TW452649B - Azimuthal alignment technique for PEM ellipsometry at a fixed incident angle - Google Patents

Azimuthal alignment technique for PEM ellipsometry at a fixed incident angle Download PDF

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TW452649B
TW452649B TW89121862A TW89121862A TW452649B TW 452649 B TW452649 B TW 452649B TW 89121862 A TW89121862 A TW 89121862A TW 89121862 A TW89121862 A TW 89121862A TW 452649 B TW452649 B TW 452649B
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azimuth
degrees
patent application
optical axis
brightness
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TW89121862A
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Chinese (zh)
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Yu-Faye Chao
Meng-Wei Wang
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Chao Yu Faye
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Abstract

A fixed incident angle technique is proposed to align the azimuths of polarizer (P), analyzer (A) and optical axis of photoelastic modulator (PEM) in the PEM ellipsometry. Using the intensity ratio technique, two options are proposed: two pre-designed samples or two wavelengths are used to align the azimuths of P and A to the incident plane. Then, the azimuth of optical axis of the PEM is aligned by a direct determination technique.

Description

五、發明說明(1) 本發明為以單一入射角之光彈調變式橢圓 偏光儀(photoelastic modulator ellipsometry)校正 各偏光角的方法《此法可應用於已設計好的封閉系統’如 電漿蝕刻 (p 1 a s m a e t c h i n g s y s t e m)、鑛膜(f i 1m d e ρ 〇 s i t i ο η)等 系統。 一般電漿蝕刻或鍍膜系統均有多項監控儀器以監 測製作過程,近年由於橢圓偏光儀已可準確量測薄膜厚度 故已被當作系統中的監製儀器的一種。但此類系統多為 封閉式且腔殼(chamber)與監製儀器多屬不同薇商定 製,由於橢圓偏光儀量測的精準度極高,又其運作原理均 與系統中光學元件的各方位角有關,故橢圓偏光儀量測的 精準與否均決定於系統中光學元件之各方位角零點的校 正。依美國1 998年Yu-Faye Chao 等人專利 5706088 , Polarizer-Sample-Analyzer Intensity Quotient ellipsometry,須利用兩個入射角;1999 年同 作者於Jpn· J. Appl· Phys· 38,691 9的直接量測光彈 調制偏光儀器之光彈調制器光軸也須使用穿透及運作入射 角,此兩法均無法適用於已製成之腔殼。 本發明依美國1998年Yu-Faye Chao等人專利 5706088 ' Polarizer-Sample-Analyzer IntensityV. Description of the invention (1) The present invention is a method for correcting each polarization angle with a photoelastic modulator ellipsometry of a single incident angle. "This method can be applied to a closed system that has been designed, such as plasma Etching (p 1 asmaetching system), mineral film (fi 1m de ρ 〇 siti ο η) and other systems. In general, plasma etching or coating systems have multiple monitoring instruments to monitor the manufacturing process. In recent years, elliptical polarimeters have been able to accurately measure film thickness, so they have been regarded as one of the monitoring instruments in the system. However, such systems are mostly closed, and the chamber and the production equipment are often customized by different manufacturers. Due to the extremely high accuracy of the ellipsometry, the operating principles of the systems are related to the various angles of the optical components in the system. Related, so the accuracy of the ellipsometry is determined by the correction of the azimuth zero point of the optical elements in the system. According to Yu-Faye Chao et al. Patent 5,706,088 in 1998, Polarizer-Sample-Analyzer Intensity Quotient ellipsometry, two angles of incidence must be used; direct photometry in 1999 by the same author as Jpn · J. Appl · Phys · 38,691 9 The optical axis of the photoelastic modulator of the elastic modulation polarizing instrument must also use the penetration and operating angle of incidence. Neither of these methods can be applied to the fabricated cavity shell. The invention is based on U.S. 1998 Yu-Faye Chao et al. Patent 5706088 '' Polarizer-Sample-Analyzer Intensity

