nanocrystal has 4 arms and has tetrahedral symmetry. 145. The photovoltaic device according to item 144 of the scope of patent application, wherein: the branched nanocrystalline system is CdSe or CdTe, and is embedded in an amount of about 90% by weight of 1245819 and the scope of patent application. 146.  The photovoltaic device according to item 117 of the application, wherein: the film has a thickness of about 100 nm to about 350 nm. 147.  The photovoltaic device according to item 146 of the scope of patent application, wherein: 5 the film has a thickness of about 200 nm. 148 · A photovoltaic device, comprising: a first planar electrode, a thin film comprising a semiconducting conjugated polymer having a semiconductor-nano crystal buried therein, the thin film being deposited on the first plane On the electrode 10, and a second electrode, which is opposite to the first electrode, and an electron hole injection layer, which is placed between the thin film polymer layer and the first planar electrode, wherein the semiconductor_nanometer At least a portion of the crystals have an aspect ratio of greater than 15 to about 2. 149.  The photovoltaic device according to item 148 of the patent application scope, wherein: the electron hole injection layer comprises PEDOT: PSS. 150.  The photovoltaic device according to item 149 of the patent application scope, wherein 20: the first electrode includes ITO and the second electrode includes A1. 151. The photovoltaic device according to item 148 of the scope of patent application, wherein at least a part of the Λ half 'body-nano crystal has an aspect ratio greater than about 5. 1245819 Patent application scope 152. The photovoltaic device according to item 148 of the patent application scope, wherein: at least a part of the semiconductor-nano crystal has an aspect ratio greater than about 10. 153. The photovoltaic device according to item 148 of the scope of patent application, wherein: at least a part of the 5 ° semiconductor semiconductor nanocrystal has an aspect ratio between about 5 and about 50. 154. The photovoltaic device according to item 148 of the patent application scope, wherein: at least a part of the semiconductor-nano crystal has an aspect ratio between about 2 and about 〇. 10 155. The photovoltaic device according to item 148 of the scope of patent application, wherein: the semiconductive conjugated polymer has about 5 to about 99% by weight of semiconductor-nanocrystals buried therein. 156. The photovoltaic device according to item 148 of the scope of patent application, wherein: the semiconducting conjugated polymer has approximately 20 and 95% by weight of semiconductor-nano crystals buried therein. 157. The photovoltaic device according to item 148 of the scope of patent application, wherein: the semiconductive conjugated polymer has about 50 to 95% by weight of semiconductor-nanocrystals buried therein. 158. The photovoltaic device according to item 148 of the scope of patent application, wherein: 20 the semiconductive conjugated polymer has approximately 90% by weight of semiconductor-nanocrystals buried therein. 159. The photovoltaic device according to item 148 of the scope of patent application, wherein: the semiconducting conjugated polymer is selected from the group consisting of trans-polyacetylene, polypyrrole, polythiophene, polyaniline, and poly (para-elongation) Phenyl) and poly (p-phenylene_vinyl) 1245819, patent application scope, polyfluorene, polyaromatic amine, poly (thienyl-vinyl) and its soluble derivatives Ethnic group. 160.  The photovoltaic device according to item 159 of the application, wherein: the conjugated polymer is selected from (poly (2-methoxy5- (2'-ethylhexyloxy) 5 A group consisting of vinyl) (MEH-PPV) and poly (3-hexylthiophene) (P3HT). 161.  The photovoltaic device according to item 148 of the patent application scope, wherein: the semiconductor-nanocrystal includes a rod having a length greater than about 50 nm. 162.  The photovoltaic device according to item 148 of the scope of patent application, wherein: 10 the semiconductor-nanocrystal comprises a rod having a length between about 20 nm and about 200 nm. 163.  The photovoltaic device according to item 162 of the patent application scope, wherein: the semiconductor-nano crystal includes a rod having a length between about 60 nm and about 110 nm. 15 164. The photovoltaic device according to item 148 of the patent application scope, wherein: the semiconductor-nano crystal includes a rod of about 7 nm X 60 nm. 165. The photovoltaic device according to item 148 of the patent application scope, wherein: the semiconductor-nano crystal includes a group selected from the group consisting of II-VI, III-V, IV semiconductors, and tertiary mica copper ore Of semiconductors. 20 166. The photovoltaic device according to item 165 of the application, wherein: the semiconductor-nano crystal system is selected from the group consisting of CdSe, CdTe, InP, GaAs, CuInS2, CuInSe2, AlGaAs, InGaAs, Ge, and Si. 167. The photovoltaic device according to item 148 of the patent application scope, wherein: 1245819, patent application scope ° Xuan semiconductor-nano crystal system is selected from the group consisting of CdSe and CdTe. The photovoltaic device according to the item, wherein: part of the semiconductor-nanocrystal is a branched nanocrystal. 5 169. The photovoltaic device according to item 168 of the Shen Jing patent scope, wherein: a part of the 5 nm branched nanocrystal has at least two arms, and the arms are not all the same length. Π0. The photovoltaic device according to item 169 of the patent application scope, wherein: the branched nanocrystals all have the same shape. 10 171. The photovoltaic device according to item 169 of the patent application, wherein: the branched nanocrystal has four arms and has tetrahedral symmetry. 172. The photovoltaic device according to item 171 of the scope of patent application, wherein: the branched nanocrystalline system is CdSe or CdTe, and is embedded in an amount of about 90% by weight. 15 173. The photovoltaic device according to item 148 of the scope of patent application, wherein: the film has a thickness of about 100 nm to about 350 nm. 174.  The photovoltaic device according to item 173 of the patent application scope, wherein: the film has a thickness of about 2000 nm. 175.  A thin film comprising: 20 polymer 'having a nano junction buried therein, wherein at least a portion of the semiconductor-nano crystal has an aspect ratio crystal greater than about 2. 176. A method for making a thin film, including one or more of the following steps: (a) washing the nanocrystals at least once with a solvent; 1245819, applying for patent scope (b) making the cleaned nanostructured mixture; The crystals and polymers are dissolved in a solvent to produce the mixture (C), wherein the semiconductor-nanocrystal has at least one eighteenth of four parts having an aspect ratio greater than about two. 177. A photovoltaic device, comprising: a polymer layer having nanometers dispersed therein, wherein at least a portion of the semiconductor-nanocrystal has an aspect ratio greater than about 2. 10 178. A photovoltaic device, comprising: a first electrode, a thin film including a polymer on the first electrode, and a second electrode, wherein at least a portion of the semiconductor-nanocrystal has a diameter greater than about 15 Aspect ratio of 2.
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