TW586463U - Improved chemical mechanical polishing machine - Google Patents

Improved chemical mechanical polishing machine

Info

Publication number
TW586463U
TW586463U TW91205999U TW91205999U TW586463U TW 586463 U TW586463 U TW 586463U TW 91205999 U TW91205999 U TW 91205999U TW 91205999 U TW91205999 U TW 91205999U TW 586463 U TW586463 U TW 586463U
Authority
TW
Taiwan
Prior art keywords
mechanical polishing
chemical mechanical
polishing machine
improved chemical
improved
Prior art date
Application number
TW91205999U
Other languages
Chinese (zh)
Inventor
Li-Jung Liou
Ching-Hung Jang
Jung-Min Lin
Original Assignee
Nanya Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanya Technology Corp filed Critical Nanya Technology Corp
Priority to TW91205999U priority Critical patent/TW586463U/en
Publication of TW586463U publication Critical patent/TW586463U/en

Links

TW91205999U 2001-03-28 2001-03-28 Improved chemical mechanical polishing machine TW586463U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91205999U TW586463U (en) 2001-03-28 2001-03-28 Improved chemical mechanical polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91205999U TW586463U (en) 2001-03-28 2001-03-28 Improved chemical mechanical polishing machine

Publications (1)

Publication Number Publication Date
TW586463U true TW586463U (en) 2004-05-01

Family

ID=34058268

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91205999U TW586463U (en) 2001-03-28 2001-03-28 Improved chemical mechanical polishing machine

Country Status (1)

Country Link
TW (1) TW586463U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8545634B2 (en) 2005-10-19 2013-10-01 Freescale Semiconductor, Inc. System and method for cleaning a conditioning device
TWI639486B (en) * 2018-05-31 2018-11-01 國立清華大學 Omni-directional integrated conditioner device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8545634B2 (en) 2005-10-19 2013-10-01 Freescale Semiconductor, Inc. System and method for cleaning a conditioning device
TWI639486B (en) * 2018-05-31 2018-11-01 國立清華大學 Omni-directional integrated conditioner device

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Legal Events

Date Code Title Description
MK4K Expiration of patent term of a granted utility model