叫0209 A7 一 6 2 3 0 t w f . d 〇 c / 0 0 8_gy_ 五、發明說明（/ ) (請先閱讀背面之注意事項再填寫本頁) 本發明是有關於一種半導體製程設備，（conditioner set)且特別是有關於一種具有多功能（mult i functional) 之調節刷組，此多功能調節刷組可用於化學機械硏磨 (chemical mechanical polishing)機台。 化學機械硏磨法是現在唯一能提供超大型積體電路 (Very-Large Scale Integration ;VLSI)，甚至極大型積 體電路（Ultra-Large Scale Integration ; ULSI)製程，“全 面性平坦化（global planarization)”的一種技術。 經濟部智慧財產局員工消費合作社印製 請同時參照第1A圖與第1B圖，其分別繪示一種習知 化學機械硏磨機台的俯視與側視圖。其中包括：一硏磨台 10(polishing table); —握柄 ll(holder)，用以抓住被 硏磨的晶片12; —硏磨墊13(polishing pad)，舖在硏磨 台10上；一管件14(tube)，用以輸送硏漿15(slurry)到 硏磨墊13上；一液泵16，用以將硏漿15抽送到管件14 中；以及一調節刷（conditioner) 17，用以刮粗硏磨墊13 的表面、去除殘留硏漿或淸潔。當進行化學機械硏磨時， 硏磨台10與握柄11分別沿一定的方向旋轉，如圖中之箭 號18a與18b所示，且握柄11抓住晶片12的背面19，將 晶片12的正面20壓在硏磨墊13上。管件14係將液泵16 所打進來的硏漿15，持續不斷地供應到硏磨墊13上。所 以，化學機械硏磨程序就是當晶片上凸出的部分和硏磨墊 接觸時，利用硏漿15中的化學助劑，在晶片12的正面20 上產生化學反應，再配合晶片12在硏磨墊13上藉由硏漿 15中之硏磨粒（abrasive particles)輔助之機械硏磨，去 3 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐f 480209 A7 B7Called 0209 A7 6 2 3 0 twf. D 〇c / 0 0 8_gy_ 5. Description of the invention (/) (Please read the notes on the back before filling out this page) The present invention is about a semiconductor process equipment, (conditioner set ) And in particular, it relates to a multifunctional adjusting brush set, which can be used in a chemical mechanical polishing machine. The chemical-mechanical honing method is currently the only process that can provide Very-Large Scale Integration (VLSI), or even Ultra-Large Scale Integration (ULSI) processes. "Global planarization ) ". Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Please refer to Figures 1A and 1B, which show the top and side views of a conventional chemical mechanical honing machine, respectively. These include: a honing table 10 (polishing table);-a handle ll (holder) for holding the honing wafer 12;-honing pad 13 (polishing pad), spread on the honing table 10; A tube 14 for conveying slurries 15 to the honing pad 13; a liquid pump 16 for pumping the slurries 15 into the tube 14; and a conditioner 17 for Roughen the surface of the honing pad 13 to remove residual mortar or clean. When performing chemical mechanical honing, the honing table 10 and the handle 11 are respectively rotated in a certain direction, as shown by arrows 18a and 18b in the figure, and the handle 11 grasps the back surface 19 of the wafer 12, and the wafer 12 The front side 20 is pressed against the honing pad 13. The pipe 14 is a mortar 15 driven by the liquid pump 16 and is continuously supplied to the honing pad 13. Therefore, the chemical-mechanical honing process is to use the chemical assistant in the honing slurry 15 to generate a chemical reaction on the front surface 20 of the wafer 12 when the protruding part of the wafer is in contact with the honing pad, and then cooperate with the wafer 12 to honing Pad 13 is mechanically honed with the aid of abrasive particles in mortar 15 to 3 paper sizes. Applicable to China National Standard (CNS) A4 (210 X 297 mm f 480209 A7 B7).
6230twf.d〇c/〇〇Q 五、發明說明（>) =硏磨墊相接觸之凸出部份，反覆上述化學反應與機械 硏磨，即可形成平坦的表面。 、，般硏磨墊上有助傳輸硏漿及硏磨的孔洞，硏磨墊的 表面粗縫有1 2 um的凹凸不平，以龍抓住和傳輸硏 漿，在硏磨幾個晶片後，硏磨墊表面的凹凸不平變平坦， 以放抓硏漿的能力和壓力降低，而使硏磨的速率降低；同 時硏磨墊中的孔洞會被一些硏磨材料（比如硏漿裡的硏磨 顆粒，或是自晶圓中被硏磨掉的物質）塡滿，使得硏磨特 性有所改變，而影響硏磨效果。因此需要以調節刷17來 調節（conditioning)硏磨墊，以恢復凹凸不平的表面及去 掉孔洞間的硏磨材料。通常於每做完一片晶片做調節或是 一面做硏磨一面做調節。 依應用上之不同，硏磨墊有兩種··硬硏磨墊（hard polishing pad)與軟硏磨墊（soft polishing pad)，其中 硬硏磨墊需用鑽石調節刷和耐龍（nyl〇n)調節刷，因硬硏 磨墊較硬，配合調節刷管路提供之去離子水，鑽石調節刷 調節恢復表面的凹凸不平；配合調節刷管路提供之去離子 水或化學藥劑，耐龍調節刷用以去掉孔洞間的硏磨材料或 淸潔，也可淸潔掉出的鑽石粒。軟硏磨墊需用耐龍調節刷 調節。 習知的技術的化學機械硏磨機台，只有一個調節刷的 位置，一次只能使用一個調節刷，必須加入一更換調節刷 的動作，才能繼續使用另一調節刷，以完成調節硬硏磨墊 的動作，如此造成製程流程時間增長，而影響產量。若要 4 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂- 經濟部智慧財產局員工消費合作社印製 480209 A7 B7 6230twf.doc/008 五、發明說明（3) 減少調節硬硏磨墊的時間，可以增加一個調節刷的位置， 第2圖繪示習知的含有兩個調節刷17的化學機械硏磨機 台，使用此機台不致增長製程流程時間，但多一個調節刷 的位置，會使此機台過於擁擠不易操作。習知的化學機械 硏磨機台的調節刷管路，可提供去離子水或化學藥劑，但 未提供超音波或百萬倍音波於化學藥劑與去離子水，而未 達到充分運用化學藥劑與去離子水的效用。 本發明的目的之一就是提供一種用於化學機械硏磨機 台的多功能調節刷組。利用多功能調節刷組含有數個不同 物質的調節刷盤，達到節省製程流程時間與機台面積的效 果。利用加超音波或百萬倍音波於化學藥劑與去離子水， 而可充分運用化學藥劑與去離子水。以及利用不同的單個 或數個調節刷盤與加有超音波或百萬倍音波的化學藥劑或 去離子水的不同組合，而達多功能調節與淸潔硏磨墊的效 果，可以解決習知的技術的缺點。 根據本發明的上述及其他，提出一種多功能調節刷 組。此多功能調節刷組由數個調節刷盤與連接於一震盪裝 置的噴射管組成。此些調節刷盤的組成物質，依應用上的 不同：如刮粗糙、去硏磨材料、或淸潔（包栝去除殘留於 硏磨墊上的鑽石），可由不同物質組成··如鑽石或耐龍。 此調節刷盤的大小與形狀，依應用上的不同，可有不同或 相同的大小與形狀，可能的形狀包括圓形、橢圓形、一字 形、和十字形。以氣動閥或馬達操作使用此多功能調節刷 盤時，依應用上的不同，分次使用不同的調節刷盤，或分 5 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁} 訂·- 經濟部智慧財產局員工消費合作社印製 480209 62 3 0twf. doc/0 〇 8 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（屮） 次依不同組合方式使用不同的調節刷盤。此連接於一震盪 裝置的噴射管中，噴射管可供給化學藥劑與去離子水，此 震盪裝置可以提供超音波與百萬倍音波於化學藥劑與去離 子水，以提供能量改變硏磨墊上硏磨材料的吸附力，以達 到去除硏磨材料的效果。本發明之調節刷組結合不同的調 節刷盤組合與不同的噴射管功能組合，達到多功能的效 本發明提供之多功能調節刷組將數個調節刷盤與連接 於一震盪裝置的噴射管結合爲一組，依實際需要，依次序 採用不同的單個或數個調節刷盤與噴射管功能的組合，其 間無須替換調節刷或多佔用機台面積，以連續的方式完成 多步驟調節、淸潔硏磨墊、也淸潔掉出的鑽石粒。 爲讓本發明之上述目的、特徵、和優點能更明顯易懂， 下文特舉一較佳實施例，並配合所附圖式，作詳細說明如 下： 圖式之簡單說明： 第1A圖繪示爲一種習知的化學機械硏磨機台的俯視 圖， 第1B圖爲繪示於第1A圖之化學機械硏磨機台的側視 圖； 第2圖以示意圖繪示習知化學機械硏磨機台需用二個 調節刷時，需佔用兩個調節刷的面積； 第3圖繪示習知調節刷的側視圖； 第4圖繪不含有兩個同心圓形狀調節刷盤之本發明調 6 (請先閱讀背面之注意事項再填寫本頁) % 訂· -線· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 480209 6230twf.doc/008 A7 B7 五、發明說明（（） 節刷組的側視圖； 第5A圖至第5C圖繪示本發明調節刷組之可能操作方 法的三種，此調節刷組含有兩個同心圓形狀調節刷盤； 第6A圖至第6F圖以底示圖繪示本發明調節刷組之調 節刷盤的可能之形狀與可能之排列方式的六種。 圖示標記說明： 經濟部智慧財產局員工消費合作社印製 10 硏磨台 11 握柄 12 晶片 13 硏磨墊 14 管件 15 硏漿 16 液泵 17 調節刷 19 晶片的背面 20 晶片的正面 25 晶片與握柄 30 圓形調節刷盤 31 圓形調節刷盤 32 噴射管 34 震盪裝置 36 一字形調節刷盤 37 十字形調節刷盤 38 39 40橢圓形調節刷盤 7 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)6230twf.d〇c / 〇〇Q V. Description of the invention (>) = The protruding part of the honing pad is in contact with the above-mentioned chemical reaction and mechanical honing to form a flat surface. The honing pads help to transfer the honing paste and the holes. The rough seam on the surface of the honing pad has 12 um unevenness. The dragon is grasped and transferred by the dragon. After honing several wafers, The unevenness on the surface of the pad is flattened, so that the ability and pressure to hold the honing paste is reduced, which reduces the rate of honing. At the same time, the holes in the honing pad will be subject to some honing materials (such as honing particles in the honing paste) , Or honing away from the wafer), making honing characteristics change, which affects the honing effect. Therefore, it is necessary to condition the honing pad with the adjusting brush 17 to restore the uneven surface and remove the honing material between the holes. It is usually adjusted after each wafer is finished, or adjusted while honing. Depending on the application, there are two types of honing pads: hard polishing pads and soft polishing pads, of which hard diamond polishing pads require diamond adjustment brushes and nyl. n) Regulating brush, because the hard honing pad is hard, cooperate with the deionized water provided by the adjusting brush pipeline, and the diamond adjusting brush adjusts the unevenness of the surface; it is compatible with the deionized water or chemical agent provided by the adjusting brush pipeline. The adjusting brush is used to remove the honing material or cleaning between the holes, and it can also clean out the diamond particles. The soft honing pads need to be adjusted with a Nylon adjustment brush. The conventional chemical mechanical honing machine has only one adjustment brush position, and only one adjustment brush can be used at a time. The action of replacing one adjustment brush must be added to continue to use another adjustment brush to complete the adjustment of the hard honing. The action of the pad causes the time of the process flow to increase, which affects the output. If 4 paper sizes are applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page) Order-Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 480209 A7 B7 6230twf.doc / 008 V. Description of the invention (3) The time of adjusting the hard honing pad can be reduced, and the position of an adjusting brush can be increased. The second figure shows a conventional chemical mechanical honing machine table with two adjusting brushes 17 The use of this machine will not increase the process flow time, but an additional adjustment brush position will make this machine too crowded and difficult to operate. The adjusting brush pipeline of the conventional chemical mechanical honing machine can provide deionized water or chemical agents, but does not provide ultrasonic or million times ultrasonic waves for chemical agents and deionized water, but does not achieve the full use of chemical agents and The utility of deionized water. An object of the present invention is to provide a multifunctional adjusting brush set for a chemical mechanical honing machine. The multifunctional adjusting brush set contains several adjusting brush plates of different materials, which can save the effect of process time and machine area. By adding ultrasonic waves or millions of times to chemicals and deionized water, chemical agents and deionized water can be fully used. And the use of different single or several adjustment brush discs and different combinations of ultrasonic or million times of chemicals or deionized water, to achieve the effect of multi-functional adjustment and clean honing pad, can solve the conventional Disadvantages of technology. According to the above and other aspects of the present invention, a multifunctional adjusting brush set is proposed. This multifunctional adjusting brush set is composed of several adjusting brush discs and a spray pipe connected to an oscillating device. The composition of these adjusting brush disks depends on the application: such as roughening, honing materials, or cleaning (including removing diamonds remaining on the honing pad), they can be composed of different substances such as diamonds or resistant Long. The size and shape of the adjustment brush plate can be different or the same size and shape depending on the application. Possible shapes include round, oval, zigzag, and cross shapes. When using this multifunctional adjusting brush disc with pneumatic valve or motor operation, different adjusting brush discs are used in different times depending on the application, or 5 paper sizes are applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page} Order ·-Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 480209 62 3 0twf. Doc / 0 〇8 A7 B7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (屮) Different adjustment brush disks are used in different combinations. This is connected to the spray tube of an oscillating device. The spray tube can supply chemicals and deionized water. This oscillating device can provide ultrasonic waves and Million times of sound waves are applied to chemicals and deionized water to provide energy to change the adsorption force of the honing material on the honing pad to achieve the effect of removing the honing material. The adjusting brush set of the present invention combines different adjusting brush disc combinations with different The function of the spray tube is combined to achieve a multifunctional effect. The multifunctional adjustment brush set provided by the present invention combines several adjustment brush discs with a spray tube connected to an oscillating device into one. Group, according to the actual needs, sequentially using different single or several combination of adjustment brush disk and spray tube function, without the need to replace the adjustment brush or take up more machine area, complete multi-step adjustment, cleanliness and honing in a continuous manner The pads and diamond particles are also cleaned. In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below in conjunction with the accompanying drawings for detailed description as follows: Brief description of the drawings: FIG. 1A is a top view of a conventional chemical mechanical honing machine table, and FIG. 1B is a side view of the chemical mechanical honing machine table shown in FIG. 1A; The schematic diagram shows that when the conventional chemical mechanical honing machine requires two adjustment brushes, it needs to occupy the area of two adjustment brushes. Fig. 3 shows a side view of the conventional adjustment brushes. Fig. 4 does not contain two concentric brushes. Circular shape adjustment brush plate of the present invention 6 (Please read the precautions on the back before filling in this page)% Order · -line · This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 480209 6230twf .doc / 008 A7 B7 V. Invention (() Side view of segment brush set; FIGS. 5A to 5C illustrate three possible operation methods of the adjustment brush set of the present invention, and the adjustment brush set includes two concentric circular adjustment brush discs; FIGS. 6A to 6 Figure 6F shows the six possible shapes and possible arrangements of the adjustment brush plate of the adjustment brush set of the present invention with the bottom diagram. Symbol description: Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 10 Honing table 11 Handle 12 Wafer 13 Honing pad 14 Tube fitting 15 Mortar 16 Liquid pump 17 Adjustment brush 19 Back of wafer 20 Front of wafer 25 Wafer and handle 30 Circular adjustment brush disc 31 Circular adjustment brush disc 32 Spray tube 34 Oscillation device 36 I-shaped adjustment brush plate 37 Cross-shaped adjustment brush plate 38 39 40 Oval-shaped adjustment brush plate 7 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling (This page)
62 3 0twf. doc/〇 〇 8 7 發明說明（&/ 實施例 第4圖繪示爲依照本發明1佳實施例的一種調節 刷組的側視圖。 (請先閱讀背面之注意事項再填寫本頁) 用於化學機械硏磨裝置的多功能調節刷組包括不同物 貞之口周節刷盤’且至少包括兩編讎盤。如帛4圖所 不之多功目gg周節刷組包括二不同物質之麵刷盤：調節刷 盤30與調節刷盤31，此多功能調節刷組上並有一噴射 管32，此噴射管32除供給化學藥劑與去離子水外，並連 接於一震盪裝置34，此震盪裝置34可以提供超音波或百 萬倍音波於化學藥劑與去離子水。此噴射管32可以位於 調節刷組的中心或邊緣。第4圖繪示之噴射管32位於中 心。 i線· 經濟部智慧財產局員工消費合作社印製 第5A圖至第5C圖繪示本發明調節刷組之可能操作 方法。本發明調節刷組之操作，以氣動閥或馬達（未繪示 於圖）控制調節刷盤30，調節刷盤31與噴射管32的上 下及壓力’並可以不同方式任意排列組合調節刷盤30, 調節刷盤31。第5A圖爲使用調節刷盤30調節硏磨墊 13，第5B圖爲使用調節刷盤31調節硏磨墊13，第5C圖 爲使用調節刷盤30與調節刷盤31調節硏磨墊13;第5A， 5B，和5C圖中，依應用上不同，噴射管32可提供化學 藥劑或去離子水，並加上或不加上超音波或百萬倍音波的 功能。 第6A圖至第6F圖繪示本發明調節刷組調節刷盤的 可能之形狀與可能之排列方式的六種。組成本發明調節刷 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 480209 A7 B7 6230twf.doc/008 五、發明說明（，） (請先閱讀背面之注意事項再填寫本頁) 組之不同物質的調節刷盤可有不同或相同之形狀、大小、 和排列方式。第6A圖由一圓形調節刷盤30和一一字形 調節刷盤36組成，第6B圖由一圓形調節刷盤30和一十 字形調節刷盤37組成，第C圖由二圓形調節刷盤30、31 組成，第6D圖由一橢圓形調節刷盤38和--字形調節 刷盤36組成，第6E圖由一橢圓形調節刷盤38和一圓形 調節刷盤31組成，第6F圖由一圓形30和二橢圓形調節 刷盤39、40組成。 上述之中的每一調節刷盤本身，依同樣的精神，亦可 由不同物質、大小、形狀鑲嵌組合在一起，且一起升降。 其可能的物質，包括，例如，鑽石和耐龍。 經濟部智慧財產局員工消費合作社印製 本發明可以在硬硏磨墊上硏磨晶片完後調節硬硏磨墊 來舉例說明。應用如第4圖之調節刷組，其中調節刷盤30 爲鑽石刷，調節刷盤31爲耐龍刷，噴射管32提供化學 藥劑與去離子水，並連接於一震盪裝置，此震盪裝置可以 提供超音波或百萬倍音波於化學藥劑與去離子水。四個硏 磨墊調節步驟可以一個如第4圖所示之多功能調節刷組 來完成。第一步驟如第5A圖所示使用調節刷盤30之 鑽石刷，和噴射管32提供去離子水，以使硏磨墊13的 表面粗糙；第二步驟如第5B圖所示使用調節刷盤31之 耐龍刷，和噴射管32提供化學藥劑，以去除硏磨墊13的 硏磨材料和淸除第一步驟掉出之鑽石粒；第三步驟如第5B 圖所示使用調節刷盤31之耐龍刷，和噴射管32提供百 萬倍音波的去離子水，以進一步去除與淸除；和第四步驟 9 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 x 297公釐） 480209 A7 R7 6230twf.doc/008 五、發明說明（又） 如第5B圖所示使用調節刷盤31之耐龍刷’和噴射管32 提供去離子水，以淸潔硏磨墊13 。 本發明亦可應用於硏磨時同步調節硬硏磨墊。本發明 亦可應用於硏磨後與硏磨時同步調節軟硏磨墊。本發明可 應用於淸潔硏磨墊。 本發明將數個調節刷盤組合成一個調節刷組，並加上 一連接於一震盪裝置的噴射管，此噴射管供給化學藥劑與 去離子水，，此震盪裝置可提供超音波或百萬倍音波於化 學藥劑與去離子水。所以本發明具有多功能，可以連續的 多步驟控制每一或數個調節刷盤的旋轉速度和壓力，同時 噴射管可提供加有或不加有超音波或百萬倍音波的化學藥 劑或去離子水，在節省製程流程時間與佔用機台面積下， 以充分調節或淸潔硏磨墊，也可去除掉落的鑽石粒。 雖然本發明已以一較佳實施例揭露如上，然其並非用 以限定本發明，任何熟習此技藝者，在不脫離本發明之精 神和範圍內，當可作各種之更動與潤飾，因此本發明之保 護範圍當視後附之申請專利範圍所界定者爲準。 -------------- 4^丨丨 (請先閱讀背面之注意事項再填寫本頁) tSJ· --線· 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）62 3 0twf. Doc / 〇〇8 7 Description of the invention (& / The fourth embodiment of the drawing is a side view of an adjustment brush set according to a preferred embodiment of the present invention. (Please read the precautions on the back before filling (This page) The multifunctional adjusting brush set for the chemical mechanical honing device includes different mouth brushes and different at least two knitting disks. As shown in Figure 4, the gg week brushes include Two different surface brush discs: an adjustment brush disc 30 and an adjustment brush disc 31. The multi-function adjustment brush set has a spray pipe 32, which is in addition to supplying chemicals and deionized water, and is connected to a shock. Apparatus 34. This oscillating device 34 can provide ultrasonic or million times sound to chemicals and deionized water. The spray pipe 32 can be located at the center or edge of the brush set. The spray pipe 32 shown in Figure 4 is located at the center. i-line · Figures 5A to 5C printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs show possible operation methods of the brush set of the present invention. The operation of the brush set of the present invention is controlled by a pneumatic valve or a motor (not shown in FIG. Figure) Control and adjustment brush plate 30, adjustment Up and down and pressure of the disc 31 and the spray pipe 32 can be arranged in any combination in different ways to adjust the brush disc 30, and adjust the brush disc 31. Fig. 5A shows the use of the adjustment brush disc 30 to adjust the honing pad 13, and Fig. 5B shows the use of the adjustment brush. The disc 31 adjusts the honing pad 13, FIG. 5C shows the use of the adjustment brush disc 30 and the adjustment brush disc 31 to adjust the honing pad 13; FIGs. 5A, 5B, and 5C, depending on the application, the spray pipe 32 can provide chemical agents Or deionized water, with or without the function of ultrasound or million times. Figures 6A to 6F show six possible shapes and possible arrangements of the adjusting brush set of the adjusting brush set of the present invention. The paper size of the adjustment brush of the present invention is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480209 A7 B7 6230twf.doc / 008 5. Description of the invention (,) (Please read the precautions on the back before (Fill in this page) The adjustment brush plates for different substances in the group can have different or the same shape, size, and arrangement. Figure 6A consists of a circular adjustment brush plate 30 and a linear adjustment brush plate 36, and Figure 6B A circular adjustment brush disc 30 and a cross-shaped adjustment brush disc 37 Fig. C is composed of two circular adjustment brush discs 30 and 31, Fig. 6D is composed of an oval adjustment brush disc 38 and --- shaped adjustment brush disc 36, and Fig. 6E is composed of an oval adjustment brush disc 38 and A circular adjustment brush disc 31 is composed, and FIG. 6F is composed of a circular 30 and two oval adjustment brush discs 39 and 40. Each of the adjustment brush discs described above may be composed of different substances, according to the same spirit. The size and shape of the mosaic are combined together and lifted together. Possible materials, including, for example, diamonds and Nylon. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. An example is a hard honing pad. The adjustment brush set shown in FIG. 4 is applied, in which the adjustment brush plate 30 is a diamond brush, the adjustment brush plate 31 is a dragon-resistant brush, and the spray pipe 32 provides chemicals and deionized water, and is connected to an oscillating device. The oscillating device can Provide ultrasonic or million times sound waves for chemicals and deionized water. The four 硏 pad adjustment steps can be completed with a multifunctional adjustment brush set as shown in Figure 4. The first step uses the diamond brush of the adjustment brush disc 30 as shown in FIG. 5A, and the spray pipe 32 provides deionized water to roughen the surface of the honing pad 13. The second step uses the adjustment brush disc as shown in FIG. 5B. The dragon-resistant brush 31 and the spray pipe 32 provide chemical agents to remove the honing material of the honing pad 13 and the diamond particles dropped in the first step; the third step uses an adjusting brush disc 31 as shown in FIG. 5B Zhilong brush, and the spray pipe 32 provide millions of times of deionized water for further removal and eradication; and the fourth step 9 This paper size applies the Chinese National Standard (CNS) A4 specification (21 × 297 mm) ) 480209 A7 R7 6230twf.doc / 008 V. Description of the invention (again) As shown in FIG. 5B, use the dragon-resistant brush of the adjustment brush disc 31 and the spray pipe 32 to provide deionized water to clean the sanding pad 13. The invention can also be applied to synchronously adjust hard honing pads during honing. The invention can also be applied to adjust the soft honing pad synchronously after honing and during honing. The present invention can be applied to a honing honing pad. The invention combines several adjusting brush disks into one adjusting brush set, and adds a spray pipe connected to an oscillating device, which supplies chemical agents and deionized water. The oscillating device can provide ultrasonic waves or millions The sound wave is in chemicals and deionized water. Therefore, the present invention is multifunctional, and can continuously control the rotation speed and pressure of each or several brush disks in multiple steps. At the same time, the spray tube can provide chemical agents or detergents with or without ultrasonic or million times sound waves. Ionized water can fully adjust or clean the honing pad while saving the process time and occupying the machine area. It can also remove the dropped diamond particles. Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and decorations without departing from the spirit and scope of the present invention. The scope of protection of the invention shall be determined by the scope of the attached patent application. -------------- 4 ^ 丨 丨 (Please read the precautions on the back before filling this page) tSJ · --line · Printed paper scale of the staff consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Applicable to China National Standard (CNS) A4 (210 X 297 mm)