TW560016B - One-time formation of flip-chip type ball grid array semiconductor package and its manufacturing method - Google Patents

One-time formation of flip-chip type ball grid array semiconductor package and its manufacturing method Download PDF

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Publication number
TW560016B
TW560016B TW91121571A TW91121571A TW560016B TW 560016 B TW560016 B TW 560016B TW 91121571 A TW91121571 A TW 91121571A TW 91121571 A TW91121571 A TW 91121571A TW 560016 B TW560016 B TW 560016B
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Taiwan
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flip
substrate
chip
solder
manufacturing
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TW91121571A
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Chinese (zh)
Inventor
Szu-Wei Lu
Wei-Hua Lu
Feng-Jun Leu
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Ind Tech Res Inst
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Publication of TW560016B publication Critical patent/TW560016B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

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  • Wire Bonding (AREA)

Abstract

A kind of one-time formed flip-chip type ball grid array semiconductor package and its manufacturing method are disclosed in the present invention. Through the surface tension of soldering paste, the soldering paste of solder ball array is filled into the conduction holes of the substrate via the substrate surfaces, so as to complete flip-chip attachment and soldering ball array package in one time. Thus, the manufacturing steps can be effectively saved. Therefore, the flip-chip package can be completed without requiring the actions of forming bumps and underfill on the chip and substrate surface when generating flip-chip attachment. In addition, by using the surface tension of the soldering paste itself for the soldering ball array, the amount of soldering paste filled into the conducting holes of substrate can be controlled. The invention is used to simplify the processes of flip-chip attachment and soldering ball array package such that it is capable of relatively decreasing the factors influencing the manufacturing process and making the manufacturing process more stable for reducing the packaging cost.

Description

560016 五、發明說明(1) 【發明的應用 本發明是 法,特別是關 裝與其製造方 【發明的背景 現今半導 輕、薄、短、 半導體元件構 可靠度、密度 此,封裝以及 近年來, 出各種新的接 覆晶直接晶片 DCA)技術被大 其中’覆晶接 of solder ba (lead frame) 的技術,可降 小晶片封裝後 此種技術符合 外型小的發展 同時,在 grid array, 點。由於半導 範圍】 一種覆晶式閘球陣列半導體構裝與其製造方 於一種一次成形之覆晶式閘球陣列半導體構 法。 ] 體元件的結構,伴隨著電子產品同步朝向 小、高速化與高機能化之發展趨勢,而使得 裝的技術不斷突破創新。由於對於增加元件 以及減少元件尺寸方面的要求不斷提高,因 接合技術的條件越來越嚴可。 傳統打線接合(w i r e b ο n d i n g )技術逐漸發展 合技術,例如覆晶接合技術(f 1 i p - c h i p )或 接合(flip-chip direct chip attachment, 量運用於積體電路晶片封裝(packaging)。 合技術係以晶片表面形成銲球陣列(a r r a y 1 1 )的技術取代習知封裝所使用的導線架 ,而晶片以反轉方式直接接觸並接合於基板 低晶片與基板間的電子訊號傳輸距離’並縮 的尺寸,使得晶片封裝前後大小相差不多。 未來高頻雜訊容易控制、多功能、高密度與 趨勢。 基板的電性連接方面,更以閘球陣列(b a 1 1 BGA )構裝取代了傳統的接腳來形成支點及焊 體元件的結構日趨微細和複雜,因此,半導560016 V. Description of the invention (1) [Application of the invention The invention is a method, especially the assembly and its manufacturer [Background of the invention Today semiconductors are light, thin, short, semiconductor component structure reliability, density, packaging and recent years A variety of new chip-on-chip direct-current wafer (DCA) technologies have been introduced. Among them, the chip-on-solder ba (lead frame) technology can reduce the size of small-chip packages after packaging. This technology is in line with small-scale development. , Point. Because of the semiconducting range] A flip-chip brake-array semiconductor structure and its manufacturing method are a one-shot flip-chip brake-array semiconductor structure. ] The structure of body components is accompanied by the development trend of electronic products toward small, high-speed and high-functionality, which makes the technology of packaging continue to break through innovation. As the requirements for increasing components and reducing component sizes continue to increase, the conditions for bonding technology are becoming more stringent. Traditional wireb ο nding technology gradually develops bonding technology, such as flip-chip bonding technology (f 1 ip-chip) or flip-chip direct chip attachment, which is used in volume for integrated circuit chip packaging. The technology of forming a solder ball array (array 1 1) on the surface of the wafer is used to replace the lead frame used in conventional packaging, and the wafer directly contacts and is bonded to the substrate in a reversed manner, and the electronic signal transmission distance between the wafer and the substrate is reduced. The size of the chip makes the size of the chip package similar before and after. In the future, high-frequency noise is easy to control, multi-functional, high-density and trend. In terms of the electrical connection of the substrate, the ball-ball array (ba 1 1 BGA) structure has replaced the traditional The structure of the pins to form the fulcrum and the welded component becomes increasingly finer and more complex. Therefore, the semiconductor

響IIill 第4頁 560016 五、發明說明(2) "" -- 體元件$裝從原有的雙邊接腳進展到四邊都可以接腳。然 而 、I緣接腳的方式在面臣品腳數過多時,腳距變得非常 抬,在黏著電路板的過程中產生了良率不高的問題。於是 閘球陣列(b a 1 1 g r丨d a r r a y,B G A )構裝方法改變基板以接 腳形成支點及焊點的封裝方式,於基板的底部面積排列錫 球陣列取代傳統接腳,使得腳距由〇 · 5 _擴大至丨· 5,良 率也因此提升。 此外,更可結合覆晶接合技術與錫球陣列封裝方式以 發展出覆晶接合(F 1 i p C h i p )錫球陣列構裝(B G A )技術。此 項結合的技術同時具有頻率響應佳、晶片中訊號的干擾少 及電性表現優於其他封裝方法之特點。 同時應用覆晶接合(F 1 i p C h i p )與錫球陣列構裝(B g A ) 技術的製程’包含了覆晶技術與B G A構裝組裝兩部分。首 先’在覆晶技術方面包含了先分別在基板及晶片表面設定 的位置製作欲接合的凸塊與問球結構,再將晶片置放於美 板的預先设定位置加以焊接並以底部填膠法(u n d e r f i 1 1 ) 填入封止材料。其中,凸塊與閘球結構可由蒸鏡 (evaporation)方式產生’蒸鍍時,金屬蒸氣經過網罩 (m a s k)即在晶片或是基板所需的位置產生凸塊圖案。此 外,在BGA構裝組裝方面則是需要另外在基板預定的位置 製作閘球陣列以達成基板的電性連接;BGA構裝組裝製程 中經常以電鍍或是錫球印刷的技術來大量產生問球陣列。 雖然同時應用覆晶接合與錫球陣列構裝技彳^有其優 點,但是結合覆晶技術與BGA構裝組裝兩部分時需要分"別 ifIIIIill Page 4 560016 V. Description of the invention (2) " "-The body component has been installed from the original bilateral pins to the four sides. However, when the number of pins on the I edge is too high, the pin pitch becomes very high, which causes a problem of low yield during the process of bonding the circuit board. Therefore, the brake ball array (ba 1 1 gr 丨 darray, BGA) construction method changes the packaging method of the substrate by using pins to form fulcrum and solder joints. An array of solder balls is arranged on the bottom area of the substrate instead of the traditional pins, so that the pitch of the foot is changed by 〇 · 5 _ expands to 丨 · 5 and yield rate is improved as a result. In addition, the flip-chip bonding technology and the solder ball array packaging method can be combined to develop a flip-chip bonding (F 1 i p C h i p) solder ball array assembly (B G A) technology. This combined technology also has the characteristics of good frequency response, less interference of signals in the chip, and better electrical performance than other packaging methods. At the same time, the process of applying flip-chip bonding (F 1 i p C h i p) and solder ball array assembly (B g A) technology ’includes two parts: flip-chip technology and B G A assembly. First of all, in terms of flip chip technology, the bumps and ball structures to be joined are first made at the positions set on the substrate and the wafer surface, and then the wafer is placed at the preset position of the US board to be soldered and the bottom is filled with glue (Underfi 1 1) Fill in the sealing material. Among them, the bumps and the ball structure can be generated by evaporation method. During the vapor deposition, the metal vapor passes through the mesh cover (ma sk) to generate the bump pattern at the desired position of the wafer or the substrate. In addition, in the BGA structure assembly, it is necessary to additionally make a brake ball array at a predetermined position of the substrate to achieve the electrical connection of the substrate; the BGA structure assembly process often uses electroplating or solder ball printing technology to generate a large number of question balls Array. Although the application of flip-chip bonding and solder ball array assembly technology has its advantages, it is necessary to separate the two parts when combining flip-chip technology and BGA assembly.

IIIIII

m IIm II

ill· 第5頁 560016 五、發明說明(3) 製作凸塊與閘球結構,再經過各種熱處理程序加以接合。 因此,使得製程相當複雜,導致製程影響因素多而造成製 程不穩定;也由於製程步驟增加相對的提高了封裝成本。 【發明之目的與概述】ill · Page 5 560016 V. Description of the invention (3) Fabrication of bump and brake ball structure, and then joint through various heat treatment procedures. Therefore, the manufacturing process is quite complicated, which leads to many factors affecting the process and causes the process to be unstable; it also relatively increases the packaging cost due to the increase in the number of process steps. [Objective and Summary of the Invention]

為了解決上述習知技術的問題,本發明提供一種一次 成形之覆晶式閘球陣列半導體構裝與其製造方法,能夠簡 化覆晶接合與錫球陣列構裝技術的製程,相對的能夠減少 影響製程的因素以及降低封裝成本。相較於一般需要分別 在晶片與基板雙面分別形成凸塊與閘球結構的製程,本發 明之一次成形之覆晶式閘球陣列半導體構裝與其製造方法 約節省了包含形成凸塊(b u m p i n g )、覆晶接合以及底部填 膠(under f i 1 1 )等二十多項製程步驟°In order to solve the problems of the above-mentioned conventional technology, the present invention provides a flip-chip gate array semiconductor structure and its manufacturing method, which can simplify the process of flip-chip bonding and solder ball array assembly technology, and can relatively reduce the impact process. Factors and reduce packaging costs. Compared with the general process of forming bumps and gate ball structures on both sides of the wafer and the substrate, respectively, the once-molded flip-chip gate ball array semiconductor structure and manufacturing method of the present invention can save about bumping. ), Flip-chip bonding and under-filling (under fi 1 1) more than 20 process steps °

本發明揭露之一次成形之覆晶式閘球陣列半導體構裝 與其製造方法係利用錫膏本身的表面張力將錫球陣列之錫 嘗經由基板表面的導線填入基板的導通孔’猎此將覆晶接 合與錫球陣列構裝一次完成;可以有效的節省製程步驟。 在產生覆晶接合時不需要在晶片和基板形成凸塊 (bumping)以及底部填膠(underfill)的動作即可完成覆晶 封裝。且利用錫球陣列之錫膏自身的表面張力可以控制填 入基板導通孔的錫膏量。同時本發明利用填入錫膏的基板 導通孔進行基板上下層的電路導通;因此具有能夠進行多 層基板堆疊構裝的特性。 本發明所揭露之一次成形之覆晶式閘球陣列半導體構 裝,其包含有:一基板,其具有複數個填入錫膏之導通孔The once-molded flip-chip gate ball array semiconductor structure disclosed by the present invention and the manufacturing method thereof use the surface tension of the solder paste to fill the solder of the solder ball array into the via holes of the substrate through the wires on the surface of the substrate. Crystal bonding and solder ball array assembly are completed at one time; process steps can be effectively saved. When flip-chip bonding occurs, the flip-chip package is completed without the need to form bumping and underfill operations on the wafer and substrate. And the surface tension of the solder paste of the solder ball array can be used to control the amount of solder paste filled in the substrate via hole. At the same time, the present invention uses the substrate vias filled with solder paste to conduct the upper and lower circuits of the substrate; therefore, it has the characteristics of being capable of stacking multiple layers of substrates. The once-formed flip-chip gate ball array semiconductor structure disclosed in the present invention includes: a substrate having a plurality of via holes filled with solder paste

560016 五、發明說明(4) 及複數個錫球,每一複數個填入錫膏之 線連接於複數個錫球其中之一;及一個 個以上的晶片透過複數個 路導通’ ,^個以上的晶片 一適當的間距。 填入錫嘗之導 並以複數個間 導通孔各具 以上的晶片 通孔與基板 隔元件與基 有一導 ,其一 達成電 板形成 本發明 構裝的製造 數個導通孔 導線連接於 片,其以複 個以上的晶 板之複數個 錫球溶融形 複數個導通 片 使一個 基板至一適 的晶片 完成 此外, 裝與其製造 表面,導線 錫膏導入複 及所形成的 個導通孔的 【較佳實施 更包含 方法, 及複數 該複數 數個間 片之複 導通孔 成複數 孔形成 以上的 當溫度 迴焊的 本發明 方法, 係事先 數個導 錫膏球 尺寸與 例說明 上述一 其步驟 個錫球 個錫球 隔元件 數個預 ; 及力口 個錫膏 錫膏球 晶片與 的步驟 步驟。 次成形 包含有 ?每一 其中之 與基板 定與基 熱基板 以沿著 並至錫 基板達 ,更包 之覆晶式閘球陣列半導體 :提供一基板,其具有複 該複數個導通孔各具有一 一;提供一個以上的晶 隔離_ 適當距離, 板達成電性連接處 至一適當溫度,使 導通孔之導 複數個 膏球接 成電路 含同時 並使一 對準基 複數個 線填入 觸到一個以上的晶 ,力σ熱 個以上 導通。其中 之 次 複數個 於表面 通孔。 形狀可 複數個 成形之覆晶式 錫球可以用印 佈上錫膏,以 而填入複數個 透過錫膏本身 錫球的體積來 使基板與一 閘球陣列半 刷方式塗佈 利錫球溶融 導通孔的錫 的表面張力 控制。 導體構 於基板 形成之 膏量以 由複數560016 5. Description of the invention (4) and a plurality of solder balls, each of which is filled with solder paste, is connected to one of the plurality of solder balls; and more than one chip is conducted through a plurality of paths, and more than ^ A proper pitch of the wafer. Fill in the lead of the tin and use a plurality of inter-via holes each with more than one wafer through hole and the substrate spacer element and the base. One of them can be used to form an electrical board to form a plurality of via holes connected to the chip. It uses a plurality of solder balls of a plurality of crystal plates to melt and shape a plurality of conductive pieces to complete a substrate to a suitable wafer. In addition, it is mounted on its manufacturing surface, the lead solder paste is introduced into the conductive holes, and the conductive holes are formed. The preferred method further includes a method, and the method of the present invention for temperature reflow soldering when the plurality of vias of the plurality of interlayers are formed into a plurality of holes. The method of the present invention refers to the size of a plurality of solder paste balls in advance and an example to explain one of the above steps. Several steps of solder ball and solder ball spacer elements; and a step of solder paste and solder ball wafers. Sub-forming includes: each of which is aligned with the substrate and the base thermal substrate to reach along the tin substrate, and further includes a flip-chip gate array semiconductor: providing a substrate having a plurality of vias each having One by one; provide more than one crystal isolation _ proper distance, the board reaches the electrical connection to an appropriate temperature, so that a plurality of paste balls of the vias are connected into a circuit, and at the same time a plurality of alignment base lines are filled into the contact To more than one crystal, the force σ heats more than one to conduct. Among them, a plurality of surface vias are used. The shape can be multiple shaped flip-chip solder balls. You can use solder paste on the printed cloth to fill the volume of the solder balls through the solder paste to make the substrate and a gate ball array half-brush coating. Surface tension control of the tin of the hole. The amount of paste formed by the conductor on the substrate

