TW505708B - Gold plating solution and plating method using the same - Google Patents

Gold plating solution and plating method using the same Download PDF

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Publication number
TW505708B
TW505708B TW88117558A TW88117558A TW505708B TW 505708 B TW505708 B TW 505708B TW 88117558 A TW88117558 A TW 88117558A TW 88117558 A TW88117558 A TW 88117558A TW 505708 B TW505708 B TW 505708B
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Taiwan
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gold
acid
solution
plating solution
gold plating
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TW88117558A
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Chinese (zh)
Inventor
Katsutsugu Kida
Yoshiro Shindo
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Tanaka Kikinozoku Kogyo Kk
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Priority claimed from JP11995798A external-priority patent/JP3898334B2/en
Priority claimed from JP00802699A external-priority patent/JP4220053B2/en
Application filed by Tanaka Kikinozoku Kogyo Kk filed Critical Tanaka Kikinozoku Kogyo Kk
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Publication of TW505708B publication Critical patent/TW505708B/en

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Abstract

This invention provides a gold plating solution which uses gold compounds such as gold salts or gold complex compounds as gold and contains a buffer agent, an organic gloss agent and a conduction salt; the solution is characterized by containing bis(1,2-ethyldiamine). Through the use of a non-cyanide gold plating solution with above-mentioned characteristics, solution stability in any gold plating bath is excellent without causing any change of physical properties of the deposited gold and without being decomposed during gold plating operation. The gold plating solution includes two aspects, the use of bis(1,2-ethyldiamine) gold complex as an ingredient and the use of a gold salt as an ingredient. When such a gold plating solution is used, hardness, purity, and crystal state of the deposited gold can be controlled; thus, it is an excellent gold plating solution not seen among conventional counterparts.

Description

505708 五、發明說明(1) 【發明所屬技術領域 本發明係有關於 異且可長期使用的金 法。 【習知技術】 金電鍍並不僅是 餐器上,由於其所具 利用於電子工業領域 習知以來,金電 氰浴’但是近來因為 及半導體零件之光阻 糸金電錄液之需求逐 液之提案。 例如,如J. Am, 中所揭示之非氰系金 氯化物來作為金化合 利用眾所周知之製法 及溶劑(二乙醚)在 曾提出新的雙(1,2 -使用該雙(1,2-乙烷 可得到外觀美麗的析 能控制由電鍍所析出 等。 另外,在廣泛為 如自古 有之優 中。 鍍液中 作業安 等的浸 漸提高 Chem, 電鍍液 物。該 ’將氯 常溫下 乙烷二 二胺) 出電鍍 之金的 一種不含亞硫酸離子、溶液安定性優 電鍍液及使用該金電鍍液之電鍍方 以來般只刺用在裝飾用或外國 異電氣特性,使得其已被廣泛 幾乎皆為含有有毒氰化金钾之 全上或排水處理上的問題,以 蝕(attack)問題,故對於非氰 ,因而出現種種非氰系金電鍍505708 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to different and long-term golden methods. [Know-how] Gold plating is not only used for dining utensils. Because of its use in the electronics industry, gold electrocyanide baths have been used for a long time, but recently, due to the photoresist of semiconductor parts and the need for gold recording liquid Proposal. For example, as disclosed in J. Am, a non-cyanide gold chloride is used as a gold compound using a well-known manufacturing method and a solvent (diethyl ether). A new bis (1,2,-using the bis (1,2, Ethane can obtain beautiful appearance and can be controlled by electroplating, etc. In addition, it is widely used in ancient times. The immersion in the plating solution improves the Chem, the plating solution. The 'will be at room temperature of chlorine Ethylenediamine) A plating solution that does not contain sulfite ions, has excellent solution stability, and electroplating solutions using the gold plating solution have only been used for decoration or foreign foreign electrical characteristics, making it Almost all of them are toxic gold potassium cyanide all or drainage problems, to attack (attack) problems, so for non-cyanide, there have been various non-cyanide gold plating

Soc· 1951, vol·73, P4722 ,係使用雙(1,2 -乙烷二胺)金 雙(1,2 -乙烷二胺)金氣化物係 金酸、乙烯二胺(1水合物) 使反應而製得。本發明者等亦 胺)金氣化物之製造方法以及 金氯化物之金電鍍液,以作為 層之電鍍液及方法,但還是不 硬度、純度以及析出結晶狀態 人所利用的金電鍍浴中,亦常見將Soc · 1951, vol · 73, P4722, using bis (1,2-ethanediamine) gold bis (1,2-ethanediamine) gold gaseous system auric acid, ethylene diamine (monohydrate) Made by reaction. The present inventors also produced a method of producing gold gaseous compounds and a gold plating solution of gold chloride as the plating solution and method of the layer, but the hardness, purity, and precipitation state of the crystals used in the gold plating bath, Also common

505708 五、發明說明(2) 1 ------------ 中A :作金鹽來使用。但是在使用Na3Au(S〇3)2之金 、又^ /谷’夜中的亞硫酸離子非常地不安定,且由於容 ^ Ϊ Ϊ正Ϊ ί ί的氧或大氣中的氧所氧化,其濃度自然就 ;所=造成金電鑛液中金錯合物的安定性降低,而 ^ α 明電桁物之物性發生變化或電鍍液分解等不良的 情況。 【圖式簡單說明】 第1圖所示係金電鍍層表面的析出粒子構造之sem照 片。 第2圖所示係與第!圖同樣地為金電鍍層表面的析出 子構造。 【發明說明】 一 $發明者係提供一種藉由於金電鍍液中使含有丨,2 —乙 烧一胺而製得具有更佳之長期安定性與耐長時間作業性之 電解金電鍍液及使用該電解金電鍍液之電鍍方法。 ”、二本t明者銳思進行在實用上更優異之非氰系電解金 電,液^究的結果,發現了可發揮極優異效能的如申請專 利範圍第1項所述之金電鑛液。 — 在申明專利範圍第1項中所述之金電鑛液係一種非氰 電解金電錢液’該電解金電鍍液係使用金鹽或金錯合物之 金化合物來當作金,且含有緩衝劑、有機光澤劑以及傳導 鹽’而其特徵在於:在上述電鍍液中使含有丨,2-乙烷二 胺。 利用上述電鑛液的結果,由於係在金電鍍液中使含有505708 V. Description of the invention (2) 1 ------------ Medium A: Used as gold salt. However, the use of Na3Au (S〇3) 2 gold, sulfite ions in the ^ / Valley 'night is very unstable, and due to the oxygen oxidized by the capacity or oxygen in the atmosphere, its concentration Naturally; the result is that the stability of the gold complex in the gold-electric ore liquid is reduced, and ^ α indicates that the physical properties of the electric truss are changed or the plating solution is decomposed. [Brief description of the drawings] A sem photograph of the structure of the precipitated particles on the surface of the gold plating layer shown in FIG. Figure 2 shows the relationship with the first! The figure also shows the precipitated structure on the surface of the gold plating layer. [Explanation of the invention] One inventor is to provide an electrolytic gold plating solution with better long-term stability and resistance to long-term workability by using a gold plating solution containing 丨, 2-ethylamine, and using the same Electroplating method of electrolytic gold plating solution. As a result of the research on non-cyanide electrolytic gold electricity, which is more practical in practice, the two founders have found a gold electricity mine as described in item 1 of the scope of patent application that can exert extremely excellent performance. — The gold electric ore liquid described in item 1 of the declared patent scope is a non-cyanide electrolytic gold electric money liquid. The electrolytic gold plating liquid uses gold compounds of gold salts or gold complexes as gold, It also contains a buffering agent, an organic gloss agent, and a conductive salt, and is characterized in that the above-mentioned electroplating solution is made of 1,2,2-ethanediamine. As a result of the use of the above-mentioned electro-mineral liquid, the content of the

505708 五 、發明說明(3) 1,2 -乙烧二胺,故得到無論在任何金電鑛浴下溶液安定性 皆極為優異,且在金電鍍操作中不會發生所析出之金的物 性產生變化或金電鍍液分解等情形之金電鍍液之組成。該 金電鑛液係同日守包括將雙(1,2 -乙烧二胺)金錯合物當作 原料來使用以及將金鹽當作原料來使用兩方面,結果即形 成了在金電鍍液中含有1,2-乙烷二胺之狀態。 若使用上述之金電鍍液的話,則可控制所析出金的硬 度、純度以及結晶狀態等,而成為習知所未見的優異電解 金電鑛液。 在申晴專利範圍弟2項中所述者係一種非氰電解金電 錢液’其中該金電鍍液中含有··使金電鍍液中的金濃度變 為在2g/l〜30g/l範圍内之量的金化合物之雙d,2—乙燒二 胺)金錯合物、〇·;[〜2·5Μ之1,2-乙烷二胺硫酸鹽、作為傳 導鹽之無機酸鉀鹽、作為緩衝劑之有機羧酸以及作為〃'有機 光澤劑之含1種以上異(hetero )原子的雜環化合物。 該非氰電解金電鍍液係為將雙(1,2—乙烷二胺)金鋩人 物作為原料來使用者。在此處而言,金化合物之雙(1,、曰2一口 =烷一胺)金錯合物係為可用Au(en、3+(en: I 2一乙烷二 來表=者。金錯合物的含量係為使金在2〜3(^/1之範^ ^右在下限值2g/1以下的話,金的析出速度會變㊅而 ^用於實際之作業中;若超過上限值3〇g/1的話,則又 對ί 5沒Ϊ變化而容易發生金沈澱。®此,該範圍係採版 μ作業環境值之範圍為目的而得到。 /、 其他構成化合物之L 2一乙烧二胺硫酸鹽係作 五、發明說明(4) 來H1;2-乙烧二胺硫酸鹽係在〇.",的範圍下進 ;::赶ΐ ί: ◦.1M以下的話則配位劑的效果無法發 揮,右起過上限值2· 5M的話則無法溶解。 無機酸鉀鹽係如申請專利範圍第4項所述般可 硫酸鉀、虱化鉀以及硝酸鉀。該等物質係 液時能達到作為傳導鹽之效能而添加之物質。 以在卜HOg/i的範圍内進行添加較佳。若在該;限值二、 以下的活,則很難確保電鍍液具有充分的導電性若 限值lOOg/i以上的話,則在溶液中會變得無法溶解。 有機羧酸係用來執行作為緩衝劑之功能 ==;5變,"此處而言,有機緩 明專利粑圍弟5項所述般,為具有乙酸、甲酸或笨 Ϊ ί Ϊ = :t物右並可當作與界面活性劑具有同樣效果 用。有機幾酸的添加量係以卜2〇。" 值1g/1以下的話,則無法充分發揮緩衝 奋若添加超過上限值2〇〇g/1以上的話,緩 政果亦不會因此而加大。 j 4旧 你β ΐ進一步,含有1個以上異原子之雜環化合物係可當 面!性劑具有同樣效果之光澤劑來作用。該雜環化 δ物係如申請專利範圍第6項所述般係以噻吩曱酸 thlophene carboxylic acid )、鄰菲啉 耳44 - t二Τ:111"01 me )、吼咬(Pyridine )、吼咬續酸或 =二吡疋(bipyridyl)等作為異原子,並可使用含氮之 7 /谷性化合物等。又,其添加量係以在O.hlOg/l的範圍 505708505708 V. Description of the invention (3) 1,2-Ethyl diamine, so the solution stability is excellent regardless of any gold-electric ore bath, and the physical properties of the precipitated gold will not occur in the gold plating operation. Changes in the composition of the gold plating solution, such as changes or decomposition of the gold plating solution. The gold-electricity mineral liquid system includes the use of bis (1,2-ethanediamine) gold complex as a raw material and the use of gold salt as a raw material. As a result, a gold plating solution is formed. Contains 1,2-ethanediamine. If the above-mentioned gold plating solution is used, it is possible to control the hardness, purity, crystallization state, and the like of the deposited gold, and it becomes an excellent electrolytic gold electro-mineral liquid which has not been known in the past. The one described in Shen Qing's patent scope is a non-cyanide electrolytic gold electric money solution, in which the gold plating solution contains the gold concentration in the gold plating solution in the range of 2 g / l to 30 g / l. Bis d, 2-ethanediamine) gold complex in the amount of gold compound, 〇; [~ 2 · 5M of 1,2-ethanediamine sulfate, inorganic acid potassium salt as conductive salt An organic carboxylic acid as a buffering agent and a heterocyclic compound containing at least one hetero atom as a fluorene organic glossing agent. The non-cyanide electrolytic gold plating solution is prepared by using bis (1,2-ethanediamine) gold tincture as a raw material. In this context, the bis (1, 2, 2 = alkane-amine) gold complexes of gold compounds are those which can be expressed by Au (en, 3+ (en: I 2-ethane, two to =). Gold The content of the complex is such that the gold is within the range of 2 to 3 (^ / 1). ^ If the lower limit is 2 g / 1 or less, the gold precipitation rate will be reduced and ^ will be used in actual operations. If the limit value is 30g / 1, then there will be no change to ί5 and gold precipitation will easily occur. ® Here, this range is obtained for the purpose of the range of the operating environment value of the plate collection μ. /, L 2 of other constituent compounds 5. Ethyl diamine sulfate is used as the fifth, the description of the invention (4) to H1; 2-ethyl diamine sulfate is in the range of. &Quot;, and advances ::: ΐ ΐ: ◦. 1M or less The effect of the complexing agent cannot be exerted, and it cannot be dissolved if the upper limit value is 2 · 5M from the right. The potassium salt of inorganic acid can be potassium sulfate, potassium lice, and potassium nitrate as described in item 4 of the patent application scope. It is a substance that can be added as a conductive salt when it is a substance-based liquid. It is better to add it in the range of HOg / i. If it is within this limit, the following two or less, it is difficult to ensure the plating solution If it has sufficient conductivity, if the limit is 100 g / i or more, it will become insoluble in the solution. Organic carboxylic acid is used to perform the function as a buffering agent ==; 5 changes, in this case, organic As mentioned in the 5 items of the patent of Weiming Ming, it has acetic acid, formic acid, or stupidity. Ί: =: t is right and can be used to have the same effect as the surfactant. The amount of organic citric acid added is 2 〇 " If the value is less than 1g / 1, it will not be able to give full play to the buffer. If you add more than the upper limit of 200g / 1 or more, the effect of the delay will not increase. J 4Old you β β Further Heterocyclic compounds containing more than one heteroatom can be face-to-face! Sex agents have the same effect as gloss agents. The heterocyclic δ system is thlophene carboxylic acid as described in item 6 of the scope of the patent application. acid), phenanthroline 44-t-di-T: 111 " 01 me), Pyridine, bipyridyl acid or bipyridyl, etc., as the heteroatoms, and nitrogen-containing 7 / Cereal compounds, etc. Also, the added amount is in the range of O.hlOg / l 505708

=軏佳。右在下限值〇. lg/Ι以下的話,則無法充分發揮作 為光澤劑之效果;若添加超過上限值10g/1#上的話,亦 不會因此而產生增大光澤度之效果。 在申請專利範圍第3項中所述之發明係一種非氰電解 金電鍍液,該電解金電鍍液係由金鹽、丨,2-乙烷二胺、緩 衝Μ有機光澤劑以及傳導鹽所構成,其特徵在於該電鍍 液中含有:作為5g/l〜30g/l之金供給源的三價金鹽以及〇· 〜3.0M之1,2-乙烧二胺。 、= 軏 佳. If the right is below the lower limit value of 0.1 lg / 1, the effect as a glossing agent cannot be fully exerted; if it exceeds 10g / 1 # above the upper limit value, the effect of increasing glossiness will not be caused as a result. The invention described in item 3 of the scope of the patent application is a non-cyanide electrolytic gold plating solution. The electrolytic gold plating solution is composed of a gold salt, 1,2-ethanediamine, a buffering organic gloss agent, and a conductive salt. It is characterized in that the plating solution contains a trivalent gold salt as a gold supply source of 5 g / l to 30 g / l and 1,2-ethanediamine diamine at a concentration of 3.0 to 3.0 M. ,

該非氰電解金電鍍液與申請專利範圍第2項所述之電 鍍液不同,其係使用金鹽作為金的供給源。若以作為如上 ^般之電鍍液而言,可使用一般的三價金鹽。藉由使用三 價金鹽,可使所能使用的原料範圍更廣泛,同時亦是由不 含有亞硫酸離子、具有比起習知所用的亞硫酸金電鍍液更 長期的溶液安定性以及所形成的電鍍被膜的之形狀等來考 慮並以對整體平衡(total balance)而言最優異而作的判 斷所研究得到的結果。This non-cyanide electrolytic gold electroplating bath is different from the electroplating bath described in item 2 of the scope of patent application in that it uses a gold salt as a source of gold supply. As a plating solution as described above, a general trivalent gold salt can be used. By using a trivalent gold salt, a wider range of raw materials can be used. At the same time, it is also free of sulfite ions, has a longer-term solution stability and is formed than the conventional gold sulfite plating solution. Considering the shape and the like of the electroplated coating, the result obtained by research is determined by judging that it is the most excellent for the total balance.

就此處而言,三價金鹽係如申請專利範圍第7項所述 般,以使用擇自雙(1,2-乙烷二胺)金三氣化物、氫氧化 金、四羥合金鉀以及氣金酸中1種或2種以上成份者較佳。 上述等三價金鹽在用來作為電鍍液時就算經過長時間也不 易變質,因而長期的溶液安定性特別優異。 金之含量係在5-30g/l之範圍内。若在下限值5g/1以 下的話,則金的析出速度變慢而不適用在實際之作業中; 上限值30 g / 1則係可溶解量之限度。因此,金的量如果在For this purpose, trivalent gold salts are used as described in item 7 of the scope of the patent application to use bis (1,2-ethanediamine) gold trigas, gold hydroxide, potassium tetrahydroxide, and One or two or more components of qiaulic acid are preferred. The above-mentioned equivalent trivalent gold salts are not easily deteriorated even after being used for a long time when used as a plating solution, and therefore have long-term solution stability. The gold content is in the range of 5-30 g / l. If the lower limit value is 5 g / 1 or less, the gold precipitation rate becomes slow and is not suitable for practical operation; the upper limit value of 30 g / 1 is the limit of the soluble amount. Therefore, if the amount of gold is in

五、發明說明(6) ' ' -------- 可 ΐ::Ϊ内的話,量愈多則析出的速度會愈快。所以, ^粑内根據使用目的對應作業條件來選擇使用值。 \2-乙烷二胺係用來作為配位劑使用。該 胺硫酸鹽係在〇.2_3.〇μ的範圍内進行添加。若在下限^一 的話則無法發揮作為配位劑之效果;若超過上限值 使得全在、、心Ϊ 精由使用該乙烷二胺, = 液2成=使:雙(1,2-乙院二胺)金錯 種二液。即使是在使用雙(1,2_乙炫二胺)金 會因為六Λ女雙(,2_乙烷二胺)金三氯化物的情形下,也 二。’ "、、σ有1,2_乙烷二胺而成為較具安定性的金電鍍 等。該等=::t:使用硫酸鉀、氯化鉀以及硝酸鉀 效能而添加之====液;能達到作為傳導鹽之 錄液具有ί八=下限值lg/1以下的話,則很難確保電 在溶液以::::解若在上限一以上的話,則 或2種以上ϊΐϊ 6的有機羧酸、_酸以及硼酸中1種 °·05Μ^1 ou^ n f f 酸,具體而,有'ΊΓ:佳。在此;,pH值為2~6的有機敌 等。此外;ir酸、•酸、琥轴酸、乳酸以及酒石酸 亦可使用磷酸及硼酸等具有緩衝作用之效果5. Description of the invention (6) '' -------- OK 可 :: Ϊ, the more the amount, the faster the precipitation. Therefore, within ^ 粑, the use value is selected according to the operating conditions corresponding to the purpose of use. \ 2-Ethylenediamine is used as a complexing agent. The amine sulfate is added in a range of 0.2 to 3.0 μ. If the lower limit is ^ 1, the effect as a complexing agent cannot be exerted; if the upper limit is exceeded, the presence of carbodiazepine is used by the ethanediamine, = liquid 2% = make: double (1, 2- Yiyuan Diamine) Gold wrong two liquid. Even in the case of the use of bis (1,2-ethylene diamine) gold because of the hexa-La female bis (, 2-ethanediamine) gold trichloride, two. "&Quot;, and σ have 1,2_ethanediamine, which makes it a more stable gold plating. These = :: t: liquids added with potency of potassium sulfate, potassium chloride, and potassium nitrate; ==== liquid; it can reach the recording liquid as a conductive salt with a lower limit of lg / 1 or less, which is It is difficult to ensure that the solution is in the ::::: solution if the upper limit is more than one, or 2 or more kinds of organic carboxylic acids, _acids, and boric acids, and one of the type of ° · 05M ^ 1 ou ^ nff acid, specifically, There is' ΊΓ: good. Here, organic enemies with a pH of 2 to 6. In addition, ir acid, • acid, succinic acid, lactic acid and tartaric acid can also use phosphoric acid and boric acid, which have a buffering effect.

_丨__ 丨 _

第9頁 505708 —— 五、發明說明(7) 者。藉著緩衝作用,可達到虹& 動之效果。添加量亦為可使用=非氰電解金電鑛液PH變 其總莫耳濃度在0.05M-1.。MJi種严上的藥劑,並使 0 0 5 M Ji( τ' iii ^ t 、乾圍内較佳。若在下限值 ?5M以下的活,則無法充分發揮 果。 不^因此而增大緩衝劑的效 9項所〜進/步::乂有機光澤劑而言,係如申請專利範圍第 Λ Λν 自鄰菲啉、聯二哦咬以及上述者等 油:声w。1種或2種以上成份者。並且,其添加量係以在 = ^5〇P賢1()_卿的範圍内較佳。如此寬廣的濃度 :圍”示上述等有機光澤劑的溶解度會隨著溶液PH而變 ί則右 限i50ppm以下的話,則無法充分發揮作為光 澤d之效果,右添加超過上限值1 0 000ppm以上的話亦 不會因此而提昇光澤之改善效果。 α具有傳導性之傳導鹽係如申請專利範圍第1 0項所述 般,可使用含硫酸離子、鹽酸離子或硝酸離子之化合物。 =即,利用1,2-乙烷二胺的化合物以動態供給丨,2—乙烷二 胺及傳導離子之方法是最有效率且經濟的。因此,以使用 乙烷二胺之化合物的1種或2種以上成份且傳導離子的 總莫耳濃度為在〇·05Μ〜5· 〇Μ的範圍内進行添加者較佳。若 在忒下限值0 · 〇 5Μ以下的話,則很難確保電鍍液具有充分 的導電性,若在上限值5· 〇Μ以上的話,則在溶合 無法溶解。 t曰支件 此外’硫酸離子、鹽酸離子以及硝酸離子雖然亦可以Page 9 505708-V. Description of Invention (7). By buffering, rainbow & motion can be achieved. The addition amount is also usable = the pH of non-cyanide electrolytic gold power ore liquid changes to a total molar concentration of 0.05M-1. MJi is a kind of strict medicine, and it is better to make 0 0 5 M Ji (τ 'iii ^ t, dry range. If the lower limit value is less than 5M, the effect cannot be fully exerted. Do not increase the buffer therefore The effect of the agent is as follows: Step 9: For organic lubricating agents, such as the scope of application for patents Λ Λν phenanthroline, biphenyl, and the above oils: sound w. 1 or 2 The above ingredients. And, the added amount is preferably in the range of = ^ 5〇P 贤 1 () _ qing. Such a wide concentration: around "shows that the solubility of the above organic gloss agents will vary with the pH of the solution. If it is changed, if the right limit i50ppm or less, the effect of gloss d cannot be fully exerted, and if the right limit exceeds 10,000ppm or more, the improvement effect of gloss will not be improved because of this. Α Conductive conductive salts such as As described in item 10 of the scope of the patent application, compounds containing sulfate ions, hydrochloric acid ions, or nitrate ions can be used. That is, a compound using 1,2-ethanediamine can be dynamically supplied. 2-ethanediamine And the method of conducting ions is the most efficient and economical. Therefore, the use of ethanediamine It is preferable to add one or two or more components of the compound and the total molar concentration of the conductive ions in the range of 0.05M to 5.0M. If the lower limit of 忒 is 0.5M or less, It is difficult to ensure that the electroplating solution has sufficient conductivity, and if the upper limit value is 5 · OM or more, it cannot be dissolved in the melt.

第10頁 505708Page 505708

但是此種添加方 硫酸、鹽酸以及硝酸的型態來進行添加 式還是以用來作為調整pH值之手段較佳 然後,在申請專利範圍第U項中所述者係一種非 解金電鍍方法,該方法係使用如申請專利範圍第2、3、 4、5或6項中所述之金電鍍液,其特徵在於:在溶液的pH 值為2〜7、液溫為4〇〜80 t:的條件下以電流密度 0·2〜3«5A/dm2來進行電解電鍍。 在此處,浴液的pH會隨著無機酸鉀鹽之添加量而變成 位於PH2〜7的範圍内,如果在此範圍内的話,則在所析出 之金電鍍層的外觀上就不會產生異常。在必須調整pH時, ^ 乂使用不會影響電鍍液特性之硫酸鉀、氯化鉀及硝酸钟 專無機酸鉀鹽,或是醋酸、甲酸、笨曱酸等有機羧酸 行調整較佳。 將電鍍液控制在液溫為4 〇〜8 〇 °c的條件下,若在下限 ,以下的話則析出速度會變慢而不適用於實際之作業中; =f上限值以上的話,則會影響所析出之金電鍍層的光浲 业k成 >谷液壽命急遽降低。 係將電解時的電流密度控制在〇· 2〜3· 5 A/dm2的用意, ^〜慮上述電鍍液之pH值及液溫,以使所析出之金電鍍層 侍到作為目的之性質。 得 使用以上之金電鍍液並利用此處所述之金電鍵方法戶斤 ^ =之析出金比起使用習知之金電鍍液所析出之金而言, 而f具有微細的析出結晶且亦具有硬度低的特性。就一舣 σ ,結晶粒愈細小,所測得的金屬硬度愈高。但是,砮However, it is better to use this type of added sulphuric acid, hydrochloric acid and nitric acid to perform the addition formula as a means of adjusting the pH value. Then, the one described in item U of the scope of patent application is a non-gold plating method. This method uses the gold plating solution as described in the items 2, 3, 4, 5, or 6 of the scope of the patent application, which is characterized in that the pH value of the solution is 2 to 7, and the liquid temperature is 40 to 80 t: The electrolytic plating was performed under the conditions of a current density of 0 · 2 ~ 3 «5A / dm2. Here, the pH of the bath liquid will be in the range of pH 2 to 7 with the addition amount of the potassium salt of the inorganic acid. If it is within this range, the appearance of the deposited gold plating layer will not occur. abnormal. When it is necessary to adjust the pH, it is better to use potassium sulfate, potassium chloride, and potassium nitrate which do not affect the characteristics of the plating solution, or potassium salts of inorganic acids, or organic carboxylic acids such as acetic acid, formic acid, and stearic acid. Control the plating solution at a temperature of 40 ° C to 80 ° C. If it is below the lower limit, the precipitation speed will be slower if it is below, and it is not suitable for practical work. The photoresistance of the gold plating layer that affects the precipitation > the life of the valley solution is drastically reduced. The purpose is to control the current density during electrolysis to 0.2 to 3.5 A / dm2, and to consider the pH value and temperature of the above-mentioned plating solution so that the deposited gold plating layer serves the purpose properties. It is possible to use the above-mentioned gold electroplating solution and use the gold key method described herein. The amount of precipitated gold is higher than that of gold precipitated using the conventional gold electroplating solution, and f has fine precipitated crystals and also has hardness. Low characteristics. As soon as 舣 σ, the finer the crystal grains, the higher the hardness of the measured metal. But 砮

505708505708

到具有 五、發明說明(9) 使用本發明之金電鍍液與金電鍍方法,則可同時得 微細的結晶粒且硬度低之析出金,此特點乃與利用 電鍍液及方法所得到之析出金全然不同。 例如 ,在使用Na3Au(S03)2之習知金電錢浴中, 析出金當中亦析出了電鍍液中所含的硫磺,故得到_、也 金之粒子分散同樣的效果,因而使得結晶粒形成大,、析出 結晶組織。相對於此,以本發明之電鍍方法所得到 組織則由於析出金的純度很高,故結晶粒很微細 密度(bu 1 k )金,因而可得到結晶粒内轉移密度少之 硬之 度金電鍍層。上述情形係如表1所示 白勺結晶 而接近高 低石更 表1 析出金電鑛層的維式c Vickers )硬度比較 項目 本發明之金電鍍液 習知之金電鍍液 維式 硬度 最大值 69.1 77 .4 ' 最小值 64.6 72.2 平均值 66 1 7 1一"·—-—_ 75.1 標準偏差1 2.1 1. 9 (各 Ή= 30 ) 顯微型維式硬度計之測量加重 lgTo the fifth, the invention description (9) the use of the gold plating solution and the gold plating method of the present invention can simultaneously obtain fine crystal grains and low hardness precipitated gold, this feature is the same as the use of the plating solution and the method It's totally different. For example, in the conventional gold electric money bath using Na3Au (S03) 2, the sulfur contained in the plating solution is also precipitated in the precipitated gold, so the same effect as that of the gold particles is obtained, so that crystal grains are formed. Large, precipitated crystalline structure. In contrast, the microstructure obtained by the electroplating method of the present invention has high purity of the precipitated gold, so the crystal grains have a very fine density (bu 1 k) of gold, and thus a hard gold plating with a small transfer density within the crystal grains can be obtained. Floor. The above situation is as shown in Table 1. It is close to the high and low stones. Table 1 Vickers hardness of gold deposits. Comparison item of hardness The maximum value of the Vickers hardness of the conventional gold plating solution of this invention 69.1 77 .4 'Minimum 64.6 72.2 Average 66 1 7 1- " · —-—_ 75.1 Standard deviation 1 2.1 1. 9 (each Ή = 30) The measurement weight of the micro-dimensional hardness tester is increased lg

然後,在申請專利範圍第1 2項中所述者係一種非氛電 解金電鍍方法,該方法係使用如申請專利範圍第3、7、 8、9或10項中所述之非氰電解金電鍍液,在溶液的pH值為 2〜6、液溫為40〜70 °C的條件下以電流密度為〇.丨〜3· OA/dm2 之條件來進行電解。 在此處,溶液的pH值係控制在PH為2〜6的範圍内,若Then, the one described in item 12 of the patent application is a non-ambient electrolytic gold plating method, which uses non-cyanide electrolytic gold as described in item 3, 7, 8, 9 or 10 of the patent application. The electroplating solution is electrolyzed under the condition that the pH of the solution is 2 to 6, and the liquid temperature is 40 to 70 ° C, and the current density is 0.1 to 3. OA / dm2. Here, the pH of the solution is controlled within the range of pH 2 to 6, if

第12頁 505708 五、發明說明(10) 在此範圍内的話’則在所析出之金電鍍層的外觀上就不會 產生異常。在必須調整pH時,則以使用不會影響電鍍液特 性之硫酸、鹽酸及硝酸等無機酸鹽’或是醋酸、甲酸、苯 甲酸專有機緩酸來進行調整較佳。 將電鍍液控制在液溫為40〜70 °C的條件不,若在下限 值以下的话則析出速度會變慢而不適用於實際之作業中; 若在上限值以上的話,則會影響所析出之金電鑛層的光澤 並造成溶液壽命急遽降低。 將電解時的電流密度控制在〇· :1〜3· 〇 A/dm2,係考慮 上述電鍍液之pH值及液溫所得到的能在析出金電鍍層上賦 予其良好性質之範圍。 曰 若使用以上之金電鍍液以及金電鍍方法的話,即可得 ,,有如申請專利範圍第i丨項所述之電解金電鍍液以上的 女疋性且結晶粒微細、硬度低之析出金,並且長期安定性 優異、可長期使用。 , 例如,在使用N^AiUSC»3)2之習知金電鍍浴中,由於在 析出金當中亦析出了電鍍液中所含的硫磺,故得到與析出 金之粒子分散同樣的效果,因而使得結晶粒形成大且硬之 =晶組織。而且與如以上所述之使用本發明的電解金電鍍 =的情形比較起來,其在短時間内即會有產生金沉澱等之 電鍍液變質的現象發生,因而造成很難長時間安定作業。 使用習知電鍍液的電鍍方法,無法在進行非常細微形 勺凸塊(bump)電鑛時達到良好的精確度,故電鍍後之金 的析出面會變得粗糙,凸塊形狀因而歪斜。利用本發明之Page 12 505708 V. Description of the invention (10) If it is within this range, there will be no abnormality in the appearance of the deposited gold plating layer. When it is necessary to adjust the pH, it is better to use inorganic acid salts 'such as sulfuric acid, hydrochloric acid, and nitric acid', or acetic acid, formic acid, and benzoic acid, which are special organic slow acids, which do not affect the characteristics of the plating solution. Control the plating solution at a temperature of 40 to 70 ° C. If it is below the lower limit, the precipitation speed will be slower and it is not suitable for practical work. If it is above the upper limit, it will affect the temperature of the plating solution. The luster of the precipitated gold ore layer causes a sharp decrease in the life of the solution. The current density at the time of electrolysis is controlled to be in the range of: 1 to 3. A / dm2, which is a range in which good properties can be imparted on the deposited gold plating layer obtained by considering the pH value and temperature of the above-mentioned plating solution. That is, if the above gold plating solution and gold plating method are used, it can be obtained, as described in item i 丨 of the scope of application for patents, the nucleus has finer crystal grains and low hardness. And it has excellent long-term stability and can be used for a long time. For example, in a conventional gold plating bath using N ^ AiUSC »3) 2, since sulfur contained in the plating solution is also precipitated in the precipitated gold, the same effect as that of the dispersed gold particles is obtained, thus making Crystal grains form a large and hard = crystalline structure. In addition, as compared with the case where the electrolytic gold plating of the present invention is used as described above, the phenomenon of deterioration of the plating solution, such as gold precipitation, occurs in a short time, making it difficult to perform stable operations for a long time. The plating method using the conventional plating solution cannot achieve good accuracy when performing very fine-shaped scoop bump ore deposits, so the precipitation surface of the gold after plating will become rough, and the shape of the bumps will be skewed. Utilizing the invention

