TW589240B - Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale - Google Patents

Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale Download PDF

Info

Publication number
TW589240B
TW589240B TW91124988A TW91124988A TW589240B TW 589240 B TW589240 B TW 589240B TW 91124988 A TW91124988 A TW 91124988A TW 91124988 A TW91124988 A TW 91124988A TW 589240 B TW589240 B TW 589240B
Authority
TW
Taiwan
Prior art keywords
arc
rotation
shaped
rotary table
center
Prior art date
Application number
TW91124988A
Other languages
Chinese (zh)
Inventor
Yung-Tian Liou
Rung-Feng Feng
Jiun-Chau Wang
Original Assignee
Yung-Tian Liou
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yung-Tian Liou filed Critical Yung-Tian Liou
Priority to TW91124988A priority Critical patent/TW589240B/en
Application granted granted Critical
Publication of TW589240B publication Critical patent/TW589240B/en

Links

Abstract

The present invention relates to a non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale, comprising an arc-shaped or circular rotary table, at least one set of displacement-driving elements arranged on the rotary table and an arc-shaped base or a pivot that guides and/or supports rotation of the rotary table, wherein the set of displacement-driving elements includes an impact element, a piezoelectric element, an inertia body, and a spring. The displacement-driving element set receives electric pulses, which causes instant deformation of extension/retraction on the piezoelectric element, which in turn induces an impact force, driving the impact element to hit the rotary table for overcoming the friction induced by the base or the pivot thereby generating micro-movement with respect to the base or the pivot. As such, the circular or arc-shaped rotary table can make non-linear displacement in nanometer/micrometer scale.

Description

589240 A7 B7 五、發明說明 本發明係關於一種具奈/微米旋動功能之非直線旋動 U凋裝置,尤指一種可令圓形或弧形旋動檯具有奈/微米 旋動位移者。 μ589240 A7 B7 V. Description of the invention The present invention relates to a non-linear rotating U-shaped device with a nano / micron rotation function, especially a person that can make a circular or arc-shaped rotary table have a nano / micron rotation displacement. μ