1_SI: 第7頁 5600161_SI: Page 7 560016

五、發明說明(5) 根 體構裝 錫膏, 於迴焊 熱溶融 著基板 片間的 次完成 因素以 為 體構裝 下: 據本發 與其製 以及於 基板表 形成之 表面的 覆晶接 ;可以 及降低 詳細說 與其製 明所揭 造方法 基板預 面之閘錫膏, 導線填 合結構 有效的 封裝成 明本發 造方法 露的一次 ’係事先 定與晶片 球陣列之 將由於錫 入基板的 。藉此將 節省製程 本的目的 明之一次 ,將本發 成形之覆晶式 於基板表面的 接合處形成導 時,基板表面 膏本身表面張 導通孔;同時 覆晶接合與錫 步驟;達到減 〇 成形之覆晶式 明實施例配合 閘球陣列半導 導線佈上一層 通孔。然後, 之閘球陣列受 力的影響而沿 形成基板與晶 球陣列構裝一 少影響製程的 閘球陣列半導 圖不說明如 、明芩考第1圖,第1圖為本發明實施例之一次成形之覆 晶式閘球陣列半導體構裝的上視圖,其結構包含有:具有 56 ( 28X2 )個填入錫膏的導通孔丨3與56 ( 28义2)個錫球丨丨的基 板1 〇且母一個導通孔1 3都各具有一導線1 2連接於一個锡 球1 1 ’以及一晶片2 〇 ’晶片係透過填入錫膏的導通孔1 3與 基板1 0達成電路導通並以複數個間隔元件(無圖示)隔離於 基板。並且由第2圖可得知,其填入錫膏的導通孔丨3以7個 為一組分別以一導線丨2連接於一個錫球1丨,其錫球1丨的直 控,26 0微米(Vm,micrometer),而個別的導線12長度則 因每一個導通孔1 3與錫球1 1之間的距離不等而略有差異, 其中之最大導線長度約為380微米(vm,micrometer)。 本發明更包含一次成形之覆晶式閘球陣列半導體構裝Fifth, the description of the invention (5) root body structured solder paste, the second completion factor between the substrates in the reflow hot-melt melting substrates: according to the present invention and its system and the flip-chip connection on the surface formed on the substrate surface; It can reduce the solder paste of the substrate pre-surface of the method disclosed in detail. The wire packing structure can be effectively packaged into the substrate once exposed by the method of the invention. of. In this way, the purpose of saving process costs is clear. When the flip chip of the present invention is formed at the junction of the substrate surface, the via on the surface of the substrate surface paste itself opens the vias; at the same time, the flip chip bonding and tin steps are achieved; The flip-chip embodiment of the present invention is matched with a layer of through holes in the semi-conductive wire of the brake ball array. Then, the brake ball array is affected by the force, and a semi-conductive map of the brake ball array is formed along the formation substrate and the crystal ball array with a small influence on the process. The first figure is not shown. The first figure is an embodiment of the present invention. A top view of a once-formed flip-chip gate array semiconductor structure, the structure of which includes: 56 (28X2) vias filled with solder paste 3 and 56 (28 2) solder balls 丨 丨The substrate 10 and the mother vias 13 each have a lead 12 connected to a solder ball 1 1 ′ and a wafer 20 ′. The wafer is electrically connected to the substrate 10 through the vias 13 filled with solder paste. It is isolated from the substrate by a plurality of spacer elements (not shown). It can be seen from FIG. 2 that the via holes filled with the solder paste 3 are connected to a solder ball 1 with a wire 丨 2 in a group of 7 and the direct control of the solder ball 1 2 6 0 Micrometer (Vm, micrometer), and the length of individual wires 12 varies slightly due to the different distance between each via 13 and the solder ball 1 1, where the maximum wire length is about 380 microns (vm, micrometer ). The invention further comprises a flip-chip gate ball array semiconductor structure formed at one time.

第8頁 560016 五、發明說明(6) 步驟包含有··提供一基板,其具有複數個 於複數個=錫球、:複數個導通孔係以複數個導線連接 之一連接於1 ’母一稷數個之導通孔係由複數個導線其中 ,連接於稷數個錫球其中之一;提供一晶片,豆以 :=隔:件與基板形成一 ·當距•,並★晶片 < 預定與基 基板ί:ΐίί處對準基板之複數個導通孔;最後將二 . 、田,里度,使複數個錫球形成溶融錫膏並f著 複數個導通孔以形成複數個錫。= 禝數個錫τ球使晶片與基板達成電路導通。 -浐ϋ'Γ說明本發明,請參考第3圖;第3圖為本發明 ;一 -人成一形之覆晶式閘球陣列半導體構裝的剖面 "〇弟圖所不,其晶片2 0係以複數個間隔元件2 1 I美 =形成—適當距離^發明是利料錫材料本身之^面 :λ二:Ϊ1:表面之錫球11溶融形成錫膏沿著導線12填 達成電路導通。w入導 守ι礼13的錫τ,也利用錫暮 本身的表面張力來成型。如此, 、月 晶接合-次同時完成迴谭。了使基板的錫球陣列與覆 門丄中^: it! 2例係以印刷方式形成複數個錫球之 Γ1:::ί:ϊΓ先於表面佈上錫膏,以利錫球溶融 ^成之錫通孔;t線q才質係為銅&是紹金屬材 枓。此外,經過熱處理之複數個導通孔的複數個錫膏球之 二小與形狀係由複數個導通孔的尺寸和複數個錫球 寻因素來加以控制。 、 imi 第9頁 560016 五、發明說明(7) 以上所述者,僅為本發明其中的較佳實施例而已,並 非用來限定本發明的實施範圍;即凡依本發明申請專利範 圍所作的均等變化與修飾,皆為本發明專利範圍所涵蓋。Page 8560016 V. Description of the invention (6) The steps include providing a substrate with a plurality of = a plurality of solder balls: a plurality of vias are connected to the 1 'female one by one of a plurality of wire connections. The plurality of vias are composed of a plurality of wires, which are connected to one of the plurality of solder balls; a chip is provided, and the beans are formed by: = spacer: a distance between the substrate and the substrate, and the chip is scheduled A plurality of vias are aligned with the base substrate at a position of ί: ίί; finally, the two solder balls are formed into a molten solder paste and a plurality of via holes are formed to form a plurality of tins. = 禝 Several tin τ balls make the chip and substrate achieve circuit conduction. -浐 ϋ'Γ illustrates the present invention, please refer to FIG. 3; FIG. 3 is the present invention; a cross-section of a flip-chip gate array semiconductor structure formed by a man-made shape " not shown in the figure, its wafer 2 0 is a plurality of spacer elements 2 1 US = formation-a proper distance ^ invention is a material of the tin material itself ^ plane: λ two: Ϊ 1: the surface of the ball 11 melts to form a solder paste along the wire 12 to achieve circuit conduction . The tin τ of the guide 13 is also shaped by the surface tension of tin twilight itself. In this way, the lunar bonding was completed at the same time back to Tan. In order to make the solder ball array of the substrate and the gate cover ^: it! 2 cases are to form a plurality of solder balls by printing Γ1 ::: ί: ϊΓ before the surface is covered with solder paste, so that the solder balls can be melted into ^ The tin through hole; the quality of the t wire q is copper & is a metal material of Shao. In addition, the size and shape of the plurality of via holes and the plurality of solder ball seeking factors are controlled by the two small shapes and shapes of the plurality of via holes of the plurality of via holes after the heat treatment. Imi Page 9 560016 V. Description of the invention (7) The above are only the preferred embodiments of the present invention, and are not used to limit the scope of the invention; Equal changes and modifications are all covered by the patent scope of the present invention.

第10頁 560016 圖式簡單說明 第1圖為本發明實施例之一次成形之覆晶式閘球陣列 半導體構裝的上視圖; 第2圖為本發明實施例之一次成形之覆晶式閘球陣列 半導體構裝的部分放大圖;及 第3圖為本發明實施例之一次成形之覆晶式閘球陣列 半導體構裝的剖面圖。 【圖式符號說明】 10 基板 11 錫球 12 導線 13 導通孔 20 晶片 21 間隔元件Page 560016 Brief Description of Drawings Figure 1 is a top view of the semiconductor structure of a flip-chip brake ball array formed in one embodiment of the present invention; Figure 2 is a flip-chip brake ball formed in one embodiment of the present invention An enlarged view of a part of the array semiconductor structure; and FIG. 3 is a cross-sectional view of a flip-chip gate ball array semiconductor structure formed in one embodiment according to the present invention. [Illustration of Symbols] 10 substrate 11 solder ball 12 wire 13 via 13 chip 21 spacer

第11頁Page 11

Claims (1)

560016560016 一基板,其具有複數個導線、複數個填入 通孔及複數個錫球,該複數個填入錫膏之導通孔:以該 複數個導線連接於該複數個錫球,备 ’、^ 春夕道、S 了丨总、> 母一該稷數個填入錫 月之V通孔係由该複數個導線其中 錫球其中之一;及 連接於该稷數個 一個以上的晶月,該^一 /fg| I;/ I- ΛΑ η 個埴Λ级* +、曾 上的日日片係透過該複數 入錫τ之導通孔與該基板達成電路導通。 如申請專利範圍第1項所述之一戈 列半導體構裝,該—個以上的晶片:之復晶式閘球陣 隔離兮A 4c :〇/ «χ 曰日片係以複數個間隔元件 同離该基板形成一適當的間距。 如申請專利範圍第1 一 量係由該複數個埴入錫膏之導通錫Τ之導通t的錫膏 的體積。 /、入錫H之v通孔尺寸、該複數個錫球 4. 如申請專利範圍第1項所述之一 列半導體構襄,其Λ複數個導人線成形之覆晶式1球降 Τ,以利該銲錫材料導入該複導2於表佈上錫 如申請專利範圍第丨項所述之一 ν通孔。 屬材料其中之一。 、'1之材質係為銅和鋁金 如申請專利範圍第丨項所述之一 列半導體構裝,其巾該複數 ^之覆晶式間球陣A substrate having a plurality of wires, a plurality of filled vias, and a plurality of solder balls. The plurality of vias filled with solder paste are connected to the plurality of solder balls by the plurality of wires. Xidao, S 丨 Total, > the mother-the plurality of V through holes filled into the tin moon is made of one of the plurality of wires among the tin balls; and connected to the plurality of one or more crystal moons, The ^ a / fg | I; / I- ΛΑ η 埴 Λ level * +, the previous Japanese and Japanese films are used to achieve circuit conduction with the substrate through the plurality of vias into the tin τ. According to one of the Gorilla Semiconductor structures described in item 1 of the scope of the patent application, the one or more wafers: a polycrystalline brake ball array isolation A 4c: 0 / «χ A proper distance is formed from the substrate. For example, the first quantity in the scope of the patent application is the volume of the solder paste of the conductive t of the conductive tin T inserted into the solder paste. /, The size of the v through hole into the tin H, the plurality of solder balls 4. As described in item 1 of the scope of the patent application, a series of semiconductor structures with a Λ shape of a plurality of lead wires forming a flip-chip 1 ball drop T, In order to facilitate the introduction of the solder material into the guide 2 on the surface cloth, the tin is a ν through hole as described in the first item of the patent application scope. Is one of the materials. The material of "1" is copper and aluminum gold. As described in item 丨 of the patent application, the semiconductor structure is a series of flip-chip interstitial arrays. 來係以印刷方式形成。 560016Lai is formed by printing. 560016 7. 一種一次成形之覆晶式閘球陣列半導體構裝的制、主 法,其步驟包含有: 、 i^方 複數個導線及 個導線連接於 由該複數個導 提供一基板,其具有複數個導通孔、 複數個錫球,該複數個導通孔係以該複數 該複數個錫球’每一該複數個之導通孔係 線其中之一連接於該複數個錫球其中之_ 提供一個以上的晶片 Μ .1..., fci>J cq μ . , 個預定與基板達成電性連接處對準該基板之該複數= 通孔;及 I 加熱該基板 王 適▲溫度,使該複數個錫球 融錫貧並沿著該複數個導線填入該複數個導通孔^ / f數個錫膏並透過該複數個豸膏球使該_個以丄的 曰曰片與該基板達成電路導通。 、 所述之—次成形之覆軸 歹J + V體構I的製造方法,該—個以上 個間隔元件隔離該基板形成—適當的間距。糸複數 列t ^ ϋ : : ί 7項所述之—次成形之覆晶式閘球陣 列+ ¥體構I的製造方法,其中該加埶該 舍 的步驟’係同時使該基板與該一個以上的晶片 ο. 匕第7項所述之-次成形之覆晶式閘球陣 製造方法,其中填入該複數個導通孔 的尺寸、該複i 之大小ΐ形狀係由該複數個導通孔 Λ 個锡球的體積與該複數個間隔元件的,7. A fabrication and main method of a flip chip semiconductor ball array semiconductor fabrication method, the steps include: i, a plurality of wires and a plurality of wires connected to a substrate provided by the plurality of guides, which has a plurality of Vias, a plurality of solder balls, the plurality of vias are connected to one of the plurality of solder balls by one of the plurality of the plurality of solder balls' each of the plurality of via holes line _ provide more than one The number of wafers M .1 ..., fci &J; J cq μ., The plurality of which are intended to be electrically connected to the substrate are aligned with the plurality of the substrate = through holes; and I heat the substrate at a suitable temperature, so that the plurality of Solder balls are melted and depleted, and the plurality of vias are filled along the plurality of wires ^ / f, the plurality of solder pastes are passed through the plurality of solder paste balls, and the circuit board is electrically connected to the substrate with the solder paste . As mentioned, the manufacturing method of the secondary-molded cover shaft 歹 J + V body structure I, the-more than one spacer element is formed to isolate the substrate-the proper pitch.糸 Complex number sequence t ^ ϋ:: ί The 7th method of manufacturing a flip-chip brake ball array + ¥ structure I, wherein the step of adding the substrate is to simultaneously make the substrate and the one The above wafer ο. The method for manufacturing a flip-chip gate array of the sub-shape described in item 7 above, wherein the size of the plurality of vias and the size of the complex i are filled with the plurality of vias. The volume of Λ solder balls and the number of spacer elements, 560016 六、申請專利範圍 高度來控制。 11.如申請專利範圍第7項所述之一次成形之覆晶式閘球陣 列半導體構裝的製造方法,其中該複數個錫球係以印 刷方式形成。 1 2.如申請專利範圍第7項所述之一次成形之覆晶式閘球陣 列半導體構裝的製造方法,其中該複數個導線係事先 於表面佈上錫膏,以利該複數個錫球溶融形成之錫膏 導入該複數個導通孔。560016 6. Scope of patent application Height control. 11. The manufacturing method of the flip-chip brake ball array semiconductor structure as described in item 7 of the patent application scope, wherein the plurality of solder balls are formed by printing. 1 2. A manufacturing method of a flip-chip gate ball array semiconductor structure as described in item 7 of the scope of the patent application, wherein the plurality of wires are coated with solder paste on the surface in advance to facilitate the plurality of solder balls The solder paste formed by melting is introduced into the plurality of via holes. 1 3.如申請專利範圍第7項所述之一次成形之覆晶式閘球陣 列半導體構裝的製造方法,其中該複數個導線之材質 係為銅和鋁金屬材料其中之一。1 3. The manufacturing method of the flip-chip gate array semiconductor structure as described in item 7 of the scope of the patent application, wherein the material of the plurality of wires is one of copper and aluminum metal materials. 第14頁Page 14
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