TWD167922S - Electrical contacts for electroplating equipment - Google Patents

Abstract

[Use of the article]; The article of this design is an electrical contact for an electroplating device. For example, as shown in the "Usage Reference Picture", it is a device in which the front end is in contact with the periphery of the wafer held on the support surface of the substrate electroplating device. A member used at the end, the wafer is immersed in the plating solution and energized, thereby performing electroplating. ;[Design Description];The appearance difference between this derivative design and the original design is: as shown in each picture, the groove spacing and other designs above it are slightly different. Therefore, the difference between this case and the original design is slight and does not affect the original design. Similar to generative design. ;The left view is symmetrical to the right view, and the left view is omitted. ; In the "enlarged three-dimensional view of part of the design area" and the "enlarged top view of part of the design area", the horizontal, vertical and oblique thin lines appearing in the outline are all hatching lines used to express the shape of the three-dimensional surface.