TW522255B - Micro-mirror positioning device - Google Patents

Abstract

A micro mirror positioning device includes a stationary vertical element, a stationary horizontal element and an interference eliminator. The stationary horizontal element holds micro mirrors in place during transportation for avoiding vibration and collision. The stationary vertical element accurately orientates the micro mirrors in the vertical position. The interference eliminator assures that the micro mirrors are free from the interference caused by the operating magnetic field of other micro mirrors in the micro mirror array, or external magnetic field, thereby preventing the magnetic field from interfering the overall operation of the micro mirror array.

Description

522255 Modification -1S 90108048 V. Description of the invention α) Field of the invention: The present invention relates to a kind of micro-lens fixed micro-mirror for precise vertical positioning, and can provide the micro-lens without interference. The lens array is free from the interference of magnetic field during the operation of the lens array. Besides, the horizontal and horizontal positioning functions can be used to fix all the micro lenses of the micro lens or the micro lens array, so that the micro lenses can avoid vibration and collision during the carrying and transportation of the micro lenses. Displacement or damage, so the present invention can provide the function of micro-lens or micro-lens array accurate positioning and avoid interference, and can improve the reliability of micro-lens or micro-lens array movement or carrying. Background of the Invention: In recent years, the high-tech industry has made great progress in various fields. Among them, the development of micro-optical communication and micro-electromechanical fields is also rapid. Among them, application deposition

(deposit), bulk etching (bulk microiachining), surface etching, (surface micro-machining) and other yellow light lithography processes, has produced many micro-objects, micro-devices that can not be made in the past technology, such micro-objects 4 elements' may Used in micro-electromechanical fields and other high-tech fields. At the same time, the micro-optical communication technology in the field of optical communication is also progressing rapidly. Among them, a large number of miniature, high-speed, high-reliability optical switches are required in the micro-optical communication system. This optical switch can change the direction of the optical path according to the needs of various applications. ^ The yellow light lithography process technology is applicable to the production of micro-objects that meet the requirements of micro, high speed, high reliability, etc. Therefore, some research institutions have engaged in related research and published research results, including two papers (the first paper For # Yang Yi and Chang Liu, " Parallel assembly 〇f

Page 5 522255 case number 90108048, V. Description of the invention (2) hinged microstructures using magnetic actuation "Solid-state sensor and actuator 1998, the second paper is Hiroshi: Tosh i yosh i and Hiroyuki Fu ji ta, n An electrostatically operated torsion mirror for optical switching device ”Transducers 1995) and two Wu Guo patents (USP at · N o · 6,0 9 4,2 9 3 and USP a t. No · 5, 9 6 0, 1 3 2 ) Have proposed micro-optic switches manufactured by the aforementioned lithographic process. The above-mentioned micro-optical switches are proposed to be inserted into a swingable micro-lens by electrostatic or magnetic fields to make it stop from the self-reflecting state to the non-reflecting state, or after the self-reflecting state to the non-reflecting state. Stop, where the non-reflective state allows the incoming light to pass through and continue along the original light path; while the reflective state changes the original light path of the incoming light with total reflection. However, the above information 'whether it oscillates from non-reflective state to non-reflective state, or from non-reflective state to reflective state, its microlenses are often affected by the inertia of the swing, resulting in a swing exceeding the fixed point of the reflective state or the absence of the fixed point of the non-reflective state, causing micro The lens cannot be accurately positioned, and the lack of accurate positioning of the low-light optical path after reflection by the micro-lens results in the lack. Summary of the Invention: Please refer to FIG. 1 and FIG. 2, which are three-dimensional intention and front view of a conventional micro-lens swing device. The conventional microlens swinging device 10 is attached to a silicon substrate (K substrate or glass substrate) with a relatively flat surface, and a microlens swinging device is manufactured by using the Yuguang lithography process technology. The microlens swinging device 10 10 includes a first fixed end 12a and a second fixed end

Page 6 522255 --- Shame ― 90108048 Θ ^ year month _____ _ day correction V. Description of the invention (3) —— ~~~ ^ a — 12b 'advancing element 121, a reflecting lens 14, a stop 15. A microcoil 16. The first fixed end i 2a, the second fixed end 12 b, the torsion element 1 2 1, the reflective lens 14, and the stopper 5 are integrally formed by the aforementioned yellow light lithography process, and their materials are usually suitable for elasticity. Polycrystalline silicon (Poiy-siiiC0n); the first fixed end 12a and the second fixed end 12b are separated by an appropriate distance and fixed on the silicon substrate, respectively, and the torsion element 1 2 1 is horizontal The suspension method is provided between the two fixed ends 12 2 and 12 b. The reflection lens 14 is an extension of the central portion of the torsion element 121 in the horizontal direction. A soft magnetic alloy 141 is further provided on the reflective lens 14. The soft magnetic alloy (perm-alloy) is fixed above the reflective lens 14 by a sputtering or electroplating process; a reflective region 142 It is a highly flat reflection area 'on the reflection lens 14 which can provide the function of changing the light path after the incident light is reflected by the reflection area 142. The stopper 15 can be at least one square stopper or a long rectangle, which is fixed below the reflective lens 4 and its height can provide the horizontal rest position of the reflective lens 14. The micro-coil 1 β is provided under the Shixi substrate 11 and can provide a magnetic repulsive force for pushing the reflection lens 14 to swing. Please refer to Figures 3, 4, and 5, which are schematic diagrams of the swing mechanism of the conventional micro-lens swinging device 10. Figure 3 shows the micro-lens swinging device 10 in a horizontal position, and the micro-coil 6 Schematic diagram when power is applied; Figure 4 is a schematic diagram of the micro-lens swinging device 10 swinging from the horizontal direction to the vertical direction; Figure 5 is a schematic diagram of the micro-lens swinging device 10 swinging beyond the fixed point of the vertical position due to inertia generated during swinging .

522255 ---- Case No. 9〇１〇 Don't 缒 _________— Everyday, 5. Description of the invention (4) Please refer to Figure 3. After the micro-coil 16 provided under the micro-lens swinging device 10 is powered on, a The magnetic flux density is 161. At the same time, the soft magnetic alloy 1 4 1 is induced by the magnetic flux density 1 6 1 to generate a magnetization 163 'The N pole of the stone flux density 161 and the N pole of the magnetization 163 Between them, a repulsive force 164 is generated. The repulsive force 164 is a reflection of the reflecting lens 丄 4 丨 〇 ″ on the slab of the right of the dream ii. Use a knife to enter the board. According to the foregoing, the twisting element 121 is connected to the microlens. 14 and the two fixed ends 12a, 12b, and are formed by a yellow light lithography process. They are integrally formed and have a suitable elastic material. Therefore, when the soft magnetic alloy 141 is induced by the magnetic flux density 161 to generate magnetization 163, the N pole of the magnetization 163 and When the N poles of the magnetic flux density 1 61 repel each other, the torsion element 21 can be appropriately elastically twisted for the reflecting lens 14 to swing from the horizontal position to the vertical position. Please note that when the reflecting lens 14 is in a horizontal position, the distance between the two N poles is the shortest, and the repulsive force 164 of the reflecting lens 14 is also the largest.凊 Refer to FIG. 4 'When the repulsive force 164 of the reflecting lens 14 swings from the horizontal position to the vertical position, the distance between the two N poles gradually increases, and the repulsive force 1 6 4 of the reflecting lens 14 gradually decreases, and the twist Element 1 21 continues to provide an appropriate elastic twist for the reflective lens to continue to swing from a horizontal position to a vertical value. ~ Please refer to FIG. 5, when the reflecting lens 14 swings to a near vertical position, the distance between the two N poles is further increased, and the repulsive force 164 experienced by the reflecting lens 14 is also greatly reduced. At the moment of position 17, the repulsive force 164 cannot provide the force that the reflecting lens 14 continues to swing beyond the vertical position; but the inertia generated when the reflecting lens 14 swings, Shi Cheng's reflecting lens 14 cannot stop at the vertical position after swinging The vertical bit ^

522255 Yi Ying Yi Yi (Amendment on the Xth day of each month V. Invention description (5) «—— 一 《— 一 · — 一一 一一 1 1 7 i so that it often exceeds its predetermined vertical position 17 before stopping in a stationary position 1 8 'Therefore, the requirement of vertical positioning cannot be achieved. When the reflecting lens ^ 4 is stationary at the static position 18', the repulsive force 164 prevents the reflecting lens 14 from swinging downward to the horizontal position. U, please see Figure 6 for tea, It is a schematic diagram of a conventional micro-lens swinging device i υ located at a static position 18 when the micro-coil 丨 6 is closed and the original magnetic field disappears. 4 is due to the elastic restoring force of the aforementioned torsion element 丨 2 1, swinging from the rest position 18 to the horizontal position, please refer to FIG. 7, which is a schematic diagram of the conventional micro lens swinging device 10 swinging to the horizontal position. Similarly, the reflecting lens 14 may swing beyond its horizontal position due to the inertia generated by the swing. Because the reflecting lens 14 is provided with a stop 15, the reflecting lens 14 can be stopped at the stop 15 Set it See Fig. 7. When the micro-lens swing device 10 needs to be moved or carried, or when one of the micro-lens array swing devices composed of at least one micro-lens swing device needs to be moved or carried, the stopper 1 5 That is, the mechanism and function of fixing the microlens 10 or a microlens array in the horizontal position cannot be provided. Please refer to FIG. 8, which is a schematic diagram of a microlens array 20 of conventional technology. The microlens array 20 is composed of Sixteen microlenses 2 11, 21 2, 21 3, 214 ^ 221 > 222 > 223, 224 > 231 ^ 232 ^ 233 ^ 234 > 241, 242, 2 43 and 244, of which four micro The lenses 213, 221, 232, and 244 are in the vertical state, so the incident light emitted from the four light sources 20A, 20B, 20C, and 20D is reflected by the four microlenses 213, 221, 232, and 244, respectively, and is respectively Sensing unit 2 0 Ε, 2 0 F, 2 0 G, 2 0

Page 9 522255 One-one case number 90108048 Seven years 0-month dagger 绦 Zheng V. Description of the invention (6) ~ ~ Close. The remaining twelve microlenses 211, 212, 214, 222, 223, 224, 231, 233, 234, 241, 242, and 243 are set in a horizontal state. At this time, the aforementioned concave microlenses 213, 221, 2 are located in the vertical position. The magnetic field of the micro-coils below 32 and 244 is activated, so it may affect the twelve micro-lenses 211, 212, 214, 222, 223, 224, 231, 233, 234 '241, 242, 243 in a horizontal position. Due to the influence of nearby magnetic fields, these lenses cannot swing at a horizontal position and will swing. They may intercept any incident light or reflected light in the picture, causing the abnormal operation of conventional micro-lens arrays. The twelve microlenses 211, 212, 214, 222, 223, 224, 231, 233, 234, 241, 242, 243 will be affected by the magnetic field. In this detailed description of the invention, an interference-free mechanism will be disclosed to solve the problem. The magnetic field interference problem of conventional microlens 10 or microlens array 20. Eleven micro-lenses 211, 212, 214, 222, 223, 224, 231, 233, 234, 241, 242, 243 set in the horizontal position, some lenses may be affected by nearby magnetic fields and cannot be fixed in the horizontal position to swing , And may intercept any incident light or reflected light in the picture, resulting in abnormal operation of the conventional technology micro lens array 20.简单 Brief description of the invention ... The object of the present invention is to provide a micro lens positioning device capable of positioning a micro lens or a micro lens array in a vertical position. Another object of the present invention is to provide a micro lens positioning device capable of positioning a micro lens or a micro lens array in a horizontal position.

