TW444255B - Hydrogen sensor - Google Patents

Hydrogen sensor Download PDF

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TW444255B
TW444255B TW89105284A TW89105284A TW444255B TW 444255 B TW444255 B TW 444255B TW 89105284 A TW89105284 A TW 89105284A TW 89105284 A TW89105284 A TW 89105284A TW 444255 B TW444255 B TW 444255B
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hydrogen
metal
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hydrogen sensor
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TW89105284A
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Wen-Chau Liou
Huei-Ying Chen
Shi-Ren Pan
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Nat Science Council
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Abstract

In this invention, we propose a high-sensitivity Pd/InP hydrogen sensor. First, a n-type InP semiconductor membrane is grown on a semi-insulating InP substrate. The concentration and thickness of this membrane are 2x10<SP>17</SP> cm<SP>-3</SP> and 3000 respectively. Then, Pd metal and AuGe alloy are evaporated on the surface of the membrane as the anode and cathode electrodes, respectively. Due to the catalytic performance of Pd metal, the adsorbed hydrogen molecules on the surface of the Pd metal are dissociated into hydrogen atoms. The hydrogen atoms diffuse and pass through the Pd metal and form a dipole layer at the interface between the Pd metal and the n-type InP membrane. This dipole layer will decrease the depletion width of the n-type InP membrane and further lower the metal-semiconductor Schottky barrier height. Therefore, the current-voltage (I-V) characteristics will be modulated after the introduction of hydrogen gas. From the experimental results, the forward and reverse currents in the I-V characteristics of the sensor are both increased with increasing hydrogen concentration in air. The saturation sensitivity can reach to 130 in a 1% hydrogen concentration in air. Furthermore, even a very low hydrogen concentration of 200 ppm in air is introduced, a saturation sensitivity of 2 is obtained. This reveals that the invention is a high sensitivity hydrogen sensor.

Description

' 4442 5 5 五、發明說明(1) 發明領域 本發明是關於一種高靈敏度氫氣感測器,且特别是有 關於一種靶/磷化銦(Pd/ΙηΡ)氯氣感測器,其具有體積 小、製程簡易的優點。 發明背景 由 為原料 外洩氫 即有爆 的重視 中,以 測器除 須其他 達到智 動元件 於科技 或其他 氣與空 炸的危 ,氫氣 準確測 了體積 的附加 慧化的 氫氣感 的進步,現 用途,而氫 氣混合的濃 險。所以, 感測器已廣 知外漏氫氣 大、價格高 設備或轉換 要求'因此 測器已是當 代工業 氣為一 度範圍 基於工 泛地使 的含量 外,大 電路才 與醫療 種可燃 到達4. 業安全 用於工 ,然而 部分屬 能進行 ,發展一新式 今一項重要課 業大量 且爆炸 6 5 vo 1 的考量 廠、實 ,目前 於被動 分析或 且有效 題。 性氣體,當 %以上時, 與環保意識 驗室及醫院 傳統氫氣感 式元件,尚 放大’無法 的智慧型主 近年來’由於石夕半導體技術的進步,以纪金屬-薄氧 化,石夕半導體M〇S (metal-oxide-semiconductor)結構作 為半導體氫氣感測器之研究引起了許多人的興趣。其結構 採用纪金屬之原因在於鈀具有良好的觸媒活性,在含有氫 氣$環境中’能將吸附於表面的氫分子解離為氫原子,而 部分的氫原子將會擴散穿過鈀金屬並吸附於金屬與氧化層 界 這些乳原子經極化後,會造成氧化層與石夕半導體界 面的蕭特基能障高度改變,也因此改變了元件的電性。在'4442 5 5 5. Description of the invention (1) Field of the invention The present invention relates to a high-sensitivity hydrogen sensor, and in particular to a target / indium phosphide (Pd / ΙηΡ) chlorine gas sensor, which has a small volume The advantages of simple process. BACKGROUND OF THE INVENTION In the emphasis on leaking hydrogen as a raw material, there is an explosion of concern. In addition to the need for the detector to reach the risk of intelligent motion components in technology or other gas and air explosions, hydrogen accurately measures the volume of the hydrogen. , The current use, and the concentration of hydrogen is dangerous. Therefore, the sensor has been widely known for leaking hydrogen, high cost equipment or conversion requirements. Therefore, the sensor is a contemporary industrial gas. It is once based on the content of industrial and industrial use, the large circuit and medical species are flammable to reach 4. Occupational safety is used for work, but some of it can be carried out. The development of a new type of today's important task and an explosion of 65 5 vo 1 are considered in the factory. It is currently in a passive analysis or a valid question. When the gas is more than%, the traditional hydrogen sensing element of environmental protection laboratory and hospital still enlarges the 'impossible smart master in recent years'. The research of MOS (metal-oxide-semiconductor) structure as a semiconductor hydrogen sensor has attracted many people's interest. The reason why the metal is used in its structure is that palladium has good catalytic activity. In the environment containing hydrogen, it can dissociate hydrogen molecules adsorbed on the surface into hydrogen atoms, and some of the hydrogen atoms will diffuse through the palladium metal and adsorb. After polarization of these milk atoms at the boundary between the metal and the oxide layer, the Schottky barrier height at the interface between the oxide layer and the Shi Xi semiconductor will be changed, and the electrical properties of the device will be changed accordingly. in

