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First worldwide family litigation filedlitigationCriticalhttps://patents.darts-ip.com/?family=57941432&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW369681(B)"Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US08/605,769external-prioritypatent/US5964643A/en
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
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Publication of TW369681BpublicationCriticalpatent/TW369681B/en
An in-situ method of measuring uniformity of a layer on a substrate during polishing of said layer, said method comprising: directing a light beam toward said layer during polishing; monitoring an interference signal produced by said light beam reflecting off of said substrate; and computing a measure of uniformity from said interference signal.
TW085104954A1996-02-221996-04-25Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
TW369681B
(en)