522255 One ~ One—— ☆ Car 丨 6th of May, 5. Description of invention (7) The micro lens positioning device. Detailed description of the preferred embodiment: Those skilled in the art are not used to limit the present invention. The invention will be described below. Please refer to the drawings. It must be understood that the description below is for illustration only. In order to solve the above-mentioned problems in the conventional technology, the present invention proposes a new micro lens positioning device 3, which includes a vertical positioning unit 40, a horizontal positioning unit 50 and an interference-free unit 60, which can solve the conventional technology respectively. The vertical positioning problem, the horizontal positioning problem and the optimization problem of the microlens 10 or the microlens array 20. Figures 9 and 10 show the three-dimensional schematic and front views of the first preferred practical example of the microlens positioning device 3 of the present invention. In the first preferred embodiment, the vertical positioning unit 40 of the present invention is attached to a Shixi substrate 41 (or a glass substrate) having a relatively flatness, and a micro-lens vertical positioning device 40 is manufactured by using a yellow light lithography process technology. The micro-lens vertical positioning unit 40 includes a first fixed end 42a, a second fixed end 42b, a first torsion element 421, a second torsion element 422, a positioning lens 43, and a reflection lens 4 4. A stop 45 and a micro-coil 46. The two fixed ends 42a, 42b, the first torsion element 421, the second torsion element 422, the positioning lens 43, the reflection lens 44, and the stopper 45 are integrally formed by the aforementioned yellow light lithography process, and the materials are usually Polysilicon with appropriate elasticity; the two fixed ends 42a, 42b are separated by an appropriate distance, and are respectively fixed on the silicon substrate 4 丨, the first

522255 ———— Case No. 90108048 {Xi Nianl > Month "m WU» ^ M-IIWMI &Ht; HWr— B—mifl _1 | _ | _ 丨 咖啡 ___ | __ · · 1ΓΠΙ_ΙΙ _ 1 | 丨 __ | __ I 丨 __ 丨 _ _. ΠΠΙ 5. Description of the invention (8) A turning element 421 and a second torsion element 422 are parallel to each other and spaced at an appropriate distance from each other, and are respectively arranged on the first side in a horizontal suspension manner. Between the fixed end 4 2 a and the remote one fixed end 4 2 b; the positioning lens 4 3 is the length of the central portion of the first twisting element 42 1 in the horizontal direction; the reflecting lens 44 is the second twisting element The central portion of 422 is extended in the horizontal direction, and the positioning lens 43 and the reflecting lens 44 are respectively disposed on both sides of the first torsion element 41 and the second torsion element 422. The positioning lens 43 and the A first soft magnetic alloy (Permalloy) 431 and a second soft magnetic alloy (Permalloy) 441 are respectively disposed on the reflective lens 44. The first soft magnetic alloy 431 and the second soft magnetic alloy 441 are sputtered or plated with money. (electroplating) process, fixed on the positioning lens 43 and the reflective lens 44 respectively; the reflective lens 44 is There is a reflection area 442, which is a highly flat reflection area on the reflection lens 44, which can provide the function of changing the optical path after the incident light is reflected by the reflection area 442. The weight 45 is fixed on the stone evening substrate 41 One of the long rectangular or at least one square stopper can provide the horizontal rest position of the reflective lens 44. The micro-coil 46 is disposed below the silicon substrate 41, and can provide a driving force for the reflective lens 44 to swing. Magnetic repulsion.

Please refer to FIG. 11, FIG. 12, and FIG. 13, which are schematic diagrams of the first preferred practical example of the vertical positioning unit 40 of the present invention, respectively. FIG. 11 shows the vertical positioning unit 40 in a horizontal position and the microcoil Fig. 12 is a schematic diagram of the vertical positioning unit 40 swinging from the horizontal direction to the vertical direction, and Fig. 12 is a schematic diagram of the vertical positioning unit 40.

Page 12 522255 —— ^ ^ Lu Modification V. Explanation of the invention (9) I ~ ~ — In Figure Η, Figure 12 and Figure 13, the vertical positioning unit 40 microcoil 46 of the present invention generates a magnetic flux density 461, The soft magnetic alloy mi is induced by the magnetic flux density 461 to 'generate a magnetization 463. Between the N pole of the magnetic flux density 461 and the N pole of the magnetized magnet 4 63', a second repulsive force 443 is generated. The second repulsive force 443 is Pushing the 5H reflection lens 4 4 upward from one of the forces of the Shixi substrate 41, the principle is the same as in Figure 2, Figure 4, and Figure 5. Background of the Invention Conventional technology uses micro-coil 6 and soft magnetic alloy 141. The repulsive force 164 drives the reflective lens 14 in the same principle; however, the vertical positioning unit 40 of the present invention discloses a mechanism for vertically positioning the reflective lens 44 with a torsion element 421, a positioning lens 43 and a soft magnetic alloy 4 31. no. Referring to FIG. 11, the positioning lens 43 soft magnetic alloy 4 31 is induced by the magnetic flux density 46 1 to generate a magnetization 462, and a first repulsive force 433 is generated between the N pole of the magnetic flux density 461 and the N pole of the magnetization 46 2. This repulsive force is a force that pushes the positioning lens 43 upward from the silicon substrate 41. The first repulsive force 433 can push the positioning lens 43 to swing from the horizontal direction to the vertical direction. At the same time, the reflecting lens 44 soft magnetic alloy 441 is induced by the magnetic flux density 461 to generate a magnetization 463 'Between the N pole of the magnetic flux density 461 and the N pole of the magnetization 463, the aforementioned second repulsive force 443 and the second repulsive force 443 are generated. It is a force for pushing the reflecting lens 44 upward from the silicon substrate 41, and the second repulsive force 443 can push the reflecting lens 44 to swing from the horizontal direction to the vertical direction. Please note that when the positioning lens 43 is in the horizontal position, the distance between the N pole of the magnetic flux density 461 and the ν pole of the magnetization 46 2 is the shortest, and the first repulsive force 433 that the positioning lens 43 receives is the same; the same reason, the reflective lens When 44 is in the horizontal position, the distance between the N pole of the magnetic flux density 461 and the N pole of the magnetized 463 is the shortest. The reflection lens 44 is subjected to 522255--------Case No.-year (July < 5. Description of the invention (10) The second repulsive force 443 is also the largest. Please refer to FIG. 12, when the positioning lens 43 and the reflective lens 44 are respectively subjected to the first repulsive force 433 and the second repulsive force 443 and swing from the horizontal position to the vertical position, respectively. The distance between the magnetic flux density 4 6 1 N pole and the magnetized 4 6 2 N pole and the magnetic bias 4 6 1 N pole and the magnetized 4 6 3 N pole gradually increase at the same time, so the 疋The first repulsive force 4 3 3 and the first repulsive force 4 4 3 respectively received by the bit lens 4 3 and the reflective lens 4 4 are gradually reduced, and the first torsion element 4 2 1 and the first torsion element 422 are continuously provided. Appropriate elastic twist for the positioning lens 4 3 and the reflecting lens 44 to continue from the horizontal position respectively Vertical position swing. However, the quality of the positioning lens 43 is small, and its speed of swinging from the horizontal position to the vertical position is slightly faster, so the process of swinging the positioning lens 43 to the vertical position is slightly ahead of the reflective lens 4 4; however, this phenomenon can be caused by The length ratio of the torsion elements 4 2 1 and 4 2 2 and the thickness of the soft magnetic alloys 431 and 441 are controlled to control. That is, the shorter the length ratio of the torsion elements 4 2 1 and 4 2 2 is, the longer the time of the torsion element to swing. The shorter it is, and the thicker the thickness of the soft magnetic alloys 431 and 441 is, the shorter the swing time is. Therefore, the process of positioning the lens 4 3 slightly ahead of the reflective lens 4 4 can be controlled freely. Furthermore, if the positioning lens 43 In the case where the conditions of the reflecting lens 44 are not equal, the moment, angular acceleration, and moment of inertia in the clockwise and counterclockwise directions will not be equal. Generally speaking, the equilibrium state of the reflecting lens by the external magnetic field is 90. (because The applied magnetic field 461 is parallel to the magnetization 463) 'But because of the inertia effect', the reflective lens 44 will exceed 9 0. These are a big problem for mirrors that need to be switched at high speed. In this case the invention by positioning a lens designed may be made, to compensate for the inertia of the angle error.

