533324 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明（） 本發明與一種製造液晶顯示器（LCD )之方法有關， 特別是一種製造具有廣視角LCd之方法。 最近電腦記事薄（personal data assistant ; PDA)和筆 5己型電腦有顯著性的進步，可攜帶式顯示器的要求為重量 幸至和低功率消耗，薄膜電晶體-液晶顯示器（TFT-LCD )能 滿足上述要求且已知其需要高像素密度和高品質。一般 TFT-LCD包括一薄膜電晶體和像素電極所形成之底板及具 有彩色濾光片之頂板。液晶乃充填在頂板和底板之間。每 個單位像素中，提供了一電容器和另一電容器，藉由TFT 作為單位像素之開關元件。操作時施加一閘極信號電壓到 TFT上’也就是每個單位像素之開關元件上，該TFT接收 了閘極信號電壓後會開啟，因而攜帶影像資訊之資料電壓 可經由TFT而加到相對應之像素電極和液晶上。當資料電 壓加到TFT上，液晶分子之排列會有所改變，因而也改變 了其光學特性並顯示出影像。 一般來說’視角和色彩表現是設計LCD時的重要古義 題。彩色濾光片在LCD中的應用是用來顯示螢幕的彩色部 份’ LCD技術上的趨勢之一是在改善其視角，然而lcd視 (請先閱讀背面之注意事項-,¼寫本頁)533324 Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs A7 B7 V. Description of the Invention The present invention relates to a method for manufacturing a liquid crystal display (LCD), and in particular, a method for manufacturing an LCd with a wide viewing angle. Recently, personal data assistant (PDA) and pen 5 computers have made significant progress. The requirements for portable displays are weight and low power consumption, and thin film transistor-liquid crystal display (TFT-LCD) capabilities The above requirements are met and it is known that they require high pixel density and high quality. A general TFT-LCD includes a bottom plate formed of a thin film transistor and a pixel electrode, and a top plate having a color filter. The liquid crystal is filled between the top plate and the bottom plate. In each unit pixel, a capacitor and another capacitor are provided, and a TFT is used as a switching element of the unit pixel. During operation, a gate signal voltage is applied to the TFT, that is, the switching element of each unit pixel. The TFT will turn on after receiving the gate signal voltage, so the data voltage carrying image information can be applied to the corresponding via the TFT. Pixel electrode and liquid crystal. When the data voltage is applied to the TFT, the arrangement of the liquid crystal molecules will be changed, thus changing its optical characteristics and displaying the image. Generally speaking, the viewing angle and color performance are important ancient meanings when designing LCDs. The use of color filters in LCDs is used to display the color portion of the screen. One of the trends in LCD technology is to improve its viewing angle, but LCD viewing (please read the precautions on the back-, write this page)
經濟部中央標準局員工消費合作社印製 533324 A 7 ____B7__ 五、發明説明（） 角和對比值上的問題仍然使得其無法應用在大面積顯示 器。K.Ohmuro等人提出一篇關於垂直配列型（vertical-alignment-mode ) LCD 之文章（參閱 SID’97 DIGEST ρ·845〜ρ·848 )。參考文獻中，具有光學補償（optical compensation )和最佳化區域分割（domain-divided )結構 之垂直配列型 LCD ( vertically aligned LCD ; VA-LCD)的 應用已被實現，這種垂直配列型LCD具有超過70度的視 角、快速的反應時間（小於25毫秒）、和超過300的對比 值，然而它仍然有些缺點，例如形成雙域結構（tw0-domain structure )需要一複雜且昂貴的罩幕磨擦過程（mask rubbing process )，罩幕磨擦過程也會造成靜電放電 (Electrostatic Discharge; ESD)和微粒（particle)的問 題，而且罩幕磨擦過程也會導致影像的殘影。 發明目的及概述： 本發明的目的提供一種具有廣視角LCD之形成方法。 本發明的另一目的是形成LCD元件（ceu )中的凸起結構 (bump structure )，以增加液晶分子的預傾角（pre tiUed angle) 〇 本發明包含由起偏振器與檢偏振器組成的一對偏光 板’形成一上透明絕緣基板於起偏振器之上，形成—補斤 膜（compensator)於檢偏振器之上。一凸起結構形成於^ 3 本纸張尺度適用中國國家標準（CNS ) 規格（210X297公缝） (請先閱讀背面之注意事項.，%寫本頁)Printed by the Consumers' Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 533324 A 7 ____B7__ V. The problem of the angle of the invention () and the contrast value still make it unsuitable for large-area displays. K. Ohmuro et al. Proposed an article on vertical-alignment-mode LCDs (see SID’97 DIGEST ρ · 845 ~ ρ · 848). In the reference, the application of vertically aligned LCD (VA-LCD) with optical compensation and optimized domain-divided structure has been implemented. This type of vertically aligned LCD has A viewing angle of more than 70 degrees, a fast response time (less than 25 milliseconds), and a contrast value of more than 300. However, it still has some disadvantages. For example, forming a tw0-domain structure requires a complicated and expensive mask friction process. (Mask rubbing process), the mask rubbing process can also cause problems with Electrostatic Discharge (ESD) and particles, and the mask rubbing process can also cause image sticking. Object and Summary of the Invention The object of the present invention is to provide a method for forming an LCD with a wide viewing angle. Another object of the present invention is to form a bump structure in an LCD element (ceu) to increase a pre-tied angle of a liquid crystal molecule. The present invention includes a polarizer and a polarizer. The polarizing plate is formed with a transparent insulating substrate on the polarizer, and a compensator is formed on the polarizer. A raised structure is formed at ^ 3 This paper size is applicable to Chinese National Standard (CNS) specifications (210X297 cm) (Please read the precautions on the back first,% write this page)
533324 A7 B7 五、發明説明（） 基板之上’具有大角度預傾角的液晶分子形成於具有預傾 斜方向的凸起結構之上，該凸起結構的形成方法後面會看 到。 本方法疋使用單一光罩和多次的曝光步驟來形成凸起 結構於液晶顯示器之中，該光罩其上有多個等寬的開口， 每次曝光之後該光罩便平行基板表面方向移動，經過上述 多次的曝光步驟後，光阻曝光的部份會有類似三角形的輪 廓。有另一個跟剛剛方法很像的的方法，使用與上個例子 相同的光罩，唯一不同的是光罩以近似等速（V)朝某方向 移動’動作方向仍為朝平行基板表面方向移動，如此也可 製作該凸起結構。 (請先閲讀背面之注意事項，¾寫本頁}533324 A7 B7 V. Description of the invention () On the substrate, the liquid crystal molecules with a large pre-tilt angle are formed on the convex structure with the pre-tilt direction. The method of forming the convex structure will be seen later. In this method, a single photomask and multiple exposure steps are used to form a convex structure in a liquid crystal display. The photomask has a plurality of openings of equal width. The photomask moves parallel to the surface of the substrate after each exposure. After the above-mentioned multiple exposure steps, the exposed portion of the photoresist will have a triangle-like outline. There is another method that is very similar to the previous method. It uses the same mask as the previous example. The only difference is that the mask moves at a certain constant velocity (V) in a certain direction. The movement direction is still parallel to the substrate surface. In this way, the raised structure can also be manufactured. (Please read the notes on the back first, write this page}
訂 經濟部中央標準局員工消費合作社印製 J式簡單說明： 本發明的前述觀點及許多伴隨的優點如參考下面之詳 細敘述並結合附圖之後將更加容易了解，其中： 第一圖為本發明中LCD的截面圖。 第二圖為本發明中LCD的俯視圖。 本紙張尺度適用中國國家標準（CNS ) A4規格（2丨ox297公釐） 經濟部中央標準局員工消費合作社印製 533324 A7 B7 五、發明説明（） 第三圖為本發明中LCD的側視圖。 第四圖為本發明中凸起結構的圖解。 圖五A至圖六B為本發明中具有凸起結構之LCD的截 面圖。 第七圖本發明中用來形成凸起結構之光罩圖案。 第八圖為FUJITSU之MVA-LCD所用之光罩圖案。 第九圖為利用圖八光罩之結果。 第十圖為利用FUJITSU之MVA-LCD所用之光罩圖案， 利用移動光罩連率曝光所形成之凸起結構。 第十一圖為本發明利用移動光罩連率曝光所形成之凸 起結構之傾斜面。 第十二圖為利用本發明顯影後所形成之凸起結構。 第十三圖至第十七圖為本發明中形成凸起結構之步 驟0 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事if.填寫本頁)A simple description of the J-type printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs: The foregoing viewpoints of the present invention and many accompanying advantages will be easier to understand if reference is made to the following detailed description and the accompanying drawings, in which: The first figure is the present invention Sectional view of a medium LCD. The second figure is a top view of the LCD in the present invention. This paper size applies to China National Standard (CNS) A4 (2 丨 ox297 mm) Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 533324 A7 B7 V. Description of the invention () The third picture is a side view of the LCD in the present invention. The fourth figure is an illustration of a raised structure in the present invention. 5A to 6B are cross-sectional views of an LCD having a convex structure according to the present invention. FIG. 7 is a photomask pattern used to form a raised structure in the present invention. The eighth figure is a mask pattern used by FUJITSU's MVA-LCD. The ninth figure is the result of using the mask of FIG. The tenth figure is a raised structure formed by using the mask pattern used by FUJITSU's MVA-LCD and exposing it with a moving mask. The eleventh figure is an inclined surface of a convex structure formed by continuous exposure using a moving photomask. The twelfth figure is a raised structure formed after development by the present invention. The thirteenth to seventeenth drawings are the steps for forming a raised structure in the present invention. 0 The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). (Please read the notes on the back if you want to fill in this page. )
533324 A7 B7 五、發明説明（ 第十八圖至第二十圖為本發明中不同移動距離所形成 不同凸起結構之組態。 經濟部中央標準局員工消費合作社印製 第二十一圖為本發明中另一實施例所形成凸起結構之 截面圖。 發明#細説明： 本發明將伴隨圖示詳細描述如下，本發明提供具有補 償膜雙域垂直配置（Homeotropic )型LCD —種增進視角的 方法’亦可没汁為多域配向區域（mu 1 t i _d〇ma i n)之結構， 以下以雙域（two-domain)結構為例。本發明中使用一凸起 結構以達成此目的，詳細過程將描述如下。 第一圖為本發明中具有補償膜之凸起結構雙域垂直配 置LCD之平板結構，本LCD包含由起偏振器1〇〇與檢偏 振器102組成的一對偏光板，起偏振器1〇〇與檢偏振器1〇2 的配置使得起偏振器100與檢偏振器1〇2的穿透軸為互相 垂直，穿過該起偏振器100之光線將會被檢偏振器1〇2吸 收而無法穿透，反之亦然。例如玻璃或類似材質的上透明 絕緣基板104，形成於起偏振器1〇〇之上，一補償膜（或數 個）1〇6形成於檢偏振器102之上，使用該補償膜1〇6以降 低與視角有關的光漏（light leakage )效應。一下基板ι〇8 位於之上補 >(員膜1〇6之上，形成此透明絕緣下基板的 請 先 閲 讀 背 之 注 意 事 項 訂 本纸張尺度適用中國國家標準（CNS) Μ規格（21〇><297公釐） 經濟部中央標準局員工消費合作社印製 533324 A7 ____B7 五、發明説明（） 材質為玻璃或類似上基板104的材質。包含氧化銦錫 (ιτο)薄膜的透明導電層分別位於上基板1〇4的下表面和 下基板108的上表面（或在凸起結構上），至少形成一凸起 結構110於上述一對玻璃基板的其中一片上。第一圖顯示 的是該凸起結構110形成於下基板1〇8的上表面，該凸起 結構110的泮細描述如後。 兩垂直排列用配向膜（0rientati0I1 layer) 112分別形 成於上基板104的下表面和凸起結構11〇之上，通常該配 向膜112的用途是用來控制液晶分子的方向，該配向膜ιΐ2 是由聚亞醯胺（polyimide)組成。將液晶材料114填充且密 封於上基板104和下基板108之間，此液晶材料ιΐ4為負 型液晶（negative LC，Δε < 0)，這些垂直配向排列型液晶分 子與基板共同形成一垂直配向元件10。 此液晶分子114為垂直配向型，一個像素中有兩區域 12、16和這兩者的重疊區域14，相對於區域12與區域16 中液晶分子的傾斜方向，在基板平面投影量具有一不為直 線的角度φ(可大於或小於18〇度）。 在導通的狀態，由於液晶分子為垂直配列，所以在正 交偏光片下為暗狀態，色散程度較小，本發明也有無反轉 灰階視角廣的優點特色，請參閱第二圖，其中顯示二具有 補償膜垂直配列型LCD的局部俯視圖，投影在基板方：角 上的傾斜角p在區_ 12、16之中不為18〇纟（可大於或小 本紙張尺度適用中國國家標準（CNS ) 公釐） (請先閱讀背面之注意事項.¼寫本頁} 丨_ 、\呑 533324 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明（ 於180度）。本實施例中，每個區域的液晶分子被定向幾 乎垂直於基板的表面’當未施加電場時（〇FF狀離）有一 相對於基板法線的小預傾角（pre-tilted angle )，在區域12 16之中的液晶分子其預設傾角投影在基板方向角上的傾斜 角p不為180度。 區域12、14和16之間的二維垂直配列型液晶分子在 導通狀fe前其投影在基板方向角的傾斜角$不為18〇度， 此性質強烈地影響液晶分子的反應時間，本發明中的凸起 結構110用來進一步達成此區域分割V A元件的反應特 性’第二圖為該凸起結構11〇的側視圖，第四圖為該凸起 結構110的二度空間結構圖。該凸起結構i i 〇可用正光阻 或負光阻來形成。該凸起結構構築為上表面斜向欲得的方 向’如此使得形成於凸起結構i 1()上的液晶分子有較大的 預傾角。例如该凸起結構110是由兩側面18、20和兩傾斜 面22所組成的，兩側面18、2〇為三角形，以一較佳實施 例而言：由於兩側面18、20是由不同的高&、H2所形成 的’所以凸起結構110的傾斜面22可傾向欲得到的方向。 每一傾斜面22的終端分別與兩側面18、20連接。傾斜面 22的傾斜角α是從基板的表面算起。 圖5Α、圖5Β、圖6Α和圖6Β為本發明中的例子，凸 起結構110可形成於一側的基板表面上或兩側的基板表面 上。上述各圖中顯示具有較大預傾角的液晶分子形成於具 (請先閱讀背面之注意事項¼寫本頁} 丨 訂 533324 A7 _____ B7 i 7發明説明（「 ^ ^ 有預傾斜方向的凸起結構110之上，顯然地該凸起結構11〇 可提供液晶分子較大預傾角，且該凸起結構11〇可分離或 連結在一起。 若是使用如第七圖之光罩，利用不同大小之開口依序 重複曝光，可以將光阻不同部位之曝光量不同，顯影之後 得到第一圖至第六圖之凸起結構。 第八圖為FUJITSU所提之有關MVA結構之光罩圖案， 利用其光罩曝光，經過顯影之後可以得到A — A，截面如第九 圖之凸起結構（參閱 1988 SID Digest，41. 1，A. Takeda， Ρ· 1077)。而FUTITSU並沒有提出移動光罩之概念。因此 本發明提出一種移動光罩之方法製作凸起結構於液晶顯示 器之中’以提供一預傾角。按照本方法，若是朝A_A，方向 移動，則其戴面將如同第十圖所示。 第十一圖A以及第Η--圖Β為本發明利用單一光罩 經濟部中央標準局員工消費合作社印製 80 ’且將光罩延光阻82表面移動（方向為水平之箭號表 示）’曝光董遞減之截面圖。利用控制不同曝光之劑量，此 曝光之光阻所照射之能量遞減至一程度之後再遞增，則可 以得到如第十一圖Α之結果，斜線部份表示被曝光之光阻 84 ’該凸起之光阻將具有兩個傾斜表面。也可控制曝光劑 量得到單一斜面之光阻。經過顯影之後，其結果如第十二 圖A以及第十二圖β。本發明之連續式或階梯式曝光以正 本紙張尺度適用中國國家標準（CNS )从胁（21GX297公酱） 533324 A7 ~—__ B7 五、發明説明（-- 光阻作為據舉例，但其他之感光材料亦可以使用。第十一 圖Α以及第十一圖Β之結構可作為反射式液晶顯示器之應 用。此外’若此實施例中之移動距離若等於開口之寬度， 另外條狀光罩等間隔移動，但施以曝光能量U、2U、3卜…_ 階梯式曝光，則可以製作凸起結構，如第十一圖與第十二 圖所示。若為正光阻時會形成良好之斜面，可以作為反射 板或其他方面之應用。其次利用調整曝光時間使其遞增或 遞減亦可以達到類似效果。請參閲第十二圖C與第十二圖 D ’利用本發明之方法形成凸起結構之後，可以在凸起結構 之上沈積一金屬層（其材質可以為鋁）或高反射率之金屬作 為反射面。由圖中可知藉由控制光罩移動之速度可以形成 兩邊斜率不同之斜面，分別以⑴與I表示。其入射光與反 射光以箭號表示，凸起結構之材質可以選用正、負光阻或 感光材質。 上述之方法簡述如下： (a) 曝光一感光材料，以其上有開口之光罩為罩幕； (b) 移動該光罩一距離，該光罩沿著一平行於該感光材 料表面之方向移動至與該開口相同之距離； (c) 重複該步驟（a)和該步驟（b)至數個預設的循環並且 逐次遞增（或遞減）每一次之曝光能量；且 (d) 顯影該感光材料而形成該凸起結構。 上述之逐次遞減曝光能量數個循環之後，更包含： 10 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再533324 A7 B7 V. Description of the invention (Figures 18 to 20 are the configurations of different raised structures formed by different moving distances in the present invention. The 21st figure printed by the staff consumer cooperative of the Central Standards Bureau of the Ministry of Economic Affairs is A cross-sectional view of a raised structure formed by another embodiment of the present invention. Invention # Detailed description: The present invention will be described in detail with the accompanying drawings as follows. The present invention provides a dual-domain vertical configuration (Homeotropic) LCD with a compensation film. The method can also be a structure of a multi-domain alignment region (mu 1 ti_doma). The following uses a two-domain structure as an example. In the present invention, a raised structure is used to achieve this goal. The detailed process will be described as follows. The first figure is the flat structure of the dual-domain vertical configuration LCD with the convex structure of the compensation film in the present invention. The LCD includes a pair of polarizers consisting of a polarizer 100 and a polarizer 102. The configuration of the polarizer 100 and the polarizer 102 is such that the transmission axes of the polarizer 100 and the polarizer 100 are perpendicular to each other, and the light passing through the polarizer 100 will be detected and polarized. Device 10 It cannot be penetrated, and vice versa. For example, the upper transparent insulating substrate 104 of glass or similar material is formed on the polarizer 100, and a compensation film (or several) 106 is formed on the polarizer 102. On the other hand, the compensation film 10 is used to reduce the light leakage effect related to the viewing angle. The lower substrate ι08 is located on top of the substrate> (member film 106) to form the transparent insulating lower substrate. Please read the notes at the back first. The size of the paper is applicable to the Chinese National Standard (CNS) M specification (21〇 > < 297 mm). Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 533324 A7 ____B7 V. Description of the invention ( ) The material is glass or similar to the upper substrate 104. Transparent conductive layers containing indium tin oxide (ιτο) films are located on the lower surface of the upper substrate 104 and the upper surface of the lower substrate 108 (or on the raised structure), At least one protruding structure 110 is formed on one of the pair of glass substrates. The first figure shows that the protruding structure 110 is formed on the upper surface of the lower substrate 108. A detailed description of the protruding structure 110 is as follows Rear two vertical The alignment film 112 for the column is formed on the lower surface of the upper substrate 104 and the convex structure 11 respectively. Generally, the alignment film 112 is used to control the direction of liquid crystal molecules. The alignment film ιΐ2 is composed of a polymer Polyimide composition. The liquid crystal material 114 is filled and sealed between the upper substrate 104 and the lower substrate 108. The liquid crystal material ι4 is a negative liquid crystal (negative LC, Δε < 0). These vertical alignment liquid crystals The molecules and the substrate together form a vertical alignment element 10. The liquid crystal molecules 114 are of a vertical alignment type. There are two regions 12, 16 and an overlapping region 14 of the two pixels in a pixel. With respect to the oblique directions of the liquid crystal molecules in the regions 12 and 16, the projection amount on the substrate plane has a difference. The angle φ of the straight line (can be greater or less than 180 degrees). In the conducting state, since the liquid crystal molecules are aligned vertically, the state is dark under the orthogonal polarizer, and the degree of dispersion is small. The present invention also has the advantages of a wide viewing angle with and without inverted grayscale. Please refer to the second figure, which shows Partial top view of a vertical alignment LCD with compensation film, projected on the substrate side: the inclination angle p on the corner is not 18 ° in the zone _ 12, 16 (can be larger or smaller than the paper size applicable to the Chinese national standard (CNS ) Mm) (Please read the notes on the back. ¼ Write this page} 丨 _ \ \ 533324 A7 B7 Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention (at 180 degrees). In this example The liquid crystal molecules in each region are oriented almost perpendicular to the surface of the substrate. 'When no electric field is applied (0FF-like separation), there is a small pre-tilted angle relative to the substrate normal. The tilt angle p of the liquid crystal molecules whose preset tilt angle is projected on the substrate orientation angle is not 180 degrees. The two-dimensional vertical alignment liquid crystal molecules between the regions 12, 14, and 16 are projected on the substrate orientation angle before the conductive fe. tilt The angle $ is not 180 degrees. This property strongly affects the reaction time of the liquid crystal molecules. The raised structure 110 in the present invention is used to further achieve the response characteristics of the VA element dividing this region. The second figure is the raised structure 11. Side view, the fourth figure is a two-dimensional spatial structure view of the raised structure 110. The raised structure ii 〇 can be formed by positive or negative photoresistance. The raised structure is structured so that the upper surface is inclined obliquely. 'In this way, the liquid crystal molecules formed on the convex structure i 1 () have a larger pretilt angle. For example, the convex structure 110 is composed of two side surfaces 18, 20 and two inclined surfaces 22, and the two side surfaces 18, 2 〇 is a triangle. In a preferred embodiment, since the two sides 18, 20 are formed by different heights & H2, the inclined surface 22 of the convex structure 110 may be inclined in the desired direction. The ends of the inclined surface 22 are respectively connected to the two side surfaces 18 and 20. The inclination angle α of the inclined surface 22 is calculated from the surface of the substrate. Figures 5A, 5B, 6A, and 6B are examples in the present invention, and the convex structure 110 can be formed on the substrate surface on one side or the substrate on both sides The above figures show that the liquid crystal molecules with a large pretilt angle are formed on the surface (please read the precautions on the back first to write this page) 丨 order 533324 A7 _____ B7 i 7 invention description ("^ ^ has a pre-tilt direction Above the protruding structure 110, it is obvious that the protruding structure 110 can provide a larger pretilt angle of the liquid crystal molecules, and the protruding structure 110 can be separated or connected together. If a photomask as shown in FIG. 7 is used, Different sizes of openings are repeatedly exposed sequentially, and the exposure of different parts of the photoresist can be different. After development, the convex structures of the first to sixth pictures are obtained. The eighth picture is the mask pattern of the MVA structure mentioned by FUJITSU Using its photomask exposure, A-A can be obtained after development with a raised structure in cross section as shown in Figure IX (see 1988 SID Digest, 41.1, A. Takeda, P · 1077). FUTITSU did not propose the concept of moving photomasks. Therefore, the present invention proposes a method of moving a photomask to make a convex structure in a liquid crystal display 'to provide a pretilt angle. According to this method, if it moves in the direction of A_A, its wearing surface will be as shown in the tenth figure. Figure 11A and Figure VIII--Figure B shows the invention using a single photomask to print 80 'on the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs and to move the photomask to the surface of the photoresist 82 (the direction is indicated by a horizontal arrow) 'Exposed Dong diminishing cross-sectional view. By controlling the dose of different exposures, the energy irradiated by the exposed photoresistor decreases to a certain degree and then increases, and the result shown in Figure 11A can be obtained. The oblique part indicates the exposed photoresistor 84 'the protrusion. The photoresist will have two inclined surfaces. It is also possible to control the amount of exposure to obtain a single oblique photoresist. After development, the results are shown in Fig. 12A and Fig. 12β. The continuous or stepwise exposure of the present invention applies the Chinese National Standard (CNS) Congxie (21GX297 male sauce) at the original paper size. 533324 A7 ~ ___ B7 5. Description of the invention (-Photoresistance is used as an example, but other photosensitivities Materials can also be used. The structures of Figures 11A and 11B can be used as reflective liquid crystal displays. In addition, 'if the moving distance in this embodiment is equal to the width of the opening, the stripe masks are equally spaced Move, but apply exposure energy U, 2U, 3 Bu ..._ Stepwise exposure, you can make a convex structure, as shown in Figure 11 and Figure 12. If it is a positive photoresist, it will form a good slope, Can be used as a reflector or other applications. Secondly, similar effects can be achieved by adjusting the exposure time to increase or decrease. See Figure 12C and Figure 12D 'Using the method of the present invention to form a convex structure After that, a metal layer (which can be made of aluminum) or a highly reflective metal can be deposited on the raised structure as a reflective surface. As can be seen from the figure, it can be formed by controlling the speed of the mask movement. The slopes with different slopes are represented by ⑴ and I. The incident light and reflected light are represented by arrows. The material of the convex structure can be selected from positive, negative photoresist, or photosensitive materials. The above method is briefly described as follows: (a) Expose a photosensitive material with a mask with an opening on it as a mask; (b) move the mask a distance, the mask moves to the same distance as the opening in a direction parallel to the surface of the photosensitive material; (c) repeating step (a) and step (b) through several preset cycles and sequentially increasing (or decreasing) the exposure energy of each time; and (d) developing the photosensitive material to form the convex structure. After several cycles of the above-mentioned successively decreasing exposure energy, it further includes: 10 This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back first)
^ 經濟部中央標準局員工消費合作社印製 533324 經濟部中央標準局員工消費合作社印製 五、發明説明（ (e) 移動該光罩一距離，該光罩沿著一平行於該感光材 料表面之方向移動至與該開口相同之距離； (f) 逐次遞減（或遞。增）每一次之曝光能量用以曝光該 感光材料；及 (g) 重複步驟（e)與⑴。 另一實施例如下： u)曝光一感光材料，以其上有開口之光罩為罩幕； (b) 移動該光罩一距離，該光罩沿著一平行於該感光材 料表面之方向移動至與該開口相同之距離； (c) 重複該步驟（a)和該步驟（1))至數個預設的循環並且 逐次遞減（或遞增）每一次之曝光時間；且 (d) 顯影該感光材料而形成該凸起結構。 上述之逐次遞減曝光時間數個循環之後，更包含： (Ο移動該光罩一距離，該光罩沿著一平行於該感光材 料表面之方向移動今與該開口相同之距離； (f) 逐次遞增（或遞減）每一次之曝光時間用以曝光該感 光材料；及 (g) 重複步驟（e)與（f)。 使用單一光罩和多次曝光步驟，該光罩上有數個等寬 的開口，本方法的關鍵為每次曝光之後該光罩便朝平行光 阻表面的方向移動，該方向如圖中箭頭所指，經過上述多 次的曝光步驟後光阻曝光的部份會有類似三角形的幹廊。 (請先閲讀背面之注意事項再 ! -裝· 訂 -線 11 533324 A7 ___B7 五、發明説明（ 此方法解釋如下： 經濟部中央標準局員工消費合作社印製 為了描述地更清楚，在此以曝光五次的方法為例，但 並不是限制只能曝光五次，換言之任何的曝光次數皆可。 請參閱第十三圖至第十七圖，以上述光罩1〇2將光阻ιι〇 進行第一次曝光，該曝光步驟完成後費時q秒，該光罩上 有數個開口 104，光阻可為正光阻、負光阻、聚醯亞胺 (polyimide)或聚醯胺（polyamide)，在技術上使用負光 阻的結果會得到與使用正光阻相反的結構，本發明中以使 用正光阻為例，曝光後光罩1〇2朝箭頭A1所指方向移動一 距離，接著進行第二次曝光，使光線經由光罩1〇2上的開 口 104將光阻11〇曝光，相同地，光罩1〇2再移動一次與 上次相同的距離。假設此步驟從開始算起完成於匕秒時， 因此此步驟費時（ti )秒，相同地進行第三次、第四次 和第五次曝光且分別費時（^ L )秒、（v ^ )和秒（v ^ ) 秒，接下來的步驟如上述般重複進行並如第十五圖至第十 七圖所示，光阻110曝光的部份如第十七圖所示，曝光部 份的曝光深度（de)可表示為de(ti) = (d/5)Xi，其中d為光 阻110的厚度，Xi表示第i次曝光後所移動的總距離，顯 影後的結果如第十七圖所示，使用缺口寬度w/2和兩相鄰 缺口距離也為W/2的光罩可得到最後的凸起結構11()，而 且如果每次移動距離為W/10則總移動距離（Δχ)約為w/2。 此種條件下該凸起結構寬度為w。第十九圖和第二十圖所 示為不同移動距離所形成的凸起結構輪廓，其總移動距 12 533324 A7 B7 五、發明説明（） 分別別為（Λχ)小於W/2和（Λχ)大於W/2。 另一與上述方法之類似方法如下，請看第二十一圖， 一類似上個實施例的光罩l〇〇a，唯一不同的是光罩l〇〇a 以等速（V )朝箭頭所指方向移動，動作方向仍為朝平行基 板表面的方向移動，第二十一圖為光罩l〇〇a以等速V = (W/2)/t移動的結果，如第二十一圖第二十二圖所示，調整 光罩100移動的速度也可製作該凸起結構。 以上所述僅為本發明之較佳實施例而已，並非用以限 定本發明之申請專利範圍；凡其它未脫離本發明所揭示之 精神下所完成之等效改變或修飾，均應包含在下述之申請 專利範圍内。 請 先 閲 讀 背 之 注 意 事 項 再^ Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 533324 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention ((e) Move the photomask a distance along a surface parallel to the surface of the photosensitive material Move to the same distance as the opening; (f) successively decrease (or increase.) The exposure energy for each exposure to expose the photosensitive material; and (g) repeat steps (e) and ⑴. Another embodiment is as follows : U) expose a photosensitive material, using a mask with an opening as a mask; (b) move the mask a distance, the mask moves in a direction parallel to the surface of the photosensitive material to the same as the opening (C) repeating step (a) and step (1)) to a number of preset cycles and decreasing (or increasing) each exposure time successively; and (d) developing the photosensitive material to form the Raised structure. After the above-mentioned successively decreasing exposure time for several cycles, it further includes: (ο move the mask a distance, the mask moves along a direction parallel to the surface of the photosensitive material by the same distance now as the opening; (f) successively Increasing (or decrementing) each exposure time to expose the photosensitive material; and (g) repeating steps (e) and (f). Using a single mask and multiple exposure steps, the mask has several equal-width The key of this method is that after each exposure, the photomask moves in a direction parallel to the photoresist surface. The direction is as indicated by the arrow in the figure. After the above multiple exposure steps, the photoresist exposed part will be similar. Triangular corridor. (Please read the precautions on the back first!-Binding · Binding-Thread 11 533324 A7 ___B7 5. Explanation of the invention (This method is explained as follows: Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs for clearer description Here, the method of five exposures is taken as an example, but it is not limited to only five exposures, in other words, any number of exposures is possible. Please refer to the thirteenth to seventeenth photos, and use the above-mentioned mask 102 to The photoresist is exposed for the first time. After the exposure step is completed, it takes q seconds. The photomask has several openings 104. The photoresist can be positive photoresist, negative photoresist, polyimide, or polyimide ( Polyamide), the result of using a negative photoresist technically will result in the opposite structure to the use of a positive photoresist. In the present invention, a positive photoresist is used as an example. After exposure, the photomask 102 moves a distance in the direction indicated by arrow A1, Make a second exposure, so that the light will expose the photoresist 11 through the opening 104 on the reticle 10. Similarly, the reticle 10 will be moved again by the same distance as the last time. Assume that this step is counted from the beginning When completed in dagger seconds, this step therefore takes time (ti) seconds, and the third, fourth, and fifth exposures are performed in the same manner and each takes (^ L) seconds, (v ^), and (v ^) seconds The next steps are repeated as described above and shown in Figures 15-17. The exposed part of the photoresist 110 is shown in Figure 17. The exposure depth (de) of the exposed part can be expressed. De (ti) = (d / 5) Xi, where d is the thickness of the photoresist 110, and Xi is the value after the i-th exposure The total distance of the moving, the development results are shown in Figure 17, using the notch width w / 2 and the two adjacent notch distance W / 2 can also get the final raised structure 11 (), and if Each time the moving distance is W / 10, the total moving distance (Δχ) is about w / 2. Under this condition, the width of the convex structure is w. Figures 19 and 20 show different moving distances. The outline of the raised structure, its total moving distance is 12 533324 A7 B7 V. Description of the invention () respectively (Λχ) is less than W / 2 and (Λχ) is greater than W / 2. Another similar method to the above method is as follows, please Looking at the twenty-first figure, a photomask 100a similar to the previous embodiment, the only difference is that the photomask 100a moves at a constant speed (V) in the direction indicated by the arrow, and the movement direction is still parallel The direction of the substrate surface is moved. The twenty-first figure is the result of the mask 100a moving at a constant speed V = (W / 2) / t. As shown in the twenty-first figure in the twenty-second figure, the light is adjusted. The raised structure can also be made at the speed at which the cover 100 moves. The above are merely preferred embodiments of the present invention, and are not intended to limit the scope of patent application for the present invention; all other equivalent changes or modifications made without departing from the spirit disclosed by the present invention shall be included in the following Within the scope of patent application. Please read the notes of the memorandum before
經濟部中央標準局員工消費合作社印製Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs
本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐）This paper size applies to China National Standard (CNS) A4 (210X 297 mm)