TW494564B - Electrostatic discharge protection circuit - Google Patents
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4^4^04 五、發明說明(1) ---------- 本發明係有關於一種靜電放電保護電路,詳而說明之 糸關於-種在3伏特/耐受5伏特的輸出/入電路中,將摻雜 里雜質之靜電放電箝制元件設置於電源線以及接地線之 間的靜電放電保護電路。 ^ 靜電放電(Electr〇static Discharge,以下以ESD 簡 係普遍存在於積體電路之量測、組裝、安裝及使用過 程中j其可能造成積體電路的損壞,並間接影響電子系統 的功能。然而’形成ESD應力的原因,最常見的是下列三 種椒型*(1)人體放電模式(human b〇dy model):美軍軍 事標準883 號方法30 15· 6(MIL-STD-883, Method 3015· 6)所繼 界定之模型,其代表人體所帶靜電碰觸積體電路的接腳時 所ie成之ESD應力。(2)機器模式(machine model) ··機器 所帶靜電碰觸積體電路接腳時所造成之ESD應力,以現有 工業標準EIAJ-IC-121 method 20所界定之量測方法。(3) 電荷元件模式(charge device model):原已帶有電荷的 積體電路在隨後的過程中,接觸接地導電物質,因此對積 體電路形成一ESD脈衝路徑。 一般提及的ESD防護電路,多數是指用來防護人體放 電模式(human body mode,HBM)或是機器放電模式 (machine mode,MM)的靜電放電。基本上,此類或MM _ 的靜電放電,其靜電放電的電荷是來自於積體電路 (integrated circuit,1C)的外界,經由ic的某個腳位 (p i η)進入IC内,然後經由另一個腳位流出I c。為了防範 此類E S D對I C所造成的損壞’因此,E S D防護電路在I c佈局4 ^ 4 ^ 04 V. Description of the invention (1) ---------- The present invention relates to an electrostatic discharge protection circuit. The detailed description is about-a kind of 3V / 5V resistant In the input / output circuit, an electrostatic discharge clamping circuit in which an impurity-doped electrostatic discharge clamping element is disposed between a power line and a ground line. ^ Electrostatic Discharge (ESD) is commonly used in the measurement, assembly, installation and use of integrated circuits. It may cause damage to integrated circuits and indirectly affect the function of electronic systems. However, 'The most common reason for the formation of ESD stress is the following three pepper types * (1) Human body model: human military standard model: US Military Standard 883 Method 30 15 · 6 (MIL-STD-883, Method 3015 · 6) The following defined model represents the ESD stress caused by the static electricity of the human body when it contacts the pins of the integrated circuit. (2) machine model ·· The static electricity of the machine contacts the integrated circuit The ESD stress caused by the pin is the measurement method defined by the current industry standard EIAJ-IC-121 method 20. (3) Charge device model: The integrated circuit with the charge has been subsequently In the process of contacting grounded conductive materials, an ESD pulse path is formed on the integrated circuit. Most of the ESD protection circuits mentioned are used to protect human body mode (HBM) or machine discharge mode ( mac Hine mode (MM) electrostatic discharge. Basically, the charge of this type of electrostatic discharge or MM _ comes from the outside of the integrated circuit (1C) and passes through a pin of the IC (pi η) enter the IC and then flow out I c through another pin. In order to prevent damage to the IC caused by this type of ESD ', the ESD protection circuit is laid out in I c
0503-6282TW ; TSMC2001-0088 ; ROBERT.ptd 第 4 頁 494564 五、發明說明(2) ------- 中皆設計於接合墊(b〇nding pad)附近,藉以就近旁通 放ESD電机。參閱第丨圖,第丨圖係顯示傳統之㈣防護電 路,其應用於耐受高電壓的輸出/入電路。如第U所示之 3伏特/耐受5伏特的輸出/入電路,後級輸出緩衝器1〇之 PMOS電晶體Mpl係設置在浮接(fl〇ating)的~型井(未顯 不)中。另外,接合墊1 2於正常操作時所輸出之電壓準位 為0至5V。為了避免接合墊12所輸出的5伏特的電壓對於 級輸出緩衝器10的NM0S之間極產生過高的應力,後級輸出 緩衝器10中的NMOS部分係以NMOS電晶體如^與“”堆疊的 架構而構成。NMOS電晶體Mnla的閘極偏壓在Vdd(3 3v),而 NMOS電晶體Mnlb的閘極受前級輸出緩衝器14的控制。如 此,當外界的信號介於〇至5伏特時,可以保證NM〇s電晶體 M^ila與Mnlb的閘氧化層之跨壓不會轉過3· 3伏特,以避免 咼電應力下所造成的可靠度問題。另外,關qs電晶體 Mnlb之源極係接到輸出入Vss電源線,而電源線ν⑽與接地線0503-6282TW; TSMC2001-0088; ROBERT.ptd page 4 494564 V. Description of the invention (2) ------- All are designed near the bonding pad, so that the ESD power is bypassed nearby. machine. Refer to Figure 丨, which shows a conventional protection circuit for high-voltage output / input circuits. As shown in U-three-volt / 5-volt-proof I / O circuit, the PMOS transistor Mpl of the output buffer 10 is set in a floating-type ~ well (not shown) in. In addition, the level of voltage output by the bonding pad 12 during normal operation is 0 to 5V. In order to prevent the 5 volts output by the bonding pad 12 from generating excessive stress on the NMOS of the stage output buffer 10, the NMOS part in the rear stage output buffer 10 is stacked with NMOS transistors such as ^ and "" Structure. The gate of the NMOS transistor Mnla is biased at Vdd (33V), and the gate of the NMOS transistor Mnlb is controlled by the output buffer 14 of the previous stage. In this way, when the external signal is between 0 and 5 volts, it can be ensured that the cross-over voltage of the gate oxide layers of the NMOS transistor M ^ ila and Mnlb will not be shifted by 3.3 volts to avoid being caused by galvanic stress. Reliability issues. In addition, the source of the Qs transistor Mnlb is connected to the input / output Vss power line, and the power line ν⑽ and the ground line
Vss之間具有電源間ESD箝制元件16,其包含關⑽電晶體心? 以及電阻R。 參閱第2圖,第2圖係顯示第1圖中,後級輸出緩衝器 10以及電源間ESD箝制元件16之剖面圖。為了防護ΗΜΒ/〇 ESD事件可能對I c造成的損傷,所以通常傳統技術在接合_ 塾12附近之NMOS電晶體Mnla之汲極處,摻入p型雜質18, 例如侧(B),藉以降低此處PN接面之崩潰電壓。因此, 當接合塾12突然接收到大量之靜電應力時,NM〇s電晶體 Μη 1 a之〉及極處將會先行崩潰而將靜電放電電流釋放至接地There is an inter-power ESD clamping element 16 between Vss, which contains a transistor core? And resistor R. Referring to Fig. 2, Fig. 2 is a cross-sectional view showing the output buffer 10 of the rear stage and the ESD clamping element 16 between the power sources in the first diagram. In order to protect the damage caused by the IMB / ESD event to Ic, the conventional technique is usually doped with a p-type impurity 18, such as the side (B), at the junction of the NMOS transistor Mnla near __12. The breakdown voltage of the PN junction here. Therefore, when the joint 塾 12 suddenly receives a large amount of electrostatic stress, the NMOS transistor and its pole will collapse in advance and release the electrostatic discharge current to ground.
4^4!)64 五、發明說明(3) ^ 藉以避免内部電路受到靜電應力之傷害,進而造成可 靠度之問題。 一 而’上述傳統技術所使用之方式,會提高NMOS電晶 體Mn la之寄生電容’進而造成後級輸出緩衝器内部電路 之延遲,降低了電路元件之操作效率。 /曰有於此為了解決上述問題,本發明主要目的在於 係提供一種靜電放電保護電路,在3伏特/耐受5伏特的輸 出/、入電路中,將摻雜p型雜質之靜電放電箝制元件設置於 電源線以及接地線之間,使得後級輸出緩衝器丨〇之内部電 路不致因為摻入P型雜質所額外產生之寄生電容效應而導 致電路操作效能之惡化。 響 為獲致上述之目的,本發明提出一種靜電放電保護電 路)適用於耐受高電壓的輸出/入電路之接合墊,包括下 列元件。首先是耦接於接合墊之第一開關,當接合墊之電 壓值達到-既定電位時,則導通並輸出靜電放電電流。耦 接於第-位準之第二開關,具有一控制極。耗接於第二開 關及第二位準之間之第三開關,以及設置於第一位準及第 二位準之間之NMOS電晶體,具有耗接於上述第—位準之汲 極,此沒極係另外摻雜P型雜質,當接收到靜電放電電流 時,則NMOS電晶體汲極處之㈣接面電壓崩潰以釋放靜 # 電電流。 圖式之簡單說明: 為使本發明之上述目的、特徵和優點能更明顯易懂,4 ^ 4!) 64 V. Description of the invention (3) ^ To prevent the internal circuit from being damaged by electrostatic stress, which will cause reliability problems. On the other hand, the “method used in the above-mentioned conventional technology will increase the parasitic capacitance of the NMOS transistor Mn la”, which will cause a delay in the internal circuit of the output buffer of the subsequent stage and reduce the operating efficiency of the circuit elements. In order to solve the above problems, the main purpose of the present invention is to provide an electrostatic discharge protection circuit. In a 3 volt / 5 volt output / input circuit, an electrostatic discharge doped with p-type impurities is clamped to the element. It is arranged between the power supply line and the ground line, so that the internal circuit of the output buffer of the subsequent stage will not cause the circuit operation efficiency to deteriorate due to the parasitic capacitance effect caused by doping the P-type impurity. In order to achieve the above object, the present invention proposes an electrostatic discharge protection circuit) a bonding pad suitable for an output / input circuit withstanding high voltage, including the following components. The first is a first switch coupled to the bonding pad. When the voltage value of the bonding pad reaches a predetermined potential, it turns on and outputs an electrostatic discharge current. The second switch coupled to the first level has a control electrode. A third switch that is consumed between the second switch and the second level, and an NMOS transistor that is disposed between the first and second levels, has a drain that is connected to the first level, This anode is doped with another P-type impurity. When an electrostatic discharge current is received, the junction voltage at the drain of the NMOS transistor collapses to release the static electric current. Brief description of the drawings: In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible,
494564 五、發明說明(4) ^文特舉-較佳實施例,並配合所附圖式,作詳細說明如 圖示說明: 第1圖係顯示傳統之ESD防護電路。 第2圖係顯示第!圖中,後級輸出緩衝器1〇以 ESD箝制元件丨6之剖面圖。 "、曰 第3圖係顯示根據本發明實施例所述之靜電放電保古蔓 電路 第4圖係顯示第3圖中’後級輸出緩衝器2 〇以及電 E S D推制元件2 6之剖面圖。 源間 符號說明: 10、20〜後級輸出緩衝器 1 2 ' 2 2〜接合墊 14、24〜前級輸出緩衝器 16、26〜電源間ESD箝制元件 18、28〜P型雜質 Mpl、Mpll〜PMOS電晶體 Mnla 、Mnlb 、Mn2 、Mnlla494564 V. Description of the invention (4) ^ Special mention of the invention-the preferred embodiment, and in conjunction with the attached drawings, detailed description as illustrated: Figure 1 shows the traditional ESD protection circuit. Figure 2 shows the first! In the figure, the post-stage output buffer 10 is a cross-sectional view of the ESD clamping element 6. ", Fig. 3 is a sectional view showing the electrostatic discharge Baoguman circuit according to the embodiment of the present invention. Fig. 4 is a sectional view showing the "back stage output buffer 2 0" and the electric ESD pushing element 26 in Fig. 3. . Inter-source symbol description: 10, 20 ~ back stage output buffer 1 2 '2 2 ~ bonding pad 14, 24 ~ front stage output buffer 16, 26 ~ power source ESD clamping element 18, 28 ~ P type impurities Mpl, Mpll ~ PMOS transistor Mnla, Mnlb, Mn2, Mnlla
Mnllb、Mnl2 〜NMOS 電晶 體 R〜電阻 VDD〜電源線 Vss〜接地線Mnllb, Mnl2 to NMOS transistor R to resistor VDD to power line Vss to ground
0503-6282TW ; TSMC2001-0088 ; ROBERT.ptd 第 7 頁 494564 五、發明說明(5) " ------1 實施例: 參閱第3圖,第3圖係顯示根據本發明實施例所述之靜 電,電保遵電路’其應用於财受南電壓的輸出/入電路。 如第3圖所示之3伏特/耐受5伏特的輸出/入電路。後級輸 出緩衝器20之PM0S電晶體Mpll設置在浮接(fl〇ating) 型井(未顯示)中。另外,接合墊22於正常操作時所輸 之電壓準位為〇至5V。為了避免接合墊22所輸出的5伏特 =電壓對於後級輸出緩衝器2〇的關⑽電晶體之閘極產生過 同的應力,後級輸出緩衝器2〇中的NM〇s部分係以關⑽電晶 體心113與心1113堆疊的架構而構成。在此,關電晶體 M<nlia的閘極偏壓在Vdd(3.3V),而NM0S電晶體Mnllb的閘極· ,刖級輸出緩衝器24的控制。因此,當輸入接合墊22之信 號介於0至5伏特時,可以保證NM〇s電晶體^丨“與題⑽電 晶體Mnl lb的閘氧化層跨壓不會超過3· 3伏特,以避免高電 壓應力下所造成的可靠度問題。另外,NM〇s電晶體MnUb 之源極係接到接地線vss電源線,而電源線v⑽與接地線L 之間具有電源間ESD箝制元件26,包含NM〇s電晶體心12以 及電阻R。 參閱第4圖,第4圖係顯示第3圖巾,後級輸出緩衝器 20以及電源間ESD箝制元件26之剖面圖。為了防護HMB/MM · ESD事一件可能對I C造成的損害以及考慮後級輸出緩衝器2 〇 内部兀件之操作速度’本發明實施例於電源間ESI)箝制元 件26之NMOS電晶體Mnl2之汲極與p型基底(p —Sub)之接面 下方摻雜P型雜質28 ’例如蝴(B ),藉以降低此處pN接面0503-6282TW; TSMC2001-0088; ROBERT.ptd Page 7 494564 V. Description of the invention (5) " ------ 1 Example: Refer to FIG. 3, which shows a diagram according to an embodiment of the present invention. Regarding the static electricity, the electrical protection compliance circuit is applied to an output / input circuit that is subject to the South voltage. 3 volt / 5 volt tolerant output / input circuit as shown in Figure 3. The PM0S transistor Mpll of the rear output buffer 20 is set in a floating type well (not shown). In addition, the voltage level input by the bonding pad 22 during normal operation is 0 to 5V. In order to avoid that the 5 volts = voltage output by the bonding pad 22 exerts the same stress on the gate of the transistor in the output buffer 20 of the subsequent stage, the NM0s part in the output buffer 20 of the subsequent stage is closed. The triode core 113 and the core 1113 are stacked. Here, the gate of the transistor M < nlia is biased at Vdd (3.3V), and the gate of the NMOS transistor Mnllb is controlled by the high-level output buffer 24. Therefore, when the signal input to the bonding pad 22 is between 0 and 5 volts, it can be ensured that the cross-over voltage of the gate oxide layer of the NM0s transistor and the transistor Mnl lb will not exceed 3.3V, to avoid Reliability problems caused by high voltage stress. In addition, the source of the NMMOS transistor MnUb is connected to the ground line vss the power line, and there is an inter-power ESD clamping element 26 between the power line v⑽ and the ground line L, including NM〇s transistor core 12 and resistor R. Refer to Fig. 4, which is a cross-sectional view of Fig. 3, the output buffer 20 at the rear stage, and the ESD clamping element 26 between the power sources. To protect HMB / MM · ESD One thing that may cause damage to the IC and consider the operating speed of the internal output buffer 2 〇 The internal operating speed of the internal components' in the embodiment of the present invention between the power supply ESI) clamping element 26 NMOS transistor Mnl2 drain and p-type substrate ( p-Sub) junctions are doped with P-type impurities 28 'such as butterfly (B) to reduce the pN junctions here
494564 五、發明說明(6) 之崩潰電壓。因此,當接合墊22突然接收到大量之靜電放 電電流時,此時會有相當高之電壓耦合至PMOS電晶體Mp 11 以及Mpl2之汲極與閘極間之寄生電容,並使得pm〇S電晶體 Mpl 1以及Mpl 2導通。因此,由接合墊22所接收到之大量靜 電放電電流係分別經由PMOS電晶體Mpll以及Mpl2而流至電 源線VDD,並藉由電源線vDD而流至電源間ESD箝制元件26。 如上所述,電源間ESD箝制元件26之NMOS電晶體Mnl2之汲 極與P型基底(P-Sub )之接面下方已摻入P型雜質28,因 此此處之崩潰電壓較低,故NMOS電晶體Μη 1 2之PN接面在承 受ESD應力之條件下,很容易就會電壓崩潰而將靜電放電 電流釋放至接地點,藉以避免内部電路受到靜電應力之傷 害’進而造成可靠度上的問題。 根據本發明實施例,使得3伏特/耐受5伏特的輸出入 電路中,因為於電源線以及接地線之間之靜電放電箝制元 件摻雜Ρ型雜質,能夠有效避免後級輸出緩衝器丨〇之内部 電路不致因為摻入Ρ型雜質所額外產生之寄生電容效應而 導致電路操作效能之惡化,並且能夠有效的將因為人體放 電模式ΗΒΜ或是機器放電模式所產生之靜電放 電路外部,提高了電路之可靠度。 太2 =以較佳實施例揭露如上,然其並非用以限定 ;何熟習此項技藝者’在不脫離本發明之 保護範圍當視後附之申請專利範圍所界定者為準本^月之494564 V. The breakdown voltage of invention description (6). Therefore, when the bonding pad 22 suddenly receives a large amount of electrostatic discharge current, a relatively high voltage will be coupled to the parasitic capacitance between the drain and gate of the PMOS transistors Mp 11 and Mpl2, and make the PMS current The crystals Mpl 1 and Mpl 2 are turned on. Therefore, a large amount of static discharge current received by the bonding pad 22 flows to the power supply line VDD through the PMOS transistors Mpll and Mpl2, respectively, and flows to the ESD clamping device 26 between the power supplies through the power supply line vDD. As described above, P-type impurities 28 have been doped below the junction between the drain of the NMOS transistor Mnl2 of the ESD clamp element 26 between the power sources and the P-substrate (P-Sub), so the breakdown voltage here is lower, so NMOS Under the conditions of ESD stress, the PN junction of the transistor Mη 1 2 can easily collapse the voltage and release the electrostatic discharge current to the ground point, so as to avoid the internal circuit from being damaged by electrostatic stress' and thus cause reliability problems. . According to the embodiment of the present invention, the 3 volt / 5 volt tolerant I / O circuit can effectively avoid the post-stage output buffer because the electrostatic discharge clamping element between the power line and the ground line is doped with P-type impurities. The internal circuit does not cause the circuit operation performance to deteriorate due to the additional parasitic capacitance effect caused by doping P-type impurities, and can effectively externalize the electrostatic discharge circuit generated by the human discharge mode ΗBM or the machine discharge mode, which improves the Reliability of the circuit. Mt 2 = The above is disclosed in the preferred embodiment, but it is not intended to limit it; any person skilled in the art will not depart from the scope of protection of the present invention as defined by the scope of the attached patent application.
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MK4A | Expiration of patent term of an invention patent |