TW354795B - Liquid radiation-curable formulation, in particular for use in stereolithography - Google Patents

Liquid radiation-curable formulation, in particular for use in stereolithography

Info

Publication number
TW354795B
TW354795B TW083107379A TW83107379A TW354795B TW 354795 B TW354795 B TW 354795B TW 083107379 A TW083107379 A TW 083107379A TW 83107379 A TW83107379 A TW 83107379A TW 354795 B TW354795 B TW 354795B
Authority
TW
Taiwan
Prior art keywords
polysiloxane
liquid radiation
curable formulation
stereolithography
polyoxyalkylene
Prior art date
Application number
TW083107379A
Other languages
Chinese (zh)
Inventor
Jean-Pierre Wolf
Adrian Schulthess
Bettina Steinmann
Max Hunziker
Original Assignee
Ciba Geigy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Corp filed Critical Ciba Geigy Corp
Application granted granted Critical
Publication of TW354795B publication Critical patent/TW354795B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

A liquid radiation-curable formulation comprising 0.1 to 10 wt% of at least one photoinitiator and 0.5 to 50 wt% of a polyoxyalkylene-polysiloxane block copolymer, and the balance to 100% of at least one compound that contains radically polymerisable groups, in which the polyoxyalkylene-polysiloxane block copolymer is selected from copolymers of the chemical formulae (I), (II) and (III), in which: R1 is a hydrogen atom or a C1-C8-alkyl group; c is a number of 1 to 8 which is equivalent to the average carbon number of alkylene unit in the (CcH2cO)d of the polysiloxane alkylene group; d is an integer of 1 to 100; g is an integer of 1 to 4; [T] is selected from the formula T1 to T12, [PS] is a polysiloxane group of the following formula.
TW083107379A 1993-08-26 1994-08-12 Liquid radiation-curable formulation, in particular for use in stereolithography TW354795B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH254193 1993-08-26

Publications (1)

Publication Number Publication Date
TW354795B true TW354795B (en) 1999-03-21

Family

ID=57940232

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083107379A TW354795B (en) 1993-08-26 1994-08-12 Liquid radiation-curable formulation, in particular for use in stereolithography

Country Status (2)

Country Link
KR (1) KR100310329B1 (en)
TW (1) TW354795B (en)

Also Published As

Publication number Publication date
KR100310329B1 (en) 2001-12-31
KR950005883A (en) 1995-03-20

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