584878 A7 B7584878 A7 B7
經濟部智慧財產局員工消費合作社印製 五、發明説明（） 發明領域： 本發明係有關於一種防止電弧室（Arc Chamber)之陰極 (Cathode)入口處遭電弧（Arcing)傷害的方法及裝置，特別是 有關於一種在電弧室之陰極入口處安裝絕緣元件，來防止 陰極入口處遭電狐傷害的方法及裝置。 發明背景： 離子植入（Ion Implantation)技術不但能提供各種半 導體摻雜的需求，且由於其能準確地控制摻質的摻入含量 與分佈，因此，離子植入技術已成為半導體元件製程上最 主要的摻質預置技術。離子植入機係用來實施離子植入技 術的半導體製程設備，其作用係引導具有能量的、帶電粒 子進入晶圓。 離子源是離子植入機的主要部分之一，係用來產生離 子的硬體設備’其基本原理是利用電漿，在適當的低壓下， 把氣體分子藉由電子撞擊而離子化，因而產生離子植入機 所需要使用的摻質離子。離子源係利用例如鎢絲之熱燈絲 (Hot Filament),亦即陰極，來撞擊電弧室内的源氣體 (Source Gas)，以產生大量的離子。 請參照第1圖，第1圖為繪示習知之陰極與電弧室的 爆炸示意圖。其中電弧室1〇〇具有陰極入口 1〇2，藉以供 陰極管1 1 0伸入至電弧室丨00内，陰極管丨丨〇與陰極入口 102之間留有間隙144，藉以避免陰極管n〇與陰極入口 102發生短路。陰極管ho的一端具有凹槽112,且凹槽 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) ..... .....#.........、玎.........,· (請先閲讀背面之注意事項再填寫本頁) 584878 A7 B7 五、發明説明（） i 12係朝向電狐室100的外部，藉以供熱燈絲13〇安置於 凹槽1 1 2内。當通以電源時，熱燈絲丨3 〇會發射電子來撞 擊源氣體，而撞出二次電子，使源氣體成為帶正電的離 子。被撞出的二次電子再繼續撞擊，因而大幅增加電弧室 i 00中的離子濃度。當熱燈絲13〇發射出電子時，部分之 電子會透過陰極管110，撞擊電弧室1〇〇之陰極入口 1〇2 的側壁’使此側壁遭電弧轟擊而造成剝落，其剝落的碎片 或微粒會使由導電材料所製成之陰極管n 〇與陰極入口 1 02之間容易發生短路。當前述之短路發生時，離子源設 備便無法產生離子束，而離子束電流（Beam Current)會變 為零，使得離子源設備的使用壽命減少，大幅增加其維修 成本° 另一方面，當安裝陰極管1 1 〇於陰極入口丨〇2時，陰 極管1 1 0必須對準於陰極入口 1 〇 2的中心位置，亦即二者 必須同心（Concentric)。然而，由於陰極管！ ！ 〇與陰極入口 102間的間隙144不大，欲準確地安裝陰極管丨1〇於陰極 入口 102原已相當不易，若加上陰極入口 1〇2的側壁發生 剝落’陰極入口 1 〇 2的中心位置便更加難以確定，使得陰 極管1 1 〇非常難以準確地安裝於陰極入口丨02的中心位 .......................?τ......... (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 入入生 極極發 陰陰管 之之極 室 室 陰 弧弧與 電電口 止止入 防防極 種以陰 一 藉免 出，避 展置， 發裝落 要及剝 需法而 切方擊 迫的轟 常害孤 非傷電 ， 弧遭 此電壁 因遭側 。 處的 置口口 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) 五 、發明説明（ 準 卜此方法及裝置更須能有效而簡便地使陰極Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention () Field of the Invention: The present invention relates to a method and a device for preventing arcing damage at the entrance of the cathode of the Arc Chamber. In particular, it relates to a method and a device for installing an insulating element at the cathode entrance of an arc chamber to prevent the cathode entrance from being injured by an electric fox. Background of the Invention: Ion Implantation technology can not only provide various semiconductor doping requirements, but also because it can accurately control the doping content and distribution of dopants, therefore, ion implantation technology has become the most important in the semiconductor device manufacturing process. Main dosing presets. Ion implanters are semiconductor process equipment used to implement ion implantation technology. Their role is to guide energetic, charged particles into the wafer. The ion source is one of the main parts of the ion implanter. It is a hardware device used to generate ions. Its basic principle is to use a plasma to ionize gas molecules by the impact of electrons under an appropriate low pressure. Doped ions required for ion implanters. The ion source uses, for example, a hot filament (tungsten filament), that is, a cathode, to strike a source gas in the arc chamber to generate a large amount of ions. Please refer to Fig. 1. Fig. 1 is a schematic diagram showing an explosion of a conventional cathode and an arc chamber. The arc chamber 100 has a cathode inlet 102 for the cathode tube 110 to extend into the arc chamber 00, and a gap 144 is left between the cathode tube 118 and the cathode inlet 102 to avoid the cathode tube n. 〇Short circuit with cathode inlet 102. One end of the cathode tube ho has a groove 112, and the paper size of the groove is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ..... ..... # ......... 