TW454316B - Multi-chip package module - Google Patents

Multi-chip package module Download PDF

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Publication number
TW454316B
TW454316B TW089121622A TW89121622A TW454316B TW 454316 B TW454316 B TW 454316B TW 089121622 A TW089121622 A TW 089121622A TW 89121622 A TW89121622 A TW 89121622A TW 454316 B TW454316 B TW 454316B
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TW
Taiwan
Prior art keywords
chip
wafer
semiconductor wafer
chip package
dummy
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Application number
TW089121622A
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Chinese (zh)
Inventor
Tsung-Ming Pai
Sung-Fei Wang
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Advanced Semiconductor Eng
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Priority to TW089121622A priority Critical patent/TW454316B/en
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Publication of TW454316B publication Critical patent/TW454316B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Wire Bonding (AREA)

Abstract

A kind of multi-chip package module mainly contains two semiconductor chips, which are mutually stacked and mounted on a baseboard. The multi-chip package module is featured with having a dummy chip sandwiched between these two semiconductor chips. The size of this dummy chip is smaller than the lower semiconductor chip such that any part of dummy chip will not block the vertically upward region of the chip bonding-pad for the lower chip to avoid blocking its wire bonding process. In addition, the dummy chip has a preset thickness that is enough to provide the required clearance for bonding wires of the lower chip bonding-pad so as to prevent the bonding wires of the lower chip from being damaged by the upper chip.

Description

1543 1 6 五、發明說明(1) 【發明領域】 本發明係有關於一種多晶片封裝構造(m u 11 i - c h i p ^ module, MCM),特別有關於一種晶片堆疊式多晶片封裝構 造。 【先前技術】 由於電子產品越來越輕薄短小,使得用以保護半導體晶 片以及提供外部電路連接的封裝構造也同樣需要輕薄短小 化。 隨著微小化以及高運作速度需求的增加,多晶片封裝構 造在許多電f裝置越來越吸引人。多晶片封裝構造可藉由 將兩個或兩個以上之晶片組合在單一封裝構造中,來使系 統運作速度之限制最小化。此外,多晶片封裝構造可減少 晶片間銲線路之長度而降低訊號延遲以及存取時間° 輸 最常見的多晶片封裝構造為並排式(side-by-side)多晶 片封裝構造,其係將兩個以上之晶片彼此並排地安裝 共同基板.之主要安裝面。晶片與共同基板上導電線路 連接一般係藉由線銲法(w i r e b ο π d i n g )達成。然而該並排 式多晶片封裝構造之缺點為封裝效率太低,因為該共同基 板之面積會隨著晶片數目的增加而增加。 因此,美國專利第5 3 2 3 0 6 0號揭示一多晶片堆疊裝置 (multichip stacked device)·,.其包含一苐一半導體晶片 1 1設於一基板1 2並且電性連接至基板1 2,以及一第二半導 體晶片1 3堆疊於該第一半導體晶片上並且電性連接至基板 (參見第一圖)。該美國專利第5 3 2 3 0 6 0號之特徵在於利1543 1 6 V. Description of the Invention (1) [Field of the Invention] The present invention relates to a multi-chip package structure (m u 11 i-c h p p module, MCM), and particularly to a chip-stacked multi-chip package structure. [Previous Technology] As electronic products become thinner and thinner, packaging structures for protecting semiconductor wafers and providing external circuit connections also need to be thinner and shorter. With the miniaturization and increasing demand for high operating speeds, multi-chip packaging structures are becoming increasingly attractive in many electrical devices. The multi-chip package structure can minimize the system speed limitation by combining two or more chips in a single package structure. In addition, the multi-chip package structure can reduce the length of the inter-chip soldering circuit and reduce the signal delay and access time. The most common multi-chip package structure is a side-by-side multi-chip package structure, which is a combination of two More than one wafer mounts the main mounting surface of a common substrate side by side. The connection between the chip and the conductive line on the common substrate is generally achieved by a wire bonding method (w i r e b ο π d i n g). However, the disadvantage of the side-by-side multi-chip package structure is that the packaging efficiency is too low, because the area of the common substrate will increase as the number of chips increases. Therefore, U.S. Patent No. 5 3 2 3 0 60 discloses a multichip stacked device. It includes a semiconductor wafer 11 on a substrate 12 and is electrically connected to the substrate 1 2 And a second semiconductor wafer 13 is stacked on the first semiconductor wafer and is electrically connected to the substrate (see the first figure). This U.S. Patent No. 5 3 2 3 0 6 0 is characterized by

Ρ00-Ϊ42. ptd 第4頁 4 5 43 16___, _ 丘、發明說明(2) . 用一設於兩晶片間的膠層1 4來提供銲線線弧(the 1 oops of the bonding wires)所需之空隙(clearance)。該第一 半導體晶片11之打線製程必須在第二半導體晶片1 2堆疊之> 前完成。這意味著每一層晶片之黏晶(die bonding)製程 以及打線製程均需分別進行,因此將增加額外之製程步 驟。此外’由於相鄰晶片間的空隙相當緊密,因此限制了 .打,線(wire bonding)白勺作業空間(processing window), 因而影響鲜線(bonding wires)之可靠性。· 一般而言,銲線之弧高約為1 〇至1 5密爾(m i 1 )。雖然藉 著調整線弧參數,外形以及型式,習用打線技術可以將弧 高將低至大約4-6密爾(mi丨)。然而這已是可得到的最小弧 高’因為若更低將使線受損並且使其拉力變差。因此,使 用習知打線技術時,該膠層丨4之厚度必須大於6密爾以完 全防止晶片1 3接觸到銲線15之線弧。該.膠層14之材料一般 為環氧勝(epoxy)或膠帶(tape)。然而要形成厚度超過6务_^ 爾之環氧勝層並且保持穩定之膠層厚度(bond丨ine thickness)是非常困難的。而一但無法控制膠層厚度,則 不但在上層晶片1 3安裝後會引起共平面性(c〇pUnari ty )二 不良之問題’而且嚴重時該上層晶片丨3將會碰觸到下層銲 線之線弧,甚至導致其扭曲移位。此外,當使用厚度達6 密爾之膠帶’其一方面將大幅增加製造成本;另一方面, 塑料製成的膠帶與矽晶片間的熱膨脹係數不一致(CTE mismatch)也將嚴重損壞所製得封裝構造之可靠性。 【發明概要.】 ,Ρ00-Ϊ42. Ptd page 4 4 5 43 16___, _ Yau, description of the invention (2). An adhesive layer 14 provided between two wafers is used to provide the 1 oops of the bonding wires. Required clearance. The wire bonding process of the first semiconductor wafer 11 must be completed before the second semiconductor wafer 12 is stacked. This means that the die bonding process and the wire bonding process of each layer of wafers need to be performed separately, so additional process steps will be added. In addition, because the gap between adjacent wafers is quite tight, it limits the processing window of wire bonding and wire bonding, which affects the reliability of bonding wires. · In general, the arc height of the bonding wire is about 10 to 15 mils (m i 1). Although by adjusting the line arc parameters, shape and type, the conventional wire drawing technology can reduce the arc height to about 4-6 mils (mi 丨). However, this is already the minimum arc height achievable because if it is lower, the wire will be damaged and its tension will be worsened. Therefore, when using conventional wire bonding technology, the thickness of the adhesive layer 4 must be greater than 6 mils to completely prevent the wafer 13 from contacting the wire arc of the bonding wire 15. The material of the adhesive layer 14 is generally epoxy or tape. However, it is very difficult to form an epoxy layer having a thickness of more than 6 mm and maintain a stable bond thickness. However, once the thickness of the adhesive layer cannot be controlled, not only will the coplanarity (c0Unary ty 2 problem) be caused after the upper wafer 1 3 is installed, but also the upper wafer 3 will touch the lower bonding wire in serious cases. The arc of the line even causes its distortion. In addition, when using tapes up to 6 mils in thickness, on the one hand, it will greatly increase the manufacturing cost; on the other hand, the thermal expansion coefficient (CTE mismatch) between the plastic tape and the silicon wafer will also seriously damage the resulting package. Structural reliability. [Summary of Invention.],

第5頁 Η dSd^iβ 五'發明說明C3) 本發明之主 在於具有一虛 下層晶片間, 基板11該虛晶 片銲墊之銲線 片損傷下層晶 根據本發明 兩半導體晶片 之特徵在於具 晶片之尺寸係 任何部分都不 域,以便不妨 根據本發明 片提供下層銲 層晶片損傷下 為了讓本發 顯,下文特舉 細說明如下。 【發明說明】 請參照第二 封裝構造200 . 疊安裝於一基 性連接之構造 trace)120a ° 封裝構造,其特徵 一上層晶片以及一 堆疊方式安裝於一 足以提供該下層晶 ’藉此防止上層晶 構造,其主要包含 該多晶片封裝構造 導體晶片間。該_虚 藉此使侍虛晶片的 墊的垂直向上區 構造,由於邊虛晶 ),藉此可防止上 徵、和優點能更明 合所附圖示’ 要目的係提供一種多晶片 晶片(d u m m y c h i p )夾設於 其中該上、下層晶片係以 片具有一預先設定之厚度 所需之空隙(clearance) 片之辉線。 較佳實施例之多晶片封裝 彼此堆_疊安裝於一基板。 有一虛晶片_夾設於該兩半 小於該下層半導體晶片, 會擋到下層晶片之晶片銲 礙其打線製.程。 較佳實施例之多晶片封裝 線所需之空隙(c 1 e a r a n c e 層晶片之銲線。 明之.上述和其他目的、特 本發明較佳實施例1並配 圖,其揭示根據本發明較佳實施例之多晶片 其主要包含兩半導體晶片1 1 0、1 3 0彼此堆 板1 2 0。該基板1 2 0具有一用以與外界形成電 ,其包含複數條導電線路(c ο n d u c t i v e 半導體晶片i 1 0、1 3 0各具有複數個晶片銲墊Page 5 Η dSd ^ iβ Five 'invention description C3) The main point of the present invention is to have a virtual lower wafer, the substrate 11 the bonding pad of the virtual wafer pad damages the lower crystal. According to the present invention, two semiconductor wafers are characterized by a wafer The dimensions are not in any part, so it may be possible to provide the present invention with the damage of the underlying solder layer wafer according to the present invention. In order to make this obvious, the following detailed description is given below. [Explanation of the invention] Please refer to the second package structure 200. The structure of a stack mounted on a basic connection trace) 120a ° package structure, which features an upper layer chip and a stacking method mounted on a layer sufficient to provide the lower layer crystal to prevent the upper layer The crystal structure mainly includes conductors between the multi-chip package structures. This design allows the vertical upward structure of the pad of the dummy wafer, due to the side dummy crystal), which can prevent the sign, and the advantages can better understand the attached figure. The main purpose is to provide a multi-chip wafer ( The dummy chip is sandwiched between the upper and lower wafers. The wafers have a clear line of the required clearance. The multi-chip packages of the preferred embodiment are stacked on top of each other and mounted on a substrate. There is a dummy wafer sandwiched between the two halves that is smaller than the lower semiconductor wafer, which will block the wafer soldering of the lower wafer and hinder its wiring process. The gap required for the multi-chip packaging line of the preferred embodiment (c 1 earance layer wafer bonding wire.) For the above and other purposes, the preferred embodiment 1 of the present invention is provided with a drawing, which discloses the preferred implementation according to the present invention. For example, many wafers mainly include two semiconductor wafers 1 10 and 1 3 stacked on each other 1 2 0. The substrate 1 2 has a structure for forming electricity with the outside and includes a plurality of conductive lines (c ο nductive semiconductor wafers). i 1 0, 1 3 0 each with a plurality of wafer pads

P00-142.ptd 第S頁 i fi____ 五、發明說明(4) 1 1 0 a、1 3 0 a設於其正面,用以連接其内部電路。該晶片銲 墊11 Oa、220a係分別經由複數條銲線152、154連接於該基 板120之複數條導電線路i 2〇a。該多晶片封裝構造2〇〇較佳 包含一封膠體170包覆該晶片11()、13〇,銲線152、154以 及該基板1 2 0之一部分。該封膠體丨7 〇 一般係利用習知的塑 膠模塑法(例如轉 >主成形法(..t r a n s.丨e Γ爪〇 1 d i η §:))形成於 該晶片11 0、1 3 0以及基板上表面之一部分。 該基板1 2 0可由玻璃纖維強化β τ. (b i s m a 1 e i m i d e -1 r i a 2 i n e)樹脂,或F r _ 4玻璃纖維強化環 氧樹月曰(fiberglass reinforced epoxy resin)製成之蕊 層(core layer)形‘成。此外,該基板12〇亦可以是薄片基 板(film substrate).或陶竟基板(ceramic subs1:rate)。 可以理解的是該基板1 20亦可以一導線架(1 ead f rame)取 代。導線架一般係包含複數條導線且具有内腳部分(丨nner lead portion)以及外腳部分(〇uter lead p〇rti〇n),其 中該内腳部分係用以電性連接至晶月,該外腳部分係 與外界電性連接。 . 請再參照第二圖’該多晶片封裝構造2 0 0之特徵在於具 有一虛晶片1 6 0夾設於該兩半導體晶片j i 〇、」3 〇間。根據 本發明之虛晶片1 6 0的材質係與設在基板上的半導體晶片 相同’因此其與石夕晶片間將有一致的熱膨脹係數(CTE), 因而大幅增進所製得封裝構造之可靠性。此外,該虛晶片 不需要佈線,因為其並不參與整個裝置的運作。 根據本發明之虛晶片丨6 Q,其尺寸係小於該下層半導體P00-142.ptd Page S i fi____ 5. Description of the invention (4) 1 1 0 a, 1 3 0 a is provided on the front side for connecting its internal circuit. The wafer pads 11 Oa and 220a are connected to a plurality of conductive lines i 2a of the substrate 120 via a plurality of bonding wires 152 and 154, respectively. The multi-chip package structure 200 preferably includes a piece of colloid 170 covering the wafers 11 (), 130, bonding wires 152, 154, and a part of the substrate 120. The sealant 丨 7 〇 is generally formed on the wafer 11 0, 1 by using a conventional plastic molding method (for example, a transfer > master forming method (..tran s. 丨 e Γ clawed 〇1 di η § :)). 30 and a part of the upper surface of the substrate. The substrate 1 2 0 may be made of glass fiber reinforced β τ. (Bisma 1 eimide -1 ria 2 ine) resin, or F r _ 4 glass fiber reinforced epoxy resin (core made of fiberglass reinforced epoxy resin). layer) form. In addition, the substrate 12 may also be a film substrate. Or a ceramic substrate (rate). It can be understood that the substrate 120 can also be replaced by a lead frame. The lead frame generally includes a plurality of wires and has an inner pin portion and an outer pin portion, wherein the inner pin portion is used to be electrically connected to the crystal moon. The outer feet are electrically connected to the outside world. Please refer to the second figure again. The feature of the multi-chip package structure 200 is that it has a dummy chip 160 sandwiched between the two semiconductor chips j i 〇, ″ 30 ″. The material of the virtual wafer 160 according to the present invention is the same as that of the semiconductor wafer provided on the substrate. Therefore, it will have a consistent coefficient of thermal expansion (CTE) with the Shi Xi wafer, thereby greatly improving the reliability of the package structure obtained . In addition, the dummy chip does not need wiring because it does not participate in the operation of the entire device. According to the virtual wafer of the present invention, its size is smaller than that of the underlying semiconductor.

POO-142, ptdPOO-142, ptd

第7頁 4543 1 6 五、發明說明(5) , 晶片1 1 0,藉此使得虛晶片1 6 0的任何部分都不會擔到下層 晶片110之晶片鮮塾ll〇a的奎直向上區域,以便不妨礙其 打線製程。該虛晶片1 6 0與晶片1 1 〇之晶片銲塾I 1 a間較佳 至少保留6密爾(m i 1)之距離,藉此保留較大之作業空間, 而增加該半導體晶片1 1 〇之銲線1 5 2的可靠性 (reliability)。 該虛晶片1 6 0係利用兩膠層1 6 2、1 6 4夾設於兩晶片i 1 〇、 1 3 0間。適合之膠層如環氧化合物(e p 0 X y )、熱塑性材料 (thermoplastic materials)、膠帶(tape)等 ° 一般而 言’銲線1 5 2之弧高約為1 〇至1 5.密爾。而藉著調整線弧參 數’外形以及型式,習用打線技術可以將弧高將低至大約 4-6密爾。因此’使用習知打線技術時,該虛晶片1 6〇加上 兩膠層162、164之膠層厚度(bond line thickness)至少 必須大於6密爾以完全防止晶片130接觸到銲線152之線 弧。較佳地,該膠層16 2、1 6 4之膠層厚度係控制約為1密 爾;因此該虛晶片1 6 0至少具有4密爾的厚度以提供該 152所需之空隙(ciearance),藉此防止上層晶片損傷_ 晶片之銲線。此外,設於兩晶片間之虛晶片係提供良好之 厚度控制(thickness control ),因此該晶片1 30安裝後具 有良好之共平面性(c ο p I a n a r i t y ),藉此增進該多晶片封 裝構造2 0 0之可靠性。 雖然本發明已以前述較佳實施例揭示,然其並非用以限 定本發明’任何熟習此技藝者,在不脫離本發明之精神和 抱圍内’當可作各種之更動與修改。因此本發明之保護範Page 7 4543 1 6 V. Description of the invention (5), wafer 1 1 0, so that no part of the virtual wafer 1 60 will bear the straight upward area of the wafer freshness 110a of the lower wafer 110 So as not to hinder its wire-making process. A distance of at least 6 mil (mi 1) is preferably reserved between the virtual wafer 160 and the wafer welding pad I 1 a of the wafer 1 10, thereby retaining a larger working space and increasing the semiconductor wafer 1 1 〇 Reliability of the bonding wire 1 5 2. The virtual wafer 160 is sandwiched between two wafers i 10 and 130 by two adhesive layers 16 2 and 16 4. Suitable adhesive layers such as epoxy compounds (ep 0 X y), thermoplastic materials (tape), tapes, etc. ° Generally speaking, the arc height of the welding wire 1 5 2 is about 10 to 15.5 mil . And by adjusting the parameters and shape of the line arc parameters, the conventional wire drawing technology can reduce the arc height to about 4-6 mils. Therefore, when using conventional wire bonding technology, the bond line thickness of the virtual chip 160 plus the two adhesive layers 162 and 164 must be at least 6 mils to completely prevent the chip 130 from contacting the wire of the bonding wire 152 arc. Preferably, the thickness of the adhesive layer 16 2, 16 4 is controlled to be about 1 mil; therefore, the virtual wafer 1 60 has a thickness of at least 4 mils to provide the required clearance of the 152 (ciearance). In order to prevent damage to the upper wafer _ bonding wire of the wafer. In addition, the virtual chip provided between the two chips provides good thickness control, so the chip 130 has good coplanarity (c ο p I anarity) after mounting, thereby improving the multi-chip package structure. 2 0 0 reliability. Although the present invention has been disclosed in the foregoing preferred embodiments, it is not intended to limit the present invention'to any person skilled in the art, and various changes and modifications can be made without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention

第8 I 454316 五、發明說明(6) 圍當視後附之申請專利範圍所界定者為準。Article 8 I 454316 V. Description of Invention (6) The definition in the scope of the attached patent shall prevail.

ιιηι POO-142, ptd 第9頁 4543 1 β 圖式簡單說明 【圖示說明】 第1圖:習知多晶片封裝構造之剖面圖;及 第2圖:根據本發明較佳實施例之多晶片封裝構造之剖 •面圖。 【圖號說明】 11 半導體晶片 12 基板 13 半導體晶片 14 膠層 15 銲線 200 多晶片封裝構造 110 半導體晶 片 1 10a 晶片銲墊 120 基板 120a 導電線路 130 半導體晶 片 130a 晶片輝塾 152 銲線 154 銲線 160 虛晶片 162 膠層. 164 .膠層 170 封膠體ιιηι POO-142, ptd Page 9 4543 1 β Brief description [Illustration] Figure 1: Sectional view of a conventional multi-chip package structure; and Figure 2: Multi-chip package according to a preferred embodiment of the present invention Structural cut-aways. [Illustration of drawing number] 11 semiconductor wafer 12 substrate 13 semiconductor wafer 14 adhesive layer 15 bonding wire 200 multi-chip package structure 110 semiconductor wafer 1 10a wafer bonding pad 120 substrate 120a conductive line 130 semiconductor wafer 130a wafer Hui 152 bonding wire 154 bonding wire 160 virtual wafer 162 adhesive layer. 164. adhesive layer 170 sealing gel

POO-142.ptd 第10頁POO-142.ptd Page 10

Claims (1)

^45431^ 六、申請專利範圍 - 1 、一種多晶片封裝構造(mult ichi p module),其係包 含: ... 一用以承載晶片之裝置,該承載裝置具有一用以與外界 形成電性連接之構造; 、 一第一半導體晶片固著於該承載裝置,該第一半導體晶 片具有複數個第一晶片銲墊設於其正面; 複數條第一銲線電性連接該複數個第一晶片銲墊至該用 以與外界形成電性連接之構造; 一虛晶片(dummy chip)固設於該第一半導體晶片之正 面,使得該虛晶片的任何部分都不會擋到該第一晶片銲墊 之垂直向上區域,以便不妨礙其打線製程;及 一第二半導體晶片固著於談虛晶片,該第二半導體晶片 係電性連接至該用以與外界形成電性連接之構造, 其中該虛晶片具有一預先設定之厚度足以在第一半導體 晶片與第二半導體晶片之間提供該第一銲線所需之空隙 (clearance)。 2、 依申請專利範圍第1項之多晶片封裝構造,其中該第一 半導體晶片與第二半導體晶片具有大致相同的尺寸。· 3、 依申請專利範圍第丨項之多晶片封裝構造,其中該承載 裝置係為一基板。 4、依申請專利範圍第1項之多晶片封裝構造,其中該承載^ 45431 ^ 6. Scope of patent application-1. A multi-chip package structure (mult ichi p module), which includes: ... a device for carrying a chip, the carrying device has a device for forming electrical properties with the outside world Connection structure; a first semiconductor wafer is fixed on the carrier device, the first semiconductor wafer has a plurality of first wafer pads arranged on the front surface thereof; a plurality of first bonding wires are electrically connected to the plurality of first wafers A pad to the structure for forming an electrical connection with the outside world; a dummy chip is fixed on the front side of the first semiconductor wafer, so that no part of the dummy wafer will block the first wafer The vertical upward region of the pad so as not to hinder its wire bonding process; and a second semiconductor wafer fixed to the dummy wafer, the second semiconductor wafer is electrically connected to the structure for forming an electrical connection with the outside, wherein the The dummy wafer has a predetermined thickness sufficient to provide a clearance required for the first bonding wire between the first semiconductor wafer and the second semiconductor wafer. 2. The multi-chip package structure according to item 1 of the patent application scope, wherein the first semiconductor wafer and the second semiconductor wafer have approximately the same size. · 3. The multi-chip package structure according to item 丨 of the patent application scope, wherein the carrier device is a substrate. 4. The multi-chip package structure according to item 1 of the patent application scope, wherein the carrier POO-142, ptd 第11頁 4543 1 βPOO-142, ptd Page 11 4543 1 β POO-142.ptd 第12頁POO-142.ptd Page 12
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