TW369681B - Apparatus and method for in-situ monitoring of chemical mechanical polishing operations - Google Patents

Apparatus and method for in-situ monitoring of chemical mechanical polishing operations

Info

Publication number
TW369681B
TW369681B TW085104954A TW85104954A TW369681B TW 369681 B TW369681 B TW 369681B TW 085104954 A TW085104954 A TW 085104954A TW 85104954 A TW85104954 A TW 85104954A TW 369681 B TW369681 B TW 369681B
Authority
TW
Taiwan
Prior art keywords
mechanical polishing
chemical mechanical
situ monitoring
polishing operations
layer
Prior art date
Application number
TW085104954A
Other languages
Chinese (zh)
Inventor
Manoocher Birang
Nils Johansson
Allan Gleason
Grigory Pyatigorsky
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=57941432&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW369681(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US08/605,769 external-priority patent/US5964643A/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of TW369681B publication Critical patent/TW369681B/en

Links

Abstract

An in-situ method of measuring uniformity of a layer on a substrate during polishing of said layer, said method comprising: directing a light beam toward said layer during polishing; monitoring an interference signal produced by said light beam reflecting off of said substrate; and computing a measure of uniformity from said interference signal.
TW085104954A 1996-02-22 1996-04-25 Apparatus and method for in-situ monitoring of chemical mechanical polishing operations TW369681B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/605,769 US5964643A (en) 1995-03-28 1996-02-22 Apparatus and method for in-situ monitoring of chemical mechanical polishing operations

Publications (1)

Publication Number Publication Date
TW369681B true TW369681B (en) 1999-09-11

Family

ID=57941432

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085104954A TW369681B (en) 1996-02-22 1996-04-25 Apparatus and method for in-situ monitoring of chemical mechanical polishing operations

Country Status (1)

Country Link
TW (1) TW369681B (en)

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