591570591570
發明説明 發明之 1·發明之領域 本發明係有關於一種反射式液晶顯示裝置，而更特定 吕之’係有關於一種反射式液晶顯示裝置其具有一反射電 極其上構成有複數之微透鏡。 2 ·相關技藝之說明 在近年之資訊社會中，當資訊傳輸媒體與不同的電子 顯示裝置廣泛地應用於工業裝置或是家用設備時電子顯示 裝置係更為重要。持續地改良該等電子顯示裝置，針對資 訊社會不同的需求具有新的合適之功能。 一般而言，電子顯示裝置顯示及傳送不同的資訊給利 用该貧訊的使用者。亦即，電子顯示裝置將從電子裝置輸 出的電氣資訊信號轉換成經使用者由其之雙眼所識別的光 資訊信號。 電子顯示裝置劃分成一放射性的顯示裝置與一非放 射性的顯示裝置，放射性的顯示裝置經由其之光放射現象 顯示光資Λ彳§號，而非放射性的顯示裝置經由其之反射、 散射或是干涉顯示光資訊信號。放射性的顯示裝置包括陰 極射線官（CRT)、電漿顯示器（pdp)、發光二極體（LED)以 及電激發光顯示器（ELD)。放射性的顯示裝置係稱作為一 主動式顯示裝置。同時，被稱作為被動式顯示裝置的非放 射性的顯示裝置包括一液晶顯示器（LCD)、電化學顯示器 (ECD)以及一電泳的影像顯示器（EPID)。 因陰極射線管（CRT)具有高品質及低的製造成本，所 4 (請先閲讀背面之注意事項再填寫本頁) 訂· 参- 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公爱） 591570 A7 B7 五、發明説明（2 ) 以使用在電視接收器或是電腦顯示器作為顯示裝置已有很 長一段時間。然而，陰極射線管（CRT)具有一些缺點，諸 如重量大、體積大並且耗電量高。 近年來，對於新式的電子顯示裝置的需求急遽增加， 諸如一種具有極佳特性的平面顯示器，例如，厚度薄、重 量輕、低驅動電壓以及低耗電量。該等平面顯示器係可根 據迅速改良的半導體技術製造。 在平面顯示器中，液晶顯示（LCD)裝置已廣泛地使用 在不同的電子裝置，因為液晶顯示（LCD)裝置具有厚度 薄、低耗電量以及與陰極射線管（CRT)近似相同之高顯示 品質。同時，液晶顯示（LCD)裝置係可在低驅動電壓下作 動並易於製造，因此液晶顯示（LCD)裝置廣泛地使用在不 同的電子裝置。 液晶顯示（LCD)裝置一般係劃分成一傳輸式液晶顯示 (LCD)裝置、一反射式液晶顯示（LCD)裝置、以及一反射-傳輸式液晶顯示（LCD)裝置。傳輸式液晶顯示（LCD)裝置藉 使用一外部光源顯示資訊，而反射式液晶顯示（LCD)裝置 藉使用自然光顯示資訊。反射-傳輸式液晶顯示（LCD)裝置 在一傳輸模態下作動，在一不存在外部光源的房間或一黑 暗場所中利用液晶顯示（LCD)裝置之内建式光源用於顯示 一影像，以及在一反射模態下作動藉由反射在外部的入射 光用於顯示影像。 然而，反射式液晶顯示裝置顯示相對黑暗的影像並且 無法充分地施用顯示精細的節距或色彩影像，因此反射式 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁)DESCRIPTION OF THE INVENTION 1. Field of the Invention The present invention relates to a reflection-type liquid crystal display device, and more specifically, Lu Zhi 'relates to a reflection-type liquid crystal display device having a reflective electrode and a plurality of microlenses. 2 · Explanation of related technologies In the information society in recent years, when information transmission media and different electronic display devices are widely used in industrial devices or household equipment, electronic display devices are more important. Continuously improve these electronic display devices, with new and suitable functions for different needs of the information society. Generally speaking, the electronic display device displays and transmits different information to users who use the poor information. That is, the electronic display device converts an electrical information signal output from the electronic device into an optical information signal recognized by a user's eyes. The electronic display device is divided into a radioactive display device and a non-radioactive display device. The radioactive display device displays the light data Λ 彳 § through its light emission phenomenon, and the non-radioactive display device reflects, scatters, or interferes with Display the optical information signal. Radioactive display devices include cathode ray officers (CRT), plasma displays (pdp), light emitting diodes (LEDs), and electrically excited light displays (ELD). A radioactive display device is referred to as an active display device. Meanwhile, a non-radioactive display device called a passive display device includes a liquid crystal display (LCD), an electrochemical display (ECD), and an electrophoretic image display (EPID). Because the cathode ray tube (CRT) has high quality and low manufacturing cost, please read (Please read the precautions on the back before filling out this page). Order and specification-This paper size applies to China National Standard (CNS) A4 (210X297) Love) 591570 A7 B7 5. Description of the invention (2) It has been used for a long time in television receivers or computer monitors as display devices. However, cathode ray tubes (CRT) have some disadvantages, such as being heavy, bulky, and power-hungry. In recent years, the demand for new-type electronic display devices has increased sharply, such as a flat-panel display having excellent characteristics, for example, thin thickness, light weight, low driving voltage, and low power consumption. These flat-panel displays can be manufactured according to rapidly improving semiconductor technology. In flat panel displays, liquid crystal display (LCD) devices have been widely used in different electronic devices because liquid crystal display (LCD) devices have a thin thickness, low power consumption, and high display quality that is approximately the same as that of a cathode ray tube (CRT). . At the same time, liquid crystal display (LCD) devices can operate at low driving voltages and are easy to manufacture, so liquid crystal display (LCD) devices are widely used in different electronic devices. Liquid crystal display (LCD) devices are generally divided into a transmission liquid crystal display (LCD) device, a reflective liquid crystal display (LCD) device, and a reflection-transmission liquid crystal display (LCD) device. Transmissive liquid crystal display (LCD) devices display information by using an external light source, while reflective liquid crystal display (LCD) devices display information by using natural light. The reflection-transmission liquid crystal display (LCD) device operates in a transmission mode, using a built-in light source of the liquid crystal display (LCD) device to display an image in a room or a dark place where no external light source exists, and Acting in a reflection mode to display an image by reflecting incident light externally. However, reflective liquid crystal display devices display relatively dark images and cannot adequately display fine pitch or color images. Therefore, this reflective paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read first (Notes on the back then fill out this page)
、可I 591570 A7 B7____ 五、發明説明（3 ) 液晶顯示裝置僅使用以顯示簡單的圖表或文字。因此，為 了針對不同的電子顯示裝置使用，反射式液晶顯示裝置應 具有精細的節距及高的反射性以及顯示色彩影像。此外， 反射式液晶顯示裝置具有足夠的亮度、快速的反應速度、 以及一改良的影像對比。 於近來之反射式液晶顯示裝置中，反射式液晶顯示| 置的亮度已藉由結合增加反射電極的反射性以及特佳的孔 徑比技術加以改良。具有複數之精細的凸面體與凹面體的 反射電極係揭露於頒給Naofumi Kimura之美國專利第 5,610,741號標題為”在反射器上具有凸塊的反射式液晶顯 示裝置（REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE WITH BUMPS ON THE REFLECTOR)，，中。 其間，本發明者已發展出一種反射電極致使均勻的擴 散反射，用以改良影像的品質並於1999年3月4日以此發明 向大韓民國智慧財產局（KIPO)提出專利申請。該反射電極 係揭露在韓國專利申請案第1999-7093號中，標題為”反射 式液晶顯示裝置及其之製造方法（A REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND A METHOD FOR MANUFACTURING THE SAME)”，現於大韓民國智慧 財產局（KIPO)中等候判定並隸屬本申請案之申請人。 第1圖係為一平面圖顯不位在一光罩上之一反射電極 或圖案，用於根據上述申請案構成反射電極。 參考第1圖，反射電極包括一第一區域14與一第二區 域16，在像素區域中具有相對地高及低的高度。第二區域 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 6 (請先閲讀背面之注意事項再填寫本頁) 、一ΤΓ— .«, 591570 A7 _____B7 五、發明説明（4 ) 16係以第一區域14加以封閉，諸如閉合的曲線。所構成之 第一區域14具有不變的寬度。第一區域14具有一溝槽形狀 其之高度相對地低於第二區域16。第二區域16具有一突起 的形狀其之高度相對地高於第一區域14，因此第二區域16 的功能如同一微透鏡。 為了在反射電極上構成複數之微透鏡，一有機絕緣層 係構成在具有薄膜電晶體的一第一絕緣基板上，並應使用 一具有於第1圖中所示之圖案的光罩加以曝光及顯影。 第2A及2B圖係為沿著第1圖中線Al-Al，及，所取 之橫截面視圖，其係圖示一種在有機絕緣層上構成複數之 溝槽的方法。 參考第2A及2B圖，一具有與用於構成微透鏡之溝槽相 對應的圖案的光罩20，其係覆蓋著一有機絕緣層12為了構 成複數之在其上具有溝槽形狀的第一區域14。於此例中， 光罩20具有與在第1圖中所示之反射電極之形狀相同的圖 案。特別地，與第一區域14對應的光罩圖案係構成在透明 的基板上，從而構成在第1圖中所示的光罩2〇。在有機絕緣 層12利用光罩20加以曝光及顯影之後，複數之溝槽14(亦 即，第一區域14)係構成在有機絕緣層12之表面上。 構成每一第一區域14致使在第一方向（亦即，於第1圖 中八1_八1，線）上的寬度wa，係與在第二方向（亦即，於第1圖 中B〗-：^，線）上的寬度Wb相同。由於所構成之第一區域14具 有均勻的寬度Wa&Wb，所以反射效率增加從而改良反射式 液晶顯示裝置的影像品質。 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公爱） 7 (請先閱讀背面之注意事項再填窝本頁) •、可| 五、發明説明（5 ) 上述的反射電極關於包括水平與垂直方向的所有方 向具有固定的反射性，因為反射電極之微透鏡（亦即，第二 區域16)係等向地構成在所有方向上。然而，反射電極無法 應用在於一特定方向上需要具有高反射性的電子裝置上， 諸如行動電話。假若在特定的方向上為了增加反射電極的 反射性可以變化整個圖案，則加工狀況應再一次加以最佳 化並且會發生諸如關於整個基板之對稱性的其他問題。 1明之概要說明 本發明已解決上述問題，因而本發明之一目的在於提 供一種反射式液晶顯示裝置，其係可在一特定的方向上無 論透鏡的形狀控制其之反射性。 本發明之另一目的在於提供一種電子顯示裝置，其係 可在一特定的方向上無論透鏡的形狀控制其之反射性。 為達成本發明之-目的，所提供之一反射式液晶顯示 ，置包括-在其上構成像素的第一基板，一第二基板係與 第一基板相對配置、一液晶層係構成在第一基板與第二基 板之間、以及一反射電極構成在第一基板上以及具有一第 -區域及-第二區域其具有相對地高與低的高度用於散射 光線。第-區域在第-方向上具有一第一寬度，其係寬於 在第二方向上的-第二寬度，為了在第一方向上所具有的 第一反射性相對地高於在第二方向上的第二反射性。 於本發明之-較佳的觀點中，第一區域具有一溝槽形 狀其之高度相對地低於第二區域，而第二區域具有一突起 的形狀其之高度相對地高於第一區域。第一區域具有一第 -I ^ΓΊ ΓΊ[Ι -I ^ΓΊ ΓΊ[Ι 一方向上，以及一第二溝槽係連續 一溝槽連續地構成在第 地構成在第二方向上。 請 先 閲 讀 背 面 之 注 意 事 項 再 填 寫 本 頁 為達成本發明之其他目的，提供一種電子顯示裝置其 包括一像素構成於其上的—絕緣基板，以及反射構件與像 素連接並構成在第_基板上。反射構件具有複數之第一區 域以及複數之第二區域其具有相對地高與低的高度用於散 射光，。第-區域在第-方向上具有—第—寬度，其係寬 於在第二方向上的—第二寬度，為了在第-方向上所具有 的第反射性相對地高於在第二方向上的第二反射性。 根據本發明，反射式液晶顯示裝置的反射電極在需要 回反射性的像素之一方向上，其之溝槽具有寬的寬度。因 此，反射式液晶顯示裝置具有一改良的孔徑比，以及無論 透鏡之形狀藉由改變溝槽之寬度在一特定所欲的方向上增 加反射性。 圖式之簡要 本發明之上述以及其他的目的與優點，藉由參考下列 的詳細說明並結合伴隨圖式將變得更為顯而易見的，其中： 第1圖係為一平面圖顯示位在一光罩上的反射電極或 圖案’用於構成在韓國專利申請案第1999_7093號中所揭露 的反射電極； 第2Α及2Β圖係為沿著第1圖中線AKAi，及BrBi，所取 之橫截面視圖，其係圖示一種在有機絕緣層上構成複數之 溝槽的方法； 第3圖係為一平面圖顯示位在一光罩上的反射電極或 9 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 591570 A7 -----------— B7 五、發明説明（7 ) "" ------ θ案―用於構成本發明之第_具體實施例的反射電極； 第4圖係為具有本發明之第一具體實施例之反射電極 的一反射式液晶顯示裝置的橫截面視圖； 一第5Α至5Ε圖係為横截面視圖，圖示一種製造第4圖中 所示之反射式液晶顯示裝置的方法； 第6圖係為-平面圖顯示位在一光罩上的反射電極或 圖案，用於構成本發明之第二具體實施例的反射電極； 第7八及7Β圖係為沿著第6圖中線Αό-Α6，Λ Β6-Β6,所取 之橫截面視圖，其係圖示一種在有機絕緣層上構成複數之 溝槽的方法。 致隹具體實施例之詳鈿銳aq 以下，將相關於伴隨的圖式詳細說明本發明之較佳具 體實施例的一種反射式液晶顯示裝置。 第3圖係為一平面圖顯示位在一光罩上的反射電極或 圖案，用於構成本發明之第一具體實施例的反射電極。 參考第3圖，本發明之第一具體實施例的一反射電極 具有第一區域290與第二區域295，其係構成在一像素區域 中並具有相對地高與低的高度。第一區域29〇包括複數之第 一溝槽290a以及複數之第二溝槽290b，其中第一溝槽29〇a 係沿著像素區域之水平方向連續地構成，而第二溝槽29〇b 係於像素區域之垂直方向上連續地構成。第二溝槽29%的 寬度較第一溝槽290a之寬度為寬，因此確保關於像素區域 之垂直方向（亦即’上下的方向）顯示器之視角，並且改良 反射性。 本紙張尺度適用中國國家標準（CNS) M規格（210χ297公釐） 10， 可 I 591570 A7 B7____ 5. Description of the invention (3) The liquid crystal display device is only used to display simple diagrams or text. Therefore, in order to use for different electronic display devices, reflective liquid crystal display devices should have fine pitch, high reflectivity, and display color images. In addition, the reflective liquid crystal display device has sufficient brightness, fast response speed, and an improved image contrast. In recent reflection type liquid crystal display devices, the brightness of the reflection type liquid crystal display device has been improved by combining the reflectivity of the reflective electrode and the excellent aperture ratio technology. Reflective electrodes with a plurality of fine convex and concave bodies are disclosed in U.S. Patent No. 5,610,741, issued to Naofumi Kimura, entitled "REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE WITH REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE WITH" BUMPS ON THE REFLECTOR) ,,. In the meantime, the present inventors have developed a reflective electrode to cause uniform diffuse reflection to improve the quality of the image, and on March 4, 1999, this invention was submitted to the Korean Intellectual Property Office (KIPO) ) Filed a patent application. The reflective electrode is disclosed in Korean Patent Application No. 1999-7093, entitled "Reflective Liquid Crystal Display Device and Manufacturing Method thereof (A REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND A METHOD FOR MANUFACTURING THE SAME) ) ", Which is pending judgment in the Korean Intellectual Property Office (KIPO) and is an applicant under this application. Figure 1 is a plan view showing a reflective electrode or pattern on a photomask for The application constitutes a reflective electrode. Referring to Figure 1, the reflective electrode includes a first region 14 and a second Area 16, which has a relatively high and low height in the pixel area. The second area applies the Chinese National Standard (CNS) A4 specification (210X297 mm) for this paper size 6 (Please read the precautions on the back before filling this page) 、 一 ΤΓ—. «, 591570 A7 _____B7 V. Description of the Invention (4) 16 is enclosed by a first region 14, such as a closed curve. The first region 14 formed has a constant width. The first region 14 has The height of a groove shape is relatively lower than that of the second area 16. The height of the second area 16 is relatively higher than that of the first area 14, so the function of the second area 16 is the same as a micro lens. A plurality of microlenses are formed on the reflective electrode. An organic insulating layer is formed on a first insulating substrate having a thin film transistor, and a photomask with a pattern shown in FIG. 1 should be used for exposure and development. Figures 2A and 2B are cross-sectional views taken along line Al-Al in Figure 1, and illustrate a method of forming a plurality of trenches on an organic insulating layer. Refer to Figures 2A and 2A. Figure 2B, one with A photomask 20 for forming a pattern corresponding to a groove of a microlens is covered with an organic insulating layer 12 to form a plurality of first regions 14 having a groove shape thereon. In this example, the photomask 20 has the same pattern as the shape of the reflective electrode shown in FIG. 1. In particular, the photomask pattern corresponding to the first region 14 is formed on a transparent substrate, thereby constituting the pattern shown in FIG. Photomask 20. After the organic insulating layer 12 is exposed and developed using the photomask 20, a plurality of grooves 14 (i.e., the first region 14) are formed on the surface of the organic insulating layer 12. Each of the first regions 14 is formed such that the width wa in the first direction (that is, 8-1_8, a line in FIG. 1) is related to the second direction (that is, B in FIG. 1). 〖-: ^, The width Wb on the line) is the same. Since the formed first region 14 has a uniform width Wa & Wb, the reflection efficiency is increased to improve the image quality of the reflective liquid crystal display device. This paper size applies to China National Standard (CNS) A4 specifications (210X297 public love) 7 (Please read the precautions on the back before filling in this page) • 、 may | 5. Description of the invention (5) The above-mentioned reflective electrode is about including horizontal All directions perpendicular to the vertical direction have a fixed reflectivity, because the microlenses of the reflective electrode (ie, the second region 16) are configured isotropically in all directions. However, the reflective electrode cannot be applied to an electronic device, such as a mobile phone, which needs to be highly reflective in a specific direction. If the entire pattern can be changed in order to increase the reflectivity of the reflective electrode in a specific direction, the processing conditions should be optimized again and other problems such as the symmetry of the entire substrate may occur. Brief Description of the Invention The present invention has solved the above-mentioned problems, and it is therefore an object of the present invention to provide a reflective liquid crystal display device whose reflectivity can be controlled in a specific direction regardless of the shape of the lens. Another object of the present invention is to provide an electronic display device which can control its reflectivity regardless of the shape of a lens in a specific direction. In order to achieve the purpose of the invention, a reflective liquid crystal display is provided, including a first substrate on which pixels are formed, a second substrate is disposed opposite to the first substrate, and a liquid crystal layer is formed on the first Between the substrate and the second substrate, and a reflective electrode is formed on the first substrate and has a first region and a second region, which have relatively high and low heights for scattering light. The first region has a first width in the first direction, which is wider than the second width in the second direction. In order to have a first reflectivity in the first direction, it is relatively higher than in the second direction. On the second reflective. In a preferred aspect of the present invention, the first region has a groove shape and its height is relatively lower than the second region, and the second region has a protrusion shape and its height is relatively higher than the first region. The first region has a first -I ^ ΓΊ ΓΊ [I -I ^ ΓΊ ΓΊ [I in one direction, and a second groove system is continuous. A groove is continuously formed in the first ground structure in the second direction. Please read the precautions on the back before filling out this page. In order to achieve the other purpose of the invention, an electronic display device is provided which includes an insulating substrate with a pixel formed on it, and a reflective member connected to the pixel and formed on the _ substrate. . The reflecting member has a plurality of first regions and a plurality of second regions having relatively high and low heights for scattering light. The first region has a first width in the first direction, which is wider than the second width in the second direction. In order to have a first reflectivity in the first direction, it is relatively higher than in the second direction. The second reflectivity. According to the present invention, the reflective electrode of the reflective liquid crystal display device has a wide width in a direction of one of the pixels requiring retroreflectivity. Therefore, the reflective liquid crystal display device has an improved aperture ratio, and increases the reflectivity in a specific desired direction by changing the width of the groove regardless of the shape of the lens. BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects and advantages of the present invention will become more apparent by referring to the following detailed description in conjunction with the accompanying drawings, in which: Figure 1 is a plan view showing a mask The reflective electrode or pattern on it is used to constitute the reflective electrode disclosed in Korean Patent Application No. 1999_7093; Figures 2A and 2B are cross-sectional views taken along line AKAi and BrBi in Figure 1 , Which is a method for forming a plurality of grooves on an organic insulating layer; FIG. 3 is a plan view showing a reflective electrode on a photomask or 9 paper standards applicable to Chinese National Standard (CNS) A4 specifications (210X297 mm) 591570 A7 ------------- B7 V. Description of the invention (7) " " ------ Theta case-used to constitute the first _ specific implementation of the present invention Fig. 4 is a cross-sectional view of a reflective liquid crystal display device having a reflective electrode of a first embodiment of the present invention; Figs. 5A to 5E are cross-sectional views illustrating a manufacturing process; The reflective liquid crystal display device shown in Fig. 4 Figure 6 is a plan view showing a reflective electrode or pattern on a photomask used to form a reflective electrode of a second embodiment of the present invention; Figures 7A and 7B are along the 6th In the figure, a cross-sectional view of the lines Αό-Α6, Λβ6-Β6, illustrates a method of forming a plurality of trenches on an organic insulating layer. A detailed description of specific embodiments: aq Hereinafter, a reflection type liquid crystal display device according to a preferred embodiment of the present invention will be described in detail with reference to accompanying drawings. Fig. 3 is a plan view showing a reflective electrode or pattern on a photomask, which is used to constitute the reflective electrode of the first embodiment of the present invention. Referring to FIG. 3, a reflective electrode according to a first embodiment of the present invention has a first region 290 and a second region 295, which are formed in a pixel region and have relatively high and low heights. The first region 29o includes a plurality of first grooves 290a and a plurality of second grooves 290b. The first grooves 29oa are continuously formed along the horizontal direction of the pixel region, and the second grooves 29ob. It is formed continuously in the vertical direction of the pixel region. The width of the second groove 29% is wider than the width of the first groove 290a, thus ensuring the viewing angle of the display in the vertical direction (i.e., the 'up-down direction) with respect to the pixel region, and improving the reflectivity. This paper size applies Chinese National Standard (CNS) M specifications (210x297 mm) 10
C請先閱讀背面之注意事項再填窝本頁) 、一-T— 591570 A7 五、發明説明（ 第一區域290係構成在溝槽之形狀中，其之高度相對 地低於第二區域295的高度，同時第二區域295係構成在突 起的形狀中其之高度相對地高於第一區域290之高度，因此 其扮演微透鏡的角色。 第4圖係為具有本發明之第一具體實施例之反射電極 的一反射式液晶顯示裝置的橫截面視圖。 參考第4圖，反射式液晶顯示裝置具有一第一基板 210、一第二基板220、一液晶層230、以及一反射電極235。 像素係構成在第一基板210上，第二基板220係配置與第一 基板210相對應。液晶層230係構成在第一基板210與第二基 板220之間。反射電極235係為反射式液晶顯示裝置的一像 素電極。 第一基板210包括一第一絕緣基板240以及一薄膜電 晶體（TFT)245構成在第一絕緣基板240上。薄膜電晶體245 其之功能如同一切換元件。薄膜電晶體245具有一閘極 250、一閘極絕緣層255、一活性層260、一歐姆的接觸層 265、一源極270，以及一汲極275。 一有機絕緣層280係由一諸如光阻劑的感光性材料所 組成，其係構成在包括薄膜電晶體245之第一絕緣層240 上。接點孔285係構成穿過有機絕緣層280，將每一薄膜電 晶體245之汲極275部分地曝光。 反射電極235係構成在接點孔285以及有機絕緣層280 上。每一反射電極235係連接至對應之汲極275穿過接點孔 285,因此每一薄膜電晶體245係與對應之反射電極235電氣 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 11 (請先閲讀背面之注意事項再填寫本頁) 、v一 u 591570 A7 B7 五 、發明説明（9 地連接。 (請先閲讀背面之注意事項再填寫本頁) 一第一定向層300係構成在反射電極235與有機絕緣 層280上。 第二基板220係配置與第一基板210相對，並包括一第 二絕緣基板305、一色彩濾光鏡3 10、一共用電極315、一第 —定向層320、一相位板325、以及一偏振板330。 第二絕緣基板305係由與第一絕緣基板240之相同的 材料所組成，例如，玻璃或是陶瓷。相位板325以及一偏振 板3 3 0係連續地構成在第二絕緣基板3 〇 5上。色彩遽光鏡310 係配置在第二絕緣基板305下方。共用電極315與第二定向 層320係依次地構成在第二絕緣基板3〇5下方。第二定向層 320與第一基板210之第一定向層300的功能係以一預定角 度預先將液晶層230之液晶分子傾斜。 分隔物335及336係插入於第一基板210與第二基板 220之間，在第一基板21〇與第二基板220之間提供一預定的 工間。液晶層230係構成在介於第一基板210與第二基板220 之間的空間中。 以下，相關於伴隨的圖式詳細地說明製造第4圖中之 反射式液晶顯示裝置的方法。 弟5 A至5E圖係為橫截面視圖，圖示一種製造第4圖中 之反射式液晶顯示裝置的方法。於第5A至5E圖中，相同的 元件標號係用於與第4圖中相同之元件。 參考笫5 A圖，以|呂（A1)、絡（Cr)或鉬-鶴（Mo-W)所製成 的第一金屬薄膜，係構成在由一絕緣材料，諸如玻璃、陶 591570 A7 ___ B7 五、發明説明（10 ) 瓷等，所組成的第一絕緣基板240上。因而，第一金屬薄膜 係圖案化構成閘極線路（未顯示）以及由每一閘極線路分支 的閘極250。因而，一由氮化矽所構成的閘極絕緣層255係 構成在包括閘極250的第一絕緣基板24〇的整個表面上。較 佳地，閘極絕緣層255係藉由一電漿增強式化學氣相沉積法 (PECVD)所構成。 在藉由電漿增強式化學氣相沉積法（PECVD)在閘極絕 緣層2 5 5上連續地 >儿積一非結晶;g夕層與一在原處攙添的非 結晶石夕層’該等非結晶石夕層加以圖案化用以在閘極絕緣層 255上構成活性層260與歐姆接觸層265，閘極250係位在閘 極絕緣層255的下方。 其後，在合成結構上沉積一以鉻（Cr)製成的第二金屬 薄膜之後，第二金屬薄膜係加以圖案化構成資料線路（未顯 示）、源極270、以及汲極275，藉此完成薄膜電晶體245。 每一薄膜電晶體245包括閘極250、活性層260、歐姆接觸層 265、源極270以及汲極275。資料線路係與閘極線路垂直， 而源極270與汲極275係為資料線路的分支。閘極絕緣層255 係配置在閘極線路與資料線路之間，因此閘極線路不致與 資料線路接觸。 接著，藉由一旋轉塗佈法將光阻劑塗佈在薄膜電晶體 245構成於其上的第一絕緣基板240之整個表面上，從而在 第一絕緣基板240上構成一有機絕緣層280其之厚度约為1 至3微米。 參考第5B圖，在將用於構成接點孔285的一第一光罩 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 13 (請先閲讀背面之注意事項再填寫本頁)C Please read the precautions on the back before filling in this page) Ⅰ-T- 591570 A7 V. Description of the invention (The first area 290 is formed in the shape of the groove, and its height is relatively lower than the second area 295 At the same time, the height of the second region 295 is relatively higher than the height of the first region 290 in the shape of the protrusion, so it plays the role of a microlens. Figure 4 is a first embodiment of the present invention. A cross-sectional view of a reflective liquid crystal display device with a reflective electrode as an example. Referring to FIG. 4, the reflective liquid crystal display device has a first substrate 210, a second substrate 220, a liquid crystal layer 230, and a reflective electrode 235. The pixel is formed on the first substrate 210, and the second substrate 220 is disposed corresponding to the first substrate 210. The liquid crystal layer 230 is formed between the first substrate 210 and the second substrate 220. The reflective electrode 235 is a reflective liquid crystal A pixel electrode of a display device. The first substrate 210 includes a first insulating substrate 240 and a thin film transistor (TFT) 245 formed on the first insulating substrate 240. The thin film transistor 245 functions as the same switching element The thin film transistor 245 has a gate 250, a gate insulating layer 255, an active layer 260, an ohmic contact layer 265, a source 270, and a drain 275. An organic insulating layer 280 consists of a A photoresist, such as a photoresist, is formed on the first insulating layer 240 including the thin film transistor 245. The contact hole 285 is formed through the organic insulating layer 280 to draw each thin film transistor 245. The electrode 275 is partially exposed. The reflective electrode 235 is formed on the contact hole 285 and the organic insulating layer 280. Each reflective electrode 235 is connected to the corresponding drain electrode 275 and passes through the contact hole 285. Therefore, each thin film transistor 245 Corresponding reflective electrode 235 electrical This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 11 (Please read the precautions on the back before filling this page), v one u 591570 A7 B7 V. Description of the invention (9-ground connection. (Please read the precautions on the back before filling out this page) A first alignment layer 300 is formed on the reflective electrode 235 and the organic insulating layer 280. The second substrate 220 is disposed opposite the first substrate 210 And includes a second The edge substrate 305, a color filter 310, a common electrode 315, a first-orientation layer 320, a phase plate 325, and a polarizing plate 330. The second insulating substrate 305 is the same as the first insulating substrate 240 The material is composed of, for example, glass or ceramic. The phase plate 325 and a polarizing plate 3 30 are continuously formed on the second insulating substrate 3 05. The color calender 310 is disposed under the second insulating substrate 305 The common electrode 315 and the second alignment layer 320 are sequentially formed below the second insulating substrate 305. The functions of the second alignment layer 320 and the first alignment layer 300 of the first substrate 210 are to tilt the liquid crystal molecules of the liquid crystal layer 230 in advance at a predetermined angle. The partitions 335 and 336 are inserted between the first substrate 210 and the second substrate 220, and a predetermined workshop is provided between the first substrate 210 and the second substrate 220. The liquid crystal layer 230 is formed in a space between the first substrate 210 and the second substrate 220. Hereinafter, a method for manufacturing the reflective liquid crystal display device in FIG. 4 will be described in detail with reference to the accompanying drawings. 5A to 5E are cross-sectional views illustrating a method of manufacturing the reflective liquid crystal display device in FIG. 4. In FIGS. 5A to 5E, the same component numbers are used for the same components as those in FIG. Referring to Figure 5A, the first metal thin film made of | Lu (A1), Cr (Cr), or Mo-W is composed of an insulating material such as glass, ceramic 591570 A7 ___ B7 V. Description of the invention (10) Porcelain, etc., on a first insulating substrate 240. Thus, the first metal thin film is patterned to form a gate line (not shown) and a gate 250 branched from each gate line. Therefore, a gate insulating layer 255 made of silicon nitride is formed on the entire surface of the first insulating substrate 24o including the gate 250. More preferably, the gate insulating layer 255 is formed by a plasma enhanced chemical vapor deposition (PECVD) method. On the gate insulating layer 2 5 5 by plasma enhanced chemical vapor deposition (PECVD), a continuous > amorphous layer and a non-crystalline stone layer added in situ ' The amorphous stone layers are patterned to form an active layer 260 and an ohmic contact layer 265 on the gate insulating layer 255. The gate 250 is located below the gate insulating layer 255. Thereafter, after depositing a second metal thin film made of chromium (Cr) on the composite structure, the second metal thin film is patterned to form a data line (not shown), a source electrode 270, and a drain electrode 275, thereby The thin film transistor 245 is completed. Each thin film transistor 245 includes a gate electrode 250, an active layer 260, an ohmic contact layer 265, a source electrode 270, and a drain electrode 275. The data line is perpendicular to the gate line, and the source 270 and drain 275 are branches of the data line. The gate insulation layer 255 is arranged between the gate line and the data line, so the gate line does not contact the data line. Next, a photoresist is applied on the entire surface of the first insulating substrate 240 on which the thin film transistor 245 is formed by a spin coating method, thereby forming an organic insulating layer 280 on the first insulating substrate 240. The thickness is about 1 to 3 microns. Referring to Figure 5B, the paper size of a first photomask used to form the contact hole 285 applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 13 (Please read the precautions on the back before filling this page )
591570 A7 ____B7_ 五、發明説明（11 ) 450覆蓋在有機絕緣層280上後，有機絕緣層280係利用第一 光罩曝光益顯影。因此’接點孔2 8 5係構成穿過有機絕緣層 280用以將對應的汲極275部分地曝光，同時地複數之溝槽 係構成在有機絶緣層280之表面處。構成接點孔285穿過有 機絕緣層280之加工與在有機絕緣層280中構成溝槽的加工 將於以下加以說明。 第5C及5D圖係為沿著第3圖中線ΑγΑ3,及B3-B3,所取 之橫截面視圖，分別地特別顯示構成於第4B圖中之接點孔 285之加工以及構成溝槽之加工。 首先’為了在有機絕緣層280中構成接點孔285，第一 光罩450(見第5B圖）係配置覆蓋於由光阻劑所組成之有機 絕緣層280上。第一光罩450具有與接點孔285對應的圖案。 接著，有機絕緣層280覆蓋汲極275的一部分主要係經由一 完全的曝光處理而加以曝光。 接著，用於構成微透鏡的第二光罩5〇〇具有與溝槽相 對應之圖案，其係配置覆蓋有機絕緣層28〇，如第5(：及5〇 圖中所示，為了在有機絕緣層280之表面中構成複數之溝槽 290a及290b。第二光罩500所包括之圖案的形狀係與第3圖胃 中反射電極235的形狀相同。特別地，圖案係構成在一透明 的基板上俾使沿著像素之一第一方向（亦即，第3圖中線 A^A3’)所具有之溝槽的第一寬度（Wla)，係窄於沿著像素之 一第二方向（亦即，第3圖中線^3，)上溝槽的第二寬度 (Wib)，從而完成第二光罩500。像素之第一與第二方向分 別地與像素之水平及垂直的方向對應。 本紙張尺度適用中國國(CNS) A4规格（210X297公楚 1 "一"----- (請先閲讀背面之注意事項再填寫本頁) 、可丨 591570 A7 _B7_ 五、發明説明（12 ) (請先閲讀背面之注意事項再填寫本頁) 除了接點孔285外有機絕緣層280係其次地藉由一透 鏡曝光加工（一用於構成透鏡的曝光加工）利用第二光罩 500而曝光。 接著，將有機絕緣層280顯影從而構成接點孔285，將 通過機絕緣層280與位在有機絕緣層280之表面中的溝槽將 對應之汲極275曝光。亦即，包括第一與第二溝槽290a及 290b之溝槽係連續地構成在有機絕緣層280之表面中，其中 第一溝槽290a沿著像素之第一方向（亦即，水平方向）構成 有第一寬度，而第二溝槽290b的第二寬度係寬於沿著像素 之第二方向（亦即，垂直方向）所構成之第一寬度。因此， 有機絕緣層280之表面係劃分成由複數之連續地構成的溝 槽所組成的第一區域290、以及由第一區域290所封閉之複 數之突起所製成的第二區域295。 參考第5E圖，於構成有溝槽之有機絕緣層280上沉積 一第三金屬薄膜之後，將第三金屬薄膜圖案化構成具有如 第4圖中所示之預定像素之形狀的反射電極235。第三金屬 薄膜包括一金屬具有良好的反射性，諸如鋁（A1)、鎳（Ni)、 鉻（Cr)、銀（Ag)等。因而，將一光阻劑塗佈在反射電極235 上並經摩擦處理，從而構成一第一定向層300其係以一預定 角度預先將液晶層230之液晶分子傾斜。 每一反射電極235所具有的形狀係與有機絕緣層280 之表面的形狀相同。反射電極235係劃分成具有複數之溝槽 的第一區域290，該溝槽係構成在有機絕緣層280之溝槽 上，以及第二區域295包括複數之突起，該區域係與微透鏡 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） _ 15 - 591570 A7 一 — S7_ 五、發明説明（13 ) ~ 一 — 區域相配合。較佳地，第一區域29〇其之結構中複數之第一 溝槽與複數之第二溝槽係連續地構成。第一溝槽沿著像素 之第一方向（亦即，水平方向）構成有第一寬度，而第二溝 槽的第二寬度係寬於沿著像素之第二方向（亦即，垂直方向） 所構成之第一寬度。根據具有上述結構的反射電極，由於 沿著第二方向（亦即’垂直方向）的第二溝槽的寬度較沿著 第一方向（亦即，水平方向）之第一溝槽之寬度為寬，因此 改良了顯示器在向上與向下的方向上之視角與反射性。 現參考第5E圖，-色彩濾光鏡31G、_共用電極315、 以及ϋ向層32G係連續地構成在_第二絕緣基板奶 上，係以與第一絕緣基板24〇相同之材料所組成，從而完成 一第二基板220。 將第一基板220與第一基板21〇相對配置之後，第一與 第二基板210及220係藉由介於第一基板21〇與第二基板22q 之間插入的分隔物335而互相結合。因此，在第一基板21〇 與第一基板220之間配置一預定的空間。接著，藉由真空抽 吸法將液晶引入第一基板210與第二基板220之間的空間 中’用以構成一液晶層230，藉此完成本發明之反射式液晶 顯示裝置。於此狀況下，一偏振板33〇與一相位板325係可 構成弟一^基板220之正面。此外，一黑色矩陣（black matnX)(未顯示）係可配置在第二絕緣基板305與色彩濾光 鏡310之間。 根據本發明之第一具體實施例，反射電極235係由具 有一溝槽形狀的複數之第一區域290與具有突起形狀的複 本紙張尺度適财0 81¾轉（㈣M雜⑵G><297公督) 16 (請先閱讀背面之注意事項再填寫本頁)591570 A7 ____B7_ V. Description of the Invention (11) After the 450 is covered on the organic insulating layer 280, the organic insulating layer 280 is exposed and developed using the first photomask. Therefore, the contact holes 2 8 5 are formed through the organic insulating layer 280 to partially expose the corresponding drain electrodes 275, and a plurality of trenches are formed at the surface of the organic insulating layer 280. The process of forming the contact hole 285 through the organic insulating layer 280 and the process of forming a groove in the organic insulating layer 280 will be described below. 5C and 5D are cross-sectional views taken along lines AγA3, and B3-B3 in FIG. 3, and particularly show the processing of the contact holes 285 formed in FIG. 4B and the grooves. machining. First, in order to form a contact hole 285 in the organic insulating layer 280, the first photomask 450 (see FIG. 5B) is disposed and covered on the organic insulating layer 280 composed of a photoresist. The first mask 450 has a pattern corresponding to the contact hole 285. Next, a part of the organic insulating layer 280 covering the drain electrode 275 is mainly exposed through a complete exposure process. Next, a second photomask 500 for forming a microlens has a pattern corresponding to the groove, and is configured to cover the organic insulating layer 28, as shown in FIGS. 5 (: and 50). A plurality of grooves 290a and 290b are formed in the surface of the insulating layer 280. The shape of the pattern included in the second photomask 500 is the same as that of the reflective electrode 235 in the stomach of FIG. 3. In particular, the pattern is formed in a transparent The first width (Wla) of the grooves along the first direction of one of the pixels (that is, line A ^ A3 'in FIG. 3) is narrower than the second direction of one of the pixels. The second width (Wib) of the groove on the line (i.e., line 3 in FIG. 3), thereby completing the second mask 500. The first and second directions of the pixels correspond to the horizontal and vertical directions of the pixels, respectively. 。 This paper size applies to China (CNS) A4 specifications (210X297 Gongchu 1 " 一 " ----- (Please read the precautions on the back before filling out this page) 、 591570 A7 _B7_ V. Description of the invention (12) (Please read the notes on the back before filling this page) Except for the contact hole 285, the organic insulating layer 280 series Secondly, exposure is performed by a lens exposure process (an exposure process for forming a lens) with the second mask 500. Then, the organic insulating layer 280 is developed to form a contact hole 285, and the organic insulating layer 280 and the bit The trench in the surface of the organic insulating layer 280 exposes the corresponding drain electrode 275. That is, the trench including the first and second trenches 290a and 290b is continuously formed in the surface of the organic insulating layer 280, wherein The first groove 290a is formed with a first width along the first direction of the pixel (that is, the horizontal direction), and the second width of the second groove 290b is wider than the second direction along the pixel (that is, the vertical direction) Direction). Therefore, the surface of the organic insulating layer 280 is divided into a first region 290 composed of a plurality of continuously formed trenches, and a plurality of protrusions enclosed by the first region 290. The completed second region 295. Referring to FIG. 5E, after depositing a third metal thin film on the organic insulating layer 280 forming the trench, the third metal thin film is patterned to have a predetermined shape as shown in FIG. Pixel shape Reflective electrode 235. The third metal thin film includes a metal with good reflectivity, such as aluminum (A1), nickel (Ni), chromium (Cr), silver (Ag), etc. Therefore, a photoresist is coated on the reflection The electrodes 235 are subjected to a rubbing treatment to form a first alignment layer 300. The liquid crystal molecules of the liquid crystal layer 230 are tilted in advance at a predetermined angle. The shape of each reflective electrode 235 is similar to the surface of the organic insulating layer 280. The shape of the reflective electrode 235 is divided into a first region 290 having a plurality of trenches, the trenches being formed on the trenches of the organic insulating layer 280, and the second region 295 including a plurality of protrusions, the regions being connected with Microlens This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) _ 15-591570 A7 I—S7_ V. Description of the invention (13) ~ I—Region matching. Preferably, the plurality of first grooves and the plurality of second grooves in the structure of the first region 29 are formed continuously. The first groove is formed with a first width along the first direction of the pixel (that is, the horizontal direction), and the second width of the second groove is wider than the second direction along the pixel (that is, the vertical direction) The first width formed. According to the reflective electrode having the above structure, since the width of the second trench in the second direction (ie, the “vertical direction”) is wider than the width of the first trench in the first direction (ie, the horizontal direction) Therefore, the viewing angle and reflectivity of the display in the upward and downward directions are improved. Referring now to FIG. 5E, the color filter 31G, the common electrode 315, and the orientation layer 32G are continuously formed on the second insulating substrate, and are composed of the same material as the first insulating substrate 24. Thus, a second substrate 220 is completed. After the first substrate 220 and the first substrate 210 are disposed opposite to each other, the first and second substrates 210 and 220 are combined with each other by a spacer 335 interposed between the first substrate 21 and the second substrate 22q. Therefore, a predetermined space is arranged between the first substrate 21 and the first substrate 220. Next, liquid crystal is introduced into the space between the first substrate 210 and the second substrate 220 'by a vacuum suction method to form a liquid crystal layer 230, thereby completing the reflective liquid crystal display device of the present invention. In this case, a polarizing plate 33 and a phase plate 325 can form the front surface of the substrate 220. In addition, a black matrix (not shown) may be disposed between the second insulating substrate 305 and the color filter 310. According to a first embodiment of the present invention, the reflective electrode 235 is composed of a plurality of first regions 290 having a groove shape and a replica paper having a protruding shape. The paper size is 0 81¾ turns (㈣M 杂 ⑵G > < 297) ) 16 (Please read the notes on the back before filling this page)
591570 A7 B7 五、發明説明（14 ) 數之第二區域295所組成，而沿著像素之垂直方向所構成之 第二溝槽290b其之寬度在第一區域290中係寬於沿著像素 之水平方向所構成之第一溝槽290a的寬度。因此，確保沿 著向上及向下方向顯示器之視角以及在像素之向上及向下 方向增加顯示器的反射性，因為沿著像素之垂直方向所構 成的反射電極235之溝槽寬度寬於沿著像素之水平方向所 構成之溝槽的寬度。 第6圖係為一平面圖顯示位在一光罩上的反射電極或 圖案，用於構成本發明之第二具體實施例的反射電極。 參考第6圖，本發明之一反射電極係劃分成第一區域 290與第二區域295，在像素區域中具有相對高與低的高 度。第一區域290所具有之溝槽形狀其之高度相對地低於第 二區域295，而第二區域295具有突起的形狀其之高度相對 地高於第一區域290,因此第二區域295的功能如同微透鏡。 第一區域290包括複數之沿著像素區域之水平方向連 續地構成的第一溝槽290a，以及複數之沿著像素區域之垂 直方向上連續地構成的第二溝槽290b。第一溝槽290a的寬 度分別地寬於第二溝槽290b的寬度。因此，確保沿著像素 之左及右方向顯示器之視角以及在像素之左及右方向增加 顯示器的反射性，因為沿著像素之水平方向所構成的溝槽 寬度寬於沿著像素之垂直方向所構成之溝槽的寬度。 一種用於在一有機絕緣層上構成複數溝槽的方法，其 係為了提供具有將於以下說明之上述結構的反射電極。 第7A圖係為沿著第6圖中線A6-A6，所取之橫截面視 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 17 (請先閱讀背面之注意事項再填寫本頁)591570 A7 B7 V. Description of the invention (14) is composed of the second region 295, and the second groove 290b formed along the vertical direction of the pixel has a width in the first region 290 that is wider than that along the pixel. The width of the first groove 290a formed in the horizontal direction. Therefore, ensure the viewing angle of the display along the upward and downward directions and increase the reflectivity of the display in the upward and downward directions of the pixels, because the groove width of the reflective electrode 235 formed along the vertical direction of the pixels is wider than that along the pixels. The width of the groove formed by the horizontal direction. Fig. 6 is a plan view showing a reflective electrode or pattern on a photomask, which is used to constitute a reflective electrode in a second embodiment of the present invention. Referring to FIG. 6, a reflective electrode system of the present invention is divided into a first region 290 and a second region 295, and has a relatively high and low height in a pixel region. The height of the groove shape of the first region 290 is relatively lower than that of the second region 295, and the height of the second region 295 is relatively higher than that of the first region 290, so the function of the second region 295 is Like micro lenses. The first region 290 includes a plurality of first trenches 290a continuously formed along the horizontal direction of the pixel region, and a plurality of second trenches 290b continuously formed along the vertical direction of the pixel region. The width of the first trench 290a is wider than the width of the second trench 290b, respectively. Therefore, ensure the viewing angle of the display along the left and right directions of the pixel and increase the reflectivity of the display because the width of the groove formed along the horizontal direction of the pixel is wider than that of the vertical direction along the pixel. The width of the trench. A method for forming a plurality of trenches on an organic insulating layer is to provide a reflective electrode having the above-mentioned structure to be described below. Figure 7A is taken along line A6-A6 in Figure 6. The cross-section taken is based on the paper size and applies the Chinese National Standard (CNS) A4 specification (210X297 mm). 17 (Please read the notes on the back before filling (This page)
591570 A7 B7 五、發明説明（l5 ) 圖，以及第7B圖係為沿著第6圖中線B6-B6,所取之橫截面視 圖，其係圖示在有機絕緣層上構成複數之溝槽的方法。 參考第7A及7B圖，為了在有機絕緣層280中構成複數 之溝槽290a及290b，一用於構成微透鏡的光罩510具有之圖 案係與複數之溝槽相對應，其係配置覆蓋一有機絕緣層 280。特別地，光罩圖案係構成在一透明的基板上俾使沿著 像素之一第一方向（亦即，第6圖中線A6-A6，）所具有之溝槽 的一寬度（W2a)，係寬於沿著像素之一第二方向（亦即，第6 圖中線B6-B6，）上溝槽的第二寬度（W2b)，從而完成光罩 510。像素之第一與第二方向分別地與像素之水平及垂直的 方向對應。 藉由一透鏡曝光加工利用光罩510將有機絕緣層280 曝光並顯影之後，複數之溝槽係連續地構成在有機絕緣層 280之表面中。亦即，具有第一寬度的第一溝槽290a係沿著 像素之第一方向（亦即，像素之水平方向）構成，而具有第 二寬度之第二溝槽2 9 0 b係同時地沿著像素之第二方向（亦 即，像素之垂直方向）所構成。較佳地，第一溝槽290a之第 一寬度係寬於第二溝槽290b之第二寬度。因此，有機絕緣 層280之表面係劃分成由複數之連續地構成的溝槽所組成 的第一區域290、以及由第一區域290所封閉之複數之突起 所組成的第二區域295。 根據本發明之上述說明，構成反射電極之溝槽俾使在 需要高反射性的像素方向上具有較寬之寬度。因此，於所 欲之方向上不論透鏡的形狀變化溝槽之寬度，從而確保顯 18 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 591570 A7 B7 五、發明説明（16 ) 示器沿著特定方向的視角並增加在特定方向的反射性。 儘管本發明之較佳的具體實施例已加以說明，但是應 暸解的是不應限制在該等較佳的具體實施例上，熟知此技 藝之人士可以作不同的變化與修改而不致背離由之後的申 請專利範圍所定出之本發明的精神與範疇。 元件標號對照 12…有機絕緣層 285···接點孔 14…第一區域 290…第一區域 16…第二區域 290a…第一溝槽 20…光罩 290b…第二溝槽 210···第一基板 295…第二區域 220···第二基板 300…第一定向層 230···液晶層 305…第二絕緣基板 235···反射電極 310…色彩濾光鏡 240···第一絕緣基板 315…共用電極 245···薄膜電晶體 320…第二定向層 250…閘極 325…相位板 255···閘極絕緣層 330…偏振板 260···活性層 335…分隔物 265…歐姆接觸層 336…分隔物 270…源極 450…第一光罩 275···汲極 500…第二光罩 280…有機絕緣層 510…光罩 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 19 (請先閲讀背面之注意事項再填寫本頁)591570 A7 B7 V. Description of the invention (l5), and FIG. 7B is a cross-sectional view taken along line B6-B6 in FIG. 6, which illustrates the formation of a plurality of grooves on the organic insulating layer Methods. Referring to FIGS. 7A and 7B, in order to form a plurality of grooves 290a and 290b in the organic insulating layer 280, a photomask 510 for forming a microlens has a pattern corresponding to the plurality of grooves, and its configuration covers a Organic insulating layer 280. In particular, the mask pattern is formed on a transparent substrate so as to have a width (W2a) along a groove in a first direction of a pixel (that is, line A6-A6 in FIG. 6), It is wider than the second width (W2b) of the groove along the second direction of one of the pixels (ie, the line B6-B6 in FIG. 6), thereby completing the photomask 510. The first and second directions of the pixels correspond to the horizontal and vertical directions of the pixels, respectively. After the organic insulating layer 280 is exposed and developed using the mask 510 through a lens exposure process, a plurality of grooves are continuously formed in the surface of the organic insulating layer 280. That is, the first groove 290a having the first width is formed along the first direction of the pixel (ie, the horizontal direction of the pixel), and the second groove 290a having the second width is along the same time It is constituted by the second direction of the pixel (that is, the vertical direction of the pixel). Preferably, the first width of the first trench 290a is wider than the second width of the second trench 290b. Therefore, the surface of the organic insulating layer 280 is divided into a first region 290 composed of a plurality of continuously formed trenches, and a second region 295 composed of a plurality of protrusions enclosed by the first region 290. According to the above description of the present invention, the grooves constituting the reflective electrode have a wide width in a pixel direction requiring high reflectivity. Therefore, regardless of the shape of the lens, the width of the grooves is changed in the desired direction, so as to ensure the display of 18 (please read the precautions on the back before filling this page). (Centi) 591570 A7 B7 5. Description of the invention (16) The angle of view of the display along a specific direction and increase the reflectivity in a specific direction. Although the preferred embodiments of the present invention have been described, it should be understood that they should not be limited to these preferred embodiments. Those skilled in the art can make different changes and modifications without departing from the reasons. The spirit and scope of the present invention are determined by the scope of patent application. Element reference number 12 ... Organic insulating layer 285 ... Contact hole 14 ... First region 290 ... First region 16 ... Second region 290a ... First trench 20 ... Reticle 290b ... Second trench 210 ... First substrate 295 ... Second region 220 ... Second substrate 300 ... First alignment layer 230 ... Liquid crystal layer 305 ... Second insulating substrate 235 ... Reflective electrode 310 ... Color filter 240 ... First insulating substrate 315 ... Common electrode 245 ... Thin film transistor 320 ... Second orientation layer 250 ... Gate 325 ... Phase plate 255 ... Gate insulation layer 330 ... Polarizing plate 260 ... Active layer 335 ... Separated Object 265 ... Ohm contact layer 336 ... Separator 270 ... Source 450 ... First photomask 275 ... Drain 500 ... Second photomask 280 ... Organic insulation layer 510 ... Photomask This paper applies Chinese national standards (CNS) ) A4 size (210X297mm) 19 (Please read the notes on the back before filling this page)