TW530834U - PECVD apparatus - Google Patents

PECVD apparatus

Info

Publication number
TW530834U
TW530834U TW91213600U TW91213600U TW530834U TW 530834 U TW530834 U TW 530834U TW 91213600 U TW91213600 U TW 91213600U TW 91213600 U TW91213600 U TW 91213600U TW 530834 U TW530834 U TW 530834U
Authority
TW
Taiwan
Prior art keywords
pecvd apparatus
pecvd
Prior art date
Application number
TW91213600U
Other languages
Chinese (zh)
Inventor
Chi-Wei Lin
Hung-Sheng Fang
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW91213600U priority Critical patent/TW530834U/en
Publication of TW530834U publication Critical patent/TW530834U/en

Links

TW91213600U 2002-08-30 2002-08-30 PECVD apparatus TW530834U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91213600U TW530834U (en) 2002-08-30 2002-08-30 PECVD apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91213600U TW530834U (en) 2002-08-30 2002-08-30 PECVD apparatus

Publications (1)

Publication Number Publication Date
TW530834U true TW530834U (en) 2003-05-01

Family

ID=28789530

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91213600U TW530834U (en) 2002-08-30 2002-08-30 PECVD apparatus

Country Status (1)

Country Link
TW (1) TW530834U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105274499A (en) * 2015-11-23 2016-01-27 上海卫星装备研究所 Single-room multi-electrode type PECVD (plasma enhanced chemical vapor deposition) reaction chamber

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105274499A (en) * 2015-11-23 2016-01-27 上海卫星装备研究所 Single-room multi-electrode type PECVD (plasma enhanced chemical vapor deposition) reaction chamber

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MM4K Annulment or lapse of a utility model due to non-payment of fees