TW495700B - Method to integrate the measured data in the statistical process control system - Google Patents

Method to integrate the measured data in the statistical process control system Download PDF

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Publication number
TW495700B
TW495700B TW89101248A TW89101248A TW495700B TW 495700 B TW495700 B TW 495700B TW 89101248 A TW89101248 A TW 89101248A TW 89101248 A TW89101248 A TW 89101248A TW 495700 B TW495700 B TW 495700B
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Taiwan
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data
scope
measurement
patent application
control
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TW89101248A
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Chinese (zh)
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Jau-Yu Jan
Yau-Lung Tzeng
Chi-Hung Lin
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United Microelectronics Corp
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Abstract

A method to integrate the measured data in the statistical process control system is disclosed, which is used to improve the display mode of the control system, so that the replacing frequency of the control map can be reduced to improve the integration of data information. The measured data information is normalized by formula computation. After appropriate normalization of data, plural production information can be integrated together in a single control map. If the production information which needs to be controlled in separated maps can be displayed together, the number of control maps can be greatly reduced, and the control system can obtain the uninterrupted information message according to the production sequence for controlling the process continuously. Thus, the process records are not separated and are more complete. In addition, the continuous information display will make the online detection and control more efficient. Furthermore, the control method can integrate the measured information of different processes, plural batches and various products together, so as to simplify the map handling procedure effectively.

Description

495700 五、發明說明α) 5-1發明領域 本Is明係有關於一種運用於統計程序控制( p:ocess controlj SPC) 数豫吊恶化,並加以整合的方法。 5 -2發明背景· 良率要 用、生 則是製 求最適 量測在 要的地 這些量 。然而 的處理 會令管 示的方 配備有好 集、再加 或缺的項 故能提高 狀態的訊 程間操作 其尺度的 致使製程 此外,更 率不佳。 有效的管 的管制 上生產 目。製 生產良 息,故 範圍及 大小可 及批次 換圖示 因此, 制製程 產品的 制方法的運 條件的比對 正製種以尋 主要變數的 中佔有其重 差異,目< 格的管制= 制圖 、只,且圖務 測的中%還 簡化數棣顯 高,製程需 產資料的收 程管制不可 化的功用, 於提供製程 位。由於製 測的數據依 分散的圖示 亦嫌繁瑣。 制程序的效 式,當可更 系統。而管 資料與管制 程管制有修 率。而製程 在製程管制 批次規格的 納入不同規 g己錄無法連 間,製程偵 若能發展出 數據顯 次或多步驄 隨著製程步 不合處均需 示的簡化可應用在積體電路製程,尤其是多批 的積ϋ電路生產。由於此類電路之生產成本是 驟執行的數s而累積,任何製程的變異及規袼 及時偵測,以避免後續製程的消耗。此外,製495700 V. Description of the invention α) 5-1 Field of the invention The present invention relates to a method for applying statistical program control (p: ocess controlj SPC) data to deteriorate and integrate it. 5-2 Background of the Invention · Yield is used, and production is the best way to measure these quantities. However, the processing will make the management party equipped with good sets, additions or missing items, so it can improve the state of the inter-procedure operation. Its scale leads to the process. In addition, the rate is not good. Effective regulatory control on production projects. The production yield is good, so the scope and size can be changed to the batch change diagram. Therefore, the comparison of the operating conditions of the manufacturing method of the manufacturing process product and the main variety of the main product are the major differences. The purpose of the control is = Drawing, only, and the middle% of the graphic measurement also simplified the number significantly higher, the function of the process control of the production of production data can not be used to provide a process bit. Because the measured data are scattered according to the diagram, it is too cumbersome. The effectiveness of control procedures should be more systematic. And the management of information and control process has a fixed rate. The manufacturing process cannot be linked when different batch specifications are included in the process control batch specification. If the process detection can develop data display times or multiple steps, the simplification of the instructions required as the process steps are not suitable can be applied to the integrated circuit manufacturing process. , Especially the production of multiple batches of integrated circuits. Since the production cost of such circuits is accumulated by the number of executions, any process variations and regulations are detected in time to avoid the consumption of subsequent processes. In addition, the system

第4頁 495700Page 4 495700

程或批次間,更換 現管制系統的偏移 性仍有待改進。有 序控制系統内整合 連續性,以改善管 果0 記錄顯示的次數若 ,進而誤導偵測程 鑑於此,本發明提 i測數據的方法, 制系統的穩定度, 過於頻繁,則較易出 序’故數據顯示的特 出一種可以在統計程 期能增進資料顯示的 並達到及時偵測的效 3發明目的及概述: 鑒於上述 的諸多缺點, 圖的更換頻率 明將製程數據 (製 其中規格標的 方式’各種尺 上述公式,在 袼標的,而計 異,以原點為 )而上下偏移< 制,本實施例 言是為數值1 < 之發明背景中,傳 本發明提出一種改 ,並增進數據的整 用下述公式加以常 程數據-規格標的 及規格範圍均為特 度的量測值就可整 常態化後,管制圖 鼻後的數據則根據 準,依比例(上述 且有別於傳統SPC 的管制限制已經常 統的資料顯示模式 善的方法,用以減 合。在一實施例中 態化: )/ (規格範圍) 定值。利用數值常 合在同一管制圖上 的原點即成為各規 其量測值與規格標 差異值與規格範圍 官制圖具有不同的 態化,而其絕對值 所產生 少管制 ,本發 態化的 。根據 格的規 的的差 的比例 管制限 一般而The deviation of the existing control system between processes or batches still needs to be improved. Continuity is integrated in the orderly control system to improve the number of records displayed in the tube 0, and thus mislead the detection process. In view of this, the method for measuring data provided by the present invention, the stability of the system is too frequent, it is easier to produce Therefore, the data display has a special feature that can improve the data display during the statistical process and achieve the effect of timely detection. 3 The purpose and summary of the invention: In view of the above-mentioned many shortcomings, the replacement frequency of the map clearly shows the process data (manufacturing specifications The above formulas of various scales are based on the above formulas, and they are calculated differently based on the origin, and are shifted up and down. The embodiment is a background of the invention with a value of 1 < , And to improve the integration of the data, use the following formula to add regular data-the specifications of the target and the range of the measurement can be normalized after the measurement, the data after the control nose is based on the standard, according to the proportion (the above and Different from the traditional SPC, the control restriction has been a unified method of data display mode, which is used for subtraction. In one embodiment, it is normalized:) / (specification range) fixed value. The use of the value often coincides with the origin on the same control chart, which becomes the difference between the measured value and the specification standard value and the specification range. The official drawing has different states, and the absolute value is less regulated. . Proportion of difference according to rules

495700 五、發明說明(3) 本發明的另一實施例,則為次 簡化之公式來改進數據顯示: 供—種更加 士 (裝程數據—規格標的) 此卞I制圖的原點仍為各規格的規格標的,&― 下偏移。由於以目前的技術而言,次微米製程各招::上 能以同圖在合理的範 二:=就 行一圖偵測之功。 u此以間化公式即可 根據本,明,原先需分圖管制的生產資料如今可合併 產順序::官!!圖的數量大量減低’且控制系統便能依生 。如ίit 資料訊息,卩對程序作連續性的控制 來,製私的紀錄不但不致分散各ϋ,@ JL # ¥ m ,示將使線上之偵測管制更具效率。再則而 ^可3不同程序、多數批次及各種產品的量測資料整合 來’有效地簡化圖務處理的程序。 5 一 4圖式簡單說明·· 而揭示 本發明的内容可經由下述實施例與其相關圖示的闡述495700 V. Description of the invention (3) In another embodiment of the present invention, the data display is improved by a simplified formula: supply—kind of improvement (installation data—specification target) The origin of this drawing is still The specifications of each specification are marked with & ― Offset. As far as the current technology is concerned, each method of the sub-micron manufacturing process can be used to achieve the same picture in a reasonable range. u This can be based on the formula of intermediary. According to the book, it is clear that the production materials that previously needed to be controlled by separate maps can now be combined. Production order :: official! The number of maps has been greatly reduced 'and the control system can be regenerated. For example, it ’s data information and continuous control of the process. Not only does the private record not be scattered, @ JL # ¥ m indicates that the online detection and control will be more efficient. Furthermore, the measurement data of different programs, most batches, and various products can be integrated to effectively simplify the process of graphic processing. 5 1 4 Schematic illustrations ... and reveal the content of the present invention can be explained through the following embodiments and related diagrams

