TW526091B - A mixing apparatus - Google Patents

A mixing apparatus Download PDF

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Publication number
TW526091B
TW526091B TW089104645A TW89104645A TW526091B TW 526091 B TW526091 B TW 526091B TW 089104645 A TW089104645 A TW 089104645A TW 89104645 A TW89104645 A TW 89104645A TW 526091 B TW526091 B TW 526091B
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TW
Taiwan
Prior art keywords
solute
tank
chamber
mixing chamber
solvent
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TW089104645A
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Chinese (zh)
Inventor
Paul Henington
Kwok Wai Wen
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Process Automation Int Ltd
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Priority to TW089104645A priority Critical patent/TW526091B/en
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Publication of TW526091B publication Critical patent/TW526091B/en

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Abstract

An apparatus 20 for mixing a solute with a solvent, wherein said apparatus 20 includes a chamber member 12 for containing said solute and said solvent, means 18, 78, 68a, 68b, 68c for moving said solute and said solvent within said chamber 12, and dividing means 80 adapted to occupy a first position ""U"" to substantially divide said chamber 12 into at least two portions.

Description

526091 案號 89104645 五、發明說明(1) 本發明為有關於電 括可以促進混合以及使 混合室流出的未溶解溶 電鍍的裝置的槽室中。 本裝置稱為前電鍍 兩個外殼内相對應分隔 質於溶劑中以形成電解 室以進行電鍍。 傳統式裝置的問題 電解液一同輸送到第二 室’也會影響到電鍍的 為未溶解的溶質無法在 用,而需另外補充。 傳統式裝置的另一 單攪拌裝置安置在第一 在於在溶質的溶解的過 解的溶質可能被強烈流 位置而可能被送到第二 本發明尋求提供電 可以緩和上述裝置的缺 依據本發明的第一 溶劑之中的混合裝置。 槽室,在槽室之中移動 置。此分隔的裝置在第526091 Case number 89104645 V. Description of the invention (1) The present invention relates to a tank chamber of a device that can promote the mixing and flow out of the undissolved electroplating device from the mixing chamber. This device is called front electroplating. The corresponding partitions in the two casings are dissolved in a solvent to form an electrolysis chamber for electroplating. Problems with conventional devices The electrolyte is transported to the second chamber together. It will also affect the electroplating. The undissolved solute cannot be used and needs to be supplemented. The other single stirring device of the traditional device is arranged at the first because the dissolved solute in the solute may be strongly flowed and may be sent to the second invention. The invention seeks to provide electricity to alleviate the lack of the above device. Mixing device in the first solvent. The chamber is moved in the chamber. This separated device

錢的裝置,更 溶質溶解於溶 質的量降到最 裝置。一個前 的槽室,第一 液,再將此電 ,在於第一槽 個槽室中,這 過程。再則如 弟一個槽室的 問題, 個槽室 程中受 動帶到 個槽室 鍍装置 點而同 個觀點 此裝置 溶質與 一個位 在於常 的下方 到不希 第一槽 的改良 時能提 明確的說, 劑中的裝置 低,例如流 電鑛裝置的 個槽是用來 解液輪送到 室中的未溶 樣不僅污染 此也是不經 電錄過程中 使用形狀如 。這項設計 望的強烈流 室上方,從 式混合裝置 供額外的操 ,為提供一個將溶 包刮一 溶劑的 置時, 個存放溶質 裝置,以及 可將槽室充 此裝置包 ,使的從 出到進行 實例包到 將溶解溶 第二個槽 解溶質與 第二個槽 濟的,因 發揮作 渦輪的簡 的不利點 動,未溶 這不利的 ,這裝置 作優點。 質混合於 與溶劑的 分隔的裝 分地至少In the device, the amount of solute dissolved in the solute is reduced to the most device. A previous tank, the first liquid, and then this electricity, in the first tank, this process. Another example is the problem of a tank chamber. During the process of the tank chamber, it is driven to the point of the plating device of the tank chamber. From the same point of view, the solute in the apparatus can be clearly defined when the solute is located from the lower part to the first tank. It is said that the device in the agent is low. For example, the tank of the galvanic mining device is used to dissolve the undissolved sample sent to the chamber by the liquid wheel, which not only contaminates it, but also does not use the shape during the recording process. This design looks above the strong flow chamber, and the slave-type mixing device is used for additional operations. It provides a time for scraping the solvent pack and a solvent, a solute storage device, and a tank for filling the device package. Out of the example package to dissolve the second tank to dissolve the solute and the second tank, due to the disadvantage of the simple jog of the turbine, undissolved this disadvantage, this device has advantages. Mixed in a separate part from the solvent