、 玎 ............, (Please read the precautions on the back before filling out this page) 584878 A7 B7 V. Description of the invention () i 12 is facing the outside of the electric fox room 100, so as to heat the filament 130 is placed in the groove 1 12. When the power is turned on, the hot filament 3o will emit electrons to hit the source gas, and the secondary electrons will be knocked out, making the source gas a positively charged ion. The impacted secondary electrons continue to impact, thereby greatly increasing the ion concentration in the arc chamber i 00. When the hot filament 130 emits electrons, some of the electrons will pass through the cathode tube 110 and hit the side wall of the cathode inlet 102 of the arc chamber 100. This side wall will be bombarded by the arc and cause flaking, and the flaking fragments or particles It will easily cause a short circuit between the cathode tube no made of conductive material and the cathode inlet 102. When the aforementioned short circuit occurs, the ion source equipment cannot generate an ion beam, and the beam current (Beam Current) becomes zero, which reduces the service life of the ion source equipment and greatly increases its maintenance cost. On the other hand, when the When the cathode tube 110 is at the cathode inlet 1002, the cathode tube 110 must be aligned at the center of the cathode inlet 102, that is, the two must be concentric. However, due to the cathode tube! !! 〇The gap 144 between the cathode inlet 102 and the cathode inlet 102 is not large. It is not easy to install the cathode tube accurately. If the sidewall of the cathode inlet 102 is peeled off, the center of the cathode inlet 102 will be peeled off. The position is more difficult to determine, making it very difficult for the cathode tube 1 1 〇 to be accurately installed at the center of the cathode inlet 丨 02... Τ ......... (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, the polar arc chamber arcs and electrical ports The anti-entry and anti-electrode types are borrowed from the yin to avoid the exhibition, to avoid the installation, to send the installation and the stripping method, and the persecution of the bang and the lonely non-injury electricity, the arc was hit by the electric wall. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). 5. Description of the invention (Standard method and device must be able to effectively and simply make the cathode
準確地安裝於陰極入口的中心位置。 B 發明目的及概述： II於上述之發明背景Φ 岸厅、中，在習知之陰極管與電弧室的 、置’其陰極入口的伽辟合、酱‘ k Μ 的惻土會遭電弧轟擊而產生剝落，使險 極官與陰極入口容易 ^ ,, X生紐路，而減少設備的使用壽命， 大te增加維修成本。另外， 陰極入口的側壁的剝落會使陰 極管不易安裝於陰極入口的中心位置。 因此’本發明的主要目的為提供一種防止電弧室之陰 朽入口處遭電弧傷害的方法及裝置，藉以防止電弧室之陰 =口：側壁遭電弧森擊而產生剝落，因而避免陰極入口 ::丢極“x生短路’進而延長離子源設備的使 te減少維修成本。 本發明之另一目的為提供一種防止電弧室之陰極入口 處遭電狐傷害的方法月驻 — … 法及#置m有效而簡便地使陰極 ，官準確地安裝於陰極入口的中心位置。 經濟部智慧財產局員工消費合作社印製 根據以上所述之目的，本發明提供了一種防止電孤室 之陰極入口處產生電弧的裝置’此裝置至少包括：電弧室， 其中電弧室具有陰極入口，且陰極入口具有側壁厚度；絕 緣凡件，其中絕緣元件係經由陰極入口而伸入至電孤室 内’且具有開口；陰極管，其中陰極管係經由開口而伸入 2電狐室内，陰極管之一端具有凹槽，而凹槽係朝向電孤 至的外,以及熱燈絲，其中熱燈絲係置於凹槽内。 本紙張尺度適用中國國家標準(CNS)A4規格(210x297公爱) 584878 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明説明（） 另外，本發明提供了一 止電狐室之陰極入口處遭 電弧傷害的方法，此方法至 y匕枯·徒供具有陰極入口 電弧室，其中陰極入口具有側 J立序度，钕供具有開口之絕 緣元件’並將絕緣元件經由险士 由陰極入口伸入至電弧室内；提Installed accurately at the center of the cathode inlet. B. Purpose and summary of the invention: II In the above background of the invention Φ In the hall, in the conventional cathode tube and the arc chamber, the pitting soil of the cathode inlet of the cathode electrode and the saucer will be bombarded by the arc and The spalling makes it easier for the dangerous electrode and the cathode inlet to reduce the service life of the equipment and increase the maintenance cost. In addition, the peeling of the side wall of the cathode inlet makes it difficult to install the cathode in the center of the cathode inlet. Therefore, the main purpose of the present invention is to provide a method and a device for preventing arc damage at the arcuate entrance of the arc chamber, so as to prevent the arc of the arc chamber's yin = mouth: the side wall is peeled off by the arc, so as to avoid the cathode entrance :: Lost-pole "short circuit" further prolongs the ion source equipment and reduces maintenance costs. Another object of the present invention is to provide a method for preventing electric foxes from being damaged at the cathode entrance of the arc chamber. Effectively and simply make the cathode and the official installed accurately at the center of the cathode entrance. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs According to the above-mentioned purpose, the present invention provides a method for preventing an arc at the cathode entrance of an electric isolation room. The device 'this device includes at least: an arc chamber, wherein the arc chamber has a cathode inlet, and the cathode inlet has a side wall thickness; an insulating element, wherein the insulating element extends into the electric isolation chamber through the cathode inlet, and has an opening; a cathode tube Where the cathode tube extends into the 2 fox room through the opening, one end of the cathode tube has a groove, and the groove is facing Guzhiwai, as well as the hot filament, where the hot filament is placed in the groove. This paper size applies to China National Standard (CNS) A4 specification (210x297 public love) 584878 Α7 Β7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 2. Description of the invention () In addition, the present invention provides a method for preventing arc damage at the cathode entrance of an electric fox chamber. This method has a cathode inlet arc chamber until the cathode inlet has a side J vertical order. Neodymium supplies insulating elements with openings' and extends the insulating elements into the arc chamber from the cathode inlet through the fuser;
供陰極管，並將陰極管Μ Α Μ π A s A由開口伸入至電弧室内，其中陰 極管之一端具有凹槽，而凹槽 " 1曰1糸朝向電弧至的外部；以及 提供熱燈絲安置於凹槽内。 圖式簡單說明： 本發明的較佳實施例將於往後之說明文字中輔以下列 圖形做更詳細的闡述，其中： 第1圖為繪示習知之陰極與電弧室的爆炸示意圖； 第2圖為繪示本發明之較佳實施例之防止電弧室之阶 極入口處遭電弧傷害的裴置之爆炸示意圖；以及 π 第3圖為繪示本發明之較佳實施例之防止電弧室之陰 極入口處遭電弧傷害的裝置之俯視示意圖。 " 圖號對照說明： 100 電弧室 102 陰極入口 110 陰極管 112 凹槽 130 熱燈絲 144 間隙 200 絕緣元件 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) .....………磬.........、玎.........,· (請先閲讀背面之注意事項再填寫本頁) 584878 Α7 Β7 五、發明説明（ 202 開口 210、220 中空圓柱體 發明詳細說明： 本發明揭露-種防止電弧室之陰極入口處遭電弧傷害 的方法及a置。本發明係安裝例如由陶瓷材料所製成的絕 緣元件於陰極入口與陰極管之間，藉以防止電弧室之陰極 入口的側壁遭受電弧轟擊而產生剝落。 請參照第2圖，第2圖為繪示本發明之較佳實施例之 防止電弧室m 口處遭電弧傷冑的裝置之爆炸示旁 圖。其中電弧t⑽具有陰極入口 1〇2，且陰極入口 1〇2 具有側壁厚度。本發明使用絕緣元件2〇〇來隔離陰極（由陰 極管110和熱燈、絲13〇所組成）與電弧室1〇〇之陰極入: 102,其中絕緣元件200係經由陰極入口 1〇2而伸入至電 弧室1GG内，且絕緣元件2〇〇具有開口 2G2，藉以供陰極 管110伸入至電弧室100内。陰極管110之一端具有凹槽 112，而凹槽112係朝向電弧室1〇〇的外部，藉以供熱燈 絲1 3 0安置於其中。絕緣元件2〇〇係由例如陶瓷材料的絕 緣材料所製成，可以防止陰極入口丨02的側壁遭由陰極而 來之電子所產生的電弧轟擊，更避免與陰極管11〇產生短 路’造成如上所述之離子源設備的損害。由於絕緣元件 2 〇 0為對稱的形狀，且與陰極入口 1 〇 2完全吻合，而絕緣 元件200之開口 202與陰極管完全吻合，故當陰極管 1 1 〇透過絕緣元件200安裝於陰極入口 1 〇2後，陰極管π 〇 6 C請先閱讀背面之注意事項再填寫本頁) 訂· 線·- 經濟部智慧財產局員工消費合作社印製Supply the cathode tube, and extend the cathode tube Μ Α Μ π A s A into the arc chamber through the opening, wherein one end of the cathode tube has a groove, and the groove " 1 曰 1 糸 faces the outside of the arc to; and provides heat The filament is placed in the groove. Brief description of the drawings: The preferred embodiment of the present invention will be described in more detail in the following explanatory text with the following figures, where: Figure 1 is a schematic diagram showing the explosion of a conventional cathode and an arc chamber; The figure is a schematic diagram showing Pei Zhi's explosion that prevents the arc from being damaged at the step entrance of the arc chamber according to the preferred embodiment of the present invention; and π FIG. 3 is a diagram showing the arc prevention chamber according to the preferred embodiment of the present invention A schematic plan view of a device injured by an arc at the cathode inlet. " Comparison of drawing numbers: 100 arc chamber 102 cathode inlet 110 cathode tube 112 groove 130 hot filament 144 gap 200 insulation element This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) ........ ...... 磬 ........., 玎 ........., (Please read the notes on the back before filling out this page) 584878 Α7 Β7 V. Description of the invention (202 opening 210, 220 Detailed description of the hollow cylinder invention: The present invention discloses a method and a method for preventing arc damage at the cathode inlet of an arc chamber. The present invention is to install an insulating element made of ceramic material between the cathode inlet and the cathode tube, for example. In order to prevent the side wall of the cathode inlet of the arc chamber from being subjected to arc bombardment and spalling, please refer to FIG. 2. FIG. 2 illustrates a device for preventing arc injury at the m-mouth of the arc chamber according to a preferred embodiment of the present invention. The explosion is shown in the side view. The arc t⑽ has a cathode inlet 102 and the cathode inlet 102 has a side wall thickness. The present invention uses an insulating element 200 to isolate the cathode (the cathode tube 110 and the heat lamp 13 and the filament 13). Composition) with arc chamber 1 〇 Cathode inlet: 102, in which the insulation element 200 extends into the arc chamber 1GG through the cathode inlet 102, and the insulation element 200 has an opening 2G2 for the cathode tube 110 to extend into the arc chamber 100. The cathode tube 110 has a groove 112 at one end, and the groove 112 faces the outside of the arc chamber 100, and a heating filament 130 is disposed therein. The insulating element 200 is made of an insulating material such as a ceramic material Therefore, the side wall of the cathode inlet 02 can be prevented from being bombarded by the arc generated by the electrons from the cathode, and the short circuit with the cathode tube 110 can be avoided, which can cause damage to the ion source equipment as described above. Because the insulation element 2000 It has a symmetrical shape and completely matches the cathode inlet 102, and the opening 202 of the insulation element 200 completely matches the cathode tube. Therefore, after the cathode tube 1 1〇 is installed at the cathode inlet 102 through the insulation element 200, the cathode tube π 〇6 C Please read the notes on the back before filling out this page.) Order · Line ·-Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
584878 A7 ________ B7 五、發明説明（） 便自然地對準於陰極入口的中心位置。因此，本發明可以 解決習知之裝置中陰極管不易準確地安裝於陰極入口之 中心位置的問題。 請繼續參照第2圖和第3圖，其中第3圖為繪示本發 明之較佳實施例之防止電弧室之陰極入口處遭電弧傷害的 裝置之俯視示意圖。本發明之絕緣元件2 0 0可由例如兩個 同心中空圓柱體210和220所組成。其中中空圓柱體210 的外徑大於陰極入口 1 02的直徑，且位於電弧室1 00内， 而中空圓柱體22 0與中空圓柱體210互為同心圓柱體。中 空圓柱體220並穿過電弧室1〇〇，其中中空圓柱體210和 中空圓柱體220之開口 202的直徑略大於陰極管no的外 徑，中空圓柱體220的外徑略小於陰極入口 1〇2的直徑， 藉以使中空圓柱體220分別與陰極管11〇和陰極入口 ι〇2 吻合。如第3圖所示，中空圓柱體22〇的長度大於陰極入 口 102的側壁厚度’藉以充分保護電弧室ι〇〇之陰極入口 102的側壁。 另外’請繼續參照第2圖和第3圖，本發明之防止電 弧室之陰極入口處遭電弧傷害的方法如下：首先，提供具 有陰極入口 102之電弧室1〇〇,其中陰極入口 1〇2具有側 壁厚度。再提供具有開口 202之絕緣元件2〇〇，並將絕緣 元件200經由陰極入口 1〇2伸入至電弧室1〇〇内。然後提 供陰極管1 1 0，並將陰極管1 1 〇經由開口 2〇2伸入至電弧 至100内’其中陰極管110之一端具有凹槽112，而凹槽 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 訂· 線一 經濟部智慧財產局員工消費合作社印製 584878 、發明説明（） 1 1 2係朝向電弧室i 〇 〇的外邱 ΠΠ ^ 1 °卩再k供熱燈絲1 3 0安置於 w僧1 1 2内。 本發明的主要優點為提供一 ，.^ 供種防止電弧室之陰極入口 处乂電弧傷害的方法及裝置， 了防止電弧至之陰極入口的 側壁因遭受電弧轟擊而產生 Ά 到洛’而避免陰極入口與陰極 : 路，故可延長離子源設備的使用壽命，大幅減少 維修成本。 本七明之另一優點為揭：供_帛防止電弧室之陰極入口 處遭電狐傷害的方法及裝置，可有效而簡便地使陰極管準 確地文裳於陰極入口的中心位置。 如熟悉此技術之人員所瞭解的，以上所述僅為本發明 之較佳實施.例而已，並非用以限定本發明之申請專利範 圍；凡其它未脫離本發明所揭示之精神下所完成之等效改 變或修飾，均應包含在下述之申請專利範圍内。 (請先閲讀背面之注意事項再填寫本頁} 線-· 經濟部智慧財產局員工消費合作社印製 8 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐)584878 A7 ________ B7 V. Description of the invention () It is naturally aligned with the center position of the cathode inlet. Therefore, the present invention can solve the problem that it is difficult to accurately install the cathode tube at the center position of the cathode inlet in the conventional device. Please continue to refer to FIG. 2 and FIG. 3, wherein FIG. 3 is a schematic plan view showing a device for preventing arc damage at the cathode inlet of the arc chamber in the preferred embodiment of the present invention. The insulating member 200 of the present invention may be composed of, for example, two concentric hollow cylinders 210 and 220. The outer diameter of the hollow cylinder 210 is larger than the diameter of the cathode inlet 102 and is located in the arc chamber 100. The hollow cylinder 220 and the hollow cylinder 210 are concentric cylinders. The hollow cylinder 220 passes through the arc chamber 100. The diameter of the hollow cylinder 210 and the opening 202 of the hollow cylinder 220 is slightly larger than the outer diameter of the cathode tube no. The outer diameter of the hollow cylinder 220 is slightly smaller than the cathode inlet 10. 2 diameter, so that the hollow cylinder 220 coincides with the cathode tube 11 and the cathode inlet 12 respectively. As shown in Fig. 3, the length of the hollow cylindrical body 22 is larger than the thickness of the sidewall of the cathode inlet 102, thereby fully protecting the sidewall of the cathode inlet 102 of the arc chamber 102. In addition, please continue to refer to FIG. 2 and FIG. 3. The method for preventing arc damage at the cathode inlet of the arc chamber of the present invention is as follows: First, an arc chamber 100 having a cathode inlet 102 is provided, and the cathode inlet 102 is provided. Has a sidewall thickness. An insulation element 200 having an opening 202 is further provided, and the insulation element 200 is extended into the arc chamber 100 through the cathode inlet 102. Then provide the cathode tube 1 10 and extend the cathode tube 1 10 into the arc to 100 through the opening 202. One end of the cathode tube 110 has a groove 112, and the paper size of the groove applies the Chinese national standard ( CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling out this page) Order · Line 1 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 584878, Invention Description () 1 1 2 towards the arc chamber i 〇〇 Out Qiu ΠΠ ^ 1 ° 卩 k heating filament 130 is placed in the monk 1 12. The main advantage of the present invention is to provide a method and a device for preventing arc damage at the cathode entrance of the arc chamber, and to prevent the arc from reaching the side wall of the cathode inlet due to arc bombardment and avoiding the cathode. Inlet and cathode: It can prolong the service life of ion source equipment and greatly reduce maintenance costs. Another advantage of this Qiming is to expose: the method and device for preventing the electric fox from being damaged at the cathode entrance of the arc chamber, which can effectively and simply make the cathode tube accurately positioned at the center of the cathode entrance. As understood by those familiar with this technology, the above is only a preferred implementation of the present invention. The examples are not intended to limit the scope of the patent application for the present invention; all others that are completed without departing from the spirit disclosed by the present invention Equivalent changes or modifications should be included in the scope of patent application described below. (Please read the precautions on the back before filling out this page} Line- · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 8 This paper size applies to China National Standard (CNS) A4 (210X297 mm)