Figure

所形成的管圖制〜不根據本發明-實施例’常態化第三A 第四A圖顯示一傳其 作微距]匕多晶層 用^,其連續紀錄多晶層之製 宁列用一種步進機生產所得。 第四B圖顯示根據 ’所形 形成的管制hi。 S月另一實施例,常態化第四Λ圖 第五圖顯示本發明整合量測數據之流程 主要部分之代表符號: 1 0數據收集 20數據收集 3 0裝置控制The formed tube pattern is not in accordance with the present invention-Example 'normalization of the third A, the fourth A shows a pass that is used as a macro] for polycrystalline layers, and its continuous recording of polycrystalline layers Production of a stepper. The fourth panel B shows the control hi formed according to ′. Another embodiment of the month, the fourth figure is normalized. The fifth figure shows the process of integrating measurement data according to the present invention. The representative symbols of the main part are: 1 0 data collection 20 data collection 3 0 device control

4 0 流程控制 5 0流程控制 6 0數據處理 7 0數據儲存 8 0統計程序控制 9 0 網路連結 82製程數據 84管制條件 86選擇合用的管制圖 88數據常態化、劁 — 9 2管制規則 衣作管制圖並計算必要之統計值 94篩選不符管制規則者 96發出異常通知 3〇1儲存規格標的 302收集參數量測數據 3 〇 3 #恶化參數量測數據 3〇4製程偵測 5 - 5發明祥細說明: 本發明可應用在多批次或多步驟之積體電路製作程序 ’此類製程之統計程序控制(SPC )尤需有效的線上量測和 簡化之顯示偵測。4 0 process control 5 0 process control 6 0 data processing 7 0 data storage 8 0 statistical program control 9 0 network connection 82 process data 84 control conditions 86 selection of shared control diagram 88 data normalization, 劁 — 9 2 regulatory rules Make a control map and calculate the necessary statistical values. 94 Screeners who do not comply with the control rules. 96 Send an abnormal notification. 3 Store the target of the specification. 302 Collect the parameter measurement data. 3 〇 3 # Deterioration parameter measurement data. 3 4 Process detection 5-5 Invention Detailed description: The present invention can be applied to a multi-batch or multi-step integrated circuit production program. The statistical program control (SPC) of this type of process requires particularly effective online measurement and simplified display detection.

495700 五 、發明說明(6) 接徂β &圖係為一常用之數據接收之流程架構,此架構可 數;^i耘序控制系統所需之數據資料。生產線上的製程 ^ 由收集裝置(例如方格1 0及方格20 )匯集,各收 ^ ^ ^ =連接數個生產機台。這些收集之數據資料再經由 於網路90的裝置控制系、统(方格3〇)、流程管制單位 資斜#4()及方格50 )和數據處理系統(方袼6G )進行 (二;2日卞,數據處理系統並向網路90上的數據銀行 含有2旦、、目,丨叙Ϊ事先儲存的規格數據。此規格數據最好包 規#Iί ^ π虞所屬的規格標的及至少一種規袼範圍,而 : = 限及規格下限。規袼範圍乃為 限減去規林ϋ ^ 可經由計算而得,像是規格上 限的:、或是規格上下 路9°傳送购服器(方_),以ϊ=ί:;ΞΓ S^c飼服器提供偵測數據資料的功能,以因岸 私弟一圖即顯示本發明之SPC流 :申衣 84 ),選擇出適用的管制圖(方格86 )。 二(方格 ,度的尺寸而分類。而尺度的差異在本發明程 :化的方式及圖務處理的需要。下述 :二:據常495700 V. Description of the invention (6) The connection β & diagram is a commonly used data receiving process architecture, and this architecture can be counted; ^ i data sequence required by the control system. Processes on the production line ^ are collected by collection devices (for example, box 10 and box 20), each receiving ^ ^ ^ = connecting several production machines. These collected data are then transmitted through the device control system, system (box 30), process control unit Zishang # 4 () and box 50) and data processing system (box 6G) on the network 90 (II) On the 2nd, the data processing system and the data bank on the network 90 contain the specification data stored in advance. The specification data should preferably include the specifications of # Iί ^ π At least one regulatory range, and: = limit and lower specification limit. The regulatory range is the limit minus the regulatory limit. ^ It can be calculated, such as the upper limit of the specification: or 9 ° up and down the server. (方 _), with ϊ = ί :; ΞΓ S ^ c Feeder provides the function of detecting data and data, a picture of the private bank of the shore shows the SPC flow of the present invention: Shen Yi 84), select the applicable Control chart (box 86). Two (squares, degrees, and sizes are classified. The difference in scale is in the process of the present invention: the way of transformation and the need for graphic processing. The following: two: as usual

為兩類,次微米製程多以其中-種管制圖顯^官制圖分 大尺度的數據則選用另-種管制圖(此類為通用Ξ其:J 第9頁 五、發明說明(7) 米也可選用此類管制一 度範圍的管制圖,在】務:)。然,傳統spc卻需要多種尺 闻将上要比本發明複雜了許多。 選擇好管制圖德,旦、3丨^ Λ 以常態化,常態化的數;=據5經-道計算程序而加 制必要的統計值。此數攄$ :入官制圖令,進而計算管 統計值的計算係執行於:制圖的數據輸入和 9”對製程數據進行管:、88 :J下來以管制規則(方袼 94 ),並發$ ^再師、不符管制規則者(方袼 七出衣轾異常通知(方格96 )。 態化 在一貫施例中,本發明將製程數據用下述公式加以常 直中相执^衣耘數據''規格標的)/ (規格範圍)(1 ) 規格範圍均為特定值。以-種爐管生產厚 lofl5 15〇〇± 150 ' 3000 1 300 ^ 4000 , 400 為其生產二及⑽00, 5〇°微求等規格。第三A圖顯示的即 範ΐ的差里、ft Γ連Ϊ貧料。⑯圖中可以察覺到,由於規格 I無法以此圖對製程做連續管制,若以 == 執,。,用數值常態化的= 0二篦_ A岡/尤可整合官制在同一管制圖上,第三B圖就 的結果。根據公式(1),在常態化後 二二A :點即成為各規格的規格標的,而計算後的數 據貝]根據其置測值與規格標的的差異,以原點為準,依比 第10頁 五'發明說明(8) 例(上述差異值與規格範圍的比 於傳統SPC管制圖具有不同的管=上下偏移。且有別 限制已經常態化,而其絕對 2制,本實施例的管制 力又而言是為數值1。 但若以次微米尺度量測製程, ,為次微米製程提供一種更符 〔明提出另一實施例 示: 間化之公式來改進其數據顯 (製程數據-規袼標的)( 以一種步進機生產多晶層微距的規 0.01、0.28 ± 0.03、〇.29± 〇〇25例’其計有0.26 士 0.03、0.37± 0.025、〇.38± 〇 〇3 . 土 0.01、0.365士 格。第四Abiis-aa 一 · 及〇·42±0·〇25微米等規 f四Α圖顯不的即為其生產奸卞4規 :以察覺到,要以此圖對製程做連續斗。從圖中 整合數據於同圖管制,可採 、s 1疋不可能的。要 四A圖常態化的結果。 )’弟四B圖就是將第 規格標的,而計算後的數據原點仍為各規格的 差異,以原點為準而根;其量測值與規格標的的 次微米製程各規柊n 由於以目前的技術而言, 各規格的管制限制士 八八極為有限,所以 审〗也就犯以同圖在合採沾益 ,因此以簡化公合gp可> ^ ^ 里的靶圍内明白顯示 A式即可行一圖偵測之功。 規格S認ΪΪΪί的形式概述本發明之數據整合,其中 連結於生產機台心:以銀::(方格3°"。然後運用 叼s利電細,糟由網路的傳送,收集參數 五、發明說明(9) ,測數據(方格302 ) 量測數據(方格303 ) 之與製程管制限制比 。而利用上述實施例 料合併顯示,而使管 便可依生產順序取得 性的控制。如此一來 且持續的資料顯示將 本管制方法可將不同 料整合起來,有效地 。其次藉由數值谨皙 。之後,谓測該ΐ::常態化該參數 本:::原統:以制(方_) 制囝的叙旦先而刀圖管制的生產資 不;斷:大量減低。此時控制系統 、貝料訊息,以對程序作連續 佶J程的紀錄不但不致分散各圖,而 f線上之偵測管制更具效率。再則, ^序夕數批次及各種產品的量測資 間化圖務處理的程序。 定本發明:f::3 =之較佳實施例而6,並非用以限 姓4 ΠΓ 明專利圍,凡其它未脫離本發明所揭示之 G範圍ί。^效改變或修飾,均應包含在下述之申請There are two types of sub-micron processes. Most of the sub-micron processes use one type of control chart to display the large-scale data. Another type of control chart is used (this type is general, and its: J page 9 V. Invention description (7) m You can also choose to use a control map of this kind of control once in the business :). However, the traditional spc requires a variety of features, which is much more complicated than the present invention. Select the control graph, once, 3, ^^ Λ to normalize, normalize the number; = according to the 5 Jing-Dao calculation procedures and add the necessary statistical values. This number: $: Enter the official drawing order, and then calculate the statistical value of the tube. The calculation is performed on: the data input of the drawing and 9 "to manage the process data: 88: J down to control rules (Fang 袼 94), concurrent $ ^ Re-teachers, those who do not comply with the control rules (Fang Yiqi, Yi Qi, abnormal notification (box 96). In a consistent embodiment, the present invention uses the following formula to add straightness and consistency to each other ^ Yi Yun Data `` Specification target) / (Specification range) (1) The specification ranges are all specific values. The thickness of the furnace tube is to produce lofl5 150,000 ± 150 '3000 1 300 ^ 4000, 400 for its production and ⑽00, 5 〇 ° micro-equivalent specifications. The third graph shown in Figure A is the difference between the range of ft, ft Γ and even the poor material. It can be observed in the graph that due to the specification I, the process cannot be continuously controlled by this graph. = ,,., Normalized with numerical values = 0 篦 A A Gang / You can integrate the official system on the same control chart, the result of the third chart B. According to formula (1), after the normalization, two two A: The point becomes the specification target of each specification, and the calculated data] According to the difference between the measured value and the specification target, the origin is taken as the (8) Example (The difference value and the range of specifications are different from the traditional SPC control chart with different tubes = up and down shifts. And different restrictions have been regularized, and its absolute 2 The control force of this embodiment is a value of 1. However, if the process is measured at the sub-micron scale, it will provide a more consistent method for the sub-micron process. [Another embodiment is explicitly proposed to improve the Data display (manufacturing data-specification) (using a stepper to produce polycrystalline layer macros 0.01, 0.28 ± 0.03, 0.29 ± 〇025 cases' 0.26 ± 0.03, 0.37 ± 0.025, 〇.38 ± 〇〇3. Soil 0.01, 0.365 sigma. The fourth Abiis-aa one and 0.42 ± 0. 25 micron isotactic f. The four A diagrams are not produced. I noticed that we need to make continuous battles on the process with this diagram. Integrating data from the diagram into the same diagram control can be adopted, s 1 疋 impossible. The result of normalization of diagram A is required. The standard specification is marked, and the calculated data origin is still the difference between the specifications, which is based on the origin; its measured value The specifications of the sub-micron process of the specification target. As the current technology, the regulatory restrictions on each specification are extremely limited, so the trial will be committed to the same plan in the joint mining, so to simplify the public contract gp It is possible to clearly display the A type in the target range in ^ ^ to perform the function of one picture detection. The form of the specification S recognizes the outline of the data integration of the present invention, which is linked to the core of the production machine: with silver :: (square Grid 3 ° ". Then use 叼 s to save electricity and collect the parameters from the Internet. Collect parameters 5. Invention description (9), measurement data (box 302), measurement data (box 303), and process Regulatory limit ratio. By using the above-mentioned embodiment, the materials are combined and displayed, so that the tubes can be controlled in accordance with the production order. In this way, continuous data show that this control method can integrate different materials effectively. Secondly, the value is fair. After that, it is said that this parameter is normalized. This parameter ::: Original system: The production of capital controlled by the system (Square_) is first; the production capital is controlled by a knife. At this time, the control system and the material information are used to continuously record the program. The J-process records not only do not distract the maps, but the detection and control on the f-line is more efficient. Furthermore, the procedures for the batch processing of various batches and various products for measurement and intermediation. Defining the present invention: f :: 3 = the preferred embodiment and 6 is not intended to limit the surname 4 ΠΓ patent patent, and all other without departing from the scope of G disclosed in the present invention. ^ Effective changes or modifications should be included in the application below

Claims (1)

495700 六、申請專利範圍 l -種整合製測數據的於一數據銀行中儲存一法,至少包含: 運用至少一個連結於—生::的’· 路的傳送’收集參數量測數J.機台的管制電藉由數值運算,當熊仆J, _該常態化之數;數量測數據;以及 以執行統計程序控制。 :之與製程管制限制 腦 藉由網 比對, 2·如申請專利範圍第1項之方法# , ΐ包含將該參數量測數據減去該規;夂“述:態化數值運 範圍。 π成現格的、再除w 規格 3·如申請專利範圍第1項之方法, μ 算包含將該參數量㈣據減㈣規格標的化數值運 4.如申請專利範圍第丄項之方法,更包含一 因應該常態化數據不符該製程管制限制。一 ’、 5·如申請專利範圍第i項之方法,豆 對值包含數值1。 ,、中上11 &制限制的絕 統,以 請專利範圍第1項之方法,其中上述規格範 特疋值。 園係495700 VI. Application for Patent Scope l-A method of storing and storing data in a data bank that integrates measurement data, including at least: using at least one link to the ": road transmission" to collect parameter measurements. J. machine The control of the station is performed by numerical calculation, when the bear servant J, the normalized number; the quantitative measurement data; and the execution of statistical program control. : Compared with process control to limit the brain comparison through the network, 2 · If the method of applying for the scope of the first item of the patent #, ΐ contains the parameter measurement data minus the specification; 述 ": Stated numerical value operation range. Π Realized, and then divide the w specifications 3. If the method of the scope of patent application 1 item, μ calculation includes the value of the parameter reduced by the standard value of the specification target 4. If the method of scope of the patent application method, more Contains a reason that the normalized data does not comply with the process control limit. A ', 5. If the method of the patent application scope item i, the value of the bean pair contains the value 1. The middle and upper 11 & The method of item 1 of the patent scope, in which the above-mentioned specifications have a special value. 第13頁 495700 六、申請專利範圍 7 ·如申請專利範圍第1項之方诗 及/規格下限於該數據銀行。 8 ·如申請專利範圍第7頊之方9 長該規格標的以得到一上限範H 規格下限以得到一下限範圍。 9 ·如申請專利範圍第8項之方h 據大於該規格標的時,該規格聋 I 0 ·如申請專利範圍第8項之方s 據小於該規格標的時,該規袼章 II ·如申請專利範圍第8項之方9 於該上限範圍與該下限範圍的今 1 2·如申請專利範圍第丨項之方注 對多數個製程的量測。 ' 1 3·如申請專利範圍第丨項之方 對多數個批次的量测。 1 4·如申請專利範圍第J項之方 對多數個產品的量測。 ' 更包含儲存一規格上限 ,更包含將該規格上限減 ,及將該規袼標的減去該 ’當其中上述參數量測數 圍即相當於該上限範園。 ’當其中上述參數量剛數 圍即相當於該下限範園。 ’其中上述規袼範圍相卷 均值。 田 ’其中上述製程量测包含 ’其中上述製程量測包含 ’其中上述製程量測包含 ^ /uuPage 13 495700 VI. Scope of patent application 7 · If the Fang Shi and / or specifications of the first scope of patent application are limited to the data bank. 8 · If you apply for the 7th square of the scope of the patent application, 9 long the standard object to get an upper limit range H specification lower limit to get the lower limit range. 9 · If the party h in the scope of patent application for item 8 is larger than the specification target, the specification is deaf I 0 · If the party in the scope of patent application for item 8 is smaller than the specification target, the regulation II · if applying Item 8 of the patent range 9 In this upper limit range and the lower limit range 1 2. If the application of the patent range item 丨, note the measurement of most processes. '1 3 · If the number of patent application scope item 丨 measurement for a lot of batches. 1 4 · If you apply for item J in the scope of the patent, measure the number of products. 'It also includes storing an upper specification limit, and further including subtracting the upper limit of the specification, and subtracting the upper limit from the specification target', where the above-mentioned parameter measurement range is equivalent to the upper limit range. ′ When the above parameter quantity range is equivalent to the lower limit range. 'Wherein the above-mentioned regulation ranges are relative averages. Tian ‘where the above-mentioned process measurement includes‘ where the above-mentioned process measurement includes ‘where the above-mentioned process measurement includes ^ / uu 法,s種整合至少一個積體電路製程之製0 B 至少包含: I較I測數據的方 行中儲存各製程之規格標的; 路的傳逆〆一個連結於一生產機台的管制電# ,迗,收集參數量測數據; 電驷,猎由網 將該上:二::丄常態化該參數量測數據該數值 以及數里顯減去該規格標的、再除以一 係 以#偵測該常態化之數據’並將之盥製程这# u執行統計程序控制。 、#吕制限制比對, 上述規袼範圍係 1 -6特;:請專利範圍第15項之方法’其中 其中上述製程量測包 其中上述製程量測包 17.如申請專利範圍第15項之方法, 含對多數個批次的量測。 18·如申請專利範圍第1 5項之方法, 含對多數個產品的量須|J。 19· 法 一種整合至少 至少包含: 一個積體電路製程之製程量測數據的方 於一數據銀行中儲存各製程之規格標的;A method that integrates at least one integrated circuit manufacturing process 0 B includes at least: the comparison of the measurement specifications of each process is stored in the test line; the transmission of the road is a control circuit connected to a production machine # , 迗, collect parameter measurement data; electric 驷, hunting and netting the above: two :: 丄 normalize the parameter measurement data and the numerical display minus the specification target, and then divide by a series with #detect Measure the normalized data and perform the statistical program control. , # Lu system limit comparison, the above regulation range is 1 -6 special ;: the method of the patent scope item 15 'wherein the above-mentioned process measurement package among which the above-mentioned process measurement package 17. If the scope of patent application item 15 The method includes measurement of a plurality of batches. 18 · If the method of item 15 of the scope of patent application includes the quantity for most products, | J. 19 · Method A method of integrating at least at least: a process measurement data of an integrated circuit process to store the specifications of each process in a data bank; 六、申請專利範圍 路的產機台的管制電腦,藉由網 藉由數值運算,營能# % #窃 係 將該參數量洌數攄1 夏測數據該數值運算 乂默里州數據減去該規格標的; 偵測該常態化之數據,並將之 以執行統計程序控制。 /、i %官制限制比對 述規格範圍係 述製程量測包 2〇·如申請專利範圍第19項之方法,复 一特定值。 /、T上 21·如申請專利範圍第][9項之方法,i 含對多數個批次的量測。 /、 2 2 ·如申凊專利範圍第1 9 之 , 含對多數個產品的量測。、 八中上述製程量測包 23. 種系統,係用以整合至少 /、、、、ϋ Ί尔Μ堂兮主少-—個拉Λ 量測數據’㈣統至少包含: 固積體電路製程之製程 一數據接收裝置,用以收集、押 電路機台之製程數據,該數據接收裝置連;m積體 及 i逆結於一網路,·以 一連結於該網路之製程管制伺服器, 狄 器針對該數據接收裝置所接收之製程數二二,官制伺服 控制,該製程管制伺服器至少包含: 、執行統計程序 第16頁 495700 六、申請專利範圍 一運算裝置,用以常態化該製程數據;以及 一顯示裝置,用以顯示該常態化之數據及至少一 個規格範圍,以為製程偵測之用。 24. 如申請專利範圍第23項之系統,其中上述網路與生產 資訊系統相連結。 25. 如申請專利範圍第23項之系統,其中上述製程數據常 態化係將該製程數據減去一第一規格標的、再除以一規格 範圍而得。 26. 如申請專利範圍第23項之系統,其中上述製程數據常 態化係將該製程數據減去一第二規格標的而得。 27. 如申請專利範圍第23項之系統,其中上述規格範圍係 為一特定值。 28. 如申請專利範圍第23項之系統,其中上述製程包含多 數個批次的製程。 29. 如申請專利範圍第23項之系統,其中上述製程包含多 數個產品的製程。6. The control computer of the patent application scope of the production machine, through the network through numerical calculation, Yingneng #% # The system is the number of the parameter 洌 1 summer test data, the numerical calculation 乂 Murray state data minus The target of the specification; Detect the normalized data and control it by performing statistical procedures. /, I% official system limit comparison The specification range is the process measurement package 20. If the method in the 19th scope of the patent application is applied, a specific value is repeated. /, T 21 · If the method of the scope of the patent application] [9], i includes the measurement of a plurality of batches. /, 2 2 · As applied for in Patent Application No. 19, it includes the measurement of most products. 23. The above-mentioned process measurement package 23. The system is used to integrate at least / ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, and ability, and the data from, the measurement systems from the Λ system, at least: A process-data receiving device is used to collect and stake the process data of the circuit machine. The data-receiving device is connected to; m product and i are inversely connected to a network, and a process control server connected to the network. According to the number of manufacturing processes received by the device for the data receiving device, the official server is controlled by the servo control system. The process control server includes at least: Execute statistical procedures, page 16, 495700. 6. A patent application scope, a computing device to normalize the processing device. Process data; and a display device for displaying the normalized data and at least one specification range for process detection. 24. If the system of the scope of patent application is No. 23, the above network is connected to the production information system. 25. If the system of claim 23 is applied for, the normalization of the process data is obtained by subtracting a first specification target from the process data and dividing it by a specification range. 26. If the system of claim 23 is applied for, the process data normalization is obtained by subtracting a second specification from the process data. 27. If the system of the scope of patent application No. 23, wherein the above specification range is a specific value. 28. If the system of claim 23 is applied for, the above-mentioned process includes a plurality of batches of processes. 29. The system of claim 23, wherein the above-mentioned manufacturing process includes the manufacturing process of a plurality of products.
TW89101248A 2000-01-26 2000-01-26 Method to integrate the measured data in the statistical process control system TW495700B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7957821B2 (en) 2004-11-17 2011-06-07 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for statistical process control

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7957821B2 (en) 2004-11-17 2011-06-07 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for statistical process control

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