TW570905B - Glass composition of a substrate for display - Google Patents

Glass composition of a substrate for display Download PDF

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Publication number
TW570905B
TW570905B TW91124481A TW91124481A TW570905B TW 570905 B TW570905 B TW 570905B TW 91124481 A TW91124481 A TW 91124481A TW 91124481 A TW91124481 A TW 91124481A TW 570905 B TW570905 B TW 570905B
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glass
oxide
weight percentage
composition
patent application
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TW91124481A
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Chinese (zh)
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Jau-Jin Liang
Bo-Yi Guo
Jing-Hua Tan
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China Optoelectronics Technolo
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

A glass composition of a substrate for display consisting essentially of, as calculated in weight percent on an oxide basis, of 56.0% to 62.0% SiO2, 13.0% to 18.0% Al2O3, 9.0% to 13.5% B2O3, 1.0% to 8.0% SrO, 0.1% to 8.0% BaO, 3.5% to 8.5% CaO, 0% to 1.0% MgO, 0.1% to 1.5% ZnO, 0.1% to 1.5% ZrO2 and 0% to 1.0% BeO, provided that the total weight percent of CaO, MgO, ZnO, ZrO2 and BeO is preferably within 4.0 to 9.0%.

Description

570905570905

發明背景: (1)發明領域: 本發明係關於一種應用於生產厚度約〇 · 2公釐()到 1·2公釐之顯示器用平板玻璃配方,尤指一種可用以生 液晶顯示器之基板玻璃。 (2 )先前技藝: 按,一般用於生產主動矩陣式液晶顯示器,如··薄膜 電晶體液晶顯示器或類似顯示器,所使用之基板玻璃/,均 屬一種鋁矽酸玻璃,該種玻璃組成中僅含極微量之鹼金屬 氧化物成份,可利用浮式法或下拉法等成型法,製作成平 板玻璃’其中浮式法適用於日產量3 〇领以上之生產規模, 下拉法則適用於日產量約3〜1 〇噸之生產規模。一般言,利 用下拉法製造平板玻璃時,高溫且具流動性之玻璃膏,係 依序先經玻璃熔解爐、澄清槽及冷卻管等裝置,流到具有 平均为配玻璃流量功能之分配槽,再經玻璃板抽引裝置, 將熔融玻璃下拉,徐緩冷卻,而製成平板玻璃。由下 拉成型法能可靠地量產超薄平板玻璃,故適合作為製造液 晶顯示器用基板玻璃之成型法,在其製程中,當玻璃膏流 經熔解爐及澄清槽時,其溫度較高,且具流動性,俟二: 冷卻管時,冷卻管將令其溫度降低,俾流到具有平均分配 玻璃流量功能之分配槽時,能降低到成型所需之溫度,即 令其黏度範圍保持在1〇4·6(泊)之溫度範圍。 一般言,玻璃貧溫度降低時,極易引發玻璃失透或產Background of the invention: (1) Field of the invention: The present invention relates to a flat glass formulation used for the production of displays with a thickness of about 0.2 mm (1 to 2 mm), especially a substrate glass that can be used to produce liquid crystal displays. . (2) Previous technology: According to the general, it is generally used to produce active matrix liquid crystal displays, such as thin film transistor liquid crystal displays or similar displays. The substrate glass used is a kind of aluminosilicate glass. It contains only a very small amount of alkali metal oxide components, and can be made into flat glass by forming methods such as the float method or the pull-down method. The float method is suitable for production scales with a daily output of 30% or more, and the pull-down method is suitable for daily output. Production scale of about 3 ~ 10 tons. Generally speaking, when the flat glass is manufactured by the down-draw method, the high-temperature and fluid glass paste first passes through a glass melting furnace, a clarification tank, and a cooling pipe, and then flows to a distribution tank with an average glass flow function. Then, the molten glass is pulled down through a glass plate extraction device, and then slowly cooled to make flat glass. The down-draw molding method can reliably produce ultra-thin flat glass, so it is suitable as a molding method for manufacturing substrate glass for liquid crystal displays. In the process, when the glass paste flows through the melting furnace and the clarification tank, the temperature is high, and With fluidity, second: When cooling the tube, the cooling tube will reduce its temperature. When it flows to the distribution tank with the function of evenly distributing the glass flow, it can be lowered to the temperature required for molding, that is, its viscosity range is maintained at 104. · Temperature range of 6 (poise). Generally speaking, when the glass lean temperature decreases, it is easy to cause glass devitrification or production.

570905 五、發明說明(2) 生結晶現象’而定義玻璃失透或產生結晶之最高溫度,即 玻璃液相溫度(TL ),因此,玻璃膏溫度在玻璃液相溫度 (TL )以上時’即使經長時間之熱處理,也不致產生失透 或結晶現象。然而,由於玻璃之成型溫度往往和玻璃液相 溫度接近,故若玻璃膏溫度長時間處於玻璃液相溫度以下 時’極易產生失透或結晶,造成玻璃表面或内部發生缺 陷,降低了產品之良率,因此,在玻璃成型製程中,玻璃 成型溫度與玻璃液相溫度間應有適當區隔,而根據實務經 驗,玻璃成型溫度應較玻璃液相溫度高約4 〇。〇以上,才能 有效防止玻璃在成型過程中發生失透或結晶現象。 傳統上’利用下拉成型法製作鋁矽酸玻璃時,其溫度 均係控制在約1 085〜1 250 t間,因此,為了減少玻璃表面 或内σ卩發生失透或結晶等缺陷,一般均係藉提高玻璃成型 μ度或降低玻璃液相溫度等二種做法,使玻璃成型溫度較 玻璃液相溫度高40 °C以上。首先,在提高玻璃成型溫度方 面’由於玻璃貧之黏度會隨玻璃膏温度升高而降低,因 此’,提咼成型溫度將使成型中之玻璃膏黏度降低,不易維 持製品形狀之尺寸精度,而提高成型溫度亦將使冷卻管、 ^有平均分配玻璃流量功能之分配槽及玻璃板徐冷裝置 等,操作在較高之温度狀態,如此,除了增加能源之耗損 外還會減短上述裝置之使用壽命,更會因玻璃膏及上述 裝置在兩溫反應下,令更多雜·質及污染物混入成型後之平 板玻璃内,致產品良率始終無法提高,不符經濟效益。因 此在貫務上’較不傾向採用提高玻璃成型溫度之方式,570905 V. Description of the invention (2) Crystallization phenomenon 'defines the highest temperature of glass devitrification or crystallization, namely the glass liquidus temperature (TL). Therefore, when the glass paste temperature is above the glass liquidus temperature (TL), After a long period of heat treatment, devitrification or crystallization will not occur. However, because the glass forming temperature is often close to the glass liquidus temperature, if the glass paste temperature is below the glass liquidus temperature for a long time, it is very easy to produce devitrification or crystallization, causing defects on the glass surface or inside, which reduces the product Yield, therefore, in the glass forming process, there should be a proper separation between the glass forming temperature and the glass liquid phase temperature, and according to practical experience, the glass forming temperature should be about 40% higher than the glass liquid phase temperature. 〇 above, can effectively prevent the glass from devitrification or crystallization during the molding process. Traditionally, when the alumino-silicate glass is manufactured by the down-draw molding method, the temperature is controlled between about 1 085 and 1 250 t. Therefore, in order to reduce defects such as devitrification or crystallization of the glass surface or internal σ 卩, generally By increasing the glass forming μ degree or lowering the glass liquidus temperature, the glass forming temperature is more than 40 ° C higher than the glass liquidus temperature. First, in terms of increasing the glass molding temperature, 'because the viscosity of the glass lean will decrease with the temperature of the glass paste, so, raising the molding temperature will reduce the viscosity of the glass paste during molding, and it is difficult to maintain the dimensional accuracy of the product shape. Increasing the molding temperature will also enable cooling pipes, distribution tanks with a function of evenly distributing glass flow, and glass plate cooling devices to operate at higher temperatures. In this way, in addition to increasing energy consumption, it will also shorten the above devices. The service life will be caused by the glass paste and the above-mentioned device under the two-temperature reaction, so that more impurities, impurities and pollutants are mixed into the flat glass after molding, so the product yield can not always be improved, which is not in line with economic benefits. Therefore, in practice, it ’s less inclined to adopt a method of increasing the glass forming temperature,

第5頁 570905 五、發明說明(3) — 而係以降低玻璃液相溫度,為較常採用之方案。 在調控玻璃液相溫度時,一般係藉調整玻璃組成成 份,亦即將玻璃組成成份之液相溫度,調降到較成型下限 溫度1 0 8 5 C低4 0 c (即1 〇 4 5 °c ),或更低之溫度,但玻璃 組成成份一經變動,除了玻璃液相溫度將隨之變動外,其 他重要之物理特性,如:熱膨脹係數、應變點及密度等, 往往也會隨之變動,甚至部份特性會劣化到妨礙玻璃產品 之正常使用。因此,如何調整組成成份,使得在降低玻璃 液相溫度之同時,其他重要之物理特性,亦不至過度劣 化,即成為調整玻璃組成成份時之關鍵重點。 另’針對生產液晶顯示器所使用之玻璃,特別是生產 薄膜電晶體液晶顯示器所使用之玻璃,在其物理特性上之 要,,特別嚴格,因此,玻璃之熱膨脹係數、應變點及密 度等重要特性,應必須一併列入評估考量之重點。一般 吕,薄膜電晶體液晶顯示器用玻璃之熱膨脹係數應低於4〇 x 10-V °c,若過高,會影響後續液晶顯示器製程之精確 度’ f玻璃基板貼合組裝困難,其應變點一般應高於65〇 c ’右降低過多’亦會影響製程之精確度,令微影蝕刻之 對位產生偏差’嚴重時,更將導致電路短路或斷路,劣化 其電氣性能’其密度一般應低於2· 55g/cm3,若過大,則 會使液晶顯示器面板重量增加,不利於運用在攜帶型產品 上。 近年來’液晶顯示器用基板玻璃之設計及製造業者, 亦針對該等基板玻璃之組成成份,開發設計出諸多新的製Page 5 570905 V. Description of the Invention (3) — It is the more commonly used solution to reduce the liquidus temperature of the glass. When adjusting the liquidus temperature of glass, it is generally adjusted by adjusting the glass composition, that is, the liquidus temperature of the glass composition is lowered to 1 0 8 5 C, which is 4 0 c lower than the lower limit temperature of the molding (that is, 104 ° C). ), Or lower temperature, but once the glass composition changes, in addition to the temperature of the liquid phase of the glass, other important physical characteristics, such as thermal expansion coefficient, strain point and density, will often also change. Some properties may even deteriorate to prevent normal use of glass products. Therefore, how to adjust the composition so that while lowering the liquidus temperature of the glass, other important physical properties will not be excessively deteriorated, which will become a key focus when adjusting the composition of the glass. In addition, for the glass used in the production of liquid crystal displays, especially the glass used in the production of thin-film transistor liquid crystal displays, the physical characteristics are particularly strict. Therefore, the thermal expansion coefficient, strain point and density of glass are important characteristics. , It must be included in the evaluation considerations. Generally, the thermal expansion coefficient of thin-film transistor liquid crystal display glass should be lower than 40 × 10-V ° c. If it is too high, it will affect the accuracy of the subsequent liquid crystal display process. F The glass substrate is difficult to assemble and assemble, and its strain point Generally, it should be higher than 65 ° c. “Right lowering too much” will also affect the accuracy of the process, causing deviations in the alignment of lithographic etching. “Serious, it will also cause the circuit to be short-circuited or disconnected, which will degrade its electrical performance. If it is lower than 2.55 g / cm3, if it is too large, it will increase the weight of the LCD panel, which is unfavorable for use in portable products. In recent years, the designers and manufacturers of substrate glass for liquid crystal displays have also developed many new systems for the composition of these substrate glasses.

570905 五、發明說明(4) 1 作技術’如:美國專利第58 1 1 36 1號、第58 5 1 9 3 9號及第 6060 1 68號等’依該等專利所揭露之玻璃組成成份製作之 玻璃基f,其玻璃液相溫度仍偏高,約在1〇9〇。〇以上,因 此,該等玻璃在利用下拉法成型時,將會發生前述種種困 擾0 發明綱要 有鑑 成份及生 來對此一 種顯示器 液相溫度 變點及密 本發 其組成之 氧化石夕、 硼、1. 0% 括氧化鈣 份,雖佔 玻璃時之 在基板玻 之重量百 化鎂、0. 1· 0%之氧 器用基板玻璃 之諸多問題, 及研究心得, 成,俾其具有 物理特性,如 般鋁矽酸玻璃 在提供一種顯 量百分比分別 氧化鋁、9. 0% 及〇· 1% 至8. 0% 辞、氧化鍅及 比較低,但由 解度,有著極 具有舉足輕重 至8. 5%之氧化 辞、0 · 1 % 至 1. 、氧化鎮、氧 於傳統液晶顯示 產製造上所存在 領域之實務經驗 用基板玻璃之組 ,而其他重要的 度等’則仍與一 明之一目的,係 主要成份包括重 13· 0% 至 18· 〇% 之 至8· 0%之氧化鳃 、氧化鎂、氧化 整體重量之百分. 玻璃膏黏度及熔 璃之製程中,仍 分比分別為3. 5% 1%至1· 5%之氧化 化鈹,但氧化鈣 ’長期以來在組成 發明人乃根據多年 開發出本發明之一 低於1045 °C之玻璃 :熱膨脹係數、應 相近。 示器用基板玻璃, 為 56.0% 至 62.0 % 之 至13. 5%之氧化 之氧化鋇,其餘包 氧化鈹等五種成 於該等成份對熔製 為重要之影響,故 之份量,各該成份 詞、〇至1. 0%之氧 之氧化錯及0%至 化鋅、氧化鍅及氧 第7頁570905 V. Description of the invention (4) 1 Working technology 'such as: U.S. Patent Nos. 58 1 1 36 1, 58 5 1 9 3 9 and 6060 1 68, etc.' Glass composition disclosed in these patents The glass-based f of the fabricated glass still has a high liquidus temperature, about 1090. 〇 Above, therefore, when these glasses are formed by the pull-down method, the aforementioned various problems will occur. 0 The outline of the invention has the ingredients and the oxidized stone of the liquid crystal temperature change point and the composition of the display. Boron, 1.0% including calcium oxide, although it accounts for the weight of magnesium in the substrate glass when it is glass, 0.1 · 0% of the substrate glass for oxygen devices, and research experience, it has a physical Characteristics, such as aluminosilicate glass in providing a significant percentage of alumina, 9. 0% and 0.1% to 8. 0%, rhenium oxide and relatively low, but from the resolution, has a very important 8. 5% oxidation, 0.1% to 1., oxidation ballast, oxygen in the field of traditional liquid crystal display manufacturing and the practical experience of the substrate glass group, while other important degrees, etc. 'are still the same One of the goals of the Ming Dynasty is that the main ingredients include 14.0% to 18.0% to 8% of gill oxide, magnesium oxide, and the percentage of the total weight of the oxide. Glass paste viscosity and glass melting process are still divided. Ratio of 3.5% 1% to 1.5% oxidation Beryllium, but calcium oxide has been in the composition for a long time. The inventor has developed one of the inventions based on many years. The glass below 1045 ° C: The coefficient of thermal expansion should be similar. The substrate glass for the indicator is 56.0% to 62.0% to 13.5% of oxidized barium oxide, and the remaining five types include beryllium oxide and other components. These components have important effects on melting, so the amount of each component Word, 0 to 1.0% of oxygen oxidation error and 0% to zinc, hafnium oxide and oxygen page 7

I 570905I 570905

$鈹等成份之總含量,以重量百分比在4 〇%至9 〇%間為最 詳細說明: =發明係在提供_種顯示器用基板玻璃之組成,該玻 璃係:下列2料,依_定之重量百分比,組合而成: (2) (3) (4) (5) (6) (7) (8) (9) (10) 重里百分比56.0%至62.0%之氧化矽(Si〇2); 重量百分比13.0%至18.0%之氧化鋁(Al2〇3); 重^百分比9.0%至13.5%之氧化硼(]82〇3); 重量百分比1.0%至8〇%之氧化鳃(Sr〇) 重,百分比0.1%至8.0%之氧化鋇(Ba0) 重,百分比3. 5%至8. 5%之氧化鈣(Ca〇) 重^百分比0%至1.0%之氧化鎂(Mg〇); 重f百分比0.1%至1.5%之氧化鋅(Zn〇); 重量J分比0.1%至1.5%之氧化锆(Zr〇2); 重量百分比〇%至1〇%之氧化鈹(Be〇); 鈹蓉二:Λ中氧化鈣、氧化鎂、氧化鋅、氧化锆及氧化 0;;^" 物理=發;;:板:=該組成物之重量百分比,將依其 ^ ^ ^ ^ ^ 土板用玻璃之特性、結構及製作等方面,造 所限:響’故各該組成物在重量百分比上必須有 化在田及氧ΐΐί組成物中,氧化石夕、氧化1呂、氧化棚、氧 ^ 鋇#五種成份所佔之重量百分比較多,且對基$ The total content of beryllium and other ingredients is described in the most detailed range between 40% and 90% by weight: = The invention is to provide _ kinds of substrate glass for display, the glass system: the following 2 materials, according to _ Weight percent, combined: (2) (3) (4) (5) (6) (7) (8) (9) (10) Silicon oxide (Si〇2) with a weight percentage of 56.0% to 62.0%; 13.0% to 18.0% by weight of alumina (Al203); 9.0% to 13.5% by weight of boron oxide () 82〇3); 1.0% to 80% by weight of gill oxide (Sr〇) , Percentage 0.1% to 8.0% barium oxide (Ba0) weight, percentage 3.5% to 8.5% calcium oxide (Ca〇) weight ^ percentage 0% to 1.0% magnesium oxide (Mg〇); weight f 0.1% to 1.5% of zinc oxide (Zn〇); 0.1% to 1.5% by weight of zirconia (Zr〇2); 0% to 10% of beryllium oxide (Be〇); beryllium 2: Calcium oxide, magnesium oxide, zinc oxide, zirconia, and oxide in Λ; ^ " Physical = hair;;: plate: = weight percentage of the composition will be used according to its ^ ^ ^ ^ ^ ^ The characteristics, structure, and production of glass are limited by the following reasons: Therefore, each composition The weight percentage must be in the composition of the field and oxygen. The five ingredients of stone oxide, oxidized oxide, oxidized shed, and oxygen ^ barium # accounted for more weight percentages.

五、發明說明(6) 板用玻璃之特性、結構及製七 為重要,故該等成份= 面,所造成之影響,較 料玻璃網路形板之主要成份,其中氧化 R9 n〇/ 〇 又王體,其較佳之含量為56·0%至 失透°,,/一乳方:夕含Λ少於56.0% ’所製作出之玻璃將容易 之熔解溫产太古:ί化石夕含量多於62.0%,將導致玻璃 失透;氧化㈣用以提=1:構:; =丄係在13.°%至18.°%間,若氧化紹含量少: 二易失透’也容易受到外界水氣或化學試 ^ Μ ’另*氧化紹含量多於18.0%,亦將導致玻璃之 用而不利於以一般炫解爐製㊄;氧化棚之作 Π為:熔劑,t要係用以降低炼製玻璃時玻璃膏之黏 :〇%】=量為9.〇%至13.5%,若氧化硼含量少於* 3%,1大Λ效果即無法充分發揮,若氧化蝴含量多於 用11 璃之應變點,不利於後續製程之應 將容易失透,化=多 相似,其較佳之含量為〇.1%至8.〇%,===氧化銷 1% ’玻璃將容易失透,若氧化鋇含量:二化,含1少:〇. 會太高,且應變點會大幅降低。 夕;.%,玻璃密度 在本發明之基板用玻璃中,除 一 氧化硼、氧化鳃及氧化鋇等成份外,;餘矽、氧化鋁、 570905 五、發明說明(7) 整體^ 1之百分比較低,但由於該等成份對熔製玻璃時之 玻璃貧黏度及熔解度,有著極為重要之影響,故在該基板 用玻璃之製程中,仍具有舉足輕重之份量,其中氧化鈣之 作用,,進玻璃之熔解,其較佳含量係介於3.5%至8 5% $ :化劈含=少於3· 5% ’將無法有效降低玻璃之黏 :數:里多於8·5% ’玻璃將容易失透,且熱膨脹 於後續製程之應用;氧化鎂係用以 玻寺玻璃膏之黏心以減少其中之氣泡或不純 含量係介謂至,但若氧化鎖 璃之ΐ解直易失透;氧化鋅亦係用以促進玻 為0·1%Μ.5%,若氧化辞含量少於 0.U,將無法發揮促進玻璃熔解之效、 於1.5% ’玻璃將容易失透 ::化辞“夕 :係,低玻璃之黏度,以=用氧= 無促進玻璃溶解之效果,若氧少則·1%,亦 容易失透;氧化鈹亦係用以促進:璃之ζ解·:’玻璃將 “尤須特別注意者,:前1述匕m】”。 辞、乳化錯及氧化皱等成份雖係$ &乳化 及調整玻璃之熱膨脹係數,但氧化舞之溶解度, 氧化锆及氧化鈹等成份之總含量,以在4。=、氧化鋅、V. Description of the invention (6) The characteristics, structure, and system of glass used for the board are important. Therefore, these components = surface. The effect caused by the glass is more important than the main components of the glass network board, which is oxidized R9 n0 / 〇 And the king body, its preferred content is 56.0% to devitrification ° ,, a milk formula: Xi contains Λ less than 56.0% 'The glass produced will be easily melted and warm to produce Taigu: ί fossil Xi content At 62.0%, it will cause devitrification of the glass; ytterbium oxide is used to increase = 1: structure :; = 丄 series is between 13. °% and 18. °%, if the content of oxide is small: two devitrification is also vulnerable External water vapor or chemical tests ^ Μ ′ In addition, the content of oxides is more than 18.0%, which will also lead to the use of glass and is not conducive to the use of general decontamination furnaces to make dysprosium; the operation of the oxidation shed is: flux, t must be used for Reduce the viscosity of glass paste when making glass: 0%] = the amount is 9.0% to 13.5%, if the boron oxide content is less than * 3%, the effect of 1 large Λ cannot be fully exerted, and if the content of the oxide butterfly is more than the use 11 The strain point of glass is not conducive to subsequent processes. It should be easy to devitrify, and it is more similar. Its preferred content is 0.1% to 8.0%, === oxidized pin 1%. It is easy to devitrify, if the content of barium oxide: dioxin, containing 1 less: 0. It will be too high, and the strain point will be greatly reduced. Evening;.%, Glass density in the glass for substrates of the present invention, with the exception of components such as boron monoxide, gill oxide, and barium oxide; silicon, alumina, 570905 V. Description of the invention (7) Overall ^ 1 percentage Lower, but because these ingredients have a very important impact on the glass's lean viscosity and melting degree when melting glass, it still has a decisive weight in the process of manufacturing glass for substrates, among which the role of calcium oxide, For glass melting, its preferred content is between 3.5% and 8 5% $: chemical split content = less than 3.5% 'will not effectively reduce the viscosity of glass: number: more than 8.5%' glass It is easy to devitrify and thermal expansion is applied in subsequent processes. Magnesium oxide is used to reduce the bubbles or impure content of the glass paste paste glass core. ; Zinc oxide is also used to promote the glass to 0.1% M.5%, if the content of oxidant is less than 0. U, will not play the role of promoting the melting of glass, at 1.5% 'glass will easily devitrify :: "Even: yes, low glass viscosity, with oxygen = no effect to promote glass dissolution As a result, if oxygen is less than 1%, it is also easy to devitrify; beryllium oxide is also used to promote: zeta solution of glass: "Glass will" especially require special attention: the above-mentioned dagger m] ". Ci, Although the ingredients such as emulsification error and wrinkle are $ & emulsified and adjusted the thermal expansion coefficient of glass, the solubility of the oxide dance, the total content of the components such as zirconia and beryllium oxide, etc.

佳,若氧化舞、氧化鎂、氧化鋅、氧化錯%間為最 之總含量少於4,,玻璃之炼解溫度將;太成J 第10頁 570905If the total content of oxide, magnesium oxide, zinc oxide, and oxidation percentage is less than 4, the melting temperature of glass will be too high; Taicheng J Page 10 570905

::鈣、巩化鎂、氧化辞、氧化錯及氧化鈹等成份之總含 j ^於9· (U,則玻璃將容易失透,且玻璃的熱膨脹係數會 本發明在貫施時,係先將前述組成物,均勻混合後, :將混合原料導入一玻璃熔解槽,俟熔解成玻璃膏後,將 二溫度降低到成型所需之溫度範圍,即令其黏度範圍保持 $1〇4·6至1052p〇ise(泊)之溫度範圍,再以下拉法成型, 製作出預定厚度之玻璃基板,嗣再將玻璃基板徐緩冷卻, 即可切割加工成液晶顯示器用之玻璃基板成品。以下謹就 本發明前述之各組成物,以不同之重量百分比,加以混, 合’再依前述程序製作出不同之玻璃樣品,並以該等玻璃 樣品為例’列表說明其熱膨脹係數、應變點、密度及玻璃 液相溫度等特性值間之差異·· 又 在表一(例1至例6 )顯示根據本發明所製成破璁嫌σ 的組成及特性,即本發明的實施例。在表〕(玻至璃=2°° )顯示不同於本發明所製成玻璃樣品的組成 發明的比較例。在表一及表二的玻璃樣品成;::如= 法製造,各組成成份係取常用原料,依對應之重量百分比 加以均勻混合’再以1 6 〇 〇〜1 6 5 0 °C之溫度,在白金掛禍内 熔解6至8小時,熔解過程中,並以白金攪拌棒攪拌2小 時,以促進玻璃中各組成成份之均勻性,然後將玻璃膏倒 入金屬模板中冷卻成型為板狀。此時,針對各玻璃樣2進 行檢測,可分別得到熱膨脹係數、應變點、密度及玻^液 相溫度等特性值,並分別表列在表一及表二之對應搁位1:: The total content of calcium, magnesium sulphide, oxide, oxidized oxide, and beryllium oxide is less than 9 · (U, the glass will be easily devitrified, and the coefficient of thermal expansion of the glass will be first implemented in the present invention. After the aforementioned composition is uniformly mixed, the mixed raw materials are introduced into a glass melting tank, and after melting into glass paste, the two temperatures are reduced to the temperature range required for molding, that is, the viscosity range is maintained at $ 104 · 6 to 1052p. ise (poise) temperature range, and then draw-molded to produce a glass substrate with a predetermined thickness, and then slowly cooling the glass substrate, it can be cut and processed into a glass substrate finished product for liquid crystal displays. Each composition is mixed with different weight percentages, and then different glass samples are made according to the foregoing procedures, and these glass samples are taken as examples. The thermal expansion coefficient, strain point, density, and glass liquid temperature are described in the list. The difference between the equal characteristic values is shown in Table 1 (Examples 1 to 6). The composition and characteristics of the breakage σ made according to the present invention are shown in the example of the present invention. 2 °°) shows a comparative example of the composition invention different from the glass samples made in the present invention. The glass samples in Tables 1 and 2 are made as follows:: such as = method, each component is made of commonly used raw materials, according to the corresponding The weight percentages are uniformly mixed 'and then melted in platinum for 6 to 8 hours at a temperature of 1600 ~ 1650 ° C. During the melting process, stir with a platinum stirrer for 2 hours to promote the glass The homogeneity of each component, and then the glass paste is poured into a metal template and cooled to form a plate. At this time, the glass sample 2 is tested to obtain the thermal expansion coefficient, strain point, density, and glass temperature, etc. Characteristic values, which are respectively listed in Table 1 and Table 2

570905570905

上0 本發明在檢測各#σ & & a ^ 坂瑀樣之各特性值時,主要係依 列方法進行檢測: 下 (1 )熱膨脹係數(單彳☆ · Ί卜7 / >、 ,、 、早位· 1 ο V c )之檢測··係參照美國材 料試驗協會(Amerimn Qm· + £ . can Society f〇r Testing andThe upper 0 of the present invention, when detecting each characteristic value of each # σ & a ^ Sakazaki sample, is mainly tested in accordance with the following methods: Lower (1) coefficient of thermal expansion (Single ☆ · Ί 7 / >, ,,, Early position · 1 ο V c) The test is based on the American Materials Testing Association (Amerimn Qm · + £. Can Society f〇r Testing and

Materials ’以下簡稱“以)所訂定之編號E228 — 95檢測 標準,以機械推桿式熱膨脹儀及氧化鋁為參考標準, 加熱並量測玻璃樣品之伸長量,溫度範圍自室溫量到 玻璃不,伸長,甚至因軟化而收縮為止之溫度,升溫 速率為每分鐘3 °C。熱膨脹係數由100至40 0 〇c之玻璃伸 長量計算得到。 (2) 應變點胃(單位:它)之檢測:係參照ASTM C598 —93, 加熱並置測玻璃樣品之變形率與溫度之關係,以特定 變形率所對應之溫度作為應變點。 (3) 密度(單位·· g/cm3 )之檢測:係參照ASTM c729_75, 取約2公克重不含汽泡之塊狀玻璃,以玻璃樣品在比 重液中浮沉之情形量測其密度。 (4) 玻璃液相溫度(單位:它)之檢測:係根據astm C82 9-8 1 ’將小於850 //m之玻璃屑放入白金皿中,置於 梯度爐24小時後,以顯微鏡測量玻璃之結晶情形,判 定其液相溫度而得。 表一Materials' Hereinafter referred to as "with" the testing standard No. E228-95, using mechanical push rod type thermal expansion instrument and alumina as reference standards, heating and measuring the elongation of glass samples, the temperature range is from room temperature to glass, The temperature until elongation, even contraction due to softening, is 3 ° C per minute. The thermal expansion coefficient is calculated from the glass elongation of 100 to 4 00c. (2) Strain point stomach (unit: it) detection: Refer to ASTM C598-93, heat and measure the relationship between the deformation rate and temperature of the glass sample, and take the temperature corresponding to the specific deformation rate as the strain point. (3) Density (unit ·· g / cm3) detection: refer to ASTM c729_75, take about 2 grams of non-bubble glass, measure the density of the glass sample when it floats in the specific gravity liquid. (4) glass liquid temperature (unit: it) detection: based on astem C82 9-8 1 'Put glass shavings smaller than 850 // m in a platinum dish, and place it in a gradient furnace for 24 hours, then measure the crystallization of the glass with a microscope and determine its liquidus temperature. Table 1

第12頁 570905 五 、發明說明(10) 例1 例2 例3 例4— 例5 例6 58.0 57.0 58.0 58.3 56.5 59.5 14.5 14.0 13.5 15.5 13.5 16.0 11.0 12.5 13.0 9.5 9.5 10.0 6.5 63 5^ 4.0 7.0 4.0 3.5 3.0 4.5 6.5 7.5 3.0 5.5 5.0 4.0 4.5 4.8 6.0 0 0.5 0 0.5 0.5 0.5 0.5 1.0 0.5 0.2 0.5 0.5 0.5 0.5 1.0 0.5 0.2 0.5 0 0 0 0.5 0 0 6.5 7.0 5.5 6.2 6.0 7.5 38.6 38.9 37.4 39.4 38.3 39.1 656 658 655 660 652 661 2.52 2.53 2.54 2.54 2.54 2.52 1030 1035 1035 1030 1035 1030 s i〇2)之重量百分比 氧花鋁(A1A)之重量百分比 SSi(B203:)之重量百分比 氧化緦(S rO)之重量百分比 ¥化鋇(BaO)之重量百分比 Ϊ化鈣(CaO)之重量百分比 _鎂^20)之重量百分比 1化鋅(ZnO)之重量百分比 氧化鉻(Zr02)之重量百分比 氧化鈹(BeO)之重量百分比Page 12 570905 V. Description of the invention (10) Example 1 Example 2 Example 3 Example 4— Example 5 Example 6 58.0 57.0 58.0 58.3 56.5 59.5 14.5 14.0 13.5 15.5 13.5 16.0 11.0 12.5 13.0 9.5 9.5 10.0 6.5 63 5 ^ 4.0 7.0 4.0 3.5 3.0 4.5 6.5 7.5 3.0 5.5 5.0 4.0 4.5 4.8 6.0 0 0.5 0 0.5 0.5 0.5 0.5 1.0 0.5 0.2 0.5 0.5 0.5 0.5 1.0 0.5 0.2 0.5 0 0 0 0.5 0 0 6.5 7.0 5.5 6.2 6.0 7.5 38.6 38.9 37.4 39.4 38.3 39.1 656 658 655 660 652 661 2.52 2.53 2.54 2.54 2.54 2.52 1030 1035 1035 1035 1030 1035 1030 si2) Weight percentage of aluminum oxide (A1A) Weight percentage of SSi (B203 :) Weight percentage of osmium oxide (S rO) Weight percentage of barium (BaO) weight percentage of calcium oxide (CaO) _magnesium ^ 20) weight percentage 1 weight percentage of zinc zinc (ZnO) weight percentage of chromium oxide (Zr02) weight percentage of beryllium oxide (BeO)

Mg0+Ca0+ZnQfZr02+Be0 之重毚百 分比 熱膨脹係數(l〇-7/〇C) 應變點(°C) 密度(g/cm3) 玻璃液相溫度(〇C) 由表一所示實施例彳z — 楚觀察出,依本發明所製貫之各檢測數據,可清 成之玻璃基板 > 具右彳$ 1 η ς。广 之玻璃液相溫度,故極適於以下拉成型法,你^ 夂作平板玻Mg0 + Ca0 + ZnQfZr02 + Be0 weight percent thermal expansion coefficient (10-7 / 〇C) strain point (° C) density (g / cm3) glass liquid temperature (° C) Example shown in Table 1 z — Chu observed that according to the various inspection data produced by the present invention, the glass substrate that can be cleared has a right edge of $ 1 η ς. Wide glass liquidus temperature, so it is very suitable for the following drawing forming method.

IH 第13頁 570905 五、發明說明(π) 璃,此外,由 係數,且其應 性值,與前述 故適於作為前 另,本發 明之傳統組成 比較例中,清 1 0 4 5 °C之玻璃 時,極易發生 檢測數據中, 熱膨脹係數偏 之應變點偏低 度則偏高,均 破璃具有低於40 x 10-Vt之熱膨脹 篗點兩於65 0 °c,密度小於2.55 g/cm3等特 之一般液晶顯示器用之基板破螭極為相近, 述液晶顯示器用玻璃基板之材料。 明亦於表二中,列示了利用其它不同於本發 成伤’施作之比較例7至比較例1 2,在該等 楚顯示,所製成之玻璃基板,均具有高於 液相溫度,故以下拉法成型法製作平板玻璃 失透或結ΒΘ的問題。此外,由表二所示之各 亦清楚顯示,比較例7所製成之玻璃基板之 高,而比較例9、10及11所製成之玻璃基板 ,比較例8、11及1 2所製成之玻璃基板之密 不適合作為液晶顯示器用玻璃基板之材料。 表二IH Page 13 570905 V. Description of the invention (π) Glass. In addition, the coefficient and its response value are the same as those described above. Therefore, in the comparative example of the traditional composition of the present invention, the temperature is 1 0 4 5 ° C. In the case of glass, it is very easy to occur in the detection data, the strain point of the thermal expansion coefficient is too low, and the glass has a thermal expansion point of less than 40 x 10-Vt. / cm3 and other special substrates for liquid crystal displays are very similar. The materials for glass substrates for liquid crystal displays are very similar. Ming also lists in Table 2 the comparative examples 7 to 12 using other treatments that are different from the treatment of the hair, and shows that the glass substrates produced have a higher liquid phase Temperature, it is a problem of devitrification or junction BΘ produced in the flat glass produced by the pull-molding method. In addition, each of Table 2 clearly shows that the glass substrates made in Comparative Example 7 are high, while the glass substrates made in Comparative Examples 9, 10, and 11 are made in Comparative Examples 8, 11 and 12 The density of the resulting glass substrate is not suitable as a material for a glass substrate for a liquid crystal display. Table II

第14頁 570905 五、發明說明(12) 例7 例8 例9 飞!110 例11 例12 氧化矽(Si02)之重量百分比 58.0 54.0 57.2 57.0 57.0 63.0 氧化鋁(A1203)之重量百分比 12.0 15.5 14.5 15.5 14.0 13.5 氧化硼(B203)之重量百分比 9.5 11.5 14.5 11.5 9.5 9.5 氧化鋸(S rO)之重量百分比 7.0 8.5 2.3 5.5 4.0 9.0 氧化鋇(BaO)之重量百分比 3.5 3.5 1.5 3.0 9.0 1.0 氧化鈣(CaO)之重量百分比 9.0 6.0 6.0 5.0 4.0 4.0 氧化鎂(MgO)之重量百分比 0.5 0 2.0 0 0 0 氧化鋅(ZnO)之重量百分比 0.5 0.5 1.0 2.5 0 0 氧化鉻(ZK)2)之重量百分比 0 0.5 0.5 0 2.5 ~0 之重量百分比 0 0 0.5 0 0 0 Mg0+CaQfZnQfZr02+Be0 之重量百 分比 10.0 7.0 10.0 7.5 6.5 4.0 熱膨脹係數(l〇-7,C) 40.2 39.8 39.4 37.8 38.3 37.6 應變點(°c) 656 6—50 647 645 644 665 密度(g/cm3) 2.5^ 2.5^ 2.53 2.55 2.58 2.56 玻璃液相溫度(。〇 1095 1100 110—0 1110 1090 1110 本乂所示之檢測數據,可清楚得知,根據 本發明之玻璃組成成份,所制 很佩Page 14 570905 V. Description of the invention (12) Example 7 Example 8 Example 9 fly! 110 Example 11 Example 12 Weight percentage of silicon oxide (Si02) 58.0 54.0 57.2 57.0 57.0 63.0 Weight percentage of alumina (A1203) 12.0 15.5 14.5 15.5 14.0 13.5 Weight percentage of boron oxide (B203) 9.5 11.5 14.5 11.5 9.5 9.5 Weight percentage of oxide saw (S rO) 7.0 8.5 2.3 5.5 4.0 9.0 Weight percentage of barium oxide (BaO) 3.5 3.5 1.5 3.0 9.0 1.0 Calcium oxide (CaO) Weight percentage 9.0 6.0 6.0 5.0 4.0 4.0 Weight percentage of magnesium oxide (MgO) 0.5 0 2.0 0 0 0 Weight percentage of zinc oxide (ZnO) 0.5 0.5 1.0 2.5 0 0 Weight percentage of chromium oxide (ZK) 2) 0 0.5 0.5 0 2.5 ~ 0 weight percentage 0 0 0.5 0 0 0 Mg0 + CaQfZnQfZr02 + Be0 weight percentage 10.0 7.0 10.0 7.5 6.5 4.0 coefficient of thermal expansion (10-7, C) 40.2 39.8 39.4 37.8 38.3 37.6 strain point (° c) 656 6-50 647 645 644 665 Density (g / cm3) 2.5 ^ 2.5 ^ 2.53 2.55 2.58 2.56 Temperature of the liquid phase of the glass (.1095 1100 110-0 0 1010 1090 1110) Glass composition of the present invention Parts, wear very prepared

於1045 t之玻璃液相溫度,j出之玻璃基板,均具有低 ,其應變點均高於650 Γ其熱膨脹係數均低於4〇 X L ’至於其密度則均能保持At a glass liquidus temperature of 1045 t, the glass substrates produced by j all have a low temperature, their strain points are higher than 650 Γ, their thermal expansion coefficients are lower than 40 × L ′, and their density can be maintained.

570905570905

五、發明說明(13) 在2· 55g/cm3以下,與一般鋁矽酸坡螭 、 作為生產厚度約0· 2公釐(mm)到1· 2公篇;’極適宜 =器用巧板玻璃,以有效解決前述傳統基板】以 晶顯示器在製作過程中,所發生之諸多問題。 嘴及液 以上所述,僅係本發明之較佳實施例,惟,本發明所 主張之權利範圍,並不局限於此,按凡熟悉該項技藝人 士’依據本發明所揭露之技術内容,可輕易思及之等效變 化’均應屬不脫離本發明之保護範疇。 570905 圖式簡單說明 第17頁V. Description of the invention (13) Below 2.55g / cm3, and common aluminosilicate slopes, as a production thickness of about 0.2 mm (mm) to 1.2 cm; 'Extremely suitable = smart glass for utensils In order to effectively solve the aforementioned traditional substrate] many problems occurred in the production process of crystal display. The above description of the mouth and liquid is only a preferred embodiment of the present invention. However, the scope of the rights claimed by the present invention is not limited to this. According to the technical content disclosed by those skilled in the art according to the present invention, Equivalent changes that can be easily considered should all belong to the protection scope of the present invention. 570905 Schematic Description Page 17

Claims (1)

570905 六、tit鼻利蓺圊 ^ 1、 一種顯示器用基板玻璃之組成,包括: 重量百分比為56.0%至62.0°/。之氧化矽; 重量百分比為13.0%至18.0%之氧化鋁; 重量百分比為9. 0%至13. 5%之氧化硼; 重量百分比為1. 〇%至8. 0%之氧化勰; 重量百分比為〇. 1 %至8. 0%之氧化鋇;及 重量百分比為3. 5%至8. 5%之氧化鈣。 2、 如申請專利範圍第1項所述之顯示器用基板玻璃之組 成,係先將該等組成物,均勻混合後,再將混合原料 導入一玻璃熔解槽,俟熔解成玻璃膏後,將其溫度降 低到成型所需之溫度範圍’令其黏度範圍保持在1 〇4.6 至1〇5.2 poise(泊)之溫度範圍,再以下拉法成型,製作 出預定厚度之玻璃基板,嗣再將玻璃基板徐緩冷卻, 即可切割加工成液晶顯示器用之玻璃基板成品。 3、 如申請專利範圍第2項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為0 %至1 · 0 %之氧化鎂成份。 4、 如申請專利範圍第2項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為0· 1 %至1 · 5%之氧化鋅成份。 5、 如申請專利範圍第2項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為0.1%至1.5%之氧化錯成份。 6、 如申請專利範圍第2項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為〇%至ι·〇%之氧化鈹成份。 7、 如申請專利範圍第3項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為0 · 1 %至1 · 5 %之氧化鋅成份。570905 VI. Tit nose 蓺 圊 ^ 1. A composition of a substrate glass for a display, including: a weight percentage of 56.0% to 62.0 ° /. 0% 至 8. 0% 的 Erbium oxide; weight percentage of 1.0% to 8.0% of boron oxide; silicon oxide; weight percentage of 13.0% to 18.0% of alumina; weight percentage of 9.0% to 13.5% of boron oxide; weight percentage of 1.0% to 8. 0% of hafnium oxide; weight percentage 1% to 8.0% of barium oxide; and a weight percentage of 3.5% to 8.5% of calcium oxide. 2. According to the composition of the substrate glass for display described in item 1 of the scope of the patent application, after the components are uniformly mixed, the mixed raw materials are introduced into a glass melting tank, and the glass paste is melted into a glass paste, and then The temperature is reduced to the temperature range required for molding, so that its viscosity range is maintained at a temperature range of 104.6 to 10.5.2 poise, and then pulled down to form a glass substrate of a predetermined thickness, and then the glass substrate After slowly cooling, it can be cut into glass substrates for liquid crystal displays. 3. The composition of the substrate glass for a display as described in item 2 of the scope of the patent application, which further includes a magnesium oxide content of 0% to 1.0% by weight. 4. The composition of the substrate glass for a display as described in item 2 of the scope of the patent application, further including a zinc oxide component in a weight percentage of from 0.1% to 1.5%. 5. The composition of the substrate glass for a display as described in item 2 of the scope of the patent application, further including an oxidation error component in a weight percentage of 0.1% to 1.5%. 6. The composition of the substrate glass for a display as described in item 2 of the scope of the patent application, which further includes a beryllium oxide component with a weight percentage of 0% to ι · 0%. 7. The composition of the substrate glass for a display as described in item 3 of the scope of the patent application, which further includes a zinc oxide component in a weight percentage of from 0.1% to 1.5%. 570905 六、申請專利範圍 8、 如申請專利範圍第3項所述之顯示器用基板玻璃之組 成,尚包括重量百分比為0 · 1 %至1 · 5%之氧化锆成份。 9、 如申請專利範圍第3項所述之_示器用基板玻璃之組 成,尚包括重量百分比為至ι·〇%之氧化鈹成份。 1 0、如申請專利範圍第4項所述之_示器用基板玻璃之組 成’尚包括重量百分比為1.5%之氧化錯成份。 11、如申請專利範圍第4項所述之1員示器用基板玻璃之組 成,尚包括重量百分比為〇%至1 · 0%之氧化鈹成份。 1 2、如申請專利範圍第5項所述之_示器用基板玻璃之組 成,尚包括重量百分比為0 %至1 · 0 %之氧化鈹成份。 1 3、如申請專利範圍第7項所述之顯示器用基板玻璃之組 成’尚包括重量百分比為0· 1 %至1 · 5%之氧化锆成份。 1 4、如申請專利範圍第7項所述之顯示器用基板玻璃之組 成’尚包括重量百分比為〇%至1 · 0%之氧化鈹成份。 15如申凊專利範圍第1 2項戶斤述之顧示器用基板玻璃之組 成’尚包括重量百分比為〇· 1%至1. 5%之氧化鋅成份。 1 6、如申請專利範圍第1 5項所述之顯示器用基板玻璃之組 ,,其中氧化鈣、氧化鎂、氧化鋅、氧化鍅及氧化鈹 等成份之總重量百分比,係介於4 · 0 %至9. 0 %間。570905 VI. Scope of patent application 8. The composition of the substrate glass for display as described in item 3 of the scope of patent application, including zirconia components with a weight percentage of 0.1 · 1% to 1. · 5%. 9. The composition of substrate glass for display as described in item 3 of the scope of the patent application, which further includes a beryllium oxide component with a weight percentage of ι · 0%. 10. The composition of the substrate glass for a display device as described in item 4 of the scope of the patent application includes an oxidation error component of 1.5% by weight. 11. The composition of the substrate glass for a 1 indicator as described in item 4 of the scope of the patent application, which further includes a beryllium oxide content of 0% to 1.0% by weight. 1 2. The component of the substrate glass for display as described in item 5 of the scope of patent application, including the beryllium oxide content of 0% to 1.0% by weight. 1 3. The composition of the substrate glass for a display as described in item 7 of the scope of the patent application further includes a zirconia component in a weight percentage of 0.1% to 1.5%. 14. The composition of the substrate glass for a display as described in item 7 of the scope of the patent application further includes a beryllium oxide component in an amount of 0% to 1.0% by weight. 15 As described in item 12 of the patent application, the composition of the substrate glass for display devices ′ further includes a zinc oxide component with a weight percentage of 0.1% to 1.5%. 16. The group of substrate glass for display as described in item 15 of the scope of patent application, wherein the total weight percentage of the components such as calcium oxide, magnesium oxide, zinc oxide, hafnium oxide and beryllium oxide is between 4.0 % To 9.0%.
TW91124481A 2002-10-23 2002-10-23 Glass composition of a substrate for display TW570905B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI635062B (en) * 2014-05-15 2018-09-11 康寧公司 Aluminosilicate glasses

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI635062B (en) * 2014-05-15 2018-09-11 康寧公司 Aluminosilicate glasses
US10077205B2 (en) 2014-05-15 2018-09-18 Corning Incorporated Aluminosilicate glasses

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