Quotient el 1 ipsometry中的亮度比觀念,但使用兩設計 好的試片或兩種波長取代兩個入射角,如此便可在—單入 射角下將偏光片及析光片的穿透軸校準到入射面上;然後The brightness ratio concept in Quotient el 1 ipsometry, but using two well-designed test strips or two wavelengths instead of two incidence angles, so that the polarization axis of the polarizer and the analyzer can be calibrated at a single incidence angle to Incident surface; then

第4頁 45 264 9 五、發明說明(2) =彈:制器置於光路中以仿⑻」Αρρΐ 38,6919直接量測的觀念量光彈調制器的光軸。 本發明主要目地是以函# u / ^ A ^ 试片(或兩波長)取代兩個入 射角來权正偏光片及析光片的偏光角Uzimuth angu) 此法可適用於一須定角入射校正的系統。 的光軸 本發明另一目的是用—直接量測法以量光彈調制器 抑本發明之最大特徵:為光彈調制式橢圓偏光儀提供一 以單一入射角的架構下,校正各光學元件的方位角。 以下說明本發明校正偏光片及析光片之偏光角的校 正:在PSA (偏光片p -試片s -析光片a)系統中所量之亮度 /(ΛΖ)·〔[sm* PsinM+tanVeos1 j〇co? 其中Ψ及△為試片的橢圓參數(ellipSometric para-meters),而P及a分別為偏光片及析光片之偏光角; 假設α及/3分別為偏光片及析光片方位角之微小偏差 r j , * X u 丄 n i(45+txj) R _ ΙΜ^+α,β) (deviation),若亮度比。, 灼分別作小 角展開之一次近似式為當Page 4 45 264 9 V. Description of the invention (2) = Bomb: The controller is placed in the optical path to imitate ⑻ "Αρρΐ 38,6919 The direct measurement of the optical axis of the photoelastic modulator. The main purpose of the present invention is to replace the two angles of incidence with the function # u / ^ A ^ test piece (or two wavelengths) to weight the polarizing angle of the polarizer and the analyzer (Uzimuth angu). This method can be applied to a required angle of incidence Corrected system. The optical axis of the present invention is to use the direct measurement method to measure the photoelastic modulator to suppress the biggest feature of the present invention: to provide a photoelastic modulation elliptical polarizer with a single incident angle to correct each optical element Azimuth. The following describes the correction of the polarizing angle of the polarizer and the light-resolving sheet of the present invention: the brightness measured in the PSA (polarizing sheet p-test sheet s-light-receiving sheet a) / (ΛZ) · [[sm * PsinM + tanVeos1 j〇co? where Ψ and △ are ellipSometric para-meters of the test piece, and P and a are the polarizing angles of the polarizer and the light-resolving plate, respectively; assuming α and / 3 are the polarizing plate and the light-removing light, respectively The small deviation rj of the sheet azimuth angle, * X u 丄 ni (45 + txj) R _ ΙΜ ^ + α, β) (deviation), if the brightness ratio. , The first approximation of the small angle expansion is

(1) a 五、發明說明(3)(1) a V. Description of the invention (3)

-{cos Δ J ]β E 時Ά-一 。利用兩個不同的Ψ及△(可因兩試片或兩波 長造成,前述之專利由兩入射角)形成一組二元一次聯立 方程式’其唯一解即是零點,亦即反射面。 在確定偏光片及析光片之零點後,將Ρ置於45度 處,然後將光彈調制器置於光路中形成一 P-PEM-S-A式橢 圓偏光儀(圖一),在偵測器所量得的亮度為 (2) /(^4) =3 ^4+jWcos3 tan3 ^+ATsm j4 cosA] 其中L,M, N各參數分別定意如下 L = 0.5f[+cosA^ M = 0.5f\-\~cosAp cos )(\ + )} ^ ~~ ^c〇s^p - (\-cos )cosA&Jtanifrcosti. ~sinK9 cos 2θίαηψ3ΐκ Δ θ ’ Δρ又分別為光彈調制器的光軸方位角及相位延遲 將析光片方位角A = 〇度及90度代入(2)式得 - 0.5/ff tan <p(1 + Δ,+ (1 — cos Δ,)(1 + sin 4的), (3 ) ’(90,):Ci.5L{l + c〇sA,+(l-cosAj)(1_sm4W ( 4 ) 光彈調變器之相位延遲為Δ,=Δ,Μ ,其中△。為光彈調變 器的相位振幅’ ω為調變頻率。針對Δρ我們可以採用 傅立葉展開(Fourier expansi〇n)式表示如下:-{cos Δ J] β E when Ά-a. Using two different chirps and deltas (can be caused by two test strips or two wavelengths, the aforementioned patent consists of two incident angles) to form a set of binary once-in-one cubic equations' whose only solution is the zero point, which is the reflecting surface. After determining the zero point of the polarizer and the analyzer, put P at 45 degrees, and then place the photoelastic modulator in the optical path to form a P-PEM-SA ellipse polarizer (Figure 1). The measured brightness is (2) / (^ 4) = 3 ^ 4 + jWcos3 tan3 ^ + ATsm j4 cosA] where each parameter of L, M, N is defined as follows: L = 0.5f [+ cosA ^ M = 0.5 f \-\ ~ cosAp cos) (\ +)) ^ ~~ ^ c〇s ^ p-(\ -cos) cosA & Jtanifrcosti. ~ sinK9 cos 2θίαηψ3ΐκ Δ θ 'Δρ is the optical axis of the photoelastic modulator. Azimuth and phase delay Substituting the azimuth angle A = 0 ° and 90 ° of the light-reflector into equation (2) gives-0.5 / ff tan < p (1 + Δ, + (1 — cos Δ,) (1 + sin 4 (3) '(90,): Ci.5L {l + cosA, + (l-cosAj) (1_sm4W (4) The phase delay of the photoelastic modulator is Δ, = Δ, M, where △. Is the phase amplitude of the photoelastic modulator 'ω is the modulation frequency. For Δρ we can use the Fourier expansion (Fourier expansi) expression as follows:

第6頁 五、發明說明¢4) 五、發明說明¢4) sin Ap = 2Jl (Δρ) cos at - 2J2 (Afl)cos 3〇Jt. cosAp =Ja(Aa)-2J:l(Afi)cos2iU............ 代入(3 )及(4 ) 式並取光強度的直流分量Id。,且已知 /„(△,) = 0 當 1=0.383乂 (λ為波長) ,可得以下結果 /rff(0*) = 0.5/,, tan3 ^(2+sin Λθ) (5) 4(90·) = 0.5//2-sin 4的 (6) 光彈調變器光軸的方位角β可由 θ=&+◦。及“民+45° 的ide 光強度推算,見下式 smAS = 2 IiA〇 ^ic(〇 )pjp.+0* )pj.+45* ( 7 ) 試片的橢圓參數Ψ亦可由下式推算 (8) :v= K0. 以90'入-〜 本發明利用兩試片(或兩波長)在一單一入射角的架構下完 成了偏光片、析光片及光彈調變器光軸等方位角的校正, 如此光彈調變式橢圓偏光儀便已完成即時量測的功能。 為了更進一步揭露本發明的架構、特徵及優點,茲配合附Page 6 5. Description of the invention ¢ 4) 5. Description of the invention ¢ 4) sin Ap = 2Jl (Δρ) cos at-2J2 (Afl) cos 3〇Jt. CosAp = Ja (Aa) -2J: l (Afi) cos2iU ............ Substituting into equations (3) and (4) and taking the DC component Id of the light intensity. , And we know that / „(△,) = 0 When 1 = 0.383 乂 (λ is the wavelength), we can get the following result / rff (0 *) = 0.5 / ,, tan3 ^ (2 + sin Λθ) (5) 4 (90 ·) = 0.5 // 2-sin 4 (6) The azimuth angle β of the optical axis of the photoelastic modulator can be calculated from θ = & + ◦ and “min + 45 ° ide light intensity, see the following formula smAS = 2 IiA〇 ^ ic (〇) pjp. + 0 *) pj. + 45 * (7) The ellipse parameter of the test piece can also be calculated from the following formula (8): v = K0. Enter 90 '-~ this The invention uses two test strips (or two wavelengths) to complete the correction of the azimuth angles of the polarizer, light splitter, and optical axis of the photoelastic modulator under the structure of a single incident angle. The function of instant measurement has been completed. In order to further disclose the structure, features and advantages of the present invention, the following

