TW473809B - Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system - Google Patents

Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system Download PDF

Info

Publication number
TW473809B
TW473809B TW86120101A TW86120101A TW473809B TW 473809 B TW473809 B TW 473809B TW 86120101 A TW86120101 A TW 86120101A TW 86120101 A TW86120101 A TW 86120101A TW 473809 B TW473809 B TW 473809B
Authority
TW
Taiwan
Prior art keywords
wall
gas
flow
liquid
flow channel
Prior art date
Application number
TW86120101A
Other languages
Chinese (zh)
Inventor
Mark R Holst
Kent Carpenter
Scott Lane
Prakash V Arya
Joseph D Sweeney
Original Assignee
Atmi Ecosys Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/778,396 external-priority patent/US5833888A/en
Priority claimed from US08/778,386 external-priority patent/US5846275A/en
Priority claimed from US08/857,448 external-priority patent/US5935283A/en
Application filed by Atmi Ecosys Corp filed Critical Atmi Ecosys Corp
Application granted granted Critical
Publication of TW473809B publication Critical patent/TW473809B/en

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An inlet structure for passage of a gas stream from an upstream source of same to a downstream locus, wherein the inlet structure is constructed, arranged and operated to suppress particulate and film deposition and formation, as well as to suppress adverse hydrodynamic effects.

