TW583465B - Diffusion reflection plate, transfer master, transfer base film and transfer film used for manufacturing the same, and method of manufacturing diffusion reflection plate - Google Patents

Abstract

A diffusion reflection plate for diffusing and reflecting light has a saw-tooth shaped cross-section composed of continuous and repeated saw teeth each of which constituted by a vertical surface (a) and an inclined surface (b), relative to a substrate surface of the diffusion reflection plate. The inclined surface (b) inclines 2-30 degrees relative to the substrate surface, the inclination angle of the vertical surface (a) relative to the substrate surface is 75-105 degrees. A cross-section of the inclined surface (b), which is perpendicular to the saw-tooth shaped cross-section, has a waveform having amplitude, which presents on the surface of the diffusion reflection plate forming a continuous and rugged surface.

Description

583465 V. Description of the invention (1)---one ^ [Technical field of Qiming] Show ΐ 月 is about-a kind of reflective plastic liquid crystal diffusion that can be used without rear projection light: ί f for high efficiency Diffusion-reflective substrates for conversion display substrates of reflective liquid crystal displays such as solar cells, and those used in the manufacture of base films, transfer films, and transfer masters. L prior art] indicator (hereinafter referred to as LCD) because of = = has been used in clocks: Α, τν, hair, except 佶 .I =. Especially in recent years, the color LCD has been completed to open the piano: V Xi A · AV machines, but also used in navigation systems, dramas, :), brain screen, etc., it can be predicted that its market will continue to be an urgent LCD because of helmets Must be rear-projected.卩 The reflection type ## ^ of the incident is displayed first. Each port has the characteristics of low power consumption, thinness, lightness, and lightness, so it is too clumsy to use_ dry J ^ Ί intention. The application on the portable terminal is very popular. The t-t-type LCD uses a twisted structure and a high twisted structure. Some methods are used because the linear polarizer is only displayed when the display: = = so it will display. darken. Therefore, some people have proposed to reduce: the display mode of the force and the mode of the display, and the display mode of the guest-host mode. In order to effectively use the incident light to brightly display the incident light at various angles of the local t, the diffuser Λ; f is displayed on the page. That is, it is necessary to control the reflective film on the reflective plate so that it is properly reversed: "Use a metal reflective plate, such as aluminum or

583465 5. Description of the invention (2) Silver, or a layer of sensitized reflective film laminated on the metal to increase the reflectivity of the metal surface. In addition, there is a proposal of a so-called photoetching method (Japanese Patent Application Laid-Open No. 4-2 4 3 2 2 6), in which a photosensitive resin is coated on a substrate, and a photo-ink (ph 〇 〇 mask) is used to form the substrate. A method of forming a concave and convex surface of a pattern and forming a metal thin film to form a reflecting plate. When the inclination angle of the uneven surface is controlled at a certain angle, you can try to increase its reflectivity within a certain angle range with the specular reflection direction as the center. In terms of proper reflection characteristics, it is best to review and review the use of displays such as liquid crystal elements. For example, in a liquid crystal element, in order to reflect externally incident light, the image of the light source is reflected like a mirror on the surface of the liquid crystal element and the interface existing parallel to the surface. Therefore, the bright angle of the non-orthogonal reflection direction is not used. When most of the concave surfaces of the diffuse reflection plate forming a fine uneven surface on the surface of the substrate are irregularly dispersed, the reflection characteristic becomes a viewing angle that depends on the amount of reflected light. Although the display in the direction of regular reflection should be the brightest, but as before The liquid crystal element does not use a regular reflection direction but uses an angle that is not a regular reflection direction, so the amount of reflected light is reduced, and the display quality of the liquid crystal element is reduced. At the same time, most externally incident light is not directed below the position of the user of the liquid crystal element. Most of the fields below the display of liquid crystal elements, such as keyboards or desktops, and users of liquid crystal elements, are difficult to introduce externally incident light. That is, most of the externally incident light is incident from the upper direction and the left-right direction of a display such as a liquid crystal element. Therefore, it is possible to provide a bright reflected light quantity with excellent display quality of a liquid crystal element.

314175.ptd Page 13 583465 V. Explanation of the invention (3) The diffuse reflection plate must require its reflection characteristics so that external incident light entering in various directions above and below the display can effectively reflect to the user direction. In order to solve the above problems, the present invention provides a diffusion reflection plate with excellent display quality and a method for manufacturing a transfer master, a transfer base film, a transfer film, and a diffusion reflection plate used in the manufacture thereof. The diffusion reflection plate has excellent display quality. It has a directional reflection characteristic that allows external incident light that enters in various directions, such as the upper direction and the left-right direction, of a display such as a liquid crystal display, to effectively reflect toward the user. [Disclosure of the Invention] The first aspect of the present invention is [1] a diffuse reflection plate characterized in that the diffuse reflection plate is capable of diffusing and reflecting light, and the diffuse reflection plate is formed of a base material and formed on a surface thereof; The cross-section of the film layer, which is composed of a thin film layer and a reflective layer, in a direction perpendicular to the surface of the substrate, is a zigzag formed by successively repeated vertical surfaces (a) and inclined surfaces (b). The inclination angle of the vertical plane (a) is 75 to 105 degrees, and the inclination angle of the inclined plane with respect to the surface of the substrate ^) is 2 to 30 degrees, which is perpendicular to the dentate cross section and on the two sides of the substrate The vertical inclined plane (b) has a continuous wave surface with a wave shape having a cross section. ] Female The diffuse reflection plate of [1] above, in which the waveform perpendicular to the tooth-shaped cross section and the inclined surface (b) cross section is a sine wave. ] The diffuse reflection plate according to the above [1], wherein the amplitude of the waveform of the inclined plane (b) perpendicular to the sawtooth-shaped transverse plane is not fixed. Inverse L 1 ″ diffuse reflection plate, which is perpendicular to the zigzag cross section

Page 14 583465 V. Description of the invention (4) The wavelength of the waveform of a straight inclined plane (b) cross section is not constant. [5] The diffuse reflection plate according to the above [1], wherein the arrangement interval of the vertical plane (a) is 2 // m or more and 1 5 0 # or less. [6] The diffuse reflection plate according to the above [1], in which the difference between the maximum height and the minimum height (that is, the maximum drop of the concave-convex surface) in the vertical direction of all the zigzag cross sections is less than 6 // m. [7] The diffuse reflection plate according to the above [1], wherein the arrangement interval of the vertical plane (&) is not a certain interval. [8] The diffuse reflection plate according to any one of the above [丨] to [7], wherein the vertical plane (a) and the inclined plane (b) of the center are subjected to surface roughening treatment. ϊϋΠ is a transfer thick mold, which has formed the uneven surface of the diffuse reflection plate of [1] above. i 二]: Ϊ transfer thick mold, used to form the transfer original mold as described in [9] above, and a transfer base film, which is stamped on the transferred layer using the above [9] or = transferred original mold to transfer its shape. The transfer of the original mold f [12]-a transfer film, using the transfer film layer of [n] above, the transfer of the thin support from the surface of the transfer original mold: :: the surface of the substrate. The looking surface is formed and transferred 2H]: a kind of transfer film, which has a reflective film formed between the above [12] rotations. ¥ zhong temporarily supporting the building "12% of i is [14] = manufacturing year of the diffuse reflection plate, the transfer film is pressed with the film layer as the interface to be transferred to Shanghai, so that the work on the above b substrate

314175.ptd Page 15 583465 V. Description of the invention (5) ~ ~ Process, the process of peeling the temporary support, and the process of forming a diffuse reflection plate by forming a reflective film on the surface of the thin film layer. Xi and [15] —A method for manufacturing a diffuse reflection plate, which is a film transfer process in which the above-mentioned base film is formed by pressing the transfer forming surface as a contact surface on the substrate, a process of peeling the transfer base film described above, And the engineer of the film in Niji. ≫ Reverse and [1 6] —A method for manufacturing a diffuse reflection plate, which includes a process of pressing the upper transfer film with the thin film layer as the interface and pressing it on the transferred substrate. The engineer who peeled off the temporary support. # And [17] A diffuse reflection plate made by the above [14] to [u diffuse reflection plate manufacturing method. [1 3] of 'and

—Item ^ Π The clever scattered reflection is the only one that is provided with a reflective film on the surface of the transfer base film on [11] and on the surface of the self-transfer original wedge. The f H9] type diffuse reflection plate is characterized in that the above-mentioned [to the device. [18] The diffuse reflection plate of any one of the items is used in the reflection type liquid crystal display tl g 0] y diffuse reflection plate, which is characterized in the above [1] to [7],