近年來隨著光電、通訊、半導體、生物科技等產品之 精密化、微小化的趨勢,相關零件亦愈趨精密細緻,反應 在組裝或檢查程序上,即對相關作業機檯、基檯的定位精 度要求極高,這些組裝或檢查作f所要求精度所跨足的^ 業包含有:磁碟機:資料讀寫頭的組裳、傳真機肖光學頭電 路板的組裝、半導體檢查裝置之光學系統,或光纖轉合對 準等領域’該等精密製程作業通常所要求精度均在微米 區,甚至低於l〇〇nm以下的尺寸。 上述提及的各種生產精密零件產業所使用的定位裝 置’大多會利用到伺服馬達及滚珠螺桿所構成的驅動裝 置’但隨著產品微小化的趨勢,#求的作業精度已愈來愈 接近傳統舰機構之解析度的上限,且這些精密零組件& 組裝時,仍存在下列缺點: 1 ·零件微小,不利組裝作業。 2.零件在稍微固定後,不易作微動調整。 3 .零件在精確位置調整後,因後續的強力固定作 業,會使位置再偏移。 由於傳統伺服移動機構在微米以下之微動範圍,傳動 組件間存在著‘黏著—滑動(stid(-slip),,的問題,不 易達到精確的定位要求,故此類組裝作業大多仰賴熟練技 術士的技術及經驗的判斷,以人工調整的方式達到高精密 祕尺度適用中國鳴) A7 -------— B7 五、發明糊(〉) ~ ~- 的作業需求。 ,上所述,對於精密產制使用之微調_,不僅無 ^確實達到奈/微米尺寸平移效果,亦無法達到精密的奈 =微米旋動微調功能,是以,該等精密機㈣移動裝置仍 1進一步改良,才能達到較為精良的產品,有㈣此,本 〃月人奴即。又„十出一系列單軸向及多軸向的奈/微米級的 旋動微調裝置,以令相關產業的精密定位或調整裝置,能 獲得更為精密的調整。 為此’本發明主要目的係提供—種非直線微動的裝 置,以適用於旋轉用微調機檯。 右人達上述目的所使用之主要技術手段係於圓形或扇形 旋動檯内面或弧面上形成至少一個容置槽,以供單次產生 奈/微米級衝擊力的位移驅動元件組裝設其中,由於該旋 動檯係由樞軸連接,當位移驅動元件組通入一脈衝電壓信 號時,即可使位移驅動元件組瞬間M並且對旋⑽產^ 衝擊力,令該旋動檯以柩軸為中心產生旋轉微動,因旋動 檯為圓形或扇形的曲弧面體,故藉此產生非直線的奈米級 位移,藉此,可配合微調機檯需求,裝設本發明而達到角 度上的精密調校功能。 本發明次一目的係提供雙軸的非水平軸非直線旋動微 調裝置,係包含有-具弧面的基檯及一第一、第二弧形旋 動檯,該基檯係供第一弧形旋動檯的弧面疊接,而第一弧 形旋動檯則供第二弧形旋動檯的弧面疊接,因為第一、第 二弧形旋轉檯以弧面相接,又,以各弧形旋動檯的中心軸 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) (請先閱讀背面之注意事項再填寫本頁) -------訂---------線---------------- II---- ^9240 A7 B7 第一圖 第二圖 第三圖 第四圖 第五圖 第六圖 五、發明說明(\3) 線^由狐線中心與弧心連線所定義)為中心,於弧面的兩 對稱位置内置各一位移驅動元件,使各弧形旋動檯以中心 輛線為主軸產生弧形運動,若令第-、第二弧形旋動檯的 中心㈣分別對應X、γ軸’則第―、第二孤形旋動楼相 對不動的基檯,產生Χγ軸的軸向運動。。 為使貴審查委員能進一步瞭解本發明具體之設計及 其他目的,茲附以圖式詳細說明如后: (一)圖式部份: 係本發明第一較佳實施例的上視圖。 係第一圖的側剖圖。 係本發明第二較佳實施例的立體分解圖。 係本發明第三較佳實施例的立體組合圖。 係本發明第四較佳實施例的立體分解圖。 係本發明位移驅動元件組各點的特性圖,其揭示 該位移驅動元件組通電後各點呈現的施力狀態與 位移狀態。 (請先閱讀背面之注意事項再填寫本頁) -¾ -------訂--------« (二)圖號部份 (10)基檯 (1 2)螺孔 (2 0)旋動檯 (2 2)凹弧面 (2 4)容置槽 (2 6 )螺孔 (3 1 )凸弧面 (1 1 )凹弧面 (13)長槽 (2 1 )凸弧面 (2 3)容置槽 (2 5)長槽 (3 0)旋動檯 (3 2)容置槽 589240 A7 (3 3 )容置槽 (3 5 )樞孔 (41)容置槽 (4 3)樞軸 (5 1 )壓電元件 (5 3 )慣性體 (6 0 )螺柱 (6 3 )強力磁鐵 (7 〇)夾座 本發明係為 五、發明說明(4) (3 4)容置槽 (4 0)圓形旋動檯 (4 2)容置槽 (5 0 )位移驅動元件組 (5 2)打擊部 (5 4)彈簧 (6 1 )螺帽 (6 4)墊圈 + ,w 種具有微奈米級之旋動微調量的微調平 楼可七、精雄疋位機檯作為非直線微調之用,亦即,可達 到單軸(X/Y/Z)旋動或多軸(χγζ)向旋動的功效。 、凊參閱第一圖所示,係為本發明的第一較佳實施例的 ^視圖,係於一縱軸(Ζ軸)作旋轉運動(旋動)之旋動 搂(40)上形成兩容置槽(41) (42),以供具有 Υ微米級移動的位移驅動it件組(5 0 )裝設其中,本 實施例的縱軸(Z軸)旋動之旋動檯(4 0 )係呈圓形 (俯視觀之),亦可為扇形,其中該旋轉檯(40)的圓 心樞軸(4 3 )為一旋轉時的軸心;當位移驅動元件組 (5 0 )產生早次奈//微米的衝擊力時,可推動該旋動楼 (4 0 )依軸心呈旋轉運動。請再參閱第二圖所示,係為 第一圖的剖面圖,該位移驅動元件組(5 〇 )係包人μ·”、、 壓電兀件(5 1),係具極高的頻率響應特性 施予脈衝電壓,會令其瞬間變形產生衝擊力,· 现 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) (請先閱讀背面之注意事項再填寫本頁) -------訂·-------- ^〇yz^〇 A7 五、發明說明(f ) 一打擊部( 1 )的一端,而 2) ’其一端連接於該壓電元件(5 的内壁上;另-端則抵靠於容置槽(41) (42) 體(5 3),係設置於壓電元件的另一端,即 相對該打擊部(5 2)的對稱位置;一彈簣(5 4、 甘 山 4 )’其一端設於該慣性體(5 3 )上, 而另-端則抵靠於弧形旋動檯(4〇)容置槽( (4 2)内壁上; °月配口參閱第六圖所示,當加入-週期性的脈波至上 述壓電元件(5ι、 θ ^ 身 丄),即令其產生週期性的變形(膨脹/ 、百】 田瞬間變形時,即可提供打擊部(5 2 )與彈箬 )各大小相同方向相反的作用力F1、F0,此時, 供予㈣(5 4 )的作用力FG會由彈簧(5 4 )吸收,故 僅剩作用力F1供予該打擊部(5 2)衝擊旋動檯(4 0 ) 〇 α Μ再參閱第一圖所示,由於該圓形旋動檯"0)以 圓心fe軸(4 3 )為軸心,故當其中之一位移驅動元件組 (5 0 )作動時,即可令圓形旋動檯(4 〇 )呈順或逆時 鐘的角度旋動。 再者,藉由本發明設計原理’除第一圖的水平軸向旋 動調整外,亦可應用於垂直軸向旋動調整,請參閱第三圖 所示,係為本發明的垂直單軸向的結構設計,其包含有·· 基檯(10),其上端面形成一凹弧面(11), 該弧面係依中心軸線而形成’該中心抽線乃由弧線中心點 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱 (請先閱讀背面之注意事項再填寫本頁) # 訂: -線- -n n i n 589240 A7 五、發明說明(L ) 與孤心連線定義而成,如圖中所示,f亥中心軸線與γ轴轴 向平行; -第-弧形旋動檯(20),其下端面形成凸弧面 (2 1 ) ’配合設置於該基;^ (丄〇 )的凹弧面(丄 1),故其中心軸線同樣平行丫軸,又,該凸弧面(2 1 )以中心軸線為主,其兩側對稱位置分別形成兩個容置 槽(2 3) (24);該第一弧形旋動檯(2〇)與基檯 (1 0)的凹凸弧面亦可為反向設置· 二位移驅動元件組(5 0 ),分別設置於旋動檯(2 0)的容置槽(23) (24) θ’用以產生單次奈,微 米的擊A力’右持續擊岐則產生較大位移行程; 又,考量旋動檯(20)需固定於基檯(1〇)的特 定位置,故需藉助兩者之接合弧面的磨擦力,亦即,於基 檯(1 0 )的凹弧面(1 1 )中心軸線形成一長槽(1 3 ),並於長槽(1 3 )内形成一螺孔(1 2 ),供一調 整磨擦力裝置設於其中,其包含有: -螺柱(6 0 ),其一端配合墊圈(6 4 )螺設於該 基檯(1 0 )的螺孔(1 2 )中,另一端則螺合一螺帽 (61); ' 一強力磁鐵(6 3 ),係吸附於該螺帽(6 1 )上, 並且容置於長槽(2 5 )中;由於該強力磁鐵(6 3 )相 對旋轉檯(2 0 )為相異磁性材質,故得強力磁鐵(6 3)會提供一相吸磁力於基檯(1〇)與旋動檯(2〇) 間,調整螺帽(6 1 )於螺柱(6 0 )的位置,即可調整 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) I:-----------# (請先閱讀背面之注意事項再填寫本頁) 訂: --線.In recent years, with the trend of precision and miniaturization of optoelectronics, telecommunications, semiconductors, biotechnology and other products, related parts have become more precise and detailed, which is reflected in the assembly or inspection procedures, that is, the positioning of related operating machines and abutments. The precision requirements are extremely high. The industries covered by these assembly or inspections are as follows: disk drives: data read / write heads, fax machines, optical head circuit board assembly, and semiconductor inspection device optics. Fields such as systems, or fiber alignment and alignment. 'These precision manufacturing operations typically require precision in the micrometer range, or even sizes below 100 nm. The above-mentioned positioning devices used in the production of various precision parts industries 'mostly use drive devices composed of servo motors and ball screws'. However, with the trend of miniaturization of products, the working accuracy of # 求 has become closer to the traditional The upper limit of the resolution of the ship's mechanism, and these precision components & assembly, there are still the following shortcomings: 1 · Small parts, which is not conducive to assembly operations. 2. After the parts are slightly fixed, it is not easy to make fine adjustments. 