第13頁 505708 五、發明說明(11) 金電鍍液以及金電鍍方法,因為可得到金微細地析出之金 電鍍層,故可在小尺寸的LSI凸塊上形成精度良好的金電 鑛層,同時亦可降低金電鑛液的運轉成本(running cost) 〇 表2所示係為在使用本發明的電解金電鍍液下之長期 安定性試驗的結果。在表1中,安定性係在1公升的非氰電 解金電鍍液中通以1 5 0 0 〇庫侖的電流後,於金為1 0g/ 1之情 形下對金電鍍層的析出安定性(析出速度、析出偏差Page 13 505708 V. Description of the invention (11) The gold plating solution and gold plating method can obtain a gold electroplated layer in which gold is finely precipitated, so that a high-precision gold electric ore layer can be formed on a small-sized LSI bump. At the same time, the running cost of the gold-electric ore liquid can be reduced. Table 2 shows the results of long-term stability tests using the electrolytic gold plating solution of the present invention. In Table 1, the stability is the precipitation stability of the gold plating layer when the gold is 10 g / 1 after a current of 15 000 coulombs is passed in a 1 liter non-cyanide electrolytic gold plating solution ( Precipitation speed, precipitation deviation

(dispersion)及析出硬度等)進行評價之結果。 表2 項目 單也 根品編號(lot No.) __ 1 2 3 4 5 6 溶 液 的 組 成 金濃度 g/ι 5 8 10 10 10 10 Εη濃度 Μ 1 1 1 2 2 2 緩銜劑 Μ 醋駿 0.3 檸檬醚 0.5 磷駿 , 0.1 mm. o.i 醋酸 0.3 醋酸 0.3 光澤劑$ ppm ①100 (2)500 ©700 (2)700 01000 02000 電 鍍 條 # ΡΗ - 4 5 4.5 3.8 3 6 溫度 60 65 70 50 65 65 電流密度 A/dm2 1 1 2 2 2 2 外觀木木 - 光澤 牟光泽 丰光澤 丰光澤 丰光澤 丰光澤 碛度 Hv 100 70 70 70 70 70 安定性 - 作 佳 ⑺使用光澤费 的種與 1 :①鄰菲啉,②2,2’-聯 二吡啶③2,24 -f基吡啶 (2,2-4-pi coline)(dispersion, precipitation hardness, etc.). Table 2 Item No. (lot No.) __ 1 2 3 4 5 6 Solution composition gold concentration g / ι 5 8 10 10 10 10 ΕηιηΜ 1 1 1 2 2 2 retarder M vinegar 0.3 Lemon ether 0.5 Phosphate, 0.1 mm. Oi Acetic acid 0.3 Acetic acid 0.3 Gloss $ ppm ①100 (2) 500 © 700 (2) 700 01000 02000 Plating strip # ΡΗ-4 5 4.5 3.8 3 6 Temperature 60 65 70 50 65 65 Current Density A / dm2 1 1 2 2 2 2 Appearance Wood Wood-Gloss Mou Glossy Glossy Glossy Glossy Glossy Glossiness Hv 100 70 70 70 70 70 Phenanthroline, ②2,2'-bipyridine ③2,24 -f-based pyridine (2,2-4-pi coline)

表示以目視觀察之結果 i t升,¾气鍵液中通以15000庫命的總電流曼後’將金含曼調整成原 來的佥董,紀錄測定時電鍍電流之變動。與原來的電鍛條件相比,若電流變動在 5%以内的話則判定為「佳」。 【實施例】It shows the result of visual observation. It was increased by 1 t, and the total current of 15,000 kwh was passed through the ¾ gas-bond fluid. After adjusting the Kim Han-man to the original manganese, the change of the plating current during the measurement was recorded. Compared with the original electric forging conditions, if the current variation is within 5%, it is judged as "good". [Example]

第14頁Page 14

以下,就本發明之菲一氰電解金電鍍液及使用該電鍍液 之方法,透過最佳之實施例來進行更詳細的說明。 實施例1 金化合物之雙(1,2 -乙烷二胺)金錯合物係在反應溫 度3 0 C。下利用以下之反應所得到。此時的反應溫度係以 15 = 60^ C杈佳。此乃因為若未滿15它的話,反應無法充分 地進行,故產率會下降;若超過6〇的話,則會引起金離 子的還原反應,而生成金的微粒子。Hereinafter, the phenanthrene-cyanide electrolytic gold plating solution and the method using the same according to the present invention will be described in more detail through the best embodiment. Example 1 A bis (1,2-ethanediamine) gold complex of a gold compound is at a reaction temperature of 30 ° C. It is obtained by the following reaction. The reaction temperature at this time is preferably 15 = 60 ^ C. This is because if it is less than 15, the reaction will not proceed sufficiently and the yield will decrease; if it exceeds 60, it will cause a reduction reaction of gold ions to generate gold fine particles.

NaAuCl4 + 2en Au(en)2Cl3 + NaCl #使用據此而得之雙(i,2—乙烷二胺)金氣化物來還原 非氰金電鍍液。該非氰金電鍍液的調配組成係如以下所 不 · JLUg/ i 60g/l 60g/l 50g/ 1 lg/1 於測試圖案 雙(1,2-乙烧二胺)金氯化物(當作金) 1,2 -乙烧二胺硫酸鹽 氯化鉀 有機羧酸(擰檬酸) 雜環化合物(噻吩碳酸) 使用該金電鍍液,在下列電鑛條件下, (test pattern)上進行金電鍍。 pH 值 5 〇 電鍵液溫度 β 〇。〇 ^ 1· 5 A/dm2 電解時間 Θ 0分鐘 進行在以上條件下所生成之金電鍍層的物性測定,結NaAuCl4 + 2en Au (en) 2Cl3 + NaCl # Use the bis (i, 2-ethanediamine) gold gaseous substance obtained thereby to reduce the non-cyanide gold plating solution. The composition of the non-cyanuric gold plating solution is as follows: JLUg / i 60g / l 60g / l 50g / 1 lg / 1 in the test pattern bis (1,2-ethanediamine) gold chloride (as gold ) 1,2-Ethylene diamine sulfate, potassium chloride, organic carboxylic acid (citric acid), heterocyclic compound (thiophenic acid, carbonic acid) Using this gold plating solution, gold plating is performed on the (test pattern) under the following electric mine conditions . pH value 5 〇 Electrolyte temperature β 〇. 〇 ^ 1 · 5 A / dm2 Electrolysis time Θ 0 minutes The physical properties of the gold plating layer formed under the above conditions were measured.

2169-2793-PFl.ptc 第15頁 5057082169-2793-PFl.ptc Page 15 505708

五、發明說明(13)V. Description of Invention (13)

果如表3所示。由表3可看出’金電鑛層的維氏硬度 (Vickers hardness)平均為66.7。更進一步,以掃猫式電 子顯微鏡(SEM )觀察經該金電鍍後之測試圖案(test ” pattern),其結果如第1圖所示。由第J圖可看出,所得到 之金電鍵面極為平滑。因此’藉著能確保如上述般之電錢 面的平滑性而可使附著(bond ing)性顯往向上提昇。又,X 該電解金電鑛液的壽命若以通電時間換算係為3丨〇〇小時。 實施例2 在金鹽中所使用之雙(1,2-乙烧二胺)金三氣化物係 在反應溫度30°C下利用以下之反應所得到。此時的反應、、w 度係以15-60。(:較佳。此乃因為若未滿15t的話,反應 法充分地進行,故產率會下降;若超過6〇 t的話,則會'’引 起金離子的還原反應,而生成金的微粒子。The results are shown in Table 3. From Table 3, it can be seen that the Vickers hardness of the gold deposit is 66.7 on average. Furthermore, the scanning test electron microscope (SEM) was used to observe the test pattern after the gold plating, and the results are shown in Fig. 1. As can be seen from Fig. J, the obtained gold electric key surface Extremely smooth. Therefore, 'the bondability can be significantly increased by ensuring the smoothness of the electric money surface as described above. In addition, if the life of the electrolytic gold electric mineral liquid is converted by the time of electricity conversion, It is 3 hours. Example 2 The bis (1,2-ethanediamine) gold trigas compound used in the gold salt was obtained by the following reaction at a reaction temperature of 30 ° C. At this time The reaction and w degrees are 15-60. (: Better. This is because if the reaction method is fully performed if it is less than 15t, the yield will decrease; if it exceeds 60t, it will cause `` gold The reduction reaction of ions generates fine particles of gold.

NaAuCl4 + 2en Au(en)2Cl3 + NaCl 使用據此而得之雙(1,2-乙烷二胺)金三氯化物來還 原非氰金電鍍液。該非氰金電鍍液的調配組成係如以下所 示: 雙(1,2-乙烷二胺)金三氯化物(當作金)i〇g/i 1,2-乙烷二胺硫酸鹽 ,/·! 〆 β … 1 00g/ 1 緩衝劑(檸檬酸) .t 5Og/ 1 有機光澤劑(鄰菲啉) ^ _ lOOppm 〜〃電鍍液,在下列電鍍條件下,於測試圖案上 進行金電鍍。NaAuCl4 + 2en Au (en) 2Cl3 + NaCl uses the bis (1,2-ethanediamine) gold trichloride obtained thereby to reduce the non-cyano gold plating solution. The composition of the non-cyano gold plating solution is as follows: bis (1,2-ethanediamine) gold trichloride (as gold) i0g / i 1,2-ethanediamine sulfate, / ·! 〆β… 1 00g / 1 buffering agent (citric acid) .t 5Og / 1 organic gloss agent (o-phenanthroline) ^ _ 100ppm ~ 〃 plating solution, gold plating on the test pattern under the following plating conditions .

pH 值 3e5QpH 3e5Q

果如 66. 7 小時 實施 8g/ 1 進行 pH值 電錄液溫度 電流密度 電解時間 果如 72. 1 小時 電鍍液溫度 6 〇 ^ 電流密度 A/dm2 電解時間 75分鐘 ^行在/上條件下所生成之金電鍍層的物性測定,結 1所不。由表3可看出,金電鍍層的維氏硬度平均為 。玄電解金電鍍液的壽命若以通電時間換算係為3 5 〇 〇 在;。係使用氫氧化金…將金濃度控制成 二$氰電解金電鍍液的調配組成係如以下所示: 虱氧化金(當作金) 8g/1 1,2-乙烷二胺二鹽酸鹽 緩衝劑(硼酸) 3〇g/i 有機光澤劑(2, 2-聯二吡啶)4jppm 使用該金電鑛液,在下列電妒 金電鲈。 Γ ^电鍍條件下,於測試圖案」If you implement 8g / 1 at 66. 7 hours, carry out pH electrolyzing solution temperature, current density electrolysis time, if you have 72.1 hours, plating solution temperature 6 〇 ^ current density A / dm2 electrolysis time 75 minutes ^ under the above conditions The physical properties of the resulting gold plating layer were measured in the first place. It can be seen from Table 3 that the Vickers hardness of the gold plating layer is on average. If the life of the black electrolytic gold plating solution is converted to the time of energization, it is 3 500. The system uses gold hydroxide to control the concentration of gold into a two-cyanide electrolytic gold plating solution. The composition of the system is as follows: lice oxide gold (as gold) 8g / 1 1,2-ethanediamine dihydrochloride Buffering agent (boric acid) 30g / i Organic glossing agent (2, 2-bipyridine) 4jppm Using this gold electro-mineral liquid, the following electric jealousy is used. Γ ^ Under plating conditions, in test pattern "

4· 3 5 5 °C 1.2 A/dm2 75 分鐘 進行在以上條件下所生成之金 # - ,一 土电锻層的物性測定,、名 ^ . i ^層的維氏硬度平均j 。邊電解金電鍍液的毒命若+ ^ ^ ^ ^ J " 。 电敕欣扪可°P右以通電時間換算係為345 五、發明說明(15) 實施例4 在金鹽中係使用四羥合金鉀,又,將金濃产 1 Og/ 1。該非氰電解金電鍵液的調配組成係如以〜:1一、· 四羥合金鉀(當作金) l〇g/l 不· 1,2乙燒_胺二硫酸鹽 l2〇g/i 緩衝劑(硼酸) 5〇g/1 有機光澤劑(2,2-聯二吡啶) l2〇〇ppm 使用該金電鍍液,在下列電鍍條件下, 進行金電鍍。 %及J忒圖案上 pH值 電鍍液溫度 電流密度 電解時間 3. 604 · 3 5 5 ° C 1.2 A / dm2 75 minutes The gold produced under the above conditions was measured. The physical properties of a geoelectric forging layer were measured. The average Vickers hardness of the layer was ^. I ^. The poisonous life of edge electrolytic gold plating solution + ^ ^ ^ ^ J ". The electric power can be converted to 345 ° C. The conversion time is 345. V. Description of the invention (15) Example 4 In the gold salt, tetrahydroxyalloy potassium is used, and the concentration of gold is 1 Og / 1. The composition of the non-cyanide electrolytic gold bond solution is as follows: ~: 1, · tetrakismonium potassium (as gold) lOg / l not 1,2 ethyl amine_amine disulfate l20g / i buffer Agent (boric acid) 50 g / 1 organic gloss agent (2,2-bipyridine) 1200 ppm Using this gold plating solution, gold plating was performed under the following plating conditions. % And J 忒 pattern pH value Plating bath temperature Current density Electrolysis time 3. 60

6 5 °C 1. 5 A/dm2 75 分鐘 旲J二在以上條件下所生成之金電鍍層的物性測定,- 果如表2所不。由表2可看出,金電鍍層的維: 7^。該電解金電鍍液的壽命若㈣f時間換算ς為咖 小時。 實施例5 在金鹽中係使用氣金酸。又,將金濃度控制成 1 〇g/1 °該非氰電解金電鍍液的調配組成係如以下所示: 氯金酸(當作金) 10g/l 1,2-乙烷二胺二硫酸鹽 150g/l 緩衝劑(硼酸) 40g/l 有機光澤劑(2, 2-聯二吡啶)l〇〇〇ppm6 5 ° C 1. 5 A / dm2 75 minutes 旲 J 2 The physical properties of the gold plating layer formed under the above conditions are determined, as shown in Table 2. As can be seen from Table 2, the dimension of the gold plating layer: 7 ^. The life of the electrolytic gold plating solution is converted into hours by time. Example 5 Gas gold acid was used in the gold salt. In addition, the gold concentration was controlled to 10 g / 1 °. The composition of the non-cyanide electrolytic gold plating solution was as follows: Chloroauric acid (as gold) 10 g / l 1,2-ethanediamine disulfate 150g / l buffering agent (boric acid) 40g / l organic gloss agent (2, 2-bipyridine) 1000ppm

第18頁 505708 ~ -—--- 五、發明說明(16) ------- 使用該金電鍍液,在下列 進行金電It。 丨電鍍條件下,於測試圖案上 pH值 3. 60 電鍍液溫度 60 °C 電流密度 1 · 2 A/dm2 電解時間 7 5分鐘 = 在以上條件下所生成之金電鑛層 二=。由表3可看!,金電鑛層的維氏硬度平“ 小時。μ。解金電鍍液的寿命若以通電時間換算係為3 1 0 0 iL施例6 在金鹽中係使用四羥合金鉀與氯金酸。又,將總 (total)金濃度控制成1〇g/i。 組成係如以下所示: 該非氰電解金電鍍液的調配 四羥合金鉀(當作金) 5g/ 1 氯金酸(當作金) 5g/ 1 1,2 -乙烷二胺二硫酸鹽 120g/l 緩衝劑(填酸氫二鉀) 30g/ 1 有機光澤劑(2,2 -聯二卩比淀) 4 0 0 ppm 使用該金電鍍液,在下列電鍍條件下,於測試圖案上 進行金電鍍。 pH 值 6.0Page 18 505708 ~ ------ 5. Description of the invention (16) ------- Using this gold plating solution, perform gold electricity It in the following.丨 pH value on the test pattern under plating conditions 3. 60 Electroplating bath temperature 60 ° C Current density 1 · 2 A / dm2 Electrolysis time 7 5 minutes = Gold electricity ore layer generated under the above conditions II =. See from Table 3! The Vickers hardness of the gold electric ore layer is flat "hours. Μ. The life of the solution of the gold plating solution is converted to 3 1 0 0 iL. Example 6 In the gold salt, potassium tetrahydroxy alloy and chloroauric acid are used. In addition, the total gold concentration is controlled to 10 g / i. The composition is as follows: The non-cyanide electrolytic gold plating solution is formulated with potassium tetrahydroxy alloy potassium (as gold) 5 g / 1 chloroauric acid (when As gold) 5g / 1 1,2-ethanediamine disulfate 120g / l Buffering agent (dipotassium hydrogen-filled) 30g / 1 Organic glossing agent (2, 2-dioxopyridine) 4 0 0 ppm Using this gold plating solution, gold plating was performed on the test pattern under the following plating conditions. PH value 6.0

電鍍液溫度 4 5 °C 電流密度 1. 0 A/dm2Bath temperature 4 5 ° C Current density 1. 0 A / dm2

第19頁 505708 五、發明說明(17) 電解時間 75 分鐘 進行在以上條件下所生成之金電鍍層的物性測定,結 果如表3所示。由表3可看出,金電鍍層的維氏硬度平均為 6 7· 0。該電解金電鍍液的壽命若以通電時間換算係為328〇 小時。 比較例 為了比較本發明的非氰電解金電鍍液與習知的非氰電 解金電鍍液之間的效能,故使用以Na3Au(s〇3)2作為金鹽之 ,電鍍來進行還原,並與上述步驟同樣般於測試圖案上施 二金電鍍以作為比較例。習知的非氰金電解金電鍍液之 配組成係如以下所示: l〇g/l 2〇g/ 1 20g/l 〇. 〇lg/lPage 19 505708 5. Description of the invention (17) Electrolysis time 75 minutes The physical properties of the gold plating layer formed under the above conditions were measured. The results are shown in Table 3. As can be seen from Table 3, the average Vickers hardness of the gold plating layer was 67 · 0. The life of this electrolytic gold plating solution is 3280 hours in terms of the conduction time. Comparative Example In order to compare the efficiency between the non-cyanide electrolytic gold plating solution of the present invention and the conventional non-cyanide electrolytic gold plating solution, Na3Au (s〇3) 2 was used as the gold salt, and the reduction was performed by electroplating. The above steps are similarly applied with two gold platings on the test pattern as a comparative example. The composition of the conventional non-cyano gold electrolytic gold plating solution is as follows: 10 g / l 20 g / 1 120 g / l 〇lg / l

Na3Au(S03)2 (當作au)Na3Au (S03) 2 (as au)

Na2S03Na2S03

Na2HP04 it 使用該溶液並在以下所一 金電鍍。 询不的條件下對測試圖案進行 電鍍液溫度 65χ: 電流密度 n c 電解時間 6〇 J/,2 測定在以上條件下所生:= 鍍層的物性,結果如表3所八取之金電鍍液的壽命以及金, 維氏硬度平均為75· 1。更進1。由表3可看出,金電鍍層# 步’習知的電解金電鍍液以Na2HP04 it uses this solution and is plated with gold in the following. The temperature of the plating solution was measured at 65x under the condition of no inquiry: Current density nc Electrolysis time 60J /, 2 The measurement was made under the above conditions: = physical properties of the coating, the results are shown in Table 3 The life and gold, Vickers hardness averaged 75.1. Go further 1. From Table 3, it can be seen that the gold plating layer

505708 五、發明說明(18) 壽命若以通電時間換算係為丨〇 〇 〇〜2 〇 〇 〇小時。由此可得 習知的電解金電鍵液與本發明之非氰金電解金電鍍液相 比’其壽命較短。 實施例1 實施例2 實施例3 電鍍液壽命 〔小時〕 3100 —3500 T450 維氏硬度 iHvi 66 7 "66.7 實施例4 黉施你j 5 3300 72,1 T3 . 0 目視外觀 X澤 _光澤 笠光澤 實施例6 比較例 3100 32 80 1790 70.5 67,0ΤδΤΓ _半光澤 半光澤 半光澤 半光澤505708 V. Description of the invention (18) If the service life is converted by the time of energization, it is 丨 〇 〇 ~ 2 〇 〇 00 hours. As a result, the ratio of the conventional electrolytic gold electrolysis liquid to the non-cyano gold electrolytic gold electroplating liquid phase of the present invention is relatively short. Example 1 Example 2 Example 3 Life of plating solution [hours] 3100 -3500 T450 Vickers hardness iHvi 66 7 " 66.7 Example 4 黉 Shi J 5 3300 72,1 T3. 0 Visual appearance X Ze_gloss 笠Gloss Example 6 Comparative Example 3100 32 80 1790 70.5 67,0ΤδΤΓ _ Semi-Gloss Semi-Gloss Semi-Gloss Semi-Gloss

更進一步,以掃瞄式電子顯微鏡(SEM )觀察如該比 較例所示的經金電鍍後之測試圖案,其結果如第2圖所 示。藉,比較上述第1圖及第2圖可得知,比起在使用本發 明之非氰金電鍍液時所得到的金電鍍面而言,使用習知的 電解金電鍍液所得到之金電鍍面明顯的較不平滑。 【發明效果】Furthermore, a scanning electron microscope (SEM) was used to observe the test pattern after gold plating as shown in the comparative example, and the results are shown in FIG. 2. By comparing FIG. 1 and FIG. 2 above, it can be seen that compared with the gold plating surface obtained when the non-cyano gold plating solution of the present invention is used, the gold plating obtained by using a conventional electrolytic gold plating solution The surface is noticeably less smooth. [Effect of the invention]

藉由使用本發明之非氰金電鍍液,可提供一種溶液安 定性極優異且在金電鍍操作中不會發生所析出之金的物性 產生變化或金電鍍液產生分解等情形之金電鍍液,同時又 可達成降低該電解金電鍍之操作成本的目的。此外,藉由 使在戎金電鍍液中含有1,2 -乙烷二胺,即可控制所析出金 之硬度、純度以及析出結晶之狀態,因而適合用來形成微 細圖案(fine pattern),並可確保其具有適切的附著性:By using the non-cyanuric gold plating solution of the present invention, it is possible to provide a gold plating solution with excellent solution stability and no change in the physical properties of the precipitated gold or the decomposition of the gold plating solution during the gold plating operation. At the same time, the purpose of reducing the operating cost of the electrolytic gold plating can be achieved. In addition, by including 1,2-ethanediamine in the Rongjin plating solution, the hardness, purity, and state of the precipitated crystals can be controlled. Therefore, it is suitable for forming fine patterns, and Ensures proper adhesion:

第21頁Page 21

Claims (1)

—88117RRR —88117RRR 六、申請專利_ 修正: 生·. . 士 鹽或金錯ϋ之’該電解金電錢液係使用金 光澤劑以及值逡臨1 ΛΑ當作金,且含有緩衝劑、有機 心=傳特徵在於:在上述電鍛液中使含有 其中2該第1項所述之非氰電解金電鑛液, 電鍍液中的金濃度變為在2g/1 〜3〇g/丨範之 的金化合物之雙(1,2—乙烷二胺)金錯合物、 0·1〜2.5M之1,2-乙烷二胺硫酸鹽、 作為傳導鹽之無機酸鉀鹽、 . 作為緩衝劑之有機羧酸、以及 作為有機光澤劑之含1種以上異原子的雜環化合物。 3 ·如申請專利範圍第1項所述之非氰電解金電鍍液, 其中該金電鍍液中含有: 的 使金電鍍液中的金濃度變為在5g/i〜3〇g/i範圍内之量 價金鹽、 〇·2Μ〜3·0Μ之1,2-乙烷二胺、 緩衝劑、有機光澤劑以及傳導鹽。 4·如申請專利範圍第2項所述之非氰電解金電鍍液, 其中作為傳導鹽之無機酸鉀鹽係為卜l〇〇g/l之硫酸鉀、氯 化鉀或硝酸鉀。 5 ·如申請專利範圍第2項所述之非氰電解金電鍍液, 其中作為緩衝劑之有機羧酸係為具有卜200g/l羧基之乙 酸、甲酸或苯甲酸。 2169-2793-PFl.ptc 第22頁 505708 __案號88117558 缶 Λ--^修正 六、申請專利範圍 6 ·如申請專利範圍第2項所述之非氰電解金電鍍液, 其中作為有機光澤劑之含1種以上異原子的雜環化合物係 為0· 1〜10g/l之噻吩甲酸、鄰菲啉、吡啶、吡啶磺酸或聯 二吡啶。 7·如申請專利範圍第3項所述之非氰電解金電鍍液, 其中三價金鹽係擇自雙(1,乙嫁二胺)金氯化物、氫氧 化金、四羥合金鉀以及氯金酸中1種或2種以上成份者。 8.如申請專利範圍第3項所述之非氰電解金電鍵液, 其中緩衝劑係使用擇自pK值為2〜6的有機敌酸、碟酸以及 硼酸中1種或2種以上成份者,且其總莫耳濃度為o.mlj 0Μ 〇 9 ·如申請專利範圍第7項所述之非氰電解金電鍍液, 其中緩衝劑係使用擇自ρΚ值為2〜6的有機緩酸、磷酸以及 硼酸中1種或2種以上成份者,且其總莫耳濃度為〇·〇5Μ〜ι 0Μ。 又… · 10· —種如申請專利範圍第3、7、8或9項所述之非氰 電解金電鍍液,其特徵在於: 、 有機光澤劑係使用擇自菲琳、聯二吡咬、鄰菲啉之衍 生物以及聯二吡啶之衍生物中丨種或2種以上成份者,且其 總莫耳濃度為50ppm〜l〇〇〇〇ppm。 11. 一種如申請專利範圍第3、7、8或9 述之非氰 電解金電鍍液,其特徵在於: ' 傳導鹽係使用擇自可供給硫酸離子、鹽酸離子以及硝 酸離子之化合物中1種或2種以上成份者,I^總莫耳濃度—88117RRR —88117RRR 6. Apply for a patent _ Amendment: Health · .. Taxi salt or gold tincture 'The electrolytic gold electricity money system uses a gold gloss agent and a value of 逡 Lin 1 ΛΑ as gold, and contains a buffer, organic Heart = pass is characterized in that the non-cyanide electrolytic gold electric ore liquid containing 2 of the above item 1 is contained in the above-mentioned electric forging solution, and the gold concentration in the electroplating solution is changed to 2 g / 1 to 30 g / 丨Gold compound of bis (1,2-ethanediamine) gold complex, 0.1-2.5M of 1,2-ethanediamine sulfate, potassium salt of inorganic acid as conductive salt,. As buffer Organic carboxylic acid agents, and heterocyclic compounds containing one or more heteroatoms as organic gloss agents. 3. The non-cyanide electrolytic gold plating solution as described in item 1 of the scope of patent application, wherein the gold plating solution contains: so that the gold concentration in the gold plating solution becomes within the range of 5g / i ~ 30g / i The amount of valent gold salt, ethanediamine from 0.2M to 3.0M, buffer, organic gloss agent and conductive salt. 4. The non-cyanide electrolytic gold plating solution as described in item 2 of the scope of the patent application, wherein the inorganic acid potassium salt as the conductive salt is 100 g / l of potassium sulfate, potassium chloride or potassium nitrate. 5. The non-cyanide electrolytic gold plating solution as described in item 2 of the scope of patent application, wherein the organic carboxylic acid as the buffering agent is acetic acid, formic acid or benzoic acid having a carboxyl group of 200 g / l. 2169-2793-PFl.ptc Page 22 505708 __ Case No. 88117558 缶 Λ-^ Amendment VI. Patent Application Range 6 · Non-cyanide electrolytic gold electroplating solution as described in item 2 of the patent application range, which serves as an organic gloss The heterocyclic compound containing one or more kinds of heteroatoms of the agent is thiophenecarboxylic acid, o-phenanthroline, pyridine, pyridinesulfonic acid, or bipyridine from 0.1 to 10 g / l. 7. The non-cyanide electrolytic gold plating solution as described in item 3 of the scope of patent application, wherein the trivalent gold salt is selected from the group consisting of bis (1, ethanediamine) gold chloride, gold hydroxide, potassium tetrahydroxide alloy, and chlorine One or more types of auric acid. 8. The non-cyanic electrolytic gold key bond liquid as described in item 3 of the scope of the patent application, wherein the buffering agent is one or more of organic dibasic acid, dishic acid, and boric acid selected from a pK value of 2 to 6. And its total mole concentration is o.mlj 0Μ 〇9. The non-cyanide electrolytic gold plating solution as described in item 7 of the scope of patent application, wherein the buffering agent is an organic slow acid selected from a ρK value of 2 to 6, Phosphoric acid and boric acid have one or more than one component, and the total molar concentration thereof is from 0.05M to 1M. And ... · 10 · — A kind of non-cyanide electrolytic gold plating solution as described in the scope of application for patent No. 3, 7, 8 or 9, characterized in that:, the organic gloss agent is selected from phenanthrene, dipyridine, Among the derivatives of o-phenanthroline and the derivatives of bipyridine, one or two or more components, and the total molar concentration thereof is 50 ppm to 1,000 ppm. 11. A non-cyanide electrolytic gold plating solution as described in the scope of patent application No. 3, 7, 8 or 9, characterized in that: '' The conductive salt is one selected from the compounds capable of supplying sulfate ion, hydrochloric acid ion, and nitrate ion. Or 2 or more ingredients, I ^ total mole concentration 505708 _案號 881Π5Μ 修正 六 申請專利範圍 為〇·05M〜5·0M 〇 鍍液,其特IV於'專利粍圍第10項所述之非氰電解金電 酸離::::21擇自可供給硫酸離子、鹽酸離子以及硝 I離子之化合物中1種或2 為〇. 05Μ〜5. 0Μ。 以上成份者,且/、總莫耳濃度 專利非解金電鍍方法,該方法係使用如申請 5或6項中所述之金電鍍液,在溶液 為2〜7、液溫為40, 流 〇. 之條件下進行電解電鍍。 14· 一種非氰電解金電鍍方法,該方法 =範圍第3、7、8或"中所述之非氛電解金電鍍如液申;在 洛液的pH值為2〜6、液溫為4〇〜7〇〇c、電流密度為 〇· 1〜3.0A/dm2之條件下進行電解電鍍。’ lj· 一種非氰電解金電鍍方法,該方法係使用如申請 辄圍第10項中所述之非氰電解金電錄液,在溶液的Μ 值為2〜6、液溫為40〜7(TC、電流密度為〇1 件下進行電解電鍍。 lUA/dm之條 1 6 · —種非鼠電解金電縫方法,辞士 專利範圍第11項中所述之非氰電解金電/糸使用如申請 ^ ^ „ , ^40^70 ί ο Γ:3 ot;: 件下進行電解電鍍。 · 〇A/dm之條 1 7· —種非氰電解金電鍍方法,該方 專利範圍第1 2項中所述之非氰電解金雷輪糸使用如申請 虱冤解金電鍍竦,在溶液的pH505708 _ Case No. 881Π5M Amendment 6 The scope of application for patents is from 0.05M to 5.0M. The plating solution is specially described in the non-cyano electrolytic gold electro-acid ionization described in item 10 of the 'Patent Patent Wai' :::: 21 05Μ〜5. 0Μ。 Sulfate ions, hydrochloric acid ions, and nitrate I ions can be supplied in one or two of the compound is 0.05M ~ 5. 0M. For the above components, and / or the total mole concentration is a patented non-gold plating method, which uses a gold plating solution as described in item 5 or 6 of the application, the solution is 2 to 7, the liquid temperature is 40, and the flow is 0. Under the conditions of electrolytic plating. 14. · A non-cyanide electrolytic gold electroplating method, the method = the non-ambient electrolytic gold electroplating as described in the range 3, 7, 8 or "; the pH of the Luo solution is 2 ~ 6, the liquid temperature is The electrolytic plating was performed under conditions of 40 to 700 c and a current density of 0.1 to 3.0 A / dm 2. 'lj · A non-cyanide electrolytic gold electroplating method, which uses the non-cyanide electrolytic gold recording solution as described in item 10 of the application, where the M value of the solution is 2 ~ 6, and the liquid temperature is 40 ~ 7 (TC, current density is 0, 1 pieces for electrolytic plating. LUA / dm Article 16 ·-a non-rat electrolytic gold electric seam method, the non-cyanide electrolytic gold electricity / 所述 described in item 11 of the patent scope Use as application ^ ^ „, ^ 40 ^ 70 Γ: 3 ot ;: electrolytic plating under conditions. · 〇A / dm Article 1 7 ·-a non-cyanide electrolytic gold plating method, the party's patent scope is the first The non-cyanide electrolytic gold thunder wheel described in item 2 uses the same as the application of lice solution gold plating 竦, in the pH of the solution 505708 _案號88117558_年月曰 修正_ 六、申請專利範圍 值為2〜6、液溫為40〜70°C、電流密度為〇·:!〜3.0A/dm2之條 件下進行電解電鍍。505708 _Case No. 88117558_ Years and Months Revision_ VI. The scope of the patent application is 2 ~ 6, the liquid temperature is 40 ~ 70 ° C, and the current density is 0:! ~ 3.0A / dm2. 2169-2793-PFl.ptc 第25頁2169-2793-PFl.ptc Page 25
TW88117558A 1998-04-15 1999-10-12 Gold plating solution and plating method using the same TW505708B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108441901A (en) * 2018-04-18 2018-08-24 中国工程物理研究院激光聚变研究中心 A kind of gold-plating solution of no cyanogen organic solvent

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108441901A (en) * 2018-04-18 2018-08-24 中国工程物理研究院激光聚变研究中心 A kind of gold-plating solution of no cyanogen organic solvent

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