Description

473803 Μ Β7 五、發明説明(1) 發明之領域 本發明係關於供引導氣流至下游處理設備,諸如下游氣 體處理裝置之入口裝置。在特定方面,本發明係關於供引 導含微粒固體及/或成形固體之氣流至氣體處理糸統之防 堵塞進口结構。 相關技藝之說明 在處理含微粒固體及/或成形固體之氣流,供對其處理時 ,來自此等流之微粒固體堵塞處理設備之入口裝置,為常有 之問題。含微粒固體及/或成形固體之氣流流動通過處理 設備時,固體可能沉積在表面及入口裝置之通道。 如果微粒固體隨處理設備之繼續操作而積聚,此設備之 入口裝置可能變成閉塞至足以完全堵塞之程度,或則固體 積聚可能不閉塞處理單元之入口,但可能在系統損害流動 及增加壓降,致使處理設備供其預定目的非常欠缺效率。 經濟部中央標準局貨工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 通常,與氣流關聯之微粒可能來自各種來源,包括:(i)在 上、游處理單元所產生之微粒,其隨氣流來自入口裝置之下 游;(π) —種處理氣體組份與洩漏進入管線之氧反應,而在 系統管線所形成之微粒;(in)由於二或更多種處理廢氣在 氣流向下游流動至入口裝置時之反應而在糸統管線所形成 之微粒;(iv)順流至入口裝置之廢氣之(局部)凝结所形成 之微粒;及(v)處理氣體與來自下游氣流處理單元,諸如下 游水擦洗器之向後擴散氧或蒸汽之反應所形成之微粒。在 有些情形,微粒係由凝結所形成,其可能藉處理管線加熱, K消除氣流之可凝結部份而使問題改善。然而,即使藉此 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 4 473803 A7 B7 五、發明説明(2) 種管線加熱,仍然有來自其他來源之微粒之問題。 (請先閲讀背面之注意事項再填寫本頁) 特別是在半導體製造之領域,入口堵塞易自下列情形發 生:(a)蒸汽,或液體水經由毛细管作用,向後遷移至入口, ,作為用以處理氣流之下游氧化操作及/或水擦洗操作之一 種燃燒產物,導致以一種非均勻或均勻方式與進入之水敏 感氣體諸如8(:13,評^00$,1^5,$丨?4之水解反應;(1))進入 之熱敏感氣體之熱衰變;及(c)進入之氣體由於在系統之過 渡點之凝結。 上述此等入口堵塞問題可能需要包括有柱塞機構或其他 固體去除裝置,K使入口保持無固體積聚,然而此等機械安 置使系統增加相當多費用及人工。在其他情形,入口堵塞 問題可能為系統性,並需要定期預防性維修,K使入口保持 無固體積聚。然而,此種維修需要系統停機,並在入口與其 關聯之製造或處理設施損失生產力。 經濟部中央標準局負工消費合作社印掣 請特別考慮在半導體處理排出氣流處理糸統,經由毛细 管、作用發生蒸汽,或液體水,自下游水擦洗器至上游入口裝 置之回流,其中自擦洗器釋出之蒸汽自擦洗器入口向處理 工具向後遷移,逆向處理氣體流動之正常方向,在蓮送水蒸 汽之向後遷移時,可能涉及各種機制。 一種機制為氣體互相擴散。避免此蒸汽來源向後遷移唯 一切合實際方式,為對水擦洗器入口增加一擴散逄界。 此種蒸汽向後擴散之另一機制,為所謂之Richardson效 應環狀效應。所有乾泵均在氣體流動流造成一定量之壓力 波動。此等壓力波動造成一種逆流運送機制,其逆向正常 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 一 5 - 473800 A7 B7 五、發明説明(3) 氣體流動之方向抽吸氣體。此現象為邊界層環狀效應之结 果。因為此效應,回流遷移速度在離開壁表面之很小距離 為最大。 如果微粒固體隨處理設備之繼績操作而繼績積聚,此設 備之入口裝置可能閉塞至足κ完全堵塞之程度,要不然固 體積聚可能不閉塞處理單元之入口,但可能在系統損害流 動及增加壓降,致使處理設備供其預定目的非常欠缺效率。 特別是在使用水擦洗器設備供擦洗氣流,諸如製造半導 體裝置時,所產·生之廢氣流之情形,構成流入氣流至水擦洗 器之廢氣,可能含有或產生(藉反應或凝结)顯著之微粒子 内容物,例如,來自C V D或其他沉積操作等之二氧化矽,金屬 之次微米徼粒。此等廢氣流會很容易堵塞廢氣水擦洗器之 入口。因此水擦洗器之入口需要經常人工清潔。 經濟部中央標準局負工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 入口堵塞敏感性,為使用於半導體業界之現今商用水擦 洗器單元之主要缺點。使水擦洗器之進口堵塞所需要之時 間、,在此等應用為與處理有關,並為場所特定。由於入口堵 塞而影響水擦洗器故障之平均時間,其中因素包括:處理工 •具產生在擦洗器予K處理之含微粒處理排出流,在產生在 水擦洗器予Μ處理之排出物之上游處理所採用之特定處理 配方及化學作用,Κ及在系統用Μ清洗泵及處理管線之惰 性氣體清洗之特性。其他處理狀況及因素疑為促使或影響 在處理系統之微粒積聚,但尚未經明顯界定。請見 Abreu, R . , Troup, A.及 Sahra, M., ”Causes of anomalous solid formation in exhaust systems of low-pressure 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) 6 473800 A7 B7 經濟部中央標準局與工消費合作社印掣 五、發明説明(4) chemical vapor deposition and plasma enhanced chemical vapor deposition semiconductor processes , J * Vac. S c ί * Technol. B12 ( 4) , J u 1 / A u g 1 994, 2763-2767 〇 在諸如處理來自半導體製造操作之排出氣體等操作之情 形,廢氣可經歷氧化處理,藉熱氧化,或其他氧化反應處理 ,K氧化方式消除排出氣體之危險可氧化組份。藉此種氧 化,可顯著減低排出流中之引火組份及毒性組份,K及以氧 化方式除去在自處理設施釋出至大氣時可能有害之其他組 份。 經歷此種處理之排出氣體可能不僅含有顯著之微粒子內 容物,例如來自CVD或其他沉積操作等之二氧化矽,金屬之 次微米微粒,而且此等氣流可能含有顯著之氣態組份,其在 處理環境,在一般為供氧化處理所採用之升高溫度,可能具 有侵蝕性。就來自氧化處理之熱排出氣流,以及歸因於此 種、排出氣流之微粒內容物之固體積聚能力而言,此種侵蝕 性特性因此造成一項問題。 此種氣流中之微粒固體可能堵塞下游處理設備,例如包 括水擦洗之下游處理操作。擦洗設備之堵塞在此項技藝上 為一重大問題。存在自燃燒装置所固有之熱氧化狀況至驟 冷室之冷濕狀況之過渡時,情形尤其如此。顧名思義,存在 過渡區,在此過渡區發生自熱燃燒狀況至濕驟冷狀況之流 動過渡。在此等氧化/擦洗/驟冷系統之關聯問題,包括由 於濕氣向後擴散之微粒積聚及最後斷面閉塞,以及來自濕 ------·--— (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) 7 一 473803 A7 B7 五、發明説明(5) 驟冷區之噴霧造成粘稠之粘附微粒,其將會積聚在驟冷部 位之直接在潮濕區上面之部份。 另一問題歸因於缺少濕/乾介面位置之永久界定。因為 在系統之流體動力變化時,濕/乾介面之位置可能變化,變 成對應很難Μ使濕/乾介面精確定位。影響介面位置之因 素包括:(a)燃燒廢氣流動速率及熱負載,(b)驟冷噴霧流動 速率及溢流堰流動速率,Μ及(c)驟冷噴霧或溢流堰流動之 向後混合及渦流作用。無法使濕/乾介面之位置固定,導致 二難題:(1)造成易有微粒聚結之部位,及(2)結果可能發生 驟冷部位之材料腐蝕。 供燃燒及驟冷設備使用之大多數合金在一組特定狀況為 耐腐蝕。將會經得起熱氧化狀況之合金,一般不適合濕腐 蝕狀況,反之亦然。可能存在加速腐蝕或氧化之另外之產 物,諸如存在鹵素,硫化劑等時,此問題進一步加重。由於 無法精確固定構造材料之規範過渡,於是變成必要使用外 來之構造材料,其會過於昂貴,並且性能僅只普通。人們大 力解決此問題。迄今並未發現可接受之解決辦法,並且所 經濟部中央標率局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 有建議之解決辦法均有種種缺失。一般必要使用二途徑s 。第一為使用溢流堰,Μ在過渡使壁潤濕。第二為使用一 種浸入式驟冷。溢流堰在防止微粒積聚性能最佳,但有三 項主要缺失。溢流堰防止微粒積聚性能僅僅普通,因為其 在水引導點仍然有一濕/乾介面。溢流堰需要顯著之水位, 俾保持金屬表面之最小潤濕速率。另外,溢流堰需要精確 調平,俾保持一均勻之降落薄膜,以保護驟冷部位之金屬。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) 一 8 一 473800 A7 B7 經濟部中央標嗥局眞工消費合作社印^ 五、發明説明(B) 在此等問題當中,最顯著者為溢流堰水增加速率與最小 潤濕速率及與設備之水平度之直接聯繫。此等因素阻礙使 溢流堰之水增加速率最低,並構成不可接受之限制。實際 上吾人發現,不論如何致力調平驟冷設備,在燃燒/驟冷處 理所涉及之固有熱應力需要設備之經常重新調平,俾保持 驟冷水平度在容限Μ內。此情況必要不可接受維修工作。 需要最小潤濕速率及水平度之討論可見於” Chemical Engineers Handbook" , e d . ^ Perry & Chilton, Fifth Edition, pp,5-57。也請見 Hewitt, G.F.等人之”Process Heat Transfer”,CRC Press 1993,pp.539 — 541,M 及浸入 式驟冷之敘述請見此書475頁。 發明之概述 在廣義方面,本發明係關於一種供引導氣流,例如一種含 微粒固體及/或成形固體之氣流,至一下游處理單元,諸如 一氣體處理系統之入口裝置,其中該结構予K構造,設置及 操作使閉塞(例如來自固體沉積,氣流衰變等)及不利之流 體動力效應,諸如氣體流動流分流,短路等最小。 ,在一方面,入口裝置包含一包封氣體流動路徑之可透氣 壁,及一外接可透氣壁,K在其間界定一環狀氣體儲槽之外 環狀外套。外環狀外套設有装置,供在含微粒固體及/或成 形固體之氣流通過此人口裝置,例如,一口在外套上供附著 加壓氣體源容器,諸如習知之加壓體缸,流動至一氣體處理 糸統時,引導氣體進入環狀氣體儲槽。在此種結構,供給至 環狀氣體儲槽之氣體為在足夠加壓,K通過可透氣壁”流出 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) 一 9 一 473803 A7 B7 五、發明説明(7) ”,供反抗在可透氣壁之内表面沉積或形成固體之目的。 作為另一種變型,κ上所說明之入口裝置可另任選包含 一供引導脈動較高壓力氣體進入環狀儲槽之口,該口與一 較高壓力氣體源耦合,及供脈動自其來源傳送至環狀儲槽 之裝置。在操作時,此脈動較高壓力氣體引導在可透氣壁 完成另外之抗堵塞作用,脈衝性用κ將可能形成或否則沉 積在可透氣壁之內表面之微粒移除,即使較低壓力氣體不 斷滲透通過壁。外環狀外套上之口可予Μ構造及設置為提 供較高壓力氣體切向流入環狀儲槽。 經濟部中央標苹局貞工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 作為Κ上廣義說明之入口裝置之又一變型,可透氣壁及 外環狀外套可任選予Μ耦合至一下游流動路徑區段,包括 一壁包封氣體流動路徑之對應之另一區段,並與可透氣壁 在其間形成一切口。下游流動路徑區段之壁被一外環狀外 套所外接,以在其間界定一環狀液體儲槽,與切口成液體溢 流關係,因而環狀液體儲槽填滿水或其他液體超出壁之高 度所確定之某一點時,液體在壁及沿壁之内表面流動,作為 一在其上之降落液體薄膜。此降落液體薄膜因此在壁内表 面提供一阻擋或遮蓋媒質,Μ抵抗在此内表面之固體沉積 或形成,並且也用Μ洗除依然沉積或形成在壁之内表面之 任何固體。 入口裝置之下游流動路徑區段,其外環狀外套可設有一 口或其他進入裝置,藉一含流動控制閥或其他流動調節裝 置之管線或導管耦合至一液體源,例如一含有此液體之容 器〇__ 本紙張尺度適用中國國家標準(CNS ) Α4規格(21〇Χ 297公釐) 一 10 一 473800 經濟部中央標準局與工消f合作社印繁 A7 B7五、發明説明(s) 在上述結構之口元件可包含一單元式開口,溝道,進給貫 通,接管頭,或其他進入结構,及/或很多相同之例如一連串 垂直及/或周邊間開之進入结構,在每一情形,流體通過其 轉移至諸口與其關聯之環狀儲槽之内部容積。 在另一方面,本發明之入口裝置包含第一及第二大致垂 直設置之流動通道區段,彼此成串聯耦合關係,一大致垂 直流動通道界定成此種串聯耦合關係,含微粒固體之流體 流及/或成形固體流可通過其自含微粒固體及/或成形固體 流體之上游來源流動至一設置為對入口裝置成流體流接受 關係之下游流體處理系統。 第一流動通道區段為入口裝置之上區段,並包括一内可 透氣壁,其可由一種多孔金屬,多孔陶瓷,多孔塑膠,或其他 適當構造材料形成,包封第一流動通道之上部。多孔内壁 有一內表面界限流動通道之上部。 可透氣壁被一外壁包封式圍繞,對多孔内壁成間開關係 。外壁在特性上為不多孔,但設有一氣體流動口。藉此種 配置,各別內多孔壁與外包封壁之間形成一內環狀容積。 氣體流動口復可予以耦合至一氣體源成流動關係,例如 藉適當閥及控制裝置使此氣體κ預定之低速率流入内環狀 容積,供氣體隨後自内環狀容積流人流動通道。在第一流 動通道區段之外壁也提供一高壓氣體流動口,對一高壓氣 體源耦合成流動關係,供此氣體斷續流入内環狀容積,此高 壓氣體流動用以對內多孔壁清潔可能已沉積在其内表面( 在第一流動通道區段界限流動通道)之任何微粒。高壓氣 •本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 。 裝 訂 (請先閱讀背面之注意事項再填寫本頁) 473803 A7 B7 五、發明説明(9广 體可同樣藉適當閥及控制裝置在希望之壓力予Μ可控制式 流動。 第二流動通道區段予Μ串聯耦合至第一流動通道區段, 供含微粒固體之流體自第一流動通道區段向下流入第二流 動通道區段。第二流動通道包括一外壁,其中有一液體注 射口,其可與一液體源,諸如水或其他處理液體耦合。外壁 諸如藉第一及第二流動通道區段各別外壁上之可配合凸緣 而與第一流動通道區段耦合,。第二流動通道包括一內堰 壁,對外壁成間開關係,Μ在其間界定一內環狀容積,而内 堰壁向第一流動通道區段之內多孔壁延伸,但停止在不到 此内多孔壁,Κ在此等各別之内壁與第一及第二流動通道 區段之間提供一間隙,界定一溢流堰。液體流入第二流動 通道區段之外壁及其内壁間之內環狀容積時,所引導之液 體溢流過溢流堰,並沿第二流動通道區段內壁之内表面向 下流動。液體沿内壁之此向下流動用以自壁洗除任何微粒 固體,並抑制在内壁之内壁表面沉積或形成固體。 經濟部中央標率局負工消费合作社印繁 (請先閱讀背面之注意事項再填寫本頁) 第一及第二流動通道區段彼此之凸緣狀連接可包括一快 速釋放夾總成,Κ適應容易拆卸入口裝置之各別第一及第 二流動通道區段。 而且,入口裝置之第一流動通道區段可予Κ接合至一最 上入口裝置快速分開入口區段,其同樣可容易拆卸供清潔 及維修目的。 在又一方面,本發明係關於一種氣體流動流接受结構,其 在熱含侵蝕性組份之充滿微粒氣流流動通過時,抗固體沉 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -12 - 473803 A7 B7 五、發明説明(10) 積,堵塞及腐蝕。更特別是,本發明之此一方面係關於一種 氣體/液體介面结構,可用於蓮送熱含微粒固體之氣流自此 氣流之上游來源至一下游處理單元。 此氣體/液體介面結構包含: 一第一垂直延伸入口流動通道構件,在其內界定第一氣 流流動路徑,此入口流動通道構件有一上入口供引導氣流 至氣流流動路徑,及一下出口端供在氣流流動通過入口流 動通道構件內之氣流流動路徑後自其排放氣流; 一第二流動通道構件外接第一流動通道構件及對其成向 外間開關係,K在其間界定一環狀容積,此第二流動通道構 件向下延伸至一在第一流動通道構件之下岀口端下面之下 出口端,此第二流動通道構件有一上可透液體部份及一下 不透液體部份界定第二流動通道構件之氣流流動路徑; 一外壁構件包封式外接第二流動通道構件,並與其界定 一包封之內環狀容積及 一在此外壁構件之液體流動入口,供引導液體進入外壁 構件及第二流動通道構件間之包封內環狀容積; 經濟部中央標準局賀工消費合作社印繁 (請先閱讀背面之注意事項再填寫本頁) 從而經由外壁構件上之液體流動入口所引導之液體進入 包封之内環狀容積,並滲漏式流動通過第二流動通道構件 之上可透液體部份,供隨後沿第二流動通道構件之不透液 體部份之内表面向下流動,Μ在第二流動通道構件之不透 液體部份之此内表面提供一向下流動液體薄膜,Μ抵抗微 粒固體沉積及積聚在其上,並且流動通過第一流動通道構 件之氣流在其下出口端排放,供流動通過第二流動通道構 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) 一 13 - 473803 A7 B7 五、發明説明(π ) 放 huf 5¾ 構 结 面 介 體 液 流 二 第 壁 之 部 下 構 结 在 觸 接 體接 氣直 自流 後氣 隨止 及防 徑置 路配 種 流此 之藉 件 表 壁 之 內件 之構 件道 構通 道動 通流 動 二 在 面 漏 滲 第微 自 抗 來抵 〇 膜 徑薄 路水 動落 流降 流之 氣部 0± 界 處 堰 流 面粒 表微 壁之 之膜 件薄 構水 道觸 通接 動中 流流 二 氣 第有 在帶 聚流 積體 體液 固動 粒原 之 面 表 壁 此 在 體 氣 自 供 下 向 落 外降 另由 〇 部 放下 排之 構構 结-結 面面 介 介 體在 液觸 接 質 物 性 触 侵 之 中 流 體 氣 止 防 壁 之 護 保 Μ 予 膜 薄 水 (請先閱讀背面之注意事項再填寫本頁) 本 面 方 定 特 Ι1ΗΗ1 種1 又 在 單 器 化 氧 熱 電一 如 諸 元 Μ 元自 單體 器氣 化 , 氧間 游 之 上器 一 洗 在擦 置水 配游 Μ 下 予一 明與 發 · 體 固 粒 微 去 除 其 造 構 孔 多 當 適 為 可 份 部 體 液 透 可 上 之 洗件 擦構 Μ道 予通 水 動 藉流 中 二 其第 在 屬 金 结 燒 孔0. 多在 種約 如 含 例 包可 如小 例大 可孔 並壁 至 米 微 瓷更 陶至 孔甚 多或 或 , , 圍 膠範 塑之 孔米 多微 明 說I 细 詳 之 例 施 實 佳 較 。 其 徑及 直明 孔發 大本 經濟部中央標準局Μ工消費合作社印製 意 圖示 附之 照構 參結 請 口 現入 塞 圖 在 構 结 Π 入 有 構 堵 防 之 例 施 實 性 證 例 明 發 本 據 根一 為 一—I 圖 圖 结為 口可 入道 合 管 耦游 供上 ’ 此 道 管 。 理構 處结 至 口 接入 knc rc 連 止 可 至 為導 示引 中以 L予 源 流 氣 流 氣。 游緣 上凸 自 Q 示入 所之 圖構 如結 二 熱 至 當 , 適具 K 工 予造 式製 方體 知導 習半 M一 源 此 如蹤 例 追 ,熱 組 之 流 氣 此 止 防M 流 氣 至 量 能 。 夠華 足 昇 加或 增结 道凝 管構 在结 為 口 的入 巨 在 之份 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) 14 一 473803 A7 B7 五、發明説明(1.2) 圖1中所示之入口結構60包含一入口區段7,包括一入口 凸緣1 6。入口凸緣與上環狀區段8之凸緣1 8可配合式貼合, 其在其上端終止在此凸緣。入口區段可與一上游含微粒固 體及/或微粒成形固體流產生設施90耦合,例如作為一半導 體製造工具。 環狀區段8包含一内多孔壁6,其為在特性上可透氣之適 當孔隙度,及一外固體壁9在其間界定一環狀內部容積20。 内多孔壁6之内表面因此在上環狀區段 8限定流動通道66 。外固體壁9在其上及下端相對於內壁6藉端壁40及42予K 包封,Μ包封環狀内部容積。外壁9設有一氣體入口 22,一 氣體進給管線24予Μ接合至此氣體人口。 氣體進給管線 24在其外端連接至一氣體源4。 一止回閥14配置在氣體進 給管線'24, Μ適應氣流入環狀內部容積20。進給管線24也 可設有其他流動控制裝置(未示),供在系統操作時,自來源 4以希望之量及在希望之流動速率,選擇性進給氣體至環狀 内、部容積2 0内。 可包括一供加熱氣體進給管線24之裝置,以升高透氣多 經濟部中央標率局負工消費合作社印取 (請先閱讀背面之注意事項再填寫本頁) 孔壁6之溫度。供加熱氣體進給管線24之裝置可包括一電 阻加熱器,流追蹤管線,加熱外套,或精於此項技藝者所知, 並可用於轉移熱能量至氣體進給管線24之内部通道之任何 其他加熱系統,Μ增加氣體之溫度。供例示目的,在圖1實 施例所採用之加熱裝置係由加熱線圈2 3所構成。一熱外套 也可與加熱装置合作,Κ升高氣體管線 2 4之内部溫度。 _上環狀區段8也可設有一任選之高壓氣體注射口 50 ,復 本紙張尺度適用中國國家標準(CNS ) Α4規格(21〇Χ 297公釐) 一 15 - 473803 A7 B7 經濟部中央標隼局Μ工消费合作社印1i473803 Μ B7 V. Description of the invention (1) Field of the invention The present invention relates to an inlet device for directing airflow to a downstream processing equipment, such as a downstream gas processing device. In a particular aspect, the invention relates to an anti-clogging inlet structure for directing a gas stream containing particulate solids and / or shaped solids to a gas processing system. Description of Related Techniques When processing a gas stream containing particulate solids and / or formed solids for processing, it is a common problem that particulate solids from these streams block the inlet device of the processing equipment. Particulate solids and / or shaped solids flowing through the processing equipment may deposit solids on the surface and in the channels of the inlet device. If particulate solids accumulate as the processing equipment continues to operate, the inlet device of this equipment may become occluded enough to completely block, or the accumulation of solids may not occlude the inlet of the processing unit, but may cause flow damage and increase pressure drop in the system This makes the processing equipment very inefficient for its intended purpose. Printed by the Goods and Consumers Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs ^ (Please read the notes on the back before filling this page) Generally, the particles associated with the airflow may come from various sources, including: (i) generated by the upstream and downstream processing units Particles, which come from the downstream of the inlet device with the airflow; (π)-particles formed in the system lines by the reaction gas components reacting with oxygen leaking into the pipeline; (in) due to two or more treatment exhaust gases in the airflow Particles formed in the system pipeline as a result of reactions flowing downstream to the inlet device; (iv) particles formed by (local) condensation of exhaust gas flowing downstream to the inlet device; and (v) process gas and from downstream gas processing units Particles formed by reactions such as downstream diffusion of oxygen or steam from downstream water scrubbers. In some cases, particles are formed by condensation, which may be improved by treating the condensable part of the gas stream by heating the processing line. However, even if this paper size applies the Chinese National Standard (CNS) A4 (210X297 mm) 4 473803 A7 B7 V. Description of the invention (2) There are still problems with particles from other sources. (Please read the precautions on the back before filling this page) Especially in the field of semiconductor manufacturing, the blockage of the inlet can easily occur from the following situations: (a) steam or liquid water migrates to the inlet through the capillary action, and is used as A combustion product of the downstream oxidation operation and / or water scrubbing operation of the processing gas stream, resulting in a non-uniform or uniform manner with incoming water sensitive gases such as 8 (: 13, comment ^ 00 $, 1 ^ 5, $ 丨? 4 Hydrolysis reaction; (1)) thermal decay of the incoming heat sensitive gas; and (c) the incoming gas due to condensation at the transition point of the system. The above-mentioned inlet blockage problems may need to include a plunger mechanism or other solid removal device. K keeps the inlet free of solids accumulation. However, these mechanical installations add considerable cost and labor to the system. In other cases, the blockage of the inlet may be systemic and requires regular preventive maintenance, K keeping the inlet free of solids buildup. However, such repairs require system downtime and loss of productivity at the manufacturing or processing facilities associated with the entrance. The Ministry of Economic Affairs, Central Bureau of Standards and Consumers ’Cooperatives, please take special consideration into the semiconductor processing and exhaust gas processing system, which will return steam from the downstream water scrubber to the upstream inlet device through the capillary tube, the action of steam, or liquid water. The released steam migrates backward from the scrubber inlet to the processing tool, and the normal direction of the process gas flow is reversed. Various mechanisms may be involved in the backward migration of the steam sent by the lotus. One mechanism is the mutual diffusion of gases. Avoiding the backward migration of this steam source is all practical and adds a diffusion barrier to the water scrubber inlet. Another mechanism for the backward diffusion of this steam is the so-called Richardson effect ring effect. All dry pumps cause a certain amount of pressure fluctuation in the gas flow. These pressure fluctuations cause a counter-current conveying mechanism, which is reverse to normal. The paper size applies the Chinese National Standard (CNS) A4 (210X297 mm). 5-473800 A7 B7. 5. Description of the invention (3) The direction of gas flow. . This phenomenon is the result of the boundary layer ring effect. Because of this effect, the backflow migration velocity is greatest at a small distance from the wall surface. If particulate solids accumulate with the subsequent operation of the processing equipment, the inlet device of this equipment may be blocked to the point that the κ is completely blocked. Otherwise, the accumulation of solids may not occlude the inlet of the processing unit, but it may flow and increase when the system is damaged. The pressure drop makes the processing equipment very inefficient for its intended purpose. Especially when using scrubber equipment for scrubbing airflow, such as when manufacturing semiconductor devices, the generated exhaust gas flow, the exhaust gas constituting the inflow airflow to the water scrubber, may contain or generate (by reaction or condensation) significant Microparticle contents, for example, silicon dioxide from CVD or other deposition operations, metal submicron particles. These exhaust streams can easily block the inlet of the exhaust water scrubber. Therefore, the entrance of the water scrubber needs to be manually cleaned frequently. Printed by the Central Bureau of Standards, Ministry of Economic Affairs, Consumer Cooperatives ^ (Please read the precautions on the back before filling out this page) Sensitivity to inlet clogging is the main disadvantage of today's commercial water scrubber units used in the semiconductor industry. The time required to block the inlet of the water scrubber is, in these applications, treatment-related and site-specific. Due to the blocked inlet, the average time of failure of the water scrubber is affected, among which factors include: treatment tools and tools that generate particle-containing treatment effluent from the scrubber to K, and upstream treatment of the effluent from the water scrubber to M The specific processing formula and chemical action used, and the characteristics of K and the inert gas cleaning of the pump and the processing pipeline in the system. Other processing conditions and factors are suspected to cause or affect the accumulation of particulates in the processing system, but have not been clearly defined. Please refer to Abreu, R., Troup, A. and Sahra, M., "Causes of anomalous solid formation in exhaust systems of low-pressure. This paper size applies to China National Standard (CNS) A4 (210X 297 mm) 6 473800 A7 B7 Printed by the Central Standards Bureau of the Ministry of Economic Affairs and the Industrial and Consumer Cooperatives V. Description of Invention (4) chemical vapor deposition and plasma enhanced chemical vapor deposition semiconductor processes, J * Vac. S c ί * Technol. B12 (4), J u 1 / A ug 1 994, 2763-2767 〇 In operations such as processing exhaust gas from semiconductor manufacturing operations, the exhaust gas can be subjected to oxidation treatment, thermal oxidation, or other oxidation reaction treatment. The K oxidation method can eliminate the danger of exhaust gas. Oxidation components. This kind of oxidation can significantly reduce the igniting components and toxic components in the exhaust stream, K and other components that can be harmful when released from the treatment facility to the atmosphere by oxidation. The exhaust gas may not only contain significant particulate content, such as silicon dioxide from CVD or other deposition operations. Rice particles, and these air streams may contain significant gaseous components, which may be aggressive in the processing environment and at elevated temperatures generally used for oxidation treatment. The heat exits the air flow from the oxidation treatment, and attribution This aggressive nature therefore poses a problem in terms of the solids accumulation capacity of such particulate contents that discharge the air stream. The particulate solids in such air streams may clog downstream processing equipment, such as downstream processing operations including water scrubbing. The clogging of scrubbing equipment is a major problem in this technique. This is especially the case when there is a transition from the thermal oxidation condition inherent in the combustion device to the cold and wet condition of the quench chamber. As the name implies, there is a transition zone where this transition zone exists Flow transition from self-heating combustion condition to wet quenching condition. The related problems of these oxidation / scrubbing / quenching systems include the accumulation of particles due to the backward diffusion of moisture and the occlusion of the final section, and from the wet ---- -· --— (Please read the notes on the back before filling in this page) This paper size applies to China National Standard (CNS) A4 specifications (2 10X 297 mm) 7 1 473803 A7 B7 V. Description of the invention (5) Spray in the quench zone causes sticky particles that will accumulate in the part of the quench zone directly above the wet zone. The problem is due to the lack of a permanent definition of the wet / dry interface location. Because the position of the wet / dry interface may change when the fluid dynamics of the system changes, it becomes difficult to accurately position the wet / dry interface. Factors affecting interface position include: (a) combustion exhaust gas flow rate and heat load, (b) quench spray flow rate and overflow weir flow rate, M and (c) backward mixing of quench spray or overflow weir flow, and Eddy current effect. The inability to fix the position of the wet / dry interface leads to two problems: (1) the parts that are prone to agglomeration of particles, and (2) the material corrosion of the quenched parts may occur as a result. Most alloys for combustion and quenching equipment are corrosion resistant in a specific set of conditions. Alloys that will withstand thermal oxidation conditions are generally not suitable for wet corrosion conditions and vice versa. This problem is further exacerbated by the presence of other products that may accelerate corrosion or oxidation, such as the presence of halogens, vulcanizing agents, and the like. Since the specification transition of construction materials cannot be accurately fixed, it becomes necessary to use foreign construction materials, which will be too expensive and the performance is only ordinary. People are working hard to solve this problem. No acceptable solution has been found so far, and it is printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling this page). There are various suggestions for the lack of solutions. It is generally necessary to use the two approaches s. The first is the use of an overflow weir, where M makes the wall wet during the transition. The second is the use of an immersion quench. Overflow weirs are best at preventing particulate accumulation, but there are three main shortcomings. Overflow weirs are only modest in preventing particulate accumulation because they still have a wet / dry interface at the point of water guidance. Overflow weirs require significant water levels to maintain a minimum wetting rate on the metal surface. In addition, the overflow weir needs to be precisely leveled to maintain a uniform falling film to protect the metal in the quenched part. This paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm)-8-473800 A7 B7 Printed by the Industrial and Commercial Cooperatives of the Central Bureau of Standards, Ministry of Economic Affairs ^ V. Description of invention (B) Notable is the direct connection between the increase rate of the weir water and the minimum wetting rate and the level of the equipment. These factors hinder the minimum rate of water increase in the overflow weir and constitute unacceptable limits. In fact, I found that no matter how hard I tried to level the quenching equipment, the inherent thermal stresses involved in the combustion / quenching process required the equipment to be regularly re-leveled, so that the quenching level was kept within the tolerance M. This situation necessitates unacceptable repair work. The discussion of the minimum wetting rate and level can be found in "Chemical Engineers Handbook", ed. ^ Perry & Chilton, Fifth Edition, pp, 5-57. See also "Process Heat Transfer" by Hewitt, GF et al., CRC Press 1993, pp. 539-541, M and immersion quenching can be found on page 475 of this book. SUMMARY OF THE INVENTION In a broad aspect, the present invention is directed to a gas flow for guiding, such as a particulate-containing solid and / or forming Gas flow from solids to a downstream processing unit, such as an inlet device for a gas processing system, where the structure is constructed, set, and operated to occlude (eg, from solid deposition, air decay, etc.) and adverse hydrodynamic effects, such as gas Flow flow has the smallest shunting, short circuit, etc. In one aspect, the inlet device includes a gas-permeable wall enclosing the gas flow path, and an external gas-permeable wall, K defining an annular jacket outside the annular gas storage tank. The outer ring jacket is provided with a device for passing air currents containing particulate solids and / or formed solids through the population device, for example, When a gas source container, such as a conventional pressurized cylinder, flows to a gas processing system, it guides the gas into the annular gas storage tank. In this structure, the gas supplied to the annular gas storage tank is sufficiently pressurized, K flows out through a breathable wall (please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 specifications (210X 297 mm) One 9 One 473803 A7 B7 V. Description of the invention (7 ) ", For the purpose of resisting the deposition or formation of solids on the inner surface of the breathable wall. As another variant, the inlet device described on κ may optionally include an additional means for guiding a pulsating higher pressure gas into the annular storage tank Port, which is coupled to a source of higher pressure gas, and a device for transmitting pulsation from its source to the annular storage tank. During operation, this pulsating higher pressure gas is guided in the breathable wall to complete another anti-clogging effect, Impulsively use κ to remove particles that may form or otherwise deposit on the inner surface of the breathable wall, even if lower pressure gas continues to penetrate through the wall. The mouth on the outer annular jacket can be constructed and designed In order to provide higher pressure gas flowing into the annular storage tank tangentially. Printed by Zhengong Consumer Cooperative, Central Bureau of the Ministry of Economic Affairs ^ (Please read the precautions on the back before filling this page) As another entry device for the broad description on K Variations, the breathable wall and the outer annular jacket may optionally be coupled to a downstream flow path section, including a wall enclosing the corresponding section of the gas flow path, and forming all openings with the breathable wall in between. The wall of the flow path section is bounded by an outer annular jacket to define an annular liquid storage tank therebetween, which forms a liquid overflow relationship with the cutout, so the annular liquid storage tank is filled with water or other liquid beyond the height of the wall At a certain point, the liquid flows on the wall and along the inner surface of the wall as a falling liquid film thereon. This falling liquid film thus provides a barrier or covering medium on the inner surface of the wall, M resists the deposition or formation of solids on this inner surface, and also removes any solids still deposited or formed on the inner surface of the wall with M. In the downstream flow path section of the inlet device, the outer annular jacket may be provided with a mouth or other access device, which is coupled to a liquid source by a line or conduit containing a flow control valve or other flow regulating device, such as a liquid containing Container 〇__ This paper size applies Chinese National Standard (CNS) A4 specification (21〇 × 297 mm)-10-473800 Central Standards Bureau of the Ministry of Economic Affairs and Industrial Consumers Cooperatives A7 B7 V. Description of the invention (s) in The mouthpiece of the above structure may include a unitary opening, channel, feedthrough, takeover head, or other access structure, and / or many of the same, such as a series of vertical and / or peripherally spaced access structures, in each case , Through which the fluid is transferred to the internal volume of the annular storage tanks associated with it. In another aspect, the inlet device of the present invention includes first and second substantially vertical flow channel sections, which are in series coupling relationship with each other. A substantially vertical flow channel is defined in this series coupling relationship, and the fluid flow containing particulate solids is And / or the shaped solid stream may flow from its upstream source of particulate-containing solids and / or shaped solid fluids to a downstream fluid processing system configured to accept a fluid flow into an inlet device. The first flow channel section is an upper section of the inlet device, and includes an inner gas-permeable wall, which may be formed of a porous metal, porous ceramic, porous plastic, or other suitable construction material to enclose the upper portion of the first flow channel. The porous inner wall has an upper portion bounded by an inner surface flow channel. The breathable wall is surrounded by an outer wall enveloping type, forming an open relationship with the porous inner wall. The outer wall is not porous in character, but is provided with a gas flow port. With this configuration, an inner annular volume is formed between the respective inner porous wall and the outer sealing wall. The gas flow port can be coupled to a gas source in a flow relationship, for example, by a suitable valve and control device, the gas κ is flowed into the inner ring volume at a predetermined low rate for the gas to flow from the inner ring volume into the flow channel. A high-pressure gas flow port is also provided on the outer wall of the first flow channel section to couple a high-pressure gas source into a flow relationship for this gas to intermittently flow into the inner annular volume. This high-pressure gas flow is used to clean the inner porous wall. Any particles that have been deposited on its inner surface (the flow channel bounded by the first flow channel segment). High-pressure gas • This paper is sized for China National Standard (CNS) A4 (210X297 mm). Binding (please read the precautions on the back before filling this page) 473803 A7 B7 V. Invention description (9 wide body can also use appropriate valves and control devices to give M controllable flow at the desired pressure. Second flow channel section I M is coupled in series to the first flow channel section, for the fluid containing particulate solids to flow down from the first flow channel section into the second flow channel section. The second flow channel includes an outer wall with a liquid injection port, May be coupled to a liquid source, such as water or other processing liquid. The outer wall is coupled to the first flow channel section, such as by mating flanges on the respective outer walls of the first and second flow channel sections. The second flow channel It includes an inner weir wall, which has an open relationship with the outer wall. M defines an inner annular volume therebetween, and the inner weir wall extends toward the inner porous wall of the first flow channel section, but stops at less than this inner porous wall. K provides a gap between these respective inner walls and the first and second flow channel sections to define an overflow weir. When liquid flows into the inner annular volume between the outer wall and the inner wall of the second flow channel section The guided liquid overflows through the weir and flows downward along the inner surface of the inner wall of the second flow channel section. The liquid flows down along the inner wall to wash away any particulate solids from the wall and suppress the A solid is deposited or formed on the inner wall surface of the inner wall. Printed by the Central Standards Bureau of the Ministry of Economic Affairs and Consumer Cooperatives (Please read the precautions on the back before filling out this page) The first and second flow channel sections can be flanged to each other. Including a quick release clip assembly, K adapts to each of the first and second flow channel sections of the easy-to-remove inlet device. Furthermore, the first flow channel section of the inlet device can be connected to a top inlet device to quickly separate the inlet Section, which can also be easily disassembled for cleaning and maintenance purposes. In yet another aspect, the present invention relates to a gas flow receiving structure that resists solid settling when a particulate-filled air stream containing hot and aggressive components flows through. Paper size applies to Chinese National Standard (CNS) A4 specification (210X 297 mm) -12-473803 A7 B7 V. Description of the invention (10) Volume, blockage and corrosion. More specifically, this product This aspect of the invention relates to a gas / liquid interface structure, which can be used to send a hot air stream containing particulate solids from an upstream source of the gas stream to a downstream processing unit. The gas / liquid interface structure includes: a first vertically extending inlet flow The channel member defines a first airflow flow path therein. The inlet flow channel member has an upper inlet for guiding the airflow to the airflow flow path, and a lower outlet end for the airflow flowing through the airflow flow path in the inlet flow channel member. Exhaust airflow; a second flow channel member is connected to the first flow channel member and is spaced outwardly therefrom, K defines an annular volume therebetween, and this second flow channel member extends downward to a first flow channel member The lower mouth opening end and the lower outlet end, the second flow channel member has an upper liquid-permeable portion and a lower liquid-impermeable portion defining the airflow flow path of the second flow channel member; Two flow channel members defining an enclosed inner annular volume and a liquid flow on the outer wall member Inlet for guiding the liquid into the enclosed inner annular volume between the outer wall member and the second flow channel member; Yin Fan, He Gong Consumer Cooperative, Central Standards Bureau, Ministry of Economic Affairs (please read the precautions on the back before filling this page) to pass through the outer wall The liquid guided by the liquid flow inlet on the member enters the enclosed inner annular volume and leaks through the liquid permeable portion above the second flow channel member for liquid imperviousness along the second flow channel member The inner surface of the portion flows downward, and M provides a downward flowing liquid film on this inner surface of the liquid-impermeable portion of the second flow channel member, and M resists deposition and accumulation of particulate solids thereon, and flows through the first flow The airflow of the channel member is discharged at its lower exit end for the flow through the second flow channel. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) 13-473803 A7 B7 V. Description of the invention (π) Put huf 5¾ on the surface of the second surface of the mediator. The structure of the second part of the flow is connected to the contact body. The flow of the internal components of the borrow surface wall flows through the channel. The flow leaks on the surface, and the micro-resistance reaches the surface. The membrane section is thin, and the water flows down and down. The air part 0 ± the weir surface at the boundary. The membrane surface of the micro-wall of the grain surface is connected with the thin structure of the water channel to connect the middle stream and the second gas. The surface surface wall of the solid particles with the accumulation of bodily fluids is collected. The structure of the lower row-the surface of the junction surface mediator in the physical contact with the physical contact of the fluid and the gas barrier to protect the wall M film (please read the precautions on the back before filling this page) Ding Te Ι 1ΗΗ 1 species 1 is also vaporized from the monomer unit in the single-unit oxygen thermoelectricity, and the unit is washed under the water with the M and the solid body and solid particles. Micro-removal of its structural pores is more suitable as a part of body fluids that can be permeated and cleaned on the M channel to pass through the water to move through the flow. The second genus of gold scorch holes. As small as a big one Porcelain wall-to-wall micrometer porcelain is more pottery to have many holes or or, the plastic around the plastic fan and micrometer twilight said I detailed example is better to implement. Its path and the straight-line hole are made by the Central Standards Bureau of the Ministry of Economic Affairs, the Ministry of Economic Affairs, the Ministry of Economic Affairs, and the Industrial and Commercial Cooperatives. The photo is attached. According to Mingfa, this is based on one-I figure. The figure shows that this tube can be connected to the tube and coupled to the tube. The structure is connected to the port and connected to knc rc, and the connection can be used as a guide to L to source gas flow gas. The structure of the projection on the edge from the Q display is as good as the second one. It is suitable to have a K-shaped manufacturing cube. The training guide is half a source. This is the same as the trace, the heat of the group is here to prevent M flow. To the amount of energy. Enough to raise or increase the amount of condensed duct structure in the mouth. The paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 14 473803 A7 B7 V. Description of the invention ( 1.2) The inlet structure 60 shown in FIG. 1 includes an inlet section 7 including an inlet flange 16. The inlet flange fits snugly with the flange 18 of the upper ring section 8, which terminates at this upper end. The inlet section may be coupled to an upstream particulate-containing solids and / or particulate-shaped solids flow generating facility 90, for example, as a semi-conductor manufacturing tool. The annular section 8 comprises an inner porous wall 6, which is an appropriate porosity that is breathable in character, and an outer solid wall 9 defining an annular inner volume 20 therebetween. The inner surface of the inner porous wall 6 thus defines a flow channel 66 in the upper annular section 8. The outer solid wall 9 is enclosed by K at its upper and lower ends with respect to the inner wall 6 by end walls 40 and 42, and M encloses the annular internal volume. The outer wall 9 is provided with a gas inlet 22, and a gas feed line 24 is connected to the gas population. The gas feed line 24 is connected at its outer end to a gas source 4. A non-return valve 14 is provided in the gas feed line '24, and M adapts the airflow into the annular internal volume 20. The feed line 24 may also be provided with other flow control devices (not shown) for selectively feeding gas to the inner and inner volumes of the ring 2 from the source 4 at a desired amount and at a desired flow rate during system operation. Within 0. It can include a device for heating gas feed line 24 to increase the ventilation. Printed by the Consumers Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling this page). The means for heating the gas feed line 24 may include a resistance heater, a flow tracking line, a heating jacket, or any device known to those skilled in the art, and may be used to transfer thermal energy to any of the internal channels of the gas feed line 24 For other heating systems, M increases the temperature of the gas. For the purpose of illustration, the heating device used in the embodiment of Fig. 1 is constituted by a heating coil 23. A thermal jacket can also cooperate with the heating device to raise the internal temperature of the gas line 24. _The upper ring section 8 can also be equipped with an optional high-pressure gas injection port 50, and the paper size of the copy applies to the Chinese National Standard (CNS) A4 specification (21〇 × 297 mm). 1 15-473803 A7 B7 Central Standards Bureau M Industry Consumer Cooperatives Print 1i

五、發明説明(15) I I 段 8内 丨或包含 ^下環狀區段30內之氣體流動通道66中氣 I I I 流 排 出 。 在圖示之簧施例,管 70在 一約在 堰 壁 上 端 46下 面 ,—'、 I | 二 分 之 一吋之點 將氣流 排出,不過依氣流, 處 理 使 用 9 及 狀 請 閲 I I 況 而 定 ,管70可延伸更低於堰壁上端46,或 可 終 止 在 堰 壁 上 讀 背 I I I 端 46上 面。 之 注 I I 意 I 傳 送 管7 0可例 如Μ約 二分之 一 至 四吋內 徑 之 不 銹 鋼 構 造 事 項 I I 再 gm 而 成 ϋ 精於此項 技藝者 將會認 知 ,管70可Μ各種材料, 各 種 填 裝 - 本 大 小 ,各種剖面, 及各種 構形構 成 0 傳送管 70相 對 於 多 孔 壁 頁 I I 6及溢流堰I I置位所造成之共環狀流動型 9 用 Μ 在 處 理 氣 I I I 體 出 Ρ 傳送管及 進入部 位66時 9 使 處理氣 體 與 來 g 溢 流 堰 I I II 之 水 蒸汽之混 合最小 ,因此 使 退 出傳送 管 70 之 處 理 氣 體 I 訂 與 來 白 溢流堰11 之水蒸 汽間之 成 形 固體反 應 顯 著 為 最 小 9 I I 直 到 致 使溢流堰 II之作 用可沖 洗 進 入下游 消 除 裝 置 之 任 何 I I 固 體 之 足夠下游 點。 I 為 確 定在本發 明之範 圍Κ内 既 定入口 設 計 之 抗 堵 塞 效 率 9 -種適當之評定技術為在三 三氯矽烷之流動速率I -5 si P m I I ,在氮載體氣體之平均流動速率, 在 若干分 鐘 後 監 視 特 定 入 I □ 裝 置 之固體累 積量及 位置, 以 確 定設計 適 合 性 及 任 何 I 入 □ 裝 置參數變 化之效 應。可 能 希 望較長 之 觀 察 期 間 ,Μ I I 監 視 固 體增長之 性質。 依氣流 ,處理使用, 及 狀 況 而 定 ,其 I I 也 可 能 有利於在 氣體傳 送管及 在 氣 體傳送 管 外 部 與 多 孔 壁 I I 内 部 間 之環狀區 段保持 層狀軸 向 氣 流流動 9 Μ 保 證 適 當 之.. I | 罩 蓋 排 出流及入 口之包 容壁。 I I 傳 送 管70也可 予Μ加 熱,Κ減少凝結氣體 。固體藉流動 I I 本紙張尺度適用中國國家標率(CNS ) A4規格(210X 297公釐) 一 18 一 473803 A7 B7 五、發明説明(if;) 通過管之氣體之凝结而形成在管70之壁上。供加熱管 70 之適當裝置可包括電阻加熱器,流追蹤管線,加熱外套等, 此種加熱系統予Μ構造及設置為供轉移熱能量至傳送管70 之内部通道,Κ反抗凝結。供例示目的,加熱裝置示為包含 加熱線圈76。一熱外套也可與加熱裝置合作,Κ使傳送管 7 0之内部溫度升高。一熱外套可用以使側壁溫度升高,Μ 防止可凝结處理氣體在管中凝结。 在其下端,下環狀區段30可予Κ適當接合至水洗滌器13 之外殼。水洗滌器可Κ習知方式構成,供進行洗滌消除處 理流之微粒及可溶性組份。或則,入口裝置6 0可予Κ耦合 至任何其他處理設備,供處置或處理通過入口裝置,自入口 端至其排放端之氣流。 因此,藉入口裝置60提供一氣體流動路徑66,流入液氣體 可通過其在圖1中在箭頭”1”所示之方向流動至在圖1中在 箭頭” 2 ”所示方向之排放端。 經濟部中央標準局月工消費合作社印繁 (請先閱讀背面之注意事項再填寫本頁) 在操作時,含微粒固體之氣體藉一上游來源,諸如一半導 體製造工具(未示),藉適當連接管道予Κ引導,其如曾在上 文述及,可予Μ熱追蹤,Κ在入口裝置抑制氣流組份之有害 昇華或凝結。流在箭頭” 1”所示之流動方向進入入口裝置 60,並通過入口區段7(或如果安裝,通過傳送管70)並且進 入上環狀區段8。氣體諸如氮,或其他氣體,自來源4流動通 過連接至口 22之氣體進給管線24,並進入環狀内部容積20 。引導之氣體自環狀内部容積20流動通過可透氣壁6,進入 内部氣體流動通道66。含微粒或微粒形成氣體因此在來自 本紙張尺度適用中國國家標準(CNS ) Α4規格(21〇Χ:297公釐) 一 19 一 473803 A7 _____B7 五、發明説明(m 氣體進給管線24之氣流入環狀内部容積20及通過可透氣壁 (3時,流動通過内部氣體流動通道66,並進入水洗滌器13。 K此方式,來自來源4之氣體使環狀内部容積20加壓。此 壓力保證氣體之穩定流動通過多孔壁,進入内部氣體流動 通道66。此種低流動速率,氣體之穩定流動通過可透氣壁 使氣流中之徼粒保持流動通過内部氣體流動通道6 6 ,離開 入口裝置之內壁表面。而且,隨氣體流動流存在内部流動 通道66之任何氣體同樣保持離開入口裝置之內壁表面。 如果希望,氣體進給管線24可予K熱追蹤。如果流動通 過入口裝置之氣流含有可能凝结或昇華及沉積在入口结構 之壁之物質,便可能望有此種熱追蹤。 經濟部中央標隼局員工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) 同時,可通過高壓氣體注射口 50,使來自高壓氣體供給源 5之高壓氣體可定期流動通過高壓氣體進給管線52至環狀 内部容積20。為供此目的,管線52中可有一流動控制閥(未 示),適應高壓氣體之脈動引導。K此方式,在規定或預定 之間隔將高壓氣體注射進入環狀內部容積,俾使累積在可 透氣壁6之內表面之任何微粒破裂。脈動引導高壓氣體之 持績期間及時間順序,在該項技藝之技巧K内可容易確定, 而無需過度之實驗,Μ達成所希望之壁洗刷效應,其將會防 止固體積聚在可透氣壁表面。如果需要,配合服務半導體 製造工具之水洗滌器採用入口裝置時,可在工具分批循環 時中斷此高壓注射,俾藉適當整合操作連结至工具控制系 統之控制裝置,消除在工具排氣口之壓力波動。為供此目 的,一控制閥,諸如一螺線管閥可與控制工具總成之裝置適 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) ' -2 0 - 473803 A7 B7 五、發明説明(18) 當耦合。 在圖示之入口裝置貿施例,凸緣26及28可予以彼此夾緊, K允許上環狀區段8自下環狀區段30快速分開。為供此目 的,可採用一快速分開夾。可由適當材料諸如一種耐腐蝕, 高溫彈性體材料,在凸緣26及28之間形成密封墊片10。此 彈性體墊片另外作用如一熱阻擋層,K使熱自上環狀區段 至入口裝置之下環狀區段之轉移最小,一項在本發明之熱 追蹤實施例特別重要之特色。 入口裝置之上環狀區段之可透氣壁6可由任何適當可透 氣材料,例如陶瓷,金屬及金屬合金,及塑膠形成。作為一 特定實例,壁可由一種Hastelloy 276材料形成。上環狀區 段之外壁9可同樣由任何適當材料形成,並可例如為一薄壁 不銹鋼管。 經濟部中央標隼局負工消費合作社印製 入口装置之下環狀區段30可由任何適當材料諸如一聚氯 乙烯塑膠形成。自水供給源3 ,通過管線50 ,將水注射至外 壁1 2及内堰壁11間之環狀內部容積3 2。較佳為,水予K切 向注射,Μ允許在環狀内部容積32內之水之角動量導使水 在堰壁11之頂端46,並在入口裝置之内部流動通道66沿内 部堰壁之表面向下螺旋。沿堰壁11之内表面向下之此種水 流動用Μ將任何微粒沿流動通道6 6向下洗除至入口裝置下 面之水洗滌器14。如曾述及,例如下游處理單元為燃燒洗 滌器時,下環狀區段3 0為一可予以省略之任選结構特色。 自上游處理單元及入口裝置下游之洗滌器單元,將排氣 管壓力放出,可藉Κ容易確定通過入口裝置之壓降。壓降 一 21 一 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) 473803 A7 B7 五、發明説明(lil) 可藉一 Phot ohel ic計或其他適當壓力感測計予以感測,並 且此壓降讀數可予K發出至適當監視及控制設備,以監視 在洗滌器入口之堵塞。 使用根據本發明之入口裝置,可在水洗滌器與來自半導 體製造操作之工具廢氣流之間提供一介面,其在正常處理 操作不重復堵塞。本發明之入口裝置提供一有二輔肋處理 流之介面,一穩定之低流動清洗流及一高壓力脈動流。低 流動清洗流造成一惰性氣體例如氮之淨通量,離開上環狀 區段之內表面向中央流動通道6 6之中心線。高壓氣體流動 流對固體堵塞提供一種自行清潔能力。高壓氣體流動用K 消除累積在中央流動通道66之入口装置上環狀區段内表面 之任何微粒。 經濟部中央標準局負工消費合作社印絮 (請先閱讀背面之注意事項再填寫本頁) 氣體,夾帶之微粒,及先前沉積之微粒然後在入口裝置之 下環狀區段,在內壁表面被導引進入溢流,K向下沖洗進入 在入口裝置下游之水洗滌器。Μ此方式,一在上環狀區段 之可透氣壁與入口裝置之下環狀區段之堰壁間之直接介面 ,提供一種高度有效率之入口形體,其在操作時有效使微粒 固體之累積最少。 本發明之入口裝置有若干優點。在應用於半導體製造設 施,及供在半導體處理設施處理來自工具之廢氣排出物之 水洗滌器處理系統時,來自半導體工具之排氣可予Κ連缀 加熱,在水洗滌器入口裝置自工具排氣口一直至水介面。 在入口管線之熱追蹤可用以將能量傳導至管道中,藉以使 管線加熱,其藉強制對流將能量轉移至流動氣流。處理氣 本紙張尺度適用中國國家標隼(CNS ) Α4規格(210X 297公釐) -22 - 473803 A7 B7 五、發明説明(20) (請先閲讀背面之注意事項再填寫本頁) 體可藉使氣體流動至上環狀區段之熱追蹤氣體流動管線, κ及藉進給脈動高壓氣體至人口裝置之上環狀區段內環狀 容積之熱追蹤高壓氣體流動管線予κ加熱,一直向下至入 口裝置之下環狀區段之溢流堰壁。已加熱氣體之此種流動 將會使流動通過入口裝置之中央流動通道之處理氣體保持 在一由上游處理單元流動至入口裝置之氣流中之任何微粒 形成氣體之蒸汽壓力所確定之溫度,其否則將會凝结或昇 華及沉積在入口裝置之壁。 本發明之入口裝置,其另一優點為此结構可容易拆卸。 萬一入口装置在操作時堵塞,只要將夾或使入口裝置之凸 緣彼此固持之其他固著元件去除,结構便容易分開。上環 狀區段因此可藉去除使各別凸緣固持在定位之夾,並使進 給上環狀區段之各別氣體進給管線分開予Μ更換。 本發明之入口裝置,其又一優點為其在特性上為自行清 潔。在自上游處理單元流動至入口裝置之氣流中所夾帶, 或在入口裝置由化學反應所形成之微粒,可容易在入口结 構之上環狀區段,藉注射進入內環狀容積內之脈動高壓氣 經濟部中央標準局—工消費合作社印褽 體,自入口裝置之可透氣壁予以清潔。其時自入口装置上 環狀區段之内壁表面移除之微粒然後被導引至堰壁之溢流 部份,微粒固體在此處被沖洗至下游洗滌器。高壓氣體壓 力脈動之壓力,持續期間及週期可容易予Κ設定,Μ適應盛 行之系統微粒集中狀況及此等固體之特性。脈動高壓氣體 注射之有效性將依微粒固體之特性而定。本發明之入口结 構在性質上因此為自行清潔,而不使用代表先前技藝流體 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -23 - 473803 A7 B7 五、發明説明(21) 處理系統之所謂自行清潔裝置之刮板或柱塞裝置。 入口裝置上環狀區段之多孔壁元件,其材料規格依來自 上游處理單元之進入處理氣體而定。如果氣流包括酸性組 份,此等氣體將會在水洗滌器被吸收,並且將會存在於在入 口结構之下環狀區段循環至溢流堰壁之水。有些溢流堰壁 水可能將會飛濺在入口裝置上環狀區段之多孔內壁。多孔 壁在此情形宜選自抗腐蝕構造材料。供此目的之一種較佳 金屬材料為Hastelloy 276鋼,其在低溫水合酸狀況下圼現 優異耐腐蝕性。 本發明之入口装置,其另一優點為其在水洗滌器上游採 用如在本案例所證性說明之入口裝置時,使自水洗滌器之 頂部進入處理管道之蒸汽回流最少。意在解釋此優點,請 予察知,微粒可存在於有些半導體工具之廢氣流,如來自處 理工具之夾帶微粒,或如在氣流之流動路徑Μ内之化學反 應之反應物。 本發明使先前所說明之Richards on環狀效應最小或將其 消除。由於氣體在入口裝置上環狀區段之内表面多孔壁之 經濟部中央標準局兵工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) 穩定外流,在上環狀區段內壁表面時,靜態邊界層狀況無法 產生。有流動氣體之淨通量來自可透氣壁,其作用”推”使 處理氣體流動離開界限入口装置中央流動通道之壁,並避 免靜態邊界狀況之存在,藉Μ避免Richardson環狀效應。 因之,如果由於流動流中之化學反應而形成微粒,如此形成 之微粒找不到壁聚结在其上。微粒將代之為隨氣流流入水 洗滌器。夾帶之微粒情形也是如此。微粒一經達到入口頂 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 一 2 4 一 473803 A7 B7 五、發明説明(22) 部,其將會變成夾帶在氣體流動流中,因為其將不會有壁κ 收集在其上。 對抗產生R i c h a r d s ο η環狀效應之狀況,本發明之人口结 構上環狀區段上之多孔壁藉Κ用作一種對蒸汽向後轉移至 處理系統之廢氣管線之有效阻擋層。任何向後轉移將會由 於上述互相擴散機構而非常慢。此因素將大為增加洗滌器 故障之平均時間,由於藉本發明之入口裝置,洗滌器進口及 廢氣管線將不會常常堵塞。使用傳送管70時,由於藉流動 通過多孔壁6之氣體之作用而形成環狀氣體遮蓋,而使蒸汽 之回流最小或消除。 雖然本發明入口裝置之上環狀區段之多孔壁構件經予在 本案說明為Μ —種金屬材料構成,但請予察知,此可透氣壁 可Κ任何適當構造材料形成。例如,多孔壁可將一種多孔 陶瓷,塑膠(例如多孔聚乙烯,聚丙烯,聚四氟乙烯等),或能 經得起在使用本發明之入口裝置時所可能存在之侵蝕性大 氣,溫度極端,及輸入壓力之其他材料形成。 經濟部中央標準局Μ工消費合作社印^ (請先閲讀背面之注意事項再填寫本頁) 雖然本發明業經在本案在圖1中所例示之實施例說明為 包含各別個別之上及下環狀區段,其例如藉凸緣及關聯快 速分開夾或其他互相連接裝置予以彼此耦合,但請予察知, 此入口裝置可如在本發明之既定最後使用應用所可能希望 或必要,予Μ形成作為一種單元式或整合式結構,並且下環 狀區段對上環狀區段為任選區段,並且在有些情形可不必 要。 _琨請參照圖2,圃示一防堵塞入口裝置之另一實施例。入 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -25 - 473800 A7 B7 五、發明説明(23) 口 100可代之為包括錐形側緣105,被固體外壁110所外接。 傳送管1 1 2之外表面及錐形側緣1 0 5之内表面在其間界定一 環狀氣體流動通道1 1 5。錐形側緣Μ —種惰性氣體及/或液 體環繞含微粒固體及/或成形固體氣流。惰性氣體通過進 給管線120進入入口裝置。向下及向外張開之錐形側緣有 一漸進式減少之剖面積,其導致惰性氣體之速度增加及壓 力減少。錐形側緣105予以設計為產生惰性氣體速度等於 自傳送管11 2排出之氣流之速度。氣流與惰性氣體間流動 速度之匹配有利造成共層狀流動,Κ防止氣流中之擾動,並 且在二流動流間之介面防止混雜。入口之效率因此藉在操 作時使微粒固體之累積最小而增強。 向下及向外張開錐形側緣可也有利用Κ引導液體進入入 口结構。錐形側緣之外壁110及下端(底部周邊)係成彼此 橫向間開關係,Κ在其間界定一液體流動通道135。噴霧噴 嘴1 2 5可在入口内在周圍彼此間開,以使液體分散。錐形側 緣將液體導向壁表面130。如果液體例如為水,在壁表面 1 3 0將會形成水之薄薄膜,Μ將微粒固體沖洗至下游洗滌器 經濟部中央標準局員工消費合作社印繁 (請先閲讀背面之注意事項再填寫本頁) 。錐形側緣之材料規格係依在流動通過傳送管11 2之惰性 氣體及氣流而定。如果氣流包括酸性組份,此等氣體將會 存在於循環至噴霧噴嘴1 2 5之水。錐形側緣在此情形宜自 抗腐蝕材料製成。如參照圖1實施例所討論,傳送管,惰性 氣體,及/或水可予Κ加熱,以減少凝结。 圖3例示一防堵塞入口裝置200之另一實施例。外固體壁 205及多孔內壁210在其間界定一環狀内部容積。延伸之氣 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) ~ 2 6 一 473803 A7 B7 五、發明説明(24) 流傳送管212可用K在入口裝置之特定希望位置引導含微 粒固體及/或微粒成形固體之氣流。傳送管212予K耦合為 與一上游來源成氣體流動接受關係,並將氣流導引及排出 至入口裝置内之適當位置。内多孔壁210之面對内部表面 外接傳送管212之面對外部表面。外壁205在其上端被端蓋 2 1 5所包封。 外壁設有一水入口 225,其可予Μ接合至一水供給源。端 蓋215設有一氣體入口 230, Μ軸向引導罩蓋惰性氣體進入 入口裝置。端蓋215可代之為包括一多孔分散器結構 ,Κ 軸向分散惰性氣體進入入口裝置。一氣體腔或儲槽可任選 含有惰性氣體,例如氮,供導入入口。在此實施例,水予Κ 擠壓通過多孔內壁210,Κ形成一薄液體薄膜,Κ沖洗微粒 通過入口裝置。多孔壁2 1 0可Κ任何適當材料,例如陶瓷, 金屬,金屬合金,或一種塑膠諸如聚氯乙烯形成。如在上文 所討論,傳送管,惰性氣體,及/或水可予Κ加熱,以減少或 獲除凝結。 經滴部中央標準局Κ工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) 作為圖3中所示特定结構之另一替代性實施例,可Μ —參 照圖1所示型式之溢流堰代替多孔內壁2 1 0。堰壁可例如予 Κ構造為有一上端,對上端蓋2 1 5成間開關係,俾在其間形 成一界定溢流堰之間隙。 圖4示一防堵塞入口裝置100之另一實施例。上環狀區段 305包括上内多孔壁310及外上固體壁315,在其間界定一上 環狀内部室3 2 0。延伸之氣流傳送管3 2 2被上多孔壁3 1 0所 外接,並且示為位於與多孔壁3 1 0同軸。氣體傳送管之外表 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) -27 - 473803 A7 B7 五、發明説明(25) 面及上多孔壁之內表面在其間界定一環狀容積。傳送管 3 2 2予Μ耦合為與一上游氣體源成氣體流動接受關係。上 固體壁315包括一入口 325,Μ引導適當流體進入上内室320。 下環狀區段3 30包括下内多孔壁3 3 5及外下固體壁3 40 , 在其間界定一下環狀内室345。下固體壁包括一入口 350, 以引導流體進入下室345。在操作時,圖4之入口结構允許 惰性氣體透過上多孔壁310及水擠壓通過下多孔壁 335。 惰性氣體之流動使氣流中之微粒保持離開入口裝置之內壁 表面。下內多孔壁335之内表面上之薄水薄膜洗除來自入 口裝置之任何微粒。 經濟部中央標準局兵工消費合作社印繁 (請先閱讀背面之注意事項再填寫本頁) 圖4示傳送管322在一過渡部位355上面,在上區段 305及 下區段330之間將氣流排出。過渡部位3 5 5可為一鄰接式接 合上環狀區段305及下環狀區段330之部位。過渡部位355 也可包括一使上區段305及下區段3 30與外接氣體傳送管 3 2 2分開之部位。請予瞭解,傳送管可代之為在過渡部位 3 5.5下面延伸,並進入下區段。不論傳送管 322是否在上區 段内排出氣流,在過渡部位内排出,或在下區段内排出,將 依氣流,處理使用,及狀況而定。如在上文所討論,傳送管, 惰性氣體,及/或水可予Κ加熱,以減少或消除凝结。 圖5為根據本發明一種實施例之氣體/液體介面结構 4 1 0 之示意剖面正視圖。 氣體/液體介面结構410包括由一圓柱形细長壁414所界 定之第一垂直延伸入口流動通道構件4 1 2。圓柱形壁4 1 4外 接一在入口流動通道構件412内之包封之流動通道418。在 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) -28 - 473803 A7 B7 五、發明説明(26) 圓柱形壁4 1 4之上端提供一徑向向外延伸凸緣4 1 6 ,供將氣 體/液體介面结構接合至關聯之處理流動管道,導管,儀表 等。 第一入口流動通道構件412因此在其上端有一入口 420 , 並在其下端有一對應出口 4 2 2,因而開口入口及出口端K内 部容積界定一包括流動通道4 1 8之流動路徑,來自一上游處 理單元58之氣體可通過其流動,如在圖5中所例示在管線 460之情形。 第一入口流動通道構件4 1 2之長度可顯著短於圖1中所例 示,並且此流動通道構件之出口 422末端可終止在结構之內 環狀容積430,恰好在頂壁438下面。或則,此流動通道構件 之出口 42 2末端可較之圖1中所例示,在第二流動通道構件 424內終止在一較低垂直點。 第一入口流動通道構件412之垂直向下程度因此在實施 本發明時可予Μ改變,並且特定長度及尺寸特激可容易確 定,而無需過度之實驗,以選擇一種在使用本發明入口裝置 之特定應用達成希望操作特性之形體及配置。 經濟部中央標準局負工消費合作社印裝 (請先閲讀背面之注意事項再填寫本頁) 上游處理單元45 8可例如包含一半導體製造工具及關聯 之排出氣體處理裝置。此排出物處理裝置復可包含一氧化 器,供氧化排出氣體中之可氧化組份。適當氧化器為廣為 不同之型式,並可例如由一熱氧化單元,一電熱氧化器等所 構成。 上游處理單元45 8包含氣體產生裝置及氣體處理装置供 半導體製造操作時,引導至第一入口流動通道構件4 1 2之入 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -29 - 473803 A7 B7 五、發明説明(27) 口 42 0之氣流可為在升高之溫度,並可含有實際濃度,例如 成次微米大小微粒形式之微粒固體。 介面结構410另包含一第二流動通道構件24,其外接第一 流動通道構件4 1 2 ,並如圖所示,對其成間開關係,K在其間 界定一環狀容積43 0。第二流動通道構件424向下延伸至一 在第一流動通道構件41 2之下端下面之下端468,因而第一 流動通道構件之開口出口 42 2對第二流動通道424之開口下 端6 8成垂直間開關係。如所討論,第一流動通道構件之出 口 422之位置可在本發明之廣義實施予K廣為垂直改變。 第二流動通道構件424包含一上可透液體部份426及一其 餘不透液體部份428,如圖示自可透液體部份426尚下延伸 。上可透液體部份426及下不透液體部份428可K任何適當 方式形成,如例如藉接合一上多孔圓柱形分段 426至一在 最初為單獨之下固體壁圓柱形分段42 8,各別部份藉硬焊, 焊接,熔接,機械緊固件固著,或K任何其他適當方式,藉適 當接合裝置及方法予以彼此接合。 或則,第二流動通道構件424可自一單元式圓柱形管狀構 經濟部中央標準局貝工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 件形成,藉諸如噴水切削,蝕刻,燒结,微電加工之處理,或 藉Μ可將孔隙度或可透氣性特徵傳至此管狀構件上部之任 何其他適當技術,使其上部在特性上為可透液體。較佳為, 第二流動通道構件Κ在最初為分開之上及下部所形成,其 予Μ接合在一起,並且其中上部係藉一種多孔燒結金屬材 料,一種多孔塑膠材料,一種多孔陶瓷材料,或其他多孔材 料所構成,其中孔隙度為足夠大小特性,Κ如在下文更詳細 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) 一 30 - 473803 A7 B7 五、發明説明(四) 說明,允許液體透過。 氣體/液體介面结構410另包含一外壁構件43 4,包封式外 接第二流動通道構件,並與其界定一包封之内環狀容積47 0 。外壁構件43 4包含一圓柱形側壁436,一頂壁43 8及一底端 壁440,其共同包封內環狀容積470。側壁436設有一液體引 導口 442。該口可Μ任何適當方式提供,但在圖示之實施例 ,係由管狀口延伸部份444所構成。或則,該口可僅只為一 在側壁,或其他液體入口裝置之孔口或開口,從而可將液體 自一外液體供給源導入內環狀容積470。 在圆5實施例,液體入口 442與其中含有流動控制閥448之 液體引導管線446耦合。液體入口管線446予Μ連接至液體 供給儲槽450。 經濟部中央標率局貝工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 圖6為画5之裝置之頂視平面圖,示切向進給配置供液體 傳至圖6中所示介面結構之包封內環狀容積470。圖6示管 狀口延伸部份444設置為切向相交,並與外壁構件之圓柱形 側壁接合。以此種方式所引導之液體繞上多孔圓柱形分段 (可透液體上部份426 ),在周圍高度均勻分布,因而滲漏通 過多孔圓柱形分段所產生之液體薄膜在周圍對應均勻,Μ 如在下文更完全說明,罩蓋内壁表面47 2。 在管線446之液體流動控制閥448可予Κ耦合至適當控制 器/計時器裝置,包括一中央處理單元(C P U ),微處理器,流 動控制面板,及/或輔肋監視及控制裝置,Κ提供預定或否 則為選定之液體流動自儲槽450通過管線446至液體入口 442。如此導引之液體填滿内環狀容積47 0,並且此液體可 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) 34 473803 A7 B7 五、發明説明(29) 在任何適當處理狀況予μ引導。 為供處理氣流諸如來自半導體製造操作之熱充滿微粒排 出氣流,在内環狀容積470之液體可為水或其他含水媒質。 由於第二流動通道構件424之上可透液體部份426之可透 液體特性,來自內環狀容積470之液體透過第二流動通道構 件之上部426,並在此上部之內壁表面432示為液體小滴454 此排出之液體小滴由於重力效應而降落及與其他液體小 滴聚結,並且聚集在第二流動通道構件之下不透液體部份 之內壁表面472,形成一向下流動液體薄膜456。自第二流 動通道構件之下開口端468排放之液體薄膜中之液體可予 Μ導引至適當收集及處理裝置(未示),例如供其在一下游 處理單元464之共處理,氣流在管線46 2中自第二流動通道 構件之氣體流動通道452流動至此處理單元。 下游處理單元464可為一水洗滌器,反應室,或其他處理 装置或處理區,在管線462來自通道452之氣流流動在其中 經歷進一步處理操作,最後之排出氣體在管線466自下游處 理單元排放。 經濟部中央標準局Μ工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 氣體/液體介面结構410因此構造為在第一及第二流動通 道構件之間,第二流動通道構件之上可透液體部份42 6提供 一内環狀容積430,因而滲漏通過可透液體上部之液體可聚 结及產生降落之液體薄膜45 6。 藉此種配置,自流動通道 4 18流動至流動通道45 2之氣體遭遇第二流動通道構件下部 之内壁表面472,其Κ 一保護液體薄膜456予以遮蓋。因之, 自第一流動通道構件之下開口端42 2所排放之氣體中之任 本紙張尺度適用中國國家標準(CNS ) Α4規格(21〇Χ 297公釐) -32 - 473803 A7 B7 五、發明説明(30) 何侵蝕性物質將會相對於内壁表面被”緩衝”,Μ在第二流 動通道構件之此内壁表面使腐蝕及不利反應效應最小。 而且,引導液體至第二流動通道構件及外壁構件434間之 内環狀容積470,藉Μ提供一液體儲槽”外套”结構。液體藉 其提供至第二流動通道構件之多孔上部份Μ供透過,並且 液體向下”滲漏”,Μ在第二流動通道構件之內壁表面形成 一保護薄膜。 在第二流動通道構件之内表面47 2上之此降落薄膜也用 Μ將任何微粒自氣流夾帶及傳送離開,在無此液體薄膜時, 其可能沉積及聚集在第二流動通道構件之内壁表面。 因之,降落之液體薄膜對於第二流動通道構件之內壁表 面提供一種保護切能,Κ及提供一種夾帶媒質,其將徼粒固 體及任何其他氣相組份傳送離開,否則在積聚在流動通道 構件之内壁表面時,其將會有害。 作為圖5中所例示之此結構之另一優點,使用一上可透液 體部份426 ,用Κ相對於提供一諸如液體溢流堰之结構,其 中來自内環狀容積470之液體將僅只溢流過壁426之上端, 經濟部中央標隼局兵工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 並在壁之薄膜,在第二流動通道構件之全内表面長度向下 流動,而使液體使用最少。本發明之滲漏溢流堰結構使操 作所需要之液體保持在很低水準。 本發明之滲漏溢流堰結構優於簡單之液體溢流堰結構之 另一優點,為後者需要與垂直精確對準,以便溢流堰如設計 有效率工作,而滲漏溢流堰结構能耐與正常(垂直)取向之 偏差,而不喪失或損害操作設計效率。 本紙張尺度適用中國國家標準( CNS ) Λ4規格(210X297公釐) -33 - 473803 A7 B7V. Description of the invention (15) The gas flow in the gas flow channel 66 in the I I section 8 or in the lower ring section 30 is exhausted. In the illustrated spring embodiment, the tube 70 exits the airflow at a point about one-half of an inch below the upper end 46 of the weir wall. However, depending on the airflow, handling and use, please refer to II. The tube 70 may extend further below the upper end 46 of the weir wall, or may terminate above the read back III end 46 on the weir wall. Note II means I that the transfer tube 70 can be made of stainless steel with an inner diameter of about one-half to four inches, and then formed by gm. Those skilled in this art will recognize that the tube 70 can be made of various materials, various Filling-the size, various sections, and various configurations 0 co-ring flow type 9 caused by the placement of the transfer tube 70 relative to the porous wall sheet II 6 and the overflow weir II The transfer pipe and the entry point at 66 o'clock minimize the mixing of the processing gas and the water vapor from the g overflow weir II II, so that the process gas I exiting the transfer pipe 70 is ordered to form the water vapor from the white overflow weir 11 The solids response is significantly at a minimum of 9 II until there is sufficient downstream point for any II solids to cause the effect of the overflow weir II to be flushed into the downstream elimination device. I In order to determine the anti-clogging efficiency of a given inlet design within the scope of the present invention, 9-a suitable evaluation technique is the flow rate at tritrichlorosilane I -5 si P m II, the average flow rate at the nitrogen carrier gas, After a few minutes, monitor the solids accumulation and position of a particular I □ device to determine the design suitability and effects of any I □ device parameter changes. It may be desirable that M I I monitor the nature of solid growth during longer observation periods. Depending on the airflow, processing use, and conditions, its II may also be beneficial to maintain laminar axial airflow in the gas transfer tube and in the annular section between the outside of the gas transfer tube and the interior of the porous wall II. 9 M Ensure proper .. I | Cover the containment wall for discharge and inlet. The I I transfer tube 70 can also heat the M and reduce the condensed gas. Solid by Flow II This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm)-18-473803 A7 B7 V. Description of the invention (if;) Formed on the wall of tube 70 by condensation of gas from the tube on. Suitable devices for the heating tube 70 may include resistance heaters, flow tracking lines, heating jackets, etc. This heating system is constructed and arranged to transfer thermal energy to the internal channels of the transfer tube 70, and K resists condensation. For illustrative purposes, the heating device is shown as including a heating coil 76. A thermal jacket can also cooperate with the heating device to increase the internal temperature of the transfer tube 70. A thermal jacket can be used to raise the temperature of the side wall, and M prevents the condensable processing gas from condensing in the tube. At its lower end, the lower annular section 30 can be properly joined to the casing of the water scrubber 13. The water scrubber can be constructed in a conventional manner for washing to remove particles and soluble components from the treatment stream. Alternatively, the inlet device 60 may be coupled to any other processing equipment for disposal or treatment of airflow through the inlet device from the inlet end to its discharge end. Therefore, by using the inlet device 60 to provide a gas flow path 66, the inflowing liquid gas can flow through it in the direction shown by the arrow "1" in Fig. 1 to the discharge end in the direction shown by the arrow "2" in FIG. Printed by the Central Industry Bureau of the Ministry of Economic Affairs, Consumers Cooperative (please read the precautions on the back before filling out this page). During operation, the gas containing particulate solids is borrowed from an upstream source such as a semiconductor manufacturing tool (not shown). The connection pipe is guided by K, which, as mentioned above, can be tracked by M, and K inhibits the harmful sublimation or condensation of airflow components at the inlet device. The flow enters the inlet device 60 in the direction of flow indicated by the arrow "1", passes through the inlet section 7 (or, if installed, through the transfer pipe 70) and enters the upper ring section 8. A gas, such as nitrogen, or other gas, flows from source 4 through a gas feed line 24 connected to port 22, and enters the annular internal volume 20. The guided gas flows from the annular internal volume 20 through the gas-permeable wall 6 and enters the internal gas flow passage 66. Contains particulates or particulate-forming gases, so the Chinese National Standard (CNS) A4 specifications (21 ×: 297 mm) are applied at the paper scale. 19 19473803 A7 _____B7 V. Description of the invention (m gas feed line 24 air flow in The ring-shaped internal volume 20 and the gas-permeable wall (3 o'clock, flow through the internal gas flow channel 66, and enter the water scrubber 13. In this way, the gas from the source 4 pressurizes the ring-shaped internal volume 20. This pressure guarantees The stable flow of gas passes through the porous wall and enters the internal gas flow channel 66. With this low flow rate, the stable flow of gas through the breathable wall keeps the particles in the air flow flowing through the internal gas flow channel 6 6 and leaves the inlet device Wall surface. Also, any gas that is present in the internal flow channel 66 with the gas flow also remains away from the inner wall surface of the inlet device. If desired, the gas feed line 24 can be K-tracked. If the air flow through the inlet device contains Condensed or sublimated materials deposited on the walls of the entrance structure may be expected to have such thermal tracking. Central Bureau of Standards, Ministry of Economic Affairs Printed by the industrial and consumer cooperatives (please read the precautions on the back before filling this page) At the same time, the high-pressure gas from the high-pressure gas supply source 5 can be periodically flowed through the high-pressure gas feed line 52 to the ring through the high-pressure gas injection port 50 Shape internal volume 20. For this purpose, a flow control valve (not shown) may be provided in line 52 to accommodate the pulsation guidance of high pressure gas. K In this way, high pressure gas is injected into the annular internal volume at prescribed or predetermined intervals,俾 rupture any particles accumulated on the inner surface of the breathable wall 6. The duration and time sequence of the pulsation-guided high-pressure gas can be easily determined within the skill K of this technique without undue experimentation, and M achieves the desired The wall scrub effect will prevent solids from accumulating on the breathable wall surface. If necessary, when the water scrubber used to service semiconductor manufacturing tools uses an inlet device, this high pressure injection can be interrupted during the batch cycle of the tool, with appropriate integration Operate the control device connected to the tool control system to eliminate pressure fluctuations at the tool exhaust. For this purpose, a control Valves, such as a solenoid valve, can be used with the device of the control tool assembly. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 × 297 mm) '-2 0-473803 A7 B7 V. Description of the invention (18) When coupled. In the illustrated inlet device embodiment, the flanges 26 and 28 can be clamped to each other, K allows the upper ring section 8 to be quickly separated from the lower ring section 30. For this purpose, a Quick release clip. A gasket 10 can be formed between flanges 26 and 28 from a suitable material, such as a corrosion-resistant, high-temperature elastomer material. This elastomer gasket additionally functions as a thermal barrier, K makes the heat from the top ring The transition from the segment to the annular segment below the inlet device is minimal, a feature that is particularly important in the heat tracking embodiment of the present invention. The breathable wall 6 of the annular section above the inlet device may be formed of any suitable breathable material, such as ceramics, metals and metal alloys, and plastics. As a specific example, the wall may be formed from a Hastelloy 276 material. The outer wall 9 of the upper annular section may likewise be formed of any suitable material and may be, for example, a thin-walled stainless steel tube. Printed by the Central Bureau of Standards, Ministry of Economic Affairs, Consumer Cooperative, The annular section 30 under the entrance device may be formed of any suitable material such as a polyvinyl chloride plastic. From the water supply source 3, water is injected into the annular internal volume 32 between the outer wall 12 and the inner weir wall 11 through a line 50. Preferably, water is injected tangentially to K, and M allows the angular momentum of the water in the annular internal volume 32 to direct water to the top 46 of the weir wall 11, and the internal flow channel 66 of the inlet device along the inner weir wall. The surface spirals downward. This water flow down the inner surface of the weir wall 11 uses M to wash any particles down the flow channel 66 to the water scrubber 14 below the inlet device. As mentioned, for example, when the downstream processing unit is a combustion scrubber, the lower ring section 30 is an optional structural feature that can be omitted. From the upstream processing unit and the scrubber unit downstream of the inlet device, the pressure of the exhaust pipe is released, and the pressure drop through the inlet device can be easily determined by K. Pressure drop 21 21 (Please read the precautions on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 × 297 mm) 473803 A7 B7 5. Description of the invention (lil) You can borrow a Phot An ohel ic meter or other appropriate pressure sensor is used to sense this pressure drop reading and can be sent to K to appropriate monitoring and control equipment to monitor for blockage at the scrubber inlet. With the inlet device according to the present invention, an interface can be provided between the water scrubber and the tool exhaust gas stream from the semiconductor manufacturing operation, which does not repeatedly block during normal processing operations. The inlet device of the present invention provides an interface with two auxiliary rib processing streams, a stable low-flow cleaning stream and a high-pressure pulsating stream. The low-flow purge flow causes a net flux of an inert gas such as nitrogen, leaving the inner surface of the upper annular section toward the centerline of the central flow channel 66. The high-pressure gas flow provides a self-cleaning capability for solid plugs. K for high-pressure gas flow eliminates any particles accumulated on the inner surface of the annular section on the inlet device of the central flow channel 66. Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Consumer Cooperatives (please read the precautions on the back, and then fill out this page). Gas, entrained particles, and previously deposited particles are then a ring section below the inlet device, on the inner wall surface. Guided into the overflow, K flushes down into the water scrubber downstream of the inlet device. In this way, a direct interface between the breathable wall of the upper ring section and the weir wall of the ring section below the inlet device provides a highly efficient inlet shape that effectively makes the particulate solid Cumulative least. The inlet device of the present invention has several advantages. When applied to semiconductor manufacturing facilities, and water scrubber treatment systems for processing exhaust gas effluent from tools in semiconductor processing facilities, exhaust gas from semiconductor tools can be heated by K-linked, and it is self-draining at the inlet of the water scrubber. The air port goes all the way to the water interface. Heat tracing at the inlet pipeline can be used to conduct energy into the pipeline, thereby heating the pipeline, which transfers energy to the flowing gas stream by forced convection. The size of the paper is applicable to China National Standard (CNS) A4 (210X 297 mm) -22-473803 A7 B7 V. Description of the invention (20) (Please read the precautions on the back before filling this page) The heat-tracking gas flow line that makes the gas flow to the upper annular section, κ and the heat-tracking high-pressure gas flow line that feeds pulsating high-pressure gas to the annular volume in the annular section above the population device are heated by κ, all the way down To the overflow weir wall of the annular section below the inlet device. This flow of heated gas will keep the process gas flowing through the central flow channel of the inlet device at a temperature determined by the vapor pressure of any particulate-forming gas in the gas stream flowing from the upstream processing unit to the inlet device, otherwise Will condense or sublimate and deposit on the wall of the inlet device. Another advantage of the inlet device of the present invention is that the structure can be easily disassembled. In the event that the inlet device is blocked during operation, the structure can be easily separated as long as the clips or other fixing elements that hold the flanges of the inlet device to each other are removed. The upper ring section can therefore be removed by removing the clamps that hold the respective flanges in place and separate the individual gas feed lines feeding the upper ring section for replacement. Another advantage of the inlet device of the present invention is that it is self-cleaning in characteristics. The particles entrained in the air flow flowing from the upstream processing unit to the inlet device, or formed by chemical reactions in the inlet device, can easily be looped above the inlet structure and injected into the pulsating high pressure in the inner annular volume. The printed body of the Central Standards Bureau of the Ministry of Gas Economy-Industrial and Consumer Cooperatives is cleaned from the ventilating wall of the entrance device. The particulates removed from the inner wall surface of the annular section on the inlet device are then directed to the overflow portion of the weir wall where the particulate solids are washed to the downstream scrubber. The duration and period of the high-pressure gas pressure pulsation can be easily set to K, and M adapts to the prevailing system particle concentration and the characteristics of these solids. The effectiveness of pulsating high-pressure gas injection will depend on the characteristics of the particulate solid. The entrance structure of the present invention is therefore self-cleaning in nature, and does not use the fluid representing the previous art. The paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) -23-473803 A7 B7 V. Description of the invention (21 ) Scraper or plunger device of the so-called self-cleaning device of the processing system. The material specifications of the porous wall element in the annular section on the inlet device depend on the incoming process gas from the upstream processing unit. If the gas stream contains acidic components, these gases will be absorbed in the water scrubber and will be present in the water circulating in the annular section below the inlet structure to the overflow weir wall. Some weir wall water may splash on the porous inner wall of the annular section on the inlet device. The porous wall in this case is preferably selected from corrosion-resistant construction materials. A preferred metal material for this purpose is Hastelloy 276 steel, which exhibits excellent corrosion resistance under low temperature hydrated acid conditions. Another advantage of the inlet device of the present invention is that it minimizes the backflow of steam from the top of the water scrubber into the treatment pipe when the inlet device is used upstream of the water scrubber as demonstrated in this case. In order to explain this advantage, please be aware that particulates may be present in the exhaust gas flow of some semiconductor tools, such as entrained particles from a processing tool, or chemical reactants such as in the flow path M of a gas stream. The present invention minimizes or eliminates the Richards on ring effect described previously. The gas is printed on the inner surface of the circular section of the inlet device by the porous wall of the Central Standards Bureau of the Ministry of Economic Affairs, Industrial and Commercial Cooperatives (please read the precautions on the back before filling this page). Stable outflow in the upper circular section On wall surfaces, static boundary layer conditions cannot be generated. The net flux of the flowing gas comes from the gas-permeable wall, and its function “pushes” the process gas away from the wall of the central flow channel of the boundary inlet device, and avoids the existence of static boundary conditions, and avoids the Richardson ring effect. Therefore, if particles are formed due to a chemical reaction in a flowing stream, the particles thus formed cannot find a wall to agglomerate thereon. The particles will instead flow into the water scrubber with the airflow. The same is true of entrained particles. Once the particles reach the top of the inlet, the paper size applies the Chinese National Standard (CNS) A4 (210X297 mm) 1 2 4 1 473803 A7 B7 V. The description of the invention (22) will become entrained in the gas flow, because It will not have walls κ collected on it. In response to the situation where R i c h a r d s ο η annular effect is generated, the porous wall on the annular section of the population structure of the present invention utilizes K as an effective barrier layer for the exhaust gas pipeline that the steam is transferred back to the treatment system. Any backward transfer will be very slow due to the interdiffusion mechanism described above. This factor will greatly increase the average time of scrubber failure. Because of the inlet device of the present invention, the scrubber inlet and the exhaust gas line will not often be blocked. When the transfer pipe 70 is used, a loop-shaped gas shield is formed by the action of the gas flowing through the porous wall 6, thereby minimizing or eliminating the backflow of steam. Although the porous wall member of the annular section above the inlet device of the present invention has been described in this case as being composed of M metal materials, please be aware that the breathable wall may be formed of any suitable construction material. For example, the porous wall can be a porous ceramic, plastic (such as porous polyethylene, polypropylene, polytetrafluoroethylene, etc.), or can withstand the aggressive atmosphere and temperature extremes that may exist when using the inlet device of the present invention , And other materials formed by input pressure. Printed by the Central Standards Bureau of the Ministry of Economic Affairs and Consumer Cooperatives ^ (Please read the notes on the back before filling out this page) Although the present invention has been illustrated in the embodiment illustrated in Figure 1 as including the individual upper and lower rings Like sections, which are coupled to each other by, for example, flanges and associated quick release clips or other interconnecting devices, but please be aware that this entry device may be formed or formed as may be desired or necessary in the intended end use application of the present invention. As a unitary or integrated structure, the lower ring segment is optional to the upper ring segment, and may be unnecessary in some cases. _ 琨 Please refer to FIG. 2, which shows another embodiment of an anti-blocking entrance device. The size of this paper applies the Chinese National Standard (CNS) A4 (210X 297 mm) -25-473800 A7 B7 V. Description of the invention (23) The mouth 100 can be replaced by a tapered side edge 105 and covered by a solid outer wall 110 External. The outer surface of the transfer tube 1 1 2 and the inner surface of the tapered side edge 105 define an annular gas flow channel 1 15 therebetween. Conical side edge M—an inert gas and / or liquid surrounding a gas stream containing particulate solids and / or forming solids. The inert gas enters the inlet device through the feed line 120. The tapered side edges that open downward and outward have a progressively reduced cross-sectional area, which results in an increase in the speed of the inert gas and a decrease in pressure. The tapered side edge 105 is designed to produce an inert gas at a speed equal to the speed of the gas flow discharged from the transfer pipe 112. The matching of the flow speed between the gas flow and the inert gas is favorable for co-layered flow, K prevents disturbances in the gas flow, and prevents the interface between the two flows from mixing. The efficiency of the inlet is therefore enhanced by minimizing the accumulation of particulate solids during operation. Opening the tapered side edges downwards and outwards may also use K to guide liquid into the inlet structure. The outer wall 110 and the lower end (periphery of the bottom) of the tapered side edge are in a laterally spaced relationship with each other, and K defines a liquid flow channel 135 therebetween. The spray nozzles 1 2 5 can be spaced apart from one another around the inside of the inlet to disperse the liquid. The tapered side edges direct liquid to the wall surface 130. If the liquid is, for example, water, a thin film of water will be formed on the wall surface 130, and M will wash the particulate solids to the downstream scrubber of the Central Standards Bureau of the Ministry of Economic Affairs, the Consumer Cooperatives of India. (Please read the precautions on the back before filling in this Page). The material specifications of the tapered side edges depend on the inert gas and gas flow flowing through the transfer tube 112. If the gas stream contains acidic components, these gases will be present in the water circulating to the spray nozzles 1 2 5. The tapered side edge should in this case be made of a corrosion resistant material. As discussed with reference to the embodiment of Figure 1, the transfer tube, inert gas, and / or water may be heated by K to reduce condensation. FIG. 3 illustrates another embodiment of an anti-clogging inlet device 200. The outer solid wall 205 and the porous inner wall 210 define an annular internal volume therebetween. Extending the air This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) ~ 2 6 473803 A7 B7 V. Description of the invention (24) The flow delivery pipe 212 can be used to guide K at the specific desired position of the inlet device. Airflow of particulate solids and / or particulate shaped solids. The transfer tube 212 is coupled to K in a gas flow receiving relationship with an upstream source, and directs and discharges the gas flow to an appropriate position in the inlet device. The inner surface of the inner porous wall 210 faces the outer surface of the transfer tube 212. The outer wall 205 is enclosed at its upper end by an end cap 2 1 5. The outer wall is provided with a water inlet 225 which can be connected to a water supply source. The end cap 215 is provided with a gas inlet 230, which guides the inert gas of the cover axially into the inlet device. The end cap 215 may instead include a porous diffuser structure, and K is dispersed axially into the inlet device. A gas chamber or tank may optionally contain an inert gas, such as nitrogen, for introduction into the inlet. In this embodiment, water is squeezed through the porous inner wall 210, K forms a thin liquid film, and K rinses the particles through the inlet device. The porous wall 210 can be formed of any suitable material, such as ceramic, metal, metal alloy, or a plastic such as polyvinyl chloride. As discussed above, the transfer tube, inert gas, and / or water may be heated by K to reduce or eliminate condensation. Printed by the Central Bureau of Standards of the Ministry of Industry and Labor Cooperatives (please read the precautions on the back before filling out this page) As another alternative embodiment of the specific structure shown in Figure 3, you can refer to the type shown in Figure 1 An overflow weir replaces the porous inner wall 2 1 0. The weir wall can be constructed, for example, as having an upper end, which is spaced apart from the upper end cover 2 1 5, and a gap defining an overflow weir is formed therebetween. FIG. 4 shows another embodiment of an anti-blocking inlet device 100. The upper annular section 305 includes an upper inner porous wall 310 and an outer upper solid wall 315 defining an upper annular inner chamber 3 2 0 therebetween. The extended airflow transfer tube 3 2 2 is circumscribed by the upper porous wall 3 1 0 and is shown coaxially with the porous wall 3 1 0. Outside the gas transfer tube, the paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -27-473803 A7 B7 V. Description of the invention (25) The inner surface of the surface and the upper porous wall define a ring shape in between Volume. The transfer tube 3 2 2 is coupled to a gas flow receiving relationship with an upstream gas source. The upper solid wall 315 includes an inlet 325, which directs an appropriate fluid into the upper inner chamber 320. The lower annular section 3 30 includes a lower inner porous wall 3 3 5 and an outer lower solid wall 3 40, and an annular inner chamber 345 is defined therebetween. The lower solid wall includes an inlet 350 to direct fluid into the lower chamber 345. In operation, the inlet structure of Fig. 4 allows inert gas to pass through the upper porous wall 310 and water to squeeze through the lower porous wall 335. The flow of the inert gas keeps the particles in the air stream away from the inner wall surface of the inlet device. A thin water film on the inner surface of the lower inner porous wall 335 removes any particles from the inlet device. Printed by the Central Standards Bureau of the Ministry of Economic Affairs of the Military Industry Cooperatives (please read the precautions on the back before filling out this page) Figure 4 shows the transfer pipe 322 above a transition site 355, between the upper section 305 and the lower section 330 The air flow is discharged. The transition portion 3 5 5 may be a portion that adjoins the upper annular section 305 and the lower annular section 330 in an abutting manner. The transition portion 355 may also include a portion separating the upper section 305 and the lower section 3 30 from the external gas delivery pipe 3 2 2. Please understand that the transfer tube can instead extend below the transition site 3 5.5 and enter the lower section. Regardless of whether the transfer pipe 322 discharges airflow in the upper section, discharges in the transition area, or discharges in the lower section, it will depend on the airflow, processing use, and conditions. As discussed above, the transfer tube, inert gas, and / or water may be heated by K to reduce or eliminate condensation. FIG. 5 is a schematic cross-sectional front view of a gas / liquid interface structure 4 1 0 according to an embodiment of the present invention. The gas / liquid interface structure 410 includes a first vertically extending inlet flow channel member 4 1 2 delimited by a cylindrical elongated wall 414. The cylindrical wall 4 1 4 is externally connected to an enclosed flow passage 418 inside the inlet flow passage member 412. Applicable to Chinese paper standard (CNS) A4 specification (210 × 297 mm) on this paper scale -28-473803 A7 B7 V. Description of the invention (26) Cylindrical wall 4 1 4 The upper end is provided with a flange extending radially outward 4 16. For joining gas / liquid interface structures to associated processing flow pipes, conduits, meters, etc. The first inlet flow channel member 412 therefore has an inlet 420 at its upper end and a corresponding outlet 4 2 2 at its lower end, so the internal volume of the open inlet and outlet end K defines a flow path including the flow channel 4 1 8 from an upstream The gas of the processing unit 58 may flow through it, as illustrated in the case of line 460 in FIG. 5. The length of the first inlet flow channel member 4 1 2 may be significantly shorter than that exemplified in FIG. 1, and the end of the outlet 422 of this flow channel member may terminate within the structure of the annular volume 430, just below the top wall 438. Alternatively, the end of the outlet 42 2 of the flow channel member may terminate at a lower vertical point within the second flow channel member 424 than illustrated in FIG. 1. The vertical downward degree of the first inlet flow channel member 412 can therefore be changed during the implementation of the present invention, and the specific length and size of the special stimulus can be easily determined without undue experimentation in order to choose a method of using the inlet device of the present invention. The specific application achieves the shape and configuration of the desired operating characteristics. Printed by the Central Standards Bureau of the Ministry of Economic Affairs and Consumer Cooperatives (please read the notes on the back before filling this page). The upstream processing unit 45 8 may, for example, include a semiconductor manufacturing tool and an associated exhaust gas processing device. The effluent treatment apparatus may include an oxidizer for oxidizing oxidizable components in the exhaust gas. Suitable oxidizers are of widely different types, and may be constituted, for example, by a thermal oxidation unit, an electrothermal oxidizer, and the like. The upstream processing unit 45 8 includes a gas generating device and a gas processing device for semiconductor manufacturing operations, and is guided to the first inlet flow channel member 4 1 2 The size of this paper is applicable to China National Standard (CNS) Α4 specification (210X 297 mm) -29-473803 A7 B7 V. Description of the invention (27) The airflow at port 42 0 may be at an elevated temperature and may contain actual concentrations, such as particulate solids in the form of sub-micron size particulates. The interface structure 410 further includes a second flow channel member 24, which is external to the first flow channel member 4 1 2 and, as shown in the figure, is in an open relationship with it, and K defines an annular volume 43 0 therebetween. The second flow passage member 424 extends downward to a lower end 468 below the lower end of the first flow passage member 412, so that the opening outlet 42 of the first flow passage member is perpendicular to the lower end 68 of the second flow passage 424. Open relationship. As discussed, the position of the outlet 422 of the first flow channel member can be widely changed vertically in the broad implementation of the present invention. The second flow channel member 424 includes an upper liquid-permeable portion 426 and a remaining liquid-impermeable portion 428, which extends from the liquid-permeable portion 426 as shown in the figure. The upper liquid-permeable portion 426 and the lower liquid-impermeable portion 428 can be formed in any suitable manner, such as by joining an upper porous cylindrical section 426 to a solid wall cylindrical section 42 8 which is initially separate and solid. The individual parts are joined to each other by brazing, welding, welding, mechanical fastener fixing, or any other suitable means by appropriate joining devices and methods. Alternatively, the second flow channel member 424 may be formed from a unitary cylindrical tubular structure printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperatives (please read the precautions on the back before filling this page), such as water jet cutting, Etching, sintering, micro-electro-machining, or any other suitable technique that allows the porosity or gas permeability characteristics to be passed to the upper portion of this tubular member by making the upper portion liquid-permeable in character. Preferably, the second flow channel member K is formed initially as a separate upper and lower part, which is joined together, and wherein the upper part is borrowed from a porous sintered metal material, a porous plastic material, a porous ceramic material, or It is composed of other porous materials, where the porosity is a sufficient size characteristic. As explained in more detail below, the paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm). 30-473803 A7 B7 V. Description of the invention (IV) ) Instructions that allow liquid to pass through. The gas / liquid interface structure 410 further includes an outer wall member 434. The encapsulating type is externally connected to the second flow channel member and defines an encapsulating inner annular volume 47 0 therewith. The outer wall member 43 4 includes a cylindrical side wall 436, a top wall 43 8 and a bottom end wall 440, which collectively enclose the inner annular volume 470. The side wall 436 is provided with a liquid guide opening 442. The mouth may be provided in any suitable manner, but in the illustrated embodiment, it is constituted by a tubular mouth extension 444. Alternatively, the port may be only an opening or opening in the side wall or other liquid inlet device, so that liquid can be introduced into the inner annular volume 470 from an external liquid supply source. In the embodiment of circle 5, the liquid inlet 442 is coupled to a liquid guide line 446 containing a flow control valve 448 therein. The liquid inlet line 446 is connected to the liquid supply storage tank 450. Printed by the Shell Standard Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling out this page). Figure 6 is a top plan view of the device shown in Figure 5, showing the tangential feed configuration for liquid transfer to Figure 6. The enveloping inner annular volume 470 of the interface structure shown. Figure 6 shows that the tubular mouth extension 444 is arranged to intersect tangentially and engages the cylindrical side wall of the outer wall member. The liquid guided in this way is wound around the porous cylindrical section (the upper portion 426 that is permeable to the liquid) and is evenly distributed around the periphery, so the liquid film produced by the leakage through the porous cylindrical section is correspondingly uniform around the periphery. Μ As explained more fully below, the cover inner wall surface 47 2. The liquid flow control valve 448 at line 446 may be coupled to a suitable controller / timer device, including a central processing unit (CPU), microprocessor, flow control panel, and / or auxiliary rib monitoring and control device, K A predetermined or otherwise selected liquid flow is provided from storage tank 450 through line 446 to liquid inlet 442. The liquid thus guided fills the inner annular volume of 47 0, and the liquid can be used in accordance with the Chinese National Standard (CNS) A4 specification (210X 297 mm) at this paper size 34 473803 A7 B7 V. Description of the invention (29) In any appropriate The processing conditions are guided by μ. To fill the particulate discharge air for processing gas streams, such as heat from semiconductor manufacturing operations, the liquid in the inner annular volume 470 may be water or other aqueous media. Due to the liquid-permeable property of the liquid-permeable portion 426 above the second flow channel member 424, the liquid from the inner annular volume 470 penetrates the upper portion 426 of the second flow channel member and is shown on the inner wall surface 432 of this upper portion as Liquid droplets 454 The discharged liquid droplets fall and coalesce with other liquid droplets due to the effect of gravity, and gather on the inner wall surface 472 of the liquid-impermeable portion under the second flow channel member, forming a downward flowing liquid Film 456. The liquid in the liquid film discharged from the open end 468 below the second flow channel member can be guided to an appropriate collection and processing device (not shown), for example, for co-processing in a downstream processing unit 464, and the gas flow in the pipeline The gas flow channel 452 from the second flow channel member in 46 2 flows to this processing unit. The downstream processing unit 464 may be a water scrubber, a reaction chamber, or other processing devices or processing areas. The gas flow from the channel 452 at line 462 undergoes further processing operations, and the final exhaust gas is discharged from the downstream processing unit at line 466. . Printed by the Central Standards Bureau of the Ministry of Economic Affairs, M Industrial Consumer Cooperative (please read the notes on the back before filling this page). The gas / liquid interface structure 410 is therefore constructed between the first and second flow channel members, and the second flow channel member. The upper liquid-permeable portion 42 6 provides an inner annular volume 430 so that the liquid leaking through the liquid-permeable upper portion can coalesce and create a falling liquid film 45 6. With this configuration, the gas flowing from the flow channel 4 18 to the flow channel 45 2 encounters the inner wall surface 472 of the lower portion of the second flow channel member, and its K-protective liquid film 456 covers it. Therefore, any paper size in the gas discharged from the open end 42 2 below the first flow channel member is applicable to the Chinese National Standard (CNS) A4 specification (21〇 × 297 mm) -32-473803 A7 B7 V. Explanation of the invention (30) Any aggressive substance will be "buffered" with respect to the inner wall surface, and M will minimize corrosion and adverse reaction effects on this inner wall surface of the second flow channel member. Moreover, the liquid is guided to the inner annular volume 470 between the second flow channel member and the outer wall member 434, and a liquid storage tank "outer cover" structure is provided. The liquid is supplied to the porous upper part M of the second flow channel member for transmission, and the liquid "leaks" downward, and M forms a protective film on the inner wall surface of the second flow channel member. This falling film on the inner surface 47 2 of the second flow channel member also entrains and transports any particles from the airflow with M. Without this liquid film, it may deposit and collect on the inner wall surface of the second flow channel member . Therefore, the falling liquid film provides a protective cutting energy to the inner wall surface of the second flow channel member, and provides an entrained medium that transports the solid particles and any other gas phase components away, otherwise it accumulates in the flow The inner wall surface of the channel member will be harmful. As another advantage of this structure illustrated in FIG. 5, the use of an upper liquid-permeable portion 426 is used to provide a structure such as a liquid overflow weir, in which the liquid from the inner annular volume 470 will only overflow Flowing through the upper end of the wall 426, printed by the Central Bureau of Standards, Ministry of Economic Affairs, the Military and Industrial Consumer Cooperatives (please read the precautions on the back before filling in this page) Flowing down while minimizing liquid use. The leakage weir structure of the present invention keeps the liquid required for operation at a very low level. Another advantage of the leakage weir structure of the present invention over the simple liquid overflow weir structure is that the latter needs to be accurately aligned with the vertical so that the overflow weir can work efficiently if designed, and the leakage weir structure can withstand Deviation from normal (vertical) orientation without losing or compromising operational design efficiency. This paper size applies to Chinese National Standard (CNS) Λ4 specification (210X297 mm) -33-473803 A7 B7

五、發明説明(3U 換言之,本發明之滲漏溢流堰結構,其特徵為使溢流堰水 添加速率與结構之水準,κ及與可透液體堰壁之最小濕潤 速率解除耦合(由於無需建立及保持界限液體庫存量供開 始液體自溢流堰排出,如在習知溢流结構之情形)。 作為圖5中所例示型式之氣體/液體介面結構之一種例證 性實例,可在處理來自半導體製造操作之排出氣體之熱氧 化器單元下游採用此種结構,因而在管線460進入介面结構 4 1 0之氣流為在升高之溫度並充滿微粒,諸如二氧化矽,徵 粒金屬,及類似者,如次微米大小微粒或甚至較大固體,K 及侵蝕性固體。 在此實施例,第二流動通道構件之上部426可由一厚度約 為1/1 6吋,平均孔大小約為2微米之燒结金屬壁構成。第一 流動通道構件4.1 2之長度可約為448吋,有一直徑約為 2.5 时。對應之第二流動通道構件42 4可對應有一長度約為 13.5时,有一直徑約為4.5吋。外壁構件434可有一垂直長 度約為5 , 5时,有一直徑約為6吋。 經濟部中央標準局员工消費合作社印^ (請先閱讀背面之注意事項再填寫本頁) 在此系統,可採用水作為來自儲槽45 0之液體媒質,其予 Μ導入内環狀容積470 ,供使此液體滲漏通過至第二流動通 道構件之上可透液體部份1 426之内表面432。 在此系統使 用水可約為0 . 1 -0 . 3加侖/分鐘操作。 產業可應用性 可配合下游處理單元,諸如氣流擦洗器,純化器,過濾器, 中和單元,供回收流成份之析取系統,供相對於在上游軌跡 等獲得之組成另外處理氣體之反應系統,採用本發明之入 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -34 - 473803 A7 B7 五、發明説明(32) 閉 〇 之 置積 裝沉 口粒 構 Μ 予 置 裝□ 入 該 塞 流 氣 自 來 微動 自體 來流 生之 發利 使不 作及 操成 及形 列膜 排薄 , 之 成卜 明 。 說 小要 最簡 應之 效圖 力附 之 置 裝□ 入 塞 堵 防 之 例 施 實 性 證 例 明 發 本 據 根1 為 ii 圖 之 置 裝□ 人 塞 堵 防 之 例 施 實 性 代 替 明 發 本 據 根*, 一 I 為 圖2? 意 圖 示 裝 P 入 塞 堵 防 之 例 施 實 性 代 替 一 另 明 發 本 據 根1 ♦,為 圖 3 意 圖 示 圖 意 示 之圖 置 為 裝□ 入 塞 堵 防 之 例 施 實 性 代 替1 又 明 發 本 據 根 圖 意 示 之圖 置 為 構 结 面 介 體 液 / B Mafl 氣 之 rty 施 實 性 證 例 明 發 本 據 根 置 配 給 進 向 切 <111 種 圖 一 面 之 平積 視容 頂狀 。 之環 圖置內 視裝封 正之包 面 之 圖 卜 剖^構 意 6 結 示圖面 之 介 圖 至 傳 體 液 供 示 示 所 中 ------Γ--裝-- (請先閱讀背面之注意事項再填寫本頁) i% 經濟部中央標準局員工消費合作社印製 本紙張尺度適用中國國家摔準(CNS ) A4規格(210X 297公釐) -35- 473800 A7 i ^ ^ 11 R7 — 资 / -----i五、發明說明(35 ) 5 ο 2 經濟部智慧財產局員工消費合作社印製 3 3 3 液防外多氣端水氣防上上外上氣入下下外下入過氣第圓 置 道裝 通口 管 動入壁壁送 流塞 體内傳 體堵固孔流 蓋 構 結 室 口段壁壁部管 口 入區孔體内送 口入塞狀多固狀傳 入體堵環内上環流口 段壁壁室 區孔體内 狀 多固狀 環内下環 位 B- 咅 口渡體 構 結 面 介 體 液 件 構 道 通 動壁 流長 口细 Λ形 一 柱 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 38 修正頁 (請先閱讀背面之注意事項再填寫本頁) 473800 A7B7 五、發明說明(36 ) 經濟部智慧財產局員工消費合作社印製 416 徑 向 向 外 延 伸 凸 緣 418 包 封 之 流 動 通 道 420 入 口 422 對 I7ftf 懕 出 P 424 第 二 流 動 通 道 426 上 可 透 液 體 部 份 428 其 餘 不 透 液 體 部 份 430 内 環 狀 容 積 432 内 壁 表 面 434 外 壁 構 件 436 圓 柱 形 側 壁 438 頂 壁 440 底 端 壁 442 液 體 引 導 P 444 管 狀 口 延 伸 部 份 446 液 體 引 導 管 線 448 流 動 控 制 閥 450 液 體 供 給 儲 槽 452 氣 體 流 動 通 道 454 液 體 小 滴 456 向 下 流 動 液 體 薄 膜 458 上 游 處 理 單 元 460 管 線 462 管 線 (請先閱讀背面之注意事項再填寫本頁) --------訂·』---Γ 暮- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -39 -修正頁 473803V. Description of the invention (3U In other words, the leakage weir structure of the present invention is characterized by decoupling the weir water addition rate and the structural level, κ and the minimum wetting rate from the liquid-permeable weir wall (since Establish and maintain the limit of liquid inventory for the start of liquid discharge from the overflow weir, as is the case with conventional overflow structures.) As an illustrative example of the gas / liquid interface structure of the type illustrated in Figure 5, it can be processed in This structure is used downstream of the thermal oxidizer unit of the exhaust gas of the semiconductor manufacturing operation, so the airflow entering the interface structure 4 in line 460 is at an elevated temperature and is filled with particles such as silicon dioxide, particulate metals, and the like For example, submicron-sized particles or even larger solids, K, and aggressive solids. In this embodiment, the upper portion 426 of the second flow channel member may have a thickness of about 1/1 6 inches and an average pore size of about 2 microns. It is made of sintered metal wall. The length of the first flow channel member 4.12 may be about 448 inches and a diameter of about 2.5. The corresponding second flow channel member 42 4 may have When the length is about 13.5, there is a diameter of about 4.5 inches. The outer wall member 434 can have a vertical length of about 5, 5 and a diameter of about 6 inches. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs ^ (Please read the back Please fill in this page again.) In this system, water can be used as the liquid medium from the storage tank 450, which is introduced into the inner annular volume 470 for leakage of this liquid to the second flow channel member. The inner surface 432 of the liquid-permeable portion 1 426. The system can be operated with water at about 0.1-0.3 gallons per minute in this system. Industrial applicability can be matched with downstream processing units such as air scrubbers, purifiers, filtration Device, neutralization unit, extraction system for the components of the recovery stream, and a reaction system for processing gas relative to the composition obtained in the upstream trajectory, etc., adopting the Chinese paper standard (CNS) Α4 specification (in accordance with the present paper standard) 210X 297 mm) -34-473803 A7 B7 V. Description of the invention (32) Closed occluded sinker granular structure M Pre-installed If you do not do it, and the film is thin, it will be clear. It is said that Xiaoyao's simplest effect is to attach it to the device. The installation of the figure □ The example of human plugging prevention replaces the plaintext basis *, I is the figure 2? The illustration of the example of installing P plugging prevention instead of a plaintext basis 1 ♦, the diagram shown in Figure 3 is shown as an example of the installation of □ plugging and blocking prevention. It is a practical replacement of 1 and the figure shown in the figure according to the root figure is set as the structured surface mediator fluid / B Mafl The practical evidence of the rty of Qi shows that it is based on the flat view on the side of the distribution of the inward tangent < 111 kinds of pictures. The ring diagram is shown in the figure of the envelope with the seal inside. Figure 6 shows the illustration of the figure to the body fluid supply display ------ Γ--install-(Please read the back first Note: Please fill in this page again.) I% The paper size printed by the Employees' Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs applies to the Chinese National Standards (CNS) A4 specification (210X 297 mm) -35- 473800 A7 i ^ ^ 11 R7 — / ----- i V. Description of the invention (35) 5 ο 2 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 3 3 3 Liquid-proof and multi-gas end Water and gas prevent up and down, up and down, and down and down Inlet the first round channel pipe is inserted into the wall wall flow plug body transfer body plugging hole flow cover structure chamber mouth wall wall tube inlet area hole body delivery port plug multi-solid Inside the ring, in the upper wall of the block, in the wall wall, in the chamber, in the hole, in the body, and in the ring. Applicable to China National Standard (CNS) A4 (210 X 297 mm) 38 Correction page (Please read the notes on the back before filling Page) 473800 A7B7 V. Description of the invention (36) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperative, 416 Radially outward flange 418 Encapsulated flow channel 420 Inlet 422 Pair I7ftf P 424 Second flow channel 426 Liquid-permeable part 428 Other liquid-impermeable part 430 Inner annular volume 432 Inner wall surface 434 Outer wall member 436 Cylindrical side wall 438 Top wall 440 Bottom end wall 442 Liquid guide P 444 Tubular mouth extension 446 Liquid guide line 448 Flow Control valve 450 Liquid supply tank 452 Gas flow channel 454 Liquid droplet 456 Downward liquid film 458 Upstream processing unit 460 Line 462 Line (please read the precautions on the back before filling this page) -------- Order · 』--- Twilight-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -39-Correction page 473803

A7 : A J 五、發明說明(37 ) 464 下 游 處 理 單 元 466 管 線 468 下 端 470 内 環 狀 容 積 472 罩 蓋 内 壁 表 面 (請先閱讀背面之注意事項再填寫本頁) 1--------訂 ---Γ 華 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 一 40 -修正頁A7: AJ V. Description of the invention (37) 464 Downstream processing unit 466 Pipeline 468 Lower end 470 Inner annular volume 472 Cover inner wall surface (Please read the precautions on the back before filling this page) 1 -------- Order --- Γ Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs of China The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) One 40-Revised Page

Claims (1)

經濟部中央標準局員工消費合作社印製 473803 A8 B8 C8 D8 々、申請專利範圍 1. 一種供氣流自一上游來源通過至一下游軌跡之入口裝 置,該入口裝置選由自人口裝置(A)及(B)所構成類組之入 口裝置: (A)—入口裝置包含: 一可透氣壁包封一氣體流動路徑,及一外環狀外套外接 可透氣壁,K在其間界定一環狀氣體儲槽;以及 裝置供在含微粒固體及/或成形固體之氣流在壓力足K 導致氣體透過可透氣壁,以反抗固體沉積或形成在可透氣 壁之内表面時,通過此入口裝置流動至一氣體處理系統時, 將氣體導入環狀氣體儲槽;K及 (B ) —入口裝置包含: 一第一垂直延伸入口流動通道構件,有一上進口供引導 該氣流及一下端供排放該氣流; 一第二流動通道構件外接第一流動通道構件,並對其成 間開關係,K在其間界定一環狀容積,該第二流動通道構件 向下延伸至一在第一流動通道構件下端下面之下端,並且 該第二流動通道構件有一上可透液體部份及一在該上可透 液體部份下面之下不透液體部份; 一外壁構件包封式外接第二流動通道構件,並與其界定 一包封之内環狀容積;Μ及 一在外壁構件上之液體流動入口,供將液體導入在第二 流動通道構件及外壁構件間之包封内環狀容積。 2. —種防堵塞入口裝置供導引含微粒固體及/或成形固 體之氣流處理系統,該入口裝置包含: 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) (請先閱讀背面之注意事項再填寫本頁) 裝. 訂 473803 A8 B8 C8 D8 六、申請專利範圍 封 包 壁 氣 透壁 可氣 一 透 可 及 徑 路 流 體 氣 槽 儲 體 氣 狀 環1 定 界 間 其 在Μ 接 外 套 外 狀 環及 外K 足 力 壓 在 流 氣 之 體 固 形 成 或 氣 透 可 在 成 形 或 積 沉 體 固 抗 反Κ 及 , 體壁 固氣 粒透 微可 含過 在透 供體 置氣 裝致 導 時 統 系 311 理 處 體 氣1 至 置 動 裝 流 口 置 入 裝。之 p J曰項 \ 槽 2 Ift® ,圍 過 1¾氣範 通 ,狀利 時環專 面入請-表導申 內體如 之氣 3 壁將 Ρ1 含 包 另 導 供 源透 體可 氣在 壓M 高 , 一 合 與耦 口置 該裝 中 之 其槽 , 儲 槽形 儲環 形至 環送 人 傳 進 £ 、i 33 體脈 氣源 壓來 高 自 δ Μ 脈供 引及 用 作 塞第至 堵 圍合 抗範耦 tJ4 49. ΗΛ· 之利Μ 外專予 另請套 加申外 施如形 壁4.環 氣 外 及包 壁壁 氣一 透括 可包 該 , 中段 其區 丨徑 路 動 流 游 下 置 裝 Π 入 之 項 其所關 在套流 壁外溢 氣形體 透環液 可外成 與 一 口 並被切 , 壁與 段之槽 區段儲 一 區體 另徑液 之路形 徑動環 路流 一 動游定 流下界 體 ,間 氣 口 其 之切在 應 一Μ 對成 , 一 形接 封間外 之為 定作 確動 度下 高β 々面 超 i壁 ®il I 沿 ♦ΐ 並 谊 槽上 者 液在 二 環, 在 , 而時 因點 , 定 係一 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 膜 薄 證 液質 落媒 降壁 之障 上 一 其供 在提 一 面 抵Μ 表並辟二 在 此 膜 在 1S $ 落積 而ΖΓ 從體 固 形範段 或利區 積專徑 沉請路 然 申動 依如流 除 5 游 洗 下 之 面 表 内 之 壁 在 第 成 置 裝 P 入 之 項 有 設 套 外 形 環 外 之 之 之 置其 裝供 □一 。 入至 體該合 固中耦 何其口 氣 端1 之 第1 中 其 置 裝 P 人 之 項 2 第 圍 範 利 〇 專 源請 給申 供如 體 6 液 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 2 473803 A8 B8 C8 D8 申請專利範圍 關 33 流 體 氣 成 具Η 造 製 體 導 半 一 與 為 合 耦 予 徑 路 流 護 3¾ 徑 路 動 流 體 氣 中 其 置 裝 Q 入 之 項 6 第 圍 範 利 專 請 * 如 徑 〇 路 係動 關 流 勖 譆 流氣 體中 氣其 成 I 元 單 器 洗 擦 水 與第 為圍 合範 耦利 M專 予 請 端申 二 如 第 8 之 置 裝□ 入 之 項 6 器^ ^ 洗 套 擦入外 之 燒形。 ί 項 燃2Γ環置 與第外裝 為圍被口 合範管入 耦利送至 Μ 專傳流 予請-流氣 端申氣之 二如一體 第9.含固 之 包形 ο 另 成 係置粒 關裝微 動口含 流入送 體該傳 氣中供 成其 , -兀置』 將 供 置 裝 含 包 另 置 裝 口 入 之 項 9 第 圍 範 利 專 請 Φ 如 形 成 或 / 及 體 固 粒 微 含 之 過 通 33 流 抗 反 οΜ ,結 熱凝 加之 管流 送氣 傳之 流體 氣固 項 第 圍 範 利 專 請 串 如 包 另 置 装粒 口微 入含 該送 中傳 其供 置接 裝外 口所 入壁 之氣 項透 It 可 被 管 送 傳 流 氣 供 置 裝 含 包 另 置 裝 。□ 置入 裝之 口 項 人11 至 項 流第 氣圍 體範 固 利 形專 成請 或申 / D 及$ 體12 固 (請先閱讀背面之注意事項再填寫本頁) 裝· ▼線· 經濟部中央標準局員工消費合作社印製 成 或 / 及 體 固 粒 微 含 之 過 通 流 抗 反 ο Μ ,结 熱凝 加之 管流 送氣 傳之 流體 氣固 將形 傳之 流壁 氣之 該段 中區 其徑 —路 流 游 下 在 流 氣 之 禮 固 形 成 粒 微 含 將 管 送 置 裝□ 入 之 項 11 1—I 項 第 圍 範 利 專 請 电 如 放 uhr 面 下 端 上 置 裝 P 入 該 中 其 置 裝□ 人 之 項 2 第 圍 範 利 專 請 Φ 如 含 包 另 熱 加 體 氣 之 壁爸 垦 丨 nn 氣 透 可 過 通 透 滲 將 供 置 裝 置 裝□ 入 塞 堵 防 種1 導 供 及 體 固 粒 微 形 成 或 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 3 473803 A8 B8 C8 D8 六、申請專利範圍 含 包 構 结□ 入 該 段 區 道 通 ΠΠΓΠ 流 統之 系置 理設 處直 體垂 氣致 一 大 至二 流第 氣及 之一 體第 固 聯 串 此 彼 成 之 係體 關固 合粒 耦微 在 含 道 通 流 直 垂 致 大1 定 係 關 合 耦 聯 串 可 流 體 流 流 其 過 自 之 體 流 之 體 固 粒 微 括 ; 包 係並 1n^jw, 受段 接區 流上 體 之 流構 成結 構口 結入 口含 入包 對段 元區 單道 理通 處動 至流 源 一 來第 游該 上 包 壁 LT 夕1 ,s積 部容 上狀 之環 道内 通 一 動定 流界 限間 界 其 面在 表M 內·壁 J透 壁-可 氣繞 透圍 可式 內封 動環 流内 體入 氣流 該率 , 速 壁動 外流 之 之 段定 區預 道M 通體 動氣 流供 一 , 第源 在氣 □一 動至 流合 體耦 氣 K 一 予 P 流 之 置 裝□ 入 該 入 流 積 容 形 環 内 自 體 氣 後 隨 供 以 9 # » 積道 容通 杉 S 第 自 段體 區 流 道之 通體 動固段 流粒區 二 徼道 第含通 供動 第 該 予豸動 自 流 段 區 道 通 動 流V 一一 ' 第 至 合 耦 聯 流注 二 體 第液 入一 流有 下中 向 其 段 丨 區 道 通 動 括 包 壁 外 (請先閱讀背面之注意事項再填寫本頁) 內□一 射及 合 耦 段 區 道 通, 動 流 一 第 與 壁 外 段 區 道 通 33 流二 第 該 容 狀 環 内1 定 間 其 在K 係 關 開 間 成 壁 外 對 壁 堰 經濟部中央標準局員工消費合作社印製 第 向 壁 堰 内 而 第 在 限 界 面 壁表 氣內 透一 可有 此壁 到堰 不該 積在且 伸 延 一 壁定 氣界 透隙 可間 之 一 段 供 區提 道間 通其 動在 流Κ 第 入 流時 體積 液容 在狀 而環 從內 之 被 止並道 冬 , 星 穿1¾ [0動 ί 麵 浐流 溢 ?之 段 區 道 通 動 流 間動 壁流 堰 二. 内寧 其、沿 與"並 壁 , 外 之 段 區 道 通 流 堰 該 過 流 溢 is 液 之 導 固道 粒通 散 ΔΛν 3Μ3 何流 任 之 除一構 I結 壁 口 自 入 Μ過 , 通 39 li> 流湃 下流 向氣 面 之 表體 內 固 之粒 壁微 内 含 段在 區並 道 ,s Η sw« 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 4 473800 A8 B8 C8 D8 申請專利範圍 氣 壓 高1 含 包 ο 另 0 , 固置 成裝 形口 或入 積之 沉項 面15 表第 内圍 之範 壁利 堰專 内請 在申 D 帋 女 抑 6 I ΊΧ 時 壁 外 之 段 區 道 通 «源 流氣 一 壓 第高 在 一 口 至 動合 流耦 體可 口潔 33 流 K _ , 氣 壓 高 該 積 容 形 環 內 入 流 體 氣 歷 高 供 粒 微 之 上 壁 氣 透 可 在 成 形 或 積 沉 K 予 源 氣1 中 其 置 裝 □ 入 之 項 5 ΊΜ 第 圍 範 利 專 請 Φ 如 第 至 合 賴 專 請 甲 如 源 氣 壓 高一 ο 中 口 其 體 I 氣 之 上 壁 外 之 段II ΓΕ 第 E3 圍 道f 分車 通J* 動 流 置 裝 P 入 之 項 (請先閱讀背面之注意事項再填寫本頁) -裝. 第 至 合 親M 予 專 請 Φ 如 通 。 動 口流 體二 氣第 壓中 高其 之 , 上 壁 外 之 段 區 道 通 置 裝ο 入 之 項 5 第 圍 P 入 過 通 流 洗 擦 供 。 , 流 器氣 洗之 檫體 水固 至粒 合徽 接含 M之 予道 端通 下動 之流 段之 區構 道結 第 及1 第 該 中 其 置 裝 □ 入 之 項 5 一I 第 圍 範 利 專 請 Φ 流 一 第 該 。 中 合其 顆 此 彼 式 開 分 速 快 可 K 予 段 區 道 通 勖 33 流二 置 裝 Q 入 之 項 5 11 第 圍 範 利 專 請 串 如 1 2 第 及 段 區 道 通 第 圍 範 利 專 請 Φ 如 壁 氣 透 〇 可 準該 對中 tx, 軸 其 同 , 此 彼 M 予 段 區 道 通 33 流 置 裝□ 入 之 項 、1T ▼線 經濟部中央標準局員工消費合作社印製 成 形 所 屬 金 孔 多 --I*-» 種 1 係 壁 氣 透 可 該 中 其 置 裝 P 入 之 項 5 1S 第 圍 範 利 專 請 甲 如 成 形 所 瓷 陶 孔 多 種一 K 係 Κ 係 外 及 壁 氣 透 可 該 中 其 置 裝 P 入 之 項 5 1± 第 園 範 利 專 請 甲 如 塑η為 專 孔11套 Κ 請卜 多 外 種卩形 一 ?環 成 g 面 形r 剖 膠JI圓 壁 氣 透 可 該 中 其 置 裝 P 入 之 項 本紙張尺度適用中國國家標準(CNS ) Α4規格(210 X 297公釐) 5 473803 A8 B8 C8 D8 六、申請專利範圍 流二 第 該 中 其 置 裝 Q 入 之 項 5 1 第 圍 範 利 專 請 申 如 面 剖 形 圓 為 壁 堰 内 及 壁 外 之 段 區 道 通 置 裝□ 入 之 項 5 is 第 圍 範 利 專 請 申 如 流1 第 該 中 。 其具 ,Η 造 製 體 導 半 游 上 1 至 合 接Κ 予 段 區 道 通 置 裝□ 入 之 項 5 1S 第 圍 範 利 專 請 甲 如 接 LT 夕 所 面 表 内 之 壁 氣 透 可 被 管 送 傳來 流游 氣上 一 與 含 管 包送 另傳 ,流 氣 而 動 流 直 垂 致 大 在 係 0 納 容 動 流 體 氣 成 管 送 傳 流- 氣 與 及 將 內 道 源通 出 kF 0 流 氣 之 體 固 形 成 粒 微 第 圍 範 利 專 請 如 置 裝□ 入 之 項 (請先閱讀背面之注意事項再填寫本頁) 裝· 第 氣 rET 0 在 管 hh ¾S 傳流 流氣 氣之 該體 中固 其形 —成 粒 微 含 將 内 段 區 道 通 動 流 出 置 裝□ 入 之 項 8 2 第 圍 範 利 專 請 Ψ 如 送出 傳排 流流 氣氣 該之 中體 其固 ,形 成 粒 微 含 將 面 下 隙 間 之 堰 流 溢 定 界 在 管 置 裝□ 入 之 項 8 2 第 圍 範 利 專 請 串 如 在 管 。 送出 傳排 該流 中氣 其之 ,體 固 形 成 粒 微 含 將 面 上 隙 間 之 堰 流 溢 定 界 包 另 ▼線 將形 供成 置或 fs/ 體 固 粒 置微 裝含 口 之 入過 之 通 項動 15流 第抗 圍反 範Μ 利 I 專 請 甲 如 經濟部中央標準局員工消費合作社印製 结 熱凝 加之 管流 送氣 傳 之 流體 氣固 透 滲 3 第 y 裝 Η ^ P 範々入*鍾帛* i S 二一· 置 裝 含 口 引 入 導 之LO、供 項 W 5置 熱 加 體 將 供 置 裝 含 包 另 形 成 或 / 及 擐 固 粒 微 段壁 區孔 上多 一 下 含及 包上 構該 结 , 口 壁 入孔 該多 , 下 統一 系有 理段 處區 體下徑 氣一路 一 及動 至 壁流 流孔體 氣多氣 之上 一 體一封 固有包 體 流 蓋 罩1 納 容 壁 孔 多1 每 而 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 6 473803 A8 B8 C8 D8 六、申請專利範圍 35 .如申請專利範圍第34項之入口裝置,另包含一氣流傳 送管被該上多孔壁所外接,供排出上區段内之含微粒成形 固體之氣流。 36 .如申請專利範圍第34項之入口裝置,另包含一氣流傳 送管被上多孔壁所外接,供排出下區段內之含微粒成形固 體之氣流。 3 7 .如申_請專利範圍第3 4項之入口裝置,另包含一在該上 區段及下區段間之過渡部位,及一氣流傳送管,該氣流傳送 管排出過渡部位内之含微粒固體及/或成形固體之氣流。 38.如申請專利範圍第34項之入口裝置,另包含一軸向配 置之多孔结構,Μ導引流體進入該入口裝置。 3 9 . —種氣體/液體介面結構,供蓮送氣流自其上游來源 至一下游處理單元,該氣體/液體介面結構包含: 一第一垂直延伸入口流動通道構件有一上進口供導引該 氣流及一下端供排放該氣流; 經濟部中央標隼局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 一第二流動通道構件外接第一流動通道構件,並對其成 間開關係,以在其間界定一環形容積,該第二流動通道構件 向下延伸至一在第一流動通道構件下端下面之下端,並且 該第二流動通道構件有一上可透液體部份及一下不透液體 部份在該上可透液體部份下面; 一外壁構件,包封式外接第二流動通道構件,並與其界定 一包封之內環形容積;Κ及 一在外壁構件上之液體流動入口,供導引液體進入在第 二流動通道構件與外壁構件間之包封/之內環形容積。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) —7 - 473803 經濟部中央標準局員工消費合作社印製 A8 B8 C8 ’ D8 六、申請專利範圍 40.如申請專利範圍第39項之氣體/液體介面結構,其中 該第二流動通道構件之上可透液體部份包含一多孔圓柱形 壁構件。 4 1 .如申請專利範圍第4 0項之氣體/液體介面结構,其中 該多孔圓柱形壁構件係以一種選自由燒结金屬材料,多孔 陶瓷材料,及多孔塑膠材料所組成類組之材料所形成。 42. 如申_請專利範圍第40項之氣體/液體介面結構,其中 該第二流動通道構件之上可透液體部份係K 一種多孔燒結 金屬材料所形成。 43. 如申請專利範圍第40項之氣體/液體介面结構,其中 該可透液體部份係由一多孔壁有平均孔大小約在0 . 5至30 徵米之範圍所構成。 44. 如申請專利範圍第39項之氣體/液體介面结構,其中 該第一及第二流動通道構件在特性上各為圓柱形,並彼此 同軸。 45. 如申請專利範圍第39項之氣體/液體介面结構,其中 包封式外接第二流動通道構件之外壁構件包含一圓柱形側 壁,對第二流動通道構件成徑向間開關係,一頂部端壁,第 一液體流動通道構件延伸通過此壁,及一底端壁在外壁構 件之第二流動通道構件與側壁之間。 46. 如申請專利範圍第39項之氣體/液體介面结構,其中 該外壁構件上供導引液體進入第二流動通道構件與外壁構 件間之包封之内環形容積之液體流動入口予K搆成及排列 為供切向進給液體進入包封之内環形容積,供繞第二流動 (請先閱讀背面之注意事項再填寫本頁) •裝· 訂 _線 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 8 473803 經濟部中央標準局員工消費合作社印製 A8 B8 C8 D8 六、申請專利範圍 通道構件之上可透液體部份周邊分布所導引之液體。 47.如申請專利範圍第39項之氣體/液體介面结構,構成 並排列為致使溢流堰液體速率與結構之水平度解除聯繫。 48 .如申請專利範圍第3 9項之氣體/液體介面结構,構成 並排列為致使溢流堰液體速率與最低濕潤速率解除聯繫。 49. 一種氣體/液體介面結構,供蓮送氣流自其上游來源 至一下游處理單元,包含第一及第二流動通道構件在其間 界定一環形容積,而第二流動通道構件向下延伸至一低於 第一流動通道構件下端之高度,而一外壁構件包封式外接 第二流動通道構件,並與其界定一包封之內環形容積,並且 有一液體流動口在外壁構件上供導引液體進入包封之内環 形容積,其中該第二流動通道構件包括一上可透液體部份 與包封之内環形容積成液體流動相通,從而來自此容積之 液體可滲漏通過可滲透部份,並在第二流動通道構件之內 表面部份形成一降落液體薄膜,作為一供第二流動通道構 件之保護液體介面。 50. 如申請專利範圍第49項之氣體/液體介面结構,其中 該第二流動通道構件之上可透液體部份包含一多孔圓柱形 壁構件。 51. 如申請專利範圍第50項之氣體/液體介面結構,其中 該多孔圓柱形壁構件係Μ —種選自由燒结金屬材料,多孔 陶瓷材料,及多孔塑膠材料所組成類組之材料所形成。 52. 如申請專利範圍第50項之氣體/液體介面结構,其中 該第二流動通道構件之上可透液體部份係以一種多孔燒結 (請先閲讀背面之注意事項再填寫本頁) •裝· 、?τ ▼線 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) 9 473803 經濟部中央標準局員工消費合作社印裂 A8 B8 C8 D8六、申請專利範圍 金屬材料所形成。 53. 如申請專利範圍第50項之氣體/液體介面结構,其中 該可透液體部份係由一多孔壁有平均孔大小約在0 . 5至3 0 微米之範圍所構成。 54. 如申請專利範圍第49項之氣體/液體介面结構,其中 該第一及第二流動通道構件在特性上各為圓柱形,並彼此 同軸。 _ 55. 如申請專利範圍第49項之氣體/液體介面结構,其中 該包封式外接第二流動通道構件之外壁構件包含一圓柱形 側壁,對第二流動通道構件成徑向間開關係,一頂部端壁, 第一液體流動通道構件延伸通過此壁,及一底端壁在外壁 構件之第二流動通道構件與側壁之間。 56. 如申請專利範圍第49項之氣體/液體介面结構,其中 該外壁構件上供導引液體進入第二流動通道構件與外壁構 件間之包封之内環形容積之液體流動入口予Μ構成及排列 為供切向進給液體進入包封之内環形容積, 供繞第二流動通道構件之上可透液體部份周邊分布所導 引之液體。 57. 如申請專利範圍第49項之氣體/液體介面结構,構成 並排列為致使溢流堰液體速率與結構之水平度及最低濕潤 速率解除聯繫。 5 8 , —種供處理半導體製造排出氣體之糸統,包含: 一產生排出氣流之半導體製造單元; 一供氧化處理排出氣流之氧化作用單元; 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) _ ί Λ - (請先閱讀背面之注意事項再填寫本頁) -裝· 訂 ▼線 473803 A8 B8 C8 D8 申請專利範圍 元 單 用 作 化 氧 0 流 氣 出 LUI 0 送 蓮 供 構 结 面 介 體 液 / 體 氣 體 氣 該 導 引 供 P : 進 含 上 包 一 構有 结 , 面 件 介構 體道 液通 流 □ 入 元伸 單延 理直 處垂 游 一 下第 1 1 至 流 氣 該 放件 排構 供道 Τ勖 1 rA 一流,> 及 二 係 流第關 氣一開 該 間 成件 其構 對道 並通 ’動 I 流 道二 « Μ Ζ該 33 , 流積 一 容 第狀 接環 外 一 定 界 間 其 且液 並透 , 不 端下 下 一 之及 面 , 下份 B- 端 咅 下體 件 液 ; 搆透面 道可下 通上份 動 一 部 流有體 一 件液 第構透 在道可 1 通上 至-動該 伸流在 延二份 下第部 向該體 件 構 道 通 動 流 二 第 接 外 式 封 包 (請先閱讀背面之注意事項再填寫本頁) -裝_ Π 入 流 ; 體 積液 容之 狀件 件環構 構內壁 壁之外 外封在 一 包 一 定流 界二 其 第 與 在 並 入 , 導 體 液 將 供 氣 出 kF 之 構 結 積面 容介 狀體 環液 / 內 封 包 之 間 件 構 壁 外 與理 件處 構游 道下 通一 動 及 Μ 訂 體 氣 自 來 受 接 HU 至 直 流 經濟部中央標準局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) 1—I 11Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 473803 A8 B8 C8 D8 々, patent application scope 1. An inlet device for air flow from an upstream source to a downstream track, the inlet device is selected from the population device (A) and (B) The inlet device of the group: (A) —The inlet device includes: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket surrounding the gas-permeable wall, K defining a ring-shaped gas storage in between Trough; and a device for flowing gas into the gas through the inlet device when the air stream containing particulate solids and / or formed solids pressures enough to cause gas to penetrate the breathable wall to resist solid deposition or form on the inner surface of the breathable wall When processing the system, the gas is introduced into the annular gas storage tank; K and (B)-the inlet device includes: a first vertically extending inlet flow channel member, an upper inlet for guiding the airflow and a lower end for discharging the airflow; The two flow passage members are connected to the first flow passage member and are in an open relationship with each other. K defines an annular volume therebetween, and the second flow passage member faces Extending to a lower end below the lower end of the first flow channel member, and the second flow channel member has an upper liquid-permeable portion and a liquid-impermeable portion below the upper liquid-permeable portion; an outer wall member Encapsulated externally connects the second flow channel member and defines an enclosed inner annular volume with it; M and a liquid flow inlet on the outer wall member for introducing liquid between the second flow channel member and the outer wall member Sealed toroidal volume. 2. —A kind of anti-blocking inlet device for guiding the airflow processing system containing particulate solids and / or formed solids. The inlet device includes: This paper size is applicable to China National Standard (CNS) Α4 specification (210 × 297 mm) (Please read first Note on the back, please fill in this page again.) Packing. Order 473803 A8 B8 C8 D8 VI. Patent application scope Packet wall air-permeable wall can be air-permeable and accessible Path fluid air tank storage gas-shaped ring 1 The boundary between the Connect the outer ring and outer K of the outer shell. Foot pressure is formed on the body of the flowing gas, or it can be penetrated. It can be formed or accumulated in the body. When inducting, the system 311 manages the body gas 1 and inserts it into the moving port. Zhi p J term \ Slot 2 Ift®, surrounded by 1¾ Qi Fantong, the special time ring is specially invited to-please introduce the inner body such as the qi 3 wall containing P1 to guide the source through the body. The pressure M is high, and the coupling and the coupling port are placed in the grooves of the device, and the storage tank is stored in a ring shape to pass to the ring. The pressure of the i 33 body pulse gas source is high from the δ Μ pulse for introduction and use as a plug. To block encircling anti-fan coupling tJ4 49. The benefits of ΜΛ · and the special external application, please also apply the external application such as the shape of the wall 4. The surrounding air and the surrounding wall gas can be included, the middle section of the area The items placed in the road under the current flow are closed by the outer wall of the mantle wall, and the permeable fluid can be cut into a mouth and cut, and the grooves of the wall and the section store one section of the body and the other is the path of the fluid. The radial flow of the radial flow and the fixed flow of the lower boundary body, the cut of the air port should be a pair of M, and the shape outside the enclosure is determined as the high β under the high degree of motion.者 The liquid on the union tank is in the second ring, and now, because of the point, it must be the first (please read the precautions on the back before filling (This page) The Central Government Bureau of the Ministry of Economic Affairs, the Consumer Cooperative Co-operative printed film, thin film, liquid quality, and the barrier to falling off the wall. One of them is to mention one side and the second one. This film is at 1S $, and the product is solid. Fan Duan or the profit zone special path Shen Shen Lu Ran applied to remove the wall inside the surface according to the 5 swimming wash. The item in the first installation P has a set outside the outer ring. □ one. Into the body, solid coupling, coupled with He Qi's tone end 1 of the installation of the person P of the item 2 of the range of Fan Li 〇 Special sources please apply for the body 6 liquid This paper size applies Chinese National Standard (CNS) A4 Specifications (210X297 mm) 2 473803 A8 B8 C8 D8 Patent application scope 33 Fluid gas forming tools and manufacturing guides are coupled to the path flow protection 3¾ Path fluid gas is installed in the path Q Item 6 Fan Li special request * If the path 0 is a dynamic shut-off flow, the flow of gas in the gas is complete, and the unit is a single-unit scrubbing water.装 装 □ 入 的 项 6 器 ^ ^ Wash the cover into the shape of burning. ί Xiang Ran 2Γ ring set and the outer cover are surrounded by the mouth and fit into the tube, and the coupling is sent to the MV. The stream is sent to the request-the flow-end application of the second air as a whole. The micro-movement mouth of the grain contains the flow into the donor to supply it to the body.-Wu Zhi "Item 9 will be included in the supply and the package is placed in the mouth. Slightly contained through-pass 33 flow resistance, tube solidification, solidified condensation, tube flow, gas transmission, solid gas item. Fan Li special please string such as a package, install the grain port, and insert it into the transmission port. The gas item entering the wall through the outer mouth can be transmitted through the gas supply device, including the package and the other device. □ Place the mouthpiece person 11 to Xiangliudiqi body body fan Gu Li shape special request or apply / D and $ body 12 solid (please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs, and / or the body ’s solid particles contain excessive flow resistance, which is the section of the wall gas that will transfer the gas and solid that will be transferred to the tube. The area in the middle of the road—the flow of water flows down to form solid particles in the flow of air. It contains the tube to be sent and installed. Item 11 1-I. Section Fanli special please call if you put uhr on the lower end of the surface. The installation □ item of the person 2 Fan Li specially invited Φ If the wall contains heat and gas, it can be installed through the osmosis of the supply device. Donor body solid particles are micro-formed or the size of this paper is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) 3 473803 A8 B8 C8 D8 6. The scope of patent application includes package structure □ Into this section ΓΠ The system arrangement of the flow system is located in the vertical body, causing a large body to a second-rate body and a solid body, which are connected to each other. The solid-granular coupling is slightly closed in the channel-containing flow. The close-coupled series can be composed of fluid and solid particles which flow through the body flow; the package system is 1n ^ jw. The flow of the upper body in the receiving zone constitutes the structure. After a single reason, move to the source of the flow, and then visit the upper wall LT xi 1, s, and the ring of the volume is connected to a moving fixed flow boundary. The surface is in Table M. Wall J is transparent. The rate of inflow of the inner body into the air circulation around the through-enclosed type can be closed, and the section of the speed wall moving out can be used to prescribe M through the whole body to provide one. Installation □ After entering the inflow accumulation volume ring, the autogenous gas will be supplied with 9 # »Jidao Rongtongshan S, the flow passage in the body section of the whole body, the solid flow section of the flow zone, and the second passage in the second lane. Should move Zone Road Activating Flow V-1 'to the coupling coupling flow injection two body liquid into the first level has a lower middle to its section 丨 Zone Road mobilization includes outside the envelope (please read the precautions on the back before filling this page) Inner and outer shots and the coupling section are open, and the current flow is first connected to the outer section of the wall. 33 The second flow is in the ring. It is located in the K series of gates, and it faces the center of the weir outside the wall. The Bureau of Consumer Standards of the Bureau of the Standards printed inside the wall of the directional wall and the surface of the wall at the limit interface is penetrated. There may be a wall between the wall and the weir that should not accumulate and extend a wall. At the beginning of the flow, the volume of liquid volume was in the shape of the flow, and the ring was stopped from the inside and merged with the winter. The star penetrated 1¾ [0 动 ί 面 浐 流 流? ' Nei Ningqi, Yanhe, and the "bilateral wall" and other sections of the channel through the weir, the overflow overflow is is the fluid guide particle dispersion ΔΛν 3Μ3 He Liuren except the structure I junction wall entrance into 39 li >微 The micro-internal sections of the solid wall in the surface of the surface flowing down to the air surface are merged in the area, s Η sw «This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 4 473800 A8 B8 C8 D8 Patent application The air pressure in the range is high. Including 0. The other 0, fixed into the shape of the mouth or into the sinking surface 15 of the inner wall of the Fanbiliyan, please apply in the section outside the wall when applying for D 帋 女 帋 6 I ΊΧ Zone Daotong «source gas is the highest pressure at one mouth to the dynamic confluence couple can be clean and clean 33 streams K _, high air pressure into the volumetric ring into the fluid gas calendar high particle supply micro-permeability on the upper wall can be formed or accumulated Shen K Yuyuan Gas 1 its installation □ entry item 5 Ί M 内 fan Li Zhuan Φ As the first to the last, please ask Jia Ru Yuan air pressure a higher ο Zhongkou Qi I I above the wall section of the air II ΓΕ No. E3, F Road, Fentongtong J *, the item of flow installation P (please read the precautions on the back before filling this page)-installation. The first to the close family M, please Φ Rutong. The second part of the moving fluid body has the highest pressure, and the section outside the upper wall is installed in the passageway. The entry 5 is cleaned and supplied through the passage. The body of the carcass water-washed by the flow device is solid to the grain-shaped emblem, and the flow section containing the M-shaped end of the channel is connected to the road structure. Li Zhuan please Φ flow a first. Zhonghe's fast opening speed can be K to the section of the Datong District, 33 to the second installation Q entry 5 11 No. Fan Li, please string as 1 2 No. 1 and No. 1 Fantong Specially requested Φ If the wall is breathable, you can allow the alignment tx, the same axis, this is the same as that of the section of the road through 33 flow installation □ entry, 1T ▼ line Ministry of Economic Affairs Central Standard Bureau employee consumer cooperatives printed and shaped The affiliated Jinkongduo--I *-»species 1 is air-permeable to the wall, but can be installed in the item 5 1S. Fan Li specially asks for a variety of ceramic pottery holes, such as the molding department. The air permeability can be installed in the item 5 1 ± No. Fan Li specially asked Jia Rusu for 11 sets of special holes. Please give me a look. Ring into g, plane, r, glue, JI, round-wall, air-permeable, the items in which it can be installed, the paper size is applicable to Chinese National Standard (CNS) A4 size (210 X 297 mm) 5 473803 A8 B8 C8 D8 The scope of the patent application is the second one in the installation of the item Q 1 of the installation. Fan Li specially requested to apply for the installation of the section inside the weir and the wall outside the wall. The item 5 is the first. Wei Fanli specifically requested Shen Ruliu No.1. With the following instructions, you can make a guided tour of the manufactured body from 1 to the joint. You can install it in the section of the road. The entry item 5 1S. Fan Li specially asks if the wall in the table on the side of LT Xi is breathable. The first one is sent by the tube, and the other is sent by the tube package. The flow of the gas is vertical and the flow is vertical. The flow of the gas is piped into the tube. The gas is sent to the tube and the internal channel source passes out of the kF 0 stream. The body is solidly formed into grains. Fan Li specially please install the item (please read the precautions on the back before filling out this page). Install the first gas rET 0 in the body of the tube hh ¾S flow gas Solid shape-granules containing the internal flow of the internal flow out of the installation □ Item 8 2 Wai Fan Li Zhuan Ψ If you send out the exhaust gas, the body will be solid, forming the granules will contain Weir overflow between the subsurface gaps is delimited in the installation of the pipe. □ Entry 8 2 No. Fan Li special please string as in the pipe. Send and discharge the gas in the stream, the body solid forms micro particles, and the weir between the gaps on the surface overflows the delimitation package. The other line is the shape supply or fs / body solid particle micro installation with mouth. The 15th flow of anti-impact and anti-paradigm of the project is specifically requested to be printed by the employee ’s cooperative of the Central Standards Bureau of the Ministry of Economic Affairs, printed by the condensate of the tube, and the gas-solid permeation of the fluid flowing through the tube. 3 The y installation ^ P 范 々 入* 钟 帛 * i S 21 · The installation includes the introduction of the LO, and the supply item W 5 sets the heating addition body to form an additional installation package or / and the solid section micro-segment wall hole. Enclose the knot, and there should be so many holes in the mouth wall. The lower part of the rational section of the lower part of the body will flow all the way down to the wall flow hole body gas and one gas body. An inherent body flow cover 1 There are more holes in the wall 1 Each size of this paper applies the Chinese National Standard (CNS) A4 (210X297 mm) 6 473803 A8 B8 C8 D8 6. Application for patent scope 35. If you apply for the entry device for scope item 34, additional package Streaming stretch the tube being external to the porous wall, for discharging the particle-containing gas stream in the upper section of the forming solids. 36. The inlet device according to item 34 of the scope of patent application, further comprising an airflow transfer tube surrounded by the upper porous wall for exhausting the airflow containing the formed solids in the lower section. 37. If applied, please apply for the inlet device of item 34 of the patent scope, which additionally includes a transition part between the upper section and the lower section, and an airflow transmission pipe which discharges the contents of the transition section. Airflow of particulate solids and / or shaped solids. 38. The inlet device according to item 34 of the patent application, further comprising an axially arranged porous structure, and M guides fluid into the inlet device. 3 9. A gas / liquid interface structure for sending airflow from its upstream source to a downstream processing unit. The gas / liquid interface structure includes: a first vertically extending inlet flow channel member having an upper inlet for guiding the airflow And the lower end for discharging the airflow; printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling out this page). A second flow channel member is connected to the first flow channel member and interposed therebetween. Open a relationship to define an annular volume therebetween, the second flow channel member extends downward to a lower end below the lower end of the first flow channel member, and the second flow channel member has an upper liquid-permeable portion and a lower portion The liquid-permeable portion is below the upper liquid-permeable portion; an outer wall member enclosing the second flow channel member and defining an enclosed inner annular volume therewith; K and a liquid flow inlet on the outer wall member For guiding the liquid into the enveloping / inner annular volume between the second flow channel member and the outer wall member. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) — 7-473803 Printed by the Consumers 'Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A8 B8 C8' D8 VI. Patent Application Scope 40. Such as patent application scope item 39 The gas / liquid interface structure, wherein the liquid permeable portion on the second flow channel member includes a porous cylindrical wall member. 41. The gas / liquid interface structure according to item 40 of the application, wherein the porous cylindrical wall member is made of a material selected from the group consisting of sintered metal materials, porous ceramic materials, and porous plastic materials. form. 42. As claimed, the gas / liquid interface structure of item 40 of the patent application, wherein the liquid permeable portion on the second flow channel member is formed of a porous sintered metal material. 43. The gas / liquid interface structure according to item 40 of the patent application, wherein the liquid-permeable portion is composed of a porous wall with an average pore size in the range of about 0.5 to 30 metric meters. 44. The gas / liquid interface structure of claim 39, wherein the first and second flow channel members are each cylindrical in nature and coaxial with each other. 45. For example, the gas / liquid interface structure of the scope of application for the patent No. 39, wherein the outer wall member of the encapsulating external flow channel member includes a cylindrical side wall, and the second flow channel member is radially spaced apart, and a top portion An end wall, a first liquid flow channel member extending through the wall, and a bottom end wall between the second flow channel member and the side wall of the outer wall member. 46. For example, the gas / liquid interface structure of claim 39, wherein the outer wall member is provided with a liquid flow inlet K for guiding liquid into the inner annular volume of the envelope between the second flow channel member and the outer wall member. And arranged for the tangential feed liquid to enter the inner annular volume of the envelope, to flow around the second (please read the precautions on the back before filling this page) • Binding and binding _ The size of this paper applies Chinese national standards (CNS ) A4 specification (210X297 mm) 8 473803 Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs A8 B8 C8 D8 VI. Patent application scope The liquid guided by the periphery of the liquid-permeable part above the channel member. 47. The gas / liquid interface structure according to item 39 of the scope of the patent application is structured and arranged so that the liquid velocity of the overflow weir is disconnected from the level of the structure. 48. The gas / liquid interface structure according to item 39 of the scope of patent application is constructed and arranged so that the liquid rate of the overflow weir is decoupled from the minimum wetting rate. 49. A gas / liquid interface structure for supplying air from its upstream source to a downstream processing unit, comprising first and second flow channel members defining an annular volume therebetween, and a second flow channel member extending downward to a A height lower than the lower end of the first flow channel member, and an outer wall member enclosing the second flow channel member and defining an enclosed inner annular volume therewith, and a liquid flow port on the outer wall member for guiding liquid into The enclosed inner annular volume, wherein the second flow channel member includes an upper liquid-permeable portion in fluid communication with the enclosed inner annular volume so that liquid from this volume can leak through the permeable portion, and A falling liquid film is formed on the inner surface portion of the second flow channel member as a protective liquid interface for the second flow channel member. 50. The gas / liquid interface structure of claim 49, wherein the liquid-permeable portion of the second flow channel member includes a porous cylindrical wall member. 51. The gas / liquid interface structure of claim 50, wherein the porous cylindrical wall member is M—a material selected from the group consisting of a sintered metal material, a porous ceramic material, and a porous plastic material. . 52. For example, the gas / liquid interface structure in the scope of application for patent No. 50, in which the liquid permeable portion on the second flow channel member is a porous sintering (please read the precautions on the back before filling this page) ·,? Τ ▼ The paper size of this paper is applicable to Chinese National Standard (CNS) A4 specification (210 × 297 mm) 9 473803 Employees' cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs printed A8 B8 C8 D8. 6. Formed by patent applications for metal materials. 53. The gas / liquid interface structure of claim 50, wherein the liquid-permeable portion is formed by a porous wall having an average pore size in the range of about 0.5 to 30 microns. 54. The gas / liquid interface structure of claim 49, wherein the first and second flow passage members are each cylindrical in nature and coaxial with each other. _ 55. If the gas / liquid interface structure of the 49th scope of the patent application, wherein the outer wall member of the encapsulating external flow channel member includes a cylindrical side wall, the second flow channel member is radially spaced apart, A top end wall, a first liquid flow channel member extending through the wall, and a bottom end wall between the second flow channel member and the side wall of the outer wall member. 56. For example, the gas / liquid interface structure of the 49th area of the patent application, wherein the liquid flow inlet on the outer wall member for guiding liquid into the enclosed inner annular volume between the second flow channel member and the outer wall member is constituted by M and It is arranged for the tangentially fed liquid to enter the inner annular volume of the envelope, and the guided liquid is distributed around the periphery of the liquid-permeable portion above the second flow channel member. 57. For example, the gas / liquid interface structure of the 49th scope of the application for the patent is constructed and arranged so that the liquid rate of the overflow weir is disconnected from the level of the structure and the minimum wetting rate. 58, —A system for processing semiconductor manufacturing exhaust gas, including: a semiconductor manufacturing unit that generates exhaust gas stream; an oxidation unit for oxidation processing exhaust gas stream; This paper size applies to Chinese National Standard (CNS) A4 specifications ( 210X297 mm) _ ί Λ-(Please read the precautions on the back before filling in this page)-Binding and ordering ▼ Line 473803 A8 B8 C8 D8 The scope of application for patents is used for oxygenation 0 flowing gas out of LUI 0 The junctional mediator fluid / body gas should be guided for P: Including the upper package and a structure, the passageway of the facial mediator fluid flows through the elementary element, and the vertical flow is straight. The layout of the component supply channel is 勖 1 rA first-class, and the second system flow is closed. The component is opened to the road and connected to the 'moving flow channel 2' Μ Ζ the 33. There is a certain boundary between the outer ring of the ring and the liquid, which is not transparent. If you do n’t touch the next surface, the next part is B-end body fluid. You can pass the upper part to move a part of the body. Structure On the Dok 1 pass, go to-move the extension to the second part to build the path to the body to connect the second packet (please read the precautions on the back before filling this page) -pack_ Π Inflow; volume-shaped fluid-like pieces of ring structure outside the inner wall of the envelope are enclosed in a package with a certain flow boundary, and the first and second are merged in, and the conductor fluid will supply gas out of the kF structured surface volume mesenchymal ring fluid / The inner wall of the inner package and the outer wall of the structure are connected to the structure, and the M custom gas is received from the HU to the Central Consumers Bureau of the Ministry of Economic Affairs, printed by the employee consumer cooperative. The paper size applies to Chinese national standards (CNS ) A4 size (210X 297mm) 1—I 11
TW86120101A 1996-12-31 1998-04-07 Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system TW473809B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/778,396 US5833888A (en) 1996-12-31 1996-12-31 Weeping weir gas/liquid interface structure
US08/778,386 US5846275A (en) 1996-12-31 1996-12-31 Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
US08/857,448 US5935283A (en) 1996-12-31 1997-05-16 Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system

Publications (1)

Publication Number Publication Date
TW473809B true TW473809B (en) 2002-01-21

Family

ID=27419738

Family Applications (1)

Application Number Title Priority Date Filing Date
TW86120101A TW473809B (en) 1996-12-31 1998-04-07 Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system

Country Status (1)

Country Link
TW (1) TW473809B (en)

Similar Documents

Publication Publication Date Title
US5935283A (en) Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
US5846275A (en) Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
US7569193B2 (en) Apparatus and method for controlled combustion of gaseous pollutants
JP3648539B2 (en) Exhaust flow treatment system for oxidation treatment of semiconductor manufacturing exhaust
US6333010B1 (en) Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
TWI238740B (en) Process and apparatus for abating chemical pollutants in a pollutant-containing gas stream
US4036434A (en) Fluid delivery nozzle with fluid purged face
TW200527491A (en) Exhaust conditioning system for semiconductor reactor
TW495375B (en) Treatment system for removing hazardous substances from a semiconductor process waste gas stream
US5233943A (en) Synthetic gas radiant cooler with internal quenching and purging facilities
EP1129763B1 (en) Abatement of semiconductor processing gases
TWI495611B (en) Fuel oil transfer device
TWI375767B (en) Reactive gas control
FI73516C (en) Process for operating a liquid-liquid heat exchanger.
TW473809B (en) Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
TW389739B (en) Facility for treating objects in a process tank
WO1998029178A1 (en) Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
KR102589655B1 (en) Purge gas supply means, abatement system, and method of changing abatement system
KR101722987B1 (en) Processes for removing entrained particulates from a gas
CN109758823A (en) A kind of fire coal boiler fume denitrating catalyst separator
KR960024207A (en) Multi-stage fluidized bed high temperature waste heat recovery device
US695875A (en) Gas-purifier.
SU953411A1 (en) Apparatus for evacuation of melt from cyclone furnace
JPS57207686A (en) Heating furnace
CN109908836A (en) A kind of fire coal boiler fume denitrating catalyst separator

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent