TW478224B - Electric discharge laser with active wavelength - Google Patents

Abstract

Electric discharge laser with active chip correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

Description

478224 Printed A7 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention (1) Background of the invention This application is US Patent Application No. 08 / 898,630, filed on July 22, 1997, and 2000 Partial serial applications of US Patent Application No. ------ filed on January 25, 2015. The present invention relates to some laser discharge lasers, and specifically to some lasers equipped with sonic disturbance correction. Figure 1 is a cross-sectional view of a typical KrF-excited two-body laser chamber. The above-mentioned laser gain region is a discharge region having a cross section of about 20 mm X 4 mm as shown in 34 in the i-th figure, which has a distance between their elongated electrodes 36A and 36B. 70cm length. In the above-mentioned laser chamber, the laser gas system is cooled by a fan 38, and by a heat exchanger * 0. Further, shown in Fig. 1 is a main insulator 42, an anode support rod 44, and a pre-ionizer rod 46. An important application of their electrical discharge lasers similar to KrF-excited double-body lasers is as a light source for integrated circuit lithography. In this special application, the 'special laser system is narrowed linearly to a wavelength of about 0.5pm which surrounds the desired' centerline '. The laser beam is focused on the surface of a silicon wafer by a stepper or scanner, and some integrated circuits are built on the surface. The above surface is irradiated with a laser pulse of a short pulse wave group at a pulse rate of about 1000 Hz or higher. It will require very precise control of their wavelength and bandwidth in order to allow the creation of very fine integrated circuit characteristics. Most of the operators of stepper and scanner machines currently used operate the above-mentioned laser light sources of about 1000 Hz, but 2000 Hz light sources are being shipped and their lasers with higher repetition rates are being developed. The above paper size is applicable to China National Standard (CNS) A4 (210 297 mm) * ^ Γ-; ------- ^ -------------- ih (Please Read the notes on the back before filling this page) 4 478224 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A: B7 V. Invention Description (2) The typical laser gas related to KrF laser is about 99% at atmospheric pressure The neon gas is 3, and it is at a temperature of about 45 arts. At this temperature, a sound wave at 1000 Hz will run about 47 cm between pulses, at 2000 Hz 'will run about 23.5 cm between pulses, and at 4000 Hz, it will run about U between pulses. 7cm. Their integrated circuit manufacturers want to be able to operate lasers at any of their pulse wave speeds within the laser's operating range, while maintaining their targets including the desired specifications | wavelength and bandwidth Beam parameters. The distance between the discharge areas of a typical lithography to stimulate a two-body laser, and the main reflective surface of the laser inward, range from about 5 to about 20 cm. The distances between their reflective surfaces on a plane perpendicular to the length of the above-mentioned discharge area are mostly between about 5 cm and 10 cm. Therefore, as shown in the comparison of Figure 2A, the distance traveled by the sound in Figure 丨 is shown '-a typical discharge laser built at 1000 Hz created by a pressure wave operating at the speed of sound in Figure 1, or It will be necessary to complete several reflections in order to return to the above-mentioned discharge area coincident with the next discharge. At pulse rates in the range of 2000 Hz > and higher, the above pressure wave running at the speed of sound may return to the above-mentioned discharge that coincides with the next pulse wave after only one reflection region. Wavelength specifications related to lithography lasers The KrF-excited dual-body lasers currently used in integrated circuit lithography are designed to precisely control their wavelengths and bandwidths. Their current specifications from integrated circuit manufacturers are required to be able to control the above-mentioned centerline wavelength to a target wavelength, such as within a stable range of ± ± 0.1 lpm. This paper standard is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) " ~ -------- ^ -------- ^ --------- ^ (Please read the precautions on the back before filling this page) i 478224

Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 321.3pm. —Typical bandwidth rules may be 0 > 6pm for full width and half height, and 3pm for 95% integration value. Manufacturers of their stepper and scanner machines want to be able to shrink these specifications and also increase the pulse repetition rate to 2000 Hz and above. A typical method of laser lithography-lithography is shown in Figure 3. In this drawing, the line narrowing module (referred to as 1, line narrowing kit '' or "LNP") 7 is greatly enlarged relative to the remaining laser systems 2. The laser beam at the back end of the excitation laser chamber 3 is expanded by a triplex beam expander 18 and can be reflected by a modulation mirror 14 onto a grating 16 arranged in the Litrow configuration. The angle irradiated by the light wave and reflected from the surface of the grating will determine the selected wavelength. For example, in this pre-existing technology laser, a 40 microradian pivoting motion 'generated by the above-mentioned stepping motor 15 will change the wavelength of the selected light wave by 1. The three chirped beam expanders shown in Figure 3 above will increase the selectivity of the above gratings to a magnification factor of usually about 25. The change in the direction of the laser beam that excites the laser in the direction of the LNP may also cause the selected wavelength of the grating to change; however, the change in the above direction may require about 1¾ radians to cause one of the selected wavelengths. 1pm change. The wavelengths of their pre-existing technical lithography lasers are usually controlled by a feedback arrangement. Among them, the wavelengths of their output beams are sampled by an instrument called a wavelength meter, so that The measurement of the above-mentioned wavelength and the value of this measurement are compared with a desired or target wavelength in order to calculate a wavelength error value, which is used to adjust the position of the above-mentioned mirror 14. Their typical pre-existing technical wavelength meter for lithography lasers, this paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm)

6 478224 A7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention (4) It will take about 3 milliseconds to measure the above wavelengths and calculate the above wavelength errors. The stepping motor 15 described above will take about 4 milliseconds to adjust the position of the mirror 14. These pre-existing wavelength control techniques work well to correct their wavelength drift over their entire period longer than about 10-15 milliseconds. Their pre-existing KrF-excited dual-body lasers, when continuously operating at, for example, a steady state at 2000 Hz, can operate at extremely high specifications even at very high repetition rates. However, the typical mode of operation associated with a lithography laser light source is far from steady-state continuity. In a typical mold complaint, the 170 grains on a round wafer may each be laser pulses of the 015-second pulse group at a pulse repetition rate of 1 Hz (ie, 300 l0-mJ pulses). Waves are irradiated, and their pulse wave groups have a downtime of 1015 seconds, and then when a new wafer is loaded on the machine, there will be a downtime of 9 seconds. This entire cycle will probably take about 丨 minutes and will represent a work cycle of about 42.5 percent. Lasers that operate in pulse wave group modes with pulse wave repetition rates in the range of 1000 Hz or higher have shown some patterns of wavelength variation over the entire time period of about 3 to 10 milliseconds, and have Some wavelengths vary from about 0 to about 0. These styles (for the most part) were very difficult in the past, and if they were not impossible, they were accurately predicted, and the dates to indicate their causes have not been known so far. These changes are called "wavelength chirp pulses." This chirp pulse is easy to increase as the repetition rate increases. Because of the measured wavelength and the use of the modulation mirror 14 driven by the stepper motor 5 described above, The time required to change the wavelength by laser control is about 7 milliseconds. -Line (please read the notes on the back before filling this page) 478224 A7 V. Description of the invention (5) The typical linear frequency modulation pulses, which have been effective in their pre-existing wavelength control technology, will already become history. Because of this A latent time and the inability to accurately predict the pattern of the above-mentioned chirp pulse. In the past, with the above-mentioned existing technology-type wavelength control equipment, it was difficult to achieve the active calibration of the chirp of the wavelength. Electrical discharge lasers with wavelength chirps. Summary of the invention The present invention provides some equipment and methods that can modify wavelength chirps in high pulse rate gas discharge lasers. Our applicants have confirmed that the above Pre-existing Artistic Wavelength The main reason for the frequency-modulated pulses is the pressure wave from a discharge that is reflected back to the discharge area that coincides with a subsequent discharge. The timing of the pressure wave arrival is the temperature of the laser gas that the wave passes through. During the operation of the pulse wave group mode, the temperature of the laser gas of the above-mentioned preexisting technology type laser can be changed by a few degrees during the whole period of several milliseconds. Such changes in temperature will change the pulses in the discharge area The position of the pressure wave coincides with the position of the pulse wave, which causes the change in the pressure of the laser gas, and its complex will affect the refractive index of the discharge area, which causes the laser beam on the back of the excitation laser to slightly change. Change the direction. This change in the beam direction will cause the grating in the LNp to reflect a light wave with a slightly different wavelength back to the above-mentioned discharge region, resulting in the above-mentioned linear chirp. The chirp The problem can be mitigated or dispersed by the pressure wave created by the above discharge, or by maintaining the above-mentioned gas temperature as close as possible to the actual The minimum constant value (pulse, anti-pulse) is minimized. This paper size applies the Chinese National Standard (CNS) A4 specification (2) 〇 297 public hair 4/8224 A7 ----- ____ V. Description of the invention (6) The case of Shenyan reveals some technologies related to mitigating and dispersing these pressure waves. In some lasers, some small predictable patterns will remain, and they can use the pre-existing A rather slow wavelength control instrument of technical skill is fully calibrated with active wavelength control. In a preferred embodiment, a simple study of the wide-lift method allows explanation in advance to adjust a modulation mirror to It is expected that the above-mentioned learned linear frequency modulation pulse pattern. Their embodiments include some stepping motors with extremely fine adjustment, so that the number of their modulation steps will be sufficiently reduced in terms of more accurate modulation. However, the complete elimination of the above-mentioned linear chirp pulses is usually not feasible due to structural changes and pre-modulation in the laser room; therefore, our applicants have developed some equipment for extremely fast active chirp pulse correction. And technology. Their improved technologies include a combination of a relatively slow stepping motor and an extremely fast piezoelectric actuator. In another preferred embodiment, the completion of the above-mentioned chirp pulse correction is based on the pulse wave pair pulse wave, wherein the wavelength of one pulse wave will be measured and the wavelength of the next pulse wave will be measured. , It is corrected based on this measurement. This correction technology will be able to operate at repetition rates as fast as 2000 Hz and above. Their extremely fast modulation mirrors are controlled on the settings, and the pivot position of the modulation mirrors can be adjusted, which can change the irradiation angle above the wavelength selection grating in the line narrowing kit. These controls allow mirror modulation in a fraction of the time interval between pulses at a pulse repetition rate of 2000 Hz. This application also reveals the improvement of a pre-existing technology-type wavelength meter, which can collect wavelength data in time at a pulse repetition rate of 2000 Hz or above, and calculate the wavelength of each pulse to complete the The paper size required for a pulse wave applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love). Packing --- (Please read the precautions on the back before filling this page). Line. Staff of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by Consumer Cooperatives 9 478 224 A7

V. Description of the invention (7) Wavelength modulation correction printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Therefore, this specification discloses some technical and structural improvements to minimize the chirp pulses, and also discloses some active wavelength correction techniques required to correct their residual chirp pulses. Brief description of the diagram Figure 1 shows a cross-sectional view of a preexisting lithography laser chamber; Figures 1A to 1F show the temperature in the laser gas during a pulse wave of a pulse wave group Figure 2A shows the distance traveled by the sound of their laser pulses at various pulse wave repetition rates; Figure 2B shows the change in sound speed with temperature; Figure 2C shows a pulse mode Figure 3 shows the temperature swing curve during operation; Figure 3 shows how to control the wavelength of a lithography laser; Figures 4A and 4B show the changes in wavelength σ and wavelength transients with the temperature of the laser gas; The graphs A to 8B show the variation of their beam parameters with the pulse repetition rate at two significantly different temperatures. Figures 9A and 9B compare the curves of the transient wavelength versus pulse repetition rate at the two different temperatures; Figures 10A and 10B show the effect of a pressure wave absorber on beam quality; Figures 11A, ΠB, 11B1, 11B2, 11D1, and 11D2 show that the paper size applies to the Chinese National Standard (CNS) A4 (210 X 297) Public love) I „- «------- ^ --------- ^-(Please read the notes on the back before filling out this page) 10 478224 Printed by the Consumers’ Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (8) Details of the zigzag baffle technology related to scattered pressure waves; Figures 11C1 to 11C4 show the effects of the above baffle technology; Figures 12, 12A and 12B show a suggestion for providing faster and finer wavelengths Control technology; Figures 12C and 12D are flowcharts that describe the wavelength control algorithm; Figures 13A and 13B show a heat exchanger that can be used to generate the above laser chambers | different laser gas temperature zones Design; Figure 14 shows a technology that can be used to provide heat to the laser gas at a rapid rate during laser downtime; Figure 15A shows the relationship between different gas temperatures during the operation of the pulse wave group Wavelength error; Figure 15B shows the effect of the above-mentioned active chirp pulse control; Figure 15C is a flowchart related to a control algorithm; Figure 16 is a wiring diagram of a wavelength meter; Figure _16B shows them from Development of the above wavelength meter Two_ polar body array data; Figures 17 and 17 A show the "One available, 7 pull at ^ Μ 丨 ,, Bingbu" technology used to specify a specific mirror position to control the wavelength; Section 7B The picture shows the characteristics of a diode laser%; Fig. 18 shows a picture with a point p ▲ 田庄 丨 ^ ^ 刀 # and the LNP of the mask; the 19th, 19B, 19C and 19nm and a A ^ 9D picture shows some purification techniques that can be used to cool a grating surface; while the 20 diagram shows a right p p μ μ. There are two heat exchangers with changing heat sinks. Paper size + Guan Jia Fresh ------------- install -------- order --------- line (please read the precautions on the back before filling this page) 11 478224 economy A7 printed by the Ministry of Intellectual Property Bureau's Consumer Cooperatives V. Invention Description (9) 〇 Detailed description of the preferred embodiment Our applicant's experiment Our applicant suspects that the above-mentioned wavelength-modulated linear frequency modulation pulse is due to the temperature of the laser gas As a result of this change, the complex will affect the speed of their pressure waves as they pass through the laser chamber, and thus their reflected pressure waves return to Timing said discharge area. In order to test this theory, our applicant cut the water pipeline of the laser chamber in a very low duty cycle mode (100 pulses at 2000 Hz, followed by 5 seconds on and off), and used The above-mentioned laser chamber heater is disabled to operate a laser. Both their cooling water and heater are disabled to allow the slow and uniform change from the above-mentioned shot to the 'litre'. The above-mentioned laser chamber temperature is controlled by changing the chamber temperature and by placing a base plate fan a few feet away from its frame. The hair dryer gives power to the gas, which can provide enough heat to make the above laser chamber warm up to 60 ° C, and the above-mentioned bottom plate fan can provide sufficient cooling effect to make the temperature of the above laser chamber. Down to 39 X :. The above-mentioned heating and cooling of the laser chamber occurs over the entire period of several hours' in order to minimize any effects caused by dT / dt. From the collected data, the average energy related to a pulse wave group, the energy variation related to the pulse wave group, the above-mentioned pulse wave group transient state, and the standard deviation of the above-mentioned line-to-center variation (known as " Wavelength σ "). In order to provide a single data point that can quantify the above-mentioned line and center pulse group transients, a "wavelength pulse group transient" is determined as the average of the first 3Q pulse waves per-pulse material- The central wavelength, the 2M scale between the mean line and the central wavelength of the last 30 pulses, is applicable to the Chinese National Standard (CNS) A4 specification (2 " Γ (Γχ 297 公 i 一.) :: · ------- Order --------- Line—Awi .—— (Please read the precautions on the back before filling this page) 12 V. Description of the invention (10) Poor-due to the laser wavelength meter used above, These average values provided at 1 Hz are only composed of 15 unique wavelength transients. The average of their subsequent 3G pulses is used to measure the above-mentioned steady-state lines and center wavelengths The above-mentioned field emission to temperature can be allowed to 'make a slow change' between the extreme values of about 400c to about 55 = and the above parameters will be continuously monitored. All four measurement parameters, There are four changes in the above as the temperature of the laser chamber decreases: their pulse energy usually decreases with the decrease of temperature (with some small up and down variations). Once the other three $ numbers are used, there will be a significant increase and decrease over the entire temperature range. It is bad to plot the wavelength pulse group transients and the wavelength σ relative to the temperature of the laser chamber. We have seen this. The characteristics are in a stable and repeatable manner, the temperature of the laser chamber varies with k. Figure 4A shows the data they obtained during the cooling period, and Figure 4B shows the data they have during the warm-up period. The information obtained is printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Once a temperature sensitivity has been established with their repeatable measurement results, the next question to be answered is how the laser chamber temperature will impact. Transient to wavelength? With the change of temperature in this order, it has been found that among the other laser parameters, the most significant is the laser energy. If the wavelength is complained in a similar way to the laser energy, Impact, their sound wave effect may be a significant factor. Since the speed of sound in a gas is determined by the square root of temperature, the display of this type of relationship may indicate the cause on a sound wave. Wait Then asked people in two significantly different from one laser room temperature Ray table paper scale applicable Chinese National Standard (CNS) A4 size ⑽x 297)

V. Description of the invention (η) The above laser is operated over the entire range of the repetition rate of the laser, and the curves made by them are compared. They are the same as the four parameters described above, which are measured relative to the repetition rate, and are about 57t; the high temperature is shown in Figures 5A, 6A, 7A, and 8A. Their lower temperature information is shown at a temperature of about 39 ° C 'in 5B, 6B, 7B, and 8B8. Each plot shows a dense structure, and their variation with repetition rate, and a few Hz can lead to significant changes in their plotted parameters. In order to observe whether these changes with the repetition rate are related to sound waves, these materials can be plotted together with their lower temperature data which is moderately shifted. However, the first applicants, etc., simultaneously plotted two sets of data without offset. Figure 9A shows Figures 7A and 7B-the origins are drawn (the thicker drawings represent their 57 ° C data. The results are not without obvious correlations. The difference in sound speed is biased. The comparison after the shift is as shown in Figure 9B. The completion of this is to draw the above 39t data at a repetition rate increased by a ratio of: V3m

S \ 2K The above temperature-related offset is actually quite small, only 28%, but when applied to their lower temperature data, there are not many structures that match between their two sets of data . Between the two sets of data, there were only three significantly different peaks. These characteristics may be due to another phenomenon, or they may still be acoustic, but due to the coincidence of several reflections from different distances at one temperature, but not at another temperature. Xiasuo

14 478224 V. Description of Invention (i2) Consistent. Their data appearing in the 48th to 28th graphs show that the above-mentioned wavelength transients occurring at the beginning of the -pulse group can be severely impacted by the above-mentioned interaction with the acoustic wave of the laser chamber. This data also shows that: it may be difficult to try to find-the "comfort point" related to low transients, covering only a few degrees of temperature change 'or a few Hz repetition rate change will cause the above ^ state = Big offsets are also. When their heat exchangers and laser room heaters are active, causing space temperature gradients and rapid dT / dt events, the above situation will become more complicated. Temperature variation during the operation of the pulse wave group mode. The Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints the agricultural products. During the second half of the pulse wave of the 300 pulse wave group, the above laser system is close to a stable condition. During the first 60 pulses of the group, the above laser conditions are far from stable. The discharge area between these electrodes 10 and 12 is a volume of about 20 mm high 4 mm high and 80 cm |. During a discharge, about 2 J of electrical energy is deposited in this gas volume. The tritium gas system at 3 atmospheres, for example, about 50% of its initial temperature is neon gas. The above discharge occurs within a very short period of about 40ns. 'It can start a violent pressure wave, and it will pass from the above discharge area' through the above-mentioned circulating gas at about the speed of sound (about 47 〇m / s). The above 2J energy will also increase the temperature of the gas core in the immediate vicinity of the discharge. They are slowly moving out of the discharge area at the speed of the circulating gas at about 40 m / s. The heating core described above is initially about the size of the discharge volume (about 70 cm x 0.4 cm x 2 cm). This paper size is applicable to China National Standard (CNS) A4 (210 X 297 public love) 15 478224 A7

V. Description of the invention (U volume is heated from about 20 "C to, in this certain example, about 60c> c, and it will expand relatively slowly. The relatively slowly expanding heart of the above-mentioned heated gas, The above-mentioned circulating gas was pushed out between these electrodes so as to operate with a laser at 2 kHz. The above is now heating the core at an average temperature of about 42.6 ° C from a known pulse wave, followed by At a pulse time, the line is centered about 2 cm downstream of the electrode as shown in Fig. 1B at a typical hair dryer speed for a 2 kHz lithography laser similar to that shown in Fig. 1 The laser gas described above completes a complete circle around the laser chamber in about 30 milliseconds. For one minute, a 42.5 percent duty cycle of the type described above (ie, 2000 170 short pulse wave groups of 300 pulse waves at Hz 'followed by a 9 second downtime), the above discharge will be at an average rate of about 1.7 kw (about 2J per pulse), Add heat to the above gas. The above fan is attached at about 500 Adding heat at a constant w rate, and the above heat exchanger, can remove most of the heat added by their discharges and fans at an approximately constant rate during the entire working cycle of 丨 _ minutes. The Consumer Cooperatives of the Ministry of Intellectual Property Bureau printed their controls on the laser cooling system, which are set to maintain an average gas temperature as close as possible to a practically constant temperature, such as about 441. However, 'as the heat is periodically (In their very short time) added to their electrodes, and removed at the above heat exchanger, the temperature of their gases in the above-mentioned laser chamber will change significantly. For example Regarding 'the above-mentioned gas temperature in the laser chamber, after the above-mentioned 9-second downtime', the first pulse wave front of a pulse wave of a 300 pulse wave group, the Chinese national standard < (CNS) A4 size ⑵〇χ 297mm 478224

Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

Shot into the interior, it will be quite fixed (for example) around 40 (crossing the hot parent mentioned above, with a small step temperature gradient). At this moment, the heat is extracted from the above-mentioned gas by the above-mentioned heat exchanger 40, and the slightly warmer walls and other structures of the above-mentioned laser chamber (at this time) are added to the above-mentioned gas. A rough estimate of one of the above temperature distributions is shown in Figure 1A. Just before the second pulse, the temperature of the relevant gas at a distance of about 4 cm downstream of their electrodes will be about 42 ° C, but the upstream of the above gas temperature will continue to be as indicated in Figure 1B 40%.匸 About. The gas temperature between the electrodes and upstream will continue to be about 40 ° C, and the temperature of the downstream gas will continue to be about 42.6 ° C, but the above 42.6. (: The volume of gas will increase as the heating heart of the laser gas circulates around the laser. Figure 1c shows that just before the fifth pulse wave above, one of the gas temperatures is roughly It is estimated that under the 35th to 40th pulse waves, the upstream temperature of the above-mentioned gas will start to be affected by the first pulse of the above-mentioned pulse wave group, and the above-mentioned upstream temperature will be as shown in Fig. 1D. The temperature increased as shown in the figure to about 42 ° C. When the above-mentioned gas from the first pulse wave passes through the electrodes for the second time, it will be about 2 ° C and about 2 ° C, and will be about the same as the above. The same heat as the first pulse wave group, and its temperature will increase to about 446, c, and for about 35 to 40 pulse waves, their upstream and downstream temperatures will be as shown in Figure 2E The indication is kept fairly constant at about 42 ° C and 44.6 ° C, after which both upstream and downstream will see another small increase in temperature. This private sequence will continue, and their increase will The increase will be every 40 pulses, but will become slightly smaller, just in the first 300 pulses mentioned above This paper applies the scale hog China National Standard (CNS) A4 size (210 X 297 mm)

II · · II (please read the notes on the back before filling this page); line _ 17 478224 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Α7 Β7 V. Description of the invention (I5) The last pulse wave front of the pulse wave, The temperature at the upstream is about 42 ° C, and the temperature at the downstream is about 44.6 ° C. The first pulse wave group immediately above is a 0.15 second downtime. During this period, the temperature of the laser gas downstream of the electrode will be reduced to an upstream temperature of about 42t 'and then next to 0 · Within 15 seconds, the average temperature of the gas will be reduced by about the heat exchanger. (The reader should keep in mind that the qualitative temperature changes shown in Figures 1A to 1F occur very rapidly during a pulse period of a 300 pulse group, and last only 0.15 seconds). The first pulse wave of the second pulse wave group will again cause an increase of about 2.6 "C in a small volume downstream of the electrode, and their heating volumes will follow each of the second pulse wave group. The number of pulse waves increases first. The above upstream temperature will, as explained above, start to increase again after about 35 to 40 pulse waves have passed, and their additional increase will be affected by the above pulse wave group. The shadow direction of the previous pulse waves and the above-mentioned upstream temperature will increase to " spoon 42 C ^ The gas from the first pulse wave passes through the electrodes to receive the second pulse wave group for the second time. With the same heat, it will increase to 44.6 C, and for about 35 to 40 pulses, their upstream and downstream temperatures will be kept fairly constant at about 42 < ί (: ^ σ44 · 6 Next, both their upstream and downstream will see another small increase in temperature. This autumn sequence will continue their similar temperature changes in the way explained by the first pulse group. In a period of about 5 丨 seconds, each Occurs during a period of 170 pulses. During this period, the above-mentioned average gas temperature will drift upwards by about 3. 匚 左 · ^ ιτι ---: · ------- order ----- ---- Line-(Please read the notes on the back before filling this page)

-18. A7

V. Description of the invention (16) The employee cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the right, and after the last pulse of the above 170th pulse group, there was a 9-second downtime to change the wafer. The average gas temperature will drop by about 5. 〇, and to about 41. (: Left and right (at the beginning of ours). The first few figures show that they are operating at 1000 Hz so that there are ο ”seconds between their pulse wave groups, and there is a 9-second downtime after 85 pulse wave groups. In the laser, the temperature effect of the temperature tracking of a very fast thermocouple located upstream of the heat exchanger above the position of the return pressure wave is therefore 'during the one-minute cycle of the operation of a lithography laser, the above There will be a very rapid small incremental change in the temperature of the laser gas. In the past, these small temperature changes were not considered to be particularly important. Covering the above-mentioned tritium branching is considered too small. The electrical discharge, the chemical nature of the laser gas, or the optical properties in the laser discharge area described above have any direct effect. However, our applicants have discovered that these small temperature changes can affect the quality of the laser beam , Has a very important indirect effect, because when the laser is operating at a very high repetition rate similar to their rate exceeding 1000Hz, the temperature of the pressure wave caused by the discharge in the laser (sound Due to the effect of the velocity of the shock wave), the relationship between the sound speed and temperature in the KrF (mostly neon) laser gas is shown in Figure 2B. The above relationship is a square root relationship. However, it is almost linear in the operating range of the above laser. From Figure 2B, an increase in one of the above neon gas temperatures will increase the above-mentioned sound velocity by about 0.8 m / s. So 'the above During the first approximately 5 milliseconds at the beginning of the pulse wave group, an increase of approximately 3 ° C in the temperature of the downstream gas will occur, which will make the above ------------- install ------ --Order --------- (Please read the notes on the back before filling this page)

478224

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478224 5. The invention explains (is) the reason for the chirp. For several years, pulse wave energy chirp pulses and wavelength chirp pulses during the operation of the pulse wave group mode have been used by their lithography to stimulate users of dual-body lasers. They have observed small changes in their laser beam parameters. Especially the pulse wave energy and wavelength during the operation of the pulse wave group mode. The above maximum changes usually, but not always, occur at the beginning of a pulse group and / or about a cycle time (about 30 ms for a 1000 Hz laser) after the start of a pulse group. These "chirp" changes seem to follow their patterns, but their patterns are difficult to predict, and they are different for different laser chambers and operating conditions. The reasons for these changes have already been There have been many speculations, but there is no firm agreement on the reasons. The problem of the above-mentioned energy chirp is mainly dealt with in two ways by the above-mentioned laser energy control system. First of all, the above-mentioned laser-related quantity The control system is fast enough to make the pulse wave energy of a known pulse wave, and the moon dagger is adjusted with a feedback technique based on the energy 1 measured by them including the early pulse wave immediately preceding the pulse wave. Secondly, the above-mentioned computer controller has been taught to learn the above-mentioned patterns of energy chirp pulses, and to take them into consideration to complete the adjustment of the above-mentioned discharge voltage, thereby generating the above-mentioned desired individual pulse wave energy, and a The total "dose, energy" in the pulse wave group. An active control program that can be used to process energy chirps is described in U.S. Patent No. 6,005,879, which is incorporated herein by reference. The active control of the above-mentioned linear frequency-modulated pulses is more difficult. The paper size of this paper applies the Chinese National Standard (CNS) A4 specification (21,297 mm). ^ -------- ^ ------ --- ^ (Please read the notes on the back before filling out this page) 21 478224 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (19) The above wavelength measurement is longer than energy measurement The time and the wavelength modulation mechanism currently used are slower than the discharge voltage control. Moreover, in the past, the above-mentioned wavelength chirps were more weird and more difficult to predict than energy chirps. However, based on our applicant's discovery of one of the main reasons for the weirdest part of the aforementioned chirp, our applicant has been able to devise some methods that can minimize the chirp described above, by modifying The inside of the laser chamber to reduce the impact of the pressure wave across the discharge area. This will leave a more specific and predictable chirp, which is more sensitive to active control. These two techniques of structural modification and active control are described below. How much difference can be caused at one time As shown in Figures 1A to 1F, based on a few milliseconds, such as a time interval of about 5 milliseconds, the temperature between about 2 and 3 C will occur in the laser gas. Swing. Their chirp pulses are also within a few milliseconds. Assume that a laser system operates at a pulse frequency of 2000. The above sounds are at a distance of about 23.30 cm at 45 ° C between their pulses (466 m / s) in laser gas or the distance they will run. The distance between the above sounds in the pulse wave (467.6 m / s), or within the laser gas mentioned above, is about 23.38 cm in 47 art. Therefore, if the laser gas downstream of their electrodes is at a temperature of 45 ° C, and the above-mentioned pressure wave returning from the immediately preceding pulse wave is located immediately downstream of the above-mentioned discharge region (and will not cause Perturbation of the light beam), the temperature of the gas increases to 47. 〇, will make the end of the aforementioned M force wave ′ located in the above discharge area approximately 0.8 mm. Another 2 ° C rise will cause the above-mentioned wave edge to move almost to the top. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). (Please read the precautions on the back before filling in this Page) ------- Order --------- 22 478224 A7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs ________B7_ V. Description of the invention (2) The middle of the discharge area. Therefore, at 2000 Hz, the positions of the above-mentioned pressure waves returning from the immediately preceding pulse wave are every two. 〇Temperature change, move about 0.8 mm. At 1000 Hz, the position of the pressure wave is shifted by about 0.8 mm for each temperature change 'of i ° c. As for the pressure waves that return from the pulse wave immediately before the pulse wave immediately before, the above-mentioned position change is proportionally large. > Pressure wave mitigation There are many techniques that can be used to mitigate the effects of their pressure waves. Some of these technologies are described in U.S. Patent No. 5,978,405, which has been incorporated by reference into this specification. These include their angular reflectors, such as those shown in Figures 5A to 5D of the patent, in a position where the pressure waves described above can be reflected down into the bottom of the laser chamber. Zigzag baffle plate with varying shape sawtooth A first preferred embodiment of the present invention is shown in Figs. 11A and 11B. Figure 11A shows the cross-section of a laser chamber. Their baffles are attached to the laser chamber walls at positions 60, 62, and 64 by screws, and the upper corners are shown at 66 and 68. . These baffles have a cross-section having a zigzag shape with a zigzag shape as shown in Fig. UB, which is an end view of the baffle 60 described above. As indicated by the detailed drawing of the above-mentioned baffle plate 60 (Figures UB1 and UB2), the distance between the saw teeth is from 0390 to 0.590, and the height of the saw teeth is from 012. Inch changes to 0280. The above sawtooth is usually aligned in the direction of the gas flow, and is perpendicular to the direction of the laser beam and the long dimension of the discharge area (please read the precautions on the back before filling this page) ----- Order ··· Line · This paper size applies to China National Standard (CNS) A4 (210 297 mm) 23 478224

Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of Invention (21). In this preferred embodiment, the material of the baffle plate is a 20-gauge nickel-plated aluminum plate. This baffle design is extremely effective in dispersing the pressure waves generated by the above discharge. This design allows the waves described above to be reflected in many directions, and has extremely small reflections in directions that are perpendicular to the long direction of the discharge region. The above result is that if the sound wave energy returns from any particular pulse wave to the above-mentioned discharge area, the above-mentioned wave energy (or pressure disturbance) 'will be split into some extremely large number of fragments. Figures 11C1 to 11C4 show the test results guided by our applicants. Among them, our applicants use aluminum plates that are generally formed as shown in Figure 11] 5, and the linings are as shown in Figure 1 丨 A. The wall is generally shown in the figure, but does not have the precision specified in Figure 11B. The above results from this test, as shown in Figure 11C2, are related to the two improved factors in the above-mentioned wavelength disturbance. This can be compared with the data shown in Figure 11C1, which is obtained using Figure 1 A laser chamber of the design shown in the figure includes some angular metal diffuser plates located in the corners above the heat exchanger and above the fan baffle plate. Its only major perturbation 'occurs at about 1940 Hz. This large disturbance at about 1940 Hz is achieved by placing their baffles in the general shape as shown in Figures 11B, 11B1, and 11B2 on the upper half of their downstream side walls as shown at 70, and As shown in Fig. 11C3, the decrease is large. A further improvement is the result of mounting a similar baffle plate 72 above the upstream side wall as shown in Fig. 11C4. Readers should note that in Figures 11C1 to 11C4, their wavelength transient data are plotted. The values shown here indicate that the paper size of a 100-pulse wave group is in accordance with the Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) ·- -24 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 478224 A7 __ B7 V. Description of the invention (22) The wave length between the average center wavelength of the 30 pulses and the center wavelength of the last 30 pulses difference. For this laser with the baffle arrangement described above in Figure 丨 丨 C4, almost all the data points fall within a range of about ± 0.02pm, and the data shown in Figure lici In comparison, an amazing improvement. Readers should also note that the previous thirty pulse waves (meaning that the above pulse wave group is 15 milliseconds before 2000Hz, and the above pulse wave group is 1500Hz before 20 leap seconds) are on average related to their pulse wave groups. | The wavelength at which the equilibrium wavelength is low is approximately 0.026pm. Generally, the pattern of the normal pulse wave group mentioned above is such that the above-mentioned wavelength will drop to a low point at about 7 to 10 ms after the start of a pulse wave group, and then it will gradually increase. After about 20 milliseconds, the above-mentioned centerline wavelength (average) is roughly in equilibrium (ie, centered at 0.0pm). The above average value can be pre-adjusted by the mirror 14 for about 7 to 10 milliseconds of a pulse wave group, and the offset is upward to about zero. Preferably, their wavelength control of lasers can be programmed to learn the best degree of presetting based on travel. The minimum incremental movement available for the aforementioned pre-existing technology type stepping motor 15 will result in a change in the centerline wavelength of about 0.05 pm. As far as this particular laser is concerned, a change of 0.05 pm increments in the first 7 ms may increase the above-mentioned transient value of the wavelength to about zero on average. Their typical pre-existing technical modulation masks have a latent operation of about 5 to 7 milliseconds, so that the laser control described above can be programmed to order the above-mentioned mirrors. Within 7 milliseconds, return to its steady-state position (which can be used to generate the desired centerline wavelength position above about 30ms after entering the above-mentioned pulse wave). For their best results, these pre-existing technical wavelengths of this paper are sized to the Chinese National Standard (CNS) A4 (210 X 297 mm) ------------- equipment ---------------- line (Please read the notes on the back before filling this page) 25 478224 A7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Complete some mechanical and electrical improvements. For faster and finer control, a piezo driver system can be added to the above-mentioned mirror driver 'or it will provide the required increase in speed and precision described above. A prior art stepper motor of a preferred design incorporates a piezoelectric mirror driver system that incorporates a piezoelectric to facilitate fast fine modulation arrangements, shown in Figures 12, 12A, and 12B. In this arrangement, large slower changes in their wavelengths are provided by stepper motors, and their small fast changes are provided by the piezoelectric stacks described above. Ai2o3 fibers in a wire mesh support A preferred embodiment of the present invention utilizes some pressure wave absorbers, which are composed of alumina (Al2O3) fibers that are evenly and loosely stacked, which are included in some formations. In some wire mesh supports of a container having a cross-sectional shape shown at 50 and 52 in Figure 10A. These bearings pass through the length of the laser chamber described above. Their fiber office is in Berwyn, PA

Goodfellow Corporation supplies part number A1 633790. As shown in Figure 10A, about 60 gm of material is attached. The above-mentioned metal wire mesh is an aluminum metal wire mesh formed with a 1 cm diameter metal wire into a 1 cm grid. The above materials are tested by operating a KrF laser through the pulse frequency range of 500 Hz to 2000 Hz, and making their results and their use of the corners of the type shown in Figure 1 above. Reflect similar data for the same laser chamber for comparison. The above-mentioned anode support rods have been modified in comparison with Fig. 1. The above-mentioned anode support rods are mainly used to improve the gas flow. Their results are compared in Figure 10B. The above-mentioned transient data are shown in thick lines, and the paper size of the pre-existing technology shown in the thin lines above applies to the Chinese National Standard (CNS) A4 specification (210 X 297 public love). · 'R — —!- ----- Order ------- (Please read the notes on the back before filling this page)-丨 Online! Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

A7 ^ -------- Ε _____ Description of the Invention (24) ☆ 弋 Comparison of data. These eight 203 fibers can significantly reduce the effects of the above-mentioned wavelength transients. Another type of absorbent non-woven fabric material that can be used is an oxide hammer and 8% yttrium. Since these materials can provide a very large surface area, which is affected by fluorine, it will be a potential problem, so that these fibers are resistant to fluorine attack. Another possibility is that in one pole, '· tian'. Alas, the agglomeration of the above-mentioned fibers can transmit pressure waves but keep fluorine from approaching the above-mentioned fibers. Focusing on the relaxation of temperature An important new discovery of the present invention is to change the position of pressure waves that bounce around the laser chamber, causing the effect of temperature changes. For example, if their gas temperature conditions can be kept constant, their pressure waves may not be a serious problem. Even if the center of the reentrant wave associated with each pulse is directly or injure the entire discharge area, all or what it will do is affect the refractive index of the gas in the above discharge area. This may result in a slight deflection angle of the above-mentioned light beam toward the LNP, and unless corrected, this deflection angle of the light beam may affect the above-mentioned output wavelength. However, the fixed deflection angle of a light beam may be automatically added, corrected by the above-mentioned normal feedback control of the laser, or it may only be adjusted the position of the above-mentioned modulation mirror 14 to generate the above-mentioned desired wavelength. Therefore, it rapidly changes the temperature of the laser gas, and rapidly changes the positions of the pressure waves that cause the above problems. Regarding the method of keeping the temperature fixed, the problem of the above-mentioned linear chirp can be corrected by keeping the above-mentioned gas temperature constant. This can be achieved by continuously operating the above-mentioned laser 297 mm) ^ -------- ^ --------- ^ (Please read the precautions on the back before filling this page) This paper size Applicable to China National Standard (CNS) A4 specification (21〇27 478224 A7 V. Description of invention (25) The smart employee consumes the stamp and easily completes it. Under continuous operation, the linear touch pulse will disappear. This solution is related to The problem is that the manufacturers of their integrated circuits: they do not want to operate the above lasers continuously. Continuous operation may significantly increase the cost of operation. Continuous operation is not—the wavelength of the desired linear chirp The solution, but it is a solution that can usually significantly improve the quality of the beam. Continuous operation due to the downtime between their pulse groups, which is approximately equal to the length of the above pulse groups, using lasers with continuous operation, do A light source related to two stepper or scanner machines would probably be economical. This would require a fast optical switch that could be used to exchange the laser output beam described above between the two lithography machines, and would Ground transport It ’s complicated, but in some truly automatic situations, this women ’s volleyball team may be cost-effective. A technology for fast exchange of laser beams describes the advantages of this women ’s volleyball team in US Patent No. 5,852,621 (weighing the other And many serious disadvantages) is that the beam quality can be optimized based on the continuous operation of the laser. The alternative method of flail operation is to provide the laser near the electrode when the laser is not ignited. A heat source to add heat to the above-mentioned gas. This or will need to be-a very fast heat source, covering the above temperature cycle 'is within the range of I seconds of a pen second. A solution may be as shown in Figure 12 Zhongshou " 1 * is located downstream of the existing electrode, and some electrodes 90 that will only provide heat and no laser emission are provided. Other extremely fast-acting heating states available on the market can be used to minimize the above Temperature transient. Another solution is to provide a passive alignment with a large surface area. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm 478224 A7). (26) The heat sink is preferably located just downstream of their electrodes. This heat sink may absorb the heat from the gas when the above laser is used for laser emission, and will or will be during downtime. During this period, heat is added to the above-mentioned gas. This may have the above-mentioned effect of significantly reducing the above-mentioned temperature swing during the operation of the pulse wave group mode, and thus may reduce the change in the distance over which the reflected pressure wave travels. The above-mentioned non-woven fibers placed in the above-mentioned laser chamber are mainly used to absorb their pressure waves, which can provide the above-mentioned benefits of relaxing the temperature swing. Compared with laser gas of about 50 gm, the quality of these fibers , Is about 60 gm, and the specific heat of the above eight, 2 ... is higher than the specific heat of the laser gas. When there is a temperature difference between them, heat will be transferred very quickly between their fibers and the gas, so that their fibers will tend to alleviate the temperature swings inside the laser laser chamber (such as in Figure 2G) (Shown) Another way to disperse the pressure wave in space is to change the temperature, which can improve the gas temperature fluctuation in the long dimension of the discharge area. An easy way to accomplish this is to use a single-pass water-cooled heat exchanger whose water flow rate is low enough to span the length of the laser chamber described above, which can produce a large number of gradients. For example, a water flow rate of about 6 1 / m will produce about 400c. Eliminate this

A 40C gradient of line A will be generally picked up by the above-mentioned laser gas end body. The eighth result is that the earliest reflection at one end of the laser chamber will return about 1.5 cm before the earliest reflection at the other end. Go to the above-mentioned discharge area. Another solution is to change the size of the heat exchange fins along the length of the heat exchange, so as to establish a number of different area paper ruler at different temperatures along the length of the laser chamber—Medium_ 秦 (cns) A4 size ⑵Q χ 29 V. Invention Description (27) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

Domain 'to help split pressure waves that return to the discharge area. A preferred design is shown in Figure 20. The heat exchangers mentioned above should be designed to produce a zone-to-area temperature variation of at least 10 ° c. As indicated above, at 2000 Hz, a reflected wave will decrease in temperature every 2t: and be delayed by at least about 0.8 mm, so that their reflections from the bottom area will 1 (The same wave in the colder region of TC passes most of (at least) through the above-mentioned discharge area before reaching the above-mentioned discharge area. Another solution is to provide the same size heat sink along the length of the heat exchange, but it can Insulate the cross section of the 4th heating plate from the above cooling water pipe, so that these heat sinks can act as passive heat sinks, and tend to keep a flow area at some temperature averaged over time Active Wavelength Control-Pre-Driver (Using Slow Wavelength Control) The first preferred embodiment of the present invention uses its pre-existing wavelength control technology to provide a relatively slow and definable active correction of chirped pulses As shown in Figure 11C4, and as described in the accompanying article, the aforementioned jagged baffle can eliminate the major part of the non-linear FM pulse shown in Figure 11 (: 1. However, As shown in Figure 1C4, the wavelength of the pulse wave in the early 15 ms portion of the above-mentioned pulse wave group is, on average, a steady-state wavelength m0 26pm related to the above-mentioned pulse wave group. Some actual typical styles are shown in Figure 15A. Figure 15A shows two different laser chambers at different nominal laser gas temperatures, and the chirp generated by the evil. The graph is from a pre-ionizer with the above-mentioned upstream of the electrode shown in Figure 14.

This paper size is in accordance with Chinese National Standard (CNS) A4 specifications. 〇χ 挪 公公 5. Description of the invention (28) Shot to 'and the next two graphs are from a pre-ionization with the above-mentioned located in the downstream as shown in Figure 1. Laser room. These patterns are very consistent for a particular laser chamber at a particular nominal gas temperature and repetition rate. The lithography laser room operating in the pulse wave group mode can, in general terms, produce a development pattern of the phase s and k of the type shown in Fig. 15A. These relatively slow development patterns can be partially corrected using the relatively slow wavelength control of the preexisting art-type lithography lasers described above. For the type of control shown in Figure 3, this is accomplished by adjusting the mirror 14 in anticipation of a slow-developing chirp. For example, by significantly programming one of the above-mentioned stepping motors 15 stepwisely before a pulse wave, and 30 seconds (60 pulses) after the start of the pulse wave group, the program plans a Return to the beginning of the steady-state stepper position. The wavelength data shown in the 5 9 c curve in Figure 15 A may be trimmed to the one shown in Figure 15 B. It also shows the position of the mirror 14 for the stepping motor position adjustment described above. Based on the pre-existing technology type system shown in Figure 3, from the above signal to the movement, about 2 milliseconds elapse before the above-mentioned mirror starts to move, and the above-mentioned mirror must be pivoted to generate an equivalent of a stepper motor A step size of a 0.10 pm wavelength change will take about 5 耄 seconds. Readers should note that with the above-mentioned active chirp pulse control, all pulses (except 2 or 3 pulses) are within 0.05pm of the above-mentioned target wavelength. This is a significant improvement of the original data when there are more than 50 pulses deviating from the target and greater than 0. The fact that their first 2 or 3 pulses have excessively long wavelengths is not a serious problem, especially for lithography scanners, which cover only a small part of these pulses and are used in 478224 Printed A7 by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs —----— B7__ V. Description of the Invention (29) The above-mentioned wafers are also in the grain region. Therefore, in this preferred embodiment, the above-mentioned laser operator must be familiar with the wavelength pattern of each specific lithography laser, and program the above-mentioned laser control in order to anticipate the above-mentioned pulse wave group. Slow chirp at the beginning. To assist the above operators, our applicant provides a software that allows the operator to insert two parameters (called, configurable values) into the laser control described above. These two configurable values are The number of steps of the initial deviation, and the deviation period (in milliseconds) of not less than 7 seconds. So for example, in the case of Figure 15B, these configurable values may be "丨" The above-mentioned technology is a type of "pre-driver", in which the operator can trace the above-mentioned laser 'at some time before and / or during a pulse group' to complete a certain Some specific wavelength adjustments. As in the example above, the above purpose may be to maintain the wavelength, within a narrow range of desired wavelengths, or it may be during the above-mentioned pulse wave group, to produce a desired Wavelength change. Smaller step The smallest full step of the above-mentioned pre-existing stepping motor (model 18503 provided by Oriel Instrument in Stratford, Connecticut). It is about 2 microns, which is reduced in size. Than 丨) to produce a about 7 5 nm mirror movement, and a wavelength change of about 0.1 pm. The above motor can be moved in half-step increments to produce a change of 105 pm. The same step motor supplier mentioned above can supply one A stepping motor with a double range. It is a model 1 85 12. The above improved control is provided by using the model 1 85 12 and providing a reduction ratio of 50 to 1. Therefore, based on this paper size Applicable to China National Standard (CNS) A4 specification (210 X 297 mm): ---. 1 L--II ------- Order --------- line · (Please read first Note on the back, please fill out this page) 32 478224 A7

V. Description of the invention (30) The change in the printing of 1 order by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, the above-mentioned step increment will be reduced to 0.05_ > Reduced to 002 邛 ^. This will accommodate: in wavelength control, there is such a fine resolution-a significant improvement. Second preferred embodiment (learning algorithm with slow control) In a second preferred embodiment, their laser control is programmed to test the type shown in Figure 15A, and Calculate appropriate values related to the initial deviation and the deviation period. A simple learning program is shown in the form of a block in Fig. 15C. It can be used to modify one of the chirp pulses in the pulse group N based on the data from the previous pulse group N-1. As shown in Figure 15C, a zero-valued step position, SPc, will be recorded to indicate the step of the above N-1 pulse wave group in equilibrium (that is, at the end of the pulse wave group). Into the position. The average wavelength of their last 30 pulses, and the average wavelength of pulse waves 2-60 related to the pulse group N-1, will be determined. A difference will be calculated, and this difference will be used to preset the stepping motor position (SPC) mentioned above, or a step in or out, each of which will produce a 0.1 lpm Of correction. In this simple learning algorithm, the above-mentioned stepping system is significantly ahead of the beginning of the pulse wave group, and the signal used by the above-mentioned stepping motor to return to zero is planned by the program as the beginning of the pulse wave group. It is known that 30ms, so that the position of the above-mentioned mirror will be about 7 ms after entering the above-mentioned pulse wave group, and return to its steady-state (zero) position. According to the above-mentioned different performance method 'right / 1 / 2-60-^ 3. The absolute value of the pulse wave group N-1 is less than 0.05pm. The step adjustment related to the pulse wave group N is the same as that related to the pulse wave group N-1. The paper size of the chirp pulse paper in -1 applies to China National Standard (CNS) A4 (210 X 297 mm) ------------- ^ -------- ^- -------- ^ (Please read the notes on the back before filling in this page) 33 478224

The pulse is negative because of the result of the positive correction step in the pulse group N · 1, or if the chirp pulse in the above pulse group N-1 is positive because of the result of the negative correction step in the pulse group N ′ Then, in the pulse wave group, no correction step is performed. With the small stepper mentioned above, the algorithm depicted in Fig. 15c should be modified to reduce the 0lpm dead band suggested in Fig. 15C. At a step of 0.05pm, ± 05 of Figure 115C is best changed to soil 0025. Alternatively, if half-stepping can be used, the above dead band can be reduced to 0.0125pm. Fast wavelength meters provide fast control of wavelengths, such as at intervals shorter than the time between their pulses (0.5 ms for a 2000 Hz laser). It would be advantageous to wait between pulses. The typical pre-existing art lithography laser, almost always takes 2 ms to measure the above wavelengths. A description of a wavelength meter and a technique related to measuring wavelengths is provided in U.S. Patent No. 5,991,324, which is incorporated herein by reference. The following is a description of a similar wavelength meter that has been modified to record the necessary information described above and perform the necessary calculations described above to determine a wavelength of less than 420 microseconds. As shown in Figure 16, the output beam from the laser chamber meets the partially reflective mirror 170 described above, which can pass about 95.5% of the beam energy, and can reflect about 4.5%, Wavelength meter 120. The above 4% of the reflected light beam is reflected by the above-mentioned mirror 171 to an energy detector 172 composed of an extremely fast photocell 92, which can be used in accordance with the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) ---- 卜 ιί! Φ (Please read the note on the back? Matters before filling out this page) Order --------- line! Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 34 478224 A7 B7 Printed by the Consumers' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Wave energy. A typical pulse wave energy is about 10 mJ, and the output of the above-mentioned detector 69 is fed to the above-mentioned computer controller 102 (Figure 12), which uses a specific algorithm (described in the United States) Patent No. 6,005,879, which is incorporated into this specification by reference) in order to adjust the above-mentioned laser charging voltage, and based on the stored pulse wave energy data, precisely control the pulse wave energy of their future pulse waves, thereby Restrictions on the energy variation of their individual pulse waves and the integrated energy of the pulse waves of their pulse wave groups are all described below. About 4% of the light beam passing through the mirror 171 is reflected by the above-mentioned mirror 173 through a slit 177, to a mirror 174, to a mirror 175, back to the above-mentioned mirror 174, and to an eschelle grating 176. Above. The above beam is collimated by a lens 178 with a focal length of 458.4mm. The light waves reflected from the grating 176 and traveling back through the lens 178 are reflected again from the mirrors 174, 175, and again from the mirror 174, and then reflected from the mirror 179, and focused on Above the left side of the linear light emitting diode array 180. The position of the light beam above the light emitting diode array is a rough measurement of the relative nominal wavelength of the output light beam. About 90% of the light beam passing through the mirror 173 is reflected from the mirror 182, passes through the lens 183, and enters a standard sample 184. The above-mentioned light beam leaving the standard sample ι84 will be focused by a 458.4mm focal length lens in the standard sample, and will be reflected by the two-sided mirror shown in FIG. Interference fringes are generated in the middle and right side of the polar array 180. ------------ I · I I I ---- Order · -----— II (Please read the notes on the back before filling this page) 35 A7

Linear Light Emitting Diode Array Printed by Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs

The above linear light emitting diode array 18 is a integrated circuit chip ′ which includes 1G24 separate light emitting diode volume circuits and a related sampling and holding readout circuit. The above-mentioned light-emitting diodes are spaced 1 to 2 meters apart from each other and the total length is 25.6 mm (about 1 mm). Each luminescent diode system is 500 microns long. Their similar light-emitting diode arrays can be supplied from several sources. -The preferred supplier is Hamamatsu. In the Xingjiajiabei example, we use a model ^ men *, which can be read at a rate of 2.5 x 106 pixels per second based on 0. They are all 1〇 A scan of 24 pixels can be read at a rate greater than 2000 Hz. A faster array for offices in California

The Sunnyvale EG & G Reticon supplied the model 2048 PAQ PDA at a frame rate of 16.875 GHz and was read at 2,048 pixels. Calculation of Coarse Wavelength The coarse-wavelength optics in the above-mentioned wavelength meter module 120 will produce a rectangular image of about 0 · 25 mm × 3 mm on the left side of the above-mentioned light emitting diode array 180. Ten or eleven of the illuminated light-emitting diodes will produce some signals proportional to the intensity of the radiation received, and these signals will be read by a processor in a wavelength meter controller i 97 Access and digitization. Using this information and an interpolation algorithm controller 97, the center position of the above image can be calculated. This position (measured in pixels) is converted to a coarse wavelength using two correction coefficients and a linear relationship between their positions and the wavelength.

This paper size applies to China National Standard (CNS) A4 (21〇 X 297

36

_. r & Printed by Employee Consumer Cooperatives of the Ministry of Economic Affairs

. These correction factors are determined by referring to the Atomic Wavelength Multiple Sources as described below. For example, the relationship between their image position and wavelength may be the following algorithm: A = (2.3Pm / pixel) p + 248,350pm where P = fast calculation of the fine wavelength at the center of the coarse image Instrument, in general, must be able to measure the wavelength and bandwidth in real time. Since the laser repetition rate mentioned above may be 2 kHZ or higher, it is necessary to use some accurate but not computationally intensive algorithms in order to be able to process electronic circuits economically and lightly to achieve the desired performance. Preferably, our applicants use integers instead of floating-point math, and their operations are all linear (or use square root, sine, logarithm, etc.). Specific details of a preferred algorithm used in this preferred embodiment will now be described. Figure 16B is a curve with 5 peaks as shown, which shows a typical standard sample stripe signal measured by a linear light emitting diode array ^ 80. The above-mentioned center peaks are drawn at a lower height than others. As light waves of different wavelengths enter the above-mentioned standard sample, the above-mentioned center peak value 'will increase and decrease, and sometimes it will become zero. This feature makes the above-mentioned center peak unsuitable for the above-mentioned wavelength measurement. Their other peaks' will respond to changes in the wavelength and move towards or away from the above-mentioned center peaks, so that the position of these peaks will determine the above-mentioned wavelengths, and at the same time their widths will be measurable Out of the above-mentioned laser bandwidth. An area labeled "Data Window" is shown in Figure 16B. The above-mentioned data window 'can position the stripe closest to the center peak in the above position, which is usually for the size of this paper. Chinese National Standard (CNS) A4 Specifications (210 X 297 mm) -------------- Packing— (Please read the precautions on the back before filling this page)-Line · 37 478224 A7

478224 A7 V. Description of the invention (36) In terms of differences, they can set the above 50% level boundary to find their left and right half-maximum positions, and they are labeled as eight and six in Figure 6A. B. These positions are calculated using an integer data format to a fraction of one pixel, such as 1/16. Steps 2 and 3 are duplicated on the two data windows described above to obtain a total of four interpolated 5. %position. As indicated in Figure 16B, they will be accounted for. D1 is the diameter of the inner stripes, while D2 is the diameter of the outer stripes. 5. An approximate value of the above-mentioned wavelength is determined by the coarse-wavelength circuit described in the above section, "The calculation of the coarse wavelength". Calculation of Fine Wavelength

The inner and outer fringe diameters D1 * D2 (in pixels) are converted into wavelengths by the following equations: λ = λ 〇 + Cd (D2-D〇2) 4- N FSR line where λ = The wavelength λ corresponding to the diameter D 〇 = corrected wavelength Do = corresponding to the wavelength; the diameter 10 of Cd = correction constant according to its optical design FSR = free spectral range of the standard sample N = integer, = 〇, ± ι, ± 2 , ± 3 ... The above values λ G, K !, FSR, and DG are determined and stored at the time of the above correction. The above N-related values are chosen so that:

\ ^-Xc \ & M2FSR Where, λ c = Coarse wavelength decision value. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm 478224 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Λ7 B7 V. Description of the invention (37) For example, in the preferred embodiment, We choose a reference wavelength; U = 248,327.1pm (corresponding to an absorption line of an iron hollow cathode tube). At this wavelength, the above-mentioned stripe diameter D0 may be found to be 300 pixels. Cd Is a constant that can be measured directly or can be calculated from the optical design described above. In our preferred embodiment, Cd = -9.25x 10-5pm / pixel 2. Therefore, for example, using the above The laser operates at a different wavelength, and the diameter of the above fringe may be measured as 405 pixels. The possible wavelength calculated by equation (1) is:

Input = 248,327.1pm-9.25 X l〇, m / pixel 2 [(4〇5) 2 _ (30〇) 2] + NX FSR = 248,333.95 + Ν χ FSR if the above free spectral range FSR == 20pm , Then the possible values mentioned above include: 248,293.95pm N = -2 248,3 13.95pm N = -l 248,333.95pm N = 0 248,353.95pm N = + l 248,373.95pm N = + 2 If the above coarse wavelength, It is measured as e = 248,350. For example, the above processor will choose the value above = 248,3 53.95pm (N = +1) as the closest e solution above. The inner and outer fringe diameters Di and d2 as shown in Fig. 16B are respectively converted into wavelengths i and 2 respectively. The final values reported above for the laser wavelength are the average of these two calculated values: This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love)! · Ί 1 · ----- -(Please read the notes on the back before filling this page) Line 40 478224 A7

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Wu 190 is used to calibrate the above-mentioned wavelength meter 12 (). This is accomplished by adjusting the above-mentioned laser wavelength while keeping the above-mentioned output energy to maintain the constant displayed by the above-mentioned price detector 69 while monitoring the output of the light-emitting diode 196. § The above-mentioned light-emitting diode 196 shows a large reduction in output, and at the same time, the above-mentioned light-emitting diode 69 shows normal output. The wavelength of the above-mentioned output will necessarily correspond to the above-mentioned iron vapor absorption line 248 327i. nm The position data corresponding to the stripes of the standard sample, and the position data corresponding to the image generated by the grating 176 on the linear light emitting diode 180 when the output of the light emitting diode 196 is the lowest, will be The above-mentioned wavelength meter controller 197 detects and records, and this data will be used by the above-mentioned wavelength meter controller 197 to calibrate the above-mentioned wavelength meter 120. Because the microprocessors related to wavelength measurement have only 5000 microseconds between the pulses of a 2000Hz laser, their wavelength force must be calculated in significantly less than 500 microseconds, in order to have the opportunity to move forward immediately The pulse wave's wavelength error corrects an impending pulse wave. As described above, the above-mentioned light emitting diode array 180 can be read at a rate of 2 x 106 pixels / second. The above-mentioned data will be read into a buffer storage memory, so that the processing of the above-mentioned data can be started during the above-mentioned reading period. The data processing required for the above calculations and executions should preferably be completed with a 25 MHz microprocessor of a model 68332 supplied by Motoola. Our applicants have decided that this inexpensive processor can operate at 43 MHz with a superclock without degrading performance. In a preferred arrangement, all data is read from the PDA 180, and the above-mentioned wavelength calculation is completed in a period of 420 microseconds, and the next pulse is allowed

This paper size applies to China National Standard (CNS) A4 (210 χ 297 public love

478224 A7 B7 Printed by Employees-Consumer Cooperatives of the Ministry of Economic Affairs and Intellectual Property Bureau V. Description of Invention (40) In front of the group, there are 80 microseconds to move the above-mentioned mirror 14. Quick Mask Adjustment Figures 12, 12 A, and 12B show an arrangement that allows extremely fast adjustment of the mask 14 described above. This embodiment is an important acceleration compared with the above-mentioned pre-existing technique, but it is not quite fast enough to adjust the pulse wave to pulse wave. As mentioned earlier, their pre-existing art-style mirror positioning method 'will require about 7 ms to move the above-mentioned mirror 14 and it is not possible to generate a pulse-to-pulse wavelength correction at 2000 Hz. In the above-mentioned prior art technique, a lever arm is pivoted about a pivot axis to compare with the movement of the above-mentioned step position ', resulting in a deceleration of 1 to 25 of one of the above-mentioned mirror movements. The above-mentioned pre-existing technology type stepper has a total stroke of 1/2 忖 (12.7 mm) and 6000 steps, so that each step is a distance of about 2 micrometers. With the above-mentioned deceleration of 1-25, one step can move the above-mentioned mirror by about 75 nm ', which usually can change the wavelength of the above-mentioned laser wavelength by about 0 lpm. In the fast-moving technology shown in Figure 12A, a piezoelectric stack 80 has been added to the pivot position of the stem arm. A preferred piezoelectric stack is a model P-840.10 supplied by Physik Instrumente GmbH in Waldbronn, Germany. This bunch will change with a driver voltage of 10 volts, resulting in a linear adjustment of about 1.5 microns. This range is equivalent to about 10 steps into the motor. The above pile can respond to a control signal in less than 1 microsecond, but it will take about one millisecond to move the above-mentioned bulky mirror i4 and the mask frame 86. Therefore, in this embodiment, the wavelength of the above-mentioned pulse-to-pulse wave ^ -------- ^ --------- ^ (Please read the precautions on the back before filling this page )

SUMMARY OF THE INVENTION (41) It is not feasible. However, this embodiment can provide an improvement of up to factor 7 over the prior art design with a 7 leap second latency. Therefore, it can provide very fast feedback control. A better feedback control algorithm is described in Figure 12C. In this algorithm, the above wavelengths will be measured for each pulse, and an average wavelength will be calculated for their last four and last two pulses. If any average value is less than 0.02pm from the above target wavelength, no adjustment is made. If the deviation between the two and the above target is greater than 0.02pm, the above-mentioned piezoelectric stack 80 will complete a trimming of the above-mentioned mirror assembly to provide a wavelength correction. Which of these two averages is used is determined by how much time has passed since the last adjustment. The above-mentioned piezoelectric stack is maintained within its control range by making the above-mentioned stepping motor step by step as the above-mentioned stack approaches 30% and 70% of its range. Since the above stepper motor 'requires about 7ms to complete one step, the above algorithm' may complete the piezoelectric adjustment several times during the stepping of the -stepper motor. Pulse-Pair-Pulse Feedback Control Figures 13A and 13B show a mirror control arrangement that allows for adjustment of the above-mentioned mirror faster than 80 microseconds, so that the above-mentioned pulse-pair-pulse The correction can be performed at a pulse wave repetition rate of 2000 Hz. In this case, the above-mentioned piezoelectric stack 80 is replaced by a metal bracket 80A. Second, and instead, the above-mentioned piezoelectric adjustment is based on the light-weight surface with the ribs MB attached. The mirror 14A is provided so as to move relative to the very heavy mirror frame 86a. The above-mentioned face mirror 14A is a spherical piece printed by their adjustable tension elements 89 to keep them pressed tightly at the ends of their stacks 88A, 88B, and 88C. 2. Description of invention (42) Above the contact. In this embodiment, these piezoelectric stacks can provide extremely fine adjustment of the position of the above-mentioned mirror 14A relative to the mirror frame 86A. As shown in the above example, the total adjustment range of the piezoelectric elements 88, 88B, and 88C can be extremely small, such as about 1.5 microns, and the large adjustments of the cover are provided by the above-mentioned stepping motors. and also. The light mirror with three piezoelectric elements can be adjusted in a very small distance similar to about 0.1 micron, and can be adjusted in a range of about 10 microseconds.

> Extremely fast. The position of the above-mentioned mirror can be adjusted by moving the above-mentioned driver 88A in one direction, and moving their drivers 88B and 88C 'in the opposite direction, or by moving only the above-mentioned driver 88A. As shown in the pre-existing example above, the better control algorithm depicted in Figure 12D 'will require a step if the above-mentioned piezoelectric position reaches a control range as low as about 30 or as high as 70% The motor does stepping. This provides a control range without stepping motor and 160 nm, which is equivalent to about 0 gpm to about 1.6 pm (depending on the use of one or three piezoelectric actuators). Therefore, the above-mentioned extremely fast piezoelectric control 'has a range sufficient to substantially control the variation of all linear frequency-modulated pulses. As indicated in Fig. 15A, they are usually within the range of ± 0.1 pm. The changes in their larger wavelengths are provided by the stepping motors described above. The algorithm depicted in Figure 12D can provide the pulse-to-pulse control of the above laser wavelengths, while allowing the extremely fast mirror design shown in Figures 13A, 13B, and 13C to be used as the second Pulse wave correction. The algorithm described above in Fig. 12D can wait for the completion of a pulse n, which can be redefined as pulse N-1. It can measure the wavelength of the above-mentioned pulse wave, which can make the paper size timely standard (CNS) A4 (210 X 297 public love). -------- Order --------- (Please read the notes on the back before filling out this page) 45 478224 Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (43) It is compared with a target pulse wave, and the reactor can be moved 88A, 88B, and 8 8 C or 8 8 A to provide the desired wavelength correction as described above. All these systems are completed before the pulse wave N, so that the above-mentioned mirror will be moved, and will be stationary at the time of the pulse wave N described above. If any stack is outside its range of 30% to 70%, the above-mentioned stepping motor will complete a step. The aforementioned exercise method 'will then move the stacks outside the above range back to the above 30% to 70% range. The positions of the above piles are based on their control voltages. The above algorithm can be modified so that if the absolute value of "λE" above is less than a specified small value of 20% of a standard value related to a variation in wavelength, the piezoelectric adjustment is not performed. Pre-adjustment and active modulation The embodiments described above can be used for other purposes of chirp pulse correction. In some cases, an operator of an integrated circuit lithography machine may wish to change the wavelength on a predetermined basis. In other words, the above-mentioned target wavelength λ T may not be a fixed wavelength, but it can either follow a predetermined pattern or update the learning algorithm continuously or periodically due to the use of early historical wavelength data or other parameters. As a result, it is arbitrarily changed multiple times. Determination of the position of the mirror In some cases, it may be desirable to control the above-mentioned wavelengths by specifying some specific mirror positions. This can be accomplished with the embodiment shown in Figure 17 and the figure. In this embodiment, a diode laser 86 can provide a light beam reflected from the mirror 14C, and the reflected light beam will be focused on the light-emitting diode array 9 () to determine The above-mentioned mirrors have the same paper size as CNS A4 (21G X 297 ^ 5 ". R I ^ ------- ^ --------- ^-(Please read first Note on the back, please fill out this page again) 46 478224 ___B7 V. Pivot position of invention description (44) 14C. This arrangement can allow the above-mentioned mirror to have a precise position without having to operate the above-mentioned laser to make a The actual wavelength measurement. This is very important when you want to position the mirror in advance. Figure 17A illustrates an example to increase the optical distance between their mirror 14C and the PDA array to improve the precision of the above-mentioned pivot measurement. Technology. Deformable Modulation Mask

Printed by the Ministry of Economic Affairs Intellectual Property-Bureau Consumer Cooperative Figure 18 illustrates the use of a segmented modulating mirror, where each $ mirror segment is controlled by its own piezoelectric actuator 14B1_5 . Each segment can be operated extremely quickly. This embodiment has the additional advantage of increasing the bandwidth of the laser, covering each horizontal part of the beam, which can be individually controlled. This embodiment also has a PDA 124 that determines the position of each segment. The above light wave is provided by a mercury lamp 114, and the UV light wave will pass through a slit 1 16 and a collimating lens 118. In this case, the above-mentioned light beam is expanded by the same beam expander used to expand the laser beam, and five small lenses can focus a light wave from each mirror onto the separate part of the PDA. . The purification grating surface purification line narrowing kit is well known; however, the above-mentioned pre-existing technique teaches that the aforementioned purification fluid does not directly flow on the above grating surface, so that the aforementioned purification fluid is usually transmitted through a Vapor holes are provided at positions similar to the above-mentioned grating surface. However, our applicants have found that under their extremely high repetition rates, a layer of hot gas (nitrogen) will develop on the above grating surface, which will distort the above wavelengths. This distortion can be added at least in part by the above-mentioned active wavelength control. This paper rule & Caiguan House Standard i ^ CNS) A4 specification ⑵: 297 mm

I was right again. Another solution is to quantify the grating surfaces as shown in Figures 19a, i9B, bC, and 囷. In Fig. 19A, some small holes (spaced 丨 or 1/4 inch) above the top of the purification pipe 61 having a length of 3/8 inches in diameter can provide the above-mentioned purification fluid. Other technologies are shown in Figures 19B, 19C, and 19D. The present invention can complete various modifications without changing its defined scope. All of the above are just some examples of the invention. Those skilled in the art will readily understand that many other variations and modifications can be made without departing from the spirit and scope of the invention. For example, the above-mentioned mirror 14 can be adjusted by other fast-moving mechanisms similar to a piezoelectric driver that can provide a sufficient modulation range that the stepping motor does not require. Some voice coils can also be used to quickly locate the aforementioned mirrors. Therefore, the above disclosure is not intended to be restrictive, and the scope of the invention is determined by the scope of the attached patent application. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

This paper size applies to China National Standard (CNS) A4 specifications (2) 〇X 297 issued. HlMl · — — · ------- Order --------- line— (Please read first Note on the back, please fill in this page again) 48 478224 A7 B7 V. Description of the invention (46) The reference of the component number is printed by the Consumer Cooperative of the Ministry of Economic Affairs of the Ministry of Economic Affairs

2 .. Laser system 3 .. Laser chamber 4 .. Oscillator 5A ... Frame 7 .. Line narrowing module, line narrowing sleeve

Pieces, LNP 10.12 ... Electrode 10 ... Fan 14 .. Pre-adjusting mirror, modulating mirror 14A, 14C ... face mirror 14B ... ribs 14B1-5 ... piezo driver 15. .. Stepping motor 16. .. Grating 18 ... Three-beam beam expander 20A ... Motor-controlled bending mechanism 22 ... Beam output monitor 24A ... Computer controller 30 .. Grating curve Degree stepper motor 32 .. slab stepper motor 34 .. discharge area 34 ... RMAX inclination stepper motor 36 .. laser chamber position stepper motor 3 6 A, 3 6 B .. .Long electrode 3 8… fan 40 .. heat exchanger 42 .. main insulator 44 .. anode support rod 46 .. pre-ionizer rod 46 .. pre-ionizer 60.62.64.66.68 .. 61 .. Purification tube 69 .. Detector, light-emitting diode, mirror 70, 72 .. 80 .. Piezo stack 80A ... metal bracket 82 ... stepper Motor 84 ... Lever arm 86 .. Diode laser 86, 86A ... Face lens frame 88A, 88B, 88C ..... 88 88, 888, 88 (: ... Driver 89 ..... adjustable Tension element 90 ... Electrode, light-emitting diode array -------- Order --------- (Please read the precautions on the back before filling this page) This paper ruler Applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 49 478224 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (47) 92. The mirror position processor, photo battery 176. .. eschelle grating 102 ... laser controller, computer controller 177 ... slit 104 ... extremely fast wavelength meter 178, 183, 193, 195 ... lens 106 ... LNP processor 180. ..PDA 114 .. · Mercury lamp 180 ... Linear light emitting diode array 116 ... Slit 184 ... Standard sample 118 ... Collimating lens 188 ... Optical fiber input 120 ... Wavelength meter 190 ... Atomic wavelength Reference unit 124 ... PDA 191 ... Opening 17 0 ... Partial reflective mirror 194 ... Neon iron vapor lattice 171, 173, 174, 175, 179, 182, 196 ... Light-emitting diode 1 8 6 ... Face 172 ... Energy Detector 197 ... Wavelength Meter Controller --.----- i--1 l · --- I ------- Order --- ------ Line--Awl (Please read the precautions on the back before filling out this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 50

Claims (1)

Sixth, the scope of patent application for electrical discharge lasers with active wavelength chirping pulse mitigation 'includes: A) a laser chamber; B) a long electrode structure installed in the laser chamber, which includes a long A shaped anode and an elongated cathode are separated by a distance that can define a discharge area. The above discharge area defines a long dimension in a beam direction; C) a lightning contained in the laser chamber D) a fan that allows the laser to circulate in the laser chamber and pass through the discharge area; and E) an active chirp pulse mitigation tool that can be used to mitigate wavelength chirp pulses. 2. As the laser applied for in the patent application No. 丨, the pressure active linear frequency modulation pulse tool includes a modulation mirror and an adjustment tool, which can adjust the modulation above the pulse wave of a pulse wave group. The position of the mirror mitigates one of the chirp pulses that occurred in an early part of the above-mentioned pulse wave group. 3. As for the laser applied for in item 2 of the patent application scope, the early occurrence of chirp pulses has a period of several milliseconds. 4. The laser as claimed in item 2 of the patent application scope, wherein the adjustment tool includes a stepper motor. 5. The laser as claimed in item 2 of the scope of the patent application, wherein the adjustment tool includes a processor, which is programmed with a learning algorithm in order to learn the shape of the aforementioned chirps that occur early. 297 mm) ▲ This standard is translated to the Zhongguanjia Standard (CNS) A4 specification (21 (Γ 51 A8 B8 C8 08) Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Scope of patent application. The applied laser, the chirping tool for chirping in China, can be configured to provide adjustment of their mirrors within a time period of less than 2 milliseconds. 7. As requested in the first scope of the patent application Laser, a chirping tool for chirping in chirp, can be configured for adjustment of their mirrors within a time period of less than 5000 microseconds. Among them, the active linear frequency-decreasing pulse mitigation tool includes a piezoelectric device. 9. The laser as claimed in item 8 of the patent scope of Shenyan, among which the active linear frequency-modulation pulse mitigation tool also includes a device having a Stepping motor of external mandrel. The laser applied in Guaru for item 9 of the patent application range, among which the active chirp pulse mitigation tool also includes a lever arm that moves around a pivot axis to frame, so that Narrow down the above The linear movement of the axis. 11. As the laser applied for in the patent application No. 丨, the active linearizer pulse mitigation tools include:-a stepper motor for coarse wavelength control, and a fine wavelength control 12. The piezoelectric device as claimed in item 丨 of the patent application scope, which further includes a pressure wave mitigation tool, which can be used to prevent the discharge area of the pressure wave caused by the reflected discharge. The change caused by the temperature within the time of arrival. 13_ As for the laser applied for in item 12 of the scope of patent application, the pressure wave mitigation tool includes at least-a baffle plate with a cross section of the shape of a tine. 111 — — — — — — — — — · · IIIIIII Order · — — — — — — — — * 5 ^ (Please read the notes on the back before filling this page) 52 4/8224 6. Scope of patent application S Office staff consumption stamps 14. As for the laser applied for in item 13 of the scope of patent application, the cross section of the zigzag shape is the zigzag with varying shape. 15. As for the laser applied for in item 14 of the scope of patent application, the sawtooth can define some distances ranging from about 0.390 inches to about 0.590 inches, and their south range of sawtooth is from about 012 inches to about 0.280 inches. 16. The laser as claimed in item 13 of the scope of patent application, wherein the sawtooth is usually aligned in a direction perpendicular to the above-mentioned beam direction. 17 ”The laser applied for in item 13 of the scope of Shenyan's patent, in which the 截面 κ cross section of the tooth shape is formed in the wall of the laser chamber. 18. The laser as claimed in item 13 of the patent application, wherein the baffle plate is composed of nickel-plated aluminum. 19. The laser as claimed in item 13 of the scope of patent application consists of a metal acoustic wave diffuser plate. 20．The laser 'applied as in item 12 of the scope of patent application is a 2L laser as claimed in item 20 of the scope of patent application, of which 2L The grooves can cause interference between the force waves themselves in shape so as to scatter the waves in many directions not perpendicular to the direction of the beam. 22. The laser as claimed in item 12 of the scope of patent application, wherein the moderator includes some unwoven loosely stacked fibers. 'As for the laser applied for under item 22 of the patent application, the fibers are some alumina fibers. 24. The laser as claimed in item 22 of the scope of patent application, wherein the fiber is only composed of a cone and yttrium. · One of the baffles is ordered, one of which is the easing straight line i paper ruler Qian Shuguan Jiaxian (CNS) A4 secret (χ 53 A8 B8 C8 Sixth, the scope of patent application 25. The laser applied in item 12 of the scope of patent application, which further includes a heat 2: exchanger 'which can be configured in the above laser gas in the direction of the above beam, Generate a temperature gradient at least deducting it 6. The laser as claimed in item 12 of the Shenjing patent scope, wherein the mitigation tool includes a heat exchanger, which can be configured in the above-mentioned laser to The temperature of the laser gas can be changed in increments of at least 10 ° C along the direction of the above-mentioned light beam. 27. The laser as claimed in claim 12 of the patent scope, wherein the mitigation tool includes a fast-acting gas heater system which can be positioned to apply heat to the above-mentioned laser during the laser down time. The amount of laser gas is about 4 when the laser is in operation, the heat added to the gas by the discharge between their electrodes. 28. The laser, as applied for in item 12 of the patent scope, can be programmed to operate continuously at a repetition rate of more than 1000 Hz, and it can be used as a configuration for at least two separations. The light source of the stepper or scanner system can alternately provide the pulse wave of the pulse wave group to the above two systems. 29. The laser as claimed in item 12 of the scope of patent application, at least two of which are stepper or scanner systems, are part of a single stepper or scanner machine. 3〇 · ——Electrical discharge laser with active wavelength chirp pulse mitigation, which includes: A) —Laser chamber; III I ---- — — — — — · IIIIIII order — — — — — — — I- (Please read the notes on the back before filling out this page) -54478478 A8 B8 C8 6. Scope of patent application Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs B) A long electrode structure installed in the above laser room, which includes a long anode and a long cathode, which can be defined by one A discharge area is separated by a distance. The above-mentioned discharge area defines a long dimension in a beam direction; c) a laser gas contained in the above-mentioned laser chamber; D) a above-mentioned laser can be placed on the above-mentioned The laser indoor circulation and the fan passing through the above-mentioned discharge area; E) — a wavelength meter that can measure the above-mentioned centerline wavelength; F) — a wavelength modulation mechanism; and G) — a feedback control system that can use them from the above The measurement information of the wavelength meter is used to control the aforementioned modulation mechanism so as to actively control the wavelength chirp pulse. 3 1. The laser as claimed in item 30 of the scope of patent application, wherein the modulation mechanism includes a modulation mirror and an adjustment tool, which can adjust the modulation mirror in the pulse wave front of a pulse wave group. Position, while alleviating one of the chirp pulses that occurred in an early part of the above-mentioned pulse wave group. 3 2 • The chirp pulse occurred early in the laser 'applied in item 31 of the scope of patent application, which has a period of several milliseconds. 3 3. The laser as claimed in item 31 of the scope of patent application, wherein the adjustment mechanism includes a stepper motor. 34. The laser as claimed in item 31 of the scope of patent application, wherein the adjustment mechanism includes a processor, which is programmed with a learning algorithm to learn the shape of the above-mentioned early-generated chirp pulses. 35. As for the laser applied for in item 30 of the scope of patent application, the paper size of the modulator is applicable to the Chinese National Standard (CNS) A4 specification (210 x 297 mm) -------- ·% -------- Order --------- line --J --- ^ (Please read the notes on the back before filling this page) 55 ^ / ^ 224 AS B8 C8 D8 The scope of the patented structure 'can be configured to provide adjustment of their mirrors within a time period of less than 2 seconds. 36. For example, the scope of the application for the patent is 30% of the time; the modulation mechanism 'can be configured to provide adjustment of their mirrors within a time period of less than 500 microseconds. A The laser as claimed in item 30 of the scope of patent application, wherein the modulation mechanism includes a piezoelectric device. 38. The laser as claimed in item 30 of the scope of patent application, wherein the modulation mechanism also includes a stepping motor with an external mandrel. 39. The laser as claimed in item 30 of the scope of patent application, wherein the modulation mechanism also includes a lever arm that pivots about a pivot axis in order to reduce the linear movement of the external mandrel. 40. The laser as claimed in item 33 of the scope of patent application, wherein the modulation mechanism includes: a stepper motor capable of coarse wavelength control, and a piezoelectric device capable of fine wavelength control. ---------------- ^ (Please read the notes on the back before filling out this page) ~ Printed by the employees of the Intellectual Property Department of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 56