3. After the part is adjusted in the precise position, the position will be shifted again due to the subsequent strong fixing work. Because the traditional servo moving mechanism has a micro-movement range below micron, there is a problem of “stid (-slip)” between transmission components, and it is difficult to achieve precise positioning requirements. Therefore, most of these assembly operations rely on the skills of skilled technicians And experience judgment, to achieve high-precision secret scale by manual adjustment. Applicable to China Ming) A7 --------- B7 V. Invention requirements (>) ~ ~-Operational requirements. As mentioned above, for the fine-tuning of precision production systems, not only does ^ really achieve the nano / micron size translation effect, but also cannot achieve the precise nano-micron rotation fine-tuning function. Therefore, these precision machines and mobile devices are still 1 To further improve, we can achieve more sophisticated products. If this is the case, the slaves of this month will be. And „Ten series of uniaxial and multiaxial nano / micron-level rotating fine-tuning devices, so that the precise positioning or adjusting devices of related industries can obtain more precise adjustments. To this end, the main purpose of the present invention Provides a kind of non-linear micro-movement device, suitable for rotating fine-tuning machine. The main technical means used by You Renda for the above purpose is to form at least one receiving groove on the inner or arc surface of a circular or fan-shaped rotary table. The displacement driving element assembly for generating a nano / micron-level impact force is assembled. Since the rotary table is connected by a pivot axis, when a pulse voltage signal is passed through the displacement driving element group, the displacement driving element group can be made. Instantly, M also produces ^ impact force on the rotary table, causing the rotary table to rotate slightly around the 柩 axis as the rotary table is a circular or fan-shaped curved surface, so that a non-linear nanometer level is generated by this. The displacement can be used to meet the needs of the fine-tuning machine, and the present invention can be installed to achieve the precise adjustment function of the angle. A second object of the present invention is to provide a two-axis non-horizontal axis non-linear rotation fine-tuning device, including A curved abutment and a first and a second curved rotary table. The abutment is used for overlapping the curved surfaces of the first curved rotary table, and the first curved rotary table is used for a second curved table. The arc surfaces of the rotary tables are overlapped, because the first and second arc-shaped rotary tables are connected by arc surfaces, and the center axis of each arc-shaped rotary table is in accordance with the Chinese National Standard (CNS) A4 specification ( 210 x 297 mm) (Please read the notes on the back before filling out this page) ------- Order --------- Line ------------- --- II ---- ^ 9240 A7 B7 The first picture, the second picture, the third picture, the fourth picture, the fifth picture, the sixth picture, and the fifth description of the invention (\ 3) The line ^ is connected by the fox line center and the arc center. (Definition) as the center, one displacement driving element is built in two symmetrical positions on the arc surface, so that each arc-shaped rotary table generates arc-shaped movement with the central vehicle line as the main axis. The center 对应 corresponds to the X and γ axes respectively, and the first and second solitary rotating buildings are relatively immovable abutments, which generate the axial movement of the X γ axis. In order to allow your reviewers to further understand the specific design of the invention and others The purpose is enclosed in detail The illustration is as follows: (1) Schematic part: Top view of the first preferred embodiment of the present invention. Side sectional view of the first figure. Exploded perspective view of the second preferred embodiment of the present invention. A three-dimensional combined view of the third preferred embodiment of the invention. It is an exploded perspective view of the fourth preferred embodiment of the invention. It is a characteristic diagram of each point of the displacement driving element group of the present invention, which reveals each point of the displacement driving element group after power-on. The state of force application and displacement. (Please read the precautions on the back before filling in this page) -¾ ------- Order -------- «(二) Drawing No. (10 ) Abutment (1 2) Screw hole (2 0) Rotary table (2 2) Concave arc surface (2 4) Receiving slot (2 6) Screw hole (3 1) Convex arc surface (1 1) Concave arc surface (13) Long groove (2 1) Convex arc surface (2 3) Receiving groove (2 5) Long groove (30) Rotating table (3 2) Receiving groove 589 240 A7 (3 3) Receiving groove (3 5) pivot hole (41) receiving slot (4 3) pivot shaft (5 1) piezoelectric element (5 3) inertial body (60) stud (6 3) powerful magnet (7 〇) clamping seat 5. Description of the invention (4) (3 4) Receiving groove (4 0) Circular rotating table (4 2) Receiving groove (5 0) Displacement driving element group (5 2) Hitting portion (5 4 ) Spring (6 1) Nut (6 4) Washer +, w Fine adjustments with micron-level fine rotation adjustment can be used for non-linear fine adjustment, namely, It can achieve the effect of single-axis (X / Y / Z) rotation or multi-axis (χγζ) rotation. , 凊 Refer to the first figure, which is a ^ view of the first