TWD165983S - Part of the gas introduction pipe for semiconductor manufacturing equipment (2) - Google Patents
Part of the gas introduction pipe for semiconductor manufacturing equipment (2)Info
- Publication number
- TWD165983S TWD165983S TW102305584F TW102305584F TWD165983S TW D165983 S TWD165983 S TW D165983S TW 102305584 F TW102305584 F TW 102305584F TW 102305584 F TW102305584 F TW 102305584F TW D165983 S TWD165983 S TW D165983S
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- design
- gas introduction
- view
- creation
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 2
- 235000012431 wafers Nutrition 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
Abstract
【物品用途】;本創作係一種在熱處理複數片半導體晶圓之縱型熱處理裝置中，用以將氣體導入至收納半導體晶圓之製程管內之氣體導入管。;【設計說明】;以實線所表示的部分係作為部分設計所欲註冊之部分。本創作整體為透明。整體之概略形狀如整體之縮小前視圖所示。後視圖與前視圖對稱，故省略。欲註冊之部分，係具有厚度部之垂直狀管狀部分，於其管狀部分之厚度部係沿水平而形成有多數氣體噴射孔。此創作在插入至製程管內的狀態下會從多數氣體噴出孔將氣體朝水平噴出。此外，圖式中以虛線表示之部分，為本設計所不主張之部分。[Use of article] This invention is a gas introduction tube used to introduce gas into a process tube that accommodates semiconductor wafers in a vertical heat treatment device that heats multiple semiconductor wafers. ;[Design Description];The part indicated by the solid line is the part to be registered as part of the design. This creation is entirely transparent. The general shape of the whole is shown in the reduced front view of the whole. The rear view is symmetrical with the front view, so it is omitted. The portion to be registered is a vertical tubular portion having a thickness portion, and a plurality of gas injection holes are formed horizontally along the thickness portion of the tubular portion. When this creation is inserted into the process tube, gas will be ejected horizontally from most of the gas ejection holes. In addition, the parts indicated by dotted lines in the drawings are not recommended by this design.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013003544 | 2013-02-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD165983S true TWD165983S (en) | 2015-02-11 |
Family
ID=89708945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102305584F TWD165983S (en) | 2013-02-21 | 2013-08-20 | Part of the gas introduction pipe for semiconductor manufacturing equipment (2) |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD165983S (en) |
-
2013
- 2013-08-20 TW TW102305584F patent/TWD165983S/en unknown
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