TW583465B - Diffusion reflection plate, transfer master, transfer base film and transfer film used for manufacturing the same, and method of manufacturing diffusion reflection plate - Google Patents
Diffusion reflection plate, transfer master, transfer base film and transfer film used for manufacturing the same, and method of manufacturing diffusion reflection plate Download PDFInfo
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- TW583465B TW583465B TW091133228A TW91133228A TW583465B TW 583465 B TW583465 B TW 583465B TW 091133228 A TW091133228 A TW 091133228A TW 91133228 A TW91133228 A TW 91133228A TW 583465 B TW583465 B TW 583465B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/02—Function characteristic reflective
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- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
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- Crystallography & Structural Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
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Abstract
Description
583465 五、發明說明(1) -—-一一^ [七明所屬之技術領域] 顯示ΐ ΐ日月為關於—種可使用在無須背投光之反射塑液晶 擴散:ί f求高效率之太陽電池等之反射型液晶顯示器用 之轉顯示基材用擴散反射板、及其製造上所使用 寻矛夕基膜、轉移膜、轉移原模者。 L先前技術] 示器(以下簡稱為LCD)因 個= =目前已使用在鐘錶:Α、τν、 發,除了佶.I = 上。尤其近年來彩色LCD已完成開 瞄準琴 :V夕A · AV機器外,尚被用於導航系統、 劇L、:),腦螢幕等用•,可預測今後其市場仍將急 LCD,因為盔須背投光,。卩入射先以進行顯示之反射型 化# # ^ 、各 口此具有低耗電,薄輕、可輕巧 化之特點,因此在使用太拙_ 干 J ^ Ί 意。 攜贡用終端機上之用途極受注 方Λ'已Ϊ t反t型LCD乃採用扭向結構方式及高扭向姓構 2 些方式因為顯示時直線偏振光鏡只 := =因此會使顯示變暗。因此,曾有人提議以減少之: 叩力、,且口祁位^板之方式,及以相轉換型賓主 (guest-host)方式之顯示方式。 土 ,射型LCD為有效利用入射光以明亮地顯示 局t各個角度之入射光在!頁示畫面垂I方向之散射員Λ ;f。即必須控制反射板上之反射膜,使其有適當之反: “使用问反射率之金屬反射板,例如鋁或583465 V. Description of the invention (1)---one ^ [Technical field of Qiming] Show ΐ 月 is about-a kind of reflective plastic liquid crystal diffusion that can be used without rear projection light: ί f for high efficiency Diffusion-reflective substrates for conversion display substrates of reflective liquid crystal displays such as solar cells, and those used in the manufacture of base films, transfer films, and transfer masters. L prior art] indicator (hereinafter referred to as LCD) because of = = has been used in clocks: Α, τν, hair, except 佶 .I =. Especially in recent years, the color LCD has been completed to open the piano: V Xi A · AV machines, but also used in navigation systems, dramas, :), brain screen, etc., it can be predicted that its market will continue to be an urgent LCD because of helmets Must be rear-projected.卩 The reflection type ## ^ of the incident is displayed first. Each port has the characteristics of low power consumption, thinness, lightness, and lightness, so it is too clumsy to use_ dry J ^ Ί intention. The application on the portable terminal is very popular. The t-t-type LCD uses a twisted structure and a high twisted structure. Some methods are used because the linear polarizer is only displayed when the display: = = so it will display. darken. Therefore, some people have proposed to reduce: the display mode of the force and the mode of the display, and the display mode of the guest-host mode. In order to effectively use the incident light to brightly display the incident light at various angles of the local t, the diffuser Λ; f is displayed on the page. That is, it is necessary to control the reflective film on the reflective plate so that it is properly reversed: "Use a metal reflective plate, such as aluminum or
583465 五、發明說明(2) 銀,或再於金屬上層疊增感反射膜增加金屬表面之反射 率。此外,另有所謂光蝕刻法(特開平第4 - 2 4 3 2 2 6號公報) 之提議,即在基材上塗布感光性樹脂,再使用光墨 (p h 〇 t 〇 m a s k )使形成依照圖樣之凹凸面,再作成金屬薄膜 而製成反射板的方法。控制凹凸面上之傾斜角在一定角度 時,可以嘗試在正反射方向為中心之一定角度範圍内增加 其反射率。 在適當之反射特性方面,最好再回顧檢討例如液晶元 件等顯示器之使用方法。例如在液晶元件中,為使外部入 射光反射而使光源之影像在液晶元件表面及與表面平行存 在之界面上如鏡子般反射,因此不使用正反射方向而使用 非正反射方向之明亮角度。 在基材表面上形成細微凹凸面之擴散反射板上多數之 凹面為不規則性散布時,其反射特性即變成依存於反射光 量之視野角,雖然正反射方向之顯示應該最明亮,但如前 所述液晶元件並不使用正反射方向而使用非正反射方向之 角度,因此其反射光量會減少,使液晶元件之顯示品質降 低。 同時,多數外部入射光亦不在液晶元件使用者所在方 位之下方方向。液晶元件等顯示器之下方方向,多數之場 合為鍵盤或桌面、液晶元件之使用者等不易引入外部入射 光之環境。亦即,大多數外部入射光是由液晶元件等顯示 器之上方方向及左右方向射入。 因此,能提供液晶元件優良顯示品質之明亮反射光量583465 5. Description of the invention (2) Silver, or a layer of sensitized reflective film laminated on the metal to increase the reflectivity of the metal surface. In addition, there is a proposal of a so-called photoetching method (Japanese Patent Application Laid-Open No. 4-2 4 3 2 2 6), in which a photosensitive resin is coated on a substrate, and a photo-ink (ph 〇 〇 mask) is used to form the substrate. A method of forming a concave and convex surface of a pattern and forming a metal thin film to form a reflecting plate. When the inclination angle of the uneven surface is controlled at a certain angle, you can try to increase its reflectivity within a certain angle range with the specular reflection direction as the center. In terms of proper reflection characteristics, it is best to review and review the use of displays such as liquid crystal elements. For example, in a liquid crystal element, in order to reflect externally incident light, the image of the light source is reflected like a mirror on the surface of the liquid crystal element and the interface existing parallel to the surface. Therefore, the bright angle of the non-orthogonal reflection direction is not used. When most of the concave surfaces of the diffuse reflection plate forming a fine uneven surface on the surface of the substrate are irregularly dispersed, the reflection characteristic becomes a viewing angle that depends on the amount of reflected light. Although the display in the direction of regular reflection should be the brightest, but as before The liquid crystal element does not use a regular reflection direction but uses an angle that is not a regular reflection direction, so the amount of reflected light is reduced, and the display quality of the liquid crystal element is reduced. At the same time, most externally incident light is not directed below the position of the user of the liquid crystal element. Most of the fields below the display of liquid crystal elements, such as keyboards or desktops, and users of liquid crystal elements, are difficult to introduce externally incident light. That is, most of the externally incident light is incident from the upper direction and the left-right direction of a display such as a liquid crystal element. Therefore, it is possible to provide a bright reflected light quantity with excellent display quality of a liquid crystal element.
314175.ptd 第13頁 583465 五、發明說明(3) 之擴散反射板,必須要求其反射特性能使顯示之上方方向 及左右方向之各種方向射入之外部入射光,能有效地反射 向使用者方向。 本發明為解決上述問題,提供一種顯示品質優良之擴 散反射板及其製造時使用之轉移原模、轉移基膜、轉移膜 以及擴散反射板之製造方法,該擴散反射板具有優良之顯 示品質’具有使液晶疋件等顯示器上方方向及左右方向射 入之各種方向射入之外部入射光,可以有效地反射向使用 者方向之定向性反射特性。 [發明内容] 本發明之第1樣態為[1 ]一種擴散反射板,其特徵為在 可以使光擴散反射之擴散反射板中,該擴散反射板係由基 材、在其表面上形成之薄膜層、以及反射層所構成,其與 基材表面垂直之方向的薄膜層橫切面,為連續重複之垂直 面(a )及傾斜面(b )所形成之鋸齒狀,相對於基材表面之垂 直面(a)之傾斜角為75至1〇5度,相對於基材表面之傾斜面 ^ )之傾斜角為2至3 〇度,與該鑛齒狀橫切面垂直並與基材 二面垂直之傾斜面(b )橫切面呈具有振幅之波形而具有連 續之凹凸面。 ]女上述[1 ]之擴散反射板,其中與該据齒狀橫切面垂 及傾斜面(b)橫切面之波形為正弦波者。 ]如上述[1 ]之擴散反射板,其中與該鋸齒狀橫切面垂 斜面(b)橫切面波形之振幅非〆定者。 逆L 1」之擴散反射板,其中與該鋸齒狀橫切面垂314175.ptd Page 13 583465 V. Explanation of the invention (3) The diffuse reflection plate must require its reflection characteristics so that external incident light entering in various directions above and below the display can effectively reflect to the user direction. In order to solve the above problems, the present invention provides a diffusion reflection plate with excellent display quality and a method for manufacturing a transfer master, a transfer base film, a transfer film, and a diffusion reflection plate used in the manufacture thereof. The diffusion reflection plate has excellent display quality. It has a directional reflection characteristic that allows external incident light that enters in various directions, such as the upper direction and the left-right direction, of a display such as a liquid crystal display, to effectively reflect toward the user. [Disclosure of the Invention] The first aspect of the present invention is [1] a diffuse reflection plate characterized in that the diffuse reflection plate is capable of diffusing and reflecting light, and the diffuse reflection plate is formed of a base material and formed on a surface thereof; The cross-section of the film layer, which is composed of a thin film layer and a reflective layer, in a direction perpendicular to the surface of the substrate, is a zigzag formed by successively repeated vertical surfaces (a) and inclined surfaces (b). The inclination angle of the vertical plane (a) is 75 to 105 degrees, and the inclination angle of the inclined plane with respect to the surface of the substrate ^) is 2 to 30 degrees, which is perpendicular to the dentate cross section and on the two sides of the substrate The vertical inclined plane (b) has a continuous wave surface with a wave shape having a cross section. ] Female The diffuse reflection plate of [1] above, in which the waveform perpendicular to the tooth-shaped cross section and the inclined surface (b) cross section is a sine wave. ] The diffuse reflection plate according to the above [1], wherein the amplitude of the waveform of the inclined plane (b) perpendicular to the sawtooth-shaped transverse plane is not fixed. Inverse L 1 ″ diffuse reflection plate, which is perpendicular to the zigzag cross section
第14頁 583465 五、發明說明(4) 直之傾斜面(b )橫切面波形之波長非一定者。 及[5 ]如上述[1 ]之擴散反射板,其中垂直面(a )之配置間 隔為2 // m以上1 5 〇 # m以下者。 及[6 ]如上述[1 ]之擴散反射板,其中所有鋸齒狀橫切面中 垂直方向之最大高度與最低高度之差(即凹凸面之最大落 差)在6// m以下者。 及[7 ]如上述[1 ]之擴散反射板,其中垂直面(& )之配置間 隔非為一定間隔者。 及[8 ]如上述[丨]至[7 ]中任一項之擴散反射板,立中垂直 面(a)與傾斜面(b)係經過表面粗化處理者。 ϊϋΠ一種轉移厚模,係已形成上述[1]之擴散反 射板之凹凸面者。 i二]:Ϊ轉移厚模,係用來形成如上述[9]之轉移原模 及W一種轉移基膜,係使用上述[9]或 =移原模壓印於被轉移層而轉移其形狀上之轉私原模 f [1二]—種轉移膜,係使用上述[n]之轉 膜層,薄撐體之轉移自轉移原模之面上::: 基材之接著面者。 寻之面則形成與被轉移 2H]:種轉移膜,係在上述[12]之轉 之間形成有反射膜者。 ¥中暫時支樓體 「12%之i為[14]=種擴散反射板之製造方年, 移膜以薄膜層為接面緊壓於被轉沪,係以使上述 b基材上之工Page 14 583465 V. Description of the invention (4) The wavelength of the waveform of a straight inclined plane (b) cross section is not constant. [5] The diffuse reflection plate according to the above [1], wherein the arrangement interval of the vertical plane (a) is 2 // m or more and 1 5 0 # or less. [6] The diffuse reflection plate according to the above [1], in which the difference between the maximum height and the minimum height (that is, the maximum drop of the concave-convex surface) in the vertical direction of all the zigzag cross sections is less than 6 // m. [7] The diffuse reflection plate according to the above [1], wherein the arrangement interval of the vertical plane (&) is not a certain interval. [8] The diffuse reflection plate according to any one of the above [丨] to [7], wherein the vertical plane (a) and the inclined plane (b) of the center are subjected to surface roughening treatment. ϊϋΠ is a transfer thick mold, which has formed the uneven surface of the diffuse reflection plate of [1] above. i 二]: Ϊ transfer thick mold, used to form the transfer original mold as described in [9] above, and a transfer base film, which is stamped on the transferred layer using the above [9] or = transferred original mold to transfer its shape. The transfer of the original mold f [12]-a transfer film, using the transfer film layer of [n] above, the transfer of the thin support from the surface of the transfer original mold: :: the surface of the substrate. The looking surface is formed and transferred 2H]: a kind of transfer film, which has a reflective film formed between the above [12] rotations. ¥ zhong temporarily supporting the building "12% of i is [14] = manufacturing year of the diffuse reflection plate, the transfer film is pressed with the film layer as the interface to be transferred to Shanghai, so that the work on the above b substrate
314175.ptd 第15頁 583465 五、發明說明(5) ~ 〜 程、將前述暫時支撐體剝離之工冑、以及在薄膜層被 之表面上形成反射膜之工程製作擴散反射板者。 ”夕 及[15]—種擴散反射板之製造方法,係由上述 基膜以其轉移形成面為接面緊壓於基材上形成之膜移 工程、將Θ述轉移基膜剝離之工程、以及在二之 射膜之工程者。 >成反 及[1 6 ]—種擴散反射板之製造方法,係包含將上 轉移膜以薄膜層為接面緊壓於被轉移基材上之工条; 將前述暫時支撐體剝離之工程者。 # 及[17]一種擴散反射板,係由上述[14]至[u 擴散反射板之製造方法所製成者。 [1 3 ]之 ’以及314175.ptd Page 15 583465 V. Description of the invention (5) ~ ~ Process, the process of peeling the temporary support, and the process of forming a diffuse reflection plate by forming a reflective film on the surface of the thin film layer. Xi and [15] —A method for manufacturing a diffuse reflection plate, which is a film transfer process in which the above-mentioned base film is formed by pressing the transfer forming surface as a contact surface on the substrate, a process of peeling the transfer base film described above, And the engineer of the film in Niji. ≫ Reverse and [1 6] —A method for manufacturing a diffuse reflection plate, which includes a process of pressing the upper transfer film with the thin film layer as the interface and pressing it on the transferred substrate. The engineer who peeled off the temporary support. # And [17] A diffuse reflection plate made by the above [14] to [u diffuse reflection plate manufacturing method. [1 3] of 'and
—項之 ^ Π ί巧散反射才反’為在上$ [11]之轉移基膜上之 和自轉移原楔之面上設有反射膜者。 之 f H9 ]種擴散反射板,其特徵為將上述[至 器中者。[18]中任-項之擴散反射板使用在反射型液晶顯 tl g 0 ]y種擴散反射板,其特徵為在上述[1 ]至[7 ]、—Item ^ Π The clever scattered reflection is the only one that is provided with a reflective film on the surface of the transfer base film on [11] and on the surface of the self-transfer original wedge. The f H9] type diffuse reflection plate is characterized in that the above-mentioned [to the device. [18] The diffuse reflection plate of any one of the items is used in the reflection type liquid crystal display tl g 0] y diffuse reflection plate, which is characterized in the above [1] to [7],
面垂直之任一項之擴散反射板中,以在相對於基和 平行之傾斜:狀橫切面中,因與該表面之脊頂或溝底纪 下方之方t產生之南低落差之大者面向顯示晝面之大 八使用在反射型液晶顯示器中者。 ΠΠ 在使光德1之第2樣態為[21 ]一種擴散反射板,其特徵 在其表面ΐ反射之擴散反射板中,該擴散反射係由基相 上形成之薄膜層及反射層所構成,其與基材肩In a diffuse reflection plate with any one of the planes vertical, the one with the lowest south difference in the slope of the surface relative to the base and the parallel: shaped cross section, due to the square t below the ridge top of the surface or the bottom of the ditch. The eighth face of the display day is used in reflective liquid crystal displays. ΠΠ The second aspect of Guangde 1 is [21] A diffuse reflection plate, which is characterized by a diffuse reflection plate whose surface is reflected by reflection. The diffuse reflection is composed of a thin film layer and a reflective layer formed on the base phase. And its shoulder with the substrate
第16頁 583465 五、發明說明(6) 垂直之方向之薄膜層橫切面,為連續重複之垂直面(a)及 傾斜面(b )所成之鋸齒狀,相對於基材表面之垂直面(a )傾 斜角為7 5至1 〇 5度,傾斜面(b )至少包含2種相對於基材表 面為相異之傾斜角群,其一傾斜角群為0至2 0度,另一傾 斜角群為1 〇至3 0度,與該锯齒狀橫切面垂直並與基材表面 垂直之傾斜面(b)橫切面呈具有振幅之波形而具有連續之 凹凸面。 及[2 2 ]如上述[2 1 ]中之擴散反射板,其中與該鋸齒狀橫切 垂直之傾斜面(b )之橫切面之波形為正弦波者。 齒[、2 3 ]如上述[21 ]中之擴散反射板,其中傾斜面(b)之鋸 1狀k切面形狀之全部或部份為曲線者。 歯[、2 4 ]如上述[2 1 ]中之擴散反射板,其中傾斜面(b )之鋸 =松切面形狀之2種以上相異傾斜之長度非一定者。 垂25]如上述[21 ]中之擴散反射板,其中與鋸齒狀橫切面 及[2^傾斜面(b )之橫切面波形之振幅非一定者。 垂 ]如上述[2 1 ]中之擴散反射板,其中與鋸齒狀橫切面 及「傾斜面(b )之橫切面波形之波長非一定者。 L Z 7 ]如上述「9 1 Ί &Page 16 583465 V. Description of the invention (6) The cross-section of the film layer in the vertical direction is a zigzag formed by successively repeated vertical planes (a) and inclined planes (b), and is perpendicular to the surface of the substrate ( a) The inclination angle is 75 to 105 degrees, and the inclined surface (b) includes at least two kinds of inclination angle groups different from the surface of the substrate. One of the inclination angle groups is 0 to 20 degrees, and the other is inclined. The angle group is 10 to 30 degrees, and the inclined surface (b) whose inclined surface is perpendicular to the sawtooth-shaped cross-section and perpendicular to the surface of the substrate has a waveform of amplitude and has a continuous uneven surface. [2 2] The diffuse reflection plate as in [2 1] above, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the zigzag cross section is a sine wave. The teeth [, 2 3] are the diffuse reflection plates in [21] above, in which all or part of the saw-shaped k-cut surface shape of the inclined surface (b) is a curve.歯 [, 2 4] The diffuse reflection plate as in [2 1] above, wherein the saw of the inclined surface (b) = two or more different inclined lengths of the shape of the loose cut surface are not constant. Vertical 25] The diffuse reflection plate as described in [21] above, wherein the amplitude of the waveform of the cross-sectional plane with the sawtooth-shaped cross-section and the [2 ^ inclined plane (b) is not constant. [Vertical] The diffuse reflection plate as in [2 1] above, wherein the wavelength of the waveform of the cross-sectional plane with the sawtooth-shaped cross-section and the "inclined plane (b) is not constant. L Z 7] as described above" 9 1 Ί &
置門」中之擴散反射板,其中垂直面(a)之配 息間隔為2// m以上! I 及上150// m以下者。 & L28 ]如上述「2】Ί 面中希士 1」中之擴散反射板,其中所有鋸齒狀橫切 τ垂直方向之啬士 μ 大落墓Λ 取大鬲度與最低高度之差(即凹凸面之最 /备差)在6// m以下去 及[29]如上述[2 者 置間卩5 a ^ 1」中之擴散反射板,其中垂直面(a)之配 隔非為一定間隔者。The diffuse reflection plate in "Setting the door", where the distribution interval of the vertical plane (a) is above 2 // m! I and above 150 // m. & L28] As described above in "2】 Ί Heath in the plane 1", in which all jagged warps transverse to τ in the vertical direction μ Large tomb Λ Take the difference between the large degree and the minimum height (ie The maximum / preparation of the uneven surface) is below 6 // m and [29] is the diffuse reflection plate as described in [2 者 置 间 卩 5 a ^ 1 ”, in which the vertical plane (a) is not fixed. Spacer.
第17頁 州465 轉移原模 述[3 4 ]之 膜者。 射板之製 接面緊壓 之工程、 製作擴散 造方法, 為接面緊 移基膜剝 擴散反射 造方法, 五、發明說明(7) 及[30]如上述[21]至[29]中 直面(a)與傾斜面(b)係經過 本發明又為[31]己形成: 轉移原模。 及[32]用來形成上述[3丨]之 模。 本發明又為[33]—種轉移基 之轉移原模,將轉移原模壓 者。 、 本發明又為[34]—種轉移膜 膜為暫時支撐體,而暫時支 形成薄膜層,薄膜層之未形 與被轉移基材之接著面者。 及[35 ]—種轉移膜,係在上 體與薄膜層之間形成有反射 本發明又為[36]—種擴散反 [34]中之轉移膜以薄膜層為 程、將前述暫時支撐體剝離 之表面上形成反射膜之工程 及[3 7 ]—種擴散反射板之製 ,移基膜以其轉移形成的面 薄膜層上之工程、將前述轉 面上形成反射膜之工程製作 及[38]—種擴散反射板之製 ,項之擴散反射板,其中垂 表面粗化處理者。 [2 1 ]之擴散反射板之凹凸面之 之凹凸面之轉移 f,係使用上述[31]或[32]中 P於被轉移層而轉移其形狀 =吏:上述[33]中之轉移基 撐體轉移自轉移原模之面上 成於暫時支撐體上之面則形成 轉移膜上中暫時支撐 造方法,係 於被轉移基 以及在薄膜 反射板者。 係以使上述 壓於形成於 離之工程、 板者。 係包含使上 以使上述 材上之工 層被轉移 [33]中之 基材上之 以及在表 述[35]中Page 17 State 465 transfers the original model described in [3 4]. The process of pressing the joint surface of the shooting plate and the method of making the diffusion, and the method of making the substrate close to the base film and peeling the diffusion reflection. V. Description of the invention (7) and [30] are as described in [21] to [29] above. The straight surface (a) and the inclined surface (b) have been formed into [31] after the present invention: transfer the original mold. And [32] are used to form the model of [3 丨] above. The present invention is also [33] —a transfer base mold of the transfer base, which will compress the transfer base mold. The present invention is also [34]-a kind of transfer film. The film is a temporary support and temporarily supports to form a thin film layer. The shape of the thin film layer and the surface of the substrate to be transferred are the same. And [35] a kind of transfer film, which forms a reflection between the upper body and the thin film layer. The present invention is also [36] —the kind of diffusion film in [34], which uses the thin film layer as a process to transfer the aforementioned temporary support. The process of forming a reflective film on the peeled surface and [3 7] —a process of diffusing a reflective plate, a process of transferring a base film on the surface film layer formed by the transfer, a process of forming a reflective film on the aforementioned transfer surface, and [ 38] —A system of diffuse reflection plate, the diffuse reflection plate of item, wherein the vertical surface is roughened. The transition f of the uneven surface of the uneven surface of the diffuse reflection plate in [2 1] is transferred by using P in the above [31] or [32] on the layer to be transferred. The support is transferred from the surface of the transfer original mold to the surface of the temporary support to form a temporary support on the transfer film. The method is based on the transferred substrate and the thin film reflector. This is to make the above pressure on the formation of the project, board. It consists of a substrate on which the above-mentioned materials are transferred [33] and in the expression [35]
314175.ptd 第18頁 583465 五、發明說明(8) 之轉移膜以薄膜層為接面緊壓於 及將前述暫時支撐體剝離之二程 本發明又為[39]—種擴散反射= [3 8 ]中任一項之擴散反射板之製 及[40]—種擴散反射板,為在上 自轉移原模之面上設有反射膜者 及[41 ]一種擴散反射板,其特徵 [39]、[40]之任一項中之擴散^ 示器中者。 及[4 2 ]—種擴散反射板,直 [39]、[4〇]中任一項之擴散反射 面之垂直面(a)及傾斜面(b)所構 與該表面之脊頂及溝底的線平行 之大者面向顯示晝面之大略下方 顯示器中者。 本發明又為[4 3 ]—種反射型液晶 述[1 ]之擴散反射板者。 及[44]一種反射型液晶顯示器, 擴散反射板者。 [實施方式] 本發明可以提供一種顯示品 製造用之轉移原模、轉移基膜、 等之製造方法,前述之擴散反射 等顯不器之上方方向或左右側方 被轉移基材上之工程、以 者。 ,係由上述、[36 ]至上述 造方法所製成者。 述[33]之轉移基膜之轉移 〇 為將上述[21 ]至[29]、 射板使用在反射型液晶顯 為在上述[21]至[29]、 板中’以在相對於基材表 成之鋸齒狀橫切面中,因 之傾斜而產生之高低落差 之方式使用在反射型液晶 顯示器’其特徵為使用上 其特徵為使用上述[2 1 ]之 質優良之擴散反射板及其 轉移膜、擴散反射板及彼 板具有可以使自液晶元件 向荨各方向射入的外部入314175.ptd Page 18 583465 V. Description of the invention (8) The second step of the transfer film is to press the film layer as the interface and peel the aforementioned temporary support. The present invention is [39] —diffusive reflection = [3] 8] The system of any one of the diffuse reflection plates and [40] —a type of diffuse reflection plate, which is provided with a reflective film on the surface of the original self-transferring mold, and [41] a diffuse reflection plate, which features [39] ], [40]. And [4 2] —A kind of diffuse reflection plate, straight ridge tops and grooves formed by the vertical plane (a) and inclined plane (b) of the diffuse reflection plane of any one of [39] and [4〇]. The one with the bottom line parallel is the one facing down the display, which is roughly below the day. The present invention is also a diffuse reflection plate of [4 3], a reflective liquid crystal described in [1]. And [44] a reflective liquid crystal display, a diffuse reflection plate. [Embodiment] The present invention can provide a manufacturing method of a transfer master, a transfer base film, and the like for the manufacture of display products. To. , Made by the above, [36] to the above-mentioned manufacturing methods. The transfer of the transfer base film described in [33] is the use of the above-mentioned [21] to [29], and the reflection plate is used in the reflective liquid crystal display. In the above [21] to [29], the plate is The surface of the sawtooth-shaped cross section is used in a reflection type liquid crystal display in the form of a high and low drop due to its inclination. It is characterized by the use of the above-mentioned [2 1] diffusion diffuser with excellent quality and its transfer. The film, the diffuse reflection plate, and the other plate have external entrances that can be incident from the liquid crystal element in all directions.
314175.ptd 第19頁 五、發明說明(9) 射光:效地反射之定向反射特性。314175.ptd Page 19 V. Description of the invention (9) Light: the directional reflection characteristic of effective reflection.
本發明之使用於及I ,可以容易地以例如轉r ^ ^ 1曰顯示器等之擴散反射板 作,可以轉移在基材表:开里生產。擴散反射板之製 表面形狀,或先轉移該轉移f;微之凹凸面之轉移原模之 移原模所轉移之表面:原J之表面形⑻’再轉移該轉 面’即可轉移該凹凸;::;曰Ϊ移該轉移原模之細微凹凸 可轉移相同於轉移原凹凸形狀,再次轉移時即 轉移其轉移原= 基膜上。、該轉移基膜上 板。再使用該轉移美# & 、膜即成為擴散反射 移其轉移原模;:= :層支撑:膜…體上轉 人即^ ί 轉移基材之接著面,即成轉移膜。哕場 ::;=:面向薄膜層緊壓於被轉移基材=程:述 曰寺支撐肢之剝離工程、以.及薄膜層上轉移之 反射膜之工程,即可製作成擴散反射才反。又可二二 ::與薄膜層間形成反射膜之轉移膜面向薄膜層緊厣於基 反射i,程,及前述暫時支撐體之剝離工'呈,製作:擴散 於被板之製作’即包含由轉移原模緊壓 於被轉移膜上轉移其形狀於被轉移之轉移基膜 被轉移面緊壓⑪基材上形㈣膜層±之工程,心:The invention can be easily used as a diffuse reflection plate such as a r ^^ 1 display, etc., and can be transferred to the substrate table: Kari production. The shape of the surface of the diffuse reflection plate, or the transfer f; the surface of the micro-convex surface is transferred from the original mold to the surface transferred by the original mold: the surface shape of the original J, and then the surface is transferred to transfer the unevenness ; ::; said that moving the slight unevenness of the original mold of the transfer can transfer the same shape as the original unevenness of the transfer, and it will be transferred on the base film when it is transferred again. The transfer base film is plated. Then using this transfer beauty #, the film becomes a diffuse reflection and transfers its original transfer mode; ==: layer support: film ... transfer on the body, that is, ^ ί transfer surface of the substrate, which is a transfer film. Horiba ::; =: Facing the film layer and pressing on the substrate being transferred = Cheng: The process of peeling off the supporting limbs of the temple and the project of the reflective film transferred on the film layer can be made into diffuse reflection and reflect. . Also can be two :: The transfer film forming a reflective film with the thin film layer faces the thin film layer tightly to the base reflection i, process, and the aforementioned peeling process of the temporary support body is made, produced: diffused to the production of the substrate, that is, composed of The transfer original mold is pressed tightly on the transferred film to transfer its shape to the transferred base film. The transferred surface of the transferred base film is tightly pressed to form a film layer on the substrate. Heart:
314175.ptd314175.ptd
第20頁 583465 五、發明說明(ίο) 移基膜之剝離工程,及在表面上形成反射膜之工程。 本發明之擴散反射板,相對於基材表面為垂直 及傾斜面(b)所構成之鋸齒狀橫切面,由連声、、舌+ (a) (a )與傾斜面(b )構成之鋸齒狀杻切面之凹凸面— 7圖、第1 0圖、第1 5圖、及第1 8圖所示。誃m几之例如第 . 丄旧凸面之形 成,可以如第1圖及第1 2圖所系’由蝕刻刀上 、 餘刻基材表面之水平運動之機械加工等形士下運動及被 以 JUJ 〇 y , 成之例可舉如以以下之工程形成,但並不受复 。/、形 施以激光切割、光蝕刻法、JE交蝕刻等,限制’亦可 之組合。 亦可以使用此等 在xyz空間上之xy面内配置基材表面 或轉移原模之轉移原模表面時,一面在古各原杈表面 動,一面以右半邊之末端角度與左半邊 向作等速運 至15度及70至88度組合角度之蝕刻刀 末端角度為-η ,之末端角度與左半邊之末端角度之一圖),及以右半 二方為70至90度與60至80度角度組合 為—15至15度另 轉^方居向作上下運動,即可在基材表面或轅1刀(第u圖), 原模之轉移原模表面上,形成_ — 移原模表面或 =(b)連續直線排列之凹凸面。 、、且垂直面(a)及傾斜 ,轉移原模之轉移原模、=二面或轉移原模表 時,”刀再回至原先之:::作等,^ y方向移動一定之距離, ”、·,自蝕刻起點再 動移原模表面或其轉移原模之轉v原x::向在基材表面或 上下運動進行蝕刻。重^面上作等速運 複5亥作業’即可在基材表面或Page 20 583465 V. Description of the Invention (ίο) The peeling process of the base film and the process of forming a reflective film on the surface. The diffuse reflection plate of the present invention is a sawtooth-shaped cross-section formed by a vertical and inclined surface (b) with respect to the surface of the substrate, and a sawtooth composed of continuous sound, tongue + (a) (a) and inclined surface (b) Concave-convex surface of the cut surface of the shape of 杻 —as shown in Fig. 7, Fig. 10, Fig. 15 and Fig. 18. For example, the formation of the old convex surface can be moved under the shape of the machine such as the machining on the etching knife and the horizontal movement of the surface of the substrate as shown in Figure 1 and Figure 12. JUJ 〇y, examples of success can be formed by the following projects, but they are not overwhelming. /, Laser cutting, photo-etching, JE cross-etching, etc. may be used, and the combination of '' may be limited. You can also use these to arrange the surface of the substrate in the xy plane of the xyz space or the surface of the transfer master of the transfer master, while moving on the surface of the ancient original branches, and using the end angle of the right half and the left half to move, etc. The end angle of the etch knife that is fast-forwarded to 15 degrees and the combined angle of 70 to 88 degrees is -η, one of the end angle and the end angle of the left half), and the right half is 70 to 90 degrees and 60 to 80 The combination of degrees and angles is -15 to 15 degrees, and then turn ^ square direction to move up and down, you can form a _ on the surface of the substrate or a knife (Figure u), transfer the original mold on the surface of the original mold _ — move the original mold The surface or = (b) a continuous uneven surface. , And the vertical plane (a) and the inclination, when the original model is transferred, the second model or the original model table, "the knife returns to the original: :: work, etc., moves a certain distance in the y direction, ", ·, From the beginning of the etching, move the surface of the original mold or its transfer v original x :: to etch on the surface of the substrate or move up and down. Do the same speed operation on the heavy surface, and then repeat the 5 ’operation on the surface of the substrate or
583403 五、發明說明(11) ^ ^--——_ 轉移原模表面或其轉移原模之 垂直面(/)及傾斜面(b)構成之連‘凹二二面之全面形成由 此蚪,基材表面或轉移原 原模表面為圓筒狀之場合,除、、面或其轉移原模 作疋角速度之迴轉運動,或异寺速違動外,亦 刀連續-圈時移動半預定之速度運動,且了二 在圓筒之全面形成钱刻溝之凹=運動韻刻成螺旋狀,即;_ 蝕刻刀之上下運動亦無須 f:::量為縱軸時,亦可為正弦:皮2 ’以時間轴為橫 2-人曲線運動等。 弦波運動、三角波運動、 上述各種運動、水平 :姓刻刀與被钱刻基材表 目=動、上下運動只要 例。 對運動即可,上列為其一 基材表面或轉移原模 丨”:虫刻加工後,其凹部所开4:移原模之轉移原模表面 “田粒之膜疊層等方法形成細=之面上再以喷砂、電鍍、 基材表面或轉移原模表式之凹凸而使表面粗化。 面經該蝕刻加工後,可或其轉移原模之轉移原模 塗平工程可例舉=;=平、表面粗化成凹部; =f:etching)、塗平 等再流平(refl°w)、軟 表面粗化電鍍後亦可"層寻。 狀最,化。 u拋光電鍍使凹部或凸部形 错由選擇姓刻刀之形狀可 反射特性最適化。亦可以 583465 五、發明說明(12) ^ 增加表面之硬度,或以保護電鍍 護電鍍以鉻、鎳、鋅等電鍍為佳。 虱化之目的。保 金屬本= : = = 模之轉移原模之材質為 良之不錄鋼等鐵:金,„戈工力取好::寸安定性、導電性優 者。表面再經機械研磨、餘刻、洗淨處理等豐積 可使用:可使用板狀1狀、圓 :::勾之後即 以進迴轉加工之圓筒狀者較佳。 .,,、哏疋,但以可 形成可擴散光之凹凸面形狀之轉移 轉移原模,可使用片狀、平板或圓筒狀等及原模之 材,在表面之全部或必須部份形纟可擴 2面等基 狀’再貼於加壓裳置上,或夹於形成凹:凸面形 之間使用。緊壓工程亦可加熱、照光等。面共加壓裝置 本發明之擴散反射板可由凹凸面之形狀 擴散性或反射性能,因此凹凸面之設計須 調整其 之擴散反射特性。 、^擴政反射板 本4明之擴政反射板之凹凸面形狀,對美 面(a )及傾斜面(b )所形成之鋸齒狀橫切面上::面垂直 對基材表面之傾斜角為7 5至1 0 5度。 ^ 面(a ) 本發明之第1樣態中,傾斜面(b)之傾斜角為2度以上 3〇度以下,又以2· 5度以上15度以下為佳。此 才目對表基材表面之傾斜角,為垂直面(a)及傾斜面(b 成之鋸齒狀橫切面(接近直角三角形)上,通583403 V. Description of the invention (11) ^ ^ ------_ The full formation of the concavity and concavity formed by the surface (/) and the inclined surface (b) of the transfer original mold surface or its transfer original mold is as follows: When the surface of the substrate or the surface of the transfer original mold is cylindrical, except that the surface, the surface, or the transfer original mold is used for the rotary motion of the angular velocity, or the speed of the temple is violated, the knife is moved half-predetermined during the continuous circle. Speed movement, and the formation of the concave groove of the money engraving in the cylinder = movement rhyme engraved in a spiral shape, that is, _ etching knife does not need to move up and down, f ::: can also be sinusoidal when the amount is the vertical axis: Pi 2 'uses the time axis as the horizontal 2-person curve movement and so on. Sine wave movement, triangle wave movement, the above-mentioned various movements, and levels: the name of the knife and the substrate carved by the money. The movement can be done, the above is the surface of one of the substrates or the transfer mold 丨 ": After the engraving process, the recesses are opened 4: The surface of the transfer mold is transferred to the surface of the original mold, such as the film stacking of the grain On the surface, the surface is roughened by sandblasting, plating, the surface of the substrate or transferring the unevenness of the original mold. After the surface is subjected to the etching process, the transfer of the original mold and the flat coating process of the original mold can be exemplified. =; = Flat, the surface is roughened to a concave portion; = f: etching), coating equalization and releveling (refl ° w), Soft surface roughening and plating can also be used for layer-finding. The state is the most. u Polishing and plating make the shape of the concave part or convex part wrong. The reflection characteristics can be optimized by selecting the shape of the carving knife. Can also be 583465 V. Description of the invention (12) ^ Increase the hardness of the surface, or to protect the plating. The plating is preferably chromium, nickel, zinc and other plating. The purpose of lice. Protected metal = = = = The mold is transferred. The material of the original mold is a good non-recorded steel. Iron: Gold, „Gong Gongli: Good inch stability, good conductivity. The surface is mechanically polished, engraved, Accumulations such as washing treatment can be used: plate-like 1 shape, round ::: cylindrical shape that is processed into rotation after the hook is preferred ... ,,, 哏 疋, but can form a diffused light The shape of the concave and convex surface is transferred. The original mold can be used in the form of a sheet, a flat plate or a cylinder, and the original mold. The entire surface or part of the surface must be shaped. It can be expanded to 2 sides and other base shapes. It can be placed on or sandwiched between concave and convex shapes. It can also be heated, illuminated, etc. in the compacting process. Surface co-pressurization device The diffuse reflection plate of the present invention can be diffused or reflected by the shape of the uneven surface, so the uneven surface The design must be adjusted for its diffuse reflection characteristics. The shape of the concave-convex surface of the enlarged reflective plate of the 4th expansion plate, the jagged cross-section formed by the beautiful surface (a) and the inclined surface (b) :: The angle of inclination of the surface perpendicular to the surface of the substrate is 75 to 105 degrees. ^ Surface (a) The present invention In the first aspect, the inclined angle of the inclined surface (b) is preferably 2 degrees or more and 30 degrees or less, and more preferably 2.5 degrees or more and 15 degrees or less. Therefore, the inclination angle of the surface of the watch substrate is vertical. The surface (a) and the inclined surface (b-shaped zigzag cross section (close to a right triangle))
Qb)刀線兩鳊之直線與擴散反射板基材表面之角度。相同Qb) The angle between the straight line of the two blades and the surface of the substrate of the diffuse reflection plate. the same
3】4l75.ptd 第23頁 583465 五、發明說明(13) 地,垂直面(a)相對於基材表面之傾斜角,為垂直面(a ) 及傾斜面(b )所構成之鋸齒狀橫切面上,通過一垂直面(a ) 分線兩端之直線與擴散反射板基材表面之角度。 本發明之第2樣態中之傾斜面(b ),如第1 6圖及第1 7圖 中所示,至少包含相對於基材表面不同之2傾斜角群,其 傾斜角群一為0至2 0度,另一為0至3 0度,對應入射光量最 佳之入射光角度範圍為0度以上1 5度以下及1 0度以上2 5度 以下之組合。傾斜角群之角度依擴散反射板之用途而異。 鋸齒狀橫切面之傾斜面(b )之傾斜角群長度可為相同 之長度,亦可為不規則者,以對應入射光量最佳之入射光 角度,角度與長度之比例以儘量大者為佳。錯齒狀橫切面 上傾斜面(b)之形狀亦可全部或部份為曲線,傾斜角群為 在設定角度範圍内具有均一之角度分布者,反射光可以均 一地反射回使用者之方向。 第2樣態中擴散反射板之凹凸面,傾斜面(b )為設有複 i數傾斜角群,且傾斜面(b )之橫切面為有一振幅之波形, 其連續之凹凸形狀可以將射入之外部入射光有效地反射回 使用者觀察之角度範圍内,凹凸面表面粗化可以使複數傾 斜角群之反射光高峰間平緩化,可得到在角度範圍内視野 減損較少之顯示狀態。 本發明之第1及第2樣態中,與鋸齒狀橫切面垂直之傾 斜面(b)橫切面上為有一振幅之波形,可為如第8圖所示之 波形,除正弦波形外又可以部份圓或橢圓連成之波形、部 份拋物線連成之波形、三角波形、及這些波形組合之連續3] 4l75.ptd Page 23 583465 V. Description of the invention (13) The inclination angle of the vertical plane (a) with respect to the surface of the substrate is a zigzag horizontal plane composed of the vertical plane (a) and the inclined plane (b). On the cut plane, the angle between the straight line at both ends of the dividing line of a vertical plane (a) and the surface of the substrate of the diffuse reflection plate. The inclined surface (b) in the second aspect of the present invention, as shown in FIG. 16 and FIG. 17, includes at least two inclined angle groups different from the surface of the substrate, and one of the inclined angle groups is 0. To 20 degrees, the other is 0 to 30 degrees, and the range of incident light angles corresponding to the best amount of incident light is a combination of 0 degrees to 15 degrees and 10 degrees to 25 degrees. The angle of the inclination group depends on the purpose of the diffuse reflection plate. The length of the inclination angle group of the inclined surface (b) of the sawtooth cross-section may be the same length or irregular, so as to correspond to the incident light angle with the best amount of incident light, and the ratio of the angle to the length is preferably as large as possible. . The shape of the inclined surface (b) on the cross-cutting plane can also be all or part of a curve, and the inclined angle group is a person with a uniform angular distribution within a set angle range, and the reflected light can be uniformly reflected back to the direction of the user. In the second aspect of the uneven surface of the diffuse reflection plate, the inclined surface (b) is provided with a complex i number of inclined angle groups, and the cross section of the inclined surface (b) has a waveform with an amplitude. The incoming external incident light is effectively reflected back to the angle range observed by the user. The roughening of the surface of the uneven surface can smooth the peaks of the reflected light of the plurality of inclined angle groups, and a display state with less loss of visual field in the angle range can be obtained. In the first and second aspects of the present invention, the inclined plane (b) on the transverse plane perpendicular to the sawtooth transverse plane has a waveform with an amplitude, which can be a waveform as shown in FIG. 8 and can be in addition to a sinusoidal waveform. Waves formed by partial circles or ellipses, waveforms formed by partial parabola, triangle waveforms, and the continuity of these waveform combinations
314175.ptd 第24頁 583465 五、發明說明(14) 波形,曲面更可能自更廣闊範圍之光源位置擴散反射光, 又可降低製造單價,其中以正弦波形為佳。傾斜面(b )之 橫切面上波形之波長可為規則性者,但為抑制干擾波及分 光,亦可為非一定之間隔配置。亦即,在波形為正弦波形 之場合,正弦波形之波形非一定者亦可。垂直面(a )鄰接 傾斜面(b )之橫切面波形之正弦波等之相位可一定,但為 抑制干擾波及分光,以移動半相位者為佳,非一致者更 佳。傾斜面(b )橫切面波形之振幅可為規則性者,但為抑 制干擾波及分光,以非一定間隔配置者為佳。亦即,在波 形為正弦波形之場合,正弦波形之振幅非一定者亦可。相 對於擴散反射板之基材表面,垂直面(a )及傾斜面(b )所構 成鋸齒狀橫切面之凹凸面之頂角、及該鋸齒狀橫切面垂直 方向之頂角連成之峰、谷,亦可為具曲率形狀者。 觀察擴散反射板,在減少各垂直面(a)之面積時,無 視差或散光減損,可得到辨視性優良之擴散反射板,因此 垂直面(a)配置之間隔以150// m以下為宜,70// m以下更 佳。另一方面,垂直面(a )配置之間隔太小時易造成分 光,因此以2// m以上為宜,配置間隔5# m以上更佳。垂直 面(a )配置之間隔可為規則性者,但為抑制干擾波及分 光,以非一定間隔配置者為佳。 擴散反射板之凹凸面上,其凹凸在表面上產生落差, 在例如液晶顯示器之2片玻璃板間形成擴散反射板之場 合,其落差必須減小。在其他顯示器例如電場發光顯示器 等之中使用本發明擴散反射板之場合,其落差小者在擴散314175.ptd Page 24 583465 V. Description of the invention (14) For the waveform, the curved surface is more likely to diffuse the reflected light from a wider range of light source positions, and it can reduce the manufacturing unit price, of which the sinusoidal waveform is preferred. The wavelength of the waveform on the cross-section of the inclined surface (b) may be regular, but in order to suppress interference waves and spectral splitting, it may also be arranged at non-constant intervals. That is, when the waveform is a sinusoidal waveform, the waveform of the sinusoidal waveform may be non-constant. The phase of the sine wave, etc. of the cross-section waveform of the vertical plane (a) adjacent to the inclined plane (b) may be constant, but in order to suppress the interference wave and the beam splitting, it is better to move the half phase, and the non-uniform one is better. The amplitude of the cross-section waveform of the inclined plane (b) may be regular, but it is better to arrange it at a certain interval in order to suppress interference waves and spectral splitting. That is, when the waveform is a sinusoidal waveform, the amplitude of the sinusoidal waveform may not be constant. With respect to the surface of the substrate of the diffuse reflection plate, the peak angle formed by the uneven surface of the zigzag cross section formed by the vertical surface (a) and the inclined surface (b), and the peak angle formed by the vertical angle of the zigzag cross section, Valley can also be a person with a curvature shape. Observing the diffuse reflection plate, when reducing the area of each vertical plane (a), no parallax or astigmatism is lost, and a diffuse reflection plate with excellent visibility can be obtained. Therefore, the interval at which the vertical plane (a) is arranged is 150 // m or less It is better to be below 70 // m. On the other hand, if the interval of the vertical plane (a) is too small, it is easy to cause spectrometry. Therefore, it is better to use 2 // m or more. The interval of the vertical plane (a) may be regular, but it is better to arrange it at a non-definite interval in order to suppress interference from spreading the light. The unevenness on the uneven surface of the diffuse reflection plate causes a drop on the surface. For example, when a diffuse reflection plate is formed between two glass plates of a liquid crystal display, the difference must be reduced. When the diffuse reflection plate of the present invention is used in other displays, such as an electric field light-emitting display, the smaller the difference is
314175.ptd 第25頁 583465 五、發明說明(15) 反射板上疊積 即,本發明擴 向之最高及最 宜,3.5// m以 本發明轉 設計時通常須 模轉移至薄膜 緩,以轉移原 膜層凹凸形狀 曲率小者為佳 本發明之 緊壓於被轉移 膜可為以下之 基膜可使 者。其具體者 叉乙稀等聚鹵 璐玢等纖維素 亞胺、聚酯、 塑膠,或鋁、 之雙軸延伸聚 設有底漆 述薄膜層為硬 烯,乙烯與乙 之類乙烯共聚 構成各顯示器之部件時製造工程較簡便。亦 散反射板之所有鋸齒狀橫切面中,以垂直方 低位差(即凹凸面之最大落差)在6/z m以下為 下更佳。 移原模或轉移原模之轉移原模之凹凸面,在 考慮薄膜層硬化時之變形。亦即,由轉移原 層之工程中,須考慮轉移之形狀之變形最和 模之凹凸面上落差或傾斜角角度比所要之薄 更大、轉移原模之凹凸面上頂角及峰、谷之 〇 轉移原模,可以使用轉移原模以其轉移原模 層上,轉移其形狀於轉移基膜上。該轉移基 轉移基膜,或為再設有底漆層之轉移基膜。 用對化學、熱安定,可成形為片狀、板狀 如聚乙烯、聚丙烯等聚烯,聚氯乙烷、聚氣 化乙烯類,乙酸纖維素酯、硝化纖維素、賽 衍生物,聚醯胺、聚苯乙烯、聚碳酸酯、聚 ABS、聚乙醛、PPO、聚楓、環氧樹脂等各種 銅等金屬類等。其中特別以尺寸安定性優良 對苯二曱酸乙二醇酯為佳。 層之轉移基膜之底漆層,以凹凸形成後比後 者為佳。其例可舉如在聚乙烯、聚丙烯等聚 酸乙烯酯、乙烯與丙烯酸酯、乙烯與乙烯醇 體,聚氯乙烯、氯乙烯與乙酸乙烯酯之共聚314175.ptd Page 25 583465 V. Description of the invention (15) The superposition of the reflecting plate means that the present invention is the highest and most suitable for expansion. When 3.5 // m is redesigned by the present invention, it is usually necessary to transfer the mold to the film to It is preferable that the curvature of the uneven shape of the transfer original film layer is small. The compacted film of the present invention can be the following base film. The specific examples are biaxially stretched cellulose imine, polyester, plastic, or aluminum, such as vinyl chloride, etc., and a biaxially-stretched polymer with a primer. The film layer is hardene, and ethylene and ethylene are copolymerized to form each The manufacturing process of display parts is simple. Of all the jagged cross-sections of the diffuse reflection plate, it is more preferable that the vertical low position difference (that is, the maximum drop of the uneven surface) is less than 6 / z m. The deformed surface of the transfer master mold or the transfer master mold of the transfer master mold is considered when the film layer is hardened. That is, in the process of transferring the original layer, it is necessary to consider the deformation of the transferred shape and the drop or inclination angle of the concave-convex surface of the mold, which is larger than the desired thickness, and the vertex and peak and valley of the concave-convex surface of the original mold. 〇 Transfer original mold, you can use the transfer original mold to transfer the original mold layer, transfer its shape on the transfer base film. The transfer base is a transfer base film or a transfer base film further provided with a primer layer. With chemical and thermal stability, it can be formed into sheet-like, plate-like polyenes such as polyethylene, polypropylene, polyvinyl chloride, polygasified vinyls, cellulose acetate, nitrocellulose, derivatives Metals such as copper, polystyrene, polycarbonate, polyABS, polyacetaldehyde, PPO, polymaple, epoxy resin, etc. Among them, ethylene terephthalate is particularly preferred because of its excellent dimensional stability. The primer layer of the transfer base film is preferably formed after the unevenness is formed. Examples include the copolymerization of polyethylene, polypropylene and other polyvinyl esters, ethylene and acrylates, ethylene and vinyl alcohols, and the copolymerization of polyvinyl chloride, vinyl chloride, and vinyl acetate.
314175.ptd 第26頁 583465 五、發明說明(16) ~~ " ~ —- 笨 氣乙烯與乙烯醇之共聚體,聚偏氯乙烯、聚苯乙烯、 乙稀與(曱基)丙烯酸酯之類苯乙烯共聚體,聚甲基苯乙 體、甲基苯乙烯與(甲基)丙烯酸酯之類甲基苯乙烯之共聚 -’聚(曱基)丙烯酸酯、(甲基)丙烯酸丁酯與乙酸乙稀醋 '^類(甲基)丙烯酸酯之共聚體,合成橡膠、纖維素衍生物 寻中選擇,亦可以使用至少1種以上之有機高分子。為在 凹凸形成後硬化之需要,亦可以再添加光起始劑或含乙稀 性雙鍵之單體等。負型、正型感光型均無問題。 該轉移基膜、設有底漆層之轉移基膜,可以使用轉移 原模以其轉移原模緊壓於被轉移層而製成轉移形狀之轉移 基膜。 本發明亦可以以上述轉 時支撐體上轉移轉移原模之 未形成暫時支撐體之面則構 為一轉移膜。轉移基膜以面 之薄膜層上,再剝離該轉移 膜之擴散反射板。 移基膜為暫時支撐體,再於暫 面上形成薄膜層,在薄膜層上 成與被轉移基材之接著面,成 對被轉移面緊壓於基材上形成 基膜,即製成一表面形成反射 層可使用可在轉移基膜之支持體或基材上塗 :、貼布專形成可捲取之膜狀的樹脂組成4勿。在必要時, :ΐ t::ί獨或混合使用染料、有機顏#、無機顏料、 私體或其複合物。冑膜層中亦可使用光硬化性樹脂組成物 或熱硬化I·生樹月曰組成物。薄膜層之軟化溫度並無特別限 疋’但以20 0C以下為佳。此外為由加熱得到流動性,亦 可以添加分子量i 〇〇〇〇以下之低熔點物質。314175.ptd Page 26 583465 V. Description of the invention (16) ~~ " ~ --- The copolymer of stupid ethylene and vinyl alcohol, polyvinylidene chloride, polystyrene, ethylene and (fluorenyl) acrylate Styrene-like copolymer, polymethylstyrene, copolymer of methylstyrene and methylstyrene such as (meth) acrylate-'poly (fluorenyl) acrylate, butyl (meth) acrylate and Copolymers of vinyl acetate (^) type (meth) acrylates, synthetic rubber, cellulose derivatives, and at least one organic polymer can be used. In order to harden after the unevenness is formed, a photo-initiator or an ethylene-containing double bond-containing monomer may be further added. Negative and positive type are no problem. The transfer base film and the transfer base film provided with a primer layer can be made into a transfer-shaped transfer base film by using a transfer master mold and pressing the transfer master mold against the transferred layer. The present invention can also be used as a transfer film by using the above-mentioned transfer support to transfer the original mold without forming a temporary support. The diffuser reflection plate of the transfer film is peeled on the surface of the transfer base film. The base film is a temporary support, and then a thin film layer is formed on the temporary surface. On the film layer, a contact surface with the substrate to be transferred is formed, and the pair of transferred surfaces are pressed against the substrate to form a base film. The reflective layer formed on the surface can be coated on the support or substrate of the transfer base film, and the film is formed to form a rollable resin composition. 4 When necessary,: ΐ t :: ί alone or in combination with dyes, organic pigments #, inorganic pigments, private bodies, or composites thereof. It is also possible to use a photo-curable resin composition or a heat-curable I. Izuki-yue composition in the film layer. The softening temperature of the thin film layer is not particularly limited 疋 ', but preferably 200 ° C or lower. In addition, in order to obtain fluidity by heating, a low-melting substance having a molecular weight of 10,000 or less may be added.
314175.ptd 第27頁 583465 五、發明說明(17) 這些物質中以對轉移基膜或基材密貼性良好,且對轉 移基膜剝離性優良者為佳。例如包含光硬化性樹脂組成物 之有機聚合物之例可舉如丙烯樹脂、聚乙烯、聚丙烯等聚 烯,聚氣乙烯、聚偏氯乙烯等聚i化乙烯類,乙酸纖維素 酯、硝化纖維素、賽璐玢等纖維素衍生物,聚醯胺、聚苯 乙烯、聚碳酸酯、聚酯等。使用於TFT液晶顯示器之場 合,為了在基材上與形成之TFT形成接觸孔,須去除該部 份之薄膜層,亦可以使用可用鹼等顯相之感光性樹脂。同 時,為增加其财熱性、财溶劑性、形狀安定性,亦可使用 可熱硬化之樹脂組成物。此外,添加偶合劑、賦接著性 劑,亦可再增加其與轉移基膜之密合。為增加接著之目 的,亦可在其接著面上形成賦接著性劑。 薄膜層為由加熱得到流動性,亦可以添加分子量 1 0 0 0 0以下之低熔點物質。可添加例如「塑膠配合劑」(遠 藤昭定、須藤真編,大成社發行,平成8年1 1月30日發 行)中記載之可塑劑、或分子内至少含1個以上乙烯性雙鍵 之單體。本成份之使用量,以感光性組成物中固形份總量 之1至7 0重量%為佳。 其例可舉如三羥曱基丙烷三丙烯酸酯、三乙二醇二丙 烯酸酯、二乙二醇二丙烯酸酯、四乙二醇二丙烯酸酯、六 甲二醇二丙烯酸酯、新戊二醇二丙烯酸酯、丙烯酸呋喃甲 酯、四羥曱基甲烷四丙烯酸酯、二丙烯酸間苯二酚酯、 對,對’-二羥基二苯基二丙烯酸酯、螺二醇二丙烯酸酯、 環己烷二羥曱基二丙烯酸酯、聯酚A二丙烯酸酯、聚丙二314175.ptd Page 27 583465 5. Description of the invention (17) Among these materials, those with good adhesion to the transfer base film or substrate and excellent peelability to the transfer base film are preferred. Examples of the organic polymer containing a photocurable resin composition include polyenes such as propylene resin, polyethylene, and polypropylene; polyvinylidene compounds such as polyethylene gas and polyvinylidene chloride; cellulose acetate and nitration Cellulose derivatives such as cellulose and celluloid, polyamine, polystyrene, polycarbonate, polyester, etc. In the field of TFT liquid crystal displays, in order to form contact holes on the substrate with the formed TFT, the thin film layer of this portion must be removed, and a photosensitive resin that can show a phase such as alkali can also be used. At the same time, in order to increase its thermal properties, financial properties, and shape stability, a thermosetting resin composition can also be used. In addition, by adding a coupling agent and an adhesive, the adhesion to the transfer base film can be further increased. For the purpose of adhesion, an adhesive agent may be formed on the adhesion surface. The thin-film layer is obtained by heating, and a low-melting substance having a molecular weight of 1 000 or less may be added. For example, you can add plasticizers described in "Plastic Compounding Agents" (edited by Akira Endo and Makoto Sudo, issued by Daiseisha, issued on November 30, 2008), or those containing at least one ethylenic double bond in the molecule monomer. The amount of this component used is preferably 1 to 70% by weight of the total solid content in the photosensitive composition. Examples include trihydroxymethylpropane triacrylate, triethylene glycol diacrylate, diethylene glycol diacrylate, tetraethylene glycol diacrylate, hexamethylene glycol diacrylate, neopentyl glycol diacrylate Acrylates, methyl furan acrylate, tetrahydroxymethylmethane tetraacrylate, resorcinol diacrylate, para, p -'- dihydroxydiphenyl diacrylate, spirodiol diacrylate, cyclohexanedi Hydroxy fluorenyl diacrylate, biphenol A diacrylate, polypropylene diacrylate
314175.ptd 第28頁 583465 五、發明說明(18) 醇二丙烯酸酯、五丁四醇四丙烯酸酯、乙二醇化五丁四醇 四丙烯酸酯、二五丁四醇六丙烯酸酯、及上述丙烯酸酯相 對之丙稀酸S旨化合物,丙烯酸S旨、丙稀酸S旨、丙稀酸、 丙稀酸S旨、丙稀酸S旨、丙烯酸酯、丙烯酸醋、亞甲基二丙 烯醯胺、尿烷系二丙烯酸酯等多官能性單體。另外亦可使 用如ECH變性苯二甲酸二丙烯酸酯、三(丙烯氧基乙基)異 氰酸酯、三(曱基丙烯氧基乙基)異氰酸酯、三(2 -羥甲乙 基)異氰酸酯、聚乙二醇二曱基丙烯酸酯、三溴化苯基丙 烯酸酯、E0變性三溴化酚丙烯酸酯、E0變性四溴化二酚二 甲基丙烯酸酯等2 5°C下為固體或其黏度在1 0 0 Pa · s (1 0萬 csp)以上之單體或募聚體。或選擇「感光材料目錄集」 (光聚體研討會編,Buns i η出版發行,1 9 9 6年3月3 1曰發 行)中所記載者更佳。 另外亦可例舉如丙烯酸曱酯、丙烯酸乙酯、丙烯酸正 丁酯、丙烯酸異丁酯、丙烯酸-2 -乙基己酯、甲基丙烯酸 烧S旨、丙稀酸環己S旨、甲基丙稀酸四氫咲喃S旨、甲基丙烯 酸苯曱酯、酸性磷酸單(2-甲基丙烯醯基氧乙基)酯、甲基 丙烯酸二曱基胺基乙酯四級化物等單官能性單體。這些成 份可單獨或以其2種以上混合使用。 光硬化性樹脂組成物之光起始劑可例舉如苯醯苯、Ν, Ν’ -四乙基-4, 4’ -二胺基苯醯苯、4-甲氧基-4’ -二甲基胺 基苯醯苯、苯曱基、2, 2-二乙氧基乙醯苯、苯偶因、苯偶 因甲醚、苯偶因異丁醚、苯甲基二曱基縮酮、α -羥基異 丁基苯酮、噻噸酮、2 -氣化噻噸酮、1 -羥基環己基苯酮、314175.ptd Page 28 583465 V. Description of the invention (18) Alcohol diacrylate, pentaerythritol tetraacrylate, glycolized pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, and the above acrylic acid Acrylic acid compounds, acrylic acid compounds, acrylic acid compounds, acrylic acid, acrylic acid compounds, acrylic acid compounds, acrylic acid esters, acrylic acid vinegars, methylene diacrylamide, Polyfunctional monomer such as urethane-based diacrylate. In addition, ECH denatured phthalic acid diacrylate, tris (acryloxyethyl) isocyanate, tris (fluorenyloxyethyl) isocyanate, tris (2-hydroxymethylethyl) isocyanate, and polyethylene glycol can also be used. Difluorenyl acrylate, tribromophenyl acrylate, E0 denatured tribromophenol acrylate, E0 denatured tetrabromodiphenol dimethacrylate, etc. are solid at 5 ° C or their viscosity is 100 ° Monomers or aggregates of Pa · s (100,000 csp) or more. Alternatively, it is better to select the ones listed in the Catalogue of Photosensitive Materials (edited by Photopolymer Workshop, published by Buns i η, March 31, 1996). Other examples include methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, 2-ethylhexyl acrylate, methyl methacrylate, cyclohexyl acrylate, methyl Monofunctional functions such as tetrahydrofuran succinate, phenyl methacrylate, acidic (2-methacryl fluorenyloxyethyl) phosphate, dimethylamino methacrylate quaternary, etc. Sex monomer. These ingredients may be used alone or as a mixture of two or more of them. Examples of the photoinitiator of the photocurable resin composition include benzophenone, Ν, Ν'-tetraethyl-4, 4'-diaminophenylbenzene, 4-methoxy-4 '-di Methylaminobenzylbenzene, phenylbenzyl, 2,2-diethoxyacetamidine, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl difluorenyl ketal, α-hydroxyisobutyl ketone, thioxanthone, 2-gasified thioxanthone, 1-hydroxycyclohexyl benzophenone,
314175.ptd 第29頁 583465 五、發明說明(19) 2 -甲基-1-[4 -(甲基硫代)苯基]_2 -嗎福琳-1-丙烧、第三 蒽醌、卜氣化蒽醌、2, 3-二氣化蒽醌、3-氯-2-甲基蒽 醌、2-乙基蒽醌、1,4-萘醌、9, 10-菲醌、1,2-苯并蒽 醌、1,4-二甲基蒽醌、2-苯基蒽醌、2-(鄰氣化苯 基)-4,5 -二苯基咪唑雙體等。此些光起始劑可單獨或以其 2種以上組合使用。本成份之使用量以感光性樹脂組成物 中固形份總量之0 . 0 1至2 5重量%為佳,1至2 0重量%更佳。 薄膜層及底漆層之塗布方法可例舉如輥塗機塗布、旋 鍍塗布機塗布、喷鍍塗布機塗布、浸潰塗布機塗布、幕淋 塗布機塗布、盤條塗布機塗布、輪轉凹印塗布機塗布、氣 動刮塗機塗布等。暫時支撑體及基材等之表面亦使用上列 方法塗布薄膜層或底漆層。 塗布基材可舉如玻璃板、以鉻或I T 0等無機化合物成 膜之玻璃板、石夕膠基材、陶究板、聚碳酸S旨系樹脂膜、丙 烯系樹脂膜、聚對苯二甲酸乙二醇酯膜、聚醚楓樹脂膜、 氟系樹脂膜等。以使用雙折射率少η = 0· 01以下)之基材 為佳。 本發明於薄膜層上被轉移之表面或轉移基膜上再形成 反射膜。第3圖、第2圖所示為薄膜層上形成該反射膜之一 例。 反射膜可以以希望反射波長範圍選擇其適當之材料, 例如反射型LCD顯示器可以可見光波長範圍30 Onm至80 Onm 反射率高之金屬,例如铭或金、銀等’以真空蒸鍵法或錢 鍍法等形成。另外亦可以上述方法疊積反射加強膜(光學314175.ptd Page 29 583465 V. Description of the invention (19) 2-methyl-1- [4- (methylthio) phenyl] _2-morpholin-1-propanone, third anthraquinone, Bu Gasified anthraquinone, 2, 3-digassed anthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 9, 10-phenanthrenequinone, 1,2 -Benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2- (ortho-gasified phenyl) -4,5-diphenylimidazole dimer, and the like. These photoinitiators can be used alone or in combination of two or more kinds. The amount of this component used is preferably from 0.01 to 25% by weight of the total solids content in the photosensitive resin composition, and more preferably from 1 to 20% by weight. The coating method of the film layer and the primer layer can be exemplified by roll coater coating, spin coating coater coating, spray coating coater coating, dip coater coating, curtain coater coating, wire rod coating machine coating, and rotary gravure coating. Printing coating machine coating, pneumatic blade coating machine coating. The surface of the temporary support and the substrate is also coated with a film layer or a primer layer using the method described above. Examples of coating substrates include glass plates, glass plates formed with inorganic compounds such as chromium or IT 0, stone rubber substrates, ceramic plates, polycarbonate resin films, acrylic resin films, and poly (phenylene terephthalate). Ethylene formate film, polyether maple resin film, fluorine resin film, etc. It is better to use a substrate with less birefringence (n = 0.01 or less). The present invention forms a reflective film on the transferred surface of the thin film layer or on the transferred base film. Figures 3 and 2 show an example of forming the reflective film on a thin film layer. The reflective film can be selected with appropriate materials in the desired reflection wavelength range. For example, reflective LCD displays can display visible light in the wavelength range of 30 Onm to 80 Onm. Metals with high reflectivity, such as Ming or gold, silver, etc. Law formation. In addition, the reflection enhancement film (optical
314175.ptd 第30頁 583465 五、發明說明(20) 概論2,辻内順平,朝倉書店,1 9 7 6年發行)。在利用折射 率之差使反射之場合,除金屬外亦可再以真空蒸鍍法或濺 鍍法等形成I TO或五氧化钽等之膜及矽烷或鋁等之氧化膜 或氮化膜、氧氮化膜。或疊積大氣或折射率低之膜作為薄 膜層單體。反射膜厚度以0. 01至50// m為佳。反射膜上必 要部份亦可以光蝕刻法、光罩蒸鍍法等形成圖樣。 為保護基材上薄膜層轉移面,最好再設置表膜層作為 保護膜。此表膜層最好是對化學及熱安定,且易於自薄膜 層剝離者。具體地以聚乙烯、聚丙烯、聚對苯二甲酸乙二 醇酯、聚乙烯醇等薄片狀且表面平滑性高者為佳。為賦予 剝離性,亦包括其表面經離型處理者。這些表膜層之厚度 以5至1 2 0/z m為佳。不足5// m時膜易破損,因此易變成不 良。超過1 2 0 // m時,後續工程中捲取膜時易產生縐折。降 低其作業性。 如第2圖及第1 3圖所示,本發明之轉移膜可以以轉移 原模緊壓於基膜與底漆層形成之被轉移層上轉移形狀於轉 移原膜作為暫時支撐體,再於暫時支撐體上轉移其轉移原 模之面上形成薄膜層(在第2圖及第1 3圖中,層積表膜層形 成保護薄膜層),暫時支撐體上未層積薄膜層之面構成對 被轉移基材之接著面。轉移膜上之薄膜層轉移於基材上之 方法,可例舉如第4圖所示剝離表膜層,再加熱壓著在例 如玻璃基材之被轉移基材上等。在必須要求密接性之場 合,可以使用必要之藥液等洗淨基材,或在基材上塗布賦 接著劑,或基材照射紫外線等方法。薄膜層轉移之裝置,314175.ptd Page 30 583465 V. Description of the Invention (20) Introduction 2, Toei Shunhei, Asakura Bookstore, 1976. In the case of reflection using the difference in refractive index, in addition to metal, it is also possible to form a film such as I TO or tantalum pentoxide, an oxide film such as silane or aluminum, or an oxide film by vacuum evaporation or sputtering. Nitride film. Or a laminated film with a low refractive index is used as the thin film layer monomer. The thickness of the reflective film is preferably from 0.01 to 50 // m. The necessary part of the reflective film can also be patterned by photolithography or photomask evaporation. In order to protect the transfer surface of the thin film layer on the substrate, it is better to provide a surface film layer as a protective film. The surface film layer is preferably one which is chemically and thermally stable and is easily peeled from the film layer. Specifically, those having a thin sheet shape such as polyethylene, polypropylene, polyethylene terephthalate, and polyvinyl alcohol and having a high surface smoothness are preferred. In order to impart releasability, the surface is also released. The thickness of these surface film layers is preferably 5 to 120 / z m. When the thickness is less than 5 // m, the membrane is easily damaged, and therefore it is liable to become defective. When it exceeds 1 2 0 // m, creases are likely to occur when the film is wound in the subsequent process. Reduce its workability. As shown in FIG. 2 and FIG. 13, the transfer film of the present invention can be pressed on the transferred layer formed by the base film and the primer layer by the transfer original mold, and the shape of the transfer original film can be used as a temporary support. A film layer is formed on the surface of the temporary support body after transferring the original mold (in Figs. 2 and 13, the surface film layer is laminated to form a protective film layer), and the surface of the temporary support body is not laminated with a film layer. Adhesion to the transferred substrate. The method of transferring the thin film layer on the transfer film to the substrate can be exemplified by peeling off the surface film layer as shown in Fig. 4 and heating and pressing it on a transferred substrate such as a glass substrate. Where adhesion is required, the substrate can be cleaned with necessary chemicals, etc., or an adhesive can be applied to the substrate, or the substrate can be irradiated with ultraviolet rays. Device for film layer transfer,
314175.ptd 第31頁 583465 五、發明說明(21) 以使用可以將基材 滾輪使薄膜層緊壓 佳。如此在基材表 圍為佳。此時薄膜 凹凸形狀較易再現 堊大破薄膜層,因 效率好的擴散反射 為保持其可擴 場合,可以使薄膜 可舉如碳弧燈、超 金屬燈、日光燈、 曝光可在自暫 曝光後亦有再 板等加熱者。 本發明中以使 匕及傾斜面⑻構 溝底線平行因傾斜 大略下方者較佳, 圖之左側面向顯示 以上以反射型 板可以使用在必須 以下以實施例 L貫施例] 實農教1 失於可加 於基材上 面上形成 層之膜厚 。膜厚相 此產生不 板。 散光之形 層曝光, 向壓水銀 鎢燈等。 時支撐體 經暖風加 熱、加壓 ,並送出 之薄膜層 凹凸形狀 同,或較 須要之平 狀,在光 使其感光 燈、高壓 剝離前或 熱爐、或 之橡膠滾 基材之滾 膜厚以〇 . 之最大高 缚之场合 面告卩,不 硬化性樹 、硬化。 水銀燈、 剝離後施 紅外線加 用在反射型液晶顯禾器上, 成之鋸齒狀橫切面上’與表 所產生之高低差之大者在面 第5圖所示為反射变LCD之一 晝面大略下方,其反射特性 液晶顯示器說明,但本發明 擴散反射外部光線之顯示裝 具體說明本發明。 輪間,轉動 輪層壓機為 1至5 0// m範 低差大於者 ’原模凸處 易得到反射 脂組成物之 曝光機之例 或燈、鹵化 行。 熱爐、電熱 在其垂直面 面之脊頂及 向顯示畫面 例,使第5 較佳。 之擴散反射 置上。314175.ptd Page 31 583465 V. Description of the invention (21) The film roller can be pressed tightly by using the substrate roller. This is preferable around the substrate. At this time, the concave-convex shape of the film is easier to reproduce the large cracked film layer. Due to the efficient diffusion reflection to maintain its expandable occasions, the film can be lifted such as carbon arc lamps, supermetal lamps, fluorescent lamps, and exposure can also be performed after the temporary exposure. There are reheaters. In the present invention, it is better to make the bottom line of the dagger and the inclined plane parallel to the bottom of the trench because the slope is slightly lower. The left side of the figure shows the above. The reflective plate can be used. The following examples must be used. The film thickness can be formed on the substrate. The film thickness is not flat. Layers of astigmatism, layer exposure, pressure on mercury tungsten lamps, etc. When the support body is heated and pressurized by warm air, the concave-convex shape of the thin film layer sent out is the same or flat than necessary. Before the light is exposed to the photosensitive lamp, high-pressure peeling or hot furnace, or the rolling film of the rubber rolling substrate The thickest occasions with thickness of 0.% are not observed, the hardening tree is not hardened. The mercury lamp and the infrared rays applied after peeling off are applied to the reflective liquid crystal display device. The zigzag cross-section of the surface is the greater of the difference between the height of the surface and the surface. Figure 5 shows a daylight surface of the reflective LCD. Below, the reflection characteristics of the liquid crystal display will be described, but the display device that diffuses and reflects external light according to the present invention will specifically explain the present invention. Rotate between wheels. The laminator is in the range of 1 to 5 0 // m. The difference is greater than that of the original mold. ’The convex part of the original mold is easy to get reflection. For example, the top of the ridge and the direction of the display screen of the heating furnace and electric heating on the vertical plane make the fifth preferred. The diffuse reflection is set.
3l4175.ptd 第32頁 583465 五、發明說明(22) 如第1圖所示,旋轉一直徑130mm圓筒狀鐵製基材同時 進行鍍銅,即得一在鐵上疊積2 0 0// m銅之原模基材。其表 面再研磨加工成鏡面。其次,一面旋轉一面再以右半邊末 端角度0度、左半邊末端角度8 0度組合之鑽石針連續作螺 旋雕刻,即得一全面形狀為波長2 7 // m、振幅2 . 5 // m、傾 斜角1 0度正弦波彎曲之傾斜面(b ),與垂直面(a )以2 5// m 間隔配置之筒。其次,再浸潰於以下所示之銅電鍍液中, 並一面旋轉,以調節電流密度(電鍍面積1 0平方公分之電 流值)為8A/平方公寸之電流進行拋光電鍍後,再於相同電 鍍液中以調節電流密度為2 A /平方公寸之電流進行表面粗 化電鍍後,為去除電鍍液目的再以純水洗淨。其次,為抑 制銅氧化,再浸潰於下述鎳電鑛液中,一面以調節電流密 度為2A/平方公寸之電流進行拋光鍍鎳,即得一原模。 銅電鍍液: 硫酸銅 210g/公升 硫酸 60g/公升 硫脲 0. Olg/公升 糊精 0· Olg/公升 鹽酸 0. Olg/公升 液溫 3 0°C 鎳電鍍液: 硫酸鎳 240g/公升 氯化鎳 4 5g/公升 硼酸 30g/公升3l4175.ptd Page 32 583465 V. Description of the invention (22) As shown in Figure 1, rotating a 130mm diameter cylindrical iron substrate and performing copper plating at the same time results in a stack of 2 0 0 // on the iron m copper master substrate. The surface is then ground to a mirror finish. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a comprehensive shape with a wavelength of 2 7 // m and amplitude of 2.5 5 // m The inclined surface (b) with a sine wave bent at an inclination angle of 10 degrees, is arranged at a distance of 2 5 // m from the vertical surface (a). Next, immerse it in the copper plating solution shown below and rotate it to adjust the current density (the current value of the plating area is 10 square centimeters) to a current of 8A / square inch for polishing and plating. After roughening the surface of the plating solution with a current adjusted to a current density of 2 A / square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the nickel electro-mineral fluid described below. One side was polished and nickel-plated at a current of 2A / cm² to adjust the current density to obtain a master mold. Copper plating solution: copper sulfate 210g / litre sulfuric acid 60g / litre thiourea 0. Olg / litre dextrin 0 · Olg / litre hydrochloric acid 0. Olg / litre liquid temperature 3 0 ° C Nickel plating solution: nickel sulfate 240g / litre chloride Nickel 4 5g / liter boric acid 30g / liter
314175.ptd 第33頁 583465 五、發明說明(23) ' ~~-—314175.ptd Page 33 583465 V. Description of the Invention (23) '~~ ---
浴溫 3 (TC 上基膜上再使用厚1 〇 0// m之聚對苯二甲酸乙二醇酯膜, 在4基膜上再以旋塗機塗布2 〇// _之光硬化性樹脂溶液 作為底漆層。其次再緊壓於前述轉移原模,再照射紫外 使光硬化性樹脂硬化後再自原模分離,即成一光硬化二 脂層(即底漆層)表面形成轉移原模凹凸形狀之轉: 光硬化性樹脂(底漆層)溶液: 、 5重量份 8重量份 2重量份 3重量份 2重量份 2· 5重量 丙烯酸-丙烯酸丁酯—乙酸乙烯酯共聚體 乙酸丁酯(單體) 乙酸乙烯酯(單體) 丙烯酸(單體) 丙烯酸己二醇酯(單體) 苯偶因異丁醚(起始劑) 。j里重〉 其次,再於光硬化性樹脂(底漆層)上以旋塗機塗布 述薄膜層形成用溶液,乾燥成平均膜厚為8# m厚之^,即 成為一上覆聚乙烯膜表膜層之轉移膜(第2圖)。其次',如P 第4圖所示’將該轉移膜之表膜層剝離,以層壓機(、、旁7 壓機HLM1500,日立化成Technoplant公司製造,商曰、 在基材溫度9 0°C、滾筒溫度8 0°C、滾筒壓力 °印 0.686MPa(7kg/cm2)、速度〇·5πι/分鐘下進行層壓, ^ 玻璃基材上疊積薄膜層、光硬化性樹脂層(底漆〜即$ = 之基材。其次,再剝離光硬化性樹脂層(底漆層)θ、美二、 即得一玻璃基材上含轉移原模相同凹凸形狀之薄膜^ #豆 次,再於烘箱中以2 3 0°C進行熱硬化3〇分鐘,再以直Bath temperature 3 (On the base film, a polyethylene terephthalate film with a thickness of 1000 // m is used, and then on the 4 base film, a photo-curing property of 2 // _ is applied by a spin coater. The resin solution is used as the primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiated with ultraviolet light to harden the photo-curable resin and then separated from the original mold to form a photo-curable di-fat layer (ie, the primer layer). Conversion of mold uneven shape: Photocurable resin (primer layer) solution: 5 parts by weight, 8 parts by weight, 2 parts by weight, 3 parts by weight, 2 parts by weight, 2.5 parts by weight, acrylic acid-butyl acrylate-vinyl acetate copolymer butyl acetate Ester (monomer) Vinyl acetate (monomer) Acrylic acid (monomer) Hexanediol acrylate (monomer) Benzoin isobutyl ether (starter). The weight of the second> Next, the photocurable resin (Primer layer) The solution for forming a thin film layer is applied on a spin coater and dried to an average film thickness of 8 # m thick, which becomes a transfer film overlying the surface layer of a polyethylene film (Figure 2) . Secondly, as shown in Figure 4 of P, the surface film layer of the transfer film is peeled off, and a laminator (,, side 7 Machine HLM1500, manufactured by Hitachi Chemical Co., Ltd., said that lamination was performed at a substrate temperature of 90 ° C, a roller temperature of 80 ° C, a roller pressure of 0.686 MPa (7 kg / cm2), and a speed of 0.5 μm / minute. ^ The glass substrate is laminated with a thin film layer and a photocurable resin layer (primer ~ that is, the substrate of $ =. Secondly, the photocurable resin layer (primer layer) θ, Meiji is peeled off, and a glass is obtained. The substrate contains a film with the same concave and convex shape of the transferred original mold ^ # 豆 次, then heat-hardened in an oven at 230 ° C for 30 minutes, and then straightened.
314175.ptd 第34頁 583465 五、發明說明(24) 鍍法疊積膜厚0 · 2// m之鋁薄膜形成反射層,即製成一擴散 反射板。 第6圖所示為測定本發明擴散反射板反射特性之裝 置。反射光2 0與入射光1 9形成之角度為反射角(9 ,其必要 之0範圍内擴散反射板法線方向所可觀測之亮度,即其反 射強度越大者1即為反射特性越優良之擴散反射板。 捧巧Ϊ丄\圖所示為在方位角Q )30度之場合,本實施例之 角之依存性。;票準白色板之相繼)對入射 =1 6度時所得之反射強度 0 = 3 0度及—3 0度下反射角0 射強度為20之反射特性"〇 ’方位角必=0度時所得之反 薄膜層形成用溶液: 々之擴散反射板。 水合物使用苯乙婦、甲基 ^314175.ptd Page 34 583465 V. Description of the invention (24) A thin aluminum film with a film thickness of 0 · 2 // m is formed by a plating method to form a reflective layer, and a diffuse reflection plate is formed. Fig. 6 shows a device for measuring the reflection characteristics of the diffuse reflection plate of the present invention. The angle formed by the reflected light 20 and the incident light 19 is the reflection angle (9, which is the observable brightness of the diffuse reflection plate normal direction within the necessary 0 range, that is, the greater the reflection intensity, the better the reflection characteristics. The diffuse reflection plate. The figure shows the dependency of the angle of this embodiment when the azimuth angle Q) is 30 degrees. ; Succession of the quasi-white plate) The reflection intensity obtained when the incidence = 16 degrees is 0 = 30 degrees and the reflection angle at -30 degrees 0 The reflection characteristics of the radiation intensity of 20 " 〇 'azimuth must be 0 degrees The obtained solution for forming an inverse thin film layer at the time: a diffused reflection plate of rhenium. Hydrate uses acetophenone, methyl ^
酸、縮水甘油甲基丙烯㉟缔酸甲6旨、丙烯酸乙S旨、丙稀 量約3 5 0 〇 〇,酸價為1 1 〇 /、♦體樹脂(聚合物A )。分子 聚合物A 四丙稀酸五丁四醇能 70重量份 引加進-3 6 9 (Chiba s乎體) 30重量份 eciality Chemicals)(起始劑) N,N-四乙基〜4 4,一一 2. 2重量份 丙二醇單甲醚(溶劑)土本酿苯(引發劑)2 · 2重量份 對甲氧基笨紛(抑;合 4 9 2重量份 全氟代烷氧酸燒g旨(界〜) 0· 1重量份 實112 1面活性劑) 0. 01重量份Acid, glycidyl methacrylic acid, methyl methacrylate, ethyl acrylate, acrylic acid, acrylic acid, acrylic acid, acrylic acid, acrylic resin, polymer resin (Polymer A). Molecular polymer A Tetrapropane pentaerythritol can be added to 70 parts by weight of -3 9 (Chiba shu body) 30 parts by weight of sociality chemicals (starter) N, N-tetraethyl ~ 4 4 1, 2 2 parts by weight of propylene glycol monomethyl ether (solvent), Benzene (initiator), 2 · 2 parts by weight of p-methoxybenzene (inhibited; combined with 4 9 2 parts by weight of perfluoroalkanoic acid) 01 重量 份 g purpose (boundary ~) 0 · 1 parts by weight of solid 112 1 surfactant) 0.01 parts by weight
314175.ptd 第35頁 583465 五、發明說明(25) 一-——^ 、以真空蒸鍍法在實施例1所得之轉移基膜凹凸面上步 成膜厚〇. 2// m之鋁薄膜,疊積成反射層。即可得到在v 角0 =30度及-30度下反射角0 =18度時所得之反射強度 40,方位角0 =〇度下反射角0 =18度時所得之反射強度為 1 8,反射特性優良之擴散反射板。實施例丨為與轉移原桓 相同之凹凸形狀,實施例2為轉移原模之凹凸相反之形、 狀。 實施例3 ^使用玻璃基材為基材,再以與實施例1相同之薄膜層 形成用溶液塗布,再以2〇〇〇轉旋鍍塗布15秒鐘、以 電熱板加熱2分鐘,即得8// m之薄膜層。其次,再如實 例同樣以聚對苯二曱酸乙二醇酯形成丨〇 m之基膜,再 ^ ^機塗布光硬化性樹脂溶液使乾燥成2 _之膜, 亚緊壓轉移原模、照射紫外線使光硬化性樹脂層(即底漆 層)硬化:再自原模分離,即成一光硬化性樹脂層(即底漆 層)表面形成轉移原模凹凸形狀之轉移基膜。該轉移基膜+ 之凹凸面再如前述對薄膜層以層壓機(滾筒層壓機 、 HLM1500’日立化成Technoplant株式會社製造,商品名) 在基材溫度9 0°C、滾筒溫度8 0°C、滾筒壓力 L 68 6MPa(7kg/cm2)、速度〇· 5m/分鐘下進行層壓,即得— 玻璃基材上豐積薄膜層、光硬化性樹脂層(底漆層)、基暝 之基材。再以曝光裝置照射紫外線,其次再剝離光硬化性 樹脂層(底漆層)及基膜,即成一玻璃基材上有與轉移原模 相同凹凸形狀之薄膜層。其次,再於烘箱中以2 3 0°C進行314175.ptd Page 35 583465 V. Description of the invention (25) A --- ^, an aluminum thin film having a thickness of 0.2 // m is formed by vacuum evaporation on the uneven surface of the transfer base film obtained in Example 1 , Stacked into a reflective layer. It can be obtained that the reflection intensity is 40 when the reflection angle is 0 = 18 degrees at v angle 0 = 30 degrees and -30 degrees, and the reflection intensity is 18 when the reflection angle is 0 = 18 degrees at azimuth angle 0 = 0 degrees. Diffusion reflector with excellent reflection characteristics. Example 丨 has the same uneven shape as that of the transfer original, and Example 2 has the opposite shape and shape of the unevenness of the transfer original mold. Example 3 ^ Using a glass substrate as a substrate, and then coating with the same solution for forming a thin film layer as in Example 1, and then spin-coating at 2000 rotations for 15 seconds, and heating with a hot plate for 2 minutes, 8 // m thin film layer. Secondly, as in the example, a polyethylene terephthalate film is also used to form a base film of 0 m, and then a photo-curable resin solution is applied to the machine to dry it into a film of 2 mm. Irradiate ultraviolet light to harden the photo-curable resin layer (that is, the primer layer): then separate from the original mold to form a transfer base film on the surface of the photo-curable resin layer (that is, the primer layer) that transfers the uneven shape of the original mold. The embossed surface of the transfer base film + was again laminated to the film layer using a laminator (roller laminator, HLM1500 'manufactured by Hitachi Chemical Co., Ltd., trade name) at a substrate temperature of 90 ° C and a roller temperature of 80 ° C. Roller pressure L 68 6 MPa (7 kg / cm2) and lamination at a speed of 0.5 m / min, that is to obtain — a thick film layer on the glass substrate, a photocurable resin layer (primer layer), Substrate. Then, the exposure device was irradiated with ultraviolet rays, and then the photo-curable resin layer (primer layer) and the base film were peeled off to form a thin film layer having a concave-convex shape on the glass substrate and the transfer mold. Secondly, in the oven at 230 ° C
第36頁 583465 五、發明說明(26) 熱硬化3 0分鐘,再以真空蒸鍍法疊積膜厚0 . 2/z m之鋁薄膜 形成反射層,製成一擴散反射板。如此得到反射特性優良 之擴散反射板,方位角0 = 3 0度及-3 0度下反射角0 = 1 6度 時所得之反射強度為4 0,方位角0 = 0度下反射角0 = 1 6度 時所得之反射強度為2 0。 實施例 4 以如實施例1所示之第1圖之相同方法,旋轉一直徑 1 3 0 mm圓筒狀鐵製基材同時進行銅電鍍,即得一在鐵上疊 積2 0 0 // m銅之原模基材。其表面再研磨加工成鏡面。其 次,一面旋轉一面再以右半邊末端角度0度、左半邊末端 角度8 0度組合之鑽石針連續作螺旋雕刻,即得一全面形狀 為波長25// m至29// m之非一定、不規則波長,振幅2. 3// m 至2 . 5// m之非一定、不規則振幅,傾斜角1 0度成各種波形 之正弦波,連續排列成有波形彎曲之傾斜面(b ),與垂直 面(a)以25// m至27// m之非一定、不規則間隔配置之筒 型。其與實施例1之不同點為其凹凸無週期性。其次,再 一面旋轉一面浸潰於實施例1相同之銅電鍍液中,以調節 電流密度(電鍍面積1 0平方公分之電流值)為8A/平方公寸 之電流進行拋光電鍍後,再於相同電鍍液中以調節電流密 度為2 A /平方公寸之電流進行表面粗化電鍍後,為去除電 鑛液之目的再以純水洗淨。其次,為抑制銅氧化,再浸潰 於實施例1相同之鎳電鍍液中,一面以調節電流密度為2 A / 平方公寸之電流進行拋光電鍍,即得一轉移原模。 以下以如實施例1相同,由此轉移原模製作擴散反射Page 36 583465 V. Description of the invention (26) Heat harden for 30 minutes, and then laminate aluminum film with a film thickness of 0.2 / z m by vacuum evaporation to form a reflective layer to make a diffuse reflection plate. In this way, a diffuse reflection plate with excellent reflection characteristics is obtained. The reflection intensity obtained when the reflection angle is 0 = 16 at azimuth angles of 0 = 30 degrees and -30 degrees is 4 degrees, and the reflection angle is 0 at azimuth angles of 0 = 0 degrees. The reflection intensity obtained at 16 degrees is 20. Example 4 In the same manner as in the first figure shown in Example 1, a cylindrical iron substrate with a diameter of 130 mm was rotated and copper plating was performed at the same time to obtain a stack of 2 0 0 on the iron. m copper master substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a non-constant, full shape with a wavelength of 25 // m to 29 // m. Irregular wavelengths with irregular and irregular amplitudes ranging from 2.3 // m to 2.5 // m. The inclination angle is 10 degrees to form a sine wave of various waveforms, which are continuously arranged into an inclined surface with a curved waveform (b) A cylindrical shape arranged at an irregular and irregular interval of 25 // m to 27 // m with the vertical plane (a). It is different from Example 1 in that the irregularities are non-periodic. Secondly, immersed in the same copper plating solution as in Example 1 while rotating, immersed in the same copper plating solution as in Example 1, and adjusted the current density (the current value of the plating area 10 square centimeters) to 8A / square inch, then polished and plated again The surface of the plating solution is subjected to roughening electroplating at a current of 2 A / cm², and then washed with pure water for the purpose of removing the electric mineral liquid. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel plating solution as in Example 1 and polished and electroplated with a current adjusted to a current density of 2 A / cm 2 to obtain a transfer master. Hereinafter, the same as in Example 1 is used to transfer the original model to produce diffuse reflection.