第4頁 526091 _案號89104645_年月日__ 五、發明說明(2) 分隔為兩個部份。 分隔的裝置最好可以移動到第二個位置,使槽室的分 隔不復存在。 這樣的移動裝置,可以有利地在槽室中產生至少一股 溶質與溶劑的流動 在移動裝置所產生的溶質與溶劑的流動時,分隔裝置 可以適當地由第二位置移動到第一位置。 當移動裝置在啟動,而且分隔裝置位於第一個位置 時,槽室最好能分隔成兩個部份,第一個部份中溶質產生 劇烈的運動,而第二個部份溶質所產生的運動不若第一部 份的溶質運動劇烈。 槽室的第一部份與第二部份的液體能有利地與其它部 份的液體相互流通。 分隔裝置的位置能適當地偏向槽室的第二位置。 分隔裝置最好能利用本身的重量而偏向該第二位置。 分隔裝置能有利地包括至少一板。 分隔裝置能適當地包括兩板。 分隔裝置的板或者每一板最好能以該槽室為旋軸而移 動。 分隔裝置為於第一位置時能有利地靠著一個停止件。 停止件可以是適當地一個倒V字型。 較佳的情況,移動裝置可包括至少一個幫浦,而且至 少有第一管件、第二管件與幫浦件連接。採用幫浦的目的 是經由第一管件將溶質與溶劑由槽室帶出,再經由第二管Page 4 526091 _Case No. 89104645_Year Month and Day__ V. Description of the Invention (2) It is divided into two parts. The partitioning device may preferably be moved to a second position so that the partitioning of the tank compartments no longer exists. Such a moving device can advantageously generate at least one flow of solutes and solvents in the tank chamber. When the flow of solutes and solvents generated by the moving device, the partition device can be appropriately moved from the second position to the first position. When the mobile device is activated and the partition device is in the first position, the tank chamber should preferably be divided into two parts. The solute in the first part generates vigorous movement, and the Exercise is not as intense as the first part of the solute exercise. The liquid in the first and second portions of the tank can advantageously communicate with the liquid in the other portions. The position of the partition device can be appropriately biased to the second position of the tank chamber. Preferably, the partition means can be biased to the second position by its own weight. The separating device can advantageously include at least one plate. The divider can suitably include two plates. The plate or each plate of the partitioning device is preferably movable around the groove chamber as a rotation axis. The separating device can advantageously rest against a stop in the first position. The stop can be suitably an inverted V-shape. Preferably, the mobile device may include at least one pump, and at least the first pipe piece and the second pipe piece are connected to the pump piece. The purpose of using the pump is to bring the solute and solvent out of the tank through the first pipe, and then through the second pipe.

526091526091

年_A 修正 號 891(Ufi4F; 五、發明說明(3) 件將溶質與溶劑送入槽室中。 本發明的實施例將僅利用例範並參考下列各圖式來作 說明。 > 第一圖為如本發明的電鍍裝置横剖面的示意圖。 第二圖為第一圖的電鍍裝置中混合室的前視圖。 第三圖為第二圖的電鍍裝置中將外殼去除後混合室的 前視圖。 第四圖為第二圖的混合室底部横剖面的示意圖。 苐五圖為第三圖的吸入管的下視圖。 參 第六圖為第三圖的灑水管的下視圖。 第七圖A為部份渦流破壞器的前梘圖。 第七圖B為第七圖a中部份渦流破壞”器的上視圖。 ^八圖為第二圖中混合槽中部份分離器的前視圖。 =圖A為第二圖中部份分離器橫剖面的示意圖。 =九為與第九圖A中不同結構的分離器,其部份橫 剖面的不意圖。 劑中第十圖A顯示一試驗管’溶質將溶解於在此管内的溶 第十圖B顯示另一斜置的試驗管,溶 管内的溶劑中。 貝將,合解於在此 依據本發明的電鍍裝置丨的實施例,如 電鍍裝置1 一般可分為兩個區域,也就是混合室f J砧 咼濃度區域44 ’以及包含電鍍液箱^斑雷雜〜 、 區域42。在…至12之上方有一由直流馬達"動的供給Year_A Amendment No. 891 (Ufi4F; V. Description of the invention (3) The solute and solvent are sent into the tank chamber. The embodiments of the present invention will be described using only examples and with reference to the following drawings. ≫ One image is a schematic cross-sectional view of a plating device according to the present invention. The second image is a front view of a mixing chamber in the first image of the electroplating device. The third image is the front of the mixing chamber after the casing is removed in the second image. The fourth figure is a schematic view of the cross section of the bottom of the mixing chamber in the second figure. The fifth figure is the bottom view of the suction pipe in the third figure. Refer to the sixth figure is the bottom view of the sprinkler pipe in the third figure. The seventh figure A is a front view of a partial eddy current destroyer. Figure 7 is a top view of a partial eddy current destroyer in Figure 7 a. Figure 8 is a front view of a partial separator in the mixing tank in Figure 2 = Figure A is a schematic diagram of the cross section of a part of the separator in the second figure. = Nine is a separator with a structure different from that in Figure 9 and its cross section is not intended. Figure A of the tenth figure shows a The test tube's solute will dissolve in this tube. Figure 10 shows another inclined test tube. In the solvent in the tube, the solution of the electroplating device according to the present invention, such as the electroplating device 1, can be generally divided into two regions, that is, the mixing chamber f J anvil concentration region 44 'and Electroplating solution tank ^ 斑 雷 杂 ~, area 42. Above ... to 12 there is a supply by a DC motor