In a diffuse reflection plate with any one of the planes vertical, the one with the lowest south difference in the slope of the surface relative to the base and the parallel: shaped cross section, due to the square t below the ridge top of the surface or the bottom of the ditch. The eighth face of the display day is used in reflective liquid crystal displays. ΠΠ The second aspect of Guangde 1 is [21] A diffuse reflection plate, which is characterized by a diffuse reflection plate whose surface is reflected by reflection. The diffuse reflection is composed of a thin film layer and a reflective layer formed on the base phase. And its shoulder with the substrate

Page 16 583465 V. Description of the invention (6) The cross-section of the film layer in the vertical direction is a zigzag formed by successively repeated vertical planes (a) and inclined planes (b), and is perpendicular to the surface of the substrate ( a) The inclination angle is 75 to 105 degrees, and the inclined surface (b) includes at least two kinds of inclination angle groups different from the surface of the substrate. One of the inclination angle groups is 0 to 20 degrees, and the other is inclined. The angle group is 10 to 30 degrees, and the inclined surface (b) whose inclined surface is perpendicular to the sawtooth-shaped cross-section and perpendicular to the surface of the substrate has a waveform of amplitude and has a continuous uneven surface. [2 2] The diffuse reflection plate as in [2 1] above, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the zigzag cross section is a sine wave. The teeth [, 2 3] are the diffuse reflection plates in [21] above, in which all or part of the saw-shaped k-cut surface shape of the inclined surface (b) is a curve.歯 [, 2 4] The diffuse reflection plate as in [2 1] above, wherein the saw of the inclined surface (b) = two or more different inclined lengths of the shape of the loose cut surface are not constant. Vertical 25] The diffuse reflection plate as described in [21] above, wherein the amplitude of the waveform of the cross-sectional plane with the sawtooth-shaped cross-section and the [2 ^ inclined plane (b) is not constant. [Vertical] The diffuse reflection plate as in [2 1] above, wherein the wavelength of the waveform of the cross-sectional plane with the sawtooth-shaped cross-section and the "inclined plane (b) is not constant. L Z 7] as described above" 9 1 Ί &

The diffuse reflection plate in "Setting the door", where the distribution interval of the vertical plane (a) is above 2 // m! I and above 150 // m. & L28] As described above in "2】 Ί Heath in the plane 1", in which all jagged warps transverse to τ in the vertical direction μ Large tomb Λ Take the difference between the large degree and the minimum height (ie The maximum / preparation of the uneven surface) is below 6 // m and [29] is the diffuse reflection plate as described in [2 者 置 间 卩 5 a ^ 1 ”, in which the vertical plane (a) is not fixed. Spacer.

Page 17 State 465 transfers the original model described in [3 4]. The process of pressing the joint surface of the shooting plate and the method of making the diffusion, and the method of making the substrate close to the base film and peeling the diffusion reflection. V. Description of the invention (7) and [30] are as described in [21] to [29] above. The straight surface (a) and the inclined surface (b) have been formed into [31] after the present invention: transfer the original mold. And [32] are used to form the model of [3 丨] above. The present invention is also [33] —a transfer base mold of the transfer base, which will compress the transfer base mold. The present invention is also [34]-a kind of transfer film. The film is a temporary support and temporarily supports to form a thin film layer. The shape of the thin film layer and the surface of the substrate to be transferred are the same. And [35] a kind of transfer film, which forms a reflection between the upper body and the thin film layer. The present invention is also [36] —the kind of diffusion film in [34], which uses the thin film layer as a process to transfer the aforementioned temporary support. The process of forming a reflective film on the peeled surface and [3 7] —a process of diffusing a reflective plate, a process of transferring a base film on the surface film layer formed by the transfer, a process of forming a reflective film on the aforementioned transfer surface, and [ 38] —A system of diffuse reflection plate, the diffuse reflection plate of item, wherein the vertical surface is roughened. The transition f of the uneven surface of the uneven surface of the diffuse reflection plate in [2 1] is transferred by using P in the above [31] or [32] on the layer to be transferred. The support is transferred from the surface of the transfer original mold to the surface of the temporary support to form a temporary support on the transfer film. The method is based on the transferred substrate and the thin film reflector. This is to make the above pressure on the formation of the project, board. It consists of a substrate on which the above-mentioned materials are transferred [33] and in the expression [35]

314175.ptd Page 18 583465 V. Description of the invention (8) The second step of the transfer film is to press the film layer as the interface and peel the aforementioned temporary support. The present invention is [39] —diffusive reflection = [3] 8] The system of any one of the diffuse reflection plates and [40] —a type of diffuse reflection plate, which is provided with a reflective film on the surface of the original self-transferring mold, and [41] a diffuse reflection plate, which features [39] ], [40]. And [4 2] —A kind of diffuse reflection plate, straight ridge tops and grooves formed by the vertical plane (a) and inclined plane (b) of the diffuse reflection plane of any one of [39] and [4〇]. The one with the bottom line parallel is the one facing down the display, which is roughly below the day. The present invention is also a diffuse reflection plate of [4 3], a reflective liquid crystal described in [1]. And [44] a reflective liquid crystal display, a diffuse reflection plate. [Embodiment] The present invention can provide a manufacturing method of a transfer master, a transfer base film, and the like for the manufacture of display products. To. , Made by the above, [36] to the above-mentioned manufacturing methods. The transfer of the transfer base film described in [33] is the use of the above-mentioned [21] to [29], and the reflection plate is used in the reflective liquid crystal display. In the above [21] to [29], the plate is The surface of the sawtooth-shaped cross section is used in a reflection type liquid crystal display in the form of a high and low drop due to its inclination. It is characterized by the use of the above-mentioned [2 1] diffusion diffuser with excellent quality and its transfer. The film, the diffuse reflection plate, and the other plate have external entrances that can be incident from the liquid crystal element in all directions.

314175.ptd Page 19 V. Description of the invention (9) Light: the directional reflection characteristic of effective reflection.

The invention can be easily used as a diffuse reflection plate such as a r ^^ 1 display, etc., and can be transferred to the substrate table: Kari production. The shape of the surface of the diffuse reflection plate, or the transfer f; the surface of the micro-convex surface is transferred from the original mold to the surface transferred by the original mold: the surface shape of the original J, and then the surface is transferred to transfer the unevenness ; ::; said that moving the slight unevenness of the original mold of the transfer can transfer the same shape as the original unevenness of the transfer, and it will be transferred on the base film when it is transferred again. The transfer base film is plated. Then using this transfer beauty #, the film becomes a diffuse reflection and transfers its original transfer mode; ==: layer support: film ... transfer on the body, that is, ^ ί transfer surface of the substrate, which is a transfer film. Horiba ::; =: Facing the film layer and pressing on the substrate being transferred = Cheng: The process of peeling off the supporting limbs of the temple and the project of the reflective film transferred on the film layer can be made into diffuse reflection and reflect. . Also can be two :: The transfer film forming a reflective film with the thin film layer faces the thin film layer tightly to the base reflection i, process, and the aforementioned peeling process of the temporary support body is made, produced: diffused to the production of the substrate, that is, composed of The transfer original mold is pressed tightly on the transferred film to transfer its shape to the transferred base film. The transferred surface of the transferred base film is tightly pressed to form a film layer on the substrate. Heart:

314175.ptd

Page 20 583465 V. Description of the Invention (ίο) The peeling process of the base film and the process of forming a reflective film on the surface. The diffuse reflection plate of the present invention is a sawtooth-shaped cross-section formed by a vertical and inclined surface (b) with respect to the surface of the substrate, and a sawtooth composed of continuous sound, tongue + (a) (a) and inclined surface (b) Concave-convex surface of the cut surface of the shape of 杻 —as shown in Fig. 7, Fig. 10, Fig. 15 and Fig. 18. For example, the formation of the old convex surface can be moved under the shape of the machine such as the machining on the etching knife and the horizontal movement of the surface of the substrate as shown in Figure 1 and Figure 12. JUJ 〇y, examples of success can be formed by the following projects, but they are not overwhelming. /, Laser cutting, photo-etching, JE cross-etching, etc. may be used, and the combination of '' may be limited. You can also use these to arrange the surface of the substrate in the xy plane of the xyz space or the surface of the transfer master of the transfer master, while moving on the surface of the ancient original branches, and using the end angle of the right half and the left half to move, etc. The end angle of the etch knife that is fast-forwarded to 15 degrees and the combined angle of 70 to 88 degrees is -η, one of the end angle and the end angle of the left half), and the right half is 70 to 90 degrees and 60 to 80 The combination of degrees and angles is -15 to 15 degrees, and then turn ^ square direction to move up and down, you can form a _ on the surface of the substrate or a knife (Figure u), transfer the original mold on the surface of the original mold _ — move the original mold The surface or = (b) a continuous uneven surface. , And the vertical plane (a) and the inclination, when the original model is transferred, the second model or the original model table, "the knife returns to the original: :: work, etc., moves a certain distance in the y direction, ", ·, From the beginning of the etching, move the surface of the original mold or its transfer v original x :: to etch on the surface of the substrate or move up and down. Do the same speed operation on the heavy surface, and then repeat the 5 ’operation on the surface of the substrate or

583403 V. Description of the invention (11) ^ ^ ------_ The full formation of the concavity and concavity formed by the surface (/) and the inclined surface (b) of the transfer original mold surface or its transfer original mold is as follows: When the surface of the substrate or the surface of the transfer original mold is cylindrical, except that the surface, the surface, or the transfer original mold is used for the rotary motion of the angular velocity, or the speed of the temple is violated, the knife is moved half-predetermined during the continuous circle. Speed movement, and the formation of the concave groove of the money engraving in the cylinder = movement rhyme engraved in a spiral shape, that is, _ etching knife does not need to move up and down, f ::: can also be sinusoidal when the amount is the vertical axis: Pi 2 'uses the time axis as the horizontal 2-person curve movement and so on. Sine wave movement, triangle wave movement, the above-mentioned various movements, and levels: the name of the knife and the substrate carved by the money. The movement can be done, the above is the surface of one of the substrates or the transfer mold 丨 ": After the engraving process, the recesses are opened 4: The surface of the transfer mold is transferred to the surface of the original mold, such as the film stacking of the grain On the surface, the surface is roughened by sandblasting, plating, the surface of the substrate or transferring the unevenness of the original mold. After the surface is subjected to the etching process, the transfer of the original mold and the flat coating process of the original mold can be exemplified. =; = Flat, the surface is roughened to a concave portion; = f: etching), coating equalization and releveling (refl ° w), Soft surface roughening and plating can also be used for layer-finding. The state is the most. u Polishing and plating make the shape of the concave part or convex part wrong. The reflection characteristics can be optimized by selecting the shape of the carving knife. Can also be 583465 V. Description of the invention (12) ^ Increase the hardness of the surface, or to protect the plating. The plating is preferably chromium, nickel, zinc and other plating. The purpose of lice. Protected metal = = = = The mold is transferred. The material of the original mold is a good non-recorded steel. Iron: Gold, „Gong Gongli: Good inch stability, good conductivity. The surface is mechanically polished, engraved, Accumulations such as washing treatment can be used: plate-like 1 shape, round ::: cylindrical shape that is processed into rotation after the hook is preferred ... ,,, 哏 疋, but can form a diffused light The shape of the concave and convex surface is transferred. The original mold can be used in the form of a sheet, a flat plate or a cylinder, and the original mold. The entire surface or part of the surface must be shaped. It can be expanded to 2 sides and other base shapes. It can be placed on or sandwiched between concave and convex shapes. It can also be heated, illuminated, etc. in the compacting process. Surface co-pressurization device The diffuse reflection plate of the present invention can be diffused or reflected by the shape of the uneven surface, so the uneven surface The design must be adjusted for its diffuse reflection characteristics. The shape of the concave-convex surface of the enlarged reflective plate of the 4th expansion plate, the jagged cross-section formed by the beautiful surface (a) and the inclined surface (b) :: The angle of inclination of the surface perpendicular to the surface of the substrate is 75 to 105 degrees. ^ Surface (a) The present invention In the first aspect, the inclined angle of the inclined surface (b) is preferably 2 degrees or more and 30 degrees or less, and more preferably 2.5 degrees or more and 15 degrees or less. Therefore, the inclination angle of the surface of the watch substrate is vertical. The surface (a) and the inclined surface (b-shaped zigzag cross section (close to a right triangle))

Qb) The angle between the straight line of the two blades and the surface of the substrate of the diffuse reflection plate. the same

3] 4l75.ptd Page 23 583465 V. Description of the invention (13) The inclination angle of the vertical plane (a) with respect to the surface of the substrate is a zigzag horizontal plane composed of the vertical plane (a) and the inclined plane (b). On the cut plane, the angle between the straight line at both ends of the dividing line of a vertical plane (a) and the surface of the substrate of the diffuse reflection plate. The inclined surface (b) in the second aspect of the present invention, as shown in FIG. 16 and FIG. 17, includes at least two inclined angle groups different from the surface of the substrate, and one of the inclined angle groups is 0. To 20 degrees, the other is 0 to 30 degrees, and the range of incident light angles corresponding to the best amount of incident light is a combination of 0 degrees to 15 degrees and 10 degrees to 25 degrees. The angle of the inclination group depends on the purpose of the diffuse reflection plate. The length of the inclination angle group of the inclined surface (b) of the sawtooth cross-section may be the same length or irregular, so as to correspond to the incident light angle with the best amount of incident light, and the ratio of the angle to the length is preferably as large as possible. . The shape of the inclined surface (b) on the cross-cutting plane can also be all or part of a curve, and the inclined angle group is a person with a uniform angular distribution within a set angle range, and the reflected light can be uniformly reflected back to the direction of the user. In the second aspect of the uneven surface of the diffuse reflection plate, the inclined surface (b) is provided with a complex i number of inclined angle groups, and the cross section of the inclined surface (b) has a waveform with an amplitude. The incoming external incident light is effectively reflected back to the angle range observed by the user. The roughening of the surface of the uneven surface can smooth the peaks of the reflected light of the plurality of inclined angle groups, and a display state with less loss of visual field in the angle range can be obtained. In the first and second aspects of the present invention, the inclined plane (b) on the transverse plane perpendicular to the sawtooth transverse plane has a waveform with an amplitude, which can be a waveform as shown in FIG. 8 and can be in addition to a sinusoidal waveform. Waves formed by partial circles or ellipses, waveforms formed by partial parabola, triangle waveforms, and the continuity of these waveform combinations

314175.ptd Page 24 583465 V. Description of the invention (14) For the waveform, the curved surface is more likely to diffuse the reflected light from a wider range of light source positions, and it can reduce the manufacturing unit price, of which the sinusoidal waveform is preferred. The wavelength of the waveform on the cross-section of the inclined surface (b) may be regular, but in order to suppress interference waves and spectral splitting, it may also be arranged at non-constant intervals. That is, when the waveform is a sinusoidal waveform, the waveform of the sinusoidal waveform may be non-constant. The phase of the sine wave, etc. of the cross-section waveform of the vertical plane (a) adjacent to the inclined plane (b) may be constant, but in order to suppress the interference wave and the beam splitting, it is better to move the half phase, and the non-uniform one is better. The amplitude of the cross-section waveform of the inclined plane (b) may be regular, but it is better to arrange it at a certain interval in order to suppress interference waves and spectral splitting. That is, when the waveform is a sinusoidal waveform, the amplitude of the sinusoidal waveform may not be constant. With respect to the surface of the substrate of the diffuse reflection plate, the peak angle formed by the uneven surface of the zigzag cross section formed by the vertical surface (a) and the inclined surface (b), and the peak angle formed by the vertical angle of the zigzag cross section, Valley can also be a person with a curvature shape. Observing the diffuse reflection plate, when reducing the area of each vertical plane (a), no parallax or astigmatism is lost, and a diffuse reflection plate with excellent visibility can be obtained. Therefore, the interval at which the vertical plane (a) is arranged is 150 // m or less It is better to be below 70 // m. On the other hand, if the interval of the vertical plane (a) is too small, it is easy to cause spectrometry. Therefore, it is better to use 2 // m or more. The interval of the vertical plane (a) may be regular, but it is better to arrange it at a non-definite interval in order to suppress interference from spreading the light. The unevenness on the uneven surface of the diffuse reflection plate causes a drop on the surface. For example, when a diffuse reflection plate is formed between two glass plates of a liquid crystal display, the difference must be reduced. When the diffuse reflection plate of the present invention is used in other displays, such as an electric field light-emitting display, the smaller the difference is

