TW428305B - Manufacturing method of dielectric layer - Google Patents

Manufacturing method of dielectric layer

Info

Publication number
TW428305B
TW428305B TW88110306A TW88110306A TW428305B TW 428305 B TW428305 B TW 428305B TW 88110306 A TW88110306 A TW 88110306A TW 88110306 A TW88110306 A TW 88110306A TW 428305 B TW428305 B TW 428305B
Authority
TW
Taiwan
Prior art keywords
layer
forming
manufacturing
nitride layer
nitride
Prior art date
Application number
TW88110306A
Other languages
Chinese (zh)
Inventor
Yi-Chang Yang
Tang Yu
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW88110306A priority Critical patent/TW428305B/en
Application granted granted Critical
Publication of TW428305B publication Critical patent/TW428305B/en

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

A manufacturing method of dielectric layer includes the following steps: forming a first oxide on the surface of a polysilicon layer; forming a first nitride layer with a high silicon content on the first oxide layer; forming a second nitride layer with a low silicon content on the first nitride layer; then, conducting oxidation process for the second nitride layer and forming a second oxide layer on the surface of the second nitride to complete the dielectric structure with multi-layered nitride layer structure.
TW88110306A 1999-06-21 1999-06-21 Manufacturing method of dielectric layer TW428305B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW88110306A TW428305B (en) 1999-06-21 1999-06-21 Manufacturing method of dielectric layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW88110306A TW428305B (en) 1999-06-21 1999-06-21 Manufacturing method of dielectric layer

Publications (1)

Publication Number Publication Date
TW428305B true TW428305B (en) 2001-04-01

Family

ID=21641201

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88110306A TW428305B (en) 1999-06-21 1999-06-21 Manufacturing method of dielectric layer

Country Status (1)

Country Link
TW (1) TW428305B (en)

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Legal Events

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees