TW508379B - Binart controller for crystal body - Google Patents

Binart controller for crystal body Download PDF

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Publication number
TW508379B
TW508379B TW88117857A TW88117857A TW508379B TW 508379 B TW508379 B TW 508379B TW 88117857 A TW88117857 A TW 88117857A TW 88117857 A TW88117857 A TW 88117857A TW 508379 B TW508379 B TW 508379B
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Taiwan
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diameter
seed crystal
crystal
temperature
operation amount
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TW88117857A
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Chinese (zh)
Inventor
Shuji Onoue
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Komatsu Denshi Kinzoku Kk
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20Controlling or regulating
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20Controlling or regulating
    • C30B15/22Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

A binary controller for a crystal body used for a single crystal pull-up production method represented by the Czochralski method for converging the crystal growth diameter and the seed lift speed to their desired values. The seed lift speed controlled variable (SLC) and the temperature controlled variable (TC) are generated independently of each other on the basis of the deviation signal (DEV) of the diameter control parameter. As a result, the seed lift speed acts on the convergence of the crystal growth diameter, and the temperature controlled variable suppresses the variation of the shortage of heat energy and converges the seed lift speed varied by the convergence action of the crystal growth diameter. Hence the binary control of both the crystal growth diameter and the seed lift speed are preferably achieved.

Description

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二數值控制裝 之有效之單 曰曰 為代表 與上拉 為成為 與上拉 步中, 諸種技 有之效 液加熱 加熱器 炫液之 (以下, 單晶體 I )之凝 晶體之 直徑係 熱器之 徑收斂 將上拉 之單結 該單晶 重要之 速度之 而可發 術係分 果。以 用之加 之溫度 界面所 •稱為 每單位 固潛熱 重量變 對應於 溫度, 於期望 速度固 MM 88117RR7 五、發明說明(1) 【發明所屬之技術領域 本發明係關於單晶體之 於安定之二數值控制之達成 之達成。 【習知技術】 在以恰克勞斯基(cz)法 中’所製造之單晶體之直徑 係在決定單晶體之品質上成 因而,在從前,使直徑 之值之CZ法之開發,係在進 實施之方法。該等被開發之 有興味之特徵,而可達成特 代表性之特徵。 第一技術係只使變化熔 控制單晶體之成長直徑。使 因為可控制從上拉單晶體和 流入該界面近旁之熱量之差 即’不足熱量係關連於決定 量(以下、稱為「固化重量_ 要該不足熱量一增加,則單 重。其結果,單晶體之成長 變為更大。因而,若提高加 少,則可使單晶體之成長直 在該當技術中,因為可 置,特別是,關 體之二數值控制 晶之上拉製造法 體之速度之履歷 參數。 雙方收斂於期望 現到有幾種已被 別具有特有之很 下,說明該等之 熱器之溫度,而 變化之理由,係 放出之熱量,與 「不足熱量」)。 時間所固化之重 與密接,因而只 為比期望之值還 該重量之增加而 而使不足熱量減 之值。 定於期望之值,The effective value of the two numerical control device is to represent and pull up to become and pull up. Various effective liquid heating heaters (hereinafter, single crystal I) condensed crystal diameter of the various types of heaters. Convergence will pull up the single knot to the important speed of the single crystal, and the result can be achieved. It is referred to as the temperature interface. It is called that the latent heat weight per unit solid corresponds to the temperature, and it is solidified at the desired speed. Achievement of control. [Know-how] The diameter of the single crystal manufactured in the czakowski method (cz) is used to determine the quality of the single crystal. Therefore, in the past, the development of the CZ method of the value of the diameter was in progress. Method of implementation. These developed features can achieve special representative features. The first technique is to control the growth diameter of the single crystal only by changing the melting. Because the difference between the pull-up single crystal and the amount of heat flowing into the interface can be controlled, the 'insufficient heat' is related to the determined amount (hereinafter, referred to as "cured weight_ If the insufficient heat is increased, the single weight is obtained. As a result, the single crystal The growth becomes larger. Therefore, if the increase is increased or decreased, the growth of the single crystal can be directly in the technology, because it can be set, especially, the value of the second control of the crystal to control the speed of the manufacturing method of the crystal Parameters: Both parties converge on the expectations that there are several types that have been unique, indicating the temperature of these heaters, and the reason for the change is the amount of heat released, and "insufficient heat"). The weight solidified by time is tight and tight, so the amount of underheating is reduced only to increase the weight by more than the expected value. Set at the expected value,

7054-2811-PFl.ptc 第4頁 2001.12. 06. 005 观379 曰 修正 案號 88U7857 五、發明說明(2) =制對象:口、-個即可’而在慢慢地上拉單晶體之製造 :j中,係、比較上為易於安定之構成。以下,將著眼於進 ΐ t该第一技術之不足熱量之控制系稱為「溫度控制 抑制第晶體之成長直徑以上拉速度之調解來 2制其'纟^果,基於從期望之值偏離之上拉速度之偏差, 之度變化。在該當技術中,因為追縱直徑 術ίϋίΐ 即變化’所以特徵係比起前述第-技 制直徑之控制系為「速度控制;拉=變化而稱呼控 詳細地+ ^ ,制糸 而做為將該第二技術 Ψ A B 獻係有日本專利公報特公昭52-481 1 1 就及日本專利公報特公平7-55878號。 一第三技術係將單晶體之成長直徑以上拉速度來 =導出從上拉開始至結束之加熱器溫度之理相型 :2基於該導出之理想型態、,來控制不足埶量之; ϊ::ί術::因為可將速度控制系與溫度控制系獨立地 斤以係以適於各自之控制系為可能。 【發明所欲解決之課題】 變化::遲i ί: 制s係使用所謂加熱器溫度之 變庳變ρ。因而乂夕工制裝置,所以對於直徑之變動之 曰w釔【又因而,該技術中,係單晶體之上拉迸产# a ^ 之製造,#細、、費數間早曰曰體之製造之鈣•氟等 -不適合於上拉速度快速之石夕等之製造。 方面,第二技術係為現在主流之技術,,若依據該技 7054-281l-PFl.ptc 第5頁 2001.12. 06. 006 5083797054-2811-PFl.ptc Page 4 2001.12. 06. 005 Watch 379, Amendment No. 88U7857 V. Description of the invention (2) = object of manufacture: mouth, only one, and then slowly pull up the manufacture of the single crystal: In j, the structure is relatively easy to stabilize. In the following, the control of the insufficient heat focusing on the first technology is referred to as "the temperature control suppresses the adjustment of the pulling speed above the growth diameter of the second crystal to make its results, based on the deviation from the expected value. The deviation of the pull-up speed varies in degree. In this technology, because the chasing diameter technique changes immediately, so the characteristic is compared to the aforementioned control system of the -technical diameter as "speed control; pull = change, which is called detailed control" The second technology Ψ AB is made by the ground + ^, and the second technology Ψ AB is provided by Japanese Patent Gazette No. 52-481 1 1 and Japanese Patent Gazette No. 7-55878. A third technology is the growth of a single crystal The pulling speed above the diameter comes from the rational phase type that derives the heater temperature from the beginning to the end of the pull-up: 2 Based on the ideal type of the derivation, to control the insufficient amount; ϊ :: ί 术 :: Because the speed can be adjusted The control system and the temperature control system are independent to make it possible to adapt to the respective control system. [Problems to be solved by the invention] Variation:: Chi i ί: The system s uses the so-called heater temperature change ρ. Therefore, Xixi work system, With respect to the change in diameter, yttrium [and therefore, in this technology, the production of #a ^ produced on a single crystal, #fine, expensive, calcium, fluorine, etc.-not suitable For the production of Shi Xi, etc., which has a fast pull-up speed. In terms of the second technology is the current mainstream technology, if based on this technology 7054-281l-PFl.ptc Page 5 2001.12. 06. 006 508379

五、發明說明(3) 修正 術’則藉由上拉速度之變化,而可合適地控制單晶體之成 長直徑。此係因為對於上拉速度之變化之直徑之響應係比 起對於加熱器溫度之變化之直徑之響應,無效時間和一次 延遲之時間常數為較小,所以上拉速度之操作即可反映於 直徑之收敛動作。 該第二技術之速度控制系係在光學式之場合時,為以 、「比例項+積分項+微分項」構成。在重量式之場合時,為 =「、比例項+微分項」構成。在此,光學式之積分項與重 夏式之比例項係任一個均為響應於單晶體之直徑變動之履 歷之要素,該速度控制系係於熱的環境為一定之場合時, 以使對於目標值之定常偏差收斂於〇之一形之轉移函數(關 於轉移函數之形之定義容後敘述)來加以表現。因而,為 控=目標之單晶體之直徑係藉由上拉速度之變化,而可以 無定常偏差地收斂於目標值。 rfq 於 拉速度 於目標 成二數 及於因 單晶體 換 之剖面 目標值 望之直 係於與 值,但 值控制 加熱器 之固化 言之, 面積和 之功能 徑和上 直徑之 其目標 因為上 。此係 溫度與 重量係 上拉速 上拉長 ,所以 拉速度 值之間 拉速度 因為即 坩堝之 仍舊從 度雖係 度之兩 在由可 之理想 使上拉速 產生偏差 係從目標 使上拉速 位置所決 目標值偏 具有將固 成分,但 將實際之 值而偏離 度變化之結 。即,直徑 值偏離,所 度變化,也 定之不足熱 離。 化重量分配 無使固化重 固化重量維 之場合時, 果,該上 雖係收斂 以無法達 無法影響 量,所以 於單晶體 量收斂於 持於所期 上拉速度V. Description of the invention (3) Correction technique 'The growth diameter of a single crystal can be appropriately controlled by changing the pull-up speed. This is because the response to the change in diameter of the pull-up speed is smaller than the response to the change in temperature of the heater. The time constant of the invalid time and the primary delay is smaller, so the operation of the pull-up speed can be reflected in the diameter. Of convergence action. The speed control of this second technique is composed of "proportional term + integral term + differential term" in the case of optical type. In the case of the weight formula, it is composed of "", proportional term + differential term ". Here, any of the integral term of the optical type and the proportional term of the heavy summer type are elements of the history in response to the diameter change of the single crystal, and the speed control is performed when the thermal environment is constant so that The constant deviation of the value converges to a 0-shaped transfer function (the definition of the shape of the transfer function is described later). Therefore, the diameter of a single crystal that is equal to or equal to the target can converge to the target value without a steady deviation by the change of the pull-up speed. rfq The pulling speed is doubled to the target and the target value of the profile for single crystal is directly tied to the and value, but the value controls the curing of the heater. In other words, the area and the function diameter and the upper diameter are the goals. This series of temperature and weight is based on the pull-up speed, so the pull speed value is the crucible, although the two degrees of the crucible still depend on the degree of the pull-up speed. The target value determined by the speed position will have a solid component, but the actual value will change the deviation. That is, the diameter value deviates, and the degree of change is also determined to be insufficient. When the weight distribution does not make the solidification weight solidify the weight dimension, the result, although it is converged so that the quantity cannot be reached cannot affect the quantity, so the single crystal quantity converges to the desired pull-up speed.

508379 修正 η 曰 案號 88117RR7 £、發明說明(4) 成為具有偏差。 在一般之上拉裝置中,係與上拉同時使坩堝上升, 2將熔液之液位做為一定之液位一定控制。目而 係因為由於該坩堝之上升而經常變動,所以無法維持 而ίΐ想Ϊ值。此係意味著上拉速度追蹤不足熱量之變動 ::有偏差。在此,因為掛網之位置係決定單晶 = =的ΐ數,所以無法做為單晶體之直徑及上拉速度: 控制裝置來使用。 < 度之 在此’在上述習知技術中,係以採用藉由 系以級聯連接於速廑柝制金 + A ^ m :Γ 糸’來使單晶體之直徑收斂,而 α * 產之上拉速度之偏差之構成。該級聯控制系 :上1速度之偏差輸入於溫度控制系,而在該溫度in' 執行pid運算,而控制加熱器之溫度者。 制糸 然而,於上述級聯控制係不論如何執行加埶琴之、、w $ ”’上拉速度仍然會有所謂之誤差之問題存 :細予以說明’而在液位-定控制之上拉11了;ίϊ 熱量做為一定之理相的如刼w 馬ί寻不足 夕了机 m ^的加熱益之溫度型態係成為一次以上 值為-次函數(斜率場ίΓΓ:可考慮成目標 . π/ - # j t 時,在一形控制系中係具有定 *偏差’而在-形控制系中則成為無定常偏差, 在曰本專利公報特公昭5 ? 中,係將重量偏差輸入於PID運I ^ 5己載之級聯控制 .^ 甘運异放大器和plD運算放大器 之級聯,而給予其輸出做為加熱 該當級聯控制係因為構成一妒柝:/凰=呆作虿。因而, 成形控制,所以重量偏差具有定508379 Amend η Case No. 88117RR7 £, Invention Note (4) becomes biased. In a general pull-up device, the crucible is raised at the same time as the pull-up. 2 The liquid level of the melt is controlled as a certain level. This is because the crucible is constantly changing due to the rise of the crucible, so it cannot be maintained. This means that the pull-up speed tracks the change of insufficient heat :: There is a deviation. Here, because the position of the hanging net determines the number of single crystals = =, it cannot be used as the diameter and pull-up speed of the single crystal: the control device. < Here is the degree 'In the above-mentioned conventional technique, the diameter of a single crystal is converged by adopting a cascade connection to Susaki Gold + A ^ m: Γ 糸', and α * yields The composition of the deviation of the pull-up speed. The cascade control system: the deviation of the speed of 1 is input to the temperature control system, and the pid operation is performed at this temperature in ', and the temperature of the heater is controlled. However, in the above cascade control system, no matter how to perform the rigging, there is still a so-called error problem in the "pull-up speed": explain it in detail, and pull on top of the level-fixed control. 11; ί ϊ 做 理 马 马 马 寻 w Ma 寻 find the temperature of the heating benefit of the machine m ^ The temperature pattern of the heating benefit becomes a function of more than one value (slope field ΓΓΓ: can be considered as the target. In the case of π /-# jt, the system has a constant * deviation 'in the one-shape control system and an unsteady deviation in the -shape control system. In Japanese Patent Gazette No. 5?, the weight deviation is input into the PID. Operation I ^ 5 has cascaded control. ^ The cascade of the Gan Yunyi amplifier and the plD operational amplifier, and the output is given as a heating. The cascade control system constitutes a jealousy: / phoenix = dumb work. Therefore , Forming control, so the weight deviation has a fixed

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在此’即使重量偏差具有定長偏差,但若重量偏差為 一定’則單晶體之直徑並不帶有定常偏差。因而,可看成 在上述習知技術中,係因為將重量偏差之「比例項+微分 項」做為上拉速度之操作量,所以該比例要素使定常偏差 產生於上拉速度’而導致二數值控制為失敗之要因。 另一方面,在揭示另外之級聯控制之日本專利公報特 公平7-55878號中,係將直徑偏差輸入以2段之piD運算放 大器構成之速度控制系和溫度控制系之級聯控制,並將該 輸出給予做為加熱器溫度之操作量。因而,雖可考慮及該 當控制系係因為對於直徑偏差而構成二形控制系,所以單 晶體之直徑係不帶有定常偏差,但本發明者根據實驗而可 確認該控制系係帶有上拉速度之偏差。 因為藉由溫度控制系之轉移函數為一形之上述級聯控 =,而將加熱器溫度之操作量配合理想的加熱器溫度型玉 態、例如一次函數,所以可了解上拉速度經常帶有定常偏 差。此係可考慮為上拉速度從目標值偏離而帶有定常偏差 3由:在該當構成中,可看成速度控制系之積分要素係 導致二數值控制為失敗之要因。 為了解決上述問題,雖可考慮及於溫度控制系設置 2〜3段積分要素(延遲要素),而使上拉速度收斂於目標 ,^但如此地於溫度控制系設置多段之延遲要素, 谷易^生所謂蜂鳴(控制不安定)之問題。 還有,在該第二技術中,因為溫度控制系依存於速度Here, even if the weight deviation has a constant length deviation, if the weight deviation is constant, the diameter of the single crystal does not have a constant deviation. Therefore, it can be seen that in the above-mentioned conventional technology, the "proportional term + differential term" of the weight deviation is used as the operation amount of the pull-up speed, so the proportional element causes the constant deviation to occur at the pull-up speed, resulting in Numerical control is the cause of failure. On the other hand, in Japanese Patent Gazette No. 7-55878, which discloses another cascade control, the diameter deviation is input to the cascade control of the speed control system and the temperature control system composed of a two-stage piD operational amplifier, and This output is given as an operation amount as a heater temperature. Therefore, although it can be considered that the control system constitutes a dimorphic control system because of the deviation in diameter, the diameter system of the single crystal does not have a constant deviation, but the inventor can confirm that the control system has a pull-up speed based on experiments. The deviation. Because the transfer function of the temperature control system is the above-mentioned cascade control =, and the operation amount of the heater temperature is matched with the ideal heater temperature type jade state, such as a linear function, it can be understood that the pull-up speed is often accompanied by Steady deviation. This system can be considered as the deviation of the pull-up speed from the target value with a steady deviation. 3 Reason: In the proper configuration, it can be regarded as the integral factor system of the speed control system that causes the binary value control to fail. In order to solve the above problem, although it may be considered that the temperature control system is provided with 2 to 3 stages of integration elements (delay elements), so that the pull-up speed converges to the target, ^ However, in this way, the temperature control system is provided with multiple stages of delay elements. Gu Yi The problem of so-called beeping (unstable control). In this second technique, temperature control is dependent on speed.

案號 88117857 五、發明說明(6) 控制系之構成,即溫 接’所以分別構成最 為適於溫度控制系之 數係互相不同,因而 屬,則溫度控制系之 拘束。 一方面,在在該 存於預定之理想型態 缺點。即,單晶體周 而各個裝置之理想型 多。因此,即使是在 態,但卻無法使用在 難0 度控制系 適之控制 轉移函數 要將溫度 没計自由 第三技術 ,所以會 邊之熱環 態從該預 某一裝置 其他之裝 與速度控制系為以級聯連 系係有所困難。總之,係因 與適於速度控制系之轉移函 控制系做為速度控制系之從 度係被速度控制系之構成所 中’因為不足熱量之控制依 有所謂適應環境變化較弱之 土兄係母一裝置均為相異,因 先導出之型態偏離之情形很 中得到適合之結果之理想型 置,因而實用化係有所困 而且,於理想型態之導出係因為需要报多之 以要每一裝置來作成理想型態係也有所困難,嬖如, 是作成但是受上拉時之爐内零件之設定、加熱^ 堝之時刻變化、水溫、及氣溫等之左右,還H L、 . 型態偏離。 Μ㊣ 單晶體之上拉速度係不僅在每一單晶體之直押 域之尺寸為不同,即使在所製造之品種也有所不^,U…、項 該等要素之乘法部分之理想型態係有所必要。再者,所以 時刻變化係將理想型態之小變化做為必要,而對’上述 要理想型態之反覆導出。 用者強 從如上述之理想型態偏離係不足熱量成為 1文垤想值偏Case No. 88117857 V. Description of the invention (6) The structure of the control system, that is, the temperature connection, so that the number systems that are most suitable for the temperature control system are different from each other, and therefore belong to the constraints of the temperature control system. On the one hand, there are shortcomings in the ideal form of existence. That is, there are many ideal types of single crystal devices. Therefore, even if it is in the state, it cannot use the control transfer function that is suitable for the difficult 0 degree control system. The third technology is to measure the temperature without freedom. Therefore, the thermal loop state will be changed from the other equipment and speed of the device. Control systems have difficulty cascading. In short, the reason is that the transfer function control system suitable for the speed control system is used as the compliance system of the speed control system by the composition of the speed control system. 'Because the control of insufficient heat is based on the so-called soil system that is weaker in adapting to environmental changes. The mother and one device are all different. Because the situation of the type deviation that is derived first is the ideal type that obtains a suitable result, the practicality is difficult. Moreover, the export of the ideal type is due to the need to report more. It is also difficult for each device to make the ideal type. For example, it is made but is affected by the setting of the parts in the furnace when it is pulled up, the time of heating the pot, the temperature of the water, and the temperature, etc. . Type deviation. Μ㊣ The pull-up speed of single crystals is not only different in the size of the direct pressing region of each single crystal, but also varies in the variety produced. The ideal form of the multiplication part of U ... necessary. In addition, the change in time is necessary to make small changes in the ideal form, and iteratively derives the above-mentioned desired form. The user deviates from the ideal pattern as described above, and the lack of heat becomes 1 text.

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號 88117857 五、發明說明(7) f之原因,不足熱量之偏 來影響。當栗曰騁干日日販之成長直徑帶來咿 當第二姑t 日日_ 長直徑一從目標值偏離,則有關該 目標值,並使上拉速度變/匕應;:;體”長直徑收斂於 第二枯+軚值,仁拉速度卻從目標值偏離,而與前述乏一 一盘付:樣,成為無法達成直徑與速度之二數值控制。 如以下。 之概办整理上述問題點,則成有 制,Ιί,單ί體之二數值控制係直徑與上拉速度之控 化,而將固化重量做為一定之;:二 次以上之函數。 疋之加熱态皿度之理想型態係一 因而,為了於直徑與上拉速度不帶有定當傯蕈 ^到作用於上拉速度之轉移函數需要為二形以上。而考 要辛但i,因為重量偏差信號係於其自體具有直徑之積分 =所以關於直徑㈣’對於重量偏差信號若構成:: i之f]可考f、對於直徑要素來構成二形之控制系。前 之控制系係對於直徑或直徑要素,而構成二形ϊ 二制糸,而具有消除直徑之定常偏差之功能。 '之 不構2而,從上拉速度視之轉移函數係一形之控制系,並 考庹形之控制糸。因% ’於上拉速度產生偏離,而i 上拉速度帶有定常偏差之所謂之於習知技術 生之共通之第一問題點。 , 所No. 88117857 V. Description of the invention (7) The reason for f is due to the lack of heat. When the chestnut says that the growth diameter of the dry day-day vendor brings the second day of the day, the long-day diameter will deviate from the target value, and the target value will be changed, and the pull-up speed will be changed. The diameter converges to the second dry value + 軚 value, but the Ren pull speed deviates from the target value, which is different from the previous one. It becomes impossible to achieve the two numerical control of diameter and speed. As follows. The point, it becomes a system, the value control of I, the single body is controlled by the diameter and the pull-up speed, and the curing weight is made a certain function: a function of more than two times. Because of the fact that the diameter and the pull-up speed do not have a proper function, the transfer function that acts on the pull-up speed needs to be more than two-shaped. The test must be sin but i, because the weight deviation signal is based on its own The body has the integral of the diameter = so about the diameter ㈣ 'for the weight deviation signal if :: i of f] can be considered f, for the diameter element to form a two-shaped control system. The former control system is for the diameter or the diameter element, and Constitutes two-shaped ϊ The function of the constant deviation of the diameter. 'No structure 2', the transfer function from the pull-up speed depends on the shape of the control system, and consider the control of the shape. Because of the% 'deviation in the pull-up speed, and i The so-called first problem common to conventional technology students is that the pulling speed has a steady deviation.

508379 案號88117沾7 五、發明說明(8) 且有=亩3習知之控制系係於速度控制系之轉移函數 制之積分要素,㈣有可以上拉速度來控 二::iPID係以級聯連接於第一定值控制piD。、:2, 到會有兩刪D所干涉之第二問㈣產±。 考慮508379 Case No. 88117 Zhan 7 V. Description of the invention (8) And there is an integral element of the transfer function system of the speed control system, which is known as Mu3. There is a pull-up speed to control the second: :: iPID is a level Connected to the first fixed value control piD. : 2, there will be a second question about the interference between D and ±. consider

之前β t ΐ π t 一部裝置中,係於前述第二定值控制p 1D 拉速度視之轉移迅數制功能,而構成從上 構成:為二形之控制系者。然❿,在該當 積八:去視之轉移函數為形成三形,而產生由於 ϊιίίί延遲。因此’可考慮成控制系係為不安定,而 產生會有蜂鳴之第^㈣。 巧+女疋而 之單ΐ:之本::係於達成安定之二數值控制以提供有效 炙早日日體之一數值控制為目的。 【為了解決課題之裝置】 係包ΐ7ίΐ=目的’申請專利範圍第1項所述之發明 體(10)之上:速=量產生裝置(Μ10),產生單晶 度操作量產生f i(M1^ 升速度(SL)之操作量;及溫 、严h曰p 、置(M12),產生操作該單晶體(10)周邊之In the previous β t ΐ π t device, it was based on the above-mentioned second fixed-value control p 1D pulling speed view transfer function, and constituted from above: it is a two-form control system. Of course, in the right product eight: to consider the transfer function to form a three-shape, and the delay due to ϊιίίί. Therefore, it can be considered that the control system is unstable, and there will be a buzzing sound. Qiao + Nuo's Single List: The Original :: The purpose is to achieve a stable two numerical control in order to provide effective numerical control of one of the early sun bodies. [Apparatus for solving the problem] It is based on the invention (10) described in item 1 of the scope of the patent application: "speed = amount generating device (M10)", which generates a single crystal operation amount and generates fi (M1 ^ The operating amount of the lifting speed (SL); and the temperature, strict h, p, set (M12), to produce the operation around the single crystal (10)

Li 自之日,日ii直徑(GD)及種晶上升速度(sl)收斂於各 (M14),檢測斟、姓、曰徵在於包括:直徑控制參數檢測裝置 直徑控制參數成長直徑(GD)之控制貢獻之參數,即 "少()·’及偏差信號產生裝置(Ml 6),取出前Since the day Li, the diameter (GD) and seed crystal ascent rate (sl) have converged to each (M14). The detection of the diameter, surname, and sign includes: diameter control parameter detection device, diameter control parameter, diameter growth parameter (GD), Control the parameters of contribution, that is, "less () ·" and the deviation signal generating device (Ml 6), before taking out

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述直控控制參數檢測裝置(M丨4)所檢測之直徑控制參數 (CP)與該&直控控制參數(cp)之目標值之差而產生偏差信號 (DEf),前述種晶上升速度操作量產生裝置係基於偏 差栺唬產生裝置(M16)所產生之偏差信號(DEV),而產生前 述種晶上μ升速度(SL)之操作量,即種晶上升速度操作量 (SLC),前述溫度操作量產生裝置(M12)係基於偏差信號產 生裝置(M16)所產生之偏差信號(DEV),而產生前述溫度操 作量(TC)。The deviation signal (DEf) is generated by the difference between the diameter control parameter (CP) detected by the direct control control parameter detection device (M 丨 4) and the target value of the & direct control control parameter (cp). The operation amount generating device is based on the deviation signal (DEV) generated by the deviation bluff generation device (M16), and generates the operation amount of the μ liter speed (SL) on the seed crystal, that is, the seed ascent speed operation amount (SLC), The temperature operation amount generating device (M12) generates the temperature operation amount (TC) based on the deviation signal (DEV) generated by the deviation signal generating device (M16).

而且,申請專利範圍第2項所述之發明係在申請專利 範圍第1項所述之發明中,其特徵在於:前述種晶上升速 度操作量產生裝置(Ml 〇)係以不含有響應於前述結晶成長 直徑(GD)之變動履歷之要素之轉移函數來表現,而將根據 前述偏差信號(DEV)之變動之信號做為前述種晶上升速度 操作量(SLC)而輸出;前述溫度操作量產生裝置(M12)係以 含有積分要素之轉移函數來表現,並將根據前述偏差信號 (DEV)之履歷之信號做為溫度操作量(TC)而輸出。Furthermore, the invention described in item 2 of the scope of patent application is the invention described in item 1 of the scope of patent application, characterized in that the aforementioned seed crystal raising speed operation amount generating device (M10) is responsive to the foregoing without containing The transfer function of the elements of the change history of the crystal growth diameter (GD) is expressed, and the signal based on the change of the aforementioned deviation signal (DEV) is output as the aforementioned seed crystal rising speed operation amount (SLC); the aforementioned temperature operation amount is generated The device (M12) is expressed by a transfer function containing integral elements, and outputs a signal based on the history of the aforementioned deviation signal (DEV) as a temperature operation amount (TC).

而且,申咕專利範圍第3項所述之發明係在申請專利 範圍第2項所述,發明中,其特徵在於:前述直徑控制參 數(CP)為前述单晶體(1〇)所成長之重量,即種晶成長重量 (GW);前述種晶上升速度操作量產生裝置(M1⑸係以 微分要素之轉移函數來表現;前述溫度操作量產生裝置 (Ml 2)係以含有積分要素之轉移函數之i段來表現。 而且,申請專利範圍第4項所述之發明係在申請 範圍第2項所述之發明中,其特徵在於:前述,直徑控制參Furthermore, the invention described in item 3 of the patent scope of Shengu is described in item 2 of the scope of patent application. The invention is characterized in that the diameter control parameter (CP) is the weight grown by the single crystal (10). That is, the seed crystal growth weight (GW); the aforementioned seed crystal rising speed operation amount generating device (M1) is expressed by a transfer function of a differential element; the aforementioned temperature operation amount generating device (Ml 2) is based on a transfer function containing an integral element It is expressed in paragraph i. Moreover, the invention described in the fourth scope of the application for patent is the invention described in the second scope of the application, characterized in that:

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2(^P)為前述結晶成長直徑(GD);前述種晶上升速度操作 里,生裝置(M10)係以含有比例要素之轉移函數來表現; 2溫度操作量產生裝置(Ml2)係以含有積分要素之轉移函 數之2段來表現。 传砂山 冰,且’申請專利範圍第5項所述之發明係在申請專利 摩巳,第1項所述之發明中,其特徵在於:前述種晶上升速 度操作量產生裝置(Ml 0)之轉移函數與前述溫度操作量產 生裝置(Ml 2)之轉移函數之比係構成二形以上之控制系。 ^ 而且,申請專利範圍第6項所述之發明係在申請專利 犯,第5項所述之發明中,其特徵在於··前述種晶上升速 度操作量產生裝置(Ml 〇)係從對於前述直徑控制參數(cp) 之直徑成分之比例要素、微分要素及該等之組合來選擇所 構成’而將對於不足熱量之固化重量分配成單晶體(1〇)之 剖面面積和該單晶體(1 0)之上拉長度之2成分。 ^ 而且,申請專利範圍第7項所述之發明係在申請專利 範圍第5項所述之發明中,其特徵在於:前述直徑控制參 數(CP)為單晶體(1〇)所成長之重量,即種晶成長重量 (/w);前述種晶上升速度操作量產生裝置(M1〇)係以含有 微分要素之轉移函數來表現;前述溫度操作量產生裝置 (Ml 2)係以含有積分要素之轉移函數之1段來表現。 ^ 而且,申請專利範圍第8項所述之發明係在申請專利 辜巳圍第5項所述之發明中,其特徵在於··前述直徑控制參 數(cp)為前述結晶成長直徑(GD);前述種晶上升速度操作 量產生裝置(M10)係以含有比例要素之轉移函,數來表現;2 (^ P) is the aforementioned crystal growth diameter (GD); in the aforementioned seed crystal rising speed operation, the green device (M10) is expressed by a transfer function containing a proportional element; 2 the temperature operation amount generating device (Ml2) is included Expressed in two stages of the transfer function of the integral element. Pass the sand mountain ice, and the invention described in item 5 of the scope of the patent application is the invention described in the patent application Capricorn, the item 1 is characterized in that: the seed crystal ascending speed operation amount generating device (Ml 0) The ratio of the transfer function to the transfer function of the aforementioned temperature-operating-amount generating device (Ml 2) constitutes a control system of two or more shapes. ^ The invention described in item 6 of the scope of patent application is a patent applicant, and the invention described in item 5 is characterized in that the aforementioned seed crystal raising speed operation amount generating device (MlO) is The diameter control parameter (cp) of the diameter component has a proportional element, a differential element, and a combination of these to select the composition ', and the solidified weight for the insufficient heat is distributed into the cross-sectional area of the single crystal (10) and the single crystal (10) 2 components of pull-up length. ^ The invention described in item 7 of the scope of patent application is the invention described in item 5 of the scope of patent application, characterized in that the aforementioned diameter control parameter (CP) is the weight grown by the single crystal (10), that is, Seed growth weight (/ w); The aforementioned seed crystal rising speed operation amount generating device (M10) is expressed by a transfer function including a differential element; the aforementioned temperature operation amount generating device (Ml 2) is a transfer including an integral element One paragraph of the function. ^ Moreover, the invention described in item 8 of the scope of the patent application is the invention described in item 5 of the patent application, which is characterized in that the aforementioned diameter control parameter (cp) is the aforementioned crystal growth diameter (GD); The aforementioned seed crystal ascending speed operation amount generating device (M10) is expressed by a transfer function containing a proportion element;

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案號 88117857 五、發明說明(11) 前述溫度操作量產生裝置(Ml 2)係以含有積分要去♦ # 函數之2段來表現。 、戈京之轉移 【發明之實施形態】 (發明之概要) 本發明之特徵係基於偏差信號0£^,而分別以 生種晶上升速度操作量SLC與溫度操作量Tc。也就H , 跟隨種晶上升速度SL之變化而成之結晶成長直徑gd& : 收斂、及跟隨加熱器溫度之變化而成之不足熱量之=抑 制分別予以獨立來執行。因此,種晶上升速飢係以結晶 成長直徑GD之收斂而作用,溫度操作量Tc係抑制不:: 之變動,而使跟隨結晶成長直徑GD之收斂作用而=二 晶上升速度SL收斂。其結果’使結晶成長直徑GD與種曰= 升速度SL之二數值控制合適地得以達成(圖3表 曰曰 (發明程序) ’ 本發明者係通過以下所示之程序, + 上述習知之課題之本發日卜 序而達到…解決 首先’做為受單晶體之成長直徑(以下、稱為「社曰 成?ί=」)之變動所影響之要因’係可考慮成單:: 之亡拉速度(以下、稱為「種晶上升速度SL」)、及不足 熱量。「在此’種晶上升速度SL係依存於使種結晶(以下、 ί Ϊ Ϊ晶」)上升之移動機構之參數,係比較上為難以 變動之參數。 勺難以 對此,不足熱量係藉由坩堝和加熱器之距離、埶 零件之設置狀態、及冷卻該熱領域零件之冷卻水之^ =Case No. 88117857 V. Description of the invention (11) The aforementioned temperature operation amount generating device (Ml 2) is represented by the second segment of the #function which contains integrals. The transfer of Ge Jing [Inventive embodiment] (Summary of the invention) The characteristics of the present invention are based on the deviation signal 0 £ ^, and the operating amount SLC and the temperature operating amount Tc are respectively increased at the rate of seed crystal growth. In other words, H, the crystal growth diameter gd & following the change in the seed crystal rising speed SL: convergence, and the lack of heat = suppression following the change in heater temperature are performed independently. Therefore, the growth rate of seed crystals depends on the convergence of the crystal growth diameter GD, and the temperature operation amount Tc suppresses the fluctuation of the non- :, so that the convergence effect of the crystal growth diameter GD is equal to the convergence rate of the two crystals. As a result, the numerical control of the crystal growth diameter GD and the seed rate = the rising speed SL was appropriately achieved (see the table of FIG. 3 (invention procedure). The inventor passed the procedure shown below, + the above-mentioned conventional problems The issue date is reached to achieve the solution ... First of all, as a factor that is affected by the change in the growth diameter of a single crystal (hereinafter referred to as "She Yuecheng? Ί ="), it can be considered as a single: :: Death pull Speed (hereinafter referred to as "seed crystal ascending speed SL"), and insufficient heat. "Here, the" seed crystal ascending speed SL "depends on the parameters of the moving mechanism that raises the seed crystal (hereinafter," ί Ϊ crystal "), It is a parameter that is relatively difficult to change. It is difficult to do this with a spoon. The lack of heat is based on the distance between the crucible and the heater, the setting state of the parts, and the cooling water that cools the parts in the hot area. ^ =

508379 a 修正 ^1^88117857 五、發明說明(12) 化專加以變化,比把插 數。 比起種s曰上升速度SL來為較易變動之參 足熱K變^^長^徑⑼之變動之主要原因係假定為不 制不足熱量之構成而採用根據結晶成長直獨之變動來控 溫度之變化J J:J f制係因為以使用所謂加熱器 成中,針於往曰Ϊ素為較夕之控制裝置,所以僅在該構 度之=而,”對於結晶成長直論之變動之響i速 變化i曰上:、丰:穴用以根據結晶成長直徑⑼之變動而使 it :升速度SL之構成。但是,在單晶體之二數值控 目二值Γ頁”有必要使種晶上升速度sl收斂於預定: 盥i曰上二ίςΤ晶體之二數值控制,使結晶成長直徑GD ”種/升速度SL之冑方收斂於期望之目#值係為重要。 速产si值μ以逆行上述思考程序,只要再度考慮種晶上升 直Pgd之::目Ϊ值之原因’則便了解為了抑制結晶成長 GD之k動之該種晶上升速度SL之變化之理由。再者, =一逆行該思考程序,則便了解到結晶成長直徑gd之變 動係不足熱量之變動為原因。 因而,假使解消不足熱量之變動,則結晶成長直徑GD 斂於目標值,其結果,可預想及種晶上升速度乩也必然 收斂於目;^值。換έ之,於結晶成長直徑G 〇與目標值為一 致之時,種晶上升速度SL也成為與目標值為一致。即,可 達成單晶體之二數值控制。 , 第15頁 2001.12. 06.016 508379 __案號8811781 年 月 日 條正__ 五、發明說明(13) 因此,根據結晶成長直徑G D之變動,假使分別獨立地 使變化種晶上升速度SL與不足熱量,則可使結晶成長直徑 GD與種晶上升速度SL之雙方收敛於期望之值。 其次’本發明者係檢討有關於如何使種晶上升速度 變化’而得到如以下之結論。即,因為種晶上升速度SL係 為二數值控制之控制項目,所以最好將種晶上升速度儿之 操作量(以下、稱為「種晶上升速度操作量31^」)之作 用於發散方向之要素包含於該當操作量之生成方塊。做為 作用於發散方向之要素來考慮者係響應於過去之變動履歷 之要素’即’重I偏差之比例要素及積分要素。 因而’種晶上升速度操作量SLC之生成方塊係以使用 為微分要素與比例要素而構成為合適。該微分要素與比例 要素之合適之組合方法係在重量式與光學式具有若干差 異,而關於具體的構成係以後面之說明使其明顯。 、、k、’、κ,本發明者係檢討有關於如何使不足熱量變化, 而得到如以下之結論。即,不足熱量變動之主要原因係坩 堝之上升,因只要坩堝一上升,則與加熱器離開僅該上升 部分之距離,並隨著對熔體之供應熱量之減少,而增加 自掛竭及炫體之放出熱。 因而,為了壓制不足熱量之變動,而需要上升僅坩堝 上升部分之加熱器之溫度。前述之加熱器溫度之理相 =從:此之觀點所導出’而得以對不足熱量之控制; =a ^而,有如前述般,因為僅在理想型態中,係易 於為%境變化所左右,~以以不僅是依存於理想型態為合508379 a Correction ^ 1 ^ 88117857 V. Description of the invention (12) The change of chemistry is more than interpolation. Compared with the kind of rising speed SL, the main reason for the change in the variable foot heat K which changes ^^ length ^ diameter 系 is that it is assumed that the structure of insufficient heat is not used, and the change based on crystal growth is used to control The temperature change JJ: J f is based on the use of a so-called heater, and the control device is relatively new. Therefore, only when the structure is equal to =, "the change in the crystal growth theory i-speed change i: upper: Feng: the hole is used to make it: the rate of rise SL in accordance with the change in the crystal growth diameter ⑼. However, it is necessary to raise the seed crystal in the single-crystal two-value control and two-value Γ page. The speed sl converges to the predetermined value: the numerical control of the two crystals of the upper two crystals, to make the crystal growth diameter GD ”species / liter speed SL converge to the desired goal # value is important. The rapid production si value μ is retrograde In the above thinking procedure, as long as the seed crystal rises directly to Pgd :: the reason for the mesh value ', then the reason for the change in the seed crystal ascent speed SL to suppress the k-movement of crystal growth GD will be understood. Furthermore, = a retrograde The thinking process, we know the crystal growth diameter gd The change is caused by the change of insufficient heat. Therefore, if the change of insufficient heat is eliminated, the crystal growth diameter GD converges to the target value. As a result, it is expected that the seed crystal rise rate 乩 will also converge to the goal; ^ value. In other words, when the crystal growth diameter G 0 is consistent with the target value, the seed crystal rising speed SL also becomes consistent with the target value. That is, the second numerical control of the single crystal can be achieved., Page 15 2001.12. 06.016 508379 __ Case No. 8811781 Article __ V. Description of the invention (13) Therefore, according to the change in the crystal growth diameter GD, if the seed crystal rising speed SL and insufficient heat are changed independently, the crystal growth diameter GD and Both sides of the seed crystal rising speed SL converged to a desired value. Secondly, "the present inventor reviewed how to change the seed crystal rising speed" and obtained the following conclusion. That is, because the seed crystal rising speed SL is controlled by two values. Control items, it is best to apply the operation amount of the seed crystal ascending speed (hereinafter referred to as "seed crystal ascending speed operation amount 31 ^") to the elements of the divergence direction Operation should be contained in an amount of generation block. As elements that act in the direction of divergence, those who consider them are elements that respond to past changes in history, that is, "proportion elements of heavy I deviation" and integral elements. Therefore, the generation block of the 'seed rising speed operation amount SLC is suitably constituted by using as a differential element and a proportional element. The appropriate combination method of the differential element and the proportional element has some differences between the weight type and the optical type, and the specific structure will be made clear by the following description. ,, K, ', κ, the present inventors reviewed how to change the insufficient calories, and obtained the following conclusions. That is, the main cause of insufficient heat fluctuation is the rise of the crucible, because as soon as the crucible rises, it is away from the heater by only the rising portion, and as the supply of heat to the melt decreases, self-exhaustion and dazzling The body releases heat. Therefore, in order to suppress the fluctuation of insufficient heat, it is necessary to raise the temperature of the heater of only the rising portion of the crucible. The rationale of the aforementioned heater temperature = derived from: this point of view can control the lack of heat; = a ^ And, as before, because only in the ideal type, it is easy to be affected by the change of% environment , ~ With the dependence on not only the ideal type

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者係以找出可代替理想型態之構成, H坪細檢討理想型態之導出方法。以下顯示其結果。 =,在以下之說明中’單晶體之育成係以液位一定之條 件來進行,單晶體育成中之坩堝之溫度 則係顯示在-般之上拉裝置中之加之位 置關係之剖面圖。同圖所示,於收容熔液12之坩堝14之四 周係配設有供應熱量給該熔液1 2。因而,在如該系統中, 係以從加熱器16朝向熔液12,來供應‘之熱量了並從單晶 體10、溶液12及坩堝14來放出Q0UT之熱量。 將掛禍14之高度當成L ’並將從加熱器Η之上面至掛 禍14之上面為止之高度當成X,則加熱器16與掛竭14之間 之熱抵抗係可以下式: ··(0 來表示,在此:KIN =供應側比例常數。 而且,坩堝1 4與該坩堝1 4周圍空氣間之熱電阻係可以下 式: 、 U 今 -(2) 來表示,在此:κ〇ϋτ =放出侧比例常數。 因而,供應側與放出側之熱傳導性係分別為有如以In order to find the structure that can replace the ideal type, H Ping carefully reviews the derivation method of the ideal type. The results are shown below. =, In the following description, the growth of single crystals is performed under a certain liquid level, and the temperature of the crucible in the formation of single crystals is a cross-sectional view showing the positional relationship in a general pull device. As shown in the figure, the crucible 14 containing the melt 12 is provided with a supply of heat 12 for four weeks. Therefore, in this system, the heat of 'is supplied from the heater 16 toward the melt 12 and the heat of QOUT is released from the single crystal 10, the solution 12, and the crucible 14. Taking the height of the hangover 14 as L 'and the height from the top of the heater 至 to the top of the hangover 14 as X, the thermal resistance between the heater 16 and the hangover 14 can be expressed as follows: ·· ( 0, where: KIN = supply-side proportionality constant. In addition, the thermal resistance between crucible 14 and the air around the crucible 14 can be expressed by the following formula: U,-(2), here: κ〇 ϋτ = discharge side proportional constant. Therefore, the thermal conductivity of the supply side and the discharge side are as follows.

7054-2811-PFl.ptc 第17頁 2001.12. 06.018 508379 案號 88117857 年月曰 修正 五、發明說明(15) 下:7054-2811-PFl.ptc Page 17 2001.12. 06.018 508379 Case No. 88117857 Rev. V. Description of Invention (15) Under:

Gm = L — X …(3) G〇ut : X …⑷ ^ουτ 之所述。 因而,將加熱器16之溫度當成TH、及將坩堝14之溫度 當成Tc,則從加熱器16供應給坩堝14之熱量QIN、及從坩堝 1 4放出之熱量Qqut係分別為有如以下:Gm = L — X… (3) G〇ut: X… ⑷ ^ ουτ. Therefore, taking the temperature of the heater 16 as TH and the temperature of the crucible 14 as Tc, the heat QIN supplied from the heater 16 to the crucible 14 and the heat Qqut emitted from the crucible 14 are as follows:

2抓= GW. CTff-D ••(5) —X) · (7g ~ = ΈΖ2 Grab = GW. CTff-D •• (5) —X) · (7g ~ = ΈZ

Qout ~ ^out ' X ·Qout ~ ^ out 'X ·

KK

OUT 之所述。 因而,不足熱量係以下式: Q = Qour -QW …⑺ 來加以定義。 其次,考慮坩堝1 4上升之時之熱量變化。即,X為僅As described in OUT. Therefore, insufficient heat is defined by the following formula: Q = Qour -QW… ⑺. Next, consider the change in heat when the crucible 14 rises. That is, X is only

7054-2811-PFl.ptc 第18頁 2001.12. 06.019 508379 _案號 88117857 五、發明說明(16) 年 修正 △ X變化時之QIN及Q〇UT之變化量△ QIN及△ Q〇UT係可以下式: △2孤= …(8) LQqut: :Τ〇 ·Δχ jr OUT ….(9) 來表示。 在此,QIN及Qqut只要僅變化△ QIN及△ Qqut,則不足熱量 即有所變動。因而,為了將該變動部分在加熱器1 6之溫度 上加以壓制,而來滿足下述方程式: 是有所必要的。 接著,從式10中除去式7,再將上述方程式予以展 開,則成為下式: 之形式。 並於該式晨代入式3、式8、式9 ’則成為 Τα , ΤΗ7054-2811-PFl.ptc Page 18 2001.12. 06.019 508379 _ Case No. 88117857 V. Description of the invention (16) Annual correction △ QIN and Q〇UT change amount when X changes △ QIN and △ Q〇UT can be downloaded Formula: △ 2solen =… (8) LQqut:: Τ〇 · Δχ jr OUT ……. (9). Here, as long as QIN and Qqut are changed only by ΔQIN and ΔQqut, the shortage of heat changes. Therefore, in order to suppress this fluctuation at the temperature of the heater 16 to satisfy the following equation: It is necessary. Then, Equation 7 is removed from Equation 10, and the above equations are expanded to form the following equation: And in the morning, when it is substituted into formula 3, formula 8, and formula 9 ’, it becomes τα, ΤΗ

J .Δχ: L一 χ …(12) 之形式,再進一步展開此,即得下式:J .Δχ: The form of L-χ (12), and then expand this further, we get the following formula:

7054-281l-PFl.ptc 第19頁 2001.12. 06. 020 508379 案號 88117857 年月曰_修正 五、發明說明(17) •(13) Δχ ΑΤη7054-281l-PFl.ptc Page 19 2001.12. 06. 020 508379 Case No. 88117857 Month_Amendment V. Description of the invention (17) • (13) Δχ ΑΤη

TcTc

1 OUT J1 OUT J

TH 之形式。 因而’積分該式’而得下式: >+log(x-i) + logC= 0 -(14) OUT / 之形式,在此:C=積分常數。 再者,展開該式,而得下式 K,TH form. So 'integrate this formula' to get the following formula: > + log (x-i) + logC = 0-(14) OUT /, where: C = integral constant. Furthermore, expand this formula to get the following formula K,

OUT 之形式。 因而,將x = 0時之將TH做為TQ,並求解上式中之C,則 成下述: C: \T〇^TcThe form of OUT. Therefore, if x is 0 and TH is taken as TQ, and C in the above formula is solved, it becomes as follows: C: \ T〇 ^ Tc

产OUTProduction OUT

L ⑽ 之形式。 因而,將該式代入式1 5,則得可表示加熱器溫度之理 想型態之下式: ^L ⑽ form. Therefore, substituting this formula into Formula 15 gives the following formula that can represent the ideal type of heater temperature: ^

7054-281l-PFl.ptc 第20頁 2001.12. 06.021 修正7054-281l-PFl.ptc Page 20 2001.12. 06.021 Correction

發明說明(18)Invention Description (18)

LL

^OUT -out J\ J〇+Tc^ OUT -out J \ J〇 + Tc

KK

OUT K〇UT 一 K射 (17)OUT K〇UT One K shot (17)

OUT 之形式。 圖形圖2门係固圖之示所以-式17所表現之加熱器溫度之理想型態之 丄:=:’加熱器溫度之理想型態係具有對於掛 之上升之函數而上升之曲線。 彳π坩 在此,同圖所示之-〇· 2L〜〇. 4L為止之 域之一般性範圍。因此,使加 圍為拉兩領 H 0.4L為止之範圍為最;之範圍係以 器溫度之理想型態係以下式: 可以了解到加熱 TH = cxx+b 之一次函數之集 在此,本發 度型態為可用反 成。以下顯示其 首先,如前 晶成長直徑GD之 統之輸入係成為 下,稱為「偏差 如前述般, os) 合即可近似,即可 明者係考慮及上述可、、、、形區分近似。 饋控制系:來產生L:形區分近似之溫 過程。 而模索可實現此之構 述般,在本發明中, 變動來控制不足埶量马係採用可根據結 對應結晶成長直,溫度控制系 信號DEV」)。 I動量之信號(以 結晶成長直徑GD之變叙_ , 更動之主因係不足熱量 508379 _鍾88117857 年月日 修正 五、發明說明(19) 之變動’而不足熱量之變動之主因係坩堝之上升。因此, 每次相竭一上升’則上述偏差信號DEV便成為具有正值。 在此’本發明者乃考慮及若將該偏差信號DEV之正值 做為變動履歷予以加起來,則可產生前述溫度模型,因而 通過很多之模擬及實驗,而將偏差信號DEV之積分值以做 為前述溫度模型而予以有效地功能化變成為明顯。因此, 從偏差信號DEV所產生之溫度模型係吸收上拉環境之變 化’而自己整合成在多變化環境中之各種理想模型。 與直徑控制參數(一般而言,為單晶體之直徑和重量) 之相異點毫無關係地,只要以統一之概念一說明本發明之 控制概念’就成為以下所述般。 、第一係以由直徑視之轉移函數為二形之控制系而構 成。第二係以由上拉速度視之轉移函數為二形之控制系而 量而將 度控制 制之最 化重量 對於直 中,係 溫度控 乃至第 而得控 點所構 第三係 之功能,其 為適合於不 度之控制係 長度之功能 現如該構成 列輸入於速 第四係 最少之段數 本發明 役刺不足熱 係使具有溫 足熱量之控 使具有將固 ’而不含有 ’在本發明 度控制系及 在上述第一 加以構成, 係從上述觀 系,並將該 適樣態。換 分配於單晶 徑成分之積 將直徑控制 制系。 四之概念中 制系之最安 成之發明, 目的之重量相合 溫度控制系構成 言之,於上拉速 體之面積與上拉 分要素。為了實 參數之偏差以並 ’將積分要素以 定之狀態。 而提供可貢獻於The form of OUT. Figure 2 shows the door fixing diagram. Therefore, the ideal form of the heater temperature represented by Equation 17 is: :: = 'The ideal form of the heater temperature has a curve that rises as a function of the rising temperature.彳 πCr Here, the general range of the range from -0.2 · L to 0.4L is shown in the figure. Therefore, the range around the pull-up of two collars H 0.4L is the maximum; the range is based on the ideal type of the device temperature and the following formula: It can be understood that the set of linear functions of heating TH = cxx + b is here. Hair type is available reverse. The following shows its first. If the input system of the former crystal growth diameter GD becomes the following, it is called "the deviation is as above, os) can be approximated, that is, the clearer can be considered considering the above-mentioned ,,,, and shape distinction. The feed control system: to generate the temperature process of L: shape difference approximation. The mold cable can achieve this structure. In the present invention, the variation is used to control the shortage. The horse system adopts the crystal growth and temperature control according to the knot. Signal DEV "). The signal of I momentum (in terms of the crystal growth diameter GD _, the main cause of the change is insufficient heat 508379 _ Zhong 88117857 month, day, day 5 correction, the change of invention description (19) ', and the main cause of the change of insufficient heat is the rise of the crucible Therefore, each time the phase exhaustion rises, the above-mentioned deviation signal DEV will have a positive value. Here, the inventor has considered and if the positive value of the deviation signal DEV is added as a change history, it can be generated. The aforementioned temperature model, through many simulations and experiments, becomes effective by functionalizing the integral value of the deviation signal DEV as the aforementioned temperature model. Therefore, the temperature model generated by the deviation signal DEV is absorbed. Pull the changes in the environment 'and integrate itself into various ideal models in a multi-change environment. It has nothing to do with the difference between the diameter control parameters (generally, the diameter and weight of a single crystal), as long as a unified concept The control concept of the present invention will be described below. The first system is constituted by a control system in which the transfer function according to the diameter is dimorphic. The second system is based on the control function of the pull-up speed as a two-shaped control system, and the optimal weight of the degree control system is straight, the temperature control and even the third control function of the first control point. It is a function suitable for the control of the length of the system. The minimum number of segments that are entered in the fourth series of the system is as follows. The degree control system of the present invention and the first configuration described above are based on the above-mentioned observation system, and the appropriate state is changed. The product allocated to the single crystal diameter component is used to control the diameter control system. The invention of Ancheng, the purpose of the weight-matching temperature control system is to say, the area of the pull-up speed body and the pull-up sub-elements. In order to realize the deviation of the parameters, the 'integral elements are set to a fixed state.

508379 修正· Λ_η 曰 案號 88117857 五、發明說明(20) 早晶體二數值控制之發展之技術。 (第一型態) 本型悲係例不有關於偏差信號DEV之並列輸入之構 成。 =3係顯示有關於本發明之第一型態之二數值控制震 一型熊成之不思圖。以下,基於同圖,來說明本發明之第 單J體10係由本發明所製造之目的物,該 及上拉所製造之各種單晶體。在本發明 將使早日日體1 0之結晶成長直 /、 夕锸曰L 4 土一 且仕⑽及该早晶體10成長之際 之種晶上升速度SL收斂於期望之值。 乂长之際 溶液1 2係使單晶體丨〇之眉袓、汾^ 早、纟口日日矽之場合時係將多結晶 於I k 12。 /丁从,合嘁而產生該熔液 掛堝1 4係容納熔液丨2之容器, -般係以使用將石英掛堝積層 製造中, 單晶體之固化量而上升。 位予u疋位,所以可隨 加熱器1 6係配設於掛竭1 4之外圍 控制信號,來控制對熔液12之供應旦並根據來自外部之 該控制之概要,則為以下所述般。+ /、要簡單地說明 升,加熱器16與掛堝14間之距‘二二丄藉由掛螞14之上 應熱量變少,不足熱量變大。1^穴丄則對熔液12之供 固化,而結晶成長直徑GD則變動、;A ;:晶體10變為容易 荷了解消該變動,而使 7054-2811-PFl.ptc 第23胃 2001· 12.06.024 曰 修正 _#號 88117857 五、發明說明(21) 付加熱器1 6之溫度上升,將不足熱量收斂於預定之值。 種晶18係成為單晶體丨〇之種的結晶。於使單晶體丨〇成 之際,首先,將該種晶1 8浸潰於熔液丨2之表面,並將古亥 面靜靜地旋轉一面向上方拉。進行根“ 明縮頸之無轉位化。其後,將該種晶18以預定之上拉 ΐ二種晶上!速度乩予以上拉,並於該種晶18之下使單 "θ1〇成長。早晶體10係於種晶18碰觸到熔液12之際,熔 ==種晶18而失熱,其結果,於種晶18之下炼液 此時,早晶體10係根據種晶18之結晶方位 成長。該種晶18係通過種晶夾頭2〇而固 藉由線纜筒24之捲繞動作而上升。U疋於線、、見22,並 之# 測裝置M14係對前述結晶成長直徑⑼ ΐΐΐ ΐ广參數,即檢測直徑控制參數CP,而將該檢 cp係可使用心==。做為直徑控制參數 成長重量二及乂所= 蚀田舌旦片、日丨 口日日成長直徑⑶。該等參數係分別可 使用重里感測為26及直徑感測器28來測 , #^„1〇ad 重測定器,一方面,“直#_ 里J之載 光學式之長度測定器。 1文馮S知例而吕,係 偏差信號產生裝置Ml 6係取直徑控制夾童 =檢測之直徑控制參數cp與該直徑控制參數cp檢之^裝置们4 差而產生偏差信號DEV,並將該 值之 種晶上升速度操作量產生裝麵與溫輸裝〜於 7054-2811-PFl.ptc 第24頁 2001· 12.06.025508379 Amendment Λ_η Case No. 88117857 V. Description of the invention (20) The technology of the development of the numerical control of early crystals. (First type) This type of sad example does not have the structure of parallel input of the deviation signal DEV. = 3 is a map showing the first type of the second type of numerical control shock of the present invention and the first type of Xiong Cheng's thought map. Hereinafter, the single J-body 10 of the present invention will be described based on the same figure, which is the object produced by the present invention, and various single crystals produced by pull-up. In the present invention, the crystal growth rate SL of the early solar body 10 will be converged to a desired value when the crystal growth rate of the early solar body 10 and the early crystal 10 grow. When the solution grows, the solution 12 will be crystallized at I k 12 when the single crystal 〇〇, Fen ^ early, and 纟 口 日 日 硅 are used. / Ding Cong, combined to produce the melt. Hanging pot 1 4 is a container that holds the melt. 2-Generally, the amount of solidification of single crystals is increased by using the stacking of quartz hanging pots. The position is u, so it can be controlled according to the outline of the control from the outside by controlling the supply of the melt 12 with the peripheral control signals of the heater 16 and the exhaustion 14. Like. + /, To explain simply, the distance between the heater 16 and the hanging pot 14 is ‘two or two’. By hanging on the hanging pot 14 the amount of heat should be reduced, and the amount of insufficient heat will be increased. 1 ^ Acupoint is used to solidify the melt 12, while the crystal growth diameter GD is changed; A ;: Crystal 10 becomes easy to understand the change, so that 7054-2811-PFl.ptc 23rd stomach 2001 · 12.06.024 Said correction_ # 号 88117857 V. Description of the invention (21) The temperature of the sub heater 16 rises, and the insufficient heat converges to a predetermined value. The seed crystal 18 is a crystal of a single crystal seed. When the single crystal is formed, first, the seed crystal 18 is immersed on the surface of the melt 2 and the Guhai surface is quietly rotated and pulled upwards. Perform the "negative indexing of the root neck". Thereafter, the seed crystal 18 is pulled up on the two seed crystals at a predetermined rate! The speed seed is pulled up, and a single "θ1" is formed below the seed crystal 18. 〇Growth. The early crystal 10 is when the seed crystal 18 touches the melt 12, and the melt == seed crystal 18 and loses heat. As a result, the liquid is refined below the seed crystal 18. At this time, the early crystal 10 is based on the seed. The crystal orientation of crystal 18 grows. The seed crystal 18 is raised by the winding action of the cable barrel 24 through the seed crystal chuck 20. U is at the line, see 22, and # 测 装置 M14 系For the aforementioned crystal growth diameter ⑼ ΐΐΐ wide parameter, that is, the diameter control parameter CP is detected, and the test cp system can use the heart ==. As the diameter control parameter growth weight II and = = Eclipse Tiandandan tablets, Japan 丨Day-to-day growth diameter ⑶. These parameters can be measured using the weight sensor 26 and the diameter sensor 28, respectively. # ^ „1〇ad re-tester, on the one hand," 直 #_ 里 J 的 载 机电The length measuring device of the formula. 1 Wen Feng S knows the example, and the deviation signal generating device M16 takes the diameter control clip = the diameter control parameter cp and the diameter control Detecting the parameter cp ^ 4 are means generates a difference error signal DEV, and output means for generating a surface temperature in the 7054-2811-PFl.ptc mounted on ~ 24 2001-12.06.025 seed rising speed of the operation amount value

直徑控制參數CP 目標值」即為偏差 M12。具體而言, 信號DEV。 在此, 量GW之場合 即為前述直 制參數CP而 體1 0之期望 目標值係將 「結晶成長 記憶。因而 際之結晶成 數相對應。The diameter control parameter “CP target value” is the deviation M12. Specifically, the signal DEV. Here, in the case of measuring GW, it is the aforementioned direct parameter CP and the desired target value of the body 10 is "memory of crystal growth. Therefore, the corresponding crystal formation number corresponds.

做為直徑 時,係在 徑控制參 言,於使 直徑即為 使對應於 長度GL」 ,輸入於 長長度GLWhen it is used as the diameter, it is in the diameter control parameter, so that the diameter is to correspond to the length GL ", and enter in the long length GL

^制參數CP而言,於使用結晶成長重 單晶體1 0以期望之形狀成長時之重量 數CP之目標值。一方面,做為直徑控 用結晶成長直徑GD之場合時,係單晶 前述直徑控制參數CP之目標值。該等 單晶體1 0所成長之長度(以下、稱為 )之設定值以做為程式參數預先予以 偏差信號產生裝置Ml 6之值係檢測實 ’並決疋使該檢測之值與前述程式參 w種晶上升速度操作量產生裝置Ml 0係基於前述偏差信 號產生裝置Ml 6所產生之偏差信號DEV,而產生種晶上升速 度SL之操作量(以下、稱為「種晶上升速度操作量 SLC」)。For the production parameter CP, the target value of the weight CP when a single crystal 10 is grown in a desired shape using a crystal growth weight. On the other hand, in the case where the diameter-controlled crystal growth diameter GD is used, it is a target value of the aforementioned diameter control parameter CP of a single crystal. The set value of the length of the single crystal 10 (hereinafter, referred to as) is used as a program parameter, and the value of the deviation signal generating device M16 is tested in advance, and the value of the test is determined according to the aforementioned program parameters. The seed crystal ascending speed operation amount generating device M10 generates an operation amount of the seed crystal ascending speed SL based on the deviation signal DEV generated by the aforementioned deviation signal generating device M16 (hereinafter, referred to as "seed crystal ascending speed operation amount SLC"). ).

種晶上升速度SL係與前述直徑控制參數”之目標值為 同樣’使期望之目標值與結晶成長長度GL相對應而預先予 以記憶。因而’於該被記憶之種晶上升速度讥之目標值減 掉種晶上升速度操作量SLC。而決定種晶上升速度SL。線 纜筒24係基於該被決定之種晶上升速度SL,而捲繞線纜 22。其結果,種晶1 8及單晶體1 〇係以該種晶上升速度SL而 上升。 在此,因為種晶上升速度SL係二數值控制之控制對The seed crystal ascent speed SL is the same as the target value of the aforementioned diameter control parameter. 'The desired target value is associated with the crystal growth length GL and stored in advance. Therefore, the target value of the seed crystal ascent speed 上升 is stored. The seed crystal ascent speed operation amount SLC is subtracted. The seed crystal ascent speed SL is determined. The cable barrel 24 is wound around the cable 22 based on the determined seed crystal ascent speed SL. As a result, the seed crystal 18 and the single crystal 10 is raised at the seed crystal rising speed SL. Here, because the seed crystal rising speed SL is a two-valued control pair

t所以需盡快使收斂於目標值。因而,種晶上升速度操 ^ $產生裝置M1 〇係以不含有響應於結晶成長直徑GD之變 履歷之要素為重要。即,原因在於響應於]結晶成長直 徑GD之變動履歷之要素係結晶成長直徑GD即使只變動一 次,其後,因為繼續輸出定值,導致種晶上升速度乩成為 溫度操作量產生裝置M12係基於偏差信號產生裝置M16 所f生之偏差信號DEV,而產生操作單晶體1〇周邊之溫度 之量(以下、稱為「溫度操作量Tc」)。於該溫度操作量π 之產生係如在前述發明程序所說明般,利用積分要素。因 :’吸收環境之變化之加熱器16溫度之理想係 為溫度操作量TC而被產生。 因而,預先導出加熱器溫度之理想型態,而不需預先 使對應結晶成長長度GL加以記憶,上述溫度操作量Tc係以 自己整合地形成加熱器溫度之理想型態。還有,本發明係 並非除了以補助地使用預先導出之加熱器溫度之理想型離 者。即,在本發明中,係將預先導出之加熱器溫度^理= 型態加入上述溫度操作量TC,也可決定加熱器16之溫度。 藉由如該,成,結晶成長直徑⑼之變化為急峻之部分,例 如初期肩覓和肩部垂下之適合之控制係可期待。 在此,只要著眼於圖3所示之種晶上升速度操作量產 生裝置M10與溫度操作量產生裝置们2之連接型態,則該等 係以並列連接於偏差信號產生裝置M16之構成。以此,〃來 考察如該並列連接構成是否於結晶成長直徑G D與種晶上升t Therefore, it is necessary to make convergence to the target value as soon as possible. Therefore, it is important that the seed crystal ascending speed operation device M10 not contain the elements of the change history in response to the crystal growth diameter GD. That is, the reason is that the element that responds to the change history of the crystal growth diameter GD is that even if the crystal growth diameter GD changes only once, thereafter, because the constant value is continuously output, the seed crystal rising speed 乩 becomes the temperature operation amount generating device M12. The deviation signal DEV generated by the deviation signal generating device M16 generates an amount for operating the temperature around the single crystal 10 (hereinafter, referred to as "temperature operation amount Tc"). The generation of the operation amount π at this temperature is based on the integration element as explained in the aforementioned invention program. The reason is that: 'The temperature of the heater 16 which absorbs changes in the environment is preferably generated as a temperature operation amount TC. Therefore, the ideal type of the heater temperature is derived in advance without memorizing the corresponding crystal growth length GL in advance. The above-mentioned temperature operation amount Tc is an ideal type of the heater temperature that is integrated with itself. In addition, the present invention is not an ideal type except for the auxiliary use of a previously derived heater temperature. That is, in the present invention, the temperature of the heater 16 can also be determined by adding the heater temperature previously calculated in advance to the temperature operation amount TC. By doing so, the change in the crystal growth diameter ⑼ becomes a critical part. For example, suitable control systems such as initial shoulder search and shoulder drop can be expected. Here, as long as the connection type of the seed crystal raising speed operation amount generating device M10 and the temperature operation amount generating device 2 shown in FIG. 3 is focused, these are connected in parallel to the deviation signal generating device M16. Based on this, I will examine whether the parallel connection structure rises with the crystal growth diameter G D and the seed crystal.

2001.12. 06. 027 /y __88117SR7 一日 五'發明說明(24) 速度S、L之二數值控制為有效。 數做為(f r T種:曰曰上Γ速ί插作量產生裝置1410之轉移函 (s),V將I二显度操作量產生裝置1112之轉移函數做為。 之合成辕敕畲度視之轉移函數、即該等之並列構成 U移函數G (s)以Gt (s)/ Gv (s):以定義。 變化將f差信號DEV做為E (s)、直徑控制參數^之 文為R (s),則偏差轉移函數係成以下所述 1 (19) ...(20) 1 + G(s) 之式子。 因而,定長偏差係以下式 ^l + G(s) 來表現。 型離=二之發明程序來加以說明,加熱器溫度之理相 慮該型態為變熱則可考 動為完全根據該型態。於是,直徑二之變 (S )係可以一次函數來近似。 將R (s)以—次函數來表示,因為成為W,所以式 7054-2811-PFl.ptc 第27頁 2001· 12· 06· 〇28 508379 案號 88117857 五、發明說明(25) 2 0係可以下式 lim--— lim——-—— h〇1 + G(s) lim--- s^s- G(s) lim· 1 ^s-G(s) (21) 來展開。 因而 定常偏差ε收敛於0之G (s)係必需滿足下式 σ(〇 = 為 + 办 + C〆+ β〆… ^ ^ +B2s + C2s2 + D2sl - 2) •(22) 、D1、D2 =拉普拉斯運 意變數取出之拉普拉 在此·不含有Ai、A2、Bi、、C!、C2 真符號S之任意變數;χ=可從前述任 斯運算符號S之乘數。 在本發明中,係對應於該拉普拉斯運算符號s之乘數 X,而將控制系之形式定義為X形。例如,χ = 2之控制系係 二形控制系,χ = 3之控制系係三形控制系。因而,假使構 成一形以上之控制系,則定常偏差收斂於0,而可達成於 晶成長直徑GD與種晶上升速度讥之二數值控制。換言之°2001.12. 06. 027 / y __88117SR7 One day five 'invention description (24) Speed S, L two numerical control is effective. The number is used as the (fr T type: the transfer function (s) of the above-mentioned high-speed interpolating amount generating device 1410, and V is the transfer function of the I two-degree operation quantity generating device 1112. The transfer function is regarded as the U-shift function G (s) and Gt (s) / Gv (s): by definition. The difference is the f difference signal DEV as E (s), diameter control parameter ^ The text is R (s), then the deviation transfer function is given by the formula 1 (19) ... (20) 1 + G (s) described below. Therefore, the fixed-length deviation is given by the following formula ^ l + G (s ) To show. The type of the == two invention procedures to explain, considering the reason of the heater temperature, if the type becomes hot, it can be considered to be based entirely on the type. Therefore, the change in diameter (S) can be It is approximated by a linear function. Let R (s) be expressed by a linear function. Since it becomes W, the formula is 7054-2811-PFl.ptc Page 27 2001 · 12 · 06 · 〇28 508379 Case No. 88117857 V. Description of the invention ( 25) 2 0 series can use the following formula lim --- lim ------- h〇1 + G (s) lim --- s ^ s- G (s) lim · 1 ^ sG (s) (21) Therefore, the G (s) where the constant deviation ε converges to 0 must satisfy the following formula σ (0 = + + C〆 + β〆 ... ^ ^ + B2s + C2s2 + D2sl-2) • (22), D1, D2 = Laplacian taken out by Laplacian's intentional variables here does not contain Ai, A2, Bi, , C !, C2 Any variable of the true symbol S; χ = a multiplier that can be obtained from the above-mentioned arbitrary operation symbol S. In the present invention, the multiplier X corresponding to the Laplacian operation symbol s will be controlled The form of the system is defined as X. For example, a control system with χ = 2 is a two-form control system, and a control system with χ = 3 is a three-shape control system. Therefore, if a control system with more than one shape is formed, the steady deviation converges to 0, which can be achieved by the numerical control of the crystal growth diameter GD and the seed crystal rising speed 讥. In other words, °

508379 案號 88117857 五、發明說明(26) 有關本發明之二數值控制系可說是並列二形控制系。 因而,關於種晶上升速度操作量產生裝置M1〇與溫度 操=量產生裝觀2 ’係料偏差信號產生裝置而以並 列連接’ 1¾時’以該等轉移函數之比為二形以上之控制 系,來決定各自之轉移函數。 依據以上所說明之本發明之第一型態,因為種晶上升 ,度操作量SLC及溫度操作量TC為基於偏差信號剛所產 ί而^將種晶上升速饥做為結晶成長直徑GD之收斂裝 ί斂2 ?可將加熱器之溫度以做為種晶上升速度SL之 置而/刀別獨立加以使用。其結果’彳自己整合地達 成…曰曰成長直徑GD與種晶上升速度乩之二數值押制。再 t、: =將如該偏差信號DEV以並列輸入於速工度控制系 和脈度控制系之構成,則因為可將適 函數獨立加以#用,所以I A & 6 6分S I經制之轉移 加以使用,所以可成為安定之二數值控制。 I弟一型態) t發明之帛:型態係、例示對重量式上拉裝 之適用可能性。 4 =4係顯示有關本發明之第二型態之二數值控制裝置 方塊圖。以下,基於同圖(a),來說明本發明之 之構成。還有,關於前述之準於 系賦予同-符號而省略掉說明,在以下之以成 疋°兒明與第一型態相異之部分。 直徑參數檢測裝置M14係將結晶成長重量Gw做為 且4控制參數CP予以檢測,並將該檢測之值輸出於偏差信 508379 _ζι 案號 88117857 修正 五、發明說明(27) 號產生裝置M16。 偏差信號產生裝置Ml 6係產生直徑控制參數檢測穿置 M14所檢測知結晶成長重量“與該結晶成長重量之^ 值之差(以了、稱為「重量偏差GWDj),並將該產生之; 量偏差GWD輸出於種晶上升速度操作量產 操作量產生裝置Ml 2。 直μ度 種晶上升速度操作量產生震置Μ1〇係以含有微分項之 Πΐίϊί現’並將根據重量偏細之變動信號做為 ,曰曰上升速度操作量SLC予以輸出。將種晶上升速度操作 ^:產生裝置Ml 0以微分要素構成之理由係如在前述之發明 為將種晶上升速度SL以做為結晶成長直徑 GD之收斂裝置來使用。 么即,只要結晶成長直徑GD —變動,則結晶成長重量㈣ 化率跟著變動’而追蹤該變動重量偏差_跟著變 护GD IS叙因ί重量偏差GWD之變化係意味著結晶成長直 ^之k動,戶斤以若根據重量偏差GWD之變化使變化種晶 2速度SL ’則可將結晶成長直輸收斂於 =偏為抓取重量偏差GWD之變化,而輸出根據該變化刀 U ’所以以做為種晶上升速度操作 裝置為合適。 在,’需要留意種晶上升速度SL為二數值控制之控制 ,於根據重量偏差GWD而使種晶上升速度SL變化 係必須以將重量偏差GWD之變化率做為〇而將該 曰曰上升速度SL立刻返回於目標值。因而只要返回該目標 7054-2811-PFl.ptc 第30頁 2001.12. 06. 031 508379 修正 曰 ΛΜ 88117^7 五、發明說明(28) 值為5:時間較長,則便會影響及單晶體10之品質。 岸於社曰成ί種晶上升速度操作量產生裝置们0以含有塑 ==直徑GD之變動履歷之要素為不理想。因為V ::於使種晶上升速度sl發散之方向。於重ίΐ 琢;A:I於s亥要素者係積分要素,及比例要素。’ 以一日番θ刀要素係將重量偏差GWD之值做積分運算,所 月又比例要素係如以下般作用。 全體:期2 :差G w D係與結晶成長重量G w為單晶體10之 藉由坩堝14之上升而值相比較而產生之信號。 間之固化重旦辦Λ ρ之不足熱量之增加係使每單位時 重里增加。即,重量偏差GWD為增加。種 速度刼作量產生装置M i 〇之微 升 獅iit 度的上升操作而作用於無重量偏 ί掸作Λ二Γ。該梯度成為0為止之間(種晶上升ΐ i結果里ΐί 之間)’重量偏差議之值係被蓄積。 ϋ I主里偏SGWD係在較長之上拉時間之間,例如以 =間之階梯狀變化而增加上來(參考圖6(a))。 中,ίϋΐ長直漏與種晶上升速规之二數值控制 ^了將如此地增加之重量偏差GWD做為〇之外,使結晶 例要辛^與種晶上升速度儿收敛於目標值係為重要。比 曰使重量偏差GWD收斂於0之方向,而可帶來種 日日上升速度SL之不要之變化。 只要從別的觀點來敘述此事,即使重量偏差_不成 7054-2811-PFl.ptc 第31頁 2001.12. 06.032 皇號88117沾7 曰 來表現。 一方面 五、發明說明(29) _ 為0,但若重量偏差GWD之梯度成 係收斂於目標值。因而,不兩為0 ’則結晶成長直徑GD 之履歷來加以補償。在本發日=中重量偏差GWD回溯至過去 GWD之履歷為以後之上拉程序’係形成為在該重量偏差 報。 决疋溫度之操作量之情 溫度操作量產生裝置们2係 來表現,並將根據重量偏差函數 去夕搜度㈣量產生裝到12含有積分要 素之理由係有如在前述之發明 、 访、、田硌40 A曰士 对狂斤所說明般0逛有,關於 該/皿度#作1產生裝置M i 2係微 Λ弊宝,品女l门门 巾佩刀要素及比例要素以不成 為异。,而有如同圖所示般,可做為piD來使用。 制系其ΐ右檢Ϊ該第二型態之構成是否構成二形以上之控 产變換二ΐ ’ τ在以下之說明中係Κν=速度變換常數、Κτ=溫 二=吊數、TDV=速度控制系微分時間、Tdt=溫度控制系微 二了間、τϊν=速度控制系積分時間、Τιτ=溫度控制系積分時 曰αν=速度控制系微分係數、及“严溫度控制系微分係 數。 首先 考慮及種晶上升速度操作量產生裝置之 轉移函數心(s )之完全微分,則Gv ( S )係可以下式 < u ...(23) 因為GT ( s)係p I ]),所以成為如以下般508379 Case number 88117857 V. Description of the invention (26) The numerical control system related to the second aspect of the present invention can be said to be a parallel two-form control system. Therefore, with regard to the seed crystal rising speed operation amount generating device M10 and the temperature operation amount generating device 2, the “material deviation signal generating device is connected in parallel, and“ 1¾ ”is controlled with the ratio of these transfer functions to be more than two. System to determine the respective transfer function. According to the first form of the present invention described above, since the seed crystal is raised, the degree of operation amount SLC and the temperature operation amount TC are just produced based on the deviation signal, and the seed crystal ascent rate is regarded as the crystal growth diameter GD. Convergence device 敛 Convergence 2? The temperature of the heater can be used as the seed crystal rising speed SL and the knife can be used independently. As a result, 彳 彳 integrates it to achieve… the value of the growth diameter GD and the seed crystal ascent rate 乩 is held down. Then, t =: If the deviation signal DEV is input in parallel to the speed control system and the pulse control system, the fitness function can be used independently #, so IA & 6 6 points SI system Transfer and use, so it can be a stable two numerical control. I brother one type) t invention of the invention: type system, exemplify the applicable possibility of weight type pull-up. 4 = 4 is a block diagram showing the second numerical control device of the second type of the present invention. The structure of the present invention will be described below based on the same figure (a). It should be noted that the above-mentioned standards are given the same-symbols and explanations are omitted, and the following description is different from the first type in the following description. The diameter parameter detection device M14 uses the crystal growth weight Gw as the 4 control parameter CP to detect it, and outputs the detected value to the deviation signal 508379 _ζι Case No. 88117857 Amendment V. Invention description (27) No. generating device M16. The deviation signal generating device M16 generates a diameter control parameter to detect the difference between the crystal growth weight detected by the M14 and the value of the crystal growth weight (referred to as "weight deviation GWDj"), and generates the difference; The volume deviation GWD is output to the seed crystal ascending speed operation mass production operation amount generating device Ml 2. The straight μ degree seed crystal ascending speed operation amount generating device M10 is set to include the differential term Πΐίϊί 'and will change according to the thinner weight The signal is output as the rising speed operation amount SLC. The seed crystal rising speed is operated ^: The reason why the generating device M10 is constituted by a differential element is as described in the aforementioned invention for the seed crystal rising speed SL as a crystal growth The diameter GD convergence device is used. That is, as long as the crystal growth diameter GD-changes, the growth rate of crystal growth weight follows the change ', and the variation of the weight is tracked It means that the crystal growth is directly affected by k, and if the seed crystal 2 speed SL ′ is changed according to the change of the weight deviation GWD, the crystal growth can be converged to = partial to the grasping weight. The deviation of GWD changes, and the output is based on the change of the knife U ', so it is suitable as a seed crystal rising speed operating device. Here,' it needs to be noted that the seed crystal rising speed SL is controlled by a two-value control. The change in the seed crystal ascending speed SL must be based on the change rate of the weight deviation GWD as 0 and immediately return the ascending speed SL to the target value. Therefore, as long as the target is returned 7054-2811-PFl.ptc page 30 2001.12. 06. 031 508379 Amendment ΛΜ 88117 ^ 7 V. Description of the invention (28) The value is 5: If the time is longer, it will affect the quality of the single crystal 10. Kishi Yusha said that the seed crystal ascending speed operation amount generating device 0 is not ideal because it contains elements with a change history of plastic == diameter GD. Because V: is in the direction that diverts the seed crystal's rising speed sl. Yu Zhongzhuo; A: I is the integral element of the shai element, and Proportional factors. 'The integral value calculation of the weight deviation GWD is performed using the θ knife element system in one day, and the proportional factor system works as follows. Overall: Period 2: Difference G w D system and crystal growth weight G w are Single crystal 10 by crucible 14 The signal generated when the values are compared. The increase in the amount of insufficient heat caused by solidification is increased per unit hour. That is, the weight deviation GWD is increased. The speed operation amount generation device M i 〇 is small. The operation of raising the lit degree of the lion raises the weightless bias Λ 掸 Γ. This gradient is between 0 (the seed crystal rises ΐ i in the result ') and the value of the weight deviation is accumulated. Ϋ I main SGWD is increased between the long pull-up times, such as a step-like change between = (see Figure 6 (a)). In the figure, the length of the long straight drain and the seed crystal rising speed gauge are numerically controlled. The weight deviation GWD thus increased is taken as 0, so that the crystal example is harder and the seed crystal rising speed converges to the target value. important. The ratio makes the weight deviation GWD converge to the direction of 0, which can cause unnecessary changes in the daily rising speed SL. As long as the matter is described from another point of view, even if the weight deviation is not 7054-2811-PFl.ptc page 31 2001.12. 06.032 emperor 88117 Zhan 7 to show. On the one hand 5. Invention description (29) _ is 0, but if the weight deviation GWD gradient system converges to the target value. Therefore, if it is not 0 ', the history of the crystal growth diameter GD is compensated. At this issue date = Medium weight deviation GWD traces back to the past GWD's history is the pull-up procedure later 'is formed to report at this weight deviation. The reason for determining the operating quantity of temperature is that the temperature operating quantity generating device 2 expresses it, and the reason for generating the quantity based on the weight deviation function is to include the integral element for 12 reasons as described in the aforementioned invention, Tian Yi 40 A said that the clerk explained about the mad cat, about the / Ware degree # 作 1Generation device M i 2 is a micro-defective treasure, the product of the door knife and the scale elements of the product door do not become different . As shown in the figure, it can be used as a piD. The system checks whether the structure of the second type constitutes a production control transformation of two or more forms. 'Τ is described in the following description: κν = speed conversion constant, κτ = temperature two = hang number, TDV = speed Control system differential time, Tdt = Temperature control system differential time, τ = ν = Speed control system integration time, Tit = Temperature control system integration time αν = Speed control system differential coefficient, and “Strict temperature control system differential coefficient. First consider And the complete differentiation of the transfer function core (s) of the seed crystal ascending speed operation amount generating device, then Gv (S) can be expressed by the following formula < u ... (23) because GT (s) is p I]), so Become as follows