522255 a-f. Year ft Yuexin Yue V. Description of Invention (11)

When approaching the vertical position, the distance between the magnetic flux density 461N pole and the magnetized 462N pole is further increased, and the first repulsive force 433 experienced by the positioning lens 43 is also greatly reduced. 'Fu the positioning lens 4 3 swings to a vertical position 1 At the moment of 7, the first repulsive force 4 3 3 could not provide the force of the positioning lens 4 3 to continue to swing beyond the vertical value; but the inertia generated when the positioning lens 43 swings, causing the positioning lens 4 3 to reach first and slightly surpass it. The vertical position 4 7 is only stopped to the right; when the reflecting lens 44 that is slightly behind in the swinging process swings to the vertical position, the first repulsive force 443 cannot provide the force that the reflective lens 44 continues to swing beyond the vertical position; however, the reflective lens 44 swings Due to the inertia caused by the time, the reflection lens 44 can't stop in the vertical position 47 when it swings to the vertical position, and it can't stop after it exceeds the vertical position 47. You can use the positioning lens 43 to reach and slightly exceed the vertical position 4 7 The balance inertia is interlocked, so the positioning lens 43 and the reflecting lens 44 are in contact with each other and are stationary at the vertical position 47 ′ to achieve the vertical positioning. begging. However, the relative mass of the positioning lens u and the reflective lens 44, the relative magnetic moment received, the relative axis 彳 f of the first torsion element 421 and the second torsion element 422, and the elastic torsion ability are all factors that affect the vertical positioning. Therefore, a vertical positioning unit 40 requires the selection of many materials, the acquisition and application of experimental data to obtain the best results; and the confirmation of vertical positioning can be emitted by a plurality of laser beams in different directions at a fixed point, and the vertical The reflection of the reflective lens 44 is positioned and verified by a plurality of sensing devices respectively sensing the reflected light beam at predetermined positions.

522255, * ^ 80108048 (February, "Amendment ·· 麻 I— · τ · ^ κ ___ ι · _ wie_mi 丨 ____ mmntmmefmnmMumimmnmrmmmsmmm-irwivmaiae V. Description of the invention (12) Figure 14 of the regulations and Figure 15 of the fifteenth chapter 'It is a schematic diagram of the conductive state and the non-conductive state of the first preferred practical example of the water bucket and positioning unit 50 of the present invention, wherein the horizontal positioning unit 50 includes a first electrode 52a, a second electrode 52b, and a first A cantilever 521, a second cantilever 522, a connecting cantilever 523, and a tenon 53. The micro-lens horizontal positioning unit 50 further includes a convex plate 47 protruding from the silicon substrate 41 and a region corresponding to the tenon 53. The first electrode 5 2 a, the second electrode 5 2 b, the first cantilever 5 2 1, the second cantilever 5 2 2, the connecting cantilever 523 and the tenon 53 are integrally formed by the aforementioned yellow light lithography process, and the material is usually Copper alloy or gold alloy with proper conductivity; the first electrode 52a and the second electrode 52b are separated by an appropriate distance, and are respectively fixed on the stone substrate 41, the first cantilever 521 and the second Cantilever 522 is parallel or approximately parallel to each other, while the second cantilever 522 is thicker than the first _ cantilever 52 ι. One of the two is a horizontal suspension method, which is fixed to the first electrode 52a and the second electrode 52b, respectively, and the second end of the two is also horizontally suspended. In a hanging manner, the two ends of the connecting cantilever 5 23 are respectively connected, so the horizontal positioning unit 50 forms a suspended conductive circuit in a horizontal manner between the first electrode 52 a and the second electrode 52 b.

Page 16 522255 January 6 s Correction V. Description of the invention (13) When the positioning lens 43 is positioned in the vertical positioning state shown in Fig. 13, the system control software issues a command to 'cut off the microcoil 46 from being electrically connected to the power supply. After the disappearance of the original magnetic field, the first soft magnetic alloy 431 of the positioning lens 43 and the second soft magnetic alloy 441 of the reflecting lens 44 stop sensing, and are no longer affected by the first repulsive force 433 and the second repulsive force 443, respectively. The positioning lens 43 and the reflective lens 44 is due to the elastic restoring force of the first torsion element 421 and the second torsion element 422, respectively, from the vertical rest vertical position to the horizontal position respectively, and the reflecting lens 44 can be used. The stopper 45 provided by it can prevent Due to the inertia generated by the swing, the swing exceeds its horizontal position, so that the reflective lens 44 is stationary at the horizontal position, and the horizontal positioning unit 50 forms a horizontally suspended conductive loop formed between the first electrode 52a and the second electrode 52b. The first cantilever 521, the connecting cantilever 523 and the second cantilever 522 of the conductive circuit have the same f, and the same expansion coefficient of the same metal material is in the electrical conduction state. The second cantilever 522 is thicker than the first cantilever 521, and its cross section is larger, lower resistance, lower heat generated by resistance, lower temperature, due to less linear extension due to thermal expansion. The first cantilever 5 2 1 is more linearly extended / pulled forward to connect the cantilever 523 and the second cantilever 522 is more linearly extended than the relative force of the cantilever 5 2 3 to be pulled backward, so the horizontal positioning is single. As shown in FIG. 15, the first cantilever 521 and the second cantilever 522 are bent close to the two-to-one to the right. 'Please note that the connecting cantilever 523 is much shorter than the younger cantilever 521 and the second cantilever 522, and its thermal expansion linearly extends the length.

-522255 One year (h "Day correction V. Invention description (14) ~~ -one one _ ~ one_« = shorter than the linear extension length of the first cantilever 5 2 1 or the second cantilever 5 2 2 The relative force of a cantilever 521 or a second cantilever 522 can be ignored. ^ The horizontal positioning unit 50 of the animal money is in a conductive state, and the reflective lens 44f is in the horizontal position. At this time, the system control software issues an instruction. , Cut off the connection between the conductive circuit of the horizontal suspension = and the power supply, causing the circuit to be non-conductive f, like this, please refer to Figure 15, the first suspension 521 of the horizontal positioning unit 50, the connection cantilever 523 Both the second cantilever 522 and the second cantilever 522 are extended linearly and shortened due to the disappearance of the resistance, the decrease in temperature, and the thermal expansion. They gradually recover from the first cantilever 521 in the conductive state to the right, the cantilever 5 23 and the second cantilever 522. The normal shape that is no longer bent to the right in the non-conductive state shown, at this time, 'the tenon 53 is moved to the left above the corresponding convex plate 47 and can just contact the convex plate 47 to prevent the reflection The lens 44 moves, and the horizontal positioning unit 50 is at this time. It can provide the micro-lens precise positioning device 3 during the carrying and transportation process, so as to avoid the displacement or damage of the micro-lens caused by vibration and collision. The interference-free unit 60 disclosed by the micro-lens positioning device 3 of the present invention can solve the aforementioned problem. In the micro lens array 20 of FIG. 8, the micro lenses existing in the conventional technology cannot swing at a horizontal position due to the influence of the nearby magnetic field, and may intercept the incident light or reflected light in FIG. 8, resulting in the conventional technology micro lens array. 2 The lack of abnormal operation. Please refer to FIG. 16, which are front views of the interference-free unit 60 according to the present invention. The interference-free unit 60 includes one of the reflection lenses 44. The first conductive film 61 and a second conductive film 62 provided on the silicon substrate 41. The first conductive film 61 and the second

Page 18 522255 __Case No. 90108048 Rev. P_15. Description of the Invention (15) The conductive film 62 is fixed to the reflective lens 44 and the reflective lens 44 by a sputtering or electroplating process, respectively. Shi Xi substrate 41. When the reflective lens 44 is in a horizontal state, the conductive film 61 is located below the reflective lens 44, and when the reflective lens 44 is in a horizontal state, the second conductive film 62 is disposed on the silicon substrate 41 and the first Above the corresponding region of the conductive film 61. In an implementation manner, when the reflective lens 44 is in a horizontal position and the magnetic field interference of other microcoils is to be avoided, the first conductive film 61 and the second conductive film 62 of the interference unit 60 may be respectively connected to a first power source 63 and A second power source 64 is electrically connected and the opposite charges are provided by the first power source 63 and the second power source 64. In this embodiment, the first conductive film 61 and the second conductive film 62 are in a positive state and a negative state, respectively. The reflective lens 44 is protected from the magnetic field of the micro-coils in the activated state under the other micro-lenses, and the electrostatic attraction required to stand still in a horizontal position. If the twelve micro-lenses 211, 212, 214, 222, 22 3, 224, 231, 233, 234, 241, 242, and 243 in the horizontal state shown in FIG. 8 are respectively provided with an interference-free unit 60, it can be avoided. In this vertical position, the magnetic field of the micro-coils under the activation state of the four micro-lenses 213, 221, 232, and 244 can be left at a horizontal position. Similarly, if the four micro-lenses 213, 221, 232, and 244 are respectively provided with an interference-free unit 60, then when the four micro-lenses 2 1 3, 2 2 1, 232, and 244 are in a horizontal state, other micro-lenses can also be exempted. The magnetic field of the microcoil in the activated state under the lens can be left in a horizontal position. Please refer to FIG. 17, which is a schematic perspective view of a second preferred practical example of the vertical positioning unit 70 of the present invention. The vertical positioning unit 70 is a silicon substrate 71 (or a glass substrate) having a relatively flatness. ) On to Huang Guangwei

522255 amendment

No. 901f) 8 (UR V. Description of the invention (16) Manufacturing of a micro lens for vertical positioning of a farmhouse 70. The vertical positioning unit 70 includes a first positioning unit 73, a second positioning unit 74, and a reflection. Unit 75, a micro-coil 76 and a stopper 77. The first positioning unit 73 includes a first fixed end 73a, a first torsion element 731, a first positioning lens 734 and a first side 735; The second positioning unit 74 includes a second fixed end 74a, a second torsion element 741 / a second positioning lens 744, and a second side 745; the reflection unit 75 includes a third fixed end 75a, a The fourth fixed end 75b, a third torsion element 751, and a reflective lens 754; the micro-coil 76 is provided below the silicon substrate 71, and can provide a magnetic repulsive force for pushing the reflective lens 44 to swing; the stopper 77 is fixed A height of a long rectangular or at least one square weight of the reflection lens 754 can provide the horizontal rest position of the reflection lens 754. In the first positioning unit 73, the first fixed end 73a and the first twist The first positioning lens 734 of the element 731 is based on the aforementioned yellow light lithography The one-piece processer's material is usually poly-silicon with appropriate elasticity; the first fixed end 73a is fixed to the silicon substrate 71; the second torsion element 731 is set in a horizontal suspension manner. At the first fixed lens' 73a, the first position lens 734 is the center of the first torsion element γη = an extension in the horizontal direction; a first soft magnetic alloy (permaU) is further disposed on the first positioning lens 734. 〇y) 732, the first soft magnetic alloy is formed by a sputtering or electroplating process, and is fixed on the first positioning lens 73; the first side 735 is in phase with the first torsion element 731 vertical.

Page 20 522255 House violation-MMQ48 V. Description of the invention (17) In the second positioning unit 74, the second fixed end 74a, the second torsion element 741, and the second positioning lens 744 are integrally formed by the aforementioned yellow light lithography process. 'The material is usually poly-si Ucon with appropriate elasticity; the second fixed end 74a is fixed on the silicon substrate 71' The second torsion element 7 41 is provided on the second by horizontal suspension The fixed end 74a, and the second torsion element 741 is parallel to the first torsion element 73}; the second positioning lens 744 is an extension of the central portion of the second torsion element 741 in the horizontal direction, and the second The positioning lens 744 and the first positioning lens 7 3 4 are disposed between the first torsion element 7 31 and the second torsion element 7 41. A second soft magnetic alloy (permalloy) is further disposed on the second positioning lens 744. 742, the second soft magnetic alloy 742 is fixed on the second positioning lens 744 by a sputtering or eiectroplating process; the second side 745 is perpendicular to the second torsion element 741. In the reflection unit 75, the third fixed end 75a, the fourth fixed end 75b, the third torsion element 751, and the reflection lens 754 are integrally formed by the aforementioned yellow light lithography process, and the material thereof is usually a polycrystal with appropriate elasticity; ^ (poly-silicon); the third fixed end 75a and the fourth fixed end 75b are separated by an appropriate distance, and are respectively fixed on the silicon substrate 71, and the third torsion element 7 5 1 is suspended horizontally The mode is set between the third fixed end 75a and the fourth fixed end 75b, and the third torsion element 751 is perpendicular to the first torsion element 731 and the second torsion element 741; the The reflection lens 754 is an extension of the central portion of the third torsion element 751 in the horizontal direction, and the reflection lens 754 and the first positioning unit 73 and the second positioning unit

Page 21 522255 a Case No. 90108048 ___ill Month A—Sunday 5th, invention description (18) 74 are respectively provided on opposite sides of the third torsion element 75 1; a reflection lens 754 is further provided with a The third soft magnetic alloy (permalloy) 752 is fixed on the reflective lens 754 by a sputtering or electroplating process, and the reflective lens 7 5 4 is further provided with a The reflection area 7 5 3 is a highly flat reflection area on the reflection lens 7 5 4, which can provide the function of changing the light path after the incident light is reflected by the reflection area 754. Please refer to FIG. 18 and FIG. 19, which are three-dimensional schematic diagrams of the vertical positioning unit 70 swinging to the vertical position and the vertical positioning respectively, which are the second preferred practical examples of the present invention. When the micro-coil 76 is activated, the first The positioning principle of a positioning unit 73, φ the second positioning unit 74 and the reflection lens 754 is the same as the principle described in the vertical positioning unit 40 of the first preferred practical example in FIG. 11, FIG. 12, and FIG. the same. Referring to FIG. 18, when the first positioning lens 7 3 4 and the second positioning lens 7 4 4 swing from a horizontal position to a vertical position, respectively, the first positioning lens 734 and the second positioning lens 744 are respectively due to quality. The speed of swinging from the horizontal position to the vertical position is slightly faster, so the process of swinging the first positioning lens 734 and the second positioning lens 7 44 to the vertical position is slightly ahead of the reflection lens 44. First, please refer to FIG. 19, and please refer to FIG. 20, which is a front view of the vertical positioning of the second preferred practical example of the vertical positioning unit 70 of the present invention. When the first positioning lens _ sheet 734 and the second positioning lens W4 are smaller than the reflecting lens 754, respectively, the first positioning lens 734 and the second positioning lens W4 are respectively swung to a position slightly exceeding the vertical position than the reflective lens 754, due to the first torsion element. 731 and the second torsion element · 741 are in a horizontal position, and the first side 735 and the second side are

Page 22 522255 m ^ 9〇〇〇〇〇48. V. Description of the invention (19) is perpendicular to the second torsion element 741, so when the reflecting lens 754 is later adapted to the inertia of the swing as shown in FIG. When the phenomenon swings beyond the vertical position, the first side edge 735 of the first positioning lens 734 and the second side edge 7d5 of the ^ 744 provide a Kagu imitated 754 cannot exceed the vertical V position; The acre is straight, and the reflection lens 754 is positioned vertically. Home. The support of the Meng Zhimao as early as 70 can reflect the reflection 4 .fli 'Ming Figures 21 and 22, from the experimental results can be: the greater the width of the' the greater the shear stress it bears, and the torsional element The longer the length, the smaller the shear stress it bears. The above descriptions are only preferred embodiments of the present invention, and should not fall within the scope of the present invention when they depart from the spirit of the present invention. = Yin Shi's invention has not been seen in any public venue before the application. Important: The case has a "practical, new, and progressive" new patent grant date. Two McFarland filed a new patent application. Pray Your reviewing committee issued a review of $ A Huiyun and granted a patent early.

Page 23 522255 j No. 90108048 ——G a Correction Brief description of the diagram Explanation: Figure 1 is a three-dimensional schematic diagram of the conventional microlens swinging device 10. Fig. 2 is a front view of a conventional microlens swinging device 10; Fig. 3 is a schematic view of a conventional microlens swinging device 10 in a horizontal position. FIG. 4 is a schematic diagram of a conventional technology balance micro-lens swinging device 10 swinging from a horizontal direction to a vertical direction. FIG. 5 is a schematic diagram of a conventional microlens swinging device 10 swinging to a rest position 18. FIG. 6 is a schematic view of a conventional technology microlens swinging device 10 located at a stationary position 18. Fig. 7 is a schematic diagram of a conventional microlens swing device 10 that swings to a horizontal position. FIG. 8 is a schematic diagram of a conventional microlens array 20. Fig. 9 is a perspective view of a first preferred practical example of the microlens positioning device 3 of the present invention. Fig. 10 is a front view of a first preferred practical example of the microlens positioning device 3 of the present invention. Fig. 11 is a schematic view showing the horizontal position of the first preferred practical example of the microlens vertical positioning unit 40 of the present invention. Figure 12 is a schematic diagram of the first preferred practical example of the vertical positioning unit 40 of the present invention swinging from the horizontal direction to the vertical direction.-Figure 13 is a schematic diagram of the vertical preferred position of the first preferred practical example of the vertical positioning unit 40 of the present invention. .

Page 24 522255 Amendment No. 90108048 Brief description of drawings Figure 14 is a schematic diagram of the conductive state of the 50th first preferred practical example of the horizontal positioning unit of the present invention. Fig. 15 shows the non-conductive state of the first preferred practical example of the horizontal positioning unit 50 of the present invention. Fig. 16 is a front view of the first preferred practical example of the interference-free unit 60 of the present invention. Fig. 17 is a perspective view of a second preferred practical example of the vertical positioning unit 70 of the present invention. Fig. 18 is a schematic perspective view of the second preferred practical example of the vertical positioning unit 70 of the present invention swinging to a vertical position. Fig. 19 is a schematic perspective view of the vertical positioning of the second preferred practical example of the vertical positioning unit 70 of the present invention. Fig. 20 is a front view of the vertical positioning of the second preferred practical example of the vertical positioning unit 70 of the present invention. Fig. 2-is the relationship between the width and thickness of the torsion element of the present invention and the maximum shear stress. Fig. 22 is a graph showing the relationship between the length and thickness of the torsion element of the present invention and the maximum shear stress. Reference Number Description: 1 0-Conventional technology micro lens swinging device 1 1-Broken substrate 1 2 a-First fixed end 12b-Second fixed end 1 2 1-Twisting element

Page 25 522255 _Case No. 90108048 Leap Year > Yue Shi Yue Correction _ Simple Description 1 4-Reflective Lens 1 4 1-Soft Magnetic Alloy 1 4 2-Reflective Area 1 5-Stopper 1 6-Micro Coil 1 6 1-magnetic flux density 1 6 3-magnetization 164-repulsion 1 7-vertical position 1 8-rest position 2 0-micro lens array 20A, 20B, 20C, 20D-light source 20E, 20F, 20G, 20H-sensing unit 213 22, 2 3 2, 244-microlenses (vertical state) 21, 212, 214, 222, 223, 224, 231 > 233, 234, 24 2 2 4, 243-microlenses (horizontal state) 3-micro Lens positioning device 4 0 _vertical positioning unit 4 1-broken substrate 42a-first fixed end 42b-second fixed end 421-first twisting element 42 2-second twisting element 4 3-positioning lens 4 3 1-first Soft magnetic alloy

Page 26 522255 Case No. 90108048 Brief description of the diagram 433-First repulsive force 44-Reflective lens 44 1 -Second soft magnetic alloy 4 4 2 -Reflective area 443-Second repulsive force 4 5 -Block 4 6 _Microcoil 5 0 -Horizontal positioning unit 4 7 -Convex plate 52a ~ * First electrode 52b-Second electrode 5 2 1 -First cantilever 5 2 2-Second cantilever 5 2 3 -Connecting cantilever 5 3-Ring 4 4 -Positioning lens 431-first soft magnetic alloy 44-reflection lens 44 1 -second soft magnetic alloy 6 0-interference-free unit 6 first conductive film 6 2-second conductive film 6 3-first power supply 64-second power supply 7 0- Vertical positioning unit

Page 27 522255 Case No. 90108048 厶 S Modified drawing simple description 7 3-First positioning unit 73a-First fixed end 731-First torsion element 7 3 2-First soft magnetic alloy 734-First positioning lens 7 3 5-First side 74-Second 74a-741-742- 744-74- 5-Positioning unit 2 Fixed end 2 Twisting element 2 Soft magnetic alloy 2 Positioning lens 2 Side 7 5-Reflecting unit 75a -Third fixed end 75b-Fourth fixed end 751-Third torsion element 752-Third soft magnetic alloy 7 5 3-Reflective area 7 5 4-Reflective lens 7 6-Micro-coil 7 7-Stopper

Page 28

Claims (1)

522255 1 (丨 Case No. 90108048_. Rev. d, dd, dd, ___ ㈣ ㈣ ～ 一 一 一 六 六, Patent application scope 1 -------- L A micro lens positioning device, which can be used in the vertical direction of micro lenses The positioning includes: a substrate; a fixed unit having a first fixed end and a second fixed end, the first fixed end and the second fixed end are fixed to the substrate at an appropriate distance; A magnetic unit is disposed at an appropriate distance below the substrate; a positioning unit includes: a first torsion element, which can be horizontally suspended on the first fixed end and the second fixed end In between, the central portion of the first torsion element can extend horizontally to an appropriate distance to one side thereof, and a first plane and a second plane are provided thereon; and a first magnetic induction unit is fixed On the first plane or the second plane and can be sensed by the magnetic unit; and a reflection unit comprising: a second torsion element which is parallel to the first torsion element and spaced apart from each other by a suitable distance; When the distance is between the first fixed end and the second fixed end in a horizontal suspension manner, the central portion of the second torsion element extends a suitable distance to one side in a horizontal suspension manner, and it is provided with a The third plane 0 and a fourth plane; and a second magnetic induction unit, which is fixed on the third plane or the fourth plane and can be sensed by the magnetic unit. 2. As the first item of the scope of patent application The said micro lens positioning device, wherein the 29th page 522255 _ case number 90108048 _ month ^ ^ day 绦 _ _ 6, the scope of the patent application The first plane and the second plane can be parallel to each other. 3. If applying for a patent The microlens positioning device according to item 1 of the scope, wherein the third plane and the fourth plane are parallel to each other. 4. The microlens positioning device according to item 1 of the patent application scope, wherein the second torsion element is below It may further include a stopper. 5. The microlens positioning device according to item 1 of the scope of patent application, wherein the magnetic unit may be a microcoil. 6. The microlens positioning according to item 1 of the scope of patent application Device where The first magnetic induction unit may be a soft magnetic alloy. 7. The micro-lens positioning device according to item 1 of the scope of the patent application, wherein the second magnetic induction unit may be a soft magnetic alloy. 8. The scope of the patent application The microlens positioning device according to item 1, wherein the third plane may be a reflection plane. 9. The microlens positioning device according to item 1 of the patent application scope, wherein the fourth plane may be a reflection plane 10. The micro-lens positioning device according to item 1 of the scope of the patent application, wherein the first torsion element, the second torsion element, the stopper, the positioning lens, the reflection lens, and the broadcast block may be polycrystalline stones ( P 〇1 y-si 1 ic ο η), and can be integrated by the yellow light lithography process. 11. A micro-lens positioning device, which can be used for positioning the micro-lens in the vertical direction, includes: a substrate; a magnetic unit, the magnetic unit is located at an appropriate distance below the substrate; page 30 522255 case number 90108048 6. The patent application scope includes at least one positioning unit, which further includes: a first torsion element, which is a thin plate structure extending horizontally? A first fixing element is provided at one end of the thin plate-like first torsion element, which is fixed. On the substrate, the first torsion element can be planted with the fixing element as an axis. A first magnetic induction element is fixed to a side of the first torsion element farther from the fixing element; and at least one reflection unit, more It includes: a second torsion element, which is a tiltable thin plate structure extending in the horizontal direction. A second fixing element and a third fixing element are provided on both sides of one end of the thin plate-like second torsion element, which are separated by one Proper distance It is fixed on the substrate, so that the second torsion element can be pivoted at the same time with the second fixing element and the third fixing element as axes; a second magnetic induction element, which is fixed to the second torsion element and is farther away from the second fixing. The side of the element and the third fixing element; wherein the first torsion element further has a first side edge, and the first side edge is disposed on the side of the first torsion element that is closer to the second torsion element. 12 • The micro-lens positioning device according to item 11 of the patent scope, wherein the positioning unit includes a first positioning unit and a second positioning unit and the pivot of the first positioning unit and the second positioning unit The pole rotation axes of the positioning unit are parallel. 13. The microlens positioning device as described in item 11 of the patent scope, wherein the second twisting element may further include a load below. 14 • The micro lens positioning device as described in item 11 of the patent scope, where page 31 is 522255 ^ _ Case No. 90108048 Amended on October 11, 91 _ 6. The scope of patent application The magnetic unit can be a micro Coil. 15. The micro-lens positioning device according to item 11 of the scope of patent application, wherein the first magnetic induction element is a soft magnetic alloy. 16. The micro-lens positioning device according to item 11 of the scope of patent application, wherein the second magnetic induction element may be a soft magnetic alloy. 17. The microlens positioning device according to item 11 of the scope of the patent application, wherein the first torsion element can be polycrystalline stone (ρ ο 1 y-si 1 ic ο η), and can be borrowed by yellow light lithography Integrated process molding. 18. The microlens positioning device according to claim 11 in claim 11, wherein the second torsion element may be polycrystalline stone (ρ 〇1 y-si 1 ic ο η), and is f Can be integrated by the yellow light lithography process. 19. The microlens positioning device according to item 11 of the scope of patent application, wherein the first torsion element is further provided with an opening at a position closer to the first fixing element. 20. The microlens positioning device according to item 11 of the scope of patent application, wherein the pivot axis of the first torsion element is perpendicular to the pivot axis of the second torsion element, and the first side is connected to the first torsion The pivot axes of the components are perpendicular. 2 1. The micro lens positioning device described in item 1 or item 11 of the scope of patent application, further comprising an interference-free unit, and the interference-free unit includes a power source, the power source has a power source One end and a second end of a power source; a first conductive unit, the first conductive unit may be disposed on a vertical Amendment on page 32 522255 Case No. 90108048 6. The patent application scope of the direct positioning device is electrically connected to the first end of the power supply; and a second conductive unit, the second conductive unit can be arranged in phase with the first conductive unit A corresponding substrate is electrically connected to the second terminal of the power source. 2 2. The vertical positioning device according to item 21 of the scope of patent application, wherein the first end of the power supply may be the positive end of the power supply, and the second end of the power supply may be the negative end of the power supply. 2 3. The vertical positioning device as described in item 21 of the scope of patent application, wherein the first end of the power supply may be the negative end of the power supply, and the second end of the power supply may be the positive end of the power supply. 24. A micro-lens positioning device, which can be used for positioning the micro-lens in the horizontal direction, includes: a power source, the power source having a positive power source terminal and a negative power source terminal; an electrode unit including a first electrode and a A second electrode, the first electrode and the second electrode system are respectively fixed on a first plane at an appropriate distance, are electrically connected to the positive terminal of the power source and the negative terminal of the power source, and a positioning unit, It includes a first cantilever, a second cantilever, and a connecting cantilever. The first cantilever and the second cantilever are separated by an appropriate distance. The first ends of the two are fixed to the first electrode in a horizontal suspension manner. And the second electrode, and the second ends of the two are also connected to the two ends of the connecting cantilever in a horizontal suspension manner, the positioning unit forms a horizontal suspension between the first electrode and the second electrode Of the conductive circuit. 25. The micro-lens positioning device according to item 24 of the scope of patent application, wherein a second tenon is further provided on the side of the second end of the first cantilever. Page 33 Case No. 90108048 Amendment 522255 f (January, P.Y., patent application scope 26. The micro lens positioning device according to item 24 of the patent application scope, wherein the cross-sectional area of the second cantilever is greater than the cross-section area of the first cantilever Cross-sectional area. 2 7. The microlens positioning device as described in item 24 of the scope of patent application, further comprising a convex plate protruding from a vertical positioning device. 2 8. As item 24 of the scope of patent application The micro-lens positioning device, wherein the first electrode, the second electrode, the first cantilever, the second cantilever, the connecting cantilever and the tenon can be made of conductive materials, as described in item 28 of the scope of patent application. The micro-lens positioning device, wherein the first electrode, the second electrode, the first cantilever, the second cantilever, the connecting cantilever and the tenon can be a copper alloy, and can be integrally formed by the yellow light lithography process. 3 (K 如The micro-lens positioning device according to item 28 of the scope of the patent application, wherein the first electrode, the second electrode, the first cantilever, the second cantilever, the connecting cantilever and the tenon can be a gold alloy, and can be borrowed by Huangguang Process one Body shaper. Page 34