五、發明說明(5) 圖說明實例於後。 清參閱第1圖,本發日月夕止2gg _ 尽驶明之先彈調制式橢圓偏光儀儀包括: :光源裝置10 ’ 一偏光片20,一光彈調制器3〇 ,二可調大小的光圈37及38,一析光片40 = =續i放置在待測架35上,其前後各有二= 的光圈37及38,以供經換標準片或波長後校正光路,且介 於光彈調制器30及析光片40之i透過光彈調制器的控 制器32以調制光彈調制器的相位及供應鎖相放大器^的參 考頻率將光偵測器5 〇所得的亮度經信號控制器(s丨gna 土 control unit) 60分成直流電壓(Vdc) 64及交流電壓 (Vac) 66,利用鎖相放大器(1〇ck_in ampUfier) 34 加 以放大分別送入電腦7〇計算及分析所得。 使用兩設計好的試片(本實例所選為一矽晶圓片及一二氧 化矽約1 0 0奈米之薄膜晶圓片)取代兩個入射角,在一單 入射角下將偏光片及析光片的穿透轴校準到入射面上,由 理論程式中兩聯立方程式之交點(第2圖),可得偏光片及 析光片的實際零點。 本發明經由轉動光彈調變器之方位角所量出的直流信號 (Vdc)與理論值(第3圖)’可清楚的判斷光彈調變器的光轴 位置’經由理論程式(式7),可直接量測光彈調變器光轴V. Description of the invention (5) Examples of illustrations are as follows. Please refer to Figure 1 for the day and month ending 2gg _ As far as possible, the first-bounce modulation elliptical polarizer includes: light source device 10 ′ a polarizer 20, a light modulator 30, two adjustable size Apertures 37 and 38, a light analysis sheet 40 == continued i is placed on the frame 35 to be measured, there are two apertures 37 and 38 in front and back, for correcting the optical path after changing the standard or wavelength, and between the light The elastic modulator 30 and the light analysis sheet 40 through the controller 32 of the optical elastic modulator are used to modulate the phase of the optical elastic modulator and the reference frequency for supplying the phase-locked amplifier ^, and control the brightness obtained by the photodetector 50 by a signal. The control unit 60 is divided into a DC voltage (Vdc) 64 and an AC voltage (Vac) 66, which is amplified by a lock-in amplifier (10ck_in ampUfier) 34 and sent to a computer 70 for calculation and analysis. Use two designed test strips (a silicon wafer and a thin film wafer with silicon dioxide of about 100 nm selected in this example) instead of two incident angles, and polarizers at a single incident angle And the transmission axis of the light analysis plate is aligned to the incident surface. From the intersection of the two simultaneous equations in the theoretical program (Figure 2), the actual zero point of the polarizer and light analysis plate can be obtained. According to the present invention, the direct current signal (Vdc) measured from the azimuth of the photoelastic modulator and the theoretical value (Figure 3) 'can clearly determine the position of the optical axis of the photoelastic modulator' via a theoretical formula (Equation 7 ), Can directly measure the optical axis of the photoelastic modulator

第8頁 -^3452649 五、發明說明(6) 之方位角零點偏差0. 28,當光彈調制器方位角修正0. 28 度後,則理論值與量測值更加吻合(第3圖)。 本發明於校正程序中直接線上量測(式8 )白金薄膜試片的 橢圓參數Ψ為34.89 度(依美國1998 年Yu-Faye Chao 等人專利570 6088優化量測值),該試片經商用歸零式橢 圓儀(Rodulgh AutoEL III)量測,其橢圓參數Ψ為34.52 度。 為說明本發明之操作程序,特繪製方位角偏差判別流程圖 (第4圖),以便於了解本線上校正方法的適用條件及需 求。Page 8- ^ 3452649 V. Description of the invention (6) The azimuth zero point deviation is 0.28. When the photoelastic modulator azimuth is corrected by 0.28 degrees, the theoretical value and measured value are more consistent (Figure 3) . The elliptic parameter 量 of the platinum film test strip (Eq. 8) measured directly by the present invention in the calibration program is 34.89 degrees (optimized measurement values according to the 1998 Yu-Faye Chao et al. Patent 570 6088), and the test strip is commercially available. As measured by a Rodulgh AutoEL III, the ellipse parameter Ψ is 34.52 degrees. In order to explain the operation procedure of the present invention, the azimuth deviation determination flowchart (Fig. 4) is drawn in order to understand the applicable conditions and requirements of the online correction method.

五、發明說明(7) 重要元件符號說明 (10)光源裝置(light source) (20)偏光片(polarizer) (30)光彈調制器(photoelastic modulator head) 0A為其光轴 (32) 光彈調制器的控制器(photoelastic modulator controller) (34) 鎖相放大器(i〇ck-in amplifier) (35) 待測架(sample holder) (36) 電腦聯線(GPIB cable) (3 7 ) 可調大小的光圈1 (38) 可調大小的光圈2 (40)析光 (analyzer) (5 0 )價測裝置(d e t e c t 〇 r) (60)信號控制器(signal control unit) (64)直流電壓(Vdc) (66)交流電壓(Vac) (68)電腦聯線(GPIB cable) (70)個人電腦(PC)V. Description of the invention (7) Symbols of important components (10) Light source (20) Polarizer (30) Photoelastic modulator head 0A is its optical axis (32) Photoelastic Photoelastic modulator controller (34) Ioc-in amplifier (35) Sample holder (36) GPIB cable (3 7) Adjustable Aperture size 1 (38) Adjustable size aperture 2 (40) Analyzer (5 0) Price measurement device (detector) (60) Signal control unit (64) DC voltage ( Vdc) (66) AC voltage (Vac) (68) GPIB cable (70) Personal computer (PC)

第10頁 452649 五、發明說明(8) 說明附圖 第1圖:光彈調制式橢圓偏光儀的基本架構 第2圖:二標準片的零點校正圖 兩設計好的試片,在70度入射角下將偏光片及析光片的穿 透軸校準圖解(-為理論計算值,*為量測值,〇為量測值) 第3圖:轉動光彈調制器方位角所量出的直流信號圖 當光彈調制器方位角零點修正0. 27 64度後,轉動光彈調制 器方位角所量出的直流信號圖(Vdc )。(-為理論計算值, *為量測值) 第4圖:方位角偏差判別流程圖Page 10 452649 V. Description of the invention (8) Description of the drawings Figure 1: Basic structure of photoelastic modulation ellipsometry Figure 2: Zero calibration of two standard films Two designed test pieces are incident at 70 degrees Diagram of the calibration of the transmission axis of the polarizer and light-reflector under the angle (-is the theoretical calculation value, * is the measured value, 〇 is the measured value) Figure 3: DC measured by rotating the photoelastic modulator azimuth Signal graph After the photoelastic modulator azimuth zero point is corrected to 0.27 64 degrees, the direct current signal graph (Vdc) measured by rotating the photoelastic modulator azimuth. (-Is the theoretical calculation value, * is the measured value) Figure 4: Azimuth deviation discrimination flowchart

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Claims (1)

^4 5 2 64 9 六、申請專利範圍 1_ 一定角入射線上校正各元件方位角的方法包括: 二標準片, 一理論程式,用以模擬在此特定入射角下,兩聯立 方程式之圖解, 一理論程式’以量測之橢圓參數反推入射角的準確 值, 州八ΛΙ、 光路_ ……一 在於:先將一標準片放置於一僅有偏光片及析 2片的轉動式橢圓偏光儀的待測架上,利用亮比校正法 1,光片及析光片方位角之線性關係;再換第二標準片 偏光片及析光片方位角之線性關係;解此二聯立; J式=返射面之零點。將偏光片之方位角放在45 J 2 4。6 變器置光路中,並將其相位振幅調至 將光彈1 g - 方位為〇度時,量測vdc之信號; ^ =调變盗旋轉45度再測Vdc 3十异光彈調變器光軸的方位角。彳d以此-量碉 申叫專利鞑圍第丨項定自# 六T , 中1具疋月杈正法,j 卡片也可由一標準 6 —波長之方法完成 3 ’如申請專利範圍镇]语—& 準片有由理論程々ή員疋角校正法,其中所使用之二標 斤模擬之圖示中挑選。^ 4 5 2 64 9 VI. Patent application scope 1_ The method of correcting the azimuth of each element on a certain angle of incidence line includes: two standard films, a theoretical program to simulate the illustration of two simultaneous equations at this specific incident angle, A theoretical formula 'uses the measured ellipse parameters to infer the exact value of the incident angle. State eight ΛΙ, optical path _ ... one is: first place a standard film on a rotating elliptical polarization with only polarizers and 2 On the test stand of the instrument, using the brightness ratio correction method 1, the linear relationship between the azimuth angles of the light sheet and the light-resolving sheet; then change the linear relationship between the azimuth angles of the second standard sheet polarizer and the light-resolving sheet; J type = zero point of the retroreflective surface. Place the azimuth of the polarizer in the 45 J 2 4.6 converter and place it in the optical path, and adjust its phase amplitude to 1 g-when the azimuth is 0 degrees, measure the signal of vdc; ^ = modulation theft Rotate 45 degrees and then measure the azimuth of the optical axis of the Vdc 3 ten different light bomb modulator.彳 d This is the amount of the patent application. The first item is determined from # 六 T, one of which is the normal method, and the j card can also be completed by a standard 6-wavelength method. —The quasi-film is selected from the diagrams of the two-pound simulation modeled by the theoretical process of the corner correction method. 第12頁 六、申請專利範圍 4.如申請專利範圍第1項定角校正法,其定角可由二線性 關係所得之橢圓參數藉程式反推其入射角之確切值。 5. 如申請專利範圍第i項定角校正法,其中,光彈調變器 光軸之方位角之量測:將P 置於4 5 度A 置於0度; 光彈調變器之相位振幅設於0. 383又處,取直流亮度 Id。( 0°) θ。,旋轉光彈調變器4 5度再量直流亮度 Idc(0°)e〇+45>其方位角可由下式算出 ΑΓι η )p.P+0* sin % 二 2 —;-;- )w,# +4(〇 )从,+仆 。 6. 如申請專利範圍第1項定角校正法,其中,在A置於Ο 度光彈調變之光軸在0。+ 45度的直流亮度Ide(0〇)&+45 ; 及A 置於90 度光彈調變之光軸在Θ。度的直流亮度 Ι^(9〇°)θϋ可得橢圓參數ΨPage 12 6. Scope of patent application 4. If the fixed angle correction method of item 1 of the scope of patent application is adopted, the fixed angle can be deduced from the elliptic parameters obtained by the bilinear relationship to the exact value of the incident angle. 5. For the fixed angle correction method of item i in the scope of patent application, in which the azimuth of the optical axis of the photoelastic modulator is measured: P is set at 45 degrees and A is set at 0 degrees; the phase of the photoelastic modulator Set the amplitude at 0.383 again, take the DC brightness Id. (0 °) θ. , Rotating photoelastic modulator 45 degree re-directed DC brightness Idc (0 °) e〇 + 45 > The azimuth angle can be calculated by the following formula: ΑΓι η) p.P + 0 * sin% 2 2-;-;-) w, # +4 (〇) From, + servant. 6. For the fixed angle correction method in the first scope of the patent application, the optical axis of the photoelastic modulation at 0 degrees is set to 0 at A. +45 degree DC brightness Ide (0〇) &+45; and A is set at 90 degrees, and the optical axis of the photoelastic modulation is at Θ. Degree of direct current brightness Ι ^ (9〇 °) θϋ 第13頁Page 13
TW89121862A 2000-10-17 2000-10-17 Azimuthal alignment technique for PEM ellipsometry at a fixed incident angle TW452649B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI485374B (en) * 2014-01-27 2015-05-21 Univ Nat Chiao Tung Ellipsometer and ellipsometric parameters measuring method utilizing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI485374B (en) * 2014-01-27 2015-05-21 Univ Nat Chiao Tung Ellipsometer and ellipsometric parameters measuring method utilizing the same

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