TW568891B - Reflection control member and method of fabricating the same - Google Patents

Abstract

A reflection control member includes a multilayer stack that is adhered to a substrate using a primer layer to promote adhesion. The multilayer stack includes pairs of layers in which the first layer is a grey metal and the second layer is a substantially transparent material. In the preferred embodiment, the grey metal is nickel chromium and the transparent layer is a silicon oxide. For each pair of layers, the grey metal is nearer to the surface of the substrate for which antireflection is a concern. The primer layer has a thickness of less than 50 angstroms. Although the primer layer is deposited in an essentially oxygen-free environment, it may oxidize following deposition.

Description

568891

V. Description of the invention (1) The surface provides desired light, such as a display screen. The present invention relates generally to the properties of light-transmitting or reflective elements, and in particular, to providing an anti-reflective coating on the surface of light-transparent elements. 2 The coating is applied to the light-transmitting or reflective element to give the element a period Screen: ‘One or more coatings may be applied to a computer monitor: Screen’ Length: for polarization or to reduce reflection. Anti-reflection that reduces the thickness of the reflected light by .r (CRT) about a quarter of the wavelength. Anti-reflection: organic materials such as polymers, or none. ^: Fold 2 = have a low refractive index. Reflection is obtained when depositing: antigen :: square root of the refractive index of the material. 'Dagger methods have limitations. Single-layer low-refractive-index anti-reflection coatings show distinct colors, especially with regard to reflection. By using multiple deposited layers, an anti-reflective coating having a wider bandwidth and thus less color can be obtained. Two common anti-reflection coatings are designed as four-quarter-knife (QQ) and quarter-half-quarter (QHQ) stacks. In other words, the anti-reflection coating is formed of a plurality of layers having different refractive indices, each having an optical thickness equal to a quarter (Q) or half (Η) of a wavelength in which anti-reflection is sought. A detailed description of the anti-reflection stack is contained in U.S. Patent No. 744,227 issued to Bright et al. And assigned to the assignee of the present invention. At least two layer pairs are formed to provide anti-reflection properties. Each layer pair has a layer at i ·

568891 V. Description of the invention (2) 8 The emissivity of the conductive, transparent inorganic materials, oxides. The stack has good optical properties for the light-transmitting inorganic p @ @ ， 达 ”, which has a refractive index within the range. Shooting down: :: 1 is made of non-absorbent material. Therefore, anti-c = ;; = is added to the components that need anti-reflection (for example, LK 1 J 円 moon t * to achieve 〇 ,; where the contrast of y may have a moment ^ L / 〇 some live first Absorption is to enhance the image: Toshiba will add absorbent materials to the glass used to make crt glass. Or, the anti-reflective coating that protects the CRT may include an absorbent layer, which has a dispersion in it. Obtain good anti-reflection properties (ie low reflection and wide bandwidth). See, for example, US Patent No. 0 issued to 〇yama # person. Among them, titanium nitride (TiNx) has been proven to have better absorption. Γ 1 Γ " 2, which includes a simple stack of only two layers (for example, T i Nx and Lui 02)-generally provides & good anti-reflection properties only for the narrow transmission value of Fan S1. In the US patent issued = 7 No. 5, 091, 4 also teaches the use of metal layers. In the case of η, nitride is not for anti-reflective, and is a better material, because the optical properties of nitride usually have a phase, Shen: conditions (such as , * In the deposition environment ~ and 〇2 phase i) and 疋. However, further improvements in optical characteristics are still needed. Certification U.S. Patent No. 4,846,55 1 to Rancourt et al. Illustrates a combination of light emitters that enhance image contrast and reduce CRT flicker. Many layers are formed on a substrate to achieve the desired optical properties. An aluminum oxide layer having a thickness of at least 1; 70 ▲ millimeters, which is about 8/3 of the optical thickness of a wave at a design wavelength of about 500 nanometers. Here is a preferred specific example

568891 V. Description of the invention (3) ’is an alternating layer of nickel and magnesium fluoride above the alumina layer. The first nickel layer is formed on the oxide substrate. Emulsification is designed to make the nickel layer firmly bonded to the material. The nickel layer has a thickness of about 13 to 80 Angstroms. The next layer is a magnesium fluoride thin film having a thickness equal to one t-wave optical thickness. The second nickel layer is formed to have a thickness of about 75 angstroms. Finally, the second magnesium fluoride layer has an optical thickness of four quarters. This patent indicates that the experimental measurement of the filter 1 coating used with the CRT has confirmed that only 0.5-0.8% of the total reflected light is displayed to the eyes of the viewer, and the overall light transmittance of the image display is approximately = 84. percentage. In contrast, when no filter coating is used, 0-12% of the reflected light reaches the viewer's eyes. Although the existing optical coatings can achieve acceptable junctions and are relatively easy to adapt to the process to achieve Tvis, while still maintaining good anti-reflection, so: "Coating outside the coating" hopes for the deposition of absorbent layers It is quite easy, therefore, high manufacturing productivity can be obtained. In the broad description of the structure of the package η !, the multilayer absorptive anti-reflective coating material has a refractive index of + and has a refractive index in the range of 25, 1, 7 There are four alternating layers of "transparency", and up to 乂. In a four-layer stack, the one-seven-seven genus layers are closest to the surface that needs anti-reflection; the J paint layer is bonded to the surface. The four paint layers are "low In the narrow sense of the description, the 'transparent material is silicon oxide (SiOx) is better than silicon oxide. The gray metal is a nickel-chromium alloy (Nicr), such as vehicle 568891. V. Description of the invention (4) Nickel-chrome having a composition of 80/20 is preferred. In addition to nickel-chromium, acceptable gray metals include Incone 1, mone 1, stainless steel, and chromium. The description of another level of the present invention relates to the layer thickness. The thickness of the gray metal layer closest to the protected surface (for example, a CRT screen) should be in the range of 0.5 nm to 30 nm, and within! It is more preferably in the range of nanometers to 15 nanometers. Adjacent Si0X layers preferably have a thickness in the range of 50 nm to 200 nm, and more preferably in the range of 70 nm to 150 nm. However, the thickness of this second layer depends on the optical properties of the previous layer. The second gray metal layer has a thickness in the same range as the first gray metal layer, but in a preferred embodiment, the thickness is adjusted so that the entire coating reaches a desired range of 20% to 80%. Adjust, but it is better to adjust within the dry range of 30% to 60%. The second layer has a thickness in the range of 60 nm. This can be adjusted. For example, the optical and electrical properties of the anti-reflection layer with a wavelength of the maximum reflection layer (Rmin) of the second thickness of the surface layer provide another "layer" length. As previously mentioned, the Tvis value is adjusted to a range of 6 °%. It is better to adjust it within the Si ox layer. The visible light ^ is the thickness of the two gray metal layers, and the value t should occur not more than 10%. The absorption of 2000 ohms per square of thin fire metal. The layer is made of a dielectric material, for example, the rate is better, while another layer in the layer pair can form the layer pair in a soft fA oxide: formed. "Substrate, such as polyethylene terephthalate Divine vinegar 88119628.ptd Page 8 568891 Fifth invention description (5) (PET), but it can be used can be-hard coating formed on the substrate. Hard =;] 2 1 Gal). : In the process, and in the use of the final product; the quality substrate is added to any of the known hard coating materials, useful. The hard coating layer may be an oxyalkane hard coating layer, a two-arm f-oxide-based hard coating layer, and a silicon material is typically an acid-based hard coating layer, and the like. Afterwards, it undergoes a change, that is, aerobic: to the hard coating. The primer may be a material for depositing an inorganic material. For example, a layer of colorless silicon is formed after a period of time. Hard coating: thick; n, to the range of 20 microns, and primer layer: J microns = one side can form a protective surface coating. Table use: A combination of carbides, as a material for her, this gas carbide provides the desired lubricating properties. An accessible gas carbide used as a lubricant is sold by 3M under the federal trademark FLUORORAD. Surface coatings are hydrophobic and oleophobic, and have low surface energy and high contact angle. Therefore, the surface coating exhibits antifouling properties. 十 The present invention can also be described with reference to a manufacturing method. Although not critical, these layers can be deposited using sputtering deposition techniques. In the first pass of the sputtering deposition device, a mild pre-glue treatment prepares the surface of the substrate material in order to improve adhesion for coating of subsequent deposited layers. The primer-forming material (for example, Shi Xi) was introduced during this initial process. Allows better primer & deposition in an oxygen-free environment. However, after applying the primer layer, the primer

88119628.ptd Page 9 568891 V. Description of the invention (6) Exposure of lacquer materials to oxygen is acceptable. In daisinization, and the formation of the first layer pair; gold ^:;: 'makes the former glow active again, and it may be necessary to introduce a third substrate. Depending on the thick voice of the manufacturing process, such as, Sio), add the thickness of the first upper layer (eg, ^ 6 1) to the thickness of this upper layer, Xingsheng 14 and -1, ^ The degree of drought depends on The light-drying characteristics of the first gray metal layer depend on the thickness of the metal layer, as determined by the gray metal material. Li Yiman + Shi Cong Tian, the thickness of the metal layer, and the thickness of the metal layer :: 疋 [also depends on the desired transmission of π piles However, a second layer pair is deposited. If you need a “layer #” followed by “5” in # 5, you need a subsequent process, the material. King / b, θ, and two layers. Then add lubrication as needed. The surface coating, one of the advantages of the present invention is that you can significantly increase the display equipment with free color: two: the absorption provided by * only by adjusting the layer: such as the contrast of CRT. You can optimize the thickness of the layer, It can be used in a wide range of wavelengths (that is, broadband). This conductive drawer can be 柞 A m 睥. Another advantage is that the 11% layer can be used as a barrier to delay the CRT. Emitted =. The final product has a high stability with regard to oxidation in the natural environment, = mechanically when deposited on a suitable hard coating Tough. This stable gray metal can retain its original anti-reflective properties for several years. Detailed description ^ = Figure i. One specific example of an optical configuration that will be used to form a multilayer absorbent anti-reflective coating is not a light-transmitting substrate 12. This substrate can be shaped by ρΕτ, but other materials can be used. The substrate material is not important to the present invention: but in a preferred embodiment, the anti-reflection and surface coating layers described below will be applied as a base material. Form 'so that the substrate should be soft. Then this soft

568891, invention description (7) The substrate and various layers are attached to another substrate, such as a CRT screen. On the other hand, anti-reflection and surface coating layers can be applied directly to the final product. Therefore, the substrate may be an organic or inorganic material. Under the absorptive antireflection stacks formed by layers 14, 16, 18, and 20, the soil material 2 should exhibit a reflection level of less than 20% in the visible light wavelength. For example, the m reflection is 10% to 15%. Visible light (both sides are anti-reflective; the anti-reflective soil stack formed by layers 14-20 is designed to significantly reduce the degree of reflection through absorption and destructive interference through reflection.) F Above the anti-reflective stack is an adhesion promoting layer 22 Carbon, such as silane, which has anti-friction properties to promote cleaning and scratch resistance. FluororadV ^ t # ^ #

Fr 790 # Material department is better. The best material is FLUORORAD = Layer 2 == In the gasification solvent, the liquid pin w 28 is used between the layer 14-2 ° and the substrate 12 as the hard coat layer 26 and the primer layer. Island: can improve the softness During the processing of the substrate, and the coating of the final product 2 = :::. Hard coating systems are known in the art. Figure 1 Hard Oxygen Hard Coating® ^ known materials, such as oxidized stone-based hard coating, silicon-based materials:; top: layer, acrylic hard coating, etc. Has a refractive index of 60. Therefore, the refractive index of 1 俜 1 from 12: Fengcai? The refractive index is in the same range Θ. Acceptable thickness ranges from 1 μm to 20 μm. Lacquer ΐ 促进 = promotes adhesion of the anti-reflective layer 14_2 ° to the hard coat layer 26. In order to undergo transformation after deposition, that is, oxidation, to produce substantially transparent

568891

5. Description of the invention (8) It is stated that an inorganic material which is substantially colorless, such as a metal or a semiconductor oxide, is a metal or a semiconductor. Examples of useful primer materials include silicon, titanium, chromium and nickel. Alternatively, the primer layer can be deposited as a substoichiometric oxide, such as

CrOx, SiOx, etc. The primer layer 28 should be thin enough to minimize disruption of the desired optical properties in the optical configuration 10. The primer layer preferably has a temperature of less than 50 degrees. The thick layers 14 and 16 form a first layer pair, and the layers 18 and 20 form a second layer pair. Each layer pair has lower absorbing gray metal layers 14 and 18 and upper transparent layers 16 and 20. The upper transparent layer is formed of a material having a refractive index in the range of "" to "". The preferred material is "heart", and the best material is silicon dioxide. The first and third anti-reflection layers 14 and 18 are "high refractive index layers" with respect to the second and layers 16 and 20. Machine shot ★ The gray metal layers 14 and 18 each have a substantial degree of conductivity. For example, a resistivity of less than 1 x 1 () 6 ohms per square is preferred, and a resistivity of less than 20 () () ohms squared is more 1. In a preferred embodiment, the gray metal is a nickel-chromium alloy, such as nickel-chromium composed of ί 8 乂 20. However, other acceptable gray metals include Xingnan Nickel, Mongolian Nickel, Stainless Steel, and Chromium. The lower gray metal is between U nanometers and three. In the nanometer range, and more preferably in the micrometer range. The adjacent SiOx layer i 6 has a value of 5. Mika 2 5m. However, the thickness of this layer 16 depends on the optical properties of the gray metal layer 14 including the layers 14 and 19 pairs. The first gray metal layer 18 has a thickness in the same range as the first gray metal layer 14. In a preferred embodiment, the thickness is adjusted so that the overall optical configuration 10

568891 V. Description of the invention (9) The desired T v i s value is reached. By changing the thickness of the layer 1 4-20, this Tvis value can be adjusted in the range of 20% to 80%, but it can be adjusted in the range of 30% to 60%. The second pair of SiO 2 layers 20 has a thickness in the range of 60 nm to 120 nm. The thickness of this second layer can be adjusted to change the anti-reflection characteristics of the optical configuration 10. For example, if the thickness of the surface layer 20 is increased, the reflection minimum (Rmin) wavelength of the optical configuration 10 will be shifted to a higher wavelength. Therefore, the wavelength range to be anti-reflected can be adjusted. The second and fourth anti-reflection layers 16 and 20 are preferably SiOx, but this is not important. These two layers 16 and 20 each have a refractive index in the range of 丨 .25 to 丨 .7, and more preferably in the range of 1.4 to 1.6. These layers can be referred to as "low-refractive-index layers" of pairs of layers that provide absorptivity and reflectivity. Each layer is substantially transparent and substantially colored when present in combination with a high refractive index layer therein. This layer should not have more than 10% iAvis, and preferably less than 5%. Examples of materials with suitable characteristics for forming a low refractive index layer are some inorganicized to the surface. Now referring to Fig. 2, it is possible to transfer the optically-distributed electrostatic / roll-on-coil form attached to the substrate. The roll sheet can be seen on the CRT. It can be formed on the CRT. As needed ^ 〇β ^ ^ ^ is the adhesive film 34 that is first melted. The roller 36 is used to apply the required load force to the yoke to directly laminate the rollers. For example, cm is a material element including a compound curvature radius. 568891 V. Description of the invention (10) The optical configuration is thermoformed before being combined. Thermoforming technology is known in the art. It should be noted that the gray metal is deposited in a manner designed to minimize the amount of oxygen added to the coating. However, due to the background gas, 5 parts in the substrate, etc., some slight degree of oxidation usually occurs. However, the atomic ratio of metal to oxygen in the gray metal should be less than 0.3, and more preferably less than 0.2. The optical configuration 10 of FIG. 1 can be manufactured using sputtering. One advantage of this optical configuration is that the absorptive layers (i.e. gray metal layers 14 and 18) do not require the reactive sputtering deposition method required for nitride < absorptive layers. Therefore, the coating stack sink rate is optimized. In addition, the primer layer 28 is typically formed after a mild pre-glow treatment on the surface area of the substrate having a hard coat layer on which the primer layer material is formed. Pre-glow system An ionizing gas cleaning conditioner that improves the adhesion of subsequent deposits. The pre-glow and primer layer deposition can occur simultaneously during the initial pass of the hard-coated substrate material through the sputtering deposition device. In the sputtering, in the presence of a reactive or non-reactive gas, an electromigration is applied to a metal, semiconductor, or metal complex sputtering cathode to generate an electric base II; the role of the cathode is to move atomic atoms in parallel, And Shen = mi on the substrate. Typically, the sakura body is noble gas, and splashing on air is the most commonly used because of its attractive cost. It is also known in the art to use about 1% to about 90% (or a reactive gas of a kind of dry matter as a spattering gas to make gold tincture; half; compounds (when oxygen and nitrogen sources exist), Another = when the stock is in the oxygen source), oxygen nitrogen 568891 Description of the invention αυ Figure 3 shows the continuous base coating feeling. This base material coating system includes, the workmanship & line 42 pumping straight empty # ^ ^ / 1 π 3, Η ^ ^ ^ ^ ”to 40. The room includes a soft substrate 12 ii! 2 Transmission of a series of magnetron sputtering stations 44, 46, and 48: The components used to drive the base material include the feed roller 50, idler wheels 52, 54, 56, 58, 60, 62, and 64, and reeling. ^

c. Han tightened pro 6 6. The substrate bypasses the cold rigid idler cylinder 68 0. A pair of monitors 70 and 72 can be used to determine the light-drying properties of the base material before coating, and monitors 74 and 76 can be used to measure the Light

学 性。 Nature. The optical properties of interest include light transmittance, reflectance, and absorbance. The sputtering device 38 is configured to allow two separate magnetron cathodes to be used at two other stations 44 and 46, while simultaneously and continuously sputtering up to two layers on the base material 12. The cathode at station 46 is typically AC powered and the cathode at station 44 is typically DC powered. Since the base material 12 is rotated about the axis of the cylinder 68, the base material first encounters the front glow station 78 which provides the aforementioned surface modification. The first station 44 lowers the primer layer 28 of FIG. 1. Usually in the second pass, station 44 is used to deposit the gray metal layers 14 and 18, and second station 46 is used to deposit the transparent layers 16 and 20. Typically, the primer layer is formed during the formation of the first layer pair 14 and 16. In addition, using the apparatus shown in FIG. 3, each layer pair requires a different process. The control and monitoring of the sputtering device 38 is accomplished using standard equipment and sensors in this type of coating machine. A mass flow controller (MKS) 80 was used to regulate the gas flow into the cathode stations 44 and 46. The reel motion controller 82 adjusts the tension, speed and speed of the base material 12 as it moves through the device 38.

88119628.ptd Page 15 568891 V. Description of the invention (12) Distance. One or more AC or DC power sources 84 provide power to both base cathodes of stations 44 and 46. An optical monitoring system 86 was used to determine the optical characteristics of the base material in the spectral region of 400 nm to 2000 nm. The optical monitoring system is connected to four monitors 70, 72, 74 and 76. The front glow power source 88 controls the operation of the front glow station 78. f. Example of pepper pepper A roll of PET substrate with a hard coating layer having a thickness of 7 mils is loaded into a sputtering apparatus 38 of the type described with reference to FIG. The substrate is oriented so that the hard coat layer 26 of FIG. 1 faces the sputtering stations 44, 46, and 48. In the initial stage, the substrate is subjected to a pre-glow treatment, and a primer layer 28 is applied. This process is performed under the following conditions: (1) Glow chamber 78 gas flow: 02 13. 4 glow pressure. 16¾ Torr (mHiiTorr) glow voltage: 1 500 volts glow current pull: 100 milliamps ( 2) Station 46 line speed: 25mm / s

Sl deposited gas flow: Ar 103.4 seem Target power · 9 0 0 watt Pressure: 3 · 0 mTorr As a result, a stone priming layer was formed. Using sputtering, a wavelength of 400 nm (blue) is transmitted. The target in the initial process is a silicon target. With the optical monitoring capability of 38, the measurement ratio is reduced by 3%.

568891 V. Description of invention (13). Since only the primer layer 28 is formed in the initial pass, it is referred to as "the first pass". In the "first pass", a first layer pair 14 and a portion of 16 (that is, 77 mils) are formed. The physical thickness of the nickel-chromium layer 14 is not directly controlled. In contrast, the optical properties exhibited by the S chromium layer are the main focus. In order to explain the visible light transmission of the coating of the =, the decrease of Tvis due to the layer pair w, which is adjusted to 75.6

Tv.s || S, 75.1% ^? 6. 1〇 / 〇fiJ ^ f ^ Glow voltage: 0 Volts (ie off) w 仵 is as follows · Light: 1 NiCr dry followed by 2 Si dry (ie AC pair) Linear velocity · 9 mm / s gas flow on NiCr target: 4ι4 Pressure on NiCrl ^: 3.03 mTorr Electrical condition on NiCr target: 39 watts, 1.01 amp / 430 volts on Si cathode Gas flow rate: Ar 103 3 s 4 丄 Pressure at Si cathode: 3.25 mTorr · 3 sccm Electrical property at Si cathode: 5.0 仟 8 Partial pressure of oxygen: 0.22 mTorr. / Yihuot As a result of "the 1st ^ Zhishili," w

Tvis is fossilized. Thick fruit; the optical device has a thickness of about 75. The thickness is about 77.3 nm. The measured partially completed optical characteristics of the optical pre-configuration can be determined by the first metal layer and the second layer of the metal dioxide and the second power = good. This thickness was increased in other experiments. In a "; to 110 nanometers. In the second real. :: micrometers. From this second experiment, push a knife and say about 1 20 鼋 Fen into another pass to form gray metal and dioxin & amp 568891 V. Description of the invention (14) The second layer of silicon. Referring to the figure}, the gray metal layer 18 is formed to a thickness of micrometers, and the silicon dioxide layer 20 is formed to have a thickness of 86, 亳 micro = · 7 millidegrees; The measured visible light transmission is 49%. The conditions of this process are as follows: The thickness of the gas flow at the NiCr cathode Α γ 11.4 seem The system at the NiCr cathode: 3.01 mTorr at the electrical properties of the NiCr cathode · 75 0 watts, 15 amps / 463 volts at the Si cathode: Ar 102.5 seem; 02 5 3.9 Seem Pressure at the Si cathode: 3.19 mTorr cm Electrical properties at the Si cathode: 5 · 〇 · Watts, 12.5 amps / 439 volts Figure 4 shows the reflective properties of the resulting optical configuration at visible wavelengths. However, the optical properties of the present invention can be easily adjusted to meet the required specifications.

88119628.ptd Page 18

Claims (1)

Case No. 568891, 19628, 6th Amendment Patent Scope1. A reflection control element comprising a substrate having a first surface; a multilayer anti-reflection coating on the substrate, the anti-reflection coating comprising: made of nickel chromium A first layer formed of an alloy, the first layer being adjacent to the first surface of the substrate; a second layer on the first layer; the second layer being a third layer of silicon oxide on the second layer Layer, the third layer is a fourth layer of the nickel-chromium layer on the third layer, and the fourth layer is a silicon oxide ~ a primer layer between the substrate and the anti-reflection coating to promote the anti- Reflection = adhesion of the layer. The primer layer has a thickness of less than 50 angstroms and is formed of a material that is susceptible to at least partial oxidation when exposed to oxygen. 2. The reflection control element according to item 1 of the patent application, wherein the paint layer is deposited in silicon in a substantially oxygen-free environment. 3. The reflection control element according to item 1 of the patent application scope includes a hard coating layer sandwiched between the substrate and the primer layer. 4. The coating of the reflection control element according to item 3 of the patent application is a siloxane-based material. 5. The reflection control element according to item 1 of the patent application range, wherein the first layer has a thickness in the range of 0.5 nm to 30 nm, and the third layer has the anti-reflection coating selected The visible light transmission & transmission ratio (Tv is) reaches a thickness in the range of 20% to 80%. 6 · The reflection control element according to item 1 of the patent application range, wherein the first layer has a thickness in the range of 1 nm to 15 nm, and the third layer has the anti-reflection coating selected The layer iTvis reaches a level of 30% ^. Ju ·-ί Replace the bottom of the bottom, and even more, the hard \\ Eight 326 \ Total files \ 88 \ 88119628 \ 88119628 (Replace) -2.ptc Page 21 568891 Thickness in the range of 60%. _7. The reflection control element according to item 1 of the patent application range, wherein the second and fourth layers are silicon dioxide, each of which has a thickness in a range of 50 nm to 2000 nm. 8 · A reflection control element comprising: a transparent substrate; a primer layer having a thickness of less than 50 angstroms, the primer layer being formed of a material selected to promote the adhesion of the nickel front alloy layer; The second nickel-chromium alloy layer formed on one side of the substrate and in contact with the primer layer has a nickel-chromium alloy layer having a range of 0.5 nm to 30 nm and the first nickel-chrome alloy The first transparent silicon oxide layer in contact with the first transparent silicon oxide layer has a thickness in the range of 50 nm to 200 nm and a second nickel-chromium alloy layer in contact with the first transparent oxygen cut layer. = Cr alloy layer has 0.5 nm to 3. Thickness in the nanometer range The second transparent oxygen-alloyed oxide layer in contact with the second nickel-chromium alloy layer has 6. Nanometers to 12. Thickness in the range of nanometers 9th. The reflection control element such as the item 8 in the scope of patent application, the towel and lacquer layer are formed by silicon which is susceptible to oxidation after deposition. 10. The reflection control element according to item 8 of the scope of patent application, further comprising a hard coating layer between the primer layer and the substrate to enhance the substrate. 568891 Usability. 11. The reflection control element according to item 9 of the patent application scope, which includes a slippery layer formed in the second transparent oxide layer and the substrate. 〈Smoothing on one side includes the following steps: · 1 2 · — A method for manufacturing a reflection control element to provide a transparent substrate; a primer layer is formed on the substrate to facilitate the adhesion of the nickel-chromium layer, in an environment without oxidation Depositing silicon to a temperature of less than 50 angstroms; 'including forming a first nickel-chromium layer on the primer layer; X' forming a first transparent layer on the second envelope layer; on the first transparent layer Forming a second nickel-chromium layer on the layer; and forming a second transparent layer on the second nickel-chromium layer, the reflection is controlled and there is Tvis in a range of 20% to 80%. ', 1 3. The method of claim 2 in the scope of patent application, wherein: the step of forming the -chromium layer includes a thickness of the material in a range of 0.5 nm to 30 nm; and This step of the second nickel-chromium layer includes depositing the material to a selected value such that the reflection control element 2Tvis reaches between 20% and 8. Thickness within a percentage range. i4. In the method ′ ㊣ of item 12 of the scope of patent application, the step of forming the first and first transparent layers includes forming each of the layers to a thickness in the range of 50 nm to 200 nm. C: \ master file \ 88 \ 88119628 \ 88119628 (replace)-2. ptc page 23 568891