TW372335B - Manufacturing method for increasing selectivity of photo-resistance - Google Patents

Manufacturing method for increasing selectivity of photo-resistance

Info

Publication number
TW372335B
TW372335B TW086118962A TW86118962A TW372335B TW 372335 B TW372335 B TW 372335B TW 086118962 A TW086118962 A TW 086118962A TW 86118962 A TW86118962 A TW 86118962A TW 372335 B TW372335 B TW 372335B
Authority
TW
Taiwan
Prior art keywords
resistance
photo
manufacturing
etching
increasing selectivity
Prior art date
Application number
TW086118962A
Other languages
Chinese (zh)
Inventor
jia-xiong Cai
Chao-Chen Chen
Hong-Yuan Tao
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW086118962A priority Critical patent/TW372335B/en
Application granted granted Critical
Publication of TW372335B publication Critical patent/TW372335B/en

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Abstract

A kind of manufacturing method for increasing selectivity of photo-resistance. During the etching process of metal wires, to add a low dielectric constant material under the photo-resistance and after the photolithography process, employ the plasma with fluoride gas for etching the low dielectric constant material. The manufacturing method provided in this invention can enhance the precision of pattern shift at exposure to avoid the shrink of metal wiring width and reduce the process for removing photo-resistance after etching.
TW086118962A 1997-12-16 1997-12-16 Manufacturing method for increasing selectivity of photo-resistance TW372335B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086118962A TW372335B (en) 1997-12-16 1997-12-16 Manufacturing method for increasing selectivity of photo-resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086118962A TW372335B (en) 1997-12-16 1997-12-16 Manufacturing method for increasing selectivity of photo-resistance

Publications (1)

Publication Number Publication Date
TW372335B true TW372335B (en) 1999-10-21

Family

ID=57941631

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086118962A TW372335B (en) 1997-12-16 1997-12-16 Manufacturing method for increasing selectivity of photo-resistance

Country Status (1)

Country Link
TW (1) TW372335B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8748323B2 (en) 2008-07-07 2014-06-10 Macronix International Co., Ltd. Patterning method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8748323B2 (en) 2008-07-07 2014-06-10 Macronix International Co., Ltd. Patterning method

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