第6頁 526091 ---^^89104645 年月日 修正 五、發明說明(4) --- 器2 ’直流馬達6的供電由電源8供應。供給器2 —般像一個 底部較為狹窄槽室,在此底部中更包括有一個過濾器4 (未顯不)。在供給器2中的溶質(例如Cu0固體粉末)在 經過過滤器4的過濾後,經由螺旋供給器1 0輸送到供給器2 的出口 4 6。 混合至1 2 —般是矩形,如第一圖與第二圖所示。雖然 混合室1 2 —般是矩形,但是其它的形狀也可以使用。有一 個加大入口 1 5的長形管1 6安裝於混合室1 2的一側。混合室 =更包括分離器22以及渦流破壞器48。長形管1 6大體上平Page 6 526091 --- ^^ 89104645 Rev. V. Description of Invention (4) --- Device 2 ′ The DC motor 6 is powered by the power supply 8. The feeder 2 is like a narrow tank at the bottom, and a filter 4 is included in the bottom (not shown). The solute (for example, Cu0 solid powder) in the feeder 2 is filtered by the filter 4 and then transported to the outlet 4 of the feeder 2 through the screw feeder 10. Blend to 1 2-generally rectangular, as shown in the first and second images. Although the mixing chamber 1 2 is generally rectangular, other shapes may be used. An elongated tube 16 with an enlarged inlet 15 is installed on one side of the mixing chamber 12. The mixing chamber = further includes a separator 22 and a vortex breaker 48. Long tube 1 6 generally flat

=於混合室1 2的垂直軸,而分離器2 2以及渦流破壞器μ則 疋水平地橫置於混合室1 2内。由此可知混合室1 2 —般包括 位於上部的分離器2 2,位於中間的渦流破壞器4 8,以及位 於f部的混合裝置20。混合室1 2中的混合裝置2 0將在下面 作詳細的說明。 仍然參考第一圖,電鑛液箱2 6 —般為一槽室,在其中 有一空穴。電鍍液箱26的尺寸比混合室1 2大。混合室1 2與 電錄液箱26的真正尺寸分別為2〇〇與12〇〇公升,雖然也可 ^用同的尺寸。輸送元件或者是管件2 4從安裝於混合室 一上部的出口52伸出,並連接於電鍍液箱26。另外的輸送= On the vertical axis of the mixing chamber 12, and the separator 22 and the vortex breaker μ are horizontally placed in the mixing chamber 12 horizontally. It can be seen that the mixing chamber 1 2 generally includes a separator 22 located in the upper part, a vortex breaker 48 located in the middle, and a mixing device 20 located in the f-section. The mixing device 20 in the mixing chamber 12 will be described in detail below. Still referring to the first figure, the liquid mineral tank 26 is generally a tank chamber with a cavity therein. The size of the plating solution tank 26 is larger than that of the mixing chamber 12. The actual dimensions of the mixing chamber 12 and the recording tank 26 are 2000 and 12,000 liters, respectively, although the same dimensions may be used. The conveying element or tube 24 is extended from an outlet 52 installed at an upper portion of the mixing chamber, and is connected to the plating tank 26. Additional delivery

70件或者是管件25自電鍍液箱26的出口 53伸出,並連接於 混合室1 2。 、 電鍍室28以管件54連接於電鍍液箱26,電鍍室28包括 陰極3 〇以及進行電鐘的陽極3 2。 如前所述’電鑛裝置1 一般可分為高濃度區域4 4以及Seventy pieces or tube pieces 25 protrude from the outlet 53 of the plating tank 26 and are connected to the mixing chamber 12. The electroplating chamber 28 is connected to the electroplating bath 26 with a pipe 54. The electroplating chamber 28 includes a cathode 30 and an anode 32 for performing an electric clock. As mentioned earlier, the 'electric mining device 1 can be generally divided into high concentration regions 4 4 and

第7頁 526091 案號 89104645 五、發明說明(5) 低濃度區域4 2此兩區域。使用時,供給器2中的溶質麵由 過濾器4,由螺旋供給器1 0輸送至出口 4 6。過濾器4只允 <午 細微的溶質顆粒通過而離開出口 4 6,並且進入細長管丨6 °, 細長管1 6自渦流破壞器4 8下方通過至達混合室丨2的底部。 自電鍍液箱2 6來的低溶質濃度電解液,可以經由管而 輸送進入細長管16的入口15,這個輸送動作'ς可二將從供 給器2送來,但是黏附在入口15的管壁的溶質沖向管件’ 16。當溶質進入管件16而到達底部,溶質開始與混合室a 中的溶劑接觸,溶質開始溶解在溶劑之中, =溶質與溶劑的混合以及溶質溶解於溶】:;= 以下作更詳細的說明。 了牡 方,^第-圖至第六圖,混合震置2〇位於混合室12的下 室12下帶動。混合裝置20利用攪動處於混合 亦二溶質的溶解1用幫浦以輸送溶液 下方的昆合褒置2°包括安置於灑水管 J — 1 固吸入官 68a,盘 一 與68c與灑水管70分別以76a 了7 : *吸入管68a,68b 定。灑水管70在盆下古古 6b,76c與78等支持件固 示,而R Q 在八下方有兩排的小開口 74,如第山円所 如第二 較灑水管7G的小開ϋ74 =與?'等三個吸人管的小開口 76 兩塊板,分別以樞細 。混合裝置20更包括一對翼狀的 四圖所示。♦充滿著w =於混合室的兩侧,如第三圖與第 續地輪送混:室/2中:=V見合室12在運轉中,幫浦18持 中的洛劑,將溶劑經由68a,68b與68c 五、發明說明(6) 等二個吸入管的小開口 7 6吸出 管70的小開口74輸送回混合室12。;此經由灑水 mC一導致了產生在混合室12周圍的向 I向下水 所不,々IL動水流,如F簽豆音 方位置U。倒面板80由下方位置L推動至上、 上方。停止^^ 於灑水管7G的支持件78的正 1了止件8 6可以調整使苴的古姓> —J ^ ?反8〇的移動無法超過上方;立置 父一種为開,使其阻止 外的元件在面板8〇下 種方法,加裝額 u時’緊靠著停止件86。吏’此兀件在面板為於上方位置 出’形成持ί 2 :使J次循環的溶劑由灑水管D送 產生了一個封閉的區域,在 日年’在混合室12的底部 合與溶解。雖然著個封“ = = ;質與溶劑將進行混 溶劑從混合室12的底部移二f =二有水密性,仍然允許 部,由吸入管68與灑水管::至12的中間部位或者上 在混合器的底部。 ^產生的劇烈水流大部份局限 連接於感側器1 4的分本 地偵測混合室12内溶液的二=5 士顯示),可以持續 1 4上,小量溶液可以經势、/辰又,管件1 3連接在感側器 1 4。當混合室中的溶質^件1 3從混合室1 2流到感側器 動直流馬達6而將更多、的、、〜度^低於使用者的設定值時,將驅 12。而混合室中的溶暂、j容質經由管件16輸送至混合室 勺,奋貝〉辰度到達使用者的設定值時,直流 526091Page 7 526091 Case number 89104645 V. Description of the invention (5) Low concentration area 4 2 These two areas. In use, the solute surface in the feeder 2 is transported by the filter 4 and the screw feeder 10 to the outlet 46. The filter 4 only allows < noon fine solute particles to pass through and leaves the outlet 46, and enters the elongated tube 6 °, and the elongated tube 16 passes from below the vortex breaker 48 to the bottom of the mixing chamber 2. The low-solute-concentration electrolyte from the plating tank 26 can be conveyed into the inlet 15 of the elongated tube 16 through the tube. This conveying action can be sent from the feeder 2 but adhered to the wall of the inlet 15 The solute rushed to the fitting '16. When the solute enters the pipe 16 and reaches the bottom, the solute begins to contact the solvent in the mixing chamber a, and the solute begins to dissolve in the solvent, = the solute and the solvent are mixed together and the solute is dissolved in the solvent]: == the following is described in more detail. In Figures ^ through -6, the mixed vibration set 20 is driven under the lower chamber 12 of the mixing chamber 12. The mixing device 20 uses agitation to dissolve the mixed solutes. 1 Uses a pump to transport the solution below the solution. It includes a water pipe J-1 and a fixed suction pipe 68a. Pans 1 and 68c and a water pipe 70 respectively. 76a 7: * suction tube 68a, 68b fixed. The sprinkler pipe 70 is shown in the supporting parts such as ancient 6b, 76c, and 78 under the basin, and the RQ has two rows of small openings 74 below the eighth, as in the second mountain, as the second opening of the sprinkler pipe 7G. ? 'Wait for the small openings of the three suction tubes. 76 Two plates, each with a thin pin. The mixing device 20 further includes a pair of wing-shaped four figures. ♦ Filled with w = on both sides of the mixing chamber, as shown in the third figure and the first round of mixing: chamber / 2 in: = V see that the chamber 12 is in operation, pump 18 is held in the lotion, and the solvent is passed through 68a, 68b, and 68c V. Description of the invention (6) Two small openings of the suction pipe 7 6 Small openings 74 of the suction pipe 70 are conveyed back to the mixing chamber 12. This causes the downward flow of water around I in the mixing chamber 12 caused by the sprinkler mC, such as the IL dynamic water flow, such as the F sign bean sound square position U. The inverted panel 80 is pushed up and down from the lower position L. Stop ^^ The support member 78 of the sprinkler pipe 7G is positive and the stopper 8 6 can be adjusted so that the ancient surname of 苴 can not exceed the movement of the top 80; set the parent one to open so that Stop the external components in the panel 80 by the following method, when the amount u is added, 'close to the stopper 86.' This component is formed at the upper position of the panel to form a holder 2: The solvent of J cycles is sent from the sprinkler pipe D to create a closed area, which is combined and dissolved at the bottom of the mixing chamber 12 in the day and year. Although the seal "==; the solvent and the solvent will be mixed from the bottom of the mixing chamber 12 f = two is water-tight, but still allow the part, from the suction pipe 68 and the sprinkler pipe :: to the middle of 12 or above At the bottom of the mixer. ^ Most of the violent water generated is limited to the local detection of the solution in the mixing chamber 12. The local detection of the solution in the mixing chamber 12 = 2 5)), it can last for 14 times, a small amount of solution can Meridian, / chen, and the tube 13 is connected to the sensor 14. When the solute ^ 3 in the mixing chamber flows from the mixing chamber 12 to the sensor, the direct current motor 6 is moved, and more ,,,, When the degree is lower than the user's set value, it will drive 12. When the solvent and j contents in the mixing chamber are transferred to the mixing chamber via the pipe 16, Fenbei> When the degree reaches the user's set value, the DC 526091

______案號 89104645 五、發明說明(7) =達6停止運轉,而自供給器2至管件16的溶質加入輸送動 作將停止。 另一個感側器36連接於電鍍液箱26 的溶質濃度 開,接著電 室1 2。混合 混合室1 2的 5 2流至電鍍 濃度的溶液 溶液的溶質 濃度到達預 相2 6流向混 混合器 液的貫穿管 於混合室表 部位。在溶 冷水(9 °C ) 時大約是1 3 定值時閥37將打 道2 5而流入混合 水位’額外流入 管件24而自出口 〉辰度較低以較高 鑛液箱2 6内整體 液箱2 6内的溶質 ,溶液由電鍍液 置含有攜帶冷卻 ,冷卻管9 0安裝 上方延伸到中間 生。相對低溫的 丨混合室1 2流出 當溶質濃度低於使用者的設 鍍液箱2 6内的溶液經由輸送管 至中〉谷液將因此而一直保持滿 溶液將會溢流;溢流溶液將由 液箱2 6。因電鍍液箱2 6的溶質 置換低濃度的溶液將可提高電 濃度。當感側器36偵測到電鍍 先的選定值時,閥37將會關閉 合室1 2的舉動將會停止。 更包括一冷卻裝置,此冷卻裝 件90。如第一圖與第三圖所示 :的附近’並且由混合室1 2的 質溶解之時 才 會有大$的熱產 將送入此技& 此s中,而這些水流_ L 〇 電鑛液箱26需要有招 液,以供應電鍍室28 :規則供應含有所需溶質濃度的溶 度低於所需值時,溶有電,所需。當電鍍液箱2 6的溶液濃 輸送管道24,以隨後、索更鬲溶質的溶液將會經由出口 5 2與 的尺寸相對於混合室^充電鍍液箱2 6的溶液。電鍍液箱26 維持電鍍液箱2 6内、、交、> 大許多,其目的在於能夠更有效的 吹中溶質濃度的固定,因為大量高溶______ Case No. 89104645 V. Description of the invention (7) = 6 stops operation, and the solute feeding and conveying operation from feeder 2 to pipe 16 will stop. The other side sensor 36 is connected to the solute concentration of the plating solution tank 26, and then the electric chamber 12. Mixing The mixing chamber 1 2 5 2 flows to the plating concentration solution. The solute concentration of the solution reaches the pre-phase 2 6 to the mixing mixer. The liquid penetrating tube is at the surface of the mixing chamber. In molten cold water (9 ° C), it is about 1 3. At a fixed value, the valve 37 will hit the channel 2 5 and flow into the mixed water level. 'Extra flow into the pipe 24 and from the outlet> The lower the degree, the higher the overall liquid in the liquid tank 2 6 The solutes in the box 26, the solution is carried by the plating solution to carry the cooling, and the cooling pipe 90 is installed to extend to the middle. The relatively low temperature 丨 mixing chamber 1 2 flows out when the solute concentration is lower than the user's set plating solution tank 26. The solution passes through the transfer tube to the middle> The valley solution will therefore remain full and the solution will overflow; the overflow solution will be overflowed by Tank 2 6. The replacement of the low concentration solution by the solute in the plating tank 26 will increase the electric concentration. When the sensor 36 detects the first selected value of the plating, the valve 37 will close and the action of the chamber 12 will stop. It further includes a cooling device, the cooling unit 90. As shown in the first and third pictures: near the 'and when the mass of the mixing chamber 1 2 is dissolved, there will be a large thermal output will be sent to this technology & this, and these water flows _ L 〇 The electric ore liquid tank 26 needs to have liquid to supply the electroplating chamber 28: when the solubility containing the required solute concentration is lower than the required value, electricity is needed to dissolve. When the solution in the electroplating tank 26 is concentrated, it is sent to the pipeline 24, and then the solute solution will pass through the outlet 5 2 and the size relative to the mixing chamber ^ to charge the solution in the plating tank 26. The plating solution tank 26 maintains a large number of plating solutions in the plating solution tank 26, and its purpose is to be able to more effectively fix the concentration of the solute, because a large amount of high solubility

526091 ___j號89104fUR 年月日 倐正 五、發明說明(8) " 質之溶液隨時都可以供應電鍍室28之需求。 在混合室1 2中的溶液輸送到電鍍液箱2 6之前,溶液會 流經滿流破壞器48與分離器2 2。溶液流經渦流破壞器4 8與 分離裔2 2將在下面詳細解說。 如第一圖所示,安裝一渦流破壞器4 8於分離器2 2的下 方,以調節通過分離器2 2溶液,來降低從混合室1 2中離開 的未溶解溶質的數量。參見第七圖A與第七圖b,渦流破壞 器4 8為一多層網狀的組織5 6 (,,# ”)。本實施例中網狀的 組織56有三層’然而層數可依據混合室的尺寸以及所需的 渦流效果等因素而定。每一層的網狀組織5 6包括許多大致 相互平行排列的直立壁構件5 8。直立壁構件5 8的壁厚約 2mm,壁間的距離則為1 3mm,雖然不同尺寸的直立壁構件 58也可使用。每層的網狀組織56都以稍微偏心的方式堆疊 在另一層的上方’此種的堆疊方式可以增加對從混合室1 2 底部的混合裝置2 0所產生渦流的破壞效果。 參見第八圖’分離器2 2 —般包括許多壁狀分隔板3 4, 此分隔板組成許多的輸送管道5〇。更確切地說每一個輸送 ^道50是由許多壁狀分隔板34所圍繞而成。壁狀分隔板^ 最佳的組織方式’是由相鄰的壁狀分隔板3 4所組成的相對 表面38a與40a,能夠大致上相互平行並且與混合室12的水 平轴大約成55 -65的夾角。38a與4〇a的形狀可以是平 面或者波量狀’但表面最好是平滑的。分隔板34的組織以 及所組成的3 8 a與4 0 a表面的功能將在以下作詳細的說明。 在溶質(如氧化銅,Cu 0 ( s))溶解與混合於溶劑(如526091 ___j 号 89104fUR YYYY V. Description of the invention (8) " Quality solution can be supplied to the plating room 28 at any time. Before the solution in the mixing chamber 12 is transferred to the plating tank 26, the solution flows through the full-flow destroyer 48 and the separator 22. The solution flowing through the vortex breaker 48 and the separation line 22 will be explained in detail below. As shown in the first figure, a vortex breaker 48 is installed below the separator 22 to adjust the solution passing through the separator 22 to reduce the amount of undissolved solutes leaving the mixing chamber 12. Referring to the seventh diagram A and the seventh diagram b, the vortex breaker 48 is a multilayer network structure 5 6 (,, #). In this embodiment, the network structure 56 has three layers. However, the number of layers may be based on The size of the mixing chamber and the eddy current effect required depend on factors such as the mesh structure of each layer 5 6 including a plurality of upright wall members 58 arranged substantially parallel to each other. The wall thickness of the upright wall members 58 is about 2mm, The distance is 13 mm, although upright wall members 58 of different sizes can also be used. The mesh structure 56 of each layer is stacked slightly above the other layer in an eccentric manner. This stacking method can increase the 2 The damaging effect of the vortex produced by the mixing device 20 at the bottom. See Figure 8 'Separator 2 2-generally including a number of wall-shaped partition plates 3 4, which constitute a number of conveying pipes 50. More precisely It is said that each conveyance channel 50 is surrounded by a plurality of wall-shaped partition plates 34. The wall-shaped partition plates ^ the best organization method is the opposite surface composed of adjacent wall-shaped partition plates 34 38a and 40a can be substantially parallel to each other and horizontal to the mixing chamber 12 The angle is about 55-65. The shape of 38a and 40a can be flat or wavy, but the surface is preferably smooth. The structure of the partition plate 34 and the 3 8a and 4 0 a surface The function will be described in detail below. The solute (such as copper oxide, Cu 0 (s)) is dissolved and mixed in a solvent (such as

526091 修正 案號 89104645 五、發明說明(9) H2SO?時發現在溶解與混合的過程中, 氣泡會發 目對較低的密度,[泡將會自然地上升至所 、、容士合室12)的溶液表®。而另-方面由於 第九圖R断- ,合貝顆粒易於沉到混合室的底部,如 混合室將未溶解的溶質帶至 中,所希望完成的完全與有底部混合裝置 不希望的溶液流動:未溶挤,合貝心解,亦造成下述 以及輸送管道24而傳送到雷钷二二顆粒可能會經由出口 52 道54而流人電鑛室28。、電鑛液相26,最後再經由輪送管526091 Amendment No. 89104645 V. Description of the Invention (9) It was found that during the dissolution and mixing process of H2SO ?, bubbles will appear to the lower density, [the bubbles will naturally rise to the place, Rongshihe 12 ) Solution Table®. On the other hand, due to the ninth figure R, the particles of Hebei easily sink to the bottom of the mixing chamber. For example, the mixing chamber brings undissolved solutes into it, and the desired solution is completely flowed with the undesired solution of the bottom mixing device. : Undissolved, Hebei dissolves, and also causes the following and the conveying pipe 24 to be transferred to the Lei Er 22 pellets may flow into the power mine 28 through the outlet 52, 54. , Electricity and liquid phase 26, and finally through the tube

為了減緩上述的R 於降低未溶解的溶質到達電铲:二Π2的设计的目的在 驗,並將結果敘述於^達電鍛液相26 °因此進行下列的實 實驗1、2與3 (如第丄 目的:估計傾斜角;'二;第十圖B所示) 試驗條件:&舞洛貝溶解於溶劑之中所需時間 條件 實驗 貫驗二 次 溶劑體積(溶液)丨 (重複 ' 使用的容器 n ml 100ml i〇〇mi 溫度 i〇〇ml試管l〇〇ml試管 100ml試管 使用之溶質 氧f溫 室溫 室溫 使用之溶劑 鋼(Π )氧化銅(I I )氧化鋼(丨J ) 敍床·私士 t 復酸 硫酸 硫酸 矛王序·粉末狀的氧4 匕鋼(I I )加入含有硫酸的試管(力口以In order to slow down the above-mentioned R and reduce the undissolved solute to reach the electric shovel: the purpose of the design of II2 is to test, and the results are described in the electric forging liquid phase 26 °. Therefore, the following actual experiments 1, 2 and 3 (such as Objective 估计: Estimate the inclination angle; 'Second; as shown in Figure 10B) Test conditions: & Time required for dissolution of Wu Luo Bei in the solvent. Container n ml 100ml temperature 100ml test tube 100ml test tube 100ml test tube solute oxygen f temperature solvent room temperature room temperature room temperature solvent steel (Π) copper oxide (II) oxide steel (丨 J) · Private t acid acid sulfate spear king order · Powdered oxygen 4 dagger steel (II) Add test tube containing sulfuric acid (Likou to

第12頁 526091 案號 891f)4fUR 五、發明說明(10) 授拌)中。 結果: 曰 修正 加入的氧化銅 試管方位 自溶液表面以下的 溶液清晰高度 90mm 氧化銅顆粒消失 所需時間(溶解)1 〇分鐘 觀察:如第十圖A所示 9 0 mm 1 〇分鐘 言驗三 (平均值) 7gm 水平軸成6 0 5 0 m m 分鐘 士 I ISJ η //| ^氣化銅顆粒6 0因重力下降 ^觀察到氣泡62的發生;氣泡的發生似乎減慢力了下: 上vrnr 下表面働 乳化銅顆粒⑴)6。下降試管的 直驗二實驗結果可知,如果試管大致垂 溶解。結果也#現兩個相對的=、^軋化銅的下降以及 ^4〇b) 及氣泡的上升。結果中更明確發 '化銅的下降以 傾斜60。(如第十圖Β所示)時,見可///相對於水平軸 效果,但是只要在55。到65。之門都于 佳的溶質溶解 果。 之間都可以獲得滿意的結 基於上述的結論,分離器22將設計成為由許多的管道 第13頁 526091 _案號89104645_年月日__ 五、發明說明(11) 5 0所組成,以讓上升的氣泡通過以及溶質顆粒的下降以及 溶解。更明確的說向上的下表面4 0 a提供溶質在溶解過程 中可以下降的場所,而向下的上表面則讓氣泡據以上升。 上述的設計可以將溶質顆粒的上升(上升後可能會進入電 鑛液箱2 6 )降到最低。Page 12 526091 Case No. 891f) 4fUR 5. Description of Invention (10) Fostering). Result: Correct the orientation of the added copper oxide test tube from the solution below the surface of the solution to a clear height of 90mm. The time required for the copper oxide particles to disappear (dissolve) is 10 minutes. Observation: As shown in Figure 10, 90 mm 100 minutes. (Average value) 7gm horizontal axis is 6 0 5 0 mm minutes I ISJ η // | ^ Gasification of copper particles 60 0 due to gravity ^ The occurrence of bubbles 62 was observed; the occurrence of bubbles seems to be slowed down: up vrnr lower surface 働 emulsified copper particles ⑴) 6. The results of the second test of the lower test tube show that if the test tube is approximately vertical, it will dissolve. The result is also #currently two opposites = ^ the decrease of rolled copper and ^ 4b) and the rise of bubbles. The results made it clearer that the drop of copper was tilted by 60. (As shown in Figure 10B), you can see the effect relative to the horizontal axis, but as long as it is 55. To 65. The gates are all good solutes. A satisfactory conclusion can be obtained between them. Based on the above conclusion, the separator 22 will be designed to consist of many pipes. Page 13 526091 _ Case No. 89104645 _ Month and Day __ V. Description of the invention (11) 50 Let rising air bubbles pass and drop and dissolve solute particles. More specifically, the upward lower surface 40a provides a place where the solute can drop during the dissolution process, while the downward upper surface allows the bubbles to rise accordingly. The above design can minimize the rise of the solute particles (which may enter the power tank 26 after the rise) to a minimum.

第14頁 526091 參 案號 89104645 年 月 日 修正 圖式簡單說明 1 :電鍍裝置 34 :壁狀分隔板 2 :供給器 37 :設定值時閥 4 :過濾器 42 :低濃度區域 6 :直流馬達 44 :南濃度區域 8 :電源 46 、53 :出口 1 0 :螺旋供給器 48 :渦流破壞器 12 :混合室 50 、54 :輸送管3 1 3、2 4、2 5、5 4 :管件 5 6 :網狀組織 14 、 * 3 6 :感側器 58 : 直立壁構件 15 入口 70 : 灑水管 16 長形管 6 8a 、6 8 b、6 8 c : 吸入管 18 幫浦 76a 、7 6 b、7 6 c、 78 :支持件 20 混合裝置 74 ^ 76 :小開口 22 分離器 80 : 面板 26 電鍍液箱 86 : 停止件 28 電鍍室 90 : 冷卻管 30 陰極 32 陽極Page 14 526091 Reference No. 89104645 Month / Day Correction Drawing Brief Description 1: Plating device 34: Wall-shaped partition plate 2: Feeder 37: Valve at set value 4: Filter 42: Low concentration area 6: DC motor 44: South concentration area 8: Power supply 46, 53: Outlet 1 0: Spiral feeder 48: Vortex breaker 12: Mixing chamber 50, 54: Conveying pipe 3 1 3, 2 4, 2 5, 5 4: Pipe fitting 5 6 : Reticulated tissue 14, * 3 6: Side sensor 58: Upright wall member 15 Inlet 70: Sprinkler tube 16 Long tube 6 8a, 6 8 b, 6 8 c: Suction tube 18 pump 76a, 7 6 b, 7 6 c, 78: Support 20 Mixing device 74 ^ 76: Small opening 22 Separator 80: Panel 26 Plating liquid tank 86: Stopper 28 Plating chamber 90: Cooling tube 30 Cathode 32 Anode

第15頁Page 15

Claims (1)

526091 —------ 案號 8mfMRlR_ 六、申請專利範圍 置至少包括一塊板。 10·如申請專利範圍第豆項所述的装置,其中該分隔裝置 包括兩塊板。 11·如申請專利範圍第豆或U項所述的裝置,其中每一個 或者該板塊以樞軸固定並可與該槽室的構件作相對運動。 12.如申請專利範圍第i項逆述的裝置,其中當該分隔裝 置位於第一個位置時會與一個停止構件相鄰。 1 3·如申請專利範圍% 所述的裝置,其中該停止構件 的形狀大致為一倒V字型。526091 —------ Case No. 8mfMRlR_ VI. Scope of patent application At least one board is included. 10. The device as described in the patent application No. Bean, wherein the separating device comprises two plates. 11. The device as described in the patent application No. Bean or U, wherein each or the plate is pivotally fixed and can be moved relative to the member of the tank. 12. The device as described in item i of the patent application, wherein the partitioning device is adjacent to a stop member when it is in the first position. 1 3. The device according to the scope of patent application, wherein the shape of the stopping member is approximately an inverted V shape. 1 4 ·如申請專利範圍第1項的裝置,其中該移動裝置 至少包括一個幫浦,並且第/與第二管件與該幫浦連接。 该幫浦調整成為經由該第一管件自該槽室吸取該溶質與該 溶劑’並將此該溶質與該溶劑經由該第二管件送入該槽 t 〇 、’ 1 5 ·如申請專利範圍第ϋ項所述的裝置,其中參照專利申 清範圍3,當該溶質與該溶劑由第二管件送入該槽室將會 產生該水流。1 4 · The device according to item 1 of the scope of patent application, wherein the mobile device includes at least one pump, and the first and second pipe fittings are connected to the pump. The pump is adjusted to suck the solute and the solvent from the tank chamber through the first pipe fitting, and send the solute and the solvent into the tank via the second pipe fitting. The device described in item (2), referring to Patent Application Scope 3, when the solute and the solvent are sent into the tank by the second pipe, the water flow will be generated.
TW089104645A 2000-03-14 2000-03-14 A mixing apparatus TW526091B (en)

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