preferred embodiment of the present invention. It is formed on the rotation axis (40) of a vertical axis (Z axis) for rotational motion (rotation). The accommodating grooves (41) (42) are provided for a displacement driving it group (50) having a Υ-micron-scale movement. The rotation table (40) of the vertical axis (Z axis) of this embodiment is rotated. ) Is circular (viewed from above), and it can also be fan-shaped, in which the center axis pivot (4 3) of the rotary table (40) is an axis center during rotation; when the displacement driving element group (50) is generated early, When the impact force of sub-nano // micron is pushed, the rotating building (40) can be driven to rotate according to the axis. Please refer to the second figure again, which is a cross-sectional view of the first figure. The displacement driving element group (50) is composed of a μ · ", a piezoelectric element (5 1), and has a very high frequency. Response characteristics: The impulsive voltage applied will cause an instantaneous deformation. · The current paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love) (Please read the precautions on the back before filling this page) ------- Order · -------- ^ 〇yz ^ 〇A7 V. Description of the invention (f) One end of the striking part (1), and 2) 'One end is connected to the piezoelectric On the inner wall of the element (5; the other end is against the receiving groove (41), (42), and the body (5 3), which is arranged at the other end of the piezoelectric element, that is, symmetrical with respect to the striking part (5 2) Position; an impeachment (5 4, Ganshan 4) 'one end is set on the inertia body (5 3), and the other end is abutted against the arc-shaped rotary table (4〇) receiving slot ((4 2) On the inner wall; ° Refer to the sixth figure, when the -periodic pulse wave is added to the above-mentioned piezoelectric element (5ι, θ ^ body 丄), it will cause periodic deformation (expansion /, hundred 】 When the field is instantly deformed, Forces F1 and F0 of the striking part (5 2) and impeachment in the same direction can be provided. At this time, the force FG supplied to the impulse (5 4) will be absorbed by the spring (5 4), so only the remaining force is left. The acting force F1 is supplied to the striking part (5 2) to impact the rotary table (40). 〇α Μ Refer to the first figure again, because the circular rotary table " 0) is centered on the circle fe axis (4 3) It is an axis center, so when one of the displacement driving element groups (50) is actuated, the circular rotation table (40) can be rotated at a clockwise or counterclockwise angle. Furthermore, the design principle of the present invention 'In addition to the horizontal axial rotation adjustment in the first figure, it can also be applied to the vertical axial rotation adjustment. Please refer to the third figure, which is the vertical uniaxial structural design of the present invention, which includes: · Abutment (10), the upper end surface of which forms a concave arc surface (11), the arc surface is formed according to the central axis' the center draw line is from the center point of the arc line The paper size applies Chinese National Standard (CNS) A4 specifications (210 X 297 public love (please read the notes on the back before filling this page) # Order: -line- -nnin 589240 A7 V. Description of the invention (L) and The center line is defined, as shown in the figure, the central axis of f Hai is axially parallel to the γ axis;-the arc-shaped rotary table (20), the lower end of which forms a convex arc surface (2 1) ' Because of the concave arc surface () 1) of the base; ^ (中心 〇), its central axis is also parallel to the y-axis, and the convex arc surface (2 1) is mainly based on the central axis, and its symmetrical positions on both sides are respectively formed. Two accommodating grooves (2 3) (24); the concave-convex arc surface of the first arc-shaped rotary table (20) and the base table (1 0) can also be set in reverse. Two displacement driving element groups (5 0), which are respectively provided in the receiving grooves (23) (24) θ 'of the rotary table (20) to generate a single nanometer, and the micron hit A force' right continuous hitting the Qi produces a large displacement stroke; Considering that the rotary table (20) needs to be fixed at a specific position of the base table (10), it is necessary to rely on the frictional force of the joining arc surface of the two, that is, the concave arc surface (1) of the base table (1 0) 1) A long groove (1 3) is formed on the central axis, and a screw hole (1 2) is formed in the long groove (1 3) for a friction adjusting device to be set therein, which includes:-a stud (6 0), one end of which is fitted with a washer (6 4) and is screwed on A screw nut (61) is screwed into the other end of the screw hole (1 2) of the base (1 0); It is placed in a long groove (2 5); because the strong magnet (6 3) is a different magnetic material from the rotating table (20), the strong magnet (6 3) will provide a phase magnetic attraction force to the base (1) 〇) and the rotary table (20), adjust the position of the nut (6 1) on the stud (60), then the paper size can be adjusted to the Chinese National Standard (CNS) A4 (210 x 297 mm) ) I: ----------- # (Please read the notes on the back before filling this page) Order: --line.