第7頁 4442 5 5 五、發明說明(2) 早期I. Lundstrom提出鈀閘極之鈀/二氧化矽/ J5夕場效電晶 ^^Pd/Si02/S i MOS field effect transistor) [Lundstrom, M. S. Shi varaman, and C. Sven sson, J. Appl· Phys.,46, 3876 (1975)] ’利用把閘極吸附氫氣 後’臨限電壓(threshold voltage)與兩端電容值的改 變,作為檢測氫氣的兩種依據《但以三端元件實現兩端元 件之功能,不僅不合乎成本,並且製程困難度提高,此 外’氧化層品質亦關係著對氫氣感測能力的好壞,除了可 靠度問題外,當氧化層成長受到離子污染或缺陷增加而導 致品質不穩定時,矽半導體的費米能階會有表面態位釘住 效應(surface state pinning of Fermi-level),此時, 蕭特基能障高度較不受極化氫原子的影響,所以對氫氣之 靈敏度也較差β許多研究針對此一問題進行改良,例如A. Dutta等人以氧化鋅(ΖηΟ)等人[A. Dutta, Τ. Κ.Page 7 4442 5 5 5. Description of the invention (2) Early I. Lundstrom proposed palladium gate palladium / silicon dioxide / J5 field effect transistor ^^ Pd / Si02 / S i MOS field effect transistor) [Lundstrom, MS Shi varaman, and C. Sven sson, J. Appl. Phys., 46, 3876 (1975)] 'The change in threshold voltage and capacitance value at both ends after using the gate to absorb hydrogen' is used as a test The two basis of hydrogen "But the use of three-terminal elements to realize the functions of two-terminal elements is not only cost-effective, but also increases the difficulty of the process. In addition, the quality of the oxide layer is also related to the quality of the hydrogen sensing ability, in addition to reliability issues In addition, when the growth of the oxide layer is contaminated by ionic contamination or increased defects, the Fermi level of silicon semiconductors will have a surface state pinning of Fermi-level. At this time, Schottky The barrier height is less affected by polarized hydrogen atoms, so the sensitivity to hydrogen is also poor. Many studies have improved this problem, for example, A. Dutta et al. Used zinc oxide (Zη〇) and others [A. Dutta, T . Κ.

Chaudh ur i, and S. Basu, Materials Science Engineering, B14, 31 (1992)]和L. Yadava 等人[L. Yadava, R. Dwivedi, and S. K. Srivastava,Chaudh ur i, and S. Basu, Materials Science Engineering, B14, 31 (1992)] and L. Yadava et al. [L. Yadava, R. Dwivedi, and S. K. Srivastava,

Solid-St. Electron·, 33, 1229 (19 9 0 )]以二氧化鈦 (Ti02)來取代二氧化矽氧化層。另一方面,若以兩端式的 簫特基愈障二極體(Schottky barrier diode)來實現,似 乎是更直覺的做法,少了氧化層的不穩定因素,對氫氣之 靈敏度有明顯的改善,早期如M. C. Steele等人提出鈀/ 疏化编(Pd/CdS)結構[M. C. Steeie and B. A. Maciver, Appl. Phys. Lett.,28,687 ( 1 976 )]及 K. Ito 等人提出Solid-St. Electron., 33, 1229 (19 9 0)] replaces the silicon dioxide oxide layer with titanium dioxide (Ti02). On the other hand, if it is implemented with a Schottky barrier diode at both ends, it seems to be a more intuitive approach. The instability of the oxide layer is reduced, and the sensitivity to hydrogen is significantly improved. In the early days, such as MC Steele and others proposed the structure of palladium / diffusion (Pd / CdS) [MC Steeie and BA Maciver, Appl. Phys. Lett., 28, 687 (1 976)] and K. Ito and others

444255 五、發明說明(3) 鈀 / 氧化鋅(Pd/ZnO)結構[K_ It〇,SurfaceSci.,86, 345 ( 1 982)],之所以使用i i—VI族化、舍物半導體為材料, 主要原因在於ιι-νι族化合物半導體的表面態位(surface s t a t e)與極化氫原子相較,其影響已不明顯。 發明要旨 本發明的主要目的就是在提供一種高靈敏度之氫氣感 測器,包含: —半導體基板; 一形成於泫半導體基板上的n型或口型半導體薄膜;及 a形成於該半導體薄膜的一相同表面上但彼此間隔開的 =陽極與一陰極,其中作為陽極的一第一金屬與該半導體 溥膜形成一蕭特基接觸,及作為陰極的一第二金屬與該半 導體薄膜形成歐姆接觸,其中該第一金屬的材質與厚度可 使得當氫氣接觸該第一金屬的一曝露表面時,該蕭特基接 觸的蕭特基位障高度降低。 ^ .於本發明的氫氣感測器中,該第一金屬材質及厚度使 ,當氫氣接觸該第一金屬的曝露表面時,該氫氣被解離為 ^原子’並且該氫原子擴散穿透該第一金屬,於是降低該 蕭特基位障高度。 較佳地’該第一金屬為把或鈀合金,以鈀為更佳。該 1巴,較佳地’具有一厚度為2 0 〇 〇埃至5微米。 於本發明的氫氣感測器中’較佳地,該半導體基板係 由半絕緣型磷化銦(I np)材料形成。444255 V. Description of the invention (3) Palladium / zinc oxide (Pd / ZnO) structure [K_It〇, SurfaceSci., 86, 345 (1 982)], why use ii-VI grouping, house semiconductors as materials, The main reason is that the surface state of the ι-νι compound semiconductors is not as significant as that of polarized hydrogen atoms. SUMMARY OF THE INVENTION The main object of the present invention is to provide a high-sensitivity hydrogen sensor including: a semiconductor substrate; an n-type or mouth-type semiconductor thin film formed on a rhenium semiconductor substrate; and a On the same surface but spaced apart from each other = an anode and a cathode, wherein a first metal as an anode makes a Schottky contact with the semiconductor rhenium film, and a second metal as a cathode makes ohmic contact with the semiconductor film Wherein, the material and thickness of the first metal can reduce the height of the Schottky barrier of the Schottky contact when the hydrogen contacts an exposed surface of the first metal. ^ In the hydrogen sensor of the present invention, the first metal material and thickness are such that when hydrogen contacts the exposed surface of the first metal, the hydrogen is dissociated into ^ atoms' and the hydrogen atoms diffuse through the first A metal, thus reducing the Schottky barrier height. Preferably, the first metal is a handle or a palladium alloy, and more preferably palladium. The 1 bar, preferably &apos; has a thickness of 2000 angstroms to 5 microns. In the hydrogen sensor of the present invention, it is preferable that the semiconductor substrate is formed of a semi-insulating indium phosphide (I np) material.

444 2 b 五、發明說明(4) ---- 於本發明的氫氣感測器中,較佳地,該半導體薄 η型IH-V族化合物,以碟化銦(η_ίηρ)為更佳。^ '為 η InP的合適摻雜遭度介於ΐχΐ〇】6至5χΐ〇ρ cnr3,及一合 適厚度介於1000埃至5G〇〇埃。 口 ^於本發明的氫氣感測器中’該第二金屬較佳地為金鍺 σ金(AuGe)。该金鍺合金,較佳地,具有一介於 5微米的厚度。 、 於本發明的氫氣感測器中,較佳地,該陽極具有一 C 形或,似C形的形狀,該陰極具有一對應於該陽極的形狀 而使得該陰極為陽極所包圍。二選一地,該陰極具有一c 形或類似C形的形狀,該陽極具有一對應於該陰極的形狀 而使得該陽極為陰極所包圍。 发^ —依本發明的一較佳具體實施例所完成的鈀/磷化銦 虱氣感測器:利用鈀薄骐作為·觸媒金屬,將氫分子解離為 氫原=,亚藉由磷化銦薄膜與鈀金屬界面可吸附大量氫原 子的此力得到明顯二極體電性的線性變化,進而可檢測 低濃度的氫氣含量。 為使士,明之目的、特徵及優點更明顯易懂,下文特 舉一較佳實施例,並配合有關本發明之附圖,作詳細說 明。 較佳具體實施例的詳細說明 根據本發明的一較佳具體實施例所完成的一種高靈敏 度之鈀/磷化銦氫氣感測器,包括:—半絕緣型磷化銦基444 2 b V. Description of the invention (4) ---- In the hydrogen sensor of the present invention, preferably, the semiconductor thin η-type IH-V group compound is more preferably indium dished (η_ίηρ). ^ 'Is a suitable doping degree for η InP ranging from ΐχΐ〇] 6 to 5χΐ〇ρ cnr3, and a suitable thickness ranging from 1000 Angstroms to 5Gangstroms. In the hydrogen sensor of the present invention, the second metal is preferably gold germanium sigma gold (AuGe). The gold-germanium alloy preferably has a thickness between 5 microns. In the hydrogen sensor of the present invention, preferably, the anode has a C-shape or a C-like shape, and the cathode has a shape corresponding to the anode so that the cathode is surrounded by the anode. Alternatively, the cathode has a c-shape or a C-like shape, and the anode has a shape corresponding to the cathode such that the anode is surrounded by the cathode. Development ^-A palladium / indium phosphide gas sensor completed in accordance with a preferred embodiment of the present invention: the use of palladium as a catalyst metal to dissociate hydrogen molecules into hydrogen = The force of the interface between the indium thin film and the palladium metal that can adsorb a large number of hydrogen atoms results in a significant linear change in the electrical properties of the diode, and thus can detect low-concentration hydrogen content. In order to make it clearer, the purpose, features, and advantages of the invention are more obvious and easy to understand, a preferred embodiment will be given below, and it will be described in detail with the accompanying drawings of the present invention. Detailed description of a preferred embodiment A highly sensitive palladium / indium phosphide hydrogen sensor completed in accordance with a preferred embodiment of the present invention includes:-a semi-insulating indium phosphide-based

第10頁 4442 5 5Page 10 4442 5 5

板;一Π型磷化銦薄膜,位於該半絕緣型磷化銦基板上; 一金鍺合金之歐姆接觸金屬層和一鈀金屬之蕭特基接觸金 屬層’彼此鄰近但隔絕,且位於磷化銦薄膜上。 ^在該高靈敏度鈀/磷化銦氫氣感測器中,該η型磷化銦 薄臈係利用有機金屬氣相沉積法(M0CVD)成長在該半絕緣 里鱗化銦基板上的一層向品質的n型鱗化銦薄膜,因此其 具有f為減少的表面態位密度。金屬_半導體間的蕭特基 月b障间度與極化氫原子的數目即與表面態位密度有密切關 係。此外,磷化銦材料的氫氣覆蓋率(hydrogen coverage) 1¾,空氣中相當低的氣氣含量也能使蕭特基能 IV向度明顯改變,此特性正適合作為百分之一以下低漢度 的檢測。在溫度特性方面,磷化銦材料的能隙(bandgap) 約為1. 35,較矽為大,亦有不錯的耐溫表現。除此之外, 最重要的,磷化銦材料成長與製程技術已發展成熟,盔 是光電或微波積體電路皆已應用於業界,本發明氫^感 測器可與光電元件整合並積體化,成為同時檢測光電與氫 氣的多功能智慧型感測器,相信日後在各方面的應用將極 具潛力。 實施例 根據本發明的一較佳具體實施例所完成的一種高靈敏 度把/磷化銦氫氣感測器i 〇被示於第一圖,其製備方法包 3首,準備一半絕緣型磷化銦基板丨2。其次,利用有機金 屬化學氣相沈積法的技術在該半絕緣型磷化銦基板丨2上成Plate; a Π-type indium phosphide film located on the semi-insulating indium phosphide substrate; an ohmic contact metal layer of a gold-germanium alloy and a Schottky contact metal layer of a palladium metal 'are adjacent to each other but isolated, and are located in the phosphorus On indium thin film. ^ In the high-sensitivity palladium / indium phosphide hydrogen sensor, the n-type indium phosphide thin gadolinium system is grown on the semi-insulating scaled indium substrate by using organometallic vapor deposition (MOCVD). The n-type scaled indium thin film, so it has a reduced surface state potential density. The Schottky Moon b barrier between metal and semiconductor has a close relationship with the number of polarized hydrogen atoms, that is, the surface state potential density. In addition, the hydrogen coverage of the indium phosphide material is 1¾, and the relatively low gas content in the air can also significantly change the Schottky energy IV dimension. This characteristic is suitable as a low degree of less than one percent. Detection. In terms of temperature characteristics, the bandgap of the indium phosphide material is about 1.35, which is larger than that of silicon, and also has good temperature resistance performance. In addition, most importantly, the indium phosphide material growth and process technology has matured. Helmets are photovoltaic or microwave integrated circuits that have been used in the industry. The hydrogen sensor of the present invention can be integrated and integrated with photovoltaic elements. It will become a multi-functional intelligent sensor that detects both photoelectricity and hydrogen at the same time. It is believed that future applications in various aspects will have great potential. EXAMPLES A high-sensitivity handle / indium phosphide hydrogen sensor i 0 completed according to a preferred embodiment of the present invention is shown in the first figure. The preparation method includes three pieces, and half of the insulating indium phosphide is prepared. Board 丨 2. Secondly, the technique of organic metal chemical vapor deposition was used to form the semi-insulating indium phosphide substrate 2

第11頁 4442 55 五、發明說明(6) 長一品質良好之η型磷化銦薄膜丨4,其濃度及厚度分別為 2xlOncnr3及3000禳C接著,再利用傳統光罩微影及真空蒸 鍍的技術,先後於η型磷化銦薄膜μ表面上蒸鍍金鍺合金 之歐姆性接觸金屬層16與鈀金屬之蕭特基接觸金屬層18, 分別作為感測器之陰極與陽極。 第一圖之本發明感測器於(a)未感測到氫氣及(b)感測 到氫氣時之電荷密度分佈及剖示能帶圖被示於第二圖。在 未引入氫氣前,該感測器的鈀金屬丨8與n型磷化銦薄膜1 4 之界面的電荷分佈呈平衡狀態,並形成一金屬—半導體蕭 特基能障’如第二圖(a)所示。在引入氩氣後,由於鈀金 屬1 8對氫氣具有觸媒作用,當氫分子被吸附於鈀金屬表面 時會被解離為氫原子’而大部分氫原子將會擴散穿透鈀金 廣18 ’並於把金屬18與n型磷化銦薄膜14界面間形成偶極 矩層’此一偶極矩層將改變原有電荷分佈之平衡狀態,而 達到一新的平衡狀態’此一新的平衡狀態減少了 η型磷化 姻半導體的空乏區寬度’進而降低了蕭特基能障高度,如 第二圖(b)所示。 第三圖為本發明之感測器於空氣及空氣中含不同氫氣 含量(200ppm、5 00ppm、lOOOppm、5 000ppm、lOOOOppm)的 環境測量之電流-電壓特性曲線圖。此圖中的順向偏壓被 疋義為該蕭特基接觸相對於該歐姆接觸為外加正電壓,相 反地’反向偏壓則為外加負電壓。由於氫氣含量愈大’萧 特基位障高度愈小’故電流相對愈大。由圖可知,無論是 順向偏壓之電流或反向偏壓之電流,兩者皆隨著空氣中氫Page 114442 55 V. Description of the invention (6) A long-quality η-type indium phosphide film 丨 4, the concentration and thickness of which are 2xlOncnr3 and 3000 禳 C, respectively. Then, the traditional photolithography and vacuum evaporation are used. In the technology, the ohmic contact metal layer 16 of gold-germanium alloy and the Schottky contact metal layer 18 of palladium metal are vapor-deposited on the surface of the n-type indium phosphide film μ, respectively, as the cathode and anode of the sensor, respectively. The charge density distribution and cross-sectional energy band diagram of the sensor of the present invention in the first figure when (a) no hydrogen is sensed and (b) when hydrogen is sensed are shown in the second figure. Before the introduction of hydrogen, the charge distribution at the interface of the sensor's palladium metal 8 and n-type indium phosphide film 1 4 is in equilibrium, and a metal-semiconductor Schottky barrier is formed, as shown in the second figure ( a) shown. After the introduction of argon, because palladium metal 18 has a catalytic effect on hydrogen, when hydrogen molecules are adsorbed on the surface of palladium metal, they will be dissociated into hydrogen atoms, and most of the hydrogen atoms will diffuse through palladium. A dipole moment layer is formed between the interface of the metal 18 and the n-type indium phosphide film 14 'This moment of a dipole moment will change the equilibrium state of the original charge distribution and reach a new equilibrium state' This new equilibrium The state reduces the width of the empty region of the n-type phosphide semiconductor, thereby reducing the Schottky barrier height, as shown in the second figure (b). The third figure is a current-voltage characteristic curve diagram of the sensor of the present invention in air and air containing different hydrogen contents (200ppm, 500ppm, 100ppm, 5000ppm, 1000ppm) in environmental measurement. The forward bias in this figure is interpreted as the positive voltage applied to the Schottky contact relative to the ohmic contact, and the negative voltage applied to the reverse ground 'reverse bias. The larger the hydrogen content is, the smaller the Schottky barrier height is, the larger the current is. It can be seen from the figure that both the forward biased current and the reverse biased current follow the hydrogen in the air.

第12頁 4442 5 5 五、發明說明(7) 氣含量的增加而增加’其中更可明顯看出反向電流之增加 趨勢是隨氫氣含量成正比之線性增加。 第四圖顯示第一圖之本發明感測器的蕭特基能障高度 對空氣中氫氣含量關係β在空氣中的能障高度約為 5 0 0 m e V,隨著氫氣含量的增加,能障高度逐漸減小,當氫 氣含量大於0 · 5 %時’能障高度幾乎達到最低值,此時,順 向電流傳導已非常近似於歐姆特性。 第五圖為第一圖之本發明感測器在溫度為1 2 5 °C時測 量之暫態響應圖。當氫氣引入時,代表2〇〇ppm氫氣含量的 空氣以500ml /min的速率流入測試腔中,測試條件為在鈀 金屬之蕭特基接觸金屬層18與歐姆性接觸金屬層η兩電極 間維持一固定反向電流8πιΑ,由於解離之氫原子形成偶極 矩層緣故,通過蕭特基接觸的反向電流增加,因此造成兩 電極間的電壓相對減少約! 2V ’另一方面,當氫氣關閉 時,感測器直接暴露於空氣中,氫原子結合為氫分子或盥 5結合為水分子而脫附鈀金屬表面,因而又造成兩電極間 一電壓的回復。若定義反應時間與回復時間為達到個別穩 =〇%所需之時間’則由圖可知,感測器之反應時間約 量方、:回货復化間約為1 2秒。此外’重覆第-週期的測 性 于到第二週期兩者發現其展示了相當高的重現 第六圖為第一圖 中氫氣含量關係圖。 電壓下,流經兩電極 之本發明感測器之飽和靈敏度對空氣 免和靈敏度S定義為在一固定的反向 間電流變化量對基準電流之比值(1^Page 12 4442 5 5 V. Description of the invention (7) Increasing with increasing gas content 'Among them, it is more obvious that the increasing trend of reverse current is a linear increase in proportion to the hydrogen content. The fourth graph shows the relationship between the Schottky barrier height of the sensor of the present invention and the hydrogen content in the air in the first graph. The energy barrier height in the air is about 50 meV. The barrier height gradually decreases. When the hydrogen content is greater than 0.5%, the barrier height reaches almost the lowest value. At this time, the forward current conduction is very close to the ohmic characteristic. The fifth graph is the transient response graph of the sensor of the present invention measured at the temperature of 125 ° C in the first graph. When hydrogen is introduced, air representing 200 ppm of hydrogen content flows into the test chamber at a rate of 500 ml / min. The test conditions are maintained between the Schottky contact metal layer 18 and the ohmic contact metal layer η of the palladium metal. A fixed reverse current of 8πA, because the dissociated hydrogen atoms form a dipole moment layer, the reverse current through the Schottky contact increases, thus causing the voltage between the two electrodes to decrease relatively! 2V 'On the other hand, when the hydrogen is turned off, the sensor is directly exposed to the air, and the hydrogen atoms are combined into hydrogen molecules or the water molecules are combined into water molecules to desorb the surface of the palladium metal, thus causing a voltage recovery between the two electrodes. . If the reaction time and the recovery time are defined as the time required to reach individual stability = 0%, it can be seen from the figure that the response time of the sensor is about the same amount: the return and return interval is about 12 seconds. In addition, repeating the measurement of the first-period, it was found that it showed a fairly high reproducibility in both the second and the sixth periods. The sixth graph is a graph of the hydrogen content relationship in the first graph. Under voltage, the saturation sensitivity of the sensor of the present invention flowing through the two electrodes versus air immunity and sensitivity S are defined as the ratio of the current change to the reference current (1 ^

第13頁 4442 5 5 五、發明說明(8) _1$氣)/1空氣’由圖明顯地看出,該靈敏度隨氫氣含量增加 而增加。在0.5V反向偏壓下,1%氫氣含量的空氣中測量之 飽和靈敏度可高達130,即使在相當低之2〇〇1^111氫氣含量 空氣中測量之飽和靈敏度亦可達到2。 由以上可知’本發明之氫氣感測器除具備體積小、製 程簡易與可積體化之優點外,經由實驗結果顯示,其高線 性度、高反應速度、高重現性、高靈敏度等四項特性亦遠 優越於一般傳統氫氣感測器,若能大量生產,降低成本, 則本發明之氫氣感測器在工業安全的實用性上將極具 雖然本發明已以一 :限定本發明’任何熟習此技藝者離 :::範圍内’當可做各種之更動與潤•,因此本發 : &quot;隻範圍當視後附之申請專利範圍所界定者為準。Page 13 4442 5 5 V. Description of the invention (8) _1 $ gas) / 1 air 'It is obvious from the figure that the sensitivity increases with the increase of hydrogen content. Under 0.5V reverse bias, the saturation sensitivity measured in the air with 1% hydrogen content can reach 130, and the saturation sensitivity measured in the air with a relatively low 20001 ~ 111 hydrogen content can also reach 2. From the above, it can be known that, in addition to the advantages of small volume, simple process, and integration, the hydrogen sensor of the present invention shows that its high linearity, high response speed, high reproducibility, and high sensitivity. This feature is also far superior to the traditional hydrogen sensor in general. If it can be mass-produced and reduce costs, the hydrogen sensor of the present invention will be extremely useful in industrial safety. Although the present invention has been limited to the following: Anyone who is familiar with this skill can use various changes and modifications within the scope of :::, so this issue: &quot; Only the scope shall be determined by the scope of the attached patent application.

圖式簡單說明 圓示之簡單說明: 第一圖係依本發明的一較佳具體實施例所完成的鈀/ 碟化銦氫氣感測器的示意圖。 第二圖係第一圖中之鈀/磷化銦氫氣感測器於(a)未感 測到氫氣及(b)感測到氫氣時之電荷密度分佈及剖示能帶 圖。 第三圖係第一圖中之鈀/磷化銦氫氣感測器於空氣及 空氣中含不同氩氣含量(200ppm、500ppm、1000ppm、 50 0 0ppm、1 0 0 0 0 ppm)之環境所測量之電流-電壓特性曲線 圖。 第四圖係第一圖中之鈀/磷化銦氫氣感測器之蕭特基 能障高度對氫氣濃度關係圖》 苐五圖係第一圖中之鈀/鱗化銦氫氣感測器在溫度為 1 2 5 °c時測量之暫態響應圖。 第六圖係第一圖中之鈀/磷化銦氣氣感測器之飽和靈 敏度對氫氣含量關係圖》 圖示中之標號說明: 10 氫氣 感測 器 12 半絕 緣型 磷化銦基板 14 η型磷化銦薄膜 16 金錯 合金 之歐姆接觸 金屬 層 18 鈀金 屬之 蕭特基接觸 金屬 層Brief description of the drawings Brief description of the circles: The first diagram is a schematic diagram of a palladium / disdium indium hydrogen sensor completed according to a preferred embodiment of the present invention. The second diagram is the charge density distribution and cross-section energy band diagram of the palladium / indium phosphide hydrogen sensor in the first diagram when (a) no hydrogen is sensed and (b) hydrogen is sensed. The third picture is measured in the first picture of the palladium / indium phosphide hydrogen sensor in air and air containing different argon content (200ppm, 500ppm, 1000ppm, 50,000 ppm, 100 ppm) Current-voltage characteristic curve. The fourth picture is the relationship between the Schottky barrier height and the hydrogen concentration of the palladium / indium phosphide hydrogen sensor in the first picture. Transient response diagram measured at a temperature of 1 2 5 ° c. The sixth diagram is the relationship between saturation sensitivity and hydrogen content of the palladium / indium phosphide gas sensor in the first diagram. The symbols in the diagram indicate: 10 Hydrogen sensor 12 Semi-insulating indium phosphide substrate 14 η Type indium phosphide film 16 Ohmic contact metal layer of gold alloy 18 Schottky contact metal layer of palladium metal

Claims (1)

4442 55 六、申請專利範圍 I. 一種氫氣感測器,包含 一半導體基板; :形成於該半導體基材上的n型或?型半導體薄膜;及 形成於忒半導體溥膜的—相同表面上但彼此間隔開的 一陽極與-陰極,其中作為陽極的一第一金屬與該半導體 薄膜形成一蕭特基接觸,及作為陰極的一第二金屬與該半 導體薄膜形成歐姆接觸,其中該第一金屬的材質與厚度可 使得當氫氣接觸該第一金屬的一曝露表面時’該蕭特基接 觸的蕭特基位障高度降低。 2.如申請專利範圍第1項的氩氣感測器,其中該第一 金屬的材質與厚度使得當氫氣接觸該第一金屬的曝露表面 時’該氩氣被解離為氫原子,並且該氫原子擴散穿透該第 一金屬,於是降低該蕭特基位障高度。 3 _如申請專利範圍第1項的氩氣感測器’其中該半導 體基板係由半絕緣型磷化銦(丨nP)材料形成。 4 ·如申請專利範圍第1項的氫氣感測器’其中該半導 體薄膜為η型I 11 -V族化合物。 5.如申請專利範圍第4項的氫氣感測器’其中該η型 III-V族合物為11型111卩。4442 55 6. Scope of patent application I. A hydrogen sensor including a semiconductor substrate; n-type or? Formed on the semiconductor substrate? Type semiconductor thin film; and an anode and a cathode formed on the same surface of the semiconductor semiconductor film but spaced from each other, wherein a first metal serving as an anode forms a Schottky contact with the semiconductor film, and a cathode serving as a cathode A second metal makes ohmic contact with the semiconductor thin film, wherein the material and thickness of the first metal can make the Schottky barrier height of the Schottky contact decrease when hydrogen contacts an exposed surface of the first metal. 2. The argon gas sensor according to item 1 of the patent application scope, wherein the material and thickness of the first metal are such that when hydrogen contacts the exposed surface of the first metal, the 'argon gas is dissociated into hydrogen atoms, and the hydrogen Atomic diffusion penetrates the first metal, thereby reducing the Schottky barrier height. 3 _ The argon gas sensor according to item 1 of the patent application, wherein the semiconductor substrate is formed of a semi-insulating indium phosphide (nP) material. 4. The hydrogen sensor according to item 1 of the patent application, wherein the semiconductor thin film is a η-type I 11 -V group compound. 5. The hydrogen sensor 'according to item 4 of the patent application, wherein the n-type III-V group compound is 11-type 111 卩. — — 第16頁 4442 55 六、申請專利範圍 6. 如申請專利範圍第5項的氫氣感測器,其中該11型 InP具有一掺雜濃度介於lxl〇16至cm-3。 7. 如申請專利範圍第5項的氫氣感測器,其中該n型 InP具有一介於1〇〇〇埃至5〇〇〇埃的厚度。 8. 如申請專利範圍第1項的氫氣感測器,其中該第一 金屬為叙或纪合金。 9.如申請專利範圍第8項的氫氣感測器,纟中該第一 的氫氣感測器,其中該纪 1 0 _如申請專利範圍第9項 的厚度為2000埃至5微米。 屬 11 _如申請專利範圍第i 係為金錯合金(AuGe)。 項的氫氣感測器,該第二金 1 2 _如申請專利範圍第11項 鍺合金具有一厚度係介於3〇〇〇埃 的氫氣感測器,其中該 至5微米。 金 13.如申請專利範圍第!項之氫氣感測器, ^有-C形或類似C形的形狀,該陰 ^陽 極的形狀而使得該陰極為陽極 $ t應於心— — Page 16 4442 55 6. Scope of patent application 6. For example, the hydrogen sensor of item 5 of the scope of patent application, wherein the 11-type InP has a doping concentration between lx1016 and cm-3. 7. The hydrogen sensor according to item 5 of the patent application, wherein the n-type InP has a thickness between 1000 angstroms and 5000 angstroms. 8. The hydrogen sensor according to item 1 of the patent application scope, wherein the first metal is a Syrian or Ki alloy. 9. The hydrogen sensor according to item 8 of the patent application, and the first hydrogen sensor in the first application, wherein the thickness of the period 10 to 10 is from 2000 angstroms to 5 microns. Belongs to 11 _ If the scope of patent application for the i series is AuGe. The hydrogen sensor of item 2, the second gold 1 2 _ As in item 11 of the scope of patent application, the germanium alloy has a hydrogen sensor with a thickness of 3,000 angstroms, wherein the thickness is 5 micrometers. Gold 13. If the scope of patent application is the first! The hydrogen sensor of the item has a -C shape or a shape similar to the C shape, and the shape of the cathode makes the cathode an anode. $ T 应 于 心 第17頁 4442 55 六、申請專利範圍 14.如申請專利範圍第1項之氫氣感測器,其中該陰 極具有一 C形或類似C形的形狀,該陽極具有一對應於該陰 極的形狀而使得該陽極為陰極所包圍。Page 17 4442 55 VI. Patent application scope 14. The hydrogen sensor of item 1 of the patent application scope, wherein the cathode has a C-shape or similar C-shape, and the anode has a shape corresponding to the shape of the cathode. The anode is surrounded by the cathode. 第18頁Page 18
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103779350A (en) * 2014-02-25 2014-05-07 中国电子科技集团公司第四十九研究所 Schottky diode hydrogen sensor core and manufacturing method of core
US10753917B2 (en) 2017-05-12 2020-08-25 National Chiao Tung University Hydrogen sensing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103779350A (en) * 2014-02-25 2014-05-07 中国电子科技集团公司第四十九研究所 Schottky diode hydrogen sensor core and manufacturing method of core
US10753917B2 (en) 2017-05-12 2020-08-25 National Chiao Tung University Hydrogen sensing device

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