TW430880B - Method for increasing process window by reducing side lobe - Google Patents
Method for increasing process window by reducing side lobeInfo
- Publication number
- TW430880B TW430880B TW88122188A TW88122188A TW430880B TW 430880 B TW430880 B TW 430880B TW 88122188 A TW88122188 A TW 88122188A TW 88122188 A TW88122188 A TW 88122188A TW 430880 B TW430880 B TW 430880B
- Authority
- TW
- Taiwan
- Prior art keywords
- patterned photoresist
- side lobe
- process window
- base layer
- adhesion layer
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention relates to a method for increasing a process window by reducing the side lobe, which comprises: providing a substrate formed with a base layer thereon; forming a patterned photoresist that has been processed by a photolithography procedure on the base layer, in which a plurality of side lobes are formed in the patterned photoresist due to the use of a phase shift mask during the exposure; using a selective growing process to form a selective adhesion layer, which is only adhered to the patterned photoresist, on the top and sidewall of the patterned photoresist, thereby forming a stack structure by combining the selective adhesion layer with the patterned photoresist; using the stack structure as a mask to perform an etching process on the base layer; and removing the selective adhesion layer and the patterned photoresist.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88122188A TW430880B (en) | 1999-12-17 | 1999-12-17 | Method for increasing process window by reducing side lobe |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88122188A TW430880B (en) | 1999-12-17 | 1999-12-17 | Method for increasing process window by reducing side lobe |
Publications (1)
Publication Number | Publication Date |
---|---|
TW430880B true TW430880B (en) | 2001-04-21 |
Family
ID=21643430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW88122188A TW430880B (en) | 1999-12-17 | 1999-12-17 | Method for increasing process window by reducing side lobe |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW430880B (en) |
-
1999
- 1999-12-17 TW TW88122188A patent/TW430880B/en not_active IP Right Cessation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |