478044 經濟部智慧財£局員工消費合作社印製 Α7 Β7 五、發明説明（） 發明領域： 本發明係提供一種半導體製程，係能在電獎式化學氣 相沈積設備製程中*自動產生監測反應室内電漿輻射光狀 況之方法及糸統。 相關技藝說明： 習用化學氣相沈積設備（CVD)，係由數個基本的子糸 統組成。其子糸統是射頻功率糸統、電子電路糸統、真空 歷力糸統、晶圓傳輸糸統、溫度控制糸統、製程反應室糸 統、真空壓力糸統及氣體糸統。 設備機台主體設有一個機台控制器，負責整個機台動 作的控制，並且與上述子糸統間Μ類比或數位訊號來進行 溝通。 其中射頻功率糸統主要是由射頻功率產生器和阻抗匹 配藕合器組成。而射頻功率產生器透過本身的感測電路， 檢知傳送至反應室的實際功率和反射功率，然後Μ訊號傳 送告知機台控制器，Μ提供機台完成監控功率輸出的功能。 透過射頻功率產生器而傳送的功率，可將反應室中的 氣體被解離成高能雛子狀態（電獎），然後與其中被加工 之晶片上表面的氣體分子發生化學反應，而產生需要的固 態沈積。 整個化學氣相沈積設備處理晶元的加工製程，在反應 室中電獎的產生與杏及產生良否，會直接影響到晶圓製作 的成敗。 在反應室中影響電獎的狀態，與1.射頻功率大小、2. -2- 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） I---------^------1Τ------0 (請先閱讀背面之注意事項再填寫本頁) 478044 Α7 Β7 五、發明説明（） 術，並於觀念上有所突破，終於完成本發明。 本發明之目的，係在提供一種能自動監控反應室内電 獎反應结果之輻射光有否及良否之方法和糸統。 本發明之再一目的，係在提供一種能直接簡易匹配於 傳統反應室使用，能自動監控電獎輻射光之方法和系統。 由於上述目的之達成，本發明具有下列五大優點： 1. 可Μ提升作業人員之監控機台數*降低生產墳下之直 接人事成本費用。 2. 可Μ增強製程機台電漿狀態真實反應情形之監控功能。 3. 可Μ正確偵測出反應室內電賭化有無及良否之情形， 而可Μ積極介入控制改進及/或中止製程，而降低晶 圓加工件不良率。 4. 可Μ應用到反應室壓力狀態、射頻功率功率糸統及反 應室氣體種類及流量狀態的監控，而達多元監控及多 元運用之目的。 5. 可Μ精確的進行機台設備之合理保養*而合理降低傳 統預防性粗估式，強迫短期定時更新物件之保養成本。 為便於審査委員對於本案能更進一步了解，兹配合圖 式說明如下： 圖式說明： 圖1係輻射光產生示意圖。 圖2係反應室结構外觀示意圖。 圖3係本發明監控系統圖。 圖4係本發明自動觸發電路圖。 一 4一 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） — 坤衣-- (請先閱讀背面之注意事項再填寫本頁) 訂 線 經濟部智慧財產局員工消費合作社印製 經 濟 部 智. 慧 財· 產 局 員 工 消 費 合 η 社 印 製 478044 Α7 ____Β7 五、發明説明（） 連接至一中央處理單60上，並輔Μ異常法則判斷、專家糸 統進行此一電賭幅射光10資料之謓取、分析、判斷及控制 圖2係為反應室結構外觀示意圖，其中反應室20存在 —個非常狹小的觀測口 21 (6Χ6Χ 24mm)，透過這個觀測 口 21可以目測到電獎的輻射光10。 圖3係為本發明監控糸統圖，其中監控糸統係直接以 —輻射光顯取器30藉由光纖固定座a，快速將其偵測端311 安裝在反應室20之觀測口21處，直接採測電獎放電之頼射 光10 ;而將輸出端312連接至一光電轉換電路40，將光訊 號轉換成電子類比訊號；然後再藉由一A/D轉換卡50 (類 比/數位資料轉換介面卡）將電子類比訊號，予Μ轉換成 數位化電子資料；連接傳送至中央處單元，此中央處理單 元60可為電腦主機或單晶片；使其進行資料謓取、分析及 判斷及控制，並且使之在電腦螢幕70上完成顯示各項解謓 資訊及控制資訊。 賴射光瀬取器30係於一光纖31之偵測端311外加一智 波帶通干涉滤波器32組合而成。窄波帶通干涉減波器32可 Μ消除來至溫度控制糸統所散發之紅外線的干擾，而能有 效擷取分佈在光譜紫外線附近特定波長之輻射光10。 光電轉換電路40係由一光感測器41 (光電倍增管）加 設一偏壓電路42及一訊號處理糸統43組合而成。其中光感 測器41可將輻射光10的強度訊號轉化成電的訊號（本發明 建議在光感測器结構本身之外緣，包覆不透光的物質，例 如黑色的膨布用Μ有效的遮斷內部光訊之外洩及防止外部 一6 — 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） I--------^------、訂------- (請先閱讀背面之注意事項再填寫本頁) 478044 A7 __ B7___ 五、發明説明（） 光源侵入干擾），然後電訊再進入訊號處理系統43，此一 訊號處理糸統43負責提高電訊號的訊雜比。偏壓電路42係 在使光感測器41 (光電倍增管）有良好的工作區域（可使 在放大較高之區域操作）。本發明糸統電路所設計之多重 的訊號品質防護及處理措施，可將輸入之光訊號轉化成優 質電訊。 圖4係為本發明自動觸發電路圖。由於半導體製程包 含很多步驟，其中並非是每一個步驟都需要使用到電獎狀 態加工。所以，本發明考量節能及電路節用之經濟利益， 特別透過製程主體機台本身之I/O點，並聯出一藉由光藉 合元件81所構成之自動觸發電路80。所Μ，每當製程進行 到必需使用到電獎之製程時，透過機台本身之I/O點即能 將電漿操作之前置訊號b發出，進而使自動觸發電路80產 生出一觸發信號c，來驅動監控糸統中有關之電路。易言 之，本發明能夠在電漿產生之時，預先透過機台通知監控 糸統，展開進行有關反應室20輻射光10資料的謓取、分析 、判斷及控制之工作。 圖5係本發明電獎產生訊號與觸發訊號產生示意圖。 在半導體製程中需要電獎時，預先透過機台本身之I/O點 ，即能將電漿操作之前置訊號b發出，進而使自動觸發電 路80產生出一觸發信號c，來驅動監控糸統中有關之電路 進行資料謓取、分析、判斷和控制。當本階段電獎製程完 成時，透過機台之I/O點，亦能將電漿操作終止訊號d異動 檢出，進而驅使自動觸發電路80回復原狀，結束觸發信號 c之情況，進而達到停止進行輻射光1〇資料謓取、分析、 _________一7 -_ —-- 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） (請先閱讀背面之注意事項寫本頁) •裝· ，τ 經濟部智慧財產局員工消費合作社印製 478044 ▼ 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明説明（） 判斷和控制。易言之，監控糸統之作業係藉由自動觸發電 路80自動控制在反應室20輻射光10發生之前些微的時間前 ，超前觸發T1，預先啟動作用；此時反應室20內所生之輻 射光10資料，經由輻射光掘取器30採测，經光電轉換電路 40處理成儍質之電訊，再經A/D轉換卡50 (類比/數位資 料轉換介面卡）轉換成數位資訊，輸入電腦主機60 ;然後 經由異常法則的判斷，判斷此時電獎是否正常；如果電號 正常則會產生一個直流訊號。而當在反應室20輻射光10製 程作用完成後，在些微遲延時間後始結束觸發T2監控糸統 及相關電路始停止進行輻射光資料分析、判斷和控制，而 達有效節能及節用之功效者。 經由本發明方法及糸統之提供，再透過專家糸統軟體 的處理，便可Μ得到反應室20輻射光10與製程控制各項參 數在解析上的關係。因此本發明可為以下三種應用： 1. 本發明可以應用到反應室壓力狀況的監控。 2. 本發明可Μ應用到反應室射頻功率糸統的監控。 3. 本發明可以應用到反應室氣體種類及流量狀態的監控。 本發明其他實施例可如下列三種方式衍生實施： 1. 本發明輻射光擷取器之偵測端可藉由光纖固定座，直 接配設在反應室傳統之觀測口處使用。 2. 本發明輻射光擷取器之偵測端亦可直接配設在反應室 為本發明特設之觀測口處使用。 3·本發明光感測器41亦可Μ (光二極體）或（光二極體 列陣）形式，配合光學鏡片糸統架構而成一等功效裝 置來使用。 一8 - 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） — 裝 訂線 (請先閲讀背面之注意事項再填寫本頁)478044 Printed by the Intellectual Property Department of the Ministry of Economic Affairs Bureau Consumer Cooperatives A7 B7 V. Description of the Invention () Field of the Invention: The present invention provides a semiconductor process that can automatically generate a monitoring reaction chamber during the process of an electric award type chemical vapor deposition equipment. Method and system of plasma radiation. Relevant technical description: The conventional chemical vapor deposition equipment (CVD) is composed of several basic subsystems. Its subsystems are radio frequency power systems, electronic circuit systems, vacuum calendar systems, wafer transfer systems, temperature control systems, process chamber systems, vacuum pressure systems, and gas systems. The main body of the equipment is provided with a machine controller, which is responsible for the control of the whole machine operation, and communicates with the M analog or digital signals between the above-mentioned subsystems. The RF power system is mainly composed of an RF power generator and an impedance matching coupler. The RF power generator detects the actual power and reflected power transmitted to the reaction chamber through its own sensing circuit, and then the M signal is transmitted to the machine controller to provide the machine with the function of monitoring the power output. The power transmitted through the RF power generator can dissociate the gas in the reaction chamber into a high-energy state (electric prize), and then chemically react with the gas molecules on the upper surface of the wafer being processed to produce the required solid deposition. . The entire chemical vapor deposition equipment processing wafer processing process, the generation of electrical awards in the reaction chamber, and the quality of the apricots, will directly affect the success of wafer manufacturing. The status of the electric award in the reaction room is 1. RF power level, 2. -2- This paper size applies to China National Standard (CNS) A4 specification (210 × 297 mm) I --------- ^ ------ 1Τ ------ 0 (Please read the notes on the back before filling out this page) 478044 Α7 Β7 V. Description of the invention () technology, and a breakthrough in concept, finally completed the present invention . The purpose of the present invention is to provide a method and a system for automatically monitoring whether the radiated light of the reaction result of the electric award in the reaction room is good or not. Yet another object of the present invention is to provide a method and system that can be directly and simply matched to the use of a traditional reaction chamber, and can automatically monitor the radiation of electricity. Due to the achievement of the above objectives, the present invention has the following five major advantages: 1. It can increase the number of monitoring machines of the operator * and reduce the direct personnel costs under the production grave. 2. It can strengthen the monitoring function of the real reaction situation of the plasma state of the process machine. 3. It can correctly detect the presence and absence of electric gambling in the reaction room, and can actively intervene in control improvement and / or suspension of the process to reduce the defect rate of wafer processing parts. 4. It can be applied to the monitoring of the pressure state of the reaction chamber, the RF power system and the type and flow state of the gas in the reaction chamber to achieve the purpose of multiple monitoring and multiple applications. 5. Reasonable maintenance of machine equipment can be accurately performed *, and the traditional preventative rough estimate can be reasonably reduced, forcing the maintenance cost of short-term and regularly updated items. In order to facilitate the members of the review committee to further understand the case, they are described in conjunction with the drawings as follows: Schematic description: Figure 1 is a schematic diagram of radiated light generation. Figure 2 is a schematic view of the structure of the reaction chamber. FIG. 3 is a diagram of a monitoring system of the present invention. FIG. 4 is a circuit diagram of an automatic trigger of the present invention. 1-4 This paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) — Kunyi — (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives Printed by the Ministry of Economic Affairs, Intellectual Property, Industry Bureau, Consumer Consumption Co., Ltd. 478044 Α7 ____ Β7 V. Description of the invention () Connected to a central processing sheet 60, assisted by the exception rule judgment, and the experts will conduct this electric bet Extraction, analysis, judgment and control of the light 10 data Figure 2 is a schematic diagram of the structure of the reaction chamber, in which the reaction chamber 20 exists-a very narrow observation port 21 (6 × 6 × 24mm), through which the electrical Award of radiant light 10. FIG. 3 is a monitoring system diagram of the present invention, in which the monitoring system directly uses the radiant light display device 30 to quickly install its detection end 311 at the observation port 21 of the reaction chamber 20 through the optical fiber fixing base a. Directly measure the incident light 10 of the electricity award discharge; connect the output 312 to a photoelectric conversion circuit 40 to convert the optical signal into an electronic analog signal; and then use an A / D conversion card 50 (analog / digital data conversion) Interface card) to convert electronic analog signals to digital electronic data; connection and transmission to the central unit, this central processing unit 60 can be a computer host or a single chip; to enable data capture, analysis and judgment and control, And it is made to display various information and control information on the computer screen 70. The laser light extractor 30 is a combination of a detection end 311 of an optical fiber 31 and a smart wave band-pass interference filter 32. The narrow-band band-pass interference attenuator 32 can eliminate interference from infrared rays emitted from the temperature control system, and can effectively capture radiant light 10 having a specific wavelength distributed in the vicinity of the ultraviolet spectrum. The photoelectric conversion circuit 40 is a combination of a photo sensor 41 (photomultiplier tube), a bias circuit 42 and a signal processing system 43. The light sensor 41 can convert the intensity signal of the radiant light 10 into an electrical signal. (The present invention proposes to cover the outer edge of the light sensor structure itself with an opaque substance, such as a black bulge. Interruption of internal optical communication and prevention of external leakage 6 — This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) I -------- ^ ------ 、 Order ------- (Please read the precautions on the back before filling this page) 478044 A7 __ B7___ V. Description of the invention () Light source intrusion interference), and then the telecommunications enter the signal processing system 43, this signal processing System 43 is responsible for improving the signal-to-noise ratio of the telecommunications signal. The bias circuit 42 is used to make the photo sensor 41 (photomultiplier tube) have a good working area (allowing operation in areas with higher amplification). The multiple signal quality protection and processing measures designed by the system of the present invention can convert the input optical signals into high-quality telecommunications. FIG. 4 is a circuit diagram of an automatic trigger of the present invention. Because the semiconductor process includes many steps, not every step requires the use of electrical state processing. Therefore, the present invention considers the economic benefits of energy saving and circuit saving, and in particular, an automatic trigger circuit 80 formed by a light borrowing element 81 is connected in parallel through the I / O point of the process main machine itself. Therefore, whenever the production process needs to use the electricity award process, the signal b before the plasma operation can be sent through the I / O point of the machine itself, so that the automatic trigger circuit 80 generates a trigger signal. c, to drive related circuits in the monitoring system. In other words, the invention can notify the monitoring system through the machine in advance when the plasma is generated, and carry out the work of extracting, analyzing, judging and controlling the data about the radiation light 10 in the reaction chamber 20. FIG. 5 is a schematic diagram of generating an electric award signal and a trigger signal according to the present invention. When electricity prizes are required in the semiconductor manufacturing process, the I / O point of the machine itself can be used to send the signal b before the plasma operation, so that the automatic trigger circuit 80 can generate a trigger signal c to drive the monitoring. Relevant circuits in the system perform data capture, analysis, judgment and control. When the electric award process is completed at this stage, the plasma operation termination signal d can also be detected through the I / O point of the machine, thereby driving the automatic trigger circuit 80 back to its original state, ending the situation of the trigger signal c, and then stopping Perform radiant light data acquisition, analysis, _________ 一 7 -_ --- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back to write this page ) • Equipment ·, printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 478044 ▼ printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 Β7 5. Description of the invention () Judgment and control. In other words, the operation of the monitoring system is automatically controlled by the automatic trigger circuit 80 to trigger T1 in advance a little time before the radiation 10 of the reaction chamber 20 occurs, and the effect is activated in advance; The data of light 10 are collected and measured by the radiation light extractor 30, processed by the photoelectric conversion circuit 40 into silly telecommunications, and then converted into digital information by the A / D conversion card 50 (analog / digital data conversion interface card), and input into the computer The host 60 then judges whether the electricity award is normal at this time through the judgment of the abnormal rule; if the electricity number is normal, a DC signal will be generated. After the completion of the process of radiating light 10 in the reaction chamber 20, the T2 monitoring system and related circuits will be triggered after a slight delay, and the analysis, judgment and control of the radiant light data will be stopped to achieve effective energy saving and saving effects. . Through the method and system provided by the present invention, and then processed by the expert system software, the analytical relationship between the radiation light 10 of the reaction chamber 20 and various parameters of the process control can be obtained. Therefore, the present invention can be applied to the following three applications: 1. The present invention can be applied to monitoring the pressure condition of the reaction chamber. 2. The invention can be applied to the monitoring of the RF power system of the reaction chamber. 3. The present invention can be applied to monitoring the gas type and flow state of the reaction chamber. Other embodiments of the present invention can be implemented in the following three ways: 1. The detection end of the radiation light pick-up of the present invention can be directly installed at the traditional observation port of the reaction chamber through an optical fiber fixing base. 2. The detection end of the radiation light capture device of the present invention can also be directly arranged in the reaction chamber and used at the observation port specially set for the present invention. 3. The light sensor 41 of the present invention can also be used in the form of M (photodiode) or (photodiode array) in combination with the optical lens system architecture. 8-This paper size applies Chinese National Standard (CNS) A4 specification (210 × 297 mm) — gutter (please read the precautions on the back before filling this page)