、發明說明Invention description

=(1〇)與旋動檯(2 0)間的摩擦力,當強力磁鐵 令3±)位於長槽(1 3 )内,而與旋轉檯(2 〇 )間距 1近日守’則增加與旋動檯(2 〇 )的吸引磁力,使旋轉檯 2 〇)因磨擦力的增加而定位於基檯(1 〇)上。 上述旋動微調平檯係藉由基檯(i 〇 )與旋動檯(2 )的單軸向弧面設計,配合對稱中心軸線設置的兩位移 驅:元件組(5〇)設置,可於其中一位移驅動元件組 2 3) (24)作動時提供旋動檯(2〇)的内部敲擊 :使該弧形旋動檯(2Q)相對基檯(1 ◦)軸向弧面 屋生旋動微調。 再請參閱第四圖所示,係為本發明第三較佳實例,可 =於該第-弧形旋動檯(2〇)上形成另—軸向(χ轴) Λ:狐面(22) ’以配合一第二弧形旋動檯(3 0)的 =(31) ’其中以第二孤形旋動檯(3 0)的凸弧 μ 1)中心軸線為中^,於其對稱位置裝設兩相對的 :移::元件組(圖中未示),同如第一實施例的操控原 /由兩位移驅動元件組對軸線產生衝擊力,而使第二 ::::檯(3〇)產生旋動,又,因第二旋動檯(3 基檯(1〇)凹弧面形成與之不同軸向的弧面, 卜貫施例則可具有多轴向的旋轉微動調整功能;由於 動檯(3〇)疊接第—弧形旋動檯(2〇) 亡二:會有無法定位的問題’故於第一孤形(2〇)上 :二心轴線位置形成一長槽(25),並於中心點位 ”孔C 2 6 )’供前述調整磨擦力裝置容置於其= The friction between (1〇) and the rotary table (20), when the powerful magnet makes 3 ±) is located in the long groove (1 3), and the distance from the rotary table (2 0) 1 is near the guard, it increases with The attractive magnetic force of the rotary table (20) causes the rotary table (20) to be positioned on the base table (10) due to the increase of the friction force. The above-mentioned rotation fine-tuning platform is designed by a uniaxial arc surface of the base table (i 〇) and the rotation table (2), and is arranged with two displacement drives provided by the symmetrical central axis: the element group (50). One of the displacement driving element groups 2 3) (24) provides an internal percussion of the rotary table (20) when it is actuated: the arc-shaped rotary table (2Q) is axially curved relative to the abutment (1 ◦). Rotate the fine adjustment. Please refer to the fourth figure again, which is the third preferred embodiment of the present invention, and can form another axial direction (χ axis) on the -arc rotary table (20). Λ: fox surface (22 ) 'To match a second arc-shaped rotary table (3 0) = (31)' where the convex arc of the second solitary-shaped rotary table (3 0) μ 1) is the center axis ^, which is symmetrical There are two opposite: shift :: component groups (not shown in the figure), which are the same as the control principle of the first embodiment / the two displacement driving component groups produce an impact force on the axis, so that the second :::: 台(30) rotation is generated, and since the concave arc surface of the second rotation table (3 abutment (1)) forms an arc surface with a different axial direction, the embodiment of the embodiment can have multi-axis rotation micromotion Adjustment function; as the moving table (30) overlaps the first arc-shaped rotating table (20), there will be a problem that cannot be located. Therefore, on the first solitary (20): the position of the axis of the two centers A long groove (25) is formed, and a "hole C 2 6) 'is provided at the center point for the aforementioned friction adjusting device to be accommodated therein.

589240 A7 五、發明說明(技 中,提供第一、第二弧形檯(3 〇 )調整磨擦力使用。 =參閱第五圖所示,係為本發明第四較佳實施例, 甘^ “ 為-多軸向(XU)的旋動結構, =要將圓形旋動檯(4 〇 )置於該第二弧形糊 (二)上方的圓形容置槽(34),故可形成軸繼 之作用,圓形容置槽(34)圓心位置形成一枢孔(3 5) ’供該圓形旋動檯(4 0)的枢軸(4 3)插設 再於圓形旋動檀(4〇)上固定一爽座(70),則該央 座(7 0)可藉由分別控制圓形旋動檯(4 〇)、第二弧 形旋動檯(3 〇 )與孤形旋動檀(2 Q )達到三轴向 (XYZ)的旋動微調,此外,該圓形旋動檯(4㈡可為扇 形。 由上述可知,本發明藉由弧形旋動檯的設計,配合具 奈/微米的位移驅動元件組,使得軸向旋動檯具有奈/微 米級的旋轉微調功能,由於弧面的形成方向的不同,而具 有多軸向旋轉的功效,因此,本發明並不限定前揭凹凸面 的設計’若反向設置亦可達到本發明的旋轉功效,藉此, 本發明可配合任何定位機檯所要求的方向,此外,亦可以 豐设方式達到多方向的角度旋動,故本發明除符合產業利 用性外,亦具有廣泛的利用性。 因此’本發明確實符合精密產業上利用性,並且符合 發明專利之要件,爰依法具文提出申請。 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) (請先閱讀背面之注意事項再填寫本頁) --------^---------線.589240 A7 V. Description of the invention (In the technology, the first and second arc-shaped tables (30) are provided to adjust the friction force. = Refer to the fifth figure, which is the fourth preferred embodiment of the present invention, Gan ^ " For the multi-axial (XU) rotating structure, = the circular rotating table (40) is placed on the circular receiving groove (34) above the second arc-shaped paste (2), so the shaft can be formed Following this, a pivot hole (3 5) is formed at the center position of the circular receiving groove (34). The pivot (4 3) of the circular rotary table (40) is inserted into the circular rotary sander (4). 〇) fixed a cool seat (70), then the central seat (70) can control the circular rotation table (40), the second curved rotation table (30) and the solitary rotation respectively. Sandalwood (2 Q) achieves three-axis (XYZ) rotation fine adjustment. In addition, the circular rotation table (4㈡ can be fan-shaped. From the above, it can be seen that the design of the arc-shaped rotation table matches The displacement driving element group per micrometer makes the axial rotary table have a nano / micron level rotation fine-tuning function. Due to the different formation directions of the arc surface, it has the effect of multi-axial rotation. Therefore, the present invention is not The design of limiting the front and back concave-convex surface can also achieve the rotation effect of the present invention if it is arranged in the reverse direction. Therefore, the present invention can cooperate with any orientation required by the positioning machine. In addition, it can also achieve multi-directional angle rotation in a rich manner. Therefore, in addition to industrial applicability, the present invention also has a wide range of applicability. Therefore, the invention is indeed in line with the applicability in the precision industry and meets the requirements of the invention patent. National Standard (CNS) A4 specification (210 x 297 mm) (Please read the precautions on the back before filling this page) -------- ^ --------- line.