508379 案號 88117857 年月曰 修正 五、發明說明(30) GT(s^ = Κτ KT (l -f T^p · s + Tjp · TDT · s s. T汉 • -(24) 之式子。 因而,合成轉移函數G (s)係成為如下式 邠)=耷 i^r(l + · g + T^ · TDr· s2) s . Κγ . T*jyy . Tjr (1 + B^s +?(Λ) (25) 般,因為s2係存在於分母,所以可了解該當構成係為二 形。 其次,只要一考慮及種晶上升速度操作量產生裝置 M10之轉移函數Gv (S)之不完全微分形,則該Gv (S)係可以 下式 ⑻=508379 Case No. 88117857 Rev. V. Description of Invention (30) GT (s ^ = Κτ KT (l -f T ^ p · s + Tjp · TDT · s s. T Han •-(24) The formula. Therefore, the synthetic transfer function G (s) is as follows: 邠) = 耷 i ^ r (l + · g + T ^ · TDr · s2) s. Κγ. T * jyy. Tjr (1 + B ^ s +? (Λ) (25) Generally, because s2 is present in the denominator, it should be understood that the system should be in the form of a second form. Second, as long as one considers and considers the incomplete transfer function Gv (S) of the seed crystal rising speed operation amount generating device M10, Differential fractal, then the Gv (S) system can be

DV 1 + ' ^DV ' 來表現 方面,GT (s)係PI D,所以成為如以下般 7054-2811-PFl.ptc 第33頁 2001.12. 07. 034 /yDV 1 + '^ DV' to express, GT (s) is PI D, so it becomes as follows 7054-2811-PFl.ptc Page 33 2001.12. 07. 034 / y

^r(s) = i-f. 一1—· + — ΤΰΓ · s 、 V TirS \+aTTDT.Sj il+ Ί =_ {+ ^(Var Tdt^Tdt . r^)J + 5 · αΓ . - 7dt) . . (27) 之式子。 因而,合成轉移函數G (s)係成為如下式 G(〇= 土^ r (s) = if. a 1— · + — ΤΰΓ · s, V TirS \ + aTTDT.Sj il + Ί = _ (+ ^ (Var Tdt ^ Tdt. r ^) J + 5 · αΓ.-7dt) .. (27) formula. Therefore, the synthetic transfer function G (s) is as follows: G (0 = soil

V Α0 + 〜Κ).{1+^Ά + 7^ I ___i+g2(Wj^〜7^f · TDY + TDT) (28) 4(1 +印2+£^~3) 二,因為S2係存在於分母’所以可了解該當構成係 形0 ^ —·^ 在此,可以了解到同圖(a)所示之方塊圖係可變換 同圖(b)所示之方塊圖。該同圖(b)所示之方塊構成係與f 圖(a)所示之方塊構成為同樣,為關於結晶成長直徑GD之 控制之二形控制系,同時也為關於種晶上升速度讥之控令 之二形u:二解到因為圖4(a)所示之構成係」 最少之積为要素達成目的,所以可成為安定之控制系。V Α0 + ~ Κ). {1 + ^ Ά + 7 ^ I ___ i + g2 (Wj ^ ~ 7 ^ f · TDY + TDT) (28) 4 (1 + 印 2 + £ ^ ~ 3) Second, because S2 The system exists in the denominator ', so we can understand that the system should be composed of 0 ^ — · ^ Here, we can understand that the block diagram shown in the same figure (a) can be transformed into the block diagram shown in the same figure (b). The structure of the block shown in the same figure (b) is the same as the structure of the block shown in the figure (a). It is a two-dimensional control system about the control of the crystal growth diameter GD, and it is also about the seed crystal ascent rate. The second form of the control order u: The second solution is because the "minimum product" shown in Figure 4 (a) is the key to achieve the purpose, so it can be a stable control system.

508379 __案號88117857_年月 曰 鉻$_ 五、發明說明(32) 以上,可以確認到以微分要素為完全微分及不完全微 分之雙方而成為二形控制系。因而,以後,於確認是否為 二形控制系之際,便只考察一般上被使用在控制系之不完 全微分。 其次’考慮及關於以多段連接積分要素之場合。 首先,考慮於圖4之溫度操作量產生裝置μ 12之P ID方 塊以級聯來連接積分要素之場合,則該當構成之合成轉移 函fG (s)也成為三形之控制系,即使理想加熱器溫度為 人以上之函數,種晶上升速度SL也是以無定常偏差來收 敛。因而’將溫度操作量產生裝置M1 2以二段以上之積分 要素來構成係為有效的。但是,於增加積分要素之段數之 場$時,因為容易引起蜂鳴,所以於欲構築安定之=制系 之場合時’最好是將積分要素做成最小之段數。 圖5係顯示本發明之第二型態之變形例之方塊圖。同 圖$不般。種晶上升速度操作量產生裝置M1〇係可以一次 ,二要素D1及二次微分要侧之和來構成。以下,檢言正同 β不之構成是否構成二形以上之控制系。 銘:ρ Ip先,考慮及種晶上升速度操作量產生裝置Μ10之轉 移函數Gv (s)之不完全微分形,則該Gy (s)係可以下式 =^DV + 1 + OT1!;· . . 5" • · · (29)508379 __Case No. 88117857_ Year Cr $ _ 5. Description of the Invention (32) Above, it can be confirmed that the differential element is a complete differential and an incomplete differential, and becomes a two-form control system. Therefore, in the future, when confirming whether it is a two-form control system, we will only examine the incomplete differential which is generally used in the control system. Secondly, consider the case where points are connected in multiple stages. First, considering the case where the PID blocks of the temperature operation amount generating device μ 12 in FIG. 4 are connected in cascade to integrate integral elements, the synthetic transfer function fG (s) that should be constituted also becomes a three-shaped control system, even if ideally heated The device temperature is a function of more than people, and the seed crystal rising speed SL also converges with an unsteady deviation. Therefore, it is effective to constitute the temperature operation amount generating device M12 with two or more integral elements. However, when the field $ of the number of points of the integral element is increased, it is easy to cause a beep. Therefore, when a stable = system is to be constructed ', it is best to make the integral element the minimum number of stages. Fig. 5 is a block diagram showing a modification of the second aspect of the present invention. Same as picture $. The seed crystal rising speed operation amount generating device M10 can be constituted by the sum of the primary, two elements D1, and the secondary differential. In the following, it is checked whether the constitution of β is the same as the control system of two or more forms. Inscription: ρ Ip First, considering the incomplete fractal of the transfer function Gv (s) of the seed crystal rising speed operation amount generating device M10, the Gy (s) can be expressed as follows: ^ DV + 1 + OT1!; · .. 5 " • · · (29)

508379 修正 β 88117^7 五、發明說明(33) 來表現。 因為GT (s)係與式27為相508379 Amended β 88117 ^ 7 V. Description of invention (33). Because GT (s) is the same as Equation 27

(s)係成為如下式 听以口成轉移函數G 〇(s) = £r (30) ==0 2 ^1^3) ~Al+^ + C252)~~" 般因為S2係存在於分母,所以 二而且门,係有關於結晶成長解直徑= π 匕:rsL之控制之二形= 成目的,所以成係以最少之積分要素達 圖。說明本發明之第二型態之作用之模式的時序 *基==== 之舉動,而同_係顯 似、及溫度操作:產^種=::度操作量 第二型態之作用。 ^化以下,基於該圖6,來說明 首=,坩堝14 -上升,則供應熱量與放出熱量 S成量變大。其結果’單晶體1〇成為容易固化: (二重= 以料ΐ晶上升速度操作量產生裝置M1〇係將重量偏差GWD予 二微刀括而產生對應於如同圖(b)所示之重量偏差GWD之變 化’即種晶上升速度操作量SLC。其結果,結晶成長直徑 晒 第36頁 2001.12.07.037 508379 _案號 88117857 五、發明說明(34) GD開始向目標值收斂。 同時,溫度操作量產生 而使溫度操作量TC增加。其 加,而加熱器1 6之溫度上升 值0 裝置M12係積分重量偏差GWD, 結果,根據溫度操作量TC之增 ’不足熱量則漸趨於變動前之The (s) system becomes the following transfer function G 〇 (s) = £ r (30) == 0 2 ^ 1 ^ 3) ~ Al + ^ + C252) ~~ " Generally because the S2 system exists in the denominator Therefore, the second gate is related to the crystal growth solution diameter = π dagger: the control of rsL two forms = the purpose, so the system is reached with the least integral elements. The timing of the mode that explains the effect of the second form of the present invention is the action of * base ====, which is similar to the _ series, and the temperature operation: production ^ species = :: degree of operation. The effect of the second form. In the following description, based on this FIG. 6, the following explanation will be given: If the crucible 14 is raised, the amount of supplied heat and emitted heat S will increase. As a result, the 'single crystal 10' becomes easy to cure: (Dual = The operating amount generating device M10 is operated at the rising speed of the material crystal, and the weight deviation GWD is given to the two micro-blades to generate a weight deviation corresponding to the weight shown in FIG. The change of GWD 'is the seed crystal ascent speed operation amount SLC. As a result, the crystal growth diameter is exposed. Page 36 2001.12.07.037 508379 _ Case No. 88117857 V. Description of the invention (34) GD starts to converge to the target value. At the same time, the temperature operation amount The temperature operation amount TC is increased. When it is increased, the temperature increase value of the heater 16 is 0. The device M12 is an integral weight deviation GWD. As a result, according to the increase of the temperature operation amount TC, the insufficient heat tends to change before the change.

Ik著不足熱置趨近於預定值,單晶體1〇之容易固化返 回原來,重量偏差GWD之增加變為緩和。其結果,種晶上 升速度操作量SLC減少,結晶成長直徑(^在收斂於目標值 之時點成為0。即,結晶成長直徑〇與種晶上升速度讥收 斂於目標值。該狀態一直繼續,則重量偏差GWD安定在定 值,而成為同圖(a)之水平部分之輸出。 因而,再度藉由坩堝14之上升,不足熱量一變大, 反覆如上述般之作用,使結晶成長直徑GD與種晶上 SL收斂於目標值。 τ | & 以基於將根據上述作用之反覆而得之舉動型態 同圖之時序圖來說明,首先,重量偏差GWD係根據社曰丁 ; 長直徑GD之舉動,將增加和安定予以反覆,而成為y日成 (a)所不之階梯狀之輸出。一方面,種晶上升速度·旦 SLC係反應重量偏差GWD之梯度而增加,係反覆重里 GWD朝向安定方向而收斂於〇之作用,而成為如同 SLC般之輸出。另一方面,溫度操作量TC係以根據)= 差GWD之大小之斜度來增加,而輸出如同圖(b)之里 型態。換言之,該溫度型態係做為重量偏差GWD 之溫度 積分運算值而輸出之型態,而成為吸收結 夂之 乂仅糸之複雜Ik is close to a predetermined value, and the single crystal 10 is easily cured and returns to its original state, and the increase in weight deviation GWD becomes moderate. As a result, the seed crystal ascent speed operation amount SLC decreases, and the crystal growth diameter (^ becomes 0 when it converges to the target value. That is, the crystal growth diameter 0 and the seed crystal ascent speed 讥 converge to the target value. This state continues continuously, then The weight deviation GWD stabilizes at a fixed value and becomes the output of the horizontal part of the same figure (a). Therefore, once the crucible 14 rises again, the insufficient heat becomes large, and the effect of the above is repeated, so that the crystal growth diameter GD and The SL on the seed crystal converges to the target value. Τ | & A timing diagram based on the same behavior pattern obtained by repeating the above action will be described. First, the weight deviation GWD is based on the company ’s long diameter GD. This action will increase the stability and stability repeatedly, and become a stepped output that y Nisei (a) does. On the one hand, the seed crystal ascent rate · SLC increases the gradient of the weight deviation GWD, which is the direction of the GWD repeatedly. It stabilizes in the direction and converges to 0, and becomes an output like SLC. On the other hand, the temperature operation amount TC is increased according to the slope of the difference = GWD, and the output is as shown in Figure (b). Type. In other words, the temperature pattern is a pattern that is output as the temperature integral operation value of the weight deviation GWD, and becomes the absorption structure.

508379 88Π7857508379 88Π7857

五、發明說明(35) 環境變化之理想的型態 還有,同圖所示之時序圖係顯示將實際之成長模型 以簡化者,實際之舉動係比同圖所示者更複雜。 、 若依據以上說明之本發明之第二型態,則因為根據 量偏差GWD之變動’而產生種晶上升速度操作量3!^,而溫 度操作量T C自己整合地形成加熱器溫度之理想型態,所ρ 以將種晶上升速度SL之變動以最小限壓住之構成而可期^ 結晶成長直徑GD之收斂。其結果,可達成合適之二數值控 在此,做為補足說明,再度來敘述有關於種晶上升速 度SL之比例要素之不利益之作用。具有某一重量偏差之值 而女疋住時(一定值)’係溫度之操作量為以一定之梯度辦 加而安定住。在此,使重量偏差收斂於〇之比例要素係停印 止溫度之操作量之一定梯度之增加,而使其斜度減少。因 此,而考慮及含有比例要素之速度控制系係於必須上升、、四 度時作用於下降溫度之方向,控制系因而不安定而引= 鳴現象。 今 (第三型態)V. Description of the invention (35) Ideal type of environmental change Also, the timing diagram shown in the same figure shows the simplified model of actual growth. The actual action is more complicated than that shown in the same figure. According to the second form of the present invention described above, the seed crystal rising speed operation amount 3! ^ Is generated because of the variation of the amount deviation GWD ′, and the temperature operation amount TC itself forms an ideal type of the heater temperature. Therefore, ρ can be expected to converge with the crystal growth diameter GD by composing the fluctuation of the seed crystal rising speed SL with the minimum pressure. As a result, a suitable two-value numerical control can be achieved. As a supplementary explanation, the unfavorable effect of the proportional element of the seed crystal rising speed SL will be described again. There is a certain weight deviation value, and when the son-in-law is holding (a certain value), the operating amount of temperature is settled with a certain gradient. Here, the proportional element that makes the weight deviation converge to 0 is an increase in a certain gradient of the operation amount at which the printing is stopped and the temperature is reduced, so that its slope is reduced. Therefore, the speed control that takes into account and contains the proportional element is in the direction of falling temperature when the temperature must rise, and the temperature is four degrees. Therefore, the control system is unstable and causes the phenomenon of humming. Today (Third Form)

本發明之第三型態係例示對光學式上拉裝置之 之適用可能性。 U I係顯示有關於本發明之第三型態之二數值控制裝 罝之構成之方塊圖。以了,基於同圖,來說明本發明 :里,之構成。還有’關於以前述第一型態為準之構成: ”,係賦予同一符號並省略說明,在以下之說明中,主要The third aspect of the present invention exemplifies the applicable possibility to an optical pull-up device. U I is a block diagram showing the configuration of the numerical control device of the second type of the third aspect of the present invention. Therefore, based on the same figure, the structure of the present invention will be described. There is also 'about the structure based on the aforementioned first type:', the same symbol is given and the description is omitted. In the following description, mainly

7054-281l-PFl.ptc 第38頁 2001.12. 07.039 508379 修正7054-281l-PFl.ptc Page 38 2001.12. 07.039 508379 Fix

MM 88117RB7 五、發明說明(36) 說明與第一型態相異之部分。 直徑控制參數檢測裝置M14係將結晶成長直徑gd 直徑控制參數CP予以檢測,並將該檢測之 ·、、、 號產生裝置M16。 和®於偏差信 偏差信號產生裝置Μ16係產生直徑控制參數檢測 所檢測知結晶成長直徑⑽與該結晶成長直徑⑼之^ ,之差(以下、稱&「直徑偏差GDD」),並將該產生: =差GDD輸出於種晶上升速度操作量產 操作量產生裝置Ml 2。 /凰度 種晶上升速度操作量產生裝置M10係以含有比例項 ^ ί ΐ Ϊ來表現,並將根據直徑偏差GDD之信號做為種晶 生梦tn操作量似予以輸出。將種晶上升速度操作量產 2 ί曰匕以比例要素而構成之理由係直徑偏差⑽成為0 之時結日日成長直徑GD成為目標值。 制璧+ ^此目’I ^要一留意種晶上升速度SL為=數值控制之控 制對象,則猎由直徑偏差GDD之增加而使之變化之 升速度SL係需要立刻返回至目標值。有如前述般,只要返 該目桂值為止之時間一較長,則會影響及單晶體1 〇之 品質。 於任,Ϊ且於種晶上升速度操作量產生裝置M10含有響應 = i D之變動履歷之要素為不理想。因為該當 ,素係,用於使種晶上升速度礼發散之方向。於光學式之 ,合,=當於該要素者係將直徑偏差GDD之值予以積分運 算之積分要素。MM 88117RB7 V. Description of Invention (36) Explains the part that is different from the first type. The diameter control parameter detection device M14 detects the crystal growth diameter gd and the diameter control parameter CP, and generates the detection device M16 of the ... And ® in the deviation signal deviation signal generating device M16 generates a difference between the diameter of the crystal growth diameter 知 and the crystal growth diameter 所 detected by the diameter control parameter detection (hereinafter, referred to as " diameter deviation GDD "), and Generated: = The difference GDD is output to the seed crystal rising speed operation mass production operation amount generation device Ml 2. / Phoenix degree The seed crystal ascending speed operation amount generating device M10 is expressed by including the proportional term ^ ί ΐ Ϊ, and the signal according to the diameter deviation GDD is output as the seed crystal dream tn operation amount. The reason why the seed crystal ascent speed operation is mass-produced 2 The reason that the dagger is composed of proportional elements is that the diameter deviation ⑽ becomes 0 when the diameter deviation ⑽ becomes 0, which becomes the target value. Control + ^ This item ‘I ^ To pay attention to the control object of seed crystal ascending speed SL == numerical control, then the ascending speed SL of the diameter deviation GDD needs to be returned to the target value immediately. As before, as long as the time before returning to this value, the quality of the single crystal 10 will be affected. Yu Ren, it is unsatisfactory that the seed crystal raising speed operation amount generating device M10 contains the element of the change history of response = i D. Because it should be, the prime system is used to make the seed crystals rise in speed and diverge. In the optical formula, the sum, = the integral element that calculates the value of the diameter deviation GDD by integrating the element.

508379508379

-___鎌 88117857 五、發明說明(37) 溫度操作量產生装置Μ 1 2係以含有積分項之轉移函數 來表現’並將響應於直徑偏差GDD之履歷之信號做為溫度 麵作量TC予以輸出。於溫度操作量產生裝置Μ12含有積分 要素之理由係有如在前述之發明程序所說明般。還有,關 於該,度操作量產生装置Μ1 2係微分要素及比例要素以不 成為弊害’而有如同圖所示般,可做為Ρ I D來使用。 ^、尺 檢註該第三塑悲之構成是否構成二形以上之控 ,系。首先’種晶上开速度操作量產生裝置Μ1 〇之轉移函 數Gv (s)係成為以下 之式子。 之式子。 因而,合 (31) S )係成為以下 [1 + -¥ατ·¥ TDT Ί .(32) + s2(W沉+ 成轉移函數G (S)係可以如下式 Ογ 來表現,因為S2 ‘·(33) 係存在於分母,所以可了解該當構成係為-___ sickle 88117857 V. Description of the invention (37) The temperature operation amount generating device M 1 2 is expressed by a transfer function including an integral term, and a signal corresponding to the history of the diameter deviation GDD is used as the temperature surface amount TC. Output. The reason why the temperature operation amount generating device M12 includes an integral element is as explained in the aforementioned invention procedure. In this regard, the degree-of-operation-quantity generating device M1 2 is a differential element and a proportional element so as not to be a disadvantage ', as shown in the figure, and can be used as PI D. ^, Ruler Check whether the composition of the third plastic sadness constitutes more than two forms of control. First, the transfer function Gv (s) of the opening speed operation amount generating device M10 on the seed crystal is given by the following formula. Formula. Therefore, the combined (31) S) system becomes the following [1 +-¥ ατ · ¥ TDT Ί. (32) + s2 (W Shen + formation transfer function G (S) system can be expressed as the following formula 0γ, because S2 '· (33) The system exists in the denominator, so we can understand that the constituent system is

第40頁 2001.12. 07. 041 508379 _案號 88117S57 年 月 g__ 五、發明說明(38) 二形。而且’了解到係有關於結晶成長直徑GD之控制之二 形控制系,同時為有關於種晶上升速度SL之控制之二形控 制系。再者,了解到因為該當各構成係以最少之積分要素 達成目的,所以成為安定之控制系。 關於於溫度操作量產生裝置Ml 2之PID方塊以三段以上 之級聯來連接積分要素之場合,與前述之第二型態為同 樣、因為成為二形,所以即使理想加熱器溫度之型態為一 -人以上f函數,種晶上升速度SL也是以無定常偏差來收 斂二t疋,於積分要素之段數增加之場合時,因為容易引 起蜂鳴’所以需要注意。 圖8係顯示本發明之第三型態之變形例之方塊圖。同 圖所示般,種晶上升速度操作量產生裝置M1〇係可以比例 ”與t分要素之合加以構成。以下,檢証同圖所示之構 成是否構成二形以上之控制系。 、f先,種晶上升速度操作量產生裝置M1〇之轉移函數 做為Gv ( s )係可以下式 GA) = 1 + —. s — ...(34)Page 40 2001.12. 07. 041 508379 _ Case No. 88117S57 month g__ V. Description of the invention (38) Two forms. Furthermore, it is understood that it is a two-form control system related to the control of the crystal growth diameter GD, and is also a two-form control system related to the control of the seed crystal rising speed SL. Furthermore, I learned that each component should achieve a stable control system because it achieves its goal with the fewest points. In the case where the PID element of the temperature operation amount generating device M12 is connected in cascade with three or more stages, the integral element is the same as the second type described above, because it has a two-shape, so even the ideal heater temperature type As a function of one-person or more, the seed crystal rising speed SL also converges to two t 疋 with an unsteady deviation. When the number of integral elements increases, it is easy to cause buzzing, so you need to pay attention. FIG. 8 is a block diagram showing a modification of the third aspect of the present invention. As shown in the figure, the seed crystal ascending speed operation amount generating device M10 can be constructed by combining the ratio of “t” and t. The following shows whether the structure shown in the figure constitutes a control system with more than two shapes. F First, the transfer function of the seed crystal rising speed operation amount generating device M10 is set as Gv (s), which can be expressed by the following formula GA) = 1 + —. S — ... (34)

所以合成轉移函數G =(Tpy + aY · ^Σ>γ) + l) 1 + (Χγ · Tj-^γ * 5 來表現。 因為GT (s)係與式32為相同So the synthetic transfer function G = (Tpy + aY · ^ Σ > γ) + l) 1 + (χγ · Tj- ^ γ * 5 is expressed. Because GT (s) is the same as Equation 32

观379 皇號 88117857 五、發明說明(39) (s )係可以如下式 G(s) =σ7 曰 正 rr(l + S,+ C/2 + D/) ~?(l + 5/ + C〆)~' •*(35) J ’因為S2係存在於分母’所以可了解該 二而且,了解到係有關於結晶成長直徑讣上:為二 控制糸,同時為有關於種晶上升速度乩之工—之一形 系。再者,了解到因為該當各構成係以最;之二:m 成目的,所以成為安定之控制系。 積刀要素達 圖9係說明本發明之第三型態之作用士 圖。同圖u)係顯示直徑偏差GDD之舉動,而同貝 糸顯不基於该直徑偏差GDD之舉動所產生之種曰 操作量SLC、及溫度操作量Tc之_ 日日上升速度 來說明第三型態之作用里之…以下,顧^ 瓦解百S足:士上★’則供應熱量與放出熱量之均衡 社曰& #亩二二二。其結果,單晶體1 0成為容易固化, ⑷所示般,直徑偏差^ =長直㈣—增加,則如同圖 炉偏ΐ二1丄速上操作量產生裝置M10之比例要素係將直 ,而產生對應於如同圖(C)所示之直 ST標二之 ΪΗ 7054-281l-PFl.ptc 第42頁 2001.12. 07. 043 508379 曰 修正 案號 88117857 五、發明說明(40) 同時’溫度操作量產生裝置M12係積分直徑偏差GDD, 而將結晶成長直徑GD之變動履歷做為積分運算值予以產 生。因而,再者,積分該積分運算值,而使溫度操作量 增加。其結I ’根據溫度操作㈣之增加,加熱器16之溫 度係上升,不足熱量則漸趨於變動前之值。 、酼著不足熱量趨近於預定值,單晶體1 〇之容易固化係 返回原來,直位偏差GDD之增加變為緩和。其結果,種晶 上升速度紅作1SLC減少,結晶成長直徑GD在收斂於目標 值之時點成為0。即,結晶成長直働與種晶上升速度讥 收斂於目標i。該狀態一直繼續,則直徑偏差GDD安定在 0 ’而成為同圖(a)之水平部分之輸出。 因而,再度藉由坩堝14之上升,不足熱量一變大,則 ^覆如上述般之作用,使結晶成長直徑GD與種 SL收斂於目標值。 < & 以,於將根據上述作用之反覆而#之舉動型態顯示於 mi序:來說明,首先’直徑偏差_係根據結晶成 長直位GD之舉動,將增加和安定予以反覆,而成為同圖 (a)所不之輸出。因而,響應於直徑偏差GD])之種晶上 度操作量SLC係成為如同圖(c) iSLc般之輸出。 、 一方面,直徑偏差GDD之積分值係直徑偏差每次變 :u:運算,而成為如同圖⑻所示之階段狀之輸 以相墟;Ϊ/h溫度操作量TC係直徑偏差GDD之積分值,即 根據冋圖(b)所示之斜度來增加’而輸出如同圖(c)所干 之K之溫度型態。換言之,該溫度型態係做為门二);不View 379 King No. 88117857 V. The description of the invention (39) (s) can be as follows: G (s) = σ7 is positive rr (l + S, + C / 2 + D /) ~? (L + 5 / + C 〆) ~ '• * (35) J' Because the S2 system exists in the denominator ', you can understand the two. Moreover, it is understood that the system has a relationship with the crystal growth diameter 讣: it is the second control 糸, and it is about the seed crystal rise speed 上升Work-a form. Furthermore, I learned that because each component should be the most important; the second: m as the purpose, so it becomes a stable control system. Figure 9 shows the function of the third form of the present invention. The same figure u) shows the behavior of the diameter deviation GDD, and Tongbei does not explain the third type based on the operation amount SLC and the temperature operation amount Tc of the diameter deviation GDD. In the role of the state ... the following, Gu ^ disintegrate one hundred S feet: Shi Shang ★ 'is a balanced society that supplies heat and releases heat. As a result, the single crystal 10 becomes easy to solidify. As shown in ⑷, the diameter deviation ^ = long straight 增加 —increases, and the proportional elements of the operation amount generating device M10 at the speed of the furnace 1 丄 2 丄 will be straight, resulting in Corresponds to the straight ST mark II as shown in Figure (C) 7054-281l-PFl.ptc Page 42 2001.12. 07. 043 508379 Amendment No. 88117857 V. Description of the invention (40) Simultaneous' temperature operation amount generated The device M12 is an integral diameter deviation GDD, and a change history of the crystal growth diameter GD is generated as an integral calculation value. Therefore, the integrated operation value is integrated to increase the temperature operation amount. The junction I 'increases according to the temperature operation, and the temperature of the heater 16 rises, and the insufficient heat tends to the value before the change. When the insufficient heat approaches the predetermined value, the easy-to-solidify system of the single crystal 10 will return to its original state, and the increase in the positional deviation GDD will become moderate. As a result, the seed crystal ascent rate decreases by 1 SLC, and the crystal growth diameter GD becomes 0 when it converges to the target value. That is, the crystal growth rate 働 and the seed crystal rise rate 讥 converge to the target i. This state continues until the diameter deviation GDD stabilizes at 0 'and becomes the output of the horizontal part of the same figure (a). Therefore, once the crucible 14 rises again, and the insufficient heat becomes large, the effect as described above is covered, so that the crystal growth diameter GD and the species SL converge to the target value. < & In order to show the repetitive behavior of # according to the above-mentioned action in the mi sequence: to explain, first of all, the 'diameter deviation_ is the behavior of upright GD according to crystal growth, it will increase and stabilize iteratively, and The output is the same as that shown in Figure (a). Therefore, the seed crystal upper-level manipulated variable SLC in response to the diameter deviation GD]) is output as shown in (c) iSLc. On the one hand, the integral value of the diameter deviation GDD means that the diameter deviation changes each time: u: calculation, and it becomes a phase-like loss as shown in Figure 以; phase temperature is the integral of the diameter deviation GDD. The value is increased according to the slope shown in the figure (b), and the temperature pattern of K as shown in figure (c) is output. In other words, the temperature pattern is used as the gate 2);

508379 五、發明說明(41) 曰曰成^糸之稷雜之%楗變化之理想的型態。 還有,同圖所示之日吝床岡焱收— 易化者,f際之舉動係比n;所::際之成長杈型予以簡 诉比同圖所不者還複雜。 依據以上說明之本發明 笛二 ^ 偏差GDD之大小之種晶上a升二」6,係產生根據直徑 量tc自己整合地形成加熱;作量SLC:因為溫度操作 晶上升速度SL之變動以;7 :;作理想型態’所以以將種 之:;補ί?果,可達成合適之二508379 V. Description of the invention (41) The ideal form of the change of %% which is called ^ 成. In addition, on the date shown in the same figure, it is easier for the facilitator to f, and the action of f is more complicated than that of the same figure. According to the above description of the present invention, the seed crystal with a deviation of GDD from the size of "a" to "2" 6 is generated according to the diameter tc and integrated heating is performed; the amount of SLC: because of the temperature operation of the crystal ascending speed SL changes; 7 :; make the ideal type 'so it will be planted :; supplementing the fruit, you can achieve the appropriate two

具有積分要素之場“明來於種晶上升速度SL 分要素之不利益之點。直;;上升速度SL之積 過去帶有直徑偏矣夕居庇 '偏差M吏疋女定在0也會有於 因而,考慮^直俨上加、t,則該積分要素係持有操作量。 值之安定狀態。:過去之方:::得到收斂於目標 之積分值盥傷古a 之履歷中,假如直徑偏差之正方向 說是可二數值控制之=銷條# ’則雖可 慮成:該:在?最低-次函數來增加,所以可考 即使;ΐ併:ί:ί之習知技術中所說明之第三技術般, 每—批次之纟士 S…、器溫度之理想型態,但因為理想型態係 值與負方向拉為不同,所以考慮及使正方向之積分 【實施例° 、为值相一致,而做沖銷係有所困難。The field with integral elements "is derived from the point that the seed crystal's ascending speed SL is not beneficial. Straight ;; the product of the ascending speed SL used to have a diameter bias of 居 居 居 居 'deviation. Therefore, considering the addition of ^ and t, the integral element holds the operation amount. The stable state of the value .: The past method :: Get the integral value that converges to the target. If the positive direction of the diameter deviation is controllable by two numerical values = pin ##, then it can be considered as: this: the minimum-order function to increase it, so you can test even; The third technology described in the above is the ideal pattern of each batch of warrior S ..., the temperature of the device, but because the ideal pattern is different from the negative direction, the positive direction integral is considered and implemented. [Implementation For example, the values are consistent, but it is difficult to do offsetting.

508379508379

將重$偏差GWD以並列輸入於d型速度操作放大器72與 HD型溫度操作放大器74,而分別獨立產生種晶上升速度 操作量SLC與溫度操作量TC。該種晶上升速度操作量讥^係 使種晶上升速度SL變化而使結晶成長直徑⑼收斂,溫度操 作量TC係使加熱器溫度變化而使不足熱量收斂於預定值 (參考圖13)。 (最佳之實施例) 圖10係顯示有關於本發明之最佳之實施例之單晶體之 二數值控制裝置之構成。以了,基於同圖,來說明該二數 值控制裝置之構成。在該實施例中’係同時來說明重量式 與光學式’而可明確了解到本發明為可實施在任一個方 :丄還有,關於在前述之發明之實施型態中所說明之構成 要素,係賦予同一符號而省略詳細說明。而且,在以下之 祝明中,附加在信號名之後之〈&gt; 係表示單位者。 主控制部30係驅使種晶控制部32、賴控制部48、及 力口熱器,制部34,並執行結晶成長直徑⑼與種晶上升速度 之二數值控制。因為該主控制部3〇係達成該二數值控 Π 2決定種晶上升速度SL、坩堝之上升速度、及加 .、、、益之^度,並將該決定之值分別輸出於種晶控制部32、 器控制部34。再者,因為該主控制 =7為一定’所以隨著單晶體&quot;之成 長而了進订使掛禍14以預定之比率上升之液位一定^ 制。還有,因為該液位-定控制係習知之技術,所以^略The weight deviation GWD is input in parallel to the d-type speed operational amplifier 72 and the HD-type temperature operational amplifier 74, and the seed crystal rising speed operation amount SLC and temperature operation amount TC are independently generated. The seed crystal raising speed operation amount 讥 ^ changes the seed crystal raising speed SL to converge the crystal growth diameter ,, and the temperature operation amount TC changes the heater temperature so that the insufficient heat converges to a predetermined value (refer to FIG. 13). (Best Embodiment) Fig. 10 shows a configuration of a numerical control device for a single crystal according to a preferred embodiment of the present invention. Therefore, the structure of the binary control device will be described based on the same figure. In this embodiment, "the weight type and the optical type are described simultaneously", and it is clearly understood that the present invention can be implemented in any one of the following aspects: 丄 Furthermore, regarding the constituent elements described in the aforementioned implementation mode of the invention, The same symbols are assigned and detailed descriptions are omitted. In addition, in the following descriptions, <&gt; appended to the signal name indicates a unit. The main control section 30 drives the seed crystal control section 32, the Lai control section 48, and the heater heater and the manufacturing section 34, and performs numerical control of the crystal growth diameter ⑼ and the seed crystal rising speed. Because the main control unit 30 achieves the two-value control Π 2 to determine the seed crystal ascent speed SL, the crucible ascent speed, and the plus, the, and the benefit angle, and output the determined values to the seed crystal control, respectively.部 32 、 器 控制 部 34。 32, device control section 34. Furthermore, because the main control = 7 is constant, as the single crystal &quot; grows in size, the order is made so that the liquid level at which the accident 14 rises at a predetermined ratio is constant. Also, because the level-definite control system is a well-known technology, so

2001.12. 07. 046 7054-2811-PFl.ptc 第45頁 修正 曰 t號 88117857 五、發明說明(43) ,詳細之說明’而在以下之說明,係就種晶1 8之上升高度 為與結f成長長度GL等價來加以說明。 種晶控制部3 2係具有測定有關種晶1 8之升降及旋轉之 控制機構和結晶成長重量Gw之重量感測器2 6 (參考圖丨丨), 而以主控制部30所決定之種晶上升速度SL來使種晶丨8上 升。 #蜗1控制部48係具有關於坩堝1 4升降及旋轉之控制機 構(參考圖11 ) ’而以主控制部3 〇所決定之速度來使坩堝i 4 上升。 &gt;加熱器控制部34係基於主控制部30之輸出HPWR&lt; volt &gt;仏娩/而產生HCNT&lt;W/h&gt;信號,並將該產生之信號輸出於 加熱器16。其結果,加熱器16係根據HCNT&lt;w/h&gt;而發熱, 並供應熱量給坩堝1 4。 直徑感測器2 8係配設於溶液1 2之上方,而以光學方法 檢測結晶成長直徑GD。因而,將該檢測之值做為GD &lt; v 〇 11 &gt; 4吕说輸出於主控制部30。該直徑感測器28係使用於光學 式之場合。 保溫筒4 0係配設於加熱器丨6之外圍,並將從加熱器j 6 所放出之熱保持於其内側,使對坩堝丨4之供熱效率提高。 々溫度感測器4 2係配設於保溫筒4 〇之内部,並檢測保溫 ^40之週邊溫度。因而,將該檢測之溫度做&amp;TMp&lt;v〇LT&gt; 信號輸出於主控制部30。還有,以代替該溫度感測器42, 將放射溫度計配設於保溫筒40之週邊,也可測定構成保溫 筒40之内側之披覆材之溫度。 ,2001.12. 07. 046 7054-2811-PFl.ptc Page 45 amended t number 88117857 V. Description of the invention (43), detailed description 'and the following description is that the rising height of the seed 18 is the sum of the f growth length GL is equivalent. The seed crystal control unit 3 2 is a weight sensor 2 6 (see figure 丨 丨) having a control mechanism for measuring the lifting and rotation of the seed crystal 18 and the crystal growth weight Gw (see figure 丨 丨), and the seed determined by the main control unit 30 The crystal rising speed SL is used to make the seed crystal 8 rise. # Nail1 control unit 48 is provided with a control mechanism (refer to FIG. 11) for raising and lowering the crucible 14 and the crucible i 4 is raised at a speed determined by the main control unit 30. &gt; The heater control unit 34 generates an HCNT &lt; W / h &gt; signal based on the output HPWR &lt; volt &gt; of the main control unit 30, and outputs the generated signal to the heater 16. As a result, the heater 16 generates heat in accordance with HCNT &lt; w / h &gt;, and supplies heat to the crucible 14. The diameter sensor 28 is arranged above the solution 12 and optically detects the crystal growth diameter GD. Therefore, the detected value is output to the main control unit 30 as GD &lt; v 〇 11 &gt; 4. The diameter sensor 28 is used in an optical type. The heat preservation tube 40 is arranged on the periphery of the heater 丨 6, and keeps the heat released from the heater j 6 on the inside, so that the heating efficiency of the crucible 丨 4 is improved. 々The temperature sensor 4 2 is arranged inside the thermal insulation tube 40 and detects the temperature around the thermal insulation ^ 40. Therefore, the detected temperature is output to the main control unit 30 as a & TMp &lt; v〇LT &gt; signal. In addition, instead of the temperature sensor 42, a radiation thermometer is arranged around the heat-retaining tube 40, and the temperature of the covering material constituting the inside of the heat-receiving tube 40 can also be measured. ,

7054-2811-PFl.ptc 第46頁 2001.12. 07. 0477054-2811-PFl.ptc Page 46 2001.12. 07. 047

於发ΐ?係以密氣容納坩堝14和加熱器16等之熱領域零件 ' °卩。於該室3 8内氬氣體係被供應。 堝护:f軸46係被固定於坩堝支持台44之下面,並藉由坩 將:禍=力而:降及旋轉,支持台44係 也載置其 而追蹤坩堝軸46之上下動及旋轉 夕。其結果’掛禍1 4係可升降及旋轉。 圖11係顯示圖10所示之種晶控制部32及坩堝控制部48 =構成之方塊圖。以下,基於同圖,來說明種晶控制部32 及掛堝控制部4 8之構成。Yufa? It is used to contain crucibles 14 and heaters 16 in the air. An argon system is supplied in the chamber 38. Cauldron protection: The f-axis 46 is fixed below the crucible support table 44, and the crucible will be: disaster = force and: drop and rotate, the support table 44 is also placed to track the crucible shaft 46 up and down and rotate Xi. As a result, the hanging system 1 and 4 can be lifted and rotated. FIG. 11 is a block diagram showing the configuration of the seed crystal control section 32 and the crucible control section 48 shown in FIG. 10. Hereinafter, the configurations of the seed crystal control unit 32 and the pot control unit 48 will be described based on the same figure.

▲ 口第一馬達放大器54-1係將主控制部3〇之輸出SL&lt; v〇it &gt;信號做為設定信號來接收,一面參考第一齒輪M—丨之旋 轉速度來產生SCNT&lt; volt &gt;信號。因而,將該產生之信號 輸出於第一馬達5〇-1。 —第一馬達50-1係根據第一馬達放大器54 —丨之輸出SCNT 來旋轉第一齒輪5 2 - 1。其結果,線纜筒2 4旋轉,而線纜2 2 被捲繞,種晶1 8則係上升。還有,於使種晶丨8下降之場合 時,係使第一馬達50-1逆旋轉。▲ The first motor amplifier 54-1 receives the output SL &lt; v〇it &gt; signal of the main control unit 30 as a setting signal, and generates SCNT &lt; volt & gt while referring to the rotation speed of the first gear M- 丨. ;signal. Therefore, the generated signal is output to the first motor 50-1. —The first motor 50-1 rotates the first gear 5 2-1 according to the output SCNT of the first motor amplifier 54 —. As a result, the cable tube 24 is rotated, the cable 2 2 is wound, and the seed crystal 18 is raised. When the seed crystal 8 is lowered, the first motor 50-1 is rotated in the reverse direction.

第方疋轉式解碼器5 6 — 1係將第一齒輪5 2 - 1之旋轉速度 轉換成脈波信號,而輸出於第一脈波計數器5 8 —丨。第一脈 波計數器58-1係將從第一旋轉式解碼器π —丨所接收之脈波 信號予以計數,而將該計數結果做為SLH信號(種晶上升高 度)輸出於主控制部30。還有,於種晶18下降之時,第一 脈波計數器5 8 -1之計數值係減少。 於種晶控制部3 2内係除了同圖所示之構成外,設置有The first square-turn encoder 5 6 — 1 converts the rotation speed of the first gear 5 2-1 into a pulse wave signal and outputs it to the first pulse wave counter 5 8 — 丨. The first pulse wave counter 58-1 counts the pulse wave signals received from the first rotary decoder π — 丨, and outputs the counted result as a SLH signal (seed rising height) to the main control unit 30 . When the seed crystal 18 is lowered, the count value of the first pulse wave counter 5 8 -1 is decreased. In addition to the structure shown in the figure, the seed crystal control unit 32 is provided with

第47頁 2001.12.07.048 508379Page 47 2001.12.07.048 508379

可使種晶1 8旋轉之構成。該構成係準於使上述種晶丨8上升 之構成者,在此省略說明。 第二馬達放大器54-2係將主控制部30之輸出CL&lt; v〇1t &gt;信號做為設定信號予以接收,一面參考第二齒輪52_2之 旋轉速度一面產生馬達驅動電力CCNT&lt; v〇u〉。因而,將 該產生之信號輸出於第二馬達一2。 _第二馬達50-2係根據第二馬達放大器54-2之輸出使第 二齒輪52-2旋轉。還有,於使坩堝14下降之場合時,係使 第一馬達50_2逆旋轉。 於坩堝控制部48内係除了同圖所示之構成外,設置有 可2坩堝14旋轉之構成。該構成係準於使上述坩堝14上升 之構成者,在此省略說明。 圖1 2係顯示圖1 0所示之加熱器控制部34之構成之方 ,、。冋圖所示I,加熱器控制部34係以使用 感測器之反饋控制系所構成。因A 及電力 所以省略詳細之說明。 為如遠構成係習知技術, 圖13係顯示有關圖10所示主控制部3〇之重量 方塊之構成之方塊圖。以下 飞之第 量式之第-方塊之構成。還有使之有關該重 含在轉移函數之參數以如以下般予以統―㈣巾’係將包 V速度變換常數、Κτ=溫度變換常數 — 速度控制系微分係 微分時間、TDT=溫度控制系微分時^數度控制系 時間、Τιτ=溫度控制系積分時間子門Τι厂速度控制系積分 數及度控制系微分係數、pv=速度控制系 比例增The seed crystal 18 can be rotated. This structure is for a structure that raises the seed crystal 8 described above, and the description is omitted here. The second motor amplifier 54-2 receives the output CL &lt; v〇1t &gt; signal of the main control unit 30 as a setting signal, and generates motor driving power CCNT &lt; v〇u> while referring to the rotation speed of the second gear 52_2. . Therefore, the generated signal is output to the second motor-2. The second motor 50-2 rotates the second gear 52-2 based on the output of the second motor amplifier 54-2. When the crucible 14 is lowered, the first motor 50_2 is rotated in the reverse direction. A crucible control unit 48 is provided with a structure capable of rotating two crucibles 14 in addition to the structure shown in the figure. This structure is for a structure which raises the crucible 14 mentioned above, and description is omitted here. FIG. 12 shows the structure of the heater control section 34 shown in FIG. 10. As shown in the figure, the heater control unit 34 is constituted by a feedback control system using a sensor. Because of A and power, detailed explanation is omitted. FIG. 13 is a block diagram showing the structure of the weight block of the main control unit 30 shown in FIG. The following is the constitution of the first-square of the quantitative formula. In addition, the parameters that are included in the transfer function are unified as follows-"㈣" is a combination of the velocity conversion constant V, τ = temperature conversion constant-speed control system differential system differential time, TDT = temperature control system Differential time ^ Several degrees of control time, Tit = temperature control time integration time Zimen Ti factory speed control system integration number and degree control system differential coefficient, pv = speed control system proportional increase

7054-281l-PFl.ptc 第48頁 2001.12. 07. 049 508379 案號 88117857 五、發明說明(46) 益、Ρτ =溫度控制系比例增益。 弟一放大器6 6 - 1係將數位輸入信於g [ η韓換成 SLH&lt;mm&gt;,將該SLH&lt;_&gt;做為結晶成;^度以〈隨〉,並將該 產生之值輸出於第一運算執行部68—丨、目標直徑決定部 78、及圖14所示之目標速度決定部8〇。還有,上述第一放 大裔66-1及第二放大器66-3之後段係以軟體加以構成。 一目標直徑決定部78係將對應於結晶成長長度GL之目標 直徑做為程式型態預先予以記憶,並將GL&lt;mm&gt;放進該程式 型悲,而決定該當之目標直徑。因而,將該決定之值做為 GD(GL)&lt;nun&gt;輸出於第一運算執行部68-丨、及圖14所示之第 二運算執行部68-2。 第^^運鼻執行部6 8 - 1係 GPW =7054-281l-PFl.ptc Page 48 2001.12. 07. 049 508379 Case No. 88117857 V. Description of the invention (46) Benefit, Pτ = proportional gain of temperature control system. The first amplifier 6 6-1 converts the digital input to g [η Han replaced with SLH &lt; mm &gt;, and the SLH &lt; _ &gt; is crystallized; the degree is <as>, and the resulting value is output in The first calculation execution unit 68-1, the target diameter determination unit 78, and the target speed determination unit 80 shown in FIG. The rear section of the first amplifier 66-1 and the second amplifier 66-3 is constructed by software. A target diameter determination unit 78 memorizes the target diameter corresponding to the crystal growth length GL as a pattern in advance, and puts GL &lt; mm &gt; into the pattern to determine the appropriate target diameter. Therefore, the determined value is output as GD (GL) &lt; nun &gt; to the first operation execution unit 68- 丨 and the second operation execution unit 68-2 shown in Fig. 14. Section ^^ Nose Execution Department 6 8-1 Series GPW =

Dcrystal 4~ \^{GD(GL)}2dDcrystal 4 ~ \ ^ {GD (GL)} 2d

L 在此:Dcrystal單晶體10之比重;^圓周率;GL=結晶 成長長度;GD(GL) =目標直徑; ,行以上運算,而可預測對應於前述目標直徑之目標重 ΐ。因而,將該預測之重量GPW&lt;g&gt;輪出於第二減法器 第三放大器66-3係將類比輸入信號GW&lt;v〇lt&gt;轉換成 GW&lt;g&gt;,並將該Gw&lt;g&gt;輸出於第二減法器7〇 —2及坩堝直徑決 定部82。該第三放大器66-3之後段係以軟體加以構成。、 第二減法器70-2係取GPW&lt;g&gt;與(^&lt;2&gt;之差,,而產生L is here: the specific gravity of Dcrystal single crystal 10; ^ Pi; GL = crystal growth length; GD (GL) = target diameter;, the above calculation can be performed, and the target weight corresponding to the aforementioned target diameter can be predicted. Therefore, the predicted weight GPW &lt; g &gt; is converted from the analog input signal GW &lt; g &gt; to the GW &lt; g &gt; by the second subtractor third amplifier 66-3 series, and outputs the Gw &lt; g &gt; In the second subtractor 70-2 and the crucible diameter determining unit 82. The rear stage of the third amplifier 66-3 is configured by software. The second subtracter 70-2 takes the difference between GPW &lt; g &gt; and (^ &lt; 2 &gt;), and produces

2001.12. 07. 050 5083792001.12. 07. 050 508379

GWD&lt;g&gt; ’並將該產生之值輸出於^型速度操作放大器72、 及P I D型溫度操作放大器7 4。 D型速度操作放大器7 2係 100 • · (37) 以上述轉移函數處理GWD&lt;g&gt;,而產生種晶上升速度操作量 SLC&lt;mm/min&gt;。因而,將該產生之值輸出於圖14所示之第 五減法器70-5。 、 PI D型溫度操作放大器7 4係 .-(38) (1+ι+ΓΧ·^+ώ)'? 以上述轉移函數處理GWD&lt;g&gt;,而產生溫度操作量TC&lt;。 C&gt;。因而,將該產生之值輸出於圖丨5所示之第三減法器 7 0 - 3 〇 圖1 4係顯示有關於圖1 〇所示之主控制部3 〇之重量式之 第二方塊之構成之方塊圖。以下,使用同圖,來說明有關 該重量式之第二方塊之構成。 目標速度決定部80係將對應於結晶成長長度GL之目標 速度做為程式型態預先予以記憶,,並將““^放進該程 式型悲,而決定該當之目標速度。因而,將該決定之值做 為SL(GL)&lt;mm&gt;輸出於第五減法器7〇一5。 第五減法器70-5係取81(〇1〇&lt;_/11^11&gt;與31^&lt;111111/11^11&gt;GWD &lt; g &gt; 'and outputs the resulting values to the ^ -type speed operational amplifier 72 and the PI D-type temperature operational amplifier 74. D-type speed operation amplifier 7 2 series 100 • (37) GWD &lt; g &gt; is processed by the above transfer function to generate seed crystal raising speed operation amount SLC &lt; mm / min &gt;. Therefore, the resulting value is output to the fifth subtractor 70-5 shown in Fig. 14. 4, PI D type temperature operation amplifier 7 4 series .- (38) (1 + ι + Γχ · ^ + ώ) '? The GWD &lt; g &gt; is processed by the above transfer function, and a temperature operation amount TC &lt; is generated. C &gt;. Therefore, the generated value is output to the third subtractor 7 0-3 〇 shown in FIG. 5, and FIG. 14 is the second block showing the weight formula of the main control section 3 〇 shown in FIG. 10. Block diagram of the composition. In the following, the structure of the second block of the weight formula will be described using the same figure. The target speed determination unit 80 memorizes the target speed corresponding to the crystal growth length GL as a program type in advance, and puts "" ^ into the program type to determine the appropriate target speed. Therefore, the determined value is output as SL (GL) &lt; mm &gt; to the fifth subtractor 70-15. The fifth subtractor 70-5 takes 81 (〇1〇 &lt; _ / 11 ^ 11 &gt; and 31 ^ &lt; 111111/11 ^ 11 &gt;

508379 案號 88117857 曰 修正一 五、發明說明(48) 之差,而產生種晶上升速度SL&lt;mm/min&gt;。因而,將該產生 之值輸出於第四放大器66- 4與第二運算執行部68-2。 第四放大器6 6 - 4係將上述第五減法器7 〇 - 5之輸出轉 換成類比信號SL&lt;volt&gt;,而輸出於圖η所示之第一馬達放 大器5 4 - 1。該第四放大器6 6 - 4之後段係以硬體構成。 坩堝直徑決定部8 2係使坩堝1 4之深度與在該深度中之 掛禍1 4之直徑相對應而預先予以記憶,基於該記憶内容, 而決定與熔液1 2相接之部分之坩堝直徑。具體而言,使第 三放大器66-3之輸出GW&lt;g&gt;對應於前述記憶之坩堝深度14 之深度,而分出該當之坩堝14之直徑。因而,將該決定之 直徑CI(GL)&lt;mm&gt;輸出於第二運算執行部68-2。 第二運算執行部68-2係Case No. 508379 88117857 said that the difference between the first and fifth invention description (48) resulted in the seed crystal rising speed SL &lt; mm / min &gt;. Therefore, the generated value is output to the fourth amplifier 66-4 and the second operation execution unit 68-2. The fourth amplifier 6 6-4 converts the output of the fifth subtractor 7 0-5 into an analog signal SL &lt; volt &gt; and outputs it to the first motor amplifier 5 4-1 shown in FIG. The rear stage of the fourth amplifier 6 6-4 is configured by hardware. The crucible diameter determining portion 8 2 is a crucible in which the depth of the crucible 14 is associated with the diameter of the accident 14 in the depth, and is determined in advance based on the memory content. diameter. Specifically, the output GW &lt; g &gt; of the third amplifier 66-3 is made to correspond to the depth of the crucible depth 14 memorized above, and the diameter of the crucible 14 corresponding thereto is divided. Therefore, the determined diameter CI (GL) &lt; mm &gt; is output to the second operation execution unit 68-2. Second operation execution unit 68-2

Dcrystal · {gD(GL)Y GL·' ..(39)Dcrystal · (gD (GL) Y GL · '.. (39)

SLSL

Dmelt-{GI(GL)y 在此:Dcrystal =單晶體10之比重;GD(GL)=目標直徑; Dmel t二熔液1 2之比重; C I ( GL )=熔液1 2之液面所接觸之部分之坩堝1 4之直徑; SL=種晶上升速度; 以執行上述比率運算,因為將液位做為一定所以可算出必 要之坩堝上升速度CL&lt;mm/min&gt;。因而,將該算出之值輸出 於第五放大器66-5。 第五放大器66-5係將CL&lt;mm/min&gt;轉換成類比信號 CL&lt;volt&gt;,而輸出於圖11所示之第二馬達放大器54 —2。該Dmelt- {GI (GL) y Here: Dcrystal = specific gravity of single crystal 10; GD (GL) = target diameter; Dmel t two melts 12 specific gravity; CI (GL) = melt 12 contacting the liquid surface The diameter of the crucible part 14 is SL; SL = seed crystal ascending speed; The above ratio calculation is performed, and the necessary crucible ascending speed CL &lt; mm / min &gt; can be calculated because the liquid level is fixed. Therefore, the calculated value is output to the fifth amplifier 66-5. The fifth amplifier 66-5 converts CL &lt; mm / min &gt; into an analog signal CL &lt; volt &gt; and outputs it to the second motor amplifier 54-1 shown in FIG. The

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第51頁 2001.12. 07. 052 508379 --MM 88117857__年月日 修正__ 五、發明說明(49) 第五放大器66-5之後段係以硬體構成。 圖1 5係顯示圖1 〇所示之主控制部3 〇之第三方塊之構成 之方塊圖。以下,使用同圖,來說明該第三方塊之構成。 還有’該方塊係在重量式與光學式中為共通。 第三減法器70-3係取加熱器16之設定溫度T set &lt; °C&gt;與 tc&lt; °c &gt;之差,而產生加熱器溫度HT&lt;。〇。因而,將該產 生之值輸出於第六放大器66-6。 第六放大器66-6係將HT&lt;°C&gt;轉換成HT&lt;volt&gt;,而輪出 於第四減法器7 0 - 4。該第六放大器6 6 - 6之後段係以硬體構 成。 第四減法器70-4係取HT&lt;volt〉信號與溫度感測器42之 輸出TMP&lt;volt&gt;之差,而產生溫度偏差HTD&lt;v〇lt&gt;。因而, 將該產生之信號輸出於P ID型溫度控制放大器84。 P I D型溫度控制放大器8 4係 1 + 丁议· s + 1 100 1 + €ίτ · Ύητ · s Tjp s j (40) 以上述轉移函數處理HTD&lt;volt&gt;,並產生電力作號 HPWR&lt;V〇lt&gt;。因而’將該產生之值輸出於圖1〇°所&amp;示之加埶 器控制部34。 圖1 6係顯示有關圖1 0所示之主控制部3 〇之光學式之第 一方塊之構成之方塊圖。於以光學式構成有關本之二 數值控制裝置之場合時’係以該同圖所示之方塊代替圖13 所示之有關重量式之第-方塊來使用。”:使用該圖16Page 51 2001.12. 07. 052 508379 --MM 88117857 __ year month day correction __ V. Description of the invention (49) The section after the fifth amplifier 66-5 is made of hardware. FIG. 15 is a block diagram showing the configuration of a third-party block of the main control section 30 shown in FIG. 10. Hereinafter, the structure of the third-party block will be described using the same figure. This block is common to both the weight type and the optical type. The third subtractor 70-3 takes the difference between the set temperature T set &lt; ° C &gt; and tc &lt; ° c &gt; of the heater 16 to generate the heater temperature HT &lt;. 〇. Therefore, the resulting value is output to the sixth amplifier 66-6. The sixth amplifier 66-6 converts HT &lt; ° C &gt; to HT &lt; volt &gt;, and is output in the fourth subtractors 70-4. The sixth and subsequent amplifiers 6 6-6 are constructed by hardware. The fourth subtractor 70-4 takes the difference between the HT &lt; volt> signal and the output TMP &lt; volt &gt; of the temperature sensor 42 to generate a temperature deviation HTD &lt; v〇lt &gt;. Therefore, the generated signal is output to the PID temperature control amplifier 84. PID type temperature control amplifier 8 4 series 1 + Ding · s + 1 100 1 + € ίτ · Ύητ · s Tjp sj (40) Process HTD &lt; volt &gt; with the above transfer function and generate electric power as HPWR &lt; V〇lt &gt;. Therefore, the generated value is output to the adder control section 34 shown in Fig. 10 &amp; FIG. 16 is a block diagram showing the configuration of the first block of the optical type of the main control section 30 shown in FIG. 10. In the case where the numerical control device according to the second part of the present invention is configured optically, the block shown in the figure is used instead of the first block of the weight type shown in FIG. 13. ": Use this figure 16

7054-281l-PFl.ptc 第52頁 2001.12. 07. 053 508379 __案號 88117857_年月日_修正___ 五、發明說明(50) 來說明有關該光學式之第一方塊之構成。還有,關於與有 關重量式之第一方塊為同一構成要素,係賦予同一符號而 省略說明,在以下之說明中,主要說明與有關重量式之第 一方塊為相異之部分。 第七放大器6 6 - 7係將圖1 0所示之直徑感測器2 8之類比 輸出GD&lt;volt&gt;轉換成GD&lt;mm&gt;,而將該GD&lt;mm&gt;輸出於第二減 法器70-2、及圖17所示之第三運算執行部68-3。該第七放 大器66-7之後段係以硬體構成。 第二減法器70-2係取目標直徑決定部78所產生之 GD(GL)&lt;mm&gt;與GD&lt;mm&gt;之差,而產生直徑偏差GDD&lt;mm&gt;。因 而,將該產生之值輸出於PD型速度操作放大器86、及I型 溫度操作放大器8 8。 PD型速度操作放大器86係 = TDV.s )100 ^ 1 + €ίγ · Τΰγ S J Ργ7054-281l-PFl.ptc Page 52 2001.12. 07. 053 508379 __case No. 88117857_ year month day_ amendment ___ 5. Description of the invention (50) to explain the structure of the first block of the optical type. It should be noted that the same components as the first block of the weight formula are given the same reference numerals and descriptions are omitted. In the following description, the description will be mainly given of the parts different from the first block of the weight formula. The seventh amplifier 66-7 converts the analog output GD &lt; volt &gt; of the diameter sensor 28 shown in Fig. 10 to GD &lt; mm &gt; and outputs the GD &lt; mm &gt; to the second subtractor 70- 2. And the third operation execution unit 68-3 shown in FIG. The rear section of the seventh amplifier 66-7 is composed of hardware. The second subtracter 70-2 takes the difference between GD (GL) &lt; mm &gt; and GD &lt; mm &gt; generated by the target diameter determining section 78, and generates a diameter deviation GDD &lt; mm &gt;. Therefore, the resulting value is output to a PD-type speed operational amplifier 86 and an I-type temperature operational amplifier 88. PD Type Speed Operational Amplifier 86 Series = TDV.s) 100 ^ 1 + € ίγ Τΰγ S J Ργ

Ky 並以上述轉移函數處理GDD〈匪〉,而產生種晶上升速度操 作量SLC&lt;mm/min&gt;。因而,將該產生之值輸出於圖17所示 之第五減法器7〇-5。 1型溫度操作放大器8 8係 〇η(β) = 1 100 d •..(42) ,而將其結果輸出於PI D型 並以上述轉移函數處理GDD&lt;mm&gt;Ky also processes GDD <bandit> with the transfer function described above, and generates the seed crystal rising speed operation amount SLC &lt; mm / min &gt;. Therefore, the resulting value is output to the fifth subtractor 70-5 shown in FIG. Type 1 temperature operation amplifier 8 8 series 〇η (β) = 1 100 d • .. (42), and output the result to PI D type and process GDD &lt; mm &gt; with the above transfer function

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第53頁 2001.12. 07. 054 508379Page 53 2001.12. 07. 054 508379

酿度刼作放大器74。p i 〇型溫度操作放大器74係使用與前 述之重量式為相同型態者,各常數係以另外方法調整。還 有,I型溫度操作放大器8 8與P I D型溫度操作放大器7 4之連 接順序係也可以與同圖所示者相反。 圖1 7係顯示有關圖1 〇所示之主控制部3 〇之光學式之第 二方塊之構成之方塊圖。於以光學式構成有關本發明之二 數值控制裝置之場合時,係以該同圖所示之方塊代替圖工4 所示之有關重量式之第二方塊來使用。以下,使用該圖i 7 來說明有關該光學式之第二方塊之構成。還有,關於與有 關重量式之第二方塊為同一構成要素,係賦予同一符^而 省略說明,在以下之說明中,主要說明與有關重量式:第 二方塊為相異之部分。 掛瑪直徑決定部82係係使坩堝14之深度與在該深度中 之掛禍1 4之直徑相對應而預先予以記憶,基於該記情内 容’而決定與熔液1 2相接之部分之坩堝直徑。具體而古, 使用GL&lt;mm&gt;與GD&lt;mm&gt;,而算出結晶成長重量gw,並使該算 出之值對應於前述所記憶之坩堝1 4之直徨,而分出該當直 徑。 μ田 第三運算執行部6 8 - 3係 GL =Stuffedness 刼 work amplifier 74. The p i 0 type temperature operation amplifier 74 uses the same type as the aforementioned weight formula, and each constant is adjusted by another method. In addition, the connection order of the I-type temperature operation amplifier 88 and the P D-type temperature operation amplifier 74 can be reversed from that shown in the figure. FIG. 17 is a block diagram showing the configuration of the second block of the optical type of the main control section 30 shown in FIG. 10. When the numerical control device related to the second aspect of the present invention is configured optically, the second block related to the weight type shown in Figure 4 is used instead of the second block shown in the figure. Hereinafter, the configuration of the second block of the optical type will be described using FIG. I 7. In addition, regarding the same constituent elements as the second block of the weight formula, the same symbol ^ is given, and the description is omitted. In the following description, the main description is related to the weight formula: The second block is a different part. The hanging diameter determination unit 82 is to make the depth of the crucible 14 correspond to the diameter of the accident 14 in the depth, and to memorize it in advance, and based on the content of the memorandum, determine the part to be connected to the melt 12 Crucible diameter. Specifically, the crystal growth weight gw was calculated using GL &lt; mm &gt; and GD &lt; mm &gt;, and the calculated value corresponded to the straight length of the crucible 14 memorized previously, and the proper diameter was divided. μ 田 Third operation execution unit 6 8-3 series GL =

