TWD244121S - 用於基板處理系統中之增強屏蔽的底環 - Google Patents

用於基板處理系統中之增強屏蔽的底環

Info

Publication number
TWD244121S
TWD244121S TW112301622F TW112301622F TWD244121S TW D244121 S TWD244121 S TW D244121S TW 112301622 F TW112301622 F TW 112301622F TW 112301622 F TW112301622 F TW 112301622F TW D244121 S TWD244121 S TW D244121S
Authority
TW
Taiwan
Prior art keywords
substrate processing
processing systems
bottom ring
enhanced shielding
shielding
Prior art date
Application number
TW112301622F
Other languages
English (en)
Inventor
周尚義
王丹丹
喬瓦尼 保羅 亞竹道
蓋瑞 格拉格
羅伯特 歐尼爾
Original Assignee
美商蘭姆研究公司
Filing date
Publication date
Application filed by 美商蘭姆研究公司 filed Critical 美商蘭姆研究公司
Publication of TWD244121S publication Critical patent/TWD244121S/zh

Links

TW112301622F 2023-04-07 用於基板處理系統中之增強屏蔽的底環 TWD244121S (zh)

Publications (1)

Publication Number Publication Date
TWD244121S true TWD244121S (zh) 2026-04-21

Family

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176078S (zh) 2015-06-16 2016-06-01 日立國際電氣股份有限公司 反射環構件之部分
TWD176077S (zh) 2015-06-16 2016-06-01 日立國際電氣股份有限公司 反射環構件
TWD186395S (zh) 2017-01-31 2017-11-01 Hitachi High Tech Corp 電漿處理裝置用保護環

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176078S (zh) 2015-06-16 2016-06-01 日立國際電氣股份有限公司 反射環構件之部分
TWD176077S (zh) 2015-06-16 2016-06-01 日立國際電氣股份有限公司 反射環構件
TWD186395S (zh) 2017-01-31 2017-11-01 Hitachi High Tech Corp 電漿處理裝置用保護環

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