TWI232993B - Projection optics apparatus and thereof display device and thereof manufacturing method - Google Patents

Projection optics apparatus and thereof display device and thereof manufacturing method Download PDF

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Publication number
TWI232993B
TWI232993B TW92114645A TW92114645A TWI232993B TW I232993 B TWI232993 B TW I232993B TW 92114645 A TW92114645 A TW 92114645A TW 92114645 A TW92114645 A TW 92114645A TW I232993 B TWI232993 B TW I232993B
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Taiwan
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optical
item
patent application
scope
light
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TW92114645A
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Chinese (zh)
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TW200519511A (en
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Sean Chang
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Delta Electronics Inc
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Priority to TW92114645A priority Critical patent/TWI232993B/en
Priority to JP2003299704A priority patent/JP2004326069A/en
Priority to US10/828,080 priority patent/US7102819B2/en
Priority to DE102004019112A priority patent/DE102004019112A1/en
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Publication of TWI232993B publication Critical patent/TWI232993B/en
Publication of TW200519511A publication Critical patent/TW200519511A/en
Priority to US11/483,023 priority patent/US20060250693A1/en

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Abstract

An optics display device comprises an optics focusing structure, an optics panel, and a light-absorbed layer. The optics focusing structure comprises a plurality of micro-optics focusing component. The light-absorbed layer is between the optics focusing structure and the optics panel. The light-absorbed layer has a plurality of optics transmission windows. Those optics transmission windows are corresponded with those micro-optics focusing component. Those optics transmission windows are formed by using optics exposed method.

Description

1232993 -—--案號 92114645__年月 曰 各,下____ 五、發明說明(1) " 【技術領域】 本發明係關於一種投影光學裝置以及其光學投影顯示 構件及製造方法,特別是關於一種具有高對比度的投影光 學裝置以及其光學投影顯示構件及製造方法。 【先前技術】 現今顯示器之趨勢係朝向輕薄化、大尺寸化發展,在 此種發展趨勢下,由於投影顯示器具有厚度薄、尺寸大等 優點,因而投影顯示器係逐漸取代傳統電視而成為顯示器 之主流商品之一。在投影顯示器之種類中,又以 示器為最重要。 ^ 能^現今的背投式_中’其螢幕具有下列主要的功: 大 (1)用以擴大可視範圍。以使顯示器之觀看視角增 避免顯示器内部零件受到外 (2 )用以保護顯示器。以 界灰塵、水氣所影響。 (3 )用以控制外部雜#止μ 比度 丨雜政先的反射。以提高顯示器之對 現今之螢幕製作枯分千從从、 . 較高的有效光穿透率的課達題成上上述 理想的效果。 的课通上’目剛的螢幕均無法有較為1232993 ----- case number 92114645__ year and month, each ____ five, description of the invention (1) " [Technical Field] The present invention relates to a projection optical device, its optical projection display member and manufacturing method, in particular The invention relates to a projection optical device with high contrast, an optical projection display member and a manufacturing method thereof. [Previous technology] The current trend of displays is toward thin and light, large size. Under this development trend, due to the advantages of thin thickness and large size of the projection display, the projection display gradually replaced the traditional TV and became the mainstream of the display. One of the goods. Of the types of projection displays, the monitor is the most important. ^ Can ^ Today's rear-projection type _ 'screen has the following main functions: Large (1) Used to expand the visible range. In order to increase the viewing angle of the display, the internal parts of the display are prevented from being exposed (2) to protect the display. Influenced by dust and water vapor. (3) Used to control the external miscellaneous #stop μ ratio 丨 miscellaneous reflection. In order to improve the display quality of today's screens, the problem of higher effective light transmittance is the above ideal effect. On the class lesson ’s screen, no screen can be compared

1232993 _ 案號 92114645_年月日__^ 五、發明說明(2) 100係在光學面板102與光學球104之間加上一層光吸收物 質層1 0 6,以藉此光吸收物質層1 0 6吸收外部雜散光並防止 其反射,同時藉由光學球104及光學面板1〇2將光線之角度 擴大,以增大可視範圍。 然而’在此技術中具有一個先天上的限制,亦即當光 從背面以垂直角度入射時,其可輕易地穿透整個勞幕(如 第1圖所示)。而當光線以一定夾角θ入射時,則很容易被 光吸收物質層106吸收,進而降低其穿透率(如第2圖所 示)。由第1圖與第2圖可知,光線之入射角度0愈大,其 所需面對之光吸收物質層106之厚度會從L1增大為,如、 此則會大幅降低整個螢幕100效率,甚至影響整個螢幕1〇〇 度。如同第3圖所示’以現有技術而言,光線自光 子又’v、、且件1〇8射至螢幕1〇〇的入射角度0將高達2〇度至3〇 度左右’故前述現象實不容忽視。 【内容】 因此,為解決上述問題,本發 一 ...... ^ ^ W 1尔提出 顯不構件,以同時提高對比度與顯示效率。 降低Jim 出一種光學投影顯示構件,以大幅 啤似表w成本及製造時間。 拎大ί ϊ尺i發:再提出一種投影光學裝置,“更進-步 ::寸’並同時提高對比度與顯示效率。 投影顒示構t ^::提供一種光學投影顯示構件,此光學 二:學聚焦結構、光學面板及光吸收 千來焦、,、。構係具有多個微光學聚焦元件。光吸收1232993 _ Case No. 92114645_ Year Month Day __ ^ V. Description of the invention (2) 100 is a layer of light absorbing material 1 0 6 added between the optical panel 102 and the optical ball 104, so that the light absorbing material layer 1 0 6 absorbs external stray light and prevents its reflection. At the same time, the angle of the light is enlarged by the optical ball 104 and the optical panel 102 to increase the visible range. However, there is an inherent limitation in this technology, that is, when the light is incident at a perpendicular angle from the back, it can easily penetrate the entire curtain (as shown in Figure 1). When the light is incident at a certain angle θ, it is easily absorbed by the light absorbing material layer 106, thereby reducing its transmittance (as shown in Fig. 2). As can be seen from Figs. 1 and 2, the larger the incident angle 0 of the light, the thickness of the light absorbing material layer 106 it needs to face will increase from L1 to, for example, this will greatly reduce the efficiency of the entire screen 100, It even affects the entire screen by 100 degrees. As shown in Figure 3, 'In the conventional technology, the light from the photon is again' v ', and the incident angle 0 of the piece 108 to the screen 100 will be as high as 20 to 30 degrees, so the aforementioned phenomenon It cannot be ignored. [Content] Therefore, in order to solve the above problems, the present invention ...... ^ ^ W 1 proposed a display component to improve the contrast and display efficiency at the same time. Reduce Jim to produce an optical projection display component to greatly reduce the cost and manufacturing time.拎 大 ί ϊ Rule i: Propose a projection optical device, "one step further :: inch" and improve the contrast and display efficiency at the same time. Projection display structure t ^ :: Provide an optical projection display component, this optical two : Learn focusing structure, optical panel and light absorption Qianlaijiao ,,, .. The structure has multiple micro-optical focusing elements. Light absorption

第7頁 1232993 ---案號 92114645_: 五、發明說明(3) 層係位於光學聚焦結構與光 穿透視窗,光學穿透視窗分 應’其中,光學穿透視窗係 本發明另提供一種光學 示構件係具有光學聚焦結構 具有多個微光學聚焦元件。 構的焦點附近,且具有多個 散反射窗分別與微光學聚焦 散反射窗係以光學曝光顯影 再者,於上述本發明之 在光學聚焦結構與光吸收層 料層。 在上述本發明之光學投 視窗或光學擴散反射窗的方 學穿透視窗或光學擴散反射 艰焦結構後聚焦的光點位置 擴散反射窗之形狀係與前述 另外’本發明再提供_ 有光學投影組件及光學投影 構件具有光學聚焦結構、光 組件係用以提供光學影像光 以接收來自光學投影組件之 係具有多個微光學聚焦元件 構與光學面板之間,且具有 L 月 日__修正 —______ 學面板之間,且具有多個光學 別與微光學聚焦元件相互對 以光學曝光顯影法所形成。 投影顯示構件,此光學投影顯 及光吸收層。光學聚焦結構係· 一光吸收層,位於光學聚焦結 光學擴散反射窗,前述光學擴 元件相互對應,其中,光學擴 法所形成。 光學投影顯示構件中,也可以 之間形成一層光學擴散穿透材 影顯示構件中,形成光學穿透, 式係為曝光顯影法。另外,光 窗位置係隨著光線照射到光學 而變,且光學穿透視窗或光學 光線之光道形狀相對應。 種投影光學裝置,此裝置係具 顯示構件,其中光學投影顯示 學面板及光吸收層。光學投影 束。光學投影顯示構件則是用 光學影像光束。光學聚焦結構 。光吸收層係位於光學聚焦結 多個光學穿透視窗,此光學穿:Page 71232993 --- Case No. 92114645_: V. Description of the invention (3) The layer system is located in the optical focusing structure and the light transmission window, and the optical transmission window is divided into 'the optical transmission window system of the present invention provides another optical The display member has an optical focusing structure and a plurality of micro-optical focusing elements. Near the focal point of the structure, there are a plurality of diffuse reflection windows and micro-optical focusing. The diffuse reflection windows are developed by optical exposure. Furthermore, in the above-mentioned present invention, the optical focusing structure and the light absorbing material layer. The shape of the diffused reflection window at the position of the focused spot after the optical transmission window or optical diffusion reflection window of the above-mentioned optical projection window or optical diffusion reflection window of the present invention is the same as the above-mentioned "the present invention provides _ with optical projection The module and the optical projection member have an optical focusing structure. The optical module is used to provide optical image light to receive light from the optical projection module. The system has multiple micro-optical focusing elements between the optical panel and the optical panel. ______ It is formed by optical exposure and development method with multiple optical panels and micro-optical focusing elements facing each other. A projection display member. This optical projection displays a light absorbing layer. Optical focusing structure system · A light absorbing layer is located at the optical focusing junction and the optical diffusion reflection window. The aforementioned optical expansion elements correspond to each other. Among them, the optical expansion method is formed. In the optical projection display member, a layer of optical diffusion penetrating material may be formed between the optical projection display member and the optical penetrating member to form optical penetration. In addition, the position of the light window changes as the light hits the optical, and the shape of the optically penetrating window or the track of the optical light corresponds. A projection optical device is provided with a display member, in which an optical projection display panel and a light absorbing layer are provided. Optical projection beam. Optical projection display components use optical image beams. Optical focusing structure. The light absorbing layer is located in the optical focusing junction.