314175.ptd Page 25 583465 V. Description of the invention (15) The superposition of the reflecting plate means that the present invention is the highest and most suitable for expansion. When 3.5 // m is redesigned by the present invention, it is usually necessary to transfer the mold to the film to It is preferable that the curvature of the uneven shape of the transfer original film layer is small. The compacted film of the present invention can be the following base film. The specific examples are biaxially stretched cellulose imine, polyester, plastic, or aluminum, such as vinyl chloride, etc., and a biaxially-stretched polymer with a primer. The film layer is hardene, and ethylene and ethylene are copolymerized to form each The manufacturing process of display parts is simple. Of all the jagged cross-sections of the diffuse reflection plate, it is more preferable that the vertical low position difference (that is, the maximum drop of the uneven surface) is less than 6 / z m. The deformed surface of the transfer master mold or the transfer master mold of the transfer master mold is considered when the film layer is hardened. That is, in the process of transferring the original layer, it is necessary to consider the deformation of the transferred shape and the drop or inclination angle of the concave-convex surface of the mold, which is larger than the desired thickness, and the vertex and peak and valley of the concave-convex surface of the original mold. 〇 Transfer original mold, you can use the transfer original mold to transfer the original mold layer, transfer its shape on the transfer base film. The transfer base is a transfer base film or a transfer base film further provided with a primer layer. With chemical and thermal stability, it can be formed into sheet-like, plate-like polyenes such as polyethylene, polypropylene, polyvinyl chloride, polygasified vinyls, cellulose acetate, nitrocellulose, derivatives Metals such as copper, polystyrene, polycarbonate, polyABS, polyacetaldehyde, PPO, polymaple, epoxy resin, etc. Among them, ethylene terephthalate is particularly preferred because of its excellent dimensional stability. The primer layer of the transfer base film is preferably formed after the unevenness is formed. Examples include the copolymerization of polyethylene, polypropylene and other polyvinyl esters, ethylene and acrylates, ethylene and vinyl alcohols, and the copolymerization of polyvinyl chloride, vinyl chloride, and vinyl acetate.

314175.ptd Page 26 583465 V. Description of the invention (16) ~~ " ~ --- The copolymer of stupid ethylene and vinyl alcohol, polyvinylidene chloride, polystyrene, ethylene and (fluorenyl) acrylate Styrene-like copolymer, polymethylstyrene, copolymer of methylstyrene and methylstyrene such as (meth) acrylate-'poly (fluorenyl) acrylate, butyl (meth) acrylate and Copolymers of vinyl acetate (^) type (meth) acrylates, synthetic rubber, cellulose derivatives, and at least one organic polymer can be used. In order to harden after the unevenness is formed, a photo-initiator or an ethylene-containing double bond-containing monomer may be further added. Negative and positive type are no problem. The transfer base film and the transfer base film provided with a primer layer can be made into a transfer-shaped transfer base film by using a transfer master mold and pressing the transfer master mold against the transferred layer. The present invention can also be used as a transfer film by using the above-mentioned transfer support to transfer the original mold without forming a temporary support. The diffuser reflection plate of the transfer film is peeled on the surface of the transfer base film. The base film is a temporary support, and then a thin film layer is formed on the temporary surface. On the film layer, a contact surface with the substrate to be transferred is formed, and the pair of transferred surfaces are pressed against the substrate to form a base film. The reflective layer formed on the surface can be coated on the support or substrate of the transfer base film, and the film is formed to form a rollable resin composition. 4 When necessary,: ΐ t :: ί alone or in combination with dyes, organic pigments #, inorganic pigments, private bodies, or composites thereof. It is also possible to use a photo-curable resin composition or a heat-curable I. Izuki-yue composition in the film layer. The softening temperature of the thin film layer is not particularly limited 疋 ', but preferably 200 ° C or lower. In addition, in order to obtain fluidity by heating, a low-melting substance having a molecular weight of 10,000 or less may be added.

314175.ptd Page 27 583465 5. Description of the invention (17) Among these materials, those with good adhesion to the transfer base film or substrate and excellent peelability to the transfer base film are preferred. Examples of the organic polymer containing a photocurable resin composition include polyenes such as propylene resin, polyethylene, and polypropylene; polyvinylidene compounds such as polyethylene gas and polyvinylidene chloride; cellulose acetate and nitration Cellulose derivatives such as cellulose and celluloid, polyamine, polystyrene, polycarbonate, polyester, etc. In the field of TFT liquid crystal displays, in order to form contact holes on the substrate with the formed TFT, the thin film layer of this portion must be removed, and a photosensitive resin that can show a phase such as alkali can also be used. At the same time, in order to increase its thermal properties, financial properties, and shape stability, a thermosetting resin composition can also be used. In addition, by adding a coupling agent and an adhesive, the adhesion to the transfer base film can be further increased. For the purpose of adhesion, an adhesive agent may be formed on the adhesion surface. The thin-film layer is obtained by heating, and a low-melting substance having a molecular weight of 1 000 or less may be added. For example, you can add plasticizers described in "Plastic Compounding Agents" (edited by Akira Endo and Makoto Sudo, issued by Daiseisha, issued on November 30, 2008), or those containing at least one ethylenic double bond in the molecule monomer. The amount of this component used is preferably 1 to 70% by weight of the total solid content in the photosensitive composition. Examples include trihydroxymethylpropane triacrylate, triethylene glycol diacrylate, diethylene glycol diacrylate, tetraethylene glycol diacrylate, hexamethylene glycol diacrylate, neopentyl glycol diacrylate Acrylates, methyl furan acrylate, tetrahydroxymethylmethane tetraacrylate, resorcinol diacrylate, para, p -'- dihydroxydiphenyl diacrylate, spirodiol diacrylate, cyclohexanedi Hydroxy fluorenyl diacrylate, biphenol A diacrylate, polypropylene diacrylate

314175.ptd Page 28 583465 V. Description of the invention (18) Alcohol diacrylate, pentaerythritol tetraacrylate, glycolized pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, and the above acrylic acid Acrylic acid compounds, acrylic acid compounds, acrylic acid compounds, acrylic acid, acrylic acid compounds, acrylic acid compounds, acrylic acid esters, acrylic acid vinegars, methylene diacrylamide, Polyfunctional monomer such as urethane-based diacrylate. In addition, ECH denatured phthalic acid diacrylate, tris (acryloxyethyl) isocyanate, tris (fluorenyloxyethyl) isocyanate, tris (2-hydroxymethylethyl) isocyanate, and polyethylene glycol can also be used. Difluorenyl acrylate, tribromophenyl acrylate, E0 denatured tribromophenol acrylate, E0 denatured tetrabromodiphenol dimethacrylate, etc. are solid at 5 ° C or their viscosity is 100 ° Monomers or aggregates of Pa · s (100,000 csp) or more. Alternatively, it is better to select the ones listed in the Catalogue of Photosensitive Materials (edited by Photopolymer Workshop, published by Buns i η, March 31, 1996). Other examples include methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, 2-ethylhexyl acrylate, methyl methacrylate, cyclohexyl acrylate, methyl Monofunctional functions such as tetrahydrofuran succinate, phenyl methacrylate, acidic (2-methacryl fluorenyloxyethyl) phosphate, dimethylamino methacrylate quaternary, etc. Sex monomer. These ingredients may be used alone or as a mixture of two or more of them. Examples of the photoinitiator of the photocurable resin composition include benzophenone, Ν, Ν'-tetraethyl-4, 4'-diaminophenylbenzene, 4-methoxy-4 '-di Methylaminobenzylbenzene, phenylbenzyl, 2,2-diethoxyacetamidine, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl difluorenyl ketal, α-hydroxyisobutyl ketone, thioxanthone, 2-gasified thioxanthone, 1-hydroxycyclohexyl benzophenone,

314175.ptd Page 29 583465 V. Description of the invention (19) 2-methyl-1- [4- (methylthio) phenyl] _2-morpholin-1-propanone, third anthraquinone, Bu Gasified anthraquinone, 2, 3-digassed anthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 9, 10-phenanthrenequinone, 1,2 -Benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2- (ortho-gasified phenyl) -4,5-diphenylimidazole dimer, and the like. These photoinitiators can be used alone or in combination of two or more kinds. The amount of this component used is preferably from 0.01 to 25% by weight of the total solids content in the photosensitive resin composition, and more preferably from 1 to 20% by weight. The coating method of the film layer and the primer layer can be exemplified by roll coater coating, spin coating coater coating, spray coating coater coating, dip coater coating, curtain coater coating, wire rod coating machine coating, and rotary gravure coating. Printing coating machine coating, pneumatic blade coating machine coating. The surface of the temporary support and the substrate is also coated with a film layer or a primer layer using the method described above. Examples of coating substrates include glass plates, glass plates formed with inorganic compounds such as chromium or IT 0, stone rubber substrates, ceramic plates, polycarbonate resin films, acrylic resin films, and poly (phenylene terephthalate). Ethylene formate film, polyether maple resin film, fluorine resin film, etc. It is better to use a substrate with less birefringence (n = 0.01 or less). The present invention forms a reflective film on the transferred surface of the thin film layer or on the transferred base film. Figures 3 and 2 show an example of forming the reflective film on a thin film layer. The reflective film can be selected with appropriate materials in the desired reflection wavelength range. For example, reflective LCD displays can display visible light in the wavelength range of 30 Onm to 80 Onm. Metals with high reflectivity, such as Ming or gold, silver, etc. Law formation. In addition, the reflection enhancement film (optical

314175.ptd Page 30 583465 V. Description of the Invention (20) Introduction 2, Toei Shunhei, Asakura Bookstore, 1976. In the case of reflection using the difference in refractive index, in addition to metal, it is also possible to form a film such as I TO or tantalum pentoxide, an oxide film such as silane or aluminum, or an oxide film by vacuum evaporation or sputtering. Nitride film. Or a laminated film with a low refractive index is used as the thin film layer monomer. The thickness of the reflective film is preferably from 0.01 to 50 // m. The necessary part of the reflective film can also be patterned by photolithography or photomask evaporation. In order to protect the transfer surface of the thin film layer on the substrate, it is better to provide a surface film layer as a protective film. The surface film layer is preferably one which is chemically and thermally stable and is easily peeled from the film layer. Specifically, those having a thin sheet shape such as polyethylene, polypropylene, polyethylene terephthalate, and polyvinyl alcohol and having a high surface smoothness are preferred. In order to impart releasability, the surface is also released. The thickness of these surface film layers is preferably 5 to 120 / z m. When the thickness is less than 5 // m, the membrane is easily damaged, and therefore it is liable to become defective. When it exceeds 1 2 0 // m, creases are likely to occur when the film is wound in the subsequent process. Reduce its workability. As shown in FIG. 2 and FIG. 13, the transfer film of the present invention can be pressed on the transferred layer formed by the base film and the primer layer by the transfer original mold, and the shape of the transfer original film can be used as a temporary support. A film layer is formed on the surface of the temporary support body after transferring the original mold (in Figs. 2 and 13, the surface film layer is laminated to form a protective film layer), and the surface of the temporary support body is not laminated with a film layer. Adhesion to the transferred substrate. The method of transferring the thin film layer on the transfer film to the substrate can be exemplified by peeling off the surface film layer as shown in Fig. 4 and heating and pressing it on a transferred substrate such as a glass substrate. Where adhesion is required, the substrate can be cleaned with necessary chemicals, etc., or an adhesive can be applied to the substrate, or the substrate can be irradiated with ultraviolet rays. Device for film layer transfer,

314175.ptd Page 31 583465 V. Description of the invention (21) The film roller can be pressed tightly by using the substrate roller. This is preferable around the substrate. At this time, the concave-convex shape of the film is easier to reproduce the large cracked film layer. Due to the efficient diffusion reflection to maintain its expandable occasions, the film can be lifted such as carbon arc lamps, supermetal lamps, fluorescent lamps, and exposure can also be performed after the temporary exposure. There are reheaters. In the present invention, it is better to make the bottom line of the dagger and the inclined plane parallel to the bottom of the trench because the slope is slightly lower. The left side of the figure shows the above. The reflective plate can be used. The following examples must be used. The film thickness can be formed on the substrate. The film thickness is not flat. Layers of astigmatism, layer exposure, pressure on mercury tungsten lamps, etc. When the support body is heated and pressurized by warm air, the concave-convex shape of the thin film layer sent out is the same or flat than necessary. Before the light is exposed to the photosensitive lamp, high-pressure peeling or hot furnace, or the rolling film of the rubber rolling substrate The thickest occasions with thickness of 0.% are not observed, the hardening tree is not hardened. The mercury lamp and the infrared rays applied after peeling off are applied to the reflective liquid crystal display device. The zigzag cross-section of the surface is the greater of the difference between the height of the surface and the surface. Figure 5 shows a daylight surface of the reflective LCD. Below, the reflection characteristics of the liquid crystal display will be described, but the display device that diffuses and reflects external light according to the present invention will specifically explain the present invention. Rotate between wheels. The laminator is in the range of 1 to 5 0 // m. The difference is greater than that of the original mold. ’The convex part of the original mold is easy to get reflection. For example, the top of the ridge and the direction of the display screen of the heating furnace and electric heating on the vertical plane make the fifth preferred. The diffuse reflection is set.

3l4175.ptd Page 32 583465 V. Description of the invention (22) As shown in Figure 1, rotating a 130mm diameter cylindrical iron substrate and performing copper plating at the same time results in a stack of 2 0 0 // on the iron m copper master substrate. The surface is then ground to a mirror finish. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a comprehensive shape with a wavelength of 2 7 // m and amplitude of 2.5 5 // m The inclined surface (b) with a sine wave bent at an inclination angle of 10 degrees, is arranged at a distance of 2 5 // m from the vertical surface (a). Next, immerse it in the copper plating solution shown below and rotate it to adjust the current density (the current value of the plating area is 10 square centimeters) to a current of 8A / square inch for polishing and plating. After roughening the surface of the plating solution with a current adjusted to a current density of 2 A / square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the nickel electro-mineral fluid described below. One side was polished and nickel-plated at a current of 2A / cm² to adjust the current density to obtain a master mold. Copper plating solution: copper sulfate 210g / litre sulfuric acid 60g / litre thiourea 0. Olg / litre dextrin 0 · Olg / litre hydrochloric acid 0. Olg / litre liquid temperature 3 0 ° C Nickel plating solution: nickel sulfate 240g / litre chloride Nickel 4 5g / liter boric acid 30g / liter

314175.ptd Page 33 583465 V. Description of the Invention (23) '~~ ---

Bath temperature 3 (On the base film, a polyethylene terephthalate film with a thickness of 1000 // m is used, and then on the 4 base film, a photo-curing property of 2 // _ is applied by a spin coater. The resin solution is used as the primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiated with ultraviolet light to harden the photo-curable resin and then separated from the original mold to form a photo-curable di-fat layer (ie, the primer layer). Conversion of mold uneven shape: Photocurable resin (primer layer) solution: 5 parts by weight, 8 parts by weight, 2 parts by weight, 3 parts by weight, 2 parts by weight, 2.5 parts by weight, acrylic acid-butyl acrylate-vinyl acetate copolymer butyl acetate Ester (monomer) Vinyl acetate (monomer) Acrylic acid (monomer) Hexanediol acrylate (monomer) Benzoin isobutyl ether (starter). The weight of the second> Next, the photocurable resin (Primer layer) The solution for forming a thin film layer is applied on a spin coater and dried to an average film thickness of 8 # m thick, which becomes a transfer film overlying the surface layer of a polyethylene film (Figure 2) . Secondly, as shown in Figure 4 of P, the surface film layer of the transfer film is peeled off, and a laminator (,, side 7 Machine HLM1500, manufactured by Hitachi Chemical Co., Ltd., said that lamination was performed at a substrate temperature of 90 ° C, a roller temperature of 80 ° C, a roller pressure of 0.686 MPa (7 kg / cm2), and a speed of 0.5 μm / minute. ^ The glass substrate is laminated with a thin film layer and a photocurable resin layer (primer ~ that is, the substrate of $ =. Secondly, the photocurable resin layer (primer layer) θ, Meiji is peeled off, and a glass is obtained. The substrate contains a film with the same concave and convex shape of the transferred original mold ^ # 豆 次, then heat-hardened in an oven at 230 ° C for 30 minutes, and then straightened.

314175.ptd Page 34 583465 V. Description of the invention (24) A thin aluminum film with a film thickness of 0 · 2 // m is formed by a plating method to form a reflective layer, and a diffuse reflection plate is formed. Fig. 6 shows a device for measuring the reflection characteristics of the diffuse reflection plate of the present invention. The angle formed by the reflected light 20 and the incident light 19 is the reflection angle (9, which is the observable brightness of the diffuse reflection plate normal direction within the necessary 0 range, that is, the greater the reflection intensity, the better the reflection characteristics. The diffuse reflection plate. The figure shows the dependency of the angle of this embodiment when the azimuth angle Q) is 30 degrees. ; Succession of the quasi-white plate) The reflection intensity obtained when the incidence = 16 degrees is 0 = 30 degrees and the reflection angle at -30 degrees 0 The reflection characteristics of the radiation intensity of 20 " 〇 'azimuth must be 0 degrees The obtained solution for forming an inverse thin film layer at the time: a diffused reflection plate of rhenium. Hydrate uses acetophenone, methyl ^

Acid, glycidyl methacrylic acid, methyl methacrylate, ethyl acrylate, acrylic acid, acrylic acid, acrylic acid, acrylic acid, acrylic resin, polymer resin (Polymer A). Molecular polymer A Tetrapropane pentaerythritol can be added to 70 parts by weight of -3 9 (Chiba shu body) 30 parts by weight of sociality chemicals (starter) N, N-tetraethyl ~ 4 4 1, 2 2 parts by weight of propylene glycol monomethyl ether (solvent), Benzene (initiator), 2 · 2 parts by weight of p-methoxybenzene (inhibited; combined with 4 9 2 parts by weight of perfluoroalkanoic acid) 01 重量 份 g purpose (boundary ~) 0 · 1 parts by weight of solid 112 1 surfactant) 0.01 parts by weight

314175.ptd Page 35 583465 V. Description of the invention (25) A --- ^, an aluminum thin film having a thickness of 0.2 // m is formed by vacuum evaporation on the uneven surface of the transfer base film obtained in Example 1 , Stacked into a reflective layer. It can be obtained that the reflection intensity is 40 when the reflection angle is 0 = 18 degrees at v angle 0 = 30 degrees and -30 degrees, and the reflection intensity is 18 when the reflection angle is 0 = 18 degrees at azimuth angle 0 = 0 degrees. Diffusion reflector with excellent reflection characteristics. Example 丨 has the same uneven shape as that of the transfer original, and Example 2 has the opposite shape and shape of the unevenness of the transfer original mold. Example 3 ^ Using a glass substrate as a substrate, and then coating with the same solution for forming a thin film layer as in Example 1, and then spin-coating at 2000 rotations for 15 seconds, and heating with a hot plate for 2 minutes, 8 // m thin film layer. Secondly, as in the example, a polyethylene terephthalate film is also used to form a base film of 0 m, and then a photo-curable resin solution is applied to the machine to dry it into a film of 2 mm. Irradiate ultraviolet light to harden the photo-curable resin layer (that is, the primer layer): then separate from the original mold to form a transfer base film on the surface of the photo-curable resin layer (that is, the primer layer) that transfers the uneven shape of the original mold. The embossed surface of the transfer base film + was again laminated to the film layer using a laminator (roller laminator, HLM1500 'manufactured by Hitachi Chemical Co., Ltd., trade name) at a substrate temperature of 90 ° C and a roller temperature of 80 ° C. Roller pressure L 68 6 MPa (7 kg / cm2) and lamination at a speed of 0.5 m / min, that is to obtain — a thick film layer on the glass substrate, a photocurable resin layer (primer layer), Substrate. Then, the exposure device was irradiated with ultraviolet rays, and then the photo-curable resin layer (primer layer) and the base film were peeled off to form a thin film layer having a concave-convex shape on the glass substrate and the transfer mold. Secondly, in the oven at 230 ° C

Page 36 583465 V. Description of the invention (26) Heat harden for 30 minutes, and then laminate aluminum film with a film thickness of 0.2 / z m by vacuum evaporation to form a reflective layer to make a diffuse reflection plate. In this way, a diffuse reflection plate with excellent reflection characteristics is obtained. The reflection intensity obtained when the reflection angle is 0 = 16 at azimuth angles of 0 = 30 degrees and -30 degrees is 4 degrees, and the reflection angle is 0 at azimuth angles of 0 = 0 degrees. The reflection intensity obtained at 16 degrees is 20. Example 4 In the same manner as in the first figure shown in Example 1, a cylindrical iron substrate with a diameter of 130 mm was rotated and copper plating was performed at the same time to obtain a stack of 2 0 0 on the iron. m copper master substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a non-constant, full shape with a wavelength of 25 // m to 29 // m. Irregular wavelengths with irregular and irregular amplitudes ranging from 2.3 // m to 2.5 // m. The inclination angle is 10 degrees to form a sine wave of various waveforms, which are continuously arranged into an inclined surface with a curved waveform (b) A cylindrical shape arranged at an irregular and irregular interval of 25 // m to 27 // m with the vertical plane (a). It is different from Example 1 in that the irregularities are non-periodic. Secondly, immersed in the same copper plating solution as in Example 1 while rotating, immersed in the same copper plating solution as in Example 1, and adjusted the current density (the current value of the plating area 10 square centimeters) to 8A / square inch, then polished and plated again The surface of the plating solution is subjected to roughening electroplating at a current of 2 A / cm², and then washed with pure water for the purpose of removing the electric mineral liquid. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel plating solution as in Example 1 and polished and electroplated with a current adjusted to a current density of 2 A / cm 2 to obtain a transfer master. Hereinafter, the same as in Example 1 is used to transfer the original model to produce diffuse reflection.

314175.ptd Page 37 583465 V. Description of Invention (27) Board. This results in a diffuse reflection plate with excellent reflection characteristics. The reflection intensity at a reflection angle of 0 = 30 degrees at azimuth angles of 0 = 3 and -3 degrees is 0. The reflection intensity obtained at 8 degrees is 40, and the reflection angle at an angle of azimuth angles of 0 to 20 degrees is 0 = The reflection intensity obtained at 18 degrees is 18. Comparison Example "In the same way as in the first figure shown in Example 1, a cylindrical iron substrate with a diameter of 130 mm was rotated for copper plating, and a copper stack of 2 0 0 // m on the iron was obtained. The original substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half of the end angle of 0 degrees and the left half of the end angle of 80 degrees is continuously engraved spirally. The surface (a) is a cylindrical shape arranged at an interval of 2 5 // m. The difference from Embodiment 1 is that the cross-section of the inclined surface (b) perpendicular to the sawtooth-shaped cross-section is not a waveform with an amplitude and a certain inclined plane. Secondly, while immersed in the copper electro-mineral fluid shown below while rotating and polishing and electroplating at a current of 8 A / cm 2 by adjusting the current density (the current value of the plating area of 10 cm 2), the same The surface of the plating solution is subjected to roughening electroplating at a current of 2 A / cm², and then washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel plating solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2A / cm² to obtain a transfer original mold. Hereinafter, it is the same as in Example 1, and a diffuse reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle is 0 = 18 degrees at -30 degrees, the reflection intensity obtained is 2, so it is impossible to obtain sufficient reflection intensity. The difference between Comparative Example 1 and Example 1 is the unevenness of the diffuse reflection plate and the transfer master.

314175.ptd Page 38 583465 V. Description of the invention The inclined plane (b) on the plane (28) is an inclined plane. Real J [For example, as shown in Fig. 12, except that the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of the end portion is 85.5 degrees and 75.5 degrees, it is treated as in Example 1. The shape of the curved inclined surface (b) with a period of 27 // m and a sine wave with an amplitude of 2.5 // m as shown in Fig. 17 and the vertical plane (a) is 25 / / m spaced-apart cylinders. Secondly, immersed in the same copper plating solution used in Example 1 while rotating and polishing and electroplating at a current of 8 A / cm 2 by adjusting the current density (the current value of the plating area of 10 cm 2), After the surface roughening plating is performed in the same plating solution with a current density of 2 A / square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress copper oxidation, it was immersed in the same nickel plating solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2A / cm 2 to obtain a transfer master. On the base film, a polyethylene terephthalate with a thickness of 100 // m is used. On the base film, a photo-curable resin solution is applied by a spin coater and dried to a thickness of 20 // m. As a primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiated with ultraviolet rays to harden the photo-curable resin and then separated from the original transfer mold to form a photo-curable resin layer (that is, a primer layer). Base film. Next, the same film-layer-forming solution used in Example 1 was coated on the photocurable resin (primer layer) with a spin coater, and dried to form a film with an average film thickness of 8 // m. A transfer film covered with a polyethylene film surface layer (Fig. 13). Next, as shown in FIG. 4, peel off the surface film layer of the transfer film.

314175.ptd Page 39 583465 V. Description of the invention (29) The laminating machine (roller laminator HLM 1 5 0 0, manufactured by Hitachi Kasei T ech η p 1 ant Co., Ltd.) is used as the base material. Laminate at a temperature of 90 ° C, a drum temperature of 80C, a drum pressure of 0.686 MPa (7 kg / cm2), and a speed of 0.5 m / minute, and then attach the film layer to the glass substrate to obtain a laminated film on the glass substrate. Layer, photocurable resin layer (primer layer), base material of base film. Next, the photocurable resin layer (primer layer) and the base film are peeled off to obtain a thin film layer on the glass substrate containing the same uneven shape of the transferred original mold. Secondly, heat-harden in an oven at 23 ° C for 30 minutes, and then use a vacuum evaporation method to form a reflective layer with an aluminum film with a film thickness of 0. 2 # m to form a diffuse reflection.

Where M ~ Ϊ are not in the case where the azimuth angle (0) is 30 degrees, the lower reflection angle Θ = 5 ° in this embodiment. 2. Obtain an azimuth angle of 3 ° and _30 degrees at 0 = 0 degrees. The reflection intensity at 20% is more than 20, and the diffuse reflection reflection with excellent azimuth characteristics is 15. The reflection intensity is 15. Reflected solid U 6 ° Shaped by vacuum evaporation on a concave and convex surface of a transfer base film with a film thickness of 0 · 2 // m: 5

Reflective plate. The result is the product of azimuth f, that is, the reflection strong sound obtained when the reflection layer is formed to obtain the diffusivity of 0-30 degrees and -30 degrees. The reflection angle is 0 = 7 to 2 2 = 7 to 22 degrees. Above 1 ^ 20, the reflection angle is 0 at the azimuth angle of 0 = 0 degrees, and the reflection plate is scattered. The fifth embodiment has a sub-intensity of 15 or more and an excellent reflection characteristic. The sixth embodiment is a transfer original mold, which has the same uneven shape as the original transfer mold.

Page 40 583465 V. Explanation of the invention (30) Practice 117—Using a glass substrate as the substrate, coating with the same solution for forming a thin film layer as in Example 5, and then spin-coating at 2000 for 15 seconds 2. Heat a 9-rc hot plate for 2 minutes to obtain a thin film layer of m. Secondly, as in Example 5, a polyethylene terephthalate is used to form a base film, and then spin. The coater coats the photo-curable resin solution and dries into a film of "20", and then transfers the original mold, irradiates ultraviolet light to harden the photo-curable resin, and then separates from the original mold to form a photo-curable resin layer (that is, the bottom Lacquer layer) The surface of the transfer base film is formed in a concave and convex shape. The convex and concave surface of the transfer base film is then laminated to the film layer by a laminator (roller laminator HLM15GG, manufactured by Hitachi Chemical Co., Ltd.) at a substrate temperature of 9 〇 ° c, roller temperature 80 ℃, laminating at the same pressure 0.6686MPa (7kg / cm2) and speed 0.5m / min to obtain a laminated film layer and photocurable resin layer on a glass substrate ( Primer layer), the base material of the base film, and then exposed to ultraviolet light by an exposure device, followed by peeling The photo-curable resin layer (primer layer) and the base film, that is, a glass substrate with a film layer having the same uneven shape as the original transfer pattern. Next, it is heat-cured in an oven at 230 ° C for 30 minutes. An aluminum thin film with a thickness of 0 μm was formed by vacuum evaporation to form a reflective layer. In this way, a diffuse reflection plate with excellent reflection characteristics was obtained, with an azimuth angle of 0 = 30 degrees and a reflection angle of 0 to 5 to 25 degrees The reflection intensity obtained at degrees is more than 20, and the reflection intensity obtained when the reflection angle is 0 to 5 degrees at an azimuth angle of 0 = 0 degrees is 5 degrees or more. Reached Example 2 As shown in Example 5 Figure 12 In the same way, a 130 mm diameter cylindrical iron substrate is rotated for copper plating, and a stack of 2 ^ on the iron is obtained.

314175.ptd Page 41 583465 V. Description of the invention (31) # m copper master substrate. The surface is then ground to a mirror surface. Secondly, while rotating one side, the diamond needle with a combination of the right half of the end angle of 0 degrees and the left half of the end angle of 8 5 5 degrees and 7 5. 5 degrees is continuously engraved spirally, the shape is cycle 2 7 / / m, non-amplitude, inclined planes and vertical planes (a) are arranged in a fully arranged cylindrical shape at intervals of 25 / m. The difference from the fifth embodiment is that the inclined plane (b) of the vertical sawtooth-shaped cross-section has no amplitude and has a certain inclined plane. Secondly, immersed in the same copper plating solution as in Example 5 while rotating and immersed in the same copper plating solution as in Example 5 to adjust the current density (the current value of the plating area of 10 square centimeters) to 8 A / square centimeter for polishing and plating. After the surface roughening plating is performed in the same plating solution with a current density of 2 A per square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel electric ore solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2 A / cm 2 to obtain a transfer master. Hereinafter, as in Example 5, a diffuse reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle is 0 = 18 degrees at -30 degrees, the reflection intensity obtained is 2, so it is impossible to obtain sufficient reflection intensity. The difference between Comparative Example 2 and Example 5 is that the inclined surface on the uneven surface of the diffuse reflection plate and the transfer original mold is perpendicular to the inclined surface on the cross-section. (B) The cross-section is a constant inclined plane. [Possibility of industrial use] The diffuse reflection plate of the present invention is characterized by a novel concave-convex surface shape, and its purpose is to improve the display quality of reflective liquid crystal displays, electric field light-emitting displays, electrophoretic displays, and the like. It is characterized by a curved inclined surface

314175.ptd Page 42 583465 V. Description of the invention (32) (b) The point where the vertical plane (a) intersects and arranges. The diffuse reflection plate has external incident light that is incident from various directions such as the upper direction and the left-right side direction of a display such as a liquid crystal element, and can effectively reflect the directional reflection characteristic toward the user, so that it can achieve bright and excellent display. Display quality.

314175.ptd Page 43 583465 Brief description of the drawings [Simplified illustration of the drawings] The cross-sectional view shown in Fig. 1 is an example of the transfer of the original mold manufacturing process in the first aspect of the present invention. The sectional view shown in Fig. 2 is an example of a transfer film in the first aspect of the present invention. The cross-sectional view shown in Fig. 3 is an example of a diffuse reflection plate in the first aspect of the present invention. The cross-sectional view shown in Fig. 4 is an example of manufacturing the diffuse reflection plate of the present invention. The cross-sectional view shown in FIG. 5 is an example of a reflective LCD. The oblique view shown in Fig. 6 is a device for measuring the reflection characteristics of a diffuse reflection plate. The oblique view shown in Fig. 7 is an example of the shape of the uneven surface of the diffuser reflection plate in the first aspect of the present invention. The cross-sectional view shown in Fig. 8 is an example of the wave shape of the inclined surface (b) on the uneven surface of the diffuse reflection plate of the present invention. The cross-sectional view shown in FIG. 9 is a shape in which the inclined surfaces (b) and the vertical surfaces (a) are alternately arranged on the uneven surface of the diffuse reflection plate in Example 1. The oblique view shown in Fig. 10 shows the shape of the uneven surface of the diffuser reflection plate of the first embodiment. Fig. 11 is a graph showing the dependence of the reflection intensity of the diffuse reflection plate on the reflection angle in the first embodiment. The cross-sectional view shown in Fig. 12 is an example of a manufacturing process for transferring a master mold in the second aspect of the present invention.

314175.ptd Page 44 583465 Brief description of the drawings The cross-sectional view shown in Figure 13 is an example of a transfer film in the second aspect of the present invention. The sectional view shown in Fig. 14 is an example of a diffuse reflection plate in the second aspect of the present invention. The perspective view shown in Fig. 15 is an example of the shape of the uneven surface of the diffuser reflection plate in the second aspect of the present invention. The cross-sectional view shown in FIG. 16 is an example in which the inclined surfaces (b) and the vertical surfaces (a) of the uneven surface of the diffuse reflection plate in the second aspect of the present invention are alternately arranged. The cross-sectional view shown in FIG. 17 is a shape in which the inclined surface (b) and the vertical surface (a) are alternately arranged on the uneven surface of the diffuse reflection plate of Example 5. The oblique view shown in Fig. 18 shows the shape of the concave-convex surface of the diffuser reflection plate of Example 5. Fig. 19 is a graph showing the dependence of the reflection intensity on the reflection angle of the diffuse reflection plate in Example 5. I Copper base material 2 Iron base material 3 Diamond etching blade 4 Copper rough plating particles 5 Nickel 6 Glass base material 7 Thin film layer 8 Reflective film 9 Base film (otherwise, the color filter film in the fifth picture) 10 Surface film Layer (the black background is only shown in Fig. 5) II primer layer (the transparent electrode is only shown in Fig. 5) 12 Leveling film 13 Orientation film 14 Liquid crystal layer 15 Distance-adjusting layer

314175.ptd Page 45 583465

Brief description of the drawing 16 retardation film layer 17 polarizing plate 18 sample 19 incident light 20 reflected light 21 photometer 22 reflection angle 23 azimuth angle 24 substrate surface 25 jagged cross section 26 vertical plane (a) 27 inclined plane (b) 314175.ptd Page 46

Claims (1)

-χχ --- Patent application specification- "1. A diffuse reflection plate characterized in that the diffuse reflection plate can diffuse and reflect light, the diffuse reflection plate is composed of a substrate, a thin film layer formed on the surface, And the reflective layer, the cross-section of the film layer in a direction perpendicular to the surface of the substrate is a zigzag composed of a continuous repeating vertical surface (a) and an inclined surface (b), relative to the vertical surface of the substrate surface (a ) The inclination angle is 75 to 105 degrees, and the inclination angle of the inclined surface (b) with respect to the substrate surface is 2 to 30 degrees, which is perpendicular to the sawtooth-shaped cross section and perpendicular to the substrate surface. The cross section of the surface (b) has a waveform having an amplitude and a continuous uneven surface. 2. If the diffuse reflection plate of item 1 of the patent application scope, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the sawtooth cross section is a sine wave. 3. For example, the diffuse reflection plate of the scope of patent application, in which the amplitude of the cross-section waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 4. For example, the diffuse reflection plate of the scope of patent application, the wavelength of the cross-section waveform of the inclined surface (b) perpendicular to the sawtooth-shaped cross-section is not constant. 5. For example, the diffuse reflection plate in the scope of patent application, the vertical interval (a) is arranged at a distance of 2 // m or more and 1/50 // m or less. 6. For example, the diffuse reflection plate in the scope of patent application, where the difference between the maximum height and the minimum height of the zigzag cross-section in the vertical direction (that is, the maximum drop of the uneven surface) is less than 6 // m. 7. As for the diffuse reflection plate in the scope of the patent application, the vertical plane (a) is not arranged at a certain interval. 8. The diffuse reflection plate according to any one of claims 1 to 7, wherein the vertical plane (a) and the inclined plane (b) are subjected to surface roughening treatment. 314175.ptd Page 47 6. Scope of Patent Application-One s. 9 · f transfer original mold, which has formed the concave-convex surface of the patent-applied radiation plate. I 〇 ·, transfer the original mold, is used to form the concave and convex surface of the application for the original mold. II · 1. The transfer base film uses the patent application to transfer the original mold, and the transfer original mold is stamped on the transferee. 12 · ζ ΐTransfer film, using the scope of patent application: ,,, temporary support, and a thin film layer is formed on the surface of the temporary support, the surface of the thin film layer is formed with the substrate being transferred = 1 3 · —A kind of transfer film, which is formed between the application of the special method and the stilbite 3, H, and the third film. A method of manufacturing a diffuse reflection plate, reflecting the 12 items of the transfer film with a thin film layer In order to receive the rain ^) project, a worker who forms the reflection on the surface of the temporary support body and the compression layer is transferred. Series 15 · —A kind of manufacturing method of diffuse reflection plate, the transfer base film of item 11 uses the transfer type of the film on the thin film layer formed on the material, the range of f range, the range of anti-interest of item 1, and the item 9 The transfer of the transfer layer of item 9 or item 10 and the shape of the transfer base film of item 11 is transferred from the transfer original mold to the temporary support. 1 of 2 items of temporary membrane. The process of making the scope of patent application on the substrate to be transferred, and making the diffuse reflection plate in the thin film process, and the process of applying the scope of patent application as the interface tightly pressed against the peeling of the transfer base film, the process of making diffuse reflection, and the surface Those who form the anti-3 board. of π-radiating film The scope of the patent application '~ The film of the transfer film of Item 13 of the manufacture of a diffuse reflection plate includes the process of making the patent scope and the pressing of the temporary surface on the transferred substrate ~ The Kubota Temple support is peeled off Engineer. 18 19 2〇 'd: anti' is made of a patent-pending: two-diffusion reflective plate manufacturing method. The second and second f 2 plates of the film are those provided with a reflective film on the surface of the transfer base = multiple self-transfer original molds of the patent application. 〆, inch is the use of the patent application of the first expansion of the ΐ reflective plate used in reflective liquid crystal displays. A diffuse reflection plate characterized by a zigzag cross-section formed by a vertical plane U) and an inclined surface with respect to the surface of the substrate of the diffuse reflection plate of the scope of application for patent, due to the ridge top of the surface Or the height of the height difference caused by the parallel tilt of the line of the groove i facing the display surface is slightly below the display surface. It is used in reflective liquid crystal displays. Two types of diffuse reflection plates are characterized in that In the plate, 'the diffuse reflection plate is composed of a base material, and a thin film layer and a reflection layer formed on the surface thereof, and the cross-section of the thin film layer in a direction perpendicular to the surface of the base material' is a continuous and repeated vertical plane (a ) And the inclined surface (b) are jagged, and the inclined angle with respect to the vertical surface (a) of the substrate surface is 75 to 105 degrees. The inclined surface (b) contains at least a phase relative to the substrate surface. Two different types of tilt angle groups, one tilt angle group is 0 to 20 degrees, and the other tilt angle group is 10 to 30 degrees, an inclined surface that is perpendicular to the zigzag cross section and perpendicular to the substrate surface ( b) the cross section has amplitude 314175.ptd Page 49 583465 6. The waveform of the scope of patent application has continuous uneven surface. 22. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the zigzag cross section is a sine wave. 2 3. The diffuse reflection plate according to item 21 of the scope of patent application, wherein all or part of the shape of the zigzag cross section of the inclined surface (b) is a curve. 2 4. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the two or more different inclination lengths of the zigzag cross-section shape of the inclined surface (b) are not constant. 25. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the amplitude of the cross-sectional waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 2 6. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the wavelength of the cross-section waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 27. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the arrangement interval of the vertical plane (a) is 2 // m or more and 1 5 0 // m or less. 28. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the difference between the maximum height and the minimum height of the zigzag cross-section in the vertical direction (that is, the maximum drop of the concave and convex surface) is less than 6 // m. 2 9. The diffuse reflection plate according to item 21 of the patent application scope, wherein the arrangement interval of the vertical plane (a) is not a certain interval. 30. The diffuse reflection plate according to any one of items 21 to 29 in the scope of patent application, wherein the vertical plane (a) and the inclined plane (b) are subjected to surface roughening treatment. 314175.ptd Page 50 583465 6. Scope of Patent Application. 3 1. —A kind of transfer original mold, which has formed the concave and convex surface of the diffuse reflection plate in the scope of patent application No. 21. 3 2. — A transfer master, which is used to form the concave-convex surface of the transfer master in the scope of patent application No. 31. 3 3. — A kind of transfer base film, which uses the transfer original mold of the scope of application for item 31 or item 32, embossing the transfer original mold on the layer to be transferred and transferring its shape. 3 4. — A transfer film that uses the transfer base film in item 33 of the patent application as a temporary support, and forms a thin film layer on the surface of the temporary transfer support from the transfer original mold. The surface on the temporary support is formed to be the contact surface with the substrate to be transferred. 3 5. — A transfer film is one in which a reflective film is temporarily formed between the support and the thin film layer in the transfer film of item 34 of the patent application. 3 6. —A method for manufacturing a diffuse reflection plate is a process in which the transfer film of item 34 of the patent application uses a thin film layer as a contact surface to press the transferred substrate tightly, and the process of peeling the aforementioned temporary support And those who manufacture a diffuse reflection plate by forming a reflective film on the surface where the thin film layer is transferred. 7. A method for manufacturing a diffuse reflection plate is used to transfer the transfer base film in the scope of the patent application No. 33. The formed surface is a process of making a diffuse reflection plate by a process in which the interface is pressed against the thin film layer formed on the substrate, a process in which the aforementioned transfer base film is peeled off, and a process in which a reflective film is formed on the surface. 314175.ptd Page 51 41 42 583465 6. Application for patent scope 38. — A method for manufacturing diffuse reflection plate, which covers the project of the transfer film of item 35 with the thin film layer as the interface and the temporary support mentioned above. Body peeling 3 9. — A diffuse reflection plate, which is a method of manufacturing a diffuse reflection plate according to any one of the patent applications 40. — A diffuse reflection plate, which is on the surface of the original mold of the self-transferring film of the patent application An anti-diffusive reflective plate is provided, which is characterized in that the applied diffuse reflective plate is used in a reflective liquid crystal display. A diffuse reflective plate is characterized in that the applied diffuse reflective plate is arranged on the inclined surface (b) with respect to the substrate surface. The I® toothed cross section or the bottom of the groove formed by the parallel slope of the line shows the height of the daylight surface is slightly below the middle. 4 3. — A type of reflective liquid crystal display. 4 4. A type of reflective liquid crystal display. The diffuse reflection plate of item 21 includes the engineer who pressed the applied patent range on the transferred substrate. Those created under items 36 to 38. The transfer base around item 33 is the film shooter. Among the scope of the 21st patent. The vertical plane (a) of the surface of the patent scope No. 21 and the inclination due to the ridge top of the surface face the reflection type liquid crystal display, which is characterized by the use of the scope of patent application and the feature of the scope of patent application 314175.ptd Page 52