Dcrystal · GD2 ~Dmelt · {CI(GL)Y • · · (43) 在此:Dcrys ta 1 =單晶體1 0之比重;GD=檢測直徑;Dme丄t 熔液12之比重;ci (GL) =熔液12之液面所接觸之部分之掛Dcrystal · GD2 ~ Dmelt {CI (GL) Y • · · (43) Here: Dcrys ta 1 = specific gravity of single crystal 1 0; GD = detection diameter; Dme 丄 t melt 12 specific gravity; ci (GL) = Hanging of the part contacted by the liquid surface of the melt 12

观379View 379

竭14之直徑;SL=種晶上升速度; 為一定所以可算出必 ,將該算出之值輸出 以執行上述比率運算,因為將液位做 要之掛竭上升速度CL&lt;mm/min&gt;。因而 於第五放大器66-5。 【發明之效果】 如以上所说明般,若依據本發明,則在 控制之達成上可提供有效之單晶體之二數值 還有,若依據本發明之第一型態,則因為種晶上 度#作量SLC及溫度操作量Tc為以基於偏差信號_而產速 生所以可分別以獨立地將種晶上升速度SL做為結晶成+ 直徑GD之收斂裝置來㈣,及將加熱器之溫度做為種晶^ 升速度SL之收斂裝置來使用。其結果,可以自己整合地達 成結晶成長直徑GD與種晶上升速度儿之二數值控制。再 者、,若依據將如該偏差信號DEV以並列輸入於速度控制系 及溫度控制系之構成,則因為可將適於個別之控制之轉移 函數獨立地予以使用,所以安定之二數值控制變為可能。 而且若依據本發明之第二型態,則因為根據重量偏 f GWD之變動,產生種晶上升速度操作量slc,而溫度操作 量TC以自己整合地形成加熱器溫度之理想型態,所以以將 種晶上升速度SL之變動壓在最小限之構成,而可期待結晶 成長直仅GD之收斂。其結果,可達成合適之二數值控制。 而且,若依據本發明之第三型態,則因為根據直徑偏 = GDD、之大小而產生種晶上升速度操作量,而溫度操作 畺TC以自己整合地形成加熱器溫度之理想型態,所以以將The diameter of the exhaust 14; SL = seed crystal rising speed; if it is constant, it must be calculated. The calculated value is output to perform the above-mentioned ratio calculation because the liquid level is required as the exhaust rising rising speed CL &lt; mm / min &gt;. Therefore, the fifth amplifier 66-5. [Effects of the invention] As explained above, according to the present invention, it is possible to provide two values of effective single crystals in achieving control. Also, according to the first form of the present invention, because the seed crystal is on degree # The amount of operation SLC and temperature operation Tc are generated based on the deviation signal _. Therefore, the seed crystal rising speed SL can be independently used as a convergence device for crystallization + diameter GD, and the temperature of the heater can be regarded as The seed crystal ^ raising speed SL convergence device is used. As a result, the numerical control of the crystal growth diameter GD and the seed crystal ascent rate can be achieved in an integrated manner. Furthermore, if the deviation signal DEV is input to the speed control system and the temperature control system in parallel, the transfer function suitable for individual control can be used independently, so the stable two-value control becomes variable. As possible. Moreover, according to the second form of the present invention, the seed crystal rising speed operation amount slc is generated according to the variation of the weight deviation f GWD, and the temperature operation amount TC forms an ideal form of the heater temperature in an integrated manner, so The structure in which the fluctuation of the seed crystal rising speed SL is minimized, and the crystal growth can be expected to converge only by GD. As a result, it is possible to achieve appropriate two-value control. Furthermore, according to the third aspect of the present invention, since the seed crystal rising speed operation amount is generated according to the diameter deviation = GDD, and the temperature operation 畺 TC forms the ideal type of the heater temperature by itself, so To

508379 案號 88117857 五、發明說明(53) 種晶上升速度SL之變動壓在最小限之構成,而可期待結』 成長直徑GD之收斂。其結果,可達成合適之二數值押曰 【圖式簡單說明】 ' ^ 圖1係顯不在一般之上拉裝置中之加熱器與坩堝之 置關係之剖面圖。 圖形 圖2係顯示以式1 7來表現之加熱器溫度之理想型態 之 圖3係顯示有關本發明之第一型態之二數值控制之 成之示意圖。 態之二數值控制之構 圖4係顯示有關本發明之第 成之方塊圖。 圖 圖5係顯示本發明之第二型態之變型例之方塊圖。 圖6係說明本發明之第二型態之作用之模式的時序 圖7係顯示本發明之第三型態之二數值控制之構成之 方塊圖。 圖8係顯示本發明之第三型態之變型例之方塊圖。 圖 圖9係說明本發明之第三型態之作用之模式的時序 圖1 0係顯示有關本發明之最佳之實施例之單晶體之二 數值控制裝置之構成之一部分剖面圖。 圖11係顯示圖ίο所示之種晶控制部32及坩堝控制部48 之構成之方塊圖。 圖1 2係顯示圖1 〇所示之加熱器控制部34之構成之方塊508379 Case number 88117857 V. Description of the invention (53) The variation of the seed crystal ascending speed SL is kept to a minimum, and the convergence of the growth diameter GD can be expected. As a result, an appropriate second value can be achieved. [Simplified description of the figure] '^ Figure 1 is a cross-sectional view showing the relationship between the heater and the crucible in a general pull-up device. Fig. 2 is a diagram showing an ideal form of the heater temperature expressed by Equation 17 and Fig. 3 is a diagram showing the completion of the numerical control of the first form of the present invention. Structure of the Second State Numerical Control FIG. 4 is a block diagram showing the implementation of the present invention. Fig. 5 is a block diagram showing a modification of the second aspect of the present invention. Fig. 6 is a timing chart illustrating the mode of action of the second form of the present invention. Fig. 7 is a block diagram showing the configuration of the second numerical control of the third form of the present invention. FIG. 8 is a block diagram showing a modification of the third aspect of the present invention. Fig. 9 is a timing chart illustrating a mode of operation of the third type of the present invention. Fig. 10 is a partial cross-sectional view showing the configuration of a single crystal two numerical control device according to a preferred embodiment of the present invention. FIG. 11 is a block diagram showing the structures of the seed crystal control section 32 and the crucible control section 48 shown in FIG. FIG. 12 is a block diagram showing the configuration of the heater control section 34 shown in FIG.

7054-281l-PFl.ptc 2001.12.07.057 第56頁 508379 _案號88117857_年月日_ί±^_ 五、發明說明(54) 圖。 圖1 3係顯示有關圖1 0所示之主控制部3 0之重量式之第 一方塊之構成之方塊圖。 圖1 4係顯示有關圖1 0所示之主控制部3 0之重量式之第 二方塊之構成之方塊圖。 圖1 5係顯示有關圖1 0所示之主控制部3 0之重量式之第 三方塊之構成之方塊圖。 圖1 6係顯示有關圖1 0所示之主控制部3 0之光學式之第 一方塊之構成之方塊圖。 圖1 7係顯示有關圖1 0所示之主控制部3 0之光學式之第 二方塊之構成之方塊圖。 符號說明】 10 單晶體 12 溶液 14 坩堝 16 加熱器 18 種晶 20 夾頭 22 線繞 24 線鏡筒 26 重量感測器 28 直徑感測器 30 主控制部 32 種晶控制部7054-281l-PFl.ptc 2001.12.07.057 Page 56 508379 _Case No. 88117857_ Year Month Day_ί ± ^ _ 5. Description of the invention (54) Figure. FIG. 13 is a block diagram showing the structure of the first block of the weight formula of the main control section 30 shown in FIG. 10. FIG. 14 is a block diagram showing the structure of the second block of the weight formula of the main control section 30 shown in FIG. 10. FIG. 15 is a block diagram showing the structure of the third block of the weight formula of the main control section 30 shown in FIG. 10. FIG. 16 is a block diagram showing the configuration of the first block of the optical type of the main control section 30 shown in FIG. 10. Fig. 17 is a block diagram showing the configuration of the second optical block of the main control section 30 shown in Fig. 10. Explanation of symbols] 10 single crystal 12 solution 14 crucible 16 heater 18 seed crystal 20 chuck 22 wire winding 24 wire barrel 26 weight sensor 28 diameter sensor 30 main control unit 32 seed crystal control unit

7054-2811-PFl.ptc 第57頁 2001.12.07.058 508379 案號88117857_年月日_修正 五、發明說明 (55) 34 加 熱 器 控 制 部 38 室 40 保 溫 筒 42 溫 度 感 測 器 44 坩 堝 支 持 台 46 坩 堝 軸 48 坩 堝 控 制 部 50- 1 第 一 馬 達 50- 2 第 二 馬 達 52- 1 第 _ 1* 齒 輪 52- 2 第 二 齒 輪 54- 1 第 —— 馬 達 放 大 器 54-2 第 二 馬 達 放 大 器 56- 1 第 旋 轉 式 解 碼器 58- 1 第 一 脈 波 計 數 器 60 閘 流 體 控 制 器 62 交 流 直 流 轉 換 器 64 電 力 感 測 器 66-1 第 _ _一 放 大 器 66-3 第 二 放 大 器 66- 4 第 四 放 大 器 6 6-5 第 五 放 大 器 66- 6 第 六 放 大 器 66- 7 第 七 放 大 器7054-2811-PFl.ptc Page 57 2001.12.07.058 508379 Case No. 88117857_Year_Month_Revision V. Description of the invention (55) 34 heater control unit 38 room 40 insulation tube 42 temperature sensor 44 crucible support table 46 Crucible shaft 48 Crucible control unit 50- 1 First motor 50- 2 Second motor 52- 1 First _ 1 * Gear 52- 2 Second gear 54- 1 First—— Motor amplifier 54-2 Second motor amplifier 56-1 The first rotary decoder 58-1 The first pulse wave counter 60 The sluice fluid controller 62 The AC-DC converter 64 The power sensor 66-1 The first _ _ first amplifier 66-3 The second amplifier 66- 4 The fourth amplifier 6 6 -5 Fifth amplifier 66- 6 Sixth amplifier 66- 7 Seventh amplifier

7054-2811-PFl.ptc 第58頁 2001.12. 07.059 508379 _案號88117857_年月日_ 五、發明說明(56) 68-1 第一運算執行部 68-2 第二運算執行部 68-3 第三運算執行部 7 0-2 第二減法器 7 0-3 第三減法器 70-4 第四減法器 7 0-5 第五減法器 72 D型速度操作放大器 7 4 PID型溫度操作放大器 78 目標直徑決定部78 80 目標速度決定部 82 坩堝直徑決定部 84 PID型溫度控制放大器 86 P I D速度操作放大器 88 I型溫度操作放大器7054-2811-PFl.ptc Page 58 2001.12. 07.059 508379 _Case No. 88117857_ Year Month and Day_ V. Description of the invention (56) 68-1 First operation execution unit 68-2 Second operation execution unit 68-3 No. Three operation execution unit 7 0-2 Second subtractor 7 0-3 Third subtractor 70-4 Fourth subtractor 7 0-5 Fifth subtractor 72 D-type speed operation amplifier 7 4 PID temperature operation amplifier 78 Target Diameter determination section 78 80 Target speed determination section 82 Crucible diameter determination section 84 PID temperature control amplifier 86 PID speed operation amplifier 88 I temperature operation amplifier

Ml 0 種晶上升速度操作量產生裝置Ml 0 seed crystal rising speed operation amount generating device

Ml 2 溫度操作量產生裝置Ml 2 temperature operation quantity generating device

Ml 4 直徑控制參數參數檢測裝置Ml 4 Diameter control parameter parameter detection device

Ml 6 偏差信號產生裝置 CP 直徑控制參數 DEV 偏差信號 GD 結晶成長直徑 GDD 直徑偏差 GL 結晶成長長度Ml 6 Deviation signal generator CP Diameter control parameter DEV Deviation signal GD Crystal growth diameter GDD Diameter deviation GL Crystal growth length

7054-2811-PFl.ptc 第59頁 2001.12. 07.060 508379 案號 88117857 A_ 曰 修正 五、發明說明(57) GW 結晶成長重量 GWD 重量偏差 SL 種晶上升速度 SLC 種晶上升速度操作量 TC 溫度操作量7054-2811-PFl.ptc Page 59 2001.12. 07.060 508379 Case No. 88117857 A_ Revision V. Description of the Invention (57) GW Crystal Growth Weight GWD Weight Deviation SL Seed Rise Speed SLC Seed Rise Speed Operation Amount TC Temperature Operation Amount

7054-281l-PFl.ptc 第60頁 2001· 12· 07· 0617054-281l-PFl.ptc p.60 200112.07.061

Claims (1)

508379 I I 號 88117857 修’Ί 年508379 I I 88117857 repair ’ 1 · 一種單晶體之二數值控制裝置,包括·· 種晶上升速度操作量產生裝置(M1〇), (10)之上拉速度,即種晶上升速度(SL)之操作旦0曰- 溫度操作量產生裝置(M12),產生操作該單μ晶體 周邊之溫度之量,即溫度操作量(TC), 〇) 且將該單晶體(1 〇 )之成長直徑,即結曰一 及種晶上升速度(SL)收斂於各自之目標^ ^ 、徑(GD) 其特徵在於包括: &gt; 直徑控制參數檢測裝置(M14),檢測對結曰 (GD)之控制貢獻之參數,即直徑控制參數(cp) · 侵 偏差信號產生裝置(M16),取出前述直徑控 數CCP)之目私值之差而產生偏差信號(DEV); - ^前述種晶上升速度操作量產生裝置(M10)係美於低、, 信號產生裝置(Ml 6)所產生之偏差信號(DE 而&quot;、i 二上,速度(SL)之操作量,即種晶上升速度操=可述 前述溫度操作量產生裝置(M12)係基於 =6)所產生之偏差信號(DEV),而產生前述^^乍 2 ·如申請專利範圍第! 裝置,其中, 響應=:::r;::)::二含二1 · A single crystal two numerical control device, including: · seed crystal rising speed operation amount generating device (M10), (10) pull-up speed, that is, the operation of seed crystal rising speed (SL). The quantity generating device (M12) generates a quantity for operating the temperature around the single μ crystal, that is, the temperature operation quantity (TC), 〇), and the growth diameter of the single crystal (10), that is, the growth rate of the seed crystal and the seed crystal. (SL) Converges to their respective goals ^ ^, diameter (GD) It is characterized by: &gt; Diameter control parameter detection device (M14), which detects parameters that contribute to the control of the GD, namely the diameter control parameter (cp ) · Invasion deviation signal generating device (M16), taking out the difference between the private value of the aforementioned diameter control number CCP) to generate a deviation signal (DEV);-^ The aforementioned seed crystal ascending speed operation amount generating device (M10) is beautifully low The deviation signal generated by the signal generating device (Ml 6) (DE and &quot;, i), the speed (SL) operating amount, that is, the seed crystal rising speed operation = the aforementioned temperature operating amount generating device (M12) It is based on the deviation signal (DEV) generated by = 6). The aforementioned ^^ 2 2 As the scope of patent application! Device, where response = ::: r;: :) :: two contains two /y 修正 曰 丄 案號881178R7 六、申請專利範圍 一 - 表現,而將根據前述偏差信號(dev)之變動之信號做 二則述種晶上升速度操作量(slc)而輸出; 兩述溫度操作量產生裝置(g 1 2 )係以含有積分要素之 2移函數來表現,並將根據前述偏差仏號(J) £ γ)之履歷之 信號做為溫度操作量(TC)而輸出。 ^ 3·如申請專利範圍第2項所述之單晶體之二數值控制 裝置,其中, 工 旦前述直徑控制參數(CP)為前述單晶體(10)所成 里,即種晶成長重量(G w ); 、 分f 上升速度操作量產生裝置(M1〇)係以含有微 刀要素之轉移函數來表現; 3有从 月ϋ述溫度麵作量產生裝署(Μ 轉移函數之!段來表現裝置(Μ12)係以含有積分要素之 4·如申請專利範圍第2項 裝置,其中, ⑦边之早日日體之二數值控制 前述直徑控制參數(Cp ) , 、+、#日^ 為W述結晶成長直徑(GD) · 則述種晶上升速度操作量 =直仫㈧D), 例要素之轉移函數來表現;生裝置(M10)係以含有比 月1J述溫度操作量產生裝署 轉移函數之2段來表現。 2)係以含有積分要素之 5·如申請專利範圍第1項 曰 裝置,其中, 斤述之早曰曰體之二數值控制 前述種晶上升速度操作量 與前述溫度操作量產生裝置(產裝置jM10)之轉移函數 1 2 )之轉移函數之比係構成 7054-2811-PFl.ptc 第62頁 2001.12. 07.062 508379 修正 曰 案號88Ι〗78ΡΓ7 六、申請專利範圍 二形以上之控制系 6·如申請專利範圍第5項 裝置,其中, 、述之單晶體之二數值控制 前述種晶上升速度操作量 述直徑控制參數(CP)之直禋八生裝置(Mi〇)係從對於前 該等之組合來選擇所構成,而分之比例要素、微分要素及 分配成單晶體(1〇)之剖面面,對於不足熱量之固化重量 之2成分。 償和該單晶體(1〇)之上拉長度 7·如申請專利範圍第5項 口口 裝置,其中, 、述之早晶體之二數值控制 前述直徑控制參數(CP)為 即種晶成長重量(GW), 體(10)所成長之重量, 八i I述種晶上升速度操作量產生裝置(M1〇)係以含有料 为要素之轉移函數來表現; 各有微 韓移ί ΐ溫,度操作量產生震置(M12)係以含有積分要素之 轉移函數之1段來表現。 8.如申請專利範圍第5項所述之單晶體之二數值控制 裝置,其中, 2述直徑控制參數(CP)為前述結晶成長直徑(GD); 則述種晶上升速度操作量產生裝置(μ 1 〇 )係以含有比 例要素之轉移函數來表現; 刚述溫度操作量產生裝置(Μ 1 2 )係以含有積分要素之 轉移函數之2段來表現。 、 ” 第63貢 2001.12. 07.064/ y Amend the case number 881178R7 6. Application for patent scope 1-performance, and output according to the above-mentioned deviation signal (dev) change signal as the seed crystal rising speed operation amount (slc) and output; two temperature operation The quantity generating device (g 1 2) is expressed by a 2-shift function containing integral elements, and outputs a signal based on the history of the aforementioned deviation (J) £ (γ) as a temperature operation quantity (TC). ^ 3. The numerical control device for a single crystal as described in item 2 of the scope of the patent application, wherein the diameter control parameter (CP) of the denier is formed by the single crystal (10), that is, the seed crystal growth weight (G w) ;, F The rising speed operation amount generating device (M10) is expressed by a transfer function containing a micro-knife element; 3 There is an installation from the monthly temperature surface amount (M! Of the transfer function!) To express the device ( Μ12) It is based on the 4th device including the integral element, such as the second item in the scope of patent application, in which the value of the early date of the hemisphere controls the aforementioned diameter control parameter (Cp), and +, # 日 ^ are the crystal growth Diameter (GD) · The seed crystal ascending speed operation amount = Straight D), as an example of the transfer function of the elements; the production device (M10) is based on the 2nd stage of the installation transfer function with the temperature operation amount of 1J. To perform. 2) The device including the integral element of the 5th, such as the first item of the scope of the patent application, in which the above mentioned early value of the body is used to numerically control the aforementioned seed crystal raising speed operation amount and the aforementioned temperature operation amount generating device (production device jM10) 's transfer function 1 2) The ratio of the transfer function constitutes 7054-2811-PFl.ptc Page 62 2001.12. 07.062 508379 Amendment No. 88I〗 78PΓ7 6. The control system with a patent scope of more than two forms 6 The fifth device of the scope of the patent application, wherein, the two crystals mentioned above control the seed crystal ascent speed operation parameter diameter control parameter (CP), and the straight eighth device (Mi〇) is a combination of the former Let's choose the composition, and divide the proportional element, the differential element, and the cross-section of the single crystal (10), and the two components for the curing weight that is less than heat. Compensate for the pull-up length of the single crystal (10) 7. As the mouth device of item 5 in the scope of the patent application, wherein the numerical control of the aforementioned early crystal two controls the diameter control parameter (CP) as the seed crystal growth weight ( GW), the weight that the body (10) grows, and the seed crystal ascending speed operation amount generating device (M10) is expressed by using the transfer function containing the material as the element; each has a slight Han shift, ΐtemperature, degree The operation amount generated vibration set (M12) is expressed by one stage of the transfer function containing integral elements. 8. The single crystal two numerical control device according to item 5 of the scope of the patent application, wherein the diameter control parameter (CP) is the aforementioned crystal growth diameter (GD); the seed crystal ascending speed operation amount generating device (μ 10) is expressed by a transfer function containing a proportional element; the temperature operation amount generating device (M 1 2) just described is expressed by two stages of a transfer function containing an integral element. "" The 63rd tribute 2001.12. 07.064
TW88117857A 1998-12-25 1999-10-15 Binart controller for crystal body TW508379B (en)

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