314175.ptd 第37頁 583465 五、發明說明(27) 板。此得到反射特性優良之擴散反射板,方位角0 = 3 0度 及-3 0度下反射角0 = 1 8度時所得之反射強度為4 0,方位角 0二0度下反射角0 = 1 8度時所得之反射強度為1 8。 比敕例」 以如實施例1所示第1圖之相同方法旋轉一直徑1 3 0 mm圓筒狀鐵製基材進行鍍銅,即得一在鐵上疊積2 0 0// m銅 之原模基材。其表面再研磨加工成鏡面。其次,一面旋轉 一面再以右半邊末端角度0度、左半邊末端角度80度組合 之鑽石針連續作螺旋雕刻,即得形狀由鑽石針全面以無振 幅、傾斜角1 0度、傾斜平面與垂直面(a )以2 5// m間隔配置 排列之筒型。其與實施例1之不同點為垂直於鋸齒狀橫切 面之傾斜面(b )之橫切面並非有振幅之波形、有一定之傾 斜平面。其次,再一面旋轉一面浸潰於以下所示之銅電鑛 液中,以調節電流密度(電鍍面積1 0平方公分之電流值)為 8A/平方公寸之電流進行拋光電鍍後,再於相同電鍍液中 以調節電流密度為2 A /平方公寸之電流進行表面粗化電鍍 後,為去除電鍍液之目的再以純水洗淨。其次,為抑制銅 氧化,再浸潰於實施例1相同之鎳電鍍液中,一面以調節 電流密度為2A/平方公寸之電流進行拋光鍍鎳,即得一轉 移原模。 以下與實施例1相同,由該比較例之轉移原模製作擴 散反射板。其方位角0 = 3 0度及-3 0度下反射角0 = 1 8度時 所得之反射強度為2,因此無法得到充份之反射強度。比 較例1與實施例1之不同點為擴散反射板與轉移原模之凹凸314175.ptd Page 37 583465 V. Description of Invention (27) Board. This results in a diffuse reflection plate with excellent reflection characteristics. The reflection intensity at a reflection angle of 0 = 30 degrees at azimuth angles of 0 = 3 and -3 degrees is 0. The reflection intensity obtained at 8 degrees is 40, and the reflection angle at an angle of azimuth angles of 0 to 20 degrees is 0 = The reflection intensity obtained at 18 degrees is 18. Comparison Example "In the same way as in the first figure shown in Example 1, a cylindrical iron substrate with a diameter of 130 mm was rotated for copper plating, and a copper stack of 2 0 0 // m on the iron was obtained. The original substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half of the end angle of 0 degrees and the left half of the end angle of 80 degrees is continuously engraved spirally. The surface (a) is a cylindrical shape arranged at an interval of 2 5 // m. The difference from Embodiment 1 is that the cross-section of the inclined surface (b) perpendicular to the sawtooth-shaped cross-section is not a waveform with an amplitude and a certain inclined plane. Secondly, while immersed in the copper electro-mineral fluid shown below while rotating and polishing and electroplating at a current of 8 A / cm 2 by adjusting the current density (the current value of the plating area of 10 cm 2), the same The surface of the plating solution is subjected to roughening electroplating at a current of 2 A / cm², and then washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel plating solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2A / cm² to obtain a transfer original mold. Hereinafter, it is the same as in Example 1, and a diffuse reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle is 0 = 18 degrees at -30 degrees, the reflection intensity obtained is 2, so it is impossible to obtain sufficient reflection intensity. The difference between Comparative Example 1 and Example 1 is the unevenness of the diffuse reflection plate and the transfer master.
314175.ptd 第38頁 583465 五、發明說明(28) 面上之傾斜面(b )為傾斜平面。 實J[例 如第1 2圖所示,除以右半邊末端角度0度、左半邊末 端角度為末端部份8 5 . 5度及7 5 . 5度組合之鑽石針外,如同 實施例1處理,即得形狀如第1 7圖所示,由橫切面為週期 27// m、含振幅2.5// m正弦波之彎曲的傾斜面(b )之波形, 與垂直面(a)以25// m間隔全面排列之筒型。其次,再一面 迴轉一面浸潰於實施例1中所使用之相同銅電鍍液中,以 調節電流密度(電鍍面積1 0平方公分之電流值)為8A/平方 公寸之電流進行拋光電鍍後,再於相同電鍍液中以調節電 流密度為2 A /平方公寸之電流進行表面粗化電鍍後,為去 除電鍍液之目的再以純水洗淨。其次,為抑制銅氧化,再 浸潰於實施例1相同之鎳電鍍液中,一面以調節電流密度 為2A/平方公寸之電流進行拋光鍍鎳,即得一轉移原模。 基膜上再使用厚1 0 0// m之聚對苯二甲酸乙二醇酯,在 該基膜上再以旋塗機塗布光硬化性樹脂溶液,乾燥成2 0// m厚之膜作為底漆層。其次再緊壓於前述轉移原模上,再 照射紫外線使光硬化性樹脂硬化後再自轉移原模分離,即 成一光硬化性樹脂層(即底漆層)表面形成轉移原模凹凸形 狀之轉移基膜。 其次,再於光硬化性樹脂(底漆層)上以旋塗機塗布實 施例1中使用之相同薄膜層形成用溶液,乾燥成平均膜厚 為8// m厚之膜,即成為一上覆聚乙烯膜表膜層之轉移膜 (第1 3圖)。其次,如第4圖所示,將該轉移膜之表膜層剝314175.ptd Page 38 583465 V. Description of the invention The inclined plane (b) on the plane (28) is an inclined plane. Real J [For example, as shown in Fig. 12, except that the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of the end portion is 85.5 degrees and 75.5 degrees, it is treated as in Example 1. The shape of the curved inclined surface (b) with a period of 27 // m and a sine wave with an amplitude of 2.5 // m as shown in Fig. 17 and the vertical plane (a) is 25 / / m spaced-apart cylinders. Secondly, immersed in the same copper plating solution used in Example 1 while rotating and polishing and electroplating at a current of 8 A / cm 2 by adjusting the current density (the current value of the plating area of 10 cm 2), After the surface roughening plating is performed in the same plating solution with a current density of 2 A / square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress copper oxidation, it was immersed in the same nickel plating solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2A / cm 2 to obtain a transfer master. On the base film, a polyethylene terephthalate with a thickness of 100 // m is used. On the base film, a photo-curable resin solution is applied by a spin coater and dried to a thickness of 20 // m. As a primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiated with ultraviolet rays to harden the photo-curable resin and then separated from the original transfer mold to form a photo-curable resin layer (that is, a primer layer). Base film. Next, the same film-layer-forming solution used in Example 1 was coated on the photocurable resin (primer layer) with a spin coater, and dried to form a film with an average film thickness of 8 // m. A transfer film covered with a polyethylene film surface layer (Fig. 13). Next, as shown in FIG. 4, peel off the surface film layer of the transfer film.
314175.ptd 第39頁 583465 五、發明說明(29) 離,以層壓機(滾筒層壓機HLM 1 5 0 0,日立化成 T e c h η ο p 1 a n t株式會社製造,商品名)在基材溫度9 0°C、滾 筒溫度80C、滾筒壓力0.686MPa(7kg/cm2)、速度0.5m/分 鐘下進行層壓,使薄膜層接著於玻璃基材上,即得一玻璃 基材上疊積薄膜層、光硬化性樹脂層(底漆層)、基膜之基 材。其次,再剝離光硬化性樹脂層(底漆層)、基膜,即得 一玻璃基材上含轉移原模相同凹凸形狀之薄膜層。其次, ,於烘箱中以2 3 (TC進行熱硬化3 〇分鐘,再以真空蒸鍍法 $積膜厚0 · 2# m之鋁薄膜形成反射層,製成一擴散反射314175.ptd Page 39 583465 V. Description of the invention (29) The laminating machine (roller laminator HLM 1 5 0 0, manufactured by Hitachi Kasei T ech η p 1 ant Co., Ltd.) is used as the base material. Laminate at a temperature of 90 ° C, a drum temperature of 80C, a drum pressure of 0.686 MPa (7 kg / cm2), and a speed of 0.5 m / minute, and then attach the film layer to the glass substrate to obtain a laminated film on the glass substrate. Layer, photocurable resin layer (primer layer), base material of base film. Next, the photocurable resin layer (primer layer) and the base film are peeled off to obtain a thin film layer on the glass substrate containing the same uneven shape of the transferred original mold. Secondly, heat-harden in an oven at 23 ° C for 30 minutes, and then use a vacuum evaporation method to form a reflective layer with an aluminum film with a film thickness of 0. 2 # m to form a diffuse reflection.
Μ ~ Ϊ 所不為在方位角(0 ) 30度之場合,本實施例之 下反射角Θ =5至。乂二得到一方位角卜3°度及_30度 0 =〇度下反射角0 %所侍之反射強度為20以上,方位角 特性優良之擴散反射^託度時所得之反射強度為15,反射 實U 6 ° 以真空蒸鍍法在 成膜厚0 · 2 // m之鋁薄:也^ 5所得之轉移基膜凹凸面上形Where M ~ Ϊ are not in the case where the azimuth angle (0) is 30 degrees, the lower reflection angle Θ = 5 ° in this embodiment. 2. Obtain an azimuth angle of 3 ° and _30 degrees at 0 = 0 degrees. The reflection intensity at 20% is more than 20, and the diffuse reflection reflection with excellent azimuth characteristics is 15. The reflection intensity is 15. Reflected solid U 6 ° Shaped by vacuum evaporation on a concave and convex surface of a transfer base film with a film thickness of 0 · 2 // m: 5
反射板。所得為方位f之®積,即形成反射層而製得擴散 度時所得之反射強声 0 — 3 0度及—3 〇度下反射角0 = 7至2 2 =7至2 2度時所得之1 ^ 20以上,方位角0 =〇度下反射角0 散反射板。實施例5子強度為1 5以上,反射特性優良之擴 例6為轉移原模“、、與轉移原模相同之凹凸形狀,實施 、得之凹凸形狀。 、Reflective plate. The result is the product of azimuth f, that is, the reflection strong sound obtained when the reflection layer is formed to obtain the diffusivity of 0-30 degrees and -30 degrees. The reflection angle is 0 = 7 to 2 2 = 7 to 22 degrees. Above 1 ^ 20, the reflection angle is 0 at the azimuth angle of 0 = 0 degrees, and the reflection plate is scattered. The fifth embodiment has a sub-intensity of 15 or more and an excellent reflection characteristic. The sixth embodiment is a transfer original mold, which has the same uneven shape as the original transfer mold.
第40頁 583465 五、發明說明(30) 實 117— 使用玻璃基材為基材,再以與實施例5相同之薄膜層 形成用溶液塗布,再以2 0 0 0轉旋鍍塗布15秒鐘、以9(rc之 電熱板加熱2分鐘,即得m之薄膜層。其次,再如實施 例5同樣以聚對苯二曱酸乙二醇酯形成丨〇吵⑴之基膜,再 以旋塗機塗布光硬化性樹脂溶液乾燥成2〇"蜱之膜,並 緊£轉移原模、照射紫外線使光硬化性樹脂硬化,再自原 模分離,即成一光硬化性樹脂層(即底漆層)表面形成凹凸 形狀之轉移基膜。该轉移基膜之凹凸面再如前述對薄膜層 以層壓機(滾筒層壓機HLM15GG,日立化 式會社製造’商品名)在基材溫度9 〇°c、滾筒溫度8 〇它、 ,同壓力〇.686MPa(7kg/cm2)、速度0.5m /分鐘下進行層 壓’即得一玻璃基材上疊積薄膜層、光硬化性樹脂層(底 漆層)、基膜之基材。再以曝光裝置照射紫外線,其次再 剝離光硬化性樹脂層(底漆層)及基膜,即成一玻璃基材上 有與轉移原模相同凹凸形狀之薄膜層。其次,再於烘箱中 以2 3 0°C進行熱硬化30分鐘,再以真空蒸鍍法疊積膜厚〇· μ m之鋁薄膜形成反射層。如此得到反射特性優良之擴散 反射板,方位角0 =30度及—3〇度下反射角0 =5至25度時所 得之反射強度為20以上,方位角0 =〇度下反射角0 =5至25 度時所得之反射強度為丨5以上。 达例2 如在實施例5中所示第1 2圖之相同方法,旋轉一直徑 130mm圓筒狀鐵製基材進行鍍銅,即得一在鐵上疊積2〇^Page 40 583465 V. Explanation of the invention (30) Practice 117—Using a glass substrate as the substrate, coating with the same solution for forming a thin film layer as in Example 5, and then spin-coating at 2000 for 15 seconds 2. Heat a 9-rc hot plate for 2 minutes to obtain a thin film layer of m. Secondly, as in Example 5, a polyethylene terephthalate is used to form a base film, and then spin. The coater coats the photo-curable resin solution and dries into a film of "20", and then transfers the original mold, irradiates ultraviolet light to harden the photo-curable resin, and then separates from the original mold to form a photo-curable resin layer (that is, the bottom Lacquer layer) The surface of the transfer base film is formed in a concave and convex shape. The convex and concave surface of the transfer base film is then laminated to the film layer by a laminator (roller laminator HLM15GG, manufactured by Hitachi Chemical Co., Ltd.) at a substrate temperature of 9 〇 ° c, roller temperature 80 ℃, laminating at the same pressure 0.6686MPa (7kg / cm2) and speed 0.5m / min to obtain a laminated film layer and photocurable resin layer on a glass substrate ( Primer layer), the base material of the base film, and then exposed to ultraviolet light by an exposure device, followed by peeling The photo-curable resin layer (primer layer) and the base film, that is, a glass substrate with a film layer having the same uneven shape as the original transfer pattern. Next, it is heat-cured in an oven at 230 ° C for 30 minutes. An aluminum thin film with a thickness of 0 μm was formed by vacuum evaporation to form a reflective layer. In this way, a diffuse reflection plate with excellent reflection characteristics was obtained, with an azimuth angle of 0 = 30 degrees and a reflection angle of 0 to 5 to 25 degrees The reflection intensity obtained at degrees is more than 20, and the reflection intensity obtained when the reflection angle is 0 to 5 degrees at an azimuth angle of 0 = 0 degrees is 5 degrees or more. Reached Example 2 As shown in Example 5 Figure 12 In the same way, a 130 mm diameter cylindrical iron substrate is rotated for copper plating, and a stack of 2 ^ on the iron is obtained.
314175.ptd 第41頁 583465 五、發明說明(31) # m銅之原模基材。其表面再研磨加工成鏡面。其次,一 面旋轉一面再以右半邊末端角度0度、左半邊末端角度末 端部份為8 5 . 5度及7 5 . 5度組合之鑽石針連續作螺旋雕刻, 即得形狀為週期2 7// m、無振幅、傾斜平面與垂直面(a )以 2 5// m間隔配置全面排列之筒型。其與實施例5之不同點為 垂直鋸齒狀橫切面之傾斜面(b )橫切面無振幅、有一定之 傾斜平面。其次,再一面旋轉一面浸潰於實施例5中相同 之銅電鍍液中,以調節電流密度(電鍍面積1 0平方公分之 電流值)為8 A /平方公寸之電流進行拋光電鍍後,再於相同 電鍍液中以調節電流密度為2 A /平方公寸之電流進行表面 粗化電鍍後,為去除電鍍液之目的再以純水洗淨。其次, 為抑制銅氧化,再浸潰於實施例1相同之鎳電鑛液中,一 面以調節電流密度為2 A /平方公寸之電流進行拋光鍍鎳, 即得一轉移原模。 以下與實施例5相同,由本比較例之轉移原模製作擴 散反射板。其方位角0 = 3 0度及-3 0度下反射角0 = 1 8度時 所得之反射強度為2,因此無法得到充份之反射強度。比 較例2與實施例5之不同點為擴散反射板與轉移原模之凹凸 面上垂直錯齒狀橫切面上傾斜面(b)橫切面為一定之傾斜 平面。 [產業上利用之可能性] 本發明之擴散反射板之特徵為一新穎之凹凸面形狀, 其目的為改善反射型液晶顯示器、電場發光顯示器、電氣 泳動顯示器等之顯示品質。其特徵為具有彎曲之傾斜面314175.ptd Page 41 583465 V. Description of the invention (31) # m copper master substrate. The surface is then ground to a mirror surface. Secondly, while rotating one side, the diamond needle with a combination of the right half of the end angle of 0 degrees and the left half of the end angle of 8 5 5 degrees and 7 5. 5 degrees is continuously engraved spirally, the shape is cycle 2 7 / / m, non-amplitude, inclined planes and vertical planes (a) are arranged in a fully arranged cylindrical shape at intervals of 25 / m. The difference from the fifth embodiment is that the inclined plane (b) of the vertical sawtooth-shaped cross-section has no amplitude and has a certain inclined plane. Secondly, immersed in the same copper plating solution as in Example 5 while rotating and immersed in the same copper plating solution as in Example 5 to adjust the current density (the current value of the plating area of 10 square centimeters) to 8 A / square centimeter for polishing and plating. After the surface roughening plating is performed in the same plating solution with a current density of 2 A per square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel electric ore solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2 A / cm 2 to obtain a transfer master. Hereinafter, as in Example 5, a diffuse reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle is 0 = 18 degrees at -30 degrees, the reflection intensity obtained is 2, so it is impossible to obtain sufficient reflection intensity. The difference between Comparative Example 2 and Example 5 is that the inclined surface on the uneven surface of the diffuse reflection plate and the transfer original mold is perpendicular to the inclined surface on the cross-section. (B) The cross-section is a constant inclined plane. [Possibility of industrial use] The diffuse reflection plate of the present invention is characterized by a novel concave-convex surface shape, and its purpose is to improve the display quality of reflective liquid crystal displays, electric field light-emitting displays, electrophoretic displays, and the like. It is characterized by a curved inclined surface
314175.ptd 第42頁 583465 五、發明說明(32) (b )與垂直面(a )交相排列之點。該擴散反射板具有使從液 晶元件等顯示器上方方向及左右側方方向等各種方向射入 之外部入射光,可以有效地反射向使用者方向之定向反射 特性,使其可以實現顯示明亮、優良之顯示品質。314175.ptd Page 42 583465 V. Description of the invention (32) (b) The point where the vertical plane (a) intersects and arranges. The diffuse reflection plate has external incident light that is incident from various directions such as the upper direction and the left-right side direction of a display such as a liquid crystal element, and can effectively reflect the directional reflection characteristic toward the user, so that it can achieve bright and excellent display. Display quality.
314175.ptd 第43頁 583465 圖式簡單說明 [圖式簡單說明] 第1圖所示之斷面圖,為本發明第1樣態中轉移原模製 造工程之一例。 第2圖所示之斷面圖,為本發明第1樣態中轉移膜之一 例。 第3圖所示之斷面圖,為本發明第1樣態中擴散反射板 之一例。 第4圖所示之斷面圖,為製造本發明擴散反射板之 例。 第5圖所示之斷面圖,為反射型LCD之一例。 第6圖所示之斜視圖,為擴散反射板反射特性之測定 裝置。 第7圖所示之斜視圖,為本發明第1樣態中擴散反射板 之凹凸面形狀之一例。 第8圖所示之斷面圖,為本發明擴散反射板凹凸面上 傾斜面(b )之波狀之例。 第9圖所示之斷面圖,為實施例1擴散反射板凹凸面上 傾斜面(b )與垂直面(a )交替排列之形狀。 第1 0圖所示之斜視圖,為實施例1擴散反射板凹凸面 之形狀。 第1 1圖所示之圖,為實施例1擴散反射板反射強度對 反射角度之依存性。 第1 2圖所示之斷面圖,為本發明第2樣態中轉移原模 製造工程之一例。314175.ptd Page 43 583465 Brief description of the drawings [Simplified illustration of the drawings] The cross-sectional view shown in Fig. 1 is an example of the transfer of the original mold manufacturing process in the first aspect of the present invention. The sectional view shown in Fig. 2 is an example of a transfer film in the first aspect of the present invention. The cross-sectional view shown in Fig. 3 is an example of a diffuse reflection plate in the first aspect of the present invention. The cross-sectional view shown in Fig. 4 is an example of manufacturing the diffuse reflection plate of the present invention. The cross-sectional view shown in FIG. 5 is an example of a reflective LCD. The oblique view shown in Fig. 6 is a device for measuring the reflection characteristics of a diffuse reflection plate. The oblique view shown in Fig. 7 is an example of the shape of the uneven surface of the diffuser reflection plate in the first aspect of the present invention. The cross-sectional view shown in Fig. 8 is an example of the wave shape of the inclined surface (b) on the uneven surface of the diffuse reflection plate of the present invention. The cross-sectional view shown in FIG. 9 is a shape in which the inclined surfaces (b) and the vertical surfaces (a) are alternately arranged on the uneven surface of the diffuse reflection plate in Example 1. The oblique view shown in Fig. 10 shows the shape of the uneven surface of the diffuser reflection plate of the first embodiment. Fig. 11 is a graph showing the dependence of the reflection intensity of the diffuse reflection plate on the reflection angle in the first embodiment. The cross-sectional view shown in Fig. 12 is an example of a manufacturing process for transferring a master mold in the second aspect of the present invention.
314175.ptd 第44頁 583465 圖式簡單說明 第1 3圖所示之斷面圖,為本發明第2樣態中轉移膜之 一例 。 第1 4圖所示之斷面圖,為本發明第2樣態中擴散反射 板之一例。 第1 5圖所示之斜視圖,為本發明第2樣態中擴散反射 板之凹凸面形狀之一例。 第1 6圖所示之斷面圖,為本發明第2樣態中擴散反射 板凹凸面上傾斜面(b )及垂直面(a )交替排列形狀之例。 第1 7圖所示之斷面圖,為實施例5擴散反射板凹凸面 上傾斜面(b )及垂直面(a )交替排列之形狀。 第1 8圖所示之斜視圖,為實施例5擴散反射板凹凸面 之形狀。 第1 9圖所示之圖,為實施例5擴散反射板反射強度對 反射角度之依存性。 I 銅基材 2 鐵基材 3 鑽石蝕刻刀 4 銅粗化電鍍顆粒 5 鎳 6 玻璃基材 7 薄膜層 8 反射膜 9 基膜(另只在第5圖中為彩色濾光膜) 10 表膜層(另只在第5圖中為黑底) II 底漆層(另只在第5圖中為透明電極) 12 整平膜 13 定向膜 14 液晶層 15 調距層314175.ptd Page 44 583465 Brief description of the drawings The cross-sectional view shown in Figure 13 is an example of a transfer film in the second aspect of the present invention. The sectional view shown in Fig. 14 is an example of a diffuse reflection plate in the second aspect of the present invention. The perspective view shown in Fig. 15 is an example of the shape of the uneven surface of the diffuser reflection plate in the second aspect of the present invention. The cross-sectional view shown in FIG. 16 is an example in which the inclined surfaces (b) and the vertical surfaces (a) of the uneven surface of the diffuse reflection plate in the second aspect of the present invention are alternately arranged. The cross-sectional view shown in FIG. 17 is a shape in which the inclined surface (b) and the vertical surface (a) are alternately arranged on the uneven surface of the diffuse reflection plate of Example 5. The oblique view shown in Fig. 18 shows the shape of the concave-convex surface of the diffuser reflection plate of Example 5. Fig. 19 is a graph showing the dependence of the reflection intensity on the reflection angle of the diffuse reflection plate in Example 5. I Copper base material 2 Iron base material 3 Diamond etching blade 4 Copper rough plating particles 5 Nickel 6 Glass base material 7 Thin film layer 8 Reflective film 9 Base film (otherwise, the color filter film in the fifth picture) 10 Surface film Layer (the black background is only shown in Fig. 5) II primer layer (the transparent electrode is only shown in Fig. 5) 12 Leveling film 13 Orientation film 14 Liquid crystal layer 15 Distance-adjusting layer
314175.ptd 第45頁 583465314175.ptd Page 45 583465
圖式簡單說明 16 相 位 差 膜層 17 偏 光 板 18 樣 品 19 入 射 光 20 反 射 光 21 光 度 計 22 反 射 角 23 方 位 角 24 基 材 表 面 25 鋸 齒 狀 橫切面 26 垂 直 面 (a) 27 傾 斜 面 (b) 314175.ptd 第46頁Brief description of the drawing 16 retardation film layer 17 polarizing plate 18 sample 19 incident light 20 reflected light 21 photometer 22 reflection angle 23 azimuth angle 24 substrate surface 25 jagged cross section 26 vertical plane (a) 27 inclined plane (b) 314175.ptd Page 46
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JP2001366968A JP3900908B2 (en) | 2001-11-30 | 2001-11-30 | DIFFUSING REFLECTOR, TRANSFER DEPOSIT USED FOR PRODUCING THE SAME, TRANSFER BASE FILM, TRANSFER FILM, AND METHOD FOR PRODUCING THE Diffuse Reflecting |
JP2001366969A JP3900909B2 (en) | 2001-11-30 | 2001-11-30 | DIFFUSING REFLECTOR, TRANSFER DEPOSIT USED FOR PRODUCING THE SAME, TRANSFER BASE FILM, TRANSFER FILM, AND METHOD FOR PRODUCING THE Diffuse Reflecting |
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US7794829B2 (en) | 2005-08-31 | 2010-09-14 | Eternal Chemical Co., Ltd. | Reflector having high light diffusion |
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DE102004041868B3 (en) * | 2004-08-27 | 2006-03-02 | Leonhard Kurz Gmbh & Co. Kg | Transfer film, its use and process for the production of decorated plastic articles |
KR101278322B1 (en) * | 2006-09-18 | 2013-06-25 | 엘지전자 주식회사 | Molded material and the display device manufactured by using the molded material |
JP5377824B2 (en) * | 2006-10-30 | 2013-12-25 | 日東電工株式会社 | Anti-glare film, anti-glare sheet, production method thereof, and image display device using them |
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KR920010315A (en) * | 1990-11-29 | 1992-06-26 | 이기천 | Reflector and its manufacturing method |
JP2984801B2 (en) * | 1991-07-03 | 1999-11-29 | 株式会社有沢製作所 | Fresnel reflective screen |
WO1997005521A1 (en) * | 1995-07-28 | 1997-02-13 | Sumitomo Chemical Company, Limited | Reflecting plate, reflection type polarizing plate and reflection type liquid crystal display device |
JP2000321410A (en) * | 1999-03-08 | 2000-11-24 | Ricoh Co Ltd | Production of reflection plate and reflection plate |
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US7794829B2 (en) | 2005-08-31 | 2010-09-14 | Eternal Chemical Co., Ltd. | Reflector having high light diffusion |
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