TWD146037S - Top plate of semiconductor manufacturing reactor - Google Patents
Top plate of semiconductor manufacturing reactorInfo
- Publication number
- TWD146037S TWD146037S TW100301726F TW100301726F TWD146037S TW D146037 S TWD146037 S TW D146037S TW 100301726 F TW100301726 F TW 100301726F TW 100301726 F TW100301726 F TW 100301726F TW D146037 S TWD146037 S TW D146037S
- Authority
- TW
- Taiwan
- Prior art keywords
- plate body
- semiconductor manufacturing
- slightly
- sectional
- view
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 210000005069 ears Anatomy 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000000007 visual effect Effects 0.000 abstract 1
Abstract
【物品用途】;本創作係一種對半導體基板表面依序供給複數反應氣體而製膜的半導體製造用反應爐之頂盤。;【創作特點】;本創作具有形狀略呈圓形之板體，板體一側面形成有略半圓狀之凸部，另一側面則形成有對應之凹部，板體外圍形成有兩不對稱之凸耳及五道弧長不均之缺口，板體靠其中兩道缺口處分別設有兩貫穿圓孔，略半圓狀凸部近板體外圍部位形成有略呈矩形之貫穿孔，藉此以呈現出不同的視覺感受。;使用狀態參考剖面圖係表示於本創作置於半導體製造用反應爐內部的狀態。A-B-C剖面線之組合剖面圖係表示剖面線之參考圖之剖面圖。[Use of the article]; This invention is a top plate of a semiconductor manufacturing reactor that forms a film by sequentially supplying multiple reaction gases to the surface of a semiconductor substrate. ; [Features of the invention]; This invention has a plate body that is slightly circular in shape, with a slightly semicircular convex portion formed on one side of the plate body and a corresponding concave portion formed on the other side. Two asymmetrical convex ears and five notches with uneven arc lengths are formed on the periphery of the plate body. Two through-holes are respectively provided on the plate body near two of the notches, and a slightly rectangular through-hole is formed near the periphery of the slightly semicircular convex portion of the plate body, thereby presenting different visual experiences. ; The reference cross-sectional view of the usage state shows the state of the invention placed inside the semiconductor manufacturing reactor. The combined cross-sectional view of the A-B-C section lines is a cross-sectional view of the reference drawing of the section lines.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010025235 | 2010-10-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD146037S true TWD146037S (en) | 2012-03-21 |
Family
ID=45758270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100301726F TWD146037S (en) | 2010-10-21 | 2011-04-14 | Top plate of semiconductor manufacturing reactor |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD655257S1 (en) |
| TW (1) | TWD146037S (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI627305B (en) * | 2013-03-15 | 2018-06-21 | 應用材料股份有限公司 | Atmospheric lid with rigid plate for carousel processing chambers |
| TWI683382B (en) * | 2013-03-15 | 2020-01-21 | 應用材料股份有限公司 | Carousel gas distribution assembly with optical measurements |
| USD766850S1 (en) * | 2014-03-28 | 2016-09-20 | Tokyo Electron Limited | Wafer holder for manufacturing semiconductor |
| JP6221932B2 (en) * | 2014-05-16 | 2017-11-01 | 東京エレクトロン株式会社 | Deposition equipment |
| JP1700781S (en) * | 2021-03-22 | 2021-11-29 |
-
2011
- 2011-04-13 US US29/389,553 patent/USD655257S1/en active Active
- 2011-04-14 TW TW100301726F patent/TWD146037S/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| USD655257S1 (en) | 2012-03-06 |
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