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焦元件相互對應,其中,光學穿透 法所形成 供一種投 投影顯示 及光吸收 學投影顯 像光束。 吸收層, 擴散反射 相互對應 形成。 學投影顯 的方式係 反射窗位 位置而變 前述光線 明之光學 其中超薄 菲涅耳透 供一種光 學聚焦結 焦元件, 接著,進 有光學視 五、發明說明(4) 透視窗分別與微光學聚 視窗係以光學曝光顯影 另外’本發明另提 有光學投影組件及光學 構件具有光學聚焦結構 提供光學影像光束。光 光學投影組件之光學影 微光學聚焦元件。一光 附近,且具有多個光學 分別與微光學聚焦元件 係以光學曝光顯影法所 在上述本發明之光 視窗或光學擴散反射窗 學穿透視窗或光學擴散 水焦結構後聚焦的光點 擴散反射窗之形狀係與 另外,在上述本發 有一個超薄型放大鏡, 像片(Hologram)型式或 再者,本發明另提 法,首先,提供一個光 上形成有多個微光學聚 上形成光敏感材料層。 感材料層中形成多個呈 影光學裝置,此裝置係具 構件’其中光學投影顯示 層。光學投影組件係用以 示構件則是用以接收來自 光學聚焦結構係具有多個 位於光學聚焦結構的焦點 窗,前述光學擴散反射窗 ’其中,光學擴散反射窗 示構件中, 為曝光顯影 置係隨著光 ,且光學穿 之光道形狀 投影顯示構 型放大鏡之 鏡(Fresne 1 學投影顯示 構,且在此 之後,於此 行曝光顯影 窗形狀的圖 形成光 法。另 線照射 透視窗 相對應 件中, 型式可 lens) 構件的 光學聚 光學聚 步驟, 案,再 學穿透 外,光 到光學 或光學 〇 更包括 以為全 型式。 製造方 焦結構 焦結構 於光敏 移除部The focal elements correspond to each other. Among them, the optical transmission method forms a light beam for projection projection display and light absorption projection projection. Absorptive layers and diffuse reflections are formed corresponding to each other. The method of learning projection display is to change the position of the reflection window to change the aforementioned bright optics. The ultra-thin Fresnel lens provides an optical focusing and focusing element. Then, there is optical vision. 5. Description of the invention (4) The perspective window is focused with micro-optics. The window is developed by optical exposure. In addition, the invention also provides an optical projection component and an optical component with an optical focusing structure to provide an optical image beam. Optical projection of optical projection components. Micro-optical focusing element. Near a light, and having a plurality of optical and micro-optical focusing elements, the light window or optical diffusion reflection window of the present invention, where the optical exposure and development method is located, penetrates the window or the optical diffusion water-focus structure, and diffuses and reflects the focused light points. The shape of the window is the same as above. In the above-mentioned present invention, there is an ultra-thin magnifying glass, a Hologram type, or another method of the present invention. First, a plurality of micro-optical lenses are formed on the light to form light. Layer of sensitive material. A plurality of rendering optical devices are formed in the sensing material layer, and the device is provided with a member 'therein an optical projection display layer. The optical projection module is used to show that the component is used to receive a plurality of focus windows from the optical focusing structure system. The aforementioned optical diffusion reflection window is used for the exposure and development system. With the light, and the shape of the optical passage through the projection display configuration configuration of the mirror of the magnifying glass (Fresne 1 projection projection display structure, and after that, in this line, the image of the developing window shape is formed by the optical method. The other line illuminates the perspective window phase In the corresponding part, the optical condensing and optical condensing steps of the lens) component can be learned, and the light can be transmitted to the optical or optical side. The full type is also included. Manufacturing side Focus structure Focus structure In the photosensitive removal section

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分光敏感材料層,以於光敏感材料層内形成多 視窗形狀的圖案區塊。 〜 另外’在上述本發明之光學投影顯示構件的方法 中,光敏感材料層係為一個光敏感材料層,其形^ 法係 以塗佈光阻劑的方式所形成。再者,在上述本發光學 投影顯示構件的製造方法中,也可以於圖案區塊中形成材 料層,甚至於此材料層及光敏感材料層上形成一個光學面 板。當光敏感材料層之材質包括光吸收物質時,前述材料 層係為光學穿透材料層或光學擴散反射材料層。 再者,在上述本發明之光學投影顯示構^的製造方法 中,於圖案區塊中形成材料層後,也可以移除光敏感材料 層,並於移除之部位形成另一材料層,甚至於前述材料層 上形成一個光學面板。 另外,在上述本發明之光學投影顯示構件的製造方法 中,前述曝光顯影步驟可以於預設使用光源位置上提供曝 光光源,此曝光光源經光學聚焦結構聚焦於光敏感材料 層。其中,此光敏感材料層所使用之光阻劑係正光阻劑或 負光阻劑,另外,移除部分光敏感材料層的方法係移除已 曝光之光敏感材料層或是未曝光之該光敏感材料層。$ 綜上所述,在本發明之光學投影顯示構件,由於是其 光學穿透視窗或光學擴散反射窗之形成方式係為光學曝^ 顯影的方式’且其曝光光源係位於此光學投影顯示構件之 預设燈源的位置’因此此光學穿透視窗之形狀、位置係與 入射之光束經該光學聚焦結構聚焦後的光線通道相互吻The light-sensitive material layer is divided to form a multi-window-shaped pattern block in the light-sensitive material layer. ~ In addition, in the above-mentioned method of the optical projection display member of the present invention, the light-sensitive material layer is a light-sensitive material layer, and its shape is formed by coating a photoresist. Furthermore, in the above-mentioned manufacturing method of the projection projection display member of the present invention, a material layer may be formed in the pattern block, and even an optical panel may be formed on the material layer and the light-sensitive material layer. When the material of the light-sensitive material layer includes a light-absorbing substance, the aforementioned material layer is an optically transmissive material layer or an optically diffused reflective material layer. Furthermore, in the above-mentioned manufacturing method of the optical projection display structure of the present invention, after forming the material layer in the pattern block, the light-sensitive material layer may be removed, and another material layer may be formed at the removed portion, or even An optical panel is formed on the aforementioned material layer. In addition, in the manufacturing method of the optical projection display member of the present invention, the exposure and development step may provide an exposure light source at a preset light source position, and the exposure light source is focused on the light-sensitive material layer through the optical focusing structure. Wherein, the photoresist used in the photo-sensitive material layer is a positive photoresist or a negative photoresist. In addition, a method of removing a part of the photo-sensitive material layer is to remove an exposed photo-sensitive material layer or an unexposed photo-sensitive material layer. Light-sensitive material layer. In summary, in the optical projection display member of the present invention, since the optical transmission window or the optical diffusion reflection window is formed in an optical exposure method, and the exposure light source is located in the optical projection display member, The position of the preset light source '. Therefore, the shape and position of this optical transmission window are in agreement with the light channel of the incident beam after it is focused by the optical focusing structure.

第10頁 1232993 五、發明說明(6) 而得到大幅提高顯示效率 再者’由於在預設之不透光區形成有光吸收物質層, 以有效地吸收來自外界之雜散光或氺* 土邀机二組 合,故可完全避免來自預設燈源的光受到不必要的損耗, 而得到大幅提高顯示效率。 订a ―、卜明叹〜π μ〜=v从啕光吸收物質層 因此可以有效地吸收來自外界之雜散光或來自光學投影組 件中之雜散光’甚至當外界入射光射入此光學投影^ ^構 件後,也可以因折射率之緣故,而將其偏折至光吸收物質 層,如此即可大幅提高對比度。 、 由於本發明之光學投影顯示構件的光學穿透視窗 學擴散反射窗係藉由簡易之光學曝光顯影原理而輕易完 定位,因此也可以大幅降低製造成本與時間。 另外,由於本發明之光學投影顯示構件之 散反射窗之形狀、尺寸係隨著光入射角的變: 時’光學穿透視窗或光學擴散反射 面積維持在最小尺寸。 二予擴政反射®之開口 再者,本發明之投影光學 影顯示構件作為顯示螢 ^ ,由於使用前述光學投 際,同時得到最佳之對.可以在增大顯示尺寸之 為讓本發明之上與顯示效率。 顯易懂,下文特舉一較ς,目的、特徵、和優點能更明 細說明如下·· 貫施例,並配合所附圖式,作詳 【實施方法】 第4圖係繪示本發 如 同 之”、、員不構件的局部示意圖 1232993 曰 修正 j號921遍R 五、發明說明(7) 且:!ΪΓ00係具有光學聚焦結構206、光學 =二:、Λ 視窗208的光吸收物質層2〇4,其 中先子穿透視_ 2 0 8係以光學曝光顯影法所形成。 光學面板202係用以將來自其一側面之/射光從另一 側面放射出去。其作用原理係為藉由光學面板2 〇 2與外界 之空氣介質間的折射率之差異,而使光自光學面板2〇2之 表面射出時產生較大之散射角度,如此即可達到廣視角的 效果。 光學聚焦結構2 0 6係具有多個微光學聚焦元件21〇。每 一微光學聚焦元件210係用以將來自一側之光聚焦於相對 應之另一側,以使入射之光線聚焦於一焦點上。 光吸收物質層2 0 4係位於光學面板2 〇 2與光學聚焦結構 2 0 6之間’其係用以吸收不必要的雜散光線。另外,光吸 收物質層204内具有多個光學穿透視窗2〇8,其中,光學穿 透視窗208之位置係與微光學聚焦元件210之聚焦焦點相互 對應’而且光學穿透視窗2 0 8之材質例如是空氣介質、光 學擴散穿透物質或光學穿透物質。另外,光學穿透視窗 2 0 8之形成方法例如是諸如曝光顯影法等的光學曝光顯影 法。 接著,以第一較佳實施例說明本發明之顯示構件3 〇 〇 之製造方式。請參照第5Α圖,首先提供一個光學聚焦結構 302,且此光學聚焦結構302具有多個微光學聚焦元件 3 1 4。接著,在光學聚焦結構3 〇 2上形成一層光敏感材料層 30 4a,其中光敏感材料層304a内係摻雜有光吸收物質。光 第12頁 1232993Page 101232993 V. Description of the invention (6) The display efficiency has been greatly improved, and further, 'because a light absorbing material layer is formed in a predetermined opaque area to effectively absorb stray light or light from the outside. The combination of the two machines can completely avoid unnecessary loss of light from the preset light source, and greatly improve the display efficiency. Order a ―, Bu Mingtan ~ π μ ~ = v From the light absorption material layer, it can effectively absorb stray light from the outside or stray light from the optical projection component 'even when external incident light enters this optical projection ^ ^ component Later, because of the refractive index, it can also be deflected to the light absorbing material layer, so that the contrast can be greatly improved. As the optical transmission window of the optical projection display member of the present invention is easily positioned by the simple optical exposure and development principle, the manufacturing cost and time can also be greatly reduced. In addition, since the shape and size of the diffuse reflection window of the optical projection display member of the present invention change with the incident angle of light, the 'optical transmission window or optical diffusion reflection area is maintained at the minimum size. The opening of the two-dimensional expansion reflection ® Furthermore, the projection optical shadow display member of the present invention is used as a display screen, because the aforementioned optical communication is used, and the best pair is obtained at the same time. The size of the display can be increased for the purpose of the present invention. Up and display efficiency. It is easy to understand, the following is a special comparison, the purpose, characteristics, and advantages can be explained in more detail as follows: • Implement the example, and cooperate with the attached drawings to detail [Implementation method] Figure 4 shows this hair as Zhi ", a partial schematic diagram of a member without a component 1232993 Amended j number 921 times R V. Description of the invention (7) And: ΪΓ00 is a light absorbing material layer 2 with an optical focusing structure 206, optical = 2 :, Λ window 208 〇4, where the first son through the perspective _ 2 08 is formed by the optical exposure and development method. The optical panel 202 is used to radiate light from one side of the light from the other side. The principle of its function is by The difference in refractive index between the optical panel 2 and the external air medium causes a large scattering angle when the light is emitted from the surface of the optical panel 20, so that a wide viewing angle effect can be achieved. Optical focusing structure 2 The 0 6 series has a plurality of micro-optical focusing elements 21. Each micro-optical focusing element 210 is used to focus light from one side to the corresponding other side, so that incident light is focused on a focal point. The absorbent layer 2 0 4 is located Between the optical panel 2 0 2 and the optical focusing structure 2 06 ', it is used to absorb unnecessary stray light. In addition, the light absorbing material layer 204 has a plurality of optical transmission windows 2 08, in which the optical transmission The position of the see-through window 208 corresponds to the focal point of the micro-optical focusing element 210, and the material of the optical transmission window 208 is, for example, an air medium, an optical diffusion penetrating substance, or an optical penetrating substance. In addition, the optical penetrating window The formation method of 2008 is, for example, an optical exposure development method such as an exposure development method. Next, the manufacturing method of the display member 300 according to the present invention will be described with a first preferred embodiment. Please refer to FIG. 5A, and first provide a An optical focusing structure 302, and the optical focusing structure 302 has a plurality of micro-optical focusing elements 3 1 4. Next, a layer of light-sensitive material 30 4a is formed on the optical focusing structure 3 02, wherein the light-sensitive material layer 304a is doped with Miscellaneous with light absorbing substances. Light Page 12123299

__案號 92114645 五、發明說明(8) 敏感材料層3 0 4a之材料例如是正光敏感材料、 _、 料或含前述任一光敏感材料的光阻劑。 、光敏感材 之後,於預設使用光源位置(約為第6圖所 投影組件310之位置)上設置一曝光光源(未繪尤予 曝光光源例如是UV光源’此曝光光源之發光形式1"’此 投影組件3 1 0之形式相同· 不/、尤予__ Case No. 92114645 V. Description of the invention (8) The material of the sensitive material layer 3 0 4a is, for example, a positive light-sensitive material, a material, or a photoresist containing any of the foregoing light-sensitive materials. After the light-sensitive material, an exposure light source (not shown, especially the exposure light source such as a UV light source, such as a UV light source) is set at a preset light source position (approximately the position of the projection unit 310 in FIG. 6). 'The form of this projection component 3 1 0 is the same.

接著,驅動此曝光光源以使其發射出光線,此光 (如同圖中箭頭所示)以入射角度0的方式入射至光學浐 焦結構3 0 2中,經由其上之微光學聚焦元件3丨4的聚焦二來 用,而於光敏感材料層3〇4a上形成一聚焦光點,並使此部 分之光敏感材料層3 0 4 a曝光。而且,此部分之形狀係與曝 光光源之光道相對應。 ^ 之後’請參照第5 Β圖,移除被曝光之光敏感材料層 30 4a而形成具有多個開口 3〇 6a的光敏感材料層,其中此部 为之光敏感材料層係作為光吸收物質層3 〇 4 b。Next, the exposure light source is driven to emit light, and the light (as shown by the arrow in the figure) is incident into the optical focus structure 3 0 2 at an incident angle of 0, and passes through the micro-optical focusing element 3 丨Focusing of 4 is used to form a focused light spot on the light-sensitive material layer 304a, and the light-sensitive material layer 3 0a of this portion is exposed. Moreover, the shape of this part corresponds to the track of the exposure light source. ^ Afterwards, please refer to FIG. 5B, remove the exposed light-sensitive material layer 30 4a to form a light-sensitive material layer having a plurality of openings 306a, where the light-sensitive material layer is used as a light-absorbing substance Layer 3 0 4 b.

接著’請參照第5C圖,於開口 30 6a中形成光學穿透材 料層’以作為光學穿透視窗3 〇 6b。另外,此光學穿透視窗 26b也可以直接由空氣介質所構成。之後,於光學穿透視 窗3 0 6b及光吸收物質層3〇4b上形成光學面板3〇8。如此即 可完成顯示構件3 〇 〇之製作。 睛參照第6圖,組合上述本發明之顯示構件3 〇 〇與光學 投影組件310即可得到本發明之投影光學裝置312。其中光 學投影組件310係用以提供投影光學裝置312所需的影像光 束。光學投影組件31 〇例如是由用以產生影像之光閥Next, referring to FIG. 5C, an optical transmission material layer is formed in the opening 306a to serve as an optical transmission window 306b. In addition, the optical transmission window 26b may be directly composed of an air medium. Then, an optical panel 308 is formed on the optical transmission window 306b and the light absorbing material layer 304b. In this way, the production of the display member 300 can be completed. Referring to FIG. 6, the above-mentioned display member 300 of the present invention and the optical projection module 310 are combined to obtain the projection optical device 312 of the present invention. The optical projection module 310 is used to provide an image light beam required by the projection optical device 312. The optical projection unit 31 is, for example, a light valve for generating an image.

第13頁 1232993 案说 92114645 年月 曰 條正 五、發明說明(9) (Light Valve)及投影鏡頭所組成,由光閥(Light Valve) 所產生之影像經由投影鏡頭而將影像光束投射至顯示構件 3 0 0,其中此影像光束係以一錐形角度入射至顯示構件 3 0 0。另外,光學投影組件3 1 0也可以僅由用以產生影像光 束的光閥所構成。而顯示構件3 0 〇則可接收前述錐形角度 範圍内的光線,並顯示此光線中所包含的光資訊。 由於本發明之光學穿透視窗3 0 6b在形成之過程中,係 由位於光學投影組件3 1 0的曝光光源所散發出來的光線而 達到圖案化的效果,此曝光光源之發光形式與光學投影組 件3 1 0中所使用之光源相似且其照射角度也與光學投影組 件之照射角度相似’因此曝光光源所射出之光線的光道係 與光學投影組件3 1 0相似’故光學穿透視窗3 〇 & b也與光學 投影組件3 1 0之光源光道形狀相對應。 本發明之一較佳實施方式例如是取一曝光光源,並使 其面積約略等於光閥(Light Valve)之有效面積,且此曝 光光源之位置約略等於光閥所在位置。另取一投影鏡頭使 曝光光源放大約略等於原有使用光閥時之放大率,如此照 射於顯示構件3 0 0之每個位置之曝光光束會大致等於使用 光閥時之影像光束,故由曝光光源形成之光學穿透視窗 304b的位置及大小也就等於使用光閥時之影像光束所須之 叫 v "且首岐者入射并绫之备 度的差異而自動調整。如此,即可在提供聚焦後之光 最大的穿透效果之情形τ,仍可以保持最小的視窗開二面On page 13, 1232993, it is said that it was composed of Article 5 of 92114645, the invention description (9) (Light Valve), and a projection lens. The image produced by the light valve projects the image beam to the display through the projection lens. Component 300, where the image beam is incident on the display component 300 at a cone angle. In addition, the optical projection module 3 10 may be composed of only a light valve for generating an image light beam. The display member 300 can receive light in the aforementioned cone angle range, and displays light information contained in the light. Since the optical penetrating window 3 6b of the present invention is formed in the process of being formed, it is patterned by the light emitted by the exposure light source located at the optical projection component 3 1 0. The light emission form and optical projection of the exposure light source The light source used in the component 3 10 is similar and its illumination angle is similar to that of the optical projection component. 'The light path of the light emitted by the exposure light source is similar to the optical projection component 3 1 0', so the optical transmission window 3 〇 & b also corresponds to the shape of the light source track of the optical projection module 3 10. A preferred embodiment of the present invention is to take an exposure light source and make its area approximately equal to the effective area of a light valve, and the position of the exposure light source is approximately equal to the position of the light valve. Another projection lens is used to make the exposure light source approximately equal to the original magnification when the light valve is used. In this way, the exposure beam irradiated at each position of the display member 300 will be approximately equal to the image beam when the light valve is used. The position and size of the optical transmission window 304b formed by the light source is also equal to v " required for the image beam when the light valve is used, and the difference in readiness of the Shouqi person is adjusted automatically. In this way, in the case of providing the maximum penetration effect of the focused light, τ, the smallest window opening can still be maintained.

1232993 __案號92114645_年月日_^1232993 __Case No. 92114645_year month__

五、發明說明(10) 積0 綜上所述,此顯示構件上之光學穿透視窗之位置與形 狀皆為最佳的,故使用此顯示構件之投影光學裝置可以同 時具有最佳之對比度與顯示效率。 另外,第7A圖至第7E圖所示係為本發明之第二較佳實 施例之顯示構件的製造流程。 首先,請參照第7A圖,提供一個光學聚焦結構4〇2, 且此光學聚焦結構402具有多個微光學聚焦元件412。接 著,在光學聚焦結構402上形成一層光敏感材料層404a, 其中光敏感材料層404a例如是正光敏感材料層、負光敏残 材料層。 之後,於預設使用光源位置(約為第6圖所示之光學 ’投影組件3 1 0之位置)上設置一曝光光源(未繪示),此 曝光光源例如是UV光源,此曝光光源之發光形式係與光學 投影組件3 1 0之形式相同,例如是點光源。 接著,驅動此曝光光源以使其發射出光線,此光線 (如同圖中箭頭所示)以入射角度0的方式入射至光學聚 焦結構4 0 2中,經由其上之微光學聚焦元件4 1 2的聚焦作 用,而於光敏感材料層404a上形成一聚焦光點,並使此部 分之光敏感材料層4 0 4 a曝光。而且,此部分之形狀係與曝 光光源之光道相對應。 之後,請參照第7 B圖,移除未曝光之光敏感材料層 404a而形成暴露出光學聚焦結構402的區域404c的光敏感 材料層404b。接著,請參照第7C圖,於區域404c上形成光V. Description of the invention (10) Product 0 In summary, the position and shape of the optical transmission window on this display member are optimal, so the projection optical device using this display member can have the best contrast and Show efficiency. In addition, FIGS. 7A to 7E show a manufacturing process of a display member according to a second preferred embodiment of the present invention. First, referring to FIG. 7A, an optical focusing structure 402 is provided, and the optical focusing structure 402 has a plurality of micro-optical focusing elements 412. Next, a light-sensitive material layer 404a is formed on the optical focusing structure 402. The light-sensitive material layer 404a is, for example, a positive light-sensitive material layer and a negative photosensitive residual material layer. After that, an exposure light source (not shown) is set at a preset light source position (approximately the position of the optical projection device 3 1 0 shown in FIG. 6). The exposure light source is, for example, a UV light source. The light emitting form is the same as that of the optical projection component 3 10, and is, for example, a point light source. Next, the exposure light source is driven to emit light, and the light (as shown by the arrow in the figure) enters the optical focusing structure 4 0 2 at an incident angle of 0, and passes through the micro-optical focusing element 4 1 2 Focusing effect, a focused light spot is formed on the light-sensitive material layer 404a, and the light-sensitive material layer 40a of this portion is exposed. Moreover, the shape of this part corresponds to the track of the exposure light source. After that, referring to FIG. 7B, the unexposed light-sensitive material layer 404a is removed to form a light-sensitive material layer 404b that exposes the region 404c of the optical focusing structure 402. Next, referring to FIG. 7C, light is formed on the region 404c.

1232993 -------- 案號92114645_年月曰_^_ 五、發明說明(11) 吸收物質層406。 接著,請參照第7D圖,移除殘留之光敏感材料層4〇4b 而形成開口 408a。之後,請參照第7E圖,於開口 408a中形 成光學穿透材料層,以作為光學穿透視窗4〇8b。其中,光 學穿透視窗408b之材質例如是光學擴散穿透物質或光學穿 透物質。另外,此光學穿透視窗4〇8b也可以直接由空氣介 質所構成。之後,於光學穿透視窗4〇8b及光吸收物質層 406上形成光學面板41〇。如此即可完成顯示構件4〇〇之製 作。 再者,當雜散光入射至本發明之顯示構件3 〇 〇、4 〇 〇 時’則會因入射角度與預设之入射角度不同而被光吸收物 質層304b、40 6所吸收,故顯示構件300、400在顯示影像 時,不會受到雜散光之干擾而有較佳之對比度。 另外,本發明雖以具有光學穿透視窗的顯示構件為例 進行說明,然並不以此為限,也可以變更為具有光學擴散 反射窗的顯示構件。請參照第8 A圖,本發明之顯示構件 5 0 0也可以完成前述步驟中之開口 3 0 6a或開口 408a之後, 於開口 3 0 6a、408a中形成光學擴散反射材料層506,如此 即可得到本發明之顯示構件5 0 0。 在此較佳實施例中,光線行進之路徑係自光路丨、2、 3射入光學聚焦結構50 2之微光學聚焦元件508中,並經微 光學聚焦元件508聚焦於光學擴散反射材料層5〇6上。之 後,光學擴散反射材料層50 6將光路1、2、3反射,再經過 光學I焦結構502折射至外界(亦即光路4、5、β、7、只°1232993 -------- Case No. 92114645_Year Month _ ^ _ V. Description of the invention (11) Absorbent material layer 406. Next, referring to FIG. 7D, the remaining photosensitive material layer 404b is removed to form an opening 408a. After that, referring to FIG. 7E, an optical penetrating material layer is formed in the opening 408a as an optical penetrating window 408b. The material of the optical penetrating window 408b is, for example, an optical diffusion penetrating substance or an optical penetrating substance. In addition, the optical transmission window 408b may be directly composed of an air medium. Thereafter, an optical panel 41 is formed on the optical transmission window 408b and the light absorbing material layer 406. In this way, the manufacturing of the display member 400 can be completed. Furthermore, when stray light is incident on the display members 300, 400 of the present invention, it will be absorbed by the light absorbing material layers 304b and 406 because the incident angle is different from a preset incident angle, so the display member 300 and 400 will not be disturbed by stray light and have better contrast when displaying images. In addition, although the present invention is described by taking a display member having an optical transmission window as an example, the present invention is not limited to this, and may be changed to a display member having an optical diffusion reflection window. Referring to FIG. 8A, the display member 500 of the present invention can also complete the opening 3 06a or the opening 408a in the foregoing steps, and then form an optical diffusion reflection material layer 506 in the openings 3 06a and 408a. The display member 50 of the present invention is obtained. In this preferred embodiment, the path of the light travels from the optical path 丨, 2, 3 into the micro-optical focusing element 508 of the optical focusing structure 50 2, and is focused on the optical diffuse reflection material layer 5 through the micro-optical focusing element 508. 〇6 上. After that, the optical diffuse reflection material layer 506 reflects the optical paths 1, 2, and 3, and then refracts to the outside through the optical I-focus structure 502 (that is, the optical paths 4, 5, β, 7, and °).

1232993 修正 案號 92114645 五、發明說明(12) 另外,睛參照第8 B圖,當光路j、2、3以一入射角度0 射入光學聚焦結構5 〇 2時,由於光學擴散反射材料層5 〇 6之 位置在製造之際,係自動隨著入射角度Θ之變化而調整位 置,因此,以入射角度(9射入的光路丨、2、3 物質層504吸收,而可維持較佳之顯示效率。 另外,如同第9圖所示,本發明之顯示構件3〇〇也可以 包括有超薄型放大鏡316,此超薄型放大鏡⑴係為用以提 升投射光線的亮度與均勻度的光學組件。超薄型放大鏡 |16 ^型式例如是全像片(H〇1〇gram)或菲涅耳透 ⑸ lens) 型式。 之顧示構件500 同而被光吸收物 像時,不會受到 以在光學聚焦結 穿透材料層。其 一層光學擴散穿 光學曝光顯影法 構件之另一實例 學面板而得到另 角度不 顯示影 度。 ,也可 學擴散 上塗佈 以上述 之顯示 形成光 我1景彡光學裝置之顯示夫 以此為限,也可以視負 光源。 再者,當外界之雜散光入射至 時’則會因入射角度與預設之入射 質層504所吸收,故顯示構件5〇〇在 外界雜散光之干擾而有較佳之對比 另外,在本發明之顯示構件中 構與光學穿透視窗之間形成一層光 形成方法例如是先在光學聚焦結構 透材料層,再塗佈光阻層。之後, 形成光學穿透視窗,即完成本發明 的結構。另外,在此實例中也可以 一實例的顯示構件之結構。 另外,本發明雖以曝光光源或 源為點光源為例進行說明,然並不 際情形之需要,而改用面光源、線 1232993 _素號 92114645__ 五、發明說明(13) 綜上所述,在本發明之 視窗或光學擴散反射窗之形 且其曝光光源係位於此顯示 此光學穿透視窗之形狀、位 學聚焦結構聚焦後的光束通 自預設燈源的光受到不必要 效率。 再者,由於在預設之不 因此可以有效地吸收來自外 件中之雜散光,甚至當外界 可以因折射率之緣故,而將 即可大幅提高對比度。 由於本發明之顯示構件 射窗係藉由簡易之光學曝光 此也可以大幅降低製造成本 另外,由於本發明之顯 擴散反射窗之形狀、尺寸係 整,因此當顯示構件之顯示 光學擴散反射窗仍可位於最 學穿透視窗或光學擴散反射 __m__ 顯示構件,由於是其光學穿透 成方式係為光學曝光的方式, 構件之預設燈源的位置,因此 置係與預設燈源之光束經該光 道相互吻合,故可完全避免來 的知耗,而得到大幅提高顯示 透光區形成有光吸收物質層, 界之雜散光或來自光學投影組 入射光射入此顯示構件後,也 其偏折至光吸收物質層,如此 的光學穿透視窗或光學擴散反 顯影原理而輕易完成定位,因 與時間。 7構件之光學穿透視窗或光學 11 边著光入射角的變化而自動調 尺寸增大時,光學穿透視窗或 佳之穿透或反射位置,且將光 之開口面積維持在最小尺1232993 Amendment No. 92114645 V. Description of the Invention (12) In addition, referring to FIG. 8B, when the optical paths j, 2, and 3 are incident on the optical focusing structure 5 at an angle of incidence 0, the reflection layer 5 is caused by the optical diffusion. The position of 〇6 is adjusted automatically according to the change of the incident angle Θ at the time of manufacture. Therefore, the material layer 504 absorbs at the incident angle (9 incident light path 丨, 2, 3), and can maintain better display efficiency In addition, as shown in FIG. 9, the display member 300 of the present invention may also include an ultra-thin magnifying glass 316, which is an optical component for improving the brightness and uniformity of the projected light. The ultra-thin type magnifier | 16 ^ type is, for example, a Hologram or Fresnel lens type. When the display member 500 is also imaged by a light absorbing object, it will not be exposed to the optical focusing junction to penetrate the material layer. One layer of optical diffusion penetrates another example of a member of the optical exposure development method to learn a panel and obtain another angle without displaying a shadow. You can also learn to spread the coating on the display to form light as described above. The display of the optical device is limited to this, and you can also view the negative light source. Furthermore, when the external stray light is incident, it will be better compared with the interference of the external stray light of the display member 500 due to the incident angle and the preset incident mass layer 504. In addition, in the present invention, A method for forming a layer of light between the display structure of the display member and the optical transmission window is, for example, firstly transmitting a material layer through the optical focusing structure, and then coating a photoresist layer. After that, an optical transmission window is formed, and the structure of the present invention is completed. In addition, in this example, the structure of a display member of an example is also possible. In addition, although the present invention is described by taking an exposure light source or a source as a point light source as an example, it is not necessary in the circumstances, and a surface light source is used instead. Line 1232993 _ prime number 92114645__ V. Description of the invention (13) In the shape of the window or the optical diffuse reflection window of the present invention, and its exposure light source is located here to show the shape of the optical transmission window, the focused light beam passes through the light from the preset light source and receives unnecessary efficiency. Furthermore, stray light from external parts can be effectively absorbed because of the preset, and even when the outside world can because of the refractive index, the contrast can be greatly improved. Since the display window of the display member of the present invention can greatly reduce the manufacturing cost by simple optical exposure. In addition, the shape and size of the display diffuse reflection window of the present invention are uniform. It can be located in the most transparent transmission window or optical diffuse reflection __m__ display component. Because its optical penetration method is optical exposure, the position of the preset light source of the component, so the beam of the system and the preset light source is placed The optical channels are matched with each other, so the knowledge consumption can be completely avoided, and the display light-transmitting area is formed with a light absorbing material layer. The stray light from the boundary or the incident light from the optical projection group enters the display member. It is deflected to the light absorbing material layer, such optical penetration window or optical diffusion reverse development principle can easily complete positioning, due to time. 7 The optical transmission window of the component or optical 11 Automatically adjusts to the change of the incident angle of the light. When the size increases, the optical transmission window or better penetration or reflection position is maintained, and the opening area of the light is maintained at the minimum rule.

1232993 _案號92114645_年月曰 修正_ 五、發明說明(14) 寸。 再者,本發明之投影光學裝置,由於使用前述顯示構 件作為顯示螢幕,因此可以在增大顯示尺寸之際,同時得 到最佳之對比度與顯示效率。 雖然本發明已以較佳實施例揭露如上5然其並非用以 限定本發明,任何熟習此技藝者,在不脫離本發明之精神 和範圍内,當可作各種之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。1232993 _Case No. 92114645_ Year Month Amendment_ Five. Description of the invention (14) inch. Furthermore, since the projection optical device of the present invention uses the aforementioned display element as a display screen, it is possible to obtain the best contrast and display efficiency while increasing the display size. Although the present invention has been disclosed as above in the preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and retouches without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be determined by the scope of the attached patent application.

第19頁 1232993 _案號92114645_年月日__ 圖式簡單說明 第1圖係繪示習知之顯示螢幕的局部示意圖。 第2圖係繪示光源以0角入射至第1圖之顯示螢幕的示 意圖。 第3圖係繪示習知之投影光學裝置的示意圖。 第4圖係繪示本發明之顯示構件的局部示意圖。 第5A圖至第5C圖係繪示本發明之第一較佳實施例的顯 示構件的製造流程示意圖。 第6圖係繪示本發明之一較佳實施例的投影光學裝置 的示意圖。 第7A圖至第7E圖係繪示本發明之第二較佳實施例的顯 不構件的製造流程不意圖。 第8 A圖係繪示本發明之第三較佳實施例的顯示構件的 局部不意圖。 第8B圖係繪示光源以0角入射至第8A圖之顯示構件的 示意圖。 第9圖係繪示本發明之第一較佳實施例之投影光學裝 置的另一實例的示意圖。 【圖示之符號說明】 1、2、3、4、5、6、7、8、9:光路 100 :螢幕 102 、 202 、 308 、 410 :光學面板 1 0 4 :光學球Page 19 1232993 _Case No. 92114645_Year Month Day__ Brief Description of Drawings Figure 1 shows a partial schematic diagram of a conventional display screen. Figure 2 shows the schematic diagram of the light source incident on the display screen of Figure 1 at an angle of 0. FIG. 3 is a schematic diagram showing a conventional projection optical device. FIG. 4 is a partial schematic view showing a display member of the present invention. 5A to 5C are schematic diagrams showing a manufacturing process of a display member according to the first preferred embodiment of the present invention. Fig. 6 is a schematic diagram showing a projection optical device according to a preferred embodiment of the present invention. 7A to 7E are diagrams showing the manufacturing process of the display member according to the second preferred embodiment of the present invention. Fig. 8A is a partial view of a display member according to a third preferred embodiment of the present invention. Fig. 8B is a schematic diagram showing a light source incident on the display member of Fig. 8A at an angle of 0; Fig. 9 is a schematic diagram showing another example of the projection optical apparatus according to the first preferred embodiment of the present invention. [Illustrated Symbols] 1, 2, 3, 4, 5, 6, 7, 8, 9: Optical path 100: Screen 102, 202, 308, 410: Optical panel 1 0 4: Optical ball

第20頁 1232993 _案號92114645_年月 日_修正 圖式簡單說明 106、204、304b、406、504 :光吸收物質層 1 0 8、3 1 0 :光學投影組件 1 1 0、3 1 2 :投影光學裝置 2 0 0、3 0 0、4 0 0、5 0 0 :顯示構件 2 0 6、3 0 2、4 0 2、5 0 2 :光學聚焦結構 208、30 6b、408b :光學穿透視窗 2 1 0、3 1 4、4 1 2、5 0 8 ··微光學聚焦元件 3 04a、404a、404b :光敏感材料層 306a 、 408a :開口 316 :超薄型放大鏡 4 0 4c :區域 5 0 6 :光學擴散反射材料層 0 :入射角度Page 201232993 _Case No. 92114645_Year Month Date_A brief description of the amendments 106, 204, 304b, 406, 504: Light absorbing substance layer 1 0 8, 3 1 0: Optical projection module 1 1 0, 3 1 2 : Projection optical device 2 0 0, 3 0 0, 4 0 0, 5 0 0: Display member 2 0 6, 3 0 2, 4 0 2, 5 0 2: Optical focusing structure 208, 30 6b, 408b: Optical transmission Perspective window 2 1 0, 3 1 4, 4 1 2, 5 0 8 ·· Micro-optical focusing element 3 04a, 404a, 404b: Photosensitive material layers 306a, 408a: Opening 316: Ultra-thin magnifying lens 4 0 4c: Area 5 0 6: Optical diffuse reflection material layer 0: Incident angle

第21頁Page 21

Claims (1)

1232993 _案號 92114645_年月日__ 六、申請專利範圍 1 . 一種光學投影顯示構件,包括: 一光學聚焦結構,具有複數個微光學聚焦元件;以及 一光吸收層,位於該光學聚焦結構的焦點附近,且具 有複數個光學穿透視窗,該些光學穿透視窗分別與該些微 光學聚焦元件相互對應,其中,該些光學穿透視窗係以一 光學曝光法所形成。 2. 如申請專利範圍第1項所述之光學投影顯示構件, 更包括一光學面板,且該光吸收層係位於該光學聚焦結構 與該光學面板之間。 3. 如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括光學曝光顯影法。 4. 如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括: 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件,且該曝光, 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 5. 如申請專利範圍第4項所述之光學投影顯示構件, 其中該曝光光源係選自點光源、面光源、線光源所組成之 族群其中之一。 6. 如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括: 以一曝光光源產生一光束; 該光束經一曝光投影鏡頭產生一曝光光束;以及1232993 _Case No. 92114645_ 年月 日 __ VI. Patent application scope 1. An optical projection display component includes: an optical focusing structure with a plurality of micro-optical focusing elements; and a light absorbing layer located in the optical focusing structure Near the focal point of the lens, there are a plurality of optical transmission windows, and the optical transmission windows respectively correspond to the micro-optical focusing elements, wherein the optical transmission windows are formed by an optical exposure method. 2. The optical projection display component according to item 1 of the scope of patent application, further comprising an optical panel, and the light absorption layer is located between the optical focusing structure and the optical panel. 3. The optical projection display member according to item 1 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 4. The optical projection display member according to item 1 of the scope of patent application, wherein the optical exposure method comprises: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display member, and the exposure, The angle of the light beam is approximately equal to the angle of the light source of an actual optical projection display image. 5. The optical projection display member according to item 4 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. 6. The optical projection display member according to item 1 of the scope of patent application, wherein the optical exposure method comprises: generating a light beam with an exposure light source; the light beam generating an exposure light beam through an exposure projection lens; and 第22頁 1232993 _ 案號 92114645 六、申請專利範圍 將該曝光光束投射至該光#投影顯示構件,且該曝光 光束角度與一實際光學投影顯系影像來源光束的角度大致 相等。 7 ·如申請專利範圍第6項所述之光學投影顯示構件, 其中該曝光光源係選自點光源、面光源、線光源所組成之 族群其中之一。 8 ·如申請專利範圍第丨項所述之光學投影顯示構件, 其中該些微光學聚焦元件係用以將一入射光束聚焦於該些 光學穿透視窗上。 9 ·如申請專利範圍第8項所述之光學投影顯示構件,: 其中該些光學穿透視窗位置係隨著該入射光束照射到該光 予聚焦結構後聚焦的光點位置而變。 件,2 ·如申請專利範圍第8項所述之光學投影顯示構 學聚^中°亥些光學穿透視窗之形狀係與該入射光束經該光 1、1、、、、。構聚焦後之光道形狀相對應。 件,其中如申請專利範圍第1項所述之光學投影顯示構 ^2 该些光學穿透視窗之材質包括空氣介質。 件,其中如申請專利範圍第1項所述之光學投影顯示構 料。〃该些光學穿透視窗之材質包括光學擴散穿透材 件 件 ,其中/申請專利範圍第1項所述之光學投影顯示構 14忒些光學穿透視窗之材質包括光學穿透材料。 ,更包=2請專利範圍第1項所述之光學投影顯示構 光學擴散穿透材料層,位於該光吸收層與髮Page 22 1232993 _ Case No. 92114645 VI. Patent Application Range The exposure beam is projected onto the light #projection display member, and the angle of the exposure beam is approximately equal to the angle of an actual optical projection display image source beam. 7. The optical projection display member according to item 6 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. 8. The optical projection display component according to item 丨 of the patent application scope, wherein the micro-optical focusing elements are used to focus an incident light beam on the optical transmission windows. 9 · The optical projection display member according to item 8 of the scope of the patent application: wherein the positions of the optical transmission windows change with the positions of the light spots focused after the incident beam is irradiated to the light pre-focusing structure. 2. The shape of the optical transmission windows in the optical projection display structure as described in item 8 of the scope of the patent application, and the shape of the incident light beam passing through the light 1, 1 ,,,,. The shape of the track after focusing is corresponding. The optical projection display structure described in item 1 of the scope of patent application ^ 2 The material of these optical transmission windows includes air medium. The optical projection display material described in item 1 of the scope of patent application. (1) The materials of the optical transmission windows include optical diffusion transmission materials, among which the optical projection display structure described in item 1 of the patent application scope. 14) The materials of the optical transmission windows include optical transmission materials. More package = 2 Please refer to the optical projection display structure described in item 1 of the patent scope. The optical diffusion penetrating material layer is located between the light absorbing layer and the hair 第23頁 1232993 _案號 92114645_主曰 a— ^___ 六、申請專利範圍 光學聚焦結構之間。 15·如申請專利範圍第1項所述之光學投影顯示構 件,更包括一超薄型放大鏡,位於該光學聚焦結構之一入 光側。 16·如申請專利範圍第1 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包栝全像片(Hologram) 型式。 17.如申請專利範圍第1 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包栝菲涅耳透鏡(Fresnel 1 ens) 型式。 1 8 · —種投影光學裝置,包括: 一光學投影組件,係用以提供一光學影像光束;以及 一光學投影顯示構件,用以接收來自該光學投影組件 之違光學影像光束,其中該光學投影顯示構件包括, 一光學聚焦結構,具有複數個微光學聚焦元件,及 …一光吸收層,位於該光學聚焦詰構的焦點附近,且具 有,,個光學穿透視窗,該些光學穿透視窗分別與該些微 光學聚焦元件相互對應,其中,該些光學穿透視窗係以一 光學曝光法所形成。 19·如申請專利範圍第丨8項所述之投影光學裝置,更 包括一光學面板,且該光吸收層係位於該光學聚焦結構與 該光學面板之間。 、 2〇β如申請專利範圍第1 8項所述之投影光學裝置,其: 中忒光學投影組件包括一光閥(Light Valve),用以產生Page 23 1232993 _ Case No. 92114645_ Master said a— ^ ___ 6. Scope of patent application Between optical focusing structures. 15. The optical projection display component according to item 1 of the scope of patent application, further comprising an ultra-thin magnifying glass, which is located on the light incident side of one of the optical focusing structures. 16. The optical projection display device according to item 15 of the scope of the patent application, wherein the ultra-thin magnifying glass includes a Hologram type. 17. The optical projection display component according to item 15 of the scope of patent application, wherein the ultra-thin magnifying glass includes a Fresnel lens (Fresnel 1 ens) type. 18. A projection optical device comprising: an optical projection component for providing an optical image beam; and an optical projection display component for receiving an optical image beam from the optical projection component, wherein the optical projection The display member includes, an optical focusing structure having a plurality of micro-optical focusing elements, and ... a light absorbing layer located near the focal point of the optical focusing structure, and having, an optical transmission window, the optical transmission windows Corresponding to the micro-optical focusing elements, the optical transmission windows are formed by an optical exposure method. 19. The projection optical device according to item 8 of the patent application scope, further comprising an optical panel, and the light absorption layer is located between the optical focusing structure and the optical panel. 2 0β The projection optical device as described in item 18 of the scope of the patent application, wherein: the optical projection component of the 忒 includes a light valve (Light Valve) for generating 第24頁 1232993Page 123232993 "亥光學影像光束。 曰 修正 21·如申請專利範圍第1 8項所述之投影光學裝置’其 中該光學投影組件包括: 一光閥,用以產生一影像;以及 一投影鏡頭,用以接收該影像並輸出該光學影像光 束。 2 2·如申請專利範圍第1 8項所述之投影光學裝置’其 中該光學曝光法包括光學曝光顯影法。" Hai Optical Image Beam. Amendment 21 · The projection optical device described in item 18 of the scope of patent application, wherein the optical projection component includes: a light valve for generating an image; and a projection lens for receiving the image and outputting the optical Image beam. 2 2. The projection optical device according to item 18 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 2 3.如申請專利範圍第1 8項所述之投影光學裝置’其 中該光學曝光法包括: 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 24·如申請專利範圍第23項所述之投影光學裝置’其 中該曝光光源係選自點光源、面光源、線光源所組成之族 群其中之一。2 3. The projection optical device according to item 18 of the scope of patent application, wherein the optical exposure method includes: generating an exposure light beam with an exposure light source; and projecting the exposure light beam onto the optical projection display structure, and the exposure The angle of the light beam is approximately equal to the angle of the light source of an actual optical projection display image. 24. The projection optical device 'according to item 23 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. 25.如申請專利範圍第1 8項所述之投影光學裝置’其. 中该光學曝光法包括: 以一曝光光源產生一光束; 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構’且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致. 相等。25. The projection optical device according to item 18 of the scope of patent application, wherein the optical exposure method includes: generating an exposure light source with an exposure light source; generating the exposure light beam through an exposure projection lens; and exposing the exposure light The light beam is projected onto the optical projection display structure, and the angle of the exposure beam is approximately equal to the angle of an actual optical projection display image source beam. 第25頁 1232993 案號 92114645 ^ Μ __§___#-¾. 六、 申請專利範圍 26.如申請專利範圍第25項所述之投影光學裝置’其 中該曝光光源係選自點光源、面光源、線光源所組成之族 群其中之一。 27. 如申請專利範圍第1 8項所述之投影光學裝置’其 中該些光學穿透視窗位置係隨著入射之該光學影像光束照 射到該光學聚焦結構後聚焦的光點位置而變。 28. 如申請專利範圍第27項所述之投影光學裝置’其 中該些光學穿透視窗之形狀係與該光學影像光束經該光學 聚焦結構聚焦後之光道形狀相對應。 2 9·如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗之材質包括空氣介質。 30. 如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗之材質包括光學擴散穿透材料。 31. 如申請專利範圍第1 8項所述之投影光學裝置,复 中該些光學穿透視窗之材質包括光學穿透材料。 ^ 其 饭 3 2·如申請專利範圍第1 8項所述之投影光學襄置 中該光學投影顯示構件更包括一光學擴散穿透材料層 於該光吸收層與該光學聚焦結構之間。 曰 3 3·如申請專利範圍第1 8項所述之投影光學農置 包括一超薄型放大鏡,位於該光學聚焦結構之〜人,’更 34·如申請專利範圍第33項所述之投影光學骏置· 中該超薄型放大鏡之型式包括全像片型式。 ’其 3 5 ·如申請專利範圍第3 3項所述之投影光學敦置 中該超薄型放大鏡之型式包括菲涅耳透鏡型式。 ’其Page 25 1232993 Case No. 92114645 ^ Μ __§ ___ #-¾. Six. Patent application scope 26. The projection optical device described in the patent application scope item 25, wherein the exposure light source is selected from a point light source, a surface light source, One of the groups of linear light sources. 27. The projection optical device as described in item 18 of the scope of the patent application, wherein the positions of the optical transmission windows vary with the position of the light spot focused after the incident optical image beam is irradiated to the optical focusing structure. 28. The projection optical device 'described in item 27 of the scope of the patent application, wherein the shape of the optical transmission windows corresponds to the shape of the track of the optical image beam after being focused by the optical focusing structure. 29. The projection optical device according to item 18 of the scope of patent application, wherein the material of the optical transmission windows includes an air medium. 30. The projection optical device as described in item 18 of the scope of patent application, wherein the material of the optical transmission windows includes an optical diffusion transmission material. 31. According to the projection optical device described in item 18 of the scope of patent application, the materials of the optical transmission windows include optical transmission materials. ^ Qifan 3 2 · According to the projection optics described in item 18 of the patent application scope, the optical projection display member further includes a layer of optical diffusion penetrating material between the light absorbing layer and the optical focusing structure. 33 · The projection optical farm as described in item 18 of the scope of patent application includes an ultra-thin magnifying glass located in the optical focusing structure of the person, and more 34 · The projection as described in item 33 of the scope of patent application The types of this ultra-thin magnifying lens in optical sensors include holographic type. ′ 其 3 5 · The type of the ultra-thin magnifying glass in the projection optical installation described in item 33 of the scope of patent application includes a Fresnel lens type. 'its 第26頁 1232993 ---IS 9211464^__年月日_修正 六、申請專利範圍 一" ' -----^ 36· 一種投影光學裝置,包括: 一光學投影組件,係用以提供一光學影像光束;以 上一光學投影顯示構件,用以接收來自該光學投影紐^ 之该光學影像光束,其中該光學投影顯示構件包括, 一光學聚焦結構,具有複數個微光學聚焦元件, 一光吸收層,係位於該光學聚焦結構的焦點附近,且 該光吸收層内具有複數個光學擴散反射視窗,該些光學擴 散反射視窗分別與該些微光學聚焦元件之聚焦位置相互對 應,其中’該些光學擴散反射視窗係以一光學曝光法所形 成。 3 7·如申請專利範圍第3 6項所述之投影光學裝置,其 中該光學曝光法包括光學曝光顯影法。 38·如申請專利範圍第36項所述之投影光學裝置,其 中該光學曝光法包括: 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件’且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 39.如申請專利範圍第38項所述之投影光學裝置,其 中該曝光光源係選自點光源、面光源、線光源所組成之族 群其中之_。 4 0.如申請專利範圍第36項所述之投影光學裝置,其 中a亥光學曝光法包括: 以一曝光光源產生一光束;Page 261232993 --- IS 9211464 ^ __ Year Month and Day_Amendment VI. Scope of Patent Application I " '----- ^ 36 · A projection optical device, including: An optical projection assembly for providing An optical image light beam; the above-mentioned optical projection display member for receiving the optical image light beam from the optical projection button, wherein the optical projection display member includes an optical focusing structure having a plurality of micro-optical focusing elements, a light The absorbing layer is located near the focal point of the optical focusing structure, and the light absorbing layer has a plurality of optical diffusion reflection windows. The optical diffusion reflection windows correspond to the focusing positions of the micro-optical focusing elements, respectively. The optical diffuse reflection window is formed by an optical exposure method. 37. The projection optical device according to item 36 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 38. The projection optical device according to item 36 of the scope of patent application, wherein the optical exposure method comprises: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display member 'and the angle of the exposure beam It is approximately equal to the angle of an actual optical projection display image source beam. 39. The projection optical device according to item 38 of the scope of patent application, wherein the exposure light source is selected from the group consisting of a point light source, a surface light source, and a line light source. 40. The projection optical device according to item 36 of the scope of patent application, wherein the optical exposure method includes: generating an optical beam with an exposure light source; 12329931232993 ___案號 92114645 六、 申請專利範圍 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 又 41·如申請專利範圍第40項所述之投影光學裝置,其 中該曝光光源係選自點光源、面光源、線光源所组族 群其中之一。 、 、___ Case No. 92114645 VI. Patent application scope The light beam generates an exposure light beam through an exposure projection lens; and the exposure light beam is projected to the optical projection display member, and the angle of the exposure beam and an actual optical projection display the image source beam The angles are roughly equal. 41. The projection optical device according to item 40 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. ,,, 42·如申請專利範圍第36項所述之投影光學裝置,其 中4些光學擴散反射視窗位置係隨著入射之該光學影像光 束照射到該光學聚焦結構後聚焦的光點位置而變。 4 3·如申請專利範圍第4 2項所述之投影光學裝置,其 ^ j些光學擴散反射視窗之形狀係與該光學影像光束經該 光學聚焦結構聚焦後之光道形狀相對應。 44·如申請專利範圍第36項所述之投影光學裝置,更 包括一超薄型放大鏡,位於該光學聚焦結構之一入光側。 ^ 45·如申請專利範圍第44項所述之投影光學裝置,其 中4超薄型放大鏡之型式包括全像片型式。 46·如申請專利範圍第44項所述之投影光學裝置,其 中該超薄型放大鏡之型式包括菲涅耳透鏡型式。 〃42. The projection optical device according to item 36 of the scope of the patent application, wherein the positions of the four optical diffuse reflection windows change with the positions of the light spots focused after the incident optical image light beam irradiates the optical focusing structure. 4 3. The projection optical device described in item 42 of the scope of the patent application, wherein the shapes of the optical diffuse reflection windows correspond to the shape of the track of the optical image beam after being focused by the optical focusing structure. 44. The projection optical device according to item 36 of the scope of patent application, further comprising an ultra-thin magnifying lens, which is located on the light incident side of one of the optical focusing structures. ^ 45. The projection optical device as described in item 44 of the scope of patent application, wherein the type of the 4 ultra-thin magnifying glass includes a full-image type. 46. The projection optical device according to item 44 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. 〃 ^ 47·如申請專利範圍第36項所述之投影光學裝置,其 中"亥光學投影組件包括一光閥,用以產生該光學影像光 束。 4 8 ·如申請專利範圍第3 6項所述之投影光學裝置,其 中該光學投影組件包括:^ 47. The projection optical device as described in item 36 of the scope of patent application, wherein the " Hai optical projection module includes a light valve for generating the optical image light beam. 4 8 · The projection optical device according to item 36 of the scope of patent application, wherein the optical projection component includes: 第28頁 1232993 案號 92114645 曰 修正 六、申請專利範圍 一光閥 一投影 ,用以產生一影像;以及 鏡頭,用 以接收該影像並輸出該光學影像光 束0 49. 一種光 提供一光學 數個微光學聚焦 於該光學聚 光學 圖案 進行一 複數個第一 移除部 成複數個第 50.如 的製造方法 以一曝 將該曝 角度與一實 等。 51·如 的製造方法 光源所組成 52.如 的製造方法 以一曝 分該 一圖 申請 ,其 光光 光光 際光 學投影顯示構件的製造方法,包括: 聚焦結構,且該光學聚焦結構上形成有複 元件; 焦結構的焦點附近形成一光敏感材料層; 曝光顯影步驟,於該光敏感材料層中形成 ;以及 光敏感材料層,以於該光敏感材料層内形 案區塊。 專利範圍第4 9項所述之光學投影顯示構件 中該光學曝光顯影步驟包括: 源產生一曝光光束;以及 束投射至該光敏感材料層,且該曝光光束 學投影顯示影像來源光束的角度大致相 範圍第5 0項所述之光學投影顯示構件 曝光光源係選自點光源、面光源、線 中之一。 範圍第4 9項所述之光學投影顯示構件 光學曝光顯影步驟包括: 申請專利 ,其中該 之族群其 申請專利 ,其中該 光光源產生一光束; 該光束經一曝光投影鏡頭產生,曝光光束;以及Page 28 1232993 Case No. 92114645 Amendment VI. Patent application scope: a light valve and a projection to generate an image; and a lens to receive the image and output the optical image beam 0 49. A light provides an optical number of The micro-optical focusing is performed on the optical condensing optical pattern to perform a plurality of first removal portions into a plurality of 50th. The manufacturing method such as an exposure angle and an actual angle with one exposure. 51. The manufacturing method according to the present invention is composed of a light source. 52. The manufacturing method according to the present invention is divided into one image and one image, and a method for manufacturing a light-to-light optical projection projection display member includes: a focusing structure, and the optical focusing structure is formed on There are complex elements; a light-sensitive material layer is formed near the focal point of the focal structure; an exposure and development step is formed in the light-sensitive material layer; and a light-sensitive material layer is used to form a block within the light-sensitive material layer. The step of optical exposure and development in the optical projection display member described in item 4 of the patent scope includes: the source generates an exposure beam; and the beam is projected onto the light-sensitive material layer, and the exposure beam projection shows that the angle of the image source beam is approximately The exposure light source of the optical projection display member according to the phase range item 50 is one selected from a point light source, a surface light source, and a line. The optical projection display member described in the item 49 of the scope. The steps of optical exposure and development include: applying for a patent, wherein the group applies for a patent, wherein the light source generates a light beam; the light beam is generated by an exposure projection lens, and the exposure light beam; and 第29頁 1232993 _案號 92114M5_车月 g_i±±__ 六、申請專利範圍 將該曝光光束投射至該光敏感材料層,且該曝光光束 角度與一實際光學投影顯示影像來源光束的角度大致相 等。 53. 如申請專利範圍第52項所述之光學投影顯示構件 的製造方法,其中該曝光光源係選自點光源、面光源、線 光源所組成之族群其中之一。 54. 如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,更包括於該些第一圖案區塊中形成一第一材 料層。 55. 如申請專利範圍第54項所述之光學投影顯示構件 的製造方法,其中該光敏感材料層之材質包括光吸收物 質。 56. 如申請專利範圍第55項所述之光學投影顯示構件 的製造方法,更包括於該第一材料層及該光敏感材料層上 形成一光學面板。 57. 如申請專利範圍第55項所述之光學投影顯示構件 的製造方法,其中該第一材料層包栝光學擴散穿透材料 層 。 5δβ如申請專利範圍第55項所述之光學投影顯示構件 制^方法’其中該第一材料層包栝光學穿透材料層。 bk\ 5 9 ·如申請專利範圍第4 9項所述之光學投影顯示構件 j造方法’其中在形成該光敏感材料層之步驟前更包括 的4光學聚焦結構上形成一光學擴散穿透材料層,且該光 & 1对f透材料層位於該光敏感材料層與該光學聚焦結構 學擴於斤 得Page 29 1232993 _ Case No. 92114M5_ Car month g_i ±± __ VI. Patent application scope The exposure light beam is projected onto the light-sensitive material layer, and the angle of the exposure light beam is approximately equal to the angle of an actual optical projection display image source light beam . 53. The method for manufacturing an optical projection display member according to item 52 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. 54. The method for manufacturing an optical projection display component as described in item 49 of the scope of patent application, further comprising forming a first material layer in the first pattern blocks. 55. The method for manufacturing an optical projection display member according to item 54 of the scope of patent application, wherein the material of the light-sensitive material layer includes a light-absorbing substance. 56. The method for manufacturing an optical projection display member according to item 55 of the patent application scope, further comprising forming an optical panel on the first material layer and the light-sensitive material layer. 57. The method for manufacturing an optical projection display member according to item 55 of the application, wherein the first material layer includes an optical diffusion penetrating material layer. 5δβ The method for manufacturing an optical projection display member according to item 55 of the scope of the patent application, wherein the first material layer includes an optically transmissive material layer. bk \ 5 9 · The method for manufacturing an optical projection display member according to item 4 of the scope of the patent application, wherein an optical diffusion penetrating material is formed on the 4 optical focusing structure which is included before the step of forming the light-sensitive material layer. Layer, and the light & 1 f transparent material layer is located on the light sensitive material layer and the optical focusing structure is enlarged 第30頁Page 30 1232993 _案號 92114645 六、申請專利範圍 之間。 6 0 ·如申請專利範圍第5 5項所述之光學投影顯示構件 的製造方法,其中該第一材料層包栝光學擴散反射材料 層。 61.如申請專利範圍第5 4項所述之光學投影顯示構件 的製造方法,更包括: 移除該光敏感材料層,以形成複數個第二圖案區塊· 以及 ^ 於該些第二圖案區塊中形成第二材料層。 6 2·如申請專利範圍第6 1項所述之光學投影顯示構件 的製造方法,更包括於該第一材料層及該第二材料層上带 成一光學面板。 6 3.如申請專利範圍第6 1項所述之光學投影顯示構件 的製造方法,其中該第二材料層包栝光吸收物質層。 64·如申請專利範圍第63項所述之光學投影顯示構件 的製造方法,其中該第一材料層包栝光學擴散穿透材料 層。 65·如申請專利範圍第63項所述之光學投影顯示構件 的製造方法,其中該第一材料層包栝光學穿透材料層。 66.如申請專利範圍第63項所述之光學投影顯示構件 的製造方法’其中该第一材料層包括光學擴散反射材料 層。 6 7.如申請專利範圍第6 1項所述之光學投影顯示構件 的製造方法’其中該第一材料層包枯光吸收物質層。1232993 _ Case No. 92114645 Sixth, the scope of patent application. 60. The method for manufacturing an optical projection display member according to item 55 of the scope of the patent application, wherein the first material layer includes an optical diffuse reflection material layer. 61. The method for manufacturing an optical projection display member according to item 54 of the scope of patent application, further comprising: removing the light-sensitive material layer to form a plurality of second pattern blocks; and ^ on the second patterns A second material layer is formed in the block. 62. The method for manufacturing an optical projection display member according to item 61 of the scope of patent application, further comprising forming an optical panel on the first material layer and the second material layer. 6 3. The method for manufacturing an optical projection display member according to item 61 of the scope of patent application, wherein the second material layer includes a light absorbing substance layer. 64. The method for manufacturing an optical projection display member according to item 63 of the scope of patent application, wherein the first material layer includes an optical diffusion penetrating material layer. 65. The method for manufacturing an optical projection display member according to item 63 of the scope of patent application, wherein the first material layer includes an optically transmissive material layer. 66. The method for manufacturing an optical projection display member according to item 63 of the scope of the patent application, wherein the first material layer includes an optical diffuse reflection material layer. 6 7. The method for manufacturing an optical projection display member according to item 61 of the scope of patent application, wherein the first material layer includes a layer of a light-absorbing substance. 第31頁 1232993 案號 92114645_ 年 曰 修正 六、申請專利範圍 68.如申請專利 的製造方法,其中該 層。 6 9 .如申請專利 的製造方法,其中該 7 0.如申請專利 的製造方法,其中該 層。 71.如申請專利 的製造方法,其中該 範圍第6 7 第二材料 範圍第6 7 第二材料 範圍第6 7 第二材料 範圍第49 光學曝光 於一預設使用光源位置上 光光源照射該光學 以該曝 材料層。 7 2. 如 的製造方法 光源所組成 7 3· 如 的製造方法 7 4. 如 的製造方法 已曝光之該 75· 如 的製造方法 未曝光之該 申請專利 ,其中該 之族群其 申請專利 ,其中該 申請專利 ,其中移 光敏感材 申請專利 ,其中移 光敏感材 範圍第7 1 曝光光源 中之一。 範圍第7 1 曝光光源 範圍第49 除部分該 料層。 範圍第4 9 除部分該 料層。 項所述之光學投影顯示構件 層包栝光學擴散穿透材料 項所述之光學投影顯示構件 層包括光學穿透材料層。 項所述之光學投影顯示構件 層包括光學擴散反射材料 項所述之光學投影顯示構件 顯影步驟包括: 提供/曝光光源;以及 聚焦詰構並聚焦於該光敏感 項所述之光學投影顯不構件 係選自點光源、面光源、線 項所述之光學投影顯示構件 包括U V光源。 項所述之光學投影顯示構件 光敏感材料層的步驟係移除 項所述之光學投影顯示構件 光敏感材料層的步驟係移除Page 31 1232993 Case No. 92114645_ Year Name Amendment 6. Scope of Patent Application 68. For example, the manufacturing method for patent application, in which this layer. 69. The manufacturing method as claimed in the patent, wherein the 70. The manufacturing method as claimed in the patent, wherein the layer. 71. The manufacturing method as claimed in the patent, wherein the range No. 6 7 second material range No. 6 7 second material range No. 6 7 second material range No. 49 optical exposure at a preset use light source position light source to illuminate the optical Take the exposed material layer. 7 2. The manufacturing method such as the composition of light source 7 3 The manufacturing method of such as 7 4. The manufacturing method of such as exposed 75 The manufacturing method of such as unexposed application for patent, among which the group applies for patent, among which The patent application includes a patent application for a light-sensitive material, and the light-sensitive material is one of the 71st exposure light sources. Range 7 1 Exposure light source Range 49 Except part of this layer. Except for part 4 of the range, this material layer. The optical projection display member layer according to the item includes an optical diffusion and transmission material layer. The optical projection display member layer according to the item includes an optical transmission material layer. The optical projection display member layer described in the item includes an optical diffusion display material. The optical projection display member development step described in the item includes: providing / exposing a light source; and focusing the structure and focusing on the optical projection display member described in the light-sensitive item. The optical projection display member selected from the group consisting of a point light source, a surface light source, and a line item includes a UV light source. The optical projection display member according to the item, the step of removing the light-sensitive material layer, the optical projection display member according to the item, the step of removing the light-sensitive material layer. 第32頁 1232993 ----案號 92114645 六、申請專利範圍Page 32 1232993 ---- Case No. 92114645 VI. Scope of patent application 76·如申請專利範圍第49項所述之光學投影顯示構件 的製造方法’其中該些微光學聚焦元件係形成於該光學聚 焦結構之一第一表面上。 77·如申請專利範圍第76項所述之光學投影顯示構件 的製造方法,其中該光敏感材料層係形成於該光學聚焦結 構之一第二表面上,且該第二表面係與該第一表面相對 應。 78·如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,更包括於該光學聚焦結構之—入光側形 超薄型放大鏡。 79·如申請專利範圍第78項所述之光學投影顯示 的製造方法’其中該超薄型放大鏡之型式包括全像片型 8 0 .如申請專利範圍第7 8項所述之光學投影顯示 的製造方法’其中該超薄型放大鏡之型式包括菲、、g ^集件 型式。 &耳透鏡 81· —種光學投影顯示構件,包括: 一光學聚焦結構,具有複數個微光學聚焦元件·、 一光吸收層,位於該光學聚焦結構的焦點附近| U及 有複數個光學擴散反射窗,該些光學擴散反射窗分且具 些微光學聚焦元件相互對應,其中,該些光學擴 與該 係以一光學曝光法所形成。 、反射窗 82·如申請專利範圍第81項所述之光學投影 件,其中該光學曝光法包括光學曝光顯影法。〜7^構76. The method for manufacturing an optical projection display member according to item 49 of the scope of the patent application, wherein the micro-optical focusing elements are formed on a first surface of the optical focusing structure. 77. The method for manufacturing an optical projection display member according to item 76 of the patent application, wherein the light-sensitive material layer is formed on a second surface of the optical focusing structure, and the second surface is in contact with the first surface. The surface corresponds. 78. The method for manufacturing an optical projection display member as described in item 49 of the scope of application for a patent, further comprising a light-incident side ultra-thin magnifying lens of the optical focusing structure. 79. The method for manufacturing an optical projection display as described in item 78 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a hologram type 80. The optical projection display as described in item 78 of the scope of patent application Manufacturing method 'wherein the type of the ultra-thin magnifying glass includes a Philippine, G ^ assembly type. & ear lens 81 · An optical projection display member, including: an optical focusing structure having a plurality of micro-optical focusing elements, a light absorbing layer located near the focal point of the optical focusing structure | U and a plurality of optical diffusion The reflection window, the optical diffusion reflection windows are divided into micro optical focusing elements, and the optical expansion and the system are formed by an optical exposure method. Reflective window 82. The optical projection member according to item 81 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. ~ 7 ^ struct 第33頁 1232993 曰 修正 案號 92114645_年 -------- 六、申請專利範圍 83·如申請專利範圍第81項所述之光學投影顯示構 件,其中該些光學擴散反射窗位爹係^著=射之一光束照 射到該光學聚焦結構後聚焦的光點彳立置而° 84. 如申請專利範圍第83項所述之光學投影顯示構 件,其中該些光學擴散反射窗之形狀係與入射之該光束照 射到該光學聚焦結構後聚焦之光道形狀相對應。 85. 如申請專利範圍第8 1項所述之光學投影顯示構 件,更包括一超薄型放大鏡,位於該光學聚焦結構之一入 光側。 86·如申請專利範圍第85項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包括全像片型式。 8 7 ·如申請專利範圍第8 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包括菲涅耳透鏡型式。 8 8 ·如申请專利範圍第8 1項所述之光學投影顯示構 件,其中該些光學擴散反射窗之材質包括光學擴散反射材 料。 89·如申請專利範圍第81項所述之光學投影顯示構 件,更包括一光學擴散穿透材料層,位於該光吸收層與該 光學聚焦結構之間。 90.如申請專利範圍第81項所述之光 件,其中該光學曝光法包括: 又汾.,、,員丁構 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯 4束角度與一實際光學投影顯示I ^ , 且4曝九 九采 〜像來源光束的角度大致Page 33 1232993 Amendment No. 92114645_year -------- VI. Patent Application Range 83. The optical projection display member described in item 81 of the patent application range, wherein the optical diffuse reflection window positions ^ 着 = one of the light beams irradiates the optical focusing structure and the focused light spot stands upright. 84. The optical projection display member according to item 83 of the scope of patent application, wherein the shape of the optical diffuse reflection windows It corresponds to the shape of the track focused after the incident light beam is irradiated to the optical focusing structure. 85. The optical projection display component as described in item 81 of the scope of the patent application, further comprising an ultra-thin magnifying glass, which is located on the light incident side of one of the optical focusing structures. 86. The optical projection display component according to item 85 of the scope of application for a patent, wherein the type of the ultra-thin magnifying glass includes a full-image type. 87. The optical projection display device according to item 85 of the scope of the patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. 8 8 · The optical projection display component according to item 81 of the scope of patent application, wherein the materials of the optical diffuse reflection windows include optical diffuse reflection materials. 89. The optical projection display device according to item 81 of the scope of patent application, further comprising a layer of an optical diffusion penetrating material located between the light absorption layer and the optical focusing structure. 90. The light piece according to item 81 of the scope of the patent application, wherein the optical exposure method includes: fen, ..., the Ding structure generates an exposure beam with an exposure light source; and projects the exposure beam onto the optical projection Shows 4 beam angles and an actual optical projection display I ^, and the exposure angle of the image source beam is roughly 1232993 _案號 92114645_年月日__ 六、申請專利範圍 相等。 91. 如申請專利範圍第9 0項所述之光學投影顯示構 件,其中該曝光光源係選自點光源、面光源、線光源所組 成之族群其中之一。 92. 如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該光學曝光法包括: 以一曝光光源產生一光束;1232993 _case number 92114645_year month__ Six, the scope of patent application is equal. 91. The optical projection display component according to item 90 of the scope of the patent application, wherein the exposure light source is one selected from the group consisting of a point light source, a surface light source, and a line light source. 92. The optical projection display component according to item 81 of the scope of patent application, wherein the optical exposure method comprises: generating an optical beam with an exposure light source; 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 93. 如申請專利範圍第92項所述之光學投影顯示構 件,其中該曝光光源係選自點光源、面光源、線光源所組. 成之族群其中之一。The light beam generates an exposure light beam through an exposure projection lens; and projects the exposure light beam to the optical projection display structure, and the angle of the exposure light beam is substantially equal to the angle of an actual optical projection display image source light beam. 93. The optical projection display component according to item 92 of the scope of patent application, wherein the exposure light source is one of a group consisting of a point light source, a surface light source, and a line light source. 第35頁Page 35
TW92114645A 2003-04-23 2003-05-30 Projection optics apparatus and thereof display device and thereof manufacturing method TWI232993B (en)

Priority Applications (5)

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TW92114645A TWI232993B (en) 2003-04-24 2003-05-30 Projection optics apparatus and thereof display device and thereof manufacturing method
JP2003299704A JP2004326069A (en) 2003-04-24 2003-08-25 Optical projector, its optical projection display member and its manufacturing method
US10/828,080 US7102819B2 (en) 2003-04-24 2004-04-19 Projection optics apparatus and thereof display device and thereof manufacturing method
DE102004019112A DE102004019112A1 (en) 2003-04-24 2004-04-20 Optical projection device and associated display device and associated manufacturing method
US11/483,023 US20060250693A1 (en) 2003-04-23 2006-07-07 Projection optics apparatus and display device thereof

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TW92109539 2003-04-24
TW92114645A TWI232993B (en) 2003-04-24 2003-05-30 Projection optics apparatus and thereof display device and thereof manufacturing method

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385466B (en) * 2007-03-26 2013-02-11 Seiko Epson Corp Image display system and method, and screen device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385466B (en) * 2007-03-26 2013-02-11 Seiko Epson Corp Image display system and method, and screen device

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