Claims (1)

申清專利範圍 置,i包:二具奈,微米旋動功能之非直線旋動微調敦 土檯其上端面形成一孤面,該弧面的_中 線係為_中心與弧叫連線; Υ|ΐ ★ m—第一弧形旋動檯,其下端面配合該基檯弧面,彤成 ^中心γ轴線的弧面,再錄面中心、軸線為中心,於盆 子稱位置各形成對應之容置槽; 、/、 的容驅動元件組,分別設置於第―弧形旋動檯 置枱内,各位移驅動元件組包含有: 電壓具極高的頻率響應特性’故施予脈衝 电 曰7其邊形產生衝擊力; 打簞邛,其一係連接於該壓電元件的一端,而 則抵靠於空置槽的内壁上; 而 -慣性體,係設置於該壓電元件的另 對稱打擊部位置; ^ηΛ …彈簧,其一端設於該慣性體上,另一端則抵靠於容 置槽的内壁上。 2、如中請專利範圍第!項所述具奈,微米旋動功能 之非直線旋動微調裝置,該基檯的中間位置形成一長槽, 長七中間位置再形成一螺孔’供一調整磨擦力裝置設置, 該調整磨擦力裝置包含有: -螺柱’其-端由弧形旋動檯的下端面插設自基檯的 螺孔中,另一端則螺設一螺帽; 一強力磁鐵’係吸附於螺帽上,即容置於基檯的長槽 589240 D8 、申請專利範圍 中’其與該旋轉檯係呈同極性,提供其一互斥力。 3、 如中請專利範圍第2項所述具奈/微米旋動功能 之非直線旋動微調裝置,係增加—第二弧形旋動檯…亥弧 形旋動檯的中心軸線與X軸平行,其中該第—弧形旋重緣 上端面係形成一具中心X軸線的凹弧面,以供第二弧形‘ 動檯叹置於其上’該第二弧形旋動檯的中心X軸線的對稱 位置設有二組位移驅動元件組。 4、 如申請專利範圍第3項所述具奈,微米旋動功能 之非直線旋動微調裝置,該第—弧形旋動檯上弧面的中心 軸線位置各形成一長槽,再於第一弧形旋動檯上端面的中 間位置形成一螺孔,用以供一調整磨擦力裝置設置 整磨擦力裝置包含有: ^ 中; (請先閲讀背面之注意事項再場寫本頁} 一螺柱’其—端螺合於第—弧形旋動檯的上端面螺孔 一螺帽,係螺合於螺柱的另一端, 一強力磁鐵’係吸附該螺栓端面上,容置於第一弧形 旋動棱的長槽中。 5、 如巾請專·圍第3韻述具奈/微米旋動功能 之非直線旋動微調裝置,該第二弧形旋動檯上端形成一圓 形容置槽,形容置槽中心再形成—樞孔,X,圓形旋 上端面形成兩容置槽,供兩位移驅動元件組設置,其 。玄圓形奋置槽供一具有圓心樞軸的圓形旋動檯容置, 其圓心樞軸插設於第二弧形旋動檯的樞孔上。 589240Shen Qing patent scope, i package: two non-linear, micron rotation function of non-linear rotation fine-tuning Tuntu platform on its upper end to form an isolated surface, the _center line of the arc surface is connected to the center of the arc Υ | ΐ ★ m—the first arc-shaped rotary table, the lower end of which matches the arc surface of the abutment, forming the arc surface of the ^ center γ axis, and then recording the center of the surface and the axis as the center. Form corresponding receiving grooves; and / /, the capacitive drive element groups are respectively set in the ―arc-shaped rotary table set, each displacement drive element group includes: the voltage has extremely high frequency response characteristics' The pulsed electric wave has an impact force on its side; hiccups, one connected to one end of the piezoelectric element, but abutted against the inner wall of the empty slot; and the-inertial body, is set on the piezoelectric element ^ ΗΛ… spring, one end of which is set on the inertia body, and the other end of which is against the inner wall of the accommodation groove. 2. If so, please refer to the patent scope! The non-linear rotation fine-tuning device with the nanometer and micron rotation function described in the item, a long groove is formed in the middle position of the abutment, and a screw hole is formed in the middle position of the long seven, for the setting of a friction adjusting device, and the adjustment friction The force device includes:-the stud 'whose end is inserted into the screw hole of the abutment from the lower end of the arc-shaped rotating table, and the other end is provided with a nut; a powerful magnet is adsorbed on the nut That is, it is housed in the long groove 589240 D8 of the abutment and it is in the scope of patent application that it has the same polarity as the rotary table system and provides a mutual repulsive force. 3. The non-linear rotation fine-tuning device with a nano / micron rotation function as described in item 2 of the patent scope of the patent application is added—the second arc-shaped rotation table ... the central axis of the arc-shaped rotation table and the X axis Parallel, in which the upper end of the first arc-shaped rotating edge forms a concave arc surface with a central X axis for the second arc-shaped 'moving platform to be placed on' the center of the second arc-shaped rotating platform Two sets of displacement driving element groups are provided at the symmetrical positions of the X axis. 4. As described in item 3 of the scope of the patent application, a non-linear rotation fine-tuning device with a nanometer and micron rotation function, a long groove is formed in the center axis position of the arc surface on the -arc rotation table, and A screw hole is formed at the middle position of the upper end surface of an arc-shaped rotating table for a friction adjusting device to set the entire friction device including: ^ Medium; (Please read the precautions on the back before writing this page} The stud 'its end is screwed to the upper end of the first arc-shaped rotating table with a screw hole and a nut, which is screwed to the other end of the stud. A strong magnet' is adsorbed on the end face of the bolt and is placed in the first A long groove with an arc-shaped rotating edge. 5. If you want a towel, please refer to the third rhyme non-linear rotation fine-tuning device with a nano / micron rotating function. The upper end of the second arc-shaped rotating table forms a circular volume. The groove is described as the center of the groove is re-formed-pivot hole, X, the upper surface of the circular screw is formed into two accommodation grooves for the two displacement driving element sets, which are provided with a circle with a central pivot axis. The rotary table is accommodated, and its center pivot is inserted in the pivot hole of the second arc-shaped rotary table 589240 M El 、申請專利範圍 A8M El 、 Application scope A8 6 種具奈/微米旋動功能之非直線旋動微調裝 置,係包含有: 、 圓幵y疑動檯,以圓心插設一樞轴,並於表面形成至 少一組容置槽; 至少一位移驅動元件組,係容置於對應的容置槽中。 7、如申請專利範圍第6項所述具奈/微米旋動功能 之非直線旋動微調裝置,係包含有: 一扇形旋動檯,以圓心插設一樞軸,並於表面形成至 少一組容置槽; 至少一位移驅動元件組,係容置於對應的容置槽中。 (請先閲讀背面之注意事項再塡寫本頁) 、一u 口 線 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公楚)6 types of non-linear rotation fine-tuning devices with a nano / micron rotation function, including: and a round y motion table, a pivot is inserted at the center of the circle, and at least one receiving groove is formed on the surface; at least one The displacement driving element group is housed in a corresponding receiving slot. 7. The non-linear rotation fine-tuning device with a nano / micron rotation function as described in item 6 of the scope of patent application, which includes: a fan-shaped rotation table, a pivot is inserted at the center of the circle, and at least one is formed on the surface. Group receiving grooves; at least one displacement driving element group is accommodated in corresponding receiving grooves. (Please read the precautions on the back before transcribing this page), a u-port line This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 cm)
TW91124988A 2002-10-25 2002-10-25 Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale TW589240B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91124988A TW589240B (en) 2002-10-25 2002-10-25 Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91124988A TW589240B (en) 2002-10-25 2002-10-25 Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale

Publications (1)

Publication Number Publication Date
TW589240B true TW589240B (en) 2004-06-01

Family

ID=34057946

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91124988A TW589240B (en) 2002-10-25 2002-10-25 Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale

Country Status (1)

Country Link
TW (1) TW589240B (en)

Similar Documents

Publication Publication Date Title
JP6742909B2 (en) Image stabilizer positioning device
JP5221365B2 (en) Mechanism including ultrasonic lead screw motor
CN100585897C (en) Mechanism comprising ultrasonic lead screw motor
US6940209B2 (en) Ultrasonic lead screw motor
US7061158B2 (en) High resolution piezoelectric motor
GB2556372A (en) Haptic actuator, electronic apparatus, and haptic feedback generating method
JP2007206480A (en) Optical scan element
Bergander et al. Micropositioners for microscopy applications based on the stick-slip effect
JP4896020B2 (en) Mechanism including ultrasonic lead screw motor
JP2005511333A (en) Micromanipulator including piezoelectric bender
TW589240B (en) Non-linear rotation fine adjustment device capable of rotation in nanometer/micrometer scale
TW536442B (en) 6-DOF fine position adjustment platform
JP2002090282A (en) Endless track translating/turning stage
JP4841432B2 (en) Ultrasonic motor for lead screw
JP2007158276A (en) Piezo/electrostriction device, and method for driving same
CN206743125U (en) One kind becomes frictional force formula piezoelectric inertia linear actuator
TW567122B (en) Universal rolling fine-tuning device with nano/micro scale rotating functions
Bergander et al. Micropositioners for microscopy applications and microbiology based on piezoelectric actuators
Aovagi et al. A novel ultrasonic motor with a built-in clutch mechanism for a force-feed-back actuator
JP5669446B2 (en) Driving mechanism of moving body
JPH0583958A (en) Micro motion apparatus utilizing piezoelectric element and positioning method utilizing this method
WO2017072883A1 (en) Optical adjustment device and optical device equipped with optical adjustment device
CN109531519B (en) Spatial six-degree-of-freedom micro-motion platform
JPH0894780A (en) X-y-theta fine movement stage
JPH07274556A (en) Piezoelectric actuator

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees