TW534911B - Polymer, resist composition and patterning process - Google Patents

Abstract

A polymer comprising units of formula (1-1) or (1-2) and having a weight average molecular weight of 1,000 to 500,000 is provided. R1 is an acid labile group, R2 is H or straight or branched C1-4 alkyl, Z is a tetravalent C2-10 hydrocarbon group, and k=0 or 1. A resist composition comprising the polymer as a base resin has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.

Description

Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 534911 A7 B7 V. Description of the Invention (1) [Technical Field of the Invention] The present invention relates to (1) a polymer compound having a specific acid instability providing unit, (2) use This polymer compound is used as a base resin to ensure the contrast of the Z layer before and after exposure, and is particularly suitable as a photoresist material for the fine pattern forming material for ultra-LSI manufacturing, and (3) using this light group material pattern Method of formation, etc. invention. [Previous technology] In recent years, with the high integration and high speed of LS I, in the pursuit of miniaturization of pattern lines, it is known as the far-reaching microfabrication technology in the next century. Ultraviolet etching printing is the main technology at present. Among them, the technology of photoetching printing using K r F plasma laser and A r F plasma laser as a light source is extremely needed to perform ultra-fine processing below 0.3 // m. Plasma laser light, especially photoresistive materials using A r F plasma laser light with a wavelength of 19 3 nm as the light source, is generally based on the principle of ensuring high transparency at this wavelength, but it must not Hiddenly, there is an urgent need for a material that has high uranium etch resistance that can correspond to thin film, does not cause a burden on high-priced optical system materials, and can accurately form high resolution materials required for fine patterns. . In order to meet the above requirements, basic resins with high transparency, high rigidity and high reactivity have been researched and developed, but among the currently known polymer compounds, no combination of the above characteristics has been found. Compounds, so there is currently no photoresist material available. Highly transparent resins, many of which are known to contain acrylic or methacrylic acid. This paper is compatible with Chinese National Standards (CNS) A4 (210 X 297 mm). -4- (Please read the precautions on the back before filling this page) «-Equipment -------- Ordered by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs to print 534911 A7 _ B7 V. Description of the invention (2) Copolymers of derivatives and alicyclic rings derived from norbornane derivatives Compounds such as polymer compounds with a main chain as the main chain, but those who can meet the above conditions are still very few. For example, copolymers of acrylic acid or methacrylic acid derivatives can freely introduce highly reactive monomers or increase acid labile groups, so it is easier to improve their reactivity, but it is still necessary to improve the rigidity of the main chain structure. Extremely difficult. Moreover, even if a polymer compound containing an aliphatic cyclic compound as a main chain has rigidity within a tolerable range, the poly (meth) acrylic resin structured on the main chain is relatively passive to acid due to its reactivity, and The degree of freedom of polymerization is also low, so it is extremely difficult to improve its reactivity. Therefore, when these polymer compounds are used as the base resin to manufacture photoresist materials, even if the sensitivity and resolution are sufficient, the etching resistance is insufficient, or they have high feed resistance but have only low sensitivity and low resolution. And so on, and fell into a stage of not reaching practicality. [Objective of the Invention] In view of the foregoing, the present invention proposes (1) a polymer compound having a specific acid instability providing unit, and (2) using this polymer compound as a base resin, which can ensure high levels before and after exposure. Dissolution contrast, which is particularly suitable as a photoresist material for forming a fine pattern for ultra-LSI manufacturing, and (3) a method for forming a pattern using this photo-group material is an object of the present invention. [Contents of the Invention and Embodiments of the Invention] After in-depth review of the results of the above inventors, the inventor learned that ----- ^ 1 equipment -------- order- (please read the precautions on the back before (Fill in this page) This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) -5- 534911 Printed by A7 B7, Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of invention (3) There is the following formula ( A polymer compound having a weight average molecular weight of 1,000 to 500,000 in the repeating unit shown in 1 to 1) or (1 to 2) has both high rigidity and reactivity, and is obtained by using the polymer compound as a base resin. The photoresist material also has high sensitivity, high resolution, and high resistance to etching, and is extremely suitable for the precise and fine processing of photoresist materials. That is, the present invention provides a method for forming a polymer compound, a photoresist material, and a pattern described below. [I] A polymer compound having a weight-average molecular weight of 1,000 to 5000, which contains a unit represented by the following formula (1-1) or (1-2); [Chem. 4] Η Η Η

(c——C-—) (―CH9 ch2 h2c—) / \ \; / X / HC ^ CH2- / CH Η, /, Η 1 CH—CH 1 (1-1) / \ 1 \ / 1 CH ——CH (1-2) / \, HC \ -ch2-7CHiV, HCK / CH | V R2-CZ-CO2R1 R2-CZ-CO2R1 R2 CC ^ R1 R2 CC ^ R1 (where R1 is an acid species R 2 is a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms; Z is a 4-valent hydrocarbon group having 2 to 10 carbon atoms; k is 0 or 1). (Please read the precautions on the reverse side before filling out this page) · 丨 I -------- Order · --- [II] ^ The polymer compound of Mi [〔I] as above, where, it contains the formula ( 1 to 1) or (1 to 2) high-scoring M dagger composition contains 1 or 2 kinds of "":: the following formulae (2-1) to ([3-2) units; This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -6- 534911 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (4 [化 5] Η Η (-ch2 ch2 h2c—)

, .C C, CH-

I——CH (2-1)

CH--CH (2-2), H \ -ch2

-CH

HC \ -ch2 ^ 7ch, k R2—-C—c- (CH2) i2 R2 ~ -one more ^ 2k2 R2 (CH2) Z1 CO2R1 R2 (CH2) z1 C02r1 'cop1 co2r1

R2-C, (—ch2 ch2 h2c —) \ / \ / ..C C, ·,

CH-CH (3-2)

R2--C-C—— R2 R2 (CH2) z3-L " C02R1 co2r1 " C02R1 co2r, R1, R2, k have the same meaning as above; Z is an integer from 0 to 4). (In the formula, to Z 3 [III], as in the above-mentioned [I] or [II], which contains the formula (1-1) or (1-2), and 尙 contains one or two or more of the following formula (4- 1 (8-1) The units shown are: [Chemistry CC- ;, " ^ x ^ 7Ch

(-C HC (-CH, X H2C-) Λ / (7 HC- Η Η _ I c- \ ^ x—7ch -ϋ ϋ e ^ i in -1 emmmt Βϋ I ϋ ϋ I i_i ϋ— ,, in ^ 1 · ni ^ i 1 Bn I _ (Please read the notes on the back before filling this page) R3-CC-R6 Η H Ί I (-C——c_ /, c, \

HC, x // CH (‘1) CH-CH (4-2) HC ^, CH2-R3—C- -R6 (_C, H2 person H2C-) • y \ c (

Corpse—CH. (6-1) CH— ^ CH ^ / CH, k, HV

-c-C-R, 2 H C02R, d Η H -C-C-) 0 (& 1)

HC

CH—CH (SI) CH HC 'ch2 (5-2) ^ _c ^ _Rl〇, C \ ~ ch2-7ch, u 9-9-R12 r " --- I k H C02R14 ~ C-R12 C02R15

(6-2) CH--CH (7-1) HC

This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 534911 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (5) (where k has the same content as the above Significance; at least one of R 3 to R 6 is a carboxyl group having 1 to 15 carbons or a monovalent hydrocarbon group containing a hydroxyl group, and the others are each a separate hydrogen atom or a linear or branched chain having 1 to 15 carbon atoms Or cyclic alkyl groups; R 3 to R 6 may form a ring with each other. At this time, at least i of R 3 to R 6 is a carboxyl group having 1 to 15 carbon atoms or a divalent hydroxyl group containing a hydrocarbon group. Bonds or linear, branched or cyclic alkylene groups with 1 to 15 carbons; at least one of R 7 to R 1 ° contains 2 to 15 carbons-C〇2-partial structure A monovalent hydrocarbon group, the others are independent hydrogen atoms or linear, branched, or cyclic alkyl groups having 1 to 15 carbon atoms; R 7 to R 1 ◦ can form a ring with each other, at this time R 7 to R At least one of 1 ^ is a bivalent hydrocarbon group containing a C02-partial structure with a carbon number of 1 to 15, and the other is a separate single bond or a linear, branched or Cyclic alkylene; R 11 is a hydrogen atom, a methyl group, or C0 2 R 1 3; R] 2 is a hydrogen atom, a methyl group, or CH 2 C0 2 R 1 3; r 1 3 is a linear chain having 1 to 15 carbon atoms, Branched or cyclic alkyl; R 1 1 is a polycyclic hydrocarbon group or a polycyclic hydrocarbon group-containing alkyl group having 7 to 15 carbons; R 1 5 is an acid labile group; X is C Η 2 or oxygen atom). [IV] A photoresist material containing the polymer compound described in any one of [I] to [I I I] as a base resin. [V] A method for forming a pattern, which includes the steps of coating the photoresist material of the above [IV] on a substrate, and after heat treatment, the use of the Fib M line or 先 inch through Xianzhuo. The step of exposing the wire and, if necessary, the step of developing using a developing solution after the heat treatment. One of the units shown in the above formula (1 to 1) or (1 to 2); --- 7-- · install ---- (Please read the precautions on the back before filling this page) Order- ------- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -8-534911 A7 _____ B7 5. Description of the invention (6) Acid part. It can be re-introduced into the equivalent unit with a speed of 1 unit.) That is, you can get this in use, with poor local sensibility or peeling (please read the precautions on the back before filling this page). A polymer compound having two units of acid-labile protected carboxyl with this unit will dissolve the base in a deprotected state when the protected carboxylic acid is compared with the current type only. Therefore, when this unit is used, even in addition to this characteristic, the quantity is provided in units of other characteristics (for example, the substrate can be tightly attached, and a sufficient dissolution rate can be ensured in a deprotected state. A higher dissolution contrast and a sufficient substrate Adhesiveness. Therefore, the photoresist material and high etching resistance obtained by using a polymer compound as a base resin can solve the disadvantages of conventional products such as the dissociation phenomenon of fine patterns and the disappearance of patterns after engraving. Below, The present invention will be described in more detail. The polymer compound of the present invention is a weight-average molecular weight containing a unit represented by the following formula (1-1) or (1-2). ο ο Polymer compound of 0. [Chem. 7] I Ϊ (一 ch2 ch2 H2C- ~) \ ”-cc- HC, -ch2-7 " CH—CH (1-1) CH—CH (1-2) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 1-show; hc \, ch7- > ch. R2——CZ-co2r1 R2——, (, hckch, CZ-CO2R1 R2 CC ^ R1 R2 The above formula ψ, k is a system of 0 (i --- i CO2R1 丨 person 丨 this formula (1-1) and () to (1 — 2 — 2) -9- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (【化 8】 R2- Η Η II Cc- (—ch2 ch2 h2c— ) V,

r- ~ vc〇2 R2 C02R Η H S1-1)

H

H R2- R2 Z-co2r \. CC ^ R1 -cc- CH—CH (1-1-2) / \ hWh R2-7-Z-C02R1 / \ R2 C02R1 (—ch2 ch2 h2c—) Y \ H \ / H CH—CH (1-2-2) HC \ -ch2-7ch R2- R2 ~ Z-C02R \. Co2r1 (Please read the precautions on the back before filling out this page) The carbon number and the following formula [chemical 9 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

In the formula, R1 is an acid-labile group; R2 is a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, such as methyl, ethyl, propyl, isopropyl, and η-butyl. , Sec-butyl, tert-butyl, etc. Z to 10 are 4-valent hydrocarbon groups. Among the units shown by the above formula (1-1) or (1-2), the units shown by 2-1) to (3-2) are preferred. And Η Η I I -c-C-)

/ CH I \ 7 I CH—CH HC / CH, \ ~ ch2-7, v R2 ·

C-C \ CO2R1 (2-1)

HC \… 〆 L ^^ rTjk ζ γ ix -C-—R2

ϊ_ϊ_ / Λ) hcC-ch2 ^ 7ch CH—CH (-(—CH2 ch2 H2C—) Η \ / Η (3-1)

CH—CH (3-2) \ HC ~ 2-c __- c7- R2 (CH2) i3 R2-, co2r1 co2r1 R2 (CH2) z3

-cI co2R I 'co2r1 d1 This paper size applies to China National Standard (CNS) A4 (210 x 297 mm) _ 1〇_ 534911 A7 B7 V. Description of the invention (8) where R 1, R 2, k has Same meaning as above. Z 1 to Z 3 are 0 to 4, preferably 0 to 3, and more preferably an integer of 0 to 2. The acid labile group of R 1 can be variously selected, and specific examples thereof are as shown in the formula (L1 ) To (L4), the tertiary alkyl group having 4 to 20 carbon atoms and 4 to 15 carbon atoms, and each alkyl group is a trialkyl group having 1 to 6 carbon atoms. A carbonyl alkyl group of 4 to 20 and the like. 【化 1〇】

RU3 \ C / RU (Please read the note on the back? Matters before filling this page) rl〇1 I -c 1 'Rl〇2 (LI) -〇rL03 〇- (ch2) 3—c_ (L2) -orlm rl <5 —- rlii rL15 ch2-ch2 'ry2) η 〇H = CH) m (L3) / Lr ^ 7 rL18 j ^ LQ6 ^ L08 ii (L4) In the formula, RL ◦ 1, RL. 2 is a hydrogen atom or a linear, branched, or cyclic alkyl group having a carbon number of 1 to 18 ′, preferably 1 to 10, for example, methyl, ethyl, propyl, isopropyl, η but Base sec butyl t butyl, cyclopentyl, cyclohexyl, 2-ethylhexyl η, printed by octyl, etc., in the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperative, etc .; R 3 is a carbon number of 1 to 18, preferably 1 to A monovalent hydrocarbon group of 10 which may contain heteroatoms such as oxygen atom, straight chain, branched chain or cyclic alkyl group, and a part of its hydrogen atom may be hydroxyl, alkoxy, carbonyl, amine, alkylamine Specific examples of the substituted ones include the substituted alkyl groups described below. [Chemical size of this paper applies to China National Standard (CNS) A4 (210 X 297 mm) -11-534911 Α7 Β7 V. Description of the invention (9

-0H-(CH2) 2—〇— (CH2) 3—CH〇 —CH2

CH2—〇H

'(CH2) 2—〇— (CH2) 2—〇H

-(CH2) 6—OH

L 〇 2 L 0 R and R ^ υ 丄 l υ 〇 R and R] 1 L 0 2 L 0 3, R and R are each a linear or branched linear alkylene group having a carbon number of 0. ◦ Preferred tertiary alkyl groups of 4 to 15; each alkyl group is a trialkylsilyl group having 1 to 6 carbon atoms; a fluorenyl alkyl group having 4 to 20 carbon atoms or the above formula (L 1) Examples of tertiary alkyl groups include ter t-butyl, tei: t-pentyl, 1,1-diethylpropyl, 1-ethylcyclopentyl, 1-butylcyclopentyl, 1-ethylcyclohexyl, when forming a ring, when forming a ring, R 1 to 18, preferably 1 to R is δ ash number 4 to OK (please read the precautions on the back before filling this page) 1-butyl Cyclohexyl-ethyl-alkyl-silane 3-yl-Ethyl 2-cyclopentenyl 2-cyclohexenyl, 2-methyl adamantyl and other groups printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Specific examples include trimethylsilyl, triethylsilyl, tert-butylsilyl, and the like. Specific examples of the carbonylalkyl group include 3-carbonylcyclohexyl group, 4-methylmethyl-2-carbonyloxane-4-yl group, 5-methyl-5-dioxocyclic ring 4-yl group, and the like. a is an integer from 0 to 6. R &quot; &quot; 5 is a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms or a substituted aryl group having 6 to 20 carbon atoms, linear, branched or cyclic Specific examples of the alkyl group such as methyl, ethyl, propyl, isopropyl, η-butyl, sec-butyl, tert-butyl, tert-pentyl, n-pentyl, n-hexyl, ring Amyl, cyclohexyl, cyclopentyl methyl, and cyclopentyl paper standards are applicable to China National Standard (CNS) A4 (21 × 297 mm) -12- 534911 A7 ________ B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (10) Ethyl, cyclohexylmethyl, cyclohexylethyl, etc .; specific examples of aryl groups that may be substituted, such as phenyl, methylbenzyl, naphthyl, anthracenyl, phenanthryl, and fluorenyl Let 0 or 11 be any number of 11Ί, and be a number satisfying 2 m + m = 2 or 3. L 〇6 οι R is a linear, branched, or cyclic alkyl group having 1 to 8 carbons or a substituted aryl group having 6 to 20 carbons, and specific examples thereof are the same as r 〇5 By. Each is an independent hydrogen atom or a monovalent hydrocarbon group having 1 to 15 carbon atoms which may contain a hetero atom, such as methyl, ethyl, propyl, isopropyl, η-butyl, phenyl, ter t-pentyl, η ~ ec butyl tert (please read the notes on the back before filling out this page) pentylhexyl η —octyl, cyclopentyl and other straight chain hydrogen atoms can be partially hydroxyl, cyano 1 6 can η η-nonyl, η-decyl, cyclopentyl, cyclohexyl, cyclopentylmethylethyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylbutyl, branched chain or cyclic Alkyl

Substituted by oxo, carboxy, alkoxycarbonyl, carbonyl, amine 'alkylamino, hydrogenthio, alkylthio, sulfo, etc .; R L. 7 to R T r \-0 7 L form a ring with each other (for example L 0 8

R and R, R and RR and RL &quot;, R &quot; 9 and RL &quot;, R ... and R ... L 1 3 L 1/1 R and R, etc.), at this time, it is an atomic number of 1 to 15 carbons Divalent hydrocarbon groups, or those obtained by removing 1 from the examples of monovalent hydrocarbon groups described above; and RL ◦ 7 to RL 1 6 can be performed on adjacent carbons to form double bonds without interposing other atoms (such as R &quot; 〇7 p L 0 9 DL 0 9 L 1 5 L 1 3 L 1 5 R, R and R, R and R, etc.). Specific examples of the acid-labile group represented by the above formula (L 1) that have a linear substituent include the following substituents. Contains heterogenous hydrogen bonds and / or branches. The size of this paper is applicable to Chinese National Standard (CNS) A4 (21 × 297 mm) -13- 534911A7B7 V. Description of the invention (11) [Chem. 1 2] -CH2 -0-CH3 -CH2-〇-CH2-CH3, ch3 is called -CH2 〇 一 (CH2) 3-ch3 -CH2-〇-CH-CH3 -CH2-〇— (CH2) 2—CH3 ch3 I -CH2— ° --RcH3 ch3 ch3 (ch2) 2 -CH-0-CH3 ch3 (CH2) 2 -CH-〇-CH? -CH3 CH〇I (| h2) 2 _CH-〇— (0 ^ 2) 2—CH3 (Please Read the notes on the back before filling this page) Binding --------- ^ Γ_ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs? H3 ch3 -CH-0-CH3 ch3 I —CH-〇-CH ? CH3 ch3 I -CH-〇- (CH2) 2--CH3 ch3 I -CH-〇-

ch7 -CH-0-CH3 CH3 ch2 CH-〇-CH〗 -CH3 ch3 ch9 r CH-〇-(CH2) 2-CH3 CHo I -CH ---- 〇- ch3 I ch3 1 c-〇- I -CH3 〇〇—CH〇— -CH3 ch3 1 ch3 Contained by the above formula (L 1); Cyclic substitution in an acid labile group: a group such as tetrachlorofuran-2-yl: &gt; 2 monomethyltetrahydro Specific examples of the acid-labile group represented by the above formula (L 2) are xanthon-2-yltetrahydropyran-2-yl, 2-methyltetrahydropyran-2-yl, and the like. Butoxycarbonyl, tert-butoxycarbonylmethyl, te Γ-pentyloxy, tert-pentoxycarbonylmethyl, 1, 1-diethyloxy ¥ methane, 1 1-monoethylpropyl Oxycarbonylmethyl, 1-ethylcyclopentylcarbonyl, 1-ethylcyclopentyl _ Guang γ shan im methyl, 1-ethyl-2-cyclopentyl This paper size applies to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) -14- 534911 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (12 ) Carboxyl, 1-ethyl ~ 2-cyclopentenyloxycarbonylmethyl, 1-ethoxyethoxycarbonylmethyl, 2 tetrahydropyranoxycarbonylmethyl, 2 tetrahydrofuranoxycarbonylmethyl, etc. Specific examples of the acid-labile group represented by the above formula (L 3) are, for example, 1-methyl ^ cyclopentyl, 1-ethylcyclopentyl, 1-n-endocyclopentyl, 1 isopropylcyclopentyl --- butylcyclopentyl, 1-se C-butyl badpentyl, 1-methylcyclohexyl 'fluorene-ethylcyclohexyl, 3-methyl-1 ~ cyclopentene-3 ~ yl, 3 —Ethyl-1—cyclopentene—3-yl, 3-methyl—1-cyclohexene—3-yl, 3-ethyl—1—cyclohexene—3-yl, and the like. Specific examples of the acid-labile group represented by the above sS formula (L 4) are not those shown in p. [Chemical 1 3]

Tertiary alkyl, trialkylsilyl, oxo, and the like of the acid-labile group of "R", such as the content exemplified previously. The acid-labile group of "R" may be used alone or in combination of two. Use in combination. When using many kinds of acid labile groups, the pattern shape can be fine-tuned. In addition, a polymer compound containing a unit represented by the above formula (1-1) or (1-2) may further contain one or two or more of the following formula (4-1 -------- ^- -I -------- Order --------_ (Please read the notes on the back before filling in this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (%) -15- 534911A7B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. The high score of the unit of the invention description (13) to (8 — 1). [Chemical 1 4] The compound is Η ΗI I Cc- (— CH2 x H2C—) \ X \ / • • 乂, c, Η HI I -cC-) HC, (—CH2 x H2C—)

H

H

HC ', x- CH-CH

i-- C-C- HC, (4-1)

CH—CH (4-2), HC \, ch2〆 / '\ fk R3-Cc--R6 LLR R5 CH—CH HC ^ CH2 ^ CH ·, (5-1) CH --- CH (5-2) R11- \ r- C-1 ft r!

C——R10 L ch9

One CH -C——C——R10 R8

CH—CH, HC \ -ch2-7chiV -c—c ~ R12

H C02R14 Η H-~ c-c-- 0C, (S4) 〇 一 \ 〇 /

(—CH2 y H2C—) \ / \ / ηΛ__Λη CH—CH, HC \ -ch2-7ch R11-C-C-I I, H C02R1 (6-2) j k R12 R1 HC-

Η HII &gt; c--C``), ^ bH

CH-CH

I (7-1) C—C—R12 H CO〇R15 where k has the same meaning as the above, each of which has a carbon number of 1 to 15 or a chain-like, branched or cyclic group containing a control group Group), others are linear, branched or 1 to 15 carbons or 1 to 5 carboxyl or hydroxyl-containing monovalent hydrocarbon groups, having a group, carboxyethyl, carboxybutyl, hydroxymethyl, 2 -Carboxyethoxycarbonyl, 4-Carboxybutoxycarbonyl, 4-Hydroxybutoxycarbonyl, Carboxycyclohexyloxycarbonyl, Carboxybornylalkoxycarbonyl, Hydroxybornylalkoxycarbonyl, Hydroxyl adamane This paper is suitable for paper size China National Standard (CNS) A4 (210 X 297 mm) (—CH2 X H2C—) \ c / ίΛ__L · 1 \ / I CH—CH (7-2), HC \, ch2 // h_ R11.

\ 7. -CCR H C02R15; R 3 to R 6 are monovalent hydrocarbon groups (respectively independent cyclic radicals; such as carboxyl, mesityl ethyl curtain, 2 pentyloxy carbon, hydroxycyclohexyl) At least 1 in the gray base temple is preferably a straight hydrogen atom with a carbon number of 1 to 1, a carboxymethyl group, a hydroxybutyl monohydroxyethyl group, a carboxy epoxy carbonyl group: a carbon number of 1 · __1 I ϋ I ϋ I i ^ i J 丨, I · ϋ · Ϋ I an in I with mouth (please read the notes on the back before filling in this page) -16- 534911 A7 V. Description of the invention (14) to 15 of the linear, branched or cyclic alkyl group, Specifically, for example, methyl, ethyl, propyl, isopropyl, η-butyl, sec-butyl, hept-butyl, tert-pentyl, η-pentyl, η-hexyl, cyclopentyl Alkyl groups such as alkyl, cyclohexyl, ethylcyclopentyl, butylcyclopentyl, ethylcyclohexyl, butylcyclohexyl, adamantyl, ethyladamantyl, butanyl; and R 3 to R 6 can form a ring with each other, at this time at least one of R 3 to R 6 is a carboxyl group having 1 to 15 carbon atoms or a divalent hydrocarbon group containing a hydroxyl group (preferably a linear, branched or cyclic alkylene group) ),its Each is a single bond or a linear, branched or cyclic alkylene group having 1 to 15 carbon atoms; a carboxyl group having 1 to 15 carbon atoms or a divalent hydrocarbon group containing a hydroxyl group. Specific examples are The substituents obtained by removing one hydrogen atom from the above examples of carboxyl or hydroxy-containing monovalent hydrocarbon groups; the specific examples of linear, branched, or cyclic alkylene groups having 1 to 15 carbon atoms are as described above Examples of straight-chain, branched-chain or cyclic alkyl groups having 1 to 15 carbon atoms are obtained by removing one hydrogen atom, etc .; at least one of R 7 to R 1 &quot; &quot; is 2 to carbon atoms. 1 of 5 contains a C02-partially structured monovalent hydrocarbon group, and the others are independent hydrogen atoms or linear, branched, or cyclic alkyl groups having a carbon number of 1 to 15; carbon numbers of 2 to 15 It contains a monovalent hydrocarbon group with a partial structure of C02, and the specific examples thereof are 2-dioxafluorenyl ring 3-yloxycarbonyl group, 4,4-dimethyl-2-2-dioxofluorenyl ring 3-yloxy group. A few bases, 4-monomethyl-2—mine-based oxa compound—4-monooxy curtain group, 2-carbonyl-1, 3-dioxopentane ring—4-monomethyloxycarbonyl group,

5 —methyl-1 2 —dioxa 圜 丨 哀 — 5 jixing_Greyji Temple, straight, branched or cyclic alkyl with lime number 1 to 15 '. Specific examples are R to R () The same example shown; R, to R can form a ring with each other 'At this time, the paper size of this paper applies the Chinese National Standard (CNS) A4 specification (210 x 297 public love) -17-(Please read the precautions on the back first (Fill in this page again) Pack. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 534911 Α7 Β7 V. At least one of the invention descriptions (15) to R is a carbon number 1 to 15 and contains a C02-part of the structure Divalent hydrocarbon radicals' other are each independent single bond or straight chain, branched chain or cyclic alkylene group with 1 to 15 carbons; 1 to 15 carbons contain a C02- 邰 structure The divalent nicotinyl group is specifically, for example, 1-carbonyl group-2 dioxane compound—1,3-diyl group, 1,3-dicarbonyl group 2-oxane compound-1, 3—diyl group, 1—mineral group 1 ~ 2, 2-Dioxin—1, 4-diyl, 1, 3-dicarbonyl—2 — π]], 4-diyl, etc., and a monovalent hydrocarbon group containing -C 0 2-part structure from the above Substitutions exemplified in After removing a hydrogen atom of the substituent group obtained; carbon atoms, straight chain to 15, the branched-chain or cyclic alkyl group Specific examples of the elongation of the same as shown in Example 6 R ^ to R shown in shown. R is a hydrogen atom, a methyl group, or co 2 R 1 3; R 1 2 is a hydrogen atom, a methyl group, or CH 2 C 0 2 R 1 3; R! 3 is a linear, branched, branched carbon having 1 to 15 carbon atoms Specific examples of the chain or cyclic alkyl group are the same as those shown in R 3 to R 6. R is a polycyclic hydrocarbon group or a polycyclic hydrocarbon group-containing alkyl group having 7 to 15 carbon atoms, specifically, for example, norbornyl group, bicyclic [3 · 3 • 1] nonyl group, and tricyclic [5 · 2 · 1 · 〇 2 '6] decyl, printed base of employees' cooperatives in the Intellectual Property Bureau of the Ministry of Economic Affairs of the adamantane, ethyl adamantyl, butyl adamantyl, norbornyl alkyl methyl, adamantyl methyl, etc .; R 1 b is an acid labile group, and specific examples thereof are the same as those exemplified for R 1; R 1 5 is an acid labile group, which may be used alone or in combination of two or more. When using many types of acid labile groups, the pattern shape can be fine-tuned. X is C Η 2 or an oxygen atom. The polymer compound containing the repeating unit represented by the above formula (1-1) or (1-2) according to the present invention and the unit represented by one or two or more of the units represented by the above formula (2-1) or (3-2) Manufacture of polymer compounds -18- ----.— ,, —— pack— (Please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 V. Description of the invention (16) The method 'is generally based on the compound represented by the following formula (1) as the first monomer, or one or two or more selected from the following formulas (2), (3 The compound shown by) is used as the first or second monomer, plus i or more selected from the following formulae (4) to (8). [Chemical formula 1 5] HC = CH H ', ch24ch The compound shown as the subsequent monomer

HC = CH R2- / CH— (1) —c--2-—C02R1 R2 COjR1 HC ^ izzCH CC-ch2 ^ c CH— '(2) __!) Z2 R2-C-C-R2

r2-pc- (ch2 / \ R '(CH2) z1 C〇2R / CH—C' (3) t ^ r? CH, k (Please read the precautions on the back before filling in this page) co2r1 HC = CH C \ ~ Ch2,7c

HCzr—: CH CH--CH (4) HC \ ~ ch2-7ch (5)

HC

Oh2-7ch · R3—C- / kTrR6 R5 \ ~ ch2, 7c \ T -cC- J k R8 R2 (CH2) z3 R2- j 'COjR1 CC ^ R1 HC = CH HC \, ch2 ^ ch I ^ 7 I , CH— '(6) HC \ ~ rH &lt; CH I \ ch2 / il · \ 7 Rn-CC-R12 H C02R14 hc—ch / \ HC \ ^ ch2 ^ 7ch (7)

HC

CH "k R11-C—C—r! 2 H C02R15 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

HC: = CH / \ (8), 〇xi \ / c &gt; 0 (wherein R1 to R15 have the same meaning as the content of the upper concubine) copolymerization reaction, the compound represented by the above formula (1), or One or two or more compounds selected from the compounds represented by the following formulae (2) and (3) as the first or two monomers and one or more compounds selected from the compounds represented by the following formulae (4) to (8) , After mixing the reaction rate, mix in an appropriate ratio, or the paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) 19- 534911 A7 B7 V. Description of the invention (17) Dissolve in the solvent as necessary At this time, it can coexist with an appropriate polymerization initiator and catalyst, and react appropriately under the appropriate temperature conditions. The copolymerization reaction can be performed in various forms, and specific examples thereof include methods such as a radical polymerization reaction, an anion polymerization reaction, and a coordination polymerization reaction. The reaction conditions of the radical polymerization reaction are: (a) solvents are hydrocarbons such as benzene, ethers such as tetrahydrofuran, alcohols such as ethanol, or ketones such as methyl isobutyl ketone; (b) polymerization initiators are used 2 , 2'-azobisisobutyronitrile and other azo compounds, or peroxides such as benzamidine peroxide and lauryl peroxide, (c) the reaction temperature is maintained in the range of 0 ° C to 100 ° C, (D) The reaction time is preferably in the range of 0.5 hours to 48 hours, but the reaction is not limited to this range. The reaction conditions for anionic polymerization are: (a) solvents are hydrocarbons such as benzene, ethers such as tetrahydrofuran, or liquid amines; (b) polymerization initiators are metals such as sodium and potassium; η-butyl lithium, sec —Alkali metals such as butyllithium, ketals, or Grignard reagents, (c) The reaction temperature is maintained in the range of -78 ° C to 0 ° C, and (d) the reaction time is in the range of 0.5 hours to 4 8 In a short time range, (e) the stopper is preferably a compound that provides a cation such as methanol, a halide such as methyl iodide, or other electrophilic substances, but the reaction conditions are not limited to this range. The reaction conditions for the coordination polymerization are: (a) the solvent is hydrocarbons such as η-heptane, toluene; (b) the catalyst is a Ziegler catalyst obtained by using a transition metal such as titanium and an alkyl aluminum, and chromium and Phillips catalyst with nickel compound supported on metal oxide, and olefin-substituted mixed catalyst represented by mixed catalyst of tungsten and thorium, etc. (c) The reaction temperature is maintained at 0 ° C to this paper Standards are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) -----; --- ^ --- install --- (Please read the precautions on the back before filling this page). Ministry of Economy Printed by the Intellectual Property Bureau's Consumer Cooperatives-20- 534911 A7 B7 V. Description of the invention (18) 100 ° C range, (d) The reaction time is preferably in the range of 0.5 hours to 48 hours, It does not exclude situations outside this range. In the copolymerization reaction, the presence ratio of each monomer can be appropriately adjusted to facilitate the use of a polymer compound that can exhibit better performance when used as a photoresist material. Furthermore, the polymer compound containing the repeating unit represented by the above formula (i-1) or (1-2) used in the present invention, and the polymer compound containing one or more of the above formulas (2-1) to (3-2) The weight average molecular weight of the polymer compound in the unit shown by) is from 1,000 to 50,000, and preferably from 3,000 to 10,000. If it exceeds this range, the etching resistance will be extremely reduced, and the dissolution speed difference before and after exposure cannot be ensured, resulting in a decrease in resolution. In addition, the photoresist material of the present invention is one in which a polymer compound containing a unit represented by the above formula (1-1) or (1-2) is used as a base resin. The photoresist material of the present invention, in addition to the polymer compound containing the unit represented by the above formula (1-1) or (1-2), may contain a compound capable of inducing high energy rays or electron rays to generate an acid (hereinafter referred to simply as Acid generator) and organic solvents. The acid generator used in the present invention is, for example: l, an iron salt of the following formula (P 1 a -1), (P 1 a-2) or (P 1 b), π, the two of the following formula (P 2) N-methane derivative, m, glyoxime derivative of the following formula (P3), 1V, disulfonic acid derivative of the following formula (P4), v, N-hydroxyimine compound of the following formula (P5) Sulfonate, this paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) -----;-ΤΙ-Φ-installed-(Please read the precautions on the back before filling (This page) I-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -21-534911 A7 B7 V. Description of Invention (19)

Vi, / 5 -Ketosulfonic acid derivatives, VII &gt; Disulfonic acid derivatives, (Please read the notes on the back before filling this page) VIII 'Nitrobenzylsulfonate derivatives IX &gt; Sulfonate Derivatives, etc. 【Chem 1 6】

Plal Pla-2 (where R, R 1 1 and R 1 ◦ 1. Each is a linear, branched or cyclic alkyl group, alkenyl group, carbonyl alkyl group or curtain group having 1 to 12 carbon atoms. Alkenyl, aryl having 6 to 20 carbons, or aralkyl or arylcarbonyl alkyl having 7 to 2 carbons, etc. Some or all of the hydrogen atoms in these groups can be replaced by oxygen Instead, r and r1. 1. can form a ring to form a ring R ', R are each a radical of 1 to 6 carbon atoms. K is a non-nucleophilic counter ion). r 2 1 η 1 〇1 Η 10 1 丨) 1 0 1 c The above-mentioned R, R, and R may be the same as each other or printed by different groups in the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. In specific examples, alkyl groups such as Methyl, ethyl, propyl, isopropyl, η-butyl, sec-butyl, tert-butyl, pentyl, hexyl, heptyl, octyl, cyclopentyl, cyclohexyl, cycloheptyl, Cyclopropylmethyl, 4-methylcyclohexyl, cyclohexylmethyl, norbornyl, adamantyl and the like. Alkenyl is, for example, vinyl, aryl, propenyl, butenyl, hexenyl, cyclohexenyl, and the like. Carbonyl alkyl groups such as 2-carbonylcyclopentyl, 2-carbonylcyclohexyl, etc., 2-mineral propyl, 2-cyclopentyl- 2 -ylethyl, 2-This paper applies Chinese National Standards (CNS) A4 specifications (210 X 297 mm) _ 22 _ 534911 A7 B7 V. Description of the invention (20) Cyclohexyl-2 -carbonylethyl, 2-(4-methylcyclohexyl) -2-(Please read the back first (Notes on this page, please fill out this page) carbonyl ethyl and so on. Aryl groups such as phenyl, naphthyl or the like, P-methoxyphenyl, m-methoxyphenyl, 0-methoxyphenyl, ethoxyphenyl, p-tert-butoxyphenyl , Ιίί a tert-butoxyphenyl% oxophenyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, ethylphenyl, 4-tert-butylphenyl, 4 Alkylphenyl groups such as monobutylphenyl, methylphenyl, alkylnaphthyl groups such as methylnaphthyl, ethylnaphthyl, alkoxynaphthyl groups such as methoxynaphthyl, ethoxynaphthyl, Dialkylnaphthyl such as dimethylnaphthyl and diethylnaphthyl, and dialkylnaphthyl such as dimethoxynaphthyl and diethoxynaphthyl. Aralkyl is, for example, benzyl, phenylethyl, phenethyl and the like. Arylcarbonylalkyls such as 2-phenyl- 2-carbonylethyl, 2- (1-naphthyl)-2-carbonylethyl, 2- (2-Ceyl)-2-carbonylethyl, etc. A 2-carbonyl ethyl group. K-Non-nucleophilic counter ion, such as halide ion such as chloride ion, bromide ion, trifluoroformate, 1, 1, 1, 1 trifluoroethanesulfonate, perfluorobutanesulfonate Isofluoroalkyl sulfonates, toluene sulfonates, benzene sulfonates, 4 monofluorophenyl sulfonates, 1,2,3,4,5-pentafluorophenyl sulfonates and other aryl sulfonates , Mesyl sulfonate, butane sulfonate, etc. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs [Chem. 17] p1〇2a 〇102b

I I | ^ 1Q4a ^ 103 ^ 104b K- K-

Plb (where R 1 ° 2 H and R 1 ° 2 h are each a linear, branched, or cyclic alkyl group having 1 to 8 carbon atoms; R 1 () 3 is 1 to 10 carbon atoms Straight chain-23- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7

V. Description of the invention (21) 'Branched or cyclic extension courtyard base; R

R each is a 2-carbonylalkyl group with a carbon number of $ 7. K is a non-nucleophilic counter ion

Two notes R

Specific examples of R include methyl, ethyl, propyl, isopropyl, η-butyl, sec. Butyl tert-butylpentyl, hexyl, heptyl, octyl, cyclopentyl, cyclohexyl, cyclopropyl Methyl, 4 ~ methylcyclohexyl, cyclohexylmethyl and the like. Examples of R 1 ° 3 are methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, 4-cyclohexyl 3 -cyclo Hexyl 4 -cyclohexyl 2 -cyclohexyl 1, 4-cyclohexyl dimethyl and the like. R 1 ° 1 a, R 1 ° 4 b are, for example, 2-carbonylpropyl, 2 ~ carbonylcyclopentyl, 2-carbonylcyclohexyl, 2-carbonylcycloheptyl, and the like. K is the same as that described in the formulae (P 1 a — 1) and (P 1 a — 2). 1 8 S 丄. , RU) L_S〇 卜 g_S〇rR ^ P2 0 6 (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (where R and R are carbon numbers 1 to 1 2 Straight-chain branched, cyclic alkyl or halogenated alkyl, 6 to 20 aryl or halogenated aryl or 7 to 6 carbons

R 1 0 5

R 1 0 6 2 aralkyl). Alkyl groups such as methyl, ethyl, propyl, isopropyl, η-butyl, sec --butylert-butyl, pentylhexyl, heptyl, octyl, cyclopentyl, cyclohexyl, cyclo Heptyl, norbornyl, adamantyl, etc .; halogenated alkyls such as trifluoromethyl 1 This paper is sized for China National Standard (CNS) A4 (210 X 297 mm) _ 24-534911 Α7 Β7 V. Invention Note (22) Trifluoroethyl, 1,1,1 trichloroethyl, nonafluorobutyl, etc .; Examples of aryl groups (please read the precautions on the back before filling this page) such as phenyl, P-methoxy Phenyloxy groups such as phenyl, m-methoxyphenyl, 0-methoxyphenyl, ethoxyphenyl, P-tert-butoxyphenyl, m-tert-butoxyphenyl; 2-methylbenzene Alkyl, 3-methylphenyl, 4-methylphenyl, ethylphenyl, 4-tert-butylphenyl, 4-butylphenyl, dimethylphenyl and other alkylphenyl groups; halogenated aromatic Fluorophenyl, chlorophenyl, 1,2,3,4,5-pentafluorophenyl and the like; aralkyl such as benzyl, phenethyl and the like. 【化 1 9】 r1〇8 p109 r1〇7 s〇If R —SO Bu (^ = ^ _ 〇__s〇bu Ri〇7, P3 Printed by the Intellectual Property Bureau Staff Consumer Cooperative of the Ministry of Economic Affairs This paper is applicable to China Standard (CNS) A4 specification (210 X 297 mm) -25- 534911 A7 B7 V. Description of the invention (23 [化 2〇]

1 0

Where R

R has the same meaning as the above. [Chemized 2 N—0— ^ S〇2—R1 P5 1 1 0 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (where R 6 has an alkyl group or carbon number 2 Some or all of them may be realkyl or alkoxy, nitro, 1 to 8 linear, branched, phenyl, or naphthyl, and may be further substituted with alkoxy or nitro having 1 to 4 carbon atoms.醯 雑 醯 square group; or chlorine atom

Among them, R-naphthyl and the like; the alkylene group is an alkylene group having 6 to 10 carbon atoms and 6 to 6 carbon atoms, and these are substituted by linear ethenyl or phenyl groups having 1 to 4 carbon atoms. Or substituted alkyl, such as a hydrogen atom or a oxy group, a β ash number or a phenyl group substituted by a benzene, a fluorine atom, or an aryl group such as 1, 2-such as dimethyl ether Radical, ethyl aryl, hydrogen atom or branched alkane of carbon number 1 to substituent; R is carbon number, cannyl or a part of or all of alkyl radicals of 1 to 4 ; Carbon number 3 to 5 phenylene 3-propylene (please read the notes on the back before filling this page) IIII I --- order ----- IIII-radical 3 4 butylene, 1 phenylene Ethylene, norbornane-2 diyl, etc .; Etenyl groups such as 1,2-vinyl 2-phenylene storage, 5-norbornyl-2 phenyl 3-diyl, etc. This paper applies to China National Standard (CNS) A4 Specification (210 X 297 Public Love) -26- 534911 A7 B7 V. Description of Invention (24) (Please read the precautions on the back before filling this page) R 1 1 1's alkyl group is the same as R 1 ° ^ to R 1 ^ 1 Alkenyl such as vinyl, 1-propenyl, allyl, 1-butenyl, 3-butanyl, isobutyl storage, 1-pentenyl, 3-pentenyl, 4-pentenyl, dimethyl Allyl, 1-hexenyl, 3-hexenyl, 5-hexenyl, 1-heptenyl, 3-heptyl, 6-heptenyl, 7-octyl, etc., alkoxyalkyl such as , Methoxymethyl, ethoxymethyl, propoxymethyl, butoxymethyl, pentyloxymethyl, hexyloxymethyl, heptyloxymethyl, methoxyethyl, ethoxyethyl, propoxyethyl , Butoxyethyl, pentoxyethyl, hexyloxyethyl, methoxypropyl, ethoxypropyl, propoxypropyl, methoxybutyl, ethoxybutyl, propoxybutyl, methoxypentyl , Ethoxypentyl, methoxyhexyl, methoxyheptyl, etc. In addition, the alkyl group having 1 to 4 carbon atoms which can be substituted again, such as methyl, ethyl, propyl, isopropyl, η-butyl, isobutyl, tert-butyl, etc., has 1 to 4 carbon atoms. Alkoxy, such as methoxy, ethoxy, propoxy, isopropoxy, η-butoxy, isobutoxy, tert-butoxy, etc .; alkyl groups having 1 to 4 carbon atoms, Phenyl substituted by alkoxy, nitro or acetamyl, such as phenyl, tolyl, P-tert-butoxyphenyl, p-acetamyl, P-nitrophenyl, etc .; carbon number Examples of fluorenyl groups of 3 to 5 include pyridyl, furyl and the like. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, such as trifluoromethane diphenyliodine carbonate, trifluoromethanesulfonic acid (P-tert-butoxyphenyl) phenyliodine, p-toluenesulfonic acid Diphenyliodonium iodide, p-tert-butoxyphenyl phenyliodonium, trifluoromethanesulfonic acid triphenylsulfonium, trifluoromethanesulfonic acid (P-tert-butoxyphenyl ) Diphenyl, trifluoromethanesulfonic acid bis (p-tert-butoxyphenyl) phenylphosphonium, trifluoromethanesulfonic acid tri (p — -27-) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (25) tert-butoxyphenyl) hydrazone, p-toluenesulfonic acid triphenylphosphonium, p-toluenesulfonic acid (p-tert-butoxyphenyl) ) Diphenylpyrene, p-formyl (please read the notes on the back before filling this page) bis (P — tert-butoxyphenyl) phenyl benzylsulfonate, p-totylsulfonic acid tri (P-tert -Butoxyphenyl) fluorene, triphenylsulfonium nonafluorobutanesulfonate, triphenylsulfonium butanesulfonate, trimethylsulfonium trifluoromethanesulfonate, P-trimethyltoluenesulfonate Yu, cyclohexylmethyl trifluoromethanesulfonate (2-carbonylcyclohexyl) 铳, P-cyclohexylmethyltoluenesulfonate (2-carbonylcyclohexyl) 铳, trifluoromethanesulfonate dimethylphenyl 磺酸, P —toluenesulfonic acid dimethylphenylsulfonium, trifluoromethanesulfonic acid dicyclohexylphenylammonium, P -toluenesulfonic acid dicyclohexylphenylhydrazone, trifluoromethanesulfonic acid trinaphthylfluorene, trifluoromethanesulfonic acid Cyclohexylmethyl (2-carbonyl ring td group), Difluoromethanesulfonic acid (2-norbornyl group) methyl (2-carbonylcyclohexyl) fluorene, ethylene bis [methyl (2-carbonylcyclopentyl Base) sulfonium trifluoromethanesulfonate], 1, 2'-naphthylcarbonylmethyltetrahydro, printed by sulphur salt terpolymers and other sulfonium salts, etc., by the Consumer Cooperatives of Intellectual Property Bureau of the Ministry of Economic Affairs; bis (benzenesulfonyl) Azomethane, bis (P-toluenesulfonyl) diazomethane, bis (xylylenesulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, bis (cyclopentanesulfonyl) Group) diazomethane, bis (η-butylsulfonyl) diazomethane, bis (isobutylsulfonyl) diazomethane, bis (sec-butylsulfonyl) diazo Methane, bis (η-propylsulfonyl) diazomethane, bis (isopropylsulfonyl) diazomethane, bis (tert-butylsulfonyl) diazomethane, bis (η- Amylsulfonyl) diazomethane, bis (isoamylsulfonyl) diazomethane, bis (sec-pentylsulfonyl) diazomethane, bis (tert-pentylsulfonyl) ) Diazomethane Institute, 1 Cyclohexylsulfonyl-1 1 (tert-butylsulfonyl) diazomethyl-28- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ) 534911 Α7 Β7 V. Description of the invention (26) The courtyard, 1 a cyclohexyl ore brewing base 1 1 (tert-pentyl dibasic acid base) (Please read the precautions on the back before filling out this page) 1-tert-pentyl acetamate- 1- (tert-butyl fluorenyl) diazomethane derivatives such as diazomethane, bis-010- (P-toluenesulfonyl) -α —Dimethylglyoxime, bis-101 (ρ —tosylsulfenyl) -α-monophenylethane, bis-10— (ρ —tosylsulfonyl) —α-bicyclo Hexylethanedioxime, bis-101- (P-tosylsulfonyl) -2,3-pentanediol ethanedioxime, bis-101- (ρ-tosylsulfonyl) -2-methyl-3,4 Glutaredione ethylenedioxime, bis-010- (η-butanesulfonyl) -α-dimethylethylenedioxime, bis-〇- (η- &quot; 7-sulfonyl) -α-two After ethylethylene, bis-101 (η-butanesulfonyl) -α-monocyclohexylethane @ 亏, bis-101 (η-butanesulfonyl) -2,3-pentanediol ethyl Dioxime, bis-101- (n-butanesulfonyl) -methyl-2,3,4-pentanediol ethylenedioxime, bis-10 (methanesulfonyl) -α-dimethylethyl Dioxime, bis-101 (trifluoromethanesulfonyl) -α-dimethylglyoxime, bis-101 (1, 1, 1, 1-trifluoroethanesulfonyl) -α-dimethyl Ethylenedioxime, Bis-O- (tert-butanesulfonyl) -α-dimethylglyoxime, Bi-101 (Perfluorooctanesulfonyl) printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Mono-α-dimethylglyoxime, bi-101 Cyclohexanesulfonyl) -α-dimethylglyoxime, bis-101 (benzenesulfonyl) -α-dimethylglyoxime, bis-101 (ρ-fluorobenzenesulfonyl) ) -Α-dimethylglyoxime, bis-010- (ρ-tert-butylbenzenesulfonylhydrazone) -α-dimethylglyoxime, bis-0- (xylylenesulfonyl) -α- Ethylenedioxime derivatives such as dimethylglyoxime, bis- 10- (methanesulfonylsulfanyl) -α-dimethylglyoxime; bisnaphthylsulfonylmethane, -29- This paper is applicable to China Standard (CNS) A4 specification (210 X 297 mm) 534911 A7 B7 V. Description of the invention (27) (Please read the precautions on the back before filling this page) Ditrifluoromethanesulfonylmethane, bismethylsulfonium Disulfonium derivatives such as methane, diethylsulfonylmidine, dipropylsulfonylmethane, bisisopropylsulfonylmethane, bis-P-toluenesulfonylmethane, bisbenzenesulfonylmethane; 2-cyclohexyl Carbonyl- 2-(p -tosylsulfonium) propane, 2-isopropylsulfonyl-2-(P -tosylsulfonyl) propane, etc./S-keto derivatives; diphenyl diphenyl, bicyclic Jiji Di Shuo and other di Shuo derivatives; P-toluenesulfonic acid 2,6-dinitrile phenyl ester, P-toluenesulfonic acid 2,4 dinitrile phenyl ester and other nitrile phenyl sulfonate derivatives; 1, 2, 3 -Sulfuric acid esters such as tris (methanesulfonyloxy) benzene, 1,2,3-tris (trifluoromethanesulfonyloxy) benzene, 1,2,3-tris (P-tosylsulfonyloxy) benzene derivative. N-hydroxysuccinimide methanesulfonate, N-hydroxysuccinimide trifluoromethanesulfonate, N-hydroxysuccinimide ethanesulfonate, N-hydroxysuccinimine 1-propanesulfonate, N -Hydroxysuccinimide 2-propanesulfonate, N-Hydroxysuccinimide 1 Monopentanesulfonate, N-Hydroxysuccinimide 1 Mono-octanesulfonate, N-Hydroxysuccinimide P -Toluenesulfonate Acid ester, N-hydroxysuccinimide p-methoxyphenylsulfonate, N-hydroxysuccinimine 2-chloroethanesulfonate, N-hydroxysuccinimine phenylsulfonate, N-hydroxysuccinimide Imine-2, printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 4,6-trimethylbenzenesulfonate, N-hydroxysuccinimide 1-naphthalenesulfonate, N-hydroxysuccinimide 2-Tsai Su Acid ester, N-hydroxy-2-phenylsuccinimide methanesulfonate, N-hydroxymaleimine methanesulfonate, N-hydroxymaleimine ethanesulfonate, N-hydroxy-2- Phenyl maleimine methane sulfonate, N-hydroxyglutamine imine methane sulfonate, N-hydroxyglutamine imine sulfonate, N-hydroxyphthalimide methane sulfonate, N-hydroxyphthalate Imine benzene sulfonate, N-hydroxy-o-phthalenedi-30- This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) 534911 Α7 Β7 V. Description of the invention (28) (Please read the back first Please note this page and fill in this page) Formamidine imine trifluoromethanesulfonate, N-hydroxyphthalimide p-toluenesulfonate, N-hydroxynaphthalimide methanesulfonate, N-hydroxy Zeimide benzene sulfonate, N-hydroxy-5'-norbornyl-2,3-dicarboxyimide methanesulfonate, N-hydroxy-5'-norbornyl-2,3-dicarboxyl N-hydroxyimine sulfonate derivatives, such as amine trifluoromethanesulfonate, N-hydroxy-5 -norbornyl-2,3-dicarboxyimine p-toluenesulfonate, etc .; trifluoromethane Triphenylsulfonium sulfonate, trifluoromethanesulfonic acid (P-tert-butoxyphenyl) diphenylsulfonium, trifluoromethanesulfonic acid tri (p-tert-butoxyphenyl) fluorene, p-toluenesulfonic acid Triphenylphosphonium, p-tert-butoxyphenyl diphenyl, p-tert-butyloxyphenyl, p-tert-butoxyphenyl, trinaphthyl trifluoromethanesulfonate Base, trifluoromethane Acid cyclohexylmethyl (2-carbonylcyclohexyl) hydrazone, trifluoromethanesulfonic acid (2-norbornyl) methyl (2-carbonylcyclohexyl), 1, 2'-naphthylcarboxymethyltetrahydrosulfide Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, such as benzene-trichloromethane, etc. Fluorenyl) diazomethane, bis (η -butylsulfonyl) diazomethane, bis (isobutylsulfonyl) diazomethane, bis (sec —butylsulfonyl) diazo Diazomethane such as methane, bis (η-propylsulfonyl) diazomethane, bis (isopropylsulfonyl) diazomethane, bis (tert-butylsulfonyl) diazomethane Derivatives; bis-101- (P-toluene i: i flavate) -α-monomethylethane, bis-101- (η-butanesulfonyl) -α-dimethylethylenedioxime Ethylenedioxime derivatives; Disulfonic acid derivatives such as methylene dinaphthylsulfonate. N-hydroxysuccinimide methane sulfonate, N-hydroxysuccinimide trifluoromethane-31-This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Invention Note (29) (Please read the notes on the back before filling out this page) Sulfonate, N-Hydroxysuccinimide 1 Propane Sulfonate, N-Hydroxysuccinimide 2-Propane Sulfonate 'N -hydroxyl Succinimine 1-pentanesulfonate, N-hydroxysuccinimide p-toluenesulfonate, N-hydroxynaphthalimide methanesulfonate, N-hydroxynaphthalene imine benzenesulfonate, etc. An ester derivative of an imine compound is preferred. The acid generator described above may be used alone or in combination of two or more. The sulfonium salt has the excellent effect of improving the rectangularity, and the diazomethane derivative and the glyoxime derivative have the excellent effect of reducing the fixed wave. The combination of the two can finely adjust the shape of the figure. The addition amount of the acid generator is preferably 0.1 to 15 parts, and more preferably 0.5 to 8 parts. If it is less than 0.1 part, sensitivity may be deteriorated, and if it is more than 15 parts, transparency may be reduced and resolution may be deteriorated. As the organic solvent used in the present invention, any organic solvent that can dissolve the base resin, the acid generator, and other additives can be used. This organic solvent is, for example, ketones such as cyclohexanone, methyl- 2-η-pentanone; 3-methoxybutanol, 3-methyl-3-methoxybutanol, 1-methoxy-economy Printed by the Consumer Cooperatives of the Ministry of Intellectual Property Bureau, 2-propanol, 1-ethoxy-2-propanol and other alcohols; propylene glycol monomethyl ether, ethylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol Ethers such as alcohol monoethyl ether, propylene glycol dimethyl ether, diethylene glycol dimethyl ether; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl lactate, ethyl pyruvate , Ethyl acetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, tert-butyl acetate, tert-butyl propionate, ethylene glycol propionate-single tert-butyl ether ethyl Ester such as acid esters, which can be used alone or in combination of two or more, and is not limited to the above compounds-32- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of Invention (30). In the present invention, except for diethylene glycol dimethyl ether or 1-ethoxy-2-propanol, the solvents with the best solubility of the acid generator in the photoresist component among these solvents are used as safe solvents. Propylene glycol monomethyl ether acetate and other mixed solvents can be used together. The amount of the organic solvent to be used is from 200 to 1,000 parts, and more preferably from 400 to 800 parts, based on 100 parts of the base resin. The photoresist material of the present invention may further contain other polymer compounds different from the polymer compound shown in the present invention. Specific examples of the above-mentioned other polymer compounds include a weight average molecular weight of 1,000 to 50,000, such as having a unit represented by the following formula (R 1) and / or the following formula (R 2), preferably Polymer compounds from 5,000 to 10,000, but not limited to this content. 【【化 2 2】 (Please read the precautions on the back before filling this page) d〇〇2 «00 R00 2 R00 002 R001 〇002 r001 -CH- a) br -CH- icr -CH- idr

co2r0K co2r014 C02Ru Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy -CH- iar co2r004

HC, r01Q— ~ Η M C-6- a) b2. Ic2. Η H • 6-6-

-CH HC,

-CH

^ CH) d2 ·

: H—CH

: H—CH

--CH HC \ -ch2-7CHiW, hVch2〆p, HVch2-7ch -R013 R〇〇2——V-

R002 ~ V ikf R001 R011 * R012 H C02R ° 14 H C02R011 -33- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (31) (-C々 / X \ 'C—) a3 · (-二) b3_ (-Cf / X \ H, C—} ί ^ Λ— · Η \ ,, ~ ί.—1 CH—CH CH—CH 9Η ~ ^ C3. Bu. 々 / 乂 ^^ ,. a) d3. ΗΛ / Η Γ

CH——CH

HUH HV〇H ^ 2Llk- ΗΚ /%, X r005_ \ ~ ^ -CH2 · ^ / 丨 Dagger ’l V J「 、 008 r01Q_ hc \ -ch2-7ch

_r013 r002——V _R001 r002_) 001 1 ^ 00 6 rOO 7 Η H (~%) e_ R011 R012 H C02R ° H C02R ° 15 O-(Rl) (Please read the precautions on the back before filling this page) 〇002 r001 r002 〇00 € H- ~) f -CH- co2ru co2r015 M R016 Jh—π) h. IH R016 • CH— H CH- &amp;

(R017〆 (OH) yW (R01V (R2) The number of carbon printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 to 0 0 8-(OR015) z_ (R017) x. (〇H) y. (Where R ° ° 1 is a hydrogen atom Γ ·, 丨 丨 丨 group or CH 2 C〇2 R ° ° 3 0 0 2 0 0 3 0 0 3; R is a hydrogen atom, a methyl group or C02R; R is a carbon number 1 Linear, branched, or cyclic courtyards to 15; R is a hydrogen atom or a carboxyl group of 5 or a monovalent hydrocarbon group containing a hydroxyl group; Rn (at least one of 35 to R is a carbon number of 1 to 15 Carboxyl group or monovalent hydrocarbon group containing hydroxyl group, others are independent hydrogen atom or straight chain with carbon number of 1 to 15. The paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) -34- 534911 standing Single bond or a linear, branched chain group having 1 to 15 carbons; R is an alkyl group of a polycyclic hydrocarbon group having 7 to 15 carbons; R is an acid labile group; R ϋ 16 is 0 1 7 R is a linear, branched or C Η 2 or oxygen atom having 1 to 8 carbon atoms; k &gt; is 0 or 1; 3 1-,, bl /, b2 /, b3 ^, cl ^, R-shaped or hydrogen-containing procyclic cyclic a 2 cyclic polycyclic ring or alkyl group A7 V. Description of the invention (32) Shaped, branched or cyclic alkyl group; R () ° 5 to R ° can form a ring with each other. At this time, at least one of R to R is a carboxyl group having 1 to 15 carbon atoms or a divalent hydroxyl group containing a hydrocarbon group, and the other is a separate single bond or carbon number 1 A linear, branched, or cyclic extension group to R 1 to R 5 is a monovalent hydrocarbon group containing a c02-partial structure with a number of 3 to 15; R. 1 () to R is at least 1 is a monovalent hydrocarbon group containing 2 to 15 carbon atoms and containing a C02-partial structure, and the other is a separate hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 15 carbon atoms ; R ° 1 ° to R ° 1 3 can form a ring with each other 'At this time R &quot; &quot; 1 &quot; &quot; to R ◦ At least one of 1 3 is a part having a carbon number of 1 to 5 Structured divalent nicotinic group, others are their unique alkylene alkyl methyl groups; X is (please read the precautions on the back before filling out this page) d 1 meet d 2 d printed by the employee ’s consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The system d is 0 or more b 1 ^ + 1 + d? B is a number below 2 ^ + b and gh is a lower Z Μ 'and satisfies d 3 〇 to gh over 1 to 1

Also, the specific examples of its respective substituents are shown in the RR 1 5 content of this paper, which is the national standard (CNi ^ 4 specification ^ -35-534911 Α7 _____ _ B7. V. Description of the invention (33) The polymer of the present invention The compounding ratio of the compound with other high-scoring compounds is from 10:90 to 90:10, and from 20:80 to 80: ----- ^ --- ^ --- I -(Please read the notes on the back before filling this page) The range of weight ratio of 20 is the best. When the compound ratio of the polymer compound of the present invention is lower than this range, better performance cannot be obtained when used as a photoresist material In addition, the performance of the photoresist material can be adjusted by appropriately changing the above-mentioned mixing ratio. In addition, the other polymer compounds mentioned above are not limited to the addition of only one kind, but can also add more than two kinds. Generally, many kinds of polymers are used. The method of the compound can adjust the performance of the photoresist material. The photoresist material of the present invention can be further added with a dissolution control agent. The dissolution control agent has an average molecular weight of 100 to 1,000, more preferably 150 to 150. 8 0 0 has more than two phenolic hydroxyl groups in the molecule A compound in which the hydrogen atom in the phenolic hydroxyl group is replaced by an acid-labile group at a ratio of 0 to 100 mole% of the entire average, or a compound having a residue in the molecule, and the hydrogen in the carboxyl group A compound in which the atomic acid-labile group is replaced by an average of 50 to 100 mol% of the total. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the hydrogen atom in the benzene acid group is replaced by an acid-labile group. The substitution of $ is, on average, more than 0 mole% of the total of p-phenolic hydroxyl groups, which is more than 30% by weight, and the upper limit is 100 mole%, preferably 80 mole%; hydrogen in the residue The substitution rate of the atom with an acid-labile group is, on average, more than 50 mole% of the entire carboxyl group, preferably 70 mole%. The upper limit is 100 mole%. At the time, the compound with two or more phenolic hydroxyl groups or the compound with one or more carboxyl groups is described above, for example, the following formulae (D 1) to (D 1 4) -36- This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) 534911 A7 B7 V. Description of the invention (34) Thereof. [23] of HCA_ / ch3 D1

(OH) r '52m R202 D4 _ / r20 D3

(〇H) r (Please read the precautions on the back before filling this page) Install D6 Order:

W ('OH) r D8

D9 / T \ (0H) t V = &gt; R2015.3¾

Printed by the Consumer Cooperative of DIO Intellectual Property Bureau, Ministry of Economic Affairs

(〇H) t

(QH ^ COOH

D13 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -37-

COOH D12

^ 4911

'Explanation of invention (35 (where R and R ~ are each a hydrogen atom, or a linear or branched alkyl or alkenyl group having 1 to 8 carbon atoms; R 2 Q 3 is a hydrogen atom and 1 to 8 carbon atoms 8 chain or branched alkyl or alkenyl, or ^) h C 〇〇Η; r — (η is — (c Η 2) 1 — (1 2 to 10), carbon number 6 to 1 Q Aryl, carbonyl, sulfofluorenyl, oxygen or sulfur atom; R 2. b is a carbonized alkyl group of 1 to 1 fluorene, carbonized aryl group, carbonyl, sulfofluorenyl, oxygen atom Or sulfur atom; R ° ◦ 6 is a hydrogen atom, a linear or branched alkyl group having 1 to 8 carbon atoms, a aryl group, or a phenyl or naphthyl group each substituted by a hydrocarbon group; r 2 ϋ 7 is carbon A linear or branched alkylene group having a number of 1 to 10; R2. 8 is a hydrogen atom or a hydrocarbon group, j is an integer of 0 to 5; 11, 11 is 0 or 1; s, t, s-, + ----- ： --- τ— 装 --- (Please read the notes on the back before filling in this page) The basic 10 is that each satisfies s + t ^ S, s / + t / = 4 ', and Have at least one hydroxyl group in each phenol skeleton

Number; α is the number of the formula (d 8), 0 to 1, and 0.000. In the above formula, the molecular weight of the compound of R, R D 9) is, for example, a hydrogen atom, methyl, ethylbutyl, propyl, vinyl, cyclohexyl;

R

For example, it is printed with the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, R—C 醯 2 2 (R, butyl, naphthalene is the same compound, or a 〇〇Η y (jj Η 2 C Ο Ο Ο Η ; R is, for example, ethyl, phenyl, carbonyl, sulfo, oxygen, sulfur, etc .; R. is, for example, methyl, or the same compound as} 1; R, 2.6 is, for example, hydrogen, methyl, or ethyl Group, propyl group, vinyl group, cyclohexyl group, phenyl group each substituted by a group, etc. Among them, the acid-labile group of the dissolution control agent is, for example, the following formula (L 1) This paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -38- 534911 ΚΙ B7 V. Description of the substituents shown in (36) to (L4), tertiary alkyl groups having 4 to 20 carbon atoms, and carbon numbers of each alkyl group are Trialkylsilyl groups from 1 to 6, curtain alkyl groups with carbon numbers from 4 to 20, etc. [Chemical 2 4] (Please read the precautions on the back before filling out this page) Printed by the Employees ’Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (Where 5 RR is a 1 atom or a linear branched or TS1-like carbon number of 1 to 8: alkyl; R L (.) 3 is a carbon atom of 1 to 18 which may contain an oxygen atom; a heterovalent-monovalent hydrocarbon group L; R 0 1 L and R 0 2 &gt; RLC 丨 1 and! R-0 3 LR .0 2 and RL 0; 3 can be formed: when rmi 5 forms a ring, RL () 1 &gt; RL () 2 RL 0 3 each is a linear or branched fluorenyl group having 1 to 18 carbon atoms, RL 0 1 is a carbon number of 4 to 2 0. Each base is a dialkyl silicon group of 1 to 6 carbons. 7 ′ s m is a carbonyl group of 4 to 2 0 or the above formula (L 1). Shows that the substituent RL () 5 is a straight chain having 1 to 8 carbons> a branched or cyclic alkyl group or an aryl group RL that can be substituted with 6 to 2 carbons 〇 6 is 1 to 8 carbons Straight-chain &gt; branched or cyclic courtyard or 6 to 2 carbon atoms which can be substituted 1 RL 〇7 to RL] .6 is hydrogen atom or 7 * ash 1 to 1 5 monovalent hydrocarbon groups RL (] 7 to RL which may contain hetero atoms; L 6 may form a ring with each other It can be a divalent hydrocarbon group with a number of 1 to 15 that can contain a heteroatom, TIU m, a bivalent hydrocarbon group y and 1 RLC) 7 to RLJ -6 When bonding to adjacent carbons, it is not necessary to sandwich other atoms to form a double bond rL13 rL14

(L1) (L2) (L3) (L4) -39- This paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7_ V. Description of the invention (37); a is 0 to 6 An integer; m is 0 or 1, and η is 0, 1, 2, or 3, and is a number that satisfies 2 m + η (2 or 3). (Please read the precautions on the back before filling this page) The amount of the above-mentioned dissolution control agent is 0 to 50 parts for 100 parts of the base resin, preferably 5 to 50 parts, more preferably 10 To 30 parts, it can be used alone or as a mixture of two or more. When the addition amount is less than 5 parts, the resolution may not be improved. When it exceeds 50 parts, the pattern film may be attenuated, and the resolution may be reduced. In the above-mentioned dissolution control agent, a compound having a phenolic hydroxyl group or a carboxyl group can be synthesized by introducing an acid-labile group using an organic chemical reagent. In addition, a basic compound may be further added to the photoresist material of the present invention. The basic compound is preferably a compound which can suppress the diffusion rate of the acid generated by the acid generator in the photoresist film. Adding a basic compound can suppress the diffusion speed of acid in the photoresist film to improve the resolution, thereby suppressing the sensitivity change after exposure, reducing the dependence of the substrate or the environment, and improving the exposure latitude or the shape of the pattern. This basic compound printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs can be, for example, first-, second-, and third-class aliphatic amines, mixed amines, aromatic amines, and heterocyclic amines. A nitrogen-containing compound, a nitrogen-containing compound having a sulfofluorenyl group, a nitrogen-containing compound having a hydroxyl group, a nitrogen-containing compound having a hydroxyphenyl group, an alcoholic nitrogen-containing compound, an amidine derivative, an imine derivative, and the like. Specifically, the first-stage fatty amines include urea, methylamine, ethylamine, η-propylamine, isopropylamine, η-butylamine, isobutylamine, sec-butylamine, tert- Butylamine, pentylamine, tert This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) -40- 534911 A7 B7 V. Description of the invention (38) (Please read the precautions on the back before (Fill in this page)-Amylamine, cyclopentylamine, hexylamine, cyclohexylamine, heptylamine, octylamine, nonylamine, decylamine, laurylamine, cetylamine, methylidene Diamine, ethylenediamine, tetraethylamylamine, etc .; second-order aliphatic amines such as dimethylamine, diethylamine, di-n-propylamine, diisopropylamine, Di-n-butylamine, diisobutylamine, disec-butylamine, dipentylamine, dicyclopentylamine, dihexylamine, dicyclohexylamine, diheptylamine, dioctyl Amine, dinonylamine, didecylamine, dilaurylamine, dicetylamine, N, N-dimethylmethylenediamine, N, N-dimethylmethylenediamine, N , N-dimethyl tetra Ethylpentylamine, etc .; tertiary aliphatic amines such as trimethylamine, triethylamine, tri-η-propylamine, triisopropylamine, tri-η-butylamine, triisobutyl Methylamine, disec-butylamine, tripentylamine, tricyclopentylamine, trihexylamine, tricyclohexylamine, diheptylamine, trioctylamine, trinonylamine, tridecylamine , Trilaurylamine, tricetylamine, N, N, N /, N /-tetramethylmethylenediamine, N, N, N /, N /-tetramethylmethylenediamine, N, N, N /, N / -tetramethyltetraethylpentylamine and the like. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Mixed amines such as dimethylethylamine, methylethylpropylamine, pentylamine, phenethylamine, and benzyldimethylamine. Specific examples of the aromatic amines and heterocyclic amines are aniline derivatives (for example, aniline, N-fluorenylaniline, N-ethylaniline, N-propylaniline, N, N-dimethylaniline, 2-methylaniline Aniline, 3-methylaniline, 4-methylaniline, ethylaniline, propylaniline, trimethylaniline, dinitroaniline, 3-nitroaniline, 4-mononitroaniline, 2,4 one two Nitroaniline, 2,6-dinitroaniline, 3,5-dinitroaniline, N, N-dimethylaniline, etc.) This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (%) -41-534911 A7 _ B7 Printed clothing by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (39) Diphenyl (P-tolyl) amine, methyldiphenylamine, triphenylamine, Phenylenediamine, naphthylamine, diaminonaphthalene, pyrrole derivatives (such as pyrrole, 2 2-pyrrole, 1-methylpyrrole, 2,4-dimethylpyrrole, 2,5-dimethylpyrrole , N-methylpyrrole, etc.), oxazole derivatives (such as oxazole, isoxazole, etc.), thiazole derivatives (such as thiazole, isothiazole, etc.), d-derivatives (e.g., imine, 4-methylimide, 4-methyl-2, 2-phenylimidazole, etc.), pyrazole derivatives, furan derivatives, pyrroline derivatives (such as pyrroline, 2 —Methyl-1; [monopyrroline, etc.], pyrrolein derivatives (such as pyrrolidine, N-methylpyrrolidine, pyrrolein, v-methylpyrrolidone, etc.), imidazoline derivatives, imidazopyridine derivatives , Pyridine derivatives (e.g., pyridine, methylpyridine, ethylpyridine, propylpyridine, butylpyridine, 4 mono (1-butylbenzyl) pyridine, dimethylpyridine, trimethylpyridine, triethylpyridine , Phenylpyridine, 3-monomethyl-2-phenylpyridine, 4-t-pyridylpyridine, diphenylpyridine, pentylpyridine, methoxypyridine, butoxypyridine , Dimethoxypyridine, 1-methyl-1 2-pyrrolidone, 4-pyrrolidone pyridine, 1-methyl-4 4-phenylpyridine, 2- (1 ethylpropyl) pyridine, aminopyridine, (Dimethylaminopyridine, etc.), pyridazine derivatives, pyridine derivatives, pyrazine derivatives, p-xoline derivatives, pyrazolidine derivatives Compounds, Iradidin derivatives, piperazine derivatives, morpholine derivatives, indole derivatives, isoindole derivatives, 1 Η-indazole derivatives, indolinoline derivatives, quinoline derivatives (such as quinoline Phthaloline, 3-quinoline carboxyphthalein, etc.), iso-D quinoline derivatives, oxoline derivatives, quinazoline derivatives, D | tetraline derivatives, phthalazine derivatives, purine derivatives, pyrimidine derivatives , Carbazine derivative, phenanthroline derivative, acridine derivative, phenazine derivative, 1 '1 0 (Please read the note on the back first? · _ Matters and then install-fill in this page). This paper Standards apply to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) -42- 534911 A7 B7 V. Description of the invention (40)-Phenanthroline derivatives, adenine derivatives, adenosine derivatives, guanine Derivatives, bird symbol derivatives, chewing derivatives, urazine derivatives, etc. (Please read the notes on the back before filling out this page) Also, ammonia-containing compounds with carboxyl groups, such as aminobenzoic acid, indolecarboxylic acid, amino acid derivatives (such as nicotine acid, alanine, arginine, asparagus Alanine, citrate, glycine, histidine, isolysine, glycine leucine, leucine, methionine, phenylalanine, threonine, lysine, 3-aminopyridine 2-carboxylic acid, methoxypropylamino), etc .; nitrogen-containing compounds having a sulfonic acid group such as 3-pyridinesulfonic acid, P-pyridylsulfonic acid, etc .; nitrogen-containing compounds having a hydroxyl group, Nitrogen-containing compounds, alcoholic nitrogen-containing compounds, and the like, for example, 2-hydroxypyridine, cresol, 2,4-monoquinolinediol, 3-indole methanol hydride, monoethanolamine, diethanolamine, triethanolamine, N-ethyl Diethanolamine, N, N-diethylethanolamine, tripropanolamine, 2,2 &gt;-iminodiethanol, 2-aminoethanol printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs, 3-amino-1 1 Propanol, 4-amino-1 butanol, 4-mono (2-hydroxyethyl)? , 2- (2-hydroxyethyl) pyridine, 1- (2-hydroxyethyl) piperazine, 1- [2- (2-hydroxyethoxy) ethyl] π-Cinazine, | 丨 Cinazine ethanol, 1- (2-hydroxyethyl) pyrrolidine, 1- (2-hydroxyethyl) -2-pyrrolidone, 3-pyrrolidone-1, 2-propanediol, 3-pyrrolidone-1, 2-propanediol , 8-Hydroxylonidin, 3-pyrimidinol, 3-tropinol, 1-methyl-2-pyridineethanol, 1-azacyclopropaneethanol, N- (2-hydroxyethyl) peptide 醯Imine, N- (2-hydroxyethyl) isonicotinamide and so on. Derivatives of amidine, for example, formamide, N-methylamidine, N, N-dimethylamidine, acetamide, N-methylacetamide, N, N-dimethylacetamide, Trimethyl ethyl-43- This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (41) Phenylamine, pentamidine, etc. Examples of imine derivatives include phthalimide, succinimine, and imine. In addition, basic compounds represented by the formulae (B 1) to (B 6) may be added. [Chem 2 CH2CH2O (R301O) sR304 ri-ch2ch2〇 (R302〇) tR305 CH2CH2O (R303O) uR306

Bl pH2CH2O (R307O) sR309: H2CH2O (R308〇) tR310 B2 R311—〇—R312 rl—R311-0-R312 ^ 311 ^^ 312 B3 Guangyi 0—R312 (I-r3,1-o-r312i313 B4 equipment · 11 (Please read the precautions on the back before filling this page) 311—OO—R314 —R311—G—〇—R3h 11—CO-R314 U— ^ L〇_R3M rl—r311—c—o-r3h Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ft B5 B6 (where R 3 ° 1, R 3 () 2, R 3 ° 3, R 3 ° 7, R 3 Q 8 are the independent carbon numbers 1 Linear, branched, or cyclic alkylene up to 20; R 3 ◦ 1, R 3 Q 5, R 3 ° 6, R 3 ϋ 9, and R 3 1 Q are each independently a hydrogen atom, carbon Alkyl or amine groups of 1 to 20; R. 3 Q 1 and R 3 ° 5, R 3 0 4 and R 3 0 6, R 3 0 5 and R 3 ϋ 7, R 3 01 and R 3 0 5 and R 3 1 Q may be bonded to form a ring. In this case, R 3 ◦ 1

R 3 0 6, R

R 3 0 5

R 3 0 6

R

R is a divalent or trivalent radical obtained by removing one or two hydrogen atoms from the radicals of the above conditions. S, T, and U are each an integer of 0 to 20. However, when S, T, and U are 0, R 3 ◦ 1, R 3 ◦ 5, R 3 Q 6, R 3 ° 9, and R 3 1 ° do not contain hydrogen atoms. R 3 1 1 is the Chinese national standard (CNS) A4 specification (210 X 297 mm) for each paper size -44-534911 Α7 Β7 V. Description of the invention (42) (Please read the precautions on the back before filling this page ) From the independent carbon number of 1 to 5; R3 12 is each independently containing more than one kind (c = 〇) one, one (c = 〇) one hundred one, one ten (c = 〇). Part of the structure is a linear, branched, or cyclic alkyl group having 1 to 20 carbons; R 3 1 1 is an independent hydrogen atom or a linear, branched, or cyclic group having 1 to 20 carbon atoms The school base; or may contain more than one kind-(c = 〇) one, one (c = 〇) one hundred one, one ten (c = 〇) 〇 some of the structure can also be; R; 3 12 rooms, R 3 1 2 and R: 3 1; 3, R: 3 1 4, R 3 1 3 and R 3 1 1 may be bonded to each other to form a ring. At this time, R 3 1 2, R 3 1 3 R 3 1 4 is a divalent or trivalent radical in which one or two hydrogen atoms are removed from the radicals in the above conditions). Among them, R 3.1, R 3 0 2, R 3 ° 3, R 3 ◦ 7, R 3 ° 8 may have a carbon number of 1 to 20, preferably 1 to 10, more preferably Alkyl groups having 1 to 8 carbons, specifically, for example, methylidene, ethylidene, η-propylidene, isopropylidene, η-butylidene, isobutylene, η-pentylene Base, isopentyl, hexyl, nonyl, decyl, cyclopentyl, cyclohexyl, etc. Also, R 3 ◦ 1, R 3 ° 5, R 3 ° 6, R 3 Q 9, and R 3 1 Q are printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Alkane Economy. For example, carbon number 1 to 20 is better. It is 1 to 8 and more preferably an alkyl group having 1 to 6 carbon atoms, which may be linear, branched, or cyclic. Specifically, for example, methyl, ethyl, η-propyl, isopropyl, η-butyl, isobutyl, tert-butyl, η-pentyl, isopentyl, hexyl, nonyl, decyl , Lauryl, tridecyl, cyclopentyl, cyclohexyl, etc. R 3 〇1 and R 3 0 5, R 3 0 4 and R 3 0 6, R 3 0 5 and R 3 0 6, R 3 0 1 and R 3 ◦ 5 and R 3 ϋ 6, and R 3. When 9 and R 3 1 ° form a ring, the carbon number of the ring is 1 -45- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 ---------- B7__ —_— One or five, description of the invention (43) ~~ y ~~ · * 2 〇 'more preferably 1 to 8 and most preferably 1 to 6 is appropriate, and these rings may have a carbon number of 1 to 6, In particular, alkyl branches from 4 to 4. S, T, and U are each an integer of 0 to 20, preferably 1 to 10 'and most preferably an integer of 1 to 8. R 3 1 1 is a radical having a carbon number of 1 to 5, preferably a carbon number of 1 to 4, and more preferably a radical of 1 to 3. Specific examples include methyl, ethyl, and η ~ propyl. , Isopropylidene, n-butylene, isobutylene, n-butylene, isopropylene, etc. Specific examples of the R 3 12 group include methyl amidino, ethyl amidino, trimethyl ethyl amidino, methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl, methoxycarbonylmethyl, ethoxycarbonylmethyl, tert a Butoxycarbonylmethyl, 2-carbonyloxeocane-3-yl, 2-carbonyl-5methylmethyloxalocene-5yl, 2 ~ carbonyl-1,3-dioxacenane-4 One base and so on. The alkyl group of R 3 1 3 is, for example, a carbon group having 1 to 20 carbon atoms, preferably 1 to 8 carbon atoms, and more preferably 1 to 6 carbon atoms. The alkyl group may be linear, branched, or cyclic. Specific examples are the same as shown in R 3 ° 1, R 3 Q 5, R 3.6, R 3 () 9, and R 3 1 0. The alkyl group of R 3 1 4 is, for example, a carbon number of 1 to 20, preferably a carbon number of 1 to 8, more preferably a carbon number of 1 to 6, which may be linear, branched, or cyclic. Specific examples are the same as shown in R 3 Q 4, R 3 ϋ 5, R 3 ◦ 6, R 3 ° 9, R 3 1 0. R 3 1 4 is one containing more than one kind (C = 〇) one, one (C = 〇) one 〇—, — 〇 (c = 〇) 〇 — part of the constructor also said; at this time, R 3 1 1 Specific examples are methoxymethyl, 1-ethoxyethyl, tetrahydropyran ------------- 7 --_ equipment --- (Please read the precautions on the back before filling this page) ) JI-printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, the paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -46- 534911 A7 B7 V. Description of Invention (44) Note on the back page, please fill in this page again) 2 —Methyl, methylamino, acetamido, trimethylacetamido, methoxycarbonyl, ethoxycarbonyl, tert —butoxycarbonyl, methoxycarbonylmethyl, ethoxy Carboxymethyl, tert-butoxycarbonylmethyl, 2-carbonyloxocane-3-yl, 2-carbonyl-5-methyloxocane-5-yl, 2-carbonyl-1, 3-- Oxygeno-mao hospital is one-four-one. When R 3 1 2, R 3 1 2 and R 3 1 3, R 3 1 4 and R 3 1 3 and R 3 1 4 form a ring, the carbon number of the ring is 1 to 2 0, preferably 1 To 8, preferably 1 to 6, and these rings may have an alkyl branched chain having 1 to 6 carbon atoms, preferably 1 to 4. The specific content of the above-mentioned compounds (B 1) to (B 6), for example, tris (2-methoxymethoxyethyl) amine, tris {2-(methoxyethoxy) ethyl} amine, tris { 2- (2-methoxyethoxymethoxy) ethyl} amine, di {2- (1-monomethoxyethoxy) ethyl} amine, di (2- (1-ethoxypropoxy) Ethyl 丨 amine, tris [2- {2 -— (2-hydroxyethoxy) ethoxy} ethyl] amine, 4, 7, 13, 16, 21, printed by the Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs 2 4-hexaoxo-1,10-diazabicyclo [8,8,8] hexacosane, 4,7,1,3,18-tetraoxo-1,10-diazabicyclo [ 8,5,5] eicosane, 1, 4, 1 0, 1 3 -tetraoxo 7,16 -diazabicyclooctadecane, 1 monoaza-12-crown-1 4,1 nitrogen Hetero-1 5 —crown-5, 1-aza-1-18-crown-6, tris (2-methylammonyloxyethyl) amine, tris (2-ammonyloxyethyl) amine, tris (2-ethyl Carbonylethyl) amine, tris (2-trimethylacetoxyethyl) amine, tris (2-methoxycarbonyloxyethyl) amine, tris (2-ethoxycarbonyloxyethyl) ) Amine, tri (tert-butoxycarbonyloxyethyl) amine, tris (2-methoxycarbonyl-47-) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (45) methoxyethyl) amine, tris (2-cyclohexyloxycarbonylmethoxyethyl) amine, tris (2-monomethoxymethoxycarbonylmethoxyethyl) amine, tris 2- 2- (1- Ethoxyethoxycarbmethoxy) ethyl} amine, etc. Among the basic compounds mentioned above, in particular, tertiary amines, aniline derivatives, pyrrolidine derivatives, pyridine derivatives, quinoline derivatives, and fluorenyl acids Compounds, nitrogen-containing compounds having a hydroxyl group, nitrogen-containing compounds having a phenyl group, alcoholic nitrogen-containing compounds, amidine derivatives, imine derivatives, tris (2-methoxymethoxyethyl) amines, tris { 2 — (2 —methoxyethoxy) ethyl 丨 amine, tri 2 — (2-methoxyethoxymethoxy) ethyl 丨 amine, tri (2 —ethoxyethyl) amine, 1 a Aza-one; 15-crown-5, etc. is preferred. The above-mentioned basic compound is added in an amount of 0.001 to 10 parts, preferably 0.001 to 1 part, to the acid generator. Add to When the amount is less than 0 · 0 0, the effect of the additive is not fully exerted, and when the amount exceeds 10 parts, the resolution or sensitivity may be reduced. In addition, the photoresist material of the present invention may further be added with three C-C〇〇Η in the molecule. A compound having a tri-C-Cyridyl group in the molecule can be, for example, one or two or more compounds selected from the following Groups I and II, but it is not limited to these compounds. After adding this component, it can improve the PED stability of the photoresist, and can improve the edge curl on the nitride film substrate. [Group I] The phenolic properties of the compounds represented by the following formulae (A 1) to (A 1 0) Hydroxyl ----: ΤΙ-Φ--packing · II (please read the precautions on the back before filling this page) A4 specification (210 X 297 mm) -48- 534911 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _B7_ V. Description of the invention (46) Some or all of the hydrogen atoms in the base are subject to one R 1 Q 1 — C 〇〇H (R 1 ° 1 is a linear or shaped carbon number 1 to 1 〇 I under 2 — Chain C II I I request III j [[1

With C

D (Please read the precautions on the back before filling this page) -49- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 _B7 V. Description of the invention (47)

(Wherein R 1 ◦ 8 is a hydrogen atom or a methyl group; R 1 ◦ 2, and R 4 ° 3 are each a hydrogen atom or a linear or branched alkyl or alkenyl group having 1 to 8 carbon atoms; R 1 13 4 is a hydrogen atom or a straight-chain or branched alkyl group having 1 to 8 carbon atoms or a sulfonyl group, or a (R 4 ° 9) h — C〇〇R / group (R — is a hydrogen atom or a R 1 0 9 — C 〇〇Η); R 1 (] 5 is one (C Η 2) i — (1 = 2 to 1 0), 6 to 10 carbon number of aryl, carbonyl, sulfonic group, An oxygen atom or a sulfur atom; R 4 ^ 6 is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, a carbonyl group, a sulfofluorenyl group, an oxygen atom, or a sulfur atom; R 4 ^ 7 is Hydrogen atom or linear or branched alkyl group, alkenyl group, phenyl or naphthyl group each substituted by a hydroxyl group of 1 to 8 carbon atoms; R 1 13 9 is a linear or branched carbon group of 1 to 10 carbon atoms Chain alkylene; R 1 1 ΰ is a hydrogen atom or a straight or branched chain alkyl or alkenyl group having 1 to 8 carbons; or R 111-C〇〇 Η group; R 411 is 1 to carbon 10 linear or branched alkylene; j is 0 to 5; u, h is 0 or 1; si, tl, s2, t2,-equipment --- (Please read the precautions on the back first (Please fill in this page again)

s is ·, to, and} the number ο 8, 6 of 〇 || 6 Α ο ο 1 II C ο, the formula of t 4 ο 1 + t is 1-I + / 1: 5 denier S 4. To the number of sub-foots ο full, ο all from 4 groups ο each II hydroxyl group, the amount of CO is 1 weight 4 t 1 is a medium t + quantity}, 3 combination. 4 S oligodifference number 5, to average}, 5 medium level 7 ο 3 11 frame weight Α ο t CX1 bone weight 丨 ο, t-based Chinese formula, 3 + benzene is ο S 2 each △ 口 λ a—I copy The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -50- 534911 A7 B7 V. Description of the invention (48) [Chemical 2 7] t η group 0403 r402 s5 \ _ / ~ ^ 7V_ / r40 13, COOH All (ο ^ ίδ ^ Γ ^ / 11 · 000 ^ 1 R4〇2s5 \ _ / A12

COOH

(CH2) h-C〇〇H A14 A13

(Please read the notes on the back before filling this page) (R 1 0 2, R 1 0 3, R meaning; R412 is a hydrogen atom or hydroxyl t520, and in order to meet s5 + 1 1 has the same meaning as the previous content s5, t5 is a number of s520, 525, and h / is 0 or 1. Specific examples of the ingredients are compounds represented by the following formulae AI-1 to 14 and AI I-1 to 10, but are not limited to these compounds. [Chemical 2 8] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

All

-51-This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of the invention (49)

ΑΙ-6

AI-7

OR &quot; AI-10 (Please read the notes on the back before filling this page)

OR &quot; AI-11

AI-12

AI-13 RaA CH2COORn AI-14 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. There are 亘 (亘, αα, α Η Η 〇〇〇〇〇 2 2 Η He c) with R Or% ο Zieryiyuan Mo Yi hydrogen ο is ο the same. 1 phase R to capacity C ο previously stated in the above 1 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -52- 534911 A7 B7 V. Description of the invention (50)

CHt-COOH AII-2

COOH AII-3 6h2-cooh AII-4: h2cooh All-5: h2cooh I I I I ϋ n I I I I I · n I (Please read the note on the back? Matters before filling out this page}

COOH

CO AII-6

OOH AII-7

h2cooh AII-9 AII-8

Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Among them, the compound with three C-C00H groups in the molecule mentioned above can be used alone or in combination of two or more. The addition amount of the compound having a tri-C-Coxo group in the molecule is generally 0 to 5 parts for 100 parts of the base resin, preferably 0.1 to 5 parts, more preferably 0. 1 to 3 The content is preferably 0.1 to 2 parts. When it exceeds 5 parts, the resolvability of the photoresist material is reduced. Also, the photoresist material of the present invention may further contain an alkynol derivative as an additive component, and the addition of this derivative can improve the stability of storage. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -53-53491! A7 B7 1. Description of the invention (51 The alkynyl alcohol derivative is best to use the following formula (s 1).

(S shown compound 〇 R502 C__A_R503

〇— &lt; CH2CH2〇) yH SI V R504 d502 R505-3 H (OCH2CH2) &gt; r-〇 〇— (CH:

2CH2〇) yH S2 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (where R 5 ° 1, R 5 () 2, R 5.3, R 5.1, R 5.5 are each a hydrogen atom, or A linear, branched, or cyclic alkyl group having 1 to 8 carbon atoms; X and Y are 0 or positive numbers and satisfy the following numbers: 〇SX $ 3〇, 〇 ^ γ $ 30, 〇 $ X + YS4〇). The alkynol derivatives are preferably perphenol 6 1, perphenol 8 2, perphenyl phenol fraction 104, perphenol 1 〇4 E, perphenol 1 〇4 Η, perphenol 10.4 A, perphenol τ G, perphenol PC, perphenol 4 4 0, perphenyl phenol 4 65, per phenol 4 8 5 (manufactured by Gas Manufacturing and Chemical Co., Ltd.), perphenol E 1 004 (manufactured by Nissin Chemical Industry Co., Ltd.) )Wait. The addition amount of the alkynol derivative described above is 0.01 to 2% by weight, and more preferably 0.02 to 1% by weight to 100% by weight of the photoresist composition. The effect of sufficient coatability and storage stability cannot be obtained, and when it exceeds 2% by weight, the resolvability of the photoresist material is reduced. In the photoresist material of the present invention 1, any conventional component other than the ± E component can be added as a surfactant for the purpose of improving the coatability. It should be noted that the addition amount of any of these ingredients is a general addition amount within a range that does not hinder the effects of the present invention. (Please read the precautions on the back before filling this page) The size of this paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) -54- 534911 A7 B7 V. Description of the invention (52 of which surfactants Non-ionic ones are preferred, such as perfluoroalkyl polyoxyacetylene alcohol, fluorinated alkyl esters, perfluoro alkyl amine oxides, perfluoro alkyl E0 additives, fluorine-containing organosiloxane compounds, and the like. For example, “F — 430”, “FC — 4: made by Fleet”, “S — 1 4 1” made by Safluron (manufactured by the Glass Company), and “DS — 4 0L” by UNION (both Sumitomo 3 M Corporation “ S — 1 4 5 ”(all Asahi),“ DS —

"4〇3", Megfluor "FDS-4 5 1 are manufactured by Daikin Industries Corporation 8 15 1 (made by Dainippon Ink Co., Ltd.) X — 7 0 〇2”, “X — 7 0 — 093” (both are Shin-Etsu Chemical Industry Co., Ltd.) and so on. Among them, the better ones are "FC-4 3〇" (manufactured by Sumitomo 3M) and "X-70-093" (Shin-Etsu Chemical Co., Ltd .-----: --- ^ --- install --- (Please Please read the notes on the back before filling in this page) (Employee Cooperative Co., Ltd. Printing Industry Co., Ltd.) Using the photoresist material of the present invention to form a pattern, a well-known etching printing technique, etc., for example, a film with a thickness of 0 · 3 to 2 · 0 // m is spin-coated on a substrate such as a wafer, and Preheat at 60 to 150 ° C. for 1 to 10 minutes, preferably 80 to 130 ° C. for 1 to 5 minutes. Secondly, after the photoresist film is used to form the photomask of the desired pattern, the exposure energy of the chirped energy rays or electron rays such as far ultraviolet rays, plasma lightning X-rays, etc. is 1 to 2 m. Right and left, preferably 10 to 100 nij / c claw 2 under the hot platen at 60 to 150 ° C, 1 to 5 minutes, preferably to 130 ° C, 1 to 3 minutes After the irradiation and baking (pEB) use a developing solution of an alkaline aqueous solution such as 0.1 · 5% to 5%, preferably 2 to 3% Sijiaqi | Antong ^ oxygen THAM), to 0, this paper size applies Chinese national standards (CNS) A4 size (210 X 297 mm) can be coated with radiation on the transfer coating platen. Subsequent compounds (minutes,-55-534911 A7 --- ^ ____ B7 V. Description of the invention (53) (Please read the note on the back? Matters before filling out this page) _ 乂 k is 0 · 5 to 2 minutes, The pattern is formed on a substrate by a common development method such as a dip method, a Pud 1 e method, and a spray method. In addition, the material of the present invention is most suitable for using high energy rays. The micro-pattern drawing of far ultraviolet rays or plasma lightning rays, X-rays and electron rays in the range of 2 4 to 19 3 nm. Also, if it is outside the upper or lower limit of the above range, the target pattern may not be obtained. The effect of the invention [Effect of the invention] The photoresist material of the present invention can sense high energy rays, and has excellent sensitivity, resolution, and etching resistance, so it is very suitable for the fineness of electronic wires or far ultraviolet rays. Processing. In particular, it has less absorption of exposure wavelengths such as A r F plasma laser and K r F plasma laser, so it is very suitable for forming a fine pattern that is perpendicular to the substrate. [Example] The following will use synthesis examples and Examples and Comparative Examples It will be described more specifically in the following, but the present invention is not limited by the following examples. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [Synthesis Example 1] The synthesis of Polymer 1 will be 3 3 · 6 g 1 — (Second Ring [2 · 2 · 1] Heptan-2-en-5-yl) propane-2,2-dicarboxylic acid ditert-butyl vinegar and 9.8 g of maleic anhydride were dissolved in 400 m 1 of tetrahydrofuran ' Then add 0.7 g of 2, 2 /-azobisisobutyronitrile. Stir the tensile scale at 60 ° C and apply the Chinese National Standard (CNS) A4 specification (210 X 297 public love) -56- 534911 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (54) After 15 hours, 60 m 1 of tetrahydrofuran was added, and then dropped into 2 L of η-hexane. The solid produced was filtered out Then, it was washed with 2 L of η-Heiyuan and dried under vacuum at 40 ° C for 6 hours to obtain a polymer compound represented by 28.3 g of hexahedron P ο 1 ymer 1. The yield was 6 5.2% [Synthesis Examples 2 to 6] Polymers 2 to 6 were synthesized in the same manner as described above, or Polymer 2 to 6 were prepared by a known method. [Chemical 3 1] (Polymer 1) (λ ^ = 0.50, e = 0.50, Mw = 9,300) (Polymer 2) (x = 0.50, e = 0.50, Mw = 8,800) (Polymer 3) (x = 0.50, € = 0.50, Mw = 6,300) (Polymer 4) (x = 0.60, b = 0.40, Mw = 17,200) ϋ ϋ ϋ ϋ ϋ ϋ ϋ ϋ II · ^ 1 1 (Please read the notes on the back before filling this page)

This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -57- · 534911 A7 B7 V. Description of the invention (55 (Polymer 6) (x = 0.60, b = 0.40, Mw = 26,900) ( Polymer 5) (x = 0.60, a = 0.05, b = 0.35, Mw = 19,300)

ia &quot;) b co2h

[Example I] The photoresist material of the present invention was evaluated for resolvability using K r F plasma laser exposure. (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [Example I-11 ~ 16] The evaluation of the photoresistive material's resolving power is based on the polymerization that is guarded by ^ Β (P ◦ 1 ymer 1 ~ 6) as the base resin, then the acid generator (p AG 1, 2) shown in the following formula, the Z dissolution control agent (DRR 1 ~ 4) shown in the following formula, basic compounds, The compound (a CC 1, 2) having a tri-C-quinone group in the molecule represented by the following formula is mixed with the solvent 'according to the composition shown in Table 1. It was then filtered with a Teflon filter (pore size: 0 · 2 // m) to obtain a photoresist material. [Chemical 3 2]

cf3so3- (PAG 1)

(Pag 2) This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) -58- 534911 A7 B7 V. Description of the invention (56) [Chemical 3 3]

(DRR 1)

----- ： --- ^ ---- install --- (Please read the note on the back? Matters before filling out this page} (ACC 1)

Order: 13% thicker, 13% thicker. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the Ministry of Economic Affairs. The photoresist solution was spin-coated on a silicon wafer with a degree of 0 · 5 // m. This silicon wafer was baked at 0 ° C and 90 seconds using a hot platen. Thereafter, exposure was performed by a K r F plasma laser (Ricoh, NA = 0.5), and then baking (PEB) was performed at 0 ° C and 90 seconds, and then at 2.38 tetramethyl The development of the positive-type photoresist material after development in an ammonium hydroxide aqueous solution was performed according to the following method. First, the sensitivity (h, m J / c m) is measured. Secondly, take the exposure amount of the space outside the line of 0.3 m / m as a 1: 1 resolution as the optimal exposure amount (sensitivity: P? M J / cm 2), and use the smallest line of space outside the line separated by this exposure amount The width (// m) is used as the estimated resolution of the photoresist material. Vision ^ This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) -59- 534911 A7 B7 V. Description of the photoresist pattern after the invention (57) is observed with a scanning electron microscope . (Please read the precautions on the back before filling out this page) The composition and evaluation results of each photoresist are shown in Table 1. In addition, in Table 1, the description of a solvent and a basic compound is as follows. As the solvent, those containing 0.05% by weight of 2FC-430 (manufactured by Sumitomo 3M Co., Ltd.) were used. C y 〇〇: cyclohexanone PG Μ EA: propylene glycol methyl ether acetate PG / EL: PG Μ EA 70% and 30% lactic acid mixed solvent rj TBA: tributylamine TEA: triethanolamine T Μ Μ EA: Trimethoxymethoxyethylamine T Μ Ε EA: Trimethoxyethoxymethoxyethylamine [Comparative Example] For comparison, the following photoresist materials were evaluated for K r F Resolution under plasma laser exposure. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs [Comparative Examples 1 to 4] Except for the base resin, which uses polymers (Polymer 7 to 10) shown in the following formula, the photoresist materials are made according to the composition shown in Table 2. -60- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 _ B7 V. Description of the invention (58) [Chemical 3 5]

(Polymer 7) (Please read the notes on the back before filling this page) (d = 0.50, e = 0.50, Mw = 8,800) (Polymer 8) (d = 0.50, e = 0.50, Mw = 9,700) (Polymer 9 ) (d = 0.60, e = 0.40, Mw = 20,200) (Polymer 10) (d = 0.60, e = 0.40, Mw = 25,500) The evaluation method of the photoresist is the same as in the above embodiment. The composition and evaluation results of each photoresist are shown in Table 2. According to the results shown in Tables 1 and 2, it is known that the photoresist material of the present invention has a high printed image in the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Γ K. -61-This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) 534911 A7 B7 V. Description of Invention (59) [Table 1] Printing of Example resin by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Acid generator, dissolution control agent, basic compound, solvent, optimal exposure, resolution, shape 1-1 Polymer 1 PAG 1 (2) TBA PGMEA 20.0 0.22 Rectangle (80) (0.125) (480) 1-2 Polymer 2 PAG 1 (2) TBA PGMEA 21.5 0.22 Rectangle (80) (0.125) (480) 1-3 Polymer 3 PAG 1 (2) TBA PGMEA 18.5 0.22 Rectangle (80) (0.125) (480) 1-4 Polymer 4 PAG 1 (2) TBA CyHO 19.5 0.22 Rectangle (80) (0.125) (480) 1-5 Polymer 5 PAG 1 (2) TBA CyHO 20.0 0.22 Rectangle (80) (0.125) (480) 1-6 Polymer 6 PAG 1 (2) TBA CyHO 22.0 0.22 Rectangle (80) (0.125) (480) 1-7 Polymer 4 PAG 2 (2) TBA CyHO 19.0 0.22 Rectangle (80) (0.125) (480) 1-8 Polymer 4 PAG 2 (2) TEA CyHO 23.0 0.22 Rectangle ( 80) (0.125) (480) 1-9 Polymer 4 PAG 2 (2) TMMEA CyHO 19.5 0.22 Rectangle (80) (0.125) (480) 1-10 Polymer 4 PAG 2 (2) TMEMEA CyHO 18.0 0.24 Rectangle (80) (0.125) (480) 1-11 Polymer 3 PAG 1 (2) DRR 1 TEA PG / EL 20.5 0.24 Rectangle (70) (10) (0.125) (480) 1- 12 Polymer 3 PAG 1 (2) DRR 2 TEA PG / EL 22.0 0.22 rectangular (70) (10) (0.125) (480) 1-13 Polymer 3 PAG 1 (2) DRR 3 TEA PG / EL 25.0 0.22 rectangular (70 ) (10) (0.125) (480) 1-14 Polymer 3 PAG 1 (2) DRR 4 TEA PG / EL 22.5 0.22 Rectangle (70) (10) (0.125) (480) 1-15 Polymer 1 PAG 1 (2 ) ACC1 TEA PG / EL 22.5 0.22 Rectangle (80) (4) (0.125) (480) 1-16 Polymer 1 PAG 1 (2) ACC 2 TEA PG / EL 24.0 0.24 Rectangle (80) (4) (0.125) ( 480) (Please read the notes on the back before filling out this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) • 62- 534911 A7 B7 V. Description of Invention (6) Ministry of Economy Printed by the Intellectual Property Bureau's Consumer Cooperatives [Table 2] Comparative Example Resin Acid Generator Dissolution Control Agent Basic Compound Solvent Optimum Exposure Amount Resolution Shape 1 Polymer 7 PAG 1 (2) TBA PGMEA 26.0 0.28 T-crown (80) ( 0.125) (480) 2 Polymer 8 PAG 1 (2) TBA PGMEA 25.0 0.28 T-crown (80) (0.125) (480) 3 Polymer 9 PAG 1 (2) TBA CyHO 24.5 0.26 T-crown (80) (0.125) (480) 4 Polymer 10 PAG 1 (2) TBA CyHO 25.5 0.28 Τ-crown (80) (0.125) (480); --- &quot; --- install --- (Please read the precautions on the back before filling this page) This paper Standards apply to China National Standard (CNS) A4 specifications (210 X 297 mm) -63- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 534911 A7 B7 V. Description of the invention (61) [Example II] Photoresistance of the present invention Materials to evaluate their resolvability using Ar F plasma laser exposure. [Example I I 1,2] Evaluation of photoresist resolution The photoresist material was prepared according to the composition of Table 3 in the same manner as described above. The obtained photoresist solution was spin-coated on a silicon wafer to a thickness of 0 · 5 // m. This silicon wafer was then baked at 130 ° C and 90 seconds using a hot platen. After that, exposure was performed by an Ar F plasma laser processor (Ricoh, NA = 0.55), followed by baking (PEB) at 130 ° C and 90 seconds, and then at 2.38 After developing in a tetramethylammonium hydroxide aqueous solution of%, a positive pattern is obtained. The evaluation of the photoresist material was performed according to the following method. First, the sensitivity (E t h, m J / c m 2) was measured. Secondly, the exposure amount of 1: 1 resolution obtained from the space outside the line of 0 · 2 5 em is used as the optimal exposure amount (sensitivity: E 〇p, m J / cm.), And the smallest amount of space outside the line separated by this exposure amount is used. The line width m) is used to evaluate the resolution of the photoresist material. The photoresist pattern shape after development was observed using a scanning electron microscope. The composition and evaluation results of each photoresist are shown in Table 3. It is known from the results in Table 3 that the photoresist material of the present invention has a higher resolution for the exposure of Ar F plasma laser. The size of this paper applies to China National Standard (CNS) A4 (210 X 297 mm)-64- ----- ^ --- ^ --- install --- (Please read the phonetic on the back? Matters before filling in This page} a ding. Announcement of the application date of this application 'November 14, 89, 89891101 Category Q〇yf 7 / d39, h〇 (L ^^ n (the above columns are filled out by this Office)

A4 C4 534911 Invention patent specification (revised purchase) Chinese polymer compound, photoresist material and pattern formation method invention (1) New name Polymer, resist composition and patterning process English name (1) Xi Hengkuan (2) Takeshi Watanabe (3) Jun Itoyama (1) Said in the country of Niigata Prefecture, Nakagami-gun, Nakijo-mura, Nishifukushima, 281 Nationality, Invention 1 &quot; &quot; &quot; &quot; &quot; Creation of residence and residence (2) Nakijo-gun, Nakijo-mura, large character, Nishifuku bird 2811 (3) Nipponjo-gun, Naka-naki-gun, Nakagura-gun, Nishiki-gun, large character, Nishifukushima 2811 Name (1) Shin-Etsu Chemical Industry Co., Ltd. Shin-Etsu Chemical Industry Co., Ltd. (Name) Nationality ( 1) Japan (1) No.1, 2-chome, Otemachi, Otemachi, Chiyoda-ku, Tokyo, Japan 3. Applicant's residence, residence (office) Name of representative (1) Jinchuan Chihiro 1 Order, this paper is applicable to China Standard (CNS) A4 size (210X297 mm)

Application date November 14, 89 Case No. 89124101 Category (the above columns are filled by the Office) A4 C4 || Mexico Patent Specification Invention I. Name New Chinese English I. Invention ^ Creation Name Nationality Residence, Residence (4) Jin Shenggang (Q Hasegawa Yukiji B) Kiyoshi Seijiro (4) Natsuki Village, Nakagami-gun, Niigata Prefecture, Japan, Nishi Fukushima 2811 (9 Natsuki Village, Nakagaki-gun, Niigata Prefecture, Japan, Nishi Fukushima 2811, B) Nakajo-gun, Nakagusuku-gun, Nakafukushima Prefecture, Fukushima 2813, Applicant's Name (Name) Nationality Residence, Residence (Office) Name of Representative • The size of the paper is applicable to China National Standard (CNS) A4 (210X29 * 7) Mm)

Hold

534911 V. Description of the invention ([Table 3] φ · sh · -3 Α7 factory sound. ^ Β7 L —............. Example Test Acid generator dissolution control agent alkaline compound solvent best Exposure Resolution Shape 11-1 Polymer 1 PAG 1 (1) DRR2 TEA PG / EL 20.5 0.16 Rectangle (70) (10) (0.063) (480) 11-2 Polymer 3 PAG 1 (1) DRR2 TEA PG / EL 19.0 0.16 Rectangle (70) (10) (0.063) (480) (Please read the notes on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, M Industrial Consumer Cooperative, This paper is sized to the Chinese National Standard (CNS) Α4 (210 × 297 mm) -65-

Claims (1)

534911 --- | Public Cooperative Office of the Intellectual Property Bureau of the Ministry of Economic Affairs printed out the application for patent scope 1, 0 0, No. 89 1 24 1 0 1 patent application Chinese patent scope amendment January 1, 1991 A polymer compound having a weight-average molecular weight of 1, 000 to 1,000, which is one containing two or more units selected from the following formulae (2-1) to (3-2) [化 2] Η Η Η Η c 「） I- \ 7» CH—CH (2-1) (一 CH2 ch2 h2c—) HC XCH, CH—CH (2-2) -SC-C- (CH ^ ^ R2- (one ch2 ch2 h2c—) tH \ 丨 '(3-1) ^ CH—CH (3.2), rc \ -cH2- / cHtv C—C—R2 R3 (CH ^, \ 〇2Ry R2 (CH ^, C02R 'R: ^ (CH ^ 3' co # \ o2r 'R2—One R2 ~ -CC ^ -— R2 R2 (CH ^ a (Please read the precautions on the back before filling this page) 1T COjR 'C02R' 'CO〆co2r' (wherein R1 is an acid labile group; R2 is a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms; z 1 to z 3 are 0 An integer to 4; k is 0 or 1). 2. The polymer compound according to item 1 of the scope of patent application, wherein the units represented by formulas (2-1) to (3-2) are one or more units selected from the units represented by the following formula; Applicable to China National Standard (CNS) A4 specification (210 × 297 mm), Spring, 534911 A8 B8 C8 D8 6. Scope of patent application x) e (Please read the precautions on the back before filling out this page) _! · Packing. Order Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs \ ο -b \ The other, the higher the child, the higher the child. The child of the child's position is high.} 2 2 or | r—I 0〇C range to range} Profit 1 Special i Please 2 Apply for C ® There are 3 types in Chinese and 2 types in Chinese and 1 in the above; 1 has a single indication, and the content is ^^ _ 4 IX to 8 This paper size applies Chinese National Standard (CNS) A4 specification (210X297) (B) 534911 8 8 8 8 ABCD, patent application scope [Chemical 3] Η Η (--— C- HC ^ CH—-CH (4-1) CH 一 CH \ ^ ch2-/ CH, one cCF (0-Ό (—C, called C—) CH—CH (4-2) / \ R3-CC-R6ί ί (ΛΗν X H2C—) CH- -CH 1-NC—-CR HC, ： -C-) -x ^ 7ch (—CH2 X H2C—) CH-CH (5-1) rv CM,-CH CH—CH • 0 彳 (5-2) rCC-R'0 R8 R9 Η HII:-~ Cc ~ —) CH_CH —Π: Jk -R'〇 (7-1) HC H \ 〇7R'a Η HH C02R -CCR, 2 H C02R15 (— C 卜 入 · Ή w ~~ ^ CH-CH: · 仏 :), R &quot;-cC—-R'I IH CO? R, 5 (7-2) (Please read the notes on the back before filling in this Page ^ cc (S-1) / C: ^ co Print at least one carboxyl group with a carbon number of 1 to 15 or a monovalent hydrocarbon group with a hydroxyl group, and the others are independent hydrogen atoms. Or a linear, branched, or cyclic alkyl group having 1 to 15 carbons; R3 to R6 may form a ring with each other, at this time at least one of R3 to R6 is a carboxyl group having 1 to 15 carbons or a hydrocarbon group containing Divalent hydroxyl, others are independent single bonds or linear, branched or cyclic alkylene groups with 1 to 15 carbons; at least one of R7 to R1C) is 2 to 15 carbons Contains -C〇2-partially structured χ-valent hydrocarbons Other groups are each independently a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 15 carbon atoms; R7 to R1 may form a ring with each other, in which case R7 to R1. At least one of them is a carbon number; [to 15 containing a divalent hydrocarbon group of a c02-partial structure, and the others are independent single bonds or linear, branched, or cyclic carbon numbers of 1 to 15 The extension of the shape-3 This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 534911 A8 B8 C8 D8 ----— ___________-— 丨 丨 ·, ... 丨 一 · _— &quot;, — Six, patent application scope alkyl; R11 is hydrogen atom, methyl or COsR13; R1. Is a hydrogen atom, a methyl group, or CH2C0. R13; R13 is a linear, branched, or cyclic alkyl group having 1 to 15 carbon atoms; R 1 4 is a polycyclic hydrocarbon group having 7 to 15 carbon atoms Or an alkyl group containing a polycyclic hydrocarbon group; R 1 5 is an acid labile group; X is C Η 2 or an oxygen atom). 4. A photoresist material, which contains a polymer compound of any one of claims 1 to 3 as the base resin in an amount of 20 to 100% by weight. 5. A method for forming a pattern, which includes the steps of applying a photoresist material on the substrate according to item 4 of the patent application, and exposing it to high-energy rays or electron rays through a photomask after heat treatment. The steps and, if necessary, the step of developing with a developer after the heat treatment. (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) Α4 size (210X297 mm) -4-